CN103744268B - A kind of high precision grating scale motherboard lithographic equipment - Google Patents
A kind of high precision grating scale motherboard lithographic equipment Download PDFInfo
- Publication number
- CN103744268B CN103744268B CN201310718341.8A CN201310718341A CN103744268B CN 103744268 B CN103744268 B CN 103744268B CN 201310718341 A CN201310718341 A CN 201310718341A CN 103744268 B CN103744268 B CN 103744268B
- Authority
- CN
- China
- Prior art keywords
- grating chi
- light source
- ruling
- lathe bed
- supports
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The present invention discloses a kind of high precision grating scale motherboard lithographic equipment, comprises lathe bed, light source, covers plate, ruling grating chi and gap adjusting structure; Lathe bed is provided with pair of parallel guide rail, and guide rail is provided with slide carriage, and light source is installed on slide carriage; Lathe bed is just provided with gap adjusting structure to the side of light source; Cover plate and ruling grating chi is installed on described clearance adjustment mechanism.Namely apparatus of the present invention ensure the homogeneity of optical energy irradiation, avoid again contact scuffing to cover plate.This device can make motherboard long service life, photoetching dividing precision high, is easy to mass production.On the basis of directional light photoetching scribing process, continue the making of the techniques such as development, baking, burn into post bake, detection; The grating scale motherboard precision produced can reach ± precision of 1 μm/m.
Description
Technical field:
The invention belongs to optical metrology components and parts and advanced manufacture neck field, particularly a kind of grating scale motherboard lithographic equipment.
Background technology:
Grating scale photoetching process is by a series of production stage, by the technique that the specific part of coated glass surface film removes; After this, coated glass surface can leave the film with micrographics structure; By photo-etching technological process, what finally retain on coated glass is feature pattern part.Need in photoetching process to use to cover plate, domestic most producer adopts contact photolithography mode at present, covers that plate in use easily scratches, the life-span is short, and process reliability is low.
Summary of the invention:
The object of the invention is to, a kind of high precision grating scale motherboard lithographic equipment is provided, overcome original contact transmissive glass grating motherboard delineation life-span short, the shortcoming of delineation less stable.
To achieve these goals, the present invention adopts following technical scheme:
A kind of high precision grating scale motherboard lithographic equipment, comprises lathe bed, light source, covers plate, ruling grating chi and gap adjusting structure; Lathe bed is provided with pair of parallel guide rail, and guide rail is provided with slide carriage, and light source is installed on slide carriage; Lathe bed is just provided with gap adjusting structure to the side of light source; Cover plate and ruling grating chi is installed on described clearance adjustment mechanism.
The present invention further improves and is: described gap adjusting structure comprises the pair of supporting that is fixed on lathe bed and covers plate for a pair and supports; Bracing frame is H-shaped, and two bracing frames are arranged in parallel; Cover plate and support to L shape, cover plate supports parallel for two and be arranged in outside pair of supporting.
The present invention further improves and is: described gap adjusting structure also comprises ruling grating chi and supports; A U-shaped portion is formed at bracing frame top, and the both sides difference frame that ruling grating chi supports is in the U-shaped portion of pair of supporting.
The present invention further improves and is: the both sides of U-shaped portion are separately installed with the first closely-pitched adjustment screw rod and the second closely-pitched adjustment screw rod, and the bottom of U-shaped portion is provided with the 3rd closely-pitched adjustment screw rod; Ruling grating chi supports in tabular and perpendicular to the emergent light direction of light source, ruling grating chi supports top and is provided with a cuboid gap towards light source side, and ruling grating chi is installed in described cuboid gap, covers plate and supports to be provided with and cover plate.
The present invention further improves and is: the first closely-pitched adjustment screw rod and the second closely-pitched adjustment screw rod end support the front side and rear side that support at ruling grating chi, respectively for regulating the gap covered between plate and ruling grating chi and tilting; The end of the 3rd closely-pitched adjustment screw rod supports the bottom side supported at ruling grating chi, for adjusting tilted upward.
The present invention further improves and is: described lathe bed is natural granite lathe bed.
The present invention further improves and is: described light source is the lamp box of band cooling device.
The present invention further improves and is: described in cover between plate and ruling grating chi there is gap, this gap is 2 μm ~ 100 μm.
Relative to prior art, the present invention has following beneficial effect: the present invention adopts natural granite lathe bed, plays good function of shock insulation; To adopt with the high-pressure sodium lamp lamp box of cooling device as light source, well heat is taken away, reduce the temperature rise that heat brings; Guide rail can move in the direction of delineation chi base by energizes high-pressure mercury lamp; Fine setting screw rod adopts fine thread, ensures the Adjustment precision of micron, and the fine setting screw rod of both direction, ensure that level, vertical, the adjustability that tilts.It is that micron interstitial is adjustable that proximity covers plate with being carved grating scale gap; Avoid the contact covered plate and be scored between grating motherboard, reduce the process procedure that contact cut etc. affects grating scale quality, make motherboard long service life, photoetching dividing precision high, be easy to mass production.Cover grid apart from exchanging, scope is pitch can be 2 μm, 4 μm, 8 μm, 10 μm, 20 μm, 40 μm, 100 μm.
Namely apparatus of the present invention ensure the homogeneity of optical energy irradiation, avoid again contact scuffing to cover plate.This device can make motherboard long service life, photoetching dividing precision high, is easy to mass production.On the basis of directional light photoetching scribing process, continue the making of the techniques such as development, baking, burn into post bake, detection.The grating scale motherboard precision produced can reach ± precision of 1 μm/m.
Accompanying drawing explanation
Accompanying drawing 1 is the principle schematic of proximity lithography.
Accompanying drawing 2 is the structural representation of a kind of high precision grating scale of the present invention motherboard lithographic equipment;
Accompanying drawing 3 is the schematic diagram of gap adjusting structure of the present invention.
Embodiment
Below in conjunction with drawings and Examples, the present invention is described in further detail:
Refer to shown in Fig. 1, in proximity lithography, cover plate 2 and be scored grating scale base 3 and be arranged in parallel, and gap 4 needs to ensure at micron order; Cover the reflection horizon 6 that plate 2 comprises hyaline layer 5 and is arranged on hyaline layer 5; During photoetching, source of parallel light 1 vertical irradiation of certain wavelength is covering plate 2, when ensureing the homogeneity of optical energy irradiation, completes directional light scribing process.
Refer to shown in Fig. 2 and Fig. 3, a kind of high precision grating scale of the present invention motherboard lithographic equipment, comprise natural granite lathe bed 7, light source, cover plate 17, ruling grating chi 18 and gap adjusting structure.
Natural granite lathe bed 7 is provided with pair of parallel guide rail 8, closed slide 8 is provided with slide carriage 9, and light source is installed on slide carriage 9; In the present embodiment, light source is preferably the lamp box 10 of band cooling device, and the emergent light direction of the lamp box 10 of band cooling device is perpendicular to guide rail 8.
Natural granite lathe bed 7 is just provided with gap adjusting structure to the side of the lamp box 10 of band cooling device; Gap adjusting structure comprises the pair of supporting 5 that is fixed on natural granite lathe bed 7 and covers plate for a pair and supports 16; Bracing frame 5 is in H-shaped, and two bracing frames 5 are arranged in parallel.Cover plate and support 16 one-tenth L shapes, cover plate support 16 for two and be arranged in parallel in outside pair of supporting 5.
A U-shaped portion is formed at bracing frame 5 top, supports 12 for supporting ruling grating chi; The both sides of U-shaped portion are separately installed with the first closely-pitched adjustment screw rod 11 and the second closely-pitched adjustment screw rod 13, and the bottom of U-shaped portion is provided with the 3rd closely-pitched adjustment screw rod 14.Ruling grating chi supports the both sides difference frame of 12 in the U-shaped portion of pair of supporting 5; The emergent light direction of the lamp box 10 of ruling grating chi support 12 in tabular and perpendicular to band cooling device, ruling grating chi supports 12 tops and is provided with a cuboid gap towards light source side, for placing ruling grating chi 18.Covering plate support 16 to be provided with for placing the breach covering plate 17, covering plate 17 and being arranged in this breach.First closely-pitched adjustment screw rod 11 and the second closely-pitched adjustment screw rod 13 end support the front side and the rear side that to support 12 at ruling grating chi respectively, for regulating the gap covered between plate 17 and ruling grating chi 18 and tilting; The end of the 3rd closely-pitched adjustment screw rod 14 supports in the bottom side of ruling grating chi support 12, for adjusting tilted upward.
The present invention adopts natural granite lathe bed, plays good function of shock insulation; To adopt with the high-pressure sodium lamp lamp box of cooling device as light source, well heat is taken away, reduce the temperature rise that heat brings; Guide rail can move in the direction of delineation chi base by energizes high-pressure mercury lamp; Fine setting screw rod adopts fine thread, ensures the Adjustment precision of micron, and the fine setting screw rod of both direction, ensure that level, vertical, the adjustability that tilts.
It is that micron interstitial is adjustable that proximity covers plate with being carved grating scale gap; Avoid the contact covered plate and be scored between grating motherboard, reduce the process procedure that contact cut etc. affects grating scale quality, make motherboard long service life, photoetching dividing precision high, be easy to mass production.Cover grid apart from exchanging, scope is pitch can be 2 μm, 4 μm, 8 μm, 10 μm, 20 μm, 40 μm, 100 μm.
Namely apparatus of the present invention ensure the homogeneity of optical energy irradiation, avoid again contact scuffing to cover plate.This device can make motherboard long service life, photoetching dividing precision high, is easy to mass production.On the basis of directional light photoetching scribing process, continue the making of the techniques such as development, baking, burn into post bake, detection.The grating scale motherboard precision produced can reach ± precision of 1 μm/m.
Claims (4)
1. a high precision grating scale motherboard lithographic equipment, is characterized in that, comprises lathe bed, light source, cover plate (17), ruling grating chi (18) and gap adjusting structure;
Lathe bed is provided with pair of parallel guide rail (8), guide rail (8) is provided with slide carriage (9), and light source is installed on slide carriage (9);
Lathe bed is just provided with gap adjusting structure to the side of light source; Cover plate (17) and ruling grating chi (18) is installed on described clearance adjustment mechanism;
Described gap adjusting structure comprises the pair of supporting (5) that is fixed on lathe bed and covers plate for a pair and supports (16); Bracing frame (5) is in H-shaped, and two bracing frames (5) are arranged in parallel; Cover plate and support (16) one-tenth L shape, cover plate support (16) for two and be arranged in parallel in pair of supporting (5) outside;
Described gap adjusting structure also comprises ruling grating chi and supports (12); A U-shaped portion is formed at bracing frame (5) top, and ruling grating chi supports the both sides difference frame of (12) in the U-shaped portion of pair of supporting 5;
The both sides of U-shaped portion are separately installed with the first closely-pitched adjustment screw rod (11) and the second closely-pitched adjustment screw rod (13), and the bottom of U-shaped portion is provided with the 3rd closely-pitched adjustment screw rod (14); Ruling grating chi supports (12) in tabular and perpendicular to the emergent light direction of light source, ruling grating chi supports (12) top and is provided with a cuboid gap towards light source side, ruling grating chi (18) is installed in described cuboid gap, covers plate and supports (16) be provided with and cover plate (17);
First closely-pitched adjustment screw rod (11) and the second closely-pitched adjustment screw rod (13) end support respectively and support the front side of (12) and rear side at ruling grating chi, the gap covered between plate (17) and ruling grating chi (18) for adjustment and tilting; The end of the 3rd closely-pitched adjustment screw rod (14) supports the bottom side supporting (12) at ruling grating chi, for adjusting tilted upward.
2. a kind of high precision grating scale motherboard lithographic equipment according to claim 1, it is characterized in that, described lathe bed is natural granite lathe bed (7).
3. a kind of high precision grating scale motherboard lithographic equipment according to claim 1, is characterized in that, described light source is the lamp box (10) of band cooling device.
4. a kind of high precision grating scale motherboard lithographic equipment according to claim 1, is characterized in that, described in cover between plate (17) and ruling grating chi (18) there is gap, this gap is 2 μm ~ 100 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310718341.8A CN103744268B (en) | 2013-12-23 | 2013-12-23 | A kind of high precision grating scale motherboard lithographic equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310718341.8A CN103744268B (en) | 2013-12-23 | 2013-12-23 | A kind of high precision grating scale motherboard lithographic equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103744268A CN103744268A (en) | 2014-04-23 |
| CN103744268B true CN103744268B (en) | 2015-12-09 |
Family
ID=50501298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310718341.8A Expired - Fee Related CN103744268B (en) | 2013-12-23 | 2013-12-23 | A kind of high precision grating scale motherboard lithographic equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103744268B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104390596B (en) * | 2014-11-12 | 2017-01-25 | 广东工业大学 | Portable grating ruler main ruler engraving device and engraving method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101706592A (en) * | 2009-12-02 | 2010-05-12 | 南昌大学 | Method for manufacturing Moire grating by directly copying metal mother set |
| CN102566260A (en) * | 2011-12-30 | 2012-07-11 | 西安交通大学 | Method for rapidly processing graphical surface of ultralong grating ruler rolling die |
| CN102759855A (en) * | 2012-07-17 | 2012-10-31 | 西安交通大学 | Single code channel absolute grating scale rolling and impressing mould manufacturing method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006049538A (en) * | 2004-08-04 | 2006-02-16 | Canon Inc | Near field exposure mask and unit and method for controlling adhesion thereof |
-
2013
- 2013-12-23 CN CN201310718341.8A patent/CN103744268B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101706592A (en) * | 2009-12-02 | 2010-05-12 | 南昌大学 | Method for manufacturing Moire grating by directly copying metal mother set |
| CN102566260A (en) * | 2011-12-30 | 2012-07-11 | 西安交通大学 | Method for rapidly processing graphical surface of ultralong grating ruler rolling die |
| CN102759855A (en) * | 2012-07-17 | 2012-10-31 | 西安交通大学 | Single code channel absolute grating scale rolling and impressing mould manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103744268A (en) | 2014-04-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10639821B2 (en) | Ultraviolet curing device, sealant curing system and sealant curing method | |
| CN104375388A (en) | Multi-workpiece table direct-writing photoetching system | |
| CN103744268B (en) | A kind of high precision grating scale motherboard lithographic equipment | |
| CN102081262A (en) | Ultraviolet irradiation device | |
| CN105522278A (en) | Glass-base-assisted mechanical scribing device and method for laser light-transmitting grating blank | |
| CN103885298A (en) | Exposure device and exposure system | |
| CN203241563U (en) | Polarization component unit and polarized light irradiation device | |
| CN203018296U (en) | Ultraviolet (UV) curing machine | |
| TWI401541B (en) | Laser interference lithography apparatus capable of stitching small exposed areas into large exposed area | |
| CN105606488B (en) | The manoscopy system and its measurement method easily adjusted | |
| CN104483813A (en) | Exposure machine light source transformation method and UVLED light source mechanism | |
| CN206757986U (en) | A kind of Experiment of College Physics combination mirror assembly | |
| CN204479187U (en) | Based on the collimated light beam detector of two pentaprism | |
| CN210011335U (en) | Projection arrangement of photocuring 3D printer | |
| CN203858771U (en) | Projection amplifying device for multimedia teaching of English | |
| CN104916198A (en) | Self-focusing lens light-concentrating principle simulation demonstration device and experimental method | |
| CN205138322U (en) | Interior red utensil of taking aim at that light source stability adjusted | |
| CN208109009U (en) | A kind of laser Lidar projective measuring instrument integrated device | |
| CN111856703A (en) | Device for adjusting light beam height | |
| CN205404084U (en) | Light path testing arrangement | |
| CN218561279U (en) | Optical glass former unloader that blanking quality is high | |
| CN204203631U (en) | The cooling device of exposure machine glass exposure table top | |
| CN204382825U (en) | The dynamic focusing mirror holder of laser marking machine | |
| CN202057873U (en) | Optical reflector of projector | |
| CN203621732U (en) | Optical-path-fixed laser engraving machine with radio-frequency tube |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20151209 Termination date: 20191223 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |