TWI480601B - Color filter production line, production line control system, production line control method - Google Patents

Description

Color filter production line, production line control system, production line control method

The present invention relates to a color filter production line for manufacturing a color filter used in a liquid crystal display device or the like, a production line control system for controlling the production line, and a production line control method.

As a method of manufacturing a color filter used in a liquid crystal display device, a method of forming a color pattern of a plurality of colors on a glass substrate by a photolithography method is generally used. For example, in the case of manufacturing a color filter provided with a black matrix (black) and a color pattern of four colors of red, green, and blue, a series of color pattern formation is repeated for each of black, red, green, and blue colors. The treatment includes a process of cleaning the substrate, applying a coloring material to the substrate, and exposing, developing, and post-baking using the photomask. Further, in the case of manufacturing a color filter provided with a black matrix (black) and a color pattern of five colors of red, green, blue, and yellow, the above-described colors of black, red, green, blue, and yellow are repeatedly repeated. The colored pattern forming process.

Fig. 10 is a schematic view showing a conventional color filter production line, and Fig. 11 is a block diagram showing a part of the color filter production line shown in Fig. 10.

In order to perform the above-described coloring pattern forming process for each color, four processings for forming the coloring patterns of four colors of black, red, green, and blue are arranged in series in the conventional color filter production line shown in FIG. Production lines 92a to 92d.

The processing line 92a is, for example, a pattern for generating a black matrix, and includes a loading device LD that carries the substrate supplied from the storage device 91, a cleaning device 93, a coating device 94, an exposure device 95, a developing device 96, a baking device 97, and The substrate is carried out to the unloading device ULD of the storage device 91. These devices are connected by transporting devices 81 to 86 that transport substrates. Further, an inspection device 98 for inspecting a film thickness or a coating uneven line is provided downstream of the coating device 94, and an inspection device 99 for inspecting the pattern formed by the inspection device 96 is provided downstream of the developing device 96. Further, the transport device 86 is connected to an extraction inspection device 70 for performing substrate extraction inspection and a repair device 71 for repairing the substrate.

Inside the storage device 91, the substrate is stored in a state of being stored in a cassette. The loading device LD takes out the substrate from the magazine received from the storage device 91 and supplies it to the conveying device 81. The supplied substrate is transported and cleaned by the transport device 81 to the cleaning device 93, and then transported by the transport device 82 to the coating device 94, and the photoresist device containing the black colored material is applied by the coating device 94. The substrate to which the photoresist is applied is inspected by the inspection device 98, transported by the transport device 83 to the exposure device 95, and exposed by the exposure device 95 using a photomask. After the exposed substrate is transported to the developing device 96 by the transport device 84 and developed, the substrate is inspected by the inspection device 99 during the transport by the transport device 85. The substrate that has been checked for no abnormality is post-baked by the baking device 97, and is transported by the transport device 86 to the unloading device ULD. The unloading device ULD accommodates the received substrate in the magazine and carries the magazine out to the storage device 91.

Although each device operates under a certain degree of compliance (tact), there is a case where the substrate is stuck in the production line due to an increase in processing time caused by a trouble or irregular processing of the device. . Therefore, a buffer device (not shown) for temporarily storing the retained substrate is provided in the transport device that is predicted to remain in advance. The cushioning device generally has a multi-stage scaffolding structure, and has a function of storing a plurality of substrates according to control by the control device and discharging the stored substrates onto the transport path. By appropriately arranging the buffer device in the production line, the retention of the substrate can be alleviated, and the operational efficiency of each processing device can be improved.

Further, the other processing lines 92b to 92d are also constituted by the same processing apparatus, conveying apparatus, and inspection apparatus as those included in the processing line 92a.

The substrate on which the black matrix pattern is produced by the processing line 92a is supplied to the downstream processing line 92b while being accommodated in the magazine, and a red colored pattern is formed by the processing line 92b. Thereafter, the coloring patterns of four colors are formed on the substrate via the processing of the processing lines 92c and 92d in the same manner.

[Previous Technical Literature] [Patent Literature]

[Patent Document 1] JP-A-2004-109968

[Patent Document 2] JP-A-2008-108878

[Patent Document 3] JP-A-2004-103947

In the conventional color filter production line described above, since the processing line for the color number of the formed color pattern is required, there is a problem that the space required for the installation of the production line becomes large. In recent years, since the size of the glass substrate has increased in size, the space required for the installation of the above-described production line has become larger as the size of the substrate has increased, and the cost required for manufacturing equipment has increased.

Further, in the color filter production line, each processing device (each device for cleaning, coating, exposing, developing, and baking) and the inspection device constituting the processing line, and the conveying device connecting the devices need to be adapted only to the coloring pattern. The number of chromatic numbers. Therefore, the increased number of devices required also leads to an increase in the cost of manufacturing equipment.

Further, in addition to such a problem, in the case of providing a buffer device, there are the following problems.

In a color filter production line including a buffer device, there is a possibility that a substrate that has been stored in the buffer device for a long period of time or a substrate that is stored in the transport path without being accommodated in the buffer device may occur. However, the processing time from the start to the end of the formation of the colored pattern is long, which is not preferable in terms of quality.

Further, instead of providing a coloring pattern forming line for each color, a processing device and a conveying device that perform processing for each process are shared in one production line when two or more coloring patterns are formed, and a plurality of branches and confluences exist on the conveying path. In the production line of the form (for example, refer to Patent Document 3), there is a problem that buffering itself is not easy. In other words, when a plurality of processing apparatuses and a single conveying apparatus are shared by a plurality of substrates having different states during processing, the retention of the substrate caused by the failure of the colored pattern forming process of a certain color is also the coloring pattern of the other colors. Since the formation process has an influence, it is difficult to simply absorb the retention of the substrate by the buffer device alone.

Accordingly, it is an object of the present invention to provide a color filter production line that can reduce the installation space and the number of devices required.

Further, another object of the present invention is to provide a production line control system and a production line control method which share a color filter production line in the form of a processing device and a transfer device when forming a color pattern of a plurality of colors, even in a color pattern of a certain color. In the case where the device for forming is broken, the coloring pattern forming process of other colors can be continued.

Further, another object of the present invention is to provide a color filter production line which shares a processing device and a conveying device while forming a coloring pattern of a plurality of colors, and even when a device for forming a color pattern of a certain color fails. It is also possible to continue the coloring pattern forming process of other colors.

The present invention relates to a color filter production line for sequentially forming a color pattern of at least four colors on a substrate, comprising: a storage device for storing a substrate; and a coloring pattern forming production line, comprising: a plurality of processing devices for performing light The processing of each process of the lithography method is arranged in parallel, and a plurality of transfer devices are connected between the processing devices, and the substrate is transported to a predetermined processing device according to the colored pattern formed on the substrate, and the photolithography method is used. In each process, at least one of the processing devices is shared when the two color patterns are formed; the loading device carries the substrate supplied from the storage device into the coloring pattern forming line; and the unloading device is discharged from the coloring pattern forming line. The substrate is carried out toward the storage device. The coloring pattern forming line passes the substrate repeatedly until a desired coloring pattern is formed on the substrate, and the substrate on which the desired coloring pattern has been formed is discharged to the unloading device.

The production line control system of the present invention is for controlling a color filter production line, which comprises a plurality of processing devices, a plurality of transfer devices connecting the processing devices, and a buffer device for temporarily storing a plurality of substrates, and when forming a color pattern of a plurality of colors The production line control system includes: monitoring information acquisition means, acquisition monitoring information, operation status of the monitoring information display processing device, the transportation device, and the buffer device; and operation control means for controlling the processing device and carrying The operation of the device and the buffer device and the monitoring means monitor the operation status of the monitoring target device based on the monitoring information notified from the monitoring information acquisition means, and instruct the operation control means to stop at least from the upstream side of the monitoring target device One device discharges the substrate and releases the stop.

Moreover, the production line control method of the present invention is for controlling a color filter production line, which comprises a plurality of processing devices, a plurality of transfer devices connecting the processing devices, and a buffer device for temporarily storing a plurality of substrates, and forming a plurality of colors. In the pattern, the processing device and the transport device are shared, and the line control method acquires the respective operating states of the processing device, the transport device, and the buffer device; monitors the operating status of each of the acquired devices, and determines whether or not to restrict the supply of the substrate to the monitoring target device; According to the determination result, at least one device on the upstream side of the monitoring target device stops the discharge of the substrate and releases the stop.

Moreover, the color filter production line of the present invention is for forming a plurality of colored patterns on a substrate, the color filter production line having: a processing device for performing processes of the photolithography method, and collectively forming a multi-color coloring pattern; a plurality of conveying devices connected to the processing device and used to form a plurality of colored patterns; a buffer device for temporarily storing a plurality of substrates; and a control device for controlling the respective processing devices, the handling devices, and the buffering Device. Each of the processing device, the transport device, and the buffer device includes a monitoring information acquisition unit that acquires monitoring information indicating an operation status, and an operation control unit that controls the operation based on an instruction from the control device. The control device monitors the operation status of the monitoring target device based on the monitoring information transmitted from the monitoring information acquisition unit, and instructs the operation control unit of at least one device on the upstream side of the monitoring target device to stop the discharge and release of the substrate.

In the color filter production line of the present invention, since one processing device is shared in the process of forming the two-color coloring pattern in each process, the color filter can be greatly reduced as compared with the case where the processing line is set for each color. The space required for the production line setup. Moreover, since the number of devices required can be reduced, the cost required to constitute a color filter production line can be reduced.

Moreover, according to the present invention, it is possible to realize a production line control system and a production line control method which share a color filter production line in the form of a processing device and a transfer device when forming a color pattern of a plurality of colors, by controlling the upstream of the device to be monitored The discharge of the substrate of the side device allows the coloring pattern forming process of the other colors to continue even if the device for forming a color pattern of a certain color fails.

Further, it is possible to realize a color filter production line that shares a processing device and a transfer device when forming a color pattern of a plurality of colors, and can cause other devices even if a device for forming a color pattern of a certain color fails. The color pattern forming process of the color continues.

(First embodiment)

Fig. 1 is a schematic view showing a part of a color filter production line according to a first embodiment of the present invention. In Fig. 1, only the processing lines for forming the color pattern of four colors by the photolithography method in the color filter process are shown. Further, the arrows in Fig. 1 indicate the connection relationship between the devices and the conveyance direction of the substrate.

The color filter production line of the present embodiment includes a storage device 109, a loading device LD, a carry-out device ULD, a coloring pattern forming line 121 that performs two color pattern forming processes in parallel, and buffer devices 122a and 122b.

The storage device 109 is a device for storing a plurality of magazines and a plurality of empty magazines for accommodating the glass substrate, and is equivalent to, for example, an automatic warehouse. The storage device 109 is provided with a transfer device for transferring a magazine, and supplies a magazine that accommodates the glass substrate to the loading device LD, and recovers the empty magazine from the loading device LD. Moreover, the storage device 109 supplies the empty magazine to the unloading device ULD, and collects the magazine in which the glass substrate is accommodated from the unloading device ULD.

The loading device LD takes out the unprocessed substrate from the magazine supplied from the storage device 109, and supplies the taken substrate to the conveying device 101a or 101b of the coloring pattern forming line 121.

The unloading device ULD accommodates the substrate discharged from the colored pattern forming line 121 in the magazine, and carries the magazine in which the substrate is stored to the storage device 109.

The coloring pattern forming line 121 includes a plurality of processing apparatuses which are provided in parallel in each process of the photolithography method, and a plurality of conveying apparatuses 101a to 108b. In the present embodiment, in order to perform the main processes (cleaning, coating, exposure, development, and baking) of the photolithography method, two processing apparatuses, that is, cleaning apparatuses 110a and 110b and a coating apparatus 111a are provided in each process. And 111b, exposure devices 112a and 112b, development devices 113a and 113b, and baking devices 114a and 114b.

Each processing device is a device that can appropriately switch and perform coloring pattern forming processing of two or more colors. For example, each of the coating apparatuses 111a and 111b includes at least two coating means for applying a photoresist to the surface of the substrate, and the coating mechanism to be used can be switched depending on the color of the colored pattern to be formed on the substrate, and the color phase can be separately applied. A different photoresist. Further, the exposure devices 112a and 112b are provided with switching means for switching the arrangement of the mask itself or the mask in accordance with the color of the colored pattern to be formed.

The transport apparatuses 101a to 108b are connected between the respective processing apparatuses, and the substrates that have been subjected to the processing by the respective processing apparatuses are transported to the next processing apparatus, the inspection apparatus, and the unloading apparatus ULD. The destination of the substrate is determined by the respective conveyance devices determining the next processing to be performed based on the color pattern on the substrate. In the first embodiment, the transporting devices (for example, the transporting devices 101a and 101b) provided for the respective processing devices and the transporting devices (for example, the transporting devices 103) shared by the processing devices of the same process are differently shown, but the transporting devices 101a are provided. The form of 108b is not particularly limited, and whether or not the conveying device is common can be arbitrarily used.

Further, in the present invention, although the order in which the color patterns of the respective colors are formed is not particularly limited, in order to simplify the description, in the examples described below, the order in which the color patterns are formed is in the order of black, red, green, and blue, and The cleaning device 110a, the coating device 111a, the exposure device 112a, the developing device 113a, and the baking device 114a (the device attached to the lower right oblique line) perform coloring pattern forming processing of two colors of black and red, and the cleaning device 110b and the coating device The device 111b, the exposure device 112b, the developing device 113b, and the baking device 114b (the device attached to the upper right oblique line) perform green and blue color pattern forming processing.

The buffer devices 122a and 122b are connected to the transport device 108a, and are devices that are temporarily stored on the transport path of the transport device 108a. The buffer devices 122a and 122b are buffering and parallelizing processing for adjusting the order or the number of substrates flowing in the colored pattern forming line 121, and the details thereof will be described later.

In addition to the above-described respective devices, inspection devices 115a and 115b for inspecting a film or coating unevenness are provided on a conveyance path between the coating devices 111a and 111b and the exposure devices 112a and 112b. Further, an inspection device 116 for inspecting the colored pattern line formed on the conveyance path between the baking devices 114a and 114b and the unloading device ULD is provided.

Further, the conveyance device 103 is connected to the extraction inspection device 117, which extracts and inspects a part of the substrate on which the photoresist has been applied, and returns the inspected substrate to the conveyance device 103. Similarly, the conveyance device 106 is connected to the extraction inspection device 118, which extracts and inspects a part of the substrate after the development process, returns the inspected substrate to the conveyance device 106, and connects the extraction inspection devices 119 and 120 to the conveyance device 108b. And extracting and inspecting a part of the substrate of the colored pattern in which all colors have been formed, and returning the inspected substrate to the conveying device 108b. Further, these inspection devices may be disposed at any position on the production line, or may be disposed at positions other than those shown in FIG.

Here, the coloring pattern forming process by the coloring pattern forming line 121 and the buffering and parallelizing processing using the buffering devices 122a and 122b will be described.

The coloring pattern forming line 121 circulates the substrate being processed until the coloring pattern of all four colors is formed on the substrate loaded by the loading device LD, and discharges the substrate on which the coloring patterns of all four colors are formed to the unloading device ULD.

In the present embodiment, whether or not the substrate processed by the baking devices 114a and 114b is further supplied to the processing device by the transport device 107 and the transport devices 108a and 108b. More specifically, the transport device 107 transports the substrate on which the two-color or three-color color pattern has been formed in the substrate that has been baked by the baking devices 114a and 114b to the transport device 108a, and is formed via the inspection device 116. The substrate of the one color or all four color patterns is transported to the transport device 108b. The transport device 108a transports the substrate transported from the transport device 107 to the transport device 101b. On the other hand, the conveyance device 108b conveys the substrate on which the color pattern of one color has been formed to the conveyance device 101a, and conveys the substrate on which the color patterns of all four colors are formed to the unloading device ULD. Moreover, the conveyance apparatuses 108a and 108b also convey the board|substrate which was judged as a defective item in the one inspection apparatus to the carry-out apparatus ULD.

The specific conveyance path until the color pattern of the first color to the fourth color is formed on the substrate loaded by the loading device LD is as follows.

<Coloring pattern forming process of the first color (black)>

The conveyance path of the substrate which is loaded into the conveyance device 101a by the loading device LD is as follows.

Handling path 1

Loading device LD-transporting device 101a-cleaning device 110a-transporting device 102a-coating device 111a-transporting device 103- (extraction inspection device 117-transporting device 103)-inspection device 115a-transporting device 104-exposure device 112a-transporting device 105 - Development device 113a - Transport device 106 - (Extraction inspection device 118 - Transport device 106) - Bake device 114a - Transport device 107 - Inspection device 116 - Transport device 108b - (Extraction inspection device 119 or Extraction inspection device 120 - Handling Device 108b) - handling device 101a

In the process of transporting the substrate on the transport path 1, the processing is applied to the substrate by each processing device, and a color pattern (black matrix) of the first color is formed on the surface of the substrate. The substrate on which the color pattern of the first color has been normally formed is transported to the transport device 101 again via the transport device 107 and the transport device 108b.

<Coloring pattern forming process of the second color (red)>

The conveyance path of the substrate loaded into the conveyance device 101a by the conveyance device 108b is as follows.

Handling path 2

Transport device 101a - Washing device 110a - Transport device 102a - Coating device 111a - Transport device 103 - (Extraction inspection device 117 - Transport device 103) - Inspection device 115a - Transport device 104 - Exposure device 112a - Transport device 105 - Imaging device 113a - conveying device 106 - (extraction inspection device 118 - conveying device 106) - baking device 114a - conveying device 107 - inspection device 116 - conveying device 108a - conveying device 101b.

In the process of transporting the substrate by the transport path 2, the processing is applied to the substrate by each processing device, and a color pattern of the second color (red) is formed on the surface of the substrate. The substrate on which the color pattern of the second color is normally formed is transported to the transport device 101b via the transport device 107 and the transport device 108a.

<Coloring pattern forming process of the third color (green)>

The conveyance path of the substrate loaded into the conveyance device 101b by the conveyance device 108a is as follows.

Handling path 3

Transport device 101b-cleaning device 110b-transport device 102b-coating device 111b-transport device 103- (extraction inspection device 117-transport device 103)-inspection device 115b-transport device 104-exposure device 112b-transport device 105-development device 113b - conveying device 106 - (extraction inspection device 118 - conveying device 106) - baking device 114b - conveying device 107 - conveying device 108a - conveying device 101b

In the process of transporting the substrate on the transport path 3, the processing is applied to the substrate by each processing device, and a color pattern of the third color (green) is formed on the surface of the substrate. The substrate on which the color pattern of the third color is normally formed is conveyed to the conveyance device 101b via the conveyance device 107 and the conveyance device 108a.

<Coloring pattern forming process of the fourth color (blue)>

The conveyance path of the substrate loaded into the conveyance device 101b by the conveyance device 108a is as follows.

Handling path 4

Transport device 101b-cleaning device 110b-transport device 102b-coating device 111b-transport device 103- (extraction inspection device 117-transport device 103)-inspection device 115b-transport device 104-exposure device 112b-transport device 105-development device 113b - conveying device 106 - (extraction inspection device 118 - conveying device 106) - baking device 114b - conveying device 107 - inspection device 116 - conveying device 108b (extracting inspection device 119 or extraction inspection device 120 - conveying device 108b) - moving out Device ULD.

In the process of transporting the substrate on the transport path 4, the processing is applied to the substrate by each processing device, and a fourth color (blue) colored pattern is formed on the surface of the substrate. The substrate on which the color pattern of the fourth color is normally formed is conveyed to the unloading device ULD via the conveyance device 107, the inspection device 116, and the conveyance device 108b.

Next, the "buffering and parallel processing" performed by the buffer devices 122a and 122b will be described.

In the case where the substrate is continuously circulated by the conveyance paths 1 to 4 as described above, since the various substrates in the processing state are present in the production line, it is preferable to appropriately control the conveyance state of the substrate. Therefore, in the color filter production line of the present embodiment, the buffer devices 122a and 122b for temporarily storing the substrate are provided along the conveyance path of the conveyance device 108a.

Fig. 2 is a schematic view of the buffer devices 122a and 122b shown in Fig. 1.

The buffer devices 122a and 122b are disposed along the conveyance path 123 of the conveyance device 108a, and each operation is controlled by a control device (not shown). The buffer device 122a stores a plurality of substrates in which the color patterns of the first color and the second color are formed in the substrate (dashed line) carried by the upstream device on the transport path 123, and the stored substrate is taken out and downstream. The device is discharged. Similarly, the buffer device 122b stores a substrate in which a plurality of color patterns of the first color to the third color are formed in the substrate on which the plurality of sheets are transported, and the stored substrate is taken out and discharged to the downstream device.

The coloring pattern forming line 121 stores the substrate in the buffer devices 122a and 122b and the substrate from the buffer devices 122a and 122b (hereinafter collectively referred to as "buffering"), and the third color is alternately supplied to the carrier device 101b. The substrate to be processed and the substrate requiring the treatment of the fourth color. In addition, the coloring pattern forming line 121 is controlled by buffering, and the supply interval of the substrate to be processed by the processing of the third color and the supply interval of the substrate to the conveying device 101b requiring the fourth color are controlled. More than the established time. Further, the colored pattern forming line 121 passes through the apparatus in which the substrate conveyed by the conveying device 107 is connected downstream without requiring buffering.

Fig. 3 is a flow chart showing the control process of the buffer device 122a shown in Fig. 2. Further, the buffer device 122a is a dedicated device for forming a substrate of a color pattern of the second color or the third color.

Hereinafter, for convenience of explanation, the substrate on which the color patterns of the first color and the second color are formed is referred to as a "two-color forming substrate", and the substrate on which the color patterns of the first color to the third color are formed is referred to as "3. Color forming a substrate".

In step S101, it is determined whether or not the substrate has been carried by the upstream device. When the substrate has been transported by the upstream device (Yes in step S101), the control of the buffer device 122a proceeds to step S102, and otherwise (NO in step S101), the process proceeds to step S112.

In step S102, it is determined whether or not the substrate to be transferred is a three-color forming substrate. When the substrate to be transferred is a three-color forming substrate (Yes in step S102), the control proceeds to step S103, and otherwise (NO in step S102), the process proceeds to step S109.

In step S103, it is determined whether or not the substrate (the substrate that has passed through the buffer device 122a or the substrate that is discharged from the buffer device 122a) that was transported to the downstream device is the two-color forming substrate. When the substrate transported to the downstream device is the two-color forming substrate (Yes in step S103), the control proceeds to step S104, and otherwise (NO in step S103), the process proceeds to step S106.

The substrate that was transported to the downstream device in the process of step S104 is a two-color forming substrate, and three colors are formed from the upstream device to form a substrate. In step S104, the buffer device 122a directly passes the loaded substrate, and control is passed to step S105.

In step S105, when the substrate moved from the upstream device is continuously monitored (No in step S105), the process returns to step S101, and otherwise (Yes in step S105), the control process ends.

The substrate that has been transported to the downstream device under the control of step S106 is a three-color forming substrate, and three colors are formed from the upstream device to form a substrate. In step S106, it is determined whether or not the two-color forming substrate is stored in the buffer device 122a. When the two-color forming substrate is stored in the buffer device 122a (Yes in step S106), the control proceeds to step S107, and otherwise (NO in step S106), the process proceeds to step S108.

In step S107, the buffer device 122a discharges the stored two-color forming substrate to the downstream device earlier than the three-color forming substrate that is transported from the upstream. As a result, the discharged two-color forming substrate is inserted between the three-color forming substrate that has been transported and the three-color forming substrate that has been transported from the upstream, and the two-color forming substrate and the three-color forming substrate are alternately supplied downstream. . Then, control is passed to step S105.

In step S108, the buffer device 122a directly passes the transferred substrate, and the process proceeds to step S105.

When the control of step S109 is performed, the substrate is formed by two colors from the upstream device. In step S109, it is determined whether or not the predetermined fixed time has elapsed since the second color formation of the substrate was ejected. When the fixed time has elapsed (Yes in step S109), the control proceeds to step S110, and otherwise (NO in step S109), the process proceeds to step S111.

In step S110, the buffer device 122a directly passes the loaded substrate, and the process proceeds to step S105.

In step S111, the buffer device 122a stores the two-color forming substrate that has been transported from the upstream, and the process proceeds to step S105.

The control of step S112 is performed while the substrate is not being transported from the upstream device. In step S112, it is determined whether or not the two color forming substrates are stored in the buffer device 122a. When the two-color forming substrate is stored in the buffer device 122a (Yes in step S112), the control proceeds to step S113, and otherwise (NO in step S112), the processing returns to step S101.

In step S113, it is determined whether or not the predetermined fixed time has elapsed since the second color formation of the substrate was ejected. When the fixed time has elapsed (Yes in step S113), the control proceeds to step S114, and otherwise (NO in step S113), the process returns to step S101.

In step S114, the buffer device 122a discharges the stored two-color forming substrate to the downstream device. Then, control is passed to step S105.

Further, the control flow of the buffer device 122b (the buffer device for three color forming substrates) shown in Fig. 2 corresponds to the interchange of the two color forming substrate and the three color forming substrate in the control flow of Fig. 3 . Therefore, the description is omitted here.

The coloring pattern forming line 121 supplies the two-color forming substrate and the three-color forming substrate alternately to the conveying device 101b in accordance with the above-described control, and sets the insertion interval of the same type of substrate to a fixed time or longer. As a result, the flow balance of the respective color substrates in the production line can be prevented, and the balance of the number of substrates in the process in which the state is different during processing can be prevented, and the substrate can be circulated. Further, in the processing apparatus, when the color pattern forming process of the same color continues, there is a device in which the processing cycle becomes slow. For example, since the coating devices 111a and 111b require a preparation operation for applying a photoresist to one substrate at a time, in the case where the same color photoresist is continuously applied by one coating device, the cycle only increases the time required for the preparation work. Therefore, by alternately supplying the two-color forming substrate and the three-color forming substrate to the coating device 111b as in the present embodiment, the processing of the same color can be prevented from being continuous, and the delay in processing can be prevented.

Further, the processing device (cleaning device 110a, coating device 111a, exposure device 112a, developing device 113a, and baking device 114a) common to the processing of the first color and the second color, the loading device LD is supplied in a fixed cycle. The processed substrate and the transport device 108b insert the substrate on which the color pattern of the first color has been formed between the continuous unprocessed substrates. By performing such conveyance control, as in the case of the in-line processing using the buffer devices 122a and 122b, the substrate requiring the processing of the first color and the processing requiring the second color are alternately supplied to the respective processing devices at regular intervals. The substrate can prevent an increase in the processing cycle caused by the continuous processing of the same color.

As described above, in the color filter production line of the present embodiment, the coloring pattern forming line 121 is formed by the processing device of the two systems operating in parallel, and the substrate is circulated in the production line, thereby forming a color pattern of four colors. According to the configuration of the production line and the conveyance control, the space required for the arrangement of the color filter production line can be greatly reduced as compared with the case where the processing line is set for each color. Further, in a device such as a coating device or an exposure device, it is necessary to switch the material to be used or the mask to be used in order to use the color pattern of two colors in combination, but since the number of devices required can be reduced by itself, Therefore, the cost of constituting the color filter production line can be reduced.

Further, in the present embodiment, it is described that in each process, the coloring pattern of the first color and the second color is formed in one processing device (the device is attached to the lower right oblique line), and the other processing device is attached. The device of the oblique line to the upper right is an example in which the color pattern of the third color and the fourth color is formed. However, the assignment of the color of each processing device is not limited to this example. For example, the coloring pattern of the first color and the third color may be formed by a processing device that is attached to the lower right oblique line, and the coloring pattern of the second color and the fourth color may be formed by adding a processing device to the upper right oblique line. The processing device of one of the processes is assigned an arbitrary two colors, and the other processing device is assigned the remaining two colors. In this case, regardless of the assignment of the colors of the processing device, in order to form the color pattern in the order of the first color to the fourth color, each of the transport devices distributes the destination of the substrate, whereby the above-described embodiment can be provided. The same effect as the color filter production line described.

(Second embodiment)

Fig. 4 is a schematic view showing a part of a color filter production line according to a second embodiment of the present invention.

In the color filter production line of the present embodiment and the first embodiment, the three exposure devices 112a to 112c which are processing devices for performing the exposure process are provided on the coloring pattern forming line 121.

In this case, by assigning different colors to the respective units of the three exposure devices 112a to 112c, the photoresist of the three colors can be exposed in parallel, and the manufacturing efficiency of the color filter can be improved. For example, the substrate coated with the photoresist of the first color (black matrix) can be exposed by the exposure device 112a, and the photoresist of the second color and the third color (red and green) can be applied by the exposure device 112b. The substrate is exposed to light, and the substrate on which the photoresist of the fourth color (blue) has been applied is exposed by the exposure device 112c. Alternatively, any one of the exposure devices 112a to 112c may be used as a preliminary device. Which of the exposure device transporting devices 104 to be ejected from the inspection devices 115a and 115b is determined in accordance with the color pattern on the substrate to be transported.

In the example of Fig. 4, the configuration example of the coloring pattern forming line 121 in which only three exposure apparatuses are provided is shown, but the number of processing apparatuses which are some or all of the processes of cleaning, coating, development, and baking may be employed. Set to 3 units. However, since the number of processing units and the cost of the color filter production line increase each time the number of processing devices increases, it is preferable to increase the number of processing devices for which the cycle length is long, and to process the processing device with a relatively short cycle as much as possible. less.

In the present embodiment, since the coloring pattern forming line 121 circulates the substrate until the coloring patterns of all the four colors are formed, it is possible to reduce the number of processing apparatuses required compared with the conventional production line for the color setting processing apparatuses. number. Therefore, in the color filter production line of the present embodiment, as in the case of the first embodiment, the space required for the arrangement of the color filter production line can be greatly reduced as compared with the case where the processing line is provided for each color. Reduce the cost of forming a color filter production line.

Further, in the above embodiments, the examples in which the colored patterns are formed in the order of black, red, green, and blue are described, but the order in which these colors are formed may be arbitrary.

Further, in the above-described respective embodiments, the buffer devices 122a and 122b are provided in the transport device 108a, but the buffer device may be provided in any other transport device.

Further, in each of the above-described embodiments, a color filter production line having two or three processing devices in each of the photolithography methods will be described, but a preliminary processing device may be further provided. When the original processing apparatus is replaced instead of the original processing apparatus, the transportation path of each transport apparatus may be appropriately switched.

Further, in each of the above-described embodiments, an example of manufacturing a color filter having a color pattern of four colors of black, red, green, and blue on a substrate will be described. However, the color filter production line of each of the embodiments may be used. It is applied to the production of a color filter having a color pattern of 5 or more colors on a substrate. In this case, it is also possible to form a coloring pattern of two or more colors in at least one processing device in the coloring pattern forming line, and to form a substrate in the coloring pattern forming line until the coloring pattern of the desired color number is formed on the substrate. The internal circulation may discharge the substrate on which the desired color pattern is formed to the carry-out device.

Further, in the case where a color pattern of five colors of black matrix (black), red, green, blue, and yellow is formed on the substrate, other devices may form only a black matrix, and the color filters of the above embodiments may be used. The production line forms a color pattern of four colors of red, green, blue, and yellow.

(Third embodiment)

Fig. 5 is a schematic view showing a part of a color filter production line according to a third embodiment of the present invention. In Fig. 5, only a processing line for forming a color pattern of four colors by photolithography in the color filter process is shown. Further, the arrows in Fig. 5 indicate the connection relationship between the devices and the conveyance direction of the substrate.

In the color filter production line 201 of the present embodiment, a color pattern of a plurality of colors is formed on a substrate by photolithography, and two or more color patterns are formed in parallel for each process so that two or more color patterns can be formed in parallel. Station processing unit.

More specifically, the color filter production line 201 includes a storage device 202, loading devices 203a and 203b, cleaning devices 204a and 204b, coating devices 205a and 205b, exposure devices 206a to 206c, development devices 207a to 207c, and baking devices. 208a to 208c, carry-out devices 209a to 209c, and transfer devices 211 to 216 and buffer devices 221 to 224 to which the devices are connected. Further, in the rear stage of the coating devices 205a and 205b and the developing devices 207a to 207c In the latter stage, the inspection devices 217 and 218 on the line are set. Further, the inspection device 219 and the repair device 220 are connected to the transport device 216.

The storage device 202 is a device that stores a plurality of magazines and a plurality of empty magazines that house the glass substrate, and is equivalent to, for example, an automatic warehouse. The storage device 202 is provided with a transfer device for transferring a magazine, and supplies the magazine containing the glass substrate to the loading devices 203a and 203b, and recovers the empty magazine from the loading devices 203a and 203b. Further, the storage device 202 supplies the empty magazines to the unloading devices 209a to 209c, and collects the magazines containing the glass substrates from the unloading devices 209a to 209c.

The loading devices 203a and 203b take out the unprocessed substrate from the magazine supplied from the storage device 202, and supply the taken substrate to the conveying device 211.

The cleaning devices 204a and 204b, the coating devices 205a and 205b, the exposure devices 206a to 206c, the development devices 207a to 207c, the baking devices 208a to 208c, and the unloading devices 209a to 209c are subjected to photolithography cleaning, coating, exposure, and A device for processing each of the development and post-baking processes (hereinafter, the respective devices are not distinguished from each other and are simply referred to as "processing devices"). Each processing device is a device that can appropriately switch and perform coloring pattern forming processing of two or more colors. For example, each of the coating devices 205a and 205b is provided with at least two coating means for applying a photoresist to the surface of the substrate, and the coating mechanism to be used can be switched depending on the color of the colored pattern to be formed on the substrate, and the color can be separately applied. Different photoresists. Further, the exposure devices 206a to 206c are provided with switching means for switching the arrangement of the mask itself or the mask in accordance with the color of the colored pattern to be formed.

For each processing device, a color pattern forming process of an arbitrary color can be assigned. As an example, black (black matrix) and red coloring pattern forming processing may be performed in the cleaning device 204a and the coating device 205a, and green and blue coloring pattern forming processing may be performed in the cleaning device 204b and the coating device 205b. Further, when three processing devices (for example, exposure devices 206a to 206c) are provided in one process, one device may be prepared, or the black color pattern forming process may be performed by the exposure device 206a, and red and green may be performed by the exposure device 206b. In the color pattern forming process, the blue coloring pattern forming process or the like is performed by the exposure device 206c, and the four color processes are appropriately distributed and fed to three processing devices.

The transporting devices 211 to 216 are connected to the respective processing devices, and the respective processing devices are used to transport the substrates that have been processed by the respective processing devices to the subsequent processing devices, the inspection devices, and the unloading devices 209a to 209c. The destination of the substrate is determined by the respective conveyance devices determining the next processing to be performed based on the color pattern on the substrate. The conveyance device 216 conveys the substrate and the defective product in which all of the four color patterns are formed in the substrates discharged from the baking devices 208a to 208c to the carry-out devices 209a to 209c, and transports the other substrates to the transfer device 211. By performing such conveyance control, the coloring pattern of each color is sequentially formed while the substrate is circulated in the production line until all of the four color patterns are formed on the substrate.

The carry-out devices 209a to 209c store the substrates discharged by the transport device 216 in the magazine, and carry the magazine in which the substrates are stored to the storage device 202.

The buffer devices 221, 222, 223, and 224 are connected to the transport devices 212, 213, and 215, respectively, and are devices that temporarily store the substrates that are transported on the transport path. The buffer devices 221 to 224 are provided to absorb the variation in the processing cycle of each processing device or the retention of the substrate flowing in the production line, and to improve the operational efficiency of the entire production line.

Fig. 6 is a block diagram showing the configuration of a line control system according to a third embodiment of the present invention.

The line control system 230 is composed of a control device 231 and a plurality of in-line devices 232a to 232n that are connected via a network to be bidirectionally communicable with the control device 231. The in-line devices 232a to 232n do not distinguish each device (processing device, transport device, carry-in device, carry-out device, buffer device, inspection device, and repair device) that constitutes the color filter production line 201 shown in FIG. The device acts as a client terminal included in the production line control system 230. In addition, in Fig. 6, for convenience of illustration, only a part of the apparatus constituting the color filter production line 201 shown in Fig. 5 is shown, and the description of the remaining apparatus is omitted.

Figure 7 is a functional block diagram showing the details of the line control system shown in Figure 6. In Fig. 7, in order to simplify the description, only one in-line device 232a is shown.

The production line device 232a includes a monitoring information acquisition unit 233, an operation control unit 234, an operation unit 235 corresponding to a mechanism portion in the production line device 232a, and a network interface (hereinafter referred to as "network I/F") 236.

The monitoring information acquisition unit 233 acquires the monitoring information Imon indicating the operation status of the in-line device 232a, and transmits the acquired monitoring information Imon to the control device 231 via the network I/F 236. The monitoring information Imon includes one or more types of information indicating the presence or absence of the substrate in the in-line device 232a or the operating state of the in-line device 232a itself. The type of information included in the monitoring information Imon varies depending on the type of the in-line device 232a (processing device, conveying device, buffer device, etc.). In addition, the details of the monitoring information Imon will be described later.

The operation control unit 234 controls the operation unit 235 based on an instruction from the control device 231, thereby controlling the operation of the in-line device 232a itself. More specifically, the operation control unit 234 receives the substrate stop discharge instruction Csus and the release stop instruction Cres issued by the control device 231, and gives the operation unit 235 a control instruction Cctrl in response to the received instruction, and controls the device from the production line. The discharge of the substrate of 232a.

Moreover, when the production line device 232a is a buffer device, the buffer instruction Cbuf issued by the control device 231 is received, and the storage operation (buffering operation) of the instructed substrate is started.

Further, the other in-line devices 232b to 232n are also configured in the same manner as the in-line device 232a.

On the other hand, the control device 231 includes a storage unit 237, a setting unit 238, a monitoring unit 239, and a network I/F 240.

The memory unit 237 is realized by a memory medium such as a hard disk or a non-volatile memory, and memorizes the stop discharge condition and the release stop condition of the substrate defined for each type of information included in the monitoring information Imon, and specifically identifies the target to be monitored. The information of at least one of the in-line devices (hereinafter referred to as the "inspection-target device" to be monitored) and the device that controls the discharge of the substrate in the device on the upstream side of the device to be monitored (hereinafter referred to as " Information of the control target device"). The stop discharge condition is information indicating that the monitoring target device should satisfy the operation state when the substrate from the control target device located upstream of the monitoring target device is stopped, and the release stop condition indicates that the control target device in the substrate is to be stopped. When the substrate is discharged, the information of the operating condition of the target device should be monitored.

The setting unit 238 is configured to set each piece of information stored in the storage unit 237. The setting unit 238 stores the setting information Iset input from the keyboard or the user interface of the mouse or the like in the storage unit 237.

The monitoring unit 239 monitors the operation status of the monitoring target device based on the monitoring information Imon notified by the monitoring information acquisition unit 233 of the production line devices 232a to 232n. More specifically, the monitoring unit 239 acquires the setting information Iset stored in the storage unit 237, specifies the monitoring target device and the control target device, and acquires the stop discharge condition and the release stop condition set for the monitoring target device. The monitoring unit 239 compares the information of each monitoring item included in the notified monitoring information Imon with the stop discharge condition and the release stop condition defined by the setting information Iset stored in the storage unit 237. When the monitoring information Imon satisfies the stop discharge condition, the monitoring unit 239 transmits the stop discharge instruction Csus of the substrate to the operation control unit 234 of the control target device via the network I/Fs 240 and 236. On the other hand, when the monitoring information Imon satisfies the release of the stop condition, the monitoring unit 239 transmits the release/stop instruction Cres of the substrate to the operation control unit 234 of the control target device via the network I/Fs 240 and 236.

In addition, the monitoring unit 239 may issue a buffer instruction Cbuf for storing the substrate in a specific processing state on the buffer device located on the upstream side of the monitoring target device together with the issuance of the stop discharge instruction Csus. This buffer indicates that the Cbuf is, for example, in the case where the processing device fails in one of the processes, and is issued in order to prevent the substrate from remaining on the production line during the processing of the defective processing device. The monitoring unit 239 can also specify the substrate to be stored in the buffer device based on the buffer indication Cbuf. The stop of the buffer may be performed when the monitoring target device is restored or the like, and an appropriate instruction may be given.

Further, when the number of empty segments in the buffer device to which the buffer instruction Cbuf is given is small (for example, when the number of empty segments is smaller than a predetermined threshold value), the monitoring unit 239 determines that only the buffer device cannot completely store the retained substrate. The monitoring unit 239 can issue a buffer indication Cbuf to the buffer device on the upstream side.

The details of the monitoring information Imon referred to by the control device 231 of the present embodiment, the monitoring items monitored by the control device 231, and the stop and discharge conditions and the release and stop conditions of the respective monitoring items will be described below.

<1. Substrate retention time>

The substrate retention time means the time at which the same substrate exists at a specific position within the device to be monitored. In order to monitor the substrate retention time, the line control system 230 of the present embodiment uses the substrate position information indicating the position of the substrate in the monitoring target device. The substrate position information indicates information on whether or not a substrate is present at a predetermined position (one or more) set in advance in the monitoring target device. The monitoring unit 239 calculates the time (board retention time) at which the substrate continues to exist at each position based on the presence or absence of the substrate at each position based on the substrate position information notified by the monitoring information acquisition unit 233.

When the substrate retention time is used as the monitoring item, the threshold value of the residence time is set as the stop discharge condition, and the predetermined time elapsed from the stop of the discharge is set as the release stop condition.

Therefore, when the substrate retention time calculated for a certain monitoring target device exceeds the set threshold value, the monitoring unit 239 issues a stop discharge instruction Csus to the control target device, and then elapses from the release of the stop discharge instruction Csus. Release the stop instruction Cres at the scheduled time.

By monitoring the substrate residence time at a specific position in this manner, it is possible to grasp the initial stage in which the retention occurs. Therefore, the retention can be eliminated in the initial stage by stopping the apparatus on the upstream side of the specific position from the discharge of the substrate for a fixed period of time.

<2. Number of empty sections of the buffer device>

The number of empty segments of the buffer device is information used when the buffer device is set as the monitoring target device. The monitoring information acquisition unit 233 provided in the buffer device updates the number of slots every time the substrate is stored and discharged, and notifies the monitoring unit 239 of the number of slots indicating the number of slots.

When the number of empty segments is used as the monitoring item, the lower limit value of the number of empty segments is set as the stop discharge condition as the stop discharge condition, and the upper limit value of the number of empty segments is set as the release stop condition.

Therefore, when the number of empty segments of the monitoring target buffer device is equal to or less than the set lower limit value, the monitoring unit 239 issues a stop discharge instruction Csus to the control target device, and then the number of empty segments exceeds the set upper limit value. In the case, the release cancellation stop instruction Cres.

If the discharge of the substrate of the control target device is controlled in accordance with the number of empty portions of the buffer device, that is, the accumulated absorption balance, the retention of the substrate can be forcibly eliminated. If this control is performed together with the control of the substrate retention time according to the item 1, it is effective because it can eliminate the degree of stagnation that cannot be eliminated by stopping the discharge of the substrate for a fixed period of time.

<3. Number of substrates in the monitoring area>

As described above, in each device, a plurality of positions at which the presence or absence of the substrate can be detected are defined in advance. Each position can be set to a portion that is carried out to the processing device or the buffer device, into the substrate, or a portion that is processed in the processing device, a portion inside the buffer device, and a position on the transport path of the transport device. The surveillance zone means a range defined by a combination of a plurality of positions arbitrarily selected from these predetermined positions.

For example, in Fig. 5, all the positions specified in the conveying device 212, the buffer device 221, the coating devices 205a and 205b, the inspection device 217, the conveying device 213, and the buffer device 222 can be selected by the two-point chain. The Z ₁ portion surrounded by the line is set as the monitoring area. Further, although an example in which the monitoring area is defined by a combination of all the positions defined in the devices arranged continuously is described here, the method of selecting the position is not particularly limited and may be arbitrarily selected. For example, the monitoring area may be defined by selecting only a part of the position specified in each device or simultaneously selecting the position of the device not directly connected.

In the present embodiment, by monitoring the number of substrates present in the set monitoring area, the flow control of the more flexible substrate can be realized. The monitoring area can be defined based on the setting information input via the setting unit 238 and stored in the memory unit 237.

The number of substrate pieces in the monitoring area is monitored by the substrate position information notified by each monitoring target device included in the monitoring area.

When the number of substrates in the monitoring area is used as a monitoring item, the upper limit of the number of substrates is set as the stop discharge condition, and the lower limit of the number of substrates is set as the release stop condition.

Therefore, when the number of substrates in the monitoring area calculated for a certain monitoring area is equal to or greater than the set upper limit value, the monitoring unit 239 issues a stop discharge instruction Csus to the control target device, and then, in the calculated monitoring area substrate When the number of sheets is less than the set lower limit value, the release stop instruction Cres is issued.

If the discharge of the substrate of the control target device is controlled in accordance with the number of substrates flowing in the monitoring area, the retention of the substrate can be forcibly eliminated. If this control is performed together with the control of the substrate retention time according to the item 1, it is effective because it can eliminate the degree of stagnation that cannot be eliminated by stopping the discharge of the substrate for a fixed period of time.

<4. Retention time of substrate in buffer device>

The substrate retention time in the buffer device is information used when the buffer device is set as the monitoring target device, and indicates the elapsed time from when the substrate is stored in the buffer device. The monitoring information acquisition unit 233 provided in the buffer device measures the residence time of each of the stored substrates, and notifies the monitoring unit 239 of the measured time as the substrate retention time information in the buffer device.

When the retention time of the substrate in the buffer device is the monitoring item, the upper limit value of the retention time is set as the stop discharge condition, and the monitoring unit 239 is in the case where the substrate retention time in the monitoring target buffer device is equal to or higher than the set upper limit value. The control target device issues a stop discharge instruction Csus. However, as the release stop condition, the number of substrates in a predetermined area including the buffer device is used. This will be described in detail below.

Figure 8 is a schematic view showing a portion of the production line shown in Figure 5. In Fig. 8, the position defined on the conveyance path of the conveyance device 212 is indicated by a triangular symbol. Further, in the example of Fig. 8, it is assumed that the monitoring target device is the buffer device 221 and the control target device is the cleaning device 204a.

Referring to Fig. 8(a), the buffer device 221 is placed on the conveyance path of the conveyance device 212 in an on-line manner, and is conveyed to the conveyance device 212 by FILO (First In Last Out). The substrate is stored and transported to discharge the substrate. Therefore, the buffer device 221 is retained in the buffer device 221 until the other substrate is removed from the substrate 226 stored in the empty state.

When the retention time in the buffer device of the substrate 226 exceeds the set upper limit value, the monitoring unit 239 issues a stop discharge instruction Csus to the cleaning device 204a. As a control method for discharging the substrate from the cleaning device 204a after the release of the discharge instruction Csus is issued, for example, it is conceivable that the cleaning device 204a issues a release stop instruction when the substrate stored in the buffer device 221 is completely discharged.

However, as shown in Fig. 8(b), when the buffer device 221 is emptied and then the substrate is ejected, the coating device is reached after the substrate 227 discharged from the cleaning device 204a is reached immediately after the release of the stop instruction Cres is received. The time lag occurs until 205a, which results in a decrease in the operational efficiency of the production line.

Therefore, in the present embodiment, it is considered that the timing of releasing the stop instruction Cres is controlled from the time when the substrate discharged from the cleaning device 204a to be controlled reaches the buffer device 221 in the subsequent stage. Specifically, in the eighth (c) diagram, the range (the range surrounded by the two-dot chain line) defined by the combination of the buffer device 221 and the n positions P ₁ to P _n on the upstream side thereof is defined as one In the zone Z ₂ , when the number of substrates present in the zone Z ₂ is equal to or less than a predetermined threshold value, the monitoring unit 239 issues a release stop instruction Cres to the cleaning device 204a. Further, this zone Z ₂ and the monitoring zone can be defined in accordance with the setting information input via the setting section 238 and stored in the memory section 237.

For example, in the case of releasing the set (the maximum number M, but small, the substrate is within Th ₂ ratio of Z may be arranged in the region) is stopped with the discharge threshold Th, the number of the zone Z in the substrate sheet ₂ becomes Th The following time monitoring unit 239 issues a release stop instruction Cres. In response to the release stop instruction Cres, the cleaning device 204a restarts the discharge of the substrate and discharges the substrate to the transfer device 212.

If the pre-set value of the threshold value Th, so that the substrate at the time of 8 (c) of FIG. 228 is discharged and transported before coming to the position P _1, the longest residence time of the substrate 226 is discharged from the buffer means 221, as in the first As shown in Fig. 8(d), the substrate can be transported without interruption, and the operational efficiency of the production line can be improved.

When the substrate retention time in the buffer device is monitored in this manner, it is possible to prevent the substrate being processed from being stored in the buffer device for a predetermined time or longer, thereby suppressing variations in processing time required for each substrate and improving quality.

<5. Device operation status>

The device operation state indicates whether or not the monitoring target device is in normal operation. The monitoring information acquisition unit 233 periodically notifies the monitoring unit 239 that, for example, the binary operation unit 235 is in normal operation and normal operation information in other cases.

When the device operation state is used as the monitoring item, the normal operation information is set as the stop discharge condition from the value indicating the normal state to the value indicating the abnormal state, and the normal operation information is set from the value indicating the abnormal state to the normal state. The change in the value of the state is used as the release stop condition.

Therefore, when the monitoring target device changes to an abnormal state, the monitoring unit 239 issues a stop discharge instruction Csus to the control target device, and then issues a release stop instruction to the control target device when the monitoring target device returns to the normal state. .

By monitoring the operation state of the apparatus in this manner, it is possible to stop the discharge of the substrate to be processed in the abnormal device, and it is possible to prevent the substrate that cannot be processed from circulating in the production line.

Further, the above-described buffer instruction Cbuf issued by the monitoring unit 239 may be combined with any of the monitoring controls described in the items 1 to 5. By issuing the buffer indication Cbuf together with the stop discharge instruction of the substrate, it is possible to ensure that the processing performed by a part of the devices is continued without ensuring that the storage path of the storage or the abnormality of the device has not occurred.

Fig. 9 is a flow chart showing the control process performed by the monitoring unit shown in Fig. 6.

In steps S201 to S205, the monitoring unit 239 determines whether or not the substrate stop discharge condition defined by each monitoring item is satisfied based on the monitoring information notified from the monitoring target device. Further, the processing of these steps S201 to S205 can be performed in an arbitrary order. The monitoring unit 239 sets 1 to the flag (flg1 to flg5) for the monitoring item that satisfies the substrate stop discharge condition, sets 0 to the other monitoring items, and moves to step S206.

In step S206, the monitoring unit 239 obtains the logical sum of the flags flg1 to flg5 set in steps S201 to S205, and proceeds to step S207.

In step S207, the monitoring unit 239 determines whether or not the obtained logical sum is 1. When the logical sum obtained is 1 (Yes in step S207), the process goes to step S208, and in other cases (No in step S207), the process returns to steps S201 to S205.

In step S208, the monitoring unit 239 issues a substrate stop discharge instruction to the operation control unit 234 of the control target device set for the monitoring target device, and proceeds to steps S209 to S213.

In steps S209 to S213, the monitoring unit 239 determines whether or not the release stop condition defined by each monitoring item is satisfied based on the monitoring information notified from the monitoring target device. Further, the processing of these steps S209 to S213 can be performed in an arbitrary order. The monitoring unit 239 sets 1 to the flag (flg6 to flg10) for the monitoring item that satisfies the release of the stop condition, sets the flag to 0 for the other monitoring items, and proceeds to step S214.

In step S214, the monitoring unit 239 obtains the logical product of the flags flg6 to flg10 set in steps S209 to S213, and proceeds to step S215.

In step S215, the monitoring unit 239 determines whether or not the obtained logical product is 1. When the obtained logical product is one (Yes in step S215), the process proceeds to step S216, and otherwise (NO in step S215), the process returns to steps S209 to S213.

In step S216, the monitoring unit 239 issues a release stop instruction to the operation control unit 234 of the control target device set to the monitoring target device, and the process proceeds to step S217.

In step S217, the monitoring unit 239 stops the monitoring (Yes in step S217), and ends the control process. Otherwise (NO in step S217), the process returns to steps S201 to S205.

By the control, when any of the plurality of monitoring items satisfies the carry-out stop condition, the discharge of the substrate from the control target device located on the upstream side of the monitoring target device is stopped, and when all the monitoring items satisfy the release stop condition, The substrate is discharged from the control target device again.

Here, a specific example of the above control processing will be described.

In the fifth drawing, in order to perform the coloring pattern forming process of the first color, it is assumed that the unprocessed substrate is transported in the order of "the loading devices 203a and 203b - the cleaning device 204a - the conveying device 202 - the coating device 205a". For example, when the coating device 205a (monitoring device) is stagnant or the device is abnormal, the control device 231 (Fig. 6) stops the loading devices 203a and 203b and the cleaning device 204a (control device) on the upstream side of the coating device 205a. The substrate is simultaneously instructed by the buffer device 221 to store the substrate (the substrate discharged from the cleaning device 204a and having been transported by the transport device 212) to be processed by the coating device 205a in the buffer device 221. When such control is performed, since the conveyance path is ensured for the coating device 205b in normal operation, the coloring pattern forming process of other colors can be continued. Further, it is possible to prevent the unprocessable substrate (the substrate in the processing to be processed by the coating device 205a) from continuing to flow in the production line.

Then, when the retention of the coating device 205a or the abnormality of the device is eliminated, and the release and stop conditions of all the monitoring items are satisfied, the control device 231 (Fig. 6) cleans the loading devices 203a and 203b on the upstream side of the coating device 205a and the cleaning device. The device 204a (control target device) instructs to cancel the stop, that is, again Start to discharge the substrate.

In this specific example, an example in which a specific processing device is stuck or a device abnormality is described. However, when the monitoring target device is another device, or when another monitoring item satisfies the stop discharging condition, the same can be controlled. The discharge of the substrate of the target device is controlled.

As described above, in the control method executed by the line control system of the present embodiment, the monitoring unit 239 acquires the operation status of each device in the production line, monitors the operation status of each device in the production line, and determines whether or not to limit the device to be monitored. The supply of the substrate is performed, and based on the determination result, the stop discharge and the stop of the stop of the substrate of at least one of the control target devices are performed. By controlling the discharge of the substrate of the device on the upstream side of the monitoring target device in this manner, even if the substrate in a different state in the processing state shares the production line in which the device in the production line flows, the retention of the substrate can be suppressed and the productivity can be improved. (throughput). Further, by suppressing the retention of the substrate, it is possible to prevent an increase in the processing time from the start to the end of the coloring pattern of a certain color, so that the quality of the color filter can be improved.

Further, according to the present embodiment, when the buffer device on the upstream side of the monitoring target is instructed to store the substrate to be processed by the monitoring target device, the monitoring device can continue to monitor the normal operation other than the target device. Processing of the device in the middle.

Further, in the present embodiment, an example of the monitoring information acquisition unit and the operation control unit is realized by a computer provided in the production line device. However, another computer terminal that can control the production line control device can be used to configure the monitoring information. Department and action control department.

[Industrial Applicability]

The present invention can be utilized, for example, in a production line for manufacturing a color filter used in a liquid crystal display device.

101~108. . . Handling device

109. . . Storage device

110. . . Cleaning device

111. . . Coating device

112. . . Exposure device

113. . . Imaging device

114. . . Baking device

121. . . Coloring pattern forming production line

122. . . Buffer device

LD. . . Carrying in device

ULD. . . Carry out device

201. . . Color filter production line

204. . . Cleaning device

205. . . Coating device

206. . . Exposure device

207. . . Imaging device

208. . . Baking device

211~216. . . Handling device

221~224. . . Buffer device

230. . . Production line control system

231. . . Control device

Fig. 1 is a schematic view showing a part of a color filter production line according to a first embodiment of the present invention.

Fig. 2 is a schematic view of the buffer device shown in Fig. 1.

Fig. 3 is a flow chart showing the control process of the buffer device shown in Fig. 2.

Fig. 4 is a schematic view showing a part of a color filter production line according to a second embodiment of the present invention.

Fig. 5 is a block diagram showing a part of a color filter production line according to a third embodiment of the present invention.

Fig. 6 is a block diagram showing the configuration of a line control system according to a third embodiment of the present invention.

Figure 7 is a functional block diagram showing the details of the line control system shown in Figure 6.

Figure 8 is a schematic view showing a portion of the production line shown in Figure 5.

Fig. 9 is a flow chart showing the control process performed by the monitoring unit shown in Fig. 6.

Fig. 10 is a schematic view showing a conventional color filter production line.

Figure 11 is a block diagram showing a portion of the color filter production line shown in Figure 10.

109. . . Storage device

LD. . . Carrying in device

ULD. . . Carry out device

101a, 101b. . . Handling device

110a, 110b. . . Cleaning device

102a, 102b. . . Handling device

111a, 111b. . . Coating device

117. . . Extraction inspection device

103. . . Handling device

115a, 115b. . . Inspection device

104. . . Handling device

112a, 112b. . . Exposure device

105. . . Handling device

113a, 113b. . . Imaging device

106. . . Handling device

118. . . Extraction inspection device

114a, 114b. . . Baking device

107. . . Handling device

108a, 108b. . . Handling device

116. . . Inspection device

122a, 122b. . . Buffer device

119. . . Extraction inspection device

120. . . Extraction inspection device

121. . . Coloring pattern forming production line

Claims (11)

A color filter production line sequentially forms at least four colored patterns on a substrate, the color filter production line having: a storage device for storing a substrate; and a colored pattern forming production line, comprising: a plurality of processing devices for And performing a process of each process of the photolithography method in parallel; and a plurality of transfer devices are connected between the processing devices, and transporting the substrate to a predetermined processing device according to the colored pattern formed on the substrate; Each process of the lithography method shares at least one of the processing devices when forming a two-color coloring pattern; the loading device carries the substrate supplied from the storage device into the coloring pattern forming production line; and the unloading device The substrate discharged from the coloring pattern forming line is carried out to the storage device; the coloring pattern forming line causes the substrate to be repeatedly circulated until a desired coloring pattern is formed on the substrate, and the desired coloring pattern is formed to the carrying device. a substrate; further comprising a buffer device for temporarily storing the substrate in the coloring pattern forming line The coloring pattern forming production line is formed by storing the substrate to the buffering device and discharging the substrate from the buffering device, and alternately supplying the processing device shared by the coloring pattern forming the two colors to form one of the two colors. The substrate of the color pattern of color, and the other one of the two colors should be formed A substrate of a colored pattern of color. A production line control system for controlling a color filter production line, the color filter production line comprising: a plurality of processing devices, a plurality of transfer devices connected to the processing device, and a buffer device for temporarily storing a plurality of substrates, and forming The processing device and the transport device are shared when the color pattern of the plurality of colors is shared. The line control system includes monitoring information acquisition means for acquiring monitoring information indicating the respective operating states of the processing device, the conveying device, and the buffer device. The operation control means controls the operation of the processing device, the transfer device, and the buffer device, and the monitoring means monitors the operation status of the monitoring target device based on the monitoring information notified by the monitoring information obtaining means, and The operation control means instructs to stop discharging the substrate from at least one device located on the upstream side of the monitoring target device, and to release the stop; the color filter production line discharges the substrate from the buffer device and discharges the substrate from the buffer device For the common use in forming the colored pattern Processing means alternately supplied to the substrate 2 of the one kind of the colored pattern of colors of the color to be formed, the substrate and the another colored pattern of a color of the second color to be formed. The production line control system of claim 2, wherein the monitoring information includes substrate position information indicating a position of the substrate in each device; The monitoring means calculates the residence time of the substrate in the monitoring target device based on the notified substrate position information, and instructs the stop discharge when it is determined that the calculated residence time is equal to or greater than a predetermined threshold value, and discharges from the stop. Indicates that the release is stopped after a predetermined time has elapsed. The production line control system of claim 2, wherein the monitoring information includes information on the number of empty segments indicating the number of empty segments of the buffer device; the monitoring means is based on the information of the number of empty segments to be monitored. When the number of empty segments of the buffer device is equal to or less than a predetermined lower limit value, the stop discharge is instructed, and when the number of empty segments exceeds a predetermined upper limit value, the release stop is instructed. The production line control system of claim 2, wherein the monitoring information includes substrate position information indicating a position of a substrate in each device; the monitoring means is to be pre-defined in the color filter production line. A combination of a plurality of positions selected by a plurality of positions is defined as a monitoring area, and the number of substrates in the monitoring area is calculated based on the notified substrate position information, and the calculated number of substrates is equal to or greater than a predetermined upper limit value. The stop is instructed to be stopped, and the release stop is instructed when the calculated number of substrates is less than a predetermined lower limit. The production line control system of claim 2, wherein the monitoring information includes retention time information in the buffer device, which indicates that the buffer device in each of the substrates stored in the buffer device stays in the buffer device. According to the information on the retention time in the buffer device, the monitoring means instructs the stop discharge when the residence time of the substrate in the buffer device to be monitored is equal to or greater than a predetermined upper limit value, and is buffered by the monitor. The release stop is instructed when the number of substrates in the area defined by the plurality of positions on the upstream side of the apparatus is equal to or less than a predetermined threshold. The production line control system of claim 2, wherein the monitoring information includes normal operation information indicating whether each device is in normal operation; and the monitoring means operates on the monitoring target device according to the notified normal operation information. The state in which the state changes from normal to abnormal indicates that the stop is discharged, and the state in which the operational state returns to normal from the abnormality indicates the release stop. The production line control system according to any one of claims 2 to 7, wherein the monitoring means instructs the stop of the discharge, and further indicates to the buffer device on the upstream side of the monitoring target device that the storage should be handled by the monitoring target device. Substrate. The production line control system according to any one of the items 2 to 7 of the patent application, further comprising: a memory means for memorizing: stopping the discharge condition and releasing the stop condition of the substrate defined in each piece of information included in the monitoring information Specific information of at least one device to be monitored; and specific to the monitoring pair And the setting means for setting information stored by the memory means; the monitoring means is based on the notified monitoring information and the memory means The result of the comparison of the stop discharge condition and the release stop condition determines the stop discharge and the release stop. A production line control method for controlling a color filter production line, the color filter production line comprising: a plurality of processing devices, a plurality of transfer devices connected to the processing device, and a buffer device for temporarily storing a plurality of substrates, and forming The processing device and the transport device are shared when the color pattern of the plurality of colors is used. The line control method includes the steps of: obtaining the respective operating states of the processing device, the transport device, and the buffer device; and monitoring the operation status of each device obtained. And determining whether or not to restrict the supply of the substrate to the monitoring target device; and according to the determination result, at least one device on the upstream side of the monitoring target device stops discharging the substrate and releases the stop, and the color filter production line is stored in the buffer device a substrate and a substrate discharged from the buffer device, and a substrate common to the coloring pattern of one of the two colors to be alternately supplied to the processing device shared by the coloring pattern, and another one of the two colors to be formed A substrate with a colored pattern of color. A color filter production line for forming a plurality of colors on a substrate a pattern, the color filter production line includes: a processing device that performs processing of each process of the photolithography method, and is commonly used to form a color pattern of a plurality of colors; a plurality of conveying devices are connected to the processing device and are collectively used for forming a coloring pattern of a plurality of colors; a buffering device for temporarily storing a plurality of substrates; and a control device for controlling each of the processing device, the conveying device, and the buffering device; the processing device, the conveying device, and the buffering device each including The monitoring information acquisition unit acquires monitoring information indicating an operation status; and the operation control unit controls the operation based on an instruction from the control device; the control device monitors based on the monitoring information transmitted from the monitoring information acquisition unit. Monitoring the operation state of the target device, and instructing the operation control unit of at least one device on the upstream side of the monitoring target device to stop the discharge and release of the stop substrate, and by storing the substrate to the buffer device and discharging the substrate from the buffer device, The processing device shared by the forming of the colored pattern should be alternately supplied to form the 2 A substrate of a color pattern of one of the colors and a substrate of a color pattern of the other of the two colors.