WO2010082495A1 - Color filter production line, line control system, and line control method - Google Patents
Color filter production line, line control system, and line control method Download PDFInfo
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- WO2010082495A1 WO2010082495A1 PCT/JP2010/000195 JP2010000195W WO2010082495A1 WO 2010082495 A1 WO2010082495 A1 WO 2010082495A1 JP 2010000195 W JP2010000195 W JP 2010000195W WO 2010082495 A1 WO2010082495 A1 WO 2010082495A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/001—Axicons, waxicons, reflaxicons
Definitions
- the present invention relates to a color filter production line for producing a color filter used in a liquid crystal display device and the like, and a line control system and a line control method for controlling the production line.
- a method of forming a colored pattern of a plurality of colors on a glass substrate using a photolithography method is common. For example, when manufacturing a color filter having a black matrix (black) and colored patterns of a total of four colors of red, green, and blue, cleaning the substrate, coating the coloring material on the substrate, and exposure using a photomask A series of colored pattern forming processes including development, post-baking steps are repeated for each color of black, red, green, and blue.
- FIG. 10 is a schematic diagram showing a conventional color filter production line
- FIG. 11 is a block diagram showing a part of the color filter production line shown in FIG.
- the conventional color filter manufacturing line shown in FIG. 10 has four processing lines for forming four colored patterns of black, red, green, and blue. 92a to 92d are provided in series.
- the processing line 92a is, for example, for patterning a black matrix, and includes a loading device LD for loading a substrate supplied from the stocker device 91, a cleaning device 93, a coating device 94, an exposure device 95, and development.
- the apparatus 96, the baking apparatus 97, and the unloading apparatus ULD which unloads a board
- an inline inspection device 98 that inspects the film thickness and coating unevenness is provided downstream of the coating device 94, and an inline inspection device 99 that inspects the formed pattern is provided downstream of the developing device 96.
- a sampling inspection device 70 for performing a substrate sampling inspection and a correction device 71 for correcting the substrate are connected to the transport device 6.
- the substrate is stored in a cassette.
- the carry-in device LD takes out the substrate from the cassette received from the stocker device 91 and supplies it to the transport device 81.
- the supplied substrate is transported to the cleaning device 93 by the transport device 81 and cleaned, and then transported to the coating device 94 by the transport device 82, and a photoresist containing a black coloring material is applied by the coating device 94.
- the substrate coated with the photoresist is inspected by the inspection device 98 and then transported to the exposure device 95 by the transport device 83, and the exposure device 95 performs an exposure process using a photomask.
- the exposed substrate is transported to the developing device 96 by the transport device 84 and developed, and then inspected by the inspection device 99 during the transport process by the transport device 85.
- a substrate having no abnormality in the inspection is subjected to a post-bake process by the bake device 97 and is transferred to the carry-out device ULD by the transfer device 86.
- the carry-out device ULD stores the received substrate in a cassette and carries the cassette to the stocker device 91.
- Each device operates with a certain degree of tact, but the substrate may stay in the line due to an increase in processing time due to device trouble or irregular processing. Therefore, a buffer device (not shown) for temporarily storing the staying substrate is provided in the transfer device where the staying is predicted in advance.
- the buffer device generally has a multi-stage shelf structure, and has a function of storing a plurality of substrates and discharging the stored substrates onto a conveyance path in accordance with control by the control device.
- processing lines 92b to 92d are also configured by the same process device, transfer device, and inspection device as those included in the processing line 92a.
- the substrate on which the black matrix is patterned by the processing line 92a is supplied to the downstream processing line 92b in a state of being accommodated in the cassette, and a red coloring pattern is formed by the processing line 92b. Thereafter, similarly, through the processing by the processing lines 92c and 92d, four colored patterns are formed on the substrate.
- the above-described conventional color filter production line requires a processing line for the number of colors of the colored pattern to be formed.
- the space required for installation of the production line as described above is further increased as the substrate size is increased, resulting in an increase in the cost required for the production facility.
- each process device cleaning, coating, exposure, development, baking device
- inspection device that constitute the processing line, and an inspection device, and a transport device that connects them are colored pattern colors. Only the number corresponding to the number is necessary. Therefore, an increase in the number of necessary devices also leads to an increase in cost required for manufacturing equipment.
- the process device for carrying out each process and the conveying device are shared for forming colored patterns of two or more colors in one line, and branch and merge on the conveying path
- the buffering itself is not easy in a production line (see, for example, Patent Document 3) in a form in which there are a plurality of. That is, when one process device and one transfer device are shared by a plurality of substrates having different in-process states, the retention of the substrate due to troubles caused by the color pattern forming process of a certain color is caused by a color pattern of another color. Since the formation process is also affected, it is difficult to simply absorb the retention of the substrate with only the buffer device.
- an object of the present invention is to provide a color filter production line that can reduce the installation space and the number of necessary devices.
- Another object of the present invention is to provide a color filter production line in which a process device and a conveying device are commonly used for forming a plurality of colored patterns, even when trouble occurs in a device for forming a colored pattern of a certain color. Another object is to provide a line control system and a line control method capable of continuing the color pattern forming process of other colors.
- another object of the present invention is to share a process device and a conveying device for forming a colored pattern of a plurality of colors, and even when a trouble occurs in a device for forming a colored pattern of a certain color, a colored pattern of another color
- the object is to provide a color filter production line capable of continuing the forming process.
- the present invention relates to a color filter manufacturing line for sequentially forming at least four colored patterns on a substrate, and is provided in parallel with a stocker device for storing the substrate and each process of the photolithography method.
- a plurality of process devices connected to each other and a plurality of transfer devices that connect the process devices and transfer the substrate to a predetermined process device based on a colored pattern formed on the substrate.
- the colored pattern forming line that shares at least one of the process devices for forming the two colored patterns, the carry-in device that carries the substrate supplied from the stocker device into the colored pattern forming line, and the colored pattern formed line discharged An unloading device for unloading the substrate to the stocker device;
- the colored pattern forming line repeatedly circulates the substrate until a necessary colored pattern is formed on the substrate, and discharges the substrate on which the necessary colored pattern is formed to the carry-out device.
- a line control system includes a plurality of process devices, a plurality of transfer devices that connect the process devices, and a buffer device that temporarily stores a plurality of substrates.
- Monitor information acquisition means for controlling a color filter production line shared for forming a colored pattern, and for obtaining monitoring information indicating the operating status of each of the process device, the transport device and the buffer device, and the process device and the transport device
- the operation control means for controlling the operation of the buffer device, and the operation status of the monitoring target device is monitored based on the monitoring information notified from the monitoring information acquisition means, and the upstream side of the monitoring target device with respect to the operation control means
- Monitoring means for instructing to stop and release the discharge of the substrate from at least one apparatus located at the same position.
- the line control method includes a plurality of process devices, a plurality of transfer devices that connect the process devices, and a buffer device that temporarily stores a plurality of substrates. It is for controlling the color filter production line that is shared for color pattern formation. It acquires the operating status of each of the process equipment, transfer equipment, and buffer equipment, and monitors the operating status of each acquired equipment. It is determined whether or not the supply of the substrate to the target device is restricted, and based on the determination result, the substrate discharge is stopped and released by at least one of the upstream side of the monitoring target device.
- the color filter production line is for forming a colored pattern of a plurality of colors on a substrate, and is used for forming a colored pattern of a plurality of colors by performing each process of the photolithography method.
- Each of the process device, the transfer device, and the buffer device includes a monitoring information acquisition unit that acquires monitoring information indicating an operation status, and an operation control unit that controls operations according to instructions from the control device.
- the control device monitors the operation status of the monitoring target device based on the monitoring information transmitted from the monitoring information acquisition unit, and discharges the substrate to the operation control unit of at least one device upstream of the monitoring target device. Instruct stop and release.
- the color filter production line in each process, one process apparatus is shared for two-color coloring pattern formation processing. Therefore, compared to the case where a processing line is provided for each color, the color filter production line is installed. The required space can be greatly reduced. In addition, since the number of necessary devices can be reduced, the cost required to configure the color filter production line can be reduced.
- the present invention in the color filter manufacturing line in which the process device and the transport device are commonly used for forming a plurality of colored patterns, by controlling the discharge of the substrate from the upstream device of the monitored device, Even when a trouble occurs in an apparatus for forming a color pattern of a certain color, it is possible to realize a line control system and a line control method capable of continuing the process of forming a color pattern of another color.
- the process device and the transport device are shared by multiple color pattern formation, even if a trouble occurs in the color pattern formation device of one color, the color that can continue the color pattern formation process of other colors A filter production line can be realized.
- FIG. 1 is a schematic diagram showing a part of a color filter production line according to the first embodiment of the present invention.
- FIG. 2 is a schematic diagram of the buffer device shown in FIG.
- FIG. 3 is a flowchart showing a control process of the buffer device shown in FIG.
- FIG. 4 is a schematic view showing a part of a color filter production line according to the second embodiment of the present invention.
- FIG. 5 is a block diagram showing a part of a color filter production line according to the third embodiment of the present invention.
- FIG. 6 is a block diagram showing a configuration of a line control system according to the third embodiment of the present invention.
- FIG. 7 is a functional block diagram showing details of the line control system shown in FIG.
- FIG. 8 is a schematic diagram showing a part of the line shown in FIG.
- FIG. 9 is a flowchart showing a control process performed by the monitoring unit shown in FIG.
- FIG. 10 is a schematic diagram showing a conventional color filter production line.
- FIG. 1 is a schematic diagram showing a part of a color filter production line according to the first embodiment of the present invention.
- FIG. 1 shows only processing lines for forming a colored pattern of four colors by a photolithography method in the color filter manufacturing process.
- the arrows in FIG. 1 indicate the connection relationship between the apparatuses and the transport direction of the substrate.
- the color filter production line includes a stocker device 109, a carry-in device LD, a carry-out device ULD, a color pattern formation line 121 that performs color pattern formation processing of two or more colors in parallel, a buffer device 122a, 122b.
- the stocker device 109 is a device for storing a plurality of cassettes containing glass substrates and a plurality of empty cassettes, and corresponds to, for example, an automatic warehouse.
- the stocker device 109 includes a transfer device for transferring a cassette, supplies a cassette containing a glass substrate to the carry-in device LD, and collects an empty cassette from the carry-in device LD. Further, the stocker device 109 supplies an empty cassette to the carry-out device ULD, and collects the cassette in which the glass substrate is stored from the carry-out device ULD.
- the carry-in device LD takes out an unprocessed substrate from the cassette supplied from the stocker device 109, and supplies the taken-out substrate to the transport device 101a or 101b of the colored pattern forming line 121.
- the unloading device ULD stores the substrate discharged from the coloring pattern forming line 121 in a cassette, and unloads the cassette storing the substrate to the stocker device 109.
- the colored pattern forming line 121 includes a plurality of process apparatuses provided in parallel for each process of the photolithography method and a plurality of transfer apparatuses 101a to 108b.
- two process apparatuses that is, cleaning apparatuses 110a and 110b and a coating apparatus are provided for each process.
- 111a and 111b, exposure devices 112a and 112b, developing devices 113a and 113b, and baking devices 114a and 114b are provided.
- Each process apparatus is an apparatus capable of appropriately switching between two or more color pattern forming processes.
- each of the coating apparatuses 111a and 111b includes at least two coating mechanisms for coating a photoresist on the substrate surface, and switches the coating mechanism to be used in accordance with the color of the colored pattern to be formed on the substrate, so that different colors are used.
- the photoresist can be applied separately.
- the exposure apparatuses 112a and 112b include a mechanism for switching the photomask itself and the arrangement of the photomask according to the color of the colored pattern to be formed.
- the transfer apparatuses 101 to 108b connect the process apparatuses, and transfer the substrate processed by each process apparatus to the next process apparatus, inspection apparatus, and unloading apparatus ULD.
- the substrate transfer destination is determined by determining the next process to be performed by each transfer device based on the colored pattern on the substrate.
- a transfer device for example, transfer device 101 a or 101 b
- a transfer device for example, transfer device 103
- the form of the transport apparatuses 101 to 108b is not particularly limited, and whether or not to share the transport apparatus may be arbitrary.
- the order in which the colored patterns of each color are formed is not particularly limited. However, in order to simplify the description, in the following, the order in which the colored patterns are formed is in the order of black, red, green, and blue. Further, a coloring pattern forming process of two colors of black and red is performed by the cleaning device 110a, the coating device 111a, the exposure device 112a, the developing device 113a, and the baking device 114a (devices with right-down hatching), and green and blue An example will be described in which the colored pattern forming process is performed by the cleaning device 110b, the coating device 111b, the exposure device 112b, the developing device 113b, and the baking device 114b (apparatus with a right-up hatching).
- the buffer devices 122a and 122b are devices that are connected to the transport device 108a and temporarily store the substrate transported on the transport path of the transport device 108a.
- the buffer devices 122a and 122b are used for buffering / permutation processing for adjusting the order and the number of the substrates flowing in the colored pattern forming line 121, and details thereof will be described later.
- in-line inspection devices 115a and 115b for inspecting film thickness and coating unevenness are provided on the conveyance path between the coating devices 111a and 111b and the exposure devices 112a and 112b. Further, an in-line inspection device 116 for inspecting the formed colored pattern is provided on the conveyance path between the baking devices 114a and 114b and the carry-out device ULD.
- a sampling inspection device 117 is connected to the transport device 103 to extract and inspect a part of the substrate coated with the photoresist and return the inspected substrate to the transport device 103.
- the conveyance device 106 is connected to a sampling inspection device 118 for extracting and inspecting a part of the substrate after the development processing and returning the inspected substrate to the conveyance device 106.
- the conveyance device 108b is connected to all the colors.
- Sampling inspection devices 119 and 120 are connected to pull out and inspect a part of the substrate on which the colored pattern is formed, and return the inspected substrate to the transfer device 108b.
- the colored pattern forming line 121 circulates the in-process substrate until all four colored patterns are formed on the substrate loaded from the loading device LD, and the substrate on which all four colored patterns are formed is unloaded from the unloading device ULD. To discharge.
- the transport device 107 transports, to the transport device 108a, a substrate on which a colored pattern of two or three colors is formed among the substrates that have been baked by the baking devices 114a and 114b.
- the substrate on which the coloring patterns of all four colors are formed is transferred to the transfer device 108b via the inspection device 116.
- the transport device 108a transports the substrate transported from the transport device 107 to the transport device 101b.
- the transport device 108b transports the substrate on which one color pattern is formed to the transport device 101a, and transports the substrate on which all four color patterns are formed to the unload device ULD. Further, the transfer devices 108a and 108b also transfer a substrate that has been determined to be defective by any of the inspection devices to the carry-out device ULD.
- the specific transport route until the colored patterns of the first color to the fourth color are formed on the substrate loaded from the carry-in device LD is as follows.
- the transport route for the substrate loaded from the carry-in device LD into the transport device 101a is as follows.
- Transport route 1 Loading device LD-Conveying device 101a-Cleaning device 110a-Conveying device 102a-Coating device 111a-Conveying device 103- (Sampling inspection device 117-Conveying device 103) -Inspecting device 115a-Conveying device 104-Exposure device 112a-Conveying device 105 -Developing device 113a-Conveying device 106- (Sampling inspection device 118-Conveying device 106) -Baking device 114a-Conveying device 107-Inspecting device 116-Conveying device 108b- (Sampling inspection device 119 or sampling inspection device 120-Conveying device 108b) ) -Conveyor 101a
- the substrate is processed by each process device, and a first color pattern (black matrix) is formed on the surface of the substrate.
- the substrate on which the first color pattern is normally formed is transferred again to the transfer device 101a through the transfer device 107 and the transfer device 108b.
- Transport route 2 Conveying device 101a-cleaning device 110a-conveying device 102a-coating device 111a-conveying device 103- (sampling inspection device 117-conveying device 103) -inspecting device 115a-conveying device 104-exposure device 112a-conveying device 105-developing device 113a -Transport device 106-(Sampling inspection device 118-Transport device 106)-Baking device 114a-Transport device 107-Inspection device 116-Transport device 108a-Transport device 101b
- the substrate is processed by each process device, and a second color (red) colored pattern is formed on the surface of the substrate.
- the substrate on which the coloring pattern of the second color is normally formed is transferred to the transfer device 101b through the transfer device 107 and the transfer device 108a.
- the transport route of the substrate put into the transport device 101b from the transport device 108a is as follows.
- Transport route 3 Transport device 101b-Cleaning device 110b-Transport device 102b-Coating device 111b-Transport device 103-(Sampling inspection device 117-Transport device 103)-Inspection device 115b-Transport device 104-Exposure device 112b-Transport device 105-Developing device 113b -Transport device 106-(Sampling inspection device 118-Transport device 106)-Baking device 114b-Transport device 107-Transport device 108a-Transport device 101b
- the substrate is processed by each process device, and a third color (green) colored pattern is formed on the surface of the substrate.
- the substrate on which the coloring pattern of the third color has been normally formed is transferred again to the transfer device 101b through the transfer device 107 and the transfer device 108a.
- the transport route of the substrate put into the transport device 101b from the transport device 108a is as follows.
- Transport route 4 Transport device 101b-Cleaning device 110b-Transport device 102b-Coating device 111b-Transport device 103-(Sampling inspection device 117-Transport device 103)-Inspection device 115b-Transport device 104-Exposure device 112b-Transport device 105-Developing device 113b -Conveying device 106-(Sampling inspection device 118-Conveying device 106)-Baking device 114b-Conveying device 107-Inspection device 116-Conveying device 108b (Sampling inspection device 119 or sampling inspection device 120-Conveying device 108b)-Unloading device ULD
- the substrate is processed by each process device, and a fourth color (blue) colored pattern is formed on the surface of the substrate.
- the substrate on which the coloring pattern of the fourth color is normally formed is discharged to the unloading device ULD through the transfer device 107, the inspection device 116, and the transfer device 108b.
- buffering / permutation processing performed using the buffer devices 122a and 122b will be described.
- the color filter production line is provided with buffer devices 122a and 122b for temporarily storing the substrate along the transport path of the transport device 108a.
- FIG. 2 is a schematic diagram of the buffer devices 122a and 122b shown in FIG.
- the buffer devices 122a and 122b are arranged along the transport path 123 of the transport device 108a, and their operations are controlled by a control device (not shown).
- the buffer device 122a stores a plurality of substrates on which a colored pattern of the first color and the second color is formed among substrates (broken lines) conveyed on the conveyance path 123 from an upstream device, and takes out the stored substrates. To the downstream device.
- the buffer device 122b stores a plurality of substrates on which the coloring patterns of the first to third colors are formed out of the substrates transported through the transport path 123, and the stored substrates are taken out and discharged toward a downstream device. To do.
- the colored pattern formation line 121 stores the substrate in the buffer devices 122a and 122b and discharges the substrate from the buffer devices 122a and 122b (hereinafter collectively referred to as “buffering”). And a substrate that requires a fourth color process are alternately supplied to the transfer apparatus 101b. Further, the coloring pattern forming line 121 performs buffering so that the supply interval to the transfer device 101b for the substrate that requires the third color processing and the supply interval to the transfer device 101b for the substrate that requires the fourth color processing are performed. Are controlled to be equal to or longer than a predetermined time. In addition, the coloring pattern formation line 121 passes the board
- FIG. 3 is a flowchart showing a control process of the buffer device 122a shown in FIG.
- the buffer device 122a is a device dedicated to the substrate on which the second or third color pattern is formed.
- the substrate on which the first and second color patterns are formed is referred to as a “two-color formation substrate”, and the substrate on which the first to third color patterns are formed is referred to as a “three-color formation substrate”. That's it.
- step S101 it is determined whether or not the substrate has been transferred from the upstream apparatus. If the substrate has been transported from the upstream apparatus (Yes in step S101), the control of the buffer device 122a proceeds to step S102, otherwise (No in step S101), the process proceeds to step S112.
- step S102 it is determined whether or not the conveyed substrate is a three-color formation substrate. If the substrate that has been transported is a three-color formation substrate (Yes in step S102), the control proceeds to step S103, and otherwise (No in step S102), the process proceeds to step S109.
- step S103 it is determined whether or not the substrate (the substrate that has passed through the buffer device 122a or the substrate that has been discharged from the buffer device 122a) transported to the downstream device is a two-color forming substrate. If the substrate transported to the previous downstream apparatus is a two-color formation substrate (Yes in step S103), the control proceeds to step S104, otherwise (No in step S103), the process proceeds to step S106.
- step S104 The processing in step S104 is performed when the substrate transported to the downstream apparatus is the two-color forming substrate and the three-color forming substrate has been transported from the upstream apparatus.
- the buffer device 122a passes the transported substrate as it is, and the control proceeds to step S105.
- step S105 when monitoring of the substrate conveyed from the upstream apparatus is continued (No in step S105), the process returns to step S101, and in other cases (Yes in step S105), the control process is ended.
- step S106 The control in step S106 is performed when the substrate transported to the downstream apparatus most recently is a three-color forming substrate and the three-color forming substrate has been transported from the upstream apparatus. In step S106, it is determined whether or not the two-color formation substrate is stored in the buffer device 122a. If the two-color forming substrate is stored in the buffer device 122a (Yes in step S106), the control proceeds to step S107, and otherwise (No in step S106), the process proceeds to step S108.
- step S107 the buffer device 122a discharges the stored two-color forming substrate to a downstream device before the three-color forming substrate conveyed from the upstream.
- the discharged two-color forming substrate is interrupted between the three-color forming substrate that has already been transferred and the three-color forming substrate that has been transferred from the upstream, and the downstream device has two-color forming substrate and three colors. Forming substrates are alternately supplied. Thereafter, the control proceeds to step S105.
- step S108 the buffer device 122a passes the transported substrate as it is and proceeds to step S105.
- step S109 The control in step S109 is performed when the two-color forming substrate is transported from the upstream apparatus. In step S109, it is determined whether a predetermined time has elapsed since the previous two-color process substrate was discharged. If the predetermined time has elapsed (Yes in step S109), the control proceeds to step S110. Otherwise (No in step S109), the process proceeds to step S111.
- step S110 the buffer device 122a passes the transported substrate as it is, and proceeds to step S105.
- step S111 the buffer device 122a stores the two-color forming substrate transported from the upstream, and proceeds to step S105.
- step S112 The control in step S112 is performed while the substrate is not being transferred from the upstream apparatus. In step S112, it is determined whether or not the two-color formation substrate is stored in the buffer device 122a. If the two-color forming substrate is stored in the buffer device 122a (Yes in step S112), the control proceeds to step S113, otherwise (No in step S112), the process returns to step S101.
- step S113 it is determined whether or not a predetermined time has elapsed since the previous two-color process substrate was discharged. If the predetermined time has elapsed (Yes in step S113), the control proceeds to step S114, and otherwise (No in step S113), the process returns to step S101.
- step S114 the buffer device 122a discharges the stored two-color formation substrate to the downstream device. Thereafter, the control proceeds to step S105.
- the control flow of the buffer device 122b (buffer device for a three-color formation substrate) shown in FIG. 2 corresponds to the two-color formation substrate and the three-color formation substrate in the control flow of FIG. Therefore, the description here is omitted.
- the colored pattern forming line 121 supplies the two-color forming substrate and the three-color forming substrate alternately to the transfer device 101b according to the control described above, and sets the same type of substrates to be inserted at a certain time or more. As a result, it is possible to circulate the substrates without losing the balance of the flow of the substrates of the respective colors in the production line and the balance of the number of substrates being processed having different in-process states. Further, some process apparatuses have an apparatus that slows down processing tact when a colored pattern forming process of the same color continues.
- the coating apparatuses 111a and 111b require a preparation operation every time a photoresist is applied to one substrate, preparation is performed when the same color photoresist is continuously applied by one coating apparatus.
- the tact time becomes longer by the time required for the work. Therefore, by continuously supplying the two-color formation substrate and the three-color formation substrate to the coating apparatus 111b as in the present embodiment, it is possible to avoid the processing of the same color from being continued, and the processing delay can be reduced. Can be prevented.
- the carry-in device LD is in a certain tact.
- a substrate to be processed is supplied, and the transfer device 108b interrupts the substrate on which the first color pattern is formed between successive unprocessed substrates.
- the colored pattern forming line 121 is configured by two process devices operating in parallel, and the substrate is circulated in the line, thereby four colors. A colored pattern is formed. According to such a line configuration and conveyance control, the space required for the arrangement of the color filter production line can be greatly reduced as compared with the case where a processing line is provided for each color. In addition, some devices such as a coating device and an exposure device need to be used for forming a two-color coloring pattern, such as switching the material used or the mask to be used. Therefore, it is possible to reduce the cost required to configure the color filter production line.
- the first and second color patterns are formed by one process apparatus (apparatus with right-down hatching), and the other process apparatus (with right-up hatching) is used.
- the color assignment to each process apparatus is not limited to this example.
- arbitrary 2 patterns may be formed by forming the first and third color patterns with a process apparatus with right-down hatching and forming second and fourth color patterns with a process apparatus with right-up hatching.
- a color may be assigned to one process device of each process, and the remaining two colors may be assigned to the other process device.
- each transfer device distributes the transfer destination of the substrate so that the coloring patterns are formed in the order of the first to fourth colors regardless of the allocation of the respective colors to the process apparatus.
- the same effect as the color filter production line can be obtained.
- FIG. 4 is a schematic view showing a part of a color filter production line according to the second embodiment of the present invention.
- the color filter production line according to the present embodiment is different from that of the first embodiment in that three exposure apparatuses 112a to 112c are provided in the colored pattern forming line 121 as a process apparatus for performing an exposure process. Is different.
- the exposure device 112a exposes the substrate coated with the first color (black matrix) photoresist
- the exposure device 112b exposes the second color and third color (red and green) photoresist coated substrates.
- the substrate coated with the fourth color (blue) photoresist can be exposed by the exposure device 112c.
- any one of the exposure apparatuses 112a to 112c may be a spare apparatus.
- the exposure apparatus to which the substrates discharged from the inspection apparatuses 115a and 115b are transferred is determined by the transfer apparatus 104 according to the coloring pattern on the substrate to be transferred.
- the configuration example of the colored pattern forming line 121 provided with only three exposure apparatuses is shown.
- the number of process apparatuses in some or all of the steps of cleaning, coating, developing, and baking is three. It is also good.
- the occupation area and cost of the color filter production line increase. Therefore, the number of process devices that perform a process with a long tact is increased, and a process device that performs a process with a relatively short tact is possible. Less is preferred.
- the color filter production line according to the present embodiment is also greatly reduced in the space required for the arrangement of the color filter production line as compared with the case according to the first embodiment, as compared with the case where a processing line is provided for each color. It is possible to reduce the cost required to construct the color filter production line.
- the description is limited to an example in which the coloring pattern is formed in the order of black, red, green, and blue.
- the order of forming these colors may be arbitrary.
- the buffer devices 122a and 122b are provided in the transport device 108a, but the buffer device may be provided in any other transport device.
- the color filter production line provided with two or three process apparatuses for each step of the photolithography method has been described.
- a spare process apparatus may be further provided.
- the transfer route by each transfer apparatus may be switched as appropriate.
- the color filter manufacturing line according to each of the above embodiments is It can also be applied to the production of a color filter having a coloring pattern of five or more colors on the substrate. Also in this case, at least one process device in the colored pattern forming line can form a colored pattern of two or more colors, and the colored pattern forming line is formed until the required number of colored patterns are formed on the substrate.
- the substrate may be circulated and the substrate on which a necessary coloring pattern is formed may be discharged to the carry-out device.
- black matrix black
- red, green, blue, and yellow colored pattern is formed on a substrate
- only the black matrix is formed by another device, and the four colors of red, green, blue, and yellow are used.
- the colored pattern may be formed on the color filter production line according to each of the above embodiments.
- FIG. 5 is a schematic diagram showing a part of a color filter production line according to the third embodiment of the present invention.
- FIG. 5 shows only processing lines for forming a colored pattern of four colors by a photolithography method in the color filter manufacturing process.
- the arrows in FIG. 5 represent the connection relationship between the apparatuses and the substrate transport direction.
- the color filter production line 201 is for forming a colored pattern of a plurality of colors on a substrate by a photolithography method so that a colored pattern of two or more colors can be formed in parallel. In each process, two or three process devices are provided in parallel.
- the color filter production line 201 includes a stocker device 202, carry-in devices 203a and 203b, cleaning devices 204a and 204b, coating devices 205a and 205b, exposure devices 206a to 206c, and developing devices 207a to 207c. And bake devices 208a to 208c, carry-out devices 209a to 209c, transfer devices 211 to 216 for connecting the devices, and buffer devices 221 to 224. Further, in-line inspection devices 217 and 218 are provided at the subsequent stage of the coating devices 205a and 205c and the subsequent stage of the developing devices 207a to 207c. Further, an inspection device 218 and a correction device 220 are connected to the transport device 206.
- the stocker device 202 is a device that stores a plurality of cassettes containing glass substrates and a plurality of empty cassettes, and corresponds to, for example, an automatic warehouse.
- the stocker device 202 includes a transfer device for transferring a cassette, supplies a cassette containing a glass substrate to the carry-in devices 203a and 203b, and collects an empty cassette from the carry-in devices 203a and 203b.
- the stocker device 202 supplies empty cassettes to the carry-out devices 209a to 209c, and collects cassettes containing glass substrates from the carry-out devices 209a to 209c.
- the carry-in devices 203 a and 203 b take out an unprocessed substrate from the cassette supplied from the stocker device 202 and supply the taken-out substrate to the transport device 211.
- the cleaning devices 204a and 204b, the coating devices 205a and 205b, the exposure devices 206a to 206c, the developing devices 207a to 207c, the baking devices 208a to 208c, and the unloading devices 209a to 209c are photolithography method cleaning / coating.
- An apparatus that performs processing in each step of exposure, development, and post-bake hereinafter, each apparatus is not distinguished and is also simply referred to as “process apparatus”).
- Each process apparatus is an apparatus capable of appropriately switching between two or more color pattern forming processes.
- each of the coating apparatuses 205a and 205b includes at least two coating mechanisms for coating a photoresist on the substrate surface, and switches the coating mechanism to be used according to the color of the colored pattern to be formed on the substrate, thereby changing different colors.
- the photoresist can be applied separately.
- the exposure apparatuses 206a to 206c include a mechanism for switching the photomask itself and the photomask arrangement in accordance with the color of the colored pattern to be formed.
- Each process apparatus can be assigned a coloring pattern forming process of an arbitrary color.
- black (black matrix) and red coloring pattern formation processing may be performed by the cleaning device 204a and the coating device 205a
- green and blue coloring pattern formation processing may be performed by the cleaning device 204b and the coating device 205b.
- three process apparatuses for example, exposure apparatuses 206a to 206c
- one may be used as a spare, or the exposure apparatus 206a performs a black colored pattern forming process to perform exposure.
- the four color processes may be appropriately distributed to three process apparatuses, such as the apparatus 206b performing red and green color pattern forming processes and the exposure apparatus 206c performing blue color pattern forming processes.
- the transfer devices 211 to 216 connect the respective process devices, and transfer the substrate processed by each process device to the next process device, inspection device, and unloading devices 209a to 209c.
- the substrate transfer destination is determined by determining the next process to be performed by each transfer device based on the colored pattern on the substrate.
- the transport device 216 transports substrates on which all four colored patterns are formed and defective products out of the substrates discharged from the baking devices 208 a to 208 c to the transport devices 209 a to 209 c, and transports the other substrates to the transport device 201. And carry. By carrying out such transport control, colored patterns of each color are sequentially formed while circulating the substrate in the line until all four colored patterns are formed on the substrate.
- the unloading devices 209a to 209c store the substrate discharged from the transfer device 216 in a cassette, and unload the cassette storing the substrate to the stocker device 202.
- the buffer devices 221, 222, 223, and 224 are devices that are connected to the transport devices 212, 213, 215, and 216, respectively, and temporarily store the substrates transported on the transport path.
- the buffer devices 221 to 224 are provided in order to improve the operation efficiency of the entire line by absorbing the processing tact shift of each process device and the retention of the substrate flowing in the line.
- FIG. 6 is a block diagram showing a configuration of a line control system according to the third embodiment of the present invention.
- the line control system 230 includes a control device 231 and a plurality of in-line devices 232a to 232n connected to the control device 231 via a network so as to be capable of bidirectional communication.
- the in-line devices 232a to 232n are devices corresponding to the respective devices (process device, transport device, carry-in device, carry-out device, buffer device, inspection device, correction device) constituting the color filter production line 201 shown in FIG. It is regarded as a client terminal included in the line control system 230 without distinction. In FIG. 6, for the convenience of illustration, only a part of the devices constituting the color filter production line 201 shown in FIG. 5 is shown, and the remaining devices are not shown.
- FIG. 7 is a functional block diagram showing details of the line control system shown in FIG. In FIG. 7, only one in-line device 232a is shown for simplicity of explanation.
- the in-line device 232a includes a monitoring information acquisition unit 233, an operation control unit 234, an operation unit 235 corresponding to a mechanism part of the in-line device 232a, and a network interface (hereinafter referred to as “network I / F”) 236. Including.
- the monitoring information acquisition unit 233 acquires the monitoring information Imon indicating the operating status of the in-line device 232a, and transmits the acquired monitoring information Imon to the control device 231 via the network I / F 236.
- the monitoring information Imon includes one or more pieces of information indicating the presence / absence of a substrate in the in-line device 232a, the residence time, and the operating state of the in-line device 232a itself.
- the type of information included in the monitoring information Imon differs depending on the type of the in-line device 232a (process device, transfer device, buffer device, etc.). Details of the monitoring information Imon will be described later.
- the operation control unit 234 controls the operation of the in-line device 232a itself by controlling the operation unit 235 in accordance with an instruction from the control device 231. More specifically, the operation control unit 234 receives the substrate discharge stop instruction Csus and the stop release instruction Cres issued from the control device 231, and gives the control instruction Cctrl according to the received instruction to the operation unit 235, Controls the discharge of the substrate from 232a.
- the in-line control device 232a is a buffer device, it receives a buffering instruction Cbuf issued by the control device 231 and starts a storage operation (buffering operation) of the instructed substrate.
- the other in-line devices 232b to 232n are configured in the same manner as the in-line device 232a.
- control apparatus 231 includes a storage unit 237, a setting unit 238, a monitoring unit 239, and a network I / F 240.
- the storage unit 237 is realized by a storage medium such as a hard disk or a non-volatile memory.
- the storage unit 237 has at least one discharge stop condition and stop release condition defined for each type of information included in the monitoring information Imon, and at least one monitoring target.
- the monitoring target device that identifies the in-line device (hereinafter referred to as the “monitoring target device”), the device that should control the substrate discharge (hereinafter, And information specifying "control target device”).
- the discharge stop condition is information indicating the operation status that the monitoring target device should satisfy in order to stop the substrate discharge from the control target device located upstream of the monitoring target device, and the stop release condition stops the discharge of the substrate.
- This is information representing the operating status that the monitoring target apparatus should satisfy in order for the control target apparatus in the middle to resume discharging the substrate.
- the setting unit 237 is for setting each information stored in the storage unit 238.
- the setting unit 237 stores setting information Iset input from a user interface such as a keyboard or a mouse in the storage unit 238.
- the monitoring unit 239 monitors the operating status of the monitoring target device based on the monitoring information Imon notified from the monitoring information acquisition unit 233 of the in-line devices 232a to 232n. More specifically, the monitoring unit 239 acquires the setting information Iset stored in the storage unit 238, specifies the monitoring target device and the control target device, and sets the discharge stop condition and stop set for the monitoring target device. Get the release condition. The monitoring unit 239 compares the information of each monitoring item included in the notified monitoring information Imon with the discharge stop condition and stop cancellation condition defined in the setting information Iset stored in the storage unit 237.
- the monitoring unit 239 When the monitoring information Imon satisfies the discharge stop condition, the monitoring unit 239 transmits a substrate discharge stop instruction Csus to the operation control unit 234 of the control target apparatus via the network I / Fs 240 and 236. On the other hand, when the monitoring information Imon satisfies the stop cancellation condition, the monitoring unit 239 transmits a board stop cancellation instruction Csus to the operation control unit 234 of the control target apparatus via the network I / Fs 240 and 236.
- the monitoring unit 239 issues a buffering instruction Cbus for storing a substrate in a specific in-process state to the buffer device located upstream of the monitoring target device in conjunction with the issuance of the discharge presentation instruction Csus. May be.
- This buffering instruction Cbuf is given, for example, in order to prevent an in-process substrate to be processed by the failed process apparatus from staying on the line when one process apparatus in a certain process fails.
- the monitoring unit 239 may specify a substrate to be stored in the buffer device by the buffering instruction Cbuf. Stopping of buffering may be instructed as appropriate when the monitored device is restored.
- the monitoring unit 239 determines that the number of empty stages in the buffer device to which the buffering instruction Cbuf is given is small (for example, when the number of empty stages is smaller than a predetermined threshold), and the buffer substrate alone cannot store the staying substrate. In this case, the monitoring unit 239 can issue a buffering instruction Cbuf to the upstream buffer device.
- monitoring information Imon referred to by the control device 231 according to the present embodiment, monitoring items monitored by the control device 231, discharge stop conditions and stop release conditions for each monitoring item will be described.
- the substrate residence time is the time during which the same substrate exists at a specific position in the monitoring target apparatus.
- the line control system 230 uses substrate position information indicating the substrate position in the monitoring target apparatus.
- the substrate position information is information indicating whether or not there is a substrate at a predetermined position (provided at one or more locations) in the monitoring target apparatus.
- the monitoring unit 239 calculates the time (substrate retention time) that the substrate is continuously present on each position based on the presence or absence of the substrate on each position. To do.
- a residence time threshold is set as a discharge stop condition, and the elapse of a predetermined time from the discharge stop is set as a stop release condition.
- the monitoring unit 239 issues a discharge stop instruction Csus to the control target apparatus when the substrate residence time calculated for a certain monitoring target apparatus exceeds a set threshold, and then the discharge stop instruction Csus A stop cancellation instruction Cres is issued when a predetermined time has passed since the issue.
- the number of empty stages in buffer device is information used when the buffer device is set as the monitoring target device.
- the monitoring information acquisition unit 233 provided in the buffer device updates the number of empty stages every time the board is stored and dispensed, and notifies the monitoring unit 239 of empty stage number information indicating the number of empty stages.
- the lower limit value of the empty stage number is set as the discharge stop condition
- the upper limit value of the empty stage number is set as the stop release condition
- the monitoring unit 239 issues a discharge stop instruction Csus to the control target device when the number of empty stages in a certain monitoring target buffer is less than or equal to the set lower limit value, and then the number of empty stages is set.
- a stop cancellation instruction Cres is issued.
- the discharge of the substrate of the device to be controlled is controlled based on the number of empty stages of the buffer device, that is, the remaining absorption capacity, the retention of the substrate can be forcibly eliminated. If this control is performed in combination with the control based on the substrate residence time of item 1 above, it is effective because the residence that cannot be eliminated by stopping the substrate discharge for a certain time can be eliminated.
- a plurality of positions where the presence / absence of a substrate can be detected is defined in advance in each apparatus.
- Each position can be set at a part where the substrate is carried in and out of the process apparatus and the buffer apparatus, a part where processing is performed in the process apparatus, the inside of the buffer apparatus, and an arbitrary place on the transfer path of the transfer apparatus.
- the monitoring zone refers to a range defined by a combination of a plurality of positions arbitrarily selected from these predefined positions.
- all positions defined in the transport device 212, the buffer device 221, the coating devices 205 a and 205 b, the inspection device 217, the transport device 213, and the buffer device 222 are selected and surrounded by a two-dot chain line. It is possible to set the Z 1 part as surveillance zone.
- the monitoring zone is defined by a combination of all positions defined in devices that are continuously arranged.
- the position selection method is not particularly limited, and can be arbitrarily selected. .
- the monitoring zone may be defined by selecting only a part of positions defined in each device or by simultaneously selecting positions of devices that are not directly connected.
- more flexible substrate flow control can be realized by monitoring the number of substrates present in the set monitoring zone.
- the monitoring zone can be defined by setting information input via the setting unit 238 and is stored in the storage unit 237.
- the number of substrates in the monitoring zone is calculated by the monitoring unit 239 based on substrate position information notified from each monitoring target device included in the monitoring zone.
- the upper limit value of the number of substrates is set as a discharge stop condition, and the lower limit value of the number of substrates is set as a stop release condition.
- the monitoring unit 239 issues a discharge stop instruction Csus to the control target device when the number of substrates in the monitoring zone calculated for a certain monitoring zone is equal to or greater than the set upper limit value, and then calculates When the number of substrates in the monitoring zone becomes less than the set lower limit value, a stop cancellation instruction Cres is issued.
- the substrate discharge of the control target device is controlled based on the number of substrates flowing in the monitoring zone in this way, the retention of the substrate can be forcibly eliminated. If this control is performed in combination with the control based on the substrate residence time of item 1 above, it is effective because the residence that cannot be eliminated by stopping the substrate discharge for a certain time can be eliminated.
- Substrate residence time in buffer device is information used when the buffer device is set as the monitoring target device, and represents the elapsed time since the substrate was stored in the buffer device.
- the monitoring information acquisition unit 233 provided in the buffer device measures the residence time for each stored substrate, and notifies the monitoring unit 239 of the measured time as the residence time information in the buffer device.
- the upper limit value of the residence time is set as the discharge stop condition, and the monitoring unit 239 has exceeded the upper limit value set for the substrate residence time in the monitored buffer device.
- a discharge stop instruction Csus is issued to the control target device.
- the number of substrates in a predetermined zone including the buffer device is used as the stop cancellation condition.
- FIG. 8 is a schematic diagram showing a part of the line shown in FIG. In FIG. 8, positions defined on the conveyance path of the conveyance device 212 are indicated by triangular marks. In the example of FIG. 8, it is assumed that the monitoring target device is the buffer device 221 and the control target device is the cleaning device 204a.
- the buffer device 221 is provided inline on the transport path of the transport device 212, and stores the substrate on the transport path of the transport device 212 and discharges the substrate to the transport path. First in, last out). Therefore, the substrate 226 that is initially stored with the buffer device 221 empty remains in the buffer device 221 until all other storage substrates are discharged.
- the monitoring unit 239 issues a discharge stop instruction Csus to the cleaning device 204a when the retention time in the buffer device of the substrate 226 exceeds the set upper limit value.
- a control method for restarting the dispensing of the substrate from the cleaning device 204a after the discharge stop instruction Csus is issued for example, when all the substrates stored in the buffer device 221 are discharged, the cleaning device 204a is stopped. It is possible to issue a release instruction.
- the issue timing of the stop release instruction Cres is controlled in consideration of the time until the substrate discharged from the cleaning device 204a to be controlled reaches the buffer device 221 in the subsequent stage.
- a range (range surrounded by a two-dot chain line) defined by a combination of the buffer device 221 and the n positions P 1 to P n on the upstream side is defined as one zone. defined as Z 2, when the number of substrates present in the said zone Z 2 is equal to or less than a predetermined threshold value, the control unit 239 issues a stop cancellation instruction Cres against cleaning device 204a.
- the zone Z 2 can be defined by setting information input via the setting unit 238 and stored in the storage unit 237, similarly to the monitoring zone.
- the control unit 239 issues a stop cancellation instruction Cres.
- the cleaning device 4 a resumes the delivery of the substrate and discharges the substrate 228 to the transport device 212.
- the long substrate 226 of the most residence time sets the value of the threshold Th to be discharged from the buffer 221 In this case, as shown in FIG. 8D, the substrate can be transported without interruption, and the operating efficiency of the line can be improved.
- the device operating state is information indicating whether the monitoring target device is operating normally.
- the monitoring information acquisition unit 233 periodically notifies the monitoring unit 239 of normal operation information in which a case where the operation unit 235 is in normal operation and a case other than that are expressed in binary.
- the normal operation information is set to change from a value indicating a normal state to a value indicating an abnormal state as a discharge stop condition, and the normal operation information represents an abnormal state as a stop cancellation condition A change from a value to a value representing a normal state is set.
- the monitoring unit 239 issues a discharge stop instruction Csus to the control target device when a certain monitoring target device changes to an abnormal state, and then when the monitoring target device returns to a normal state. Then, a stop cancellation instruction Cres is issued to the control target device.
- the buffering instruction Cbuf by the monitoring unit 239 described above may be combined with any of the monitoring controls described in items 1 to 5 above.
- By issuing the buffering instruction Cbuf together with the substrate discharge stop instruction Csus it is possible to secure a transport path in which no stagnation or apparatus abnormality has occurred and to continue processing by some apparatuses. Become.
- FIG. 9 is a flowchart showing a control process performed by the monitoring unit shown in FIG.
- steps S201 to S205 the monitoring unit 239 determines whether or not the substrate discharge stop condition defined for each monitoring item is satisfied based on the monitoring information notified from the monitoring target device. Note that the processing of these steps S201 to S205 can be performed in an arbitrary order.
- the monitoring unit 239 sets 1 to the flags (flg1 to flg5) for the monitoring items that satisfy the substrate discharge stop condition, and sets the flag to 0 for the other monitoring items, and proceeds to step S206.
- step S206 the monitoring unit 239 obtains a logical sum of the flags flg1 to flg5 set in steps S201 to S205, and proceeds to step S207.
- step S207 the monitoring unit 239 determines whether or not the obtained logical sum is 1. If the calculated logical sum is 1 (Yes in step S207), the process proceeds to step S208, and otherwise (No in step S207), the process returns to steps S201 to S205.
- step S208 the monitoring unit 239 issues a substrate discharge stop instruction to the operation control unit 234 of the control target device set for the monitoring target device, and proceeds to steps S209 to S213.
- the monitoring unit 239 determines whether or not the stop cancellation condition defined for each monitoring item is satisfied based on the monitoring information notified from the monitoring target device. Note that the processing of these steps S209 to S213 can be performed in an arbitrary order.
- the monitoring unit 239 sets 1 to the flags (flg6 to flg10) for the monitoring items that satisfy the stop cancellation condition, and sets the flag to 0 for the other monitoring items, and proceeds to step S214.
- step S214 the monitoring unit 239 obtains a logical product of the flags flg6 to flg10 set in steps S209 to S213, and proceeds to step S215.
- step S215 the monitoring unit 239 determines whether or not the obtained logical product is 1. If the calculated logical product is 1 (Yes in step S215), the process proceeds to step S216, and otherwise (No in step S215), the process returns to steps S209 to S213.
- step S216 the monitoring unit 239 issues a stop cancellation instruction to the operation control unit 234 of the control target device set for the monitoring target device, and proceeds to step S217.
- step S217 the monitoring unit 239 terminates the control process when monitoring is stopped (Yes in step S217), and returns to steps S201 to S205 in the other cases (No in step S217).
- the unprocessed substrate is transported in the order of “carry-in apparatuses 201a and 201b—cleaning apparatus 204a—conveying apparatus 202—coating apparatus 205a” in order to perform the coloring pattern forming process for the first color.
- the control apparatus 231 uses the carry-in apparatuses 201a and 201b on the upstream side of the coating apparatus 205a and the cleaning apparatus 205a (control target apparatus).
- the buffer device 221 In addition to stopping the discharge of the substrate, the buffer device 221 is instructed to store in the buffer device 221 the substrate to be processed by the coating device 205a (the substrate discharged from the cleaning device 205a and already transferred by the transfer device 212). If such control is performed, since the transport path for the coating apparatus 205b in normal operation is secured, it is possible to continue the color pattern forming process for other colors. It is possible to prevent the substrate (in-process substrate to be processed by the coating apparatus 205a) from continuing to flow in the line.
- the control apparatus 231 (FIG. 6) performs the loading apparatuses 201a and 201b on the upstream side of the coating apparatus 205a. And the cleaning device 205a (control target device) are instructed to cancel the stop, that is, restart the substrate discharge.
- control target is also applicable when the monitoring target device is another device or when the discharge stop condition is satisfied in another monitoring item.
- the discharge of the substrate by the apparatus can be similarly controlled.
- the control unit 239 acquires the operating status of each in-line device, monitors the acquired operating status of each in-line device, It is determined whether or not the supply of the substrate to the monitoring target device is to be restricted, and based on the determination result, the discharge of the substrate is stopped and released by the at least one control target device.
- the control unit 239 By controlling the discharge of the substrate by a part of the devices upstream of the monitored device in this way, the substrate stays even in a production line in which a substrate having a different in-process state flows while sharing the in-line device. Can be suppressed and the throughput can be improved. Further, by suppressing the retention of the substrate, it is possible to prevent an increase in processing time from the start to the completion of the formation of a colored pattern of a certain color, so that the quality of the color filter can be improved.
- the monitoring target Processing by a device that is operating normally other than the device can be continued.
- the example in which the monitoring information acquisition unit and the operation control unit are realized by the computer included in the in-line apparatus has been described.
- the monitoring information acquisition is performed using a separate computer terminal that can control the in-line control apparatus.
- the operation control unit may be configured.
- the present invention can be used, for example, in a production line for producing a color filter used in a liquid crystal display device.
Abstract
Description
図1は、本発明の第1の実施形態に係るカラーフィルタ製造ラインの一部を示す模式図である。図1においては、カラーフィルタ製造工程のうち、フォトリソグラフィ法によって4色の着色パターンを形成するための処理ラインのみが示されている。また、図1における矢印は、各装置間の接続関係と基板の搬送方向とを示している。 (First embodiment)
FIG. 1 is a schematic diagram showing a part of a color filter production line according to the first embodiment of the present invention. FIG. 1 shows only processing lines for forming a colored pattern of four colors by a photolithography method in the color filter manufacturing process. Moreover, the arrows in FIG. 1 indicate the connection relationship between the apparatuses and the transport direction of the substrate.
搬入装置LDから搬送装置101aに投入された基板の搬送ルートは、次の通りである。 <First Color (Black) Colored Pattern Formation Process>
The transport route for the substrate loaded from the carry-in device LD into the
搬入装置LD-搬送装置101a-洗浄装置110a-搬送装置102a-塗布装置111a-搬送装置103-(抜き取り検査装置117-搬送装置103)-検査装置115a-搬送装置104-露光装置112a-搬送装置105-現像装置113a-搬送装置106-(抜き取り検査装置118-搬送装置106)-ベーク装置114a-搬送装置107-検査装置116-搬送装置108b-(抜き取り検査装置119または抜き取り検査装置120-搬送装置108b)-搬送装置101a
Loading device LD-Conveying
搬送装置108bから搬送装置101aに投入された基板の搬送ルートは、次の通りである。 <Second Color (Red) Colored Pattern Formation Process>
The transport route of the substrate put into the
搬送装置101a-洗浄装置110a-搬送装置102a-塗布装置111a-搬送装置103-(抜き取り検査装置117-搬送装置103)-検査装置115a-搬送装置104-露光装置112a-搬送装置105-現像装置113a-搬送装置106-(抜き取り検査装置118-搬送装置106)-ベーク装置114a-搬送装置107-検査装置116-搬送装置108a-搬送装置101b
Conveying
搬送装置108aから搬送装置101bに投入された基板の搬送ルートは、次の通りである。 <Third color (green) coloring pattern formation process>
The transport route of the substrate put into the
搬送装置101b-洗浄装置110b-搬送装置102b-塗布装置111b-搬送装置103-(抜き取り検査装置117-搬送装置103)-検査装置115b-搬送装置104-露光装置112b-搬送装置105-現像装置113b-搬送装置106-(抜き取り検査装置118-搬送装置106)-ベーク装置114b-搬送装置107-搬送装置108a-搬送装置101b
搬送装置108aから搬送装置101bに投入された基板の搬送ルートは、次の通りである。 <Fourth Color (Blue) Colored Pattern Formation Process>
The transport route of the substrate put into the
搬送装置101b-洗浄装置110b-搬送装置102b-塗布装置111b-搬送装置103-(抜き取り検査装置117-搬送装置103)-検査装置115b-搬送装置104-露光装置112b-搬送装置105-現像装置113b-搬送装置106-(抜き取り検査装置118-搬送装置106)-ベーク装置114b-搬送装置107-検査装置116-搬送装置108b(抜き取り検査装置119または抜き取り検査装置120-搬送装置108b)-搬出装置ULD Transport route 4
図4は、本発明の第2の実施形態に係るカラーフィルタ製造ラインの一部を示す模式図である。 (Second Embodiment)
FIG. 4 is a schematic view showing a part of a color filter production line according to the second embodiment of the present invention.
図5は、本発明の第3の実施形態に係るカラーフィルタ製造ラインの一部を示す模式図である。図5においては、カラーフィルタ製造工程のうち、フォトリソグラフィ法によって4色の着色パターンを形成するための処理ラインのみが示されている。また、図5における矢印は、各装置間の接続関係と基板の搬送方向とを表している。 (Third embodiment)
FIG. 5 is a schematic diagram showing a part of a color filter production line according to the third embodiment of the present invention. FIG. 5 shows only processing lines for forming a colored pattern of four colors by a photolithography method in the color filter manufacturing process. In addition, the arrows in FIG. 5 represent the connection relationship between the apparatuses and the substrate transport direction.
基板滞留時間とは、監視対象装置内の特定ポジションに同一の基板が存在する時間のことである。基板滞留時間を監視するために、本実施形態に係るライン制御システム230は、監視対象装置内における基板位置を示す基板位置情報を用いる。基板位置情報は、監視対象装置内に予め規定された所定のポジション(1カ所以上設けられる)に基板があるか否かを示す情報である。監視部239は、監視情報取得部233から通知される基板位置情報に基づき、各ポジション上の基板の有無に基づいて、各ポジション上に継続して基板が存在する時間(基板滞留時間)を算出する。 <1. Substrate residence time>
The substrate residence time is the time during which the same substrate exists at a specific position in the monitoring target apparatus. In order to monitor the substrate residence time, the
バッファ装置の空段数は、監視対象装置としてバッファ装置が設定されている場合に使用される情報である。バッファ装置に設けられた監視情報取得部233は、基板の格納及び払出の度に空段数を更新し、空段数を示す空段数情報を監視部239に通知する。 <2. Number of empty stages in buffer device>
The number of empty stages of the buffer device is information used when the buffer device is set as the monitoring target device. The monitoring
上述したように、各装置内には、基板の有無を検出できる複数のポジションが予め規定されている。各ポジションは、プロセス装置やバッファ装置に基板を搬出入する部分や、プロセス装置内で処理が行われる部分、バッファ装置内部、搬送装置の搬送路上の任意の箇所等に設定できる。監視ゾーンとは、これら予め規定されたポジションから任意に選択された複数のポジションの組み合わせによって規定される範囲をいう。 <3. Number of boards in monitoring zone>
As described above, a plurality of positions where the presence / absence of a substrate can be detected is defined in advance in each apparatus. Each position can be set at a part where the substrate is carried in and out of the process apparatus and the buffer apparatus, a part where processing is performed in the process apparatus, the inside of the buffer apparatus, and an arbitrary place on the transfer path of the transfer apparatus. The monitoring zone refers to a range defined by a combination of a plurality of positions arbitrarily selected from these predefined positions.
バッファ装置内基板滞留時間は、監視対象装置としてバッファ装置が設定されている場合に使用される情報であり、基板がバッファ装置に格納されてからの経過時間を表す。バッファ装置に設けられた監視情報取得部233は、格納されている基板毎に滞留時間を計測し、計測した時間をバッファ装置内滞留時間情報として監視部239に通知する。 <4. Substrate residence time in buffer device>
The substrate retention time in the buffer device is information used when the buffer device is set as the monitoring target device, and represents the elapsed time since the substrate was stored in the buffer device. The monitoring
装置運転状態は、監視対象装置が正常運転中であるか否かを示す情報である。監視情報取得部233は、例えば動作部235が正常運転中である場合とそれ以外の場合とを2値で表現した正常運転情報を定期的に監視部239に通知する。 <5. Device operating status>
The device operating state is information indicating whether the monitoring target device is operating normally. For example, the monitoring
109 ストッカ装置
110 洗浄装置
111 塗布装置
112 露光装置
113 現像装置
114 ベーク装置
121 着色パターン形成ライン
122 バッファ装置
LD 搬入装置
ULD 搬出装置
201 カラーフィルタ製造ライン1
204 洗浄装置
205 塗布装置
206 露光装置
207 現像装置
208 ベーク装置
211~216 搬送装置
221~224 バッファ装置
230 ライン制御システム
231 制御装置 101 to 108
204 Cleaning device 205 Coating device 206 Exposure device 207 Development device 208
Claims (12)
- 基板上に少なくとも4色の着色パターンを順次形成するカラーフィルタ製造ラインであって、
基板を格納するストッカ装置と、
フォトリソグラフィ法の各工程の処理を行うために並列に設けられる複数のプロセス装置と、前記プロセス装置間を接続し、基板上に形成された着色パターンに基づいて、所定のプロセス装置に基板を搬送する複数の搬送装置とを含み、フォトリソグラフィ法の各工程において、プロセス装置の少なくとも1つを2色の着色パターン形成に共用する着色パターン形成ラインと、
前記ストッカ装置から供給される基板を前記着色パターン形成ラインに搬入する搬入装置と、
前記着色パターン形成ラインから排出された基板を前記ストッカ装置へと搬出する搬出装置とを備え、
前記着色パターン形成ラインは、基板上に必要な着色パターンが形成されるまで繰り返し基板を循環させ、必要な着色パターンが形成された基板を前記搬出装置に排出する、カラーフィルタ製造ライン。 A color filter production line for sequentially forming at least four colored patterns on a substrate,
A stocker device for storing substrates;
A plurality of process devices provided in parallel for processing each step of the photolithography method and the process devices are connected to each other, and the substrate is transported to a predetermined process device based on the colored pattern formed on the substrate. A colored pattern forming line that shares at least one of the process devices for forming two color patterns in each step of the photolithography method,
A carry-in device for carrying the substrate supplied from the stocker device into the colored pattern forming line;
An unloading device for unloading the substrate discharged from the colored pattern forming line to the stocker device;
The colored pattern forming line is a color filter manufacturing line in which the substrate is repeatedly circulated until a necessary colored pattern is formed on the substrate, and the substrate on which the necessary colored pattern is formed is discharged to the carry-out device. - 前記着色パターン形成ライン内を循環する基板を一時的に格納するバッファ装置を更に備え、
前記着色パターン形成ラインは、前記バッファ装置への基板の格納及び前記バッファ装置からの基板の排出を行うことにより、前記2色の着色パターン形成に共用されるプロセス装置に対して、当該2色のうちの一方の色の着色パターンを形成すべき基板と、当該2色のうちの他方の色の着色パターンを形成すべき基板とを交互に供給する、請求項1に記載のカラーフィルタ製造ライン。 A buffer device for temporarily storing a substrate circulating in the colored pattern forming line;
The colored pattern forming line stores the substrate in the buffer device and discharges the substrate from the buffer device, so that the two-colored pattern forming line can The color filter production line according to claim 1, wherein a substrate on which a colored pattern of one of the colors is to be formed and a substrate on which the colored pattern of the other of the two colors is to be formed are alternately supplied. - 複数のプロセス装置と、前記プロセス装置を接続する複数の搬送装置と、複数の基板を一時的に格納するバッファ装置とを含み、前記プロセス装置及び前記搬送装置を複数色の着色パターン形成に共用するカラーフィルタ製造ラインを制御するライン制御システムであって、
前記プロセス装置、前記搬送装置及び前記バッファ装置の各々の稼働状況を示す監視情報を取得する監視情報取得手段と、
前記プロセス装置、前記搬送装置及び前記バッファ装置の動作を制御する動作制御手段と、
前記監視情報取得手段から通知される監視情報に基づいて、監視対象装置の稼働状況を監視し、前記動作制御手段に対して、監視対象装置の上流側に位置する少なくとも1つの装置からの基板の排出停止及び停止解除を指示する監視手段とを備える、ライン制御システム。 A plurality of process apparatuses; a plurality of transfer apparatuses that connect the process apparatuses; and a buffer apparatus that temporarily stores a plurality of substrates, and the process apparatus and the transfer apparatus are shared for forming a colored pattern of a plurality of colors. A line control system for controlling a color filter production line,
Monitoring information acquisition means for acquiring monitoring information indicating the operating status of each of the process device, the transfer device, and the buffer device;
Operation control means for controlling operations of the process device, the transfer device, and the buffer device;
Based on the monitoring information notified from the monitoring information acquisition means, the operating status of the monitoring target device is monitored, and the substrate from at least one device located upstream of the monitoring target device is monitored with respect to the operation control means. A line control system comprising: monitoring means for instructing to stop and release the discharge. - 前記監視情報は、各装置内における基板位置を示す基板位置情報を含み、
前記監視手段は、通知される基板位置情報に基づいて監視対象装置内の基板の滞留時間を算出し、算出した滞留時間が所定の閾値以上になったと判定した場合に前記排出停止を指示し、前記排出停止の指示から所定時間経過後に前記停止解除を指示する、請求項3に記載のライン制御システム。 The monitoring information includes substrate position information indicating a substrate position in each apparatus,
The monitoring means calculates the residence time of the substrate in the monitoring target device based on the notified substrate position information, and instructs the stoppage of discharge when it is determined that the calculated residence time is equal to or greater than a predetermined threshold, The line control system according to claim 3, wherein the stop cancellation is instructed after a predetermined time has elapsed from the discharge stop instruction. - 前記監視情報は、前記バッファ装置の空段数を示す空段数情報を含み、
前記監視手段は、通知される空段数情報に基づいて監視すべきバッファ装置の空段数が所定の下限値以下になった場合に前記排出停止を指示し、空段数が所定の上限値を超えた場合に前記停止解除を指示する、請求項3に記載のライン制御システム。 The monitoring information includes empty stage number information indicating the empty stage number of the buffer device,
The monitoring means instructs the discharge stop when the number of empty stages of the buffer device to be monitored is equal to or lower than a predetermined lower limit value based on the notified empty stage number information, and the empty stage number exceeds a predetermined upper limit value. The line control system according to claim 3, wherein the stop cancellation is instructed in a case. - 前記監視情報は、各装置内における基板位置を示す基板位置情報を含み、
前記監視手段は、前記カラーフィルタ製造ライン内に予め規定された複数の位置から選択された複数の位置の組み合わせを監視ゾーンとして定義し、通知される基板位置情報に基づいて前記監視ゾーン内の基板枚数を算出し、算出した基板枚数が所定の上限値以上になった場合に前記排出停止を指示し、算出した基板枚数が所定の下限値未満となった場合に前記停止解除を指示する、請求項3に記載のライン制御システム。 The monitoring information includes substrate position information indicating a substrate position in each apparatus,
The monitoring means defines a combination of a plurality of positions selected from a plurality of positions defined in advance in the color filter production line as a monitoring zone, and a substrate in the monitoring zone based on the notified substrate position information The number of substrates is calculated, the discharge stop is instructed when the calculated number of substrates exceeds a predetermined upper limit value, and the stop cancellation is instructed when the calculated number of substrates is less than a predetermined lower limit value. Item 4. The line control system according to item 3. - 前記監視情報は、バッファ装置内に格納されている基板毎のバッファ装置内滞留時間示すバッファ装置内滞留時間情報を含み、
前記監視手段は、通知されるバッファ装置内滞留時間情報に基づいて、監視すべきバッファ装置内の基板の滞留時間が所定の上限値以上になった場合に前記排出停止を指示し、監視すべきバッファ装置及びその上流側の複数の位置で規定されるゾーン内の基板枚数が所定の閾値以下となった場合に前記停止解除を指示する、請求項3に記載のライン制御システム。 The monitoring information includes dwell time information in the buffer device indicating a dwell time in the buffer device for each substrate stored in the buffer device,
The monitoring means instructs and stops the discharge stop when the residence time of the substrate in the buffer device to be monitored exceeds a predetermined upper limit value based on the notified residence time information in the buffer device. The line control system according to claim 3, wherein the stop cancellation is instructed when the number of substrates in a zone defined by the buffer device and a plurality of positions on the upstream side thereof is equal to or less than a predetermined threshold value. - 前記監視情報は、各装置が正常運転中であるか否かを示す正常運転情報を含み、
前記監視手段は、通知される正常運転情報に基づいて、監視対象装置の稼働状態が正常から異常に変化した場合に前記排出停止を指示し、前記稼働状態が異常から正常に復帰した場合に前記停止解除を指示する、請求項3に記載のライン制御システム。 The monitoring information includes normal operation information indicating whether each device is operating normally,
The monitoring means instructs the discharge stop when the operating state of the monitored device changes from normal to abnormal based on the notified normal operation information, and when the operating state returns from normal to normal The line control system according to claim 3, wherein a stop release is instructed. - 前記監視手段は、前記排出停止を指示をする場合、更に、監視対象装置の上流側のバッファ装置に対して、監視対象装置によって処理すべき基板の格納を指示する、請求項3~8のいずれかに記載のライン制御システム。 The monitoring means, when instructing the stop of discharge, further instructs the buffer device upstream of the monitoring target device to store a substrate to be processed by the monitoring target device. A line control system according to the above.
- 前記監視情報に含まれる情報毎に定義された基板の排出停止条件及び停止解除条件と、少なくとも1つの監視対象装置を特定する情報と、前記監視対象装置の上流側に位置し、基板の排出を制御すべき装置を特定する情報とを記憶する記憶手段と、
前記記憶手段に記憶される情報を設定するための設定手段とを更に備え、
前記監視手段は、通知される前記監視情報と前記記憶手段に記憶される前記排出停止条件及び停止解除条件との比較結果に基づいて、前記排出停止及び前記停止解除を決定する、請求項3~9のいずれかに記載のライン制御システム。 Substrate discharge stop condition and stop release condition defined for each information included in the monitoring information, information for identifying at least one monitoring target device, and upstream of the monitoring target device, the discharge of the substrate Storage means for storing information identifying a device to be controlled;
Setting means for setting information stored in the storage means;
The monitoring unit determines the discharge stop and the stop release based on a comparison result between the notified monitoring information and the discharge stop condition and the stop release condition stored in the storage unit. The line control system according to any one of 9. - 複数のプロセス装置と、前記プロセス装置を接続する複数の搬送装置と、複数の基板を一時的に格納するバッファ装置とを含み、前記プロセス装置及び前記搬送装置を複数色の着色パターン形成に共用するカラーフィルタ製造ラインを制御するライン制御方法であって、
前記プロセス装置、前記搬送装置及び前記バッファ装置の各々の稼働状況を取得し、
取得した各装置の稼働状況を監視し、監視対象装置に対する基板の供給を制限するか否かを判定し、
判定結果に基づいて、前記監視対象装置の上流側の少なくとも1つによる基板の排出停止及び停止解除を行う、ライン制御方法。 A plurality of process apparatuses; a plurality of transfer apparatuses that connect the process apparatuses; and a buffer apparatus that temporarily stores a plurality of substrates, and the process apparatus and the transfer apparatus are shared for forming a colored pattern of a plurality of colors. A line control method for controlling a color filter production line,
Obtaining the operating status of each of the process device, the transfer device and the buffer device;
Monitor the operating status of each acquired device, determine whether to limit the supply of substrates to the monitored device,
A line control method for stopping and releasing the substrate discharge by at least one of the upstream side of the monitoring target device based on a determination result. - 基板上に複数色の着色パターンを形成するカラーフィルタ製造ラインであって、
フォトリソグラフィ法の各工程の処理を行い、複数色の着色パターン形成に共用されるプロセス装置と、
前記プロセス装置を接続し、複数色の着色パターン形成に共用される複数の搬送装置と、
複数の基板を一時的に格納するバッファ装置と、
前記プロセス装置、前記搬送装置及び前記バッファ装置の各々を制御する制御装置とを備え、
前記プロセス装置、前記搬送装置及び前記バッファ装置の各々は、
稼働状況を示す監視情報を取得する監視情報取得部と、
前記制御装置からの指示に従って、動作を制御する動作制御部とを含み、
前記制御装置は、前記監視情報取得部から送信された監視情報に基づいて、監視対象装置の稼働状況を監視し、監視対象装置の上流側の少なくとも1つの装置の動作制御部に対して、基板の排出停止及び停止解除を指示する、カラーフィルタ製造ライン。 A color filter production line for forming a colored pattern of a plurality of colors on a substrate,
A process apparatus that performs processing of each step of the photolithography method and is shared for forming a colored pattern of a plurality of colors;
A plurality of transfer devices that connect the process devices and are shared by a plurality of color patterns;
A buffer device for temporarily storing a plurality of substrates;
A control device that controls each of the process device, the transfer device, and the buffer device;
Each of the process device, the transfer device, and the buffer device,
A monitoring information acquisition unit for acquiring monitoring information indicating the operating status;
An operation control unit for controlling the operation according to an instruction from the control device,
The control device monitors the operating status of the monitoring target device based on the monitoring information transmitted from the monitoring information acquisition unit, and provides a substrate for the operation control unit of at least one device upstream of the monitoring target device. A color filter production line that instructs to stop and release the discharge.
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