JP5365274B2 - Exposure equipment - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a means for efficiently transferring a plurality of exposure patterns by exposure by a single apparatus employing a scanning exposure system, in particular, to provide an exposure apparatus for successively processing a color filter substrate having two color filter patterns of different types by a single scanning exposure apparatus over different two color processes without interruption, and to provide an exposure method for patterns of different types by using the apparatus. <P>SOLUTION: The exposure apparatus for transferring different types of exposure patterns on a processed substrate having a photosensitive layer formed thereon includes at least a first substrate conveying means, a second substrate conveying means, a substrate receiving stage, an aligning means, an exposure section, a substrate carrying-out section, and a control means, wherein the exposure section comprises a plurality of exposure units. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

  The present invention relates to an exposure apparatus that exposes an imposition filter pattern on a multi-faced color filter substrate and an exposure method for different types of patterns using the same, and in particular, an exposure apparatus that can efficiently expose a filter pattern with a single exposure line. The present invention also relates to an exposure method for different patterns using the same.

In recent years, with the increase in large color televisions, notebook computers, and portable electronic devices, there has been a remarkable increase in demand for liquid crystal displays, particularly color liquid crystal display panels.
The color filter substrate used in the color liquid crystal display panel is a pattern substrate exposure using a photomask as a colored filter composed of a black matrix, a red filter, a green filter, a blue filter, etc. on a transparent substrate composed of a glass substrate, It is formed through a photolithography process that performs a patterning process such as development.

  Recently, there is a demand for an increase in the size of the color liquid crystal display panel itself, and an improvement in production efficiency is also strongly demanded. Therefore, for the color filter substrate used, for example, the size of the mother glass is increased to be used for a large display panel. It is particularly important to efficiently manufacture a large-sized multicolored color filter substrate including a large number of patterns.

  The photolithography process often includes a process of forming protrusions for controlling the alignment of the liquid crystal in addition to the process of forming the color filters and spacers of the respective colors. In particular, increasing production efficiency has become important.

  In the exposure process, in order to obtain high productivity, a batch exposure type photomask is often used in order to obtain high productivity. However, the mother glass size of the color filter substrate is further increased. As the size of photomasks increases, the difficulty in manufacturing a batch exposure type photomask increases and the cost becomes high, and the problems of the batch exposure processing method become larger. For this reason, development of a so-called scan exposure method is progressing, in which a plurality of small-sized photomasks that are inexpensive and easy to manufacture are arranged and exposed while scanning the color filter substrate directly under the photomask.

  With respect to the pattern arrangement on the color filter substrate, in order to improve the imposition efficiency of the color filter substrate, for example, as shown in FIG. A and B are usually two different patterns. As the size of the mother glass increases, the degree of freedom in the pattern arrangement of the color filters to be imposed further increases.

  However, in the scanning exposure method, since the exposure is performed while scanning the color filter substrate directly under the photomask, only one exposure can be repeated repeatedly in the scanning direction during one scan, and the exposure pattern differs. The A and B types of patterns cannot be exposed during one scan. Therefore, as described above, in the case of imposing the color filters of two different patterns of A and B and performing the scan exposure process, it is necessary to process the A pattern and the B pattern in different scan operations.

As an example of the scan exposure process when two kinds of the above-mentioned different patterns are mixed, two exposure apparatuses are installed, and different patterns are exposed by different apparatuses, respectively, or the pattern of the exposure area in the photomask By switching between and using, one exposure apparatus performs two passes (two scans) to perform exposure, either. In the former case, the number of exposure apparatuses is two, and the entire exposure system including the transport portion requires twice the equipment cost and installation area, leading to an increase in production cost.

  In the latter case, the production capacity is also halved, resulting in an increase in production cost. For the purpose of this improvement, the present inventor has proposed an exposure apparatus that can efficiently expose a color filter pattern in which two different patterns are mixed with one exposure apparatus, and an exposure method for different patterns using the same (Patent Document). 1).

  With the proposed exposure apparatus and the different pattern exposure method using the same, a single exposure apparatus can efficiently expose a color filter pattern in which two kinds of different patterns are mixed, so that a multi-faced substrate can be obtained without reducing the production efficiency. It was possible to expose different color filter patterns. However, it is difficult to efficiently expose a product having many repeated exposure processes such as a color filter substrate to an arbitrary different exposure process using a single exposure apparatus. For example, when a color filter substrate in which two different types of exposure patterns are mixed and manufactured continuously without any stagnation by using one exposure apparatus across different color processes, there are four types of photomask patterns for scan exposure. I need it. Further, in order to perform exposure processing on a color filter substrate in which three different exposure patterns are mixed, even when only a single color process is continuously flowed, the proposed exposure apparatus and the different pattern using the same are used. With this exposure method, a sufficient effect cannot be obtained.

JP 2008-310217 A

  The present invention is proposed in view of the above problems, and the problem to be solved by the present invention is to provide means for efficiently exposing a plurality of exposure patterns with a single apparatus in a scan exposure method. In particular, an exposure apparatus for continuously processing a color filter substrate having two different color filter patterns across two different color processes by one scanning exposure apparatus without stagnation, and the same It is to provide a method for exposing different types of patterns used.

As means for solving the above-mentioned problems, the invention according to claim 1 is characterized in that the processing substrate on which the photosensitive layer is formed has an A1 pattern and B1 pattern as the first color filter, or A2 as the second color filter. An exposure apparatus that exposes a pattern and a B2 pattern , at least a light source, an alignment mechanism that positions the photomask at a predetermined position, a photomask for a first exposure unit in which the A1 pattern and the B2 pattern are arranged, and A first exposure unit having a shutter mechanism for selecting a pattern to be exposed from the A1 pattern and the B2 pattern, the light source, the alignment mechanism, and a second exposure unit in which the B1 pattern and the A2 pattern are arranged. Photomask, B1 pattern and A2 pattern A second exposure unit having a shutter mechanism for selecting a pattern to be exposed from the screen, a substrate receiving stage having an alignment means for aligning the processing substrate at a predetermined position, and holding the processing substrate at the substrate receiving stage. A first substrate having a first color photosensitive layer formed on the first exposure unit while being transported by the transport device under the control of the control device. Then, the A1 pattern is exposed, and then the B1 pattern of the first color is exposed by the second exposure unit, and then the second processing substrate on which the photosensitive layer of the second color is formed is transported by the transport means. However, the A2 pattern is exposed by the first exposure unit, and then the B2 pattern is exposed by the second exposure unit. And conveying the plate, an exposure apparatus which is characterized in that the exposure of the color filter patterns mixed two to by the selection of the pattern to be exposed by the first exposure unit and the second exposure unit.

  By using the exposure apparatus of the present invention and the exposure method of different patterns using the same, a plurality of exposure patterns can be efficiently exposed with one exposure apparatus in the scan exposure method, and two different color filter patterns are provided. Since the multi-sided color filter substrate can be processed continuously by a single scanning exposure apparatus across two different color processes, it is difficult to dedicate the manufacturing equipment for each color. However, the color filter substrate can be manufactured without relatively reducing the production efficiency. In addition, in common with processes including general exposure processes, it is possible to efficiently form a plurality of different patterns exceeding the number of photomasks that can be accommodated and switched by a single exposure unit on a single wafer substrate to be subjected to exposure processing. It can be carried out.

It is a schematic block diagram which shows one Embodiment of the exposure apparatus of this invention. It is a schematic top view which shows the example of the imposition arrangement | positioning of the color filter pattern of a different size. It is a schematic plan view which shows the example of pattern arrangement | positioning to the photomask of a different type pattern. (A) is a pattern arrangement example of a photomask for a first exposure unit, and (b) is a pattern arrangement example of a photomask for a second exposure unit. It is a schematic plan view which shows the example of arrangement | positioning of each photomask to each exposure unit. (A)-(d) is explanatory drawing which shows the exposure method which exposes a dissimilar pattern to the process board | substrate with which the photosensitive layer was formed using the exposure apparatus of this invention in order of a process.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. In addition, although this description demonstrates in the form accompanied by the switching of a color process along the example of formation of a color filter board | substrate, the switching of a color process changes to the other layer formation in the case of general multi-layer formation It is the same even if it replaces.

FIG. 1 is a schematic block diagram showing an embodiment of an exposure apparatus of the present invention.
The exposure apparatus according to the present invention includes at least a first substrate transport unit 1, a second substrate transport unit 2, a substrate receiving stage 3, an alignment unit (not shown), an exposure unit 5, and a substrate unloading unit 6. And a control means 7, and the exposure unit 5 is composed of a plurality of exposure units. Although the substrate transport direction is indicated by a block arrow in the figure, it is possible to reversely feed a certain section in addition to this description depending on the order of exposure or the like. Two examples of the plurality of exposure units will be described for simplicity, but three or more exposure units may be provided. In the figure, a first exposure unit 51 and a second exposure unit 52 are provided as two exposure units in the order of arrangement from the upstream to the downstream of the entire apparatus.

  Furthermore, the pre-exposure substrate standby unit 41 can be provided on the upstream side of the exposure unit 5. Further, a post-exposure substrate standby unit (not shown) can be provided on the downstream side of the exposure unit 5 and in front of the substrate carry-out unit 6. By adding a function of folding and transporting between the pre-exposure substrate standby part and the post-exposure substrate standby part, it becomes possible to use in irregular exposure order.

  FIGS. 5A to 5D are explanatory views showing, in the order of steps, an exposure method for exposing a different pattern on a processing substrate on which a photosensitive layer is formed using the exposure apparatus of the present invention, and the color of the color filter. Although the description will be made in the form accompanied by the process switching, the same is true if the switching of the color process is replaced with the transition to the other layer formation in the case of the general multi-layer formation. The process shown in FIG. 5 uses an exposure apparatus corresponding to the schematic block diagram showing one embodiment of the exposure apparatus of the present invention shown in FIG. 1, and the explanation of the function of the apparatus is supplemented by FIG.

  The first substrate transport means 1 and the second substrate transport means 2 include at least a substrate fixture 21 for holding the positioned processing substrate 11 and the like, and a moving mechanism for transporting the processing substrate (FIG. Each of which includes at least one set. The substrate fixtures 21 and 22 are processes in which a processing substrate 11 or the like on which a photosensitive layer is formed is supplied from an upstream device (for example, a resist coating device) to the substrate receiving stage 3 and positioned by an alignment means (not shown). The substrate that holds the substrate, the processing substrate held by the substrate fixture is subjected to exposure processing while moving in a held state, the holding is released by the substrate carry-out unit 6, and the other moving mechanism A processing substrate is supplied to a downstream device (for example, a developing device). Further, the substrate fixtures 21 and 22 released from holding the processing substrate return to the substrate receiving stage 3 together with the moving mechanisms of the first substrate transport unit 1 and the second substrate transport unit 2. Various holding methods can be used as a method of holding the processing substrate on the substrate fixtures 21 and 22, but a vacuum suction method is preferable.

  Further, the moving mechanism for transporting and moving the processing substrate while holding it on the substrate fixture is preferably a method in which the fixing jig moves on the rail using a ball screw. Further, the processing substrate after the holding of the substrate transfer means 1 and 2 by the substrate fixtures 21 and 22 is released and discharged to the substrate carry-out unit 6 is generally provided by a transfer belt or the like separately provided in the substrate carry-out unit 6. It is sent downstream by a typical transport mechanism (not shown).

  In the substrate receiving stage 3, the processing substrate 11 and the like on which the photosensitive layer is formed is supplied to the substrate receiving stage 3 from an upstream device (for example, a resist coating device), and each of the exposure units 5 is aligned by an alignment unit (not shown). Positioning is performed so that the position corresponding to the specific alignment mark of the photomask for exposure set in the exposure units 51 and 52 is the same position for each processing substrate.

  In addition, as an alignment means, it has a normal mechanical alignment mechanism and a camera alignment mechanism, and it performs rough alignment with the mechanical alignment mechanism, ensuring accurate alignment accuracy with the camera alignment mechanism, and processing substrate Positioning on the receiving stage 3 is performed quickly and accurately.

  The pre-exposure substrate standby unit 41 serves as a passage region to the exposure unit 5 and also serves as a standby place for receiving the next processing substrate on the substrate receiving stage 3 and holding it in a positioned state. Further, when the exposure order is freely selected, it can be used as a space for giving a degree of freedom to the movement of the processing substrate.

  Here, with reference to FIG. 2, FIG. 3, and FIG. 4, an example of using a photomask will be described by taking as an example the exposure process of a color filter substrate comprising a plurality of imposition arrangements of different sizes and different patterns.

  FIG. 2 is a schematic plan view showing an example of an imposition arrangement of color filter patterns of different sizes, and is an example of a color filter substrate 8 on which a plurality of different patterns of different sizes and different patterns A and B are arranged in a multiple manner. In the case where four imposition color filters (A pattern) 81 and eight imposition color filters (B pattern) 82 are arranged on one color filter substrate 8 in the manufacturing process, the color filter An exposure process for forming each of the color patterns A and B corresponds to each of a plurality of color processes such as the color filter constituting the color filter.

FIG. 3 is a schematic plan view showing an example of pattern arrangement on a photomask of different patterns, where (a) is a pattern of the first exposure unit photomask, and (b) is a pattern of the second exposure unit photomask. It is an example of arrangement. In the first exposure unit photomask 9, for example, the first-color photomask pattern 91 of the A pattern is formed as one element, and the second-color photomask pattern 92 of the B pattern is also one element. It is formed. The two pattern elements are abbreviated as A1 pattern and B2 pattern, respectively. The second exposure unit photomask 10 is formed with, for example, a first-color photomask pattern 101 of the B pattern as one element, and the second-color photomask pattern 102 of the A pattern is also one. Formed as an element. The two pattern elements are abbreviated as B1 pattern and A2 pattern, respectively.

  FIG. 4 is a schematic plan view showing an arrangement example of each photomask in each exposure unit. When the processing substrate 11 or the like transported in the direction indicated by the block arrow from the substrate receiving stage 3 is passed through the first exposure unit 51 and the second exposure unit 52 provided in the exposure unit 5, each exposure unit is exposed. Selective exposure is performed using a plurality of prepared photomasks, that is, a photomask group in which first exposure unit photomasks 9 are arranged and a photomask group in which second exposure unit photomasks 10 are arranged. .

The first exposure unit 51 and the second exposure unit 52 included in the exposure unit 5 are each a storage space (not shown) in which each exposure unit stores a light source (not shown) and two or more photomasks on which patterns are formed. An alignment mechanism (not shown) for positioning the photomask at a predetermined position, and a shutter mechanism (not shown) for selecting a pattern to be exposed from various patterns formed on the photomask. The color filter pattern formed on the photomask is selected by a shutter mechanism, and pattern exposure is performed on the processing substrate on which the photosensitive layer is formed by scanning exposure.
Since different types of color filter patterns are formed on the photomask, the pattern is selected each time by the shutter movement of the shutter mechanism and the shutter opening / closing operation. Alternatively, the position of the shutter mechanism can be fixed and pattern selection can be performed each time by moving the photomask.

  The substrate that has been subjected to the exposure processing by the exposure apparatus of the present invention is released from the substrate unloading unit 6 and is supplied to a downstream device (for example, a developing device). The processing substrate is definitely processed efficiently.

Hereinafter, an exposure method for exposing a different pattern on a processing substrate on which a photosensitive layer has been formed using the exposure apparatus of the present invention will be described in the order of steps with reference to FIG.
First, the first processing substrate 11 on which the first color photosensitive layer is formed is received by the substrate receiving stage 3 from the upstream apparatus, and the first processing substrate 11 is received at a predetermined position on the substrate receiving stage 3 by using the alignment means. In the state aligned with each other, the first processing substrate 11 is held by the substrate fixture 21 of the first substrate transport means 1 (see FIG. 5A).

  Next, while the first processing substrate 11 is transported / moved downstream by the first substrate transport means 1, the second sheet-shaped processing substrate 12 on which the second color photosensitive layer is formed from the upstream apparatus. Is received by the substrate receiving stage 3, and the second processing substrate 12 is aligned with a predetermined position of the substrate receiving stage 3 by using the alignment unit, with the substrate fixture 22 of the second substrate transport unit 2. The second processed substrate 12 is held (see FIG. 5B). The processing substrate newly received by the substrate receiving stage 3 is not only formed with a photosensitive layer, but also often has been subjected to previous pattern formation, but for simplicity, including the case in the following description. Is not shown in the figure.

Next, while the first substrate transport means 1 transports and moves the first processing substrate 11 to the exposure unit 5, the first exposure unit 51 of the exposure unit 5 sets the first color of the A pattern as the A1 pattern. Then, the first processing substrate 11 on which the A1 pattern and the B1 pattern are exposed is obtained by selectively exposing the first color of the B pattern as the B1 pattern in the second exposure unit 52 of the exposure unit 5. The first processed substrate 11 is released from the holding by the substrate fixture 21 of the first substrate transfer means 1 and discharged to the substrate carry-out section 6, and the second substrate transfer means 2 makes the second substrate. The photosensitive layer of the second color was formed from the upstream apparatus while transporting / moving the processed substrate 12 downstream.
The first sheet processing substrate 13 is received by the substrate receiving stage 3, and the first processing substrate 13 is aligned with a predetermined position of the substrate receiving stage 3 by using the alignment unit. The third processing substrate 13 is held by the substrate fixture 21 of the first substrate transport means 1 that has returned to the substrate receiving stage 3 after releasing the holding of the processing substrate 11 (see FIG. 5C). Here, the radial mark 59 indicates that the exposure unit has been lit for a certain period of time during this process.

  Next, while the second substrate transport means 2 transports / moves the second processed substrate 12 to the exposure unit 5, the first exposure unit 51 of the exposure unit 5 sets the second color of the B pattern as the B2 pattern. Then, the second exposure substrate 52 of the exposure unit 5 selectively exposes the second color of the A pattern as the A2 pattern, whereby the second processing substrate 12 on which the A2 pattern and the B2 pattern are exposed is obtained. The second processed substrate 12 is released from the holding by the substrate fixture 22 of the second substrate transfer means 2 and discharged to the substrate carry-out section 6, and the third substrate is transferred by the first substrate transfer means. While the processing substrate 13 is transported and moved downstream, a fourth sheet-like processing substrate 14 on which a photosensitive layer of the second color is formed is received from the upstream apparatus by the substrate receiving stage 3, and four sheets are used by using the alignment means. Eye treatment substrate 14 With the substrate receiving stage 3 aligned with a predetermined position, four substrates are fixed by the substrate fixture 22 of the second substrate transport means 2 that has returned to the substrate receiving stage 3 after releasing the holding of the second processed substrate 12. The processing substrate 14 of the eye is held (see FIG. 5D). Here, the radial mark 59 indicates that the exposure unit has been lit for a certain period of time during this process.

  By repeating the process described with reference to FIG. 5D with the number of processed substrates accumulated in order, the first sheet composed of the first color photosensitive layer formed in the above (a) to (c). The processing substrate 11 is continuously switched to the second and subsequent processing substrates 12, 13, 14,... Made of the photosensitive layer of the second color, so that different types of patterns can be continuously exposed without stagnation. it can. The series of operation control, condition setting, and the like are programmed in the control means 7 and controlled by the control means 7.

  Note that the expression of the first color or the first sheet is used to distinguish the second color or the second sheet as the order of explanation, and is an absolute value in the entire manufacturing process of a series of processed substrates. It does not indicate a general order.

  As described above, the exposure apparatus for efficiently exposing a plurality of exposure patterns with one apparatus in the scan exposure method and the exposure method for different types of patterns using the exposure apparatus have been described. In particular, an exposure apparatus for processing a color filter substrate having two different color filter patterns in a single scanning exposure apparatus without stagnation across two different color processes, and a different pattern using the same An exposure method can be provided. In addition, the present invention is not only easy to apply the switching of the color process to the transition to other layer formation in the case of general multi-layer formation, but also to switch to the color process or other layer formation. Even when it is not accompanied, it is easy to consider that the exposure apparatus of the present invention improves the efficiency of the exposure process including the preparatory work because the pattern switching is facilitated. Even if there is no pattern switching, the exposure apparatus of the present invention can perform processing by distributing functions to a plurality of small exposure units. Operation is possible and energy and consumable parts can be saved.

Even when the number of switchable photomask patterns in the exposure unit exceeds 2, a single exposure unit can be used repeatedly by performing simultaneous processing independently using a plurality of exposure units as in the present invention. The efficiency can be further increased as compared with the case where a plurality of single exposure apparatuses are arranged in parallel. If the number of exposure units is reduced, the load on the apparatus can be reduced, but it will be necessary to provide more space for the standby position, etc., and the movement and movement control must be set in a complicated manner. Since it disappears, it is not preferable.

DESCRIPTION OF SYMBOLS 1 ... 1st board | substrate conveyance means 2 ... 2nd board | substrate conveyance means 3 ... Substrate receiving stage 5 ... Exposure part 6 ... Substrate carrying-out part 7 ... Control means 8 ... Color filter substrate 9 ... Photomask for first exposure unit 10 ... Photomask for second exposure unit 11, 12, 13, 14 ... Process substrate 21, 22 ... Substrate fixture 41 ... Pre-exposure substrate standby section 51... First exposure unit 52... Second exposure unit 59... Exposure unit lighting display 81 .. imposition color filter (A pattern)
82 ... Imposition color filter (B pattern)
91... First pattern photomask pattern (A1 pattern) of A pattern
92... B pattern second color photomask pattern (B2 pattern)
101... B pattern first color photomask pattern (B1 pattern)
102 ... Photomask pattern of the second color of A pattern (A2 pattern)

Claims (1)

An exposure apparatus that exposes A1 pattern and B1 pattern as a first color filter or A2 pattern and B2 pattern as a second color filter on a processing substrate on which a photosensitive layer is formed,
At least a light source, an alignment mechanism for positioning the photomask at a predetermined position, a photomask for a first exposure unit in which the A1 pattern and the B2 pattern are arranged, and a pattern to be exposed from the A1 pattern and the B2 pattern A first exposure unit comprising a shutter mechanism for selecting
Second exposure comprising the light source, the alignment mechanism, a second exposure unit photomask in which the B1 pattern and the A2 pattern are arranged, and a shutter mechanism for selecting a pattern to be exposed from the B1 pattern and the A2 pattern. Unit,
A substrate receiving stage comprising alignment means for aligning the processing substrate with a predetermined position;
A substrate transfer means for holding and transferring the processing substrate at the substrate receiving stage;
Control means;
With
By control of the control device,
The A1 pattern is exposed by the first exposure unit while the first processing substrate on which the photosensitive layer of the first color is formed is conveyed by a conveying means, and then the first color of the first substrate is exposed by the second exposure unit. The B1 pattern is exposed, and then the second processing substrate on which the second color photosensitive layer is formed is conveyed by the conveying means while the A2 pattern is exposed by the first exposure unit. The B2 pattern is exposed by a two-exposure unit, and subsequently the third and subsequent processing substrates are conveyed, and the pattern to be exposed is selected by the first exposure unit and the second exposure unit. An exposure apparatus for performing exposure of a color filter pattern in which species are mixed .

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