JP2006221016A - Color filter manufacturing management system - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a color filter manufacturing system capable of performing the management by adding information of respective processing units other than load presence information to the manufacturing system having a system that manages the load presence information of filter substrates on a processing line. <P>SOLUTION: The color filter manufacturing management system is provided with at least a formation process of black matrices, a formation process of colored layers composed of a plurality of colors and an inspection process, wherein, in the formation process of black matrices and/or the formation process of colored layers, information of carrying-in, passing and carrying-out the substrates is registered into a central management unit and individual manufacturing hysteresis of the color filter in the respective processes is stored in the central management unit as the load presence information. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a color filter manufacturing management system, and more particularly to a color filter manufacturing management system for use in a liquid crystal display.

  In a liquid crystal display (LCD), color filters are used in both the active matrix method and the simple matrix method in order to meet the recent demand for colorization. For example, in an active matrix type liquid crystal display using thin film transistors (TFTs), the color filter has coloring patterns of three primary colors of red (R), green (G), and blue (B), and each of R, G, and B By turning on and off the electrodes corresponding to the pixels, the liquid crystal operates as a shutter, and light is transmitted through the R, G, and B pixels to perform color display. Color mixing is visually performed on the retina according to the principle of additive color mixing in which liquid crystal shutters corresponding to pixels of two or more colors are opened and mixed to show different colors.

  In the production of the above color filter, a black matrix (light-shielding layer) forming step, a colored layer forming step comprising R, G, and B colored patterns, a protective film forming step, a transparent conductive film forming step, and several types There is an inspection process consisting of these inspections. Therefore, it is difficult to grasp for each color filter which process each glass substrate is going through and what the inspection result is.

  In order to solve such a problem, for example, a substrate transport cassette that can store 25 glass substrates is used, and each substrate transport cassette is provided with a unique identification code such as a barcode, and the substrate has a specific identification code. As the number of glass substrates in the transport cassette, management is performed by grasping the manufacturing history of individual glass substrates.

  However, in the conventional manufacturing management, if there is a breakage of the glass substrate in each process of manufacturing, extraction for condition setting, etc., the glass substrate will be stored in a different order in the substrate transport cassette, and the glass There has been a problem that it becomes impossible to make a one-to-one correspondence between the substrate and the manufacturing history.

  Further, in the conventional manufacturing management, it is impossible even if it is desired to track the manufacturing history of each color filter, for example, the thickness of the colored layer, the light transmittance, etc. at a later date. Therefore, there has been a problem that the quality of the liquid crystal display cannot be stabilized when a sudden abnormality occurs.

  Therefore, in Patent Document 1, for the purpose of providing a manufacturing management system capable of manufacturing a color filter capable of individually tracking a manufacturing history, a black matrix forming process, a colored layer forming process including a plurality of colors, and Including at least an inspection step, forming a unique identification code for each color filter in the non-pixel region of the substrate in the black matrix forming step and / or the colored layer forming step, and registering the identification code in the central management device, A configuration has been considered in which the manufacturing history of each color filter in the process is stored in the central management device in association with the identification code.

Patent documents are described below.
JP-A-11-101907

  When manufacturing a color filter by forming a pattern on a filter substrate, the filter substrate cleaning step, the filter substrate drying step, the photosensitive resin application step to the filter substrate, the applied photosensitive resin drying step, and the pre-baking A series of pattern forming steps, that is, a processing step, a pattern exposure step, a development processing step, a cleaning step, and a post-bake processing step are required.

  In particular, in the pattern exposure process, at least the number of facilities called masks for forming a pattern is required for the exposure processing apparatus. However, for some reason, the number of masks may not be prepared for the number of exposure processing apparatuses, or the number of masks may be less than the number of exposure processing apparatuses when the production quantity schedule is small.

  In this case, since an exposure processing apparatus for which a mask could not be prepared cannot be processed, it cannot be operated, which has been a factor of greatly reducing the manufacturing efficiency as a processing line.

  Alternatively, in order to maintain the manufacturing efficiency, it is conceivable that a mask having another pattern is prepared in the exposure processing apparatus for which a mask could not be prepared, and two or more types of patterns are formed in the exposure processing apparatus. Therefore, it is necessary to manage for each filter substrate which exposure processing apparatus the filter substrate is subjected to the exposure processing.

  In that case, as shown in FIG. 3, it is necessary to form a mark for managing the filter substrate on the filter substrate in advance, prepare equipment for recognizing the mark in the exposure processing apparatus, and manage the processing history of the filter substrate. There is. However, there is a problem that the mark cannot be recognized due to a malfunction of the apparatus.

  Furthermore, with the increase in the size of the pattern on the filter substrate, it has become difficult to make a space for forming the mark.

    In order to solve such a problem, the present invention includes at least a black matrix forming process, a colored layer forming process and an inspecting process, and the black matrix forming process and / or the colored layer forming process. Color filter manufacturing management system characterized in that substrate loading / passing / unloading information is registered in a central management device, and the manufacturing history of each color filter in each process is stored as inventory information in the central management device. In addition to the inventory information, each processing apparatus is provided in a manufacturing system having a system for managing the inventory information of the filter substrate on the processing line without marking the filter substrate in the pattern forming process step. To provide a color filter manufacturing system that can add and manage information Now those were.

  In particular, by providing a color filter manufacturing management system according to claim 1, further comprising a protective film forming step and a transparent conductive film forming step between the colored layer forming step and the inspection step. Further, it is possible to provide a color filter manufacturing system that can be managed more reliably.

  Even if the number of masks cannot be prepared for the number of exposure processing units for some reason, or the number of production schedules is small, even if the number of masks is smaller than the number of exposure processing units, the operation rate is maintained and the manufacturing efficiency as a processing line is improved. It became possible to improve.

  Further, even when two or more types of patterns are formed, it is possible to manage for each filter substrate whether the exposure processing is performed by each exposure processing apparatus.

  Furthermore, it is possible to handle substrates of a plurality of sizes. Marks for managing the filter substrate are formed in advance on the filter substrate, and equipment for recognizing the mark is prepared in the exposure processing apparatus. There is no need to manage the processing history of the board. Furthermore, the problem that the mark cannot be recognized due to a malfunction of the apparatus no longer occurs.

  Further, with the increase in the size of the pattern on the filter substrate, it is not necessary to take a space for forming the mark, and the size can be further increased.

    FIG. 1 is a system block diagram showing the entirety of a color filter manufacturing system showing the best mode for carrying out the invention in the present invention.

    A processing device for performing individual processing for forming a pattern on the filter substrate (g1) is arranged in the order of each processing step, and between each processing step is used as a filter substrate transport means such as a chain conveyor, a roll conveyor, a belt conveyor, etc. And a color filter manufacturing system using a series of pattern forming processes.

    The filter substrate (g1) is branched to C2 or C5 by the branching means T from the filter substrate transfer means (C1).

  After branching, the filter substrate branched to C2 is carried into the exposure processing apparatus (R1 or 2), and the filter substrate branched to C5 is carried into the exposure processing apparatus (R3 or 4) to perform the exposure processing step.

    The processing of the color filter manufacturing system according to the present invention at this time will be described with reference to FIG.

    The filter substrate is loaded information from sensors that detect loading, passing, processing process completion, unloading, etc. installed in each processing device such as a filter substrate transport means and an exposure processing device, that is, the position of the filter substrate in the processing device. Is notified to the system (L1).

    For example, the filter substrate is moved into C2 unless C2 recognizes that the filter substrate is in the processing apparatus C2 from the filter substrate carry-in signal to C2 and C2 reports a carry-out signal for the filter substrate. It can be regarded as in stock.

    Next, when a carry-out signal is reported from C2 and a carry-in signal is reported from R1, it can be seen that the filter substrate has moved from C2 to R1. Further, since loading, passing, completion of each processing step, unloading, etc. are captured by the sensor even in the processing apparatus, the presence information of the filter substrate has the same effect as managing the filter substrate individually.

    The in-stock information is held in the internal storage device of the system (L1) and is appropriately updated by a report from a sensor or the like, so that the position of the filter substrate can always be managed.

    By managing these for all the processing apparatuses in the processing line, it is possible to manage which processing apparatus the filter substrate in the processing line is in, that is, the position information of the filter substrate in the processing line.

The system of the present invention holds the processing information for the filter substrate of each processing apparatus together with the position information in the internal storage device, so that the processing history of the filter substrate present at that position can be managed.

  In addition, the system according to the present invention can manage the processing history information for each filter substrate in the processing line by allowing the processing history information to follow when the shipment information of the filter substrate moves between the processing apparatuses.

    The system of the present invention can automatically change the processing of the downstream processing apparatus according to the processing history of the upstream processing apparatus.

    For example, in FIG. 1, information such as A for a filter substrate subjected to exposure processing by the exposure processing devices R1 to R3 and B for a filter substrate subjected to exposure processing by the exposure processing device R4 is in-stock information. In addition, the exposure processing apparatus reports to the system (L1) as a processing apparatus signal.

    Here, the system processing will be described with reference to the flowchart of FIG. 4 regarding the mechanism for controlling the processing in RB1 based on the processing process information of the exposure processing apparatus.

    When the presence information of the filter substrate is reported to the branchable filter substrate transport device RB1, the processing is performed on the RB1 based on the presence information on the processing process information associated with the filter substrate.

    If the exposure process information in the process information is A, RB1 carries out the existing filter substrate to C9. If it is B, in RB1, the filter substrate which is in stock is carried out of the line by RB1.

    In this way, it is possible to change the subsequent processing on the filter substrate after the exposure processing step.

    Therefore, it is possible to produce the number of apparatuses without interrupting the operation of the exposure processing apparatus. Further, in the present invention, since it is not necessary to form a mark on the filter substrate, it is not necessary to secure a defect on the filter substrate and a space for forming the mark on the filter substrate.

    For this reason, in any filter substrate, the subsequent processing can be changed by the processing step information.

  The present invention relates to a color filter manufacturing management system, and more particularly, to a color filter manufacturing management system for use in a liquid crystal display.

It is a system block diagram explaining the whole system of the color filter manufacturing system of this invention. It is a system block diagram explaining the system principal part of the color filter manufacturing system of this invention. It is a top view of the color filter manufactured by a color filter manufacturing system It is a flowchart of the process in the color filter manufacturing system in this invention.

Explanation of symbols

g1: Filter substrate gc: Identification code p: Pixel region C1-9: Filter substrate transport device R1-4: Exposure processing device T: Branching device S: Merging device RB1-2: Filter substrate transport device L1: Inventory information and processing Process information management system

Claims (2)

  At least a black matrix forming process, a colored layer forming process and an inspection process comprising multiple colors are provided, and substrate loading, passing and unloading information is registered in the central management device in the black matrix forming process and / or the colored layer forming process. The color filter manufacturing management system is characterized in that a manufacturing history of each color filter in each process is stored in the central management device as inventory information.   The color filter manufacturing management system according to claim 1, further comprising a protective film forming step and a transparent conductive film forming step between the colored layer forming step and the inspection step.

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