TWI480252B - Glass article and method for the same - Google Patents

Glass article and method for the same Download PDF

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TWI480252B
TWI480252B TW099139826A TW99139826A TWI480252B TW I480252 B TWI480252 B TW I480252B TW 099139826 A TW099139826 A TW 099139826A TW 99139826 A TW99139826 A TW 99139826A TW I480252 B TWI480252 B TW I480252B
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Taiwan
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glass
glass article
groove
glass substrate
pattern
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TW099139826A
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Chinese (zh)
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TW201221495A (en
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Hsin Pei Chang
wen rong Chen
Huan Wu Chiang
Cheng Shi Chen
Cong Li
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Hon Hai Prec Ind Co Ltd
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玻璃製品及其製作方法Glass product and manufacturing method thereof

本發明涉及一種玻璃製品及其製作方法。The present invention relates to a glass article and a method of making the same.

玻璃製品表面的圖案一般藉由印刷的方法製作,但印刷的圖案容易褪色或油漆剝落。近年來,由於物理氣相沉積(PVD)技術綠色環保且由沉積形成在產品表面的膜層不易剝落的特點,在業界應用越來越廣。然,該種方法製作的玻璃製品的圖案精度不高,且不利於製造尺寸較小的圖案。The pattern on the surface of the glazing is generally produced by printing, but the printed pattern is easily faded or peeled off. In recent years, due to the environmentally friendly physical vapor deposition (PVD) technology and the fact that the film formed on the surface of the product is not easily peeled off, it is widely used in the industry. However, the pattern of the glass article produced by this method is not high in precision and is not conducive to the production of a pattern having a small size.

鑒於上述內容,有必要提供一種工藝簡單、且圖案精度高的玻璃製品的製作方法。In view of the above, it is necessary to provide a method for fabricating a glass article having a simple process and high pattern precision.

另外,有必要提供一種上述製作方法製得的玻璃製品。In addition, it is necessary to provide a glass article obtained by the above production method.

一種玻璃製品的製作方法,包括以下步驟:A method of making a glass product, comprising the steps of:

提供一玻璃基體,對基體表面進行超聲波清洗;Providing a glass substrate for ultrasonic cleaning of the surface of the substrate;

玻璃基體進行貼附感光幹膜與遮蔽膜、然後曝光顯影以在玻璃基體上形成待加工的圖案區域;The glass substrate is attached to the photosensitive dry film and the masking film, and then exposed and developed to form a pattern region to be processed on the glass substrate;

對玻璃基體上圖案區域進行反應離子蝕刻以形成凹槽;Performing reactive ion etching on the pattern region on the glass substrate to form a recess;

將玻璃基體進行清洗以去除凹槽內的殘留物;Cleaning the glass substrate to remove residues in the grooves;

對凹槽進行烤漆從而在凹槽處形成圖案;Varching the groove to form a pattern at the groove;

用退鍍藥水清洗殘餘在基體表面的感光幹膜及遮蔽膜形成一具內嵌圖案的玻璃製品。The photosensitive dry film and the masking film remaining on the surface of the substrate are washed with deplating syrup to form an inlaid glass article.

一種藉由上述方法製得的玻璃製品,包括一玻璃基體,所述玻璃基體表面形成有至少一凹槽,所述至少一凹槽整體排布形成一圖案,每一所述凹槽內對應地填充有塗料,以於該玻璃基體上形成圖案層。A glass article obtained by the above method, comprising a glass substrate, the glass substrate surface is formed with at least one groove, and the at least one groove is integrally arranged to form a pattern, and each of the grooves is correspondingly A coating is applied to form a patterned layer on the glass substrate.

相較於習知技術,本玻璃製品的製作方法將曝光顯影技術、反應離子蝕刻技術應用於玻璃基體上形成凹槽,可使得凹槽具備較高的精度,如可實現凹槽的寬度尺寸在1~2mm之間,且尺寸精度可控製在0.01mm內,深度在200~800nm之間;同時結合烤漆技術對凹槽進行烤漆,使得製作在玻璃表面的圖案具有高精度,同時,烤漆時可根據顏色的需求噴塗塗料,從而在玻璃表面形成色彩豐富的且具有立體質感的圖案,且塗料填充在玻璃表面的凹槽內不易脫落;該種製作方法工藝簡單,適用性強。Compared with the prior art, the manufacturing method of the glass article adopts the exposure developing technology and the reactive ion etching technology to form a groove on the glass substrate, so that the groove has high precision, for example, the width dimension of the groove can be realized. Between 1~2mm, and the dimensional accuracy can be controlled within 0.01mm and the depth is between 200~800nm. At the same time, the groove is painted with the baking paint technology, which makes the pattern on the glass surface have high precision, and at the same time, when baking paint The paint is sprayed according to the color requirement, so that a colorful and three-dimensional texture pattern is formed on the surface of the glass, and the paint is not easily peeled off in the groove of the glass surface; the preparation method is simple in process and strong in applicability.

本發明較佳實施例玻璃製品10包括一玻璃基體11及形成在玻璃基體11表面的圖案層12,所述玻璃基體11上形成有至少一凹槽112,所述至少一凹槽112可為一自身形成圖案的凹槽或間隔排布的且整體形成圖案的多個凹槽,可根據形成圖案層12的需要製作。所述圖案層12對應地填充於凹槽112內,在玻璃基體11表面上形成整體的一圖案(未標示)。圖案層12的外表面大致與玻璃基體11的外表面平齊。根據玻璃製品10圖案的精細需求,每一凹槽112的寬度尺寸可達1-2mm,該寬度的尺寸精度在0.01mm內,即製作該寬度的凹槽時寬度邊緣的公差可控製在0.01mm內。對應地形成在每一凹槽112內的圖案層12的寬度亦在可為1~2mm,且該寬度的尺寸精度在0.01mm內;凹槽112的深度可在300~400nm,對應地形成在每一凹槽112內的圖案層12的厚度在300~400nm。The glass article 10 of the preferred embodiment of the present invention comprises a glass substrate 11 and a pattern layer 12 formed on the surface of the glass substrate 11. The glass substrate 11 is formed with at least one groove 112, and the at least one groove 112 can be a The self-patterned grooves or the plurality of grooves arranged in a pattern and integrally patterned may be fabricated according to the needs of forming the pattern layer 12. The pattern layer 12 is correspondingly filled in the recess 112 to form an integral pattern (not labeled) on the surface of the glass substrate 11. The outer surface of the pattern layer 12 is substantially flush with the outer surface of the glass substrate 11. According to the fine requirement of the pattern of the glass article 10, the width dimension of each groove 112 can be up to 1-2 mm, and the dimensional accuracy of the width is within 0.01 mm, that is, the tolerance of the width edge can be controlled to 0.01 mm when the groove of the width is made. Inside. The width of the pattern layer 12 correspondingly formed in each of the grooves 112 may also be 1 to 2 mm, and the dimensional accuracy of the width is within 0.01 mm; the depth of the groove 112 may be 300 to 400 nm, correspondingly formed in The thickness of the pattern layer 12 in each of the grooves 112 is 300 to 400 nm.

該玻璃製品10的製作方法包括以下步驟:The method of manufacturing the glass article 10 includes the following steps:

S1:提供一玻璃基體11,將玻璃基體11表面進行超聲波清洗,如採用無水乙醇或丙酮對基體進行超聲波清洗,以除去玻璃基體11表面的油污。S1: A glass substrate 11 is provided, and the surface of the glass substrate 11 is ultrasonically cleaned, and the substrate is ultrasonically cleaned with anhydrous ethanol or acetone to remove oil stain on the surface of the glass substrate 11.

S2:玻璃基體11進行貼附感光幹膜與遮蔽膜、然後曝光顯影以形成待加工的圖案區域;具體過程可為:在清洗後的玻璃基體11的表面利用熱壓貼膜機貼覆感光幹膜,並在感光幹膜表面貼附遮蔽膜,使得感光幹膜表面僅露出需曝光的區域,該露出的區域與圖案區域對應,然後將該基體需曝光的區域置於光照下,所述露出的曝光區域曝光形成待加工的圖案區域,然後利用清洗液清洗該圖案區域,從而將感光幹膜顯影後形成的殘留物去除。S2: the glass substrate 11 is attached to the photosensitive dry film and the masking film, and then exposed and developed to form a pattern area to be processed; the specific process may be: attaching the photosensitive dry film to the surface of the cleaned glass substrate 11 by using a hot press filming machine And attaching a masking film on the surface of the photosensitive dry film, so that the surface of the photosensitive dry film only exposes the area to be exposed, the exposed area corresponds to the pattern area, and then the area to be exposed of the substrate is placed under illumination, the exposed The exposed area is exposed to form a pattern area to be processed, and then the pattern area is washed with a cleaning liquid to remove the residue formed after development of the photosensitive dry film.

S3:將基體表面的圖案區域進行反應離子蝕刻(RIE)以形成對應圖案區域的凹槽;具體過程可為:將基體置入RIE蝕刻機的腔體中,使蝕刻機腔體壓強保持在5Pa左右,射頻電源的功率為400w,反應腔體溫度為40℃,基體表面溫度為5℃左右,往腔體中沖入蝕刻氣體,蝕刻氣體可為CF4 或者NF3 。氣體蝕刻所述露出於基體表面的圖案區域,且氣體不與所述遮蔽膜反應,從而在基體表面對應該圖案區域形成相對應的凹槽,本實施例中,所述對應圖案區域的凹槽可以為一個、兩個或者兩個以上,且該凹槽可為連續分佈或者不連續分佈。將蝕刻後的玻璃基體進行去離子水噴淋及表面化學超聲波清洗,使形成在凹槽內的殘留物清除。根據製作圖案的需要,藉由該方法製作的每一凹槽的寬度可在1~2mm,且該寬度的尺寸精度可控製在0.01mm內,深度可為200~800nm。S4:對凹槽進行烤漆填充,具體過程可為:調製所需顏色的塗料,藉由離心力靜電霧化設備將塗料噴塗於凹槽,使塗料填充於凹槽從而形成預定的圖案。噴塗後,檢測噴塗的效果並對噴塗缺陷區進行補漆,然後將玻璃基體進行烘烤,烘烤溫度在80~150℃之間。S3: performing reactive ion etching (RIE) on the pattern region of the surface of the substrate to form a groove corresponding to the pattern region; the specific process may be: placing the substrate into the cavity of the RIE etching machine to maintain the pressure of the etching machine cavity at 5 Pa Left and right, the power of the RF power supply is 400W, the temperature of the reaction chamber is 40 ° C, and the surface temperature of the substrate is about 5 ° C. The etching gas is punched into the cavity, and the etching gas can be CF 4 or NF 3 . The gas etches the pattern region exposed on the surface of the substrate, and the gas does not react with the masking film, thereby forming a corresponding groove corresponding to the pattern region on the surface of the substrate. In this embodiment, the groove corresponding to the pattern region There may be one, two or more, and the grooves may be continuously distributed or discontinuously distributed. The etched glass substrate is subjected to deionized water spray and surface chemical ultrasonic cleaning to remove residues formed in the grooves. According to the needs of the pattern, each groove made by the method can have a width of 1 to 2 mm, and the dimensional accuracy of the width can be controlled within 0.01 mm and the depth can be 200 to 800 nm. S4: The paint is filled with the groove, and the specific process may be: preparing a paint of a desired color, spraying the paint on the groove by a centrifugal force electrostatic atomization device, and filling the paint into the groove to form a predetermined pattern. After spraying, the effect of spraying is detected and the defect area of the spraying is repaired, and then the glass substrate is baked, and the baking temperature is between 80 and 150 °C.

S5:用退鍍藥水清洗殘餘在基體表面的遮蔽膜及感光幹膜,遮蔽膜、感光幹膜將被去除。如此,在玻璃基體表面製作圖案的工序完成。S5: The masking film and the photosensitive dry film remaining on the surface of the substrate are washed with deplating syrup, and the masking film and the photosensitive dry film are removed. Thus, the process of patterning the surface of the glass substrate is completed.

本案玻璃製品的製作方法,藉由將傳統中製作印刷電路板(PCB)的曝光顯影技術結合反應離子蝕刻技術應用於玻璃基體上形成凹槽,可使得凹槽具備較高的精度,使得凹槽的寬度可達成在1~2mm之間,且該寬度的尺寸精度可控製在0.01mm內,深度達成在300~400nm之間;同時結合烤漆技術對凹槽進行烤漆,使得製作在玻璃表面的圖案具有高精度。另外,烤漆時可根據顏色的需求噴塗塗料,從而在玻璃表面形成色彩豐富的且具有立體質感的圖案,且塗料填充在玻璃表面的凹槽內不易脫落。該種玻璃製品製作方法工藝簡單,圖案精度高,適用性強。The method for manufacturing the glass product of the present invention can form the groove by applying the exposure and development technology of the conventional printed circuit board (PCB) in combination with the reactive ion etching technology to form a groove on the glass substrate, so that the groove has high precision and makes the groove The width can be achieved between 1~2mm, and the dimensional accuracy of the width can be controlled within 0.01mm and the depth is between 300~400nm. At the same time, the groove is painted in combination with the baking technology to make the pattern on the glass surface. With high precision. In addition, when the paint is painted, the paint can be sprayed according to the color requirement, so that a colorful and three-dimensional texture pattern is formed on the surface of the glass, and the paint is not easily peeled off in the groove of the glass surface. The method for manufacturing the glass product has the advantages of simple process, high pattern precision and strong applicability.

本案玻璃製品的製作方法可應用於製作電子裝置的殼體或電子裝置的視窗等。如一種電子裝置的視窗,該視窗為玻璃基體製作,如有機玻璃。該玻璃基體藉由才用上述製作方法可在表面形成一精細的圖案,該圖案可為該電子裝置的商標等,先通過曝光顯影技術結合反應離子蝕刻技術在玻璃基體上形成凹槽,然後結合烤漆技術在凹槽內填充塗料以形成圖案。如此,圖案的每一線條寬度可在1~2mm,且該寬度的尺寸精度在0.01mm內,圖案的厚度可在200~800nm。The manufacturing method of the glass product of the present invention can be applied to a casing of an electronic device or a window of an electronic device. Such as a window of an electronic device, the window is made of a glass substrate, such as plexiglass. The glass substrate can form a fine pattern on the surface by using the above-mentioned manufacturing method, and the pattern can be a trademark of the electronic device, etc., first forming a groove on the glass substrate by exposure and development technology combined with reactive ion etching technology, and then combining The baking technique fills the grooves with a coating to form a pattern. Thus, the width of each line of the pattern can be 1~2mm, and the dimensional accuracy of the width is within 0.01mm, and the thickness of the pattern can be 200~800nm.

10...玻璃製品10. . . Glass product

11...玻璃基體11. . . Glass substrate

112...凹槽112. . . Groove

12...圖案層12. . . Pattern layer

圖1係本發明較佳實施例一玻璃製品的截面示意圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic cross-sectional view of a glass article in accordance with a preferred embodiment of the present invention.

圖2係圖1所示的玻璃製品表面製作圖案的方法流程圖。2 is a flow chart showing a method of patterning the surface of the glass article shown in FIG. 1.

10...玻璃製品10. . . Glass product

11...玻璃基體11. . . Glass substrate

112...凹槽112. . . Groove

12...圖案層12. . . Pattern layer

Claims (11)

一種玻璃製品的製作方法,包括以下步驟:
提供一玻璃基體,對玻璃基體表面進行超聲波清洗;
對玻璃基體進行貼附感光幹膜與遮蔽膜、然後曝光顯影以在玻璃基體上形成待加工的圖案區域;
對玻璃基體上圖案區域進行反應離子蝕刻以形成凹槽;
將玻璃基體進行清洗以去除凹槽內的殘留物;
對凹槽進行烤漆從而在凹槽處形成圖案;
用退鍍藥水清洗殘餘在基體表面的感光幹膜及遮蔽膜形成一具內嵌圖案的玻璃製品。
A method of making a glass product, comprising the steps of:
Providing a glass substrate for ultrasonic cleaning of the surface of the glass substrate;
Attaching a photosensitive film and a masking film to the glass substrate, and then exposing and developing to form a pattern region to be processed on the glass substrate;
Performing reactive ion etching on the pattern region on the glass substrate to form a recess;
Cleaning the glass substrate to remove residues in the grooves;
Varching the groove to form a pattern at the groove;
The photosensitive dry film and the masking film remaining on the surface of the substrate are washed with deplating syrup to form an inlaid glass article.
如申請專利範圍第1項所述之玻璃製品的製作方法,其中所述超聲波清洗過程包括採用無水乙醇或丙酮對基體進行超聲波清洗。The method for producing a glass article according to claim 1, wherein the ultrasonic cleaning process comprises ultrasonically cleaning the substrate with anhydrous ethanol or acetone. 如申請專利範圍第1項所述之玻璃製品的製作方法,其中所述形成待加工的圖案區域的過程包括:將感光幹膜曝利用熱壓貼膜機貼覆玻璃基體表面,將遮蔽膜貼附於感光幹膜表面,使感光幹膜表面僅露出需曝光的區域,該露出的區域與所述圖案區域對應,將所述露出的區域曝光並清洗。The method for fabricating a glass article according to claim 1, wherein the process of forming the pattern region to be processed comprises: attaching the photosensitive dry film to a surface of the glass substrate by using a hot press film applicator, and attaching the mask film On the surface of the photosensitive dry film, the surface of the photosensitive dry film is exposed only to the area to be exposed, and the exposed area corresponds to the pattern area, and the exposed area is exposed and washed. 如申請專利範圍第1項所述之玻璃製品的製作方法,其中所述對圖案區域進行蝕刻的方式為氣體蝕刻。The method for producing a glass article according to claim 1, wherein the pattern region is etched by gas etching. 如申請專利範圍第4項所述之玻璃製品的製作方法,其中所述氣體蝕刻包括提供一蝕刻機,蝕刻機腔體壓強保持在5Pa左右,射頻功率為400w,反應腔體溫度為40℃,基體表面溫度為5℃。The method for fabricating a glass article according to claim 4, wherein the gas etching comprises providing an etching machine, the etching chamber pressure is maintained at about 5 Pa, the RF power is 400 W, and the reaction chamber temperature is 40 ° C. The surface temperature of the substrate was 5 °C. 如申請專利範圍第5項所述之玻璃製品的製作方法,其中所述蝕刻機中沖入的蝕刻氣體為CF4或NF3。The method for producing a glass article according to claim 5, wherein the etching gas punched in the etching machine is CF4 or NF3. 如申請專利範圍第1項所述之玻璃製品的製作方法,其中所述對凹槽進行烤漆過程包括調製塗料,通過離心力靜電霧化設備將塗料噴塗於凹槽,噴塗後檢測並補漆,然後將基體進行烘烤。The method for manufacturing a glass article according to claim 1, wherein the process of baking the groove comprises preparing a paint, spraying the paint into the groove by a centrifugal force electrostatic atomization device, detecting and refinishing the paint after spraying, and then The substrate is baked. 如申請專利範圍第7項所述之玻璃製品的製造方法,其中所述烘烤溫度在80~150℃之間。The method for producing a glass article according to claim 7, wherein the baking temperature is between 80 and 150 °C. 一種申請專利範圍第1至8項中任意一項所述之製作方法製作的玻璃製品,包括一玻璃基體,其改良在於:所述玻璃基體表面形成有至少一凹槽,所述至少一凹槽整體排布形成一圖案,每一所述凹槽內對應地填充有塗料,以於該玻璃基體上形成圖案層。A glass article produced by the manufacturing method according to any one of claims 1 to 8, comprising a glass substrate, wherein the glass substrate has at least one groove formed on the surface thereof, the at least one groove The overall arrangement forms a pattern, and each of the grooves is correspondingly filled with a coating to form a pattern layer on the glass substrate. 如申請專利範圍第9項所述之玻璃製品,其中每一所述凹槽的寬度尺寸在1~2mm,凹槽的深度在200~800nm,且寬度的尺寸精度在0.01mm內。The glass article of claim 9, wherein each of the grooves has a width dimension of 1 to 2 mm, a groove depth of 200 to 800 nm, and a width dimension accuracy of 0.01 mm. 如申請專利範圍第9項所述之玻璃製品,其中所述玻璃製品為一電子裝置的視窗,對應地形成在每一所述凹槽內圖案層的寬度尺寸在1~2mm,深度在200~800nm,且寬度的尺寸精度在0.01mm內。The glass article of claim 9, wherein the glass article is a window of an electronic device, correspondingly formed in each of the grooves, the width of the pattern layer is 1~2 mm, and the depth is 200~ 800nm, and the dimensional accuracy of the width is within 0.01mm.
TW099139826A 2010-11-18 2010-11-18 Glass article and method for the same TWI480252B (en)

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