201221495 六、發明說明： 【發明所屬之技術領域】 [0001] 本發明涉及一種玻璃製品及其製作方法。 【先前技術】 [〇〇〇2]玻璃製品表面的圖案一般藉由印刷的方法製作，但印刷 的圖案容易褪色或油漆剝落。近年來，由於物理氣相沉 積（PVD)技術綠色環保且由沉積形成在產品表面的媒層 不易剝落的特點，在業界應用越來越廣。然，該種方法 製作的玻璃製品的圖案精度不高，且不利於製造尺寸較 〇 小的圖案。 , 【發明内容】 [0003] 鑒於上述内容，有必要提供一種工藝簡單、且圖案精度 高的玻璃製品的製作方法。 [0004] 另外，有必要提供一種上述製作方法製得的玻璃製品。 [0005] 一種玻璃製品的製作方法，包括以下步驟： [⑻㈤]提供一玻璃基體’對基體表面進行超參波清洗； 〇 [0007] 玻璃基體進行貼附感光幹膜與遮蔽膜、然後曝光顯影以 在玻璃基體上形成待加工的圖案區域； [0008] 對玻璃基體上圖案區域進行反應離子蚀刻以形成凹槽； [0009] 將玻璃基體進行清洗以去除凹槽内的殘留物； [0010] 對凹槽進行烤漆從而在凹槽處形成圖案； [0011] 用退鍍藥水清洗殘餘在基體表面的感光幹膜及遮蔽膜形 成一具内嵌圖案的玻璃製品。 099139826 表單編號A0101 第3頁/共11頁 0992069408-0 201221495 [0012] 一種藉由上述方法製得的玻璃製品，包括一玻璃基體， 所述玻璃基體表面形成有至少一凹槽，所述至少一凹槽 整體排布形成一圖案，每一所述凹槽内對應地填充有塗 料，以於該玻璃基體上形成圖案層。 [0013] 相較於習知技術，本玻璃製品的製作方法將曝光顯影技 術、反應離子蝕刻技術應用於玻璃基體上形成凹槽，可 使得凹槽具備較高的精度，如可實現凹槽的寬度尺寸在 1~2_之間，且尺寸精度可控製在0.01mm内，深度在 200~800nm之間；同時結合烤漆技術對凹槽進行烤漆， 使得製作在玻璃表面的圖案具有高精度，同時，烤漆時 可根據顏色的需求喷塗塗料，從而在玻璃表面形成色彩 豐富的且具有立體質感的圖案，且塗料填充在玻璃表面 的凹槽内不易脫落；該種製作方法工藝簡單，適用性強 〇 【實施方式】 [0014] 本發明較佳實施例玻璃製品1 0包括一玻璃基體11及形成 在玻璃基體11表面的圖案層12，所述玻璃基體11上形成 有至少一凹槽112，所述至少一凹槽112可為一自身形成 圖案的凹槽或間隔排布的且整體形成圖案的多個凹槽， 可根據形成圖案層12的需要製作。所述圖案層12對應地 填充於凹槽112内，在玻璃基體11表面上形成整體的一圖 案（未標示）。圖案層12的外表面大致與玻璃基體11的 外表面平齊。根據玻璃製品10圖案的精細需求，每一凹 槽11 2的寬度尺寸可達卜2mm，該寬度的尺寸精度在 0.01mm内，即製作該寬度的凹槽時寬度邊緣的公差可控 099139826 表單編號A0101 第4頁/共11頁 0992069408-0 201221495 製在0.01mm内。對應地形成在每一凹槽112内的圖案層 12的寬度亦在可為卜2mm，且該寬度的尺寸精度在 0· 01 mm内；凹槽112的深度可在300〜400ηπι，對應地形 成在每一凹槽112内的圖案層12的厚度在3〇〇〜400 nm。 [0015] [0016] Ο [0017] 該玻璃製品1 0的製作方法包括以下步驟： S1:提供一玻璃基體11 ’將玻璃基體11表面進行超聲波清 洗，如採用無水乙醇或丙酮對基體進行超聲波清洗，以 除去玻璃基體11表面的油污。 S2:玻璃基體11進行貼附感光幹膜與遮蔽膜、然後曝光顯 影以形成待加工的圖案區域；具體過程可為：在清洗後 的玻璃基體11的表面利用熱壓貼膜機貼覆感光幹膜，並 在感光幹膜表面貼附遮蔽膜，使得感光幹膜表面僅露出 需曝光的區域，該露出的區域與圖案區域對應，然後將 該基體需曝光的區域置於光照下，所述露出的曝光區域 曝光形成待加工的圖案區域，然後利用清洗液清洗該圖 案區域’從而將感光幹膜顯影來形成的殘留物去除。 〇 [0018] S3:將基體表面的圖案區域進行反應離子蝕刻（RIE)以 形成對應圖案區域的凹槽；具體過程可為：將基體置入 RIE蚀刻機的腔體中，使蝕刻機腔體壓強保持在5Pa左右 ，射頻電源的功率為4〇〇w，反應腔體溫度為4(^c，基體 表面溫度為5。(：左右，往腔體中沖入蝕刻氣體，蝕刻氣體 ^為0%或者NF3。氣體蝕刻所述露出於基體表面的圖案 區威’且氣體不與所述遮蔽膜反應，從而在基體表面對 應該圖案區域形成相對應的凹槽，本實施例中，所述對 099139826 表單編號A0101 第5頁/共11頁 0992069408-0 201221495 應圖案區域的凹槽可以為一個、兩個或者兩個以上，且 該凹槽可為連續分佈或者不連續分佈。將蝕刻後的玻璃 基體進行去離子水喷淋及表面化學超聲波清洗，使形成 在凹槽内的殘留物清除。根據製作圖案的需要，藉由該 方法製作的每一凹槽的寬度可在卜2mm，且該寬度的尺寸 精度可控製在0.01 mm内，深度可為200〜80 0nm°S4:對 凹槽進行烤漆填充，具體過程可為：調製所需顏色的塗 料，藉由離心力靜電霧化設備將塗料噴塗於凹槽，使塗 料填充於凹槽從而形成預定的圖案。噴塗後，檢測喷塗 的效果並對喷塗缺陷區進行補漆，然後將玻璃基體進行 烘烤，烘烤溫度在80〜150°C之間。 [0019] S5:用退鍍藥水清洗殘餘在基體表面的遮蔽膜及感光幹膜 ，遮蔽膜、感光幹膜將被去除。如此，在玻璃基體表面 製作圖案的工序完成。 [0020] 本案玻璃製品的製作方法，藉由將傳統中製作印刷電路 板（PCB)的曝光顯影技術結合反應離子蝕刻技術應用於 玻璃基體上形成凹槽，可使得凹槽具備較高的精度，使 得凹槽的寬度可達成在卜2mm之間，且該寬度的尺寸精度 可控製在0.01_内，深度達成在300〜400nm之間；同時 結合烤漆技術對凹槽進行烤漆，使得製作在玻璃表面的 圖案具有高精度。另外，烤漆時可根據顏色的需求喷塗 塗料，從而在玻璃表面形成色彩豐富的且具有立體質感 的圖案，且塗料填充在玻璃表面的凹槽内不易脫落。該 種玻璃製品製作方法工藝簡單，圖案精度高，適用性強 099139826 表單編號A0101 第6頁/共11頁 0992069408-0 201221495 [0021] 本案玻璃製品的製作方法可應用於製作電子裝置的殼體 或電子裝置的視窗等。如一種電子裝置的視窗，該視窗 為玻璃基體製作，如有機玻璃。該玻璃基體藉由才用上 述製作方法可在表面形成一精細的圖案，該圖案可為該 電子裝置的商標等，先通過曝光顯影技術結合反應離子 蝕刻技術在玻璃基體上形成凹槽，然後結合烤漆技術在 凹槽内填充塗料以形成圖案。如此，圖案的每一線條寬 度可在卜2mm，且該寬度的尺寸精度在0.01 mm内，圖案 的厚度可在200〜800nm。 【圖式簡單說明】 [0022] 圖1係本發明較佳實施例一玻璃製品的戴面示意圖。 [0023] 圖2係圖1所示的玻璃製品表面製作圖案的方法流程圖。 【主要元件符號說明】 [0024] 玻璃製品：10 [0025] 玻璃基體：11 [0026] 凹槽：112 [0027] 圖案層：1 2 0992069408-0 099139826 表單編號A0101 第7頁/共11頁201221495 VI. Description of the Invention: [Technical Field to Which the Invention Is Ascribed] [0001] The present invention relates to a glass article and a method of fabricating the same. [Prior Art] [〇〇〇2] The pattern on the surface of a glass article is generally produced by a printing method, but the printed pattern is easily faded or peeled off. In recent years, the physical vapor deposition (PVD) technology has become more and more widely used in the industry due to its environmentally friendly nature and the fact that the dielectric layer formed on the surface of the product is not easily peeled off. However, the pattern of the glass article produced by this method is not high in precision and is not conducive to the production of a pattern having a relatively small size. SUMMARY OF THE INVENTION [0003] In view of the above, it is necessary to provide a method for fabricating a glass article having a simple process and high pattern precision. Further, it is necessary to provide a glass article obtained by the above production method. [0005] A method for fabricating a glass article, comprising the steps of: [(8) (5)] providing a glass substrate 'super-wave cleaning of the surface of the substrate; 〇 [0007] attaching the photosensitive film to the masking film and then exposing the film Forming a pattern region to be processed on the glass substrate; [0008] performing reactive ion etching on the pattern region on the glass substrate to form a recess; [0009] cleaning the glass substrate to remove residues in the recess; [0010] The groove is painted to form a pattern at the groove; [0011] The photosensitive dry film and the masking film remaining on the surface of the substrate are washed with deplating syrup to form an inlaid glass article. 099139826 Form No. A0101 Page 3 of 11 0992069408-0 201221495 [0012] A glass article obtained by the above method, comprising a glass substrate having at least one groove formed on the surface of the glass substrate, the at least one The grooves are integrally arranged to form a pattern, and each of the grooves is correspondingly filled with a coating to form a pattern layer on the glass substrate. [0013] Compared with the prior art, the manufacturing method of the glass article adopts an exposure developing technique and a reactive ion etching technique to form a groove on a glass substrate, so that the groove has high precision, such as a groove can be realized. The width is between 1~2_, and the dimensional accuracy can be controlled within 0.01mm and the depth is between 200~800nm. At the same time, the groove is painted in combination with the baking varnish technology, so that the pattern on the glass surface is made with high precision. When the paint is painted, the paint can be sprayed according to the color requirement, thereby forming a colorful and three-dimensional texture pattern on the surface of the glass, and the paint is not easily peeled off in the groove of the glass surface; the preparation method is simple in process and strong in applicability [Embodiment] The glass article 10 of the preferred embodiment of the present invention comprises a glass substrate 11 and a pattern layer 12 formed on the surface of the glass substrate 11. The glass substrate 11 is formed with at least one groove 112. The at least one groove 112 may be a groove formed by itself or a plurality of grooves arranged in a pattern and integrally patterned, which may be formed according to the requirement of forming the pattern layer 12 Work. The pattern layer 12 is correspondingly filled in the recess 112 to form an integral pattern (not labeled) on the surface of the glass substrate 11. The outer surface of the pattern layer 12 is substantially flush with the outer surface of the glass substrate 11. According to the fine requirements of the pattern of the glass article 10, the width dimension of each groove 11 2 can be up to 2 mm, and the dimensional accuracy of the width is within 0.01 mm, that is, the tolerance of the width edge can be controlled when the groove of the width is made. 099139826 Form number A0101 Page 4 of 11 0992069408-0 201221495 The system is within 0.01mm. The width of the pattern layer 12 correspondingly formed in each of the grooves 112 may also be 2 mm, and the dimensional accuracy of the width is within 0.01 mm; the depth of the groove 112 may be 300 to 400 ηπ, correspondingly formed. The thickness of the pattern layer 12 in each of the grooves 112 is from 3 〇〇 to 400 nm. [0016] [0016] The manufacturing method of the glass article 10 includes the following steps: S1: providing a glass substrate 11' ultrasonic cleaning of the surface of the glass substrate 11, such as ultrasonic cleaning of the substrate with anhydrous ethanol or acetone To remove oil stains on the surface of the glass substrate 11. S2: the glass substrate 11 is attached to the photosensitive dry film and the masking film, and then exposed and developed to form a pattern area to be processed; the specific process may be: attaching the photosensitive dry film to the surface of the cleaned glass substrate 11 by using a hot press filming machine And attaching a masking film on the surface of the photosensitive dry film, so that the surface of the photosensitive dry film only exposes the area to be exposed, the exposed area corresponds to the pattern area, and then the area to be exposed of the substrate is placed under illumination, the exposed The exposed area is exposed to form a pattern area to be processed, and then the pattern area is cleaned with a cleaning liquid to remove the residue formed by developing the photosensitive dry film. 〇[0018] S3: performing reactive ion etching (RIE) on the pattern region of the surface of the substrate to form a recess corresponding to the pattern region; the specific process may be: placing the substrate into the cavity of the RIE etching machine to make the etching machine cavity The pressure is kept at about 5 Pa, the power of the RF power source is 4 〇〇w, the temperature of the reaction chamber is 4 (^c, and the surface temperature of the substrate is 5. (: Left and right, the etching gas is rushed into the cavity, and the etching gas is 0. % or NF3. The gas etches the pattern region exposed on the surface of the substrate and the gas does not react with the masking film, thereby forming a corresponding groove corresponding to the pattern region on the surface of the substrate. In this embodiment, the pair 099139826 Form No. A0101 Page 5 of 11 0992069408-0 201221495 The grooves of the pattern area may be one, two or more, and the grooves may be continuously distributed or discontinuously distributed. The etched glass shall be The substrate is subjected to deionized water spray and surface chemical ultrasonic cleaning to remove the residue formed in the groove. According to the need of patterning, the width of each groove made by the method can be 2 mm, and The dimensional accuracy of the width can be controlled within 0.01 mm, and the depth can be 200~80 0 nm. S4: The groove is filled with paint. The specific process can be: modulating the paint of the desired color, and coating the coating by centrifugal force electrostatic atomization equipment. Spraying on the groove to fill the groove to form a predetermined pattern. After spraying, the effect of spraying is detected and the defect area of the spray is repaired, and then the glass substrate is baked, and the baking temperature is 80-150. [0019] S5: The masking film and the photosensitive dry film remaining on the surface of the substrate are washed with the deplating syrup, and the masking film and the photosensitive dry film are removed. Thus, the process of patterning the surface of the glass substrate is completed. 0020] The method for manufacturing the glass product of the present invention can be made by applying the exposure and development technology of the conventional printed circuit board (PCB) combined with the reactive ion etching technology to form a groove on the glass substrate, so that the groove has high precision, so that the groove has high precision. The width of the groove can be achieved between 2mm, and the dimensional accuracy of the width can be controlled within 0.01_, and the depth is between 300~400nm; The paint makes the pattern on the surface of the glass highly accurate. In addition, when the paint is painted, the paint can be sprayed according to the color requirement, thereby forming a colorful and three-dimensional pattern on the surface of the glass, and the paint fills the groove on the surface of the glass. The method for manufacturing the glass product is simple, the pattern precision is high, and the applicability is strong. 099139826 Form No. A0101 Page 6 / 11 pages 0992069408-0 201221495 [0021] The manufacturing method of the glass product can be applied to the production of electronic device a window or the like of an electronic device, such as a window of an electronic device, which is made of a glass substrate, such as plexiglass. The glass substrate can form a fine pattern on the surface by using the above-mentioned manufacturing method, and the pattern can be a trademark of the electronic device, etc., first forming a groove on the glass substrate by exposure and development technology combined with reactive ion etching technology, and then combining The baking technique fills the grooves with a coating to form a pattern. Thus, each line width of the pattern can be 2 mm, and the dimensional accuracy of the width is within 0.01 mm, and the thickness of the pattern can be 200 to 800 nm. BRIEF DESCRIPTION OF THE DRAWINGS [0022] FIG. 1 is a schematic view showing the wearing of a glass article according to a preferred embodiment of the present invention. 2 is a flow chart of a method for patterning the surface of the glass article shown in FIG. 1. [Main component symbol description] [0024] Glass article: 10 [0025] Glass substrate: 11 [0026] Groove: 112 [0027] Pattern layer: 1 2 0992069408-0 099139826 Form number A0101 Page 7 of 11