CN102464452A - Glass product and production method thereof - Google Patents
Glass product and production method thereof Download PDFInfo
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- CN102464452A CN102464452A CN2010105440090A CN201010544009A CN102464452A CN 102464452 A CN102464452 A CN 102464452A CN 2010105440090 A CN2010105440090 A CN 2010105440090A CN 201010544009 A CN201010544009 A CN 201010544009A CN 102464452 A CN102464452 A CN 102464452A
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Abstract
The invention discloses a glass product and a production method thereof. The production method of the glass product comprises the following steps: coating a layer of photosensitive dry film on the surface of a glass matrix; exposing the photosensitive dry film and developing a pattern area to be prepared; carrying out reactive ion etching (RIE) on the pattern area; and carrying out color modification on the patterns by using baking vanish technology to obtain the glass product. The method has the advantages of simple technology, and high precision of patterns. The produced glass product comprises a glass matrix, wherein, the surface of the glass matrix is provided with grooves, the grooves are filled with paints to form a pattern layer on the surface of the glass matrix.
Description
Technical field
The invention relates to a kind of glasswork and preparation method thereof.
Background technology
The pattern of existing glass article surface is generally made through method of printing, but the pattern of printing fades or paint flake easily.In recent years, because the environmental protection and incrust at the rete of product surface by formation of deposits of physical vapor deposition (PVD) technology is in the industry cycle used more and more wider.So, the pattern precision of the glasswork that this kind method is made is not high, and is unfavorable for the pattern that manufacturing dimension is less.
Summary of the invention
In view of foregoing, be necessary to provide the making method of the simple and glasswork that the pattern precision is high of a kind of technology.
In addition, be necessary the glasswork that provides a kind of above-mentioned making method to make.
A kind of making method of glasswork may further comprise the steps:
One glass basis is provided, matrix surface is carried out ultrasonic cleaning;
Glass basis attaches photosensitive dry film and shielding film, exposure imaging to be to form area of the pattern to be processed on glass basis then;
Area of the pattern on the glass basis is carried out reactive ion etching to form groove;
Glass basis is cleaned to remove the residue in the groove;
Thereby groove is carried out baking vanish form pattern at groove;
The glasswork that forms the embedded pattern of a tool at the photosensitive dry film and the shielding film of matrix surface with strip liquid medicine erase residual.
A kind of glasswork that makes through aforesaid method; Comprise a glass basis, said glass basis surface is formed with at least one groove, and said at least one groove integral body is arranged and formed a pattern; Be filled with coating accordingly in each said groove, on this glass basis, to form patterned layer.
Compared to prior art; The making method of this glasswork is applied to form on the glass basis groove with exposure imaging technology, reactive ion etching technique; Can make groove possess higher precision; As the width dimensions that can realize groove is between 1～2mm, and controlled size precision is in 0.01mm, and the degree of depth is between 200～800nm; Combine the baking vanish technology that groove is carried out baking vanish simultaneously; Make the pattern that is produced on glass surface have high precision; Simultaneously; Can be during baking vanish according to the demand sprayed coating of color, thus pattern coloury and that have match volume formed at glass surface, and coating is filled in difficult drop-off in the groove of glass surface; This kind making method technology is simple, and suitability is strong.
Description of drawings
Fig. 1 is the schematic cross-section of preferred embodiment one glasswork of the present invention.
Fig. 2 is the method flow diagram of glass article surface pattern-making shown in Figure 1.
The main element nomenclature
Embodiment
Preferred embodiment glasswork 10 of the present invention comprises a glass basis 11 and is formed on the patterned layer 12 on glass basis 11 surfaces; Be formed with at least one groove 112 on the said glass basis 11; Said at least one groove 112 can be one and self forms the groove of pattern or that be intervally arranged and the whole a plurality of grooves that form pattern, can make according to the needs that form patterned layer 12.Said patterned layer 12 is filled in the groove 112 accordingly, on glass basis 11 surfaces, forms a whole pattern (not indicating).The outside surface of patterned layer 12 is roughly concordant with the outside surface of glass basis 11.According to the meticulous demand of glasswork 10 patterns, the width dimensions of each groove 112 can reach 1-2mm, and the dimensional precision of this width is in 0.01mm, and the tolerance of widthwise edges can be controlled in the 0.01mm when promptly making the groove of this width.The width that is formed on the patterned layer 12 in each groove 112 accordingly also can be 1～2mm, and the dimensional precision of this width is in 0.01mm; The degree of depth of groove 112 can be at 300～400nm, and the thickness that is formed on the patterned layer 12 in each groove 112 accordingly is at 300～400nm.
The making method of this glasswork 10 may further comprise the steps:
S1 a: glass basis 11 is provided, ultrasonic cleaning is carried out on glass basis 11 surfaces, as adopting absolute ethyl alcohol or acetone matrix is carried out ultrasonic cleaning, to remove the greasy dirt on glass basis 11 surfaces.
S2: glass basis 11 attaches photosensitive dry film and shielding film, exposure imaging to be to form area of the pattern to be processed then; Detailed process can be: the surface by utilizing hot pressing laminator of the glass basis 11 after cleaning pastes photosensitive dry film; And at photosensitive dry film surface attaching shielding film; Making the photosensitive dry film surface only expose needs exposed areas; This zone of exposing is corresponding with area of the pattern, needs exposed areas to place under the illumination this matrix then, and said exposure area exposure of exposing forms area of the pattern to be processed; Utilize scavenging solution to clean this area of the pattern then, thereby with the removing residues that forms after the photosensitive dry film development.
S3: the area of the pattern of matrix surface is carried out reactive ion etching (RIE) to form the groove of corresponding area of the pattern; Detailed process can be: matrix is put in the cavity of RIE etching machine, the etching machine chamber pressure is remained on about 5Pa, the power of radio-frequency power supply is 400w; The reaction cavity temperature is 40 ℃; The matrix surface temperature is about 5 ℃, in cavity, pours etching gas, and etching gas can be CF
4Perhaps NF
3The said area of the pattern that is exposed to matrix surface of gas etch; And gas does not react with said shielding film; Thereby at matrix surface to forming corresponding groove by area of the pattern; In the present embodiment, the groove of said corresponding area of the pattern can for one, two or more, and this groove can be continuous distribution or discontinuously arranged.Glass basis after the etching is carried out deionized water spray and surface chemistry ultrasonic cleaning, the residue that is formed in the groove is removed.According to the needs of pattern-making, the width of each groove of making through this method can be at 1～2mm, and the controlled size precision of this width is in 0.01mm, and the degree of depth can be 200～800nm.S4: groove is carried out baking vanish fill, detailed process can be: the coating of modulation required color, through the cf-electrostatic atomization device with paint spay-coating in groove, form predetermined pattern thereby make coating be filled in groove.After the spraying, detect the effect of spraying and the spraying defect area is carried out touch-up paint, then glass basis is toasted, storing temperature is between 80～150 ℃.
S5: with shielding film and the photosensitive dry film of strip liquid medicine erase residual at matrix surface, shielding film, photosensitive dry film will be removed.So, accomplish in the operation of glass basis surface pattern-making.
The making method of this case glasswork; Through the exposure imaging technology association reaction ion etching technology of making printed substrate (PCB) in the tradition is applied to form on the glass basis groove; Can make groove possess higher precision; Make the width of groove to reach between 1～2mm, and the controlled size precision of this width is in 0.01mm, the degree of depth is reached between 300～400nm; Combine the baking vanish technology that groove is carried out baking vanish simultaneously, make the pattern that is produced on glass surface have high precision.In addition, can be during baking vanish according to the demand sprayed coating of color, thus form pattern coloury and that have match volume at glass surface, and coating is filled in difficult drop-off in the groove of glass surface.This kind glasswork making method technology is simple, and the pattern precision is high, and suitability is strong.
The making method of this case glasswork can be applicable to make the housing of electronic installation or the form of electronic installation etc.Like a kind of form of electronic installation, this form is that glass basis is made, like organic glass.This glass basis is through just forming a meticulous pattern on the surface with above-mentioned making method; This pattern can be the trade mark of this electronic installation etc.; Earlier on glass basis, form groove through exposure imaging technology association reaction ion etching technology, combine then the baking vanish technology in groove filling paint to form pattern.So, each line thickness of pattern can be at 1～2mm, and the dimensional precision of this width is in 0.01mm, and the thickness of pattern can be at 200～800nm.
Claims (11)
1. the making method of a glasswork may further comprise the steps:
One glass basis is provided, ultrasonic cleaning is carried out on the glass basis surface;
Glass basis attaches photosensitive dry film and shielding film, exposure imaging to be to form area of the pattern to be processed on glass basis then;
Area of the pattern on the glass basis is carried out reactive ion etching to form groove;
Glass basis is cleaned to remove the residue in the groove;
Thereby groove is carried out baking vanish form pattern at groove;
The glasswork that forms the embedded pattern of a tool at the photosensitive dry film and the shielding film of matrix surface with strip liquid medicine erase residual.
2. the making method of glasswork as claimed in claim 1 is characterized in that: said ultrasonic cleaning process comprises and adopts absolute ethyl alcohol or acetone that matrix is carried out ultrasonic cleaning.
3. the making method of glasswork as claimed in claim 1; It is characterized in that: the process of the area of the pattern that said formation is to be processed comprises: photosensitive dry film is exposed to the sun utilize the hot pressing laminator to paste the glass basis surface; Shielding film is attached at the photosensitive dry film surface; The photosensitive dry film surface is only exposed need exposed areas, this zone of exposing is corresponding with said area of the pattern, with said regional exposure that exposes and cleaning.
4. the making method of glasswork as claimed in claim 1 is characterized in that: said area of the pattern is carried out etched mode is gas etch.
5. the making method of glasswork as claimed in claim 4; It is characterized in that: said gas etch comprises provides an etching machine, and the etching machine chamber pressure remains on about 5Pa, and radio frequency power is 400w; The reaction cavity temperature is 40 ℃, and the matrix surface temperature is 5 ℃.
6. the making method of glasswork as claimed in claim 5, it is characterized in that: the etching gas that pours in the said etching machine is CF
4Or NF
3
7. the making method of glasswork as claimed in claim 1; It is characterized in that: saidly groove is carried out the baking vanish process comprise modulation coating; Through the cf-electrostatic atomization device with paint spay-coating in groove, spraying back is detected and touch-up paint, then matrix is toasted.
8. the method for manufacture of glasswork as claimed in claim 7, it is characterized in that: said storing temperature is between 80～150 ℃.
9. any glasswork that described making method is made of a claim 1 to 8; Comprise a glass basis; It is characterized in that: said glass basis surface is formed with at least one groove; Said at least one groove integral body is arranged and is formed a pattern, is filled with coating accordingly in each said groove, on this glass basis, to form patterned layer.
10. glasswork as claimed in claim 9 is characterized in that: the width dimensions of each said groove is at 1～2mm, and the degree of depth of groove is at 200～800nm, and the dimensional precision of width is in 0.01mm.
11. glasswork as claimed in claim 9; It is characterized in that: said glasswork is the form of an electronic installation; The width dimensions that is formed on patterned layer in each said groove accordingly is at 1～2mm, and the degree of depth is at 200～800nm, and the dimensional precision of width is in 0.01mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105440090A CN102464452A (en) | 2010-11-12 | 2010-11-12 | Glass product and production method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105440090A CN102464452A (en) | 2010-11-12 | 2010-11-12 | Glass product and production method thereof |
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|---|---|
| CN102464452A true CN102464452A (en) | 2012-05-23 |
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|---|---|---|---|
| CN2010105440090A Pending CN102464452A (en) | 2010-11-12 | 2010-11-12 | Glass product and production method thereof |
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|---|---|
| CN (1) | CN102464452A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103576957A (en) * | 2012-07-31 | 2014-02-12 | 瀚宇彩晶股份有限公司 | Touch device substrate with logo pattern and manufacturing method of touch device substrate |
| CN104860541A (en) * | 2015-05-12 | 2015-08-26 | 中国船舶重工集团公司第七一七研究所 | Polishing solution and polishing method |
| CN105513973A (en) * | 2016-02-19 | 2016-04-20 | 信利光电股份有限公司 | Blind hole manufacturing method |
| WO2017124324A1 (en) * | 2016-01-20 | 2017-07-27 | 华为技术有限公司 | Coated glass with window area and preparation method therefor |
| CN107445489A (en) * | 2016-05-30 | 2017-12-08 | 蓝思科技（长沙）有限公司 | The preparation method and glass plate of a kind of glass plate of grain pattern containing colored ink |
| CN108372746A (en) * | 2018-01-30 | 2018-08-07 | 瑞声科技(新加坡)有限公司 | 3D glass plates and its production method with textured pattern and mobile terminal |
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| SU947113A1 (en) * | 1980-04-29 | 1982-07-30 | Предприятие П/Я Р-6681 | Method for shaping surfaces of optical components |
| JPH04296025A (en) * | 1991-03-25 | 1992-10-20 | Nec Corp | Reactive ion etching method |
| CN1262246A (en) * | 1999-01-25 | 2000-08-09 | 北京北大未名科技文化发展公司 | Glass carving technology |
| CN2782429Y (en) * | 2005-01-13 | 2006-05-24 | 陈齐川 | Art and craft structure with stereo vision effect |
| CN101037185A (en) * | 2007-01-12 | 2007-09-19 | 中国科学院上海微系统与信息技术研究所 | Method for making nano-groove on quartz glass |
| US20090000640A1 (en) * | 2007-03-28 | 2009-01-01 | Kabushiki Kaisha Toshiba | Surface treatment method, etching method, and method for manufacturing electronic device |
| CN201183428Y (en) * | 2008-03-11 | 2009-01-21 | 常州市武进晨光金属涂料有限公司 | Glass plate with decorative pattern |
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- 2010-11-12 CN CN2010105440090A patent/CN102464452A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU947113A1 (en) * | 1980-04-29 | 1982-07-30 | Предприятие П/Я Р-6681 | Method for shaping surfaces of optical components |
| JPH04296025A (en) * | 1991-03-25 | 1992-10-20 | Nec Corp | Reactive ion etching method |
| CN1262246A (en) * | 1999-01-25 | 2000-08-09 | 北京北大未名科技文化发展公司 | Glass carving technology |
| CN2782429Y (en) * | 2005-01-13 | 2006-05-24 | 陈齐川 | Art and craft structure with stereo vision effect |
| CN101037185A (en) * | 2007-01-12 | 2007-09-19 | 中国科学院上海微系统与信息技术研究所 | Method for making nano-groove on quartz glass |
| US20090000640A1 (en) * | 2007-03-28 | 2009-01-01 | Kabushiki Kaisha Toshiba | Surface treatment method, etching method, and method for manufacturing electronic device |
| CN201183428Y (en) * | 2008-03-11 | 2009-01-21 | 常州市武进晨光金属涂料有限公司 | Glass plate with decorative pattern |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103576957A (en) * | 2012-07-31 | 2014-02-12 | 瀚宇彩晶股份有限公司 | Touch device substrate with logo pattern and manufacturing method of touch device substrate |
| CN104860541A (en) * | 2015-05-12 | 2015-08-26 | 中国船舶重工集团公司第七一七研究所 | Polishing solution and polishing method |
| WO2017124324A1 (en) * | 2016-01-20 | 2017-07-27 | 华为技术有限公司 | Coated glass with window area and preparation method therefor |
| CN108473367A (en) * | 2016-01-20 | 2018-08-31 | 华为技术有限公司 | A kind of coated glass and preparation method thereof with viewfinder area |
| CN105513973A (en) * | 2016-02-19 | 2016-04-20 | 信利光电股份有限公司 | Blind hole manufacturing method |
| CN105513973B (en) * | 2016-02-19 | 2018-06-08 | 信利光电股份有限公司 | A kind of production method of blind hole |
| CN107445489A (en) * | 2016-05-30 | 2017-12-08 | 蓝思科技（长沙）有限公司 | The preparation method and glass plate of a kind of glass plate of grain pattern containing colored ink |
| CN108372746A (en) * | 2018-01-30 | 2018-08-07 | 瑞声科技(新加坡)有限公司 | 3D glass plates and its production method with textured pattern and mobile terminal |
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Application publication date: 20120523 |