CN1891652B - Process for manufacturing glass back cover of organic electroluminescence display device on planer glass etching groove - Google Patents
Process for manufacturing glass back cover of organic electroluminescence display device on planer glass etching groove Download PDFInfo
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- CN1891652B CN1891652B CN2005100358652A CN200510035865A CN1891652B CN 1891652 B CN1891652 B CN 1891652B CN 2005100358652 A CN2005100358652 A CN 2005100358652A CN 200510035865 A CN200510035865 A CN 200510035865A CN 1891652 B CN1891652 B CN 1891652B
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Abstract
This invention relates to a mask used in glass etching and its application in glass etching, in which, the mask includes at least two layers of structures, one is mask material, the other is a glue layer, the mask material is placed above the glue layer and contacted with an etched glass via the glue layer, the mask can be bond on the etched glass stably and not easy to be corroded by acid, and the mask is fixed in the etching of glasses. It is not easy to fall off, it can prevent from acid liquid erosion. It's cost is low, efficiency is high. It can be randomly etched according to the etched pattern, and the groove can be manufactured with high accuracy.
Description
Technical field
The present invention relates to a kind of employing mask material, and in the glass etching process, especially the application in the organic elctroluminescent device glass back cover is made in etching.
Background technology
Along with the raising of Development of Multimedia Technology and people's quality of life, in technique of display, more and more higher to the flat-panel monitor performance demands.Display of organic electroluminescence is as present emerging a kind of flat-panel monitor, a series of advantages such as having from main light emission, low voltage direct drive, solidify entirely, the visual angle is wide, response speed is fast, color is abundant, be acknowledged as the main force of indicating meter of future generation, its principle of luminosity is the extremely thin luminous organic material of deposition between two electrodes, by to this luminous organic material in addition direct current make it luminous.
But, lost efficacy easily because luminous organic material is met water chance oxygen, thereby must carry out the bonnet encapsulation it, so that completely cut off aqueous vapor oxygen, prolong the work-ing life of indicating meter.At present, mainly be to adopt metal back cover, glass back cover or film to encapsulate.Wherein, the die cost of the making of metal back cover is higher, and different because of its coefficient of expansion with glass, makes the device distortion easily; And thin-film package does not also reach the level of practicability; So what use at most is glass back cover, for the requirement of this glass back cover be will be on flat glass the smooth groove in etching bottom so that in groove, load siccative.
The traditional fabrication method of glass back cover is: earlier at the thicker anti-etching protective layer of the front and rear surfaces printing of sheet glass; then the wherein one side of glass paint out need the groove pattern of etching and remove protective layer in this pattern after; place corrosive fluid to etch groove, remove the protective layer of glass surface at last.
Adopt this lithographic method, the white flocks that etching liquid and glass reaction generate will stop the carrying out of reaction, be difficult to reach the ideal depth of groove.By long-time immersion or add ways such as ultrasonic, can help etching liquid to penetrate batt layer, reach certain etching depth, but the homogeneity of etching liquid infiltration is difficult to control, and the surface that etches can be uneven, and both the glass back cover depth of groove can't accurately be controlled, also require double spread simultaneously at glass, prevent the outside surface of etching glass bonnet, remove two-sided protective layer again after etching groove, production efficiency is low and cost is high; Also have, owing to corrode with the time metering, the sedimentary influence of etching in addition, the glass back cover depth of groove can't accurately be controlled, and the degree of depth of etching is limited.
This is the topmost way of glass etching in the existing glass industry.Not only make the glass back cover of organic elctroluminescent device in other words, also have identical problem for other glass etching for etching.
Summary of the invention
Therefore; at above-mentioned problem; top priority of the present invention provides a kind ofly can effectively resist hydrofluoric acid corrosive protective layer; be a kind ofly to be used for mask that glass etching makes and in the application of glass etching; this mask can stably be incorporated into the on glass of institute's etching; be difficult for simultaneously by acid attack, with low cost, easy to use.
Another object of the present invention provides and a kind ofly is used for mask that glass etching makes and in the application of glass etching, this mask is applied in the etching of glass, difficult drop-off, effectively prevent that acid solution lateral erosion, cost are inefficient high, can be according to the random quarter of institute's erosive pattern form, and groove is made the precision height.
A further object of the present invention provides and a kind ofly is used for mask that glass etching makes and in the application of glass etching, this mask can and dwindle along with the expansion of glass and change and change, simultaneously glass also had horizontal drawing force, can prevent glass deformation, it can be applicable to etching glass pattern, decorative pattern, and even makes the glass back cover of organic elctroluminescent device in order to etching.
Therefore, the present invention is achieved in that
A kind of mask that is used for the glass etching making is characterized in that this mask has double-layer structure at least, and one deck is a mask material, and one deck is an adhesive-layer, and mask material is positioned at the top of adhesive-layer, by the glass contact of adhesive-layer and institute's etching.
This mask material be thickness between 80～300 microns, and PVC, PE family macromolecule adhesive tape with hydrophobic nature.
The described mask that is used for the glass etching making, it can also include protective layer, and this protective layer is positioned at the below of adhesive-layer, with the protection adhesive-layer, takes off protective layer in use, and mask material and adhesive-layer are covered on glass getting final product.
Above-mentioned mask, it can be a PVC tape.
Above-mentioned mask can also be all kinds of protective tapes.
A kind of mask that is used for the glass etching making is characterized in that it can be applicable to glass etching.
Above-mentioned be used for the mask that glass etching is made, it especially can be applicable in the etching of glass back cover of organic elctroluminescent device.
Specifically, the present invention adopts following technical scheme to be applied in the etching of glass back cover of organic elctroluminescent device: etch the groove that the degree of depth is even, the bottom is smooth by the materials used mask on flat glass, finish the making of device package glass back cover.The processing method that etched recesses is made described glass back cover on flat glass comprises the steps:
The sheet glass that A, sanction are selected desired size cleans;
B, with smooth being affixed on the sheet glass after the cleaning of mask material, the protective membrane that is about to mask material is opened, make its mucilage glue surface and glass surface fully sticking with.
C, carve on mask material according to used drying sheet size and to need corrosive groove frame, and throw off the mask material of required corrosion area, the viscose glue that the zone is taken off by institute together comes off with mask material, exposes the glass surface of need etching;
D, will place through the sheet glass of above-mentioned making stably on the worktable, and corrosive fluid evenly will be sprayed on required etch areas carry out etching.Because mask used material has hydrophobic nature, do not soak into corrosive fluid, corrosive fluid can be automatically by materials limitations in the need etch areas.
Corrosive fluid and throw out are removed after the flocks of one deck white occurring in E, zone to be etched, and repeating step D is until obtaining required depth of groove.
After F, etching finish, the sheet glass of making is soaked in the solution that removes photoresist, treat 2-3 hour after, take out sheet glass, the mask material on it is peeled off is promptly made the described glass back cover that is used for the organic elctroluminescent device encapsulation.
Above-mentioned corrosive fluid can be according to hydrofluoric acid: nitric acid: water, volume proportion are 5: 1: 1 to 5: 1: 3 corrosive fluid.
Above-mentioned mask material, its step B can be incorporated in step C, the mask material that promptly directly has etching pattern in covering on glass, the pattern part of institute's etching is indicated in mask material or is drawn, there is not mask material in this part, can directly corrode after being pasted with mask material like this.
Above-mentioned mask material, it is to the etching of the glass pattern of certain depth, by repeatedly repeating step D realization, being about to corrosive fluid is coated on the need corrosive pattern of sheet glass, corrode, after the flocks of one deck white appears in zone to be etched, remove corrosive fluid and throw out, repeating step D, because throw out can stop that corrosive carries out, thus the depth of corrosion of a certain amount of corrosion thing can calculate or come out, for the corrosion pattern that requires appropriate depth, by digitizing metering corrosion number of times, obtain the depth of groove of required etching pattern accurately.
Compare with prior art, organic elctroluminescent device glass back cover of the present invention can effectively be controlled the erosion grooves size, the accuracy of grooves height that effectively prevent the acid solution lateral erosion, makes owing to used the hydrophobic material mask in corrosion process; The material therefor low price, easy to use, the protective membrane of opening mask material can be bonding with itself and sheet glass, saved in the prior art because of making and remove the inconvenience that protective layer brings, the inefficient height of cost.
Description of drawings
Fig. 1 is the synoptic diagram of mask used material section;
Fig. 2 is the schematic cross-section of sheet glass and mask thereof in the etching process;
Fig. 3 is the organic electro luminescent display device synoptic diagram by made glass back cover encapsulation.
Embodiment
Describe in further detail adopting glass back cover making method of the present invention in conjunction with accompanying schematic figure.
The present invention adopts following technical scheme: etch the groove 10 that the degree of depth is even, the bottom is smooth by materials used 2 masks on flat glass, finish the making of device package glass back cover.The processing method that etched recesses is made described glass back cover on flat glass comprises the steps:
The sheet glass that A, sanction are selected desired size cleans;
Size is selected as required, can select the independent partial sheet glass of etching that only needs, and as one glass back cover, also can select a plurality ofly, and as forming the sheet glass of whole piece, dividing above has a plurality of glass back cover; Carry out drying after the cleaning in addition, so that bonding with mask;
B, with smooth being affixed on the sheet glass after the cleaning of mask material, the protective membrane 4 that is about to mask material is opened, make its mucilage glue surface 3 and glass surface fully sticking and;
Fully in other words bonding, very close to each other between mask material and the sheet glass, prevent the erosion of corrosive fluid to the sheet glass that do not need etching;
C, carve on mask material according to the size of used drying sheet 9 and to need corrosive groove 10 frames, and throw off the mask material of required corrosion area, the viscose glue that the zone is taken off by institute together comes off with mask material, exposes the glass surface of need etching;
In other embodiment, step B and C can merge, and promptly can directly the mask material that removes etched portions be covered on the sheet glass;
D, will place through the sheet glass of above-mentioned making stably on the worktable, and corrosive fluid 5 (for example: adopt hydrofluoric acid: nitric acid: water, volume proportion are that 5: 1: 1 to 5: 1: 3 mixing solutions is as corrosive fluid) evenly will be sprayed on required etch areas carry out etching; Because mask used material has hydrophobic nature, corrosive fluid can be gathered automatically, converges in the need etch areas by the mask material restriction, can reach etching exactly;
Corrosive fluid and throw out are removed after the flocks of one deck white occurring in E, zone to be etched, and repeating step D is until obtaining required groove 10 degree of depth;
The mode of disgorging has multiple, normally adopts the way of water flushing, cleaning that can be quick, clean like this;
After F, etching finish, the sheet glass of making is soaked in the solution that removes photoresist, treat 2-3 hour after, take out sheet glass, the mask material on it 2 is peeled off is promptly made the described glass back cover 12 that is used for the organic elctroluminescent device encapsulation.
Immersion is to transfer hydrofluoric acid for abundant neutralization, prevents the corrosion of residual hydrofluoric acid to human body and other parts, and the time of immersion is normally according to the concentration decision of hydrofluoric acid in the way of custom and the corrosive fluid.
The organic electroluminescence device of using the glass back cover encapsulation that aforesaid method makes as shown in Figure 3, the drying sheet 9 in the glass back cover 12 is affixed in the groove 10, and by packaging plastic 11 and device glass 1 adhesive seal.6,7,8 anode, luminescent layer and negative electrodes that are respectively device.
The lithographic method of above-mentioned glass removes carves the making that is applied to the organic electroluminescence device glass back cover, also can be applicable to such as other glass industries such as glass-engravings.
Claims (4)
- One kind on flat glass etched recesses make the processing method of the glass back cover of organic elctroluminescent device; this mask has three-decker from top to bottom; one deck is a mask material; one deck is a mucilage glue surface, and one deck is a protective membrane, and wherein mask material has hydrophobic nature; belong to PVC, PE family macromolecule material; thickness is characterized in that in the scope of 80-300 micron this making method comprises the steps:The sheet glass that A, sanction are selected desired size cleans;B, with smooth being affixed on the sheet glass after the cleaning of mask material, the protective membrane that is about to mask material is opened, make mucilage glue surface and glass surface fully sticking with;C, carve on mask material according to used drying sheet size and to need corrosive groove frame, and throw off the mask material of required corrosion area, the viscose glue that the mucilage glue surface in zone is taken off by institute together comes off with mask material, exposes the glass surface of need etching;D, will place through the sheet glass of above-mentioned making stably on the worktable, and corrosive fluid evenly will be sprayed on required etch areas carry out etching, corrosive fluid can be limited in by mask material automatically and need in the etch areas;Corrosive fluid and throw out are removed after the flocks of one deck white occurring in E, zone to be etched, and repeating step D is until obtaining required depth of groove;After F, etching finish, the sheet glass of making is soaked in the solution that removes photoresist, treat 2-3 hour after, take out sheet glass, the mask material on it is peeled off.
- 2. as claimed in claim 1 on flat glass etched recesses make the processing method of the glass back cover of organic elctroluminescent device, it is characterized in that, corrosive fluid among the step D is by hydrofluoric acid: nitric acid: water, the corrosive fluid that mixed in the scope in 5: 1: 3 to 5: 1: 1 at volume proportion.
- 3. as claimed in claim 1 on flat glass etched recesses make the processing method of the glass back cover of organic elctroluminescent device, it is characterized in that, above-mentioned mask material, it is to the etching of the glass pattern of certain depth, by repeatedly repeating step D realization, being about to corrosive fluid is coated on the need corrosive pattern of sheet glass, corrode, after the flocks of one deck white appears in zone to be etched, remove corrosive fluid and throw out, repeating step D by digitizing metering corrosion number of times, obtains the depth of groove of required etching pattern accurately.
- 4. as claimed in claim 1 on flat glass etched recesses make the processing method of the glass back cover of organic elctroluminescent device, it is characterized in that, step B and step C can merge, the mask material that promptly directly will remove etched portions is covered on the sheet glass, the pattern part of institute's etching is indicated in mask material or is drawn, there is not mask material in this part, can directly corrode after being pasted with mask material like this.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005100358652A CN1891652B (en) | 2005-07-06 | 2005-07-06 | Process for manufacturing glass back cover of organic electroluminescence display device on planer glass etching groove |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2005100358652A CN1891652B (en) | 2005-07-06 | 2005-07-06 | Process for manufacturing glass back cover of organic electroluminescence display device on planer glass etching groove |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1891652A CN1891652A (en) | 2007-01-10 |
| CN1891652B true CN1891652B (en) | 2011-05-18 |
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| CN2005100358652A Expired - Fee Related CN1891652B (en) | 2005-07-06 | 2005-07-06 | Process for manufacturing glass back cover of organic electroluminescence display device on planer glass etching groove |
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Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI461378B (en) * | 2012-10-12 | 2014-11-21 | Global Display Co Ltd | Method for manufacturing glass substrate having arched surface |
| CN102969393A (en) * | 2012-10-19 | 2013-03-13 | 华南理工大学 | Method for patterning indium tin oxide film (ITO) film on substrate |
| CN103159409A (en) * | 2013-03-27 | 2013-06-19 | 城步新鼎盛电子科技有限公司 | Method for generating protective layer for etching forming of toughened glass cover plate |
| CN104363730A (en) | 2014-11-25 | 2015-02-18 | 深圳市华星光电技术有限公司 | Glass cover plate structure |
| CN104926145A (en) * | 2015-05-20 | 2015-09-23 | 安徽力华光电玻璃科技有限公司 | Glass etching process |
| TWI755486B (en) | 2017-02-16 | 2022-02-21 | 美商康寧公司 | Backlight unit with one dimensional dimming |
| US11186518B2 (en) * | 2017-02-16 | 2021-11-30 | Corning Incorporated | Methods of making a glass article with a structured surface |
| CN109721253A (en) * | 2019-01-24 | 2019-05-07 | 凤阳硅谷智能有限公司 | A kind of preparation method of glass light guide plate |
| CN110723909A (en) * | 2019-10-29 | 2020-01-24 | 维达力实业(深圳)有限公司 | Method for processing decorative pattern and microscopic texture on surface of base material |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6100183A (en) * | 1998-05-29 | 2000-08-08 | United Semiconductor Corp. | Method for fabricating a via |
| CN1404624A (en) * | 2000-12-22 | 2003-03-19 | 精工爱普生株式会社 | Pattern forming method and device and semiconductor device, electric circuit, display element module and luminous element |
| CN1562841A (en) * | 2004-04-09 | 2005-01-12 | 信利半导体有限公司 | Method for fabricating organic electroluminescent display and back cover made from glass |
-
2005
- 2005-07-06 CN CN2005100358652A patent/CN1891652B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6100183A (en) * | 1998-05-29 | 2000-08-08 | United Semiconductor Corp. | Method for fabricating a via |
| CN1404624A (en) * | 2000-12-22 | 2003-03-19 | 精工爱普生株式会社 | Pattern forming method and device and semiconductor device, electric circuit, display element module and luminous element |
| CN1562841A (en) * | 2004-04-09 | 2005-01-12 | 信利半导体有限公司 | Method for fabricating organic electroluminescent display and back cover made from glass |
Non-Patent Citations (1)
| Title |
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| JP昭60-96774A 1985.05.30 |
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