TWI476240B - Resin composition - Google Patents
Resin composition Download PDFInfo
- Publication number
- TWI476240B TWI476240B TW099134418A TW99134418A TWI476240B TW I476240 B TWI476240 B TW I476240B TW 099134418 A TW099134418 A TW 099134418A TW 99134418 A TW99134418 A TW 99134418A TW I476240 B TWI476240 B TW I476240B
- Authority
- TW
- Taiwan
- Prior art keywords
- compound
- group
- monomer
- resin composition
- methyl
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/062—Copolymers with monomers not covered by C08L33/06
- C08L33/068—Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F216/14—Monomers containing only one unsaturated aliphatic radical
- C08F216/16—Monomers containing no hetero atoms other than the ether oxygen
- C08F216/165—Carbocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/20—Compounding polymers with additives, e.g. colouring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0041—Optical brightening agents, organic pigments
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3495—Six-membered rings condensed with carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/66—Substances characterised by their function in the composition
- C08L2666/70—Organic dyes or pigments; Optical brightening agents
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Electroluminescent Light Sources (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009238601 | 2009-10-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201130905A TW201130905A (en) | 2011-09-16 |
TWI476240B true TWI476240B (zh) | 2015-03-11 |
Family
ID=43907353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099134418A TWI476240B (zh) | 2009-10-15 | 2010-10-08 | Resin composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5620774B2 (ko) |
KR (1) | KR101746849B1 (ko) |
CN (1) | CN102040795A (ko) |
TW (1) | TWI476240B (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6193542B2 (ja) * | 2011-05-30 | 2017-09-06 | 住友化学株式会社 | 硬化性樹脂組成物 |
JP2013113973A (ja) * | 2011-11-28 | 2013-06-10 | Toppan Printing Co Ltd | 液晶表示装置用カラーフィルタ及び液晶表示装置 |
JP6015481B2 (ja) * | 2012-03-28 | 2016-10-26 | Jsr株式会社 | カラーフィルタ、有機el表示素子及び着色組成物 |
KR102066287B1 (ko) * | 2012-06-11 | 2020-01-14 | 스미또모 가가꾸 가부시키가이샤 | 착색 감광성 수지 조성물 |
JP6097029B2 (ja) * | 2012-07-25 | 2017-03-15 | 株式会社Dnpファインケミカル | エネルギー線硬化性樹脂組成物、この組成物を用いた保護膜、タッチパネル部材及びタッチパネル部材の製造方法 |
JP6040659B2 (ja) * | 2012-09-14 | 2016-12-07 | 日油株式会社 | 紫外線吸収性ハードコートフィルム |
JP2016056323A (ja) * | 2014-09-12 | 2016-04-21 | 住友化学株式会社 | 硬化性樹脂組成物 |
US10674612B2 (en) | 2014-11-18 | 2020-06-02 | Hitachi Chemical Company, Ltd. | Semiconductor device and manufacturing method therefor, and resin composition for forming flexible resin layer |
JP7227738B2 (ja) * | 2018-11-07 | 2023-02-22 | サカタインクス株式会社 | 皮膜形成用組成物、該皮膜形成用組成物を塗工してなるガラス基材、及び、該ガラス基材を用いてなるタッチパネル |
JP6979559B1 (ja) * | 2020-12-21 | 2021-12-15 | 東洋インキScホールディングス株式会社 | 活性エネルギー線硬化性ハードコート剤、ハードコート層および積層体 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005242279A (ja) * | 2003-04-24 | 2005-09-08 | Sumitomo Chemical Co Ltd | 黒色感光性樹脂組成物 |
JP2006126397A (ja) * | 2004-10-28 | 2006-05-18 | Jsr Corp | 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル |
JP2008218004A (ja) * | 2007-02-28 | 2008-09-18 | Hitachi Displays Ltd | 有機el表示装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11133600A (ja) * | 1997-10-30 | 1999-05-21 | Jsr Corp | 表示パネルスペーサー用感放射線性樹脂組成物 |
JP2000035670A (ja) * | 1998-07-21 | 2000-02-02 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
TWI337689B (en) * | 2003-04-24 | 2011-02-21 | Sumitomo Chemical Co | Black photosensitive resin composition |
CN101206402A (zh) * | 2006-12-22 | 2008-06-25 | 住友化学株式会社 | 感光性树脂组合物 |
-
2010
- 2010-10-05 JP JP2010225774A patent/JP5620774B2/ja active Active
- 2010-10-08 TW TW099134418A patent/TWI476240B/zh active
- 2010-10-11 CN CN2010105056734A patent/CN102040795A/zh active Pending
- 2010-10-12 KR KR1020100099071A patent/KR101746849B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005242279A (ja) * | 2003-04-24 | 2005-09-08 | Sumitomo Chemical Co Ltd | 黒色感光性樹脂組成物 |
JP2006126397A (ja) * | 2004-10-28 | 2006-05-18 | Jsr Corp | 感光性樹脂組成物、表示パネル用スペーサーおよび表示パネル |
JP2008218004A (ja) * | 2007-02-28 | 2008-09-18 | Hitachi Displays Ltd | 有機el表示装置 |
Also Published As
Publication number | Publication date |
---|---|
CN102040795A (zh) | 2011-05-04 |
TW201130905A (en) | 2011-09-16 |
JP2011102385A (ja) | 2011-05-26 |
KR20110041411A (ko) | 2011-04-21 |
KR101746849B1 (ko) | 2017-06-14 |
JP5620774B2 (ja) | 2014-11-05 |
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