TWI472271B - High frequency power supply device and ignition voltage selection method - Google Patents
High frequency power supply device and ignition voltage selection method Download PDFInfo
- Publication number
- TWI472271B TWI472271B TW102100412A TW102100412A TWI472271B TW I472271 B TWI472271 B TW I472271B TW 102100412 A TW102100412 A TW 102100412A TW 102100412 A TW102100412 A TW 102100412A TW I472271 B TWI472271 B TW I472271B
- Authority
- TW
- Taiwan
- Prior art keywords
- power supply
- load
- voltage
- cable
- frequency power
- Prior art date
Links
- 238000010187 selection method Methods 0.000 title claims description 10
- 239000003990 capacitor Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 230000005540 biological transmission Effects 0.000 description 12
- 238000012545 processing Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 230000010354 integration Effects 0.000 description 5
- 230000003321 amplification Effects 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000010248 power generation Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
- H01J37/32183—Matching circuits
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
- H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
- H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
- H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/5387—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration
- H02M7/53871—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration with automatic control of output voltage or current
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
- H02M7/00—Conversion of AC power input into DC power output; Conversion of DC power input into AC power output
- H02M7/42—Conversion of DC power input into AC power output without possibility of reversal
- H02M7/44—Conversion of DC power input into AC power output without possibility of reversal by static converters
- H02M7/48—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode
- H02M7/53—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal
- H02M7/537—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters
- H02M7/5387—Conversion of DC power input into AC power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode using devices of a triode or transistor type requiring continuous application of a control signal using semiconductor devices only, e.g. single switched pulse inverters in a bridge configuration
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2242/00—Auxiliary systems
- H05H2242/20—Power circuits
- H05H2242/26—Matching networks
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Power Engineering (AREA)
- Plasma Technology (AREA)
- Inverter Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012137140A JP5534366B2 (ja) | 2012-06-18 | 2012-06-18 | 高周波電力供給装置、及びイグニッション電圧選定方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201401938A TW201401938A (zh) | 2014-01-01 |
| TWI472271B true TWI472271B (zh) | 2015-02-01 |
Family
ID=49768588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102100412A TWI472271B (zh) | 2012-06-18 | 2013-01-07 | High frequency power supply device and ignition voltage selection method |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9072159B2 (https=) |
| EP (1) | EP2833702B1 (https=) |
| JP (1) | JP5534366B2 (https=) |
| KR (1) | KR101556874B1 (https=) |
| CN (1) | CN104322153B (https=) |
| DE (1) | DE13806362T1 (https=) |
| IN (1) | IN2014KN02414A (https=) |
| PL (1) | PL2833702T3 (https=) |
| TW (1) | TWI472271B (https=) |
| WO (1) | WO2013190986A1 (https=) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8783220B2 (en) * | 2008-01-31 | 2014-07-22 | West Virginia University | Quarter wave coaxial cavity igniter for combustion engines |
| JP6413261B2 (ja) * | 2014-03-03 | 2018-10-31 | 株式会社島津製作所 | Ｉｃｐ発光分析装置用高周波電源装置 |
| JP5797313B1 (ja) * | 2014-08-25 | 2015-10-21 | 株式会社京三製作所 | 回生サーキュレータ、高周波電源装置、及び高周波電力の回生方法 |
| KR101760187B1 (ko) | 2015-11-17 | 2017-07-20 | 주식회사 한화 | 고전압 펄스 전달 케이블 |
| US10026592B2 (en) * | 2016-07-01 | 2018-07-17 | Lam Research Corporation | Systems and methods for tailoring ion energy distribution function by odd harmonic mixing |
| KR102575531B1 (ko) | 2017-01-31 | 2023-09-06 | 삼성디스플레이 주식회사 | 표시 패널 및 이를 포함하는 표시 장치 |
| US10502773B2 (en) * | 2017-08-16 | 2019-12-10 | Connaught Electronics Ltd. | System and method for diagnosing electrical faults |
| KR102003942B1 (ko) * | 2017-11-07 | 2019-07-25 | 한국원자력연구원 | 정합 장치를 포함하는 플라즈마 발생 장치 및 임피던스 정합 방법 |
| US12288673B2 (en) | 2017-11-29 | 2025-04-29 | COMET Technologies USA, Inc. | Retuning for impedance matching network control |
| KR102644960B1 (ko) | 2017-11-29 | 2024-03-07 | 코멧 테크놀로지스 유에스에이, 인크. | 임피던스 매칭 네트워크 제어를 위한 리튜닝 |
| GB201806783D0 (en) * | 2018-04-25 | 2018-06-06 | Spts Technologies Ltd | A plasma generating arrangement |
| US11527385B2 (en) | 2021-04-29 | 2022-12-13 | COMET Technologies USA, Inc. | Systems and methods for calibrating capacitors of matching networks |
| US11114279B2 (en) | 2019-06-28 | 2021-09-07 | COMET Technologies USA, Inc. | Arc suppression device for plasma processing equipment |
| US11107661B2 (en) | 2019-07-09 | 2021-08-31 | COMET Technologies USA, Inc. | Hybrid matching network topology |
| US11596309B2 (en) | 2019-07-09 | 2023-03-07 | COMET Technologies USA, Inc. | Hybrid matching network topology |
| EP4022656A4 (en) | 2019-08-28 | 2023-10-04 | Comet Technologies USA, Inc | HIGH POWER LOW FREQUENCY COILS |
| KR102223875B1 (ko) | 2019-10-30 | 2021-03-05 | 주식회사 뉴파워 프라즈마 | 다중 주파수를 사용하는 건식 식각 장비를 위한 고주파 전원 장치 |
| US11887820B2 (en) | 2020-01-10 | 2024-01-30 | COMET Technologies USA, Inc. | Sector shunts for plasma-based wafer processing systems |
| US11670488B2 (en) | 2020-01-10 | 2023-06-06 | COMET Technologies USA, Inc. | Fast arc detecting match network |
| US11521832B2 (en) | 2020-01-10 | 2022-12-06 | COMET Technologies USA, Inc. | Uniformity control for radio frequency plasma processing systems |
| US11830708B2 (en) | 2020-01-10 | 2023-11-28 | COMET Technologies USA, Inc. | Inductive broad-band sensors for electromagnetic waves |
| US12027351B2 (en) | 2020-01-10 | 2024-07-02 | COMET Technologies USA, Inc. | Plasma non-uniformity detection |
| US11961711B2 (en) | 2020-01-20 | 2024-04-16 | COMET Technologies USA, Inc. | Radio frequency match network and generator |
| US11605527B2 (en) | 2020-01-20 | 2023-03-14 | COMET Technologies USA, Inc. | Pulsing control match network |
| US11373844B2 (en) | 2020-09-28 | 2022-06-28 | COMET Technologies USA, Inc. | Systems and methods for repetitive tuning of matching networks |
| US12057296B2 (en) | 2021-02-22 | 2024-08-06 | COMET Technologies USA, Inc. | Electromagnetic field sensing device |
| US11923175B2 (en) | 2021-07-28 | 2024-03-05 | COMET Technologies USA, Inc. | Systems and methods for variable gain tuning of matching networks |
| JP7473510B2 (ja) * | 2021-08-31 | 2024-04-23 | 株式会社京三製作所 | Ｒｆ帯域電源装置、及びパルス幅変調制御方法 |
| KR102771011B1 (ko) | 2021-12-17 | 2025-02-24 | 세메스 주식회사 | 플라즈마 공정 설비의 케이블 길이 선정 방법 및 케이블 길이 선정 장치 |
| US12243717B2 (en) | 2022-04-04 | 2025-03-04 | COMET Technologies USA, Inc. | Variable reactance device having isolated gate drive power supplies |
| US11657980B1 (en) | 2022-05-09 | 2023-05-23 | COMET Technologies USA, Inc. | Dielectric fluid variable capacitor |
| US12040139B2 (en) | 2022-05-09 | 2024-07-16 | COMET Technologies USA, Inc. | Variable capacitor with linear impedance and high voltage breakdown |
| US12051549B2 (en) | 2022-08-02 | 2024-07-30 | COMET Technologies USA, Inc. | Coaxial variable capacitor |
| US12132435B2 (en) | 2022-10-27 | 2024-10-29 | COMET Technologies USA, Inc. | Method for repeatable stepper motor homing |
| KR102790867B1 (ko) | 2023-02-24 | 2025-04-04 | 주식회사 동도뉴텍 | 콘크리트 회수수 농도 측정 장치 |
| KR20240139679A (ko) * | 2023-03-15 | 2024-09-24 | 삼성전자주식회사 | 전원 공급 장치와 그를 포함하는 전자 장치 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6089181A (en) * | 1996-07-23 | 2000-07-18 | Tokyo Electron Limited | Plasma processing apparatus |
| US6242360B1 (en) * | 1999-06-29 | 2001-06-05 | Lam Research Corporation | Plasma processing system apparatus, and method for delivering RF power to a plasma processing |
| TW462092B (en) * | 1999-05-06 | 2001-11-01 | Tokyo Electron Ltd | Plasma processing system |
| JP2003178989A (ja) * | 2001-10-02 | 2003-06-27 | Mitsubishi Heavy Ind Ltd | プラズマｃｖｄ装置、及び、その電気的欠陥検出方法 |
| TWI339413B (en) * | 2003-02-12 | 2011-03-21 | Tokyo Electron Ltd | Plasma processing unit and high-frequency electric power supplying unit |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0436482A (ja) * | 1990-05-30 | 1992-02-06 | Mitsubishi Electric Corp | プラズマ処理装置 |
| US5195045A (en) * | 1991-02-27 | 1993-03-16 | Astec America, Inc. | Automatic impedance matching apparatus and method |
| US20110121735A1 (en) * | 2000-02-22 | 2011-05-26 | Kreos Capital Iii (Uk) Limited | Tissue resurfacing |
| JP2010114001A (ja) * | 2008-11-07 | 2010-05-20 | Shimada Phys & Chem Ind Co Ltd | プラズマ発生用電源装置 |
| JP5210905B2 (ja) * | 2009-01-30 | 2013-06-12 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| CN201417951Y (zh) * | 2009-05-22 | 2010-03-03 | 宁波市北仑港龙电器有限公司 | 调谐滤波器 |
-
2012
- 2012-06-18 JP JP2012137140A patent/JP5534366B2/ja active Active
-
2013
- 2013-01-07 TW TW102100412A patent/TWI472271B/zh active
- 2013-06-03 WO PCT/JP2013/065338 patent/WO2013190986A1/ja not_active Ceased
- 2013-06-03 KR KR1020147033882A patent/KR101556874B1/ko active Active
- 2013-06-03 EP EP13806362.3A patent/EP2833702B1/en active Active
- 2013-06-03 DE DE2038106362 patent/DE13806362T1/de active Pending
- 2013-06-03 IN IN2414KON2014 patent/IN2014KN02414A/en unknown
- 2013-06-03 CN CN201380028343.2A patent/CN104322153B/zh active Active
- 2013-06-03 US US14/391,373 patent/US9072159B2/en active Active
- 2013-06-03 PL PL13806362T patent/PL2833702T3/pl unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6089181A (en) * | 1996-07-23 | 2000-07-18 | Tokyo Electron Limited | Plasma processing apparatus |
| TW462092B (en) * | 1999-05-06 | 2001-11-01 | Tokyo Electron Ltd | Plasma processing system |
| US6242360B1 (en) * | 1999-06-29 | 2001-06-05 | Lam Research Corporation | Plasma processing system apparatus, and method for delivering RF power to a plasma processing |
| JP2003178989A (ja) * | 2001-10-02 | 2003-06-27 | Mitsubishi Heavy Ind Ltd | プラズマｃｖｄ装置、及び、その電気的欠陥検出方法 |
| TWI339413B (en) * | 2003-02-12 | 2011-03-21 | Tokyo Electron Ltd | Plasma processing unit and high-frequency electric power supplying unit |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2833702A1 (en) | 2015-02-04 |
| US20150115797A1 (en) | 2015-04-30 |
| DE13806362T1 (de) | 2015-04-30 |
| EP2833702A4 (en) | 2015-08-05 |
| IN2014KN02414A (https=) | 2015-05-01 |
| PL2833702T3 (pl) | 2017-05-31 |
| CN104322153A (zh) | 2015-01-28 |
| US9072159B2 (en) | 2015-06-30 |
| KR20140146231A (ko) | 2014-12-24 |
| CN104322153B (zh) | 2016-05-25 |
| JP5534366B2 (ja) | 2014-06-25 |
| JP2014002909A (ja) | 2014-01-09 |
| WO2013190986A1 (ja) | 2013-12-27 |
| KR101556874B1 (ko) | 2015-10-01 |
| TW201401938A (zh) | 2014-01-01 |
| EP2833702B1 (en) | 2016-12-14 |
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