TWI465280B - Separation method and separation device - Google Patents

Separation method and separation device Download PDF

Info

Publication number
TWI465280B
TWI465280B TW101106790A TW101106790A TWI465280B TW I465280 B TWI465280 B TW I465280B TW 101106790 A TW101106790 A TW 101106790A TW 101106790 A TW101106790 A TW 101106790A TW I465280 B TWI465280 B TW I465280B
Authority
TW
Taiwan
Prior art keywords
liquid
mixed acid
distillation
hydrogen fluoride
hydrofluoric acid
Prior art date
Application number
TW101106790A
Other languages
English (en)
Chinese (zh)
Other versions
TW201236738A (en
Inventor
Hideki Yamamoto
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of TW201236738A publication Critical patent/TW201236738A/zh
Application granted granted Critical
Publication of TWI465280B publication Critical patent/TWI465280B/zh

Links

Landscapes

  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Removal Of Specific Substances (AREA)
  • ing And Chemical Polishing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
TW101106790A 2011-03-03 2012-03-01 Separation method and separation device TWI465280B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011046718A JP2012183457A (ja) 2011-03-03 2011-03-03 分離方法および分離装置

Publications (2)

Publication Number Publication Date
TW201236738A TW201236738A (en) 2012-09-16
TWI465280B true TWI465280B (zh) 2014-12-21

Family

ID=46806899

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101106790A TWI465280B (zh) 2011-03-03 2012-03-01 Separation method and separation device

Country Status (3)

Country Link
JP (1) JP2012183457A (enExample)
CN (1) CN102674254B (enExample)
TW (1) TWI465280B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140063449A (ko) * 2012-11-15 2014-05-27 오지 가부시키가이샤 Si 함유 불산계 폐액으로부터 Si를 제거하는 방법과 Si 함유 불산계 혼산 폐액으로부터 불산을 회수하는 방법 및 회수장치
JP5941028B2 (ja) * 2012-11-15 2016-06-29 オー・ジー株式会社 Si含有フッ酸系廃液からSiを除去する方法及びSi含有フッ酸系混酸廃液からフッ酸を回収する方法
JP2014151269A (ja) * 2013-02-08 2014-08-25 Seiko Epson Corp エッチング液の再生方法およびエッチング液再生装置
CN103566606B (zh) * 2013-11-04 2015-03-04 中国地质大学(武汉) 一种多功能提纯装置以及利用该装置提纯氟化氢铵的方法
CN110104864A (zh) * 2019-06-06 2019-08-09 盛隆资源再生(无锡)有限公司 一种酸性磷酸型含氟含氨废水的处理方法
CN110272159A (zh) * 2019-06-17 2019-09-24 苏州乔发环保科技股份有限公司 一种工业废水中无机盐的资源化处理方法及装置
CN113045089B (zh) * 2021-03-15 2023-04-18 盛隆资源再生(无锡)有限公司 一种蚀刻废液精制纯化的方法
CN113358436B (zh) * 2021-06-11 2022-12-30 中国科学技术大学 氟化氢铵的提纯装置及方法
CN113880048B (zh) * 2021-09-30 2023-06-27 中化蓝天霍尼韦尔新材料有限公司 一种氢氟酸高效回收系统及方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05170435A (ja) * 1991-10-03 1993-07-09 Hashimoto Kasei Kk フッ素系エッチング剤からフッ化カルシウムを回収する方法
CN101028919A (zh) * 2006-02-27 2007-09-05 三菱化学工程株式会社 氟酸的回收方法
JP2008189483A (ja) * 2007-02-01 2008-08-21 Morita Kagaku Kogyo Kk フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4936955A (en) * 1988-08-12 1990-06-26 Alameda Instruments, Inc. Hydrofluoric acid reprocessing for semiconductor standards
JPH03267189A (ja) * 1990-03-16 1991-11-28 Konica Corp 写真処理廃液の蒸発濃縮装置
CN1180043A (zh) * 1997-11-10 1998-04-29 应烈荣 一种含氟硫酸提取氢氟酸的工艺
JP4581618B2 (ja) * 2004-10-14 2010-11-17 三菱化学エンジニアリング株式会社 フッ酸の回収方法
DE102006040830A1 (de) * 2006-08-31 2008-03-06 Wacker Chemie Ag Verfahren zur Aufarbeitung einer Ätzmischung, die bei der Herstellung von hochreinem Silicium anfällt
CN201253537Y (zh) * 2008-09-04 2009-06-10 常熟市胜诺环保设备有限公司 混酸废气处理装置
JP5347664B2 (ja) * 2009-04-03 2013-11-20 栗田工業株式会社 フッ素含有排水の処理方法及び処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05170435A (ja) * 1991-10-03 1993-07-09 Hashimoto Kasei Kk フッ素系エッチング剤からフッ化カルシウムを回収する方法
CN101028919A (zh) * 2006-02-27 2007-09-05 三菱化学工程株式会社 氟酸的回收方法
JP2008189483A (ja) * 2007-02-01 2008-08-21 Morita Kagaku Kogyo Kk フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置

Also Published As

Publication number Publication date
CN102674254A (zh) 2012-09-19
JP2012183457A (ja) 2012-09-27
CN102674254B (zh) 2014-12-03
TW201236738A (en) 2012-09-16

Similar Documents

Publication Publication Date Title
TWI465280B (zh) Separation method and separation device
US5346557A (en) Process for cleaning silicon mass and the recovery of nitric acid
ZA200900656B (en) Process and devices for removing ruthenium as RuO4 from ruthenate-containing solutions by distillation
TWI481550B (zh) 高純度硫酸溶液之製備方法
JP2008057043A (ja) 水性エッチング混合物からの酸回収方法
EP2367608A2 (en) A process for the recovery of hydrochloric acid
TW201238912A (en) Separation method and separation device
KR102670176B1 (ko) 알칸설폰산의 재가공 방법
CN107531480A (zh) 氢溴酸制备方法
US8828345B2 (en) Method for manufacturing trichlorosilane
US5032371A (en) Process for the continuous recovery of hydrogen fluoride gas
EP1542957B9 (en) Process for preparing fluorocarboxylic acids
CN107973713A (zh) 一种从硝酸-乙酸-硝酸盐混合液中回收乙酸的方法
US7045111B1 (en) High yield co-production of anhydrous hydrogen bromide and sodium bisulfate
TW201509879A (zh) 藉由絕熱硝化作用製備硝苯之方法
WO1997000228A1 (en) Process for producing high-purity sulfuric acid
TWI667203B (zh) 鹵化鋅水溶液的製造方法
KR20210125493A (ko) 4,4'-디클로로디페닐 설폭사이드의 제조 방법
JP5114408B2 (ja) 1,2−ジクロロエタンの精製のための蒸留塔の操作及び結合されたカセイソーダ蒸発濃縮の方法
JP2001261312A (ja) ヒドロキシルアミン水溶液およびその製造方法
CN103896838B (zh) 连续生产ε‑己内酰胺的方法和设备
JPH0891811A (ja) 廃硫酸精製装置及び精製方法
CN115636748A (zh) 一种乙酸丁酯的回收方法
WO2008002908A2 (en) Continuous hydrolysis of hexafluoroarsenic acid
CN102674397A (zh) 分离方法以及分离装置

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees