JP2012183457A - 分離方法および分離装置 - Google Patents
分離方法および分離装置 Download PDFInfo
- Publication number
- JP2012183457A JP2012183457A JP2011046718A JP2011046718A JP2012183457A JP 2012183457 A JP2012183457 A JP 2012183457A JP 2011046718 A JP2011046718 A JP 2011046718A JP 2011046718 A JP2011046718 A JP 2011046718A JP 2012183457 A JP2012183457 A JP 2012183457A
- Authority
- JP
- Japan
- Prior art keywords
- hydrofluoric acid
- liquid
- mixed acid
- distillation
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 238000000926 separation method Methods 0.000 title claims abstract description 75
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 184
- 239000002253 acid Substances 0.000 claims abstract description 103
- 238000004821 distillation Methods 0.000 claims abstract description 91
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 claims abstract description 53
- 239000010703 silicon Substances 0.000 claims abstract description 31
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 31
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910001868 water Inorganic materials 0.000 claims abstract description 23
- 239000007787 solid Substances 0.000 claims description 61
- 239000007788 liquid Substances 0.000 claims description 60
- 238000005530 etching Methods 0.000 claims description 35
- 238000010438 heat treatment Methods 0.000 claims description 27
- 238000001816 cooling Methods 0.000 claims description 23
- 239000002699 waste material Substances 0.000 claims description 17
- 238000002425 crystallisation Methods 0.000 claims description 16
- 238000003756 stirring Methods 0.000 claims description 16
- 230000008025 crystallization Effects 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 37
- 238000000034 method Methods 0.000 description 25
- 229940070337 ammonium silicofluoride Drugs 0.000 description 15
- 238000011084 recovery Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 5
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 4
- 229910001634 calcium fluoride Inorganic materials 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000001802 infusion Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- VRZJGENLTNRAIG-UHFFFAOYSA-N 4-[4-(dimethylamino)phenyl]iminonaphthalen-1-one Chemical compound C1=CC(N(C)C)=CC=C1N=C1C2=CC=CC=C2C(=O)C=C1 VRZJGENLTNRAIG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- UKCBKQLNTLMFAA-UHFFFAOYSA-N F.[F] Chemical compound F.[F] UKCBKQLNTLMFAA-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000004807 localization Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000004451 qualitative analysis Methods 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Landscapes
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Removal Of Specific Substances (AREA)
- ing And Chemical Polishing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011046718A JP2012183457A (ja) | 2011-03-03 | 2011-03-03 | 分離方法および分離装置 |
| TW101106790A TWI465280B (zh) | 2011-03-03 | 2012-03-01 | Separation method and separation device |
| CN201210054230.7A CN102674254B (zh) | 2011-03-03 | 2012-03-02 | 分离方法以及分离装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011046718A JP2012183457A (ja) | 2011-03-03 | 2011-03-03 | 分離方法および分離装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012183457A true JP2012183457A (ja) | 2012-09-27 |
| JP2012183457A5 JP2012183457A5 (enExample) | 2014-04-10 |
Family
ID=46806899
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011046718A Withdrawn JP2012183457A (ja) | 2011-03-03 | 2011-03-03 | 分離方法および分離装置 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2012183457A (enExample) |
| CN (1) | CN102674254B (enExample) |
| TW (1) | TWI465280B (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014113583A (ja) * | 2012-11-15 | 2014-06-26 | Og Corp | Si含有フッ酸系廃液からSiを除去する方法及びSi含有フッ酸系混酸廃液からフッ酸を回収する方法並びに回収装置 |
| JP2014151269A (ja) * | 2013-02-08 | 2014-08-25 | Seiko Epson Corp | エッチング液の再生方法およびエッチング液再生装置 |
| CN113045089A (zh) * | 2021-03-15 | 2021-06-29 | 盛隆资源再生(无锡)有限公司 | 一种蚀刻废液精制纯化的方法 |
| CN113358436A (zh) * | 2021-06-11 | 2021-09-07 | 中国科学技术大学 | 氟化氢铵的提纯装置及方法 |
| CN113880048A (zh) * | 2021-09-30 | 2022-01-04 | 中化蓝天霍尼韦尔新材料有限公司 | 一种氢氟酸高效回收系统及方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140063449A (ko) * | 2012-11-15 | 2014-05-27 | 오지 가부시키가이샤 | Si 함유 불산계 폐액으로부터 Si를 제거하는 방법과 Si 함유 불산계 혼산 폐액으로부터 불산을 회수하는 방법 및 회수장치 |
| CN103566606B (zh) * | 2013-11-04 | 2015-03-04 | 中国地质大学(武汉) | 一种多功能提纯装置以及利用该装置提纯氟化氢铵的方法 |
| CN110104864A (zh) * | 2019-06-06 | 2019-08-09 | 盛隆资源再生(无锡)有限公司 | 一种酸性磷酸型含氟含氨废水的处理方法 |
| CN110272159A (zh) * | 2019-06-17 | 2019-09-24 | 苏州乔发环保科技股份有限公司 | 一种工业废水中无机盐的资源化处理方法及装置 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02160605A (ja) * | 1988-08-12 | 1990-06-20 | Alameda Instr Inc | フツ化水素酸の再処理法 |
| JPH03267189A (ja) * | 1990-03-16 | 1991-11-28 | Konica Corp | 写真処理廃液の蒸発濃縮装置 |
| JPH05170435A (ja) * | 1991-10-03 | 1993-07-09 | Hashimoto Kasei Kk | フッ素系エッチング剤からフッ化カルシウムを回収する方法 |
| JP2006111487A (ja) * | 2004-10-14 | 2006-04-27 | Mitsubishi Chemical Engineering Corp | フッ酸の回収方法 |
| JP2008057043A (ja) * | 2006-08-31 | 2008-03-13 | Wacker Chemie Ag | 水性エッチング混合物からの酸回収方法 |
| JP2010240558A (ja) * | 2009-04-03 | 2010-10-28 | Kurita Water Ind Ltd | フッ素含有排水の処理方法及び処理装置 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1180043A (zh) * | 1997-11-10 | 1998-04-29 | 应烈荣 | 一种含氟硫酸提取氢氟酸的工艺 |
| CN101028919B (zh) * | 2006-02-27 | 2011-07-20 | 三菱化学工程株式会社 | 氟酸的回收方法 |
| JP5143440B2 (ja) * | 2007-02-01 | 2013-02-13 | 森田化学工業株式会社 | フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置 |
| CN201253537Y (zh) * | 2008-09-04 | 2009-06-10 | 常熟市胜诺环保设备有限公司 | 混酸废气处理装置 |
-
2011
- 2011-03-03 JP JP2011046718A patent/JP2012183457A/ja not_active Withdrawn
-
2012
- 2012-03-01 TW TW101106790A patent/TWI465280B/zh not_active IP Right Cessation
- 2012-03-02 CN CN201210054230.7A patent/CN102674254B/zh not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02160605A (ja) * | 1988-08-12 | 1990-06-20 | Alameda Instr Inc | フツ化水素酸の再処理法 |
| JPH03267189A (ja) * | 1990-03-16 | 1991-11-28 | Konica Corp | 写真処理廃液の蒸発濃縮装置 |
| JPH05170435A (ja) * | 1991-10-03 | 1993-07-09 | Hashimoto Kasei Kk | フッ素系エッチング剤からフッ化カルシウムを回収する方法 |
| JP2006111487A (ja) * | 2004-10-14 | 2006-04-27 | Mitsubishi Chemical Engineering Corp | フッ酸の回収方法 |
| JP2008057043A (ja) * | 2006-08-31 | 2008-03-13 | Wacker Chemie Ag | 水性エッチング混合物からの酸回収方法 |
| JP2010240558A (ja) * | 2009-04-03 | 2010-10-28 | Kurita Water Ind Ltd | フッ素含有排水の処理方法及び処理装置 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014113583A (ja) * | 2012-11-15 | 2014-06-26 | Og Corp | Si含有フッ酸系廃液からSiを除去する方法及びSi含有フッ酸系混酸廃液からフッ酸を回収する方法並びに回収装置 |
| JP2014151269A (ja) * | 2013-02-08 | 2014-08-25 | Seiko Epson Corp | エッチング液の再生方法およびエッチング液再生装置 |
| CN113045089A (zh) * | 2021-03-15 | 2021-06-29 | 盛隆资源再生(无锡)有限公司 | 一种蚀刻废液精制纯化的方法 |
| CN113045089B (zh) * | 2021-03-15 | 2023-04-18 | 盛隆资源再生(无锡)有限公司 | 一种蚀刻废液精制纯化的方法 |
| CN113358436A (zh) * | 2021-06-11 | 2021-09-07 | 中国科学技术大学 | 氟化氢铵的提纯装置及方法 |
| CN113880048A (zh) * | 2021-09-30 | 2022-01-04 | 中化蓝天霍尼韦尔新材料有限公司 | 一种氢氟酸高效回收系统及方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102674254A (zh) | 2012-09-19 |
| TWI465280B (zh) | 2014-12-21 |
| CN102674254B (zh) | 2014-12-03 |
| TW201236738A (en) | 2012-09-16 |
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