TWI456012B - 使用脈衝式uv光源之晶圓背面塗覆方法 - Google Patents

使用脈衝式uv光源之晶圓背面塗覆方法 Download PDF

Info

Publication number
TWI456012B
TWI456012B TW100118180A TW100118180A TWI456012B TW I456012 B TWI456012 B TW I456012B TW 100118180 A TW100118180 A TW 100118180A TW 100118180 A TW100118180 A TW 100118180A TW I456012 B TWI456012 B TW I456012B
Authority
TW
Taiwan
Prior art keywords
coating composition
semiconductor wafer
pulsed
resin
coating
Prior art date
Application number
TW100118180A
Other languages
English (en)
Chinese (zh)
Other versions
TW201202359A (en
Inventor
傑夫利 葛沙
唐 恩伊 分
傑夫利 里昂
莎拉德 哈傑拉
孔勝前
Original Assignee
漢高智慧財產控股公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 漢高智慧財產控股公司 filed Critical 漢高智慧財產控股公司
Publication of TW201202359A publication Critical patent/TW201202359A/zh
Application granted granted Critical
Publication of TWI456012B publication Critical patent/TWI456012B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/74—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using temporarily an auxiliary support
    • H10P72/7402—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • H10W74/476—Organic materials comprising silicon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/28—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
    • H10W72/01336—Manufacture or treatment of die-attach connectors using blanket deposition in solid form, e.g. by using a powder or by laminating a foil
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07331—Connecting techniques
    • H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • H10W72/07338—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy hardening the adhesive by curing, e.g. thermosetting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/321—Structures or relative sizes of die-attach connectors
    • H10W72/325—Die-attach connectors having a filler embedded in a matrix
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/351—Materials of die-attach connectors
    • H10W72/352—Materials of die-attach connectors comprising metals or metalloids, e.g. solders
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/351—Materials of die-attach connectors
    • H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/30—Die-attach connectors
    • H10W72/351—Materials of die-attach connectors
    • H10W72/353—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics
    • H10W72/354—Materials of die-attach connectors not comprising solid metals or solid metalloids, e.g. ceramics comprising polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)
  • Die Bonding (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Formation Of Insulating Films (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
TW100118180A 2010-06-08 2011-05-24 使用脈衝式uv光源之晶圓背面塗覆方法 TWI456012B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35258410P 2010-06-08 2010-06-08

Publications (2)

Publication Number Publication Date
TW201202359A TW201202359A (en) 2012-01-16
TWI456012B true TWI456012B (zh) 2014-10-11

Family

ID=45098589

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100118180A TWI456012B (zh) 2010-06-08 2011-05-24 使用脈衝式uv光源之晶圓背面塗覆方法

Country Status (7)

Country Link
US (1) US8791033B2 (enExample)
EP (1) EP2580777A4 (enExample)
JP (1) JP5654672B2 (enExample)
KR (1) KR20130079478A (enExample)
CN (1) CN103003936A (enExample)
TW (1) TWI456012B (enExample)
WO (1) WO2011156221A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2942111B2 (ja) 1993-08-31 1999-08-30 東芝テック株式会社 電気掃除機
US9266192B2 (en) 2012-05-29 2016-02-23 Electro Scientific Industries, Inc. Method and apparatus for processing workpieces
US9230888B2 (en) * 2013-02-11 2016-01-05 Henkel IP & Holding GmbH Wafer back side coating as dicing tape adhesive
CN104162502A (zh) * 2013-05-16 2014-11-26 展晶科技(深圳)有限公司 光固化涂层的方法
CN112837844B (zh) * 2021-03-01 2022-07-15 佛山市瑞纳新材科技有限公司 一种有双重固化性能的hjt低温固化银浆及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200426200A (en) * 2002-11-25 2004-12-01 Henkel Corp B-stageable die attach adhesives
US20070085216A1 (en) * 2005-09-27 2007-04-19 Infineon Technologies Ag Semiconductor device having a semiconductor chip, and method for the production thereof

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4010A (en) * 1845-04-22 Island
US7008A (en) * 1850-01-08 Improvement in alloys for points of lightning-rods
JPS54105774A (en) 1978-02-08 1979-08-20 Hitachi Ltd Method of forming pattern on thin film hybrid integrated circuit
EP0114881A4 (en) 1982-07-23 1985-06-06 Xenon Corp PHOTOMAGNETIC CATALYSIS.
JPS5959751A (ja) * 1982-09-30 1984-04-05 Dainippon Ink & Chem Inc 粉体塗料用組成物
JPH0339378A (ja) 1989-07-05 1991-02-20 Hitachi Chem Co Ltd 接着剤組成物,電子部品のプリント基板への固定法および集積回路板の製造法
CA2038117A1 (en) 1990-03-29 1991-09-30 Mahfuza B. Ali Controllable radiation curable photoiniferter prepared adhesives for attachment of microelectronic devices and a method of attaching microelectronic devices therewith
EP0492828A1 (en) * 1990-12-26 1992-07-01 Dow Corning Corporation Mixture of adhesion additives useful in UV curable compositions and compositions containing same
US6674158B2 (en) * 1998-09-03 2004-01-06 Micron Technology, Inc. Semiconductor die package having a UV cured polymeric die coating
US6211320B1 (en) * 1999-07-28 2001-04-03 Dexter Corporation Low viscosity acrylate monomers formulations containing same and uses therefor
US6833629B2 (en) * 2001-12-14 2004-12-21 National Starch And Chemical Investment Holding Corporation Dual cure B-stageable underfill for wafer level
CN1317350C (zh) * 2002-11-25 2007-05-23 亨凯尔公司 B阶小片连接粘合剂
KR100517075B1 (ko) * 2003-08-11 2005-09-26 삼성전자주식회사 반도체 소자 제조 방법
JP4401912B2 (ja) 2003-10-17 2010-01-20 学校法人早稲田大学 半導体多層配線板の形成方法
JP3929966B2 (ja) 2003-11-25 2007-06-13 新光電気工業株式会社 半導体装置及びその製造方法
JP2005218921A (ja) * 2004-02-03 2005-08-18 Keyence Corp 紫外線照射装置及び紫外線照射方法
KR100555559B1 (ko) 2004-03-03 2006-03-03 삼성전자주식회사 백 그라인딩 공정용 표면 보호 테이프를 이용하여 다이싱공정을 수행하는 반도체 장치의 제조 방법
JP2005268425A (ja) 2004-03-17 2005-09-29 Toshiba Corp 半導体装置およびその製造方法
JP2005320491A (ja) 2004-05-11 2005-11-17 Hitachi Chem Co Ltd 接着剤組成物、それを用いたフィルム状接着剤及び回路接続材料、並びに回路部材の接続構造及びその製造方法
JPWO2005112091A1 (ja) 2004-05-18 2008-03-27 日立化成工業株式会社 粘接着シート並びにそれを用いた半導体装置及びその製造方法
US7560519B2 (en) 2004-06-02 2009-07-14 Lord Corporation Dual-stage wafer applied underfills
KR100618837B1 (ko) 2004-06-22 2006-09-01 삼성전자주식회사 웨이퍼 레벨 패키지를 위한 얇은 웨이퍼들의 스택을형성하는 방법
JP2006012914A (ja) 2004-06-22 2006-01-12 Canon Inc 集積回路チップの製造方法及び半導体装置
JP2006100728A (ja) 2004-09-30 2006-04-13 Nitto Denko Corp 保護テープ剥離方法およびこれを用いた装置
JP2006269887A (ja) * 2005-03-25 2006-10-05 Sumitomo Bakelite Co Ltd 半導体用接着フィルム及びこれを用いた半導体装置
JP2007012810A (ja) 2005-06-29 2007-01-18 Renesas Technology Corp 半導体集積回路装置の製造方法
JP4375481B2 (ja) 2005-07-05 2009-12-02 日立化成工業株式会社 感光性接着剤組成物、並びにこれを用いて得られる接着フィルム、接着シート、接着剤層付半導体ウェハ、半導体装置及び電子部品
JP5109239B2 (ja) 2005-07-05 2012-12-26 日立化成工業株式会社 粘接着シート、粘接着シートの製造方法及び半導体装置の製造方法
JP5011804B2 (ja) 2005-09-06 2012-08-29 日立化成工業株式会社 回路接続材料、接続体及び回路部材の接続方法
KR20070066929A (ko) 2005-12-22 2007-06-27 닛토덴코 가부시키가이샤 제거가능한 수분산성 아크릴 접착제 조성물 및 접착 시트
US7494900B2 (en) 2006-05-25 2009-02-24 Electro Scientific Industries, Inc. Back side wafer dicing
US7482251B1 (en) 2006-08-10 2009-01-27 Impinj, Inc. Etch before grind for semiconductor die singulation
EP2109881B1 (en) 2007-01-31 2018-09-26 Henkel AG & Co. KGaA Semiconductor wafer coated with a filled, spin-coatable material
US20090104448A1 (en) * 2007-10-17 2009-04-23 Henkel Ag & Co. Kgaa Preformed adhesive bodies useful for joining substrates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200426200A (en) * 2002-11-25 2004-12-01 Henkel Corp B-stageable die attach adhesives
US20070085216A1 (en) * 2005-09-27 2007-04-19 Infineon Technologies Ag Semiconductor device having a semiconductor chip, and method for the production thereof

Also Published As

Publication number Publication date
US20130099396A1 (en) 2013-04-25
JP2013535098A (ja) 2013-09-09
WO2011156221A3 (en) 2012-04-05
TW201202359A (en) 2012-01-16
CN103003936A (zh) 2013-03-27
JP5654672B2 (ja) 2015-01-14
US8791033B2 (en) 2014-07-29
KR20130079478A (ko) 2013-07-10
EP2580777A2 (en) 2013-04-17
EP2580777A4 (en) 2015-06-03
WO2011156221A2 (en) 2011-12-15

Similar Documents

Publication Publication Date Title
JP2015147828A5 (enExample)
MY160364A (en) Adhesive tape for manufacturing electronic components
PH12018550034B1 (en) Resin, composition, cured film, method for manufacturing cured film and semiconductor device
SI2794126T1 (en) A process for the production of homogeneously matted coatings by means of irradiation by irradiation
TW201612271A (en) Film adhesive, semiconductor package using film adhesive and method for manufacturing same
MX2017015550A (es) Métodos para unir aditamentos al vidrio de vehículos.
RU2015121358A (ru) Теплостойкая микропористая пленка на основе синтетической смолы, способ ее получения, сепаратор для аккумуляторной батареи с неводным электролитом и аккумуляторная батарея с неводным электролитом
WO2016062787A3 (en) A process for producing a composite article
PH12018500836B1 (en) Curable resin film and first protective film forming sheet
AR066988A1 (es) Metodo para recubrir un sustrato con una composicion de recubrimiento curable por radiacion y por curado quimico
CN104064660A (zh) Led灌胶封装工艺
JP2013535098A5 (enExample)
NO20044026L (no) Varm smelte belegssammensetning for filmoverforings- og stopningsprosesser
MY174072A (en) Oil-in-water emulsion composition and surface treatment method using same
JP2017516873A5 (enExample)
TW200721524A (en) Method of releasing high temperature films and/or devices from metallic substrates
RU2013158396A (ru) Способ получения толстых слоев отвержденных облучением адгезивов
EP3708365A4 (en) POLARIZATION PLATE, POLARIZATION PLATE BACKING FILM LAMINATE, METHOD OF PREPARING POLARIZING PLATE BACKING FILM LAMINATE, METHOD OF PREPARING POLARIZING PLATE AND CURING COMPOSITION UNDER ACTIVE ENERGY RADIATION
JP2010028087A5 (enExample)
CN104210218B (zh) 基板粘合方法
WO2011156221A3 (en) Wafer backside coating process with pulsed uv light source
JP2014088567A5 (enExample)
JP2017097974A5 (enExample)
MY189101A (en) Curable composition, method for producing curable composition, cured product, and use of curable composition
JP2018062067A5 (enExample)

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees