TWI455956B - 非晶系共聚酯、基材、及光學膜 - Google Patents

非晶系共聚酯、基材、及光學膜 Download PDF

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Publication number
TWI455956B
TWI455956B TW101143374A TW101143374A TWI455956B TW I455956 B TWI455956 B TW I455956B TW 101143374 A TW101143374 A TW 101143374A TW 101143374 A TW101143374 A TW 101143374A TW I455956 B TWI455956 B TW I455956B
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TW
Taiwan
Prior art keywords
amorphous copolyester
repeating unit
molar fraction
film
optical film
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TW101143374A
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English (en)
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TW201420632A (zh
Inventor
Cheng Hsing Fan
Kuo Chen Shih
Ming Tsong Leu
Li Cheng Jheng
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Ind Tech Res Inst
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Priority to TW101143374A priority Critical patent/TWI455956B/zh
Priority to CN201210547975.7A priority patent/CN103833993B/zh
Priority to US13/728,565 priority patent/US8735484B1/en
Publication of TW201420632A publication Critical patent/TW201420632A/zh
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Publication of TWI455956B publication Critical patent/TWI455956B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16Dicarboxylic acids and dihydroxy compounds
    • C08G63/18Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/181Acids containing aromatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16Dicarboxylic acids and dihydroxy compounds
    • C08G63/18Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/199Acids or hydroxy compounds containing cycloaliphatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/24Acids; Salts thereof
    • C08K3/26Carbonates; Bicarbonates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/24Acids; Salts thereof
    • C08K3/26Carbonates; Bicarbonates
    • C08K2003/265Calcium, strontium or barium carbonate

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Claims (9)

  1. 一種非晶系共聚酯,係由雙酸單體與雙醇單體聚合而成;其中該雙酸單體係選自對苯二甲酸(terephthalic acid)及5-三級丁間苯二甲酸(5-tert-butylisophthalic acid)中至少一者;以及其中該雙醇單體係選自乙二醇(ethylene glycol)、2,2,-二甲基-1,3-丙二醇(2,2-dimethyl-1,3-propanediol)、及三環癸二甲醇(tricyclodecanedimethanol)中至少兩者,且三環癸二甲醇占雙醇之莫耳比例的30%至95%。
  2. 如申請專利範圍第1項所述之非晶系共聚酯,其結構包括:A莫耳分率之重複單元;以及B莫耳分率之重複單元其中A+B=1;0.3A0.95。
  3. 如申請專利範圍第1項所述之非晶系共聚酯,其結構包括: C莫耳分率之重複單元;以及D莫耳分率之重複單元其中C+D=1;0.3C0.95。
  4. 一種非晶系共聚酯,其結構包括:E莫耳分率之重複單元以及F莫耳分率之重複單元其中E+F=1;0.7E0.95。
  5. 一種基材,包括申請專利範圍第1-4項中任一項所述之非晶系共聚酯。
  6. 如申請專利範圍第5項所述之基材,更包括一無機奈米粉體混合於該非晶系共聚酯中,其中該無機奈米粉體包括二氧化矽、二氧化鈦、碳酸鈣、碳酸鍶、硫酸鋇、氧化鋁、或上述之組合,且該無機奈米粉體與該非晶系共聚酯之重量比大於0:100且小於或等於1:100。
  7. 一種光學膜,包括申請專利範圍第1-4項中任一項所述之非晶系共聚酯。
  8. 如申請專利範圍第7項所述之光學膜,更包括一無機奈米粉體混合於該非晶系共聚酯中,其中該無機奈米粉體包括二氧化矽、二氧化鈦、碳酸鈣、碳酸鍶、硫酸鋇、氧化鋁、或上述之組合,且該無機奈米粉體與該非晶系共聚酯之重量比大於0:100且小於或等於1:100。
  9. 如申請專利範圍第7項所述之光學膜,包括液晶顯示器之光學保護膜、離型膜、增亮膜、相位差膜、偏光板保護膜、或防反射膜。
TW101143374A 2012-11-21 2012-11-21 非晶系共聚酯、基材、及光學膜 TWI455956B (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW101143374A TWI455956B (zh) 2012-11-21 2012-11-21 非晶系共聚酯、基材、及光學膜
CN201210547975.7A CN103833993B (zh) 2012-11-21 2012-12-17 非晶系共聚酯、基材、及光学膜
US13/728,565 US8735484B1 (en) 2012-11-21 2012-12-27 Amorphous copolyester, substrate, and optical film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW101143374A TWI455956B (zh) 2012-11-21 2012-11-21 非晶系共聚酯、基材、及光學膜

Publications (2)

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TW201420632A TW201420632A (zh) 2014-06-01
TWI455956B true TWI455956B (zh) 2014-10-11

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US (1) US8735484B1 (zh)
CN (1) CN103833993B (zh)
TW (1) TWI455956B (zh)

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JP2018060064A (ja) * 2016-10-05 2018-04-12 宇部興産株式会社 塗膜式光学積層体及びその製造方法
US11683977B2 (en) * 2017-11-30 2023-06-20 3M Innovative Properties Company Substrate including a self-supporting tri-layer stack
US11065724B1 (en) * 2020-04-20 2021-07-20 Chang Chun Plastics Co., Ltd. Laser weldable compositions, products and uses thereof
CN111574812B (zh) * 2020-05-22 2021-07-06 中国科学技术大学 一种基于共聚酯材料的光学补偿膜、其制备方法和应用
CN114437323A (zh) * 2021-09-09 2022-05-06 广东新华粤石化集团股份公司 一种韧性增强的透明共聚酯材料及其制备方法

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US20140142247A1 (en) 2014-05-22
US8735484B1 (en) 2014-05-27
CN103833993B (zh) 2016-01-20
CN103833993A (zh) 2014-06-04
TW201420632A (zh) 2014-06-01

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