TWI453548B - A method for adjusting the density of the developing solution, a regulating device, and a developing solution - Google Patents
A method for adjusting the density of the developing solution, a regulating device, and a developing solution Download PDFInfo
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
- G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
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Description
本發明關於顯像液的濃度調節方法及調製裝置以及顯像液,更詳細而言是關於,使用於液晶基板、印刷基板等的製程之光阻劑的顯像處理之鹼性的調節顯像液的鹼濃度方法,調節成理想的濃度,使得可維持一定的顯像速度,達到更高品質的顯像處理之顯像液的濃度調節方法、可理想地進行該濃度調節方法的實施之顯像液的調製裝置、以及藉由這些濃度調節方法及調製裝置所能獲得之顯像液。The present invention relates to a method for adjusting a concentration of a developing liquid, a modulating device, and a developing solution, and more particularly to an alkaline modulating image for a developing process of a photoresist used in a process such as a liquid crystal substrate or a printed substrate. The alkali concentration method of the liquid is adjusted to a desired concentration so that a certain developing speed can be maintained, and a method for adjusting the concentration of the developing liquid for achieving higher quality development processing can be ideally performed. A liquid-like modulation device, and a developing liquid which can be obtained by the concentration adjustment method and the modulation device.
為了進行液晶基板、印刷基板等的製程之光阻劑的顯像處理,將以氫氧化四甲銨(TMAH)等為主成分之鹼水溶液作為顯像液來使用。該鹼性的顯像液,至今,隨著基板尺寸的大型化或處理之進步,逐漸成為多量使用,由成本降低等的觀點來看,將使用過者回收後,再生供給至顯像裝置。但,隨著反復使用,處理程序停止中等,因與光阻劑中的酸之反應、空氣中的碳酸氣體或氧之反應,造成鹼濃度降低,因此,在顯像處理,光阻劑圖案的尺寸精度及未曝光部之膜厚精度降低,故,將鹼濃度管理成一定為重要課題。In order to perform development processing of a photoresist of a process such as a liquid crystal substrate or a printed circuit board, an aqueous alkali solution containing tetramethylammonium hydroxide (TMAH) or the like as a main component is used as a developing solution. As a result of the increase in the size of the substrate or the progress of the treatment, the alkaline developer has been used in a large amount, and it has been recovered by the use of the developer and then regenerated and supplied to the developing device. However, with repeated use, the processing procedure is stopped moderately, and the alkali concentration is lowered due to the reaction with the acid in the photoresist, the reaction of carbonic acid gas or oxygen in the air, and therefore, in the development process, the photoresist pattern is Since the dimensional accuracy and the film thickness accuracy of the unexposed portion are lowered, it is an important subject to manage the alkali concentration.
針對顯像液的濃度管理,例如,揭示有一種管理裝置,是用來管理使用於光阻劑的顯像之鹼系顯像液的裝置,對顯像裝置,循環供給顯像液,並且,同時管理所循環之 顯像液的鹼濃度及顯像液中的溶解樹脂濃度雙方,用以防止顯像性能之劣化的「顯像液管理裝置」。在該顯像液管理裝置,藉由吸光光度計檢測顯像液中的溶解樹脂濃度,藉由導電率計檢測顯像液的鹼濃度,然後排出裝置內的顯像液且補給顯像液的原液與純水或補給新調製的顯像液,使得鹼濃度、溶解樹脂濃度及裝置內的顯像液的液面水平成為一定。For the concentration management of the developing liquid, for example, there is disclosed a management device for managing an alkali-based developing liquid used for development of a photoresist, and a developing device is circulated and supplied with a developing liquid, and Simultaneous management of the cycle A "developing liquid management device" for preventing deterioration of development performance, both of the alkali concentration of the developing solution and the dissolved resin concentration in the developing solution. In the developing solution management device, the concentration of the dissolved resin in the developing liquid is detected by an absorption photometer, the alkali concentration of the developing liquid is detected by a conductivity meter, and then the developing liquid in the apparatus is discharged and the developing liquid is replenished. The stock solution and the pure water or the freshly prepared developing liquid make the alkali concentration, the dissolved resin concentration, and the liquid level of the developing liquid in the apparatus constant.
〔專利文獻1〕日本特許第2561578號公報[Patent Document 1] Japanese Patent No. 2556178
在基板的製造,不受將顯像液的鹼濃度或顯像液中的溶解樹脂濃度管理成一定的影響,而進行了顯像處理及蝕刻處理之情況,可見到形成於光罩或基板之電路等的圖案的線寬變動之現象。實際上,當循環使用顯像液時,會有因藉由顯像處理,造成形成於基板之電路等的光阻劑圖案的線寬(CD值)由基準值(設計值)逐漸地偏離之傾向。即,在顯像處理,於反復進行處理中,顯像速度、換言之,對光阻劑之溶解速度變動,所獲得之光阻劑圖案的尺寸精度逐漸降低。其結果,會對藉由蝕刻而形成於基板之圖案的線寬產生影響。因此,在顯像液的供給管理,期望不會對顯像速度帶來變動之改善的管理方法。In the production of the substrate, the development process and the etching treatment are not affected by the alkali concentration of the developing solution or the dissolved resin concentration in the developing solution, and it can be seen that it is formed on the mask or the substrate. A phenomenon in which the line width of a pattern such as a circuit fluctuates. In fact, when the developing solution is recycled, the line width (CD value) of the photoresist pattern formed on the substrate or the like by the developing process is gradually deviated from the reference value (design value). tendency. That is, in the development processing, in the repeated processing, the development speed, in other words, the dissolution rate of the photoresist varies, and the dimensional accuracy of the obtained photoresist pattern gradually decreases. As a result, the line width of the pattern formed on the substrate by etching is affected. Therefore, in the supply management of the developing liquid, a management method that does not bring about an improvement in the development speed is desired.
本發明是有鑑於上述實情而開發完成之發明,其目的在於提供一種顯像液的濃度調節方法,其是用來調節使用 於液晶基板、印刷基板等的製程之光阻劑的顯像處理之鹼性的顯像液的濃度調節方法,其能夠維持一定的顯像速度,且可進行更高品質的顯像處理之顯像液的濃度調節方法。又,本發明的其他目的在於提供一種顯像液的調製裝置,其使用由光阻劑的顯像程序所回收之鹼性的使用過的顯像液,可調製進行更高品質的顯像處理之顯像液之顯像液的調製裝置。又,本發明的其他目的是在於,使用上述濃度調節方法及調製裝置且有效利用使用過的顯像液所獲得之鹼性的顯像液,其為可進行高品質的顯像處理之顯像液。The present invention has been developed in view of the above circumstances, and an object thereof is to provide a method for adjusting a concentration of a developing liquid, which is used for adjusting the use. A method for adjusting the concentration of an alkaline developing solution for developing a photoresist of a process such as a liquid crystal substrate or a printed substrate, which can maintain a constant development speed and can perform higher quality development processing. The method of adjusting the concentration of liquid. Further, another object of the present invention is to provide a developing device for a developing liquid which can be modulated to perform higher-quality developing processing using an alkaline used developing solution recovered by a developing procedure of a photoresist. A modulation device for the developing solution of the developing liquid. Further, another object of the present invention is to provide an alkaline developing solution obtained by using the used developing solution using the above-described concentration adjusting method and the modulating device, which is a high-quality developing image. liquid.
為了解決上述的課題,本發明者等進行各種檢討,確認了在顯像液,不受鹼濃度被維持於基準濃且溶解樹脂濃度被管理所影響,主要吸收空氣中的碳酸氣體,而生成於顯像液中之碳酸鹽會抵銷顯像液的溶解能,使顯像液的溶解速度降低。且,關於碳酸鹽對顯像液的溶解能之影響,著眼於CD值與顯像液中的碳酸鹽濃度之關係進行檢討之結果得知,不容易受到溶解樹脂濃度之變化所影響,而會因碳酸鹽濃度的上昇,顯像液的溶解能以一定的傾向降低。又,發現,伴隨著顯像液中的碳酸鹽濃度的上昇,根據特定的關係提高鹼濃度地進行濃度調節的話,可使顯像液對光阻劑之溶解能維持於一定,而完成了本發明。In order to solve the problem, the inventors of the present invention have conducted various reviews and confirmed that the developing solution is mainly affected by the fact that the alkali concentration is maintained at the reference concentration and the dissolved resin concentration is managed, and the carbon dioxide gas in the air is mainly absorbed. The carbonate in the developing solution offsets the dissolution energy of the developing solution, and the dissolution rate of the developing solution is lowered. Further, regarding the influence of the carbonate on the dissolution energy of the developing solution, focusing on the relationship between the CD value and the carbonate concentration in the developing solution, it is found that it is not easily affected by the change in the concentration of the dissolved resin, but The solubility of the developing solution is lowered by a certain tendency due to an increase in the concentration of the carbonate. In addition, it has been found that when the concentration of the alkali solution is increased according to a specific relationship, the concentration of the developer can be maintained at a constant level, and the dissolution of the developer can be maintained at a constant level. invention.
即,本發明的第1型態,是用來調節使用於光阻劑的 顯像處理之鹼性的顯像液的鹼性濃度之濃度調節方法,其特徵為:測定顯像液的鹼濃度及顯像液中的碳酸鹽濃度,根據預先所製作的能夠發揮進行顯像處理所獲得之CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之關係,來調節鹼濃度。That is, the first aspect of the present invention is for adjusting the use of a photoresist. A method for adjusting the concentration of an alkaline concentration of an alkaline developing solution for development processing, which is characterized in that the alkali concentration of the developing solution and the carbonate concentration in the developing solution are measured, and the development can be performed according to the preparation The alkali concentration is adjusted by the relationship between the alkali concentration of the dissolution energy and the carbonate concentration at which the obtained CD value becomes a certain value.
又,本發明的第2型態,是一種調製裝置,用來調製使用於光阻劑的顯像處理之鹼性的顯像液的調製裝置,其特徵為:具備有:用來調製所定濃度的顯像液之調製槽;將所調製的顯像液供給至顯像程序之供給管;將使用過的顯像液承接至前述調製槽之回收管;將鹼濃度較基準濃度更高濃度的新的顯像液原液供給至前述調製槽之原液供給管;用來檢測前述調製槽內的顯像液的鹼濃度及顯像液中的碳酸鹽濃度之濃度計;及根據該濃度計之檢測濃度,控制來自於前述原液供給管之顯像液原液的供給之控制裝置,該控制裝置是根據藉由前述濃度計所測定到的顯像液的鹼濃度及顯像液中的碳酸鹽濃度、與能夠發揮進行顯像處理所獲得之CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之預先所製作的關係,控制顯像液原液的供給,具有調節鹼濃度功能。Further, a second aspect of the present invention is a modulation apparatus for modulating an alkaline developing solution for use in a developing process of a photoresist, characterized in that: a method for modulating a predetermined concentration a developing solution of the developing liquid; supplying the prepared developing liquid to the supply tube of the developing program; receiving the used developing liquid to the recovery tube of the preparation tank; and having a higher concentration of the alkali than the reference concentration a new developing solution stock solution is supplied to the raw material supply pipe of the preparation tank; a concentration meter for detecting the alkali concentration of the developing liquid in the preparation tank and the carbonate concentration in the developing liquid; and detection according to the concentration meter a control device for controlling supply of a developing solution of the developing liquid from the raw liquid supply pipe, wherein the control device is based on an alkali concentration of the developing liquid measured by the concentration meter and a carbonate concentration in the developing liquid, The preliminarily prepared relationship between the alkali concentration and the carbonate concentration which can exhibit the solubility of the CD value obtained by the development process is controlled, and the supply of the developing solution liquid is controlled to have a function of adjusting the alkali concentration.
且,在本發明,為了更高精度調節鹼濃度,亦可考量顯像液中的碳酸鹽濃度及溶解樹脂濃度,來調節鹼濃度。即,本發明的第3型態,是一種顯像液的濃度調節方法,用來調節使用於光阻劑的顯像處理之鹼性的顯像液的鹼濃度之濃度調節方法,其特徵為:測定顯像液的鹼濃度、顯 像液中的碳酸鹽濃度及溶解樹脂濃度,根據能夠發揮進行顯像處理所獲得之CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度與溶解樹脂濃度之預先所製作的關係,調節鹼濃度。Further, in the present invention, in order to adjust the alkali concentration with higher precision, the alkali concentration can be adjusted by considering the carbonate concentration and the dissolved resin concentration in the developing solution. That is, the third aspect of the present invention is a method for adjusting the concentration of a developing solution, and a method for adjusting the concentration of the alkali concentration of the alkaline developing solution used for the development processing of the photoresist, which is characterized in that : Determination of the alkali concentration of the imaging solution, The concentration of the carbonate in the liquid and the concentration of the dissolved resin are adjusted according to the relationship between the alkali concentration of the solubility at which the CD value obtained by the development process is constant and the carbonate concentration and the dissolved resin concentration. Alkali concentration.
又,本發明的第4型態是一種顯像液的調製裝置,是用來調製使用於光阻劑的顯像處理之鹼性的顯像液之調製裝置,其特徵為:用來調製所定濃度的顯像液之調製槽;將所調製的顯像液供給至顯像程序之供給管;將使用過的顯像液承接至前述調製槽之回收管;將鹼濃度較基準濃度更高濃度的新的顯像液原液供給至前述調製槽之原液供給管;用來檢測前述調製槽內的顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度之濃度計;及根據該濃度計之檢測濃度,控制來自於前述原液供給管之顯像液原液的供給之控制裝置,該控制裝置是根據藉由前述濃度計所測定到的顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度、與能夠發揮進行顯像處理所獲得之CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度與溶解樹脂濃度之預先所製作的關係,控制顯像液原液的供給,具有調節鹼濃度功能。Further, a fourth aspect of the present invention is a modulating device for a developing liquid, which is a modulating device for modulating an alkaline developing liquid used for developing a photoresist, and is characterized in that it is used for modulation. a concentration developing solution for the developing solution; supplying the prepared developing liquid to the supply tube of the developing program; receiving the used developing liquid to the recovery tube of the preparation tank; and increasing the alkali concentration to a higher concentration than the reference concentration a new developing solution stock solution is supplied to the raw material supply pipe of the preparation tank; a concentration meter for detecting the alkali concentration of the developing liquid in the preparation tank, the carbonate concentration in the developing liquid, and the dissolved resin concentration; The detection concentration of the concentration meter controls a supply device for supplying the liquid of the developing liquid from the raw liquid supply pipe, and the control device is based on the alkali concentration of the developing liquid measured by the concentration meter, and in the developing liquid The carbonate concentration and the dissolved resin concentration, and the relationship between the alkali concentration and the carbonate concentration and the dissolved resin concentration, which are capable of exhibiting a certain value of the CD value obtained by the development process, are controlled in advance. Supplying stock solution having an alkali concentration adjustment function.
若根據本發明的話,伴隨顯像液中的碳酸鹽濃度的上昇,根據特定的關係,調節顯像液的鹼濃度,將對光阻劑之顯像液的溶解能維持於一定,故,在光阻劑的顯像處理 ,能夠維持一定的顯像速度,可進行更高品質的顯像處理。又,因應顯像液中的碳酸鹽濃度及溶解樹脂濃度,根據特定的關係,調節顯像液的鹼濃度,能夠進行更高品質的顯像處理。According to the present invention, as the concentration of the carbonate in the developing solution increases, the alkali concentration of the developing solution is adjusted according to a specific relationship, and the dissolution energy of the developing solution for the photoresist is maintained constant. Photoreceptor treatment It can maintain a certain development speed and can perform higher quality development processing. Further, depending on the carbonate concentration and the dissolved resin concentration in the developing liquid, the alkali concentration of the developing liquid is adjusted according to a specific relationship, and a higher-quality developing process can be performed.
參照圖面,說明關於本發明之顯像液的濃度調節方法及顯像液的調製裝置的一實施形態。An embodiment of the method for adjusting the concentration of the developing liquid of the present invention and the apparatus for modulating the developing liquid will be described with reference to the drawings.
本發明之顯像液的濃度調節方法(以下簡稱為「濃度調節方法」。)是在包含旋轉顯影裝置、塗佈顯影裝置等的顯像裝置之顯像處理程序,調節使用於光阻劑的顯像處理之鹼性的顯像液(以下簡稱為「顯像液」。)的鹼濃度濃度調節方法,又,本發明之顯像液的調製裝置(以下簡稱為「調製裝置」。)為用來調製前述的顯像液之調製裝置,本發明特別可理想地適用於,以顯像裝置,對由液晶基板、印刷基板等的製程之光阻劑的顯像程序所回收之使用過的顯像液予以再利用之情況。The method for adjusting the concentration of the developing liquid of the present invention (hereinafter simply referred to as "concentration adjusting method") is a development processing program for a developing device including a rotary developing device, a coating and developing device, and the like, and is adjusted for use in a photoresist. The method for adjusting the concentration of the alkali concentration of the development solution (hereinafter referred to as "visual liquid"), and the preparation device for the development liquid of the present invention (hereinafter simply referred to as "modulation device") The modulating device for modulating the above-described developing liquid, the present invention is particularly preferably applied to a developing device which is used for a developing device for recovering a photoresist of a process such as a liquid crystal substrate or a printed substrate. The case where the developing solution is reused.
在本發明,作為顯像液的鹼成分,可舉出例如由氫氧化鉀、氫氧化鈉、磷酸鈉、矽酸鈉等的無機鹼單獨或混合物所構成之無機鹼水溶液、或氫氧化四甲銨(TMAH)、膽鹼等的有機鹼水溶液等。在作為顯像液,使用TMAH之情況,TMAH濃度(鹼濃度)被設定成例如2.380wt%。又,在顯像液,亦可含有非離子性界面活性劑或氟系界面活性劑等的習知之添加物。In the present invention, the alkali component of the developing solution may, for example, be an inorganic alkali aqueous solution or a tetrahydric hydroxide composed of an inorganic base such as potassium hydroxide, sodium hydroxide, sodium phosphate or sodium citrate alone or in a mixture. An aqueous solution of an organic alkali such as ammonium (TMAH) or choline. In the case where TMAH is used as the developing solution, the TMAH concentration (alkali concentration) is set to, for example, 2.380% by weight. Further, the developing solution may contain a conventional additive such as a nonionic surfactant or a fluorine-based surfactant.
再者,在本發明,「CD值」是指,藉由顯像處理,在基板上所獲得之光阻劑圖案的線寬。又,後述的鹼的「基準濃度」是指,所能獲得之以下的CD值之鹼的濃度(初期的鹼濃度)。上述的CD值為進行預先所設定之一定時間的顯像處理時之CD值,且成為該值產生變化前之評価的基準之當初的CD值。又,成為該基準之鹼,亦可為單獨鹼,亦可為含有上述這樣的添加物者,關於使用含有添加物之實液的情況時之鹼的基準濃度,增加因添加物所引起之溶解度的差為佳。Further, in the present invention, the "CD value" means the line width of the photoresist pattern obtained on the substrate by the development process. In addition, the "reference concentration" of the base to be described later refers to the concentration of the base (the initial alkali concentration) of the CD value which can be obtained. The CD value described above is the CD value at the time of performing the development processing for a predetermined period of time set in advance, and is the original CD value which is the basis of the evaluation before the change. Further, the base to be used may be a single base, or may be an additive containing the above-mentioned additives, and the solubility of the additive may be increased by the reference concentration of the base when the solid liquid containing the additive is used. The difference is better.
首先,說明關於可理想地適用於本發明的濃度調節方法之實施的調製裝置。本發明的調製裝置是如圖4所示,為用來調製使用於顯像處理之顯像液的調製裝置,使用由顯像程序所回收之使用過的顯像液,調製前述的顯像液。該調製裝置具備有:用來調製所定濃度的顯像液之調製槽(1);將所調製之顯像液供給至顯像裝置(9)等的顯像程序(以下,稱為「顯像裝置」。)之供給管(2);將使用過的顯像液承接至調製槽(1)之回收管(3);將鹼濃度較基準濃度更高濃度的新的顯像液原液供給至調製槽(1)之原液供給管(6);檢測調製槽(1)內的顯像液的鹼濃度及顯像液中的碳酸鹽濃度之濃度計(5);及根據該濃度計之檢測濃度,控制來自於原液供給管(6)的顯像液原液之供給的控制裝置(未圖示)。First, a modulation apparatus which is ideally applicable to the implementation of the concentration adjustment method of the present invention will be described. The modulating device of the present invention is a modulating device for modulating a developing liquid used for developing processing as shown in FIG. 4, and modulating the above-described developing liquid using a used developing liquid recovered by a developing program. . The modulation device includes a modulation groove (1) for modulating a predetermined concentration of the developing liquid, and a developing program for supplying the prepared developing liquid to the developing device (9) (hereinafter referred to as "development" Supply tube (2); the used developing solution is supplied to the recovery tube (3) of the brewing tank (1); and a new developing liquid stock solution having a higher alkali concentration than the reference concentration is supplied to a raw liquid supply pipe (6) of the preparation tank (1); a concentration meter (5) for detecting an alkali concentration of the developing liquid in the preparation tank (1) and a carbonate concentration in the developing liquid; and detection according to the concentration meter The concentration is a control device (not shown) for controlling the supply of the developing liquid solution from the raw liquid supply pipe (6).
調製槽(1)是將顯像液的濃度調節成一定的目標值,並且,因應需要,將進行了濃度調節之顯像液供給至顯 像裝置(9)的供給槽,藉由例如,內容積100~2000公升左右的耐腐蝕性之容器所構成。在調製槽(1),為了將所收容之顯像液維持於均等的濃度,設有作為顯像液的攪拌手段之介裝有泵浦(41)的循環流路(4)。藉由上述這種循環之攪拌手段,比起在槽內設置有螺桿等的攪拌裝置,所產生之顆粒少,能夠降低顯像液受到污染。The modulation tank (1) adjusts the concentration of the developing liquid to a certain target value, and supplies the developing solution whose concentration has been adjusted to the display as needed. The supply tank of the image forming device (9) is constituted by, for example, a container having a corrosion resistance of an internal volume of about 100 to 2,000 liters. In the brewing tank (1), in order to maintain the received developing solution at an equal concentration, a circulation flow path (4) containing a pump (41) as a stirring means of the developing liquid is provided. According to the above-described circulation stirring means, the number of particles generated is smaller than that of the stirring means provided with a screw or the like in the tank, and the contamination of the developing liquid can be reduced.
又,所回收之使用過的顯像液,在顯像裝置(9)被調節成一定溫度,調製槽(1)內的顯像液也維持大致一定溫度。但,為了藉由後述的濃度計(5)更正確地測定顯像液的濃度,理想為將調製槽(1)內的顯像液的溫度正確地保持於一定溫度(例如25℃)。因此,在理想的形態,在調製槽(1)或循環流路(4),設置包含有加熱器或冷却器之溫度調節手段(未圖示)。Further, the used developing solution recovered is adjusted to a constant temperature in the developing device (9), and the developing liquid in the brewing tank (1) is maintained at a substantially constant temperature. However, in order to more accurately measure the concentration of the developing liquid by the concentration meter (5) to be described later, it is preferable to accurately maintain the temperature of the developing liquid in the brewing tank (1) at a constant temperature (for example, 25 ° C). Therefore, in an ideal form, a temperature adjustment means (not shown) including a heater or a cooler is provided in the modulation tank (1) or the circulation flow path (4).
供給管(2)是由從調製槽(1)至顯像裝置(9)之流路及介裝於該流路之泵浦(21)所構成,將調製槽(1)內的所調製之顯像液供給至顯像裝置(9)。又,回收管(3)是以顯像裝置(9)的使用過的顯像液的排出口(室的排水口)至調製槽(1)之流路所構成,使用於設置在該流路或顯像裝置(9)側之泵浦(未圖示),將使用過的顯像液回收至調製槽(1)。再者,雖未圖式,在回收管(3),亦可設置暫時儲存使用過的顯像液之緩衝槽,且,將使用過的顯像液的溫度調節成與調製槽(1)內的顯像液同等的溫度,因此,亦可設置恆溫槽等的溫度調節手段。The supply pipe (2) is composed of a flow path from the modulation tank (1) to the developing device (9) and a pump (21) interposed in the flow path, and modulates the modulation groove (1). The developing solution is supplied to the developing device (9). Further, the recovery pipe (3) is constituted by a discharge port (a drain port of the chamber) of the used developing liquid of the developing device (9) to a flow path of the brewing tank (1), and is used for being disposed in the flow path. Or a pump (not shown) on the side of the developing device (9), and the used developing solution is recovered to the brewing tank (1). Further, although not shown, a buffer tank for temporarily storing the used developing liquid may be provided in the recovery pipe (3), and the temperature of the used developing liquid is adjusted to be in the modulation tank (1). Since the developing solution has the same temperature, it is also possible to provide a temperature adjusting means such as a thermostatic bath.
原液供給管(6)是由從原液供給機構(A)(未圖示)至調製槽(1)之流路及介裝於該流路之流量調整閥(61)所構成,當調製槽(1)內的顯像液的濃度降低時,藉由後述的控制裝置之流量調整閥(61)的控制,將較基準濃度更高濃度的顯像液原液例如在TMAH之情況為20~25wt%的濃度的顯像液原液供給至調製槽(1)。原液供給機構(A)主要是藉由預先收容高濃度的顯像液原液用之內容積500~3000公升左右的原液貯槽、由原液貯槽對到調製槽(1)之上述的流路輸送顯像液原液之泵浦所構成。The raw liquid supply pipe (6) is composed of a flow path from the raw liquid supply mechanism (A) (not shown) to the modulation tank (1) and a flow rate adjusting valve (61) interposed in the flow path, and the modulation groove ( 1) When the concentration of the developing liquid in the lower portion is lowered, the liquid level of the developing liquid liquid having a higher concentration than the reference concentration is 20 to 25 wt% in the case of TMAH by the control of the flow rate adjusting valve (61) of the control device to be described later. The concentration of the developing solution stock solution is supplied to the brewing tank (1). The raw liquid supply mechanism (A) mainly conveys the above-mentioned flow path of the preparation tank (1) by the raw liquid storage tank by preserving a raw liquid storage tank having an internal volume of a high concentration of the developing liquid stock solution of about 500 to 3,000 liters. The pump consists of a liquid stock solution.
又,在本發明的調製裝置,在調製槽(1)內的顯像液的鹼濃度變得較目標濃度更高的情況時,會降低顯像液的濃度,故,通常,具備有對調製槽(1)供給稀釋水之稀釋水供給管(7)。稀釋水供給管(7)是由從稀釋水供給機構(B)(未圖示)至調製槽(1)之流路及介裝於該流路之流量調整閥(71)所構成,藉由後述的控制裝置之對流量調整閥(71)的控制,對調製槽(1)供給超純水。作為稀釋水供給機構(B),通常使用含有儲存槽及送液泵浦之純水製造裝置。Further, in the modulating device of the present invention, when the alkali concentration of the developing liquid in the modulating tank (1) is higher than the target concentration, the concentration of the developing liquid is lowered, and therefore, the modulation is usually performed. The tank (1) supplies the dilution water supply pipe (7) of the dilution water. The dilution water supply pipe (7) is composed of a flow path from the dilution water supply mechanism (B) (not shown) to the modulation tank (1) and a flow rate adjustment valve (71) interposed in the flow path. The control device of the control device described later controls the flow rate adjusting valve (71) to supply ultrapure water to the brewing tank (1). As the dilution water supply means (B), a pure water production apparatus including a storage tank and a liquid supply pump is generally used.
且,在本發明的調製裝置,為了在調製槽(1)內的顯像液的量減少至一定量以下之情況時,會補充顯像液,故,具備有將基準濃度的新的顯像液供給至調製槽(1)之新液供給管(8)。新液供給管(8)是由從新液供給機構(C)(未圖示)至調製槽(1)之流路及介裝於該流路 之流量調整閥(81)所構成,藉由後述的控制裝置對流量調整閥(81)的控制,對調製槽(1)供給基準濃度的顯像液(例如濃度2.38wt%的TMAH)。新液供給機構(C)主要是藉由預先收容新的顯像液用之內容積500~3000公升左右的新液貯槽、由新液貯槽對到調製槽(1)之上述的流路輸送顯像液之泵浦所構成。Further, in the modulating device of the present invention, in order to reduce the amount of the developing liquid in the modulating tank (1) to a certain amount or less, the developing liquid is replenished, so that a new image having a reference density is provided. The liquid is supplied to the new liquid supply pipe (8) of the brewing tank (1). The new liquid supply pipe (8) is a flow path from the fresh liquid supply mechanism (C) (not shown) to the modulation tank (1) and is interposed in the flow path. The flow rate adjusting valve (81) is configured to supply a developing liquid of a reference concentration (for example, TMAH having a concentration of 2.38 wt%) to the brewing tank (1) by controlling the flow rate adjusting valve (81) by a control device to be described later. The new liquid supply mechanism (C) mainly uses a new liquid storage tank of about 500 to 3,000 liters in total volume for pre-accommodating a new developing liquid, and the above-mentioned flow path to the preparation tank (1) by the new liquid storage tank. It is composed of a liquid pump.
在本發明的調製裝置,濃度計(5),為了更正確地測定調製槽(1)內的顯像液的鹼濃度及顯像液中的碳酸鹽濃度,通常介裝於前述的循環流路(4)。作為濃度計(5),為了不受顯像液中的溶解樹脂濃度的變動所影響且可高精度地進行濃度測定,而使用特定的濃度計。具體而言,作為上述的濃度計(5),使用下數濃度計,即,測量顯像液的溫度、超音波傳播速度及電磁導電率,依據預先所製作的預定的溫度、鹼濃度及碳酸鹽濃度之超音波傳播速度與電磁導電率之關係(矩陣),可檢測到顯像液的鹼濃度及顯像液中的碳酸鹽濃度之多成分濃度計。In the modulating device of the present invention, the concentration meter (5) is usually interposed in the above-described circulation flow path in order to more accurately measure the alkali concentration of the developing liquid in the modulating tank (1) and the carbonate concentration in the developing liquid. (4). As the concentration meter (5), a specific concentration meter is used in order to prevent the concentration measurement from being affected by fluctuations in the concentration of the dissolved resin in the developing solution. Specifically, as the concentration meter (5) described above, the lower concentration meter, that is, the temperature of the developing liquid, the ultrasonic wave propagation speed, and the electromagnetic conductivity are measured, and the predetermined temperature, alkali concentration, and carbonic acid are prepared in advance. The relationship between the ultrasonic propagation rate of the salt concentration and the electromagnetic conductivity (matrix), and the multi-component concentration meter for detecting the alkali concentration of the developing liquid and the carbonate concentration in the developing liquid.
上述的多成分濃度計為藉由測定一定溫度的溶液中的超音波傳播速度及電磁導電率,可同時即時地測定鹼與碳酸鹽之2種成分的濃度之濃度計。即,多成分濃度計為依據若溶液的溫度一定的話,因應各成分的濃度,首要地特定液中的超音波之傳播速度及電磁導電率之原理者,在例如測定2成分之情況,主要是由超音波變換器、超音波發信器、電磁導電率變換器、電磁導電率發信器及進行預定的運算之微處理器所構成。The multi-component concentration meter described above is a concentration meter capable of simultaneously measuring the concentrations of two components of a base and a carbonate by measuring the ultrasonic wave propagation speed and the electromagnetic conductivity in a solution at a constant temperature. In other words, when the temperature of the solution is constant, the multi-component concentration meter is based on the principle of the concentration of each component, and the principle of the propagation speed and electromagnetic conductivity of the ultrasonic wave in the specific liquid. It is composed of an ultrasonic transducer, an ultrasonic transmitter, an electromagnetic conductivity converter, an electromagnetic conductivity transmitter, and a microprocessor that performs predetermined calculations.
在多成分濃度計,適用於上述這樣的顯像液的濃度測定之情況時,藉由以針對每個鹼濃度及碳酸鹽濃度的各種組合,在一定溫度條件下預先所測量之超音波傳播速度與電磁導電率之關係作為矩陣而預先準備,即,藉由寫入至微處理器,根據前述的矩陣,能夠由測定值正確地推定運算鹼濃度與碳酸鹽濃度。再者,作為上述這樣的多成分濃度計,可舉出例如例如富士工業社製之液體用多成分濃度計。再者,除了上述的多成分濃度計以外,作為測定鹼濃度之濃度計,能夠使用利用測量流體之曲折率之利用屈折法的濃度計、或使用利用測量接近紅外領域之波長的接近紅外法之濃度計,又,作為測定碳酸鹽濃度之濃度計,能夠使用例如利用中和滴定之濃度計等。In the case where the multi-component concentration meter is applied to the measurement of the concentration of the above-described developing liquid, the ultrasonic wave propagation speed measured in advance under a certain temperature condition by various combinations for each alkali concentration and carbonate concentration The relationship with the electromagnetic conductivity is prepared in advance as a matrix, that is, by writing to the microprocessor, the calculated alkali concentration and the carbonate concentration can be accurately estimated from the measured values based on the aforementioned matrix. In addition, as the multi-component concentration meter as described above, for example, a multi-component concentration meter for liquids manufactured by Fuji Industrial Co., Ltd. can be mentioned. Further, in addition to the above-described multi-component concentration meter, as a concentration meter for measuring the alkali concentration, a concentration meter using a bending method using a tortuosity of a measuring fluid or a near-infrared method using a wavelength close to the infrared field can be used. Further, as the concentration meter for measuring the carbonate concentration, for example, a concentration meter using a neutralization titration or the like can be used.
在本發明的調製裝置,具備有:除了裝置全體的運轉控制外,控制根據上述這種的濃度計(5)的測定之顯像液原液的輸送、稀釋水的輸送、新的顯像液的輸送用之控制裝置(未圖示)。該控制裝置包含有:將各測量機器的訊號進行數位變換之輸入裝置、程式控制器或電腦等的運算處理裝置、及將來自於運算處理裝置之控制訊號予以類比變換之輸出裝置。In the modulation apparatus of the present invention, in addition to the operation control of the entire apparatus, the conveyance of the developing liquid solution, the delivery of the dilution water, and the new developing liquid are controlled by the concentration meter (5). Control device for transport (not shown). The control device includes an input device for digitally converting the signals of the measuring devices, an arithmetic processing device such as a program controller or a computer, and an output device for analogizing the control signals from the arithmetic processing device.
上述的控制裝置,是根據濃度計(5)之檢測濃度,控制來自於原液供給管(6)之顯像液原液的供給。即,控制裝置是根據藉由濃度計(5)所測定到的顯像液的鹼濃度及顯像液中的碳酸鹽濃度、與預先所製作的碳酸鹽濃度與鹼濃度對基準濃度之不足量之關係,換言之,能夠發 揮進行顯像處理所獲得之CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之預先所製作的關係,控制顯像液原液的供給,具有調節鹼濃度功能。藉此,在本發明的調製裝置,由顯像裝置(9)回收使用過的顯像液,在調製槽(1),能夠調製適當的鹼濃度的顯像液。The above control device controls the supply of the developing liquid solution from the raw liquid supply pipe (6) based on the detected concentration of the concentration meter (5). That is, the control device is based on the alkali concentration of the developing liquid measured by the concentration meter (5) and the carbonate concentration in the developing liquid, and the insufficient amount of the carbonate concentration and the alkali concentration prepared in advance to the reference concentration. Relationship, in other words, able to send The relationship between the alkali concentration of the solubility of the CD obtained by the development process and the carbonate concentration, which is obtained by the development process, controls the supply of the stock solution and has a function of adjusting the alkali concentration. Thereby, in the modulating device of the present invention, the used developing liquid is recovered by the developing device (9), and a developing liquid having an appropriate alkali concentration can be prepared in the modulating tank (1).
又,上述的控制裝置之結構為,可控制顯像液原液的供給,並且控制來自於稀釋水供給管(7)之稀釋水的供給、以及來自於新液供給管(8)之新的顯像液的供給。藉此,在本發明的調製裝置,能夠將調製槽(1)內的顯像液的液量管理成一定。Further, the above-described control device is configured to control the supply of the developing solution liquid, and to control the supply of the dilution water from the dilution water supply pipe (7) and the new display from the new liquid supply pipe (8). Like the supply of liquid. Thereby, in the modulating device of the present invention, the liquid amount of the developing liquid in the modulating tank (1) can be managed to be constant.
再者,在本發明的調製裝置,為了防止顯像液或顯像液原液與空氣之接觸,藉由氮氣等的鈍氣,密封系統內。又,在本發明的調製裝置,為了將系統內的液量保持於一定,而在適當的部位設置有:當供給顯像液原液時,將剩餘之使用過的顯像液排出至系統外的機構。雖未圖式,在例如,調製槽(1),附設有包含控制閥之排洩用的流路或溢流裝置。Further, in the modulating device of the present invention, in order to prevent contact between the developing liquid or the developing liquid solution and the air, the inside of the system is sealed by an inert gas such as nitrogen. Further, in the modulating device of the present invention, in order to keep the amount of liquid in the system constant, it is provided at an appropriate portion to discharge the remaining used developing liquid to the outside of the system when the developing liquid solution is supplied. mechanism. Although not illustrated, for example, the brewing tank (1) is provided with a flow path or an overflow device for discharging the control valve.
其次說明,上述的調製裝置的功能及本發明的濃度調節方法。在本發明的濃度調節方法,在使用上述這樣的調製裝置調製顯像液時,首先,藉由回收管(3)將由顯像裝置(9)所排出的使用過的顯像液回收至調製槽(1),並且,一邊使調製槽(1)的顯像液(包含使用過的顯像液之顯像液)循環於循環流路(4)並攪拌混合,一邊藉由溫度調節手段,將顯像液保持於一定溫度,再以測量顯 像液的鹼濃度及顯像液中的碳酸鹽濃度。作為濃度計(5),使用前述的多成分濃度計。Next, the function of the above-described modulation device and the concentration adjustment method of the present invention will be described. In the concentration adjustment method of the present invention, when the developing liquid is modulated by using the above-described modulation device, first, the used developing liquid discharged from the developing device (9) is recovered to the brewing tank by the collecting pipe (3). (1) Further, while the developing liquid (including the developing liquid used for the used developing liquid) in the brewing tank (1) is circulated in the circulation flow path (4), the mixture is stirred and mixed, and the temperature adjusting means is used. The developing solution is kept at a certain temperature and then measured The alkali concentration of the liquid and the carbonate concentration in the developing solution. As the concentration meter (5), the aforementioned multi-component concentration meter was used.
在測定調製槽(1)內的顯像液的鹼濃度及顯像液中的碳酸鹽濃度後,藉由上述的控制裝置,控制原液供給管(6)的流量調整閥(61),將調製槽(1)內的顯像液的鹼濃度調節成適當的濃度。在該情況,在本發明,根據預先所製作的碳酸鹽濃度與鹼濃度對基準濃度之不足量之關係,即,能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之預先所製作的關係,因應碳酸鹽濃度的測定值,將鹼濃度調節成基準濃度以上的值。藉此,能夠顯像液對光阻劑的溶解能維持成一定。以下,更具體地說明本發明的上述的思想。After measuring the alkali concentration of the developing liquid in the brewing tank (1) and the carbonate concentration in the developing liquid, the flow rate adjusting valve (61) of the raw liquid supply pipe (6) is controlled by the above-described control device to modulate The alkali concentration of the developing liquid in the tank (1) is adjusted to an appropriate concentration. In this case, according to the present invention, the relationship between the alkalinity and the carbonate concentration of the solubility of the carbonate concentration and the alkali concentration which are prepared in advance, and the amount of the base concentration, which is a certain value of the CD value, can be exhibited. The relationship produced is adjusted to a value equal to or higher than the reference concentration in accordance with the measured value of the carbonate concentration. Thereby, the dissolution energy of the developer to the photoresist can be maintained constant. Hereinafter, the above-described idea of the present invention will be more specifically described.
在對顯像裝置,循環供給顯像液之情況,吸收空氣中的碳酸氣體,於顯像液中產生碳酸鹽,該碳酸鹽與顯像液對光阻劑的溶解能抵銷,造成進行顯像處理所獲得的光阻劑圖案的尺寸精度降低。其結果,形成於基板之電路圖案的線寬會與設計寬度不同。又,在將顯像液的鹼濃度及顯像處理之顯像時間設定成一定之情況,CD值會受到所使用之顯像液中的碳酸鹽濃度與高度所影響。In the case where the developing device is circulated and supplied with the developing liquid, the carbon dioxide gas in the air is absorbed, and carbonate is generated in the developing liquid, and the dissolution of the carbonate and the developing liquid to the photoresist can be offset, resulting in display The dimensional accuracy of the photoresist pattern obtained by the treatment is lowered. As a result, the line width of the circuit pattern formed on the substrate is different from the design width. Further, when the alkali concentration of the developing liquid and the developing time of the developing treatment are set to be constant, the CD value is affected by the concentration and height of the carbonate in the developing liquid to be used.
顯像液中的碳酸鹽濃度對CD值的影響是如圖2所示。圖2是針對碳酸鹽濃度不同之7種類的顯像液(TMAH),分別將鹼濃度(TMAH濃度)調節成2.20~3.27wt%的範圍之3~5種類的濃度,確認在各濃度進行一定時間顯像處理之情況時的CD值與前述的顯像液中的碳酸鹽濃 度之關係者。如圖2所示,再使用碳酸鹽濃度0ppm之新調製之顯像液(鹼濃度不同的5種)之情況時,CD值成為2.77~5.16μm,相對於此,例如,在使用碳酸鹽濃度525ppm的顯像液(鹼濃度不同的4種)之情況,CD值成為3.70~5.05μm,在使用碳酸鹽濃度1000ppm的顯像液(鹼濃度不同的4種)之情況,CD值成為3.59~4.30μm。即,圖2所示的關係是顯示著,伴隨顯像液中的碳酸鹽濃度的上昇,顯像液對光阻劑的溶解能以一定的傾向降低,CD值以一定的關係增加。The effect of the carbonate concentration in the developing solution on the CD value is shown in Fig. 2. 2 is a concentration of 3 to 5 types in the range of 2.20 to 3.27 wt%, and the concentration of each of the 7 kinds of development liquids (TMAH) having different carbonate concentrations is determined to be constant at each concentration. The CD value in the case of time development processing is thicker than the carbonate in the aforementioned developing solution Degree relationship. As shown in Fig. 2, when a newly prepared developing solution having a carbonate concentration of 0 ppm (five kinds having different alkali concentrations) is used, the CD value is 2.77 to 5.16 μm, whereas, for example, a carbonate concentration is used. In the case of a 525 ppm imaging solution (four kinds of alkali concentrations), the CD value is 3.70 to 5.05 μm, and when a developer solution having a carbonate concentration of 1000 ppm (four types having different alkali concentrations) is used, the CD value becomes 3.59. 4.30 μm. That is, the relationship shown in Fig. 2 is shown, and as the concentration of carbonate in the developing liquid increases, the dissolution energy of the developing solution to the photoresist decreases with a certain tendency, and the CD value increases in a constant relationship.
因此,在顯像處理,欲將CD值維持成一定之情況,需要因應碳酸鹽濃度,提高鹼濃度。例如,欲將CD值設定成4.00μm時,再使用碳酸鹽濃度0ppm的新調製之顯像液的情況,鹼濃度(TMAH濃度)被調節成2.38wt%(基準濃度),但,再使用碳酸鹽濃度500ppm的顯像液之情況,必須將鹼濃度(TMAH濃度)調節成2.50wt%,又,在使用碳酸鹽濃度1000ppm的顯像液之情況,必須將鹼濃度(TMAH濃度)調節成2.71wt%。Therefore, in the case of development processing, in order to maintain the CD value to a certain extent, it is necessary to increase the alkali concentration in response to the carbonate concentration. For example, when the CD value is set to 4.00 μm, and a newly prepared developing solution having a carbonate concentration of 0 ppm is used, the alkali concentration (TMAH concentration) is adjusted to 2.38 wt% (reference concentration), but carbonic acid is used again. In the case of a developing solution having a salt concentration of 500 ppm, the alkali concentration (TMAH concentration) must be adjusted to 2.50% by weight, and in the case of using a developing solution having a carbonate concentration of 1000 ppm, the alkali concentration (TMAH concentration) must be adjusted to 2.71. Wt%.
由上述的關係,在顯像液做成所必須之鹼濃度,作為將CD值維持成一定之情況的碳酸鹽濃度與鹼濃度的必要補正量之關係(鹼濃度對基準濃度之不足量之關係),可如圖1所表示。碳酸鹽濃度與鹼濃度對基準濃度之不足量之關係是指,如上述,由進行規定的顯像處理(獲得一定的CD值之處理)的情況的鹼濃度與碳酸鹽濃度的關係預先導出之關係,指碳酸鹽濃度與對基準的鹼濃度(使用不 含碳酸鹽之新調製之顯像液的情況的該顯像液的濃度)的不足量之關係、在圖1的圖表中,縱軸的TMAH濃度(鹼濃度)的括弧內的數值是顯示對基準濃度(2.38wt%)之濃度的不足量。In the above relationship, the relationship between the concentration of alkali and the amount of alkali required to maintain the CD value as a necessary amount of alkali concentration to maintain the CD value (the relationship between the alkali concentration and the shortage of the reference concentration) ), as shown in Figure 1. The relationship between the carbonate concentration and the alkali concentration to the shortage of the reference concentration means that the relationship between the alkali concentration and the carbonate concentration in the case of performing a predetermined development process (processing for obtaining a predetermined CD value) is as described above. Relationship, refers to the concentration of carbonate and the alkali concentration on the basis (use is not The relationship between the insufficient amount of the concentration of the developing solution in the case of the newly prepared developing solution containing carbonate, and the value in the parentheses of the TMAH concentration (alkali concentration) on the vertical axis in the graph of Fig. 1 is a display pair. The insufficient amount of the concentration of the reference concentration (2.38 wt%).
本發明是如上述般,著眼於將CD值維持成一定的情況時的顯像液之鹼濃度與碳酸鹽濃度之關係,因應碳酸鹽濃度,對成為基準之鹼濃度進行補正者。又,在使用TMAH之情況,圖1所示的上述的補正量(碳酸鹽濃度與鹼濃度對基準濃度之不足量)是以下的數學式所表示。As described above, the present invention focuses on the relationship between the alkali concentration of the developing liquid and the carbonate concentration when the CD value is maintained constant, and corrects the alkali concentration serving as the standard in accordance with the carbonate concentration. Further, in the case of using TMAH, the above-described correction amount (the shortage of the carbonate concentration and the alkali concentration to the reference concentration) shown in Fig. 1 is represented by the following mathematical expression.
〔數學式1〕 y=8×10一8 x2 +2×10一4 x………(I) 其中,x為碳酸鹽濃度(ppm)、y為TMAH濃度(wt%)[Math. 1] y=8×10 - 8 x 2 + 2 × 10 - 4 x (1) where x is the carbonate concentration (ppm) and y is the TMAH concentration (wt%)
再者,為了確認圖2之關係,找出上述的數學式及圖1的關係,是準備不含碳酸鹽之新調製的鹼濃度不同的複數種顯像液(例如實際所使用之TMAH水溶液)、與含有碳酸鹽且鹼濃度不同之做為樣品的複數種顯像液,針對每顯像液,進行將溫度及顯像時間做成一定之規定的顯像處理,測定各自所獲得的光阻劑圖案的CD值。此時,關於包含碳酸鹽之各鹼濃度的顯像液,藉由一邊確認碳酸鹽濃度,一邊添加計算量的乾冰,以碳酸鹽濃度成為例如100ppm、325ppm、500ppm、1000ppm、1500ppm、2000ppm的方式調製複數種。又,由所獲得之結果,依據統計處理來推定關係式。In addition, in order to confirm the relationship of FIG. 2, the relationship between the above mathematical formula and FIG. 1 is found, and a plurality of kinds of developing liquids having different alkali concentrations not containing carbonate are prepared (for example, the TMAH aqueous solution actually used). And a plurality of kinds of developing liquids which are different from the carbonate and have a different alkali concentration as a sample, and each of the developing liquids is subjected to a predetermined development process for determining the temperature and the development time, and the respective obtained photoresists are measured. The CD value of the agent pattern. In this case, a calculated amount of dry ice is added to the developing solution containing the alkali concentration of the carbonate, and the calculated concentration of the dry ice is, for example, 100 ppm, 325 ppm, 500 ppm, 1000 ppm, 1500 ppm, or 2000 ppm. Modulate a plurality of species. Further, based on the obtained results, the relationship is estimated based on statistical processing.
在本發明,根據上述的數學式(I)(圖1所顯示的圖表之關係),即,根據能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之預先所製作的關係,因應顯像液中的碳酸鹽濃度,調節鹼濃度。換言之,因應碳酸鹽濃度的測定值,將鹼濃度調節成基準濃度以上的值。藉此,能夠將顯像液的溶解能維持成一定,能夠提高光阻劑圖案的尺寸精度,且能夠將CD值控制成一定。再者,在顯像液中的碳酸鹽濃度為0ppm的情況,鹼濃度被設定成基準濃度。According to the present invention, the relationship between the alkali concentration of the dissolution energy capable of exhibiting a CD value and the carbonate concentration is based on the above-described mathematical expression (I) (the relationship of the graph shown in FIG. 1). Adjust the alkali concentration in response to the concentration of carbonate in the imaging solution. In other words, the alkali concentration is adjusted to a value equal to or higher than the reference concentration in accordance with the measured value of the carbonate concentration. Thereby, the dissolution energy of the developing solution can be maintained constant, the dimensional accuracy of the photoresist pattern can be improved, and the CD value can be controlled to be constant. Further, when the carbonate concentration in the developing solution is 0 ppm, the alkali concentration is set to the reference concentration.
又,在調製裝置等實施本發明之際,在顯像液的濃度調節,為了獲得一定的CD值,需要因應碳酸鹽濃度,決定實際的鹼濃度。在該情況,根據預先所製作的碳酸鹽濃度與能夠發揮預定的溶解能的鹼濃度之關係,即,能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之預先所製作的關係(碳酸鹽濃度與加上前述的不足量之鹼濃度之關係),調節鹼濃度。上述的關係是在圖1的圖表中,作為橫軸的碳酸鹽濃度與縱軸的TMAH濃度之關係加以顯示。因此,在使用TMAH之情況,上述的關係(碳酸鹽濃度與能夠發揮預定的溶解能的鹼濃度之關係)是能夠以以下的數學式加以表示。Further, when the present invention is implemented by a modulating device or the like, the concentration of the developing solution is adjusted, and in order to obtain a constant CD value, it is necessary to determine the actual alkali concentration in accordance with the concentration of the carbonate. In this case, the relationship between the concentration of the carbonate prepared in advance and the concentration of alkali which can exhibit a predetermined solubility, that is, the alkali concentration and the carbonate concentration of the solubility of the CD having a predetermined value can be exhibited. The relationship (the relationship between the carbonate concentration and the alkali concentration of the aforementioned deficiency) is adjusted to adjust the alkali concentration. The above relationship is shown in the graph of Fig. 1 as the relationship between the carbonate concentration on the horizontal axis and the TMAH concentration on the vertical axis. Therefore, in the case of using TMAH, the above relationship (the relationship between the carbonate concentration and the alkali concentration capable of exhibiting a predetermined solubility) can be expressed by the following mathematical expression.
〔數學式2〕 y=8×10一8 x2 +2×10一4 x+2.38………(II) 其中,x為碳酸鹽濃度(ppm)、y為TMAH濃度(wt%)[Mathematical Formula 2] a y = 8 × 10 8 x 2 + 2 × 10 a 4 x + 2.38 ......... (II) wherein, x is the bicarbonate concentration (ppm), y is the concentration of TMAH (wt%)
在本發明的調製裝置,對控制裝置寫入濃度測定及控制運算的運算法,在調製槽(1)之濃度調節,根據以濃度計(5)所測定到的顯像液的鹼濃度及顯像液中的碳酸鹽濃度,依據上述的數學式(II)控制原液供給管(6)的流量調整閥(61),添加符合鹼濃度的不足量之顯像液原液,將鹼濃度調節成預定的目標值。又,在依照上述的關係(數學式(II)的關係),鹼濃度變得過高之情況時,透過稀釋水供給管(7),對調製槽(1)供給稀釋用的純水。In the modulation apparatus of the present invention, the calculation method of the concentration measurement and the control calculation is written to the control device, and the concentration of the modulation tank (1) is adjusted, and the alkali concentration and the display liquid of the developing solution measured by the concentration meter (5) are displayed. For the carbonate concentration in the liquid, the flow rate adjusting valve (61) of the raw liquid supply pipe (6) is controlled according to the above formula (II), and a developing liquid liquid which is insufficient in alkali concentration is added to adjust the alkali concentration to a predetermined amount. The target value. In the case where the alkali concentration is too high in accordance with the above relationship (the relationship of the formula (II)), the dilution water supply pipe (7) is passed through, and the pure water for dilution is supplied to the preparation tank (1).
再者,在排出回收的使用過的顯像液的一部份等,使得調製槽(1)內的顯像液的量降低之情況,透過原液供給管(6)及稀釋水供給管(7),將顯像液原液及純水供給至調製槽(1),並且以上述的操作進行鹼濃度的調節,藉此將調製槽(1)的液量調節於一定範圍內。或,透過新液供給管(8),將新的顯像液供給至調製槽(1)來調節液量。Further, when a portion of the used used developing liquid is discharged, the amount of the developing liquid in the brewing tank (1) is lowered, and the raw liquid supply pipe (6) and the dilution water supply pipe (7) are transmitted. The developing solution liquid and the pure water are supplied to the brewing tank (1), and the alkali concentration is adjusted by the above operation, whereby the liquid amount of the brewing tank (1) is adjusted within a certain range. Alternatively, the new liquid supply tube (8) is supplied to the brewing tank (1) to adjust the amount of liquid.
顯像液原液的供給控制、稀釋水的供給控制及新的顯像液的供給控制,分別藉由對來自於原液供給機構(A)之顯像液原液的供給量、來自於稀釋水供給機構(B))之純水的供給量及來自於新液供給管(8)之顯像液的供給量進行串聯控制來進行的。又在這些的控制,能夠利用例如,日本特許第3741811號公報所記載之「鹼顯像原液的稀釋方法及稀釋裝置」所揭示的所謂漸近法。The supply control of the developing solution stock solution, the supply control of the dilution water, and the supply control of the new developing liquid are respectively supplied from the dilution water supply mechanism by the supply amount of the developing liquid stock solution from the raw liquid supply mechanism (A). The supply amount of the pure water of (B)) and the supply amount of the developing liquid from the fresh liquid supply pipe (8) are controlled in series. In addition, the so-called asymptotic method disclosed by the "dilution method and dilution device of the alkali imaging stock solution" described in Japanese Patent No. 3741811, for example, can be used.
具體而言,在利用上述的漸近法的調製槽(1)之例 如鹼濃度的調節,為了對鹼濃度降低(或鹼濃度變高)調製槽(1)內的顯像液添加高濃度的顯像液原液(或稀釋水)調節成所定濃度時,執行下述製程,即,藉由濃度計(5)測定顯像液的濃度之濃度測定製程;及根據在濃度測定製程所測定到的濃度與目標濃度(上述的數學式(II)所獲得之濃度)的差,算出顯像液原液的不足量(或稀釋水的添加量),供給相當於所算出之不足量(或添加量)的85~99%理想為92~98%之量的調製製程。又,在所測定到的濃度成為預先所設定的目標濃度的區域值內的值為止,由前述的濃度測定製程反復進行調製製程。藉此,能夠更高精度地管理調製槽(1)之顯像液中的鹼濃度。Specifically, an example of the modulation groove (1) using the above-described asymptotic method For the adjustment of the alkali concentration, in order to adjust the alkali concentration (or the alkali concentration becomes high) to the developing solution in the preparation tank (1), a high concentration of the developing liquid solution (or dilution water) is added to the predetermined concentration, and the following is performed. a process for determining a concentration of a developing solution by a concentration meter (5); and a concentration determined according to the concentration measuring process and a target concentration (concentration obtained by the above formula (II)) The difference is calculated by the amount of the shortage of the stock solution (or the amount of the dilution water added), and the preparation process is performed in an amount of 85 to 99%, preferably 92 to 98%, which is equivalent to the calculated shortage (or addition amount). Further, the modulation process is repeated by the concentration measurement process described above until the measured concentration becomes a value within the region value of the target concentration set in advance. Thereby, the alkali concentration in the developing liquid of the brewing tank (1) can be managed with higher precision.
如上述般,在本發明,根據預先所製作的碳酸鹽濃度與鹼濃度對基準濃度之不足量之關係,因應碳酸鹽濃度的測定值,將鹼濃度調節成基準濃度以上的值。即,根據能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度之預先所製作的關係,調節鹼濃度。藉此,能夠將顯像液對光阻劑的溶解能維持成一定。因此,若根據本發明的話,在顯像裝置,能夠維持對於光阻劑之一定的顯像速度,且可更進一步提高在顯像處理所製作的光阻劑圖案的尺寸精度及膜厚精度,藉此,能夠進行更高品質的顯像處理。As described above, in the present invention, the alkali concentration is adjusted to a value equal to or higher than the reference concentration based on the measured value of the carbonate concentration based on the relationship between the carbonate concentration and the alkali concentration prepared in advance and the shortage of the reference concentration. In other words, the alkali concentration is adjusted in accordance with the relationship between the alkali concentration of the dissolution energy at which the CD value becomes a constant value and the carbonate concentration. Thereby, the dissolution energy of the developing solution to the photoresist can be maintained constant. Therefore, according to the present invention, it is possible to maintain a constant development speed for the photoresist in the developing device, and it is possible to further improve the dimensional accuracy and film thickness precision of the photoresist pattern produced by the developing process. Thereby, higher quality development processing can be performed.
又,在本發明,為了更高精度調節鹼濃度,亦可與顯像液中的碳酸鹽濃度,一同因應溶解樹脂濃度,來調節鹼濃度。如前述般,在循環供給顯像液之情況,會有下述傾 向,即,在顯像液中會產生碳酸鹽,並且,因顯像處理,光阻劑會溶解於顯像液中,雖只有稍許,但該溶解樹脂會使顯像液的溶解能降低。因此,為了如前述般調節鹼濃度,因應顯像液中的溶解樹脂濃度進行補正為佳。Further, in the present invention, in order to adjust the alkali concentration with higher precision, the alkali concentration may be adjusted in accordance with the concentration of the carbonate in the developing solution in accordance with the concentration of the dissolved resin. As described above, in the case of circulating supply of the developing liquid, there will be the following tilting The carbonate is generated in the developing solution, and the photoresist is dissolved in the developing solution due to the development treatment. Although it is only slightly, the dissolved resin lowers the solubility of the developing solution. Therefore, in order to adjust the alkali concentration as described above, it is preferable to correct the concentration of the dissolved resin in the developing solution.
顯像液中的溶解樹脂濃度對CD值的影響是如圖3所示。圖3是顯示在溶解樹脂(構成光阻劑之樹脂成分)的濃度不同的6種類的顯像液(實際使用的為濃度2.38wt%的TMAH),進行一定時間之顯像處理的情況時之溶解樹脂濃度與CD值的變化之關係,如圖3所示,對使用溶解樹脂濃度0abs的顯像液(樹脂未溶解之顯像液)的情況時之基準的CD值,使用例如,溶解樹脂濃度0.2abs的顯像液之情況時,CD值增加0.04μm,在使用溶解樹脂濃度0.8abs的顯像液之情況時,CD值增加0.288μm。即,圖3所示的關係是顯示,伴隨顯像液中的溶解樹脂濃度的上昇,顯像液對光阻劑的溶解能以一定的傾向降低,CD值以一定的關係增加。The effect of the dissolved resin concentration in the developing solution on the CD value is as shown in FIG. 3 is a view showing a case where six kinds of developing liquids (using a concentration of 2.38 wt% of TMAH) having different concentrations of a resin (a resin component constituting a photoresist) are dissolved and subjected to development processing for a predetermined period of time. For the relationship between the concentration of the dissolved resin and the change in the CD value, as shown in FIG. 3, for example, the dissolved resin is used as the reference CD value in the case of using a developing solution having a dissolved resin concentration of 0 abs (a developing solution in which the resin is not dissolved). In the case of a developing solution having a concentration of 0.2 abs, the CD value was increased by 0.04 μm, and when a developing solution having a dissolved resin concentration of 0.8 abs was used, the CD value was increased by 0.288 μm. That is, the relationship shown in Fig. 3 is a display, and as the concentration of the dissolved resin in the developing liquid increases, the dissolution energy of the developing solution to the photoresist decreases with a certain tendency, and the CD value increases in a constant relationship.
因此,能夠由實驗找出,將CD值維持成一定之情況時的顯像液之鹼濃度與碳酸鹽濃度與溶解樹脂濃度的關係。為了找出上述的關係,準備不含碳酸鹽及樹脂成分(構成光阻劑之樹脂成分)的新調製的鹼濃度不同的複數種顯像液(例如實際所使用的TMAH水溶液)、及包含碳酸鹽及上述的樹脂成分且鹼濃度不同的樣品之複數種顯像液,針對各個顯像液,進行與導出前述的數學式(I)及(II)之情況相同的規定的顯像處理,測定各自所獲得之光阻劑 圖案的CD值。關於鹼濃度不同的各顯像液的碳酸鹽濃度,與前述情況同樣地,藉由添加乾冰,能夠調節成例如100~2000ppm的適當值,又,關於各顯像液的溶解樹脂濃度,藉由一邊測定溶解樹脂濃度一邊使光阻劑溶解計算量,將鹼濃度與溶解樹脂濃度調節成例如100ppm/0abs,250ppm/0.3abs,500ppm/0.6abs,1000ppm/0.9abs。Therefore, it is possible to find out by the experiment the relationship between the alkali concentration of the developing liquid and the carbonate concentration and the dissolved resin concentration when the CD value is maintained constant. In order to find out the above relationship, a plurality of kinds of developing liquids (for example, an aqueous TMAH solution actually used) having different alkali concentrations different from carbonate and resin components (resin components constituting the photoresist) are prepared, and carbonic acid is contained. A plurality of kinds of developing liquids of the salt and the above-mentioned resin component and different alkali concentration samples are subjected to the same development processing as those of the above-described mathematical expressions (I) and (II) for each of the developing liquids, and the measurement is performed. Resistors obtained by each The CD value of the pattern. The carbonate concentration of each of the developing liquids having different alkali concentrations can be adjusted to an appropriate value of, for example, 100 to 2000 ppm by adding dry ice, and the dissolved resin concentration of each developing solution can be adjusted by the same as described above. The photoresist is dissolved in a calculated amount while measuring the dissolved resin concentration, and the alkali concentration and the dissolved resin concentration are adjusted to, for example, 100 ppm/0 abs, 250 ppm/0.3 abs, 500 ppm/0.6 abs, and 1000 ppm/0.9 abs.
然後,由所獲得之結果,藉由統計處理,將例如CD值的變動量作為從屬變數且鹼濃度與前述的碳酸鹽濃度與溶解樹脂濃度作為各獨立變數,進行多因子解析,藉此能夠推定關係式。藉此,在使用例如TMAH作為顯像液之情況,顯像液之鹼濃度的必要補正量(與前述相同的鹼濃度對基準濃度之不足量)即,能夠發揮CD值成為一定的值之溶解能用的鹼濃度的補正量是能夠以以下的數學式加以表示。以下的數學式中,TMAH濃度(y)的數值顯示對基準濃度之不足量。Then, from the results obtained, by statistical processing, for example, the fluctuation amount of the CD value is used as the dependent variable, and the alkali concentration and the above-described carbonate concentration and dissolved resin concentration are used as independent variables, and multi-factor analysis is performed, whereby it is possible to estimate Relationship. In this case, when TMAH is used as the developing solution, the necessary correction amount of the alkali concentration of the developing liquid (the same amount of the alkali concentration as the above-mentioned base concentration) is sufficient to dissolve the CD value. The amount of correction of the usable alkali concentration can be expressed by the following mathematical formula. In the following mathematical formula, the value of TMAH concentration (y) shows the amount of deficiency to the reference concentration.
〔數學式3〕 y=(2.33×10一6 x2 +6.36×10一4 x+0.36c)/8.79………(III) 其中,x為碳酸鹽濃度(ppm),c為溶解樹脂濃度(abs),y為TMAH濃度(wt%)。[Equation 3] y = (2.33 × 10 a 6 x 2 + 6.36 × 10 a 4 x + 0.36c) /8.79......... (III ) wherein, x is the bicarbonate concentration (ppm), c is the concentration of dissolved resin (abs), y is the TMAH concentration (wt%).
再者,溶解樹脂濃度的單位abs(absorbance)是如昔知,藉由顯示物質對特定的波長之光的吸收強度的尺度即吸光度來表示液中的物質的濃度之無次元量的單位,顯像液中的溶解樹脂濃度是能以該溶解樹脂特有的吸收波長(例如560nm)之吸光度來表示。Further, the unit abs (absorbance) of the dissolved resin concentration is a unit of the dimensionless amount indicating the concentration of the substance in the liquid by the absorbance indicating the absorption intensity of light of a specific wavelength, as shown in the prior art. The concentration of the dissolved resin in the liquid is expressed by the absorbance at the absorption wavelength (for example, 560 nm) peculiar to the dissolved resin.
在本發明,測定顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度,上述的數學式(III),因應顯像液中的碳酸鹽濃度及溶解樹脂濃度,調節鹼濃度。換言之,因應碳酸鹽濃度的測定值,將鹼濃度調節成基準濃度以上的值。藉此,能夠將顯像液的溶解能維持成一定,可進一步提高光阻劑圖案的尺寸精度,又,能更進一步將CD值控制成一定。In the present invention, the alkali concentration of the developing solution, the carbonate concentration in the developing solution, and the dissolved resin concentration are measured, and the above formula (III) adjusts the alkali concentration in response to the carbonate concentration and the dissolved resin concentration in the developing solution. . In other words, the alkali concentration is adjusted to a value equal to or higher than the reference concentration in accordance with the measured value of the carbonate concentration. Thereby, the dissolution energy of the developing solution can be maintained constant, the dimensional accuracy of the photoresist pattern can be further improved, and the CD value can be further controlled to be constant.
又,為了在前述的調製裝置等實施本發明之際,在顯像液的濃度調節,需要以能夠獲得一定的CD值的方式,因應碳酸鹽濃度及溶解樹脂濃度來決定實際的鹼濃度。在該情況,根據能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度與溶解樹脂濃度之預先所製作的關係,調節鹼濃度。上述的關係,在使用TMAH之情況,能利用以下的數學式加以表示。Further, in order to adjust the concentration of the developing solution in the above-described modulation apparatus or the like, it is necessary to determine the actual alkali concentration in accordance with the carbonate concentration and the dissolved resin concentration so that a certain CD value can be obtained. In this case, the alkali concentration is adjusted in accordance with the relationship between the alkali concentration of the dissolution energy at which the CD value becomes a constant value and the carbonate concentration and the dissolved resin concentration. The above relationship can be expressed by the following mathematical expression in the case of using TMAH.
〔數學式4〕 y=(2.33×10一6 x2 +6.36×10一4 x+0.36c)/8.79+2.38………(IV) 其中,x為碳酸鹽濃度(ppm),c為溶解樹脂濃度(abs),y為TMAH濃度(wt%)。[Mathematical Formula 4] y = (2.33 × 10 a 6 x 2 + 6.36 × 10 a 4 x + 0.36c) /8.79+2.38......... (IV ) wherein, x is the bicarbonate concentration (ppm), c is The dissolved resin concentration (abs), y is the TMAH concentration (wt%).
本發明的理想形態之調製裝置是與前述的形態的裝置同樣地,藉由調製槽(1)、供給管(2)、回收管(3)、原液供給管(6)、濃度計(5)及控制裝置所構成。在該情況,作為濃度計(5),使用可檢測調製槽內的顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度之多成分濃度計。又,上述的控制裝置是根據藉由濃度計(5 )所測定到的顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度、與能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度與溶解樹脂濃度之預先所製作的關係,控制顯像液原液的供給,具有調節鹼濃度功能。The preparation device of the preferred embodiment of the present invention is a modulation tank (1), a supply pipe (2), a recovery pipe (3), a raw liquid supply pipe (6), and a concentration meter (5) in the same manner as the device of the above-described configuration. And a control device. In this case, as the concentration meter (5), a multi-component concentration meter capable of detecting the alkali concentration of the developing liquid in the preparation tank, the carbonate concentration in the developing liquid, and the dissolved resin concentration is used. Moreover, the above control device is based on a concentration meter (5) The alkali concentration of the developing liquid, the concentration of the carbonate in the developing solution, the concentration of the dissolved resin, and the alkali concentration and the carbonate concentration and the dissolved resin concentration which can exhibit the solubility of the CD value. The relationship produced controls the supply of the stock solution and has the function of adjusting the alkali concentration.
作為濃度計(5),能夠使用附加有溶解樹脂濃度的測定功能之與前述相同的多成分濃度計。該多成分濃度計為依據若溶液的溫度呈一定的話,因應鹼、碳酸鹽及溶解樹脂的各成分的濃度,首要地特定液中的超音波的傳播速度、電磁導電率及吸光度之原理者。上述的多成分濃度計是測量顯像液的溫度、超音波傳播速度、電磁導電率及吸光度,根據預先所製作的預定的溫度、鹼濃度、碳酸鹽濃度及溶解樹脂濃度之超音波傳播速度與電磁導電率與吸光度之關係(規定針對每一個預先準備之鹼濃度、碳酸鹽濃度及溶解樹脂濃度的各種組合,在一定溫度條件下預先測量到的超音波傳播速度、電磁導電率及吸光度之關係的矩陣),來檢測顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度。As the concentration meter (5), the same multi-component concentration meter as described above to which the measurement function of the dissolved resin concentration is added can be used. The multi-component concentration meter is based on the principle that the concentration of each component of the alkali, the carbonate, and the dissolved resin depends on the concentration of the ultrasonic wave, the electromagnetic conductivity, and the absorbance in the specific liquid, depending on the temperature of the solution. The multi-component concentration meter described above measures the temperature of the developing solution, the ultrasonic wave propagation speed, the electromagnetic conductivity, and the absorbance, and the ultrasonic wave propagation speed according to the predetermined temperature, alkali concentration, carbonate concentration, and dissolved resin concentration prepared in advance. Relationship between Electromagnetic Conductivity and Absorbance (Provides the relationship between ultrasonic propagation rate, electromagnetic conductivity, and absorbance measured in advance under a certain temperature condition for each combination of previously prepared alkali concentration, carbonate concentration, and dissolved resin concentration. The matrix) is used to detect the alkali concentration of the developing solution, the carbonate concentration in the developing solution, and the dissolved resin concentration.
在本發明的調製裝置,根據以濃度計(5)所測定到的顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度,與前述的形態之裝置同樣地,依據上述的數學式(IV),控制原液供給管(6)的流量調整閥(61),添加符合鹼濃度的不足量之顯像液原液,將鹼濃度調節成預定的目標值。In the modulating device of the present invention, the alkali concentration of the developing liquid measured by the concentration meter (5), the carbonate concentration in the developing liquid, and the dissolved resin concentration are the same as those of the above-described apparatus. In the mathematical formula (IV), the flow rate adjustment valve (61) of the raw liquid supply pipe (6) is controlled, and a stock solution liquid solution which is insufficient in alkali concentration is added to adjust the alkali concentration to a predetermined target value.
再者,在依照上述的關係(數學式(IV)的關係), 鹼濃度變得過高之情況時,與前述的裝置同樣地,透過稀釋水供給管(7),對調製槽(1)供給稀釋用的純水。另外,在調製槽(1)內的顯像液的量降低之情況,透過原液供給管(6)及稀釋水供給管(7),將顯像液原液及純水供給至調製槽(1),或透過新液供給管(8),將新的顯像液供給至調製槽(1),藉由上述的操作來進行鹼濃度的調節。Furthermore, in accordance with the above relationship (the relationship of the mathematical formula (IV)), When the alkali concentration is too high, the dilution water supply pipe (7) is passed through the dilution water supply pipe (7) in the same manner as the above-described apparatus, and the pure water for dilution is supplied to the preparation tank (1). Further, when the amount of the developing liquid in the modulating tank (1) is lowered, the raw liquid supply pipe (6) and the dilution water supply pipe (7) are passed through, and the developing liquid and the pure water are supplied to the modulating tank (1). Or, a new developing liquid is supplied to the brewing tank (1) through the new liquid supply pipe (8), and the alkali concentration is adjusted by the above operation.
在本發明,如上述般,測定顯像液的鹼濃度、顯像液中的碳酸鹽濃度及溶解樹脂濃度,根據能夠發揮CD值成為一定的值之溶解能的鹼濃度與碳酸鹽濃度與溶解樹脂濃度之預先所製作的關係,調節鹼濃度。藉此,可進一步將顯像液對光阻劑的溶解能,即,顯像速度維持成一定。因此,若根據本發明的話,顯能夠更進一步提高在像處理所製作之光阻劑圖案的尺寸精度及膜厚精度。In the present invention, as described above, the alkali concentration of the developing solution, the carbonate concentration in the developing solution, and the dissolved resin concentration are measured, and the alkali concentration and the carbonate concentration and dissolution which can exhibit the solubility of the CD value are constant. The relationship between the resin concentration and the previously prepared relationship adjusts the alkali concentration. Thereby, the dissolution energy of the developer to the photoresist, that is, the development speed can be further maintained constant. Therefore, according to the present invention, it is possible to further improve the dimensional accuracy and film thickness precision of the photoresist pattern produced by the image processing.
如上述般,若根據本發明的話,由於能夠在顯像處理更進一步提高光阻劑圖案的尺寸精度及膜厚精度,故,能夠進行更高品質的顯像處理。其結果,能夠在蝕刻處理,於基板上,更高精度地形成圖案。且,由於因應顯像液中的碳酸鹽濃度的上昇,設定成逐漸地使鹼濃度變高,故,能夠提高顯像液的循環率,又,可使顯像程序更穩定。又,若根據本發明的調製裝置的話,使用由顯像程序所回收的使用過的顯像液,能夠調製可進行更高品質的顯像處理之顯像液。又,藉由本發明的濃度調節方法及調製裝置所獲得之顯像液,由於維持對光阻劑之一定的顯像速度,故 能夠進行高品質的顯像處理。As described above, according to the present invention, since the dimensional accuracy and film thickness precision of the photoresist pattern can be further improved in the development processing, higher-quality development processing can be performed. As a result, it is possible to form a pattern with higher precision on the substrate by the etching process. Further, since the alkali concentration is gradually increased in response to an increase in the concentration of the carbonate in the developing liquid, the circulation rate of the developing liquid can be increased, and the development process can be further stabilized. Further, according to the modulating device of the present invention, it is possible to modulate a developing liquid which can perform higher-quality developing processing by using the used developing liquid recovered by the developing program. Moreover, since the developing liquid obtained by the concentration adjusting method and the modulating device of the present invention maintains a constant developing speed for the photoresist, High quality imaging processing is possible.
順便一提,使用不含碳酸鹽之新調製之顯像液(實際所使用之濃度2.38wt%的TMAH)進行規定的顯像處理,確認所獲得之光阻劑圖案時,CD值為4.00μm。相對於此,準備碳酸鹽濃度100~2000ppm的數種類的使用過的顯像液,根據前述的數學式(II)的關係調節TMAH濃度,然後使用各顯像液,進行與上述相同的顯像處理的結果,使用任一種的顯像液之情況,CD值均為4.00μm。藉此,確認到,藉由根據數學式(I)及(II)的關係(圖1所示的關係)調節鹼濃度,能夠維持一定的溶解能。By the way, a predetermined development process was carried out using a newly-formed developing solution containing no carbonate (the actually used concentration of 2.38 wt% of TMAH), and when the obtained photoresist pattern was confirmed, the CD value was 4.00 μm. . On the other hand, a plurality of used developing liquids having a carbonate concentration of 100 to 2000 ppm are prepared, the TMAH concentration is adjusted according to the relationship of the above formula (II), and the same development as described above is performed using each developing liquid. As a result of the treatment, in the case of using any of the developing liquids, the CD value was 4.00 μm. As a result, it was confirmed that the alkali concentration can be adjusted according to the relationship between the mathematical formulas (I) and (II) (the relationship shown in FIG. 1), and a certain amount of dissolved energy can be maintained.
且,準備碳酸鹽濃度100~2000ppm、溶解樹脂濃度0~2.0abs之數種類的使用過的顯像液,根據前述的數學式(IV)的關係調節TMAH濃度。然後,使用各顯像液,進行與上述相同的顯像處理的結果,使用任一種的顯像液之情況,CD值均為4.00μm。藉此,關於溶解有樹脂之顯像液,也確認到,藉由根據數學式(III)及(IV)的關係調節鹼濃度,可更進一步將溶解能維持於一定。Further, a used developer liquid having a carbonate concentration of 100 to 2,000 ppm and a dissolved resin concentration of 0 to 2.0 abs was prepared, and the TMAH concentration was adjusted according to the relationship of the above formula (IV). Then, the results of the same development process as described above were carried out using each of the developing liquids, and in the case of using any of the developing liquids, the CD value was 4.00 μm. In the meantime, it was confirmed that the alkalinity concentration was adjusted according to the relationship between the mathematical formulas (III) and (IV), and the solubility was further maintained constant.
1‧‧‧調製槽1‧‧‧Modulation slot
2‧‧‧供給管2‧‧‧Supply tube
21‧‧‧泵浦21‧‧‧ pump
3‧‧‧回收管3‧‧‧Recycling tube
4‧‧‧循環流路4‧‧‧Circular flow path
41‧‧‧泵浦41‧‧‧ pump
5‧‧‧濃度計5‧‧‧ concentration meter
6‧‧‧原液供給管6‧‧‧ stock solution supply tube
61‧‧‧流量調整閥61‧‧‧Flow adjustment valve
7‧‧‧稀釋水供給管7‧‧‧Dilution water supply pipe
71‧‧‧流量調整閥71‧‧‧Flow adjustment valve
8‧‧‧新液供給管8‧‧‧New liquid supply pipe
81‧‧‧流量調整閥81‧‧‧Flow adjustment valve
9‧‧‧顯像裝置9‧‧‧Developing device
A‧‧‧原液供給機構A‧‧‧ stock solution supply mechanism
B‧‧‧稀釋水供給機構B‧‧‧Dilution water supply mechanism
C‧‧‧新液供給機構C‧‧‧New liquid supply mechanism
圖1是碳酸鹽濃度與鹼濃度對基準濃度之不足量之關係、及碳酸鹽濃度與可發揮預定的溶解能的鹼濃度之關係的圖表。Fig. 1 is a graph showing the relationship between the carbonate concentration and the alkali concentration to the insufficient amount of the reference concentration, and the relationship between the carbonate concentration and the alkali concentration at which a predetermined solubility can be exhibited.
圖2是顯示顯像液中的碳酸鹽濃度對進行顯像處理所獲得的光阻劑圖案的線寬(CD值)的影響之圖表。2 is a graph showing the effect of the carbonate concentration in the developing solution on the line width (CD value) of the photoresist pattern obtained by the developing process.
圖3是顯示顯像液中的溶解樹脂濃度對進行顯像處理所獲得的光阻劑圖案的線寬(CD值)的影響之圖表。3 is a graph showing the influence of the dissolved resin concentration in the developing liquid on the line width (CD value) of the photoresist pattern obtained by the development processing.
圖4是顯示本發明之顯像液的調製裝置的主要結構元件之流程圖。Fig. 4 is a flow chart showing the main structural elements of a modulating device for a developing liquid of the present invention.
1‧‧‧調製槽1‧‧‧Modulation slot
2‧‧‧供給管2‧‧‧Supply tube
3‧‧‧回收管3‧‧‧Recycling tube
4‧‧‧循環流路4‧‧‧Circular flow path
5‧‧‧濃度計5‧‧‧ concentration meter
6‧‧‧原液供給管6‧‧‧ stock solution supply tube
7‧‧‧稀釋水供給管7‧‧‧Dilution water supply pipe
8‧‧‧新液供給管8‧‧‧New liquid supply pipe
9‧‧‧顯像裝置9‧‧‧Developing device
21‧‧‧泵浦21‧‧‧ pump
41‧‧‧泵浦41‧‧‧ pump
61‧‧‧流量調整閥61‧‧‧Flow adjustment valve
71‧‧‧流量調整閥71‧‧‧Flow adjustment valve
81‧‧‧流量調整閥81‧‧‧Flow adjustment valve
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JP5637676B2 (en) * | 2009-11-16 | 2014-12-10 | 石原ケミカル株式会社 | Method for measuring photoresist dissolution in developer |
KR101332191B1 (en) * | 2012-03-07 | 2013-11-22 | (주)에스지이앤티 | Concentration computing method and concentration control system for developer including photoresist |
KR101395019B1 (en) * | 2013-05-06 | 2014-05-14 | (주)세미로드 | Apparatus for measuring and adjusting concentration of the developer |
JP6370567B2 (en) * | 2014-03-13 | 2018-08-08 | エイブリック株式会社 | Development device |
CN104777724A (en) * | 2015-04-14 | 2015-07-15 | 广东成德电路股份有限公司 | Modified developer and load measuring method thereof |
JP6713658B2 (en) * | 2015-07-22 | 2020-06-24 | 株式会社平間理化研究所 | Component concentration measuring device for developer, component concentration measuring method, developer controlling device, and developer controlling method |
JP6505534B2 (en) * | 2015-07-22 | 2019-04-24 | 株式会社平間理化研究所 | Method and apparatus for managing developer |
JP6721157B2 (en) | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | Method and apparatus for measuring component concentration of developer, and method and apparatus for managing developer |
CN105116695B (en) * | 2015-10-15 | 2019-09-17 | 京东方科技集团股份有限公司 | Developing apparatus and lithographic equipment |
KR101864674B1 (en) * | 2016-02-17 | 2018-06-05 | 한양대학교 산학협력단 | Patterned nanostructures by using stimuli-responsive soft nanoparticles and method for manufacturing the same |
CN106200281B (en) * | 2016-09-09 | 2019-11-22 | 武汉华星光电技术有限公司 | Solution level concocting method in a kind of image developing process |
CN106444304B (en) * | 2016-11-18 | 2019-08-23 | 昆山国显光电有限公司 | The compensation method of developing apparatus and developer solution activity degree |
JP2018120893A (en) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Device for measuring component concentration of developer, and developer management device |
JP2018120901A (en) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Development device |
JP2018120895A (en) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Developing device |
JP6736087B2 (en) * | 2017-01-23 | 2020-08-05 | 株式会社平間理化研究所 | Developer concentration monitoring device and developer management device |
JP2018120897A (en) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Device for monitoring concentration of developer, and developer management device |
JP2018120900A (en) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Developer management device |
JP6712415B2 (en) * | 2017-01-23 | 2020-06-24 | 株式会社平間理化研究所 | Developer management device |
JP2018120898A (en) | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Development device |
JP6763608B2 (en) | 2017-01-23 | 2020-09-30 | 株式会社平間理化研究所 | Carbon dioxide concentration display device for developer and developer management device |
KR102115858B1 (en) * | 2017-04-17 | 2020-05-27 | 조명국 | Apparatus for Recycling Developer and Method for the same |
WO2019208837A1 (en) * | 2018-04-23 | 2019-10-31 | Cho Myung Kook | Device and method for recycling developer |
US11340205B2 (en) | 2019-01-24 | 2022-05-24 | Hong Kong Applied Science And Technology Research Institute Co., Ltd. | Systems and methods for determining concentrations of materials in solutions |
CN109923415B (en) * | 2019-01-24 | 2021-06-22 | 香港应用科技研究院有限公司 | System and method for determining concentration of substance in solution |
CN109632571A (en) * | 2019-01-29 | 2019-04-16 | 深圳市华星光电半导体显示技术有限公司 | Solution level measuring device and method |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1441321A (en) * | 2002-02-27 | 2003-09-10 | 三菱化学工程株式会社 | Development liquid supply device |
TW200415705A (en) * | 2002-11-15 | 2004-08-16 | Tokyo Electron Ltd | Developing method and apparatus |
TW200530767A (en) * | 2004-03-01 | 2005-09-16 | Kemitekku Kk | The management method and apparatus of controlling a developer for photoresist |
TW200627092A (en) * | 2005-01-06 | 2006-08-01 | Nagase & Co Ltd | Method for removing carbonate in resist developing solution, removing device, and method for controlling concentration of resist developing solution |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004101999A (en) | 2002-09-11 | 2004-04-02 | Mitsubishi Chemical Engineering Corp | Apparatus for recycling and supplying developer solution |
US7062202B2 (en) * | 2002-09-25 | 2006-06-13 | Seiko Epson Corporation | Image forming apparatus and method using liquid development under an image forming condition in which an adhesion amount of toner is substantially saturated |
JP4366490B2 (en) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | Developer supply method and apparatus |
JP2005164396A (en) * | 2003-12-02 | 2005-06-23 | Fuji Kogyo Kk | Washing liquid concentration measuring apparatus |
-
2007
- 2007-11-29 WO PCT/JP2007/001319 patent/WO2008065755A1/en active Application Filing
- 2007-11-29 CN CN201410050204.6A patent/CN103852978B/en active Active
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1441321A (en) * | 2002-02-27 | 2003-09-10 | 三菱化学工程株式会社 | Development liquid supply device |
TW200415705A (en) * | 2002-11-15 | 2004-08-16 | Tokyo Electron Ltd | Developing method and apparatus |
TW200530767A (en) * | 2004-03-01 | 2005-09-16 | Kemitekku Kk | The management method and apparatus of controlling a developer for photoresist |
TW200627092A (en) * | 2005-01-06 | 2006-08-01 | Nagase & Co Ltd | Method for removing carbonate in resist developing solution, removing device, and method for controlling concentration of resist developing solution |
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