TW201828333A - Apparatus for measuring component concentration in developing solution and developing solution management apparatus capable of accurately computing concentration of each component of alkaline developing solution and maintaining and managing developing performance in optimal state - Google Patents

Apparatus for measuring component concentration in developing solution and developing solution management apparatus capable of accurately computing concentration of each component of alkaline developing solution and maintaining and managing developing performance in optimal state Download PDF

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TW201828333A
TW201828333A TW106141768A TW106141768A TW201828333A TW 201828333 A TW201828333 A TW 201828333A TW 106141768 A TW106141768 A TW 106141768A TW 106141768 A TW106141768 A TW 106141768A TW 201828333 A TW201828333 A TW 201828333A
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中川俊元
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日商平間理化硏究所股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70608Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/06Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a liquid
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

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Abstract

The present invention provides a component concentration measurement apparatus for accurately computing the concentration of each component, such as an alkaline component of an alkaline developing solution, dissolved photoresist and absorbed carbon dioxide, from the characteristic value of developing solution and a developing solution management apparatus for maintaining and managing the developing performance of the developing solution in the optimal state. The apparatus for measuring component concentration in developing solution comprises: a measurement portion 1 for measuring a plurality of characteristic values of the developing solution related to the component concentration of an alkaline developing solution that is repeatedly used; a computation portion 2 for computing the component concentration of the developing solution by a multivariate analysis method according to the plurality of characteristic values measured by the measurement portion; and, a display portion DP for displaying at least one of the characteristic values measured by the measurement portion and the component concentration computed by the computation portion 2.

Description

顯影液的成分濃度測定裝置、及顯影液管理裝置    Component concentration measuring device for developing solution and developing solution management device   

有關一種在半導體或液晶面板之電路基板的顯影製程等中為了將光阻劑膜(photoresist film)顯影而重複使用之呈現鹼性的顯影液的成分濃度測定裝置及顯影液管理裝置。 The invention relates to a component concentration measuring device and a developing solution management device for a developing solution that exhibits an alkaline property and is used repeatedly in the development process of a circuit board of a semiconductor or a liquid crystal panel to develop a photoresist film.

在實現半導體、液晶面板等中之微細配線加工的光微影(photolithography)的顯影製程中,使用呈現鹼性的顯影液(以下稱為「鹼性顯影液」。)作為將成膜於基板上的光阻劑溶解之藥液。 In the development process of photolithography that realizes fine wiring processing in semiconductors, liquid crystal panels, and the like, an alkaline developer (hereinafter referred to as "alkaline developer") is used as a film to be formed on a substrate. The solution of the photoresist dissolved.

在半導體、液晶面板基板等之製程中,近年來晶圓、玻璃基板等之大型化與配線加工的微細化及高積體化已有長足進展。在這樣的狀況下,為實現大型基板的配線加工的微細化及高積體化,有必要更加高精度地測定鹼性顯影液的主要成分的濃度以維持管理顯影液。 In the manufacturing processes of semiconductors, liquid crystal panel substrates, etc., in recent years, the size of wafers, glass substrates, and the like have been enlarged, and the miniaturization and high-volume integration of wiring processing have progressed significantly. In such a situation, in order to realize miniaturization and high integration of wiring processing of a large substrate, it is necessary to measure the concentration of the main component of the alkaline developing solution with higher accuracy in order to maintain and manage the developing solution.

如專利文獻1所記載般,習知的鹼性顯影液的成分濃度之測定係利用在鹼性顯影液的鹼成分的濃度(以下稱為「鹼成分濃度」。)與導電率之間可獲得良好的線性關係、及在已溶解於鹼性顯影液的光阻劑的濃度(以下稱為「溶解光阻劑濃度」。)與吸光度之間可獲得良好的線性關係者。 As described in Patent Document 1, a conventional measurement of the component concentration of an alkaline developer is obtained by using a concentration between an alkali component of the alkaline developer (hereinafter referred to as "alkaline component concentration") and electrical conductivity. A good linear relationship and a good linear relationship between the concentration of a photoresist that has been dissolved in an alkaline developer (hereinafter referred to as the "dissolved photoresist concentration") and the absorbance.

此外,鹼性顯影液會吸收空氣中的二氧化碳,容易產生碳酸鹽而劣化。而且,鹼性顯影液係藉光阻劑的溶解而產生光阻劑鹽,對顯影處理有效的鹼性成分會被消耗。因此,重複使用的鹼性顯影液會成為不僅含有鹼成分,也含有光阻劑、二氧化碳等的多成分系。而且,其等成分各自以不同的貢獻度對顯影性能產生影響。因此為了能高精度地維持管理顯影液的顯影性能,將此等成分對顯影性能的影響一併考量的顯影液管理是必要的。 In addition, alkaline developing solution absorbs carbon dioxide in the air, and easily generates carbonate to deteriorate. In addition, the alkaline developer solution generates a photoresist salt by dissolving the photoresist, and an alkaline component effective for development processing is consumed. Therefore, the repeatedly used alkaline developing solution becomes a multi-component system containing not only an alkali component but also a photoresist, carbon dioxide, and the like. Moreover, each of these components has a different degree of contribution to the development performance. Therefore, in order to be able to maintain and manage the developing performance of the developing solution with high accuracy, it is necessary to consider the influence of these components on the developing performance in consideration of the developing solution management.

為解決這樣的問題,在專利文獻2中揭示顯影液調製裝置等,係測定顯影液的超音波傳播速度、導電率及吸光度,依據在鹼濃度、碳酸鹽濃度及溶解樹脂濃度下之超音波傳播速度和導電率及吸光度之預先作成的關係(矩陣)來檢測顯影液的鹼濃度、碳酸鹽濃度及溶解樹脂濃度,且根據所測定之顯影液的鹼濃度、碳酸鹽濃度及溶解樹脂濃度,及能發揮CD值(critical dimension value)(線寬)成為固定的值之溶解能力的鹼濃度與碳酸 鹽濃度與溶解樹脂濃度之預先所製作的關係,控制顯影液原液的供給以調節鹼濃度。 In order to solve such a problem, Patent Document 2 discloses a developer preparation device and the like, and measures the ultrasonic wave propagation speed, conductivity, and absorbance of the developer, based on the ultrasonic propagation at the alkali concentration, carbonate concentration, and dissolved resin concentration. The pre-made relationship (matrix) of speed and conductivity and absorbance is used to detect the alkali concentration, carbonate concentration, and dissolved resin concentration of the developing solution, and based on the measured alkali concentration, carbonate concentration, and dissolved resin concentration of the developing solution, and The relationship between the alkali concentration, the carbonate concentration, and the dissolved resin concentration, which can exhibit the solubility of the critical dimension value (line width) to a fixed value, is controlled in advance, and the supply of the developer solution is controlled to adjust the alkali concentration.

又,專利文獻3揭示有:測定顯影液的折射率、導電率及吸光度並由此等之測定值來取得顯影液中的碳酸系鹽類濃度之碳酸系鹽類濃度測定裝置、及具備此碳酸系鹽類濃度測定裝置與控制顯影液中的碳酸系鹽類濃度的控制部之鹼顯影液管理系統等。 In addition, Patent Document 3 discloses a carbonate-based salt concentration measuring device that measures the refractive index, electrical conductivity, and absorbance of a developer and obtains the carbonate-based salt concentration in the developer from these measured values, and includes the carbonate A system for measuring the concentration of a salt system and an alkali developer management system for a control unit that controls the concentration of a carbonate system in a developer.

先行技術文獻Advance technical literature 專利文獻Patent literature

專利文獻1 日本專利第2561578號公報 Patent Document 1 Japanese Patent No. 2561578

專利文獻2 日本特開2008-283162號公報 Patent Document 2 Japanese Patent Laid-Open No. 2008-283162

專利文獻3 日本特開2011-128455號公報 Patent Document 3 Japanese Patent Application Laid-Open No. 2011-128455

但是,鹼性顯影液的超音波傳播速度值、折射率值等係呈現多成分系的鹼性顯影液的液體整體的性質之特性值。呈現這樣的液體整體的性質的特性值,一般不是僅與其液體所含之特定的成分的濃度有關。呈現這樣的液體整體的性質的特性值,通常與其液體所含有的各種成分的濃度分別有關。因此,在從呈現這樣的液體整體的性質之特性值之測定值運算顯影液的成分濃度之情況中,當以某特性值僅和某特定的成分濃度有關(例如處於 線性關係)而無視其他成分影響其特性值時,具有無法擁有足夠的精度來算出該特定成分的濃度之問題。 However, the ultrasonic propagation velocity value and the refractive index value of the alkaline developer are characteristic values that represent the properties of the entire liquid of the multi-component alkaline developer. The characteristic value exhibiting the properties of such a liquid generally does not depend only on the concentration of a specific component contained in the liquid. The characteristic value exhibiting the properties of such a liquid generally depends on the concentration of various components contained in the liquid. Therefore, in the case where the component concentration of the developing solution is calculated from the measured value of the characteristic value showing the properties of the entire liquid, when a characteristic value is only related to a specific component concentration (for example, in a linear relationship), other components are ignored. When the characteristic value is affected, there is a problem that the accuracy of the specific component cannot be calculated with sufficient accuracy.

另一方面,在以顯影液的特性值是顯影液所含之各種成分的濃度的關數而從顯影液的特性值之測定值算出各成分濃度之情況,在測定複數個特性值之後,有必要採用用以從此等特性值之測定值算出各成分濃度之適切的運算手法。但是,適當地選擇應測定的特性值找到從特性值之測定值可高精度地算出各成分濃度的適當的運算手法,都非常困難。因此,具有所測定之特性值與運算手法若不適當的話,則無法擁有足夠的精度算出各成分濃度之問題。 On the other hand, when the characteristic value of the developing solution is the number of concentrations of various components contained in the developing solution, and the concentration of each component is calculated from the measured value of the characteristic value of the developing solution, after measuring a plurality of characteristic values, It is necessary to use an appropriate calculation method for calculating the concentration of each component from the measured values of these characteristic values. However, it is very difficult to appropriately select the characteristic value to be measured and find an appropriate calculation method that can accurately calculate the concentration of each component from the measured value of the characteristic value. Therefore, if the measured characteristic values and calculation methods are not appropriate, there is a problem that sufficient accuracy cannot be calculated for each component concentration.

而且,在多成分系的液體中,一般而言,某成分的濃度並非和其他成分的濃度相互獨立。在多成分系的液體中,具有所謂當某成分的濃度一變化則其他成分濃度亦同時變化的相互關係。這讓高精度的成分濃度的算出及高精度的顯影液管理更加困難。 Moreover, in a multi-component liquid, generally, the concentration of one component is not independent of the concentration of other components. In a multi-component liquid, there is a correlation that when the concentration of one component changes, the concentration of other components also changes at the same time. This makes high-precision calculation of the component concentration and high-precision developer management difficult.

再加上,關於顯影液所吸收的二氧化碳的濃度(以下稱為「吸收二氧化碳濃度」。),與其呈現良好的相關之顯影液的適當特性值未被知悉,習知係難以高精度地測定吸收二氧化碳濃度。 In addition, regarding the concentration of carbon dioxide absorbed by the developing solution (hereinafter referred to as "absorbed carbon dioxide concentration"), the proper characteristic value of the developing solution exhibiting good correlation has not been known, and it is difficult for the conventional system to measure the absorption with high accuracy CO2 concentration.

又,專利文獻2中,為檢測顯影液的成分濃度,有必要事先取得顯影液的成分濃度與超音波傳播速度等的特性值之相互關係(矩陣)。然而,在此情況下,當相互關係(矩陣)不細緻時,則無法高精度地算出成分濃度。為了高精度地算出成分濃度,運算所用的顯影液的特性值與成分濃度之相互關係(矩陣)必須夠稠密。因此,越是想將成分濃度的算出精度設高,則越是要預先準備更多的試樣,且必須事先測定其成分濃度與顯影液的特性值之相互關係。預先準備這樣的稠密的相互關係(矩陣)乃係龐大的作業量,成為在實現顯影液的成分濃度之高精度測定上的問題。特別是,使用者等可確認顯影液的成分濃度在管理顯影液上是重要的。 Further, in Patent Document 2, in order to detect the component concentration of the developing solution, it is necessary to obtain in advance the correlation (matrix) between the component concentration of the developing solution and characteristic values such as the ultrasonic propagation velocity. However, in this case, when the correlation (matrix) is not detailed, the component concentration cannot be calculated with high accuracy. In order to calculate the component concentration with high accuracy, the correlation (matrix) between the characteristic value of the developer used for the calculation and the component concentration must be sufficiently dense. Therefore, the more accurate the calculation of the component concentration is, the more samples must be prepared in advance, and the correlation between the component concentration and the characteristic value of the developer must be measured in advance. Preparing such a dense correlation (matrix) in advance is a huge amount of work, and it is a problem in realizing high-precision measurement of the component concentration of the developer. In particular, the user or the like can confirm that the component concentration of the developer is important for managing the developer.

本發明係為解決上述諸課題而完成者。本發明之目的在於:提供一種可從多成分系的顯影液的特性值,高精度地測定顯影液的成分濃度且可在無需準備龐大數量的試樣且無需預備測定等之下分析顯影液的成分濃度,並能顯示成分濃度之顯影液的成分濃度測定裝置以及提供能更加精密管理顯影液的成分濃度的顯影液管理裝置。 The present invention has been made to solve the above problems. An object of the present invention is to provide a method that can accurately determine the component concentration of a developer from the characteristic values of a multi-component developer, and can analyze the developer without preparing a large number of samples and preparing for measurement. A component concentration measuring device of a developing solution that can display the component concentration and a developing solution management device that provides a more precise management of the component concentration of the developing solution.

用以達成前述目的之本發明係如下所示。 The present invention for achieving the foregoing objects is as follows.

(1)一種顯影液的成分濃度測定裝置,具備: 測定部,測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;及顯示部,顯示藉前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度中至少一者。 (1) A component concentration measuring device for a developing solution, comprising: a measuring section that measures a plurality of characteristic values of the developing solution related to the component concentration of the alkaline developing solution that is repeatedly used; and a computing section based on the aforementioned measuring section. The measured plurality of characteristic values are used to calculate the component concentration of the developing solution by a multivariate analysis method; and a display section displays the characteristic value measured by the measurement section and the component concentration calculated by the calculation section. At least one.

(2)一種顯影液的成分濃度測定裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;及顯示部,將記憶在前述測定數據記憶部之成分濃度的數據,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示。 (2) A component concentration measuring device for a developing solution, comprising: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; When measuring the plurality of characteristic values, the component concentration of the developer is calculated by a multivariate analysis method based on the plurality of characteristic values measured by the measurement section. The measurement data storage section will calculate the component concentration calculated by the calculation section. The component concentration is memorized together with at least one of the time and the elapsed time from the start of the measurement; and the display section stores the component concentration data stored in the measurement data storage section to be stored in the measurement data storage section. The time or the elapsed time from the start of measurement is used as an indicator to display the graph.

(3)一種顯影液的成分濃度測定裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值; 運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;及顯示部,將記憶在前述測定數據記憶部之特性值及成分濃度中至少一者,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示。 (3) A component concentration measuring device for a developing solution, comprising: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; When the plurality of characteristic values are measured by the measurement unit, the component concentration of the developer is calculated by multivariate analysis based on the plurality of characteristic values measured by the measurement unit; the measurement data storage unit will use the measurement values measured by the measurement unit. The characteristic value and the component concentration calculated by the calculation unit are memorized together with at least one of the time and the elapsed time from the measurement start; and the display unit stores the characteristic value stored in the measurement data storage unit. At least one of the component concentration and the component concentration is displayed in a graph using the time memorized in the measurement data storage unit or the elapsed time from the start of measurement as an index.

(4)如(3)所記載之顯影液的成分濃度測定裝置,其更具備:顯示切換手段,將要顯示於前述顯示部的圖表切換為前述顯影液的特性值的圖表或前述顯影液的成分濃度的圖表。 (4) The component concentration measuring device for a developer according to (3), further comprising: a display switching means for switching a graph to be displayed on the display section to a graph of characteristic values of the developer or a component of the developer. Concentration chart.

(5)一種顯影液管理裝置,具備:測定部,測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,依據以前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;顯示部,顯示以前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度中至少一者;及 控制部,依據從藉前述測定部所測定之前述顯影液的複數個特性值及藉前述運算部所算出之前述顯影液的成分濃度中所選擇之管理對象項目的測定值或算出值,對設在用以輸送要被補給到前述顯影液的補充液之管路上之控制閥發出控制信號。 (5) A developing solution management device comprising: a measuring section that measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; and a computing section based on the values measured by the measuring section. The plurality of characteristic values is used to calculate the component concentration of the developer by a multivariate analysis method; the display unit displays at least one of the characteristic value measured by the measurement unit and the component concentration calculated by the calculation unit; And the control unit, based on the measured value or calculated value of the management object item selected from the plurality of characteristic values of the developer measured by the measurement unit and the component concentration of the developer calculated by the calculation unit, A control valve provided on a pipeline for supplying a replenishing solution to be replenished to the developer is issued a control signal.

(6)一種顯影液管理裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;顯示部,將記憶在前述測定數據記憶部之成分濃度的數據,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示;及控制部,依據從以前述測定部所測定之前述顯影液的複數個特性值及以前述運算部所算出之前述顯影液的成分濃度中所選擇之管理對象項目的測定值或算出值,對設在用以輸送要被補給到前述顯影液的補充液之管路上之控制閥發出控制信號。 (6) A developer management device, comprising: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; and a computing section that measures the aforementioned In the case of a plurality of characteristic values, the component concentration of the developer is calculated by a multivariate analysis method based on the plurality of characteristic values measured by the measurement section; the measurement data storage section will use the component concentration calculated by the calculation section , And memorize together with at least one of the time and the elapsed time from the start of the measurement; the display section stores the component concentration data stored in the aforementioned measurement data storage section to memorize the time of the aforementioned measurement data storage section or from The elapsed time from the start of the measurement is used as an indicator to display the graph; and the control unit is based on the characteristic values of the developer solution measured by the measurement unit and the component concentration of the developer solution calculated by the calculation unit. The measured value or calculated value of the selected management target item is set for the The control valve of the filling of pipeline control signals.

(7)一種顯影液管理裝置,具備: 測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;顯示部,將記憶在前述測定數據記憶部之特性值及成分濃度中至少一者,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示;及控制部,依據從以前述測定部所測定之前述顯影液的複數個特性值及以前述運算部所算出之前述顯影液的成分濃度中所選擇之管理對象項目的測定值或算出值,對設在用以輸送要被補給到前述顯影液的補充液之管路上之控制閥發出控制信號。 (7) A developing solution management device comprising: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; a computing section that measures the aforementioned In the case of a plurality of characteristic values, the component concentration of the developer is calculated by a multivariate analysis method based on the plurality of characteristic values measured by the measurement unit; the measurement data storage unit will use the characteristic values measured by the measurement unit. And the component concentration calculated by the calculation unit, and memorize together with at least one of time and elapsed time from the start of measurement; the display unit stores the characteristic value and component concentration in the measurement data storage unit At least one of which uses the time memorized in the measurement data storage section or the elapsed time from the start of measurement as an indicator to display a graph; and the control section, based on a plurality of characteristic values of the developer measured from the measurement section And the measured value of the item to be managed selected from the component concentration of the developer solution calculated by the calculation unit, or The calculated value sends a control signal to a control valve provided on a pipeline for supplying a replenishing solution to be replenished to the developer.

(8)如(7)所記載之顯影液管理裝置,其更具備:顯示切換手段,將要顯示於前述顯示部的圖表切換為前述顯影液的特性值的圖表或前述顯影液的成分濃度的圖表。 (8) The developer management device according to (7), further comprising: a display switching means for switching a graph to be displayed on the display section to a graph of a characteristic value of the developer or a graph of a component concentration of the developer. .

(9)如(5)至(8)中任一項所記載之顯影液管理裝置,其中前述測定部具備:第一測定手段,測定與前述顯影液的成分中至少鹼成分的濃度有關之前述顯影液的特性值;及第二測定手段,測定與前述顯影液的成分濃度中至少溶解於前述顯影液的光阻劑的濃度有關之前述顯影液的特性值。 (9) The developer management device according to any one of (5) to (8), wherein the measurement unit includes: a first measurement means for measuring the concentration of at least an alkali component among the components of the developer; A characteristic value of the developing solution; and a second measuring means for measuring the characteristic value of the developing solution related to a concentration of at least a photoresist dissolved in the developing solution among the component concentrations of the developing solution.

(10)如(9)所記載之顯影液管理裝置,其中前述運算部具備算出前述顯影液的鹼成分的濃度及光阻劑的濃度之運算塊,前述控制部具備:第一控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之鹼成分的濃度成為既定的管理值;及第二控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之光阻劑的濃度成為既定的管理值以下。 (10) The developer management device according to (9), wherein the calculation unit includes a calculation block that calculates the concentration of the alkali component of the developer and the concentration of the photoresist, and the control unit includes: a first control block, The control valve sends a control signal, and the concentration of the alkali component calculated by the operation block becomes a predetermined management value; and the second control block sends a control signal to the control valve, and the light calculated by the operation block The concentration of the resist is below a predetermined management value.

(11)如(9)所記載之顯影液管理裝置,其中前述測定部更具備第三測定手段,測定與前述顯影液的成分中至少前述顯影液所吸收的二氧化碳的濃度有關之前述顯影液的特性值。 (11) The developing solution management device according to (9), wherein the measuring unit further includes a third measuring means for measuring the concentration of the developing solution related to at least the concentration of carbon dioxide absorbed by the developing solution among the components of the developing solution. Characteristic value.

(12)如(11)所記載之顯影液管理裝置,其中前述運算部具備算出前述顯影液的二氧化碳的濃度之運算塊,前述控制部具備:第三控制塊,對前述控制閥發出控制信號,俾藉由前述第一測定手段所測定之前述顯影液的特性值成為既定的管理值;第四控制塊,對前述控制閥發出控制信號,俾藉由前述第二測定手段所測定之前述顯影液的特性值落入既定的管理區域;及第五控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之二氧化碳的濃度成為既定的管理值以下。 (12) The developer management device according to (11), wherein the calculation unit includes a calculation block that calculates a carbon dioxide concentration of the developer, and the control unit includes a third control block that sends a control signal to the control valve,特性 The characteristic value of the developer measured by the first measurement means becomes a predetermined management value; the fourth control block sends a control signal to the control valve, and the developer is measured by the second measurement means. And the fifth control block sends a control signal to the control valve, and the carbon dioxide concentration calculated by the operation block becomes below the predetermined management value.

(13)如(11)所記載之顯影液管理裝置,其中前述運算部具備算出前述顯影液的鹼成分的濃度及二氧化碳的濃度之運算塊,前述控制部具備:第一控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之鹼成分的濃度成為既定的管理值;第四控制塊,對前述控制閥發出控制信號,俾藉由前述第二測定手段所測定之前述顯影液的特性值落入既定的管理區域;及第五控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之二氧化碳的濃度成為既定的管理值以下。 (13) The developer management device according to (11), wherein the calculation unit includes a calculation block that calculates a concentration of an alkali component and a concentration of carbon dioxide of the developer, and the control portion includes a first control block that controls the control. The valve sends a control signal, and the concentration of the alkali component calculated by the operation block becomes a predetermined management value. The fourth control block sends a control signal to the control valve, and the development measured by the second measurement means. The characteristic value of the liquid falls into a predetermined management area; and a fifth control block sends a control signal to the control valve, and the carbon dioxide concentration calculated by the calculation block becomes below a predetermined management value.

(14)如(11)所記載之顯影液管理裝置,其中前述運算部具備算出前述顯影液的鹼成分的濃度、光阻劑的濃度及二氧化碳的濃度之運算塊,前述控制部具備:第一控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之鹼成分的濃度成為既定的管理值;第二控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之光阻劑的濃度成為既定的管理值以下;及第五控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之二氧化碳的濃度成為既定的管理值以下。 (14) The developer management device according to (11), wherein the calculation unit includes a calculation block that calculates a concentration of an alkali component of the developer, a concentration of a photoresist, and a concentration of carbon dioxide, and the control unit includes: a first The control block sends a control signal to the control valve, so that the concentration of the alkali component calculated by the calculation block becomes a predetermined management value; the second control block sends a control signal to the control valve, and does not use the calculation block The calculated concentration of the photoresist falls below a predetermined management value; and the fifth control block sends a control signal to the control valve, and the carbon dioxide concentration calculated by the calculation block becomes below a predetermined management value.

依據本發明,由於藉由使用了多變量分析法(例如,多元回歸分析法)的運算手段算出多成分系的鹼性顯影液的成分濃度,故與所測定的特性值和特定的成分濃度是處於既定的相關關係(例如,線性關係)算出成分濃度的習知手法相比,從受到複數個顯影液成分的影響之特性值亦可高精度地算出顯影液的成分濃度。特別是,依據本發明,可測定在習知難以測定的顯影液的吸收二氧化碳濃度。又,與事前準備複數個測定特性值和複數個成分濃度之相關關係(矩陣)而用在成分濃度的算出之手法相比,本發明中亦無需準備龐大數量的試樣並實施預備測定。且本發明中,可容易地確認測定結果。 According to the present invention, since the component concentration of a multi-component alkaline developer is calculated by an arithmetic means using a multivariate analysis method (for example, a multiple regression analysis method), the measured characteristic value and the specific component concentration are Compared with the conventional method of calculating the component concentration under a predetermined correlation (for example, a linear relationship), the component concentration of the developer can also be calculated with high accuracy from the characteristic value affected by the components of the plurality of developers. In particular, according to the present invention, it is possible to measure the absorbed carbon dioxide concentration of a developer which is conventionally difficult to measure. In addition, compared with the method of preparing the correlation between a plurality of measurement characteristic values and a plurality of component concentrations (matrix) in advance and using the method for calculating the component concentration, the present invention does not need to prepare a large number of samples and perform preliminary measurement. In addition, in the present invention, the measurement results can be easily confirmed.

依據本發明,由於能比習知更高精度地測定多成分系的鹼性顯影液的各成分濃度,故可比習知者還更能精確控制鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度。又,依據本發明,亦可選擇將顯影液的導電率值控制成固定的管理、將顯影液的吸光度值控制在固定的吸光度值以下的管理。 According to the present invention, since the concentration of each component of a multi-component alkaline developing solution can be measured with higher precision than that known, it is possible to control the concentration of the alkali component, the concentration of the dissolved photoresist, and the concentration of carbon dioxide absorption more accurately than those known. . In addition, according to the present invention, management that controls the conductivity value of the developer to a fixed value and management that controls the absorbance value of the developer to a fixed value or less can be selected.

A‧‧‧成分濃度測定裝置 A‧‧‧component concentration measuring device

B‧‧‧顯影製程設備 B‧‧‧Development process equipment

C‧‧‧補充液貯留部 C‧‧‧Replenishment liquid storage department

D‧‧‧循環攪拌機構 D‧‧‧Circulation stirring mechanism

E‧‧‧顯影液管理裝置 E‧‧‧Developer Management Device

1‧‧‧測定部 1‧‧‧Measurement Department

11‧‧‧第一測定手段 11‧‧‧The first measurement method

12‧‧‧第二測定手段 12‧‧‧Second measurement method

13‧‧‧第三測定手段 13‧‧‧Third measurement method

11a、12a、13a‧‧‧測定裝置本體 11a, 12a, 13a ‧‧‧ measuring device body

11b、12b、13b‧‧‧測定探針 11b, 12b, 13b‧‧‧Measurement probe

14、14a、14b、14c‧‧‧取樣泵 14, 14a, 14b, 14c ‧‧‧ sampling pump

15、15a、15b、15c‧‧‧取樣配管 15, 15a, 15b, 15c ‧‧‧ sampling piping

16、16a、16b、16c‧‧‧回流配管 16, 16a, 16b, 16c ‧‧‧ return piping

17‧‧‧送液泵 17‧‧‧ liquid delivery pump

18‧‧‧送液配管 18‧‧‧ liquid delivery piping

19‧‧‧廢液配管 19‧‧‧ Waste liquid piping

2‧‧‧運算部 2‧‧‧ Computing Department

21‧‧‧利用多變量分析法的運算塊 21‧‧‧Operation block using multivariate analysis

22‧‧‧利用校準曲線法的運算塊 22‧‧‧Calculation block using calibration curve method

23‧‧‧運算控制部(例如電腦) 23‧‧‧ Computing control unit (e.g. computer)

3‧‧‧控制部 3‧‧‧Control Department

31、32、33‧‧‧控制塊 31, 32, 33‧‧‧ control blocks

4‧‧‧閥 4‧‧‧ valve

41~43‧‧‧控制閥 41 ~ 43‧‧‧Control Valve

44、45‧‧‧閥 44, 45‧‧‧ valve

46、47‧‧‧加壓氣體用閥 46, 47‧‧‧ Valves for pressurized gas

5‧‧‧信號線 5‧‧‧ signal line

51~53‧‧‧測定數據用信號線 51 ~ 53‧‧‧Signal cable for measurement data

54‧‧‧運算數據用信號線 54‧‧‧ signal line for operation data

55~57‧‧‧控制信號用信號線 55 ~ 57‧‧‧Signal cable for control signal

61‧‧‧顯影液貯留槽 61‧‧‧Developer storage tank

62‧‧‧溢流槽 62‧‧‧ Overflow trough

63‧‧‧液面計 63‧‧‧ level meter

64‧‧‧顯影室罩 64‧‧‧Developing chamber cover

65‧‧‧滾輪式輸送機 65‧‧‧ roller conveyor

66‧‧‧基板 66‧‧‧ substrate

67‧‧‧顯影液噴灑頭 67‧‧‧Developer spray head

71‧‧‧廢液泵 71‧‧‧ waste liquid pump

72、74‧‧‧循環泵 72, 74‧‧‧Circulation pump

73、75‧‧‧過濾器 73, 75‧‧‧ filters

8‧‧‧流體管路 8‧‧‧ fluid line

80‧‧‧顯影液管路 80‧‧‧Developer solution line

81、82‧‧‧補充液(顯影原液及/或新液)用管路 81, 82‧‧‧ replenishing solution (developing solution and / or new solution)

83‧‧‧純水用管路 83‧‧‧Pure water pipeline

84‧‧‧合流管路 84‧‧‧ Confluence pipeline

85‧‧‧循環管路 85‧‧‧Circulation pipeline

86‧‧‧氮氣用管路 86‧‧‧Pipe for nitrogen

9‧‧‧補充液貯留槽、其他 9‧‧‧ Refill liquid storage tank, others

91、92‧‧‧補充液(顯影原液及/或新液)貯留槽 91, 92‧‧‧ replenishment solution (developing original solution and / or new solution) storage tank

93‧‧‧添加試藥 93‧‧‧Add test reagent

10‧‧‧測定數據記憶部 10‧‧‧ Measurement data memory

101‧‧‧記憶塊 101‧‧‧Memory Block

DP‧‧‧顯示部 DP‧‧‧ Display

圖1係顯示在由二個特性值測定二個成分的成分濃度之情況下的信號流動之成分濃度測定方法的流程圖。 FIG. 1 is a flowchart showing a method for measuring a component concentration of a signal flow when the component concentrations of two components are measured from two characteristic values.

圖2係顯示在由三個以上的特性值測定三個成分以上的成分濃度之情況下的信號流動之成分濃度測定方法的流程圖。 FIG. 2 is a flowchart showing a method for measuring a component concentration of a signal flow when a component concentration of three or more components is measured from three or more characteristic values.

圖3係顯示在含有與多變量分析法相異的運算手法的情況下的信號流動之成分濃度測定方法的流程圖。 FIG. 3 is a flowchart showing a method for measuring a component concentration of a signal flow when a calculation method different from the multivariate analysis method is included.

圖4係測定顯影液的二個成分之成分濃度測定裝置的示意圖。 FIG. 4 is a schematic diagram of a component concentration measuring device for measuring two components of a developing solution.

圖5係測定顯影液的三個成分之成分濃度測定裝置的示意圖。 FIG. 5 is a schematic diagram of a component concentration measuring device for measuring three components of a developing solution.

圖6係在運算部具有利用與多變量分析法相異的運算手法的運算塊之成分濃度測定裝置的示意圖。 FIG. 6 is a schematic diagram of a component concentration measuring device having an arithmetic block using an arithmetic method different from the multivariate analysis method in the arithmetic section.

圖7係測定部與運算部為分開且進行線內(inline)測定的情況之成分濃度測定裝置的示意圖。 FIG. 7 is a schematic diagram of a component concentration measurement device in a case where the measurement unit and the calculation unit are separated and an inline measurement is performed.

圖8係測定手段為由本體與探針部構成的情況之成分濃度測定裝置的示意圖。 FIG. 8 is a schematic diagram of a component concentration measuring device in a case where the measuring means is composed of a main body and a probe portion.

圖9係並列地具備測定手段之成分濃度測定裝置的示意圖。 FIG. 9 is a schematic diagram of a component concentration measurement device including measurement means in parallel.

圖10係具備需要添加藥劑的測定裝置的情況之成分濃度測定裝置的示意圖。 FIG. 10 is a schematic diagram of a component concentration measurement device in the case where a measurement device for adding a drug is required.

圖11係將成分濃度測定裝置應用於顯影液管理裝置之示意圖。 FIG. 11 is a schematic diagram of applying a component concentration measuring device to a developing solution management device.

圖12係用以呈現成分濃度測定裝置的應用事例之示意圖。 FIG. 12 is a schematic diagram showing an application example of a component concentration measuring device.

圖13係藉由成分濃度管理顯影液的二個成分之顯影液管理方法的流程圖。 FIG. 13 is a flowchart of a developer management method for two components of a developer by component concentration management.

圖14係顯影液的二個成分中的一者藉由成分濃度而另一者藉由特性值作管理之顯影液管理方法的流程圖。 FIG. 14 is a flowchart of a developing solution management method in which one of two components of the developing solution is controlled by the component concentration and the other is controlled by the characteristic value.

圖15係顯影液的三個成分藉由成分濃度作管理之顯影液管理方法的流程圖。 FIG. 15 is a flowchart of a developing solution management method in which three components of a developing solution are managed by component concentrations.

圖16係顯影液的三個成分中的一個藉由特性值而其他二個藉由成分濃度作管理之顯影液管理方法的流程圖。 FIG. 16 is a flowchart of a developing solution management method in which one of the three components of the developer is characterized by the characteristic value and the other two are managed by the component concentration.

圖17係顯影液的三個成分中的二個藉由特性值而另一個藉由成分濃度作管理之顯影液管理方法的流程圖。 FIG. 17 is a flowchart of a developing solution management method in which two of the three components of the developing solution are managed by characteristic values and the other is managed by the component concentration.

圖18係用以說明本發明的顯影液管理裝置之顯影製程的示意圖。 FIG. 18 is a schematic diagram for explaining a developing process of the developer management device of the present invention.

圖19係對裝置外的控制閥進行控制之顯影液管理裝置的示意圖。 FIG. 19 is a schematic diagram of a developer management device that controls a control valve outside the device.

圖20係具備一併擁有運算功能和控制功能的運算控制部之顯影液管理裝置的示意圖。 FIG. 20 is a schematic diagram of a developer management device including an arithmetic control unit having both an arithmetic function and a control function.

圖21係管理顯影液的二個成分之顯影液管理裝置的示意圖。 FIG. 21 is a schematic diagram of a developer management device that manages two components of a developer.

圖22係顯影液的二個成分藉由成分濃度作管理之顯影液管理裝置的示意圖。 FIG. 22 is a schematic diagram of a developing solution management device in which two components of a developing solution are managed by the component concentrations.

圖23係顯影液的三個成分中的二個藉由特性值而另一個藉由成分濃度作管理之顯影液管理裝置的示意圖。 FIG. 23 is a schematic diagram of a developing solution management device in which two of the three components of the developing solution are managed by characteristic values and the other is managed by the component concentration.

圖24係顯影液的三個成分中的一個藉由特性值而另二個藉由成分濃度作管理之顯影液管理裝置的示意圖。 FIG. 24 is a schematic diagram of a developing solution management device in which one of the three components of the developing solution is controlled by the characteristic value and the other is controlled by the component concentration.

圖25係顯影液的三個成分藉由成分濃度作管理之顯影液管理裝置的示意圖。 FIG. 25 is a schematic diagram of a developing solution management device in which three components of the developing solution are managed by the component concentrations.

以下,一邊參照適當圖式一邊就本發明的較佳實施形態詳細說明。但,此等實施形態中所記載的裝置等之形狀、大小、尺寸比、其相對配置等,只要未有特定的記載,即不應僅限定於圖示在本發明範圍中的內容,只不過是作為單純說明例作示意性圖示而已。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to appropriate drawings. However, the shape, size, size ratio, and relative arrangement of the devices and the like described in these embodiments should not be limited to the contents illustrated in the scope of the present invention unless there is specific description, but only It is only a schematic illustration as a simple explanation example.

又,在以下的說明中,作為顯影液的具體例,適當地使用在半導體、液晶面板基板等之製程中主要使用的2.38%氫氧化四甲銨(tetramethyl ammonium hydroxide)水溶液(以下,將氫氧化四甲銨稱為TMAH。)來作說明。但是,適用本發明的顯影液並非受此所限定者。作為可適用本發明的顯影液的成分濃度測定裝置、顯影液管理裝置等之其他的顯影液之例子,可舉出氫氧化鉀、氫氧化鈉、磷酸鈉、矽酸鈉等的無機化合物之水溶液和氫氧化三甲基單乙醇胺(trimethyl monoethanol ammonium hydroxide)(choline:膽鹼)等的有機化合物水溶液。 In the following description, as a specific example of the developing solution, a 2.38% tetramethyl ammonium hydroxide aqueous solution (hereinafter, hydroxide Tetramethylammonium is called TMAH.) However, the developer to which the present invention is applied is not limited thereto. Examples of other developing solutions to which the component concentration measuring device and developing solution management device of the developing solution of the present invention can be applied include aqueous solutions of inorganic compounds such as potassium hydroxide, sodium hydroxide, sodium phosphate, and sodium silicate. And trimethyl monoethanol ammonium hydroxide (choline: choline).

又,多變量分析法(例如多元回歸分析法)在成分濃度的算出之際,成分濃度未取決於是哪種單位的濃度,但在以下的說明中,鹼成分濃度、溶解光阻劑濃度、吸收二氧化碳濃度等的成分濃度係採用重量百分率濃度(wt%)的濃度。「溶解光阻劑濃度」意指將溶解的光阻劑作為光阻劑的量換算之情況的濃度,「吸收二氧化碳濃度」意指將所吸收的二氧化碳作為二氧化碳的量換算之情況的濃度。 In the multivariate analysis method (for example, multiple regression analysis method), the component concentration does not depend on the unit concentration when calculating the component concentration. However, in the following description, the concentration of the alkali component, the concentration of the dissolved photoresist, and the absorption The component concentration such as the carbon dioxide concentration is a concentration using a weight percentage concentration (wt%). The "dissolved photoresist concentration" means the concentration when the dissolved photoresist is converted as the amount of the photoresist, and the "absorbed carbon dioxide concentration" means the concentration when the absorbed carbon dioxide is converted as the amount of carbon dioxide.

在顯影處理製程中,透過顯影液溶解曝光處理後的光阻劑膜之不要部分而進行顯影。溶解於顯影液的光阻劑會在與顯影液的鹼成分之間產生光阻劑鹽。因此,若未將顯影液適當地管理,則隨著顯影處理進行,顯影液就會因具有顯影活性的鹼成分被消耗而劣化,使得顯影 性能持續惡化。同時,溶解於顯影液的光阻劑係以與鹼成分生成光阻劑鹽的形式而逐漸累積。 In the development processing process, an unnecessary portion of the photoresist film after the exposure processing is dissolved through a developing solution to perform development. The photoresist dissolved in the developing solution generates a photoresist salt with the alkali component of the developing solution. Therefore, if the developing solution is not properly managed, the developing solution will be degraded by the consumption of the alkali component having developing activity as the developing process proceeds, and the developing performance will continue to deteriorate. At the same time, the photoresist dissolved in the developing solution is gradually accumulated in the form of a photoresist salt with an alkali component.

溶解於顯影液的光阻劑係在顯影液中呈現界面活性作用。因此,溶解於顯影液的光阻劑係提高對於供作顯影處理的光阻劑膜的顯影液之浸潤性(wettability)並改善顯影液與光阻劑膜之親和性。因此,在適度地含有光阻劑的顯影液中,顯影液亦遍佈在光阻劑膜之微細的凹部內,可對具有微細的凹凸之光阻劑膜良好地實施顯影處理。 The photoresist dissolved in the developing solution exhibits an interfacial active effect in the developing solution. Therefore, the photoresist dissolved in the developer improves the wettability of the developer for the photoresist film used for the development treatment and improves the affinity of the developer and the photoresist film. Therefore, in a developing solution containing a photoresist moderately, the developing solution is also spread in the fine recessed portions of the photoresist film, and the photoresist film having fine unevenness can be well developed.

又,在近年來的顯影處理中,伴隨著基板大型化,由於大量的顯影液成為被重複使用,故顯影液暴露在空氣的機會增加。然而,當鹼性顯影液暴露於空氣時會吸收空氣中的二氧化碳。所吸收的二氧化碳與顯影液的鹼成分之間生成碳酸鹽。因此,若未將顯影液適當地管理,則顯影液中具有顯影活性的鹼成分便會被二氧化碳消耗並減少。同時,顯影液中所吸收的二氧化碳是以與鹼成分生成的碳酸鹽之情形而逐漸累積。 Moreover, in recent years, with the increase in the size of the substrate, a large amount of the developing solution is repeatedly used, and therefore the chance of the developing solution being exposed to the air increases. However, when the alkaline developer is exposed to air, it absorbs carbon dioxide in the air. Carbon dioxide is formed between the absorbed carbon dioxide and the alkali component of the developing solution. Therefore, if the developing solution is not properly managed, the alkali component having developing activity in the developing solution will be consumed by carbon dioxide and reduced. At the same time, the carbon dioxide absorbed in the developing solution gradually accumulates in the case of carbonate generated with an alkali component.

顯影液中的碳酸鹽由於在顯影液中呈現鹼性,故具有顯影作用。在例如2.38%TMAH水溶液的情況,若二氧化碳在顯影液中大約為0.4wt%程度以下,則可顯影。 Since the carbonate in the developing solution is alkaline in the developing solution, it has a developing effect. For example, in the case of a 2.38% TMAH aqueous solution, development can be performed when carbon dioxide is approximately 0.4 wt% or less in the developer.

如此,不同於會使顯影處理的顯影活性失去活性的過往認知,顯影液中所溶解的光阻劑和所吸收的二氧化碳實際上是有助益於顯影液的顯影性能的。因此所必須進行的乃係在容許顯影液中溶解並存在有溶解光阻劑和吸收二氧化碳下,將溶解光阻劑和吸收二氧化碳維持管理在最佳濃度的顯影液管理而非將溶解光阻劑和吸收二氧化碳完全移除的顯影液管理。 In this way, unlike the previous recognition that the developing activity of the developing process is deactivated, the photoresist dissolved in the developing solution and the carbon dioxide absorbed will actually help the developing performance of the developing solution. Therefore, it is necessary to manage the developer solution that dissolves the photoresist and absorbs carbon dioxide at the optimal concentration under the condition that the dissolving photoresist and the absorption of carbon dioxide are allowed to dissolve in the developing solution, rather than dissolving the photoresist. And absorb the carbon dioxide completely remove the developer management.

再者,產生於顯影液中的光阻劑鹽、碳酸鹽等其一部分會解離而生成光阻劑離子、碳酸離子、碳酸氫離子等各種游離離子。而且,此等游離離子會以各種貢獻率(contributing rate)影響顯影液的導電率。 In addition, a part of the photoresist salt, carbonate, etc. generated in the developing solution is dissociated to generate various free ions such as photoresist ion, carbonate ion, bicarbonate ion. Moreover, these free ions can affect the conductivity of the developer at various contributing rates.

習知的鹼性顯影液的成分濃度分析為,利用顯影液的鹼成分濃度和顯影液的導電率值具有良好的線性關係,及顯影液的溶解光阻劑濃度具有和顯影液的吸光度值良好的線性關係者(以下將其稱為「習知方法」。)。在習知的顯影製程中所要求的顯影液管理精度亦有二氧化碳的吸收量還不多的情況,利用此分析手法已可充分實現。 The analysis of the component concentration of the conventional alkaline developer is based on the good linear relationship between the alkali component concentration of the developer and the conductivity value of the developer, and the dissolved photoresist concentration of the developer has a good absorbance value with the developer. (Hereinafter referred to as the "learning method"). The developer management accuracy required in the conventional development process also has a small amount of carbon dioxide absorption, which can be fully realized by using this analysis method.

顯影液的導電率值為取決於顯影液中所含的離子等帶電粒子數及其電荷量的物性值。如上所述,顯影液中不僅存在有鹼成分,也存在有溶解於顯影液的光阻劑或來自顯影液所吸收的二氧化碳的各種游離離子。因而, 為了提高成分濃度的分析精度,有必要使用亦加入有此等游離離子對顯影液之導電率值的影響在內的運算手法。 The conductivity value of the developer is a physical property value that depends on the number of charged particles such as ions contained in the developer and the amount of charge thereof. As described above, not only the alkali component is present in the developing solution, but also various free ions derived from the carbon dioxide absorbed by the developing solution and the photoresist dissolved in the developing solution. Therefore, in order to improve the analysis accuracy of the component concentration, it is necessary to use a calculation method that also incorporates the influence of these free ions on the conductivity value of the developing solution.

顯影液的吸光度值係為和選擇性吸收其測定波長之光的特定成分的濃度具有線性關係的物性值(Lambert-Beer law,朗伯-比爾定律)。但是,多成分系中,雖因測定波長而有其程度不同,但通常其他成分的吸光光譜會和對象成分的吸光光譜重疊。因此,為了提高成分濃度的分析精度,有必要使用不僅是溶解於顯影液的光阻劑,且亦加入有其他成分對顯影液之吸光度值的影響在內的運算手法。 The absorbance value of a developer is a physical property value (Lambert-Beer law) that has a linear relationship with the concentration of a specific component that selectively absorbs light at its measurement wavelength. However, in a multi-component system, although the degree varies depending on the measurement wavelength, the absorption spectrum of other components usually overlaps with the absorption spectrum of the target component. Therefore, in order to improve the analysis accuracy of the component concentration, it is necessary to use an arithmetic method including not only a photoresist dissolved in a developing solution, but also the influence of other components on the absorbance value of the developing solution.

發明人針對此等各點,持續精心研究的結果,發現若於運算手法上使用多變量分析法(例如,多元回歸分析法),則從使用習知方法的情況,可高精度地算出顯影液的各成分的濃度、及可進行習知難以測定的吸收二氧化碳濃度。又,發明人發現若使用藉多變量分析法(例如,多元回歸分析法)所算出之顯影液的成分濃度,則能將顯影液的溶解光阻劑濃度、吸收二氧化碳濃度等維持管理在良好的狀態。 As a result of intensive research on these points, the inventors have found that if a multivariate analysis method (for example, a multiple regression analysis method) is used in the calculation method, the developer can be accurately calculated from the case of using a conventional method. The concentration of each component and the concentration of absorbed carbon dioxide that is difficult to measure conventionally can be measured. In addition, the inventors have found that if the component concentration of the developing solution calculated by a multivariate analysis method (for example, multiple regression analysis method) is used, the dissolved photoresist concentration and carbon dioxide absorption concentration of the developing solution can be maintained and managed in a good condition. status.

發明人係假設進行2.38%TMAH水溶液的管理之情況,調製了使鹼成分濃度、溶解光阻劑濃度、吸收二氧化碳濃度有多種變化而得的TMAH水溶液作為模擬顯影 液試樣。發明人由針對此等模擬顯影液試樣所測定之各種特性值,藉由多元回歸分析法進行了求得其成分濃度之實驗。以下,說明利用多元回歸分析法之一般的運算手法,之後,依據發明人所進行的實驗,針對使用多元回歸分析法之顯影液的成分濃度的運算手法作說明。 The inventor assumes that when a 2.38% TMAH aqueous solution is managed, a TMAH aqueous solution prepared by varying the alkali component concentration, dissolved photoresist concentration, and carbon dioxide absorption concentration as a simulated developer solution is prepared. The inventors carried out experiments to determine the component concentration by using a multiple regression analysis method from various characteristic values measured for these simulated developer samples. Hereinafter, a general calculation method using a multiple regression analysis method will be described. Then, based on an experiment performed by the inventor, a calculation method for a component concentration of a developer using a multiple regression analysis method will be described.

多元回歸分析係由校正與預測的二階段組成。n成分系的多元回歸分析中,係假設準備m個校正標準溶液。將存在於第i個溶液中的第j個成分的濃度以Cij表示。此處,i=1至m、j=1至n。針對m個標準溶液,分別測定p個特性值(例如,某波長的吸光度或者導電率等之物性值)Aik(k=1至p)。濃度數據與特性數據可分別彙整顯示成矩陣的形式(C,A)。 Multiple regression analysis consists of two stages of correction and prediction. In the multiple regression analysis of the n-component system, it is assumed that m calibration standard solutions are prepared. The concentration of the j-th component present in the i-th solution is represented by C ij . Here, i = 1 to m and j = 1 to n. For m standard solutions, p characteristic values (for example, physical property values such as absorbance or electrical conductivity at a certain wavelength) A ik (k = 1 to p) are measured. Concentration data and characteristic data can be aggregated and displayed in the form of a matrix (C, A).

使此等矩陣賦予關係的矩陣稱為校正矩陣,在此係以記號S(Skj;k=1至p、j=1至n)表示。 The matrix that gives these matrices a relationship is called a correction matrix, and is represented here by a symbol S (S kj ; k = 1 to p, j = 1 to n).

數學式2C=A.S Mathematical formula 2C = A. S

藉矩陣運算從已知的C與A(A的內容係即使非為同質的測定值而混入有異質的測定值亦無妨。例如,導電 率、吸光度及密度)算出S的情況係為校正階段。此時,必須為p≧n,且m≧np。因S的各要素皆為未知數,故以m>np為佳。在此情況中,係以下列方式進行最小平方運算。 The matrix calculation is used to calculate S from the known C and A (the content of A is not a homogeneous measured value but mixed with a heterogeneous measured value. For example, conductivity, absorbance, and density) is the correction stage. At this time, it must be p ≧ n and m ≧ np. Since each element of S is unknown, m> np is preferred. In this case, the least square operation is performed in the following manner.

此處,上標的T意指轉置矩陣,上標的-1則為逆矩陣。 Here, the superscript T means the transposed matrix, and the superscript -1 is the inverse matrix.

針對未知濃度的試料液測定p個特性值,若設此等特性值為Au(Auk;k=1至p),則對此等特性值乘以S即可獲得應求取的濃度Cu(Cuj;j=1至n)。 For p samples with unknown concentrations, measure p characteristic values. If these characteristic values are set to Au (Au k ; k = 1 to p), then these characteristic values can be multiplied by S to obtain the required concentration Cu ( Cu j ; j = 1 to n).

數學式4Cu=Au.S Mathematical formula 4Cu = Au. S

此乃預測階段。 This is the forecast stage.

發明人係將使用過的鹼性顯影液(2.38%TMAH水溶液)視為由鹼成分、溶解光阻劑及吸收二氧化碳等3個成分所組成之多成分系(n=3),從作為該顯影液的特性值之3個物性值(p=3)、亦即從顯影液的導電率值、特定波長中的吸光度值及密度值,藉由上述多元回歸分析法進行了算出各成分濃度之實驗。發明人係以2.38%TMAH水 溶液作為顯影液的基本組成,調製了使鹼成分濃度(TMAH濃度)、溶解光阻劑濃度及吸收二氧化碳濃度有多種變化的11個校正標準溶液(m=11,滿足p≧n且m>np)。 The inventor regards the used alkaline developer (2.38% TMAH aqueous solution) as a multi-component system (n = 3) composed of three components: an alkali component, a dissolved photoresist, and carbon dioxide absorption. Three physical property values (p = 3) of the characteristic value of the liquid, that is, from the conductivity value of the developing solution, the absorbance value at a specific wavelength, and the density value, experiments were performed to calculate the concentration of each component by the above-mentioned multiple regression analysis method. . The inventor used a 2.38% TMAH aqueous solution as the basic composition of the developer, and prepared 11 calibration standard solutions (m = 11, which have various changes in the concentration of the alkali component (TMAH concentration), the concentration of the dissolved photoresist, and the concentration of absorbed carbon dioxide. p ≧ n and m> np).

實驗係針對11個校正標準溶液,測定導電率值、波長λ=560nm中的吸光度值及密度值作為顯影液的特性值,藉由線形多元回歸分析(Multiple Linear Regression-Inverse Least Squares;MLR-ILS)運算各成分濃度。 The experiment is based on 11 calibration standard solutions. The conductivity value, the absorbance value and the density value at a wavelength λ = 560nm are measured as the characteristic values of the developing solution. Multiple linear regression analysis ) Calculate the concentration of each component.

關於測定的方式,係將校正標準溶液的溫度調整為25.0℃再進行。溫度調整係為將裝有校正標準溶液的瓶子(bottle)長時間浸漬在溫度被管理在25℃附近的恆溫水槽,由此進行取樣,然後於即將進行測定之前利用溫度控制器再度設為25.0℃。導電率計係採用本公司製造的導電率計。使用經施行鉑黑處理之本公司製造的導電率流通槽作了測定。導電率計被輸入另外藉校正作業所確認之導電率流通槽的槽常數(cell constant)。吸光光度計亦採用了本公司製品。吸光光度計係具備有波長λ=560nm的光源部和測光部及玻璃流通槽。密度測定係使用密度計,該密度計係採用從將U字管流通槽激勵而測定之固有振動頻率求取密度之固有振動法的密度計。所測得之導電率值、吸光度值及密度值的單位分別為mS/cm、Abs.(Absorbance)及g/cm3The measurement method was performed by adjusting the temperature of the calibration standard solution to 25.0 ° C. The temperature is adjusted by immersing a bottle containing the calibration standard solution in a constant-temperature water tank whose temperature is controlled near 25 ° C for a long time, taking a sample, and then using a temperature controller to set it to 25.0 ° C immediately before the measurement . The conductivity meter is a conductivity meter manufactured by our company. The measurement was performed using a conductivity flow cell made by our company that had been treated with platinum black. The conductivity meter is inputted with the cell constant of the conductivity flow cell confirmed by the calibration operation. The absorbance photometer also uses our products. The absorbance photometer includes a light source section, a photometric section, and a glass flow cell having a wavelength λ = 560 nm. The density measurement uses a densitometer, which is a densitometer using a natural vibration method for obtaining density from a natural vibration frequency measured by exciting a U-shaped tube through a flow channel. The units of the measured conductivity value, absorbance value, and density value are mS / cm, Abs. (Absorbance), and g / cm 3, respectively .

關於運算所採用的手法,係利用將11個校正標準溶液中的一個作為未知試料,再以剩餘的10個標準求取校正陣列,算出所假設的未知試料的濃度,再與已知的值(藉由其他正確的分析手法所測定之濃度值、重量調製值)作比較的手法(留一交叉驗證法;Leave-One-Out法)。 Regarding the method used in the calculation, one of the 11 calibration standard solutions was used as the unknown sample, and the calibration array was obtained based on the remaining 10 standards. The concentration of the assumed unknown sample was calculated, and the known value ( Comparison method (concentration value, weight modulation value measured by other correct analysis methods) for comparison (Leave-One-Out method).

將進行了MLR-ILS計算之結果顯示於表1。 Table 1 shows the results of the MLR-ILS calculation.

在進行MLR-ILS計算時,有鑒於TMAH水溶液是強鹼性且容易因吸收二氧化碳而劣化,關於運算所用的濃度矩陣,係使用另以可正確地分析鹼成分濃度、吸收二氧化碳濃度等之滴定分析法將校正標準溶液作測定而得的值。惟,關於溶解光阻劑濃度,係使用重量調製值。 In the calculation of MLR-ILS, since the TMAH aqueous solution is strongly alkaline and easily deteriorated due to absorption of carbon dioxide, the concentration matrix used in the calculation uses a titration analysis that can accurately analyze the concentration of the alkali component and the concentration of absorbed carbon dioxide. The calibration standard solution was used to determine the value. However, for the dissolved photoresist concentration, a weight modulation value is used.

關於滴定方式,係將鹽酸設為滴定試藥的中和滴定。作為滴定裝置,使用了三菱化學Analytech公司製造的自動滴定裝置GT-200。 The titration method is a neutralization titration using hydrochloric acid as a titration reagent. As the titration device, an automatic titration device GT-200 manufactured by Mitsubishi Chemical Analytech was used.

以下,將濃度矩陣顯示於表2。 The density matrix is shown in Table 2 below.

將此時之校正標準溶液的物性值之測定結果顯示於表3。吸光度的欄位為波長λ=560nm中之吸光度值(光路長d=10mm)。 Table 3 shows the measurement results of the physical properties of the calibration standard solution at this time. The column of absorbance is the absorbance value at the wavelength λ = 560nm (optical path length d = 10mm).

將校正矩陣顯示於表4。 The correction matrix is shown in Table 4.

表5呈現表2的濃度測定值與表1的MLR-ILS計算值之比較。 Table 5 presents a comparison of the concentration measurements in Table 2 with the calculated MLR-ILS values in Table 1.

如表5所示,藉由多元回歸分析法所求得之TMAH濃度、溶解光阻劑濃度及吸收二氧化碳濃度,均成為與藉由滴定分析所測定之TMAH濃度、吸收二氧化碳濃度及從調整重量等所求得之溶解光阻劑濃度相當近似的值。 As shown in Table 5, the TMAH concentration, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration obtained by the multiple regression analysis method all correspond to the TMAH concentration, the absorbed carbon dioxide concentration, and the adjusted weight from the titration analysis. The obtained dissolved photoresist concentration is a fairly similar value.

如此,理解到透過測定鹼性顯影液的導電率、特定波長中之吸光度、及密度,使用多變量分析法(例如,多 元回歸分析法),便可測定顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度。 In this way, it is understood that by measuring the conductivity of the alkaline developer, the absorbance at a specific wavelength, and the density, and using a multivariate analysis method (for example, multiple regression analysis method), the alkali component concentration and dissolution resistance of the developer can be measured. Agent concentration and carbon dioxide absorption.

多變量分析法(例如,多元回歸分析法)在運算並求取複數個成分的濃度有很好的效果。測定顯影液的複數個特性值a、b、c、...,再從此等測定值可藉由多變量分析法(例如,多元回歸分析法)求取成分濃度A、B、C、...。此時,針對所要求取的成分濃度,至少與此成分濃度有關之特性值是必須有至少一個經測定並被用在運算上。 Multivariate analysis (for example, multiple regression analysis) has a good effect in computing and obtaining the concentration of a plurality of components. A plurality of characteristic values a, b, c, ... of the developing solution are measured, and from these measured values, the component concentrations A, B, C, .. can be obtained by a multivariate analysis method (for example, multiple regression analysis method). .. At this time, for the required component concentration, at least one characteristic value related to the component concentration must have at least one measured and used in the calculation.

此處,所謂與成分濃度「有關」的顯影液特性值,係指其特性值和其成分濃度有關係,特性值會隨著該成分濃度的變化而改變的關係。例如,顯影液之成分濃度中,所謂至少和成分濃度A有關的顯影液特性值a,係指欲利用以成分濃度為變數的函數求取特性值a時,其中一變數至少要包含成分濃度A。特性值a可僅為成分濃度A的函數,但通常除了成分濃度A之外,還形成為以成分濃度B或C等為變數的多變數函數時,使用多變量分析法(例如,多元回歸分析法)的意義較大。 Here, the characteristic value of the developer that is “related to the component concentration” refers to a relationship in which the characteristic value is related to the component concentration, and the characteristic value changes as the component concentration changes. For example, among the component concentrations of a developer, the so-called characteristic value a of the developer, which is at least related to the component concentration A, means that when the characteristic value a is to be obtained by using a function with the component concentration as a variable, one of the variables must include the component concentration A . The characteristic value a may be only a function of the component concentration A, but in general, in addition to the component concentration A, it is also formed as a multivariate function using the component concentration B or C as a variable, and a multivariate analysis method (for example, multiple regression analysis Law) is of great significance.

再者,成分濃度係為表示其成分相對於整體之相對量的程度。像重複使用的顯影液之類的成分會隨時間而增減的混合液的成分濃度,無法以其成分單獨決定,通常是成為其他成分之濃度的函數。因此,顯影液之特性值和成分濃度的關係,有很多難以用平面圖表(graph)顯 示的情況。在這樣的情況下,使用校準曲線的運算法等並無法從顯影液的特性值算出成分濃度。 In addition, a component concentration is a degree which shows the relative amount of the component with respect to the whole. The component concentration of a mixed solution, such as a repeatedly used developing solution, may increase or decrease with time. The concentration of the component cannot be determined individually, but it is usually a function of the concentration of other components. Therefore, there are many cases where the relationship between the characteristic value of the developing solution and the component concentration is difficult to display with a flat graph. In such a case, it is not possible to calculate the component concentration from the characteristic value of the developing solution using an algorithm or the like of a calibration curve.

然而,若依據多變量分析法(例如,多元回歸分析法),則只要收集到一組和想要算出的成分濃度有關的複數個特性值的測定值,將該些測定值使用於運算,即可算出一組成分濃度。即使是在習知的見解下看來是難以測定的成分濃度,以利用多變量分析法(例如,多元回歸分析法)的成分濃度測定,亦可獲得透過測定特性值能測定成分濃度之顯著效果。 However, if a multivariate analysis method (for example, multiple regression analysis method) is used, as long as a set of measurement values of a plurality of characteristic values related to the component concentration to be calculated is collected, and these measurement values are used in the calculation, that is, A group of component concentrations can be calculated. Even if it is a component concentration that seems difficult to measure based on conventional knowledge, the component concentration measurement using a multivariate analysis method (for example, multiple regression analysis method) can obtain a significant effect that the component concentration can be measured by measuring characteristic values. .

如同上述,依據本發明的運算手法,可依據顯影液的特性值(例如,導電率、特定波長中之吸光度、及密度)之測定值算出顯影液的鹼成分濃度、溶解光阻劑濃度、及吸收二氧化碳濃度。依據本發明的運算手法,相較於習知方法,可以更高精度算出各成分濃度。 As described above, according to the calculation method of the present invention, the alkali component concentration, the dissolving photoresist concentration, and the dissolving photoresist concentration of the developing solution can be calculated based on the measured values of the characteristic values of the developing solution (for example, conductivity, absorbance at specific wavelength, and density), and Absorption of carbon dioxide concentration. According to the calculation method of the present invention, the concentration of each component can be calculated with higher accuracy than the conventional method.

又,本發明中由於使用多變量分析法(例如,多元回歸分析法),故在算出顯影液的成分濃度的運算上亦能採用和顯影液的特定的成分濃度無線性關係的顯影液的特性值。 In addition, since a multivariate analysis method (for example, a multiple regression analysis method) is used in the present invention, the characteristics of the developing solution that is wirelessly related to the specific component concentration of the developing solution can be used in the calculation of the component concentration of the developing solution. value.

又,根據本發明,並不需要專利文獻2的發明中為必要之可進行高精度測定用的非常多的試樣之準備和預備測定。(如前述的實驗例,若為成分數n=3的顯影液, 則令進行測定之特性值的個數p=3,滿足m≧np的試樣數p(例如p=11個試樣)來進行測定即足夠。若為成分數n=2,則試樣數亦可更少。) In addition, according to the present invention, the invention of Patent Document 2 does not require preparation and preliminary measurement of a large number of samples necessary for high-precision measurement. (As in the aforementioned experimental example, if it is a developer with the number of components n = 3, let the number of characteristic values p = 3 to be measured, and the number of samples p satisfying m ≧ np (for example, p = 11 samples) It is sufficient to perform the measurement. If the number of components is n = 2, the number of samples can be reduced.)

再者,本發明由於使用多變量分析法(例如,多元回歸分析法),故可高精度地算出在習知難以測定之顯影液的吸收二氧化碳濃度。 Furthermore, since the present invention uses a multivariate analysis method (for example, a multiple regression analysis method), it is possible to accurately calculate the carbon dioxide absorption concentration of a developer that is difficult to measure conventionally.

其次,針對具體的實施例,一邊參照圖面一邊作說明。在以下的實施例中,特性值a、b、c、...、成分濃度A、B、C、...等,適當地使用字母作說明。為了能更具體的理解,特性值a、b、c、...係分別重新理解成導電率、特定波長(例如λ=560nm)中的吸光度、密度、...等,且成分濃度A、B、C、...係分別重新理解成鹼成分濃度、溶解光阻劑濃度、吸收二氧化碳濃度、...等即可。 Next, specific embodiments will be described with reference to the drawings. In the following examples, the characteristic values a, b, c,..., The component concentrations A, B, C,... And the like are appropriately described using letters. For a more specific understanding, the characteristic values a, b, c, ... are re-understood respectively as conductivity, absorbance, density, ... at a specific wavelength (for example, λ = 560nm), and component concentrations A, B, C, ... can be re-understood respectively as the concentration of alkali component, the concentration of dissolved photoresist, the concentration of absorbed carbon dioxide, etc.

其中,將特性值a、b、c設為導電率、特定波長(例如λ=560nm)中的吸光度及密度等,終究不過是依本發明算出顯影液的鹼成分濃度、溶解光阻劑濃度、吸收二氧化碳濃度等之情況下的最佳特性值之組合的例示而已,但不受此所限。特性值a、b、c、...係可因應成分濃度A、B、C、...選擇各種組合。作為可採用的特性值,例如,可舉出顯影液的導電率、吸光度、超音波傳播速度、折射率、密度、滴定終點、pH等。由於亦有在顯影液含有各種添加材之情況,所以在成分濃度中除了上述三個成分以外亦可含有添加劑濃度等。 Among them, the characteristic values a, b, and c are set to electrical conductivity, absorbance and density at a specific wavelength (for example, λ = 560 nm), etc. After all, the concentration of the alkali component of the developer, the concentration of the dissolved photoresist, The combination of the optimal characteristic values in the case of absorbing carbon dioxide concentration and the like is exemplified, but it is not limited thereto. The characteristic values a, b, c, ... can be selected in various combinations according to the component concentrations A, B, C, .... The usable characteristic values include, for example, the conductivity, absorbance, ultrasonic propagation speed, refractive index, density, titration end point, pH, and the like of the developer. Since the developing solution may contain various additives, the component concentration may contain additive concentrations and the like in addition to the three components described above.

在測定顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度以管理顯影液之情況,適合以導電率、特定波長中之吸光度、密度的組合作為特性值。測定吸光度之特定波長係以採用可視區域為宜,較佳為360~600nm的波長區域之特定波長,更佳為波長λ=480nm或560nm。此乃係在顯影液的吸收二氧化碳濃度較少且其經時變化和緩時,顯影液的導電率係和鹼成分濃度處於較良好的線性關係,顯影液的特定波長(例如λ=560nm)中之吸光度和溶解光阻劑濃度處於較良好的線性關係之緣故。此外,較佳為亦能採用導電率、特定波長中之吸光度及超音波傳播速度的組合、導電率、特定波長中之吸光度及折射率的組合等。 In the case of measuring the concentration of the alkali component of the developing solution, the concentration of the dissolved photoresist, and the concentration of carbon dioxide absorption to manage the developing solution, it is suitable to use a combination of conductivity, absorbance at a specific wavelength, and density as characteristic values. The specific wavelength for measuring absorbance is preferably a visible wavelength, preferably a specific wavelength in a wavelength region of 360 to 600 nm, and more preferably a wavelength λ = 480 nm or 560 nm. This is because when the concentration of carbon dioxide absorbed by the developer is small and its change with time is gentle, the conductivity of the developer is in a good linear relationship with the concentration of the alkali component. One of the specific wavelengths of the developer (for example, λ = 560nm) The reason is that the absorbance and dissolved photoresist concentration have a good linear relationship. In addition, a combination of electrical conductivity, absorbance at a specific wavelength and ultrasonic propagation speed, a combination of electrical conductivity, absorbance at a specific wavelength, and refractive index can also be preferably used.

以下要說明的第一到第三實施形態係有關本發明的顯影液的成分濃度測定方法。 The first to third embodiments described below relate to a method for measuring the component concentration of the developer of the present invention.

圖1係顯示在從顯影液的二個特性值測定顯影液的二個成分之成分濃度的情況的信號之流動的本實施形態的成分濃度測定方法的流程圖。 FIG. 1 is a flowchart showing a component concentration measurement method according to the present embodiment in which signals flow when a component concentration of two components of a developer is measured from two characteristic values of the developer.

在本實施形態的成分濃度運算方法中,首先,於測定顯影液的特性值a、b的步驟中,取得各個測定值am與bm。所取得之測定值am與bm被送到運算步驟。其次,運算步驟係接收測定值am與bm,使用此等,藉由多變量 分析法(例如,多元回歸分析法)算出成分濃度A、B。如此,測定成分濃度A、B。又,若重複此流程,則可連續測定顯影液的成分濃度A、B。 In the component concentration calculation method of this embodiment, first, in the step of measuring the characteristic values a and b of the developing solution, each of the measured values a m and b m is obtained . The obtained measured values a m and b m are sent to a calculation step. Next, the calculation step receives the measured values a m and b m and uses these to calculate the component concentrations A and B by a multivariate analysis method (for example, a multiple regression analysis method). In this way, the component concentrations A and B were measured. When this process is repeated, the component concentrations A and B of the developer can be continuously measured.

圖2係顯示從顯影液的三個或三個以上的特性值測定顯影液的三個或三個以上的成分之成分濃度的情況的信號之流動的本實施形態的成分濃度測定方法之流程圖。 FIG. 2 is a flowchart of a component concentration measurement method according to this embodiment, showing the flow of signals when the component concentrations of three or more components of the developer are measured from three or more characteristic values of the developer. .

在本實施形態的成分濃度運算方法中,首先,於測定顯影液的特性值a、b、c、...的步驟中,取得各個測定值am、bm、cm、...。所取得之測定值am、bm、cm、...係被送到運算步驟。其次,運算步驟係接收測定值am、bm、cm、...,使用此等藉由多變量分析法(例如,多元回歸分析法)算出成分濃度A、B、C、...。如此,測定成分濃度A、B、C、...。又,若重複此流程,則可連續測定顯影液的成分濃度A、B、C、...。 In the component concentration calculation method of this embodiment, first, in the step of measuring the characteristic values a, b, c, ... of the developing solution, the respective measurement values a m , b m , c m , ... are obtained. The obtained measured values a m , b m , c m ,... Are sent to a calculation step. Next, the calculation step receives the measured values a m , b m , c m , ..., and uses these to calculate the component concentrations A, B, C, ... by a multivariate analysis method (for example, a multiple regression analysis method). . In this way, the component concentrations A, B, C, ... are measured. When this process is repeated, the component concentrations A, B, C, ... of the developer can be continuously measured.

圖3係表示在從複數個顯影液的特性值測定複數個成分濃度之情況,運算步驟亦含有利用與多變量分析法相異的運算手法之步驟的情況的信號流動之本實施形態的成分濃度測定方法的流程圖。 FIG. 3 is a diagram showing the component concentration measurement of the present embodiment in the case where a plurality of component concentrations are measured from characteristic values of a plurality of developing solutions, and the calculation step includes a flow of signals using a method different from the multivariate analysis method. Method flow chart.

此實施形態係於採用僅與顯影液的某成分的濃度P有關係的顯影液的特性值p作為測定對象之情況等可適 當被採用。更具體言之,可例舉藉由多變量分析法而由顯影液的導電率值和密度值算出顯影液的鹼成分濃度和吸收二氧化碳濃度,將顯影液的溶解光阻劑濃度以使用和特定波長(例如λ=560nm)中的吸光度之線性關係作為校準曲線算出並作測定的情況等。 This embodiment can be suitably adopted in the case where the characteristic value p of the developer solution, which is related only to the concentration P of a certain component of the developer solution, is used as a measurement target. More specifically, for example, the alkali component concentration and the carbon dioxide absorption concentration of the developing solution can be calculated from the conductivity value and the density value of the developing solution by a multivariate analysis method, and the concentration of the photoresist dissolved in the developing solution can be used and specified. A case where a linear relationship between absorbances at a wavelength (for example, λ = 560 nm) is calculated as a calibration curve and measured.

在本實施態樣的顯影液的成分濃度測定方法中,於測定步驟,測定將複數個成分濃度作為變數的顯影液的特性值a、b、...、及僅將成分濃度P作為變數的顯影液的特性值p、...,且將其測定值am、bm、...、及pm、...送到運算步驟。 In the method for measuring the component concentration of the developing solution according to this aspect, in the measuring step, characteristic values a, b, ... of the developing solution having a plurality of component concentrations as variables are measured, and The characteristic values p, ... of the developing solution, and the measured values a m , b m , ..., and p m , ... are sent to a calculation step.

運算步驟包含:藉多變量分析法(例如,多元回歸分析法)算出成分濃度的步驟;及藉與多變量分析法相異的運算方法(例如,校準曲線法等)算出成分濃度的步驟。此等步驟的運算之先後不限。亦可同時。 The calculation step includes a step of calculating a component concentration by a multivariate analysis method (for example, a multiple regression analysis method); and a step of calculating a component concentration by an operation method different from the multivariate analysis method (for example, a calibration curve method). The order of the operations of these steps is not limited. Can also be simultaneous.

藉由多變量分析法(例如,多元回歸分析法)算出成分濃度的步驟,係由在測定步驟所測定之顯影液的特性值a、b、...之測定值,藉由多變量分析法(例如,多元回歸分析法)算出成分濃度A、B、...。 The step of calculating the component concentration by a multivariate analysis method (for example, a multiple regression analysis method) is a measurement value of characteristic values a, b, ... of the developer measured in the measurement step, and a multivariate analysis method is used. (For example, multiple regression analysis) Calculate the component concentrations A, B, ....

藉由與多變量分析法相異的運算方法(例如,校準曲線法)算出成分濃度之步驟,係將已預先取得之特性值p和成分濃度P之線性關係作為校準曲線使用等,由在測 定步驟所測定之顯影液的特性值p、...之測定值算出成分濃度P、...。 The step of calculating the component concentration by a calculation method different from the multivariate analysis method (for example, the calibration curve method) is to use the linear relationship between the characteristic value p and the component concentration P that have been obtained in advance as a calibration curve, etc. The measured values of the characteristic values p, ... of the developing solution are used to calculate the component concentrations P, ....

以上顯影液的成分濃度測定方法包含:測定步驟,測定與顯影液的成分濃度有關之顯影液的複數個特性值;及運算步驟,依據所測定之複數個特性值,藉由多變量分析法算出顯影液的成分濃度。 The above method for measuring the component concentration of a developing solution includes: a measuring step of measuring a plurality of characteristic values of the developing solution related to the component concentration of the developing solution; and a calculation step of calculating by a multivariate analysis method based on the measured plurality of characteristic values. Component concentration of the developer.

測定步驟更包含:測定特性值a之測定步驟;測定特性值b之測定步驟;測定特性值c之測定步驟、...等。但是,此等步驟之順序不限。也可同時測定。又,溫度調整步驟、試藥添加步驟、廢液步驟等,亦可含有因應測定手法而適當地需要的步驟。 The measuring step further includes: a measuring step of measuring the characteristic value a; a measuring step of measuring the characteristic value b; a measuring step of measuring the characteristic value c, etc. However, the order of these steps is not limited. Can also be measured simultaneously. In addition, the temperature adjustment step, the reagent addition step, the waste liquid step, and the like may include steps appropriately required in accordance with the measurement method.

運算步驟只要包含藉多變量分析法算出成分濃度的運算步驟即可。亦可包含藉與多變量分析法相異的運算方法(例如校準曲線法)算出成分濃度的步驟等。 The calculation step may include a calculation step for calculating a component concentration by a multivariate analysis method. It may also include a step of calculating a component concentration by an operation method (for example, a calibration curve method) different from the multivariate analysis method.

以下,實施形態係有關本發明的顯影液的成分濃度測定裝置。 Hereinafter, the embodiment relates to a component concentration measuring device for a developing solution of the present invention.

[第一實施形態]     [First Embodiment]    

圖4係測定顯影液的二個成分之成分濃度測定裝置的示意圖。為方便說明,顯影液的成分濃度測定裝置A係以連接於顯影製程設備B的態樣下連同顯影製程設備B一起圖示。 FIG. 4 is a schematic diagram of a component concentration measuring device for measuring two components of a developing solution. For convenience of explanation, the component concentration measuring device A of the developing solution is illustrated together with the developing process equipment B in a state of being connected to the developing process equipment B.

首先,針對顯影製程設備B作簡單說明。 First, the development process equipment B will be briefly described.

顯影製程設備B主要由顯影液貯留槽61、溢流槽62、顯影室罩(hood)64、滾輪式輸送機(roller conveyor)65、顯影液噴灑頭(shower nozzle)67等所構成。在顯影液貯留槽61貯留有顯影液。顯影液係被補充補充液而作組成管理,但在圖4中被省略了。顯影液貯留槽61係具備液面計63和溢流槽62,藉以管理因補給補充液所致液量的增加。顯影液貯留槽61與顯影液噴灑頭67係藉由顯影液管路80連接,顯影液貯留槽61內所貯留的顯影液藉由設於顯影液管路80的循環泵72經由過濾器73被輸送到顯影液噴灑頭67。滾輪式輸送機65係設於顯影液貯留槽61上方以搬送成膜有光阻劑膜的基板66。顯影液從顯影液噴灑頭67滴下,藉滾輪式輸送機65搬送的基板66係通過滴下的顯影液之中而浸漬於顯影液。之後,顯影液被顯影液貯留槽61回收並再貯留。如此,顯影液係在顯影製程循環地被重複使用。此外,小型玻璃基板中之顯影室內亦有藉由充滿氮氣等而施以不會吸收空氣中的二氧化碳之處理的情況。此外,劣化的顯影液係透過作動廢液泵71而被廢液(排放:drain))。 The development process equipment B is mainly composed of a developer storage tank 61, an overflow tank 62, a development chamber hood 64, a roller conveyor 65, a developer nozzle 67, and the like. The developer is stored in the developer storage tank 61. The developer solution is managed by supplemental supplemental solution, but it is omitted in FIG. 4. The developer storage tank 61 is provided with a liquid level meter 63 and an overflow tank 62 to manage the increase in the amount of liquid caused by the replenishment and replenishment. The developer storage tank 61 and the developer spray head 67 are connected by a developer liquid line 80. The developer stored in the developer storage tank 61 is circulated by a circulation pump 72 provided in the developer liquid line 80 through a filter 73. Conveyed to the developer spray head 67. The roller conveyor 65 is provided above the developer storage tank 61 to carry a substrate 66 formed with a photoresist film. The developer is dropped from the developer spray head 67, and the substrate 66 transferred by the roller conveyor 65 is immersed in the developer through the dropped developer. After that, the developer is recovered by the developer storage tank 61 and stored again. In this way, the developing solution is repeatedly used in the developing process cyclically. In addition, in a developing chamber in a small glass substrate, a treatment that does not absorb carbon dioxide in the air may be applied by filling it with nitrogen or the like. In addition, the degraded developing solution is discharged (drain) by operating the waste liquid pump 71.

其次,針對本實施形態的顯影液的成分濃度測定裝置A作說明。本實施形態的成分濃度測定裝置係取樣顯影液以測定特性值之方式的成分濃度測定裝置。 Next, the component concentration measuring device A of the developing solution of this embodiment will be described. The component concentration measuring device of the present embodiment is a component concentration measuring device that samples a developing solution to measure a characteristic value.

顯影液的成分濃度測定裝置A具備測定部1和運算部2,藉由取樣配管15及回流配管16連接到顯影液貯留槽61。測定部1與運算部2係藉由測定數據用信號線51、52連接。 The component concentration measuring device A for a developing solution includes a measuring section 1 and a computing section 2, and is connected to the developing solution storage tank 61 through a sampling pipe 15 and a return pipe 16. The measurement unit 1 and the calculation unit 2 are connected via signal lines 51 and 52 for measurement data.

測定部1具備取樣泵14、第一測定手段11及第二測定手段12(有將第一測定手段11及第二測定手段12稱為測定手段的情況)。測定手段11、12係串列地連接於取樣泵14的後段。測定部1更具備為了提高測定精度而使所取樣的顯影液穩定為既定的溫度之溫度調節手段(未圖示)者較理想。此際,溫度調節手段係以設於測定手段的前方較佳。取樣配管15連接於測定部1的取樣泵14,回流配管16係和測定手段末端的配管連接。 The measurement unit 1 includes a sampling pump 14, a first measurement means 11, and a second measurement means 12 (the first measurement means 11 and the second measurement means 12 may be referred to as measurement means). The measurement means 11 and 12 are connected in series to the rear stage of the sampling pump 14. The measurement unit 1 is more preferably equipped with a temperature adjustment means (not shown) that stabilizes the sampled developer to a predetermined temperature in order to improve the measurement accuracy. In this case, it is preferable to set the temperature adjustment means in front of the measurement means. The sampling pipe 15 is connected to the sampling pump 14 of the measurement unit 1, and the return pipe 16 is connected to a pipe at the end of the measuring means.

運算部2包含利用多變量分析法的運算塊21。利用多變量分析法的運算塊21,係連接於藉測定數據用信號線51而設置於測定部1的第一測定手段11、及藉測定數據用信號線52而設置於測定部1的第二測定手段12。 The arithmetic unit 2 includes an arithmetic block 21 using a multivariate analysis method. The arithmetic block 21 using the multivariate analysis method is connected to the first measurement means 11 provided in the measurement section 1 by the measurement data signal line 51 and the second measurement means 1 provided in the measurement section 1 by the measurement data signal line 52. Measurement means 12.

其次,針對成分濃度測定裝置A之測定動作及運算動作進行說明。 Next, a measurement operation and a calculation operation of the component concentration measuring device A will be described.

藉取樣泵14從顯影液貯留槽61所採液之顯影液,係通過取樣配管15被導入成分濃度測定裝置A之測定部 1內。之後,於具備溫度調節手段的情況,所取樣之顯影液係被輸送到溫度調節手段以維持在既定的測定溫度(例如25℃),且輸送到測定手段11、12。以第一測定手段測定顯影液的特性值a,以第二測定手段測定顯影液的特性值b。測定後的顯影液係通過回流配管16返回顯影液貯留槽61。 The developing solution collected by the sampling pump 14 from the developing solution storage tank 61 is introduced into the measuring unit 1 of the component concentration measuring device A through a sampling pipe 15. After that, if the temperature adjustment means is provided, the sampled developer solution is sent to the temperature adjustment means to be maintained at a predetermined measurement temperature (for example, 25 ° C.), and is sent to the measurement means 11, 12. The characteristic value a of the developing solution is measured by the first measuring means, and the characteristic value b of the developing solution is measured by the second measuring means. The developer solution after the measurement is returned to the developer storage tank 61 through the return pipe 16.

藉由第一測定手段11所測定之顯影液的特性值a之測定值am,及藉由第二測定手段12所測定之顯影液的特性值b之測定值bm,係分別經由測定數據用信號線51、52被送至利用多變量分析法的運算塊21。接收到測定值am、bm的運算塊21係藉由多變量分析法運算其等之測定值而算出顯影液的成分濃度A及B。如此,藉由成分濃度測定裝置A而測定顯影液的成分濃度A、B。 The measured value a m of the characteristic value a of the developing solution measured by the first measuring means 11 and the measured value b m of the characteristic value b of the developing solution measured by the second measuring means 12 are respectively measured data. The signal lines 51 and 52 are sent to an arithmetic block 21 using a multivariate analysis method. The calculation block 21 that has received the measurement values a m and b m calculates the component concentrations A and B of the developing solution by calculating these measurement values by a multivariate analysis method. In this way, the component concentrations A and B of the developing solution are measured by the component concentration measuring device A.

實施形態的成分濃度測定裝置A具備顯示部DP。於顯示部DP顯示以測定部1測定之特性值及以運算部2算出之成分濃度中至少一者。如圖4所示,可於顯示部DP顯示以運算部2算出的成分濃度A及B,亦可顯示以測定部1測定之顯影液的特性值(未圖示)。亦可顯示雙方。又,亦可按各顯影液的成分選擇顯示對應的特性值及成分濃度中任一者。 The component concentration measuring device A of the embodiment includes a display portion DP. At least one of a characteristic value measured by the measurement unit 1 and a component concentration calculated by the calculation unit 2 is displayed on the display unit DP. As shown in FIG. 4, the component concentrations A and B calculated by the calculation section 2 may be displayed on the display section DP, and the characteristic value (not shown) of the developing solution measured by the measurement section 1 may be displayed. Both sides can also be displayed. In addition, any one of the characteristic value and the component concentration corresponding to each component of the developer may be selected and displayed.

顯示部DP亦可為與成分濃度測定裝置A電性連接之顯示監視器,亦可為裝入成分濃度測定裝置A的觸控 面板型電腦。在觸控面板型電腦的情況,可包含運算部2。 The display portion DP may be a display monitor electrically connected to the component concentration measuring device A, or may be a touch panel computer in which the component concentration measuring device A is installed. In the case of a touch panel computer, the computing unit 2 may be included.

[第二實施形態]     [Second Embodiment]    

圖5係測定顯影液的三個成分之成分濃度測定裝置的示意圖。顯影液的成分濃度測定裝置A具備測定部1和運算部2,藉取樣配管15及回流配管16連接到顯影製程設備B(顯影液貯留槽61)。測定部1具備第一測定手段11、第二測定手段12及第三測定手段13,藉由此等來測定顯影液的三個特性值。所測定之三個特性值之測定值經由測定數據用信號線51、52、53送到運算部2,藉由多變量分析法算出顯影液的三個成分之成分濃度。測定動作、運算動作、和圖4重複的構件之說明係和第一實施形態相同,故予以省略。 FIG. 5 is a schematic diagram of a component concentration measuring device for measuring three components of a developing solution. The developer concentration measurement device A includes a measurement unit 1 and a calculation unit 2, and is connected to the development process equipment B (developer storage tank 61) through a sampling pipe 15 and a return pipe 16. The measurement unit 1 includes a first measurement means 11, a second measurement means 12, and a third measurement means 13, and thereby measures three characteristic values of the developer. The measured values of the three characteristic values measured are sent to the calculation unit 2 via the signal lines 51, 52, and 53 of the measured data, and the component concentrations of the three components of the developing solution are calculated by a multivariate analysis method. The description of the measurement operation, the calculation operation, and the components repeated in FIG. 4 are the same as those of the first embodiment, and are omitted.

實施形態的成分濃度測定裝置A具備顯示部DP。顯示部DP可顯示藉測定部1所測定之特性值(例如am、bm、cm)及藉運算部2所算出之成分濃度(例如,A、B、C)。實施形態中,顯示部DP切換特性值及成分濃度之顯示,可藉由設定於顯示部DP畫面上的屬顯示切換手段的切換鍵BT進行。實施形態中,雖呈現切換顯示而在顯示部DP顯示的情況,但亦可將所測定之特性值(am、bm、cm)及成分濃度(A、B、C)之顯示同時地在顯示部DP上顯示。 The component concentration measuring device A of the embodiment includes a display portion DP. The display section DP can display characteristic values (for example, a m , b m , and c m ) measured by the measurement section 1 and component concentrations (for example, A, B, C) calculated by the calculation section 2. In the embodiment, the display of the display unit DP switching characteristic value and the component concentration can be performed by a switch key BT which is a display switching means provided on the display unit DP screen. In the embodiment, although the display is switched and displayed on the display portion DP, the measured characteristic values (a m , b m , c m ) and the component concentration (A, B, C) may be displayed simultaneously. It is displayed on the display part DP.

在顯示切換手段方面,要將顯示於顯示部DP的顯示對象作特性值或成分濃度之切換的開關可被安裝於裝置的外面,亦可安裝成顯示於顯示部之可操作的GUI(圖表使用者介面)。又,顯示切換手段可以是針對所有成分總括地進行特性值顯示或成分濃度顯示之切換,亦可為能按各成分作個別地切換。 In terms of display switching means, a switch to switch the display object displayed on the display part DP to the characteristic value or the component concentration can be installed outside the device, or it can be installed to be displayed on the display part's operable GUI (graphic use User interface). In addition, the display switching means may be the switching of characteristic value display or component concentration display for all components collectively, or it may be possible to switch individually for each component.

[第三實施形態]     [Third embodiment]    

圖6係在運算部2具有利用與多變量分析法相異的運算手法之運算塊的成分濃度測定裝置的示意圖。適用於例如藉由校準曲線法等從所測定之顯影液的物性值可測定顯影液的成分濃度之顯影液的特性值與成分濃度有成組之情況。 FIG. 6 is a schematic diagram of a component concentration measuring device having an arithmetic block using an arithmetic method different from the multivariate analysis method in the arithmetic section 2. For example, it is suitable for the case where the characteristic value of a developing solution and the component concentration are grouped from the measured physical property value of the developing solution by a calibration curve method or the like.

本實施形態的成分濃度測定裝置A具備測定顯影液的複數個特性值之測定部1、由其測定值算出顯影液的成分濃度之運算部2。運算部2包含利用多變量分析法的運算塊21、利用多變量分析法以外的運算手法(例如校準曲線法)之運算塊22。 The component concentration measuring device A according to this embodiment includes a measuring unit 1 that measures a plurality of characteristic values of a developing solution, and a computing unit 2 that calculates a component concentration of the developing solution from the measured values. The arithmetic unit 2 includes an arithmetic block 21 using a multivariate analysis method, and an arithmetic block 22 using an arithmetic method (for example, a calibration curve method) other than the multivariate analysis method.

在多變量分析法中用於運算的顯影液的特性值之測定值,係在被測定部1測定後送到運算部2的利用多變量分析法的運算塊21。用在多變量分析法以外的運算手法(例如校準曲線法)之顯影液的特性值之測定值係被送到運算塊22。透過在運算塊21、22進行運算,算出顯影液的成分濃度。 The measured value of the characteristic value of the developing solution used for calculation in the multivariate analysis method is an arithmetic block 21 using the multivariate analysis method after being measured by the measurement unit 1 and sent to the arithmetic unit 2. The measured value of the characteristic value of the developer used in a calculation method (such as a calibration curve method) other than the multivariate analysis method is sent to the calculation block 22. By performing calculations in the calculation blocks 21 and 22, the component concentration of the developing solution is calculated.

此外,利用多變量分析法以外之運算手法(例如校準曲線法)的運算塊22可為複數。針對利用多變量分析法之運算與利用其以外的手法(例如校準曲線法)之運算,其運算之順序不限。其他與上述實施形態重複之構件等之說明係省略。 In addition, the operation block 22 using an operation method other than the multivariate analysis method (for example, the calibration curve method) may be a complex number. There is no restriction on the order of operations using multivariate analysis methods and operations using other methods (such as the calibration curve method). The description of other components and the like which are the same as those of the above embodiment is omitted.

實施形態的成分濃度測定裝置A具備顯示部DP。且成分濃度測定裝置A具備具有記憶塊101之測定數據記憶部10。測定數據記憶部10係將藉運算部2所算出之成分濃度,連同測定時刻及從測定開始的經過時間中至少一者一起進行記憶。此外,記憶塊101亦可用複數個記憶塊構成。 The component concentration measuring device A of the embodiment includes a display portion DP. The component concentration measuring device A includes a measurement data storage unit 10 including a memory block 101. The measurement data storage unit 10 memorizes the component concentration calculated by the calculation unit 2 together with at least one of the measurement time and the elapsed time from the start of the measurement. In addition, the memory block 101 may be configured by a plurality of memory blocks.

如圖6所示,顯示部DP可將記憶在測定數據記憶部10之成分濃度(例如,A、B、C)的數據(data),以記憶在測定數據記憶部10之測定時刻或從測定開始算起之經過時間作為指標進行圖表(graph)顯示。 As shown in FIG. 6, the display unit DP may store data of component concentrations (for example, A, B, and C) stored in the measurement data storage unit 10 to memorize the measurement time in the measurement data storage unit 10 or from the measurement. The elapsed time from the start of calculation is displayed as a graph.

[第四實施形態]     [Fourth embodiment]    

圖7係測定部1和運算部2分開構成的成分濃度測定裝置的示意圖。在本實施形態的成分濃度測定裝置A中,測定部1設置於從顯影製程設備B的顯影液管路80旁通(bypass)的管路上,以測定數據用信號線51~53和運算部2連接。亦可直接連接於顯影液管路80、其他的 管路等。亦可將流量調節閥(未圖示)等組合使用,以取代取樣泵14。 FIG. 7 is a schematic diagram of a component concentration measurement device in which the measurement unit 1 and the calculation unit 2 are separated. In the component concentration measuring device A of this embodiment, the measurement section 1 is provided on a bypass line from the developer solution line 80 of the development process equipment B, and the measurement data signal lines 51 to 53 and the calculation section 2 are provided. connection. It may also be directly connected to the developer line 80, other lines, and the like. Instead of the sampling pump 14, a flow regulating valve (not shown) or the like may be used in combination.

實施形態的成分濃度測定裝置A具備顯示部DP。且成分濃度測定裝置A具備具有記憶塊101之測定數據記憶部10。測定數據記憶部10係將藉測定部1所測定之特性值(例如,am、bm、cm)及藉運算部2所算出之成分濃度(例如,A、B、C),連同測定時刻及從測定開始的經過時間中至少一者一起進行記憶。 The component concentration measuring device A of the embodiment includes a display portion DP. The component concentration measuring device A includes a measurement data storage unit 10 including a memory block 101. The measurement data storage unit 10 includes the characteristic values (for example, a m , b m , and c m ) measured by the measurement unit 1 and the component concentrations (for example, A, B, C) calculated by the calculation unit 2 together with the measurement. At least one of the time and the elapsed time from the start of the measurement is memorized together.

顯示部DP係可將記憶在測定數據記憶部10的特性值(am、bm、cm)及成分濃度(A、B、C)中至少一者,以記憶在測定數據記憶部10的時刻或自測定開始起算的經過時間為指標進行圖表顯示。實施形態中,顯示部DP可藉由設定於顯示部DP畫面上的屬顯示切換手段的切換鍵BT進行特性值及成分濃度的圖表顯示之切換。實施形態中雖呈現切換圖表顯示而顯示於顯示部DP的情況,但亦可將特性值(am、bm、cm)及成分濃度(A、B、C)的圖表顯示同時地顯示在顯示部DP。 The display unit DP stores at least one of the characteristic values (a m , b m , c m ) and the component concentrations (A, B, C) stored in the measurement data storage unit 10 to memorize the measurement data storage unit 10. The time or the elapsed time from the start of the measurement is used as an indicator to display the graph. In the embodiment, the display part DP can switch the graph display of the characteristic value and the component concentration by a switch key BT which is a display switching means provided on the screen of the display part DP. Although the embodiment shows a case where the graph display is switched and displayed on the display portion DP, the graph display of the characteristic values (a m , b m , c m ) and the component concentration (A, B, C) may be displayed simultaneously Display part DP.

在顯示切換手段方面,要將顯示於顯示部的顯示對象作特性值的圖表或成分濃度的圖表之切換的開關可被安裝於裝置的外面,亦可安裝成顯示於顯示部之可操作的GUI(圖表使用者介面)。又,顯示切換手段可以是針對所有成分總括地進行特性值顯示或成分濃度顯示之切換,亦可為能按各成分作個別地切換。 As for the display switching means, a switch for switching a graph of a characteristic value or a graph of component concentration to be displayed on the display part can be installed outside the device, or it can be installed as an operable GUI displayed on the display part. (Graphics user interface). In addition, the display switching means may be the switching of characteristic value display or component concentration display for all components collectively, or it may be possible to switch individually for each component.

[第五實施形態]     [Fifth embodiment]    

圖8係在測定顯影液的特性值之測定手段11~13是由各個測定裝置本體11a、12a、13a與測定探針11b、12b、13b所構成之情況的成分濃度測定裝置的示意圖。本實施形態的成分濃度測定裝置具備顯示部DP。透過顯示部DP可進行與第一實施形態至第四實施形態同樣的顯示。 FIG. 8 is a schematic diagram of a component concentration measuring device in a case where the measuring means 11 to 13 for measuring the characteristic value of the developing solution are composed of the respective measuring device bodies 11a, 12a, 13a and the measuring probes 11b, 12b, 13b. The component concentration measuring device of this embodiment includes a display portion DP. The same display as that of the first to fourth embodiments can be performed through the display portion DP.

本實施形態中,測定手段11~13之測定探針11b~13b是透過浸漬於貯留在顯影液貯留槽61的顯影液而測定顯影液的特性值。所測定之顯影液的特性值經由測定數據用信號線51~53送到運算部2。利用多變量分析法在運算部2算出成分濃度,藉以測定顯影液的成分濃度。 In this embodiment, the measurement probes 11b to 13b of the measurement means 11 to 13 measure the characteristic value of the developing solution through the developing solution immersed in the developing solution storage tank 61. The measured characteristic value of the developer is sent to the arithmetic unit 2 through the signal lines 51 to 53 for measurement data. The component concentration is calculated in the calculation unit 2 by a multivariate analysis method, and the component concentration of the developing solution is measured.

圖8中雖顯示出測定部1與運算部2是分開構成之情況,但亦可為一體構成的成分濃度測定裝置。在此情況,浸漬於顯影液中的測定探針與配置在成分濃度測定裝置之測定部1內的測定裝置本體是被電纜等所連接。 Although FIG. 8 shows a case where the measurement unit 1 and the calculation unit 2 are configured separately, it may be a component concentration measurement device configured integrally. In this case, the measurement probe immersed in the developing solution and the measurement device body arranged in the measurement section 1 of the component concentration measurement device are connected by a cable or the like.

[第六實施形態]     [Sixth Embodiment]    

圖9係在具備並列配置的測定部1內之測定手段的情況之成分濃度測定裝置的示意圖。實施形態的成分濃度測定裝置具備顯示部DP。透過顯示部DP可進行與第一實施形態至第四實施形態同樣的顯示。 FIG. 9 is a schematic diagram of a component concentration measurement device in a case where measurement means in the measurement unit 1 arranged in parallel are provided. The component concentration measuring device of the embodiment includes a display portion DP. The same display as that of the first to fourth embodiments can be performed through the display portion DP.

構成測定部1的各測定手段不受限於串列地連接之情況,亦可並列地連接。如圖9所示,測定手段11~13亦可分別獨立地具備取樣管路15a~15c、取樣泵14a~14c、回流配管16a~16c等,亦可藉由在中途分歧的管路並列地連接。藉測定手段11~13所測定之顯影液的特性值被送到運算部2。藉由多變量分析法在運算部2中算出顯影液的成分濃度。 The measurement means constituting the measurement unit 1 is not limited to the case of being connected in series, and may be connected in parallel. As shown in FIG. 9, the measurement means 11 to 13 may include sampling pipes 15a to 15c, sampling pumps 14a to 14c, and return pipes 16a to 16c, respectively. They may also be connected in parallel through pipes that diverge in the middle . The characteristic value of the developing solution measured by the measuring means 11 to 13 is sent to the arithmetic unit 2. The component concentration of the developer is calculated in the arithmetic unit 2 by a multivariate analysis method.

[第七實施形態]     [Seventh embodiment]    

圖10係例如自動滴定裝置般在具備需要添加藥劑的測定裝置之情況下的成分濃度測定裝置的示意圖。圖10中,第三測定手段13是需要添加藥劑的測定裝置。實施形態的成分濃度測定裝置具備顯示部DP。透過顯示部DP可進行與第一實施形態至第四實施形態同樣的顯示。 FIG. 10 is a schematic diagram of a component concentration measuring device in a case where, for example, an automatic titration device is equipped with a measuring device that requires addition of a drug. In FIG. 10, the third measurement means 13 is a measurement device that requires addition of a drug. The component concentration measuring device of the embodiment includes a display portion DP. The same display as that of the first to fourth embodiments can be performed through the display portion DP.

在此情況,第三測定手段13除連接到取樣配管15、取樣泵14以外,還藉由送液配管18連接到添加試藥93。添加試藥係被送液泵17採液以供測定。測定後的顯影液係藉由廢液配管19被廢液(排放)。由於其他的測定動作、運算動作等和其他實施例相同,故予以省略。 In this case, in addition to the sampling pipe 15 and the sampling pump 14, the third measurement means 13 is also connected to the addition reagent 93 via the liquid feeding pipe 18. The reagent-adding system is collected by the liquid delivery pump 17 for measurement. The developing solution after measurement is discharged (discharged) through a waste liquid pipe 19. Since other measurement operations and calculation operations are the same as those of the other embodiments, they are omitted.

以上,如第一到第七實施形態所示,本發明的成分濃度測定裝置具備:測定部1,測定與顯影液的成分濃 度有關之顯影液的複數個特性值;運算部2,依據藉測定部1所測定之顯影液的複數個特性值且藉由多變量分析法測定顯影液的成分濃度;及顯示部DP。 As described above, as shown in the first to seventh embodiments, the component concentration measuring device according to the present invention includes the measuring unit 1 that measures a plurality of characteristic values of the developing solution related to the component concentration of the developing solution; The plurality of characteristic values of the developing solution measured by the section 1 and the component concentration of the developing solution are measured by a multivariate analysis method; and the display section DP.

本實施形態的成分濃度測定裝置A之測定部1可採取各種實施形態。用作為測定手段的測定裝置因為有因應於其測定裝置所要採用的測定方式而適當的設置、連接的作法,故本發明的成分濃度測定裝置之測定部1只要因應其測定手段設為最合適的構成即可。 The measurement unit 1 of the component concentration measuring device A of this embodiment can take various embodiments. The measuring device used as a measuring means is appropriately installed and connected in accordance with the measuring method to be used by the measuring device. Therefore, the measuring unit 1 of the component concentration measuring device of the present invention should be set to the most suitable according to the measuring method Just make up.

在測定部1內具備測定顯影液的複數個特性值所需之測定手段即可。測定部1具備溫度調節手段(未圖示)是理想的。雖理想的是視需要而適當地具備取樣泵14、輸液泵17、廢液配管19等,但並非意指都必須是測定部1的內部零件。 The measurement unit 1 may include measurement means necessary for measuring a plurality of characteristic values of the developer. It is desirable that the measurement unit 1 includes a temperature adjustment means (not shown). Although it is desirable that the sampling pump 14, the infusion pump 17, the waste liquid piping 19, and the like are appropriately provided as necessary, it does not necessarily mean that all of them are internal parts of the measurement unit 1.

又,測定部1與運算部2可為一體,亦可為分開。測定部1與運算部2係以只要運算部2可接收以測定部1測定的顯影液的特性值之測定數據的方式相互連絡即可。測定部1與運算部2不受限於藉信號線連接的情況,亦可構成為能以無線方式收發數據之情況。也沒有必要將複數個測定手段匯集在一個場所而構成測定部1,一個特定的測定手段被分開安置亦可。 The measurement unit 1 and the calculation unit 2 may be integrated or separated. The measurement unit 1 and the calculation unit 2 may be interconnected so long as the calculation unit 2 can receive measurement data of characteristic values of the developing solution measured by the measurement unit 1. The measurement unit 1 and the calculation unit 2 are not limited to the case of being connected by a signal line, and may be configured to be capable of transmitting and receiving data wirelessly. It is not necessary to form a measurement unit 1 by integrating a plurality of measurement means in one place, and a specific measurement means may be placed separately.

各測定手段不僅是取樣進行測定的方式,亦可為直接安裝於配管的方式,亦可將探針浸漬於液中的方式。各測定手段可串列地連接,亦可並列地連接。亦可藉各種組合來構成測定部1。 Each measurement means is not only a method of sampling and measuring, but also a method of directly mounting on a pipe, or a method of immersing a probe in a liquid. The respective measurement means may be connected in series or in parallel. The measurement unit 1 may be configured by various combinations.

此外,在本實施形態之測定部1中之顯影液的複數個特性值的測定係不限其順序。在圖4到圖10為止的圖面中之測定部1內的各測定手段之配列、及「第一測定手段」、「第二測定手段」、...等之記載中的「第一」、「第二」、...等之用詞並非限定本發明中之測定的順序者。「第一」、「第二」、...等之用詞只不過是為了方便區別複數個測定手段的每一者而已。 In addition, the measurement of the plurality of characteristic values of the developer in the measurement section 1 of this embodiment is not limited to the order. The arrangement of each measurement means in the measurement unit 1 in the drawings from FIG. 4 to FIG. 10 and the "first" in the description of "first measurement means", "second measurement means", ... The terms "second", "..." and the like do not limit the order of determination in the present invention. The words "first", "second", ... are just for the convenience of distinguishing each of the plurality of measuring means.

叉,本實施形態的成分濃度測定裝置的運算部2若含有利用多變量分析法的運算塊21,則亦可另外具有利用多變量分析法以外之手法(例如校準曲線法)的運算塊。此際,運算之順序不限。 For example, if the arithmetic unit 2 of the component concentration measuring device of the present embodiment includes an arithmetic block 21 using a multivariate analysis method, it may further include an arithmetic block using a method other than the multivariate analysis method (for example, a calibration curve method). In this case, the order of operations is not limited.

本實施形態的成分濃度測定裝置中,透過構成測定部1的各測定手段以適合於其測定方式配置而設置連接,測定顯影液的複數個特性值,運算部2接收以測定部1所測定之顯影液的特性值之測定值,藉由多變量分析法(運算手法所包含)算出顯影液的成分濃度。 In the component concentration measuring device of this embodiment, each measuring means constituting the measuring unit 1 is arranged and connected in a manner suitable for the measuring method, and a plurality of characteristic values of the developer are measured. The computing unit 2 receives the measured values measured by the measuring unit 1. The measured value of the characteristic value of the developing solution was calculated by the multivariate analysis method (included in the calculation method).

以下,在第八實施形態及第九實施形態中,針對本實施形態的成分濃度測定裝置之應用例作說明。本實施形態的成分濃度測定裝置係可作為一個零件應用在各種的裝置、系統等。 Hereinafter, in the eighth embodiment and the ninth embodiment, an application example of the component concentration measuring device of the present embodiment will be described. The component concentration measuring device of this embodiment can be applied to various devices, systems, and the like as a single component.

[第八實施形態]     [Eighth embodiment]    

圖11係使用了本實施形態的成分濃度測定裝置之顯影液管理裝置的示意圖。 FIG. 11 is a schematic diagram of a developer management device using the component concentration measuring device of the present embodiment.

本實施形態中,成分濃度測定裝置A係藉由運算數據用信號線54連接到控制控制閥41~43的控制部3(控制裝置)。控制部3(控制裝置)係藉由控制信號用信號線55~57連接到各控制閥41~43。控制閥41~43分別設置在用以從補充液貯留槽91、92輸送補充液之補充液用管路81、82及用以輸送純水之純水用管路83。成分濃度測定裝置A具備顯示部DP。 In the present embodiment, the component concentration measurement device A is connected to the control unit 3 (control device) that controls the control valves 41 to 43 via a signal line 54 for operation data. The control unit 3 (control device) is connected to each of the control valves 41 to 43 via signal lines 55 to 57 for control signals. The control valves 41 to 43 are respectively provided in the replenishing liquid pipes 81 and 82 for supplying the replenishing liquid from the replenishing liquid storage tanks 91 and 92 and the pure water pipe 83 for supplying pure water. The component concentration measuring device A includes a display portion DP.

補充液貯留槽91、92係以氮氣加壓,透過控制部3(控制裝置)開閉控制閥41~43,補充液通過合流管路84向顯影液補給。被補給的補充液係藉由循環泵74經由循環管路85返回顯影液貯留槽61並被攪拌。補充液的補給動作之方法、機構(mechanism)等,係於後述的顯影液管理方法、顯影液管理裝置等的實施例中作說明。 The replenishment liquid storage tanks 91 and 92 are pressurized with nitrogen, and pass through the control unit 3 (control device) to open and close the control valves 41 to 43. The replenished replenishment liquid is returned to the developer storage tank 61 by the circulation pump 74 through the circulation line 85 and is stirred. The method, mechanism, and the like of the replenishing operation of the replenishing liquid are described in the embodiments of the developer management method and the developer management device described later.

如此,本實施形態的成分濃度測定裝置透過與設在向顯影液輸送補給的補充液之管路上的控制閥及控制此等的控制裝置組合,可作為顯影液管理裝置的一個零件利用。 As described above, the component concentration measuring device according to the present embodiment can be used as a component of the developing solution management device by being combined with a control valve provided on a pipeline for supplying a replenishing solution to the developing solution and a control device for controlling the same.

此外,所謂補充液意指,例如顯影液的原液、新液、再生液等。亦有包含純水的情況。所謂原液意指鹼成分濃度濃厚之未使用的顯影液(例如20~25%TMAH水溶液)。所謂新液意指鹼成分濃度是與在顯影製程使用的濃度相同濃度且未使用之顯影液(例如2.38%TMAH水溶液)。所謂再生液意指從使用過的顯影液去除不要物作成可再利用之顯影液。此等在作為補充液的用途、效果等上相異。例如,原液係用以提高鹼成分濃度之補充液,降低溶解光阻劑濃度及吸收二氧化碳濃度。新液係用以將鹼成分濃度維持或和緩地增減,降低溶解光阻劑濃度及吸收二氧化碳濃度之補充液。純水係用以降低各成分濃度之補充液。在以下的實施例之說明中亦相同。 In addition, the so-called replenishing liquid means, for example, a stock solution, a fresh solution, a regenerating solution, and the like of a developing solution. In some cases, pure water is included. The so-called dope means an unused developing solution having a strong alkali component concentration (for example, a 20 to 25% TMAH aqueous solution). The so-called fresh solution means that the concentration of the alkali component is the same concentration as the concentration used in the development process and is not used (eg, a 2.38% TMAH aqueous solution). The regenerating solution means removing unnecessary substances from the used developing solution to make a reusable developing solution. These differ in use, effect, etc. as a supplement. For example, the original solution is a supplement solution for increasing the concentration of alkali components, reducing the concentration of dissolved photoresist and absorbing carbon dioxide. The new liquid is a supplementary liquid used to maintain or gently increase or decrease the concentration of alkali components, reduce the concentration of dissolved photoresist, and absorb the concentration of carbon dioxide. Pure water is a supplement to reduce the concentration of each component. The same applies to the description of the following embodiments.

又,圖11中雖圖示了補充液係從補充液貯留槽91、92經由補充液用管路81、82作供給,純水係經由純水用管路83作供給的情況,但不受此所限。亦有補充液係從補充液貯留槽91、92等送到調合槽(未圖示),在那裡調製成既定的濃度之後再輸送到顯影液貯留槽61之情況。在此情況,控制閥41、42係設於從調合槽向顯影液貯留槽61作輸送的管路中途。亦有不向顯影液貯留槽 61直接供給純水的情形,此時不存在純水用管路83、控制閥43等。在以下的實施例的說明及以下的圖面中亦相同。 In addition, FIG. 11 illustrates a case where the supplementary liquid is supplied from the supplementary liquid storage tanks 91 and 92 through the supplemental liquid pipes 81 and 82, and the pure water is supplied through the pure water pipe 83. This is limited. In some cases, the replenishing liquid is sent from the replenishing liquid storage tanks 91 and 92 to a mixing tank (not shown), and then the replenishing liquid is sent to the developer storage tank 61 after being prepared to a predetermined concentration. In this case, the control valves 41 and 42 are provided in the middle of a pipeline for conveying the developer tank to the developer storage tank 61. In some cases, pure water is not directly supplied to the developer storage tank 61, and at this time, there is no pure water pipe 83, control valve 43, or the like. The same applies to the description of the following embodiments and the following drawings.

補充液貯留於補充液貯留部C的補充液貯留槽91、92。補充液貯留槽91、92連接於具備加壓氣體用閥46、47之氮氣用管路86,藉由經此管路供給的氮氣而被加壓。又,在補充液貯留槽91、92分別連接補充液用管路81、82,透過通常為開啟狀態的閥44、45輸送補充液。補充液用管路81、82及純水用管路83具備有控制閥41~43,控制閥41~43係藉由控制部3控制開閉。透過控制閥動作,壓送補充液貯留槽91、92所貯留之補充液,且輸送純水。之後,補充液經由合流管路84與循環攪拌機構D合流且被補給到顯影液貯留槽61並被攪拌。 The replenishment solution is stored in the replenishment solution storage tanks 91 and 92 of the replenishment solution storage section C. The replenishment liquid storage tanks 91 and 92 are connected to a nitrogen gas line 86 provided with pressurized gas valves 46 and 47, and are pressurized by the nitrogen gas supplied through these lines. In addition, the replenishment liquid storage tanks 91 and 92 are connected to the replenishment liquid lines 81 and 82, respectively, and the replenishment liquid is conveyed through the normally open valves 44, 45. The replenishing liquid lines 81 and 82 and the pure water line 83 are provided with control valves 41 to 43. The control valves 41 to 43 are controlled to be opened and closed by the control unit 3. Through the operation of the control valve, the replenishment liquid stored in the replenishment liquid storage tanks 91 and 92 is pressure-fed, and pure water is delivered. After that, the replenishing liquid is merged with the circulation stirring mechanism D via the merging line 84 and is replenished to the developer storage tank 61 and stirred.

當因為補給而使得補充液貯留槽91、92內所貯留之補充液減少時,由於其內壓降低使供給量變不穩定,故維持成因應補充液之減少而適當開啟加壓氣體用閥46、47供給氮氣,以保持補充液貯留槽91、92的內壓。在補充液貯留槽91、92變空時,關閉閥44、45,和充滿補充液的新的補充液貯留槽作更換,或將另外準備的補充液再填充於變空的補充液貯留槽91、92。 When the replenishment liquid stored in the replenishment liquid storage tanks 91 and 92 is reduced due to replenishment, the supply amount becomes unstable due to the decrease in the internal pressure. Therefore, the valve 46 for the pressurized gas is appropriately opened in response to the decrease in replenishment liquid. 47. Nitrogen is supplied to maintain the internal pressure of the replenishment liquid storage tanks 91 and 92. When the replenishment liquid storage tanks 91 and 92 become empty, the valves 44 and 45 are closed, and a new replenishment liquid storage tank filled with replenishment liquid is replaced, or the replenishment liquid prepared separately is refilled into the empty replenishment liquid storage tank 91 , 92.

[第九實施形態]     [Ninth Embodiment]    

本實施形態的成分濃度測定裝置係可和警告燈WL、警報裝置WT等組合而應用在顯影液的濃度異常警報裝置等。圖12係用以顯示本發明的成分濃度測定裝置之應用事例的示意圖。如此,本發明的成分濃度測定裝置可作為零件應用於各種的裝置、系統等。 The component concentration measuring device of the present embodiment can be used in combination with a warning lamp WL, an alarm device WT, and the like, and applied to a concentration abnormality alarm device of a developing solution and the like. FIG. 12 is a schematic diagram showing an application example of the component concentration measuring device of the present invention. As described above, the component concentration measuring device of the present invention can be applied as a component to various devices, systems, and the like.

以下,圖13到圖17係有關實施形態的顯影液管理方法。 13 to 17 show a developer management method according to the embodiment.

本發明的顯影液管理方法包含:測定步驟,測定與鹼性顯影液的成分濃度有關之顯影液的複數個特性值;運算步驟,藉由多變量分析法從所測定之複數個特性值算出顯影液的成分濃度;及補給步驟,依據所測定之顯影液的特性值或算出之顯影液的成分濃度而向顯影液補給補充液。測定步驟及運算步驟係和在前述的顯影液的成分濃度測定方法中之測定步驟、運算步驟相同,故在以下的圖13到圖17的實施形態中省略其重複的說明。 The developing solution management method of the present invention includes: a measuring step of measuring a plurality of characteristic values of a developing solution related to a component concentration of an alkaline developing solution; and an arithmetic step of calculating a development from the measured plurality of characteristic values by a multivariate analysis method. And a replenishing step of replenishing the developer with a replenishing solution according to a characteristic value of the measured developer solution or a calculated component concentration of the developer solution. The measurement steps and calculation steps are the same as the measurement steps and calculation steps in the aforementioned method for measuring the component concentration of a developer. Therefore, repeated descriptions thereof are omitted in the embodiments of FIGS. 13 to 17 below.

又,以下的說明中,所謂「既定的管理值」意指,作為顯影液發揮最佳的液體性能時的特性值或成分濃度值,係依經驗或實驗等而預先知悉的特性值或成分濃度值。亦即,例如顯影後的基板上所形成之線寬或殘餘膜厚之類的成為顯影液的顯影性能的指標之數值是指以成為最好的狀態之特性值或成分濃度值之預知的值。「既 定的管理區域」亦是這樣的管理值的範圍。在顯影液管理裝置的說明中亦相同。 In the following description, the "predetermined management value" means a characteristic value or a component concentration value at which the best liquid performance is exhibited as a developer, and is a characteristic value or a component concentration that is known in advance based on experience, experiments, and the like. value. That is, a numerical value that becomes an index of the developing performance of the developer, such as a line width or a residual film thickness formed on the substrate after development, is a characteristic value or a component concentration value that is predicted in the best state. . The "predetermined management area" is also a range of such management values. The same applies to the description of the developer management device.

圖13係藉由成分濃度管理顯影液的二個成分之顯影液管理方法的流程圖。本實施形態的顯影液管理方法係可較佳地適用於被管理成二氧化碳的吸收少的鹼性顯影液中,以顯影液的鹼成分濃度是成為既定的管理值及溶解光阻劑濃度是成為既定的管理值以下的方式管理顯影液之情況等。 FIG. 13 is a flowchart of a developer management method for two components of a developer by component concentration management. The developing solution management method of this embodiment is preferably applicable to an alkaline developing solution that is managed to have a low absorption of carbon dioxide. The alkali component concentration of the developing solution becomes a predetermined management value and the dissolved photoresist concentration becomes Management of the developer in a manner below the predetermined management value.

本實施形態中,作成將成分濃度A管理在既定的管理值A0,將成分濃度B管理在既定的管理值B0以下。成分濃度A係例如為鹼成分濃度,成分濃度B係例如為溶解光阻劑濃度。 In this embodiment, the component concentration A is managed to be a predetermined management value A 0 , and the component concentration B is managed to be a predetermined management value B 0 or less. The component concentration A is, for example, an alkali component concentration, and the component concentration B is, for example, a dissolved photoresist concentration.

在測定步驟測定顯影液的特性值a、b,將其測定值am、bm送到運算步驟。在運算步驟中,藉由多變量分析法由測定值am、bm算出顯影液的成分濃度A、B。藉運算步驟所算出之成分濃度A、B被送到補給步驟。 In the measurement step, the characteristic values a and b of the developer are measured, and the measured values a m and b m are sent to the calculation step. In the calculation step, the component concentrations A and B of the developing solution are calculated from the measured values a m and b m by a multivariate analysis method. The component concentrations A and B calculated by the calculation step are sent to the replenishment step.

補給步驟包含調整成分濃度A的步驟及調整成分濃度B的步驟。 The replenishing step includes a step of adjusting the component concentration A and a step of adjusting the component concentration B.

首先,在調整成分濃度A的步驟中,判斷成分濃度A是否比其管理值A0大或小。在大時,將可發揮將成分 濃度A稀釋的作用之補充液(例如顯影液新液、純水等)對顯影液作補給。在小時,將可發揮使成分濃度A變濃的作用之補充液(例如,顯影液原液、新液等)對顯影液作補給。在成分濃度A是和其管理值A0相同時,什麼都不做。 First, in the step of adjusting the concentration of the component A, the component concentration determination A is larger or smaller than the management value A 0. When it is large, a developing solution is replenished with a replenishing solution (for example, a new developing solution, pure water, etc.) that can dilute the component concentration A. In an hour, a developer is replenished with a replenisher (for example, a developer solution, a fresh solution, and the like) that has the effect of increasing the component concentration A. When the component concentration A is the same as its management value A 0 , nothing is done.

在調整成分濃度B的步驟中,判斷成分濃度B是否比其管理值B0大。在大時,將可發揮將成分濃度B稀釋的作用之補充液(例如,顯影液新液不會改變鹼成分濃度,故而較佳)對顯影液作補給。在小時,什麼都不做。 In the step of adjusting the component concentration B, it is determined whether the component concentration B is larger than the management value B 0 . When it is large, a replenishing solution (for example, a new developer solution that does not change the alkali component concentration, which is capable of diluting the component concentration B) is used to replenish the developer solution. In hours, do nothing.

圖14係顯影液的二個成分中的一者藉成分濃度而另一者藉特性值作管理的情況之顯影液管理方法的流程圖。本實施形態的顯影液管理方法係可較佳地適用於被管理成二氧化碳的吸收少的鹼性顯影液中,以顯影液的鹼成分濃度可成為既定的管理值、及顯影液的特定波長(例如λ=560nm)中的吸光度可成為既定的管理值以下之方式管理顯影液之情況等。 14 is a flowchart of a developer management method in a case where one of the two components of the developer is managed by the component concentration and the other is managed by the characteristic value. The developing solution management method of this embodiment is preferably applicable to an alkaline developing solution that is managed to absorb less carbon dioxide. The alkali component concentration of the developing solution can be a predetermined management value and a specific wavelength of the developing solution ( For example, the absorbance at λ = 560 nm) may be used in the case where the developer is managed in a manner below the predetermined management value.

本實施形態中,將成分濃度A管理在既定的管理值A0,將顯影液的特性值b之測定值bm管理在既定的管理值b0以下。成分濃度A係例如為鹼成分濃度,特性值b係例如為在特定波長(例如λ=560nm)中之吸光度。 In this embodiment, the component concentration A is managed at a predetermined management value A 0 , and the measured value b m of the characteristic value b of the developing solution is managed at a predetermined management value b 0 or less. The component concentration A is, for example, an alkali component concentration, and the characteristic value b is, for example, an absorbance at a specific wavelength (for example, λ = 560 nm).

在測定步驟測定顯影液的特性值a、b,其測定值am、bm被送到運算步驟。在運算步驟,藉由多變量分析法由測定值am、bm算出顯影液的成分濃度A、B。藉運算步驟所算出之成分濃度A和藉測定步驟所測定之特性值b之測定值bm係被送到補給步驟。 The characteristic values a and b of the developing solution are measured in the measurement step, and the measured values a m and b m are sent to the calculation step. In the calculation step, the component concentrations A and B of the developing solution are calculated from the measured values a m and b m by a multivariate analysis method. The component concentration A calculated by the calculation step and the measurement value b m of the characteristic value b measured by the measurement step are sent to the replenishment step.

補給步驟包含調整成分濃度A的步驟與調整特性值b的步驟。由於調整成分濃度A的步驟和圖13的情況相同,故予以省略其說明。 The replenishing step includes a step of adjusting the component concentration A and a step of adjusting the characteristic value b. Since the procedure of adjusting the component concentration A is the same as that in the case of FIG. 13, its description is omitted.

在調整特性值b的步驟中,其測定值bm和其管理值b0比較以判斷是否較大。在大時,將可發揮將成分濃度B稀釋的作用之補充液(例如,顯影液新液不會改變鹼成分濃度,故而較佳)對顯影液作補給。在小時,什麼都不做。 In the step of adjusting the characteristic value b, its measurement value b m is compared with its management value b 0 to determine whether it is large. When it is large, a replenishing solution (for example, a new developer solution that does not change the alkali component concentration, which is capable of diluting the component concentration B) is used to replenish the developer solution. In hours, do nothing.

在特性值b與成分濃度B具有單調遞增之相關關係時,透過特性值b被管理成為其管理值b0以下,成分濃度B被管理成為其管理值B0以下。在特性值b與成分濃度B具有單調遞減之相關關係時,若反轉判斷的大小關係而運作的話,則同樣地能將成分濃度B管理成為其管理值B0以下。 Having monotonically increasing characteristic of the correlation between the concentration and the value b B, b values of transmission characteristics is managed as its management value b 0 or less, the concentration of component B is a management value managed B become 0 or less. When the characteristic value b and the component concentration B have a monotonically decreasing correlation, if the magnitude relationship of the judgment is reversed and the operation is performed, the component concentration B can similarly be managed to a management value B 0 or less.

圖15係顯影液的三個成分藉由成分濃度作管理之顯影液管理方法的流程圖。本實施形態的顯影液管理方 法係可較佳地適用於,例如,在將顯影液的鹼成分濃度管理成為既定的管理值、溶解光阻劑濃度管理成為既定的管理值以下、及吸收二氧化碳濃度管理成為既定的管理值以下之情況等。 FIG. 15 is a flowchart of a developing solution management method in which three components of a developing solution are managed by component concentrations. The developing solution management method of this embodiment is preferably applicable to, for example, management of the alkali component concentration of the developing solution to a predetermined management value, management of the dissolved photoresist concentration to a predetermined management value or less, and absorption of carbon dioxide concentration. Cases where management becomes below a predetermined management value.

補給步驟,係設為將成分濃度A管理在既定的管理值A0,成分濃度B管理在既定的管理值B0以下,成分濃度C管理在既定的管理值C0以下。成分濃度A係例如為鹼成分濃度,成分濃度B係例如為溶解光阻劑濃度、成分濃度C係例如為吸收二氧化碳濃度。 In the replenishing step, the component concentration A is managed at a predetermined management value A 0 , the component concentration B is managed at a predetermined management value B 0 or less, and the component concentration C is managed at a predetermined management value C 0 or less. The component concentration A is, for example, an alkali component concentration, the component concentration B is, for example, a dissolved photoresist concentration, and the component concentration C is, for example, a carbon dioxide absorption concentration.

在測定步驟測定顯影液的特性值a、b、c、...,其測定值am、bm、cm、...被送到運算步驟。在運算步驟,藉由多變量分析法由測定值am、bm、cm、...算出顯影液的成分濃度A、B、C、...。藉運算步驟所算出之成分濃度A、B、C、...係被送到補給步驟。 The characteristic values a, b, c, ... of the developing solution are measured in the measurement step, and the measured values a m , b m , c m , ... are sent to the calculation step. In the calculation step, the component concentrations A, B, C, ... of the developing solution are calculated from the measured values a m , b m , c m , ... by a multivariate analysis method. The component concentrations A, B, C, ... calculated by the calculation step are sent to the replenishment step.

補給步驟包含調整成分濃度A的步驟、調整成分濃度B的步驟及調整成分濃度C的步驟。 The replenishing step includes a step of adjusting the component concentration A, a step of adjusting the component concentration B, and a step of adjusting the component concentration C.

首先,在調整成分濃度A的步驟中,判斷成分濃度A是否比其管理值A0大或小。在大時,將可發揮將成分濃度A稀釋的作用之補充液(例如顯影液新液、純水等)對顯影液作補給。在小時,將可發揮使成分濃度A變濃的作用之補充液(例如顯影液原液、新液等)對顯影液作補給。在成分濃度A和其管理值A0相同時,什麼都不做。 First, in the step of adjusting the concentration of the component A, the component concentration determination A is larger or smaller than the management value A 0. When it is large, a developing solution is replenished with a replenishing solution (for example, a new developing solution, pure water, etc.) that can dilute the component concentration A. In a small amount of time, a developing solution is replenished with a replenishing solution (for example, a developing solution original solution, a new solution, and the like) capable of increasing the component concentration A. When the component concentration A and the management value A 0 are the same, nothing is done.

在調整成分濃度B的步驟中,判斷成分濃度B是否比其管理值B0大。在大時,將可發揮將成分濃度B稀釋的作用之補充液(例如顯影液新液不會改變鹼成分濃度,故而較佳)對顯影液作補給。在小時,什麼都不做。 In the step of adjusting the component concentration B, it is determined whether the component concentration B is larger than the management value B 0 . When it is large, a replenishing solution (such as a new developer solution that does not change the alkali component concentration, which is capable of diluting the component concentration B) is used to replenish the developer solution. In hours, do nothing.

在調整成分濃度C的步驟中,判斷成分濃度C是否比其管理值C0大。在大時,將可發揮將成分濃度C稀釋的作用之補充液(例如,顯影液新液不會改變鹼成分濃度,故而較佳)對顯影液作補給。在小時,什麼都不做。 In the step of adjusting the component concentration C, it is determined whether the component concentration C is greater than its management value C 0 . When it is large, a replenishing solution (for example, a new developer solution that does not change the alkali component concentration, which is capable of diluting the component concentration C) is used to replenish the developer solution. In hours, do nothing.

圖16係顯影液的三個成分中的一個藉由特性值而其他二個藉由成分濃度作管理之顯影液管理方法的流程圖。本實施形態的顯影液管理方法係可較佳地適用於以顯影液的鹼成分濃度可成為既定的管理值、顯影液的特定波長(例如λ=560nm)中的吸光度可成為既定的管理值以下、及顯影液的吸收二氧化碳濃度可成為既定的管理值以下的方式管理顯影液之情況等。 FIG. 16 is a flowchart of a developing solution management method in which one of the three components of the developer is characterized by the characteristic value and the other two are managed by the component concentration. The developing solution management method of this embodiment is preferably applicable to the case where the alkali component concentration of the developing solution can be a predetermined management value, and the absorbance at a specific wavelength (for example, λ = 560 nm) of the developing solution can be a predetermined management value or less. And the case where the developer absorbs the carbon dioxide concentration and the developer can be managed in such a manner that it becomes a predetermined management value or less.

本實施形態中,設為將成分濃度A管理在既定的管理值A0,顯影液的特性值b之測定值bm管理在既定的管理值b0以下,成分濃度C管理在既定的管理值C0以下。成分濃度A係例如為鹼成分濃度,特性值b係例如為在特定波長(例如λ=560nm)中之吸光度,成分濃度C係例如為吸收二氧化碳濃度。 In this embodiment, it is assumed that the component concentration A is managed at a predetermined management value A 0 , the measured value b m of the characteristic value b of the developing solution is managed at a predetermined management value b 0 or less, and the component concentration C is managed at a predetermined management value. C 0 or less. The component concentration A is, for example, an alkali component concentration, the characteristic value b is, for example, an absorbance at a specific wavelength (for example, λ = 560 nm), and the component concentration C is, for example, a concentration for absorbing carbon dioxide.

在測定步驟測定顯影液的特性值a、b、c,其測定值am、bm、cm被送到運算步驟。在運算步驟中,藉由多變量分析法由測定值am、bm、cm算出顯影液的成分濃度A、B、C。藉運算步驟所算出之成分濃度A、C及在測定步驟所測定的特性值b之測定值bm係被送到補給步驟。 The characteristic values a, b, and c of the developing solution are measured in the measurement step, and the measured values a m , b m , and c m are sent to the calculation step. In the calculation step, the component concentrations A, B, and C of the developing solution are calculated from the measured values a m , b m , and c m by a multivariate analysis method. The component concentrations A and C calculated by the calculation step and the measurement value b m of the characteristic value b measured in the measurement step are sent to the replenishment step.

補給步驟包含調整成分濃度A的步驟、調整特性值b的步驟及調整成分濃度C的步驟。由於調整成分濃度A的步驟及調整成分濃度C的步驟和圖15相同,故予以省略其說明。 The replenishing step includes a step of adjusting the component concentration A, a step of adjusting the characteristic value b, and a step of adjusting the component concentration C. Since the steps of adjusting the component concentration A and the steps of adjusting the component concentration C are the same as those in FIG. 15, descriptions thereof are omitted.

在調整特性值b的步驟中,其測定值bm和其管理值b0比較判斷是否較大。在大時,將可發揮將成分濃度B稀釋的作用之補充液(例如,顯影液新液不會改變鹼成分濃度,故而較佳)對顯影液作補給。在小時,什麼都不做。 In the step of adjusting the characteristic value b, its measured value b m is compared with its management value b 0 to determine whether it is large. When it is large, a replenishing solution (for example, a new developer solution that does not change the alkali component concentration, which is capable of diluting the component concentration B) is used to replenish the developer solution. In hours, do nothing.

在特性值b與成分濃度B具有單調遞增之相關關係時,透過特性值b被管理成為其管理值b0以下,成分濃度B被管理成為其管理值B0以下。在特性值b與成分濃度B具有單調遞減之相關關係時,若反轉判斷的大小關係(亦即bm<b0)而運作的話,則同樣地能將成分濃度B管理成為其管理值B0以下。 Having monotonically increasing characteristic of the correlation between the concentration and the value b B, b values of transmission characteristics is managed as its management value b 0 or less, the concentration of component B is a management value managed B become 0 or less. When the characteristic value b and the component concentration B have a monotonically decreasing correlation, if the magnitude relationship of the judgment is reversed (that is, b m <b 0 ) and the operation is performed, the component concentration B can also be managed as its management value B 0 or less.

圖17係顯影液的三個成分中的二個藉由特性值而另一個藉由成分濃度作管理之顯影液管理方法的流程圖。本實施形態的顯影液管理方法係可較佳地適用於以顯影液的導電率可成為既定的管理值、顯影液的特定波長(例如λ=560nm)中的吸光度可成為既定的管理值以下、及顯影液的吸收二氧化碳濃度可成為既定的管理值以下的方式管理顯影液之情況等。 FIG. 17 is a flowchart of a developing solution management method in which two of the three components of the developing solution are managed by characteristic values and the other is managed by the component concentration. The developing solution management method of this embodiment is preferably applicable to a case where the conductivity of the developing solution can be a predetermined management value, the absorbance at a specific wavelength (for example, λ = 560 nm) of the developing solution can be a predetermined management value or less, In addition, the carbon dioxide concentration absorbed by the developing solution may be used in a case where the developing solution is managed such that it becomes a predetermined management value or less.

本實施形態中,設為將顯影液的特性值a之測定值am管理在既定的管理值a0,顯影液的特性值b之測定值bm管理在既定的管理值b0以下,成分濃度C管理在既定的管理值C0以下。特性值a係例如為導電率,特性值b係例如為在特定波長(例如λ=560nm)中之吸光度,成分濃度C係例如為吸收二氧化碳濃度。 In this embodiment, it is assumed that the measured value a m of the characteristic value a of the developer is managed at a predetermined management value a 0 , and the measured value b m of the characteristic value b of the developer is managed at a predetermined management value b 0 or less. The concentration C is managed below a predetermined management value C 0 . The characteristic value a is, for example, conductivity, the characteristic value b is, for example, absorbance at a specific wavelength (for example, λ = 560 nm), and the component concentration C is, for example, absorption carbon dioxide concentration.

在測定步驟測定顯影液的特性值a、b、c,其測定值am、bm、cm被送到運算步驟。在運算步驟中,藉由多變量分析法由測定值am、bm、cm算出顯影液的成分濃度A、B、C。在測定步驟所測定之特性值a之測定值am、特性值b之測定值bm及藉運算步驟所算出之成分濃度C係被送到補給步驟。 The characteristic values a, b, and c of the developing solution are measured in the measurement step, and the measured values a m , b m , and c m are sent to the calculation step. In the calculation step, the component concentrations A, B, and C of the developing solution are calculated from the measured values a m , b m , and c m by a multivariate analysis method. Measured characteristic value of the measurement step of measuring a value of a m, b is a value measured characteristic values of m and b calculated by the calculating step based component concentration C is supplied to the supply step.

補給步驟包含調整特性值a的步驟、調整特性值b的步驟及調整成分濃度C的步驟。由於調整特性值b的步驟及調整成分濃度C的步驟和圖16相同,故予以省略其說明。 The replenishing step includes a step of adjusting the characteristic value a, a step of adjusting the characteristic value b, and a step of adjusting the component concentration C. Since the step of adjusting the characteristic value b and the step of adjusting the component concentration C are the same as those in FIG. 16, descriptions thereof are omitted.

在調整特性值a的步驟中,其測定值am和其管理值a0比較以判斷是較大或小。在大時,將可發揮將成分濃度A稀釋的作用之補充液(例如顯影液原液或新液)對顯影液作補給。在小時,將可發揮使成分濃度A變濃的作用之補充液(例如顯影液新液或純水)對顯影液作補給。在相同時,什麼都不做。 In the step of adjusting the characteristic value a, its measurement value a m is compared with its management value a 0 to determine whether it is larger or smaller. When it is large, a developing solution is replenished with a replenishing solution (such as a developing solution original solution or a fresh solution) that can dilute the component concentration A. In a small amount of time, a developing solution is replenished with a replenishing solution (such as a fresh developing solution or pure water) capable of increasing the component concentration A. Do nothing at the same time.

在特性值a與成分濃度A具有單調遞增之相關關係時,透過特性值a被維持成其管理值a0使成分濃度A被管理成為其管理值A0。在特性值a與成分濃度A具有單調遞減之相關關係時,若反轉判斷的大小關係而運作的話,則同樣地能將成分濃度A管理成為其管理值A0When the characteristic value a and the component concentration A have a monotonically increasing correlation, the transmission characteristic value a is maintained at its management value a 0 so that the component concentration A is managed to be its management value A 0 . When the characteristic value a and the component concentration A have a monotonically decreasing correlation, if the magnitude relationship of the judgment is reversed and operated, the component concentration A can also be managed to its management value A 0 .

以上,圖13至圖17所示的顯影液管理方法包含:測定步驟,測定與顯影液的成分濃度有關之顯影液的複數個特性值;運算步驟,依據所測定之複數個特性值藉由多變量分析法算出顯影液的成分濃度;及補給步驟,依據從所測定之顯影液的複數個特性值及所算出之顯影液的成分濃度中所選擇的管理對象項目之測定值或算出值,向顯影液補充補充液。 As described above, the developing solution management method shown in FIGS. 13 to 17 includes: a measuring step of measuring a plurality of characteristic values of the developing solution related to the component concentration of the developing solution; and a calculation step of using a plurality of characteristic values based on the measured plurality of characteristic values. The variable analysis method calculates the component concentration of the developer; and the replenishing step, based on the measured value or calculated value of the management target item selected from the plurality of characteristic values of the measured developer and the calculated component concentration of the developer, The developer is replenished.

測定步驟更包含:測定特性值a之測定步驟、測定特性值b之測定步驟、測定特性值c之測定步驟、...等。但此等步驟之順序不限。也可同時被測定。又,溫度調 整步驟、試藥添加步驟、廢液步驟等亦可因應測定手法而包含適當的必要步驟。 The measurement step further includes: a measurement step of the measurement characteristic value a, a measurement step of the measurement characteristic value b, a measurement step of the measurement characteristic value c, and the like. However, the order of these steps is not limited. Can also be measured at the same time. The temperature adjustment step, reagent addition step, waste liquid step, etc. may include appropriate necessary steps depending on the measurement method.

運算步驟係只要含有利用多變量分析法算出成分濃度的運算步驟即可。亦可含有利用與多變量分析法相異的運算方法(例如校準曲線法)算出成分濃度之步驟等。 The calculation steps need only include calculation steps for calculating the component concentration by a multivariate analysis method. It may also include a step of calculating the component concentration by a calculation method (for example, a calibration curve method) different from the multivariate analysis method.

補給步驟包含:將管理對象項目(顯影液的特性值或成分濃度中任一者)作為控制量,且以此可成為既定的管理值或既定的管理值以下或管理區域內之方式向顯影液補給補充液之調整成分濃度A的步驟、調整成分濃度B的步驟、調整成分濃度C的步驟、...。其順序不受圖面所示的順序所限定。 The replenishing step includes: using the control target item (either the characteristic value or the component concentration of the developer) as the control amount, and supplying the developer to the developer in such a manner as to become the predetermined management value or below the predetermined management value or within the management area. The step of adjusting the component concentration A, the step of adjusting the component concentration B, the step of adjusting the component concentration C, and the like of the replenishment solution. The order is not limited by the order shown in the drawing.

又,控制的方式可採用使控制量符合目標值的控制所能使用的各種控制方法。特別是以比例控制(P控制)(Proportional Control)、積分控制(I控制)(Integral Control)、微分控制(D控制)(Differential Control)、及組合此等控制而成的控制(PI控制(Proportional-Integral Control)等)為佳。更佳為適合PID控制。 In addition, as the control method, various control methods that can be used for the control in which the control amount is adjusted to the target value can be adopted. In particular, proportional control (P control) (Proportional Control), integral control (I control) (Integral Control), differential control (D control) (Differential Control), and control (PI control (Proportional) -Integral Control). It is more suitable for PID control.

在上述圖13至圖17的實施形態中,透過重複測定步驟、運算步驟、補給步驟,顯影液的成分濃度A維持在其管理值A0,被管理成顯影液的成分濃度B係其管理值B0以下,成分濃度C係其管理值C0以下。因此,藉 由實施形態的顯影液管理方法,可維持最佳的顯影性能,可實現所期望的線寬或殘餘膜厚。 In the embodiment of FIGS. 13 to 17 described above, the component concentration A of the developer is maintained at its management value A 0 by repeating the measurement steps, calculation steps, and replenishment steps. The component concentration B of the developer is managed at its management value. The component concentration C is equal to or less than B 0 and the management value C 0 or less. Therefore, the developing solution management method of the embodiment can maintain the optimal developing performance and achieve a desired line width or residual film thickness.

以下,第十到第十七實施形態係有關本發明的顯影液管理裝置。 Hereinafter, the tenth to seventeenth embodiments relate to the developer management device of the present invention.

本實施形態的顯影液管理裝置具備:測定部1,測定與鹼性顯影液的成分濃度有關之顯影液的複數個特性值;運算部2,藉由多變量分析法從藉測定部1所測定之複數個特性值算出顯影液的成分濃度;及控制部3,依據藉測定部1所測定之顯影液的特性值或藉運算部2所算出之顯影液的成分濃度向設於輸送要向顯影液補給的補充液之管路上之控制閥41~43發出控制信號。由於本發明的顯影液管理裝置之測定部1及運算部2和在前述之顯影液的成分濃度測定裝置中的測定部1、運算部2相同,故在以下從第十八到第二十五實施形態中省略其重複的說明。 The developing solution management device of this embodiment includes a measuring section 1 that measures a plurality of characteristic values of the developing solution related to the component concentration of the alkaline developing solution, and a computing section 2 that measures from the measuring section 1 by a multivariate analysis method. A plurality of characteristic values to calculate the component concentration of the developing solution; and the control unit 3, based on the characteristic value of the developing solution measured by the measuring unit 1 or the component concentration of the developing solution calculated by the computing unit 2 The control valves 41 to 43 on the liquid replenishment pipeline send out control signals. Since the measurement section 1 and the calculation section 2 of the developer management device of the present invention are the same as the measurement section 1 and the calculation section 2 in the component concentration measurement device of the developer described above, the eighteenth to the twenty-fifth are described below. The overlapping description is omitted in the embodiment.

[第十實施形態]     [Tenth embodiment]    

圖18係用以說明本發明的顯影液管理裝置的顯影製程的示意圖。本發明的顯影液管理裝置E是連同顯影製程設備B、補充液貯留部C、循環攪拌機構D等一起被圖示。 FIG. 18 is a schematic diagram for explaining a developing process of the developing solution management device of the present invention. The developing solution management device E of the present invention is illustrated together with the developing process equipment B, the replenishing solution storage section C, the circulation stirring mechanism D, and the like.

本實施形態的顯影液管理裝置E具備:測定部1,具備測定顯影液的複數個特性值之複數個測定手段11~13;運算部2,含有利用多變量分析法的運算塊21;及控制部3,將顯影液的特性值或成分濃度中任一者作為控制量且使其成為既定的管理值或管理區域內之方式作控制。又,本實施形態的顯影液管理裝置具備和控制部3連接而被控制之控制閥41~43。 The developer management device E of this embodiment includes: a measuring unit 1 including a plurality of measuring means 11 to 13 for measuring a plurality of characteristic values of the developing solution; an arithmetic unit 2 including an arithmetic block 21 using a multivariate analysis method; and a control The unit 3 controls any one of the characteristic value or the component concentration of the developer as a control amount and makes it a predetermined management value or a method within a management area. The developer management device of this embodiment includes control valves 41 to 43 connected to the control unit 3 and controlled.

顯影液管理裝置E藉由取樣配管15連接到顯影液貯留槽61。藉取樣泵14所取樣的顯影液通過取樣配管15導至測定部1內。在測定部1內,各測定手段11~13測定顯影液的特性值。測定後的顯影液通過回流配管16返回顯影液貯留槽61。 The developer management device E is connected to the developer storage tank 61 via a sampling pipe 15. The developer sampled by the sampling pump 14 is guided into the measurement unit 1 through the sampling pipe 15. In the measuring section 1, each of the measuring means 11 to 13 measures a characteristic value of the developing solution. The measured developer is returned to the developer storage tank 61 through the return pipe 16.

運算部2係接收一組被測定部1測定之顯影液的複數個特性值之測定值。運算部2係從所接收之一組的測定值藉由多變量分析法來算出顯影液的成分濃度。 The computing unit 2 receives measured values of a plurality of characteristic values of the developing solution measured by the measuring unit 1. The calculation unit 2 calculates the component concentration of the developing solution from the received measurement values by a multivariate analysis method.

測定動作、運算動作的詳細係和前述的顯影液的成分濃度測定裝置相同,故予以省略,以下,針對控制動作進行說明。 The details of the measurement operation and the calculation operation are the same as those of the component concentration measurement device of the developer described above, and therefore are omitted. The control operation will be described below.

顯影液管理裝置E係連接到管路81~83(含純水在內設為補充液)輸送要補給到顯影液的補充液。各管路81~83連接到在顯影液管理裝置E內被控制部3控制其動作之控制閥41~43。 The developing solution management device E is connected to the pipelines 81 to 83 (replenishing solution including pure water) to convey the replenishing solution to be replenished to the developing solution. Each of the pipes 81 to 83 is connected to control valves 41 to 43 controlled by the control unit 3 in the developer management device E.

控制部3接收來自測定部1的顯影液的特性值之測定值、及由運算部2所算出的成分濃度。控制部3係將所接收之顯影液的特性值或成分濃度當作控制量,依據此控制量,對控制閥41~43發出控制信號。控制係以例如其控制量成為既定的管理值或成為既定的管理區域內的方式進行。 The control unit 3 receives the measurement value of the characteristic value of the developing solution from the measurement unit 1 and the component concentration calculated by the calculation unit 2. The control unit 3 regards the characteristic value or component concentration of the received developer as a control amount, and sends a control signal to the control valves 41 to 43 based on the control amount. The control is performed, for example, such that the control amount becomes a predetermined management value or falls within a predetermined management area.

控制部3具備控制塊。例如,若顯影液管理裝置E是管理顯影液的三個成分濃度A、B、C者的話,則控制部3具備用以控制成分濃度A之控制塊31、用以控制成分濃度B之控制塊32、用以控制成分濃度C之控制塊33。若要管理的成分濃度是二個,則控制塊二個即可,又,若要管理的成分濃度比三個還多則對應其再具備同樣的控制塊。如此,控制部3可對控制閥41~43發出必要的控制信號。 The control unit 3 includes a control block. For example, if the developer management device E manages the three component concentrations A, B, and C of the developer, the control unit 3 includes a control block 31 for controlling the component concentration A, and a control block for controlling the component concentration B. 32. A control block 33 for controlling the component concentration C. If there are two component concentrations to be managed, then two control blocks may be required, and if there are more component concentrations to be managed than three, the same control block is provided accordingly. In this way, the control unit 3 can send necessary control signals to the control valves 41 to 43.

控制閥41~43是例如在接收「開」信號的期間進行開啟的控制閥,在是預先作了流量調節俾於閥開時可輸送既定流量的開閉控制閥之情況,控制部3在既定時間範圍將「開」信號送往設置在輸送應補給的補充液之管路上的控制閥,藉以向顯影液補給必要的量程度之顯影液管理所需的補充液。 The control valves 41 to 43 are, for example, control valves that are opened while receiving an "open" signal. In the case of an on-off control valve that can perform a predetermined flow rate adjustment when the valve is opened, the control unit 3 can perform a predetermined time. The range sends an "on" signal to a control valve provided on a pipeline for supplying the replenishment solution to be replenished, thereby replenishing the developer with a necessary amount of developer solution required for management of the developer solution.

控制閥的控制動作不受此例所限。在控制閥是依開閉切換信號切換閥之開狀態和閉狀態之情況下,透過控制部3將脈衝的開閉切換信號以既定時間間隔送往控制閥,向顯影液補給僅必要量的所需的補充液。 The control action of the control valve is not limited by this example. When the control valve is switched on and off according to the on-off switching signal, a pulsed on-off switching signal is sent to the control valve at a predetermined time interval through the control unit 3, and the developer is replenished with only the necessary amount of required Replenishment fluid.

再者,控制閥41~43亦可為能控制閥之開度者,亦可為單純的流量調整閥(針閥)和開閉控制閥之組合。控制閥41~43亦可為電磁閥,亦可為空氣壓操作閥(空氣操作閥)。 In addition, the control valves 41 to 43 may be those capable of controlling the opening degree of the valve, or a combination of a simple flow regulating valve (needle valve) and an on-off control valve. The control valves 41 to 43 may be solenoid valves or air pressure operated valves (air operated valves).

透過控制閥41~43基於控制部3所發出的控制信號進行動作,向顯影液補給顯影液管理所需的量之補充液。控制部3係依據從所接收的控制量(顯影液的特性值或成分濃度)求得之補充液的種類與其必要的補給量,向應控制的控制閥發出控制信號俾輸送必要的補給量。 The control valves 41 to 43 operate based on a control signal from the control unit 3 to supply the developer with an amount of replenisher required for developer management. The control unit 3 sends a control signal to the control valve to be controlled based on the type of replenishment liquid obtained from the received control amount (the characteristic value of the developer or the component concentration) and the necessary replenishment amount, and transmits the necessary replenishment amount.

如此,藉由本實施形態的顯影液管理裝置,依據所測定之顯影液的特性值或所算出之顯影液的成分濃度,能以此等成為既定的管理值或成為既定的管理區域內之方式維持管理顯影液。 In this way, with the developer management device of this embodiment, it can be maintained in such a manner that it becomes a predetermined management value or within a predetermined management area based on the measured characteristic value of the developer or the calculated component concentration of the developer. Manage developer.

更具體言之,如下那樣的顯影液管理是可能的。但是,以下例舉的顯影液管理係為例示,非受此所限者。 More specifically, the following developer management is possible. However, the developer management system exemplified below is an example and is not limited by this.

第一、係以針對重複使用之鹼性顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度各自可成為既定的管理值之方式向顯影液補給補充液之顯影液管理。例如,依據本發明的顯影液管理裝置,可將2.38%TMAH水溶液的鹼成分濃度管理成為2.375~2.390(wt%)的範圍內之既定的管理值較佳,更佳為2.380(wt%),可將溶解光阻劑濃度管理成為0.40(wt%)以下的既定的管理值較佳,更佳為0.15(wt%),可將吸收二氧化碳濃度管理成為0.40(wt%)以下的既定的管理值較佳,更佳為0.25(wt%)。 First, the developer solution management is to supply the developer with replenishment solution in such a way that the alkali component concentration, dissolved photoresist concentration, and carbon dioxide absorption concentration of the alkaline developer solution used repeatedly can become predetermined management values. For example, according to the developer management device of the present invention, the alkali component concentration of a 2.38% TMAH aqueous solution can be managed to a predetermined management value within a range of 2.375 to 2.390 (wt%), and more preferably 2.380 (wt%), The dissolved photoresist concentration can be managed to a predetermined management value of 0.40 (wt%) or less, and more preferably 0.15 (wt%), and the absorbed carbon dioxide concentration can be managed to a predetermined management value of 0.40 (wt%) or less. Preferably, more preferably, it is 0.25 (wt%).

第二、係以重複使用之鹼性顯影液的鹼成分濃度可成為既定的管理值、且溶解光阻劑濃度及吸收二氧化碳濃度各自可成為既定的管理值以下之方式向顯影液補給補充液之顯影液管理。例如,依據本發明的顯影液管理裝置,可將2.38%TMAH水溶液的鹼成分濃度管理成為2.375~2.390(wt%)的範圍內的既定的管理值較佳,更佳為2.380(wt%),可將溶解光阻劑濃度管理成為0.40(wt%)以下較佳,可將吸收二氧化碳濃度管理成為0.40(wt%)以下較佳。 Second, it is necessary to replenish the developer with replenishing solution in such a way that the alkali component concentration of the repeatedly used alkaline developer solution can become a predetermined management value, and the dissolved photoresist concentration and the carbon dioxide absorption concentration can each become a predetermined management value or less. Developer management. For example, according to the developer management device of the present invention, the alkali component concentration of a 2.38% TMAH aqueous solution can be managed to a predetermined management value in a range of 2.375 to 2.390 (wt%), and more preferably 2.380 (wt%), It is preferable to control the dissolved photoresist concentration to 0.40 (wt%) or less, and it is preferable to control the concentration of absorbed carbon dioxide to 0.40 (wt%) or less.

第三、係以針對重複使用之鹼性顯影液的鹼成分濃度、特定波長中的吸光度及吸收二氧化碳濃度各自可成為既定的管理值之方式向顯影液補給補充液之顯影液管理。例如,依據本發明的顯影液管理裝置,可將 2.38%TMAH水溶液的鹼成分濃度管理成為2.375~2.390(wt%)的範圍內的既定的管理值較佳,更佳為2.380(wt%),可將波長λ=560nm中的吸光度(槽光路長d=10mm)管理成為1.30(Abs.)以下的既定的管理值較佳,更佳為0.50(Abs.),可將吸收二氧化碳濃度管理成為0.40(wt%)以下的既定的管理值較佳,更佳為0.25(wt%)。 Third, the developer management is to supply the developer with replenishing solution in such a way that the alkali component concentration, the absorbance at a specific wavelength, and the absorbed carbon dioxide concentration of the alkaline developer used repeatedly can become predetermined management values. For example, according to the developer management device of the present invention, the alkali component concentration of a 2.38% TMAH aqueous solution can be managed to a predetermined management value in a range of 2.375 to 2.390 (wt%), and more preferably 2.380 (wt%), It is possible to manage the absorbance at a wavelength of λ = 560nm (slot optical path length d = 10mm) to a predetermined management value of 1.30 (Abs.) Or less, more preferably 0.50 (Abs.), And to manage the concentration of absorbed carbon dioxide to 0.40 The predetermined management value below (wt%) is better, more preferably 0.25 (wt%).

第四、係以重複使用之鹼性顯影液的鹼成分濃度可成為既定的管理值、特定波長中的吸光度可成為既定的管理區域內、及吸收二氧化碳濃度可成為既定的管理值以下之方式向顯影液補給補充液之顯影液管理。例如,依據本發明的顯影液管理裝置,可將2.38%TMAH水溶液的鹼成分濃度管理成為2.375~2.390(wt%)的範圍內的既定的管理值較佳,更佳為2.380(wt%),可將波長λ=560nm中的吸光度(槽光路長d=10mm)管理成為1.30(Abs.)以下較佳,更佳為0.65(Abs.)以下,可將吸收二氧化碳濃度管理成為0.40(wt%)以下較佳。 Fourth, the alkali component concentration of the reused alkaline developer can be set to a predetermined management value, the absorbance at a specific wavelength can be set in a predetermined management area, and the concentration of absorbed carbon dioxide can be set to a predetermined management value or less. Developer management for developer replenishment and replenishment. For example, according to the developer management device of the present invention, the alkali component concentration of a 2.38% TMAH aqueous solution can be managed to a predetermined management value in a range of 2.375 to 2.390 (wt%), and more preferably 2.380 (wt%), The absorbance at a wavelength of λ = 560nm (slot optical path length d = 10mm) can be managed to be 1.30 (Abs.) Or less, more preferably 0.65 (Abs.) Or less, and the concentration of absorbed carbon dioxide can be managed to 0.40 (wt%) The following is preferred.

第五、係以重複使用之鹼性顯影液的導電率、特定波長中的吸光度及吸收二氧化碳濃度各自可成為既定的管理值之方式向顯影液補給補充液之顯影液管理。例如,依據本發明的顯影液管理裝置,可將2.38%TMAH水溶液的導電率管理成為54.47~54.75(mS/cm)的範圍內的既定的管理值較佳,更佳為54.58(mS/cm),可將波 長λ=560nm中的吸光度(槽光路長d=10mm)管理成為1.3(Abs.)以下的既定的管理值較佳,更佳為0.50(Abs.),可將吸收二氧化碳濃度管理成為0.40(wt%)以下的既定的管理值較佳,更佳為0.25(wt%)。 Fifth, the developer management of replenishing the developer with replenishment is performed in such a manner that the conductivity of the alkaline developer used repeatedly, the absorbance at a specific wavelength, and the concentration of absorbed carbon dioxide can each become a predetermined management value. For example, according to the developer management device of the present invention, the conductivity of a 2.38% TMAH aqueous solution can be managed to a predetermined management value in the range of 54.47 to 54.75 (mS / cm), and more preferably 54.58 (mS / cm). It is better to manage the absorbance at a wavelength of λ = 560nm (the optical path length of the groove d = 10mm) to 1.3 (Abs.) Or less. The predetermined management value is better, more preferably 0.50 (Abs.). The concentration of absorbed carbon dioxide can be managed to A predetermined management value of 0.40 (wt%) or less is preferable, and more preferably 0.25 (wt%).

第六、係以重複使用之鹼性顯影液的導電率可成為既定的管理值、特定波長中的吸光度可成為既定的管理區域內、及吸收二氧化碳濃度可成為既定的管理值以下之方式向顯影液補給補充液之顯影液管理。例如,依據本發明的顯影液管理裝置,可將2.38%TMAH水溶液的導電率管理成為54.47~54.75(mS/cm)的範圍內的既定的管理值較佳,更佳為54.58(mS/cm),可將波長λ=560nm中的吸光度(槽光路長d=10mm)管理成為1.30(Abs.)以下較佳,更佳為0.65(Abs.)以下,可將吸收二氧化碳濃度管理成為0.40(wt%)以下較佳。 Sixth, the development is performed in such a manner that the conductivity of the reused alkaline developer can be a predetermined management value, the absorbance at a specific wavelength can be within a predetermined management area, and the concentration of absorbed carbon dioxide can be below the predetermined management value. Developer management of fluid replenishment. For example, according to the developer management device of the present invention, the conductivity of a 2.38% TMAH aqueous solution can be managed to a predetermined management value in the range of 54.47 to 54.75 (mS / cm), and more preferably 54.58 (mS / cm). It is possible to manage the absorbance at a wavelength of λ = 560nm (slot optical path length d = 10mm) to less than 1.30 (Abs.), More preferably 0.65 (Abs.) Or less, and to manage the concentration of absorbed carbon dioxide to 0.40 (wt%) ) The following is preferred.

因此,依據本實施形態的顯影液管理裝置,與習知者相比,由於能將顯影液的各成分濃度或各特性值高精度地管理既定的管理值或管理區域內,故可將顯影液維持在最佳的顯影性能,可實現所期望的線寬或殘餘膜厚。又,藉由顯示部DP可顯示各種數據及圖表。 Therefore, according to the developing solution management device of this embodiment, compared with a known person, since the concentration of each component or each characteristic value of the developing solution can be managed with high precision in a predetermined management value or a management area, the developing solution can be processed. Maintaining the best developing performance can achieve the desired line width or residual film thickness. In addition, various data and graphs can be displayed on the display portion DP.

[第十一實施形態]     [Eleventh Embodiment]    

圖19係用以說明設於輸送要向顯影液補給的補充液之管路上之控制閥41~43是位在本實施形態的顯影 液管理裝置的外部之實施形態的顯影液管理裝置的示意圖。 Fig. 19 is a schematic diagram for explaining a developing solution management device in which control valves 41 to 43 provided on a pipeline for supplying a replenishing solution to be supplied to the developing solution are external to the developing solution management device of this embodiment.

本實施形態的顯影液管理裝置E具備:測定部1,具備測定顯影液的複數個特性值之複數個測定手段;運算部2,含有利用多變量分析法的運算塊21;及控制部3,將顯影液的特性值或成分濃度中任一者作為控制量且使其成為既定的管理值或管理區域內之方式向設於補充液的補給管路上之控制閥41~43發出控制信號。 The developer management device E of this embodiment includes a measurement unit 1 including a plurality of measurement means for measuring a plurality of characteristic values of the developer, an operation unit 2 including an operation block 21 using a multivariate analysis method, and a control unit 3, The control signal 41 to 43 provided on the supply line of the replenishing liquid is controlled by using any one of the characteristic value or the component concentration of the developer as a control amount and making it a predetermined management value or a management area.

本實施形態中,被控制部3控制的控制閥41~43並非顯影液管理裝置E的內部零件。以和顯影液管理裝置E分開而設置在輸送補充液的管路上。顯影液管理裝置E未被連接到輸送補充液的此等管路上。其他的構成、動作等係和第十實施形態相同,故予以省略。 In this embodiment, the control valves 41 to 43 controlled by the control unit 3 are not internal components of the developer management device E. It is provided separately from the developer management device E on the pipeline for supplying replenishment. The developer management device E is not connected to these pipes for supplying the replenishing liquid. The other structures and operations are the same as those of the tenth embodiment, and are omitted.

[第十二實施形態]     [Twelfth Embodiment]    

圖20係具備一併擁有運算功能和控制功能的運算控制部23之顯影液管理裝置E的示意圖。 FIG. 20 is a schematic diagram of the developer management device E provided with the arithmetic control unit 23 having both arithmetic functions and control functions.

本發明的顯影液管理裝置E不受限於運算部2和控制部3構成為分開的裝置之情況。亦可構成為一併擁有運算功能和控制功能之一體的運算控制部23。作為運算控制部23,例如可舉出電腦等之多功能裝置。 The developer management device E of the present invention is not limited to the case where the arithmetic unit 2 and the control unit 3 are configured as separate devices. It may be configured as an arithmetic control unit 23 that has both the arithmetic function and the control function. Examples of the arithmetic control unit 23 include a multifunction device such as a computer.

電腦具備有輸入/輸出功能、收發功能、運算功能、控制功能、顯示功能等之非常多樣的功能。因此,本發明的顯影液管理裝置E之運算功能、控制功能可藉由電腦實現。運算控制部23只要連接到測定部1及控制閥41~43即可。此時,若將是從藉由多變量分析法所測定之顯影液的特性值算出成分濃度之運算處理程式、和是對控制閥41~43發出控制信號俾控制量(顯影液的特性值或成分濃度)成為既定的管理值或既定的管理區域內的控制程式安裝於電腦的話,則可將顯影液維持管理在既定的狀態。 The computer has a wide variety of functions including input / output functions, transceiver functions, calculation functions, control functions, and display functions. Therefore, the computing function and control function of the developer management device E of the present invention can be realized by a computer. The calculation control unit 23 may be connected to the measurement unit 1 and the control valves 41 to 43. At this time, if it is a calculation processing program that calculates the component concentration from the characteristic value of the developing solution measured by the multivariate analysis method, and it sends a control signal to the control valves 41 to 43 to control the amount (the characteristic value of the developing solution or If the component concentration) is a predetermined management value or a control program in a predetermined management area is installed in a computer, the developer can be maintained and managed in a predetermined state.

其他的構成、動作等係和第十實施形態相同,故予以省略。 The other structures and operations are the same as those of the tenth embodiment, and are omitted.

[第十三實施形態]     [Thirteenth Embodiment]    

圖21係管理顯影液的二個成分之顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置E係可較佳地適用於管理被管理成二氧化碳吸收較少之鹼性顯影液的鹼成分濃度和溶解光阻劑濃度之情況等。 FIG. 21 is a schematic diagram of a developer management device that manages two components of a developer. The developer management device E of the present embodiment is preferably applicable to the case where the concentration of the alkali component and the concentration of the dissolving photoresist in the alkaline developer that is managed to absorb less carbon dioxide are managed.

若設為第一測定手段11是測定與顯影液的成分中至少鹼成分濃度有關之顯影液的特性值的測定手段(例如測定導電率之導電率計)、且第二測定手段12是測定與顯影液的成分中至少溶解光阻劑濃度有關之顯影液的特性值的測定手段(例如測定λ=560nm中的吸光度之吸 光光度計)的話,由於運算部2含有利用多變量分析法的運算塊21,故可由藉多變量分析法所測定之顯影液的特性值,算出顯影液的鹼成分濃度及溶解光阻劑濃度。 Assume that the first measuring means 11 is a measuring means (for example, a conductivity meter for measuring the conductivity) for measuring the characteristic value of the developing solution related to the concentration of at least the alkali component among the components of the developing solution, and the second measuring means 12 is for measuring the If the component of the developing solution measures at least the characteristic value of the developing solution related to the concentration of the photoresist (for example, an absorbance photometer for measuring absorbance at λ = 560 nm), the arithmetic unit 2 includes a calculation block using a multivariate analysis method. 21. Therefore, the concentration of the alkaline component of the developer and the concentration of the dissolved photoresist can be calculated from the characteristic values of the developer by the multivariate analysis method.

於是,在控制塊31是以顯影液的導電率或鹼成分濃度可成為既定的管理值之方式向控制閥發出控制信號之控制塊,且控制塊32是以顯影液的特定波長(例如λ=560nm)中的吸光度或溶解光阻劑濃度可成為既定的管理值或管理區域內之方式向控制閥發出控制信號之控制塊時,由於控制部3係以可接收所測定之顯影液的特性值與所算出之顯影液的成分濃度的方式和測定部1及運算部2連接,故本實施態樣的顯影液管理裝置E,能以使顯影液的鹼成分濃度成為既定的管理值、使溶解光阻劑濃度成為既定的管理值或管理區域內的方式維持管理顯影液。 Therefore, the control block 31 sends a control signal to the control valve in such a manner that the conductivity or the concentration of the alkali component of the developing solution can become a predetermined management value, and the control block 32 is a specific wavelength of the developing solution (for example, λ = 560nm) The absorbance or dissolved photoresist concentration can be a predetermined control value or a control block that sends a control signal to the control valve in a manner within the management area, because the control unit 3 is capable of receiving the measured characteristic value of the developer. It is connected to the method of measuring the component concentration of the developer and the measurement unit 1 and the calculation unit 2. Therefore, the developer management device E of this embodiment can make the concentration of the alkali component of the developer into a predetermined management value and dissolve the solution. The developer is maintained and managed so that the photoresist concentration becomes a predetermined management value or within a management area.

其他的詳細係和其他實施形態相同,故予以省略。 The other details are the same as those of other embodiments, and are omitted.

[第十四實施形態]     [Fourteenth Embodiment]    

圖22係顯影液的二個成分藉由成分濃度作管理之顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係可較佳地適用於被管理成不吸收二氧化碳的鹼性顯影液的鹼成分濃度和溶解光阻劑濃度管理成管理濃度值的情況等。 FIG. 22 is a schematic diagram of a developing solution management device in which two components of a developing solution are managed by the component concentrations. The developing solution management device of this embodiment is preferably applicable to the case where the concentration of the alkali component of the alkaline developing solution that is managed to not absorb carbon dioxide and the concentration of the dissolved photoresist are managed to a managed concentration value.

若設為第一測定手段11是測定與顯影液的成分中至少鹼成分濃度有關之顯影液的特性值的測定手段(例如測定導電率之導電率計)、且第二測定手段12是測定與顯影液的成分中至少溶解光阻劑濃度有關之顯影液的特性值的測定手段(例如測定λ=560nm中的吸光度之吸光光度計)的話,由於運算部2含有利用多變量分析法的運算塊21,故可由藉多變量分析法所測定之顯影液的特性值算出顯影液的鹼成分濃度及溶解光阻劑濃度。 Assume that the first measuring means 11 is a measuring means (for example, a conductivity meter for measuring the conductivity) for measuring the characteristic value of the developing solution related to the concentration of at least the alkali component among the components of the developing solution, and the second measuring means 12 is for measuring the If the component of the developing solution measures at least the characteristic value of the developing solution related to the concentration of the photoresist (for example, an absorbance photometer for measuring absorbance at λ = 560 nm), the arithmetic unit 2 includes a calculation block using a multivariate analysis method. 21. Therefore, the concentration of the alkaline component of the developer and the concentration of the dissolved photoresist can be calculated from the characteristic values of the developer by the multivariate analysis method.

於是,若設為控制塊31是以鹼成分濃度可成為既定的管理值之方式向控制閥發出控制信號的控制塊,且控制塊32是以溶解光阻劑濃度可成為既定的管理值或管理值以下之方式向控制閥發出控制信號的控制塊的話,由於控制部3係以可接收所算出之顯影液的成分濃度的方式和運算部2連接,故依據本實施態樣的顯影液管理裝置E,能以使顯影液的鹼成分濃度成為既定的管理值、使溶解光阻劑濃度成為既定的管理值或管理值以下的方式維持管理顯影液。 Therefore, if the control block 31 is a control block that sends a control signal to the control valve in such a way that the concentration of the alkali component can become a predetermined management value, and the control block 32 is such that the concentration of the dissolved photoresist can be a predetermined management value or management If the control block sends a control signal to the control valve in the following manner, since the control unit 3 is connected to the calculation unit 2 so as to receive the calculated component concentration of the developer, the developer management device according to this embodiment E, the developer can be maintained and managed such that the alkali component concentration of the developer becomes a predetermined management value and the dissolved photoresist concentration becomes a predetermined management value or less.

其他的詳情係和其他實施形態相同,故予以省略。 Other details are the same as those of other embodiments, and are omitted.

[第十五實施形態]     [Fifteenth embodiment]    

圖23係顯影液的三個成分中的二個藉由特性值而另一個藉由成分濃度作管理的顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係可較佳地適用於鹼 性顯影液的鹼成分濃度藉由導電率、溶解光阻劑濃度藉由特定波長(例如λ=560nm)中的吸光度作管理、及吸收二氧化碳濃度藉由濃度作管理的情況等。 FIG. 23 is a schematic diagram of a developing solution management device in which two of the three components of the developing solution are controlled by characteristic values and the other is controlled by component concentration. The developing solution management device of this embodiment is preferably applicable to the management of the alkali component concentration of the alkaline developing solution by the conductivity, the dissolved photoresist concentration, and the absorbance at a specific wavelength (for example, λ = 560 nm), and In cases where the concentration of absorbed carbon dioxide is controlled by the concentration, etc.

若設為第一測定手段11是測定與顯影液的成分中至少鹼成分濃度有關之顯影液的特性值的測定手段(例如,測定導電率之導電率計)、第二測定手段12是測定與顯影液的成分中至少溶解光阻劑濃度有關之顯影液的特性值的測定手段(例如,測定λ=560nm中的吸光度之吸光光度計)、及第三測定手段是測定與顯影液的成分中至少吸收二氧化碳濃度有關之顯影液的特性值的測定手段(例如,測定密度之密度計)的話,由於運算部2含有利用多變量分析法的運算塊21,故可由藉多變量分析法所測定之顯影液的特性值,算出顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度。 Assume that the first measuring means 11 is a measuring means (for example, a conductivity meter for measuring the conductivity) for measuring the characteristic value of the developing solution related to the concentration of at least the alkali component among the components of the developing solution, and the second measuring means 12 is for measuring the A measuring means for measuring at least the characteristic value of the developing solution related to the concentration of the photoresist in the component of the developing solution (for example, an absorbance photometer for measuring the absorbance at λ = 560 nm), and the third measuring means measures the content of the developing solution. If the measuring means (for example, a density meter for measuring density) is used to measure at least the characteristic value of the developer that absorbs the carbon dioxide concentration, since the arithmetic unit 2 includes an arithmetic block 21 using a multivariate analysis method, it can be measured by the multivariate analysis method. The characteristic value of the developing solution was used to calculate the alkali component concentration, the dissolved photoresist concentration, and the carbon dioxide absorption concentration of the developing solution.

於是,在控制塊31是以顯影液的導電率可成為既定的管理值的方式向控制閥發出控制信號的控制塊、控制塊32是以顯影液的特性波長(例如λ=560nm)中的吸光度可成為既定的管理值或管理區域內的方式向控制閥發出控制信號的控制塊、且控制塊33是以吸收二氧化碳濃度可成為既定的管理值或管理值以下的方式向控制閥發出控制信號的控制塊時,由於控制部3係以可接收所測定之顯影液的特性值的方式和測定部1連接、且可接收所算出之顯影液的成分濃度的方式和運算部2連接,故依 據本實施態樣的顯影液管理裝置E,能以使顯影液的鹼成分濃度成為既定的管理值、使溶解光阻劑濃度成為既定的管理值或管理值以下、及使吸收二氧化碳濃度成為既定的管理值或管理值以下的方式維持管理顯影液。 Therefore, the control block 31 is a control block that sends a control signal to the control valve in such a manner that the conductivity of the developing solution can become a predetermined management value, and the control block 32 is an absorbance at a characteristic wavelength (for example, λ = 560 nm) of the developing solution. It can be a control block that sends a control signal to the control valve in a predetermined management value or in a management area, and the control block 33 sends a control signal to the control valve in such a manner that the carbon dioxide concentration can be a predetermined management value or less. When controlling the block, the control unit 3 is connected to the measurement unit 1 so as to receive the characteristic value of the developer solution measured, and connected to the calculation unit 2 so as to receive the calculated component concentration of the developer solution. The developer management device E according to the embodiment can control the concentration of the alkali component in the developer to a predetermined management value, the dissolved photoresist concentration to a predetermined management value or less, and the absorption carbon dioxide concentration to a predetermined management. The developer is maintained and managed in a manner below the value or the managed value.

其他的詳情係和其他實施形態相同,故予以省略。 Other details are the same as those of other embodiments, and are omitted.

[第十六實施形態]     [Sixteenth embodiment]    

圖24係顯影液的三個成分中的一個藉由特性值而另二個藉由成分濃度作管理之顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係可較佳地適用於鹼性顯影液的鹼成分濃度和吸收二氧化碳濃度藉由濃度作管理、及溶解光阻劑濃度藉由特定波長(例如,λ=560nm)中的吸光度作管理的情況等。 FIG. 24 is a schematic diagram of a developing solution management device in which one of the three components of the developing solution is controlled by the characteristic value and the other is controlled by the component concentration. The developing solution management device of this embodiment is preferably applicable to the alkali component concentration and carbon dioxide absorption concentration management of the alkaline developer, and the dissolving photoresist concentration by a specific wavelength (for example, λ = 560nm). The absorbance in the control.

若設為第一測定手段11是測定與顯影液的成分中至少鹼成分濃度有關之顯影液的特性值得測定手段(例如,測定導電率之導電率計)、第二測定手段12是測定與顯影液的成分中至少溶解光阻劑濃度有關之顯影液的特性值的測定手段(例如,測定λ=560nm中的吸光度之吸光光度計)、且第三測定手段是測定與顯影液的成分中至少吸收二氧化碳濃度有關之顯影液的特性值的測定手段(例如測定密度之密度計)的話,由於運算部2含有利用多變量分析法的運算塊21,故可從藉多變量分析法所測定之顯影液的特性值,算出顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度。 It is assumed that the first measurement means 11 is a measurement means (for example, a conductivity meter for measuring electrical conductivity) for measuring characteristics of the developer related to the concentration of at least an alkali component among the components of the developer, and the second measurement means 12 is measurement and development. A measuring means (for example, an absorbance photometer for measuring the absorbance at λ = 560 nm) of at least the characteristic value of the developing solution related to the concentration of the photoresist in the component of the solution, and the third measuring means is to measure at least If the measuring means for measuring the characteristic value of the developing solution related to the carbon dioxide concentration (for example, a density meter for measuring density), since the arithmetic unit 2 includes an arithmetic block 21 using a multivariate analysis method, it is possible to obtain the development value measured by the multivariate analysis method. The characteristic value of the liquid was used to calculate the alkali component concentration, the dissolved photoresist concentration, and the carbon dioxide absorption concentration of the developing solution.

於是,在控制塊31是以鹼成分濃度可成為既定的管理值的方式向控制閥發出控制信號的控制塊、控制塊32是以顯影液的特性波長(例如,λ=560nm)中的吸光度可成為既定的管理值或管理區域內的方式向控制閥發出控制信號的控制塊,控制塊33是以吸收二氧化碳濃度可成為既定的管理值或管理值以下的方式向控制閥發出控制信號的控制塊時,由於控制部3係以可接收所測定之顯影液的特性值的方式和測定部1連接、可接收所算出之顯影液的成分濃度的方式和運算部2連接,故依據本實施態樣的顯影液管理裝置E,能以使顯影液的鹼成分濃度成為既定的管理值、使溶解光阻劑濃度成為既定的管理值或管理值以下、及使吸收二氧化碳濃度成為既定的管理值或管理值以下的方式維持管理顯影液。 Therefore, the control block 31 is a control block that sends a control signal to the control valve in such a way that the concentration of the alkali component can become a predetermined management value, and the control block 32 is based on the absorbance of the characteristic wavelength of the developer (for example, λ = 560 nm). It is a control block that sends a control signal to a control valve in a manner that is a predetermined management value or in a management area. The control block 33 is a control block that sends a control signal to a control valve in a manner that absorbs carbon dioxide concentration and can become a predetermined management value or less. At this time, since the control unit 3 is connected to the measurement unit 1 so as to receive the characteristic value of the measured developer solution, and connected to the calculation unit 2 so as to receive the calculated component concentration of the developer solution, according to this embodiment The developer management device E can control the concentration of the alkali component in the developer to a predetermined management value, the dissolved photoresist concentration to a predetermined management value or less, and the absorption carbon dioxide concentration to a predetermined management value or management. The developer is maintained and managed in a manner below the value.

其他的詳情係和其他實施形態同樣,故予以省略。 The other details are the same as those of other embodiments, and are omitted.

[第十七實施形態]     [Seventeenth Embodiment]    

圖25係顯影液的三個成分藉由成分濃度作管理之顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係可較佳地適用於藉由濃度管理鹼性顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度的情況等。 FIG. 25 is a schematic diagram of a developing solution management device in which three components of the developing solution are managed by the component concentrations. The developing solution management device of this embodiment is preferably applicable to the case where the concentration of the alkali component of the alkaline developing solution, the concentration of the dissolved photoresist, and the concentration of the absorbed carbon dioxide are controlled by the concentration.

若設為第一測定手段11是測定與顯影液的成分中至少鹼成分濃度有關之顯影液的特性值的測定手段(例 如測定導電率之導電率計)、第二測定手段12是測定與顯影液的成分中至少溶解光阻劑濃度有關之顯影液的特性值的測定手段(例如測定λ=560nm中的吸光度之吸光光度計)、且第三測定手段是測定與顯影液的成分中至少吸收二氧化碳濃度有關之顯影液的特性值的測定手段(例如測定密度之密度計)的話,由於運算部2含有利用多變量分析法的運算塊21,故可從藉多變量分析法所測定之顯影液的特性值,算出顯影液的鹼成分濃度、溶解光阻劑濃度及吸收二氧化碳濃度。 Assume that the first measuring means 11 is a measuring means for measuring the characteristic value of the developing solution related to the concentration of at least the alkali component among the components of the developing solution (for example, a conductivity meter for measuring conductivity), and the second measuring means 12 is measuring and developing A measuring means (for example, an absorbance photometer for measuring the absorbance at λ = 560 nm) of a characteristic value of the developing solution in which at least the concentration of the photoresist is dissolved in the component of the liquid, and the third measuring means is to measure at least absorption in the component of the developing solution If the measuring means for measuring the characteristic value of the developing solution related to the carbon dioxide concentration (for example, a density meter for measuring density), since the arithmetic unit 2 includes an arithmetic block 21 using a multivariate analysis method, the developing solution measured by the multivariate analysis method can be used. The characteristic value of the developer is used to calculate the alkali component concentration, the dissolved photoresist concentration, and the carbon dioxide absorption concentration of the developing solution.

於是,在控制塊31是以鹼成分濃度可成為既定的管理值的方式向控制閥發出控制信號的控制塊、控制塊32是以容器光阻劑濃度可成為既定的管理值或管理值以下的方式向控制閥發出控制信號的控制塊、且控制塊33是以吸收二氧化碳濃度可成為既定的管理值或管理值以下的方式向控制閥發出控制信號的控制塊時,由於控制部3係以可接收所算出之顯影液的成分濃度的方式和運算部2連接,故依據本實施態樣的顯影液管理裝置E,能以使顯影液的鹼成分濃度成為既定的管理值、使溶解光阻劑濃度成為既定的管理值或管理值以下、及使吸收二氧化碳濃度成為既定的管理值或管理值以下的方式維持管理顯影液。 Therefore, the control block 31 sends a control signal to the control valve in such a way that the concentration of the alkali component can become the predetermined management value, and the control block 32 controls the container photoresist concentration to become the predetermined management value or less. When the control block sends a control signal to the control valve, and the control block 33 sends a control signal to the control valve in such a manner that the carbon dioxide absorption can reach a predetermined management value or less, the control unit 3 The method for receiving the calculated component concentration of the developer is connected to the calculation unit 2. Therefore, according to the developer management device E of this embodiment, the alkali component concentration of the developer can be set to a predetermined management value and the photoresist can be dissolved. The developer is maintained and managed so that the concentration becomes a predetermined management value or less and the absorbed carbon dioxide concentration becomes a predetermined management value or less.

其他的詳情係和其他實施形態同樣,故予以省略。 The other details are the same as those of other embodiments, and are omitted.

以上,如第十到第十七實施形態所示,本實施形態的顯影液管理裝置具備:測定部1,測定與鹼性顯影液的成分濃度有關之顯影液的複數個特性值;運算部2,藉由多變量分析法從藉測定部1所測定之複數個特性值算出顯影液的成分濃度;及控制部3,依據藉測定部1所測定之顯影液的特性值或藉運算部2所算出之顯影液的成分濃度向設於輸送要補給到顯影液的補充液之管路上之控制閥41~43發出控制信號。 As described above, as shown in the tenth to seventeenth embodiments, the developing solution management device of this embodiment includes the measuring section 1 that measures a plurality of characteristic values of the developing solution related to the component concentration of the alkaline developing solution, and the computing section 2 Using a multivariate analysis method to calculate the component concentration of the developing solution from the plurality of characteristic values measured by the measuring section 1; and the control section 3, based on the characteristic values of the developing solution measured by the measuring section 1 or the computing section 2 The calculated component concentration of the developing solution sends a control signal to the control valves 41 to 43 provided on the pipeline for supplying the replenishing solution to be supplied to the developing solution.

本實施形態的顯影液管理裝置中的測定部1及運算部2,係和顯影液的濃度測定裝置中的測定部1及運算部2同樣地可採用各種態樣。 The measurement section 1 and the calculation section 2 in the developer management device of this embodiment can adopt various aspects in the same manner as the measurement section 1 and the calculation section 2 in the developer concentration measurement device.

本實施形態的顯影液管理裝置中的控制部3沒必要設置成是與運算部2分開的裝置,亦能被安裝成一體的裝置(例如電腦)的控制功能和運算功能。又,如同圖11,控制部3亦能與測定部1、運算部2分開構成。控制部3只要是以可接收成為控制量的藉由測定部1所測定之特性值或藉由運算部2所算出之成分濃度的方式與測定部1、運算部2相互連絡即可。如此一來,則可依據所接收的特性值或成分濃度發出必要的控制信號。 The control unit 3 in the developer management apparatus of this embodiment does not need to be provided as a separate device from the calculation unit 2, and can also be installed as a control function and a calculation function of an integrated device (for example, a computer). As in FIG. 11, the control unit 3 can be configured separately from the measurement unit 1 and the calculation unit 2. The control unit 3 may be interconnected with the measurement unit 1 and the calculation unit 2 so as to be able to receive the characteristic value measured by the measurement unit 1 or the component concentration calculated by the calculation unit 2 as a control amount. In this way, a necessary control signal can be issued according to the received characteristic value or component concentration.

針對用以輸送補充液的管路,也可連接於本實施形態的顯影液管理裝置E,也可不連接。控制閥也可以不是顯影液管理裝置E的內部零件。若是以藉由控制部3 的控制信號而控制的方式與控制部3連絡的話,則亦可設置於顯影液管理裝置E的外部。 The pipeline for supplying the replenishment liquid may be connected to the developer management device E of the present embodiment or may not be connected. The control valve may not be an internal component of the developer management device E. If it communicates with the control part 3 so that it may be controlled by the control signal of the control part 3, it can also be provided outside the developer management apparatus E. As shown in FIG.

如以上所述,依據本發明的顯影液管理裝置,可將顯影液的各成分濃度或各特性值管理在既定的管理值或管理範圍內。因此,藉由本發明的顯影液管理裝置,可維持最佳的顯影性能,可實現所期望的線寬或殘餘膜厚。 As described above, according to the developer management device of the present invention, each component concentration or characteristic value of the developer can be managed within a predetermined management value or management range. Therefore, with the developer management device of the present invention, the optimal developing performance can be maintained, and a desired line width or residual film thickness can be achieved.

依據本發明的顯影液管理裝置,由於顯影液的各成分濃度被精確控制成既定的狀態,故能使顯影液的顯影性能更加精確而成為固定地作維護管理。因此,可期待將光阻劑顯影時的顯影速度固定且穩定化,使利用顯影處理的線寬或殘餘膜厚被固定化,提升製品品質,同時可期待有助益於實現更加微細化及高積體化。 According to the developing solution management device of the present invention, since the concentration of each component of the developing solution is accurately controlled to a predetermined state, the developing performance of the developing solution can be made more accurate and fixed for maintenance management. Therefore, it is expected that the development speed during the development of the photoresist can be fixed and stabilized, the line width or the residual film thickness by the development process can be fixed, and the product quality can be improved. At the same time, it can be expected to contribute to the realization of further miniaturization and high Integrated.

依據本發明的顯影液管理裝置,由於顯影液被自動維持在始終最佳的顯影性能,故使製品良率提升,同時變得不需要顯影液的更換作業,可期待有助益於減低運轉成本或廢液成本。 According to the developing solution management device of the present invention, since the developing solution is automatically maintained at always the best developing performance, the product yield is improved, and the replacement operation of the developing solution is not required, which can be expected to help reduce the operating cost Or waste liquid costs.

Claims (14)

一種顯影液的成分濃度測定裝置,具備:測定部,測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;及顯示部,顯示藉前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度中至少一者。     A component concentration measuring device for a developing solution includes: a measuring section that measures a plurality of characteristic values of the developing solution related to a component concentration of a developing solution that is alkaline that is repeatedly used; and a computing section based on the measured by the measuring section. The plurality of characteristic values are used to calculate a component concentration of the developing solution by a multivariate analysis method; and a display unit displays at least one of the characteristic value measured by the measurement unit and the component concentration calculated by the calculation unit. .     一種顯影液的成分濃度測定裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;及顯示部,將記憶在前述測定數據記憶部之成分濃度的數據,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示。     A component concentration measuring device for a developing solution includes: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; and a computing section that measures the foregoing In the case of a plurality of characteristic values, the component concentration of the developer is calculated by a multivariate analysis method based on the plurality of characteristic values measured by the measurement section; the measurement data storage section will use the component concentration calculated by the calculation section , And memorize together with at least one of the time and the elapsed time from the start of the measurement; and the display section, the component concentration data memorized in the aforementioned measurement data storage section to memorize the time or The elapsed time from the start of measurement is used as an indicator to display the graph.     一種顯影液的成分濃度測定裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值; 運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;及顯示部,將記憶在前述測定數據記憶部之特性值及成分濃度中至少一者,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示。     A component concentration measuring device for a developing solution includes: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to the component concentration of a developing solution that exhibits alkalinity that is repeatedly used; and a calculation section that measures the foregoing In the case of a plurality of characteristic values, the component concentration of the developer is calculated by a multivariate analysis method based on the plurality of characteristic values measured by the measurement unit; the measurement data storage unit will use the characteristic values measured by the measurement unit. And the component concentration calculated by the calculation unit, together with at least one of the time and the elapsed time from the start of measurement; and a display unit that stores the characteristic value and component concentration stored in the measurement data storage unit At least one of the graphs is displayed by using the time memorized in the measurement data storage unit or the elapsed time from the start of measurement as an indicator.     如請求項3之顯影液的成分濃度測定裝置,其更具備:顯示切換手段,將要顯示於前述顯示部的圖表切換為前述顯影液的特性值的圖表或前述顯影液的成分濃度的圖表。     For example, the developer concentration component measuring device of claim 3 further includes display switching means for switching a graph to be displayed on the display section to a graph of characteristic values of the developer or a graph of component concentration of the developer.     一種顯影液管理裝置,具備:測定部,測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;顯示部,顯示以前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度中至少一者;及 控制部,依據從以前述測定部所測定之前述顯影液的複數個特性值及以前述運算部所算出之前述顯影液的成分濃度中所選擇之管理對象項目的測定值或算出值,對設在用以輸送要被補給到前述顯影液的補充液之管路上之控制閥發出控制信號。     A developing solution management device includes: a measuring section that measures a plurality of characteristic values of the developing solution related to a component concentration of a developing solution that exhibits alkalinity that is repeatedly used; and a computing section that is based on the plurality of measured values measured by the measuring section. The characteristic value calculates the component concentration of the developer by a multivariate analysis method; the display section displays at least one of the characteristic value measured by the measurement section and the component concentration calculated by the calculation section; and a control section , Based on the measured value or calculated value of the management target item selected from the plurality of characteristic values of the developing solution measured by the measuring section and the component concentration of the developing solution calculated by the calculating section, A control signal is sent from a control valve on a pipeline for supplying a replenishing solution to be supplied to the developer.     一種顯影液管理裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值;運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將以前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;顯示部,將記憶在前述測定數據記憶部之成分濃度的數據,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示;及控制部,依據從以前述測定部所測定之前述顯影液的複數個特性值及以前述運算部所算出之前述顯影液的成分濃度中所選擇之管理對象項目的測定值或算出值,對設在用以輸送要被補給到前述顯影液的補充液之管路上之控制閥發出控制信號。     A developing solution management device includes a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to a component concentration of a developing solution that exhibits alkalinity, and a computing section that measures the plurality of characteristics each time the measuring section measures the plurality of characteristics. When the value is calculated, the component concentration of the developer is calculated by multivariate analysis based on the plurality of characteristic values measured by the measurement section; the measurement data storage section will use the component concentration calculated by the calculation section together with the time And at least one of the elapsed time from the start of the measurement is memorized together; the display unit stores the component concentration data memorized in the aforementioned measurement data storage unit to memorize the time in the aforementioned measurement data storage unit or calculate from the measurement start The elapsed time from the beginning is used as an indicator to display the graph; and the control unit is based on the management selected from the plurality of characteristic values of the developing solution measured by the measuring unit and the component concentration of the developing solution calculated by the computing unit. The measured value or calculated value of the target item is set to a replenishment provided to transport the developer to be replenished to the developer. The fluid control valve of the pipeline control signals.     一種顯影液管理裝置,具備:測定部,重複測定與重複使用之呈現鹼性的顯影液的成分濃度有關之前述顯影液的複數個特性值; 運算部,每當前述測定部測定前述複數個特性值時,依據藉前述測定部所測定之前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;測定數據記憶部,將藉前述測定部所測定之前述特性值及藉前述運算部所算出之前述成分濃度,連同時刻及從測定開始算起之經過時間中至少任一者一起進行記憶;顯示部,將記憶在前述測定數據記憶部之特性值及成分濃度中至少一者,以記憶在前述測定數據記憶部之時刻或從測定開始算起之經過時間作為指標進行圖表顯示;及控制部,依據從以前述測定部所測定之前述顯影液的複數個特性值及以前述運算部所算出之前述顯影液的成分濃度中所選擇之管理對象項目的測定值或算出值,對設在用以輸送要被補給到前述顯影液的補充液之管路上之控制閥發出控制信號。     A developing solution management device includes: a measuring section that repeatedly measures a plurality of characteristic values of the developing solution related to a component concentration of a developing solution that exhibits alkalinity; and a computing section that measures the plurality of characteristics each time the measuring section When the value is measured, the component concentration of the developer is calculated by multivariate analysis based on the plurality of characteristic values measured by the measurement unit; the measurement data storage unit will use the characteristic values measured by the measurement unit and The aforementioned component concentration calculated by the arithmetic unit is memorized together with at least one of the time and the elapsed time from the start of measurement; the display unit memorizes at least one of the characteristic value and the constituent concentration of the aforementioned measurement data storage unit Display the chart with the time memorized in the measurement data storage section or the elapsed time from the start of the measurement as an indicator; and the control section, based on the plurality of characteristic values of the developing solution measured by the measurement section and the foregoing The measurement value or calculation of the management target item selected among the component concentrations of the developer solution calculated by the calculation section. The output value sends a control signal to a control valve provided on a pipeline for conveying the replenishing solution to be replenished to the developer.     如請求項7之顯影液管理裝置,其更具備:顯示切換手段,將要顯示於前述顯示部的圖表切換為前述顯影液的特性值的圖表或前述顯影液的成分濃度的圖表。     For example, the developer management device of claim 7 further includes display switching means for switching a graph to be displayed on the display section to a graph of a characteristic value of the developer or a graph of a component concentration of the developer.     如請求項5至8中任一項之顯影液管理裝置,其中前述測定部具備:第一測定手段,測定與前述顯影液的成分中至少鹼成分的濃度有關之前述顯影液的特性值;及 第二測定手段,測定與前述顯影液的成分濃度中至少溶解於前述顯影液的光阻劑的濃度有關之前述顯影液的特性值。     The developer management device according to any one of claims 5 to 8, wherein the measurement unit includes: a first measurement means that measures a characteristic value of the developer relative to a concentration of at least an alkali component among the components of the developer; and The second measuring means measures a characteristic value of the developer in relation to a concentration of at least a photoresist dissolved in the developer in a component concentration of the developer.     如請求項9之顯影液管理裝置,其中前述運算部具備算出前述顯影液的鹼成分的濃度及光阻劑的濃度之運算塊,前述控制部具備:第一控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之鹼成分的濃度成為既定的管理值;及第二控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之光阻劑的濃度成為既定的管理值以下。     For example, the developer management device of claim 9, wherein the calculation unit includes a calculation block that calculates the concentration of the alkali component of the developer and the concentration of the photoresist, and the control unit includes a first control block that controls the control valve. Signal, the concentration of the alkali component calculated by the operation block becomes a predetermined management value; and the second control block sends a control signal to the control valve, and the concentration of the photoresist calculated by the operation block becomes Below the established management value.     如請求項9之顯影液管理裝置,其中前述測定部更具備第三測定手段,測定與前述顯影液的成分中至少前述顯影液所吸收的二氧化碳的濃度有關之前述顯影液的特性值。     The developing solution management device according to claim 9, wherein the measuring unit further includes a third measuring means for measuring a characteristic value of the developing solution related to at least a concentration of carbon dioxide absorbed by the developing solution among the components of the developing solution.     如請求項11之顯影液管理裝置,其中前述運算部具備算出前述顯影液的二氧化碳的濃度之運算塊,前述控制部具備:第三控制塊,對前述控制閥發出控制信號,俾藉由前述第一測定手段所測定之前述顯影液的特性值成為既定的管理值; 第四控制塊,對前述控制閥發出控制信號,俾藉由前述第二測定手段所測定之前述顯影液的特性值落入既定的管理區域;及第五控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之二氧化碳的濃度成為既定的管理值以下。     For example, the developer management device of claim 11, wherein the calculation unit includes a calculation block that calculates the carbon dioxide concentration of the developer, and the control unit includes a third control block that sends a control signal to the control valve, and uses the first A characteristic value of the developing solution measured by a measuring means becomes a predetermined management value; a fourth control block sends a control signal to the control valve, and the characteristic value of the developing solution measured by the second measuring means falls into A predetermined management area; and a fifth control block that sends a control signal to the control valve so that the concentration of carbon dioxide calculated by the calculation block becomes less than a predetermined management value.     如請求項11之顯影液管理裝置,其中前述運算部具備算出前述顯影液的鹼成分的濃度及二氧化碳的濃度之運算塊,前述控制部具備:第一控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之鹼成分的濃度成為既定的管理值;第四控制塊,對前述控制閥發出控制信號,俾藉由前述第二測定手段所測定之前述顯影液的特性值落入既定的管理區域;及第五控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之二氧化碳的濃度成為既定的管理值以下。     For example, the developer management device of claim 11, wherein the calculation unit includes a calculation block that calculates the concentration of the alkali component and the concentration of carbon dioxide of the developer, and the control unit includes a first control block that sends a control signal to the control valve,俾 The concentration of the alkali component calculated by the calculation block becomes a predetermined management value; the fourth control block sends a control signal to the control valve, and 特性 the characteristic value of the developer measured by the second measurement means falls And the fifth control block sends a control signal to the control valve, and the carbon dioxide concentration calculated by the calculation block becomes equal to or lower than the predetermined management value.     如請求項11之顯影液管理裝置,其中前述運算部具備算出前述顯影液的鹼成分的濃度、光阻劑的濃度及二氧化碳的濃度之運算塊,前述控制部具備:第一控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之鹼成分的濃度成為既定的管理值; 第二控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之光阻劑的濃度成為既定的管理值以下;及第五控制塊,對前述控制閥發出控制信號,俾藉由前述運算塊所算出之二氧化碳的濃度成為既定的管理值以下。     For example, the developer management device of claim 11, wherein the calculation unit includes a calculation block that calculates the concentration of the alkali component, the concentration of the photoresist, and the concentration of carbon dioxide of the developer, and the control unit includes a first control block, The control valve sends out a control signal, and the concentration of the alkali component calculated by the operation block becomes a predetermined management value. The second control block sends a control signal to the control valve, and the photoresist calculated by the operation block. And the fifth control block sends a control signal to the control valve, and the carbon dioxide concentration calculated by the calculation block becomes the predetermined management value or less.    
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