WO2019208837A1 - Device and method for recycling developer - Google Patents

Device and method for recycling developer Download PDF

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Publication number
WO2019208837A1
WO2019208837A1 PCT/KR2018/004670 KR2018004670W WO2019208837A1 WO 2019208837 A1 WO2019208837 A1 WO 2019208837A1 KR 2018004670 W KR2018004670 W KR 2018004670W WO 2019208837 A1 WO2019208837 A1 WO 2019208837A1
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WO
WIPO (PCT)
Prior art keywords
developing
developer
waste
solution
photoresist
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PCT/KR2018/004670
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French (fr)
Korean (ko)
Inventor
조명국
박경용
Original Assignee
Cho Myung Kook
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Publication date
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Priority to PCT/KR2018/004670 priority Critical patent/WO2019208837A1/en
Publication of WO2019208837A1 publication Critical patent/WO2019208837A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking

Definitions

  • the present invention relates to an apparatus and a method for regenerating a developer, and more particularly, to regenerate a developer waste recovered after a developing process such as an LCD manufacturing process or a semiconductor manufacturing process, using a difference in specific gravity between the developer and the photoresist in the developer waste.
  • a developer regenerating apparatus and method characterized by separating and removing a resist.
  • Photoresist is a resin that causes chemical changes when irradiated with light.
  • the photoresist reacts with light from the ultraviolet region to the wavelength of the visible region and causes changes in melting and coagulation.
  • Photoresist is one of the essential materials for the production of thin film transistor (TFT) -LCD ICs and LSIs.
  • TFT thin film transistor
  • the photoresist is a negative photoresist, which is a photosensitive resin in which the polymer is insolubilized only in the part where light is exposed
  • the positive photoresist is a photosensitive resin in which the polymer is solubilized by the polymer solubilizing only in the part where the light is exposed. It is divided into resists.
  • Negative photoresists include aromatic bisazides, methacrylic acid esters, cinnamon esters, and the like positive photoresists such as polymethyl methacrylate, naphthylnondiazide, Polybutene-1-sulfone and the like.
  • the positive type is the mainstream, and the usage ratio of the positive type and the negative type is about 7: 3.
  • the photoresist is applied to the wafer, the circuit pattern of the IC is formed by the exposure apparatus, and the development of the chemical in the development process leaves the photoresist only on the part where the light is touched or the part that is not touched.
  • Tetramethylammonium hydroxide that is, TMAH (Tetramethylammonium hydroxide) or the like is used as the developer, and as the development process proceeds, the photoresist is dissolved in the developer.
  • TMAH Tetramethylammonium hydroxide
  • the developer is a toxic chemical, there is a cost and safety problem in its treatment. Therefore, it is necessary to regenerate and use the developing waste used in the developing process.
  • Regeneration of the positive developer waste solution is widely used as a method of removing the photoresist using a nano-filter, as shown in Patent No. 10-1266956.
  • nanofilters can remove particles or polymers of about several nm.
  • Positive photoresist has a molecular weight of 2,000 to 4,000, so it is trapped in nanofilters.
  • Ultrapure water and TMAH have a molecular weight of 200 or less, so they pass through nanofilters. do.
  • Such a positive developer waste recycling method has high efficiency and shows about 90% satisfaction level.
  • the photoresist included in the negative developer waste fluid has a molecular weight of about 10,000 to 500,000, and easily coagulates after the developing process. There is a problem in terms of efficiency. Therefore, in the related art, it was difficult to regenerate the negative developer waste, and in many cases, a new developer was used after discarding all the developer waste used for a certain period in the developing process.
  • Patent No. 10-1266956 filters a photoresist using a mesh filter array, but if it is determined that cleaning of the mesh filter array is necessary, the photoresist attached to the mesh filter array is removed.
  • a photoacrylic developer regeneration system of an LCD manufacturing process for cleaning with thinner and ultrapure water and performing backwashing and developer filling using ultrapure water is proposed.
  • the method of regenerating the developing waste solution by using the mesh filter array as described above has a problem in terms of environmental treatment cost due to the inevitable waste water generation due to the cleaning of ultra-pure water and an organic cleaner such as thinner.
  • the mesh filter array is periodically cleaned and backwashed, it is difficult to completely remove the attached photoresist, which requires additional maintenance work, and there is a risk of leakage of harmful chemicals in the process.
  • there is often a problem of deterioration of the quality of the developer regeneration because the criterion for the necessity of cleaning and backwashing of the mesh filter array does not exist other than the differential pressure measured by the front and rear pressure sensors of the mesh filter array.
  • the negative developer waste regeneration efficiency of the conventional regeneration device is only about 50 to 70%, and the overall efficiency decreases due to the use of an organic-only cleaner and an ultrapure water. Therefore, it is not commercialized in TFT-LCD manufacturing. to be.
  • Patent Document 1 Japanese Patent Laid-Open No. 2003-0035814 "Developer Regeneration Device", 2003. 05. 09.
  • Patent Document 2 Registered Patent 10-1266956 "Photoacrylic Developer Regeneration System of LCD Manufacturing Process", 2013. 05. 30.
  • the present invention is to solve the above problems of the prior art
  • An object of the present invention is to provide a developer regeneration apparatus and method for efficiently removing photoresist in a developer without a filter by removing the photoresist by using a difference in specific gravity of the developer and the photoresist in the developer. .
  • Another object of the present invention is to provide a developing solution regeneration apparatus and method which does not require the use of a cleaning agent, ultrapure water or the like for cleaning the filter, thereby preventing environmental pollution and environmental treatment costs.
  • Still another object of the present invention is to remove the photoresist by using the difference in specific gravity of the developer and the photoresist in the developing waste solution, and to improve the separation efficiency through a pretreatment to lower the temperature of the developing waste developer. To provide.
  • Still another object of the present invention is to develop a developer regeneration solution by removing photoresist from a developer waste solution, and a developer regeneration apparatus and method for supplying a high quality developer regeneration solution to a developing process through turbidity management of the developer regeneration solution.
  • Still another object of the present invention is a developer regeneration apparatus configured to repeat the process of separating and removing photoresist from a developing waste solution until a predetermined absorbance is satisfied, so that a developing regenerating solution having excellent quality can be supplied to a developing process; To provide a way.
  • the present invention is implemented by the embodiment having the following configuration to achieve the above object.
  • the developer recycling apparatus of the present invention a developer waste supply means for supplying the developer waste recovered after the developing step, and the developer waste solution supplied from the developer waste supply means, the developer in the developer waste solution;
  • Developing regeneration solution generating means for separating and removing the photoresist by using a difference in specific gravity between the photoresist and the photoresist to generate a developing regeneration solution in which the photoresist is separated from the developing waste solution;
  • a regeneration solution supply means for supplying the developer waste recovered after the developing step, and the developer waste solution supplied from the developer waste supply means, the developer in the developer waste solution.
  • the developer recycling apparatus of the present invention is characterized in that the developer waste supply means includes cooling means for lowering the temperature of the developer waste solution.
  • the developer regeneration device of the present invention is characterized in that the developer regeneration solution supply means includes heating means for raising the temperature of the developer regeneration solution.
  • the developing regeneration solution generating means makes the developing waste solution in a swirl flow, and separates and removes the photoresist by applying a centrifugal force to the photoresist. It is characterized by including a cyclone.
  • the developer recycling apparatus of the present invention is characterized in that the developer waste solution supply means includes a first pressurizing means for generating a supply pressure of the developer waste solution.
  • the developer regeneration apparatus of the present invention is characterized in that the developer regeneration solution generating means further comprises a waste tank for collecting the photoresist removed from the cyclone.
  • the developer regeneration device is characterized in that the developer regeneration solution supply means includes a second pressurizing means for generating a supply pressure of the developer regeneration solution.
  • the developer regeneration device of the present invention when the photoresist concentration of the developer regeneration solution generated by the developer regeneration solution generation means does not meet a predetermined criterion, And developing developer recycling means for reintroducing the developing waste solution into the developing waste solution.
  • the developer regeneration solution recycling means includes: turbidity measuring means for measuring the turbidity of the developer regeneration solution, and measurement results of the turbidity measurement means are pre-set. And a recycling line for reflowing the developing regeneration solution into the developing waste supply means as the developing waste solution when the standard is not set within the standard.
  • the developing solution regeneration method of the present invention comprises: a developing waste supply step of supplying the developing waste solution collected after the developing step by the developing waste supply means to the developing regeneration solution generating means, and the developing regeneration solution; A developing and regenerating solution generating step of generating and removing a photoresist from the developing waste solution by separating and removing the photoresist using a difference in the specific gravity of the developing solution and the photoresist in the developing waste supplied with the generating means; And a developing regeneration solution supplying step of supplying the developing regeneration solution generated by the liquid supply means to the developing process.
  • the developing solution regeneration method of the present invention is characterized in that the developing solution supplying step includes a cooling step in which cooling means lowers the temperature of the developing waste solution.
  • the developing solution regeneration method of the present invention is characterized in that the developing regeneration solution supplying step includes a heating step in which a heating means raises the temperature of the developing regeneration solution.
  • the cyclone in the developing solution regeneration method of the present invention, causes the developing waste solution to turn and separates the photoresist by applying a centrifugal force to the photoresist. It characterized in that it comprises a photoresist separation step of removing.
  • the developing solution regeneration method of the present invention is characterized in that the developing waste supplying step includes a first supply pressure generating step in which the first pressurizing means increases the pressure of the developing waste solution. do.
  • the developer regeneration solution generating step after the photoresist separation step, the cyclone is a developer regeneration of the photoresist separated from the developer waste solution
  • a developer regeneration solution discharge step of discharging the liquid, and the waste tank further comprises a waste liquid collection step of collecting the photoresist removed from the cyclone, wherein the developer regeneration solution discharge step and the waste liquid collection step is carried out at the same time do.
  • the developing solution regeneration method of the present invention wherein the developing regeneration solution supply step includes a second supply pressure generating step of the second pressing means to increase the pressure of the developing regeneration solution It features.
  • the developer regeneration method of the present invention the turbidity of the developer regeneration solution by measuring the turbidity of the developer regeneration solution between the step of generating the developer and the developer regeneration solution is less than the preset criteria
  • the method further includes a developing regeneration turbidity measurement step of returning to the developing waste supplying step and supplying the developing regeneration solution to the developing waste solution and, if the predetermined criterion is satisfied, the developing regeneration solution supplying step. It features.
  • the present invention has the following effects through the above-described configuration.
  • the present invention has the effect of providing a developer regeneration apparatus and method for efficiently removing the photoresist in the developer without a filter by removing the photoresist by using the difference in the specific gravity of the developer and the photoresist in the developer.
  • the present invention has the effect of providing a developer regeneration apparatus and method that does not require the use of a cleaning agent, ultrapure water, etc. for the cleaning of the filter to avoid environmental pollution and environmental treatment costs.
  • the present invention has the effect of providing a developer regeneration apparatus and method that can prevent the safety accidents due to leakage of the developer waste during the maintenance process is not required because periodic maintenance is not required.
  • the present invention has the effect of providing a developer regeneration apparatus and method for removing the photoresist by using the difference in specific gravity of the developer and the photoresist in the developer waste solution, thereby improving separation efficiency through pretreatment of lowering the temperature of the developer waste solution. Promote.
  • the present invention has the effect of providing a developer regeneration apparatus and method which can satisfy the conditions for using the developer regeneration solution in the developing process through post-treatment of heating the developer regeneration solution generated by removing the photoresist from the developer waste solution.
  • the present invention has the effect of providing a developer regeneration apparatus and method for removing the photoresist from the developer waste solution to generate a developer regeneration solution, and to provide a high quality developer regeneration solution to the developing process through turbidity management of the developer regeneration solution. Shows.
  • the present invention is configured to repeat the process of separating and removing the photoresist from the developer waste solution until a predetermined absorbance is satisfied, thereby providing a developer regenerating apparatus and method for supplying a high quality developing regeneration solution to a developing process. Holds.
  • FIG. 1 is a block diagram of a developer reproducing apparatus according to an embodiment of the present invention.
  • FIG. 2 is a flow chart of a developer regeneration method according to an embodiment of the present invention.
  • Figure 3 is a flow chart of one embodiment of the developing waste supply step
  • Figure 4 is a flow chart of one embodiment of a developing regeneration solution generation step
  • FIG. 5 is a flowchart of an embodiment of a developer regeneration solution supply step
  • FIG. 1 is a block diagram of a developer reproducing apparatus according to an embodiment of the present invention.
  • the developer regeneration apparatus of the present invention includes a developer waste supply means 1, a developer regeneration solution generating means 3, a developer regeneration solution supply means 5, and a developer regeneration solution recycling means 7, have.
  • the developing waste supply means 1 serves to supply the developing waste recovered after the developing process.
  • the developing waste supply means 1 supplies the developing waste solution to the developing regeneration solution generating means 3.
  • the developing waste supply means 1 may include a developing waste recovery tank 11, a first pressurizing means 12, a cooling means 13, a first thermometer 14, and a first pressure gauge 15.
  • the developing waste recovery tank 11 is a portion for recovering and storing the developing waste used in the developing process from the developer through the recovery line L1.
  • the developer waste solution means a developer used by being used in a developing unit in a developing process.
  • an aqueous TMAH solution of a certain concentration for example, 2.38 wt% is generally used, and the developing waste solution contains a photoresist component.
  • the developer regenerating apparatus of the present invention mainly targets a developer waste solution containing a negative photoresist, and a general composition of photoacryl (or acrylate resin for photoresist), which is a typical negative photoresist, is unsaturated carboxylic acid.
  • Such photoresist is present in a small particle state in the developing waste solution, and the size thereof is 2 ⁇ m or more when the temperature is 23 ° C.
  • the specific gravity of the photoresist is 1.1 to 1.5, which is relatively larger than the specific gravity of the developing solution in the developing waste solution.
  • the developer waste recovery tank 11 may include a level gauge 111 for measuring the amount of the developer waste stored therein, and overall control of the developer regeneration apparatus may be performed based on the measurement result.
  • the first pressurizing means 12 serves to generate a supply pressure of the developing waste solution.
  • the developing waste solution is transferred to the developing regeneration solution generating means 3 through a developing waste supply pipe L2, and is introduced into the cyclone 31 included in the developing regeneration solution generating means 3 as described below. Inlet pressure above the level is required.
  • the first pressurizing means 12 serves to increase the pressure of the developing waste solution to a predetermined level for this purpose.
  • the first pressurizing means 12 may be a pump, and when the pump is used, the pump pressure is preferably operated at 0.1 to 0.35 MPa.
  • the cooling means 13 may be implemented as a heat exchanger as a part for lowering the temperature of the developing waste solution.
  • the temperature of the developing waste liquid in the developing waste recovery tank 11 is about 23 ° C., and the cooling means 13 lowers the temperature of the developing waste liquid to 5 to 20 ° C.
  • the reason for lowering the temperature of the developing waste solution through the cooling means 13 is to increase the specific gravity of the photoresist in the developing waste solution so that the photoresist can be separated more efficiently in the developing regeneration solution generating means 3. To help.
  • the specific gravity of the photoresist in the developing waste solution rises to 1.3 to 2.0.
  • the first thermometer 14 is for measuring the temperature of the developing waste solution passed through the cooling means 13.
  • the developing waste liquid is transferred to the developing waste recovery tank 11 to lower the temperature of the developing waste liquid to the set temperature. It is also possible to additionally configure the developer waste return line to pass through again the cooling means 13 by sending again.
  • the first pressure gauge 15 is a component for measuring whether the developing waste liquid introduced into the cyclone 31 of the developing regeneration solution generating means 3 to be described later satisfies the input pressure condition of the cyclone 31.
  • the output of the first pressurizing means 12 may be increased or decreased based on the result measured by the first pressure gauge 15.
  • the developer regeneration solution generating means (3) receives the developer waste solution from the developer waste supply means (1) and separates and removes the photoresist by using a difference between the specific gravity of the developer and the photoresist in the developer waste solution.
  • the photoresist serves to generate a separated developer regeneration solution.
  • the developing regeneration solution generating means 3 may include a cyclone 31, a waste liquid tank 32, and a waste liquid pump 33.
  • the cyclone 31 is a device that turns the developer waste into a swirling flow and separates and removes the photoresist by applying a centrifugal force to the photoresist.
  • the cyclone 31 applies a centrifugal force to the injected developer waste, so that the photoresist having a large specific gravity is separated and discharged downward, and the developer having a specific gravity smaller than the photoresist is raised and discharged. That is, by using the difference in specific gravity between the developer and the photoresist in the developing waste solution without using a filter, the photoresist is separated and removed in the developing waste solution to generate a developing regeneration solution in which the photoresist is removed from the developing waste solution. At this time, the difference in specific gravity is further increased by the cooling means 13 in front of the cyclone 31, and the separation efficiency is further increased.
  • the cyclone 31 Since the cyclone 31 is different from the conventional nanofilters or mesh filter arrays used to separate the photoresist from the developing waste solution, the separated photoresist adheres to the filter surface so that the cyclone 31 does not degrade the filtration performance due to clogging. There is no need to perform regular maintenance. Therefore, the use of cleaning agents, ultrapure water, etc. for cleaning is not required, so there is no problem of environmental pollution or an increase in production cost, and prevents the occurrence of safety accidents due to harmful chemicals during maintenance.
  • the waste tank 32 is a portion for collecting and storing the photoresist removed from the cyclone 31.
  • the waste tank 32 is preferably disposed below the cyclone 31, and the waste tank 32 stores a developing waste solution in which photoresist is concentrated.
  • the waste liquid pump 33 serves to discharge the developing waste liquid in which the photoresist is concentrated in the waste liquid tank 32 to the outside. That is, the waste liquid pump 33 provides a discharge pressure to the discharge pipe (L3).
  • the developing regeneration solution supply means 5 serves to supply the developing regeneration solution to a developing process.
  • the developer regeneration solution generated by the developer regeneration solution generating means 3 is recovered to the developer waste recovery tank 11, and the developer regeneration solution supplying means is supplied by the developer regeneration solution supply means 5.
  • the developing solution recovery tank 11 is supplied to a developing device which performs the developing process through the line L4 (in this case, the developing waste recovery tank 11 removes the photoresist from the developing waste solution to generate the developing regeneration solution.
  • the developing regeneration solution supply means 5 may include a second pressurizing means 51, a heating means 52, a second thermometer 53, and a second pressure gauge 54.
  • the second pressurizing means 51 serves to generate a supply pressure necessary for supplying the developing regeneration solution to the developing unit of the developing process through the developing regeneration solution supply line L4.
  • the second pressurizing means 51 may be implemented by a pump or the like like the first pressurizing means 12.
  • the heating means 52 serves to increase the temperature of the developing regeneration solution.
  • a heater or the like may be used.
  • the temperature of the developing waste solution is reduced to 5 to 20 ° C. through the cooling means 13.
  • the temperature of is lower than the temperature used in the developing process.
  • the heating means 52 serves to raise the low temperature of the developing regeneration solution to match the conditions of the developing process.
  • the second thermometer 53 is for measuring the temperature of the developing regeneration solution that has passed through the heating means 52. That is, by measuring whether the temperature of the developing regeneration solution that has passed through the heating means 52 has a temperature corresponding to the use conditions of the developing process, the heating means 52 can be controlled based on the measured value. .
  • the developing and regeneration solution may be increased to increase the temperature of the development and regeneration to a temperature corresponding to the use condition of the developing process. It is also possible to additionally configure a developing regeneration liquid return line for returning to the heating means (52).
  • the second pressure gauge 54 serves to measure the pressure of the developing regeneration solution in the developing regeneration solution supply line L4. Based on the measurement result of the second pressure gauge 54, it is possible to determine whether the developing regeneration solution has a suitable pressure condition to be introduced into the developing process, and based on this, the output of the second pressing means 51 can be adjusted. .
  • the developer regeneration solution recycling means 7 supplies the developer regeneration solution to the developer waste solution supply means when the photoresist concentration of the developer regeneration solution generated by the developer regeneration solution generation means 3 does not meet a predetermined standard. ) To reintroduce into developing waste.
  • the developer regeneration solution recycling means 7 may include a turbidity measuring means 71 and a recycling line 72.
  • the turbidity measuring means 71 measures the turbidity of the developer regeneration solution in order to determine the content of the photoresist of the developer regeneration solution.
  • the turbidity measuring means 71 may be an absorbance meter.
  • the developing regeneration solution generated by the developing regeneration solution generating means 3 may include a photoresist that is not completely separated or removed from the cyclone 31 or exceeds a desired photoresist concentration. Although the photoresist is still largely contained in the developing regeneration solution due to the condition of the developing waste solution or the operating conditions of the developing regeneration solution generating means 3, the quality of the developing process is again supplied to the developing process developer. Will cause degradation.
  • the turbidity measuring means 71 can determine whether the content of the photoresist of the developer regeneration solution satisfies a predetermined standard.
  • the light transmittance of the photoacryl is 95% or more when the photoresist is photoacryl, a range of wavelengths that can be measured through a photoacryl developer waste sample test for a wavelength band not measured by the conventional turbidity measuring means is found.
  • the turbidity should be measured with wavelengths in the corresponding wavelength range.
  • using a tungsten lamp and an UV-Visible spectro photometer light is detected with a photodiode array, while transmitting light through the 200-800 nm wavelength range of photoacryl mixed in a TMAH solution. It can be seen that the light does not transmit well in the wavelength range of 210 ⁇ 220nm. Therefore, in this case, by measuring the absorbance of light in the wavelength of 210nm to 220nm using an absorbance meter, it is possible to accurately measure the photoacryl haze of the photoacryl developer waste solution.
  • the recirculation line 72 serves to reintroduce the developing regeneration solution into the developing waste supply means 1 as the developing waste solution when the measurement result of the absorbance meter does not meet a preset standard.
  • the developing regeneration solution generated by the developing regeneration solution generating means 3 is recovered to the developing waste recovery tank 11.
  • the recovered developer regeneration solution may be supplied to the developer for performing the developing process by the developer regeneration solution supply means 5 through the developer regeneration solution supply line L4 or may be supplied back to the developer regeneration solution generating means 3. It is supposed to be.
  • the recycling line 72 is configured to re-introduce the developing regeneration solution into the developing waste supply means 1 as the developing waste solution when the measurement result of the turbidity measuring means does not meet a predetermined standard.
  • the recycling line 72 is configured to re-introduce the developing regeneration solution into the developing waste supply means 1 as the developing waste solution when the measurement result of the turbidity measuring means does not meet a predetermined standard.
  • the recirculation line 72 is connected to the turbidity measuring means.
  • the measurement result does not meet the preset criteria, it may be configured to only play the role of allowing the developer regeneration solution to be re-introduced into the developer waste solution supply means (1).
  • FIG. 2 is a flowchart of a developer regeneration method according to an embodiment of the present invention.
  • the developer regeneration method according to an embodiment of the present invention, developing waste supply step (S1), developing regeneration solution generation step (S3), developing regeneration turbidity measurement step (S5) and developing regeneration solution supply step (S7) is included.
  • the developer regeneration method may be performed through the developer regeneration device according to the present invention as described above.
  • the developing waste solution supplying step S1 is a step in which the developing waste solution supplying means supplies the developing waste solution recovered after the developing process to the developing regeneration solution generating means 3.
  • 3 is a flow chart of an embodiment of the developing waste solution supply step S1.
  • the developing waste supply step S1 includes a first supply pressure generating step S11 and a cooling step S13. It is included.
  • the first supply pressure generating step S11 is a step in which the first pressurizing means 12 increases the pressure of the developing waste solution.
  • the developing waste solution is transferred to the developing regeneration solution generating means 3 through the developing waste supply pipe L2, and as described above, when the developing waste solution is introduced into the cyclone 31 included in the developing regeneration solution generating means 3, Pressure above level is required.
  • the first supply pressure generating step (S11) the pressure of the developing waste liquid is raised to an appropriate pressure to be introduced into the cyclone (31).
  • the first pressurizing means 12 may be a pump as described above, and when the pump is used, the pump pressure is preferably operated at 0.1 to 0.35 MPa.
  • the cooling step (S13) is a step in which the cooling means 13 lowers the temperature of the developing waste solution.
  • the developer regeneration method of the present invention is mainly a developer waste solution containing a negative photoresist, the general composition and characteristics of the negative photoresist photoacryl (or acrylate resin for photoresist) is as described above. .
  • the cooling step S11 may be performed by lowering the temperature of the developing waste solution to 5 to 20 ° C.
  • the temperature of the developing waste solution in the developing waste recovery tank 11 is about 23 ° C.
  • the specific gravity of the photoresist contained therein is about 1.1 to 1.5.
  • the specific gravity of the photoresist in the developing waste solution rises to 1.3 to 2.0. Separation of the photoresist in the generating means 3 can be made more efficient.
  • the cooling step S13 when the temperature of the developing waste solution is not lowered to the set temperature so that the next step proceeds while the temperature of the developing waste solution is lowered to the set temperature, the developer waste is re-introduced into the cooling means 13. It is desirable to proceed in such a way that repeated cooling is achieved. That is, the cooling step (S13) may be repeatedly performed until the developer waste solution is lowered to a set temperature.
  • the developing regeneration solution generating step (S3) is performed by separating and removing the photoresist by using a difference between the specific gravity of the developing solution and the photoresist in the developing waste supplied with the developing regeneration solution generating means (3). In this step, the removed developer regeneration solution is generated.
  • 4 shows a flow chart of an embodiment of the developing regeneration solution generating step S3. Referring to this, the developing regeneration solution generating step S3 includes a photoresist separation step S31 and a developing regeneration solution discharge step S3. S33) and waste liquid collection step (S35) can be performed.
  • the photoresist separation step (S31) is a step in which the cyclone 31 separates and removes the photoresist by turning the developer waste into a turning flow and applying a centrifugal force to the photoresist.
  • the cyclone 31 applies centrifugal force to the injected developer waste, so that the photoresist having a large specific gravity is separated and discharged downward, and the developer having a lighter specific gravity than the photoresist is discharged upward. Make it.
  • the photoresist can be separated and removed in the developing waste solution by using a difference in specific gravity without using a filter.
  • the developing regeneration solution discharging step (S33) is a step in which the cyclone 31 discharges the developing regeneration solution from which the photoresist is separated from the developing waste solution. As described above, when the photoresist is separated from the cyclone 31, a developing regeneration solution in which the photoresist is separated from the developing waste solution is generated, and the developing regeneration solution has a low specific gravity and moves to an upper portion of the cyclone 31. Will be discharged.
  • the waste liquid collection step (S35) is a step in which the waste tank 32 collects the photoresist removed from the cyclone 31.
  • the waste liquid collection step (S35) may proceed simultaneously with the developing regeneration solution discharge step (S33).
  • the photoresist having a relatively large specific gravity in the developer waste solution is separated and removed from the cyclone 31 and discharged downward.
  • the photoresist is concentrated in the waste tank 32 through the waste liquid collection step S35. Waste fluid will be stored.
  • the developing waste solution in which the photoresist stored in the waste tank 32 is concentrated in the waste liquid collection step S35 may be discharged to the outside through the discharge pipe L3 by the discharge pressure provided by the waste liquid pump 33. .
  • the developer regeneration turbidity measurement step (S5) is to measure the turbidity of the developer regeneration solution, and if it does not meet the preset criteria, return to the developer waste solution supply step (S1) and supply the developer regeneration solution to the developer waste solution.
  • the developing regeneration solution supplying step (S7) is performed.
  • the developer regeneration turbidity measurement step S5 may be performed by the developer regeneration recycling means 7. That is, the turbidity measuring means 71 measures the turbidity of the developer regeneration solution, and when the measured turbidity does not meet a preset standard, the developer regeneration solution supply means is supplied to the developer regeneration solution through the recycling line 72. It can be carried out by reflowing into developing waste solution in (1).
  • the developing regeneration solution generated in the developing regeneration solution generation step S3 may include photoresist that may not be completely separated and removed from the cyclone 31. Although the photoresist is still largely contained in the developing regeneration solution due to the condition of the developing waste solution or the operating conditions of the developing regeneration solution generating means 3, the quality of the developing process is again supplied to the developing process developer. Will cause degradation. However, as described above, the turbidity standard of the developing regeneration solution is set, and based on this, the content of the photoresist in the developing regeneration solution is judged, and whether the supply to the developing process is determined or not, the quality of the developing regeneration solution and the developing process are determined. Can be maintained above a certain level.
  • the developing regeneration solution supplying step S7 is a step of supplying the developing regeneration solution generated by the developing regeneration solution supply means 5 to a developing process.
  • 5 is a flow chart of an embodiment of the developer regeneration solution supply step S7.
  • the developer regeneration solution supply step S7 includes a second supply pressure generation step S71 and a heating step S73. ) May be performed.
  • the second supply pressure generating step (S71) is a step in which the second pressing means 51 increases the pressure of the developing regeneration solution. Specifically, the second supply pressure generating step (S71) is a step of generating a supply pressure required to supply the developing regeneration solution to the developing unit of the developing process.
  • the heating step (S73) is a step in which the heating means 52 raises the temperature of the developing regeneration solution. As described above, the developing waste solution is subjected to the cooling step (S13) and the temperature thereof is lowered to 5 to 20 ° C. in order to increase the specific gravity of the photoresist in the developing waste solution. It is lower than the temperature used in. Through the heating step (S73), the temperature of the developing regeneration solution is increased to meet the conditions of use of the developing process.

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Abstract

A developer recycling device according to the present invention comprises: a waste developer supply means for supplying a waste developer recovered after a developing process; a recycled developer generating means for receiving the waste developer supplied from the waste developer supply means and separating/removing photoresist by using the difference in specific gravity between the developer and the photoresist inside the waste developer, thereby generating a recycled developer by separating the photoresist from the waste developer; and a recycled developer supply means for supplying the recycled developer in the developing process. In addition, a developer recycling method according to the present invention comprises: a waste developer supply step of a waste developer supply means supplying a waste developer recovered after a developing process to a waste developer generating means; a recycled developer generating step of the waste developer generating means separating/removing photoresist by using the difference in specific gravity between the developer and the photoresist inside the supplied waste developer, thereby generating a recycled developer by separating the photoresist from the waste developer; and a recycled developer supply step of a recycled developer supply means supplying the generated recycled developer in the developing process.

Description

현상액 재생 장치 및 방법Developer Regeneration Apparatus and Method
본 발명은 현상액 재생 장치 및 방법에 관한 것으로 더욱 상세하게는, LCD 제조공정, 반도체 제조공정 등의 현상공정 후 회수된 현상폐액을 재생하되 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거하는 것을 특징으로 하는 현상액 재생 장치 및 방법에 관한 것이다.The present invention relates to an apparatus and a method for regenerating a developer, and more particularly, to regenerate a developer waste recovered after a developing process such as an LCD manufacturing process or a semiconductor manufacturing process, using a difference in specific gravity between the developer and the photoresist in the developer waste. A developer regenerating apparatus and method characterized by separating and removing a resist.
포토레지스트(photoresist)는 빛을 조사하면 화학 변화를 일으키는 수지로서 자외선영역에서 가시광선영역의 파장까지의 빛에 반응하여 용해, 응고의 변화를 일으킨다. 포토레지스트는 TFT(Thin Film Transistor)-LCD IC, LSI 등의 생산에 반드시 필요한 재료 중 하나이다.Photoresist is a resin that causes chemical changes when irradiated with light. The photoresist reacts with light from the ultraviolet region to the wavelength of the visible region and causes changes in melting and coagulation. Photoresist is one of the essential materials for the production of thin film transistor (TFT) -LCD ICs and LSIs.
포토레지스트는 빛이 닿은 부분만 고분자가 불용화하여 포토레지스트가 남는 감광성 수지인 네가티브(negative)형 포토레지스트, 빛이 닿은 부분만 고분자가 가용화하여 포토레지스트가 사라지는 감광성 수지인 포지티브(positive)형 포토레지스트로 구분된다. 네가티브형 포토레지스트로는 방향족 비스아지드(bis-azide), 메타크릴산 에스텔(methacrylic acid ester), 계피산 에스텔 등이 있고, 포지티브형 포토레지스트로는 폴리메타크릴산 메틸, 나프트키논디아지드, 폴리브텐-1-슬폰 등이 있다. 실제 생산라인에서는 포지티브형이 주류인데, 포지티브형과 네거티브형의 사용비율은 대략적으로 7:3 정도이다.The photoresist is a negative photoresist, which is a photosensitive resin in which the polymer is insolubilized only in the part where light is exposed, and the positive photoresist is a photosensitive resin in which the polymer is solubilized by the polymer solubilizing only in the part where the light is exposed. It is divided into resists. Negative photoresists include aromatic bisazides, methacrylic acid esters, cinnamon esters, and the like positive photoresists such as polymethyl methacrylate, naphthylnondiazide, Polybutene-1-sulfone and the like. In the actual production line, the positive type is the mainstream, and the usage ratio of the positive type and the negative type is about 7: 3.
포토리소그래피(photolithography)공정에서 웨이퍼(wafer)에 포토레지스트를 칠하고, 노광장치로 IC의 회로 패턴을 형성하고, 현상공정에서 약품으로 현상하면 빛이 닿은 부분 또는 닿지 않은 부분만 포토레지스트가 남게 된다. 현상액으로는 수산화 테트라메틸 암모늄 즉, TMAH(Tetramethylammonium hydroxide) 등이 사용되는데, 현상공정이 진행됨에 따라 현상액에는 포토레지스트가 용해되게 된다. 현상액은 유독성 화학물질이므로 그 처리 시에 비용 및 안전상의 문제가 발생한다. 따라서 현상공정에 사용된 현상폐액을 재생하여 사용하는 것이 필요하다.In the photolithography process, the photoresist is applied to the wafer, the circuit pattern of the IC is formed by the exposure apparatus, and the development of the chemical in the development process leaves the photoresist only on the part where the light is touched or the part that is not touched. . Tetramethylammonium hydroxide, that is, TMAH (Tetramethylammonium hydroxide) or the like is used as the developer, and as the development process proceeds, the photoresist is dissolved in the developer. As the developer is a toxic chemical, there is a cost and safety problem in its treatment. Therefore, it is necessary to regenerate and use the developing waste used in the developing process.
포지티브형 현상폐액의 재생은 등록특허 10-1266956 등에 나타난 바와 같이 나노필터를 이용하여 포토레지스트를 제거하는 방식이 널리 사용되고 있다. 통상적으로 나노필터는 수㎚ 정도의 입자나 고분자를 제거할 수 있는데, 포지티브형 포토레지스트는 분자량이 2,000~4,000 정도여서 나노필터에 걸리게 되고, 초순수와 TMAH는 분자량이 200 이하이므로 나노필터를 통과하게 된다. 이와 같은 포지티브형 현상폐액의 재생방식은 효율이 높아 90% 정도의 만족 수준을 보인다.Regeneration of the positive developer waste solution is widely used as a method of removing the photoresist using a nano-filter, as shown in Patent No. 10-1266956. Normally, nanofilters can remove particles or polymers of about several nm. Positive photoresist has a molecular weight of 2,000 to 4,000, so it is trapped in nanofilters. Ultrapure water and TMAH have a molecular weight of 200 or less, so they pass through nanofilters. do. Such a positive developer waste recycling method has high efficiency and shows about 90% satisfaction level.
이와 비교하여 네거티브형 현상폐액에 포함되어 있는 포토레지스트는 통상적으로 분자량이 10,000~500,000 정도로 크고, 현상공정 이후 쉽게 응고되는 특성이 있어, 나노필터를 이용한 제거방식을 사용할 경우 나노필터의 폐색이 매우 쉽게 발생하게 되어 효율성 측면에서 문제가 있다. 따라서 종래에는 네거티브형 현상폐액의 재생이 어려움이 있었으며, 현상공정에 일정 기간 사용된 현상폐액을 전량 폐기하고 새로운 현상액을 사용하는 경우가 많은 실정이었다.In comparison, the photoresist included in the negative developer waste fluid has a molecular weight of about 10,000 to 500,000, and easily coagulates after the developing process. There is a problem in terms of efficiency. Therefore, in the related art, it was difficult to regenerate the negative developer waste, and in many cases, a new developer was used after discarding all the developer waste used for a certain period in the developing process.
등록특허 10-1266956가 이와 같은 문제를 해결하고자 메시필터어레이(mesh filter array)를 이용하여 포토레지스트를 필터링하되, 메시필터어레이의 세척이 필요하다고 판단되는 경우에는 메시필터어레이에 부착되는 포토레지스트를 신너와 초순수를 이용하여 크리닝하고, 초순수를 이용한 역세척 및 현상액 충전 등의 과정을 수행하는 엘씨디 제조 공정의 포토아크릴 현상액 재생 시스템을 제시하고 있다.In order to solve such a problem, Patent No. 10-1266956 filters a photoresist using a mesh filter array, but if it is determined that cleaning of the mesh filter array is necessary, the photoresist attached to the mesh filter array is removed. A photoacrylic developer regeneration system of an LCD manufacturing process for cleaning with thinner and ultrapure water and performing backwashing and developer filling using ultrapure water is proposed.
그러나 이와 같이 메시필터어레이를 지속 사용하여 현상폐액을 재생하는 방식은 신너와 같은 전용 유기 세정제 및 초순수 세척에 따른 폐수발생이 불가피하여 환경처리비용 면에서 문제가 있다. 또한, 메시필터어레이를 주기적으로 크리닝 및 역세척 해주어도 부착된 포토레지스트가 완전히 제거되기는 어려우므로 추가적인 유지보수 작업이 필요하고, 그 과정에서 유해 화학물질의 누출 등의 위험이 있다. 더 나아가, 메시필터어레이의 크리닝 및 역세척 필요성에 대한 판단 기준이 메시필터어레이의 전.후단 압력센서에 의해 측정되는 차압 외엔 존재하지 않아 현상액 재생의 품질 저하의 문제가 발생하는 경우가 많다.However, the method of regenerating the developing waste solution by using the mesh filter array as described above has a problem in terms of environmental treatment cost due to the inevitable waste water generation due to the cleaning of ultra-pure water and an organic cleaner such as thinner. In addition, even if the mesh filter array is periodically cleaned and backwashed, it is difficult to completely remove the attached photoresist, which requires additional maintenance work, and there is a risk of leakage of harmful chemicals in the process. Furthermore, there is often a problem of deterioration of the quality of the developer regeneration because the criterion for the necessity of cleaning and backwashing of the mesh filter array does not exist other than the differential pressure measured by the front and rear pressure sensors of the mesh filter array.
그 결과 종래 재생장치의 네거티브형 현상폐액 재생효율은 50~70％ 정도에 그치고 있으며, 유기 전용 세정제 사용과 초순수 세정수 사용으로 전체적인 효율이 떨어짐에 따라, TFT-LCD 제조 등에 있어 상용화되지 못하고 있는 실정이다.As a result, the negative developer waste regeneration efficiency of the conventional regeneration device is only about 50 to 70%, and the overall efficiency decreases due to the use of an organic-only cleaner and an ultrapure water. Therefore, it is not commercialized in TFT-LCD manufacturing. to be.
(특허문헌 1) 공개특허 특2003-0035814 "현상액 재생장치", 2003. 05. 09.(Patent Document 1) Japanese Patent Laid-Open No. 2003-0035814 "Developer Regeneration Device", 2003. 05. 09.
(특허문헌 2) 등록특허 10-1266956 "엘씨디 제조 공정의 포토아크릴 현상액 재생 시스템", 2013. 05. 30.(Patent Document 2) Registered Patent 10-1266956 "Photoacrylic Developer Regeneration System of LCD Manufacturing Process", 2013. 05. 30.
본 발명은 전술한 종래기술의 문제점을 해결하기 위한 것으로,The present invention is to solve the above problems of the prior art,
본 발명의 목적은, 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용하여 포토레지스트를 제거함으로써 필터가 없이도 현상폐액 내의 포토레지스트를 효율적으로 제거할 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.SUMMARY OF THE INVENTION An object of the present invention is to provide a developer regeneration apparatus and method for efficiently removing photoresist in a developer without a filter by removing the photoresist by using a difference in specific gravity of the developer and the photoresist in the developer. .
본 발명의 다른 목적은, 필터의 세척을 위한 세정제, 초순수 등의 사용이 필요없어 환경오염 및 환경처리비용이 발생하지 않게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.Another object of the present invention is to provide a developing solution regeneration apparatus and method which does not require the use of a cleaning agent, ultrapure water or the like for cleaning the filter, thereby preventing environmental pollution and environmental treatment costs.
본 발명의 또 다른 목적은, 주기적인 유지보수가 요구되지 않아 유지보수 과정에서의 현상폐액의 누출 등으로 인한 안전사고를 미연에 방지할 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.It is still another object of the present invention to provide a developer regeneration apparatus and method for preventing safety accidents due to leakage of developer waste in the maintenance process since periodic maintenance is not required.
본 발명의 또 다른 목적은, 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용하여 포토레지스트를 제거하되 현상폐액의 온도를 하강시키는 전처리를 통해 분리 효율이 향상될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.Still another object of the present invention is to remove the photoresist by using the difference in specific gravity of the developer and the photoresist in the developing waste solution, and to improve the separation efficiency through a pretreatment to lower the temperature of the developing waste developer. To provide.
본 발명의 또 다른 목적은, 현상폐액에서 포토레지스트를 제거하여 생성된 현상재생액을 가열하는 후처리를 통해 현상공정에서의 현상재생액 사용조건이 만족될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.It is still another object of the present invention to provide a developer regeneration apparatus and method for satisfying conditions for developing regeneration solution in a developing process through post-treatment of heating a regeneration solution generated by removing photoresist from a developing waste solution. It is.
본 발명의 또 다른 목적은, 현상폐액에서 포토레지스트를 제거하여 현상재생액을 생성하되 현상재생액의 탁도 관리를 통해 현상공정에 품질이 우수한 현상재생액이 공급될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.Still another object of the present invention is to develop a developer regeneration solution by removing photoresist from a developer waste solution, and a developer regeneration apparatus and method for supplying a high quality developer regeneration solution to a developing process through turbidity management of the developer regeneration solution. To provide.
본 발명의 또 다른 목적은, 사전에 설정된 흡광도를 만족할 때까지 현상폐액에서 포토레지스트를 분리제거하는 과정을 반복하도록 구성되어 현상공정에 품질이 우수한 현상재생액이 공급될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 것이다.Still another object of the present invention is a developer regeneration apparatus configured to repeat the process of separating and removing photoresist from a developing waste solution until a predetermined absorbance is satisfied, so that a developing regenerating solution having excellent quality can be supplied to a developing process; To provide a way.
본 발명은 앞서 본 목적을 달성하기 위해서 다음과 같은 구성을 가진 실시예에 의해서 구현된다.The present invention is implemented by the embodiment having the following configuration to achieve the above object.
본 발명의 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 현상공정 후 회수된 현상폐액을 공급하는 현상폐액 공급수단과, 상기 현상폐액 공급수단으로부터 상기 현상폐액을 공급받아 상기 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거하여 상기 현상폐액에서 상기 포토레지스트가 분리된 현상재생액을 생성하는 현상재생액 생성수단과, 현상공정에 상기 현상재생액을 공급하는 현상재생액 공급수단을 포함한다.According to one embodiment of the present invention, the developer recycling apparatus of the present invention, a developer waste supply means for supplying the developer waste recovered after the developing step, and the developer waste solution supplied from the developer waste supply means, the developer in the developer waste solution; Developing regeneration solution generating means for separating and removing the photoresist by using a difference in specific gravity between the photoresist and the photoresist to generate a developing regeneration solution in which the photoresist is separated from the developing waste solution; A regeneration solution supply means.
본 발명의 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상폐액 공급수단은 상기 현상폐액의 온도를 하강시키는 냉각수단을 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer recycling apparatus of the present invention is characterized in that the developer waste supply means includes cooling means for lowering the temperature of the developer waste solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상재생액 공급수단은 상기 현상재생액의 온도를 상승시키는 가열수단을 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer regeneration device of the present invention is characterized in that the developer regeneration solution supply means includes heating means for raising the temperature of the developer regeneration solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상재생액 생성수단은 상기 현상폐액을 선회 흐름으로 만들고, 상기 포토레지스트에 원심력을 작용시킴으로써 상기 포토레지스트를 분리 제거하는 사이클론을 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, in the developing solution regeneration device of the present invention, the developing regeneration solution generating means makes the developing waste solution in a swirl flow, and separates and removes the photoresist by applying a centrifugal force to the photoresist. It is characterized by including a cyclone.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상폐액 공급수단은 상기 현상폐액의 공급압력을 생성하기 위한 제1가압수단을 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer recycling apparatus of the present invention is characterized in that the developer waste solution supply means includes a first pressurizing means for generating a supply pressure of the developer waste solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상재생액 생성수단은 상기 사이클론에서 제거된 포토레지스트를 수거하는 폐액탱크를 더 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer regeneration apparatus of the present invention is characterized in that the developer regeneration solution generating means further comprises a waste tank for collecting the photoresist removed from the cyclone.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상재생액 공급수단은 상기 현상재생액의 공급압력을 생성하기 위한 제2가압수단을 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer regeneration device according to the present invention is characterized in that the developer regeneration solution supply means includes a second pressurizing means for generating a supply pressure of the developer regeneration solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상재생액 생성수단이 생성한 현상재생액의 포토레지스트 농도가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단에 현상폐액으로 재유입시켜주는 현상재생액 재순환수단을 더 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer regeneration device of the present invention, when the photoresist concentration of the developer regeneration solution generated by the developer regeneration solution generation means does not meet a predetermined criterion, And developing developer recycling means for reintroducing the developing waste solution into the developing waste solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 장치는, 상기 현상재생액 재순환수단은, 상기 현상재생액의 탁도를 측정하는 탁도 측정수단과, 상기 탁도 측정수단의 측정 결과가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단에 현상폐액으로 재유입되도록 해주는 재순환라인을 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, in the developer regeneration device of the present invention, the developer regeneration solution recycling means includes: turbidity measuring means for measuring the turbidity of the developer regeneration solution, and measurement results of the turbidity measurement means are pre-set. And a recycling line for reflowing the developing regeneration solution into the developing waste supply means as the developing waste solution when the standard is not set within the standard.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 현상폐액 공급수단이 현상공정 후 회수된 현상폐액을 현상재생액 생성수단에 공급하는 현상폐액 공급단계와, 상기 현상재생액 생성수단이 공급된 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거하여 상기 현상폐액에서 상기 포토레지스트가 제거된 현상재생액을 생성하는 현상재생액 생성단계와, 현상재생액 공급수단이 생성된 현상재생액을 현상공정에 공급하는 현상재생액 공급단계를 포함한다.According to another embodiment of the present invention, the developing solution regeneration method of the present invention comprises: a developing waste supply step of supplying the developing waste solution collected after the developing step by the developing waste supply means to the developing regeneration solution generating means, and the developing regeneration solution; A developing and regenerating solution generating step of generating and removing a photoresist from the developing waste solution by separating and removing the photoresist using a difference in the specific gravity of the developing solution and the photoresist in the developing waste supplied with the generating means; And a developing regeneration solution supplying step of supplying the developing regeneration solution generated by the liquid supply means to the developing process.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상폐액 공급단계는 냉각수단이 상기 현상폐액의 온도를 하강시키는 냉각단계를 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developing solution regeneration method of the present invention is characterized in that the developing solution supplying step includes a cooling step in which cooling means lowers the temperature of the developing waste solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상재생액 공급단계는 가열수단이 상기 현상재생액의 온도를 상승시키는 가열단계를 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developing solution regeneration method of the present invention is characterized in that the developing regeneration solution supplying step includes a heating step in which a heating means raises the temperature of the developing regeneration solution.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상재생액 생성단계는 사이클론이 상기 현상폐액을 선회 흐름으로 만들고, 상기 포토레지스트에 원심력을 작용시킴으로써 상기 포토레지스트를 분리 제거하는 포토레지스트 분리단계를 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, in the developing solution regeneration method of the present invention, in the developing regeneration solution generation step, the cyclone causes the developing waste solution to turn and separates the photoresist by applying a centrifugal force to the photoresist. It characterized in that it comprises a photoresist separation step of removing.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상폐액 공급단계는 제1가압수단이 상기 현상폐액의 압력을 상승시키는 제1공급압력 생성단계를 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developing solution regeneration method of the present invention is characterized in that the developing waste supplying step includes a first supply pressure generating step in which the first pressurizing means increases the pressure of the developing waste solution. do.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상재생액 생성단계는, 상기 포토레지스트 분리단계 후에, 상기 사이클론이 상기 현상폐액에서 상기 포토레지스트가 분리 제거된 현상재생액을 배출하는 현상재생액 배출단계와, 폐액탱크가 상기 사이클론에서 제거된 포토레지스트를 수거하는 폐액 수거단계를 더 포함하되, 상기 현상재생액 배출단계와 상기 폐액 수거단계는 동시에 진행되는 것을 특징으로 한다.According to another embodiment of the present invention, in the developer regeneration method of the present invention, the developer regeneration solution generating step, after the photoresist separation step, the cyclone is a developer regeneration of the photoresist separated from the developer waste solution A developer regeneration solution discharge step of discharging the liquid, and the waste tank further comprises a waste liquid collection step of collecting the photoresist removed from the cyclone, wherein the developer regeneration solution discharge step and the waste liquid collection step is carried out at the same time do.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상재생액 공급단계는 제2가압수단이 상기 현상재생액의 압력을 상승시키는 제2공급압력 생성단계를 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developing solution regeneration method of the present invention, wherein the developing regeneration solution supply step includes a second supply pressure generating step of the second pressing means to increase the pressure of the developing regeneration solution It features.
본 발명의 또 다른 일 실시예에 따르면, 본 발명의 현상액 재생 방법은, 상기 현상재생액 생성단계와 상기 현상재생액 공급단계 사이에, 상기 현상재생액의 탁도를 측정하여 사전에 설정된 기준에 미달할 경우 상기 현상폐액 공급단계로 되돌아가 상기 현상재생액을 상기 현상폐액으로 공급하고, 사전에 설정된 기준을 만족할 경우 상기 현상재생액 공급단계가 진행되도록 해주는 현상재생액 탁도 측정단계를 더 포함하는 것을 특징으로 한다.According to another embodiment of the present invention, the developer regeneration method of the present invention, the turbidity of the developer regeneration solution by measuring the turbidity of the developer regeneration solution between the step of generating the developer and the developer regeneration solution is less than the preset criteria The method further includes a developing regeneration turbidity measurement step of returning to the developing waste supplying step and supplying the developing regeneration solution to the developing waste solution and, if the predetermined criterion is satisfied, the developing regeneration solution supplying step. It features.
본 발명은 전술한 구성을 통해 다음과 같은 효과를 가진다.The present invention has the following effects through the above-described configuration.
본 발명은 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용하여 포토레지스트를 제거함으로써 필터가 없이도 현상폐액 내의 포토레지스트를 효율적으로 제거할 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 효과가 있다.The present invention has the effect of providing a developer regeneration apparatus and method for efficiently removing the photoresist in the developer without a filter by removing the photoresist by using the difference in the specific gravity of the developer and the photoresist in the developer.
본 발명은 필터의 세척을 위한 세정제, 초순수 등의 사용이 필요없어 환경오염 및 환경처리비용이 발생하지 않게 해주는 현상액 재생 장치 및 방법을 제공하는 효과를 가진다.The present invention has the effect of providing a developer regeneration apparatus and method that does not require the use of a cleaning agent, ultrapure water, etc. for the cleaning of the filter to avoid environmental pollution and environmental treatment costs.
본 발명은 주기적인 유지보수가 요구되지 않아 유지보수 과정에서의 현상폐액의 누출 등으로 인한 안전사고를 미연에 방지할 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 효과를 발휘한다.The present invention has the effect of providing a developer regeneration apparatus and method that can prevent the safety accidents due to leakage of the developer waste during the maintenance process is not required because periodic maintenance is not required.
본 발명은 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용하여 포토레지스트를 제거하되 현상폐액의 온도를 하강시키는 전처리를 통해 분리 효율이 향상될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 효과를 도모한다.The present invention has the effect of providing a developer regeneration apparatus and method for removing the photoresist by using the difference in specific gravity of the developer and the photoresist in the developer waste solution, thereby improving separation efficiency through pretreatment of lowering the temperature of the developer waste solution. Promote.
본 발명은 현상폐액에서 포토레지스트를 제거하여 생성된 현상재생액을 가열하는 후처리를 통해 현상공정에서의 현상재생액 사용조건이 만족될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 효과를 나타낸다.The present invention has the effect of providing a developer regeneration apparatus and method which can satisfy the conditions for using the developer regeneration solution in the developing process through post-treatment of heating the developer regeneration solution generated by removing the photoresist from the developer waste solution.
본 발명은 현상폐액에서 포토레지스트를 제거하여 현상재생액을 생성하되 현상재생액의 탁도 관리를 통해 현상공정에 품질이 우수한 현상재생액이 공급될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 효과를 보여준다.The present invention has the effect of providing a developer regeneration apparatus and method for removing the photoresist from the developer waste solution to generate a developer regeneration solution, and to provide a high quality developer regeneration solution to the developing process through turbidity management of the developer regeneration solution. Shows.
본 발명은 사전에 설정된 흡광도를 만족할 때까지 현상폐액에서 포토레지스트를 분리제거하는 과정을 반복하도록 구성되어 현상공정에 품질이 우수한 현상재생액이 공급될 수 있게 해주는 현상액 재생 장치 및 방법을 제공하는 효과를 보유한다.The present invention is configured to repeat the process of separating and removing the photoresist from the developer waste solution until a predetermined absorbance is satisfied, thereby providing a developer regenerating apparatus and method for supplying a high quality developing regeneration solution to a developing process. Holds.
도 1은 본 발명의 일 실시예에 따른 현상액 재생 장치의 블록 구성도1 is a block diagram of a developer reproducing apparatus according to an embodiment of the present invention.
도 2는 본 발명의 일 실시예에 따른 현상액 재생 방법의 순서도2 is a flow chart of a developer regeneration method according to an embodiment of the present invention.
도 3은 현상폐액 공급단계의 일 실시예의 순서도Figure 3 is a flow chart of one embodiment of the developing waste supply step
도 4는 현상재생액 생성단계의 일 실시예의 순서도Figure 4 is a flow chart of one embodiment of a developing regeneration solution generation step
도 5는 현상재생액 공급단계의 일 실시예의 순서도5 is a flowchart of an embodiment of a developer regeneration solution supply step
이하에서는 본 발명에 따른 현상액 재생 장치 및 방법을 첨부된 도면을 참조하여 상세히 설명한다. 특별한 정의가 없는 한 본 명세서의 모든 용어는 본 발명이 속하는 기술분야의 통상의 지식을 가진 기술자가 이해하는 당해 용어의 일반적 의미와 동일하고 만약 본 명세서에 사용된 용어의 의미와 충돌하는 경우에는 본 명세서에 사용된 정의에 따른다. 또한, 본 발명의 요지를 불필요하게 흐릴 수 있는 공지 기능 및 구성에 대해 상세한 설명은 생략한다.Hereinafter, a developing solution regeneration device and method according to the present invention will be described in detail with reference to the accompanying drawings. Unless otherwise defined, all terms in this specification are equivalent to the general meaning of the terms understood by those of ordinary skill in the art to which the present invention pertains and, if they conflict with the meanings of the terms used herein, Follow the definition used in the specification. In addition, detailed description of well-known functions and configurations that may unnecessarily obscure the subject matter of the present invention will be omitted.
도 1에는 본 발명의 일 실시예에 따른 현상액 재생 장치의 블록 구성도가 도시되어 있다.1 is a block diagram of a developer reproducing apparatus according to an embodiment of the present invention.
도 1을 참조하면, 본 발명의 현상액 재생 장치는 현상폐액 공급수단(1), 현상재생액 생성수단(3), 현상재생액 공급수단(5) 및 현상재생액 재순환수단(7)을 포함하고 있다.Referring to FIG. 1, the developer regeneration apparatus of the present invention includes a developer waste supply means 1, a developer regeneration solution generating means 3, a developer regeneration solution supply means 5, and a developer regeneration solution recycling means 7, have.
상기 현상폐액 공급수단(1)은 현상공정 후 회수된 현상폐액을 공급하는 역할을 수행한다. 상기 현상폐액 공급수단(1)은 현상폐액을 상기 현상재생액 생성수단(3)으로 공급한다. 상기 현상폐액 공급수단(1)은 현상폐액 회수탱크(11), 제1가압수단(12), 냉각수단(13), 제1온도계(14) 및 제1압력계(15)를 포함할 수 있다.The developing waste supply means 1 serves to supply the developing waste recovered after the developing process. The developing waste supply means 1 supplies the developing waste solution to the developing regeneration solution generating means 3. The developing waste supply means 1 may include a developing waste recovery tank 11, a first pressurizing means 12, a cooling means 13, a first thermometer 14, and a first pressure gauge 15.
상기 현상폐액 회수탱크(11)는 현상공정에 사용된 현상폐액을 회수라인(L1)을 통하여 현상기로부터 회수하여 저장하는 부분이다. 상기 현상폐액은 현상공정에서 현상기에 투입되어 사용된 현상액을 의미한다. 현상액으로는 일정 농도(예를 들면, 2.38wt%)의 TMAH 수용액이 일반적으로 사용되며, 현상폐액에는 포토레지스트 성분이 포함되어 있다.The developing waste recovery tank 11 is a portion for recovering and storing the developing waste used in the developing process from the developer through the recovery line L1. The developer waste solution means a developer used by being used in a developing unit in a developing process. As a developing solution, an aqueous TMAH solution of a certain concentration (for example, 2.38 wt%) is generally used, and the developing waste solution contains a photoresist component.
본 발명의 현상액 재생 장치는 네거티브형의 포토레지스트가 포함되어 있는 현상폐액을 주된 대상으로 하는데, 이 가운데 대표적인 네거티브형 포토레지스트인 포토아크릴(또는 포토레지스트용 아크릴레이트 수지)의 일반적인 조성은 불포화 카르본산 20~50wt%, 방향족 단량체 20~40wt%, 에톡시화 패티알콜의 메타 아크릴릭에스테르, 이소트리데실 메타아크릴레이트, 스테릴 메타아크릴레이트, 이소데실 메타아크릴레이트, 에틸헥실 메타아크릴레이트, 에틸트리글리콜 메타아크릴레이트, 메톡시폴리에틸렌글리콜 메타아크릴레이트 및 부틸 다이글리콜 메타아크릴레이트로 이루어지는 군으로부터 1종 이상 선택되는 저유리전이온도 부여 능력이 있는 단량체 3~15wt%, 아크릴 단량체 10~30wt%를 중합하여 제조되며, 유리전이온도가 150 ℃ 이하인 동시에 중량평균 분자량이 10,000~500,000이다. 이와 같은 포토레지스트는 현상폐액 내에 작은 입자 상태로 존재하게 되는데, 그 크기가 온도 23℃일 때 2㎛ 이상이다. 상기 포토레지스트의 비중은 1.1~1.5로서, 상기 현상폐액 내의 현상액의 비중에 비하여 상대적으로 크다.The developer regenerating apparatus of the present invention mainly targets a developer waste solution containing a negative photoresist, and a general composition of photoacryl (or acrylate resin for photoresist), which is a typical negative photoresist, is unsaturated carboxylic acid. 20-50 wt%, 20-40 wt% aromatic monomer, methacrylic ester of ethoxylated petty alcohol, isotridecyl methacrylate, steryl methacrylate, isodecyl methacrylate, ethylhexyl methacrylate, ethyltriglycol meta Manufactured by polymerizing 3-15 wt% of monomers having low glass transition temperature assigning ability and 10-30 wt% of acrylic monomer selected from the group consisting of acrylate, methoxy polyethylene glycol methacrylate and butyl diglycol methacrylate. At the same time, the glass transition temperature is less than 150 ℃ Molecular weight is 10,000 to 500,000. Such photoresist is present in a small particle state in the developing waste solution, and the size thereof is 2 µm or more when the temperature is 23 ° C. The specific gravity of the photoresist is 1.1 to 1.5, which is relatively larger than the specific gravity of the developing solution in the developing waste solution.
상기 현상폐액 회수탱크(11)에는 내부의 현상폐액 저장량을 측정하는 레벨게이지(111)가 포함될 수 있으며, 그 측정결과를 기초로 현상액 재생 장치의 전체적인 제어가 수행될 수도 있다.The developer waste recovery tank 11 may include a level gauge 111 for measuring the amount of the developer waste stored therein, and overall control of the developer regeneration apparatus may be performed based on the measurement result.
상기 제1가압수단(12)은 상기 현상폐액의 공급압력을 생성하는 역할을 수행한다. 상기 현상폐액은 현상폐액 공급관(L2)를 통해 상기 현상재생액 생성수단(3)으로 이송되는데, 후술하는 바와 같이 상기 현상재생액 생성수단(3)에 포함된 사이클론(31)에 투입될 때 일정 수준 이상의 투입압력이 필요하다. 상기 제1가압수단(12)은 이를 위하여 상기 현상폐액의 압력을 일정 수준의 투입압력까지 높여주는 역할을 수행한다. 상기 제1가압수단(12)은 펌프일 수 있으며, 펌프 사용 시 펌프압력은 0.1~0.35㎫로 가동되는 것이 바람직하다.The first pressurizing means 12 serves to generate a supply pressure of the developing waste solution. The developing waste solution is transferred to the developing regeneration solution generating means 3 through a developing waste supply pipe L2, and is introduced into the cyclone 31 included in the developing regeneration solution generating means 3 as described below. Inlet pressure above the level is required. The first pressurizing means 12 serves to increase the pressure of the developing waste solution to a predetermined level for this purpose. The first pressurizing means 12 may be a pump, and when the pump is used, the pump pressure is preferably operated at 0.1 to 0.35 MPa.
상기 냉각수단(13)은 상기 현상폐액의 온도를 하강시키는 부분으로 열교환기 등으로 구현될 수 있다. 상기 현상폐액 회수탱크(11) 내의 현상폐액의 온도는 23℃ 정도인데, 상기 냉각수단(13)은 상기 현상폐액의 온도를 5~20℃로 낮추어 준다. 상기 냉각수단(13)을 통해 상기 현상폐액의 온도를 낮추어주는 이유는 상기 현상폐액 내의 포토레지스트의 비중을 높여줌으로써 상기 현상재생액 생성수단(3)에서 포토레지스트의 분리가 더욱 효율적으로 이루어질 수 있게 해주기 위함이다. 상기 냉각수단(13)에 의하여 상기 현상폐액의 온도가 5~20℃가 될 경우 상기 현상폐액 내의 포토레지스트의 비중은 1.3~2.0으로 상승하게 된다.The cooling means 13 may be implemented as a heat exchanger as a part for lowering the temperature of the developing waste solution. The temperature of the developing waste liquid in the developing waste recovery tank 11 is about 23 ° C., and the cooling means 13 lowers the temperature of the developing waste liquid to 5 to 20 ° C. The reason for lowering the temperature of the developing waste solution through the cooling means 13 is to increase the specific gravity of the photoresist in the developing waste solution so that the photoresist can be separated more efficiently in the developing regeneration solution generating means 3. To help. When the temperature of the developing waste solution is 5 to 20 ° C. by the cooling means 13, the specific gravity of the photoresist in the developing waste solution rises to 1.3 to 2.0.
상기 제1온도계(14)는 상기 냉각수단(13)을 통과한 현상폐액의 온도를 측정하기 위한 것이다. 도 1에 도시되어 있지는 않지만 상기 냉각수단(13)을 통과한 현상폐액의 온도가 설정된 기준보다 높은 경우 상기 현상폐액의 온도를 설정된 온도까지 낮추기 위하여 상기 현상폐액을 상기 현상폐액 회수탱크(11)로 다시 보내줌으로써 상기 냉각수단(13)을 다시 거치도록 해주는 현상폐액 회송라인을 추가적으로 구성하는 것도 가능하다.The first thermometer 14 is for measuring the temperature of the developing waste solution passed through the cooling means 13. Although not shown in FIG. 1, when the temperature of the developing waste liquid passing through the cooling means 13 is higher than the set standard, the developing waste liquid is transferred to the developing waste recovery tank 11 to lower the temperature of the developing waste liquid to the set temperature. It is also possible to additionally configure the developer waste return line to pass through again the cooling means 13 by sending again.
상기 제1압력계(15)는 후술할 현상재생액 생성수단(3)의 사이클론(31)에 투입되는 현상폐액이 상기 사이클론(31)의 투입압력 조건을 만족하는지 측정하기 위한 구성이다. 상기 제1압력계(15)가 측정한 결과에 근거하여 상기 제1가압수단(12)의 출력을 높이거나 낮출 수 있다.The first pressure gauge 15 is a component for measuring whether the developing waste liquid introduced into the cyclone 31 of the developing regeneration solution generating means 3 to be described later satisfies the input pressure condition of the cyclone 31. The output of the first pressurizing means 12 may be increased or decreased based on the result measured by the first pressure gauge 15.
상기 현상재생액 생성수단(3)은 상기 현상폐액 공급수단(1)으로부터 상기 현상폐액을 공급받아 상기 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거하여 상기 현상폐액에서 상기 포토레지스트가 분리된 현상재생액을 생성하는 역할을 수행한다. 상기 현상재생액 생성수단(3)은 사이클론(31), 폐액탱크(32) 및 폐액펌프(33)를 포함할 수 있다.The developer regeneration solution generating means (3) receives the developer waste solution from the developer waste supply means (1) and separates and removes the photoresist by using a difference between the specific gravity of the developer and the photoresist in the developer waste solution. The photoresist serves to generate a separated developer regeneration solution. The developing regeneration solution generating means 3 may include a cyclone 31, a waste liquid tank 32, and a waste liquid pump 33.
상기 사이클론(31)은 상기 현상폐액을 선회 흐름으로 만들고, 상기 포토레지스트에 원심력을 작용시킴으로써 상기 포토레지스트가 분리 제거되도록 하는 장치이다. 상기 사이클론(31)은 투입된 현상폐액에 원심력을 가하여, 비중이 큰 포토레지스트는 분리되어 하방으로 배출되도록 하고, 상기 포토레지스트 보다 비중이 작은 현상액은 상승하여 배출되도록 해준다. 즉, 필터의 사용없이 현상폐액 내의 현상액과 포토레지스트 간의 비중의 차이를 이용하여 현상폐액 내에서 포토레지스트를 분리하여 제거함으로써 상기 현상폐액에서 상기 포토레지스트가 제거된 현상재생액을 생성하여 준다. 이때, 상기 사이클론(31) 전단의 냉각수단(13)에 의해 비중의 차이는 더욱 커져서 분리효율이 더욱 높아지게 된다.The cyclone 31 is a device that turns the developer waste into a swirling flow and separates and removes the photoresist by applying a centrifugal force to the photoresist. The cyclone 31 applies a centrifugal force to the injected developer waste, so that the photoresist having a large specific gravity is separated and discharged downward, and the developer having a specific gravity smaller than the photoresist is raised and discharged. That is, by using the difference in specific gravity between the developer and the photoresist in the developing waste solution without using a filter, the photoresist is separated and removed in the developing waste solution to generate a developing regeneration solution in which the photoresist is removed from the developing waste solution. At this time, the difference in specific gravity is further increased by the cooling means 13 in front of the cyclone 31, and the separation efficiency is further increased.
상기 사이클론(31)은 현상폐액에서 포토레지스트를 분리하기 위하여 종래 사용되었던 나노필터나 메쉬필터어레이 등과 달리 분리된 포토레지스트가 필터면에 부착됨으로써 폐색을 유발하여 여과 성능을 저하시키는 일이 없으므로 세척이나 정기적인 유지보수를 수행할 필요가 없다. 따라서 세척을 위한 세정제, 초순수 등의 사용이 요구되지 않으므로 환경오염이나 생산비용의 상승 문제가 없으며, 유지보수 과정에서의 유해 화학물질로 인한 안전사고의 발생도 미연에 방지하여 준다.Since the cyclone 31 is different from the conventional nanofilters or mesh filter arrays used to separate the photoresist from the developing waste solution, the separated photoresist adheres to the filter surface so that the cyclone 31 does not degrade the filtration performance due to clogging. There is no need to perform regular maintenance. Therefore, the use of cleaning agents, ultrapure water, etc. for cleaning is not required, so there is no problem of environmental pollution or an increase in production cost, and prevents the occurrence of safety accidents due to harmful chemicals during maintenance.
상기 폐액탱크(32)는 상기 사이클론(31)에서 제거된 포토레지스트를 수거하여 저장하는 부분이다. 상기 폐액탱크(32)는 상기 사이클론(31)의 하부에 배치되는 것이 바람직하며, 상기 폐액탱크(32)에는 포토레지스트가 농축된 현상폐액이 저장되게 된다.The waste tank 32 is a portion for collecting and storing the photoresist removed from the cyclone 31. The waste tank 32 is preferably disposed below the cyclone 31, and the waste tank 32 stores a developing waste solution in which photoresist is concentrated.
상기 폐액펌프(33)는 상기 폐액탱크(32) 내에 포토레지스트가 농축된 현상폐액이 일정량 이상으로 저장된 경우 이를 외부로 배출시켜주는 역할을 수행한다. 즉, 상기 폐액펌프(33)는 상기 배출관(L3)에 배출압을 제공한다.The waste liquid pump 33 serves to discharge the developing waste liquid in which the photoresist is concentrated in the waste liquid tank 32 to the outside. That is, the waste liquid pump 33 provides a discharge pressure to the discharge pipe (L3).
상기 현상재생액 공급수단(5)은 현상공정에 상기 현상재생액을 공급하는 역할을 수행한다. 도 1을 참조하면, 상기 현상재생액 생성수단(3)에 의해 생성된 현상재생액은 상기 현상폐액 회수탱크(11)로 회수되어, 상기 현상재생액 공급수단(5)에 의하여 현상재생액 공급라인(L4)를 통하여 현상공정을 수행하는 현상기로 공급되게 된다(이때, 상기 현상폐액 회수탱크(11)는 상기 현상폐액에서 포토레지스트를 제거하여 현상재생액을 생성하는 공정이 진행 중인 경우 상기 회수라인(L1)을 통한 새로운 현상폐액의 유입을 차단시키는 방식으로 운영될 수도 있고, 상기 현상폐액 회수탱크(11)의 내부 공간이 현상기로부터 유입된 현상폐액을 저장하는 공간과 상기 현상재생액을 저장하는 공간으로 구분되어 있음을 전제로 상기 현상폐액에서 포토레지스트를 제거하여 현상재생액을 생성하는 공정과 상기 회수라인(L1)을 통한 새로운 현상폐액의 유입이 동시에 진행되는 방식으로 운영될 수도 있다). 상기 현상재생액 공급수단(5)은 제2가압수단(51), 가열수단(52), 제2온도계(53) 및 제2압력계(54)를 포함할 수 있다.The developing regeneration solution supply means 5 serves to supply the developing regeneration solution to a developing process. Referring to FIG. 1, the developer regeneration solution generated by the developer regeneration solution generating means 3 is recovered to the developer waste recovery tank 11, and the developer regeneration solution supplying means is supplied by the developer regeneration solution supply means 5. The developing solution recovery tank 11 is supplied to a developing device which performs the developing process through the line L4 (in this case, the developing waste recovery tank 11 removes the photoresist from the developing waste solution to generate the developing regeneration solution. It may be operated in a manner to block the inflow of new developer waste through the line (L1), the internal space of the developer waste recovery tank 11 stores a space for storing the developer waste flowed from the developer and the developer regeneration solution A process for generating a developer regeneration solution by removing the photoresist from the developer waste solution and inflow of a new developer waste solution through the recovery line L1 is performed under the premise that it is divided into a space. May be operated in such a manner as to proceed). The developing regeneration solution supply means 5 may include a second pressurizing means 51, a heating means 52, a second thermometer 53, and a second pressure gauge 54.
상기 제2가압수단(51)은 상기 현상재생액 공급라인(L4)을 통해 상기 현상재생액을 현상공정의 현상기로 공급하는 데에 필요한 공급압력을 생성하는 역할을 수행한다. 상기 제2가압수단(51)은 상기 제1가압수단(12)과 마찬가지로 펌프 등으로 구현될 수 있다.The second pressurizing means 51 serves to generate a supply pressure necessary for supplying the developing regeneration solution to the developing unit of the developing process through the developing regeneration solution supply line L4. The second pressurizing means 51 may be implemented by a pump or the like like the first pressurizing means 12.
상기 가열수단(52)은 상기 현상재생액의 온도를 상승시키는 역할을 수행한다. 상기 가열수단(52)으로는 히터 등이 사용될 수 있다. 전술한 바와 같이 상기 사이클론(31)에서 상기 현상폐액 내의 포토레지스트를 효율적으로 분리 제거하기 위하여 상기 냉각수단(13)을 통해 상기 현상폐액의 온도를 5~20℃로 낮추어 주므로, 생성된 현상재생액의 온도는 현상공정에서 사용되는 온도보다 낮은 상태가 된다. 상기 가열수단(52)은 상기 현상재생액의 낮은 온도를 현상공정의 사용조건에 부합하도록 높여주는 역할을 수행한다.The heating means 52 serves to increase the temperature of the developing regeneration solution. As the heating means 52, a heater or the like may be used. As described above, in order to efficiently separate and remove the photoresist in the developing waste solution from the cyclone 31, the temperature of the developing waste solution is reduced to 5 to 20 ° C. through the cooling means 13. The temperature of is lower than the temperature used in the developing process. The heating means 52 serves to raise the low temperature of the developing regeneration solution to match the conditions of the developing process.
상기 제2온도계(53)는 상기 가열수단(52)을 통과한 현상재생액의 온도를 측정하기 위한 것이다. 즉, 상기 가열수단(52)을 통과한 현상재생액의 온도가 현상공정의 사용조건에 부합하는 온도를 가지는지 측정함으로써 그 측정값에 기초하여 상기 가열수단(52)의 제어가 이루어질 수 있게 해준다.The second thermometer 53 is for measuring the temperature of the developing regeneration solution that has passed through the heating means 52. That is, by measuring whether the temperature of the developing regeneration solution that has passed through the heating means 52 has a temperature corresponding to the use conditions of the developing process, the heating means 52 can be controlled based on the measured value. .
도 1에 도시되어 있지는 않지만 상기 가열수단(52)을 통과한 현상재생의 온도가 설정된 기준보다 낮은 경우 상기 현상재생의 온도를 현상공정의 사용조건에 부합하는 온도까지 높이기 위하여 상기 현상재생액을 상기 가열수단(52)으로 회송시켜주는 현상재생액 회송라인을 추가적으로 구성하는 것도 가능하다.Although not shown in FIG. 1, when the temperature of the development and regeneration that has passed through the heating means 52 is lower than a set standard, the developing and regeneration solution may be increased to increase the temperature of the development and regeneration to a temperature corresponding to the use condition of the developing process. It is also possible to additionally configure a developing regeneration liquid return line for returning to the heating means (52).
상기 제2압력계(54)는 상기 현상재생액 공급라인(L4) 내의 현상재생액의 압력을 측정하는 역할을 수행한다. 상기 제2압력계(54)의 측정결과에 기초하여 상기 현상재생액이 현상공정에 투입되기에 적합한 압력조건을 가지는지 판단하고, 이에 기초하여 상기 제2가압수단(51)의 출력을 조절할 수 있다.The second pressure gauge 54 serves to measure the pressure of the developing regeneration solution in the developing regeneration solution supply line L4. Based on the measurement result of the second pressure gauge 54, it is possible to determine whether the developing regeneration solution has a suitable pressure condition to be introduced into the developing process, and based on this, the output of the second pressing means 51 can be adjusted. .
상기 현상재생액 재순환수단(7)은 상기 현상재생액 생성수단(3)이 생성한 현상재생액의 포토레지스트 농도가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단(1)에 현상폐액으로 재유입시켜주는 역할을 수행한다. 상기 현상재생액 재순환수단(7)은 탁도 측정수단(71)과 재순환라인(72)을 포함할 수 있다.The developer regeneration solution recycling means 7 supplies the developer regeneration solution to the developer waste solution supply means when the photoresist concentration of the developer regeneration solution generated by the developer regeneration solution generation means 3 does not meet a predetermined standard. ) To reintroduce into developing waste. The developer regeneration solution recycling means 7 may include a turbidity measuring means 71 and a recycling line 72.
상기 탁도 측정수단(71)은 상기 현상재생액의 포토레지스트의 함량을 파악하기 위하여 상기 현상재생액의 탁도를 측정하는 역할을 수행한다. 상기 탁도 측정수단(71)은 흡광도계일 수 있다. 상기 현상재생액 생성수단(3)에 의해 생성된 현상재생액에는 상기 사이클론(31)에서 완전히 분리 제거되지 못한 또는 원하는 기준의 포토레지스트 농도를 초과하는 포토레지스트가 포함되어 있을 수 있다. 상기 현상폐액의 상태나, 상기 현상재생액 생성수단(3)의 가동 조건 등의 영향으로 상기 현상재생액 내애 포토레지스트 여전히 다량 포함되어 있음에도 불구하고 이를 다시 현상공정의 현상기로 공급할 경우 현상공정의 품질저하를 야기하게 된다.The turbidity measuring means 71 measures the turbidity of the developer regeneration solution in order to determine the content of the photoresist of the developer regeneration solution. The turbidity measuring means 71 may be an absorbance meter. The developing regeneration solution generated by the developing regeneration solution generating means 3 may include a photoresist that is not completely separated or removed from the cyclone 31 or exceeds a desired photoresist concentration. Although the photoresist is still largely contained in the developing regeneration solution due to the condition of the developing waste solution or the operating conditions of the developing regeneration solution generating means 3, the quality of the developing process is again supplied to the developing process developer. Will cause degradation.
이와 같은 문제를 방지하기 위하여 상기 현상재생액 내의 포토레지스트 함량에 대한 일정한 기준을 사전에 세워두고, 이를 만족할 경우에만 현상공정에 공급하는 것이 바람직하다. 이때, 상기 탁도 측정수단(71)을 통해 상기 현상재생액의 포토레지스트의 함량이 사전에 설정된 기준을 만족하는지 여부를 확인할 수 있게 된다.In order to prevent such a problem, it is preferable to set a predetermined standard for the photoresist content in the developing regeneration solution in advance and supply it to the developing process only when it is satisfied. At this time, the turbidity measuring means 71 can determine whether the content of the photoresist of the developer regeneration solution satisfies a predetermined standard.
구체적으로, 상기 포토레지스트가 포토아크릴인 경우 포토아크릴의 빛 투과율은 95%이상 되기 때문에, 기존 탁도 측정수단에서는 측정하지 못한 파장 대역에 대하여 포토아크릴 현상폐액 샘플 테스트를 통해 측정 가능한 파장의 범위를 찾아내어, 해당 파장 범위의 파장으로 탁도를 측정하여야 한다. 일례로, 텅스텐 램프와 자외선가시 스펙트로포토미터(UV-Visible spectro photometer)를 써서, 포토다이오드 어레이(photodiode array)로 빛을 검출하면서, TMAH 용액에 혼합된 포토아크릴의 200~ 800nm 파장 영역에 대한 투과도를 측정하면 210~220nm의 파장대 빛은 잘 투과하지 않음을 알 수 있다. 따라서 이러한 경우 흡광도계를 사용하여 210nm 내지 220nm 부근 파장의 빛의 흡광도를 측정함으로써 포토아크릴 현상폐액의 포토아크릴 탁도를 정확히 측정할 수 있게 된다.Specifically, since the light transmittance of the photoacryl is 95% or more when the photoresist is photoacryl, a range of wavelengths that can be measured through a photoacryl developer waste sample test for a wavelength band not measured by the conventional turbidity measuring means is found. The turbidity should be measured with wavelengths in the corresponding wavelength range. For example, using a tungsten lamp and an UV-Visible spectro photometer, light is detected with a photodiode array, while transmitting light through the 200-800 nm wavelength range of photoacryl mixed in a TMAH solution. It can be seen that the light does not transmit well in the wavelength range of 210 ~ 220nm. Therefore, in this case, by measuring the absorbance of light in the wavelength of 210nm to 220nm using an absorbance meter, it is possible to accurately measure the photoacryl haze of the photoacryl developer waste solution.
상기 재순환라인(72)은 상기 흡광도계의 측정 결과가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단(1)에 현상폐액으로 재유입되도록 해주는 역할을 수행한다.The recirculation line 72 serves to reintroduce the developing regeneration solution into the developing waste supply means 1 as the developing waste solution when the measurement result of the absorbance meter does not meet a preset standard.
도 1을 참조하면, 상기 현상재생액 생성수단(3)에 의해 생성된 현상재생액은 상기 현상폐액 회수탱크(11)로 회수된다. 회수된 현상재생액은 상기 현상재생액 공급수단(5)에 의하여 현상재생액 공급라인(L4)을 통하여 현상공정을 수행하는 현상기로 공급되거나 혹은 상기 현상재생액 생성수단(3)으로 다시 공급될 수 있게 되어 있다. 따라서 도 1의 실시예에서 상기 재순환라인(72)은 상기 탁도 측정수단의 측정 결과가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단(1)에 현상폐액으로 재유입되도록 해주는 역할뿐만 아니라 상기 탁도 측정수단의 측정 결과가 사전에 설정된 기준을 만족할 경우 상기 현상재생액을 상기 현상재생액 공급수단(5)에 공급하는 역할도 동시에 수행하게 되어 있다.Referring to FIG. 1, the developing regeneration solution generated by the developing regeneration solution generating means 3 is recovered to the developing waste recovery tank 11. The recovered developer regeneration solution may be supplied to the developer for performing the developing process by the developer regeneration solution supply means 5 through the developer regeneration solution supply line L4 or may be supplied back to the developer regeneration solution generating means 3. It is supposed to be. Accordingly, in the embodiment of FIG. 1, the recycling line 72 is configured to re-introduce the developing regeneration solution into the developing waste supply means 1 as the developing waste solution when the measurement result of the turbidity measuring means does not meet a predetermined standard. In addition to the role of providing the developer regeneration solution to the developer regeneration solution supply means (5) when the measurement result of the turbidity measuring means satisfies a preset criterion.
그러나 상기 현상재생액이 상기 현상폐액 회수탱크(11)로 회수되지 않도록 구성된 실시예 즉, 상기 현상재생액의 회수가 별도의 공간에서 이루어지는 실시예에서는 상기 재순환라인(72)이 상기 탁도 측정수단의 측정 결과가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단(1)에 현상폐액으로 재유입되도록 해주는 역할만을 수행하는 형태로 구성될 수도 있다.However, in an embodiment in which the developing regeneration solution is not recovered to the developing waste recovery tank 11, that is, an embodiment in which the recovery of the developing regeneration solution is performed in a separate space, the recirculation line 72 is connected to the turbidity measuring means. When the measurement result does not meet the preset criteria, it may be configured to only play the role of allowing the developer regeneration solution to be re-introduced into the developer waste solution supply means (1).
도 2에는 본 발명의 일 실시예에 따른 현상액 재생 방법의 순서도가 도시되어 있다.2 is a flowchart of a developer regeneration method according to an embodiment of the present invention.
도 2를 참조하면, 본 발명의 일 실시예에 따른 현상액 재생 방법은 현상폐액 공급단계(S1), 현상재생액 생성단계(S3), 현상재생액 탁도 측정단계(S5) 및 현상재생액 공급단계(S7)를 포함하고 있다. 상기 현상액 재생 방법은 위에서 살펴본 바와 같은 본 발명에 따른 현상액 재생 장치를 통해 수행될 수 있다.Referring to Figure 2, the developer regeneration method according to an embodiment of the present invention, developing waste supply step (S1), developing regeneration solution generation step (S3), developing regeneration turbidity measurement step (S5) and developing regeneration solution supply step (S7) is included. The developer regeneration method may be performed through the developer regeneration device according to the present invention as described above.
상기 현상폐액 공급단계(S1)는 현상폐액 공급수단이 현상공정 후 회수된 현상폐액을 상기 현상재생액 생성수단(3)에 공급하는 단계이다. 도 3에는 상기 현상폐액 공급단계(S1)의 일 실시예의 순서도가 도시되어 있는데, 이를 참조하면, 상기 현상폐액 공급단계(S1)는 제1공급압력 생성단계(S11) 및 냉각단계(S13)를 포함하고 있다.The developing waste solution supplying step S1 is a step in which the developing waste solution supplying means supplies the developing waste solution recovered after the developing process to the developing regeneration solution generating means 3. 3 is a flow chart of an embodiment of the developing waste solution supply step S1. Referring to this, the developing waste supply step S1 includes a first supply pressure generating step S11 and a cooling step S13. It is included.
상기 제1공급압력 생성단계(S11)는 상기 제1가압수단(12)이 상기 현상폐액의 압력을 상승시키는 단계이다. 상기 현상폐액은 현상폐액 공급관(L2)를 통해 상기 현상재생액 생성수단(3)으로 이송되는데, 전술한 바와 같이 상기 현상재생액 생성수단(3)에 포함된 사이클론(31)에 투입될 때 일정 수준 이상의 압력이 필요하다. 상기 제1공급압력 생성단계(S11)를 통해 상기 현상폐액의 압력은 상기 사이클론(31)에 투입되는 데에 있어 적정한 압력으로 상승하게 된다. 상기 제1가압수단(12)은 전술한 바와 같이 펌프일 수 있으며, 펌프 사용 시 펌프압력은 0.1~0.35㎫로 가동되는 것이 바람직하다.The first supply pressure generating step S11 is a step in which the first pressurizing means 12 increases the pressure of the developing waste solution. The developing waste solution is transferred to the developing regeneration solution generating means 3 through the developing waste supply pipe L2, and as described above, when the developing waste solution is introduced into the cyclone 31 included in the developing regeneration solution generating means 3, Pressure above level is required. Through the first supply pressure generating step (S11), the pressure of the developing waste liquid is raised to an appropriate pressure to be introduced into the cyclone (31). The first pressurizing means 12 may be a pump as described above, and when the pump is used, the pump pressure is preferably operated at 0.1 to 0.35 MPa.
상기 냉각단계(S13)는 상기 냉각수단(13)이 상기 현상폐액의 온도를 하강시키는 단계이다. 본 발명의 현상액 재생 방법은 네거티브형의 포토레지스트가 포함되어 있는 현상폐액을 주된 대상으로 하는데, 네거티브형 포토레지스트인 포토아크릴(또는 포토레지스트용 아크릴레이트 수지)의 일반적인 조성 및 특성은 위에서 살펴본 바와 같다. 상기 냉각단계(S11)는 전술한 바와 같이 상기 현상폐액의 온도를 5~20℃로 낮추어 주는 방식으로 수행될 수 있다. 일반적으로 상기 현상폐액 회수탱크(11) 내의 현상폐액의 온도는 23℃ 정도이며 그 속에 포함된 포토레지스트의 비중은 1.1~1.5 정도이다. 상기 냉각단계(S11)를 통해 상기 현상폐액의 온도가 5~20℃로 낮아질 경우 상기 현상폐액 내의 포토레지스트의 비중은 1.3~2.0으로 상승하게 되고, 그 결과 상대적 비중의 차이가 커져 상기 현상재생액 생성수단(3)에서 상기 포토레지스트의 분리가 더욱 효율적으로 이루어질 수 있게 된다.The cooling step (S13) is a step in which the cooling means 13 lowers the temperature of the developing waste solution. The developer regeneration method of the present invention is mainly a developer waste solution containing a negative photoresist, the general composition and characteristics of the negative photoresist photoacryl (or acrylate resin for photoresist) is as described above. . As described above, the cooling step S11 may be performed by lowering the temperature of the developing waste solution to 5 to 20 ° C. In general, the temperature of the developing waste solution in the developing waste recovery tank 11 is about 23 ° C., and the specific gravity of the photoresist contained therein is about 1.1 to 1.5. When the temperature of the developing waste solution is lowered to 5 to 20 ° C. through the cooling step (S11), the specific gravity of the photoresist in the developing waste solution rises to 1.3 to 2.0. Separation of the photoresist in the generating means 3 can be made more efficient.
상기 냉각단계(S13)는 상기 현상폐액의 온도가 설정된 온도까지 낮아진 상태에서 다음 단계가 진행되도록 상기 현상폐액의 온도가 설정된 온도까지 낮아지지 않은 경우 상기 현상폐액을 상기 냉각수단(13)으로 재투입하여 반복적인 냉각이 이루어지도록 해주는 방식으로 진행되는 것이 바람직하다. 즉, 상기 냉각단계(S13)는 상기 현상폐액이 설정된 온도까지 낮아질 때까지 반복적으로 진행될 수 있다.In the cooling step S13, when the temperature of the developing waste solution is not lowered to the set temperature so that the next step proceeds while the temperature of the developing waste solution is lowered to the set temperature, the developer waste is re-introduced into the cooling means 13. It is desirable to proceed in such a way that repeated cooling is achieved. That is, the cooling step (S13) may be repeatedly performed until the developer waste solution is lowered to a set temperature.
상기 현상재생액 생성단계(S3)는 상기 현상재생액 생성수단(3)이 공급된 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거함으로써 상기 현상폐액에서 상기 포토레지스트가 제거된 현상재생액을 생성하는 단계이다. 도 4에는 상기 현상재생액 생성단계(S3)의 일 실시예의 순서도가 도시되어 있는데, 이를 참조하면, 상기 현상재생액 생성단계(S3)는 포토레지스트 분리단계(S31), 현상재생액 배출단계(S33) 및 폐액 수거단계(S35)를 포함하여 수행될 수 있다.The developing regeneration solution generating step (S3) is performed by separating and removing the photoresist by using a difference between the specific gravity of the developing solution and the photoresist in the developing waste supplied with the developing regeneration solution generating means (3). In this step, the removed developer regeneration solution is generated. 4 shows a flow chart of an embodiment of the developing regeneration solution generating step S3. Referring to this, the developing regeneration solution generating step S3 includes a photoresist separation step S31 and a developing regeneration solution discharge step S3. S33) and waste liquid collection step (S35) can be performed.
상기 포토레지스트 분리단계(S31)는 상기 사이클론(31)이 상기 현상폐액을 선회 흐름으로 만들고, 상기 포토레지스트에 원심력을 작용시킴으로써 상기 포토레지스트를 분리 제거하는 단계이다. 상기 포토레지스트 분리단계(S31)에서 상기 사이클론(31)은 투입된 현상폐액에 원심력을 가하여, 비중이 큰 포토레지스트는 분리되어 하방으로 배출되도록 하고, 상기 포토레지스트 보다 비중이 가벼운 현상액은 상승하여 배출되도록 만들어준다. 즉, 필터의 사용없이 비중의 차이를 이용하여 현상폐액 내에서 포토레지스트를 분리하여 제거할 수 있게 해준다.The photoresist separation step (S31) is a step in which the cyclone 31 separates and removes the photoresist by turning the developer waste into a turning flow and applying a centrifugal force to the photoresist. In the photoresist separation step (S31), the cyclone 31 applies centrifugal force to the injected developer waste, so that the photoresist having a large specific gravity is separated and discharged downward, and the developer having a lighter specific gravity than the photoresist is discharged upward. Make it. In other words, the photoresist can be separated and removed in the developing waste solution by using a difference in specific gravity without using a filter.
상기 현상재생액 배출단계(S33)는 상기 사이클론(31)이 상기 현상폐액에서 상기 포토레지스트가 분리 제거된 현상재생액을 배출하는 단계이다. 전술한 바와 같이 상기 사이클론(31)에서 상기 포토레지스트의 분리가 이루어지면 상기 현상폐액에서 상기 포토레지스트가 분리된 현상재생액이 생성되고 상기 현상재생액은 비중이 낮아 상기 사이클론(31)의 상부로 배출되게 된다.The developing regeneration solution discharging step (S33) is a step in which the cyclone 31 discharges the developing regeneration solution from which the photoresist is separated from the developing waste solution. As described above, when the photoresist is separated from the cyclone 31, a developing regeneration solution in which the photoresist is separated from the developing waste solution is generated, and the developing regeneration solution has a low specific gravity and moves to an upper portion of the cyclone 31. Will be discharged.
상기 폐액 수거단계(S35)는 상기 폐액탱크(32)가 상기 사이클론(31)에서 제거된 포토레지스트를 수거하는 단계이다. 상기 폐액 수거단계(S35)는 상기 현상재생액 배출단계(S33)와 동시에 진행될 수 있다. 상기 현상폐액에서 상대적으로 큰 비중을 가지는 포토레지스트는 상기 사이클론(31)에서 분리 제거되어 하방으로 배출되게 되는데, 상기 폐액 수거단계(S35)를 통해 상기 폐액탱크(32)에는 포토레지스트가 농축된 현상폐액이 저장되게 된다.The waste liquid collection step (S35) is a step in which the waste tank 32 collects the photoresist removed from the cyclone 31. The waste liquid collection step (S35) may proceed simultaneously with the developing regeneration solution discharge step (S33). The photoresist having a relatively large specific gravity in the developer waste solution is separated and removed from the cyclone 31 and discharged downward. The photoresist is concentrated in the waste tank 32 through the waste liquid collection step S35. Waste fluid will be stored.
상기 폐액 수거단계(S35)에서 상기 폐액탱크(32)에 저장된 포토레지스트가 농축된 현상폐액은 상기 폐액펌프(33)가 제공하는 배출압에 의해 상기 배출관(L3)을 통해 외부로 배출될 수 있다.The developing waste solution in which the photoresist stored in the waste tank 32 is concentrated in the waste liquid collection step S35 may be discharged to the outside through the discharge pipe L3 by the discharge pressure provided by the waste liquid pump 33. .
상기 현상재생액 탁도 측정단계(S5)는 상기 현상재생액의 탁도를 측정하여 사전에 설정된 기준에 미달할 경우 상기 현상폐액 공급단계(S1)로 되돌아가 상기 현상재생액을 상기 현상폐액으로 공급하고, 사전에 설정된 기준을 만족할 경우 상기 현상재생액 공급단계(S7)가 진행되도록 해주는 단계이다.The developer regeneration turbidity measurement step (S5) is to measure the turbidity of the developer regeneration solution, and if it does not meet the preset criteria, return to the developer waste solution supply step (S1) and supply the developer regeneration solution to the developer waste solution. When the predetermined criteria are satisfied, the developing regeneration solution supplying step (S7) is performed.
상기 현상재생액 탁도 측정단계(S5)는 상기 현상재생액 재순환수단(7)에 의해 수행될 수 있다. 즉, 상기 탁도 측정수단(71)이 상기 현상재생액의 탁도를 측정하고, 측정된 탁도가 사전에 설정된 기준에 미달할 경우 상기 재순환라인(72)을 통해 상기 현상재생액을 상기 현상폐액 공급수단(1)에 현상폐액으로 재유입시켜주는 방식으로 수행될 수 있다.The developer regeneration turbidity measurement step S5 may be performed by the developer regeneration recycling means 7. That is, the turbidity measuring means 71 measures the turbidity of the developer regeneration solution, and when the measured turbidity does not meet a preset standard, the developer regeneration solution supply means is supplied to the developer regeneration solution through the recycling line 72. It can be carried out by reflowing into developing waste solution in (1).
상기 현상재생액 생성단계(S3)에서 생성된 현상재생액에는 상기 사이클론(31)에서 완전히 분리 제거되지 못한 포토레지스트가 포함되어 있을 수 있다. 상기 현상폐액의 상태나, 상기 현상재생액 생성수단(3)의 가동 조건 등의 영향으로 상기 현상재생액 내애 포토레지스트 여전히 다량 포함되어 있음에도 불구하고 이를 다시 현상공정의 현상기로 공급할 경우 현상공정의 품질저하를 야기하게 된다. 그러나 위에서 설명한 바와 같이 상기 현상재생액의 탁도 기준을 설정하여 두고, 이를 근거로 상기 현상재생액 내의 포토레지스트의 함량을 판단하고, 현상공정으로의 공급여부를 결정함으로써 현상재생액 및 현상공정의 품질을 일정 수준 이상으로 유지할 수 있게 된다.The developing regeneration solution generated in the developing regeneration solution generation step S3 may include photoresist that may not be completely separated and removed from the cyclone 31. Although the photoresist is still largely contained in the developing regeneration solution due to the condition of the developing waste solution or the operating conditions of the developing regeneration solution generating means 3, the quality of the developing process is again supplied to the developing process developer. Will cause degradation. However, as described above, the turbidity standard of the developing regeneration solution is set, and based on this, the content of the photoresist in the developing regeneration solution is judged, and whether the supply to the developing process is determined or not, the quality of the developing regeneration solution and the developing process are determined. Can be maintained above a certain level.
상기 현상재생액 공급단계(S7)는 상기 현상재생액 공급수단(5)이 생성된 현상재생액을 현상공정에 공급하는 단계이다. 도 5에는 상기 현상재생액 공급단계(S7)의 일 실시예의 순서도가 도시되어 있는데, 이를 참조하면, 상기 현상재생액 공급단계(S7)는 제2공급압력 생성단계(S71) 및 가열단계(S73)를 포함하여 수행될 수 있다.The developing regeneration solution supplying step S7 is a step of supplying the developing regeneration solution generated by the developing regeneration solution supply means 5 to a developing process. 5 is a flow chart of an embodiment of the developer regeneration solution supply step S7. Referring to this, the developer regeneration solution supply step S7 includes a second supply pressure generation step S71 and a heating step S73. ) May be performed.
상기 제2공급압력 생성단계(S71)는 상기 제2가압수단(51)이 상기 현상재생액의 압력을 상승시키는 단계이다. 구체적으로 상기 제2공급압력 생성단계(S71)는 상기 현상재생액을 현상공정의 현상기로 공급하는 데 필요한 공급압력을 생성하는 단계이다.The second supply pressure generating step (S71) is a step in which the second pressing means 51 increases the pressure of the developing regeneration solution. Specifically, the second supply pressure generating step (S71) is a step of generating a supply pressure required to supply the developing regeneration solution to the developing unit of the developing process.
상기 가열단계(S73)는 상기 가열수단(52)이 상기 현상재생액의 온도를 상승시키는 단계이다. 전술한 바와 같이 상기 현상폐액은 상기 냉각단계(S13)를 거치며 상기 현상폐액 내의 포토레지스트의 비중을 높이기 위하여 그 온도가 5~20℃로 낮추어진 상태이므로, 생성된 현상재생액의 온도는 현상공정에서 사용되는 온도보다 낮은 상태이다. 상기 가열단계(S73)를 통해 이와 같은 현상재생액의 온도가 현상공정의 사용조건에 부합되도록 높아지게 된다.The heating step (S73) is a step in which the heating means 52 raises the temperature of the developing regeneration solution. As described above, the developing waste solution is subjected to the cooling step (S13) and the temperature thereof is lowered to 5 to 20 ° C. in order to increase the specific gravity of the photoresist in the developing waste solution. It is lower than the temperature used in. Through the heating step (S73), the temperature of the developing regeneration solution is increased to meet the conditions of use of the developing process.
이상에서, 출원인은 본 발명의 다양한 실시예들을 설명하였지만, 이와 같은 실시예들은 본 발명의 기술적 사상을 구현하는 일 실시예일 뿐이며, 본 발명의 기술적 사상을 구현하는 한 어떠한 변경예 또는 수정예도 본 발명의 범위에 속하는 것으로 해석되어야 한다.In the above, the Applicant has described various embodiments of the present invention, but these embodiments are merely one embodiment for implementing the technical idea of the present invention, and any changes or modifications may be made to the present invention as long as the technical idea of the present invention is implemented. It should be interpreted as falling within the scope of.

Claims (17)

  1. 현상공정 후 회수된 현상폐액을 공급하는 현상폐액 공급수단과,Developing waste supply means for supplying the developing waste recovered after the developing step;
    상기 현상폐액 공급수단으로부터 상기 현상폐액을 공급받아 상기 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거하여 상기 현상폐액에서 상기 포토레지스트가 분리된 현상재생액을 생성하는 현상재생액 생성수단과,A phenomenon in which the developer is supplied from the developer waste supply means to separate and remove the photoresist by using a difference between specific gravity of the developer and the photoresist in the developer waste to generate a developer regeneration solution in which the photoresist is separated from the developer waste solution; Regeneration solution generating means,
    현상공정에 상기 현상재생액을 공급하는 현상재생액 공급수단을 포함하는 현상액 재생 장치.And a developing regeneration solution supply means for supplying the developing regeneration solution to a developing step.
  2. 제1항에 있어서,The method of claim 1,
    상기 현상폐액 공급수단은 상기 현상폐액의 온도를 하강시키는 냉각수단을 포함하는 것을 특징으로 하는 현상액 재생 장치.And the developer waste solution supplying means comprises cooling means for lowering the temperature of the developer waste solution.
  3. 제2항에 있어서,The method of claim 2,
    상기 현상재생액 공급수단은 상기 현상재생액의 온도를 상승시키는 가열수단을 포함하는 것을 특징으로 하는 현상액 재생 장치.And the developing regeneration solution supplying means includes heating means for raising the temperature of the developing regeneration solution.
  4. 제3항에 있어서,The method of claim 3,
    상기 현상재생액 생성수단은 상기 현상폐액을 선회 흐름으로 만들고, 상기 포토레지스트에 원심력을 작용시킴으로써 상기 포토레지스트를 분리 제거하는 사이클론을 포함하는 것을 특징으로 하는 현상액 재생 장치.And said developing regeneration solution generating means includes a cyclone for making said developing waste liquid into a turning flow and separating and removing said photoresist by applying centrifugal force to said photoresist.
  5. 제1항 내지 제4항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 4,
    상기 현상폐액 공급수단은 상기 현상폐액의 공급압력을 생성하기 위한 제1가압수단을 포함하는 것을 특징으로 하는 현상액 재생 장치.And the developing waste supply means includes first pressing means for generating a supply pressure of the developing waste solution.
  6. 제4항에 있어서,The method of claim 4, wherein
    상기 현상재생액 생성수단은 상기 사이클론에서 제거된 포토레지스트를 수거하는 폐액탱크를 더 포함하는 것을 특징으로 하는 현상액 재생 장치.The developer regeneration solution generating means further comprises a waste tank for collecting the photoresist removed from the cyclone.
  7. 제1항 내지 제4항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 4,
    상기 현상재생액 공급수단은 상기 현상재생액의 공급압력을 생성하기 위한 제2가압수단을 포함하는 것을 특징으로 하는 현상액 재생 장치.And the developing regeneration solution supplying means includes second pressurizing means for generating a supply pressure of the developing regeneration solution.
  8. 제1항 내지 제4항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 4,
    상기 현상재생액 생성수단이 생성한 현상재생액의 포토레지스트 농도가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단에 현상폐액으로 재유입시켜주는 현상재생액 재순환수단을 더 포함하는 것을 특징으로 하는 현상액 재생 장치.And developing developer recycling means for reintroducing the developing regeneration solution into the developing waste supply means as the developing waste solution when the photoresist concentration of the developing regeneration solution generated by the developing regeneration solution generation means is less than a preset standard. A developer reproducing apparatus comprising a.
  9. 제8항에 있어서,The method of claim 8,
    상기 현상재생액 재순환수단은,The developer regeneration solution recycling means,
    상기 현상재생액의 탁도를 측정하는 탁도 측정수단과,Turbidity measuring means for measuring turbidity of the developer regeneration solution;
    상기 탁도 측정수단의 측정 결과가 사전에 설정된 기준에 미달할 경우 상기 현상재생액을 상기 현상폐액 공급수단에 현상폐액으로 재유입되도록 해주는 재순환라인을 포함하는 것을 특징으로 하는 현상액 재생 장치.And a recycling line for reflowing the developing regeneration solution into the developing waste supply means as a developing waste solution when the measurement result of the turbidity measuring means does not meet a predetermined standard.
  10. 현상폐액 공급수단이 현상공정 후 회수된 현상폐액을 현상재생액 생성수단에 공급하는 현상폐액 공급단계와,A developing waste supplying step, wherein the developing waste supplying means supplies the developing waste recovered after the developing process to the developing regeneration solution generating means;
    상기 현상재생액 생성수단이 공급된 현상폐액 내의 현상액과 포토레지스트의 비중의 차이를 이용해 상기 포토레지스트를 분리 제거하여 상기 현상폐액에서 상기 포토레지스트가 제거된 현상재생액을 생성하는 현상재생액 생성단계와,A developer regeneration solution generation step of generating a developer regeneration solution from which the photoresist is removed from the developer waste solution by separating and removing the photoresist by using a difference between the specific gravity of the developer and the photoresist in the developer waste solution supplied with the developer regeneration solution. Wow,
    현상재생액 공급수단이 생성된 현상재생액을 현상공정에 공급하는 현상재생액 공급단계를 포함하는 현상액 재생 방법.And a developer regeneration solution supplying step of supplying the developer regeneration solution generated by the developer regeneration solution supply means to a developing step.
  11. 제10항에 있어서,The method of claim 10,
    상기 현상폐액 공급단계는 냉각수단이 상기 현상폐액의 온도를 하강시키는 냉각단계를 포함하는 것을 특징으로 하는 현상액 재생 방법.The developer waste solution supplying step includes a cooling step of cooling means for lowering the temperature of the developer waste solution.
  12. 제11항에 있어서,The method of claim 11,
    상기 현상재생액 공급단계는 가열수단이 상기 현상재생액의 온도를 상승시키는 가열단계를 포함하는 것을 특징으로 하는 현상액 재생 방법.The developer regeneration solution supplying step includes a heating step in which a heating means raises the temperature of the developer regeneration solution.
  13. 제12항에 있어서,The method of claim 12,
    상기 현상재생액 생성단계는 사이클론이 상기 현상폐액을 선회 흐름으로 만들고, 상기 포토레지스트에 원심력을 작용시킴으로써 상기 포토레지스트를 분리 제거하는 포토레지스트 분리단계를 포함하는 것을 특징으로 하는 현상액 재생 방법.The developer regeneration solution generating step includes a photoresist separation step of separating the photoresist by applying a centrifugal force to the photoresist by turning the developer waste into a swirl flow.
  14. 제10항 내지 제13항 중 어느 한 항에 있어서,The method according to any one of claims 10 to 13,
    상기 현상폐액 공급단계는 제1가압수단이 상기 현상폐액의 압력을 상승시키는 제1공급압력 생성단계를 포함하는 것을 특징으로 하는 현상액 재생 방법.And the developing waste solution supplying step includes a first supply pressure generating step of causing the first pressurizing means to raise the pressure of the developing waste solution.
  15. 제13항에 있어서,The method of claim 13,
    상기 현상재생액 생성단계는, 상기 포토레지스트 분리단계 후에,The developing regeneration solution generation step, after the photoresist separation step,
    상기 사이클론이 상기 현상폐액에서 상기 포토레지스트가 분리 제거된 현상재생액을 배출하는 현상재생액 배출단계와,A developing regeneration solution discharge step of discharging the developing regeneration solution in which the photoresist is separated and removed from the developing waste solution by the cyclone;
    폐액탱크가 상기 사이클론에서 제거된 포토레지스트를 수거하는 폐액 수거단계를 더 포함하되,The waste tank further comprises a waste liquid collection step of collecting the photoresist removed from the cyclone,
    상기 현상재생액 배출단계와 상기 폐액 수거단계는 동시에 진행되는 것을 특징으로 하는 현상액 재생 장치.And the developer regeneration solution discharge step and the waste solution collection step are performed at the same time.
  16. 제10항 내지 제13항 중 어느 한 항에 있어서,The method according to any one of claims 10 to 13,
    상기 현상재생액 공급단계는 제2가압수단이 상기 현상재생액의 압력을 상승시키는 제2공급압력 생성단계를 포함하는 것을 특징으로 하는 현상액 재생 방법.And the developing regeneration solution supplying step includes a second supply pressure generating step of causing the second pressing means to increase the pressure of the developing regeneration solution.
  17. 제10항 내지 제13항 중 어느 한 항에 있어서,The method according to any one of claims 10 to 13,
    상기 현상재생액 생성단계와 상기 현상재생액 공급단계 사이에,Between the developing regeneration solution generating step and the developing regeneration solution supplying step,
    상기 현상재생액의 탁도를 측정하여 사전에 설정된 기준에 미달할 경우 상기 현상폐액 공급단계로 되돌아가 상기 현상재생액을 상기 현상폐액으로 공급하고, 사전에 설정된 기준을 만족할 경우 상기 현상재생액 공급단계가 진행되도록 해주는 현상재생액 탁도 측정단계를 더 포함하는 것을 특징으로 하는 현상액 재생 방법.When the turbidity of the developing regeneration solution is not measured and the predetermined standard is not reached, the processing returns to the developing waste supply step, and the developing regeneration solution is supplied to the developing waste solution. The developer regeneration method further comprises the step of measuring the developer regeneration turbidity to proceed.
PCT/KR2018/004670 2018-04-23 2018-04-23 Device and method for recycling developer WO2019208837A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003033760A (en) * 2001-07-26 2003-02-04 Kemitekku:Kk Regeneration unit for developer
KR100613401B1 (en) * 2006-04-07 2006-08-17 주식회사 대원에프엔씨 Developing system for color filter
JP2006318997A (en) * 2005-05-10 2006-11-24 Pioneer Electronic Corp Pattern forming method and equipment, equipment for treating developer, and method for treating waste developer
KR20090015784A (en) * 2007-08-08 2009-02-12 주식회사 동진쎄미켐 Recirculation method and device of chemical solution in semiconductor or display manufacturing process
KR20090094217A (en) * 2006-11-30 2009-09-04 미츠비시 가가쿠 엔지니어링 가부시키가이샤 Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
KR20180116660A (en) * 2017-04-17 2018-10-25 조명국 Apparatus for Recycling Developer and Method for the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003033760A (en) * 2001-07-26 2003-02-04 Kemitekku:Kk Regeneration unit for developer
JP2006318997A (en) * 2005-05-10 2006-11-24 Pioneer Electronic Corp Pattern forming method and equipment, equipment for treating developer, and method for treating waste developer
KR100613401B1 (en) * 2006-04-07 2006-08-17 주식회사 대원에프엔씨 Developing system for color filter
KR20090094217A (en) * 2006-11-30 2009-09-04 미츠비시 가가쿠 엔지니어링 가부시키가이샤 Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
KR20090015784A (en) * 2007-08-08 2009-02-12 주식회사 동진쎄미켐 Recirculation method and device of chemical solution in semiconductor or display manufacturing process
KR20180116660A (en) * 2017-04-17 2018-10-25 조명국 Apparatus for Recycling Developer and Method for the same

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