TW201704902A - Component concentration measuring method and apparatus for developing solution, and developing solution managing method and apparatus provides a highly precise component concentration estimation method and apparatus - Google Patents

Component concentration measuring method and apparatus for developing solution, and developing solution managing method and apparatus provides a highly precise component concentration estimation method and apparatus Download PDF

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TW201704902A
TW201704902A TW104143283A TW104143283A TW201704902A TW 201704902 A TW201704902 A TW 201704902A TW 104143283 A TW104143283 A TW 104143283A TW 104143283 A TW104143283 A TW 104143283A TW 201704902 A TW201704902 A TW 201704902A
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中川俊元
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平間理化研究所股份有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N9/00Investigating density or specific gravity of materials; Analysing materials by determining density or specific gravity
    • G01N9/36Analysing materials by measuring the density or specific gravity, e.g. determining quantity of moisture

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Abstract

The disclosure provides a component concentration estimation method and apparatus capable of precisely calculating the concentration of each component of an alkaline developing solution, such as an alkaline component, dissolved photoresist, absorbed carbon dioxide and the like, according to characteristic values of the developing solution, and a management method and apparatus capable of maintaining and managing the developing performance of the developing solution in the best condition. The present invention uses a measurement unit 1 to measure a plurality of characteristic values of the developing solution related to the component concentration of the developing solution. The plurality of measured characteristic values are sent to a calculation unit 2, which calculates the component concentration of the developing solution with multivariate analysis. The control unit 3 is configured to: set any one of the measured characteristic value and the calculated alkaline component concentration as a predetermined management value, allow any one of the measured characteristic value and the calculated photoresist concentration to be in a predetermined management range, and supply a replenishing solution, such as primary solution, new solution or pure water, to the developing solution in such a manner that the measured characteristic value and the calculated photoresist concentration are in a predetermined management range.

Description

顯影液的成分濃度測定方法及裝置、與顯影液管理方法及裝置 Method and device for measuring component concentration of developing solution, and developing solution management method and device

本發明係有關在半導體和液晶面板的電路基板的顯影製程等中用以顯影光阻(photoresist)膜所使用之呈鹼性的顯影液的成分濃度測定方法及成分濃度測定裝置、與顯影液管理方法及顯影液管理裝置。 The present invention relates to a component concentration measuring method, a component concentration measuring device, and a developer management system for developing an alkaline developing solution for developing a photoresist film in a developing process of a circuit board of a semiconductor or a liquid crystal panel. Method and developer management device.

在實現半導體和液晶面板等的微細配線加工之微影(photolithography)的顯影製程中,關於溶解成膜在基板上的光阻之藥液方面,使用呈鹼性的顯影液(以下,稱為「鹼性顯影液」)。 In the development process of photolithography for performing fine wiring processing such as semiconductors and liquid crystal panels, an alkaline developing solution is used for dissolving a chemical solution for forming a photoresist on a substrate (hereinafter referred to as " Alkaline developer").

近年來,在半導體和液晶面板基板的製程中,晶圓和玻璃基板的大型化與配線加工的微細化以及高密度積體化已有長足進展。在這樣的狀況下,為了實現大型基板的配線加工的微細化及高密度積體化,便需要更加高精度地測定鹼性顯影液的主要成分的濃度來維持管理顯影液。 In recent years, in the process of semiconductors and liquid crystal panel substrates, there has been a great progress in increasing the size of wafers and glass substrates, miniaturization of wiring processes, and high-density integration. In such a situation, in order to achieve the miniaturization and high-density integration of the wiring processing of the large substrate, it is necessary to measure the concentration of the main component of the alkaline developing solution with higher precision to maintain the management developer.

關於習知的鹼性顯影液的成分濃度的測定,係如下述專利文獻1所記載,利用鹼性顯影液的鹼性成分的濃度(以下,稱為「鹼性成分濃度」)與導電率之間可獲得良好的線性關係這點、以及溶解於鹼性顯影液的光阻的濃度(以下,稱為「溶解光阻濃度」)與吸光度之間可獲得良好的線性關係這點。 The measurement of the component concentration of the conventional alkaline developer is as described in Patent Document 1 below, and the concentration of the alkaline component (hereinafter referred to as "alkaline component concentration") and the conductivity of the alkaline developer are used. A good linear relationship can be obtained between the point of obtaining a good linear relationship and the concentration of the photoresist dissolved in the alkaline developing solution (hereinafter referred to as "dissolved photoresist concentration") and the absorbance.

然而,鹼性顯影液會因吸收空氣中的二氧化碳生成碳酸鹽而容易劣化。此外,鹼性顯影液還會因光阻的溶解而生成光阻鹽,消耗掉在顯影處理起到效果的鹼性成分。因此,重複使用的鹼性顯影液並非僅有鹼性成分,而是形成為還含有光阻和二氧化碳的多成分系統。此外,該些成分分別以不同的貢獻率影響著顯影性能。因此,為了高精度地維持管理顯影液的顯影性能,便需要進行一併考慮到該些成分對顯影性能造成的影響之顯影液管理。 However, the alkaline developing solution is easily deteriorated by absorbing carbon dioxide in the air to form carbonate. Further, the alkaline developing solution generates a photoresist salt due to dissolution of the photoresist, and consumes an alkaline component which is effective in development processing. Therefore, the reusable alkaline developing solution is not only an alkaline component but a multi-component system which also contains a photoresist and carbon dioxide. In addition, the components affect the developing performance at different contribution rates. Therefore, in order to maintain the development performance of the developing developer with high precision, it is necessary to carry out developer management in consideration of the influence of the components on the developing performance.

為了解決上述問題,下述專利文獻2揭示了一種顯影液調製裝置等內容,係測定顯影液的超音波傳播速度、導電率及吸光度,根據預先建立好的超音波傳播速度、導電率與吸光度於鹼性濃度、碳酸鹽濃度及溶解樹脂濃度下的關係(矩陣表(matrix))來檢測顯影液的鹼性濃度、碳酸鹽濃度及溶解樹脂濃度,再根據所測定得的顯影液的鹼性濃度、碳酸鹽濃度及溶解樹脂濃度、與預先建立好的得以發揮使CD值(CD:Critical Dimension)(線寬)成為一定值之溶解能力的鹼性濃度、碳酸鹽濃度與溶解樹脂濃度之關係來控制顯影液原液的供給而調節鹼性濃度。 In order to solve the above problem, Patent Document 2 listed below discloses a developer liquid preparation device and the like, which measures the ultrasonic wave propagation speed, conductivity, and absorbance of the developer, and is based on the previously established ultrasonic wave propagation speed, conductivity, and absorbance. The relationship between the alkaline concentration, the carbonate concentration, and the dissolved resin concentration (matrix) to detect the alkaline concentration, the carbonate concentration, and the dissolved resin concentration of the developer, and then based on the measured alkaline concentration of the developer The relationship between the carbonate concentration and the dissolved resin concentration, and the alkali concentration, the carbonate concentration, and the dissolved resin concentration which are previously established so that the CD value (CD: Critical Dimension) (line width) becomes a certain value. The supply of the developer solution is controlled to adjust the alkali concentration.

此外,在下述專利文獻3揭示一種鹼性顯影液管理系統等內容,係具備:碳酸系鹽類濃度測定裝置,係測定顯影液的折射率、導電率、吸光度,從該些測定值取得顯影液中的碳酸系鹽類濃度;及控制部,係控制該碳酸系鹽類濃度測定裝置與顯影液中的碳酸系鹽類濃度。 In addition, the following Patent Document 3 discloses an alkaline developer management system and the like, and includes a carbonic acid salt concentration measuring device that measures a refractive index, a conductivity, and an absorbance of a developer, and obtains a developer from the measured values. The carbonic acid salt concentration in the medium; and the control unit controls the carbonic acid salt concentration in the carbonic acid salt concentration measuring device and the developing solution.

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1 日本國特許第2561578號公報 Patent Document 1 Japanese Patent No. 2561778

專利文獻2 日本國特開2008-283162號公報 Patent Document 2 Japanese Patent Laid-Open Publication No. 2008-283162

專利文獻3 日本國特開2011-128455號公報 Patent Document 3 Japanese Patent Laid-Open No. 2011-128455

然而,鹼性顯影液的超音波傳播速度值和折射率值乃係一表示屬於多成分系統的鹼性顯影液的藥液整體性質之特性值。一般而言,此一表示藥液整體性質之特性值未必只會與該液體中的特定成分的濃度相關。此一表示藥液整體性質之特性值通常與該液體中的各種成分的每一濃度有關。因此,在從此一表示藥液整體性質之特性值的測定值演算顯影液的成分濃度的情形中,若假設某特性值只與特定的成分濃度相關(例如存在線性關係)而忽略其他成分對該特性值造成的影響,便有無法以充分的精度算出該特定成分的濃度之問題。 However, the ultrasonic propagation velocity value and the refractive index value of the alkaline developing solution are characteristic values indicating the overall properties of the chemical liquid of the alkaline developing solution belonging to the multi-component system. In general, this characteristic value indicating the overall properties of the liquid is not necessarily related to the concentration of a specific component in the liquid. This means that the characteristic value of the overall properties of the liquid is usually related to each concentration of the various components in the liquid. Therefore, in the case where the component concentration of the developer is calculated from the measured value of the characteristic value of the overall property of the chemical solution, it is assumed that a certain characteristic value is only related to a specific component concentration (for example, there is a linear relationship) and other components are ignored. The influence of the characteristic value may cause a problem that the concentration of the specific component cannot be calculated with sufficient accuracy.

另一方面,在以顯影液的特性值為顯影液中的各種成分的濃度之函數來從顯影液的特性值的測定值算出各成分濃度的情形中,必須採用測定得複數個特性值後,用以從該些特性值的測定值算出各成分濃度之適當的演算手法。然而,適當地選擇應測定的特性值以及找出能夠從特性值的測定值高精度地算出各成分濃度的適當的演算手法均非常困難。因此,有若所測定的特性值與演算手法不適當,便無法以充分的精度算出各成分濃度之問題。 On the other hand, in the case where the concentration of each component is calculated from the measured value of the characteristic value of the developer as a function of the concentration of the developer in the characteristic value of the developer, it is necessary to measure a plurality of characteristic values. An appropriate calculation method for calculating the concentration of each component from the measured values of the characteristic values. However, it is extremely difficult to appropriately select the characteristic value to be measured and to find an appropriate calculation method capable of accurately calculating the concentration of each component from the measured value of the characteristic value. Therefore, if the measured characteristic value and the calculation method are not appropriate, the problem of the concentration of each component cannot be calculated with sufficient accuracy.

此外,在多成分系統的液體中,一般而言某個成分的濃度並非與其他成分的濃度互為獨立。在多成分系統的液體中,係存在當某個成分的濃度變化,其他成分濃度同時也變化的相互關係。這點使得高精度的成分濃度的算出及高精度的顯影液管理更加困難。 Further, in a liquid of a multi-component system, generally, the concentration of a certain component is not independent of the concentration of other components. In the liquid of the multi-component system, there is a correlation in which the concentration of one component changes and the concentration of other components also changes. This makes it more difficult to calculate the component concentration with high precision and to manage the developer with high precision.

除此之外,關於顯影液所吸收的二氧化碳的濃度(以下,稱為「吸收二氧化碳濃度」),過往並不曉得顯影液有哪個適當特性值表現出與吸收二氧化碳濃度有良好的關係,難以高精度地測定吸收二氧化碳濃度。 In addition, regarding the concentration of carbon dioxide absorbed by the developer (hereinafter referred to as "absorbed carbon dioxide concentration"), it has not been known in the past which appropriate characteristic value of the developer exhibits a good relationship with the concentration of absorbed carbon dioxide, and is difficult to be high. Accurately measure the concentration of absorbed carbon dioxide.

此外,在上述專利文獻2中,為了檢測顯影液的成分濃度,必須預先取得顯影液的成分濃度與超音波傳播速度等特性值的相互關係(矩陣表)。然而,此時,當相互關係(矩陣表)粗略,便無法高精度地算出成分濃度。要高精度地算出成分濃度,用於演算的顯影液的特性值與成分濃度的相互關係(矩陣表)必須夠稠密才行。因此,愈想提高成分濃度的算出精度,就必須預先 準備更多的樣品來測定其成分濃度與顯影液的特性值的相互關係才行。預先準備如上述的稠密的相互關係(矩陣表)的作業量非常龐大,成了實現顯影液的成分濃度的高精度測定面臨的問題。 Further, in Patent Document 2, in order to detect the component concentration of the developer, it is necessary to obtain a correlation (matrix table) of characteristic values such as the component concentration of the developer and the ultrasonic wave propagation velocity in advance. However, at this time, when the correlation (matrix table) is rough, the component concentration cannot be accurately calculated. In order to accurately calculate the component concentration, the correlation between the characteristic value of the developer for calculation and the component concentration (matrix table) must be sufficiently dense. Therefore, the more you want to improve the accuracy of the calculation of the component concentration, you must More samples were prepared to determine the correlation between the concentration of the components and the characteristic values of the developer. The amount of work required to prepare the dense correlation (matrix table) as described above is extremely large, which is a problem in achieving high-precision measurement of the concentration of the developer solution.

本發明乃係為了解決上述諸課題而研創。本發明的目的在於提供能夠從屬於多成分系統的顯影液的特性值高精度地測定顯影液的成分濃度,並且不需龐大數量樣品的準備和前期測定便能夠分析顯影液的成分濃度之顯影液的成分濃度測定方法及裝置、與能夠更加精密地管理顯影液的成分濃度之顯影液管理方法及裝置。 The present invention has been made in order to solve the above problems. An object of the present invention is to provide a developer capable of accurately measuring a component concentration of a developer from a characteristic value of a developer belonging to a multi-component system, and capable of analyzing a component concentration of a developer without preparation and preliminary measurement of a large number of samples. The method and apparatus for measuring the component concentration, and the developer management method and apparatus capable of more precisely managing the concentration of the component of the developer.

為了達成前述目的,本發明係具備藉由多變量分析法(例如,複回歸分析法)算出顯影液的成分濃度之步驟及演算部。亦即,本發明係提供下述的成分濃度測定方法、成分濃度測定裝置、顯影液管理方法、及顯影液管理裝置。 In order to achieve the above object, the present invention includes a step of calculating a component concentration of a developer by a multivariate analysis method (for example, a complex regression analysis method) and a calculation unit. That is, the present invention provides the following component concentration measuring method, component concentration measuring device, developing solution management method, and developing solution management device.

(1)一種顯影液的成分濃度測定方法,係含有下述步驟:測定與重複使用的呈鹼性的顯影液的成分濃度有相關的顯影液的複數個特性值之步驟;及根據所測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度之步驟。 (1) A method for measuring a component concentration of a developer, comprising the steps of: measuring a plurality of characteristic values of a developer associated with a component concentration of a repeatedly used developer; and determining The plurality of characteristic values are a step of calculating the component concentration of the developer by multivariate analysis.

(2)一種顯影液的成分濃度測定裝置,係具備:測定部,係測定與重複使用的呈鹼性的顯影液的成分濃度有相關的顯影液的複數個特性值;及演算部,係根據藉由測定部測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度。 (2) A component concentration measuring device for a developing solution, comprising: a measuring unit that measures a plurality of characteristic values of a developing solution relating to a component concentration of a re-used alkaline developing solution; and an arithmetic unit according to the calculation unit The component concentration of the developer is calculated by a multivariate analysis method by a plurality of characteristic values measured by the measuring unit.

(3)一種顯影液管理方法,係含有下述步驟:測定與重複使用的呈鹼性的顯影液的成分濃度有相關的顯影液的複數個特性值之步驟;從所測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度之步驟;及根據從以進行測定的步驟測定的顯影液的複數個特性值及以進行算出的步驟算出的顯影液的成分濃度當中選擇的管理對象項目的測定值或算出值,補給補充液至前述顯影液之步驟。 (3) A developer management method comprising the steps of: measuring a plurality of characteristic values of a developer associated with a component concentration of a repetitive alkaline developer; and measuring a plurality of characteristics a value obtained by calculating a component concentration of the developer by a multivariate analysis method; and selecting a plurality of characteristic values of the developer measured by the step of performing the measurement and a component concentration of the developer calculated by the step of calculating The measurement value or the calculated value of the management target item, and the step of replenishing the replenishing liquid to the developer.

(4)一種顯影液管理裝置,係具備:測定部,係測定與重複使用的呈鹼性的顯影液的成分濃度有相關的顯影液的複數個特性值;演算部,係根據藉由測定部測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度;及控制部,係根據從以測定部測定的顯影液的複數個特性值及以演算部算出的顯影液的成分濃度當中選擇的管理對象項目的測定值或算出值,對設置在輸送補給至顯影液的補充液之流路的控制閥發出控制信號。 (4) A developer management apparatus comprising: a measurement unit that measures a plurality of characteristic values of a developer associated with a component concentration of an alkaline developer that is repeatedly used; and an operation unit that is based on a measurement unit The plurality of characteristic values are measured, and the component concentration of the developer is calculated by the multivariate analysis method; and the control unit is based on a plurality of characteristic values of the developer measured by the measuring unit and the composition of the developer calculated by the calculation unit. The measured value or the calculated value of the management target item selected among the concentrations gives a control signal to the control valve provided in the flow path for supplying the replenishing liquid supplied to the developing solution.

(5)如前述(4)之顯影液管理裝置,其中測定部具備:第一測定手段,係測定與顯影液的成分中的至少鹼性成分的濃度有相關的顯影液的特性值;及第二測定手段,係測定與顯影液的成分中的至少溶解於顯影液的光阻的濃度有相關的顯影液的特性值。 (5) The developing solution management device according to the above (4), wherein the measuring unit includes: a first measuring means for measuring a characteristic value of the developing solution relating to a concentration of at least an alkaline component in a component of the developing solution; The second measuring means measures the characteristic value of the developing solution relating to the concentration of at least the photoresist dissolved in the developing solution among the components of the developing solution.

(6)如前述(5)之顯影液管理裝置,其中演算部具備算出顯影液的鹼性成分的濃度及光阻的濃度之演算方塊(block);控制部具備:以使藉由演算方塊算出的鹼性成分的濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊;及以使藉由演算方塊算出的光阻的濃度成為預定之管理值以下之方式對控制閥發出控制信號之控制方塊。 (6) The developer management device according to the above (5), wherein the calculation unit includes a calculation block for calculating the concentration of the alkaline component of the developer and the concentration of the photoresist; and the control unit includes: calculating by the calculation block a control block for issuing a control signal to the control valve in such a manner that the concentration of the alkaline component becomes a predetermined management value; and a control signal is issued to the control valve such that the concentration of the photoresist calculated by the calculation block becomes a predetermined management value or less Control block.

(7)如前述(5)之顯影液管理裝置,其中測定部復具備第三測定手段,該第三測定手段係測定與顯影液的成分中的至少顯影液所吸收的二氧化碳的濃度有相關的顯影液的特性值。 (7) The developer management device according to (5), wherein the measuring unit further includes a third measuring means for measuring a concentration of carbon dioxide absorbed by at least the developing solution among the components of the developing solution. The characteristic value of the developer.

(8)如前述(7)之顯影液管理裝置,其中演算部具備算出顯影液的二氧化碳的濃度之演算方塊;控制部具備:以使藉由第一測定手段測定的顯影液的特性值成為預定之管理值之方式對控制閥發出控制信號之控制方塊;以使藉由第二測定手段測定的顯影液的特性值落在預定之管理區域之方式對控制閥發出控制信號之控制方塊;及 以使藉由演算方塊算出的二氧化碳的濃度成為預定之管理值以下之方式對控制閥發出控制信號之控制方塊。 (8) The developer management device according to (7), wherein the calculation unit includes a calculation block for calculating a concentration of carbon dioxide in the developer; and the control unit includes: the characteristic value of the developer measured by the first measurement means is predetermined a control block for issuing a control signal to the control valve in a manner of managing values; a control block for issuing a control signal to the control valve in such a manner that the characteristic value of the developer measured by the second measuring means falls within a predetermined management area; A control block for issuing a control signal to the control valve in such a manner that the concentration of carbon dioxide calculated by the calculation block becomes equal to or less than a predetermined management value.

(9)如前述(7)之顯影液管理裝置,其中演算部具備算出顯影液的鹼性成分的濃度及二氧化碳的濃度之演算方塊;控制部具備:以使藉由演算方塊算出的鹼性成分的濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊;以使藉由第二測定手段測定的顯影液的特性值落在預定之管理區域之方式對控制閥發出控制信號之控制方塊;及以使藉由演算方塊算出的二氧化碳的濃度成為預定之管理值以下之方式對控制閥發出控制信號之控制方塊。 (9) The developer management device according to the above (7), wherein the calculation unit includes a calculation block for calculating the concentration of the alkaline component of the developer and the concentration of carbon dioxide; and the control unit includes the alkaline component calculated by the calculation block. The control block sends a control signal to the control valve in such a manner that the concentration becomes a predetermined management value; the control signal is sent to the control valve in such a manner that the characteristic value of the developer measured by the second measuring means falls within a predetermined management area And a control block for issuing a control signal to the control valve such that the concentration of carbon dioxide calculated by the calculation block becomes equal to or less than a predetermined management value.

(10)如前述(7)之顯影液管理裝置,其中演算部具備算出顯影液的鹼性成分的濃度、光阻的濃度及二氧化碳的濃度之演算方塊;控制部具備:以使藉由演算方塊算出的鹼性成分的濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊;以使藉由演算方塊算出的光阻的濃度成為預定之管理值以下之方式對控制閥發出控制信號之控制方塊;及以使藉由演算方塊算出的二氧化碳的濃度成為預定之管理值以下之方式對控制閥發出控制信號之控制方塊。 (10) The developer management device according to (7) above, wherein the calculation unit includes a calculation block for calculating a concentration of an alkaline component of the developer, a concentration of the photoresist, and a concentration of carbon dioxide; and the control unit includes: a control block for issuing a control signal to the control valve in such a manner that the calculated concentration of the alkaline component becomes a predetermined management value; and a control signal is issued to the control valve such that the concentration of the photoresist calculated by the calculation block becomes equal to or less than a predetermined management value a control block; and a control block for issuing a control signal to the control valve in such a manner that the concentration of carbon dioxide calculated by the calculation block becomes equal to or less than a predetermined management value.

依據本發明,係藉由使用多變量分析法(例如,複回歸分析法)的演算手段算出屬於多成分系統 的鹼性顯影液的成分濃度,因此相較於以所測定的特性值與特定的成分濃度存在預定之相關關係(例如,線性關係)來算出成分濃度的習知手法,即使是從受到複數個顯影液成分影響的特性值,仍能夠高精度地算出顯影液的成分濃度。具體而言,依據本發明,能夠測定習知難以測定的顯影液的吸收二氧化碳濃度。此外,相較於事前準備複數個測定特性值與複數個成分濃度之間的相關關係(矩陣表)供進行成分濃度的算出所用的手法,本發明也不須準備龐大數量的樣品來實施前期測定。 According to the present invention, a multi-component system is calculated by using a multivariate analysis method (for example, complex regression analysis) The concentration of the component of the alkaline developing solution is therefore a conventional method of calculating the component concentration as compared with a predetermined correlation (for example, a linear relationship) between the measured characteristic value and the specific component concentration, even if it is subjected to plural The characteristic value affected by the developer component can still accurately calculate the component concentration of the developer. Specifically, according to the present invention, it is possible to measure the concentration of absorbed carbon dioxide of a developer which is conventionally difficult to measure. Further, the present invention does not require preparation of a large number of samples for performing preliminary measurement, as compared with a method for preparing a correlation between a plurality of measured characteristic values and a plurality of component concentrations (matrix table) for calculating the component concentration. .

依據本發明,能夠比習知技術更高精度地測定屬於多成分系統的鹼性顯影液的各成分濃度,因此能夠比習知技術更加高精度地控制鹼性成分濃度、溶解光阻濃度、吸收二氧化碳濃度。此外,依據本發明,亦能夠選擇將顯影液的導電率值控制在一定之管理、將顯影液的吸光度值控制在一定的吸光度值以下之管理。 According to the present invention, since the concentration of each component of the alkaline developing solution belonging to the multi-component system can be measured with higher precision than the prior art, the alkaline component concentration, the dissolved photoresist concentration, and the absorption can be controlled more accurately than the prior art. Carbon dioxide concentration. Further, according to the present invention, it is also possible to select a management in which the conductivity value of the developer is controlled to a certain level, and the absorbance value of the developer is controlled to be equal to or lower than a certain absorbance value.

1‧‧‧測定部 1‧‧‧Determination Department

2‧‧‧演算部 2‧‧‧ Calculation Department

3‧‧‧控制部 3‧‧‧Control Department

4‧‧‧閥 4‧‧‧ valve

5‧‧‧信號線 5‧‧‧ signal line

6‧‧‧顯影設備 6‧‧‧Developing equipment

7‧‧‧顯影設備 7‧‧‧Developing equipment

8‧‧‧流體管路 8‧‧‧ fluid lines

9‧‧‧補充液貯留槽 9‧‧‧Replenishment tank

11‧‧‧第一測定手段 11‧‧‧First measure

12‧‧‧第二測定手段 12‧‧‧Second measure

13‧‧‧第三測定手段 13‧‧‧ Third measure

11a、12a、13a‧‧‧測定裝置本體 11a, 12a, 13a‧‧‧measurement device body

11b、12b、13b‧‧‧測定探針 11b, 12b, 13b‧‧‧ assay probe

14、14a、14b、14c‧‧‧取樣泵 14, 14a, 14b, 14c‧‧ ‧ sampling pump

15、15a、15b、15c‧‧‧取樣配管 15, 15a, 15b, 15c‧‧‧ sampling piping

16、16a、16b、16c‧‧‧回流配管 16, 16a, 16b, 16c‧‧‧ reflow piping

17‧‧‧送液泵 17‧‧‧ Liquid pump

18‧‧‧送液配管 18‧‧‧ Liquid supply piping

19‧‧‧廢液配管 19‧‧‧Waste piping

21‧‧‧以多變量分析法進行的演算方塊 21‧‧‧ calculus with multivariate analysis

22‧‧‧以檢量曲線法進行的演算方塊 22‧‧‧Study block using the calibration curve method

31、32、33‧‧‧控制方塊 31, 32, 33‧‧‧ control blocks

23‧‧‧演算控制部(例如電腦) 23‧‧‧ Calculation Control Department (eg computer)

41至43‧‧‧控制閥 41 to 43‧‧‧ control valve

44、45‧‧‧閥 44, 45‧‧‧ valve

46、47‧‧‧加壓氣體用閥 46, 47‧‧‧ Valves for pressurized gas

51至53‧‧‧測定資料用信號線 51 to 53‧‧‧ Signal line for measurement data

54‧‧‧演算資料用信號線 54‧‧‧Signal lines for calculation data

55至57‧‧‧控制信號用信號線 55 to 57‧‧‧ Signal lines for control signals

61‧‧‧顯影液貯留槽 61‧‧‧ developer storage tank

62‧‧‧溢流槽 62‧‧‧Overflow trough

63‧‧‧液面計 63‧‧‧liquid level meter

64‧‧‧顯影室護罩 64‧‧‧Development room shield

65‧‧‧輥式輸送機 65‧‧‧Roller conveyor

66‧‧‧基板 66‧‧‧Substrate

67‧‧‧顯影液澆淋頭 67‧‧‧Developing sprinkler

71‧‧‧廢液泵 71‧‧‧Waste pump

72、74‧‧‧循環泵 72, 74‧‧‧ Circulating pump

73、75‧‧‧過濾器 73, 75‧‧‧ filter

80‧‧‧顯影液管路 80‧‧‧developer line

81、82‧‧‧補充液(顯影液原液及/或新 液)用管路 81, 82‧‧ ‧ replenishing solution (developer stock solution and / or new Liquid)

83‧‧‧純水用管路 83‧‧‧Pure water pipeline

84‧‧‧合流管路 84‧‧‧Confluence pipeline

85‧‧‧循環管路 85‧‧‧Circulation line

86‧‧‧氮氣用管路 86‧‧‧Nitrogen pipeline

91、92‧‧‧補充液(顯影液原液及/或新液)貯留槽 91, 92‧‧‧ replenishing liquid (developer stock solution and / or new liquid) storage tank

93‧‧‧添加試藥 93‧‧‧Adding reagents

A‧‧‧成分濃度測定裝置 A‧‧‧ component concentration measuring device

B‧‧‧顯影製程設備 B‧‧‧Developing process equipment

C‧‧‧補充液貯留部 C‧‧‧Replenishment Storage Department

D‧‧‧循環攪拌機構 D‧‧‧Circulating mixing mechanism

E‧‧‧顯影液管理裝置 E‧‧‧ developer management device

第1圖係顯示從兩個特性值測定兩個成分的成分濃度時的信號的流程之成分濃度測定方法的流程圖。 Fig. 1 is a flow chart showing a method of measuring a component concentration of a flow when a component concentration of two components is measured from two characteristic values.

第2圖係顯示從三個以上的特性值測定三個以上成分的成分濃度時的信號的流程之成分濃度測定方法的流程圖。 Fig. 2 is a flowchart showing a method of measuring a component concentration of a flow when a component concentration of three or more components is measured from three or more characteristic values.

第3圖係顯示含有不同於多變量分析法的演算手法時的信號的流程之成分濃度測定方法的流程圖。 Fig. 3 is a flow chart showing a method of measuring a component concentration of a flow containing a signal different from the calculation method of the multivariate analysis method.

第4圖係測定顯影液的兩個成分的成分濃度測定裝置的示意圖。 Fig. 4 is a schematic view showing a device for measuring a component concentration of two components of a developer.

第5圖係測定顯影液的三個成分的成分濃度測定裝置的示意圖。 Fig. 5 is a schematic view showing a device for measuring a component concentration of three components of a developer.

第6圖係在演算部具有以不同於多變量分析法的演算手法進行的演算方塊之成分濃度測定裝置的示意圖。 Fig. 6 is a schematic diagram of a component concentration measuring device having a calculation block performed by an arithmetic method different from the multivariate analysis method in the calculation unit.

第7圖係測定部與演算部為個別獨立、以線內(inline)方式進行測定時的成分濃度測定裝置的示意圖。 Fig. 7 is a schematic diagram of a component concentration measuring device when the measurement unit and the calculation unit are individually independent and measured in an inline manner.

第8圖係測定手段為由本體與探針部構成時的成分濃度測定裝置的示意圖。 Fig. 8 is a schematic view showing a component concentration measuring device when the measuring means is constituted by a main body and a probe portion.

第9圖係將測定手段以並列方式配置的成分濃度測定裝置的示意圖。 Fig. 9 is a schematic view showing a component concentration measuring device in which measurement means are arranged in parallel.

第10圖係配置有需添加藥劑的測定裝置時的成分濃度測定裝置的示意圖。 Fig. 10 is a schematic view showing a component concentration measuring device in a case where a measuring device to which a drug is to be added is disposed.

第11圖係將成分濃度測定裝置應用於顯影液管理裝置的示意圖。 Fig. 11 is a schematic view showing the application of the component concentration measuring device to the developer management device.

第12圖係用以顯示成分濃度測定裝置的應用範例之示意圖。 Fig. 12 is a schematic view showing an application example of the component concentration measuring device.

第13圖係藉由成分濃度來管理顯影液的兩個成分的顯影液管理方法的流程圖。 Figure 13 is a flow chart showing a developer management method for managing two components of a developer by a component concentration.

第14圖係藉由成分濃度來管理顯影液的兩個成分其中一成分、藉由特性值來管理另一成分的顯影液管理方法的流程圖。 Fig. 14 is a flow chart showing a method of managing a developer which manages one of the two components of the developer by the component concentration and manages the other component by the property value.

第15圖係藉由成分濃度來管理顯影液的三個成分的顯影液管理方法的流程圖。 Fig. 15 is a flow chart showing a developer management method for managing three components of a developer by a component concentration.

第16圖係藉由特性值來管理顯影液的三個成分其中一成分、藉由成分濃度來管理其餘兩成分的顯影液管理方法的流程圖。 Fig. 16 is a flow chart showing a method of managing a developer for managing the remaining two components by one of the three components of the developer by the characteristic value.

第17圖係藉由特性值來管理顯影液的三個成分其中兩成分、藉由成分濃度來管理其餘一成分的顯影液管理方法的流程圖。 Fig. 17 is a flow chart showing a method of managing a developer for managing the remaining components by three components of the three components of the developer by characteristic values.

第18圖係用以說明本發明的顯影液管理裝置之顯影製程的示意圖。 Fig. 18 is a schematic view for explaining the developing process of the developer management device of the present invention.

第19圖係對裝置外部的控制閥進行控制的顯影液管理裝置的示意圖。 Figure 19 is a schematic view of a developer management device that controls a control valve outside the device.

第20圖係具備有兼具演算功能與控制功能的演算控制部之顯影液管理裝置的示意圖。 Fig. 20 is a schematic diagram of a developer management device having an arithmetic control unit having both an arithmetic function and a control function.

第21圖係管理顯影液的兩個成分的顯影液管理裝置的示意圖。 Fig. 21 is a schematic view showing a developer management device for managing two components of the developer.

第22圖係藉由成分濃度來管理顯影液的兩個成分的顯影液管理裝置的示意圖。 Fig. 22 is a schematic view showing a developer management device for managing two components of a developer by a component concentration.

第23圖係藉由特性值來管理顯影液的三個成分其中兩成分、藉由成分濃度來管理其餘一成分的顯影液管理裝置的示意圖。 Fig. 23 is a schematic diagram of a developer management apparatus which manages the remaining components by the three components of the developer by the characteristic values.

第24圖係藉由特性值來管理顯影液的三個成分其中一成分、藉由成分濃度來管理其餘兩成分的顯影液管理裝置的示意圖。 Fig. 24 is a schematic view showing a developer management device for managing one of the three components of the developer by the characteristic value and managing the remaining two components by the component concentration.

第25圖係藉由成分濃度來管理顯影液的三個成分的顯影液管理裝置的示意圖。 Fig. 25 is a schematic view showing a developer management apparatus for managing three components of a developer by a component concentration.

以下,適當參照圖式,針對本發明的較佳實施形態詳細進行說明。其中,關於下述各實施形態所記載的裝置等之形狀、大小、尺寸比、相對配置等,只要無特別說明,則本發明之範圍便不受圖示內容之限。僅單純作為說明例而示意性圖示而已。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. In addition, the shape, the size, the size ratio, the relative arrangement, and the like of the apparatus and the like described in the following embodiments are not limited to the scope of the invention unless otherwise specified. It is merely schematically illustrated as an illustrative example.

此外,在以下的說明中,就顯影液的具體例而言,選用在半導體和液晶面板基板的製程中主要使用的2.38%四甲基氫氧化銨(tetramethylammonium hydroxide)水溶液(以下,將四甲基氫氧化銨稱為TMAH)進行說明。但本發明所適用的顯影液並不以此為限。就本發明的顯影液的成分濃度測定裝置和顯影液管理裝置等所能夠適用的其他顯影液的例子而言,能夠舉出氫氧化鉀、氫氧化鈉、磷酸鈉、矽酸鈉等無機化合物的水溶液和三甲基單乙醇氫氧化銨(trimethyl monoethanol ammonium hydroxide)(膽醶(choline))等有機化合物的水溶液。 Further, in the following description, in the specific example of the developer, an aqueous solution of 2.38% tetramethylammonium hydroxide mainly used in the process of the semiconductor and liquid crystal panel substrate (hereinafter, tetramethyl group) is selected. Description of ammonium hydroxide is called TMAH). However, the developer to which the present invention is applied is not limited thereto. Examples of other developing solutions that can be applied to the component concentration measuring device and the developer managing device of the developing solution of the present invention include inorganic compounds such as potassium hydroxide, sodium hydroxide, sodium phosphate, and sodium citrate. An aqueous solution of an aqueous solution and an organic compound such as trimethyl monoethanol ammonium hydroxide (choline).

此外,關於多變量分析法(例如複回歸分析法),在進行成分濃度的算出時,係無關於成分濃度為何種單位的濃度,但在以下的說明中,鹼性成分濃度、溶解光阻濃度、吸收二氧化碳濃度等成分濃度乃係採重量百分率濃度(wt%)計算的濃度。所謂的「溶解光阻濃度」,係指將溶解的光阻換算成光阻的量時的濃度;所謂的「吸收二氧化碳濃度」,係指將所吸收的二氧化碳換算成二氧化碳的量時的濃度。 Further, in the multivariate analysis method (for example, the complex regression analysis method), when the concentration of the component is calculated, the concentration of the component concentration is not determined, but in the following description, the alkaline component concentration and the dissolved photoresist concentration are determined. The concentration of the component such as the concentration of absorbed carbon dioxide is the concentration calculated by the concentration by weight percentage (wt%). The "dissolved photoresist concentration" refers to a concentration at which the dissolved photoresist is converted into a resist amount; the "absorbed carbon dioxide concentration" refers to a concentration at which the absorbed carbon dioxide is converted into carbon dioxide.

在顯影處理製程中,係藉由以顯影液溶解光阻膜於曝光處理後的不要部分來進行顯影。溶解於顯影液的光阻會與顯影液的鹼性成分之間生成光阻鹽。因此,若沒有適當地管理顯影液管理,則隨著顯影處理的進行,顯影液便會因具顯影活性的鹼性成分被消耗而劣化,使得顯影性能愈益惡化。與此同時,在顯影液中,溶解的光阻係以與鹼性成分生成的光阻鹽之形式不斷地累積。 In the development processing, development is performed by dissolving the photoresist film in the developing solution with an unnecessary portion after the exposure process. The photoresist dissolved in the developer forms a photoresist salt between the alkaline component of the developer. Therefore, if the developer management is not properly managed, as the development process proceeds, the developer is degraded by the consumption of the alkaline component having the development activity, and the development performance is deteriorated. At the same time, in the developing solution, the dissolved photoresist is continuously accumulated in the form of a photoresist salt formed with an alkaline component.

溶解於顯影液的光阻係在顯影液中顯現界面活性作用。因此,溶解於顯影液的光阻係提升顯影液對供顯影處理之光阻膜的浸潤性(wettability),改善顯影液與光阻膜的親和度。因此,藉適度含有光阻的顯影液,顯影液亦進入到光阻膜的微細凹部內,而能夠對具有微細凹凸的光阻膜良好地實施顯影處理。 The photoresist dissolved in the developer exhibits an interfacial activity in the developer. Therefore, the photoresist dissolved in the developing solution enhances the wettability of the developing solution to the photoresist film for development processing, and improves the affinity between the developing solution and the resist film. Therefore, the developing solution containing the photoresist is appropriately inserted into the fine concave portion of the photoresist film, and the development process can be favorably performed on the photoresist film having the fine unevenness.

此外,在近年的顯影處理中,伴隨著基板大型化,開始重複使用大量顯影液,使得顯影液曝露於空氣的機會增加。然而,鹼性顯影液一旦曝露於空氣中就會吸收空氣中的二氧化碳。所吸收的二氧化碳會與顯影液的鹼性成分之間生成碳酸鹽。因此,若沒有適當地管理顯影液管理,顯影液中具顯影活性的鹼性成分便會因被所吸收的二氧化碳消耗掉而減少。與此同時,在顯影液中,所吸收的二氧化碳係以與鹼性成分生成的碳酸鹽之形式不斷地累積。 Further, in the development processing in recent years, with the enlargement of the substrate, a large amount of the developer is repeatedly used, and the chance of the developer being exposed to the air is increased. However, the alkaline developer absorbs carbon dioxide in the air once exposed to the air. The absorbed carbon dioxide forms a carbonate with the alkaline component of the developer. Therefore, if the developer management is not properly managed, the developing alkaline component in the developer is reduced by the absorbed carbon dioxide. At the same time, in the developer, the absorbed carbon dioxide is continuously accumulated in the form of a carbonate formed with an alkaline component.

顯影液中的碳酸鹽在顯影液中呈鹼性,故具有顯影作用。例如在2.38% TMAH水溶液的情形中, 只要顯影液中二氧化碳為約0.4wt%程度以下,便能夠進行顯影。 The carbonate in the developer is alkaline in the developer, so it has a developing effect. For example, in the case of a 2.38% aqueous solution of TMAH, Development can be carried out as long as the carbon dioxide in the developer is about 0.4% by weight or less.

如上述,有別於過往認為顯影液中所溶解的光阻和所吸收的二氧化碳在顯影處理中屬無用物質,實際上是有助於顯影液的顯影性能。因此,所必須進行的乃係在容許顯影液中些微溶存有溶解光阻和吸收二氧化碳下,將溶解光阻和吸收二氧化碳維持管理在最佳濃度的顯影液管理,而非將溶解光阻和吸收二氧化碳完全移除的顯影液管理。 As described above, unlike the conventional one, it is considered that the photoresist dissolved in the developer and the absorbed carbon dioxide are useless substances in the development treatment, and actually contribute to the developing performance of the developer. Therefore, what is necessary is to allow the solution of the dissolved photoresist and the absorbed carbon dioxide to be maintained at the optimum concentration of the developer under the slight solubility of the solution in the developing solution, and to dissolve the photoresist and absorb it. Developer management for complete removal of carbon dioxide.

此外,關於生成在顯影液中的光阻鹽和碳酸鹽,其有一部分解離生成光阻離子、碳酸離子、碳酸氫離子等多種的自由離子。此外,該些自由離子係以多種貢獻率影響著顯影液的導電率。 Further, regarding the photoresist salt and the carbonate formed in the developer, a part of the free ions such as photoresist ions, carbonate ions, and hydrogen carbonate ions are generated by dissociation. In addition, the free ions affect the conductivity of the developer at various contributions.

習知的鹼性顯影液的成分濃度分析係利用顯影液的鹼性成分濃度與顯影液的導電率值具有良好的線性關係這點、以及顯影液的溶解光阻濃度與顯影液的吸光度值具有良好的線性關係這點(以下,稱之為「習知方法」)。而亦因為二氧化碳的吸收量並沒有那麼地多,以上述分析手法便已充分實現習知的顯影製程中所要求的顯影液管理精度。 The component concentration analysis of the conventional alkaline developing solution has a good linear relationship between the alkaline component concentration of the developer and the conductivity value of the developer, and the dissolved photoresist concentration of the developer and the absorbance value of the developer. This is a good linear relationship (hereinafter referred to as the "known method"). Moreover, since the amount of carbon dioxide absorbed is not so large, the developer management precision required in the conventional development process has been sufficiently achieved by the above analysis method.

顯影液的導電率值乃係一依存於顯影液中所含離子等帶電粒子數與其電荷量之物性值。在顯影液中係如同上述,不僅存在鹼性成分,亦存在來自溶解於顯影液的光阻和顯影液所吸收的二氧化碳之各種游離離子。因此,為了提高成分濃度的分析精度,便需要使 用也納入該些游離離子對顯影液的導電率值造成的影響之演算手法。 The conductivity value of the developer is a physical property value depending on the number of charged particles such as ions contained in the developer and the amount of charge thereof. In the developing solution, as described above, not only an alkaline component but also various kinds of free ions derived from the photoresist dissolved in the developing solution and the carbon dioxide absorbed by the developing solution are present. Therefore, in order to improve the analysis accuracy of the component concentration, it is necessary to make The calculation method of the influence of the free ions on the conductivity value of the developer is also included.

顯影液的吸光度值乃係一與選擇性吸收該測定波長之光的特定成分的濃度具有線性關係之物性值(朗伯-比爾定律(Lambert-Beer law))。而在多成分系統中,雖然吸收的程度係依測定波長而異,但對象成分的吸光頻譜(spectrum)通常會有其他成分的吸光頻譜重疊。因此,為了提升成分濃度的分析精度,便必須使用不僅考慮溶解於顯影液的光阻、也納入其他成分對顯影液的吸光度值造成的影響之演算手法。 The absorbance value of the developer is a property value (Lambert-Beer law) which has a linear relationship with the concentration of a specific component that selectively absorbs the light of the measurement wavelength. In a multi-component system, although the degree of absorption varies depending on the measurement wavelength, the absorption spectrum of the target component usually overlaps with the absorption spectrum of other components. Therefore, in order to improve the analysis accuracy of the component concentration, it is necessary to use a calculation method in which not only the photoresist dissolved in the developer but also the influence of other components on the absorbance value of the developer is included.

本案的發明人在針對上述各點持續致力研究後,發現只要演算手法使用多變量分析法(例如,複迴歸分析法),便能夠比使用習知手法更高精度地算出顯影液的各成分的濃度、以及能夠測定過往難以測定的吸收二氧化碳濃度。此外,發明者還發現只要使用藉由多變量分析法(例如,複迴歸分析法)算出的顯影液的成分濃度,便能夠將顯影液的溶解光阻濃度和吸收二氧化碳濃度維持管理在良好的狀態。 The inventors of the present invention have continued to study the above-mentioned various points and found that as long as the calculation method uses a multivariate analysis method (for example, a complex regression analysis method), it is possible to calculate the components of the developer more accurately than using conventional techniques. Concentration and ability to measure the concentration of absorbed carbon dioxide that was difficult to measure in the past. Further, the inventors have found that by using the component concentration of the developer calculated by the multivariate analysis method (for example, complex regression analysis), the dissolved photoresist concentration and the absorbed carbon dioxide concentration of the developer can be maintained in a good state. .

本案的發明人係設想一進行2.38% TMAH水溶液的管理情境,調製了鹼性成分濃度、溶解光阻濃度、吸收二氧化碳濃度有多種變化的TMAH水溶液作為模擬顯影液樣品。本案的發明人係進行了如下的實驗:從針對該些模擬顯影液樣品測定得的各種特性值,藉由複迴歸分析法求取其成分濃度。以下,先說明一般的藉由複迴歸分析法進行的演算手法,然後再說明根據本案 的發明人進行的實驗使用複迴歸分析法的顯影液的成分濃度的演算手法。 The inventors of the present invention envisaged a management situation in which a 2.38% TMAH aqueous solution was carried out, and a TMAH aqueous solution having various changes in the concentration of the basic component, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration was prepared as a simulated developer sample. The inventors of the present invention conducted experiments in which the component concentrations were determined by complex regression analysis from various characteristic values measured for the simulated developer samples. In the following, the general calculation method by complex regression analysis will be described first, and then according to the case. The experiment conducted by the inventor used the calculation method of the component concentration of the developer using the complex regression analysis method.

複迴歸分析係由校正階段與預測階段兩個階段組成。在n成分系統的複迴歸分析中,準備m個校正標準溶液。將存在於第i個溶液中的第j個成分的濃度表示為Cij。此處,i=1至m、j=1至n。針對m個標準溶液,分別測定p個特性值(例如,某個波長的吸光度、導電率等物性值)Aik(k=1至p)。濃度資料(data)與特性資料係分別能夠匯整表示成矩陣的形式(C,A)。 Complex regression analysis consists of two phases: the correction phase and the prediction phase. In the complex regression analysis of the n-component system, m calibration standard solutions were prepared. The concentration of the jth component present in the i-th solution is expressed as C ij . Here, i=1 to m, j=1 to n. For each of the m standard solutions, p characteristic values (for example, physical properties such as absorbance and conductivity at a certain wavelength) A ik (k=1 to p) were measured. The concentration data and the characteristic data can be aggregated into a matrix form (C, A).

將賦予該兩矩陣關聯的矩陣稱為校正矩陣,此處係以代號S(Skj;k=1至p、j=1至n)代表。 The matrix to which the two matrices are associated is referred to as a correction matrix, here represented by the code S (S kj ; k = 1 to p, j = 1 to n).

C=A.S C=A. S

藉由矩陣演算從既知的C與A(A的內容係即使非純為同質的測定值而混有異質的測定值亦無妨。例如,導電率與吸光度與密度)算出S,此為校正階段。此時,必須為p>=n且m>=np。由於S的各要素均為未知數,因此較佳為m>np,此時係如下述進行最小平方演算。 It is possible to calculate S from the known C and A (the content of A is a heterogeneous measurement value even if it is not purely homogeneous. For example, conductivity and absorbance and density), S is calculated, which is a correction phase. At this time, it must be p>=n and m>=np. Since each element of S is an unknown number, it is preferably m>np, and the least squares calculation is performed as follows.

其中,上方標記的T表示轉置矩陣,上方標記的-1表示反矩陣。 Wherein, the T of the upper mark represents the transposed matrix, and the upper mark of -1 represents the inverse matrix.

只要針對濃度未知的試樣液測定p個特性值,令該些特定值為Au(Auk;k=1至p),乘上S,便能夠獲得所要求取的濃度Cu(Cuj;j=1至n)。 As long as the p characteristic values are determined for the sample liquid of unknown concentration, the specific values are Au (Au k ; k = 1 to p), and by multiplying S, the desired concentration Cu (Cu j ; j can be obtained. =1 to n).

Cu=Au.S Cu=Au. S

以上為預測階段。 The above is the forecasting stage.

本案的發明人係進行了如下的實驗:將使用過的鹼性顯影液(2.38% TMAH水溶液)視為由鹼性成分、溶解光阻、吸收二氧化碳三種成分組成的多成分系統(n=3),以三個物性值(p=3)、亦即顯影液的導電率值、特定波長之吸光度值、及密度值作為該顯影液的特性值,從該些特性值,藉由上述複迴歸分析法算出各成分濃度。本案的發明人係以2.38% TMAH水溶液為顯影液的基本組成,調製了鹼性成分濃度(TMAH濃度)、溶解光阻濃度、吸收二氧化碳濃度有多種變化的11個校正標準溶液(m=11,滿足p>=n且m>np)。 The inventors of the present invention conducted the following experiment: a used alkaline developer (2.38% TMAH aqueous solution) was regarded as a multi-component system composed of three components of an alkaline component, a dissolved photoresist, and a carbon dioxide absorption (n=3). Taking three physical property values (p=3), that is, the conductivity value of the developer, the absorbance value of the specific wavelength, and the density value as the characteristic values of the developer, from the characteristic values, by the above complex regression analysis The concentration of each component was calculated by the method. The inventor of the present invention prepared a standard calibration solution of 2.38% TMAH aqueous solution as a developing solution, and prepared 11 calibration standard solutions (m=11, which have various changes in alkaline component concentration (TMAH concentration), dissolved photoresist concentration, and absorbed carbon dioxide concentration. Satisfy p>=n and m>np).

關於實驗,係針對11個校正標準溶液,測定導電率值、波長λ=560nm之吸光度值、及密度值作為顯影液的特性值,藉由複線性迴歸分析(Multiple Linear Regression-Inverse Least Squares;MLR-ILS)演算各成分濃度。 For the experiment, the conductivity value, the absorbance value of the wavelength λ=560 nm, and the density value were measured as the characteristic values of the developer for the 11 calibration standard solutions, and the complex linear regression analysis (Multiple Linear Regression-Inverse Least Squares; MLR) -ILS) Calculate the concentration of each component.

關於測定的進行方式,係將校正標準溶液的溫度調整至25.0℃再進行。溫度調整方式如下:將內 有校正標準溶液的瓶子長時間浸於溫度管理在25℃附近的恆溫水槽,在該狀態下取樣(sampling),在即將進行測定之前以溫度控制器再次調整至25.0℃。導電率計係採用本公司製的導電率計。使用施行過鉑黑處理的本公司製的導電率流通槽(flow cell)進行測定。在導電率計係輸入有另外藉由校正作業而確認的導電率流通槽的槽常數。吸光光度計亦使用本公司製的吸光光度計。乃係具備波長λ=560nm的光源部、測光部、及玻璃流通槽的吸光光度計。密度測定係使用採用固有振動法的密度計,亦即從對U形管流通槽施加振動而測定得的固有振動頻率來求取密度。所測定得的導電率值、吸光度值、密度值的單位分別為mS/cm、Abs.(Absorbance)、g/cm3Regarding the manner in which the measurement was carried out, the temperature of the calibration standard solution was adjusted to 25.0 ° C. The temperature adjustment method is as follows: the bottle with the calibration standard solution is immersed in a constant temperature water bath with a temperature management at 25 ° C for a long time, and sampling is performed in this state, and the temperature controller is adjusted again to 25.0 ° C immediately before the measurement is performed. . The conductivity meter is a conductivity meter manufactured by our company. The measurement was carried out using a conductivity flow cell manufactured by our company which was subjected to platinum black treatment. A conductivity constant of the conductivity flow path confirmed by the calibration operation is input to the conductivity meter. The spectrophotometer is also used in the spectrophotometer. It is an absorption photometer which has a light source part of a wavelength λ=560 nm, a photometry part, and a glass flow-through groove. In the density measurement, a density meter using a natural vibration method, that is, a natural vibration frequency measured by applying vibration to a U-shaped tube flow groove, is used to determine the density. The units of the measured conductivity value, absorbance value, and density value were mS/cm, Abs. (Absorbance), and g/cm 3 , respectively .

關於演算所採用的手法(留一交叉驗證法;Leave-One-Out法),係選擇11個校正標準溶液當中的一個作為未知試樣,以其餘10個標準求取校正矩陣,算出所假定的未知試樣的濃度,再與既知的值(藉由其他的正確的分析手法測定得的濃度值和重量調製值)進行比較。 Regarding the tactics used in the calculation (leave-cross-validation method; Leave-One-Out method), one of the 11 calibration standard solutions is selected as the unknown sample, and the correction matrix is obtained by the remaining 10 criteria to calculate the assumed The concentration of the unknown sample is then compared to known values (concentration values and weight modulation values determined by other correct analytical methods).

下表1顯示MLR-ILS計算的結果。 Table 1 below shows the results of the MLR-ILS calculation.

有鑒於TMAH水溶液為強鹼性、容易吸收二氧化碳而劣化,在進行MLR-ILS計算時,演算所使用的濃度矩陣表的值係另以能夠正確分析鹼性成分濃度和吸收二氧化碳濃度的滴定分析法測定校正標準溶液而得。其中,關於溶解光阻濃度係採用重量調製值。 In view of the fact that the TMAH aqueous solution is strongly alkaline and easily absorbs carbon dioxide and deteriorates, in the calculation of MLR-ILS, the value of the concentration matrix used in the calculation is based on a titration analysis capable of correctly analyzing the concentration of the alkaline component and the concentration of the absorbed carbon dioxide. Determine the calibration standard solution. Among them, the weight modulation value is used for the dissolved photoresist concentration.

關於滴定方式,乃係以鹽酸為滴定試藥之中和滴定。滴定裝置使用三菱化學Analytech公司製的自動滴定裝置GT-200。 The titration method is based on hydrochloric acid as a titration reagent and titration. As the titration device, an automatic titrator GT-200 manufactured by Mitsubishi Chemical Analytech Co., Ltd. was used.

下表2顯示濃度矩陣表。 Table 2 below shows the concentration matrix table.

下表3顯示此時的校正標準溶液的物性值的測定結果。吸光度之欄為波長λ=560nm之吸光度值(光路長d=10mm)。 Table 3 below shows the measurement results of the physical property values of the calibration standard solution at this time. The column of absorbance is an absorbance value of wavelength λ = 560 nm (optical path length d = 10 mm).

下表4顯示校正矩陣。 Table 4 below shows the correction matrix.

下表5顯示上表2的濃度測定值與上表1的MLR-ILS計算值之比較。 Table 5 below shows the comparison of the concentration measurement values of Table 2 above with the MLR-ILS calculation values of Table 1 above.

如上表5所示,藉由複迴歸分析法求得的TMAH濃度、溶解光阻濃度、吸收二氧化碳濃度係皆成為與藉由滴定分測定得的TMAH濃度和吸收二氧化碳濃度及從調整重量求得的溶解光阻濃度皆非常近似之值。 As shown in Table 5 above, the TMAH concentration, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration obtained by the complex regression analysis are both obtained from the TMAH concentration and the absorbed carbon dioxide concentration measured by the titration and from the adjusted weight. The dissolved photoresist concentrations are very similar.

如上述,理解到藉由測定鹼性顯影液的導電率、特定波長之吸光度、及密度,利用多變量分析法(例如,複迴歸分析法),便能夠測定顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度。 As described above, it is understood that by measuring the conductivity of the alkaline developing solution, the absorbance at a specific wavelength, and the density, by using a multivariate analysis method (for example, complex regression analysis), it is possible to measure the alkaline component concentration of the developer and dissolve it. Photoresist concentration, and absorption of carbon dioxide concentration.

多變量分析法(例如,複迴歸分析法)係在演算求取複數個成分的濃度有很好的效果。測定顯影液的複數個特性值a、b、c、...,便能夠藉由多變量分析法(例如,複迴歸分析法)從該些測定值求取成分濃度A、B、C、...。此時,針對所要求取的成分濃度,至少與該成分濃度有相關的特性值係必須有至少一個經測定得而使用在演算。 Multivariate analysis (for example, complex regression analysis) has a good effect in calculating the concentration of a plurality of components. By measuring a plurality of characteristic values a, b, c, ... of the developer, the component concentrations A, B, C, can be obtained from the measured values by multivariate analysis (for example, complex regression analysis). .. At this time, at least one of the characteristic values associated with the concentration of the component to be taken must be at least one measured and used in the calculation.

此處,所謂的與成分濃度「有相關」的顯影液的特性值,係指該特性值與該成分濃度有關,存在特性值相應於該成分濃度的變化而改變的關係。例如,與顯影液的成分濃度中的至少成分濃度A有相關的顯影液的某特性值a,指的是當藉由以成分濃度為變數的函數來求取特性值a時,其中一變數至少含有成分濃度A。雖然特性值a可為僅成分濃度A的函數,但通常是在除了成分濃度A外還形成以成分濃度B和C等為變數的多變數函數時使用多變量分析法(例如,複迴歸分析法)的意義較大。 Here, the characteristic value of the developer which is "related to the component concentration" means that the characteristic value is related to the concentration of the component, and there is a relationship that the characteristic value changes in accordance with the change in the concentration of the component. For example, a certain characteristic value a of the developer associated with at least the component concentration A of the component concentration of the developer means that when the characteristic value a is obtained by a function of the component concentration as a variable, at least one of the variables is at least Contains component concentration A. Although the characteristic value a may be a function of only the component concentration A, a multivariate analysis method (for example, complex regression analysis) is generally used in addition to the component concentration A to form a multivariate function having the component concentrations B and C as variables. ) is of great significance.

此外,成分濃度係乃係表示該成分相對於全體的相對量之尺度。關於重複使用的顯影液此種成分會隨時間而增減的混合液的成分濃度,通常係成為其他成分的濃度的函數,無法由其成分單獨決定。因此,顯影液的特性值與成分濃度的關係常常難以以平面性的圖表表示。此時,以使用檢量曲線的演算法等,並無法從顯影液的特性值算出成分濃度。 Further, the component concentration is a measure indicating the relative amount of the component with respect to the whole. The concentration of the component of the mixed solution in which the developer is reused over time is usually a function of the concentration of other components, and cannot be determined solely by the components thereof. Therefore, the relationship between the characteristic value of the developer and the component concentration is often difficult to express as a flat graph. At this time, the component concentration cannot be calculated from the characteristic value of the developer by an algorithm using a calibration curve or the like.

而若利用多變量分析法(例如,複迴歸分析法),則只要收集到一組與欲算出的成分濃度有相關的複數個特性值的測定值,將該些測定值使用於演算,便算出一組成分濃度。以多變量分析法(例如,複迴歸分析法)進行的成分濃度測定,係能夠獲得即使是習知知見中乍見難以測定的成分濃度亦能夠藉由測定特性值來測定成分濃度之顯著效果。 On the other hand, if a multivariate analysis method (for example, a complex regression analysis method) is used, a set of measured values of a plurality of characteristic values related to the concentration of the component to be calculated is collected, and the measured values are used for calculation, and then calculated. A concentration of a component. The component concentration measurement by the multivariate analysis method (for example, the complex regression analysis method) can obtain a remarkable effect of measuring the component concentration by measuring the characteristic value even in a conventionally known concentration of a component which is difficult to measure.

如上所述,依據本發明的演算手法,能夠根據顯影液的特性值(例如,導電率、特定波長之吸光度、及密度)的測定值算出顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度。依據本發明的演算手法,相較於習知手法,能夠更高精度地算出各成分濃度。 As described above, according to the calculation method of the present invention, the alkaline component concentration, the dissolved photoresist concentration, and the developer concentration of the developer can be calculated from the measured values of the characteristic values (for example, conductivity, specific wavelength absorbance, and density) of the developer. Absorb carbon dioxide concentration. According to the calculation method of the present invention, the concentration of each component can be calculated with higher precision than the conventional technique.

此外,在本發明中係使用多變量分析法(例如,複迴歸分析法),因此亦能夠在算出顯影液的成分濃度的演算中採用與顯影液的特定的成分濃度無線性關係的顯影液的特性值。 Further, in the present invention, since the multivariate analysis method (for example, the complex regression analysis method) is used, it is also possible to use a developer having a wireless relationship with a specific component concentration of the developer in the calculation of the component concentration of the developer. Characteristic value.

此外,依據本發明,不需前述專利文獻2的發明中屬於必要的用以實現高精度測定的極為眾多的樣品的準備與前期測定。(如同前述的實驗例,若為成分數n=3的顯影液,則令進行測定的特性值的個數p=3,準備滿足m>=np的樣品數p(例如p=11個樣品)進行測定即足夠。若成分數n=2,樣品數可更少。) Further, according to the present invention, preparation and preliminary measurement of an extremely large number of samples necessary for realizing high-precision measurement are not required in the invention of the aforementioned Patent Document 2. (In the case of the above-mentioned experimental example, if the developer has the number of components n=3, the number of characteristic values to be measured is p=3, and the number of samples satisfying m>=np is prepared (for example, p=11 samples). It is sufficient to carry out the measurement. If the number of components is n=2, the number of samples can be less.)

此外,本發明係使用多變量分析法(例如,複迴歸分析法),因此能夠高精度地算出習知難以測定的顯影液的吸收二氧化碳濃度。 Further, in the present invention, since the multivariate analysis method (for example, the complex regression analysis method) is used, the concentration of the absorbed carbon dioxide of the developer which is difficult to measure can be accurately calculated.

接著,針對具體的實施例,參照圖式進行說明。在以下的實施例中,係適當使用英文字母特性值a、b、c、...和成分濃度A、B、C、...等進行說明。為助進一步具體理解,只要將特性值a、b、c、...分別解讀為導電率、特定波長(例如λ=560nm)之吸光度、密度、...等即可;將成分濃度A、B、C、...分別解讀為鹼性成分濃度、溶解光阻濃度、吸收二氧化碳濃度、...等即可。 Next, a specific embodiment will be described with reference to the drawings. In the following examples, the letter characteristic values a, b, c, ... and the component concentrations A, B, C, ..., etc. are appropriately used for explanation. To further understand the specifics, the characteristic values a, b, c, ... can be interpreted as conductivity, absorbance, density, etc. of a specific wavelength (for example, λ = 560 nm); B, C, ... can be interpreted as alkaline component concentration, dissolved photoresist concentration, absorbed carbon dioxide concentration, etc., respectively.

但設特性值a、b、c為導電率、特定波長(例如λ=560nm)之吸光度、密度等,純粹只是藉由本發明算出顯影液的鹼性成分濃度、溶解光阻濃度、吸收二氧化碳濃度等時的最佳特性值組合之例示,並非以此為限。特性值a、b、c、...係能夠相應於成分濃度A、B、C、...而選擇各種組合。就能夠採用的特性值而言,例如能夠舉出顯影液的導電率、吸光度、超音波傳播速度、折射率、密度、滴定終點、pH等。有時顯影液亦會含有各種添加材,因此成分濃度除了上述三成分之亦可包括添加劑濃度等。 However, it is assumed that the characteristic values a, b, and c are conductivity, absorbance at a specific wavelength (for example, λ = 560 nm), density, and the like, and the basic component concentration, the dissolved photoresist concentration, the absorbed carbon dioxide concentration, and the like of the developer are simply calculated by the present invention. The instant combination of the best characteristic values is not limited thereto. The characteristic values a, b, c, ... are capable of selecting various combinations corresponding to the component concentrations A, B, C, . Examples of the characteristic values that can be used include conductivity of the developer, absorbance, ultrasonic propagation speed, refractive index, density, titration end point, pH, and the like. In some cases, the developer may contain various additives, and thus the component concentration may include the additive concentration or the like in addition to the above three components.

在測定顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度而管理顯影液的情形中,就特性值而言,較佳為導電率、特定波長之吸光度、密度之組合。測定吸光度的特定波長係較佳為採用可見光波長範圍的特定波長之吸光度,更佳為採用360nm至600nm波長範圍的特定波長之吸光度,再佳為採用波長λ=480nm或560nm之吸光度。此乃因當顯影液的吸收二氧化碳濃度較少、其經時變化和緩時,顯影液的導電率 係與鹼性成分濃度具有較良好的線性關係、顯影液的特定波長(例如λ=560nm)之吸光度係與溶解光阻濃度具有較良好的線性關係之故。此外,能夠較佳為亦採用導電率、特定波長之吸光度、超音波傳播速度之組合和導電率、特定波長之吸光度、折射率之組合等。 In the case where the developer concentration is measured, the dissolved photoresist concentration, and the carbon dioxide concentration are measured to manage the developer, the characteristic value is preferably a combination of conductivity, absorbance at a specific wavelength, and density. The specific wavelength at which the absorbance is measured is preferably an absorbance at a specific wavelength in the visible light wavelength range, more preferably an absorbance at a specific wavelength in the wavelength range of 360 nm to 600 nm, and preferably an absorbance at a wavelength λ = 480 nm or 560 nm. This is because the conductivity of the developer is small when the concentration of carbon dioxide absorbed by the developer is small, and it changes with time and time. It has a good linear relationship with the concentration of the alkaline component, and the absorbance of the specific wavelength of the developer (for example, λ = 560 nm) has a good linear relationship with the concentration of the dissolved photoresist. Further, it is preferable to use a combination of conductivity, specific wavelength absorbance, ultrasonic propagation speed, conductivity, specific wavelength absorbance, refractive index, and the like.

以下所說明的第一實施形態至第三實施形態乃係有關本發明的顯影液的成分濃度測定方法。 The first to third embodiments described below are the method for measuring the component concentration of the developer according to the present invention.

[第一實施形態] [First Embodiment]

第1圖係顯示從顯影液的兩個特性值測定顯影液的兩個成分的成分濃度時的信號的流程之本實施形態的成分濃度測定方法的流程圖。 Fig. 1 is a flowchart showing a method of measuring a component concentration in the embodiment of the flow of a signal when the component concentrations of the two components of the developer are measured from two characteristic values of the developer.

在本實施形態的成分濃度演算方法中,係首先在測定顯影液的特性值a、b的步驟中,取得各特性值的測定值am、bm。所取得的測定值am與bm係傳送至演算步驟。接著,演算步驟係接收測定值am與bm,使用該些測定值,藉由多變量分析法(例如,複回歸分析法)算出成分濃度A、B。如此,測定成分濃度A、B。此外,只要反覆進行此一流程,便能夠連續測定顯影液的成分濃度A、B。 In the component concentration calculation method of the present embodiment, first, in the step of measuring the characteristic values a and b of the developer, the measured values a m and b m of the respective characteristic values are obtained. The obtained measured values a m and b m are transmitted to the calculation step. Next, the calculation step receives the measured values a m and b m , and uses the measured values to calculate the component concentrations A and B by multivariate analysis (for example, complex regression analysis). Thus, the component concentrations A and B were measured. Further, by repeating this flow, the component concentrations A and B of the developer can be continuously measured.

[第二實施形態] [Second embodiment]

第2圖係顯示從顯影液的三個或三個以上的特性值測定顯影液的三個或三個以上的成分的成分濃度時的信號的流程之本實施形態的成分濃度測定方法的流程圖。 FIG. 2 is a flow chart showing a method of measuring a component concentration in the embodiment of the flow rate when the component concentration of three or more components of the developer is measured from three or more characteristic values of the developer. .

在本實施形態的成分濃度演算方法中,係首先在測定顯影液的特性值a、b、c、...的步驟中,取得各特性值的測定值am、bm、cm。所取得的測定值am、bm、cm、...係傳送至演算步驟。接著,演算步驟係接收測定值am、bm、cm,使用該些測定值,藉由多變量分析法(例如,複回歸分析法)算出成分濃度A、B、C、...。如此,測定成分濃度A、B、C、...。此外,只要反覆進行此一流程,便能夠連續測定顯影液的成分濃度A、B、C、...。 In the component concentration calculation method of the present embodiment, first, in the step of measuring the characteristic values a, b, c, ... of the developer, the measured values a m , b m , and c m of the respective characteristic values are obtained. The obtained measured values a m , b m , c m , ... are transmitted to the calculation step. Next, the calculation step receives the measured values a m , b m , and c m , and the component concentrations A, B, C, . . . are calculated by multivariate analysis (for example, complex regression analysis) using the measured values. Thus, the component concentrations A, B, C, ... were measured. Further, by repeating this flow, the component concentrations A, B, C, ... of the developer can be continuously measured.

[第三實施形態] [Third embodiment]

第3圖係顯示在從複數個顯影液的特性值測定複數個成分濃度時的演算步驟中還包含以不同於多變量分析法的演算手法進行的步驟時的信號的流程之本實施形態的成分濃度測定方法的流程圖。 Fig. 3 is a view showing the composition of the embodiment in the flow of a signal when a step of measuring a plurality of component concentrations from a characteristic value of a plurality of developing solutions further includes a step different from the multivariate analysis method. Flow chart of the concentration determination method.

此實施形態係適合在測定對象採用的是僅與顯影液的某個成分的濃度P具關係的顯影液的特性值p等時候採用。更具體而言係可舉出例如如下述進行測定等情形:從顯影液的導電率值與密度值,藉由多變量分析法算出顯影液的鹼性成分濃度與吸收二氧化碳濃度;將顯影液的溶解光阻濃度與特定波長(例如λ=560nm)之吸光度的線性關係以檢量曲線的形式使用而算出顯影液的溶解光阻濃度。 This embodiment is suitable for use in the measurement object using the characteristic value p of the developer which is only related to the concentration P of a certain component of the developer. More specifically, for example, measurement may be carried out as follows: from the conductivity value and the density value of the developer, the alkaline component concentration and the absorbed carbon dioxide concentration of the developer are calculated by a multivariate analysis method; The linear relationship between the dissolved photoresist concentration and the absorbance at a specific wavelength (for example, λ = 560 nm) is used in the form of a calibration curve to calculate the dissolved photoresist concentration of the developer.

在本實施態樣的顯影液的成分濃度測定方法中,係於測定步驟,測定以複數個成分濃度為變數的顯影液的特性值a、b、...、及僅以成分濃度P為變數 的顯影液的特性值p、...,將該些測定值am、bm、...、及pm、...傳送至演算步驟。 In the method for measuring the component concentration of the developer according to the embodiment, in the measurement step, the characteristic values a, b, ... of the developer having a plurality of component concentrations as variables are measured, and only the component concentration P is used as a variable. The characteristic values p, ... of the developing solution are transmitted to the calculation steps by the measured values a m , b m , ..., and p m , .

演算步驟係含有藉由多變量分析法(例如,複回歸分析法)算出成分濃度的步驟、及藉由不同於多變量分析法的演算方法(例如,檢量曲線法等)算出成分濃度的步驟。以該些步驟進行的演算先後不拘。亦可為同時進行。 The calculation step includes a step of calculating a component concentration by a multivariate analysis method (for example, a complex regression analysis method), and a step of calculating a component concentration by a calculation method different from the multivariate analysis method (for example, a calibration curve method). . The calculations performed in these steps are not limited. It can also be done at the same time.

關於藉由多變量分析法(例如,複回歸分析法)算出成分濃度的步驟,係從以測定步驟測定得的顯影液的特性值a、b、...的測定值,藉由多變量分析法(例如,複回歸分析法)算出成分濃度A、B、...。 The step of calculating the component concentration by the multivariate analysis method (for example, complex regression analysis) is performed by multivariate analysis from the measured values of the characteristic values a, b, ... of the developer measured in the measurement step. The method (for example, complex regression analysis) calculates the component concentrations A, B, ....

關於藉由不同於多變量分析法的演算方法(例如,檢量曲線法)算出成分濃度的步驟,係將預先取得的特性值p與成分濃度P之線性關係例如以檢量曲線的形式使用,而從以測定步驟測定得的顯影液的特性值p、...的測定值算出成分濃度P、...。 The step of calculating the component concentration by an arithmetic method different from the multivariate analysis method (for example, the calibration curve method) is to use a linear relationship between the characteristic value p obtained in advance and the component concentration P, for example, in the form of a calibration curve. On the other hand, the component concentrations P, ... are calculated from the measured values of the characteristic values p, ... of the developer measured in the measurement step.

以上,如第一實施形態至第三實施形態之說明,本發明的顯影液的成分濃度測定方法係含有:測定步驟,係測定與顯影液的成分濃度有相關的顯影液的複數個特性值;及演算步驟,係根據所測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度。 As described above, in the first embodiment to the third embodiment, the method for measuring the component concentration of the developer according to the present invention includes a measurement step of measuring a plurality of characteristic values of the developer associated with the component concentration of the developer; And the calculation step is to calculate the component concentration of the developer by a multivariate analysis method based on the measured plurality of characteristic values.

測定步驟係復含有:測定特性值a的測定步驟、測定特性值b的測定步驟、測定特性值c的測定步驟、...等。但該些步驟順序不拘。亦可同時測定。此外,亦可配合測定手法而適當含有溫度調整步驟、試藥添加步驟、廢液步驟等必要步驟。 The measurement step includes a measurement step of measuring the characteristic value a, a measurement step of measuring the characteristic value b, a measurement step of measuring the characteristic value c, and the like. But the order of these steps is not limited. It can also be measured at the same time. Further, a necessary step such as a temperature adjustment step, a reagent addition step, and a waste liquid step may be appropriately included in accordance with the measurement method.

演算步驟係亦可含有藉由多變量分析法算出成分濃度的演算步驟。亦可含有藉由不同於多變量分析法的演算方法(例如檢量曲線法)算出成分濃度的步驟等。 The calculation step may also include a calculation step of calculating the concentration of the component by multivariate analysis. The step of calculating the component concentration by an arithmetic method different from the multivariate analysis method (for example, the calibration curve method) may be included.

以下,第四實施形態至第十二實施形態乃係有關本發明的顯影液的成分濃度測定裝置。 Hereinafter, the fourth to twelfth embodiments are the component concentration measuring devices of the developing solution according to the present invention.

[第四實施形態] [Fourth embodiment]

第4圖係測定顯影液的兩個成分的成分濃度測定裝置的示意圖。為了說明上的方便,顯影液的成分濃度測定裝置A為連接至顯影製程設備B的態樣,與顯影製程設備B一同圖示。 Fig. 4 is a schematic view showing a device for measuring a component concentration of two components of a developer. For convenience of explanation, the component concentration measuring device A of the developing solution is connected to the developing process device B, and is illustrated together with the developing process device B.

首先,針對顯影製程設備B簡單進行說明。 First, the development process apparatus B will be briefly described.

顯影製程設備B主要由顯影液貯留槽61、溢流(over flow)槽62、顯影室罩蓋(hood)64、輥式輸送機(roller conveyor)65、顯影液澆淋頭(shower nozzle)67等構成。於顯影液貯留槽61係有顯影液貯留。顯影液係接受補充液補充而管理組成成分,但在第4圖中予以省略。顯影液貯留槽61係具備液面計63與溢流槽62,管理因補給補充液造成的液量之增加。顯影液貯留槽61與顯影液澆淋頭67係透過顯影液管路80連接。貯留在顯影液貯留槽61內的顯影液藉由設置在顯影液管路80的循環泵(pump)72,通過過濾器(filter)73而輸送至顯影液澆淋頭67。輥式輸送機65係配置在顯影液 貯留槽61上方,搬送成膜有光阻膜的基板66。顯影液係從顯影液澆淋頭67滴下。由輥式輸送機65搬送的基板66係藉由從滴下的顯影液之中通過而浸於顯影液。然後,顯影液係回收至顯影液貯留槽61再次貯留。如上述,顯影液係在顯影製程中循環重複使用。另外,小型的玻璃基板的顯影室內係亦有施行藉由令氮氣充滿等來避免吸收空氣中的二氧化碳之類的處理。另外,劣化的顯影液係藉由令廢液泵71作動而以廢液處理(排放(drain))。 The developing process apparatus B is mainly composed of a developer storage tank 61, an overflow flow tank 62, a development chamber hood 64, a roller conveyor 65, a developer shower head 67 And so on. The developer storage tank 61 is stored with a developer. The developer is supplemented with a replenishing solution to manage the components, but is omitted in Fig. 4. The developer storage tank 61 is provided with a liquid level gauge 63 and an overflow tank 62, and manages an increase in the amount of liquid caused by the supply of the replenishing liquid. The developer storage tank 61 and the developer shower head 67 are connected to each other through the developer line 80. The developer stored in the developer storage tank 61 is sent to the developer shower head 67 through a filter 73 through a circulation pump 72 provided in the developer line 80. Roller conveyor 65 is arranged in the developer Above the storage tank 61, a substrate 66 on which a photoresist film is formed is conveyed. The developer is dropped from the developer shower head 67. The substrate 66 conveyed by the roller conveyor 65 is immersed in the developer by passing through the dripped developer. Then, the developer is recovered and returned to the developer storage tank 61 to be stored again. As described above, the developer is recycled and reused in the developing process. Further, in the developing chamber of a small-sized glass substrate, treatment such as avoiding absorption of carbon dioxide in the air by filling with nitrogen or the like is also performed. Further, the deteriorated developing solution is treated with waste liquid (drain) by causing the waste liquid pump 71 to operate.

接著,針對本實施形態的顯影液的成分濃度測定裝置A進行說明。本實施形態的成分濃度測定裝置乃係取樣顯影液來測定特性值之方式的成分濃度測定裝置。 Next, the component concentration measuring device A of the developing solution of the present embodiment will be described. The component concentration measuring device according to the present embodiment is a component concentration measuring device that samples a developer to measure a characteristic value.

顯影液的成分濃度測定裝置A係具備測定部1與演算部2,透過取樣配管15及回流配管16而與顯影液貯留槽61連接。測定部1與演算部2係經由測定資料用信號線51、52連接。 The component concentration measuring device A of the developer includes the measuring unit 1 and the calculation unit 2, and is connected to the developer storage tank 61 through the sampling pipe 15 and the return pipe 16. The measurement unit 1 and the calculation unit 2 are connected via the measurement data signal lines 51 and 52.

測定部1係具備取樣泵14、第一測定手段11及第二測定手段12(有時亦將第一測定手段11及第二測定手段12稱為測定手段)。測定手段11、12係以串列方式連接在取樣泵14的後段。測定部1係較佳為復具備為了提升測定精度而令所取樣的顯影液穩定在預定之溫度的溫度調節手段(未圖示)。此時,溫度調節手段係較佳為設置在測定手段前。取樣配管15係連接至測定部1的取樣泵14,回流配管16係與測定手段末端的配管連接。 The measurement unit 1 includes a sampling pump 14, a first measurement means 11, and a second measurement means 12 (the first measurement means 11 and the second measurement means 12 are sometimes referred to as measurement means). The measuring means 11, 12 are connected in series to the rear stage of the sampling pump 14. The measuring unit 1 preferably includes a temperature adjusting means (not shown) for stabilizing the sampled developer to a predetermined temperature in order to improve the measurement accuracy. At this time, the temperature adjustment means is preferably disposed before the measuring means. The sampling pipe 15 is connected to the sampling pump 14 of the measuring unit 1, and the return pipe 16 is connected to a pipe at the end of the measuring means.

演算部2係含有以多變量分析法進行的演算方塊21。以多變量分析法進行的演算方塊21係經由測定資料用信號線51而與配置在測定部1的第一測定手段11連接,經由測定資料用信號線52而與配置在測定部1的第二測定手段12連接。 The calculation unit 2 includes a calculation block 21 performed by a multivariate analysis method. The calculation block 21 by the multivariate analysis method is connected to the first measurement means 11 disposed in the measurement unit 1 via the measurement data signal line 51, and is connected to the second measurement unit 1 via the measurement data signal line 52. The measuring means 12 are connected.

接著,針對成分濃度測定裝置A的測定動作、及演算動作進行說明。 Next, the measurement operation and the calculation operation of the component concentration measuring device A will be described.

藉由取樣泵14而從顯影液貯留槽61採液得的顯影液係通過取樣配管15導至成分濃度測定裝置A的測定部1內。然後,若具備有溫度調節手段,所取樣得的顯影液係輸送至溫度調節手段,維持在預定之測定溫度(例如25℃)再輸送至測定手段11、12。在第一測定手段中係測定顯影液的特性值a,在第二測定手段中係測定顯影液的特性值b。測定後的顯影液係通過回流配管16而返回顯影液貯留槽61。 The developer liquid collected from the developer storage tank 61 by the sampling pump 14 is guided to the measurement unit 1 of the component concentration measuring device A through the sampling pipe 15. Then, if the temperature adjustment means is provided, the sampled developer is sent to the temperature adjustment means, and is maintained at a predetermined measurement temperature (for example, 25 ° C) and then sent to the measurement means 11 and 12. In the first measuring means, the characteristic value a of the developing solution is measured, and in the second measuring means, the characteristic value b of the developing solution is measured. The developer after the measurement is returned to the developer storage tank 61 through the return pipe 16 .

藉由第一測定手段11測定得的顯影液的特性值a的測定值am、及藉由第二測定手段12測定得的顯影液的特性值b的測定值bm係分別經由測定資料用信號線51、52傳送至以多變量分析法進行的演算方塊21。接收到測定值am、bm的演算方塊21係藉由多變量分析法演算該些測定值而算出顯影液的成分濃度A及B。如此,藉由成分濃度測定裝置A測定顯影液的成分濃度A、B。 The measured value a m of the characteristic value a of the developer measured by the first measuring means 11 and the measured value b m of the characteristic value b of the developing solution measured by the second measuring means 12 are respectively passed through the measurement data. Signal lines 51, 52 are passed to a calculus block 21 that is performed by multivariate analysis. The calculation block 21 that has received the measured values a m and b m calculates the component concentrations A and B of the developer by calculating the measured values by the multivariate analysis method. In this manner, the component concentrations A and B of the developer are measured by the component concentration measuring device A.

[第五實施形態] [Fifth Embodiment]

第5圖係測定顯影液的三個成分的成分濃度測定裝置的示意圖。顯影液的成分濃度測定裝置A係具備測定部1與演算部2,透過取樣配管15及回流配管16而與顯影製程設備B(顯影液貯留槽61)連接。測定部1係具備第一測定手段11、第二測定手段12、及第三測定手段13,藉由該些測定手段測定顯影液的三個特性值。所測定得的三個特性值的測定值係經由測定資料用信號線51、52、53傳送至演算部2,藉由多變量分析法算出顯影液的三個成分的成分濃度。測定動作、演算動作、與第4圖重複的構件之說明係與第四實施形態相同,故予以省略。 Fig. 5 is a schematic view showing a device for measuring a component concentration of three components of a developer. The component concentration measuring device A of the developer includes the measuring unit 1 and the calculating unit 2, and is connected to the developing process device B (developing solution storage tank 61) through the sampling pipe 15 and the return pipe 16. The measurement unit 1 includes first measurement means 11, second measurement means 12, and third measurement means 13, and the three characteristic values of the developer are measured by the measurement means. The measured values of the three characteristic values measured are transmitted to the calculation unit 2 via the measurement data signal lines 51, 52, and 53, and the component concentrations of the three components of the developer are calculated by the multivariate analysis method. The measurement operation, the calculation operation, and the description of the members overlapping with the fourth embodiment are the same as those of the fourth embodiment, and therefore will not be described.

[第六實施形態] [Sixth embodiment]

第6圖係在演算部2具有以不同於多變量分析法的演算手法進行的演算方塊之成分濃度測定裝置的示意圖。例如適用於當存在顯影液的特性值與成分濃度之組合能夠藉由檢量曲線法等而從所測定得的顯影液的物性值來測定顯影液的成分濃度時。 Fig. 6 is a schematic diagram of a component concentration measuring device having a calculation block performed by a calculation method different from the multivariate analysis method in the calculation unit 2. For example, when the combination of the characteristic value and the component concentration of the developer is present, the component concentration of the developer can be measured from the measured physical property value of the developer by a calibration curve method or the like.

本實施形態的成分濃度測定裝置A係具備測定部1,係測定顯影液的複數個特性值;及演算部2,係從該些測定值算出顯影液的成分濃度。演算部2係含有:以多變量分析法進行的演算方塊21;及以多變量分析法以外的演算手法(例如檢量曲線法)進行的演算方塊22。 The component concentration measuring apparatus A of the present embodiment includes a measuring unit 1 that measures a plurality of characteristic values of the developing solution, and an arithmetic unit 2 that calculates a component concentration of the developing solution from the measured values. The calculation unit 2 includes a calculation block 21 performed by a multivariate analysis method, and a calculation block 22 performed by an arithmetic method other than the multivariate analysis method (for example, a calibration curve method).

多變量分析法的演算所使用的顯影液的特性值的測定值,乃係在由測定部1測定得後,傳送至演算部2的以多變量分析法進行的演算方塊21。多變量分析法以外的演算手法(例如檢量曲線法)所使用的顯影液的特性值的測定值,則係傳送至演算方塊22。藉由演算方塊21、22進行演算,算出顯影液的成分濃度。 The measured value of the characteristic value of the developer used in the calculation of the multivariate analysis method is measured by the measurement unit 1 and then transmitted to the calculation unit 2 for the calculation block 21 by the multivariate analysis method. The measured value of the characteristic value of the developer used in the calculation method other than the multivariate analysis method (for example, the calibration curve method) is sent to the calculation block 22. The calculation is performed by the calculation blocks 21 and 22 to calculate the component concentration of the developer.

另外,以多變量分析法以外的演算手法(例如檢量曲線法)進行的演算方塊22係亦可為複數個。關於以多變量分析法進行的演算及以多變量分析法以外的手法(例如檢量曲線法)進行的演算,其演算順序不拘。其餘與第四、第五實施形態重複的構件等之說明係予以省略。 Further, the calculation block 22 performed by an arithmetic method other than the multivariate analysis method (for example, the calibration curve method) may be plural. Regarding the calculations performed by the multivariate analysis method and the calculations performed by methods other than the multivariate analysis method (for example, the calibration curve method), the calculation order is not limited. The description of the remaining members and the like which are repeated in the fourth and fifth embodiments will be omitted.

[第七實施形態] [Seventh embodiment]

第7圖係測定部1與演算部2為個別獨立構成的成分濃度測定裝置的示意圖。 Fig. 7 is a schematic diagram of a component concentration measuring device in which the measuring unit 1 and the calculating unit 2 are independently configured.

在本實施形態的成分濃度測定裝置A中,測定部1係配置在從顯影製程設備B的顯影液管路80旁路(bypass)出來的管路,與演算部2間以測定資料用信號線51至53連接。亦可直接連接至顯影液管路80和其他管路。亦可將取樣泵14改成組合流量調節閥(未圖示)等來使用。 In the component concentration measuring apparatus A of the present embodiment, the measuring unit 1 is disposed in a line bypassed from the developing solution line 80 of the developing process equipment B, and a signal line for measuring data is used between the calculating unit 2 and the calculation unit 2 51 to 53 connections. It can also be directly connected to the developer line 80 and other lines. The sampling pump 14 can also be used as a combined flow regulating valve (not shown) or the like.

[第八實施形態] [Eighth Embodiment]

第8圖係測定顯影液的特性值的測定手段11至13為分別由測定裝置本體11a、12a、13a與測定探針11b、12b、13b構成時的成分濃度測定裝置的示意圖。 Fig. 8 is a schematic view showing the measurement means 11 to 13 for measuring the characteristic values of the developer, which are component concentration measuring devices when the measurement device bodies 11a, 12a, 13a and the measurement probes 11b, 12b, and 13b are respectively formed.

在本實施形態中,係將測定手段11至13的測定探針11b至13b浸漬在貯留在顯影液貯留槽61的顯影液,藉此測定顯影液的特性值。所測定得的顯影液的特性值係經由測定資料用信號線51至53傳送至演算部2。在演算部2藉由多變量分析法算出成分濃度,藉此測定顯影液的成分濃度。 In the present embodiment, the measurement probes 11b to 13b of the measurement means 11 to 13 are immersed in the developer stored in the developer storage tank 61, thereby measuring the characteristic value of the developer. The characteristic values of the measured developer are transmitted to the calculation unit 2 via the measurement data signal lines 51 to 53. The calculation unit 2 calculates the component concentration by the multivariate analysis method, thereby measuring the component concentration of the developer.

在第8圖中雖係顯示測定部1與演算部2為個別獨立構成,但亦可為以一體構成的成分濃度測定裝置。此時,浸漬在顯影液中的測定探針與配置在成分濃度測定裝置的測定部1內的測定裝置本體係以連接線(cable)等連接。 In the eighth drawing, the measurement unit 1 and the calculation unit 2 are separately configured as separate components, but they may be a component concentration measurement device that is integrally formed. In this case, the measurement probe immersed in the developer and the measurement device disposed in the measurement unit 1 of the component concentration measurement device are connected by a cable or the like.

[第九實施形態] [Ninth Embodiment]

第9圖係以並列方式配置測定部1內的測定手段時的成分濃度測定裝置的示意圖。 Fig. 9 is a schematic view showing a component concentration measuring device when the measuring means in the measuring unit 1 is arranged in parallel.

構成測定部1的各測定手段並不限於以串列方式連接,亦可以並列方式連接。如第9圖所示,可為測定手段11至13各自獨立地具備取樣管路15a至15c、取樣泵14a至14c、回流配管16a至16c等,亦可藉由途中分歧出的管路而以並列方式連接。藉由測定手段11至13測定得的顯影液的特性值係傳送至演算部2。在演算部2係藉由多變量分析法算出顯影液的成分濃度。 The measurement means constituting the measurement unit 1 is not limited to being connected in series, and may be connected in parallel. As shown in Fig. 9, the measurement means 11 to 13 may be provided with sampling lines 15a to 15c, sampling pumps 14a to 14c, return pipes 16a to 16c, and the like, respectively, or by means of pipes which are branched from the way. Connect in parallel. The characteristic values of the developer measured by the measuring means 11 to 13 are transmitted to the calculation unit 2. In the calculation unit 2, the component concentration of the developer is calculated by the multivariate analysis method.

[第十實施形態] [Tenth embodiment]

第10圖係具備有例如自動滴定裝置之類需添加藥劑的測定裝置時的成分濃度測定裝置的示意圖。在第10圖中,第三測定手段13為必須添加藥劑的測定裝置。 Fig. 10 is a schematic view showing a component concentration measuring device provided with a measuring device to which a drug is added, such as an automatic titration device. In Fig. 10, the third measuring means 13 is a measuring device to which a drug must be added.

此時,第三測定手段13係除了與取樣配管15、取樣泵14連接之外,亦透過送液配管18而與添加試藥93連接。添加試藥係藉由送液泵17採液而供測定。測定後的顯影液係透過廢液配管19而以廢液處理(排放)。其餘的測定動作和演算動作等係與其他實施例相同,故予以省略。 At this time, the third measuring means 13 is connected to the sampling pipe 15 and the sampling pump 14, and is also connected to the additive reagent 93 through the liquid supply pipe 18. The test reagent is added for measurement by the liquid feeding pump 17. The developer after the measurement is passed through the waste liquid pipe 19 and treated (discharged) with the waste liquid. The rest of the measurement operation and the calculation operation are the same as those of the other embodiments, and therefore will be omitted.

以上,如第四實施形態至第十實施形態所示,本發明的成分濃度測定裝置係具備:測定部1,係測定與顯影液的成分濃度有相關的顯影液的複數個特性值;及演算部2,係根據藉由測定部1測定得的顯影液的複數個特性值,藉由多變量分析法測定顯影液的成分濃度。 As described in the fourth embodiment to the tenth embodiment, the component concentration measuring apparatus according to the present invention includes the measuring unit 1 that measures a plurality of characteristic values of the developer associated with the component concentration of the developer; In the portion 2, the component concentration of the developer is measured by a multivariate analysis method based on a plurality of characteristic values of the developer measured by the measuring unit 1.

本實施形態的成分濃度測定裝置A的測定部1係能採用各種實施形態。測定手段使用的測定裝置係存在相應於該測定裝置所採用的測定方式而適合的設置方法和連接方法,因此本發明的成分濃度測定裝置的測定部1係只要構成為相應於該測定手段的最佳構成即可。 The measurement unit 1 of the component concentration measuring apparatus A of the present embodiment can adopt various embodiments. The measuring device used in the measuring device has a setting method and a connecting method which are suitable depending on the measurement method used in the measuring device. Therefore, the measuring unit 1 of the component concentration measuring device according to the present invention is configured to be the most corresponding to the measuring means. Good composition can be.

在測定部1內,係只要配置有測定顯影液的複數個特性值所必要的測定手段即可。較佳為具備溫 度調節手段(未圖示)。取樣泵14、送液泵17、廢液配管19等係較佳為視需要適當配置,但皆未必要為測定部1的內部構件。 In the measurement unit 1, it is only necessary to arrange a measurement means necessary for measuring a plurality of characteristic values of the developer. Better to have temperature Degree adjustment means (not shown). The sampling pump 14, the liquid feeding pump 17, the waste liquid pipe 19, and the like are preferably disposed as appropriate, but are not necessarily internal members of the measuring unit 1.

此外,測定部1與演算部2係可為一體構成,亦可為個別獨立構成。測定部1與演算部2係只要以能夠使演算部2接收以測定部1測定得的顯影液的特性值的測定資料之方式互相聯絡即可。測定部1與演算部2並不限於經由信號線連接,亦可構成為能夠透過無線信號來送收資料。亦不一定要將複數個測定手段集中於一處來構成測定部1,亦可將特定的測定手段單獨獨立地裝配。 Further, the measurement unit 1 and the calculation unit 2 may be integrally formed or may be configured separately. The measurement unit 1 and the calculation unit 2 may communicate with each other so that the calculation unit 2 can receive the measurement data of the characteristic value of the developer measured by the measurement unit 1. The measurement unit 1 and the calculation unit 2 are not limited to being connected via a signal line, and may be configured to be capable of transmitting and receiving data by means of a wireless signal. It is not necessary to concentrate the plurality of measurement means in one place to constitute the measurement unit 1, and the specific measurement means may be separately and independently assembled.

各測定手段並不限為以取樣來進行測定的方式,亦可為直接安裝至配管的方式,亦可為將探針浸漬在液中的方式。各測定手段可採串列方式連接,亦可採並列方式連接。亦可藉由上述各種方式的組合來構成測定部1。 Each measurement means is not limited to a method of performing measurement by sampling, and may be a method of directly attaching to a pipe, or a method of immersing a probe in a liquid. Each measurement means may be connected in series or in parallel. The measurement unit 1 can also be configured by a combination of the above various aspects.

另外,本實施形態的測定部1中的顯影液的複數個特性值之測定順序不拘。第4圖至第10圖圖式中的測定部1內的各測定手段的排列、以及「第一測定手段」、「第二測定手段」、...等記載中的「第一」、「第二」、...等用語並非用以限定本發明的測定的順序。「第一」、「第二」、...等用語只不過是為了方便區別複數個測定手段的各者而已。 In addition, the order of measurement of the plurality of characteristic values of the developer in the measuring unit 1 of the present embodiment is not limited. The arrangement of each measurement means in the measurement unit 1 in the drawings of Fig. 4 to Fig. 10, and the "first" and "first" in the descriptions of "first measurement means", "second measurement means", and the like. The terms "second", "..." are not intended to limit the order of the assays of the invention. The terms "first", "second", ... are simply used to facilitate the differentiation of each of the plurality of measurement means.

此外,本實施形態的成分濃度測定裝置的演算部2係只要含有以多變量分析法進行的演算方塊 21,則亦可另外具有以多變量分析法以外的手法(例如檢量曲線法)進行的演算方塊。此外,演算的順序不拘。 Further, the calculation unit 2 of the component concentration measuring apparatus according to the present embodiment includes a calculation block by multivariate analysis. 21, in addition, may also have a calculation block performed by a method other than the multivariate analysis method (for example, the calibration curve method). In addition, the order of calculations is not limited.

在本實施形態的成分濃度測定裝置中,構成測定部1的各測定手段係設置成適合其測定方式的配置而連接,測定顯影液的複數個特性值,演算部2係接收以測定部1測定得的顯影液的特性值的測定值,藉此,藉由多變量分析法(包含多變量分析法的演算手法)算出顯影液的成分濃度。 In the component concentration measuring apparatus according to the present embodiment, each measuring means constituting the measuring unit 1 is connected so as to be suitable for the measurement method, and a plurality of characteristic values of the developing solution are measured, and the calculating unit 2 receives the measurement by the measuring unit 1. The measured value of the characteristic value of the obtained developer is used to calculate the component concentration of the developer by a multivariate analysis method (calculation method including a multivariate analysis method).

以下,在第十一實施形態及第十二實施形態中,針對本實施形態的成分濃度測定裝置的應用例進行說明。本實施形態的成分濃度測定裝置係能夠作為單一構件應用於各種裝置和系統。 In the eleventh embodiment and the twelfth embodiment, an application example of the component concentration measuring device according to the present embodiment will be described. The component concentration measuring device of the present embodiment can be applied to various devices and systems as a single member.

[第十一實施形態] [Eleventh Embodiment]

第11圖係使用本實施形態的成分濃度測定裝置的顯影液管理裝置的示意圖。 Fig. 11 is a schematic view showing a developer management device using the component concentration measuring device of the present embodiment.

在本實施形態中,成分濃度測定裝置A係經由演算資料用信號線54而與控制控制閥41至43的控制部3(控制裝置)連接。控制部3(控制裝置)係經由控制信號用信號線55至57而與各控制閥41至43連接。控制閥41至43係分別設置在用以從補充液貯留槽91、92輸送補充液之補充液用管路81、82、及用以輸送純水之純水用管路83。 In the present embodiment, the component concentration measuring device A is connected to the control unit 3 (control device) that controls the control valves 41 to 43 via the calculation data signal line 54. The control unit 3 (control device) is connected to the respective control valves 41 to 43 via the control signal signal lines 55 to 57. The control valves 41 to 43 are respectively provided in the replenishing liquid pipes 81 and 82 for supplying the replenishing liquid from the replenishing liquid storage tanks 91 and 92, and the pure water pipe 83 for conveying the pure water.

補充液貯留槽91、92係以氮氣加壓,藉由控制部3(控制裝置)開閉控制閥41至43,使補充液通 過合流管路84補給至顯影液。補給的補充液係藉由循環泵74而經由循環管路85返回顯影液貯留槽61進行攪拌。補充液的補給動作的方法與運作機制(mechanism)係於後述的顯影液管理方法和顯影液管理裝置的實施例中說明。 The replenishing liquid storage tanks 91 and 92 are pressurized with nitrogen gas, and the control unit 3 (control device) opens and closes the control valves 41 to 43 to replenish the liquid. The over-combination line 84 is supplied to the developer. The replenished replenishing liquid is returned to the developing solution storage tank 61 via the circulation line 85 by the circulation pump 74 to be stirred. The method and the mechanism of the replenishment operation of the replenishing liquid are described in the examples of the developer management method and the developer management device which will be described later.

如上述,本實施形態的成分濃度測定裝置係能夠藉由與設置在輸送補給至顯影液的補充液之流路的控制閥、及控制該些控制閥的控制裝置進行組合,而作為顯影液管理裝置的一個構件來利用。 As described above, the component concentration measuring device according to the present embodiment can be used as a developer management by combining with a control valve provided in a flow path for supplying a replenishing liquid supplied to a developing solution, and a control device for controlling the control valves. A component of the device is utilized.

另外,所謂的補充液,係例如指顯影液的原液、新液、再生液等。亦有包括純水的情況。所謂的原液,係指鹼性成分濃度濃的未使用過的顯影液(例如20%至25% TMAH水溶液)。所謂的新液,係指鹼性成分濃度與顯影製程中使用的濃度相同濃度且未使用過的顯影液(例如2.38% TMAH水溶液)。所謂的再生液,係指從使用過的顯影液去除液中的不要物而能夠再次利用的顯影液。上述各種補充液各有不同的補充液用途和效果。例如,原液乃係用以提高鹼性成分濃度之補充液,使溶解光阻濃度及吸收二氧化碳濃度降低。新液乃係維持或和緩地增減鹼性成分濃度,使溶解光阻濃度及吸收二氧化碳濃度降低之用的補充液。純水乃係使各成分濃度降低之用的補充液。在以下的實施例的說明中亦然。 In addition, the replenishing liquid is, for example, a stock solution of a developing solution, a new liquid, a regenerating liquid, or the like. There are also cases including pure water. The so-called stock solution refers to an unused developer (for example, 20% to 25% TMAH aqueous solution) having a concentrated alkaline component concentration. The so-called new liquid refers to a developer having the same concentration of the alkaline component as the concentration used in the development process and not used (for example, 2.38% TMAH aqueous solution). The regenerant is a developer that can be reused from the used developer to remove unwanted substances from the solution. Each of the above various replenishing liquids has different replenishing liquid uses and effects. For example, the stock solution is a replenisher for increasing the concentration of the alkaline component, and the dissolved photoresist concentration and the absorbed carbon dioxide concentration are lowered. The new liquid is a replenisher for maintaining or slowly increasing or decreasing the concentration of the alkaline component to reduce the concentration of the dissolved photoresist and the concentration of the absorbed carbon dioxide. Pure water is a replenisher for reducing the concentration of each component. The same is true in the description of the following embodiments.

此外,在第11圖中雖係圖示補充液為從補充液貯留槽91、92經由補充液用管路81、82供給、純水為經由純水用管路83供給,但並不以此而限。補充 液亦或先從補充液貯留槽91、92等輸送至調配槽(未圖示),在該調配槽調製成預定之濃度後再輸送至顯影液貯留槽61。此時,控制閥係配置在將補充液從調配槽輸送至顯影液貯留槽61的管路的途中。亦有不將純水直接供給至顯影液貯留槽61,此時,純水用管路83和控制閥43便不存在。在以下的實施例的說明及以下的圖式中亦然。 In addition, in FIG. 11, the replenishing liquid is supplied from the replenishing liquid storage tanks 91 and 92 via the replenishing liquid lines 81 and 82, and the pure water is supplied through the pure water line 83, but this is not And limited. supplement The liquid is first transferred from the replenishing liquid storage tanks 91, 92 and the like to a mixing tank (not shown), and is transported to the developing solution storage tank 61 after the preparation tank is prepared to have a predetermined concentration. At this time, the control valve is disposed in the middle of the line for conveying the replenishing liquid from the mixing tank to the developing solution storage tank 61. There is also no supply of pure water directly to the developer storage tank 61. At this time, the pure water pipe 83 and the control valve 43 are not present. The same applies to the description of the following embodiments and the following drawings.

補充液係貯留在補充液貯留部C的補充液貯留槽91、92。補充液貯留槽91、92係與具備加壓氣體用閥46、47的氮氣用管路86連接,由經由該管路供給的氮氣加壓。此外,在補充液貯留槽91、92係分別有補充液用管路81、82連接,經由常開狀態的閥44、45被輸送補充液。在補充液用管路81、82及純水用管路83係具備控制閥41至43,控制閥41至43係由控制部3控制開閉。藉由控制閥動作,壓送貯留在補充液貯留槽91、92的補充液及輸送純水。然後,補充液係經合流管路84而與循環攪拌機構D合流,補給至顯影液貯留槽61進行攪拌。 The replenishing liquid is stored in the replenishing liquid storage tanks 91 and 92 of the replenishing liquid storage unit C. The replenishing liquid storage tanks 91 and 92 are connected to a nitrogen gas line 86 including the pressurized gas valves 46 and 47, and are pressurized by nitrogen gas supplied through the piping. Further, the replenishing liquid storage tanks 91 and 92 are connected to the replenishing liquid pipes 81 and 82, respectively, and the replenishing liquid is supplied through the valves 44 and 45 in the normally open state. The replenishing liquid pipes 81 and 82 and the pure water pipe 83 are provided with control valves 41 to 43, and the control valves 41 to 43 are controlled to open and close by the control unit 3. By the operation of the control valve, the replenishing liquid stored in the replenishing liquid storage tanks 91, 92 and the pure water are conveyed. Then, the replenishing liquid is merged with the circulation stirring mechanism D through the joining line 84, and is supplied to the developing solution storage tank 61 to be stirred.

當因補給而使得貯留在補充液貯留槽91、92內的補充液減少,其內壓便會下降,導致供給量變得不穩定,因此,相應於補充液的減少將加壓氣體用閥46、47適度打開供給氮氣,以使補充液貯留槽91、92的內壓得以保持的方式維持供給。當補充液貯留槽91、92空了的時候,係將閥44、45關閉,更換成注滿補充液的新的補充液貯留槽、或是對空掉的補充液貯留槽91、92重新填充另備的補充液。 When the replenishing liquid stored in the replenishing liquid storage tanks 91, 92 is reduced by replenishment, the internal pressure thereof is lowered, and the supply amount becomes unstable. Therefore, the pressurized gas valve 46, 47 The nitrogen supply is appropriately opened, and the supply is maintained so that the internal pressure of the replenishing liquid storage tanks 91 and 92 is maintained. When the replenishing liquid storage tanks 91, 92 are empty, the valves 44, 45 are closed, replaced with a new replenishing liquid storage tank filled with the replenishing liquid, or refilled with the empty replenishing liquid storage tanks 91, 92. An additional replenisher.

[第十二實施形態] [Twelfth Embodiment]

本實施形態的成分濃度測定裝置係能夠與顯示裝置DP組合,作為顯影液的成分濃度監視器和成分濃度監視裝置來利用。此外,能夠與警示燈WL和警示裝置WT組合而應用於顯影液的濃度異常警示裝置等。第12圖係用以顯示本發明的成分濃度測定裝置的應用範例之示意圖。如上述,本發明的成分濃度測定裝置係能夠作為構件應用於各種裝置和系統。 The component concentration measuring device of the present embodiment can be used as a component concentration monitor of a developer and a component concentration monitoring device in combination with the display device DP. Further, it can be applied to the concentration abnormality warning device of the developer or the like in combination with the warning light WL and the warning device WT. Fig. 12 is a schematic view showing an application example of the component concentration measuring device of the present invention. As described above, the component concentration measuring device of the present invention can be applied as a member to various devices and systems.

以下,第十三實施形態至第十七實施形態乃係有關本發明的顯影液管理方法。 Hereinafter, the thirteenth to seventeenth embodiments are the developer management methods according to the present invention.

本發明的顯影液管理方法係含有:測定步驟,係測定與鹼性鹼性顯影液的成分濃度有相關的顯影液的複數個特性值;演算步驟,係從所測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度;及補給步驟,係根據所測定得的顯影液的特性值和所算出的顯影液的成分濃度其中任一者來補給補充液至顯影液。測定步驟及演算步驟係與前述的顯影液的成分濃度測定方法中的測定步驟、演算步驟相同,故在以下的第十三實施形態至第十七實施形態係將重複的說明省略。 The developer management method of the present invention includes a measuring step of measuring a plurality of characteristic values of the developer associated with the component concentration of the alkaline alkaline developing solution; and the calculating step is based on the measured plurality of characteristic values. The component concentration of the developer is calculated by the multivariate analysis method; and the replenishing step is to supply the replenishing solution to the developer based on the measured characteristic value of the developer and the calculated component concentration of the developer. Since the measurement procedure and the calculation procedure are the same as the measurement procedure and the calculation procedure in the above-described method for measuring the component concentration of the developer, the repeated description of the thirteenth to seventeenth embodiments will be omitted.

此外,在以下的說明中,「預定之管理值」係指作為顯影液發揮最佳藥液性能時的特性值或濃度值,從經驗上或透過實驗等而預先獲知的特性值或成分濃度值。亦即,例如係指作為使顯影後形成在基板的線寬和殘膜厚之類作為顯影液的顯影性能指標的數值成為 最佳狀態的特性值或成分濃度值而預先獲知之值。同理,「預定之管理區域」指上述管理值的範圍。在顯影液管理裝置的說明中亦然。 In the following description, the "predetermined management value" refers to a characteristic value or a concentration value which is obtained in advance as an optimum liquid chemical performance as a developing solution, and is known in advance from an empirical or experimental basis. . In other words, for example, the numerical value as the development performance index of the developer as the line width and the residual film thickness formed on the substrate after development becomes The value of the characteristic value or the component concentration value of the optimum state is known in advance. Similarly, the "predetermined management area" refers to the range of the above management values. The same applies to the description of the developer management device.

[第十三實施形態] [Thirteenth Embodiment]

第13圖係藉由成分濃度來管理顯影液的兩個成分的顯影液管理方法的流程圖。本實施形態的顯影液管理方法係較佳為適用於下述等情形:在以使二氧化碳的吸收少之方式進行管理的鹼性顯影液中,以使顯影液的鹼性成分濃度成為預定之管理值及使溶解光阻濃度成為預定之管理值以下之方式管理顯影液。 Figure 13 is a flow chart showing a developer management method for managing two components of a developer by a component concentration. The developer management method of the present embodiment is preferably applied to an operation in which an alkaline developer having a low concentration of carbon dioxide is managed in order to keep the concentration of the alkaline component of the developer into a predetermined state. The developer is managed in such a manner that the dissolved photoresist concentration is equal to or less than a predetermined management value.

在本實施形態中乃係將成分濃度A管理為預定之管理值A0,將成分濃度B管理為預定之管理值B0以下。成分濃度A係例如為鹼性成分濃度,成分濃度B係例如為溶解光阻濃度。 In the present embodiment, the component concentration A is managed to a predetermined management value A 0 , and the component concentration B is managed to be a predetermined management value B 0 or less. The component concentration A is, for example, an alkaline component concentration, and the component concentration B is, for example, a dissolved photoresist concentration.

以測定步驟測定顯影液的特性值a、b,將該些測定值am、bm傳送至演算步驟。在演算步驟中,從測定值am、bm,藉由多變量分析法測定顯影液的成分濃度A、B。藉由演算步驟算出的成分濃度A、B係傳送至補給步驟。 The characteristic values a and b of the developer are measured in a measurement step, and the measured values a m and b m are sent to the calculation step. In the calculation step, the component concentrations A and B of the developer are measured by multivariate analysis from the measured values a m and b m . The component concentrations A and B calculated by the calculation step are transmitted to the replenishing step.

補給步驟係含有調整成分濃度A的步驟及調整成分濃度B的步驟。 The replenishing step includes a step of adjusting the component concentration A and a step of adjusting the component concentration B.

首先,在調整成分濃度A的步驟中,係判斷成分濃度A比其管理值A0大還是小。當較為大時,係將產生稀釋成分濃度A之作用的補充液(例如顯影液新 液和純水等)補充至顯影液。當較為小時,係將產生提高成分濃度A之作用的補充液(例如顯影液原液和新液等)補給至顯影液。當成分濃度A與其管理值A0相同時,不進行任何動作。 First, in the step of adjusting the component concentration A, it is judged whether the component concentration A is larger or smaller than the management value A 0 . When it is relatively large, a replenishing liquid (for example, a developing solution new liquid, pure water, or the like) which produces a diluted component concentration A is added to the developing solution. When it is relatively small, a replenishing liquid (for example, a developing solution stock solution and a new liquid) which increases the concentration of the component A is supplied to the developing solution. When the component concentration A is the same as its management value A 0 , no action is taken.

在調整成分濃度B的步驟中,係判斷成分濃度B是否比其管理值B0大。當較為大時,係將產生稀釋成分濃度B之作用的補充液(例如,因顯影液新液不會改變鹼性成分濃度,故補充液較佳為採用顯影液新液)補給至顯影液。當較為小時,不進行任何動作。 In the step of adjusting the component concentration B, it is judged whether or not the component concentration B is larger than the management value B 0 . When it is relatively large, a replenishing liquid which acts to dilute the concentration B is generated (for example, since the new liquid of the developing solution does not change the concentration of the alkaline component, the replenishing liquid is preferably a new liquid of the developing solution) and is supplied to the developing solution. When it is small, no action is taken.

[第十四實施形態] [Fourteenth Embodiment]

第14圖係藉由成分濃度來管理顯影液的兩個成分其中一成分、藉由特性值來管理另一成分時的顯影液管理方法的流程圖。本實施形態的顯影液管理方法係較佳為適用於下述等情形:在以使二氧化碳的吸收少之方式進行管理的鹼性顯影液中,以使顯影液的鹼性成分濃度成為預定之管理值及使顯影液的特定波長(例如λ=560nm)之吸光度成為預定之管理值以下之方式管理顯影液。 Fig. 14 is a flow chart showing a developer management method in which one of the two components of the developer is managed by the component concentration and the other component is managed by the property value. The developer management method of the present embodiment is preferably applied to an operation in which an alkaline developer having a low concentration of carbon dioxide is managed in order to keep the concentration of the alkaline component of the developer into a predetermined state. The developer is managed in such a manner that the absorbance at a specific wavelength (for example, λ = 560 nm) of the developer is equal to or less than a predetermined management value.

在本實施形態中乃係將成分濃度A管理為預定之管理值A0,將顯影液的特性值b的測定值bm管理為預定之管理值b0以下。成分濃度A係例如為鹼性成分濃度、特性值b係例如為特定波長(例如λ=560nm)之吸光度。 In the present embodiment, the component concentration A is managed to a predetermined management value A 0 , and the measured value b m of the characteristic value b of the developer is managed to be equal to or lower than a predetermined management value b 0 . The component concentration A is, for example, an alkaline component concentration, and the characteristic value b is, for example, an absorbance at a specific wavelength (for example, λ = 560 nm).

以測定步驟測定顯影液的特性值a、b,將該些測定值am、bm傳送至演算步驟。在演算步驟中,從測定值am、bm,藉由多變量分析法測定顯影液的成分濃度A、B。藉由演算步驟算出的成分濃度A與藉由測定步驟測定得的特性值b的測定值bm係傳送至補給步驟。 The characteristic values a and b of the developer are measured in a measurement step, and the measured values a m and b m are sent to the calculation step. In the calculation step, the component concentrations A and B of the developer are measured by multivariate analysis from the measured values a m and b m . The component concentration A calculated by the calculation step and the measured value b m of the characteristic value b measured by the measurement step are transmitted to the replenishing step.

補給步驟係含有調整成分濃度A的步驟及調整特性值b的步驟。調整成分濃度A的步驟係與第十三實施例相同,故省略其說明。 The replenishing step includes a step of adjusting the component concentration A and a step of adjusting the characteristic value b. The step of adjusting the component concentration A is the same as that of the thirteenth embodiment, and the description thereof will be omitted.

在調整特性值b的步驟中,係判斷其測定值bm是否比其管理值b0大。當較為大時,係將產生稀釋成分濃度B之作用的補充液(例如,因顯影液新液不會改變鹼性成分濃度,故補充液較佳為採用顯影液新液)補給至顯影液。當較為小時,不進行任何動作。 In the step of adjusting the characteristic value b, it is judged whether or not the measured value b m is larger than the management value b 0 . When it is relatively large, a replenishing liquid which acts to dilute the concentration B is generated (for example, since the new liquid of the developing solution does not change the concentration of the alkaline component, the replenishing liquid is preferably a new liquid of the developing solution) and is supplied to the developing solution. When it is small, no action is taken.

當特性值b與成分濃度B具有單調遞增的相關關係時,係藉由將特性值b管理為其管理值b0以下,而以使成分濃度B成為其管理值B0以下之方式進行管理。當特性值b與成分濃度B具有單調遞減的相關關係時,係只要令判斷的大小關係反過來操作,便能夠同樣以使成分濃度B成為其管理值B0以下之方式進行管理。 When the characteristic value b and the component concentration B have a monotonically increasing correlation, the characteristic value b is managed to be equal to or lower than the management value b 0 or less, and the component concentration B is managed to be equal to or lower than the management value B 0 . When the characteristic value b has a monotonously decreasing correlation with the component concentration B, it is possible to manage the component concentration B to be equal to or less than the management value B 0 as long as the magnitude relationship of the determination is reversed.

[第十五實施形態] [Fifteenth Embodiment]

第15圖係藉由成分濃度來管理顯影液的三個成分的顯影液管理方法的流程圖。本實施形態的顯影液管理方法係例如較佳為適用於下述等情形:將顯影液的鹼性 成分濃度管理為預定之管理值,將溶解光阻濃度管理為預定之管理值以下、及將吸收二氧化碳濃度管理為預定之管理值以下。 Fig. 15 is a flow chart showing a developer management method for managing three components of a developer by a component concentration. The developer management method of the present embodiment is preferably applied, for example, to the case where the developer is alkaline. The component concentration management is a predetermined management value, the dissolved photoresist concentration is managed to be below a predetermined management value, and the absorbed carbon dioxide concentration is managed to be below a predetermined management value.

補給步驟乃係將成分濃度A管理為預定之管理值A0,將成分濃度B管理為預定之管理值B0以下,將成分濃度C管理為預定之管理值C0以下。成分濃度A係例如為鹼性成分濃度,成分濃度B係例如為溶解光阻濃度,成分濃度C係例如為吸收二氧化碳濃度。 The replenishment step is to manage the component concentration A to a predetermined management value A 0 , to manage the component concentration B to a predetermined management value B 0 or less, and to manage the component concentration C to a predetermined management value C 0 or less. The component concentration A is, for example, an alkaline component concentration, the component concentration B is, for example, a dissolved photoresist concentration, and the component concentration C is, for example, an absorbed carbon dioxide concentration.

以測定步驟測定顯影液的特性值a、b、c、...,將該些測定值am、bm、cm、...傳送至演算步驟。在演算步驟中,從測定值am、bm、cm、...,藉由多變量分析法測定顯影液的成分濃度A、B、C、...。藉由演算步驟算出的成分濃度A、B、C、...係傳送至補給步驟。 The characteristic values a, b, c, ... of the developing solution are measured in a measuring step, and the measured values a m , b m , c m , . . . are transmitted to the calculation step. In the calculation step, the component concentrations A, B, C, ... of the developer are measured by the multivariate analysis method from the measured values a m , b m , c m , . The component concentrations A, B, C, ... calculated by the calculation step are transmitted to the replenishing step.

補給步驟係含有調整成分濃度A的步驟、調整成分濃度B的步驟、及調整成分濃度C的步驟。 The replenishing step includes a step of adjusting the component concentration A, a step of adjusting the component concentration B, and a step of adjusting the component concentration C.

首先,在調整成分濃度A的步驟中,係判斷成分濃度A比其管理值A0大還是小。當較為大時,係將產生稀釋成分濃度A之作用的補充液(例如顯影液新液和純水等)補充至顯影液。當較為小時,係將產生提高成分濃度A之作用的補充液(例如顯影液原液和新液等)補給至顯影液。當成分濃度A與其管理值A0相同時,不進行任何動作。 First, in the step of adjusting the component concentration A, it is judged whether the component concentration A is larger or smaller than the management value A 0 . When it is relatively large, a replenishing liquid (for example, a developing solution new liquid, pure water, or the like) which produces a diluted component concentration A is added to the developing solution. When it is relatively small, a replenishing liquid (for example, a developing solution stock solution and a new liquid) which increases the concentration of the component A is supplied to the developing solution. When the component concentration A is the same as its management value A 0 , no action is taken.

在調整成分濃度B的步驟中,係判斷成分濃度B是否比其管理值B0大。當較為大時,係將產生稀釋成分濃度B之作用的補充液(例如,因顯影液新液不會 改變鹼性成分濃度,故補充液較佳為採用顯影液新液)補給至顯影液。當較為小時,不進行任何動作。 In the step of adjusting the component concentration B, it is judged whether or not the component concentration B is larger than the management value B 0 . When it is relatively large, a replenishing liquid which acts to dilute the concentration B is generated (for example, since the new liquid of the developing solution does not change the concentration of the alkaline component, the replenishing liquid is preferably a new liquid of the developing solution) and is supplied to the developing solution. When it is small, no action is taken.

在調整成分濃度C的步驟中,係判斷成分濃度C是否比其管理值C0大。當較為大時,係將產生稀釋成分濃度C之作用的補充液(例如,因顯影液新液不會改變鹼性成分濃度,故補充液較佳為採用顯影液新液)補給至顯影液。當較為小時,不進行任何動作。 In the step of adjusting the component concentration C, it is judged whether or not the component concentration C is larger than the management value C 0 . When it is relatively large, a replenishing liquid which acts to dilute the concentration C is generated (for example, since the developer liquid does not change the alkali component concentration, the replenishing liquid is preferably a developer liquid) and is supplied to the developer. When it is small, no action is taken.

[第十六實施形態] [Sixteenth Embodiment]

第16圖係藉由特性值來管理顯影液的三個成分其中一成分、藉由成分濃度來管理其餘兩成分的顯影液管理方法的流程圖。本實施形態的顯影液管理方法係較佳為適用於下述等情形:以使顯影液的鹼性成分濃度成為預定之管理值、使顯影液的特定波長(例如λ=560nm)之吸光度成為預定之管理值以下、及使顯影液的吸收二氧化碳濃度成為預定之管理值以下之方式管理顯影液。 Fig. 16 is a flow chart showing a method of managing a developer for managing the remaining two components by one of the three components of the developer by the characteristic value. The developer management method of the present embodiment is preferably applied to a case where the alkali component concentration of the developer is a predetermined management value, and the absorbance at a specific wavelength (for example, λ = 560 nm) of the developer is predetermined. The developer is managed below the management value and the concentration of the absorbed carbon dioxide of the developer is equal to or less than a predetermined management value.

在本實施形態中乃係將成分濃度A管理為預定之管理值A0,將顯影液的特性值b的測定值bm管理為預定之管理值b0以下,將成分濃度C管理為預定之管理值C0以下。成分濃度A係例如為鹼性成分濃度,特性值b係例如為特定波長(例如λ=560nm)之吸光度,成分濃度C係例如為吸收二氧化碳濃度。 In the present embodiment, the component concentration A is managed to a predetermined management value A 0 , and the measured value b m of the characteristic value b of the developer is managed to be equal to or lower than a predetermined management value b 0 , and the component concentration C is managed to be predetermined. The management value is below C 0 . The component concentration A is, for example, an alkaline component concentration, and the characteristic value b is, for example, an absorbance at a specific wavelength (for example, λ = 560 nm), and the component concentration C is, for example, an absorbed carbon dioxide concentration.

以測定步驟測定顯影液的特性值a、b、c,將該些測定值am、bm、cm傳送至演算步驟。在演算步驟中,從測定值am、bm、cm,藉由多變量分析法測定顯影 液的成分濃度A、B、C。藉由演算步驟算出的成分濃度A、C、及以測定步驟測定得的特性值b的測定值bm係傳送至補給步驟。 In the step of measuring characteristics of the developer measured values a, b, c, some of the steps of calculating a m, b m, c m values transferred to the assay. In the calculation step, the component concentrations A, B, and C of the developer are measured by multivariate analysis from the measured values a m , b m , and c m . The component concentrations A and C calculated by the calculation step and the measured value b m of the characteristic value b measured by the measurement step are transmitted to the replenishing step.

補給步驟係含有調整成分濃度A的步驟、調整特性值b的步驟、及調整成分濃度C的步驟。調整成分濃度A的步驟及調整成分濃度C的步驟係與第十五實施形態相同,故省略其說明。 The replenishing step includes a step of adjusting the component concentration A, a step of adjusting the characteristic value b, and a step of adjusting the component concentration C. The step of adjusting the component concentration A and the step of adjusting the component concentration C are the same as those of the fifteenth embodiment, and thus the description thereof will be omitted.

在調整特性值b的步驟中,係判斷其測定值bm是否比其管理值b0大。當較為大時,係將產生稀釋成分濃度B之作用的補充液(例如,因顯影液新液不會改變鹼性成分濃度,故補充液較佳為採用顯影液新液)補給至顯影液。當較為小時,不進行任何動作。 In the step of adjusting the characteristic value b, it is judged whether or not the measured value b m is larger than the management value b 0 . When it is relatively large, a replenishing liquid which acts to dilute the concentration B is generated (for example, since the new liquid of the developing solution does not change the concentration of the alkaline component, the replenishing liquid is preferably a new liquid of the developing solution) and is supplied to the developing solution. When it is small, no action is taken.

當特性值b與成分濃度B具有單調遞增的相關關係時,係藉由將特性值b管理為其管理值b0以下,而以使成分濃度B成為其管理值B0以下之方式進行管理。當特性值b與成分濃度B具有單調遞減的相關關係時,係只要令判斷的大小關係反過來(亦即bm<b0)操作,便能夠同樣以使成分濃度B成為其管理值B0以下之方式進行管理。 When the characteristic value b and the component concentration B have a monotonically increasing correlation, the characteristic value b is managed to be equal to or lower than the management value b 0 or less, and the component concentration B is managed to be equal to or lower than the management value B 0 . When the characteristic value b and the component concentration B have a monotonically decreasing correlation, the component concentration B can be made the management value B 0 as long as the magnitude relationship of the judgment is reversed (that is, b m <b 0 ). Manage in the following ways.

[第十七實施形態] [Seventeenth Embodiment]

第17圖係藉由特性值來管理顯影液的三個成分其中兩成分、藉由成分濃度來管理其餘一成分的顯影液管理方法的流程圖。本實施形態的顯影液管理方法係較佳為適用於下述等情形:以使顯影液的導電率成為預定之 管理值、使顯影液的特定波長(例如λ=560nm)之吸光度成為預定之管理值以下、及使顯影液的吸收二氧化碳濃度成為預定之管理值以下之方式管理顯影液。 Fig. 17 is a flow chart showing a method of managing a developer for managing the remaining components by three components of the three components of the developer by characteristic values. The developer management method of the present embodiment is preferably applied to a case where the conductivity of the developer is made predetermined. The developer is managed such that the absorbance of the specific wavelength of the developer (for example, λ = 560 nm) is equal to or lower than a predetermined management value, and the concentration of the absorbed carbon dioxide of the developer is equal to or less than a predetermined management value.

在本實施形態中乃係將顯影液的特性值a的測定值am管理為預定之管理值a0,將顯影液的特性值b的測定值bm管理為預定之管理值b0以下,將成分濃度C管理為預定之管理值C0以下。特性值a係例如為導電率,特性值b係例如為特定波長(例如λ=560nm)之吸光度,成分濃度C係例如為吸收二氧化碳濃度。 In the present embodiment, the measured value a m of the characteristic value a of the developer is managed to a predetermined management value a 0 , and the measured value b m of the characteristic value b of the developer is managed to be equal to or less than a predetermined management value b 0 . The component concentration C is managed to be equal to or lower than a predetermined management value C 0 . The characteristic value a is, for example, conductivity, and the characteristic value b is, for example, an absorbance at a specific wavelength (for example, λ = 560 nm), and the component concentration C is, for example, an absorbed carbon dioxide concentration.

以測定步驟測定顯影液的特性值a、b、c,將該些測定值am、bm、cm傳送至演算步驟。在演算步驟中,從測定值am、bm、cm,藉由多變量分析法測定顯影液的成分濃度A、B、C。以測定步驟測定得的特性值a的測定值am、b的測定值bm、及藉由演算步驟算出的成分濃度C係傳送至補給步驟。 In the step of measuring characteristics of the developer measured values a, b, c, some of the steps of calculating a m, b m, c m values transferred to the assay. In the calculation step, the component concentrations A, B, and C of the developer are measured by multivariate analysis from the measured values a m , b m , and c m . To determine the characteristic values obtained in the measurement step of measuring a value of a m, b measured values b m, and by the step of calculating a component concentration C is calculated based transferred to recharge step.

補給步驟係含有調整特性值a的步驟、調整特性值b的步驟、及調整成分濃度C的步驟。調整特性值b的步驟及調整成分濃度C的步驟係與第十六實施形態相同,故省略其說明。 The replenishing step includes a step of adjusting the characteristic value a, a step of adjusting the characteristic value b, and a step of adjusting the component concentration C. The step of adjusting the characteristic value b and the step of adjusting the component concentration C are the same as those of the sixteenth embodiment, and thus the description thereof will be omitted.

在調整特性值a的步驟中,係判斷其測定值am比其管理值a0大還是小。當較為大時,係將產生稀釋成分濃度A之作用的補充液(例如顯影液原液或新液)補給至顯影液。當較為時,係將產生提高成分濃度A之作用的補充液(例如顯影液新液或純水)補給至顯影液。當相同時,不進行任何動作。 In the step of adjusting the characteristic value a, it is judged whether the measured value a m is larger or smaller than the management value a 0 . When it is relatively large, a replenishing liquid (for example, a developing solution stock solution or a new liquid) which produces a diluted component concentration A is supplied to the developing solution. When it is relatively small, a replenishing liquid (for example, a new liquid solution or pure water) which increases the concentration of the component A is supplied to the developer. When the same, no action is taken.

當特性值a與成分濃度A具有單調遞增的相關關係時,係藉由將特性值a維持在其管理值a0,而以使成分濃度A成為其管理值A0之方式進行管理。當特性值a與成分濃度A具有單調遞減的相關關係時,係只要令判斷的大小關係反過來操作,便能夠同樣以使成分濃度A成為其管理值A0之方式進行管理。 When the characteristic value a has a monotonically increasing correlation with the component concentration A, it is managed such that the component concentration A is maintained at its management value a 0 so that the component concentration A becomes its management value A 0 . When the characteristic value a has a monotonously decreasing correlation with the component concentration A, the system can be managed such that the component concentration A becomes the management value A 0 as long as the magnitude relationship of the determination is reversed.

以上,如第十三實施形態至第十七實施形態所示,本發明的顯影液管理方法係含有:測定步驟,係測定與顯影液的成分濃度有相關的顯影液的複數個特性值;演算步驟,係根據所測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度;及補給步驟,係根據從所測定的顯影液的複數個特性值及所算出的顯影液的成分濃度當中選擇的管理對象項目的測定值或算出值,補充補充液至顯影液。 As described in the thirteenth to seventeenth embodiments, the developer management method of the present invention includes a measurement step of measuring a plurality of characteristic values of the developer associated with the component concentration of the developer; a step of calculating a component concentration of the developer by a multivariate analysis method based on the measured plurality of characteristic values; and a replenishing step based on the plurality of characteristic values from the measured developer and the calculated developer The measured value or the calculated value of the management target item selected among the component concentrations is added to the developer.

測定步驟係復含有:測定特性值a的測定步驟、測定特性值b的測定步驟、測定特性值c的測定步驟、...等。但該些步驟順序不拘。亦可同時測定。此外,亦可配合測定手法而適當含有溫度調整步驟、試藥添加步驟、廢液步驟等必要步驟。 The measurement step includes a measurement step of measuring the characteristic value a, a measurement step of measuring the characteristic value b, a measurement step of measuring the characteristic value c, and the like. But the order of these steps is not limited. It can also be measured at the same time. Further, a necessary step such as a temperature adjustment step, a reagent addition step, and a waste liquid step may be appropriately included in accordance with the measurement method.

演算步驟係亦可含有藉由多變量分析法算出成分濃度的演算步驟。亦可含有藉由不同於多變量分析法的演算方法(例如檢量曲線法)算出成分濃度的步驟等。 The calculation step may also include a calculation step of calculating the concentration of the component by multivariate analysis. The step of calculating the component concentration by an arithmetic method different from the multivariate analysis method (for example, the calibration curve method) may be included.

補給步驟係含有以管理對象項目(顯影液的特性值和成分濃度其中任一者)為控制量,以使該控制 量成為預定之管理值、或者成為預定之管理值以下或管理區域內之方式補給補充液至顯影液的調整成分濃度A的步驟、調整成分濃度B的步驟、調整成分濃度C的步驟、……。該些步驟的順序並以圖式中所示的順序為限。 The replenishing step includes controlling the object item (the characteristic value of the developing solution and the component concentration) as a control amount to make the control The step of adjusting the component concentration A to replenish the replenishing liquid to the adjusting component concentration A of the developing solution, the step of adjusting the component concentration B, or the step of adjusting the component concentration C, or the amount of the predetermined management value or the predetermined management value or less in the management region. . The order of the steps is limited to the order shown in the drawings.

此外,關於控制的方式,係能夠採用令控制量一致於目標值之控制所使用的各種控制方法。具體而言,較佳為比例控制(P控制)、積分控制(I控制)、微分控制(D控制)、及將該些控制方式進行組合而成的控制(PI控制等)。更佳為PID控制。 Further, regarding the manner of control, various control methods used to control the control amount in accordance with the target value can be employed. Specifically, proportional control (P control), integral control (I control), differential control (D control), and control (PI control, etc.) in which these control methods are combined are preferable. Better for PID control.

在上述第十三實施形態至第十七實施形態中,藉由反覆進行測定步驟、演算步驟、補給步驟,顯影液的成分濃度A係維持在其管理值A0,顯影液的成分濃度B係管理在其管理值B0以下,成分濃度C係管理在其管理值C0以下。因此,藉由本發明的顯影液管理方法,能夠維持最佳的顯影性能,從而能夠實現所期望的線寬和殘膜厚。 In the thirteenth to seventeenth embodiments, the measurement step, the calculation step, and the replenishment step are repeated, and the component concentration A of the developer is maintained at the management value A 0 , and the component concentration B of the developer is The management is below its management value B 0 , and the component concentration C is managed below its management value C 0 . Therefore, with the developer management method of the present invention, it is possible to maintain optimum developing performance, and it is possible to achieve a desired line width and residual film thickness.

以下,第十八實施形態至第二十五實施形態乃係有關本發明的顯影液管理裝置。 Hereinafter, the eighteenth to twenty-fifth embodiments are related to the developer management device of the present invention.

本實施形態的顯影液管理裝置係具備:測定部1,係測定與鹼性顯影液的成分濃度有相關的顯影液的複數個特性值;演算部2,係從以測定部1測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度;及控制部3,係根據以測定部1測定得的顯影液的特性值或以演算部2算出的顯影液的成分濃度,對設置在輸送補給至顯影液的補充液之流路的控制閥41至 43發出控制信號。本發明的顯影液管理裝置的測定部1及演算部2係與前述的顯影液的成分濃度測定裝置中的測定部1、演算部2相同,故在以下的第十八實施形態至第二十五實施形態中係將重複的說明省略。 The developer management device according to the present embodiment includes the measurement unit 1 that measures a plurality of characteristic values of the developer associated with the component concentration of the alkaline developer, and the calculation unit 2 that is obtained from the measurement unit 1 The characteristic value is calculated by the multivariate analysis method, and the control unit 3 is based on the characteristic value of the developer measured by the measurement unit 1 or the component concentration of the developer calculated by the calculation unit 2 Provided to the control valve 41 for conveying the flow path of the replenishing liquid supplied to the developing solution to 43 sends a control signal. The measurement unit 1 and the calculation unit 2 of the developer management device of the present invention are the same as the measurement unit 1 and the calculation unit 2 in the component concentration measurement device for the developer described above, and therefore, the following eighteenth to twentieth embodiments In the fifth embodiment, the repeated description will be omitted.

[第十八實施形態] [Eighteenth Embodiment]

第18圖係用以說明本發明的顯影液管理裝置之顯影製程的示意圖。將本發明的顯影液管理裝置E與顯影製程設備B、補充液貯留部C、循環攪拌機構D等一同圖示。 Fig. 18 is a schematic view for explaining the developing process of the developer management device of the present invention. The developer management device E of the present invention is shown together with the development process equipment B, the replenishing liquid storage unit C, the circulation agitation mechanism D, and the like.

本實施形態的顯影液管理裝置E係具備:測定部1,係具備測定顯影液的複數個特性值的複數個測定手段11至13;演算部2,係含有以多變量分析法進行的演算方塊21;及控制部3,係以顯影液的特性值和成分濃度其中任一者為控制量,以使該控制量成為預定之管理值或管理區域內之方式進行控制。此外,本實施形態的顯影液管理裝置係具備與控制部3連接進行控制的控制閥41至43。 The developer management device E of the present embodiment includes a measurement unit 1 including a plurality of measurement means 11 to 13 for measuring a plurality of characteristic values of the developer, and a calculation unit 2 including a calculation block by multivariate analysis. 21; and the control unit 3 controls one of the characteristic value and the component concentration of the developer as a control amount so that the control amount becomes a predetermined management value or a management region. Further, the developer management device of the present embodiment includes control valves 41 to 43 that are connected to the control unit 3 and controlled.

顯影液管理裝置E係與顯影液貯留槽61透過取樣配管15而連接。藉由取樣泵14取樣得的顯影液係通過取樣配管15導至測定部1內。在測定部1內,由各測定手段11至13測定顯影液的特性值。測定後的顯影液係通過回流配管16而返回顯影液貯留槽61。 The developer management device E is connected to the developer storage tank 61 through the sampling pipe 15. The developer sampled by the sampling pump 14 is guided into the measuring unit 1 through the sampling pipe 15. In the measuring unit 1, the characteristic values of the developing solution are measured by the respective measuring means 11 to 13. The developer after the measurement is returned to the developer storage tank 61 through the return pipe 16 .

演算部2係接收一組以測定部1測定得的顯影液的複數個特性值的測定值。演算部2係從所接收 到的一組測定值,藉由多變量分析法算出顯影液的成分濃度。 The calculation unit 2 receives a set of measured values of a plurality of characteristic values of the developer measured by the measuring unit 1. The calculation department 2 receives from the receiving The set of measured values obtained was calculated by multivariate analysis to determine the concentration of the developer.

測定動作、演算動作的詳情係與前述的顯影液的成分濃度測定裝置相同,故予以省略,以下針對控制動作進行說明。 The details of the measurement operation and the calculation operation are the same as those of the above-described component concentration measuring device for the developer, and therefore will not be described. Hereinafter, the control operation will be described.

顯影液管理裝置E係與輸送補給至顯影液的補充液之管路81至83連接(純水亦納入作為補充液)。各管路81至83係與位在顯影液管理裝置E內且由控制部3控制其動作的控制閥41至43連接。 The developer management device E is connected to the lines 81 to 83 for supplying the replenishing liquid supplied to the developer (pure water is also included as a replenishing liquid). Each of the conduits 81 to 83 is connected to the control valves 41 to 43 which are positioned in the developer management device E and whose operation is controlled by the control unit 3.

控制部3係從測定部1接收顯影液的特性值的測定值,從演算部2接收算出的成分濃度。控制部3係以接收到的顯影液的特性值或成分濃度為控制量,根據該控制量,對控制閥41至43發出控制信號。關於控制,係例如以使其控制量成為預定之管理值或成為預定之管理區域內之方式進行。 The control unit 3 receives the measured value of the characteristic value of the developer from the measuring unit 1 and receives the calculated component concentration from the calculating unit 2. The control unit 3 sets a control value for the control valves 41 to 43 based on the control amount by using the received characteristic value or component concentration of the developer as a control amount. The control is performed, for example, such that the amount of control becomes a predetermined management value or becomes within a predetermined management area.

控制部3係具備控制方塊。例如,若顯影液管理裝置E為管理顯影液的三個成分濃度A、B、C,則控制部3係具備用以控制成分濃度A之控制方塊31、用以控制成分濃度B之控制方塊32、用以控制成分濃度C之控制方塊33。若要管理的成分濃度為兩個,則控制方塊為兩個即可,又,若要管理的成分濃度多於三個,便相應地再多配置相同的控制方塊。如此,控制部3便能夠對控制閥41至43發出所需的控制信號。 The control unit 3 is provided with a control block. For example, if the developer management device E is to manage the three component concentrations A, B, and C of the developer, the control unit 3 includes a control block 31 for controlling the component concentration A and a control block 32 for controlling the component concentration B. Control block 33 for controlling the concentration C of the component. If the concentration of the components to be managed is two, the control block can be two. Further, if more than three components are to be managed, the same control block is configured accordingly. Thus, the control unit 3 can issue the required control signals to the control valves 41 to 43.

控制閥41至43係當例如為在接收到「開」信號的期間打開的控制閥且為已預先調節好流量使在開 閥時能夠輸送預定之流量的開閉控制閥時,係由控制部3對設置在輸送所應補給的補充液之流路的控制閥傳送「開」信號達預定之時間長度,藉此使顯影液管理所需的補充液僅必要之量補給至顯影液。 The control valves 41 to 43 are, for example, control valves that are opened during the reception of the "on" signal and are pre-adjusted for the flow rate to be opened. When the valve is capable of delivering an opening/closing control valve of a predetermined flow rate, the control unit 3 transmits an "on" signal to the control valve provided in the flow path of the replenishing liquid to be replenished for a predetermined period of time, thereby making the developing solution The replenishing liquid required for management is supplied to the developer only in an amount necessary.

控制閥的控制動作並不限於上例。當控制閥為藉由開閉切換信號來切換閥的開狀態與閉狀態時,係由控制部3以預定之時間間隔對控制閥發送脈波(pulse)式的開閉切換信號,藉此使所需的補充液僅必要之量補給至顯影液。 The control action of the control valve is not limited to the above example. When the control valve switches the open state and the closed state of the valve by the opening and closing switching signal, the control unit 3 transmits a pulse-type opening and closing switching signal to the control valve at predetermined time intervals, thereby making the required The replenisher is replenished to the developer in only the necessary amount.

此外,控制閥41至43係可為能夠控制閥開度的控制閥,亦可單純為流量調整閥(針閥(needle valve))與開閉控制閥之組合。控制閥41至43係可為電磁閥,亦可為空氣壓操作閥(氣動閥(air operated valve))。 Further, the control valves 41 to 43 may be control valves capable of controlling the valve opening degree, or may simply be a combination of a flow regulating valve (needle valve) and an opening and closing control valve. The control valves 41 to 43 may be solenoid valves or air operated valves (air operated valves).

控制閥41至43根據控制部3所發出的控制信號而動作,藉此,使顯影液管理所需之量的補充液補給至顯影液。控制部3係根據從接收到的控制量(顯影液的特性值或成分濃度)得出的補充液的種類及其所需的補給量,以輸送所需的補給量之方式對所應控制的控制閥發出控制信號。 The control valves 41 to 43 operate in accordance with a control signal from the control unit 3, whereby the replenishing liquid required for the developer management is supplied to the developer. The control unit 3 controls the type of the replenishing liquid obtained from the received control amount (the characteristic value or the component concentration of the developing solution) and the required replenishment amount thereof in order to deliver the required replenishment amount. The control valve sends a control signal.

如此,藉由本實施形態的顯影液管理裝置,能夠根據所測定得的顯影液的特性值或所算出的顯影液的成分濃度,以使該些特性值或成分濃度成為預定之管理值或成為預定之管理區域內之方式維持管理顯影液。 According to the developer management device of the present embodiment, it is possible to set the characteristic value or the component concentration to a predetermined management value or to be predetermined based on the measured characteristic value of the developer or the calculated component concentration of the developer. The management of the developer is maintained in a manner within the management area.

更具體而言,能夠進行如下所列的顯影液管理。但下列所舉出的顯影液管理僅為例示,並不以此為限。 More specifically, developer management as listed below can be performed. However, the developer management listed below is merely illustrative and is not limited thereto.

第一種顯影液管理:係以使重複使用的鹼性顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度成為針對各者的預定之管理值之方式補給補充液至顯影液。例如,依據本發明的顯影液管理裝置,能夠管理成:2.38% TMAH水溶液的鹼性成分濃度較佳為2.375(wt%)至2.390(wt%)之範圍內的預定之管理值,更佳為2.380(wt%);溶解光阻濃度較佳為0.40(wt%)以下的預定之管理值,更佳為0.15(wt%);吸收二氧化碳濃度較佳為0.40(wt%)以下的預定之管理值,更佳為0.25(wt%)。 The first type of developer management is to supply the replenishing liquid to the developer so that the alkaline component concentration, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration of the repeatedly used alkaline developing solution become predetermined management values for each. For example, the developer management apparatus according to the present invention can be managed to have a predetermined management value in which the alkaline component concentration of the 2.38% TMAH aqueous solution is preferably from 2.375 (wt%) to 2.390 (wt%), more preferably 2.380 (wt%); a predetermined management value of a dissolved photoresist concentration of preferably 0.40 (wt%) or less, more preferably 0.15 (wt%); and a predetermined management of an absorption carbon dioxide concentration of preferably 0.40 (wt%) or less; The value is more preferably 0.25 (wt%).

第二種顯影液管理:係以使重複使用的顯影液的鹼性成分濃度成為預定之管理值、使溶解光阻濃度及吸收二氧化碳濃度成為針對各者的預定之管理值以下之方式補給補充液至顯影液。例如,依據本發明的顯影液管理裝置,能夠管理成:2.38% TMAH水溶液的鹼性成分濃度較佳為2.375(wt%)至2.390(wt%)之範圍內的預定之管理值,更佳為2.380(wt%);溶解光阻濃度較佳為0.40(wt%)以下;吸收二氧化碳濃度較佳為0.40(wt%)以下。 The second developer management is to replenish the replenishing liquid so that the alkaline component concentration of the re-used developer becomes a predetermined management value, and the dissolved photoresist concentration and the absorbed carbon dioxide concentration are equal to or less than a predetermined management value for each developer. To the developer. For example, the developer management apparatus according to the present invention can be managed to have a predetermined management value in which the alkaline component concentration of the 2.38% TMAH aqueous solution is preferably from 2.375 (wt%) to 2.390 (wt%), more preferably 2.380 (wt%); the dissolved photoresist concentration is preferably 0.40 (wt%) or less; the absorbed carbon dioxide concentration is preferably 0.40 (wt%) or less.

第三種顯影液管理:係以使重複使用的鹼性顯影液的鹼性成分濃度、特定波長之吸光度、及吸收二氧化碳濃度成為針對各者的預定之管理值之方式補給補充液至顯影液。例如,依據本發明的顯影液管理裝置, 能夠管理成:2.38% TMAH水溶液的鹼性成分濃度較佳為2.375(wt%)至2.390(wt%)之範圍內的預定之管理值,更佳為2.380(wt%);較佳為將波長λ=560nm之吸光度(槽(cell)光路長d=10mm)管理為1.30(Abs.)以下的預定之管理值,更佳為0.50(Abs.);吸收二氧化碳濃度較佳為0.40(wt%)以下的預定之管理值,更佳為0.25(wt%)。 The third developer management is to supply the replenishing liquid to the developer so that the alkaline component concentration of the reusable alkaline developing solution, the absorbance at a specific wavelength, and the absorbed carbon dioxide concentration become predetermined management values for each. For example, the developer management device according to the present invention, The concentration of the basic component of the 2.38% TMAH aqueous solution can be managed to be a predetermined management value in the range of 2.375 (wt%) to 2.390 (wt%), more preferably 2.380 (wt%); preferably the wavelength is The absorbance at λ = 560 nm (cell optical path length d = 10 mm) is managed to be a predetermined management value of 1.30 (Abs.) or less, more preferably 0.50 (Abs.); and the absorbed carbon dioxide concentration is preferably 0.40 (wt%). The predetermined management value below is more preferably 0.25 (wt%).

第四種顯影液管理:係以使重複使用的鹼性顯影液的鹼性成分濃度成為預定之管理、使特定波長之吸光度成為預定之管理區域內、使吸收二氧化碳濃度成為預定之管理值以下之方式補給補充液至顯影液。例如,依據本發明的顯影液管理裝置,能夠管理成:2.38% TMAH水溶液的鹼性成分濃度較佳為2.375(wt%)至2.390(wt%)之範圍內的預定之管理值,更佳為2.380(wt%);波長λ=560nm之吸光度(槽光路長d=10mm)較佳為1.30(Abs.)以下,更佳為0.65(Abs.)以下;吸收二氧化碳濃度較佳為0.40(wt%)以下。 The fourth developer management is such that the alkaline component concentration of the repeatedly used alkaline developer is predetermined, the absorbance at a specific wavelength is within a predetermined management region, and the absorbed carbon dioxide concentration is equal to or less than a predetermined management value. Replenish the replenisher to the developer. For example, the developer management apparatus according to the present invention can be managed to have a predetermined management value in which the alkaline component concentration of the 2.38% TMAH aqueous solution is preferably from 2.375 (wt%) to 2.390 (wt%), more preferably 2.380 (wt%); the absorbance of the wavelength λ = 560 nm (the groove optical path length d = 10 mm) is preferably 1.30 (Abs.) or less, more preferably 0.65 (Abs.) or less; the absorbed carbon dioxide concentration is preferably 0.40 (wt%). )the following.

第五種顯影液管理:係以使重複使用的鹼性顯影液的導電率、特定波長之吸光度、及吸收二氧化碳濃度成為各者的預定之管理值之方式補給補充液至顯影液。例如,依據本發明的顯影液管理裝置,能夠管理成:2.38% TMAH水溶液的導電率較佳為54.47(mS/cm)至54.75(mS/cm)之範圍內的預定之管理值,更佳為54.58(mS/cm);波長λ=560nm之吸光度(槽光路長d=10mm)較佳為1.3(Abs.)以下的預定之管理值,更佳為0.50(Abs.);吸收二氧化碳濃度較佳為0.40(wt%)以下的預定之管理值,更佳為0.25(wt%)。 The fifth type of developer management is to supply the replenishing liquid to the developing solution such that the conductivity of the repeatedly used alkaline developing solution, the absorbance at a specific wavelength, and the absorbed carbon dioxide concentration become predetermined management values of each. For example, the developer management apparatus according to the present invention can manage a predetermined management value in which the conductivity of the 2.38% TMAH aqueous solution is preferably in the range of 54.47 (mS/cm) to 54.75 (mS/cm), more preferably 54.58 (mS/cm); absorbance at a wavelength λ = 560 nm (slot light path length d = 10 mm) is preferably a predetermined management value of 1.3 (Abs.) or less, more preferably 0.50 (Abs.); It is a predetermined management value of 0.40 (wt%) or less, more preferably 0.25 (wt%).

第六種顯影液管理:係以使重複使用的鹼性顯影液的導電率成為預定之管理值、使特定波長之吸光度成為預定之管理區域內、使吸收二氧化碳濃度成為預定之管理值以下之方式補給補充液至顯影液。例如,依據本發明的顯影液管理裝置,能夠管理成:2.38% TMAH水溶液的導電率較佳為54.47(mS/cm)至54.75(mS/cm)之範圍內的預定之管理值,更佳為54.58(mS/cm);波長λ=560nm之吸光度(槽光路長d=10mm)較佳為1.30(Abs.)以下,更佳為0.65(Abs.)以下;吸收二氧化碳濃度較佳為0.40(wt%)以下。 The sixth type of developer management is a method in which the conductivity of the repeatedly used alkaline developer is a predetermined management value, the absorbance at a specific wavelength is within a predetermined management region, and the absorbed carbon dioxide concentration is equal to or lower than a predetermined management value. Replenish the replenisher to the developer. For example, the developer management apparatus according to the present invention can manage a predetermined management value in which the conductivity of the 2.38% TMAH aqueous solution is preferably in the range of 54.47 (mS/cm) to 54.75 (mS/cm), more preferably 54.58 (mS/cm); absorbance at a wavelength λ = 560 nm (slot light path length d = 10 mm) is preferably 1.30 (Abs.) or less, more preferably 0.65 (Abs.) or less; and the absorbed carbon dioxide concentration is preferably 0.40 (wt). %)the following.

因此,依據本實施形態的顯影液管理裝置,相較於習知技術,能夠更高精度地將顯影液的各成分濃度或各特性值管理為預定之管理值或管理區域內,因此能夠將顯影液維持在最佳的顯影性能,從而能夠實現所期望的線寬和殘膜厚。 Therefore, according to the developer management device of the present embodiment, it is possible to manage the concentration of each component of the developer or each characteristic value to a predetermined management value or management area with higher precision than the prior art, so that development can be performed. The liquid is maintained at an optimum developing performance so that the desired line width and residual film thickness can be achieved.

[第十九實施形態] [Nineteenth Embodiment]

第19圖係用以說明設置在輸送補給至顯影液的補充液之流路的控制閥41至43位在本實施形態的顯影液管理裝置外部的實施形態的顯影液管理裝置之示意圖。 Fig. 19 is a schematic view for explaining a developing solution management device of an embodiment in which the control valves 41 to 43 which are provided in the flow path of the replenishing liquid supplied to the developing solution are disposed outside the developing solution management device of the present embodiment.

本實施形態的顯影液管理裝置E係具備:測定部1,係具備測定顯影液的複數個特性值的複數個測定手段;演算部2,係含有以多變量分析法進行的演算方塊21;及控制部3,係以顯影液的特性值和成分濃度其中任一者為控制量,以使該控制量成為預定之管理 值或管理區域內之方式對設置在補充液之補給管路的控制閥41至43發出控制信號。 The developer management device E of the present embodiment includes a measurement unit 1 including a plurality of measurement means for measuring a plurality of characteristic values of the developer, and the calculation unit 2 includes a calculation block 21 by a multivariate analysis method; The control unit 3 uses one of the characteristic value and the component concentration of the developer as a control amount so that the control amount becomes a predetermined management. The value or the manner in the management area gives a control signal to the control valves 41 to 43 provided in the replenishing line of the replenishing liquid.

在本實施形態中,由控制部3控制的控制閥41至43並非顯影液管理裝置E的內部構件。係獨立於顯影液管理裝置E之外設置在輸送補充液的管路。顯影液管理裝置E並未與輸送補充液的該些管路連接。 In the present embodiment, the control valves 41 to 43 controlled by the control unit 3 are not internal members of the developer management device E. It is provided in a conduit for conveying the replenishing liquid independently of the developer management device E. The developer management device E is not connected to the pipes that deliver the replenishing liquid.

其餘的構成、動作等係與第十八實施形態相同,故予以省略。 The rest of the configuration, operation, and the like are the same as those in the eighteenth embodiment, and therefore will not be described.

[第二十實施形態] [Twentyth embodiment]

第20圖係具備有兼具演算功能與控制功能的演算控制部23之顯影液管理裝置E的示意圖。 Fig. 20 is a schematic diagram of a developer management device E having an arithmetic control unit 23 having both an arithmetic function and a control function.

本發明的顯影液管理裝置E並不限於將演算部2與控制部3以個別獨立的裝置之形式構成。亦可構成為兼具演算功能與控制功能的一體化的演算控制部23。就演算控制部23而,例如可舉出電腦等多功能裝置。 The developer management device E of the present invention is not limited to the configuration in which the calculation unit 2 and the control unit 3 are individually independent devices. It is also possible to constitute an integrated calculation control unit 23 that has both an arithmetic function and a control function. The calculation control unit 23 is, for example, a multi-function device such as a computer.

電腦係具備有輸入輸出功能、信號送收功能、演算功能、控制功能、顯示功能等非常多樣的功能。因此,能夠藉由電腦實現本發明的顯影液管理裝置E的演算功能、控制功能。只要演算控制部23有與測定部1及控制閥41至43連接在一起即可。此時,只要在電腦裡安裝有藉由多變量分析法從所測定得的顯影液的特性值算出成分濃度的演算處理程式、及以使控制量(顯影液的特性值或成分濃度)成為預定之管理值或者成為預定之管理區域內之方式對控制閥41至43發出控制信號的控制程式,便能夠將顯影液維持管理在預定之狀態。 The computer system has a wide range of functions such as input/output function, signal transmission and reception function, calculation function, control function, and display function. Therefore, the calculation function and the control function of the developer management device E of the present invention can be realized by a computer. The calculation control unit 23 may be connected to the measurement unit 1 and the control valves 41 to 43. In this case, a calculation processing program for calculating the component concentration from the measured characteristic value of the developer by the multivariate analysis method is installed in the computer, and the control amount (the characteristic value or the component concentration of the developer) is predetermined. The management value or the control program for issuing control signals to the control valves 41 to 43 in a predetermined management area enables the developer to be maintained in a predetermined state.

其餘的構成、動作等係與第十八實施形態相同,故予以省略。 The rest of the configuration, operation, and the like are the same as those in the eighteenth embodiment, and therefore will not be described.

[第二十一實施形態] [Twenty-first embodiment]

第21圖係管理顯影液的兩個成分的顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置E係較佳為適用於下述等情形:對以使二氧化碳的吸收少之方式進行管理的鹼性顯影液的鹼性成分濃度與溶解光阻濃度進行管理。 Fig. 21 is a schematic view showing a developer management device for managing two components of the developer. The developer management device E of the present embodiment is preferably applied to a case where the alkaline component concentration and the dissolved photoresist concentration of the alkaline developer which is managed so as to reduce the absorption of carbon dioxide are used.

只要令第一測定手段11為測定與顯影液的成分中的至少鹼性成分濃度有相關的顯影液的特性值之測定手段(例如,測定導電率的導電率計)、令第二測定手段12為測定與顯影液的成分中的至少溶解光阻濃度有相關的顯影液的特性值之測定手段(例如,測定波長λ=560nm之吸光度的吸光光度計),則由於演算部2含有以多變量分析法進行的演算方塊21,故能夠藉由多變量分析法從所測定得的顯影液的特性值算出顯影液的鹼性成分濃度及溶解光阻濃度。 The first measuring means 11 is a measuring means (for example, a conductivity meter for measuring conductivity) for measuring a characteristic value of a developing solution having a concentration of at least an alkaline component in a component of a developing solution, and causing the second measuring means 12 In order to measure the characteristic value of the developer relating to at least the dissolved photoresist concentration in the composition of the developer (for example, an absorptiometer that measures the absorbance at a wavelength of λ = 560 nm), the calculation unit 2 contains multivariate Since the calculation block 21 is performed by the analysis method, the alkaline component concentration and the dissolved photoresist concentration of the developer can be calculated from the measured characteristic values of the developer by the multivariate analysis method.

如此一來,當控制方塊31為以使顯影液的導電率或鹼性成分濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊、控制方塊32為以使顯影液的特定波長(例如λ=560nm)之吸光度或溶解光阻濃度成為預定之管理值或管理區域內之方式對控制閥發出控制信號之控制方塊時,由於控制部3係以能夠接收所測定得的顯影液的特性值與所算出的顯影液的成分濃度之 方式與測定部1及演算部2連接在一起,故藉由本實施態樣的顯影液管理裝置E,能夠以使顯影液的鹼性成分濃度成為預定之管理值、使溶解光阻濃度成為預定之管理值或管理區域內之方式維持管理顯影液。 In this way, when the control block 31 is a control block that sends a control signal to the control valve in such a manner that the conductivity or the alkaline component concentration of the developer becomes a predetermined management value, the control block 32 is such that the specific wavelength of the developer ( For example, when the absorbance or the dissolved photoresist concentration of λ = 560 nm becomes a predetermined management value or a control block for issuing a control signal to the control valve in a management area, the control unit 3 is capable of receiving the measured characteristics of the developer. The value and the calculated concentration of the developer Since the mode is connected to the measurement unit 1 and the calculation unit 2, the developer management device E of the present embodiment can set the concentration of the alkaline component of the developer to a predetermined management value and set the concentration of the dissolved photoresist to a predetermined value. Maintain management of the developer in a manner that manages the value or management area.

其餘詳情係與其他實施形態相同,故予以省略。 The rest of the details are the same as in the other embodiments, and therefore will be omitted.

[第二十二實施形態] [Twenty-second embodiment]

第22圖係藉由成分濃度來管理顯影液的兩個成分的顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係較佳為適用於下述等情形:將以避免吸收二氧化碳之方式進行管理的鹼性顯影液的鹼性成分濃度與溶解光阻濃度管理為管理濃度值。 Fig. 22 is a schematic view showing a developer management device for managing two components of a developer by a component concentration. The developer management device according to the present embodiment is preferably applied to a case where the alkali component concentration and the dissolved photoresist concentration of the alkaline developer which is managed to avoid absorption of carbon dioxide are managed as the management concentration value.

只要令第一測定手段11為測定與顯影液的成分中的至少鹼性成分濃度有相關的顯影液的特性值之測定手段(例如,測定導電率的導電率計)、令第二測定手段12為測定與顯影液的成分中的至少溶解光阻濃度有相關的顯影液的特性值之測定手段(例如,測定λ=560nm之吸光度的吸光光度計),則由於演算部2含有以多變量分析法進行的演算方塊21,故能夠藉由多變量分析法從所測定得的顯影液的特性值算出顯影液的鹼性成分濃度及溶解光阻濃度。 The first measuring means 11 is a measuring means (for example, a conductivity meter for measuring conductivity) for measuring a characteristic value of a developing solution having a concentration of at least an alkaline component in a component of a developing solution, and causing the second measuring means 12 In order to measure the characteristic value of the developer associated with at least the dissolved photoresist concentration in the composition of the developer (for example, an absorptiometer that measures the absorbance at λ = 560 nm), the calculation unit 2 contains multivariate analysis. Since the square 21 is calculated by the method, the alkaline component concentration and the dissolved photoresist concentration of the developer can be calculated from the measured characteristic values of the developer by the multivariate analysis method.

如此一來,只要令控制方塊31為以使鹼性成分濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊、令控制方塊32為以使溶解光阻濃度成 為預定之管理值或管理值以下之方式對控制閥發出控制信號之控制方塊,則由於控制部3係以能夠接收所算出的顯影液的成分濃度之方式與演算部2連接在一起,故藉由本實施態樣的顯影液管理裝置E,能夠以使顯影液的鹼性成分濃度成為預定之管理值、使溶解光阻濃度成為預定之管理值或管理值以下之方式維持管理顯影液。 In this way, as long as the control block 31 is a control block that sends a control signal to the control valve in such a manner that the alkaline component concentration becomes a predetermined management value, the control block 32 is such that the dissolved photoresist concentration is The control unit 3 sends a control signal to the control valve in a manner that is less than a predetermined management value or a management value. The control unit 3 is connected to the calculation unit 2 so as to be able to receive the calculated concentration of the developer solution. In the developer management device E of the present embodiment, the developer can be maintained by setting the alkaline component concentration of the developer to a predetermined management value and setting the dissolved photoresist concentration to a predetermined management value or less.

其餘詳情係與其他實施形態相同,故予以省略。 The rest of the details are the same as in the other embodiments, and therefore will be omitted.

[第二十三實施形態] [Twenty-third embodiment]

第23圖係藉由特性值來管理顯影液的三個成分其中兩成分、藉由成分濃度來管理其餘一成分的顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係較佳為適用於下述等情形:藉由導電率來管理鹼性顯影液的鹼性成分濃度,藉由特定波長(例如λ=560nm)之吸光度來管理溶解光阻濃度,藉由濃度來管理吸收二氧化碳濃度。 Fig. 23 is a schematic diagram of a developer management apparatus which manages the remaining components by the three components of the developer by the characteristic values. The developer management device according to the present embodiment is preferably applied to a case where the alkaline component concentration of the alkaline developer is controlled by the conductivity, and the solubility is managed by the absorbance at a specific wavelength (for example, λ = 560 nm). The concentration of the photoresist is controlled by the concentration to absorb the concentration of carbon dioxide.

只要令第一測定手段11為測定與顯影液的成分中的至少鹼性成分濃度有相關的顯影液的特性值之測定手段(例如,測定導電率的導電率計)、令第二測定手段12為測定與顯影液的成分中的至少溶解光阻濃度有相關的顯影液的特性值之測定手段(例如,測定λ=560nm之吸光度的吸光光度計)、令第三測定手段13為測定與顯影液的成分中的至少吸收二氧化碳濃度有相關的顯影液的特性值之測定手段(例如,測定密度的密度 計),則由於演算部2含有以多變量分析法進行的演算方塊21,故能夠藉由多變量分析法從所測定得的顯影液的特性值算出顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度。 The first measuring means 11 is a measuring means (for example, a conductivity meter for measuring conductivity) for measuring a characteristic value of a developing solution having a concentration of at least an alkaline component in a component of a developing solution, and causing the second measuring means 12 A measuring means for measuring a characteristic value of a developing solution relating to at least a dissolved photoresist concentration in a component of a developing solution (for example, an absorptiometer for measuring an absorbance of λ = 560 nm), and a third measuring means 13 for measuring and developing The concentration of at least the absorbed carbon dioxide in the liquid component is determined by the characteristic value of the developer (for example, the density of the density is measured) In the calculation unit 2, since the calculation unit 2 includes the calculation block 21 by the multivariate analysis method, the alkaline component concentration and the dissolved photoresist of the developer can be calculated from the measured characteristic values of the developer by the multivariate analysis method. Concentration, and absorption of carbon dioxide concentration.

如此一來,當控制方塊31為以使顯影液的導電率成為預定之管理值之方式對控制閥發出控制信號之控制方塊、控制方塊32為以使顯影液的特性波長(例如λ=560nm)之吸光度成為預定之管理值或管理區域內之方式對控制閥發出控制信號之控制方塊、控制方塊33為以使吸收二氧化碳濃度成為預定之管理值或管理值以下之方式對控制閥發出控制信號之控制方塊時,由於控制部3係以能夠接收所測定得的顯影液的特性值之方式與測定部1連接在一起、以能夠接收所算出的顯影液的成分濃度之方式與演算部2連接在一起,故藉由本實施態樣的顯影液管理裝置E,能夠以使顯影液的鹼性成分濃度成為預定之管理值、使溶解光阻濃度成為預定之管理值或管理值以下、及使吸收二氧化碳濃度成為預定之管理值或管理值以下之方式維持管理顯影液。 In this way, when the control block 31 is a control block for issuing a control signal to the control valve in such a manner that the conductivity of the developer becomes a predetermined management value, the control block 32 is such that the characteristic wavelength of the developer (for example, λ = 560 nm). The control block for issuing a control signal to the control valve in a manner that the absorbance becomes a predetermined management value or a management area, and the control block 33 sends a control signal to the control valve in such a manner that the absorbed carbon dioxide concentration becomes a predetermined management value or a management value or less. When the control unit 3 is connected to the measurement unit 1 so as to be able to receive the measured component concentration of the developer, the control unit 3 is connected to the calculation unit 2 so as to be able to receive the measured characteristic value of the developer. In addition, the developer management device E of the present embodiment can make the alkaline component concentration of the developer into a predetermined management value, set the dissolved photoresist concentration to a predetermined management value or less, and absorb carbon dioxide. The management of the developer is maintained in such a manner that the concentration becomes a predetermined management value or a management value or less.

其餘詳情係與其他實施形態相同,故予以省略。 The rest of the details are the same as in the other embodiments, and therefore will be omitted.

[第二十四實施形態] [Twenty-fourth embodiment]

第24圖係藉由特性值來管理顯影液的三個成分其中一成分、藉由成分濃度來管理其餘兩成分的顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係較佳 為適用於下述等情形:藉由濃度來管理鹼性顯影液的鹼性成分濃度與吸收二氧化碳濃度,藉由特定波長(例如,λ=560nm)之吸光度來管理溶解光阻濃度。 Fig. 24 is a schematic view showing a developer management device for managing one of the three components of the developer by the characteristic value and managing the remaining two components by the component concentration. The developer management device of the embodiment is preferably It is suitable for the case where the concentration of the alkaline component of the alkaline developing solution and the concentration of the absorbed carbon dioxide are managed by the concentration, and the concentration of the dissolved photoresist is managed by the absorbance of a specific wavelength (for example, λ = 560 nm).

只要令第一測定手段11為測定與顯影液的成分中的至少鹼性成分濃度有相關的顯影液的特性值之測定手段(例如,測定導電率的導電率計)、令第二測定手段12為測定與顯影液的成分中的至少溶解光阻濃度有相關的顯影液的特性值之測定手段(例如,測定λ=560nm之吸光度的吸光光度計)、令第三測定手段為測定與顯影液的成分中的至少吸收二氧化碳濃度有相關的顯影液的特性值之測定手段(例如,測定密度的密度計),則由於演算部2含有以多變量分析法進行的演算方塊21,故能夠藉由多變量分析法從所測定得的顯影液的特性值算出顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度。 The first measuring means 11 is a measuring means (for example, a conductivity meter for measuring conductivity) for measuring a characteristic value of a developing solution having a concentration of at least an alkaline component in a component of a developing solution, and causing the second measuring means 12 A measuring means for measuring a characteristic value of a developing solution relating to at least a dissolved photoresist concentration in a component of a developing solution (for example, an absorptiometer for measuring an absorbance of λ = 560 nm), and a third measuring means for measuring and developing a liquid The measuring unit 2 (for example, a density meter for measuring density) in which at least the carbon dioxide concentration is absorbed in the component, the calculation unit 2 includes the calculation block 21 by the multivariate analysis method. The multivariate analysis method calculates the alkaline component concentration, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration of the developer from the measured characteristic values of the developer.

如此一來,當控制方塊31為以使鹼性成分濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊、控制方塊32為以使顯影液的特性波長(例如,λ=560nm)之吸光度成為預定之管理值或管理區域內之方式對控制閥發出控制信號之控制方塊、控制方塊33為以使吸收二氧化碳濃度成為預定之管理值或管理值以下之方式對控制閥發出控制信號之控制方塊時,由於控制部3係以能夠接收所測定得的顯影液的特性值之方式與測定部1連接在一起、以能夠接收所算出的顯影液的成分濃度之成分與演算部2連接在一起,故藉由本實施 態樣的顯影液管理裝置E,能夠以使顯影液的鹼性成分濃度成為預定之管理值、使溶解光阻濃度成為預定之管理值或管理值以下、及使吸收二氧化碳濃度成為預定之管理值或管理值以下之方式維持管理顯影液。 In this way, when the control block 31 is a control block for issuing a control signal to the control valve in such a manner that the alkali component concentration becomes a predetermined management value, the control block 32 is such that the characteristic wavelength of the developer (for example, λ = 560 nm). The control block for issuing a control signal to the control valve in a manner that the absorbance becomes a predetermined management value or a management area, and the control block 33 sends a control signal to the control valve in such a manner that the absorbed carbon dioxide concentration becomes a predetermined management value or a management value or less. In the case of the control unit, the control unit 3 is connected to the measurement unit 2 so as to be able to receive the measured characteristic value of the developer, and is connected to the calculation unit 2 so as to be able to receive the component concentration of the calculated developer. Together, so by this implementation In the developer management device E of the aspect, the concentration of the alkaline component of the developer is set to a predetermined management value, the concentration of the dissolved photoresist is equal to or less than a predetermined management value or management value, and the concentration of the absorbed carbon dioxide is a predetermined management value. Or manage the developer in a manner that is less than the management value.

其餘詳情係與其他實施形態相同,故予以省略。 The rest of the details are the same as in the other embodiments, and therefore will be omitted.

[第二十五實施形態] [Twenty-fifth embodiment]

第25圖係藉由成分濃度來管理顯影液的三個成分的顯影液管理裝置的示意圖。本實施形態的顯影液管理裝置係較佳為適用於下述等情形:藉由濃度來管理鹼性顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度。 Fig. 25 is a schematic view showing a developer management apparatus for managing three components of a developer by a component concentration. The developer management device according to the present embodiment is preferably applied to a case where the alkaline component concentration, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration of the alkaline developer are managed by the concentration.

只要令第一測定手段11為測定與顯影液的成分中的至少鹼性成分濃度有相關的顯影液的特性值之測定手段(例如,測定導電率的導電率計)、令第二測定手段12為測定與顯影液的成分中的至少溶解光阻濃度有相關的顯影液的特性值之測定手段(例如,測定λ=560nm之吸光度的吸光光度計)、令第三測定手段為測定與顯影液的成分中的至少吸收二氧化碳濃度有相關的顯影液的特性值之測定手段(例如,測定密度的密度計),則由於演算部2含有以多變量分析法進行的演算方塊21,故能夠藉由多變量分析法從所測定得的顯影液的特性值算出顯影液的鹼性成分濃度、溶解光阻濃度、及吸收二氧化碳濃度。 The first measuring means 11 is a measuring means (for example, a conductivity meter for measuring conductivity) for measuring a characteristic value of a developing solution having a concentration of at least an alkaline component in a component of a developing solution, and causing the second measuring means 12 A measuring means for measuring a characteristic value of a developing solution relating to at least a dissolved photoresist concentration in a component of a developing solution (for example, an absorptiometer for measuring an absorbance of λ = 560 nm), and a third measuring means for measuring and developing a liquid The measuring unit 2 (for example, a density meter for measuring density) in which at least the carbon dioxide concentration is absorbed in the component, the calculation unit 2 includes the calculation block 21 by the multivariate analysis method. The multivariate analysis method calculates the alkaline component concentration, the dissolved photoresist concentration, and the absorbed carbon dioxide concentration of the developer from the measured characteristic values of the developer.

如此一來,當控制方塊31為以使鹼性成分濃度成為預定之管理值之方式對控制閥發出控制信號之控制方塊、控制方塊32為以使溶解光阻濃度成為預定之管理值或管理值以下之方式對控制閥發出控制信號之控制方塊、控制方塊33為以使吸收二氧化碳濃度成為預定之管理值或管理值以下之方式對控制閥發出控制信號之控制方塊時,由於控制部3係以能夠接收所算出的顯影液的成分濃度之方式與演算部2連接在一起,故藉由本實施態樣的顯影液管理裝置E,能夠以使顯影液的鹼性成分濃度成為預定之管理值、使溶解光阻濃度成為預定之管理值或管理值以下、及使吸收二氧化碳濃度成為預定之管理值或管理值以下之方式維持管理顯影液。 In this way, when the control block 31 is a control block for issuing a control signal to the control valve in such a manner that the alkali component concentration becomes a predetermined management value, the control block 32 is such that the dissolved photoresist concentration becomes a predetermined management value or management value. In the following manner, the control block for issuing a control signal to the control valve, and the control block 33 is a control block for issuing a control signal to the control valve in such a manner that the absorbed carbon dioxide concentration becomes a predetermined management value or a management value or less, since the control unit 3 Since the calculation unit 2 can be connected to the calculation unit 2 so that the concentration of the component of the developer can be received, the developer management device E of the present embodiment can set the alkaline component concentration of the developer to a predetermined management value. The management developer is maintained such that the dissolved photoresist concentration is equal to or less than a predetermined management value or management value, and the absorbed carbon dioxide concentration is equal to or lower than a predetermined management value or management value.

其餘詳情係與其他實施形態相同,故予以省略。 The rest of the details are the same as in the other embodiments, and therefore will be omitted.

以上,如第十八實施形態至第二十五實施形態所示,本實施形態的顯影液管理裝置係具備:測定部1,係測定與鹼性顯影液的成分濃度有相關的顯影液的複數個特性值;演算部2,係從以測定部1測定得的複數個特性值,藉由多變量分析法算出顯影液的成分濃度;及控制部3,係根據以測定部1測定得的顯影液的特性值或以演算部2算出的顯影液的成分濃度,對設置在輸送補給至顯影液的補充液之流路的控制閥41至43發出控制信號。 As described in the eighteenth to twenty-fifth embodiments, the developer management device of the present embodiment includes the measuring unit 1 for measuring the plural amount of the developer associated with the component concentration of the alkaline developer. The calculation unit 2 calculates the component concentration of the developer from the plurality of characteristic values measured by the measurement unit 1 by the multivariate analysis method, and the control unit 3 develops based on the measurement unit 1 The characteristic value of the liquid or the component concentration of the developer calculated by the calculation unit 2 gives a control signal to the control valves 41 to 43 provided in the flow path for supplying the replenishing liquid supplied to the developer.

同顯影液的濃度測定裝置中的測定部1及演算部2,本實施形態的顯影液管理裝置中的測定部1及演算部2亦能夠採用許多不同態樣。 In the measurement unit 1 and the calculation unit 2 in the developer concentration measuring apparatus of the developer, the measurement unit 1 and the calculation unit 2 in the developer management device of the present embodiment can adopt many different aspects.

本實施形態的顯影液管理裝置中的控制部3並不一定要配置成個別獨立於演算部2之裝置,可安裝成一體化之裝置(例如電腦)的控制功能與演算功能。此外,如第11圖所示,控制部3亦可構成為個別獨立於測定部1和演算部2。控制部3係只要以能夠接收作為控制量的藉由測定部1測定得的特性值或藉由演算部2算出的成分濃度之方式與測定部1和演算部2互相聯絡即可。如此一來,便能夠根據所接收到的特性值和成分濃度發出所需的控制信號。 The control unit 3 in the developer management device according to the present embodiment does not have to be disposed separately from the device of the calculation unit 2, and can be installed as a control function and an arithmetic function of an integrated device (for example, a computer). Further, as shown in FIG. 11, the control unit 3 may be configured to be independent of the measurement unit 1 and the calculation unit 2, respectively. The control unit 3 may communicate with the measurement unit 1 and the calculation unit 2 so as to be able to receive the characteristic value measured by the measurement unit 1 as the control amount or the component concentration calculated by the calculation unit 2. In this way, the desired control signal can be emitted based on the received characteristic values and component concentrations.

關於用以輸送補充液之管路,係可連接至本實施形態的顯影液管理裝置E,亦可不連接。控制閥亦可非為顯影液管理裝置E的內部構件。只要為以藉由控制部3的控制信號進行控制之方式與控制部3聯絡,則亦可配置在顯影液管理裝置E的外部。 The pipe for conveying the replenishing liquid may be connected to the developer management device E of the present embodiment or may not be connected. The control valve may not be an internal member of the developer management device E. The control unit 3 may be disposed outside the developer management device E so as to be in communication with the control unit 3 by the control signal from the control unit 3.

如上所述,依據本發明的顯影液管理裝置,能夠將顯影液的各成分濃度或各特性值管理為預定之管理值或管理範圍內。因此,藉由本發明的顯影液管理裝置,能夠維持最佳的顯影性能,從而能夠實現所期望的線寬和殘膜厚。 As described above, according to the developer management device of the present invention, it is possible to manage the concentration of each component of the developer or each characteristic value within a predetermined management value or management range. Therefore, with the developer management device of the present invention, it is possible to maintain an optimum developing performance, and it is possible to achieve a desired line width and residual film thickness.

依據本發明的顯影液管理裝置,係將顯影液的各成分濃度高精度地控制在預定之狀態,因此能夠以更加高精度地固定之方式維持管理顯影液的顯影性能。因此,顯影光阻時的顯影速度穩定定速,使顯影處理形成的線寬和殘膜厚定值化,而使製品品質提升,並且可望有助於實現更進一步的微細化及高密度積體化。 According to the developer management apparatus of the present invention, since the concentration of each component of the developer is accurately controlled to a predetermined state, the development performance of the developer can be maintained with higher precision. Therefore, the developing speed at the time of developing the photoresist is stabilized at a constant speed, and the line width and the residual film thickness formed by the development processing are set to be constant, so that the quality of the product is improved, and it is expected to contribute to further miniaturization and high density product. Physicalization.

依據本發明的顯影液管理裝置,由於顯影液自動且隨時維持在最佳顯影性能,使製品良率提升,並且不再需要顯影液的更換作業,可望有助於降低經常成本(running cost)和廢液成本。 According to the developer management apparatus of the present invention, since the developer is automatically and always maintained at an optimum developing performance, the yield of the product is improved, and the replacement operation of the developer is no longer required, it is expected to contribute to the reduction of the running cost. And waste liquid costs.

1‧‧‧測定部 1‧‧‧Determination Department

2‧‧‧演算部 2‧‧‧ Calculation Department

3‧‧‧控制部 3‧‧‧Control Department

11‧‧‧第一測定手段 11‧‧‧First measure

12‧‧‧第二測定手段 12‧‧‧Second measure

13‧‧‧第三測定手段 13‧‧‧ Third measure

14‧‧‧取樣泵 14‧‧‧Sampling pump

15‧‧‧取樣配管 15‧‧‧Sampling piping

16‧‧‧回流配管 16‧‧‧Reflow piping

21‧‧‧以多變量分析法進行的演算方塊 21‧‧‧ calculus with multivariate analysis

31、32、33‧‧‧控制方塊 31, 32, 33‧‧‧ control blocks

41至43‧‧‧控制閥 41 to 43‧‧‧ control valve

44、45‧‧‧閥 44, 45‧‧‧ valve

46、47‧‧‧加壓氣體用閥 46, 47‧‧‧ Valves for pressurized gas

55至57‧‧‧控制信號用信號線 55 to 57‧‧‧ Signal lines for control signals

61‧‧‧顯影液貯留槽 61‧‧‧ developer storage tank

62‧‧‧溢流槽 62‧‧‧Overflow trough

63‧‧‧液面計 63‧‧‧liquid level meter

64‧‧‧顯影室護罩 64‧‧‧Development room shield

65‧‧‧輥式輸送機 65‧‧‧Roller conveyor

66‧‧‧基板 66‧‧‧Substrate

67‧‧‧顯影液澆淋頭 67‧‧‧Developing sprinkler

71‧‧‧廢液泵 71‧‧‧Waste pump

72、74‧‧‧循環泵 72, 74‧‧‧ Circulating pump

73、75‧‧‧過濾器 73, 75‧‧‧ filter

80‧‧‧顯影液管路 80‧‧‧developer line

81、82‧‧‧補充液(顯影液原液及/或新液)用管路 81, 82‧‧‧ Pipes for replenishing liquid (developer stock solution and/or new liquid)

83‧‧‧純水用管路 83‧‧‧Pure water pipeline

84‧‧‧合流管路 84‧‧‧Confluence pipeline

85‧‧‧循環管路 85‧‧‧Circulation line

86‧‧‧氮氣用管路 86‧‧‧Nitrogen pipeline

91、92‧‧‧補充液(顯影液原液及/或新液)貯留槽 91, 92‧‧‧ replenishing liquid (developer stock solution and / or new liquid) storage tank

B‧‧‧顯影製程設備 B‧‧‧Developing process equipment

C‧‧‧補充液貯留部 C‧‧‧Replenishment Storage Department

D‧‧‧循環攪拌機構 D‧‧‧Circulating mixing mechanism

E‧‧‧顯影液管理裝置 E‧‧‧ developer management device

Claims (10)

一種顯影液的成分濃度測定方法,係含有下述步驟:測定與重複使用的呈鹼性的顯影液的成分濃度有相關的前述顯影液的複數個特性值之步驟;及根據所測定得的前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度之步驟。 A method for measuring a component concentration of a developer, comprising the steps of: measuring a plurality of characteristic values of the developer associated with a concentration of a component of the alkaline developer repeatedly used; and A plurality of characteristic values, the step of calculating the component concentration of the developer by multivariate analysis. 一種顯影液的成分濃度測定裝置,係具備:測定部,係測定與重複使用的呈鹼性的顯影液的成分濃度有相關的前述顯影液的複數個特性值;及演算部,係根據藉由前述測定部測定得的前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度。 A component concentration measuring device for a developing solution includes a measuring unit that measures a plurality of characteristic values of the developing solution associated with a component concentration of an alkaline developing solution that is repeatedly used, and a calculation unit The plurality of characteristic values measured by the measuring unit are used to calculate the component concentration of the developer by a multivariate analysis method. 一種顯影液管理方法,係含有下述步驟:測定與重複使用的呈鹼性的顯影液的成分濃度有相關的前述顯影液的複數個特性值之步驟;從所測定得的前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度之步驟;及根據從以前述進行測定的步驟測定的前述顯影液的複數個特性值及以前述進行算出的步驟算出的前述顯影液的成分濃度當中選擇的管理對象項目的測定值或算出值,補給補充液至前述顯影液之步驟。 A developer management method comprising the steps of: measuring a plurality of characteristic values of the developer associated with a concentration of a component of a re-used alkaline developer; and determining the plurality of characteristic values a step of calculating a component concentration of the developer by a multivariate analysis method; and a component of the developer calculated based on a plurality of characteristic values of the developer measured by the step of measuring the above and a step of calculating the above The measured value or the calculated value of the management target item selected among the concentrations, and the step of replenishing the replenishing liquid to the developing solution. 一種顯影液管理裝置,係具備:測定部,係測定與重複使用的呈鹼性的顯影液的成分濃度有相關的前述顯影液的複數個特性值; 演算部,係根據藉由前述測定部測定得的前述複數個特性值,藉由多變量分析法算出前述顯影液的成分濃度;及控制部,係根據從以前述測定部測定的前述顯影液的複數個特性值及以前述演算部算出的前述顯影液的成分濃度當中選擇的管理對象項目的測定值或算出值,對設置在輸出補給至前述顯影液的補充液之流路的控制閥發出控制信號。 A developer management device comprising: a measuring unit that measures a plurality of characteristic values of the developer corresponding to a concentration of a component of an alkaline developer that is repeatedly used; The calculation unit calculates the component concentration of the developer by the multivariate analysis method based on the plurality of characteristic values measured by the measurement unit, and the control unit is based on the developer from the measurement unit measured by the measurement unit. a plurality of characteristic values and a measured value or a calculated value of the management target item selected from the component concentrations of the developer calculated by the calculation unit, and the control valve provided to the flow path for supplying the replenishing liquid supplied to the developer is controlled signal. 如請求項4之顯影液管理裝置,其中前述測定部具備:第一測定手段,係測定與前述顯影液的成分中的至少鹼性成分的濃度有相關的前述顯影液的特性值;及第二測定手段,係測定與前述顯影液的成分中的至少溶解於前述顯影液的光阻的濃度有相關的前述顯影液的特性值。 The developer management device according to claim 4, wherein the measurement unit includes: a first measurement means for measuring a characteristic value of the developer corresponding to a concentration of at least an alkaline component in a component of the developer; and a second The measuring means measures the characteristic value of the developing solution relating to the concentration of the photoresist dissolved in at least the developing solution among the components of the developing solution. 如請求項5之顯影液管理裝置,其中前述演算部具備算出前述顯影液的鹼性成分的濃度及光阻的濃度之演算方塊;前述控制部具備:以使藉由前述演算方塊算出的鹼性成分的濃度成為預定之管理值之方式對前述控制閥發出控制信號之控制方塊;及以使藉由前述演算方塊算出的光阻的濃度成為預定之管理值以下之方式對前述控制閥發出控制信號之控制方塊。 The developer management device according to claim 5, wherein the calculation unit includes a calculation block for calculating a concentration of the alkaline component of the developer and a concentration of the photoresist, and the control unit includes an alkalinity calculated by the calculation block a control block for issuing a control signal to the control valve in such a manner that the concentration of the component becomes a predetermined management value; and a control signal is issued to the control valve such that the concentration of the photoresist calculated by the calculation block becomes equal to or less than a predetermined management value Control block. 如請求項5之顯影液管理裝置,其中前述測定部復具備第三測定手段,該第三測定手段係測定與前述顯影液的成分中的至少前述顯影液所吸收的二氧化碳的濃度有相關的前述顯影液的特性值。 The developer management device according to claim 5, wherein the measurement unit further includes a third measurement means for measuring the concentration of carbon dioxide absorbed by at least the developer in the component of the developer The characteristic value of the developer. 如請求項7之顯影液管理裝置,其中前述演算部具備算出前述顯影液的二氧化碳的濃度之演算方塊;前述控制部具備:以使藉由前述第一測定手段測定的前述顯影液的特性值成為預定之管理值之方式對前述控制閥發出控制信號之控制方塊;以使藉由前述第二測定手段測定的前述顯影液的特性值落在預定之管理區域之方式對前述控制閥發出控制信號之控制方塊;及以使藉由前述演算方塊算出的二氧化碳的濃度成為預定之管理值以下之方式對前述控制閥發出控制信號之控制方塊。 The developer management device according to claim 7, wherein the calculation unit includes a calculation block for calculating a concentration of carbon dioxide in the developer; and the control unit includes: a characteristic value of the developer measured by the first measurement means a control block for issuing a control signal to the control valve in a manner of a predetermined management value; the control signal is sent to the control valve in such a manner that the characteristic value of the developer determined by the second measuring means falls within a predetermined management area a control block; and a control block for issuing a control signal to the control valve such that the concentration of carbon dioxide calculated by the calculation block is equal to or less than a predetermined management value. 如請求項7之顯影液管理裝置,其中前述演算部具備算出前述顯影液的鹼性成分的濃度及二氧化碳的濃度之演算方塊;前述控制部具備:以使藉由前述演算方塊算出的鹼性成分的濃度成為預定之管理值之方式對前述控制閥發出控制信號之控制方塊;以使藉由前述第二測定手段測定的前述顯影液的特性值落在預定之管理區域之方式對前述控制閥發出控制信號之控制方塊;及 以使藉由前述演算方塊算出的二氧化碳的濃度成為預定之管理值以下之方式對前述控制閥發出控制信號之控制方塊。 The developer management device according to claim 7, wherein the calculation unit includes a calculation block for calculating a concentration of an alkaline component of the developer and a concentration of carbon dioxide, and the control unit includes an alkaline component calculated by the calculation block. a control block for issuing a control signal to the control valve in such a manner that the concentration becomes a predetermined management value; and the control valve is issued in such a manner that the characteristic value of the developer measured by the second measuring means falls within a predetermined management area Control block for control signals; and A control block for issuing a control signal to the control valve in such a manner that the concentration of carbon dioxide calculated by the calculation block is equal to or lower than a predetermined management value. 如請求項7之顯影液管理裝置,其中前述演算部具備算出前述顯影液的鹼性成分的濃度、光阻的濃度及二氧化碳的濃度之演算方塊;前述控制部具備:以使藉由前述演算方塊算出的鹼性成分的濃度成為預定之管理值之方式對前述控制閥發出控制信號之控制方塊;以使藉由前述演算方塊算出的光阻的濃度成為預定之管理值以下之方式對前述控制閥發出控制信號之控制方塊;及以使藉由前述演算方塊算出的二氧化碳的濃度成為預定之管理值以下之方式對前述控制閥發出控制信號之控制方塊。 The developer management device according to claim 7, wherein the calculation unit includes a calculation block for calculating a concentration of the alkaline component of the developer, a concentration of the photoresist, and a concentration of carbon dioxide; and the control unit includes: a control block for issuing a control signal to the control valve in such a manner that the calculated concentration of the alkaline component becomes a predetermined management value; and the control valve is set such that the concentration of the photoresist calculated by the calculation block is equal to or less than a predetermined management value a control block for issuing a control signal; and a control block for issuing a control signal to the control valve such that the concentration of carbon dioxide calculated by the calculation block is equal to or less than a predetermined management value.
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