CN110262196A - The method of the developer solution conductivity of developing trough and control developing trough - Google Patents
The method of the developer solution conductivity of developing trough and control developing trough Download PDFInfo
- Publication number
- CN110262196A CN110262196A CN201910492197.8A CN201910492197A CN110262196A CN 110262196 A CN110262196 A CN 110262196A CN 201910492197 A CN201910492197 A CN 201910492197A CN 110262196 A CN110262196 A CN 110262196A
- Authority
- CN
- China
- Prior art keywords
- groove body
- developer solution
- developing trough
- pipeline
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Abstract
The present disclosure provides developing trough and the methods for the developer solution conductivity for controlling developing trough.The developing trough is used for the developing manufacture process of display panel.The developing trough includes: groove body, the first pipeline and the second pipeline.The groove body is to accommodate developer solution.Centre portion of first pipeline to supplement new developer solution to the groove body.Second pipeline is to supplement moisture content to the bottom of the groove body.The developing trough can be automatically replenished the moisture content before supplementing the new developer solution to control the initial stage conductivity of the developing trough, and reaching improves the higher problem of the initial stage conductivity.
Description
[technical field]
This announcement is related to the technical field of developing trough, the in particular to development of a kind of developing manufacture process for display panel
Slot.
[background technique]
In field of display technology, developing machine carries out the stability contorting of panel characteristics value by the conductivity of control developer solution.
As shown in Figure 1, developing trough 400 used in the prior art can carry out display panel after storing developer solution 410
The development operation of (not shown go out).Specifically, the developing trough 400 is to make nozzle 430 through the setting of plural pipeline 420
May be guided and spray the developer solution 410 on the display panel, make new developer solution 440 that can be supplemented to the developing trough 400
Every numerical value that is interior, making complex sensor 450 can be used to monitor the developer solution 410 simultaneously.
In addition, as shown in Figure 1, the developing trough 400 also has heater 460 and discharge outlet 470.The heater 460
To heat the developer solution 410, and the discharge outlet 470 is to discharge the used developer solution 410.
In in the prior art, about 100 multi-disc of the piece number of the open ended display panel of single developing trough 400, and when described aobvious
When conductivity possessed by shadow slot 400 is higher, the loss of the active constituent in the developer solution 410 for solute effect is also opposite
It is higher.
Since the initial stage conductivity of the existing developing trough 400 used is higher, the aobvious of the display panel is seriously affected
Shadow effect, therefore need to control the initial stage conductivity of the developing trough 400, reduce it to improve the aobvious of the display panel
Shadow effect.
[summary of the invention]
In order to solve the above technical problems, the one of this announcement is designed to provide a kind of developing trough and controls the development of developing trough
The method of liquid conductivity.The developing trough can be automatically replenished the moisture content before supplementing the new developer solution to control the development
The initial stage conductivity of slot, reaching improves the higher problem of the initial stage conductivity.
To reach above-mentioned purpose, this announcement provides a kind of developing trough.The developing trough includes: groove body, the first pipeline and
Two pipelines.The groove body with top, the bottom opposite with the top and is located in the top to accommodate developer solution
Centre portion between portion and the bottom.First pipeline is to supplement new developer solution to the middle area of the groove body
Section.Second pipeline is to supplement moisture content to the bottom of the groove body.
In this revealed embodiment, the developing trough includes third pipeline, and the third pipeline is to from the groove body
The top provide the developer solution to nozzle.
In this revealed embodiment, the developing trough includes complex sensor, and the complex sensor passes through plural number the
The developer solution parameter of the centre portion of groove body described in four line sensors.
In this revealed embodiment, the developing trough includes discharge outlet, and the discharge outlet is by the 5th pipeline described in
The developer solution is discharged in the bottom of groove body.
In this revealed embodiment, the cleaning and polishing end is made of rubber material.
In this revealed embodiment, having heaters is installed in the bottom of the groove body.
To reach above-mentioned purpose, this announcement also provides a kind of method of developer solution conductivity for controlling developing trough, the side
Method includes: to provide groove body to accommodate the developer solution, and the groove body has top, the bottom opposite with the top and sandwiched
Centre portion between the top and the bottom；The centre portion of first pipeline connection to the groove body is provided,
Make the centre portion of first pipeline to supplement new developer solution to the groove body；And provide the second pipeline connection extremely
The bottom of the groove body makes second pipeline to supplement moisture content to the bottom of the groove body.Wherein, in supplement
The developer solution to the groove body the centre portion the step of before, first carry out supplementing described in the moisture content to the groove body
The step of bottom.
In this revealed embodiment, the developing trough includes third pipeline, and the third pipeline is to from the groove body
The top provide the developer solution to nozzle.
In this revealed embodiment, the developing trough includes complex sensor, and the complex sensor passes through plural number the
The developer solution parameter of the centre portion of groove body described in four line sensors.
In this revealed embodiment, the developing trough includes discharge outlet, and the discharge outlet is by the 5th pipeline described in
The developer solution is discharged in the bottom of groove body.
In this revealed embodiment, having heaters is installed in the bottom of the groove body.
For the above content of this announcement can be clearer and more comprehensible, preferred embodiment is cited below particularly, and cooperate institute's accompanying drawings, makees
Detailed description are as follows.
[Detailed description of the invention]
Fig. 1 is the schematic diagram of developing trough used in the prior art；
Fig. 2 is the schematic diagram of the developing trough of this announcement；And
The step of Fig. 3 is the method for the developer solution conductivity of the control developing trough of this announcement is schemed.
[specific embodiment]
In order to which the above-mentioned and other purposes of this announcement, feature, advantage can be clearer and more comprehensible, it is excellent that spy is hereafter lifted into this announcement
Embodiment is selected, and cooperates institute's accompanying drawings, is described in detail below.
The similar unit of structure is to be given the same reference numerals in the figure.
A kind of method for being designed to provide developing trough and the developer solution conductivity for controlling developing trough of this announcement.It is described aobvious
Shadow slot can be automatically replenished moisture content before supplementing the developer solution to control the initial stage conductivity of the developing trough, reach described in improvement
The higher problem of initial stage conductivity.
As shown in Fig. 2, a kind of developing trough 100 that this announcement provides includes groove body 110, the first pipeline 120 and the second pipeline
122.The groove body 110 is to accommodate developer solution 200；The groove body 110 has top 112, the bottom opposite with the top 112
Portion 114 and the centre portion 116 being located between the top 112 and the bottom 114.First pipeline 120 is to mend
Fill the centre portion 116 of new developer solution 210 to the groove body 110.Second pipeline 122 to supplement moisture content 220 to
The bottom 114 of the groove body 110.
It please connect referring to Fig.2, the developing trough 110 includes third pipeline 124, the third pipeline 124 is to described in
After the top 112 of groove body 110 provides the developer solution 200 to nozzle 130, then spray by the nozzle 1300 described aobvious
Shadow liquid 200 is to the display panel for being intended to develop.
The developing trough 100 further includes complex sensor 132, and the complex sensor 132 passes through plural 4th pipeline 126
The developer solution parameter of the centre portion 116 of the groove body 110 is sensed, and adjusts and supplement the new developer solution 210 whereby
Or the moisture 220.
The developing trough 100 includes discharge outlet 134, and the discharge outlet 134 passes through the 5th pipeline 128 from the groove body 110
The bottom 114 developer solution 200 is discharged, to carry out the replacement operation of the new developer solution 210.
Having heaters 136 is installed in the bottom 114 of the groove body 110, and the heater 136 can be directed to the developer solution
200 are heated, and the developer solution 200 is made to be maintained at particular job temperature whereby, maintain the conduction of the developer solution 200
Rate.
As shown in figure 3, this announcement also provides a kind of method of 200 conductivity of developer solution for controlling developing trough 100, the side
Method includes: step 301: groove body 110 is provided to accommodate the developer solution 200, wherein the groove body 110 has top 112 and institute
The centre portion 116 stating 112 opposite bottoms 114 of top and being located between the top 112 and the bottom 114；Step
302: the first pipeline 120 being provided and is connected to the centre portion 116 of the groove body 110, makes first pipeline 120 to mend
Fill the centre portion 116 of new developer solution 210 to the groove body 110；And step 303: the second pipeline 122 is provided and is connected to
The bottom 114 of the groove body 110 makes second pipeline 122 to supplement described in moisture content 220 to the groove body 110
Bottom 114.
Wherein, advanced before the step of supplementing the new developer solution 210 to the centre portion 116 of the groove body 110
Row supplements the step of moisture content 220 to the bottom 114 of the groove body 110.
The developing trough 100 includes third pipeline 124, and the third pipeline 124 is to from the top of the groove body 110
After portion 112 provides the developer solution 200 to nozzle 130, then by the nozzle 130 developer solution 200 is sprayed to being intended to carry out
The display panel of development.
The developing trough 100 includes complex sensor 132, and the complex sensor 132 passes through plural 4th pipeline 126 sense
Survey the developer solution parameter of the centre portion 116 of the groove body 110, and adjust and supplement whereby the new developer solution 210 or
The moisture 220.
The developing trough 100 includes discharge outlet 134, and the discharge outlet 134 passes through the 5th pipeline 128 from the groove body 110
The bottom 114 developer solution 200 is discharged, to carry out the replacement operation of the developer solution 200.
Having heaters 136 is installed in the bottom 114 of the groove body 110, and the heater 136 can be directed to the developer solution
200 are heated, and the developer solution 200 is made to be maintained at particular job temperature whereby, maintain the conduction of the developer solution 200
Rate.
In conclusion developing trough through this announcement and control developing trough developer solution conductivity method, just can be
The moisture content 220 is automatically replenished to control the initial stage conductivity of the developing trough 100 before supplementing the new developer solution 210, is reached
Improve the higher problem of the initial stage conductivity.
The above is only the preferred embodiments of this announcement, it is noted that for those of ordinary skill in the art, is not departing from
Under the premise of this announcement principle, several improvements and modifications can also be made, these improvements and modifications also should be regarded as the guarantor of this announcement
Protect range.
Claims (10)
1. a kind of developing trough, the developing trough is used for the developing manufacture process of display panel characterized by comprising
Groove body with top, the bottom opposite with the top and is located in the top and institute to accommodate developer solution
State the centre portion between bottom；
First pipeline, to supplement the centre portion of new developer solution to the groove body；And
Second pipeline, to supplement moisture content to the bottom of the groove body.
2. developing trough as described in claim 1, which is characterized in that the developing trough includes third pipeline, the third pipeline
To provide the developer solution to nozzle from the top of the groove body.
3. developing trough as claimed in claim 2, which is characterized in that the developing trough includes complex sensor, and the plural number passes
Sensor passes through the developer solution parameter of the centre portion of groove body described in plural 4th line sensor.
4. developing trough as claimed in claim 3, which is characterized in that the developing trough includes discharge outlet, and the discharge outlet passes through
The developer solution is discharged from the bottom of the groove body in 5th pipeline.
5. developing trough as claimed in claim 4, which is characterized in that install having heaters in the bottom of the groove body.
6. a kind of method for the developer solution conductivity for controlling developing trough, the developing trough are used for the developing manufacture process of display panel,
It is characterized in that, comprising:
Groove body is provided to accommodate the developer solution, the groove body has top, the bottom opposite with the top and is located in institute
State the centre portion between top and the bottom；
The centre portion of first pipeline connection to the groove body is provided, makes first pipeline to supplement new developer solution extremely
The centre portion of the groove body；And
The second pipeline connection is provided to the bottom of the groove body, makes second pipeline to supplement moisture content to the groove body
The bottom；
Wherein, it before the step of supplementing the centre portion of the new developer solution to the groove body, first carries out supplementing the water
The step of part to bottom of the groove body.
7. method as claimed in claim 6, which is characterized in that the developing trough includes third pipeline, and the third pipeline is used
To provide the developer solution to nozzle from the top of the groove body.
8. the method for claim 7, which is characterized in that the developing trough includes complex sensor, the plural number sensing
Device passes through the developer solution parameter of the centre portion of groove body described in plural 4th line sensor.
9. method according to claim 8, which is characterized in that the developing trough includes discharge outlet, and the discharge outlet passes through the
The developer solution is discharged from the bottom of the groove body in five pipelines.
10. method as claimed in claim 9, which is characterized in that install having heaters in the bottom of the groove body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910492197.8A CN110262196A (en) | 2019-06-06 | 2019-06-06 | The method of the developer solution conductivity of developing trough and control developing trough |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910492197.8A CN110262196A (en) | 2019-06-06 | 2019-06-06 | The method of the developer solution conductivity of developing trough and control developing trough |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110262196A true CN110262196A (en) | 2019-09-20 |
Family
ID=67917121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910492197.8A Pending CN110262196A (en) | 2019-06-06 | 2019-06-06 | The method of the developer solution conductivity of developing trough and control developing trough |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110262196A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1312490A (en) * | 2000-01-31 | 2001-09-12 | 富士胶片株式会社 | Automatic developing device and method for supplementing developing liquid |
| CN106371296A (en) * | 2015-07-22 | 2017-02-01 | 株式会社平间理化研究所 | Component concentration measuring method and apparatus for developing solution and developing solution managing method and apparatus |
| CN207301641U (en) * | 2017-10-12 | 2018-05-01 | 中煤航测遥感集团有限公司 | Developer solution control device and developing machine |
-
2019
- 2019-06-06 CN CN201910492197.8A patent/CN110262196A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1312490A (en) * | 2000-01-31 | 2001-09-12 | 富士胶片株式会社 | Automatic developing device and method for supplementing developing liquid |
| CN106371296A (en) * | 2015-07-22 | 2017-02-01 | 株式会社平间理化研究所 | Component concentration measuring method and apparatus for developing solution and developing solution managing method and apparatus |
| CN207301641U (en) * | 2017-10-12 | 2018-05-01 | 中煤航测遥感集团有限公司 | Developer solution control device and developing machine |
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Application publication date: 20190920 |
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