JP2005164396A - Washing liquid concentration measuring apparatus - Google Patents

Washing liquid concentration measuring apparatus Download PDF

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JP2005164396A
JP2005164396A JP2003403673A JP2003403673A JP2005164396A JP 2005164396 A JP2005164396 A JP 2005164396A JP 2003403673 A JP2003403673 A JP 2003403673A JP 2003403673 A JP2003403673 A JP 2003403673A JP 2005164396 A JP2005164396 A JP 2005164396A
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concentration
solution
cleaning
measured
specific physical
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Yoshifumi Bando
嘉文 板東
Katsuhiro Ozaki
勝広 尾崎
Shinya Hatano
眞也 波多野
Yoshimichi Tamura
義道 田村
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Fuji Industrial Co Ltd
Fuji Kogyo KK
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Fuji Industrial Co Ltd
Fuji Kogyo KK
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Priority to JP2003403673A priority Critical patent/JP2005164396A/en
Priority to TW93135487A priority patent/TW200533912A/en
Publication of JP2005164396A publication Critical patent/JP2005164396A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00Indexing codes associated with group G01N29/00
    • G01N2291/02Indexing codes associated with the analysed material
    • G01N2291/028Material parameters
    • G01N2291/02809Concentration of a compound, e.g. measured by a surface mass change
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00Indexing codes associated with group G01N29/00
    • G01N2291/02Indexing codes associated with the analysed material
    • G01N2291/028Material parameters
    • G01N2291/02818Density, viscosity

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  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To correctly measure the concentration of a detergent in washing liquid and substance to be washed. <P>SOLUTION: This washing liquid concentration measuring apparatus measures each concentration of a plurality of solutes containing at least the detergent dissolved in a solvent and the substance to be washed. The apparatus has a concentration calculating part for calculating the concentration of each solute from the output of a temperature detector, the output of a detector of specific physical quantities and the output of a speed calculating part, and an output unit for outputting the conversion result of the concentration calculating part. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は液晶生産工程等で用いられて好適な洗浄液濃度測定装置に関する。   The present invention relates to a cleaning liquid concentration measuring apparatus suitable for use in a liquid crystal production process or the like.

液晶生産工程では、特許文献1に記載の如く、液晶の表面に塗布したフェノール樹脂等のレジストを、洗浄剤としてのTMAH(水酸化テトラメチルアンモニウム)を溶解させた洗浄液で洗浄するための洗浄装置が用いられている。
特開平11-216430
In the liquid crystal production process, as described in Patent Document 1, a cleaning apparatus for cleaning a resist such as a phenol resin applied to the surface of a liquid crystal with a cleaning solution in which TMAH (tetramethylammonium hydroxide) as a cleaning agent is dissolved. Is used.
JP-A-11-216430

特許文献1の如くの洗浄装置では、経済面及び環境保全面から、洗浄液をリサイクルすることが好ましいが、洗浄液には使用の経過によってレジストが混入したり、TMAHが空気中の二酸化炭素と反応して炭酸塩を生成し、洗浄液の劣化を生ずる。   In the cleaning apparatus as in Patent Document 1, it is preferable to recycle the cleaning liquid from the viewpoint of economy and environmental conservation. However, the cleaning liquid may contain a resist mixed with the course of use, or TMAH may react with carbon dioxide in the air. This produces carbonate and causes deterioration of the cleaning solution.

従って、洗浄装置では、洗浄液のリサイクルに際し、洗浄液に混入するに至ったレジスト、炭酸塩を取除くとともに、新規TMAHを補填してTMAH濃度を一定に制御する必要がある。このためには、洗浄液中のTMAH濃度、レジスト濃度を、更に必要によっては炭酸塩濃度を、それぞれ正確にリアルタイムで計測することが必要になる。   Therefore, in the cleaning apparatus, when the cleaning liquid is recycled, it is necessary to remove the resist and carbonate that have been mixed into the cleaning liquid and to supplement the new TMAH to control the TMAH concentration constant. For this purpose, it is necessary to accurately measure the TMAH concentration and the resist concentration in the cleaning liquid and, if necessary, the carbonate concentration in real time.

本発明の課題は、洗浄液中の洗浄剤と被洗浄物質の濃度を正確に計測することにある。   An object of the present invention is to accurately measure the concentration of a cleaning agent and a substance to be cleaned in a cleaning liquid.

本発明の他の課題は、洗浄液中の洗浄剤と被洗浄物質と洗浄剤反応物質の濃度正確に計測することにある。   Another object of the present invention is to accurately measure the concentration of a cleaning agent, a substance to be cleaned, and a cleaning agent reactive substance in a cleaning liquid.

請求項1の発明は、溶媒に溶解された少なくとも洗浄剤と被洗浄物質を含む複数(n)の溶質の各濃度(D1…Dn)を測定する洗浄液濃度測定装置であって、被測定溶液に超音波を送波する超音波送波器と、被測定溶液中を伝播した超音波を受波する超音波受波器と、超音波の伝播時間と伝播距離から伝播速度(V)を演算する速度演算部と、被測定溶液の温度(T)を検出する温度検出器と、各溶質の濃度及び被測定溶液の温度により上記伝播速度とはそれぞれ独立に影響を受ける(n−1)種類の特定物性量(α1…αn-1)であり、且つ各溶質の濃度及び被測定溶液の温度により互いに独立に影響を受ける(n−1)種類の特定物性量(α1…αn-1)を検出する特定物性量検出器と、被測定溶液の温度(T)、上記特定物性量(α1…αn-1)と超音波の伝播速度(V)と各溶質の濃度(D1…Dn)との関係を示す関数D1=F1(V,T,α1…αn-1)…Dn=Fn(V,T,α1…αn-1)を予め記憶している記憶部と、前記温度検出器の出力(T)と特定物性量検出器の出力(α1…αn-1)と速度演算部の出力(V)から、前記関数に基づいて各溶質の濃度(D1…Dn)を演算する濃度演算部と、濃度演算部の演算結果を出力する出力装置とを有してなるようにしたものである。 The invention of claim 1 is a cleaning liquid concentration measuring apparatus for measuring each concentration (D 1 ... D n ) of a plurality of (n) solutes including at least a cleaning agent and a substance to be cleaned dissolved in a solvent. An ultrasonic wave transmitter for transmitting ultrasonic waves to the solution, an ultrasonic wave receiver for receiving ultrasonic waves propagated in the solution to be measured, and the propagation velocity (V) from the propagation time and propagation distance of the ultrasonic waves. The propagation speed is independently influenced by the speed calculation unit for calculating, the temperature detector for detecting the temperature (T) of the solution to be measured, and the concentration of each solute and the temperature of the solution to be measured (n-1). a type of the specific physical properties amount (α 1 ... α n-1 ), the affected independently the temperature of the concentration and the measured solutions of each solute and (n-1) type of the specific physical properties amount (α 1 ... α n-1 ), a specific physical property detector for detecting the temperature of the solution to be measured (T), the specific physical property amount (α 1 . n-1 ), a function D 1 = F 1 (V, T, α 1 ... α n-1 ) ... showing the relationship between the ultrasonic wave propagation velocity (V) and the concentration of each solute (D 1 ... D n ). D n = F n (V, T, α 1 ... Α n-1 ) stored in advance, the output (T) of the temperature detector and the output (α 1 ... Α of the specific physical property detector) n-1 ) and the output (V) of the velocity calculation unit, a concentration calculation unit for calculating the concentration (D 1 ... D n ) of each solute based on the function, and an output device for outputting the calculation result of the concentration calculation unit It is made to have.

請求項2の発明は、請求項1の発明において更に、前記複数の溶質が洗浄剤と洗浄物質であるようにしたものである。   According to a second aspect of the invention, in the first aspect of the invention, the plurality of solutes are a cleaning agent and a cleaning substance.

請求項3の発明は、請求項2の発明において更に、前記洗浄剤が水酸化テトラメチルアンモニウムであり、被洗浄物質がレジストであり、前記特定物性量が吸光度であるようにしたものである。   According to a third aspect of the present invention, in the second aspect of the present invention, the cleaning agent is tetramethylammonium hydroxide, the substance to be cleaned is a resist, and the specific physical property amount is absorbance.

請求項4の発明は、請求項1の発明において更に、前記複数の溶質が洗浄剤と被洗浄物質と洗浄剤反応物質であるようにしたものである。   According to a fourth aspect of the present invention, in the first aspect of the present invention, the plurality of solutes are a cleaning agent, a substance to be cleaned, and a cleaning agent reactive substance.

請求項5の発明は、請求項4の発明において更に、前記洗浄剤が水酸化テトラメチルアンモニウムであり、被洗浄物質がレジストであり、洗浄剤反応物質が炭酸塩であり、前記特定物性量が吸光度と導電率であるようにしたものである。   According to a fifth aspect of the present invention, in the fourth aspect of the present invention, the cleaning agent is tetramethylammonium hydroxide, the cleaning target material is a resist, the cleaning agent reactive material is carbonate, and the specific physical property amount is Absorbance and conductivity.

被測定溶液としての洗浄液中の少なくとも洗浄剤(例えばTMAH)と被洗浄物質(例えばレジスト)を含み、更に必要によっては洗浄剤反応物質(例えば炭酸塩)を含む、各種多成分溶液毎に、該溶液の温度(T)と、吸光度(A)もしくは導電率(σ)等の、特定物性量(α…αn-1)と、超音波の伝播速度(V)と、各溶質の濃度(D1…Dn)との関係を示す関数D1=F1(V,T,α1…αn-1)…Dn=Fn(V,T,α1…αn-1)が予め定められ記憶部に記憶される。しかして、温度検出器、特定物性量検出器にて被測定溶液の温度(T)、特定物性量(α…αn-1)を検出するとともに、速度演算部にて超音波の伝播速度(V)を演算し、それら検出結果と演算結果を前述の関数に代入処理することにより、各溶質の濃度(D1…Dn)を確実かつ容易に測定できる。 For each of various multi-component solutions containing at least a cleaning agent (for example, TMAH) and a cleaning target material (for example, resist) in a cleaning solution as a solution to be measured, and further including a cleaning agent reactant (for example, carbonate) as necessary. Solution temperature (T), specific physical properties (α 1 ... Α n-1 ) such as absorbance (A) or conductivity (σ), ultrasonic propagation velocity (V), and concentration of each solute ( D 1 ... D n) function showing the relationship between D 1 = F 1 (V, T, α 1 ... α n-1) ... D n = F n (V, T, α 1 ... α n-1) is Predetermined and stored in the storage unit. Thus, the temperature detector and the specific physical property detector detect the temperature (T) and the specific physical property (α 1 ... Α n-1 ) of the solution to be measured, and the velocity calculation unit transmits the ultrasonic wave. By calculating (V) and substituting the detection results and the calculation results into the aforementioned function, the concentration (D 1 ... D n ) of each solute can be reliably and easily measured.

図1は洗浄装置を示す模式図、図2は洗浄液濃度測定装置を示すブロック図、3はセンサを示す正面図、図4は超音波の送受波状態を示す波形図、図5は洗浄液濃度測定装置の作動を示す流れ図、図6は洗浄液濃度測定装置の演算原理を示す線図である。   1 is a schematic diagram showing a cleaning device, FIG. 2 is a block diagram showing a cleaning liquid concentration measuring device, 3 is a front view showing a sensor, FIG. 4 is a waveform diagram showing a state of ultrasonic wave transmission and reception, and FIG. 5 is a cleaning liquid concentration measurement. FIG. 6 is a flowchart showing the operation principle of the cleaning liquid concentration measuring device.

洗浄装置100は、図1に示す如く、液晶の表面に塗布したフェノール樹脂等のレジストを、洗浄剤としてのTMAHを溶解させた洗浄液で洗浄する。洗浄装置100は、循環タンク101の洗浄液を洗浄ヘッド101Aから液晶の表面に吐出する。洗浄装置100は、再生ユニット110と供給ユニット120を付帯して備える。再生ユニット110は、循環タンク101から排出される洗浄液を受ける排液タンク111を有し、排液タンク111の洗浄液をポンプ112により、レジスト除去装置113経由で再生タンク114に送り、洗浄液中に混入した被洗浄物質としてのレジストをレジスト除去装置113で除去する。供給ユニット120は、再生タンク114からポンプ115により送られる洗浄液を受ける供給タンク121を有し、供給タンク121の洗浄液を循環タンク101に供給する。   As shown in FIG. 1, the cleaning apparatus 100 cleans a resist such as a phenol resin applied to the surface of the liquid crystal with a cleaning solution in which TMAH as a cleaning agent is dissolved. The cleaning device 100 discharges the cleaning liquid in the circulation tank 101 from the cleaning head 101A to the surface of the liquid crystal. The cleaning apparatus 100 includes a regeneration unit 110 and a supply unit 120. The regeneration unit 110 has a drain tank 111 that receives the cleaning liquid discharged from the circulation tank 101. The cleaning liquid in the drain tank 111 is sent to the regeneration tank 114 via the resist removal device 113 by the pump 112, and mixed into the cleaning liquid. The resist as the substance to be cleaned is removed by the resist removing device 113. The supply unit 120 includes a supply tank 121 that receives the cleaning liquid sent from the regeneration tank 114 by the pump 115, and supplies the cleaning liquid in the supply tank 121 to the circulation tank 101.

洗浄装置100の再生ユニット110は、再生タンク114の洗浄液中の洗浄剤としてのTMAHの濃度D1、被洗浄物質としてのレジストの濃度D2、TMAHが空気中の二酸化炭素と反応した洗浄剤反応物質としての炭酸塩の濃度D3を計測するための洗浄液濃度測定装置10を備える。供給ユニット120では、洗浄液濃度測定装置10の計測結果に応じて、供給タンク121の洗浄液に新規TMAH(NEW TMAH)を補填し、供給タンク121〜循環タンク101のTMAH濃度を一定に制御する。尚、供給ユニット120は、循環タンク101の洗浄液濃度(D1、D2、D3)をモニタするため、洗浄液濃度測定装置10と同様の洗浄液濃度測定装置10Aを備える。 The regeneration unit 110 of the cleaning apparatus 100 includes a cleaning agent reaction in which the TMAH concentration D 1 as a cleaning agent in the cleaning liquid of the regeneration tank 114, the resist concentration D 2 as a cleaning target substance, and TMAH react with carbon dioxide in the air. A cleaning liquid concentration measuring device 10 for measuring a concentration D 3 of carbonate as a substance is provided. In the supply unit 120, new TMAH (NEW TMAH) is supplemented to the cleaning liquid in the supply tank 121 according to the measurement result of the cleaning liquid concentration measuring apparatus 10, and the TMAH concentration in the supply tank 121 to the circulation tank 101 is controlled to be constant. The supply unit 120 includes a cleaning liquid concentration measuring device 10 </ b > A similar to the cleaning liquid concentration measuring device 10 in order to monitor the cleaning liquid concentration (D 1 , D 2 , D 3 ) of the circulation tank 101.

以下、洗浄液濃度測定装置10の構成について説明する。
洗浄液濃度測定装置10は、溶媒に少なくともTMAHとレジンを含み、更に本実施例では炭酸塩を含む、複数(n)の溶質を溶解してなる多成分溶液における各溶質の濃度を測定するものであり、演算装置11(図2参照)と、センサ12(図3参照)とを有してなり、演算装置11には表示器13を付帯的に備えている。
Hereinafter, the configuration of the cleaning liquid concentration measuring apparatus 10 will be described.
The cleaning liquid concentration measuring apparatus 10 measures the concentration of each solute in a multi-component solution formed by dissolving a plurality of (n) solutes, including at least TMAH and a resin as a solvent, and further including carbonate in this embodiment. Yes, it has a computing device 11 (see FIG. 2) and a sensor 12 (see FIG. 3), and the computing device 11 is additionally provided with a display 13.

センサ12は被測定溶液1に投入されて用いられる。
センサ12は、超音波送波器と超音波受波器を兼ねる超音波送受波器(振動子)14と反射板15とを備える。超音波送受波器14から被測定溶液1に送出された超音波は、被測定溶液1を伝播するとともに反射板15で反射されて超音波送受波器14により受信される。
The sensor 12 is used by being put into the solution 1 to be measured.
The sensor 12 includes an ultrasonic transmitter / receiver (vibrator) 14 that also serves as an ultrasonic transmitter and an ultrasonic receiver, and a reflector 15. The ultrasonic wave transmitted from the ultrasonic transducer 14 to the solution 1 to be measured propagates through the solution 1 to be measured, is reflected by the reflecting plate 15, and is received by the ultrasonic transducer 14.

また、センサ12は、サーミスタからなる温度検出器16を備え、被測定溶液1の温度(T)を検出する。   The sensor 12 includes a temperature detector 16 made of a thermistor, and detects the temperature (T) of the solution 1 to be measured.

更に、センサ12は、被測定溶液1に溶解されている各溶質の濃度及び被測定溶液の温度(T)により上記伝播速度(V)とはそれぞれ独立に影響を受ける(n−1)種類の特定物性量(α…αn-1)であり、かつ各溶質の濃度及び被測定溶液の温度により互いに独立に影響を受ける(n−1)種類の特定物性量(α…αn-1)を検出する特定物性量検出器を備える。被測定溶液1が例えば3つの溶質を溶解してなるもの(例えばTMAHとレジストと炭酸塩の水溶液)であれば、センサ12は、2種類の特定物性量、例えば吸光度Aを検出する吸光度検出器17Aと、導電率σを検出する導電率検出器17Bを備える。 Further, the sensor 12 is affected by the concentration of each solute dissolved in the solution 1 to be measured 1 and the temperature (T) of the solution to be measured (n−1) types that are independently affected by the propagation velocity (V). (N-1) types of specific physical properties (α 1 ... α n− ) which are specific physical properties (α 1 ... Α n−1 ) and are independently influenced by the concentration of each solute and the temperature of the solution to be measured. 1 ) A specific physical property detector for detecting 1 ) is provided. If the solution 1 to be measured is a solution in which, for example, three solutes are dissolved (for example, an aqueous solution of TMAH, resist and carbonate), the sensor 12 is an absorbance detector that detects two specific physical quantities, for example, absorbance A. 17A and a conductivity detector 17B for detecting conductivity σ.

演算装置11はシングアラウンド部18、温度計測部19、特定物性量計測部の一例としての吸光度検出器20Aと導電率計測部20B、入出力部21、CPU22、ROM23、RAM24を備える。   The computing device 11 includes a sing-around unit 18, a temperature measurement unit 19, an absorbance detector 20 </ b> A as an example of a specific physical property measurement unit, a conductivity measurement unit 20 </ b> B, an input / output unit 21, a CPU 22, a ROM 23, and a RAM 24.

超音波送受波器14の検出量はシングアラウンド部18、入出力部21を経てCPU22に転送され、速度演算部としてのCPU22にて超音波の伝播速度(V)が演算され、演算された速度データ(V)はRAM24に格納される。シングアラウンド方式は超音波バーストを送信し反射波を受信してからτ0秒後に再度送信し、その反射波を受信してからτ秒後に送信を行なうというくり返しを行なって超音波の伝播速度(V)を測定する方式である。図4のAは送信波、Bは受信波である。任意の送信時点から(k+1)回の送信が行なわれるまでの時間をt(図4のC参照)とし、演算によって得られたP=t/kをデータPとすれば、伝播速度Vは次式で与えられる。
V=2L0/(P−τ0
The detected amount of the ultrasonic transducer 14 is transferred to the CPU 22 via the sing-around unit 18 and the input / output unit 21, and the ultrasonic propagation speed (V) is calculated by the CPU 22 as a speed calculation unit, and the calculated speed is calculated. Data (V) is stored in the RAM 24. The sing-around method repeats the transmission of an ultrasonic burst and receives the reflected wave again after τ 0 seconds, and transmits the reflected wave after τ 0 seconds to repeat the ultrasonic wave propagation speed. This is a method for measuring (V). In FIG. 4, A is a transmission wave, and B is a reception wave. If the time from an arbitrary transmission time point until (k + 1) transmissions is performed is t (see C in FIG. 4), and P = t / k obtained by calculation is data P, the propagation speed V is It is given by the formula.
V = 2L 0 / (P−τ 0 )

ここで、L0は超音波送受波器14と反射板15との距離である。τ0、L0はτ0設定部25、L0設定部26にて初期設定される。 Here, L 0 is the distance between the ultrasonic transducer 14 and the reflector 15. τ 0 and L 0 are initially set by the τ 0 setting unit 25 and the L 0 setting unit 26.

温度検出器16が検出した被測定溶液1の温度データ(T)は温度計測部19、A/D変換部27、入出力部21を経てRAM24に格納される。   The temperature data (T) of the solution 1 to be measured detected by the temperature detector 16 is stored in the RAM 24 through the temperature measurement unit 19, the A / D conversion unit 27, and the input / output unit 21.

吸光度検出器17Aが検出した被測定溶液1の吸光度データ(A)は吸光度計測部20A、A/D変換部28A、入出力部21を経てRAM24に格納される。   Absorbance data (A) of the solution 1 to be measured detected by the absorbance detector 17A is stored in the RAM 24 via the absorbance measurement unit 20A, the A / D conversion unit 28A, and the input / output unit 21.

導電率検出器17Bが検出した被測定溶液1の導電率データ(σ)は導電率計測部20B、A/D変換部28B、入出力部21を経てRAM24に格納される。   The conductivity data (σ) of the solution 1 to be measured detected by the conductivity detector 17B is stored in the RAM 24 through the conductivity measuring unit 20B, the A / D conversion unit 28B, and the input / output unit 21.

演算装置11のROM23は、本発明の記憶部を構成し、被測定溶液1の温度(T)、前述の特定物性量(α…αn-1)と超音波の伝播速度(V)と各溶質の濃度(D1…Dn)との関係を示す下記の関数を記憶している。 The ROM 23 of the arithmetic unit 11 constitutes a storage unit of the present invention, and includes the temperature (T) of the solution 1 to be measured, the specific physical property amount (α 1 ... Α n-1 ) and the ultrasonic wave propagation velocity (V). The following functions indicating the relationship with the concentration (D 1 ... D n ) of each solute are stored.

1=F1(V,T,α1…αn-1) …(1)
n=Fn(V,T,α1…αn-1) …(2)
D 1 = F 1 (V, T, α 1 ... Α n-1 ) (1)
D n = F n (V, T, α 1 ... Α n−1 ) (2)

以下、TMAHの濃度D1(D1・1、D1・2)、レジストの濃度D2、炭酸塩の濃度D3の演算手順について説明する。 Hereinafter, the calculation procedure of the TMAH concentration D 1 (D 1 · 1 , D 1 · 2 ), the resist concentration D 2 , and the carbonate concentration D 3 will be described.

(A)TMAHの濃度D1・1とレジスト濃度D2
被測定溶液1が2つの溶質TMAH、レジストを溶解してなるものであり、特定物性量として吸光度Aを選定する場合には、洗浄液中における炭酸塩の影響を考慮しないTMAHの濃度D1・1と、レジストの濃度D2は以下の如くになる。
(A) TMAH concentration D 1 · 1 and resist concentration D 2
When the solution 1 to be measured is formed by dissolving two solutes TMAH and a resist, and the absorbance A is selected as a specific physical property amount, the concentration D 1 · 1 of TMAH that does not consider the influence of carbonate in the cleaning solution The resist concentration D 2 is as follows.

1・1=F1(V,T,A) …(3)
2=F2(V,T,A) …(4)
D 1 · 1 = F 1 (V, T, A) (3)
D 2 = F 2 (V, T, A) (4)

上記関数は多次多項式にて表わすことができ、TMAHとレジストの2成分を溶質とする水溶液について、未知の定数C(1)〜C(44)を含む多次多項式を設定すれば例えば以下の如くになる。ここで、多次多項式を何次の項まで利用するかは濃度測定の要求精度にて定められる。   The above function can be expressed by a multi-order polynomial. For example, if a multi-degree polynomial including unknown constants C (1) to C (44) is set for an aqueous solution having two components of TMAH and resist as solutes, for example, It becomes like this. Here, to what order the multi-order polynomial is used is determined by the required accuracy of concentration measurement.

1・1=C(29)*X1+C(30) …(5)
1=(B(1)+C(28)*(B(1)2+B(2)*B(3))1/2)/B(3)
B(1)=C(1)+C(2)*T+C(3)*T2+C(4)*T3+C(5)*T4+V*(C(6)+C(7)*T+C(8)*T2)+A*(C(9)+C(10)*T+C(11)*T2)
B(2)=C(12)+C(13)*T+C(14)*T2+C(15)*T3+C(16)*T4+V*(C(17)+C(18)*T+C(19)*T2)+A*(C(20)+C(21)*T+C(22)*T2)
B(3)=C(23)+C(24)*T+C(25)*T2+C(26)*T3+C(27)*T4
2=C(31)*Y1+C(32) …(6)
1=(X1*(C(33)+C(34)*T+C(35)*T2)+C(36)+C(37)*T+C(38)*T2+V)/(X1*(C(39)+C(40)*T+C(41)*T2)+C(42)+C(43)*T+C(44)*T2
D 1 · 1 = C (29) * X 1 + C (30) (5)
X 1 = (B (1) + C (28) * (B (1) 2 + B (2) * B (3)) 1/2 ) / B (3)
B (1) = C (1) + C (2) * T + C (3) * T 2 + C (4) * T 3 + C (5) * T 4 + V * (C (6) + C (7) * T + C (8 ) * T 2 ) + A * (C (9) + C (10) * T + C (11) * T 2 )
B (2) = C (12) + C (13) * T + C (14) * T 2 + C (15) * T 3 + C (16) * T 4 + V * (C (17) + C (18) * T + C (19 ) * T 2 ) + A * (C (20) + C (21) * T + C (22) * T 2 )
B (3) = C (23) + C (24) * T + C (25) * T 2 + C (26) * T 3 + C (27) * T 4
D 2 = C (31) * Y 1 + C (32) (6)
Y 1 = (X 1 * (C (33) + C (34) * T + C (35) * T 2 ) + C (36) + C (37) * T + C (38) * T 2 + V) / (X 1 * (C (39) + C (40) * T + C (41) * T 2 ) + C (42) + C (43) * T + C (44) * T 2 )

上記多次多項式の定数C(1)〜C(44)は以下の如くして決定される。即ち、TMAHとレジストの2成分を溶質とする溶液において、TMAHの濃度(D1・1)0〜3.00%、レジストの濃度(D2)0.00〜0.50%、温度(T)20〜30℃の組合せにつき、表1の如く、溶液中の超音波の伝播速度Vと吸光度Aを測定する。上記温度(T)、速度(V)、吸光度(A)の測定は後述するように、本発明の測定装置10を用いて行なうことができる。 The constants C (1) to C (44) of the multi-order polynomial are determined as follows. That is, in a solution containing two components of TMAH and resist, the TMAH concentration (D 1 · 1 ) is 0 to 3.00%, the resist concentration (D 2 ) is 0.00 to 0.50%, and the temperature (T) is 20 to 30 ° C. As shown in Table 1, the ultrasonic wave propagation velocity V and absorbance A in the solution are measured for each combination. The measurement of the temperature (T), speed (V), and absorbance (A) can be performed using the measuring apparatus 10 of the present invention as described later.

表1に示したD1・1、D2、T、V、Aの組合せを少なくとも44組用意し、各組をデータを前記(5)、(6)式に代入して、定数C(1)〜C(44)を未知数とする44元連立方程式を解くことにより、表2に示すように各定数C(1)〜C(44)を決定することができる。この定数C(i)をROMライタにて演算装置11のROM23に記憶させることとなる。尚、ROMライタは各D1・1、D2、T、V、Aから各定数C(i)を算出し検算し(上記C(i)の算出に用いないD1・1、D2、T、V、Aによる)各C(i)が適正な場合にのみROM23に記憶させる。 Prepare at least 44 combinations of D 1 · 1 , D 2 , T, V, A shown in Table 1, and assign the data to the equations (5) and (6) for each set to obtain a constant C (1 The constants C (1) to C (44) can be determined as shown in Table 2 by solving the 44-ary simultaneous equations having unknown numbers of) to C (44). This constant C (i) is stored in the ROM 23 of the arithmetic unit 11 by the ROM writer. The ROM writer calculates and verifies each constant C (i) from each D 1 · 1 , D 2 , T, V, A (D 1 · 1 , D 2 , Only when each C (i) (according to T, V, A) is appropriate, it is stored in the ROM 23.

(B)TMAHの補正濃度D1・2と炭酸塩の濃度D3
被測定溶液1に、例えば炭酸塩が混入すると音速が変化するから、TMAHの濃度D1・1を補正する必要がある。尚、レジストの濃度D2は炭酸塩に影響されなくて吸光度以外の物性量に影響しないから、補正の必要がない。被測定溶液1が3つの溶質TMAH、レジスト、炭酸塩を溶解してなるものであり、特定物性量として導電率σを選定する場合には、TMAHの濃度D1・2と炭酸塩の濃度D3は以下の如くなる。
(B) TMAH correction concentration D 1 · 2 and carbonate concentration D 3
For example, when carbonate is mixed in the solution 1 to be measured, the sound velocity changes, so it is necessary to correct the TMAH concentration D 1 · 1 . The resist concentration D 2 is not affected by the carbonate and does not affect the amount of physical properties other than the absorbance, so there is no need for correction. When the solution 1 to be measured is formed by dissolving three solutes TMAH, resist, and carbonate, and the conductivity σ is selected as a specific physical quantity, the concentration D 1 · 2 of TMAH and the concentration D of carbonate D 3 is as follows.

1・2=F3(D1・1,T, σ) …(7)
3 =F4(D1・1,T, σ) …(8)
D 1 · 2 = F 3 (D 1 · 1 , T, σ) (7)
D 3 = F 4 (D 1 · 1 , T, σ) (8)

上記関数は多次多項式にて表わすことができ、TMAHとレジストと炭酸塩の3成分を溶質とする水溶液について、未知の定数G(1)〜G(44)を含む多次多項式を設定すれば例えば以下の如くになる。ここで、多次多項式を何次の項まで利用するかは濃度測定の要求精度にて定められる。   The above function can be expressed by a multi-order polynomial, and for an aqueous solution having three components of TMAH, resist and carbonate as solutes, a multi-order polynomial including unknown constants G (1) to G (44) is set. For example: Here, to what order the multi-order polynomial is used is determined by the required accuracy of concentration measurement.

1・2=G(29)*X2+G(30) …(9)
2=(H(1)+G(28)*(H(1)2+H(2)*H(3))1/2)/H(3)
H(1)=G(1)+G(2)*T+G(3)*T2+G(4)*T3+G(5)*T4+V*(G(6)+G(7)*T+G(8)*T2)+σ*(G(9)+G(10)*T+G(11)*T2
H(2)=G(12)+G(13)*T+G(14)*T2+G(15)*T3+G(16)*T4+V*(G(17)+G(18)*T+G(19)*T2)+σ*(G(20)+G(21)*T+G(22)*T2
H(3)=G(23)+G(24)*T+G(25)*T2+G(26)*T3+G(27)*T4
3=G(31)*Y2+G(32) …(10)
2=(X2*(G(33)+G(34)*T+G(35)*T2)+G(36)+G(37)*T+G(38)*T2+V)/(X2*(G(39)+G(40)*T+G(41)*T2)+G(42)+G(43)*T+G(44)*T2
D 1 ・ 2 = G (29) * X 2 + G (30) (9)
X 2 = (H (1) + G (28) * (H (1) 2 + H (2) * H (3)) 1/2 ) / H (3)
H (1) = G (1) + G (2) * T + G (3) * T 2 + G (4) * T 3 + G (5) * T 4 + V * (G (6) + G (7) * T + G (8 ) * T 2 ) + σ * (G (9) + G (10) * T + G (11) * T 2 )
H (2) = G (12) + G (13) * T + G (14) * T 2 + G (15) * T 3 + G (16) * T 4 + V * (G (17) + G (18) * T + G (19 ) * T 2 ) + σ * (G (20) + G (21) * T + G (22) * T 2 )
H (3) = G (23) + G (24) * T + G (25) * T 2 + G (26) * T 3 + G (27) * T 4
D 3 = G (31) * Y 2 + G (32) (10)
Y 2 = (X 2 * (G (33) + G (34) * T + G (35) * T 2 ) + G (36) + G (37) * T + G (38) * T 2 + V) / (X 2 * (G (39) + G (40) * T + G (41) * T 2 ) + G (42) + G (43) * T + G (44) * T 2 )

上記多次多項式の定数G(1)〜G(44)は以下の如くして決定される。即ち、TMAHとレジストの炭酸塩の3成分を溶質とする溶液において、レジストの濃度(D2)は既に式(6)で求められているから、TMAHの濃度(D1・2)と炭酸塩濃度(D3)を求めるために、TMAHの濃度(D1・2)0〜3.00%、炭酸塩の濃度(D3)0〜9999ppm、レジストの濃度(D2)0.00〜0.50%、温度(T)20〜30℃の組合せにつき、超音波の伝播速度Vと導電率σを測定する。上記温度(T)、速度(V)、導電率(σ)の測定は後述するように、本発明の測定装置10を用いて行なうことができる。 The constants G (1) to G (44) of the multi-order polynomial are determined as follows. That is, in a solution containing three components of TMAH and resist carbonate as a solute, since the resist concentration (D 2 ) has already been obtained by equation (6), the TMAH concentration (D 1 · 2 ) and carbonate In order to obtain the concentration (D 3 ), the TMAH concentration (D 1 · 2 ) 0 to 3.00%, the carbonate concentration (D 3 ) 0 to 9999 ppm, the resist concentration (D 2 ) 0.00 to 0.50%, the temperature ( T) The ultrasonic propagation velocity V and conductivity σ are measured for a combination of 20 to 30 ° C. The temperature (T), speed (V), and conductivity (σ) can be measured using the measuring apparatus 10 of the present invention as will be described later.

1・2、D、D1・1、T、σの組合せを少なくとも44組用意し、各組のデータを前記(9)、(10)式に代入して、定数G(1)〜G(44)を未知数とする44元連立方程式を解くことにより、各定数G(1)〜G(44)を決定することができる。この定数G(i)をROMライタにて演算装置11のROM23に記憶させることとなる。尚、ROMライタは各D1・2、D、D1・1、T、σから各定数G(i)を算出し検算し、各G(i)が適正な場合にのみ、前述の各G(i)とともにROM23に記憶させる。 Prepare at least 44 combinations of D 1 · 2 , D 3 , D 1 · 1 , T, and σ, and substitute the data of each set into the equations (9) and (10) to obtain constants G (1) ˜ Each constant G (1) to G (44) can be determined by solving a 44-ary simultaneous equation with G (44) as an unknown. This constant G (i) is stored in the ROM 23 of the arithmetic unit 11 by the ROM writer. Note that the ROM writer calculates and verifies each constant G (i) from each D 1 · 2 , D 3 , D 1 · 1 , T, σ, and only when each G (i) is appropriate, It is stored in the ROM 23 together with G (i).

しかして、本発明の濃度演算部としてのCPU22は、3つの溶質TMAHとレジストと炭酸塩が溶解されてなる溶液(洗浄液)の濃度を以下の如くして演算する。即ち、CPU22は、超音波送受波器14の検出量に基づいて演算された超音波の伝播速度(V)、温度検出器16が検出した温度(T)、吸光度検出器17Aが検出した吸光度(A)のそれぞれを、前述の(1)、(2)式具体的には例えば(5)、(6)式に代入することにより、TMAHの濃度D1・1とレジストの濃度D2を演算する(図6(A)参照)。同様に温度(T)、導電率検出器17Bが検出した導電率(σ)のそれぞれを、前述の例えば(9)、(10)式に代入することにより、TMAHの補正濃度D1・2と炭酸塩の濃度D3を演算する(図6(B)参照)。 Therefore, the CPU 22 as the concentration calculation unit of the present invention calculates the concentration of the solution (cleaning solution) in which the three solutes TMAH, the resist, and the carbonate are dissolved as follows. That is, the CPU 22 calculates the ultrasonic wave propagation speed (V) calculated based on the detection amount of the ultrasonic transducer 14, the temperature (T) detected by the temperature detector 16, and the absorbance detected by the absorbance detector 17 </ b> A ( By substituting each of A) into the above-described equations (1) and (2), specifically, for example, equations (5) and (6), TMAH concentration D 1 · 1 and resist concentration D 2 are calculated. (See FIG. 6A). Similarly, by substituting the temperature (T) and the conductivity (σ) detected by the conductivity detector 17B into the above-described formulas (9) and (10), for example, TMAH correction concentrations D 1 and 2 and The carbonate concentration D 3 is calculated (see FIG. 6B).

演算装置11はファンクション設定部29を備えている。ファンクション設定部29は、演算装置11の動作を設定するものであり、(1)超音波の伝播速度Vのみを測定表示するモード、(2)温度Tのみを測定表示するモード、(3)特定物性量(α…αn-1)例えば吸光度A、導電率σのみを測定表示するモード、(4)濃度D1、D2、D3を演算表示するモードを設定する。ファンクション設定部29の設定にて得られる測定結果、演算結果は、表示器13に表示され、或いは出力部30からデジタル出力又はアナログ出力として外部に取り出される。表示器13と出力部30は本発明の出力装置を構成し、これらの出力は洗浄装置100の洗浄剤(TMAH)濃度制御情報等として利用できる。 The arithmetic device 11 includes a function setting unit 29. The function setting unit 29 is for setting the operation of the arithmetic unit 11, and (1) a mode for measuring and displaying only the ultrasonic propagation velocity V, (2) a mode for measuring and displaying only the temperature T, and (3) a specific Physical properties (α 1 ... Α n−1 ) For example, a mode for measuring and displaying only the absorbance A and the conductivity σ, and (4) a mode for calculating and displaying the concentrations D 1 , D 2 , and D 3 are set. The measurement result and the calculation result obtained by the setting of the function setting unit 29 are displayed on the display device 13 or taken out from the output unit 30 as digital output or analog output. The display 13 and the output unit 30 constitute an output device of the present invention, and these outputs can be used as cleaning agent (TMAH) concentration control information of the cleaning device 100 or the like.

以下、上記濃度測定装置10によりTMAHとレジストと炭酸塩の3成分を溶質とする水溶液(洗浄液)の濃度を測定する手順について説明する(図5参照)。演算装置11のτ設定部25、L0設定部26にて前述のτ0、L0を設定するとともに、ファンクション設定部29をいずれかの測定/演算モードに設定する。 Hereinafter, a procedure for measuring the concentration of an aqueous solution (cleaning solution) containing three components of TMAH, resist, and carbonate as a solute by the concentration measuring apparatus 10 will be described (see FIG. 5). The above-described τ 0 and L 0 are set by the τ 0 setting unit 25 and the L 0 setting unit 26 of the calculation device 11 and the function setting unit 29 is set to any measurement / calculation mode.

(1)音速演算モードにては、音速処理サブルーチンが作動し、被測定溶液1(洗浄液)における超音波の伝播速度(V)が前述の如くして演算され出力される。   (1) In the sound velocity calculation mode, the sound velocity processing subroutine is activated, and the ultrasonic wave propagation velocity (V) in the solution to be measured 1 (cleaning solution) is calculated and output as described above.

(2)温度測定モードにては、温度処理サブルーチンが作動し、被測定溶液1の温度(T)が前述の如くして測定され出力される。   (2) In the temperature measurement mode, the temperature processing subroutine operates, and the temperature (T) of the solution 1 to be measured is measured and output as described above.

(3)吸光度測定モードにては、吸光度処理サブルーチンが作動し、被測定溶液1の吸光度(A)が前述の如くして測定され出力される。   (3) In the absorbance measurement mode, the absorbance processing subroutine operates, and the absorbance (A) of the solution 1 to be measured is measured and output as described above.

(4)導電率測定モードにては、導電率処理サブルーチンが作動し、被測定溶液1の導電率(σ)が前述の如くして測定され出力される。   (4) In the conductivity measurement mode, the conductivity processing subroutine operates, and the conductivity (σ) of the solution 1 to be measured is measured and output as described above.

(5)濃度演算モードにては、上記(1)〜(4)の各サブルーチンにて得られたデータが利用され、前述の如くROM23に記憶されている関数からTMAHの濃度D1(D1・2)、レジストの濃度D2、炭酸塩の濃度D3が演算され出力される。 (5) In the concentration calculation mode, the data obtained in each of the subroutines (1) to (4) is used, and the TMAH concentration D 1 (D 1) is calculated from the function stored in the ROM 23 as described above. 2 ) The resist concentration D 2 and the carbonate concentration D 3 are calculated and output.

尚、本発明では、洗浄液における超音波の伝播速度Vと、洗浄液の温度Tと、吸光度Aと、導電率σのそれぞれを、下記(11)〜(13)式に代入することにより、洗浄液の溶質であるTMAHの濃度D1、レジストの濃度D2、炭酸塩の濃度D3を演算することもできる。 In the present invention, the ultrasonic wave propagation velocity V, the temperature T of the cleaning liquid, the absorbance A, and the conductivity σ are substituted into the following formulas (11) to (13), respectively. It is also possible to calculate the concentration D 1 of TMAH, which is a solute, the concentration D 2 of resist, and the concentration D 3 of carbonate.

1=F1(V,T,A,σ) …(11)
2=F2(V,T,A,σ) …(12)
3=F3(V,T,A,σ) …(13)
D 1 = F 1 (V, T, A, σ) (11)
D 2 = F 2 (V, T, A, σ) (12)
D 3 = F 3 (V, T, A, σ) (13)

本発明の実施において、洗浄剤はTMAHに限定されないし、被洗浄物質はレジンに限定されない。   In the practice of the present invention, the cleaning agent is not limited to TMAH, and the substance to be cleaned is not limited to resin.

本発明の実施に用いられる特定物性量としては、密度、pH、光の屈折率、放射線の減衰率、超音波の使用周波数、被測定溶液に対する第3の溶質添加量等を広く採用できる。   As specific physical property amounts used in the practice of the present invention, the density, pH, refractive index of light, attenuation factor of radiation, use frequency of ultrasonic waves, third solute addition amount to the solution to be measured, etc. can be widely adopted.

本発明によれば、洗浄液中の洗浄剤と被洗浄物質の濃度、洗浄剤と被洗浄物質と洗浄剤反応物質の濃度を、リアルタイムで正確に計測できるので、液晶生産工程、半導体生産工程等の工業プロセスにおいて広く適用できる。   According to the present invention, the concentration of the cleaning agent and the substance to be cleaned in the cleaning liquid, and the concentration of the cleaning agent, the substance to be cleaned and the cleaning agent reaction substance can be accurately measured in real time, so that the liquid crystal production process, the semiconductor production process, etc. Widely applicable in industrial process.

Figure 2005164396
Figure 2005164396
Figure 2005164396
Figure 2005164396

図1は洗浄装置を示す模式図である。FIG. 1 is a schematic view showing a cleaning apparatus. 図2は洗浄液濃度測定装置を示すブロック図である。FIG. 2 is a block diagram showing a cleaning liquid concentration measuring apparatus. 図3はセンサを示す正面図である。FIG. 3 is a front view showing the sensor. 図4は超音波の送受波状態を示す波形図である。FIG. 4 is a waveform diagram showing an ultrasonic wave transmission / reception state. 図5は洗浄液濃度測定装置の作動を示す流れ図である。FIG. 5 is a flowchart showing the operation of the cleaning liquid concentration measuring apparatus. 図6は洗浄液濃度測定装置の演算原理を示す線図である。FIG. 6 is a diagram showing the calculation principle of the cleaning liquid concentration measuring apparatus.

符号の説明Explanation of symbols

10 洗浄液濃度測定装置
11 演算装置
13 表示器
14 超音波送受波器
16 温度検出器
17A 吸光度検出器
17B 導電率検出器
22 CPU(速度演算部、濃度演算部)
23 ROM(記憶部)
30 出力部
DESCRIPTION OF SYMBOLS 10 Cleaning liquid density | concentration measuring apparatus 11 Arithmetic apparatus 13 Indicator 14 Ultrasonic wave transmitter / receiver 16 Temperature detector 17A Absorbance detector 17B Conductivity detector 22 CPU (speed calculating part, concentration calculating part)
23 ROM (storage unit)
30 Output section

Claims (5)

溶媒に溶解された少なくとも洗浄剤と被洗浄物質を含む複数(n)の溶質の各濃度(D1…Dn)を測定する洗浄液濃度測定装置であって、被測定溶液に超音波を送波する超音波送波器と、被測定溶液中を伝播した超音波を受波する超音波受波器と、超音波の伝播時間と伝播距離から伝播速度(V)を演算する速度演算部と、被測定溶液の温度(T)を検出する温度検出器と、各溶質の濃度及び被測定溶液の温度により上記伝播速度とはそれぞれ独立に影響を受ける(n−1)種類の特定物性量(α1…αn-1)であり、且つ各溶質の濃度及び被測定溶液の温度により互いに独立に影響を受ける(n−1)種類の特定物性量(α1…αn-1)を検出する特定物性量検出器と、被測定溶液の温度(T)、上記特定物性量(α1…αn-1)と超音波の伝播速度(V)と各溶質の濃度(D1…Dn)との関係を示す関数D1=F1(V,T,α1…αn-1)…Dn=Fn(V,T,α1…αn-1)を予め記憶している記憶部と、前記温度検出器の出力(T)と特定物性量検出器の出力(α1…αn-1)と速度演算部の出力(V)から、前記関数に基づいて各溶質の濃度(D1…Dn)を演算する濃度演算部と、濃度演算部の演算結果を出力する出力装置とを有してなる洗浄液濃度測定装置。 A cleaning liquid concentration measuring apparatus for measuring concentrations (D 1 ... D n ) of a plurality of (n) solutes including at least a cleaning agent and a substance to be cleaned dissolved in a solvent, and transmitting ultrasonic waves to the solution to be measured An ultrasonic transmitter, an ultrasonic receiver that receives the ultrasonic wave propagated in the solution to be measured, a velocity calculation unit that calculates the propagation velocity (V) from the propagation time and propagation distance of the ultrasonic wave, A temperature detector that detects the temperature (T) of the solution to be measured, and (n-1) types of specific physical properties (α) that are independently affected by the propagation speed depending on the concentration of each solute and the temperature of the solution to be measured. 1 ... α n-1 ) and (n-1) kinds of specific physical properties (α 1 ... α n-1 ) that are independently influenced by the concentration of each solute and the temperature of the solution to be measured a specific physical property quantity detector, the measured solution temperature (T), the specific physical properties amount (α 1 ... α n-1 ) and the ultrasonic Den Function showing the relationship between the speed (V) and the density (D 1 ... D n) of each solute D 1 = F 1 (V, T, α 1 ... α n-1) ... D n = F n (V, T , Α 1 ... Α n−1 ), the output of the temperature detector (T), the output of the specific physical property detector (α 1 ... Α n−1 ), and the speed calculation unit Cleaning solution concentration measurement comprising a concentration calculation unit that calculates the concentration (D 1 ... D n ) of each solute based on the function from the output (V), and an output device that outputs the calculation result of the concentration calculation unit. apparatus. 前記複数の溶質が洗浄剤と被洗浄物質である請求項1に記載の洗浄液濃度測定装置。   The cleaning liquid concentration measuring apparatus according to claim 1, wherein the plurality of solutes are a cleaning agent and a substance to be cleaned. 前記洗浄剤が水酸化テトラメチルアンモニウムであり、被洗浄物質がレジストであり、
前記特定物性量が吸光度である請求項2に記載の洗浄液濃度測定装置。
The cleaning agent is tetramethylammonium hydroxide, the substance to be cleaned is a resist,
The cleaning liquid concentration measurement apparatus according to claim 2, wherein the specific physical property amount is absorbance.
前記複数の溶質が洗浄剤と被洗浄物質と洗浄剤反応物質である請求項1に記載の洗浄液濃度測定装置。   The cleaning liquid concentration measuring apparatus according to claim 1, wherein the plurality of solutes are a cleaning agent, a substance to be cleaned, and a cleaning agent reactive substance. 前記洗浄剤が水酸化テトラメチルアンモニウムであり、被洗浄物質がレジストであり、洗浄剤反応物質が炭酸塩であり、
前記特定物性量が吸光度と導電率である請求項4に記載の洗浄液濃度測定装置。
The cleaning agent is tetramethylammonium hydroxide, the cleaning material is a resist, and the cleaning material is a carbonate;
The cleaning liquid concentration measuring apparatus according to claim 4, wherein the specific physical property amounts are absorbance and conductivity.
JP2003403673A 2003-12-02 2003-12-02 Washing liquid concentration measuring apparatus Pending JP2005164396A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008065755A1 (en) * 2006-11-30 2008-06-05 Mitsubishi Chemical Engineering Corporation Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
JP2011058981A (en) * 2009-09-10 2011-03-24 Fuji Electric Systems Co Ltd Negative ion concentration measuring apparatus, power generation device, automatic steam property measuring apparatus, and geothermal power generation device
KR101060815B1 (en) 2008-12-26 2011-08-30 주식회사 포스코 Apparatus and method for continuously measuring acid concentration of pickling solution

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008065755A1 (en) * 2006-11-30 2008-06-05 Mitsubishi Chemical Engineering Corporation Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
JP2008283162A (en) * 2006-11-30 2008-11-20 Mitsubishi Chemical Engineering Corp Method of adjusting concentration of liquid developer, preparation device of liquid developer, and liquid developer
CN103852978A (en) * 2006-11-30 2014-06-11 三菱化学工程株式会社 Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
KR101446619B1 (en) 2006-11-30 2014-10-01 미츠비시 가가쿠 엔지니어링 가부시키가이샤 Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
KR101060815B1 (en) 2008-12-26 2011-08-30 주식회사 포스코 Apparatus and method for continuously measuring acid concentration of pickling solution
JP2011058981A (en) * 2009-09-10 2011-03-24 Fuji Electric Systems Co Ltd Negative ion concentration measuring apparatus, power generation device, automatic steam property measuring apparatus, and geothermal power generation device

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