TWI447775B - 用於氣體放電雷射之電極 - Google Patents

用於氣體放電雷射之電極 Download PDF

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Publication number
TWI447775B
TWI447775B TW099135048A TW99135048A TWI447775B TW I447775 B TWI447775 B TW I447775B TW 099135048 A TW099135048 A TW 099135048A TW 99135048 A TW99135048 A TW 99135048A TW I447775 B TWI447775 B TW I447775B
Authority
TW
Taiwan
Prior art keywords
anode
electrode
anode material
discharge
receiving region
Prior art date
Application number
TW099135048A
Other languages
English (en)
Chinese (zh)
Other versions
TW201112304A (en
Inventor
Thomas D Steiger
Richard C Ujazdowski
Timothy S Dyer
Thomas P Duffey
Walter D Gillespie
Bryan G Moosman
Richard G Morton
Brian D Strate
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/629,364 external-priority patent/US7132123B2/en
Priority claimed from US10/672,722 external-priority patent/US7230965B2/en
Priority claimed from US10/672,182 external-priority patent/US7339973B2/en
Priority claimed from US10/672,181 external-priority patent/US7095774B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of TW201112304A publication Critical patent/TW201112304A/zh
Application granted granted Critical
Publication of TWI447775B publication Critical patent/TWI447775B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
TW099135048A 2003-07-29 2004-07-22 用於氣體放電雷射之電極 TWI447775B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/629,364 US7132123B2 (en) 2000-06-09 2003-07-29 High rep-rate laser with improved electrodes
US10/672,722 US7230965B2 (en) 2001-02-01 2003-09-26 Anodes for fluorine gas discharge lasers
US10/672,182 US7339973B2 (en) 2001-09-13 2003-09-26 Electrodes for fluorine gas discharge lasers
US10/672,181 US7095774B2 (en) 2001-09-13 2003-09-26 Cathodes for fluorine gas discharge lasers
US10/877,737 US7301980B2 (en) 2002-03-22 2004-06-25 Halogen gas discharge laser electrodes

Publications (2)

Publication Number Publication Date
TW201112304A TW201112304A (en) 2011-04-01
TWI447775B true TWI447775B (zh) 2014-08-01

Family

ID=34624077

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099135048A TWI447775B (zh) 2003-07-29 2004-07-22 用於氣體放電雷射之電極

Country Status (6)

Country Link
US (1) US7301980B2 (enExample)
EP (1) EP1649558A4 (enExample)
JP (2) JP2007500942A (enExample)
KR (1) KR101042179B1 (enExample)
TW (1) TWI447775B (enExample)
WO (1) WO2005050794A2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070002918A1 (en) * 2005-06-30 2007-01-04 Norbert Niemoeller Acoustic shock-wave damping in pulsed gas-laser discharge
JP6701198B2 (ja) * 2015-08-05 2020-05-27 ギガフォトン株式会社 レーザチャンバ
US10074953B2 (en) * 2015-09-30 2018-09-11 Cymer, Llc Erosion resistant electrodes for use in generating gas discharge laser
KR102593750B1 (ko) 2017-10-24 2023-10-24 사이머 엘엘씨 레이저 챔버에서 전극 수명을 연장시키기 위한 장치 및 방법
JP6829179B2 (ja) 2017-11-15 2021-02-10 Ｊｘ金属株式会社 耐食性ＣｕＺｎ合金
WO2020060735A1 (en) 2018-09-20 2020-03-26 Cymer, Llc Prolonged life laser chamber electrode and laser having same
CN113056570A (zh) 2018-12-03 2021-06-29 Ｊｘ金属株式会社 耐蚀性CuZn合金
TW202400821A (zh) 2019-05-10 2024-01-01 美商希瑪有限責任公司 雷射放電設備及在雷射放電腔中之電極上形成保護層之方法
JP7412562B2 (ja) * 2019-12-31 2024-01-12 サイマー リミテッド ライアビリティ カンパニー ガス放電レーザチャンバのためのアンダーカット電極
CN113394648B (zh) * 2020-03-13 2025-06-13 北京科益虹源光电技术有限公司 气体激光器电极及气体激光器
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
JPWO2023181416A1 (enExample) * 2022-03-25 2023-09-28
WO2023218548A1 (ja) * 2022-05-11 2023-11-16 ギガフォトン株式会社 放電電極、アノードの製造方法、及び電子デバイスの製造方法
CN120883461A (zh) * 2023-03-29 2025-10-31 西默有限公司 具有声学散射表面的激光室预电离器
WO2025120393A1 (en) * 2023-12-07 2025-06-12 Cymer, Llc Laser chamber with discharge system having acoustic scattering surfaces

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3828277A (en) * 1971-12-27 1974-08-06 Us Army Integral capacitor lateral discharge laser
US5771259A (en) * 1996-11-08 1998-06-23 Dvorkin; Lev P. Laser electrode coating

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4245194A (en) * 1979-07-16 1981-01-13 Gte Products Corporation Compact pulsed gas transport laser
DE2952046C2 (de) * 1979-12-22 1982-04-15 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn Verfahren und Vorrichtung zur Erzeugung einer elektrischen Entladung in einem mit Überschallgeschwindigkeit strömenden Gas
US4547886A (en) * 1981-09-25 1985-10-15 United Technologies Corporation Catalyzed sealed-off CO2 laser
IT1148956B (it) * 1982-06-15 1986-12-03 Selenia Industire Elettroniche Laser a gas impulsanti in struttura sigillata
US4774714A (en) * 1983-05-19 1988-09-27 Laser Science, Inc. Laser system with interchangeable modules and method for interchanging such modules
US4686682A (en) * 1984-10-09 1987-08-11 Mitsubishi Denki Kabushiki Kaisha Discharge excitation type short pulse laser device
NO853264L (no) * 1984-10-15 1986-04-16 Siemens Ag Transversalt eksitert gasslaser og fremgangsm¨te til dens drift.
US4876693A (en) * 1984-12-26 1989-10-24 Hughes Aircraft Company Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers
DE3705165A1 (de) 1986-02-18 1987-08-20 Mitsubishi Electric Corp Mit entladungserregung arbeitende laservorrichtung fuer kurze impulse
US4959840A (en) * 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
IT1231783B (it) * 1989-05-12 1992-01-14 Enea Testa laser per eccitazione a scarica trasversa con tre elettrodi
JPH04218985A (ja) * 1990-07-06 1992-08-10 Mitsubishi Electric Corp エキシマレーザ装置
CA2082405C (en) * 1991-03-06 2004-09-28 Gregory M. Jursich Method for extending the gas lifetime of excimer lasers
DE4113241C2 (de) * 1991-04-23 1994-08-11 Lambda Physik Forschung Gepulster Gasentladungslaser
US5557629A (en) * 1992-08-28 1996-09-17 Kabushiki Kaisha Komatsu Seisakusho Laser device having an electrode with auxiliary conductor members
JP2631607B2 (ja) 1992-10-07 1997-07-16 株式会社小松製作所 レーザ装置
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
US5661746A (en) * 1995-10-17 1997-08-26 Universal Laser Syatems, Inc. Free-space gas slab laser
US5771258A (en) * 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
US5991324A (en) * 1998-03-11 1999-11-23 Cymer, Inc. Reliable. modular, production quality narrow-band KRF excimer laser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
DE19750320C1 (de) * 1997-11-13 1999-04-01 Max Planck Gesellschaft Verfahren und Vorrichtung zur Lichtpulsverstärkung
US6414979B2 (en) * 2000-06-09 2002-07-02 Cymer, Inc. Gas discharge laser with blade-dielectric electrode
US6654403B2 (en) * 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser
US7132123B2 (en) * 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US6690706B2 (en) * 2000-06-09 2004-02-10 Cymer, Inc. High rep-rate laser with improved electrodes
US6584132B2 (en) * 2000-11-01 2003-06-24 Cymer, Inc. Spinodal copper alloy electrodes
US6914919B2 (en) * 2000-06-19 2005-07-05 Cymer, Inc. Six to ten KHz, or greater gas discharge laser system
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US6690704B2 (en) * 2001-04-09 2004-02-10 Cymer, Inc. Control system for a two chamber gas discharge laser
US6810061B2 (en) * 2001-08-27 2004-10-26 Komatsu Ltd. Discharge electrode and discharge electrode manufacturing method
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
KR100940782B1 (ko) * 2001-09-13 2010-02-11 사이머 인코포레이티드 향상된 전극을 구비한 고반복률 레이저
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US6798812B2 (en) * 2002-01-23 2004-09-28 Cymer, Inc. Two chamber F2 laser system with F2 pressure based line selection

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3828277A (en) * 1971-12-27 1974-08-06 Us Army Integral capacitor lateral discharge laser
US5771259A (en) * 1996-11-08 1998-06-23 Dvorkin; Lev P. Laser electrode coating

Also Published As

Publication number Publication date
WO2005050794A3 (en) 2006-01-05
US7301980B2 (en) 2007-11-27
TW201112304A (en) 2011-04-01
KR20060089717A (ko) 2006-08-09
US20050047471A1 (en) 2005-03-03
JP2007311824A (ja) 2007-11-29
WO2005050794A2 (en) 2005-06-02
KR101042179B1 (ko) 2011-06-16
EP1649558A2 (en) 2006-04-26
JP2007500942A (ja) 2007-01-18
EP1649558A4 (en) 2006-12-20

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