KR101042179B1 - 할로겐 가스 방전 레이저 전극 - Google Patents

할로겐 가스 방전 레이저 전극 Download PDF

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Publication number
KR101042179B1
KR101042179B1 KR1020067001713A KR20067001713A KR101042179B1 KR 101042179 B1 KR101042179 B1 KR 101042179B1 KR 1020067001713 A KR1020067001713 A KR 1020067001713A KR 20067001713 A KR20067001713 A KR 20067001713A KR 101042179 B1 KR101042179 B1 KR 101042179B1
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South Korea
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delete delete
anode
cathode
elongated
discharge
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KR20060089717A (ko
Inventor
토마스 디. 스타이거
리차드 씨. 우자도우스키
티모씨 에스. 다이어
토마스 피. 두페이
월터 디. 질레스피에
브라이언 지. 무스만
리차드 지. 모톤
브라이언 디. 스트라테
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사이머 인코포레이티드
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Priority claimed from US10/629,364 external-priority patent/US7132123B2/en
Priority claimed from US10/672,722 external-priority patent/US7230965B2/en
Priority claimed from US10/672,181 external-priority patent/US7095774B2/en
Priority claimed from US10/672,182 external-priority patent/US7339973B2/en
Application filed by 사이머 인코포레이티드 filed Critical 사이머 인코포레이티드
Publication of KR20060089717A publication Critical patent/KR20060089717A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
KR1020067001713A 2003-07-29 2004-07-27 할로겐 가스 방전 레이저 전극 Expired - Fee Related KR101042179B1 (ko)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
US10/629,364 US7132123B2 (en) 2000-06-09 2003-07-29 High rep-rate laser with improved electrodes
US10/629,364 2003-07-29
US10/672,722 2003-09-26
US10/672,722 US7230965B2 (en) 2001-02-01 2003-09-26 Anodes for fluorine gas discharge lasers
US10/672,181 2003-09-26
US10/672,181 US7095774B2 (en) 2001-09-13 2003-09-26 Cathodes for fluorine gas discharge lasers
US10/672,182 US7339973B2 (en) 2001-09-13 2003-09-26 Electrodes for fluorine gas discharge lasers
US10/672,182 2003-09-26
US10/877,737 2004-06-25
US10/877,737 US7301980B2 (en) 2002-03-22 2004-06-25 Halogen gas discharge laser electrodes

Publications (2)

Publication Number Publication Date
KR20060089717A KR20060089717A (ko) 2006-08-09
KR101042179B1 true KR101042179B1 (ko) 2011-06-16

Family

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Family Applications (1)

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KR1020067001713A Expired - Fee Related KR101042179B1 (ko) 2003-07-29 2004-07-27 할로겐 가스 방전 레이저 전극

Country Status (6)

Country Link
US (1) US7301980B2 (enExample)
EP (1) EP1649558A4 (enExample)
JP (2) JP2007500942A (enExample)
KR (1) KR101042179B1 (enExample)
TW (1) TWI447775B (enExample)
WO (1) WO2005050794A2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070002918A1 (en) * 2005-06-30 2007-01-04 Norbert Niemoeller Acoustic shock-wave damping in pulsed gas-laser discharge
WO2017022105A1 (ja) * 2015-08-05 2017-02-09 ギガフォトン株式会社 レーザチャンバ
US10074953B2 (en) 2015-09-30 2018-09-11 Cymer, Llc Erosion resistant electrodes for use in generating gas discharge laser
WO2019083722A1 (en) 2017-10-24 2019-05-02 Cymer, Llc METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER
JP6829179B2 (ja) 2017-11-15 2021-02-10 Ｊｘ金属株式会社 耐食性ＣｕＺｎ合金
KR102471783B1 (ko) * 2018-09-20 2022-11-25 사이머 엘엘씨 연장된 수명을 갖는 레이저 챔버 전극 및 이러한 전극을 갖는 레이저
CN113056570A (zh) 2018-12-03 2021-06-29 Ｊｘ金属株式会社 耐蚀性CuZn合金
TWI855066B (zh) 2019-05-10 2024-09-11 美商希瑪有限責任公司 雷射放電設備及在雷射放電腔中之電極上形成保護層之方法
JP7412562B2 (ja) * 2019-12-31 2024-01-12 サイマー リミテッド ライアビリティ カンパニー ガス放電レーザチャンバのためのアンダーカット電極
CN113394648B (zh) * 2020-03-13 2025-06-13 北京科益虹源光电技术有限公司 气体激光器电极及气体激光器
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
CN118648201A (zh) * 2022-03-25 2024-09-13 极光先进雷射株式会社 放电电极、放电电极的制造方法以及电子器件的制造方法
CN119256456A (zh) * 2022-05-11 2025-01-03 极光先进雷射株式会社 放电电极、阳极的制造方法以及电子器件的制造方法
WO2024201226A1 (en) * 2023-03-29 2024-10-03 Cymer, Llc Laser chamber preionizer having acoustic scattering surface
WO2025120393A1 (en) * 2023-12-07 2025-06-12 Cymer, Llc Laser chamber with discharge system having acoustic scattering surfaces

Citations (3)

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Publication number Priority date Publication date Assignee Title
US3828277A (en) 1971-12-27 1974-08-06 Us Army Integral capacitor lateral discharge laser
US4837773A (en) 1986-02-18 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Discharge excitation type short pulse laser
US5771259A (en) 1996-11-08 1998-06-23 Dvorkin; Lev P. Laser electrode coating

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US4547886A (en) 1981-09-25 1985-10-15 United Technologies Corporation Catalyzed sealed-off CO2 laser
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US4876693A (en) 1984-12-26 1989-10-24 Hughes Aircraft Company Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
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US3828277A (en) 1971-12-27 1974-08-06 Us Army Integral capacitor lateral discharge laser
US4837773A (en) 1986-02-18 1989-06-06 Mitsubishi Denki Kabushiki Kaisha Discharge excitation type short pulse laser
US5771259A (en) 1996-11-08 1998-06-23 Dvorkin; Lev P. Laser electrode coating

Also Published As

Publication number Publication date
JP2007500942A (ja) 2007-01-18
TW201112304A (en) 2011-04-01
TWI447775B (zh) 2014-08-01
WO2005050794A3 (en) 2006-01-05
US20050047471A1 (en) 2005-03-03
EP1649558A4 (en) 2006-12-20
EP1649558A2 (en) 2006-04-26
WO2005050794A2 (en) 2005-06-02
US7301980B2 (en) 2007-11-27
JP2007311824A (ja) 2007-11-29
KR20060089717A (ko) 2006-08-09

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