JP2007500942A - ハロゲンガス放電レーザ電極 - Google Patents

ハロゲンガス放電レーザ電極 Download PDF

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Publication number
JP2007500942A
JP2007500942A JP2006521978A JP2006521978A JP2007500942A JP 2007500942 A JP2007500942 A JP 2007500942A JP 2006521978 A JP2006521978 A JP 2006521978A JP 2006521978 A JP2006521978 A JP 2006521978A JP 2007500942 A JP2007500942 A JP 2007500942A
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cathode
anode
elongated
brass
discharge
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JP2006521978A
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Japanese (ja)
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JP2007500942A5 (enExample
Inventor
トーマス ディー ステイガー
リチャード シー ウジャズドースキー
ティモシー エス ダイアー
トーマス ピー ダフィー
ウォルター ディー ギルスピー
ブライアン ジー ムースマン
リチャード ジー モートン
ブライアン ディー ストラート
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サイマー インコーポレイテッド
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Priority claimed from US10/629,364 external-priority patent/US7132123B2/en
Priority claimed from US10/672,722 external-priority patent/US7230965B2/en
Priority claimed from US10/672,181 external-priority patent/US7095774B2/en
Priority claimed from US10/672,182 external-priority patent/US7339973B2/en
Application filed by サイマー インコーポレイテッド filed Critical サイマー インコーポレイテッド
Publication of JP2007500942A publication Critical patent/JP2007500942A/ja
Publication of JP2007500942A5 publication Critical patent/JP2007500942A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/04—Arrangements for thermal management
    • H01S3/041—Arrangements for thermal management for gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP2006521978A 2003-07-29 2004-07-27 ハロゲンガス放電レーザ電極 Pending JP2007500942A (ja)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US10/629,364 US7132123B2 (en) 2000-06-09 2003-07-29 High rep-rate laser with improved electrodes
US10/672,722 US7230965B2 (en) 2001-02-01 2003-09-26 Anodes for fluorine gas discharge lasers
US10/672,181 US7095774B2 (en) 2001-09-13 2003-09-26 Cathodes for fluorine gas discharge lasers
US10/672,182 US7339973B2 (en) 2001-09-13 2003-09-26 Electrodes for fluorine gas discharge lasers
US10/877,737 US7301980B2 (en) 2002-03-22 2004-06-25 Halogen gas discharge laser electrodes
PCT/US2004/024062 WO2005050794A2 (en) 2003-07-29 2004-07-27 Halogen gas discharge laser electrodes

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007195677A Division JP2007311824A (ja) 2003-07-29 2007-07-27 ハロゲンガス放電レーザ電極

Publications (2)

Publication Number Publication Date
JP2007500942A true JP2007500942A (ja) 2007-01-18
JP2007500942A5 JP2007500942A5 (enExample) 2007-09-13

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006521978A Pending JP2007500942A (ja) 2003-07-29 2004-07-27 ハロゲンガス放電レーザ電極
JP2007195677A Pending JP2007311824A (ja) 2003-07-29 2007-07-27 ハロゲンガス放電レーザ電極

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2007195677A Pending JP2007311824A (ja) 2003-07-29 2007-07-27 ハロゲンガス放電レーザ電極

Country Status (6)

Country Link
US (1) US7301980B2 (enExample)
EP (1) EP1649558A4 (enExample)
JP (2) JP2007500942A (enExample)
KR (1) KR101042179B1 (enExample)
TW (1) TWI447775B (enExample)
WO (1) WO2005050794A2 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019097846A1 (ja) 2017-11-15 2019-05-23 Ｊｘ金属株式会社 耐食性ＣｕＺｎ合金
WO2020116464A1 (ja) 2018-12-03 2020-06-11 Ｊｘ金属株式会社 耐食性ＣｕＺｎ合金
JP2023507924A (ja) * 2019-12-31 2023-02-28 サイマー リミテッド ライアビリティ カンパニー ガス放電レーザチャンバのためのアンダーカット電極
WO2023218548A1 (ja) * 2022-05-11 2023-11-16 ギガフォトン株式会社 放電電極、アノードの製造方法、及び電子デバイスの製造方法

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US20070002918A1 (en) * 2005-06-30 2007-01-04 Norbert Niemoeller Acoustic shock-wave damping in pulsed gas-laser discharge
WO2017022105A1 (ja) * 2015-08-05 2017-02-09 ギガフォトン株式会社 レーザチャンバ
US10074953B2 (en) 2015-09-30 2018-09-11 Cymer, Llc Erosion resistant electrodes for use in generating gas discharge laser
WO2019083722A1 (en) 2017-10-24 2019-05-02 Cymer, Llc METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER
KR102471783B1 (ko) * 2018-09-20 2022-11-25 사이머 엘엘씨 연장된 수명을 갖는 레이저 챔버 전극 및 이러한 전극을 갖는 레이저
TWI855066B (zh) 2019-05-10 2024-09-11 美商希瑪有限責任公司 雷射放電設備及在雷射放電腔中之電極上形成保護層之方法
CN113394648B (zh) * 2020-03-13 2025-06-13 北京科益虹源光电技术有限公司 气体激光器电极及气体激光器
US11862922B2 (en) * 2020-12-21 2024-01-02 Energetiq Technology, Inc. Light emitting sealed body and light source device
CN118648201A (zh) * 2022-03-25 2024-09-13 极光先进雷射株式会社 放电电极、放电电极的制造方法以及电子器件的制造方法
WO2024201226A1 (en) * 2023-03-29 2024-10-03 Cymer, Llc Laser chamber preionizer having acoustic scattering surface
WO2025120393A1 (en) * 2023-12-07 2025-06-12 Cymer, Llc Laser chamber with discharge system having acoustic scattering surfaces

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WO2003023910A2 (en) * 2001-09-13 2003-03-20 Cymer, Inc. High rep-rate laser with improved electrodes

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019097846A1 (ja) 2017-11-15 2019-05-23 Ｊｘ金属株式会社 耐食性ＣｕＺｎ合金
KR20190082267A (ko) 2017-11-15 2019-07-09 제이엑스금속주식회사 내식성 CuZn 합금
US12006563B2 (en) 2017-11-15 2024-06-11 Jx Metals Corporation Corrosion resistant CuZn alloy
WO2020116464A1 (ja) 2018-12-03 2020-06-11 Ｊｘ金属株式会社 耐食性ＣｕＺｎ合金
KR20210076943A (ko) 2018-12-03 2021-06-24 제이엑스금속주식회사 내식성 CuZn 합금
US11643707B2 (en) 2018-12-03 2023-05-09 Jx Nippon Mining & Metals Corporation Corrosion-resistant CuZn alloy
JP2023507924A (ja) * 2019-12-31 2023-02-28 サイマー リミテッド ライアビリティ カンパニー ガス放電レーザチャンバのためのアンダーカット電極
JP7412562B2 (ja) 2019-12-31 2024-01-12 サイマー リミテッド ライアビリティ カンパニー ガス放電レーザチャンバのためのアンダーカット電極
WO2023218548A1 (ja) * 2022-05-11 2023-11-16 ギガフォトン株式会社 放電電極、アノードの製造方法、及び電子デバイスの製造方法

Also Published As

Publication number Publication date
TW201112304A (en) 2011-04-01
TWI447775B (zh) 2014-08-01
KR101042179B1 (ko) 2011-06-16
WO2005050794A3 (en) 2006-01-05
US20050047471A1 (en) 2005-03-03
EP1649558A4 (en) 2006-12-20
EP1649558A2 (en) 2006-04-26
WO2005050794A2 (en) 2005-06-02
US7301980B2 (en) 2007-11-27
JP2007311824A (ja) 2007-11-29
KR20060089717A (ko) 2006-08-09

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