TWI444439B - 加工顏料與使用它之顏料分散組成物、著色感光性組成物、彩色濾光片、液晶顯示元件及固體攝像元件 - Google Patents
加工顏料與使用它之顏料分散組成物、著色感光性組成物、彩色濾光片、液晶顯示元件及固體攝像元件 Download PDFInfo
- Publication number
- TWI444439B TWI444439B TW097138638A TW97138638A TWI444439B TW I444439 B TWI444439 B TW I444439B TW 097138638 A TW097138638 A TW 097138638A TW 97138638 A TW97138638 A TW 97138638A TW I444439 B TWI444439 B TW I444439B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- pigment
- meth
- acid
- acrylate
- Prior art date
Links
- 0 CC*(C(N(C)C1=Cc(cc2)ccc2N(CC)CC)=*)C1=O Chemical compound CC*(C(N(C)C1=Cc(cc2)ccc2N(CC)CC)=*)C1=O 0.000 description 5
- PHEINRAFCBGMGH-ZCTHSVRISA-N CC(C)C(CCC1C)CC1OC(c(cccc1)c1/N=C(/N)\O/C(/C(C)=O)=C/c1cc(CCC2)c3N2CCCc3c1)=O Chemical compound CC(C)C(CCC1C)CC1OC(c(cccc1)c1/N=C(/N)\O/C(/C(C)=O)=C/c1cc(CCC2)c3N2CCCc3c1)=O PHEINRAFCBGMGH-ZCTHSVRISA-N 0.000 description 1
- BIUORRCFDCILEN-LTGZKZEYSA-N CCN(C(/C(/N1c2ccccc2)=C\c(cc2CCC3)cc4c2N3CCC4)=O)C1=O Chemical compound CCN(C(/C(/N1c2ccccc2)=C\c(cc2CCC3)cc4c2N3CCC4)=O)C1=O BIUORRCFDCILEN-LTGZKZEYSA-N 0.000 description 1
- VPQIFVFXHMAHQX-JLVNLMEGSA-N CCN(C(/C(/O1)=C\c(cc2)ccc2N(c2ccccc2)c2ccccc2)=O)/C1=N\c(cccc1)c1C#N Chemical compound CCN(C(/C(/O1)=C\c(cc2)ccc2N(c2ccccc2)c2ccccc2)=O)/C1=N\c(cccc1)c1C#N VPQIFVFXHMAHQX-JLVNLMEGSA-N 0.000 description 1
- USHDXLZVOZXFIU-KDSHUIOFSA-N CCOC(c(cccc1)c1/N=C(/N(CCc1ccccc1)C1=O)\O/C1=C/c(cc1)ccc1N(c1ccccc1)c1ccccc1)=O Chemical compound CCOC(c(cccc1)c1/N=C(/N(CCc1ccccc1)C1=O)\O/C1=C/c(cc1)ccc1N(c1ccccc1)c1ccccc1)=O USHDXLZVOZXFIU-KDSHUIOFSA-N 0.000 description 1
- FSHGZBTYRFQINU-NTEUORMPSA-N COC(CCN(C(/C(/O1)=C\c2cc3ccccc3nc2)=O)C1=O)=O Chemical compound COC(CCN(C(/C(/O1)=C\c2cc3ccccc3nc2)=O)C1=O)=O FSHGZBTYRFQINU-NTEUORMPSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/006—Preparation of organic pigments
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
- C09B67/0084—Dispersions of dyes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Dispersion Chemistry (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007266842 | 2007-10-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200925215A TW200925215A (en) | 2009-06-16 |
TWI444439B true TWI444439B (zh) | 2014-07-11 |
Family
ID=40570860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW097138638A TWI444439B (zh) | 2007-10-12 | 2008-10-08 | 加工顏料與使用它之顏料分散組成物、著色感光性組成物、彩色濾光片、液晶顯示元件及固體攝像元件 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5441388B2 (ja) |
KR (1) | KR101546737B1 (ja) |
CN (1) | CN101407641B (ja) |
TW (1) | TWI444439B (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5196432B2 (ja) | 2008-09-17 | 2013-05-15 | 東洋アルミニウム株式会社 | 樹脂被覆メタリック顔料、それを含有する水性塗料、それが塗布された塗装物、およびその製造方法 |
JP5527753B2 (ja) * | 2009-05-25 | 2014-06-25 | 東洋アルミニウム株式会社 | 表面被覆メタリック顔料、それを含む水性塗料およびそれが塗布された塗装物 |
KR101453771B1 (ko) * | 2010-11-08 | 2014-10-23 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
US10407614B2 (en) * | 2015-02-06 | 2019-09-10 | Lg Chem, Ltd. | Photoconversion film, and photoconversion element and display device comprising same |
JP2017010028A (ja) * | 2015-06-22 | 2017-01-12 | Dic株式会社 | カラーフィルタ用顔料組成物及びカラーフィルタ |
KR102044582B1 (ko) * | 2015-10-23 | 2019-11-13 | 주식회사 엘지화학 | 유기형광염료를 포함하는 광전환 소자 및 이를 포함하는 백라이트 유닛 및 디스플레이 장치 |
CN107235864B (zh) * | 2016-03-28 | 2018-12-28 | 中国石油化工股份有限公司 | 疏水单体、堵漏凝胶及其制备方法 |
US10287448B2 (en) * | 2016-07-08 | 2019-05-14 | Evonik Degussa Gmbh | Universal pigment preparation |
EP3492531A4 (en) * | 2016-07-28 | 2020-04-08 | Kao Corporation | PROCESS FOR PRODUCING A FINE ORGANIC PIGMENT |
CN118011734A (zh) * | 2017-02-03 | 2024-05-10 | 日产化学株式会社 | 包含具有含脲键的结构单元的聚合物的抗蚀剂下层膜形成用组合物 |
CN110079124A (zh) * | 2019-05-20 | 2019-08-02 | 浙江纳美新材料股份有限公司 | 一种纳米颜料晶型控制方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002258031A (ja) * | 2001-02-28 | 2002-09-11 | Canon Inc | カラーフィルタ、その製造方法および液晶パネル |
JP2004189928A (ja) * | 2002-12-12 | 2004-07-08 | Konica Minolta Holdings Inc | 顔料分散液の製造方法 |
JP4368134B2 (ja) * | 2003-03-24 | 2009-11-18 | 大日本印刷株式会社 | 着色レジスト用顔料分散液、感光性着色組成物、及び、カラーフィルター |
JP2006057044A (ja) * | 2004-08-23 | 2006-03-02 | Dainippon Ink & Chem Inc | 水性記録液用顔料分散体および水性記録液 |
WO2007007403A1 (ja) * | 2005-07-13 | 2007-01-18 | Miyoshi Kasei, Inc. | 表面処理粉体及びこれを含有する化粧料 |
JP5114928B2 (ja) * | 2005-11-25 | 2013-01-09 | 東洋インキScホールディングス株式会社 | 着色樹脂組成物、インクジェットインキ、及びカラーフィルター基板 |
JP2007231247A (ja) * | 2006-02-01 | 2007-09-13 | Fujifilm Corp | フタロシアニン化合物顔料微粒子の製造方法、それにより得られるフタロシアニン化合物顔料微粒子、及びそれを含有するカラーフィルタ用インクジェットインク、着色感光性樹脂組成物、感光性樹脂転写材料、並びにそれらを用いたカラーフィルタ、液晶表示装置、及びccdデバイス |
JP2007314771A (ja) * | 2006-04-28 | 2007-12-06 | Kao Corp | 顔料分散体 |
JP2009079148A (ja) * | 2007-09-26 | 2009-04-16 | Fujifilm Corp | 加工顔料、顔料分散組成物、着色感光性組成物、カラーフィルタ、液晶表示素子、及び固体撮像素子 |
-
2008
- 2008-10-07 CN CN200810168995.7A patent/CN101407641B/zh not_active Expired - Fee Related
- 2008-10-08 KR KR1020080098852A patent/KR101546737B1/ko active IP Right Grant
- 2008-10-08 TW TW097138638A patent/TWI444439B/zh not_active IP Right Cessation
- 2008-10-14 JP JP2008265602A patent/JP5441388B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2009108315A (ja) | 2009-05-21 |
TW200925215A (en) | 2009-06-16 |
KR20090037816A (ko) | 2009-04-16 |
KR101546737B1 (ko) | 2015-08-24 |
CN101407641B (zh) | 2014-04-09 |
CN101407641A (zh) | 2009-04-15 |
JP5441388B2 (ja) | 2014-03-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI444439B (zh) | 加工顏料與使用它之顏料分散組成物、著色感光性組成物、彩色濾光片、液晶顯示元件及固體攝像元件 | |
JP5191194B2 (ja) | 加工顔料、それを用いた顔料分散組成物、着色感光性組成物、及び、カラーフィルタ | |
TWI460234B (zh) | 顏料分散組成物、顏料分散組成物之製法、著色聚合性組成物、彩色濾光片、及彩色濾光片之製法 | |
KR101518985B1 (ko) | 가공 안료, 안료 분산 조성물, 착색 감광성 조성물, 컬러필터, 액정표시소자, 및 고체촬상소자 | |
JP5523677B2 (ja) | 顔料分散組成物、光硬化性組成物、およびカラーフィルタ | |
TWI442179B (zh) | 著色硬化性組成物、著色圖案及使用它之彩色濾光片 | |
JP5371313B2 (ja) | カラーフィルタ用着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及び液晶表示素子 | |
TWI519548B (zh) | 著色感光性樹脂組成物、圖案形成方法、彩色濾光片的製造方法、彩色濾光片及具備其之顯示裝置 | |
KR100517252B1 (ko) | 감방사선성착색조성물 | |
JP5611520B2 (ja) | 加工顔料、それを用いた顔料分散組成物、着色感光性組成物、カラーフィルタ、液晶表示素子、固体撮像素子、及び加工顔料の製造方法 | |
EP2042921B1 (en) | Pigment dispersion composition, photocurable composition and color filter | |
JP2009132899A (ja) | 顔料分散組成物、着色硬化性組成物、カラーフィルタ及びその製造方法 | |
CN101403857B (zh) | 着色像素用固化性组合物、滤色器和液晶显示装置 | |
JP5191197B2 (ja) | 加工顔料、それを用いた顔料分散組成物及び着色感光性組成物、並びにカラーフィルタ | |
JP2009084452A (ja) | 加工顔料、並びに、それを用いた顔料分散組成物、着色感光性組成物、カラーフィルター、当該カラーフィルターを備える液晶表示素子、及び固体撮像素子 | |
JP2009079121A (ja) | 顔料分散組成物、光硬化性組成物、カラーフィルタ及びカラーフィルタの製造方法 | |
JP2012172003A (ja) | 着色組成物の製造方法、着色組成物、カラーフィルタ、液晶表示装置、及び有機el表示装置 | |
JP2009079148A (ja) | 加工顔料、顔料分散組成物、着色感光性組成物、カラーフィルタ、液晶表示素子、及び固体撮像素子 | |
JP2009292991A (ja) | 加工顔料、並びに、それを用いた顔料分散組成物、着色感光性組成物、カラーフィルタ、液晶表示素子、及び固体撮像素子 | |
JP5224764B2 (ja) | 顔料分散組成物、光硬化性組成物、カラーフィルタ、液晶表示素子および固体撮像素子 | |
JP5917982B2 (ja) | 着色感光性組成物、カラーフィルタ及びその製造方法、並びに表示装置 | |
TWI542645B (zh) | 顏料分散組成物、光硬化性組成物、彩色濾光片、液晶顯示元件、固體攝像元件、彩色濾光片之製法、及顏料分散組成物之製法 | |
JP2009102532A (ja) | 着色組成物、着色光硬化性組成物、カラーフィルタ、液晶表示装置、及び固体撮像素子 | |
JP2010077402A (ja) | 顔料分散組成物、光硬化性組成物、カラーフィルタ、及び液晶表示装置 | |
JP2009084430A (ja) | 加工顔料,顔料分散組成物,着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |