TWI442186B - 光阻底層膜用組成物及雙鑲嵌結構之形成方法 - Google Patents

光阻底層膜用組成物及雙鑲嵌結構之形成方法 Download PDF

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Publication number
TWI442186B
TWI442186B TW97111054A TW97111054A TWI442186B TW I442186 B TWI442186 B TW I442186B TW 97111054 A TW97111054 A TW 97111054A TW 97111054 A TW97111054 A TW 97111054A TW I442186 B TWI442186 B TW I442186B
Authority
TW
Taiwan
Prior art keywords
photoresist
group
film
underlayer film
composition
Prior art date
Application number
TW97111054A
Other languages
English (en)
Chinese (zh)
Other versions
TW200848937A (en
Inventor
Nakaatsu Yoshimura
Norihiro Natsume
Yousuke Konno
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200848937A publication Critical patent/TW200848937A/zh
Application granted granted Critical
Publication of TWI442186B publication Critical patent/TWI442186B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
TW97111054A 2007-03-28 2008-03-27 光阻底層膜用組成物及雙鑲嵌結構之形成方法 TWI442186B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007086001 2007-03-28

Publications (2)

Publication Number Publication Date
TW200848937A TW200848937A (en) 2008-12-16
TWI442186B true TWI442186B (zh) 2014-06-21

Family

ID=39788598

Family Applications (1)

Application Number Title Priority Date Filing Date
TW97111054A TWI442186B (zh) 2007-03-28 2008-03-27 光阻底層膜用組成物及雙鑲嵌結構之形成方法

Country Status (3)

Country Link
JP (1) JP5177132B2 (fr)
TW (1) TWI442186B (fr)
WO (1) WO2008117867A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5229025B2 (ja) * 2009-03-13 2013-07-03 Ｊｓｒ株式会社 パターン形成方法及び平坦化膜形成用組成物
JP5319373B2 (ja) * 2009-04-10 2013-10-16 富士フイルム株式会社 ガスバリアフィルムおよびガスバリアフィルムの製造方法
TWI690270B (zh) 2013-12-18 2020-04-11 日商不二製油股份有限公司 類啤酒發泡性飲料之製造方法
US9678427B2 (en) 2013-12-27 2017-06-13 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
WO2019009143A1 (fr) * 2017-07-04 2019-01-10 富士フイルム株式会社 Procédé de fabrication d'élément récepteur d'infrarouges, procédé de fabrication de capteur optique, stratifié, composition de photorésine et kit
TW202040276A (zh) * 2019-02-07 2020-11-01 日商三井化學股份有限公司 底層膜形成用材料、抗蝕劑底層膜及積層體

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0950130A (ja) * 1995-08-04 1997-02-18 Sumitomo Chem Co Ltd 感光性樹脂用反射防止下地材料組成物
JP3506357B2 (ja) * 1996-12-13 2004-03-15 東京応化工業株式会社 リソグラフィー用下地材
JP4117871B2 (ja) * 2000-11-09 2008-07-16 東京応化工業株式会社 反射防止膜形成用組成物
JP2004014841A (ja) * 2002-06-07 2004-01-15 Fujitsu Ltd 半導体装置及びその製造方法
JP5047504B2 (ja) * 2005-02-05 2012-10-10 三星電子株式会社 ビアキャッピング保護膜を使用する半導体素子のデュアルダマシン配線の製造方法

Also Published As

Publication number Publication date
JPWO2008117867A1 (ja) 2010-07-15
TW200848937A (en) 2008-12-16
JP5177132B2 (ja) 2013-04-03
WO2008117867A1 (fr) 2008-10-02

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