TWI436702B - Substrate bonding apparatus and method for controlling the same - Google Patents

Substrate bonding apparatus and method for controlling the same Download PDF

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TWI436702B
TWI436702B TW097127562A TW97127562A TWI436702B TW I436702 B TWI436702 B TW I436702B TW 097127562 A TW097127562 A TW 097127562A TW 97127562 A TW97127562 A TW 97127562A TW I436702 B TWI436702 B TW I436702B
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substrate
adsorption
adhesive
bonding apparatus
adhesive member
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TW200915939A (en
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Takao Kojima
Taizou Inada
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Ulvac Inc
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Priority claimed from JP2008045000A external-priority patent/JP4465393B2/en
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133354Arrangements for aligning or assembling substrates

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
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Description

基板貼合裝置及基板貼合裝置之控制方法Substrate bonding device and method for controlling substrate bonding device

本發明係關於基板貼合裝置及基板貼合裝置之控制方法,詳言之,係關於進行使用於液晶等之平板顯示器(FDP:Flat Panel Display)之2片基板之貼合時所適於使用的基板貼合裝置及基板貼合裝置之控制方法。The present invention relates to a method of controlling a substrate bonding apparatus and a substrate bonding apparatus, and more specifically, it is suitable for use in bonding two substrates of a flat panel display (FDP: Flat Panel Display) used for liquid crystal or the like. The substrate bonding apparatus and the method of controlling the substrate bonding apparatus.

以往,作為平板顯示器之一種,例如已知悉液晶顯示器(LCD:Liquid Crystal Display)。液晶顯示器面板(液晶面板),一般係將複數個TFT(薄膜電晶體)形成陣列狀之陣列基板、以及形成有彩色濾光片(紅、緑、藍)或遮光膜等之彩色濾光片基板以極狹窄之間隔(數μm程度)對向設置,且將液晶封入於該等2片基板間來製造。又,遮光膜之使用目的,係為了增加對比,或使TFT遮光以防止光漏電流之產生。然後,陣列基板與彩色濾光基板則以密封材料貼合。Conventionally, as one type of flat panel display, for example, a liquid crystal display (LCD) has been known. A liquid crystal display panel (liquid crystal panel) generally has a plurality of TFTs (thin film transistors) formed into an array substrate array, and a color filter substrate on which color filters (red, green, blue) or light shielding films are formed. It is manufactured by placing it in an extremely narrow interval (a few μm) and sealing the liquid crystal between the two substrates. Moreover, the purpose of the light-shielding film is to increase the contrast or to shield the TFT from light to prevent the generation of light leakage current. Then, the array substrate and the color filter substrate are bonded together with a sealing material.

此種2片基板之貼合,係使用基板貼合裝置進行。基板貼合裝置,具備彼此對向配置於處理室內之上保持板與下保持板。於該基板貼合裝置,使上保持板與下保持板彼此接近而進行2片基板之貼合時,需要一邊精密地保持兩保持板之平行度、一邊將基板間之厚度方向之間隔於基板面內均勻地保持。例如於專利文獻1所記載之基板貼合裝置,設置複數個黏著片於各保持板之基板保持面,各保持板,藉由在處理室內承接藉由複數個吸附墊吸附之基板, 並使該基板接觸於基板保持面,以黏著力保持基板。The bonding of such two substrates is performed using a substrate bonding apparatus. The substrate bonding apparatus is provided with a holding plate and a lower holding plate which are disposed opposite to each other in the processing chamber. In the substrate bonding apparatus, when the upper holding plate and the lower holding plate are brought close to each other and the two substrates are bonded together, it is necessary to precisely maintain the parallelism between the two holding plates while spacing the thickness direction between the substrates to the substrate. Keep it evenly in the face. For example, in the substrate bonding apparatus described in Patent Document 1, a plurality of adhesive sheets are provided on the substrate holding surface of each of the holding sheets, and each of the holding sheets receives a substrate adsorbed by a plurality of adsorption pads in the processing chamber. The substrate is brought into contact with the substrate holding surface to hold the substrate with an adhesive force.

(專利文獻1)日本特開2005-351961號公報(Patent Document 1) Japanese Patent Laid-Open Publication No. 2005-351961

然而,該專利文獻1所記載之基板貼合裝置,吸附墊所保持之基板會因自重等而撓曲,因在此狀態下使基板接觸於基板保持面,故基板會在撓曲之狀態下保持於保持板。然而,將基板保持於保持板之狀態下於保持板上修正該基板之撓曲係非常困難的。並且,若在如上述基板撓曲之狀態下進行2片基板之貼合,移位則變大,而會產生各像素之開口率之減少或來自遮光部之漏光等的不良之問題。特別,近年來,所製造之貼合基板已往大型化發展,上述問題越來越顯著。However, in the substrate bonding apparatus described in Patent Document 1, the substrate held by the adsorption pad is deflected by its own weight or the like, and the substrate is brought into contact with the substrate holding surface in this state, so that the substrate is in a state of being deflected. Keep on the retaining plate. However, it is very difficult to correct the deflection of the substrate on the holding plate while holding the substrate in the holding plate. In addition, when the two substrates are bonded in a state in which the substrate is deflected, the displacement is increased, and there is a problem that the aperture ratio of each pixel is reduced or the light leakage from the light shielding portion is poor. In particular, in recent years, the manufactured bonded substrates have been developed in size, and the above problems have become more and more remarkable.

本發明係有鑒於此種實情而為,其目的在於提供:能以高平面度之狀態保持基板的基板貼合裝置及基板貼合裝置之控制方法。The present invention has been made in view of such circumstances, and an object thereof is to provide a substrate bonding apparatus and a substrate bonding apparatus capable of holding a substrate in a state of high flatness.

為解決上述課題,其第1態樣,係提供一種基板貼合裝置,係於大氣壓下之處理室內將第1基板保持於上保持板且將第2基板保持於下保持板,使該處理室內減壓以貼合該第1基板與該第2基板,其特徵在於,具備:移動機構部,具有:吸附該第1基板之複數個吸附墊;及使該複數個吸附墊上升以使該第1基板移動至該上保持板附近的第1移動手段;及黏著機構部,配置於該複數個吸附墊間,安裝於該上保持板之上固定座;該黏著機構部,包含:加 壓板,配置於該複數個吸附墊間,具有複數個貫通孔;黏著構件,以較該加壓板之下面突出於下方的方式設置於該加壓板;複數個吸附頭,分別配置於該複數個貫通孔內,且以能從該加壓板之下面向下方進出之方式支撐於該黏著機構部,能吸附藉由該移動機構部移動至該加壓板附近之該第1基板;及第2移動手段,係使該複數個吸附頭上升,以使該複數個吸附頭所吸附之該第1基板黏著於該黏著構件。In order to solve the above problems, a first aspect of the invention provides a substrate bonding apparatus in which a first substrate is held by an upper holding plate and a second substrate is held by a lower holding plate in a processing chamber under atmospheric pressure, and the processing chamber is placed in the processing chamber. The first substrate and the second substrate are bonded together under reduced pressure, and the moving mechanism portion includes a plurality of adsorption pads that adsorb the first substrate, and raises the plurality of adsorption pads to cause the first substrate a first moving means for moving the substrate to the vicinity of the upper holding plate; and an adhesive mechanism portion disposed between the plurality of adsorption pads and mounted on the upper holding plate; the adhesive mechanism portion includes: The pressure plate is disposed between the plurality of adsorption pads and has a plurality of through holes; the adhesive member is disposed on the pressure plate so as to protrude below the pressure plate; the plurality of adsorption heads are respectively disposed on the plurality of adsorption heads The inside of the through hole is supported by the adhesive mechanism portion so as to be able to move in and out from the lower surface of the pressure plate, and the first substrate can be adsorbed by the moving mechanism portion to the vicinity of the pressure plate; The moving means is configured to raise the plurality of adsorption heads so that the first substrate adsorbed by the plurality of adsorption heads adheres to the adhesive member.

其第2態樣,係提供一種基板貼合裝置,係於大氣壓下之處理室內將第1基板保持於上保持板且將第2基板保持於下保持板,使該處理室內減壓以貼合該第1基板與該第2基板,其特徵在於,具備:移動機構部,具有:吸附該第1基板之複數個吸附墊;及使該複數個吸附墊上升以使該第1基板移動至該上保持板附近的第1移動手段;及黏著機構部,配置於該複數個吸附墊間,安裝於該上保持板之上固定座;該黏著機構部,包含:加壓板,配置於該複數個吸附墊間,具有複數個貫通孔;黏著構件,於該加壓板之下面設置成與該加壓板之下面成為同一平面狀;複數個吸附頭,分別配置於該複數個貫通孔內,且被該黏著機構部支撐成能從該加壓板之下面向下方進出,能吸附藉由該移動機構部移動至該加壓板附近之該第1基板;及第2移動手段,係上升該複數個吸附頭,以使藉由該複數個吸附頭吸附之該第1基板黏著於該黏著構件。In a second aspect, a substrate bonding apparatus is provided in which a first substrate is held by an upper holding plate in a processing chamber under atmospheric pressure, and a second substrate is held by a lower holding plate, and the processing chamber is decompressed to fit. The first substrate and the second substrate are characterized in that the moving mechanism portion includes a plurality of adsorption pads that adsorb the first substrate, and raises the plurality of adsorption pads to move the first substrate to the first substrate a first moving means in the vicinity of the upper holding plate; and an adhesive mechanism portion disposed between the plurality of adsorption pads and mounted on the upper holding plate; the adhesive mechanism portion includes a pressure plate disposed in the plurality Between the adsorption pads, there are a plurality of through holes; the adhesive member is disposed under the pressure plate so as to be flush with the lower surface of the pressure plate; and a plurality of adsorption heads are respectively disposed in the plurality of through holes, And being supported by the adhesive mechanism portion so as to be able to move in and out from the lower surface of the pressure plate, and to adsorb the first substrate moved to the vicinity of the pressure plate by the moving mechanism portion; and the second moving means is raised a plurality of adsorption heads, The first substrate adsorbed by the plurality of adsorption heads is adhered to the adhesive member.

其第3態樣,係提供一種基板貼合裝置之控制方法, 該基板貼合裝置,係於大氣壓下之處理室內將第1基板保持於上保持板且將第2基板保持於下保持板,使該處理室內減壓以貼合該第1基板與該第2基板,其特徵在於,具備:藉由複數個吸附墊吸附搬入於大氣壓下之該處理室內之該第1基板的步驟;藉由在該複數個吸附墊吸附該第1基板之狀態下使該複數個吸附墊上升,以使該第1基板移動至安裝於該上保持板之上固定座之黏著機構部附近的步驟,該黏著機構部,包含配置於該複數個吸附墊間之加壓板;設置於該加壓板,以較該加壓板之下面突出於下方的方式設置於該加壓板的黏著構件;及複數個吸附頭,以能從該加壓板之下面向下方進出之方式支撐於該黏著機構部;藉由該複數個吸附頭吸附移動至該黏著機構部附近之該第1基板的步驟;及藉由在該複數個吸附頭吸附該第1基板之狀態下使該複數個吸附頭上升,使該第1基板黏著於該黏著構件的步驟。The third aspect thereof provides a method for controlling a substrate bonding apparatus. In the substrate bonding apparatus, the first substrate is held by the upper holding plate in the processing chamber under atmospheric pressure, and the second substrate is held by the lower holding plate, and the processing chamber is depressurized to bond the first substrate and the second substrate. a substrate comprising: a step of adsorbing and loading the first substrate in the processing chamber under atmospheric pressure by a plurality of adsorption pads; and applying the first substrate to the plurality of adsorption pads The adsorption pad is raised to move the first substrate to a vicinity of an adhesive mechanism portion attached to the upper holder of the upper holding plate, and the adhesive mechanism portion includes a pressure plate disposed between the plurality of adsorption pads; Provided on the pressing plate, the adhesive member disposed on the pressing plate in a manner that protrudes below the lower surface of the pressing plate; and a plurality of adsorption heads so as to be able to enter and exit downward from the lower surface of the pressing plate Supporting the adhesive mechanism portion; the step of adsorbing and moving the first substrate in the vicinity of the adhesive mechanism portion by the plurality of adsorption heads; and making the plural substrate in a state in which the first substrate is adsorbed by the plurality of adsorption heads Adsorption head The step of the first substrate is adhered to the adhesive member.

根據本發明,能提供能以高平面度之狀態保持基板的基板貼合裝置及基板貼合裝置之控制方法。According to the present invention, it is possible to provide a substrate bonding apparatus and a substrate bonding apparatus capable of holding a substrate in a state of high flatness.

(第1實施形態)(First embodiment)

以下,根據圖式說明本發明第1實施形態之基板貼合裝置。Hereinafter, a substrate bonding apparatus according to a first embodiment of the present invention will be described with reference to the drawings.

圖1係表示面板製造裝置之整體概略構成的方塊圖,該面板製造裝置係將2片基板貼合來製造平板顯示器(FDP) 等面板。又,於第1實施形態,列舉製造主動矩陣型液晶面板之面板製造裝置為例說明。1 is a block diagram showing an overall schematic configuration of a panel manufacturing apparatus for bonding two substrates to manufacture a flat panel display (FDP). Wait for the panel. Moreover, in the first embodiment, a panel manufacturing apparatus for manufacturing an active matrix liquid crystal panel will be described as an example.

於該面板製造裝置,供應構成液晶面板之2種類基板W1、W2。第1基板W1,係形成TFT等之陣列基板(TFT基板),第2基板W2,係形成彩色濾光片或遮光膜等之彩色濾光基板。第1及第2之基板W1、W2,以各自之製程作成,而後供應至面板製造裝置。In the panel manufacturing apparatus, two types of substrates W1 and W2 constituting a liquid crystal panel are supplied. The first substrate W1 is formed as an array substrate (TFT substrate) such as a TFT, and the second substrate W2 is a color filter substrate such as a color filter or a light shielding film. The first and second substrates W1 and W2 are formed by respective processes and then supplied to the panel manufacturing apparatus.

第1及第2之基板W1、W2,首先供應至密封描繪裝置11。該密封描繪裝置11,對第1及第2之基板W1、W2中之任一基板上面,於第1實施形態係在第2基板W2上面(內面),將紫外線硬化性樹脂所組成之密封材料塗成框狀。然後,將第1基板W1與已塗布密封材料之第2基板W2,藉由搬運裝置21搬運至下一個液晶滴下裝置12。The first and second substrates W1 and W2 are first supplied to the seal drawing device 11. In the seal drawing device 11, the upper surface of one of the first and second substrates W1 and W2 is sealed on the upper surface (inner surface) of the second substrate W2 in the first embodiment, and the ultraviolet curable resin is sealed. The material is painted in a frame shape. Then, the first substrate W1 and the second substrate W2 to which the sealing material has been applied are transported to the next liquid crystal dropping device 12 by the transport device 21.

液晶滴下裝置12,將液晶滴下於已塗布該密封材料之第2基板W2上面的預先設定之複數個既定位置。然後,第1基板W1與已滴下液晶之第2基板W2,藉由搬運裝置22,搬運至下一個基板貼合裝置13之按壓裝置14。The liquid crystal dropping device 12 drops the liquid crystal onto a predetermined plurality of predetermined positions on the upper surface of the second substrate W2 to which the sealing material has been applied. Then, the first substrate W1 and the second substrate W2 from which the liquid crystal has been dropped are transported to the pressing device 14 of the next substrate bonding apparatus 13 by the transport device 22.

按壓裝置14,具備作處理室用之室31(參照圖2)。於室31內,配設至少1個黏著機構部52(於第1實施形態為複數個黏著機構部52),與載台42。又,於第1實施形態,例如按壓裝置14,係藉由載台42保持第2基板W2,藉由複數個黏著機構部52保持第1基板W1後,使室31內減壓(真空排氣)。The pressing device 14 is provided with a chamber 31 for processing a chamber (see Fig. 2). At least one adhesive mechanism portion 52 (in the first embodiment, a plurality of adhesive mechanism portions 52) is disposed in the chamber 31, and the stage 42 is disposed. Further, in the first embodiment, for example, the pressing device 14 holds the second substrate W2 by the stage 42, and the first substrate W1 is held by the plurality of bonding mechanism portions 52, and the inside of the chamber 31 is decompressed (vacuum exhaust) ).

其次,按壓裝置14,使用設置於第1及第2基板W1、 W2之未圖示之對準標記以光學方式進行該等兩基板W1、W2之位置對準。接著,對準位置後,對兩基板W1、W2施加既定壓力,將該等兩基板W1、W2按壓至既定之基板間隔後,使室31內開放(大氣導入)。藉此,兩基板W1、W2,因大氣壓與兩基板W1、W2間壓力之壓力差,進而被壓至既定之單元(cell)厚度。如此貼合2片基板W1、W2而作成之貼合基板W3(例如參照圖12)則藉由搬運裝置23,搬運至下一個硬化裝置15。Next, the pressing device 14 is disposed on the first and second substrates W1. An alignment mark (not shown) of W2 optically positions the two substrates W1 and W2 in alignment. Next, after the position is aligned, a predetermined pressure is applied to the both substrates W1 and W2, and the two substrates W1 and W2 are pressed to a predetermined substrate interval, and then the inside of the chamber 31 is opened (atmospheric introduction). Thereby, the two substrates W1 and W2 are further pressed to a predetermined cell thickness due to the pressure difference between the atmospheric pressure and the pressure between the substrates W1 and W2. The bonded substrate W3 (see, for example, FIG. 12) which is formed by bonding the two substrates W1 and W2 in this manner is transported to the next curing device 15 by the transport device 23.

硬化裝置15,具備照射紫外線(UV)之燈,將來自該燈之紫外線透過未圖示之遮光罩照射於該貼合基板W3。遮光罩,藉由防止紫外線照射於液晶等,僅使密封材料硬化。如此,密封材料已硬化之貼合基板W3(液晶面板),藉由搬運裝置24搬運至下一個檢查裝置16。The curing device 15 is provided with a lamp that emits ultraviolet rays (UV), and transmits ultraviolet rays from the lamp to the bonding substrate W3 through a hood (not shown). The hood is only used to cure the sealing material by preventing ultraviolet rays from being irradiated onto the liquid crystal or the like. Thus, the bonded substrate W3 (liquid crystal panel) whose sealing material has been hardened is transported to the next inspection device 16 by the transport device 24.

檢查裝置16,測定貼合基板W3之2片基板間之移位,並將其測定值輸出至控制裝置17。控制裝置17,根據該檢查裝置16之測定值,進行該按壓裝置14之位置對準修正等之控制。例如控制裝置17,將貼合基板W3所產生之移位量,藉由朝與其移位方向相反之方向預先錯開,來實施該位置對準修正。藉此,防止下一個要製造之液晶面板之移位。The inspection device 16 measures the displacement between the two substrates of the bonded substrate W3, and outputs the measured value to the control device 17. The control device 17 performs control such as alignment correction of the pressing device 14 based on the measured value of the inspection device 16. For example, the control device 17 performs the positional alignment correction by shifting the amount of displacement generated by the bonded substrate W3 in the direction opposite to the direction in which it is displaced. Thereby, the displacement of the next liquid crystal panel to be manufactured is prevented.

其次詳細說明按壓裝置14。Next, the pressing device 14 will be described in detail.

如圖2所示,按壓裝置14之室31,由上側容器32與下側容器33構成。上側容器32,藉由未圖示之致動器等之驅動機構而能相對下側容器33上下移動。且,當上側容器 32之側緣部下降至抵接於下側容器33之側緣部,即會藉由上側容器32與下側容器33所密封之空間形成處理室(室31)。又,於下側容器33之側緣部,在與上側容器32之側緣部的抵接面安裝O型環34,以該O型環34確保室31之氣密性。As shown in FIG. 2, the chamber 31 of the pressing device 14 is composed of an upper container 32 and a lower container 33. The upper container 32 can be moved up and down with respect to the lower container 33 by a drive mechanism such as an actuator (not shown). And when the upper container The side edge portion of 32 is lowered to abut against the side edge portion of the lower container 33, that is, the processing chamber (chamber 31) is formed by the space sealed by the upper container 32 and the lower container 33. Further, an O-ring 34 is attached to the side edge portion of the lower container 33 at a contact surface with the side edge portion of the upper container 32, and the O-ring 34 ensures the airtightness of the chamber 31.

於下側容器33上,透過下固定座41配設載台42。又,於第1實施形態,藉由下固定座41與載台42構成下保持板。於下側容器33內,以能升降之方式支撐用以對載台42進行第2基板W2之交接的下基板保持裝置43。如圖3所示,下基板保持裝置43,藉由將複數個支持棒44之兩端部以連結框45連結形成為柵狀。於載台42,當下基板保持裝置43下降至最下限時,以不使各支持棒44露出載台42之上面之方式,形成有收容各支持棒44之收容槽42a。再者,於構成下基板保持裝置43之連結框45之一側,向上突出有支撐搬運裝置22(上部臂104,參照圖2)之前端以防止上部臂104因自重下垂的撓曲防止片46。A stage 42 is disposed on the lower container 33 through the lower holder 41. Further, in the first embodiment, the lower holder 41 and the stage 42 constitute a lower holding plate. The lower substrate holding device 43 for transferring the second substrate W2 to the stage 42 is supported in the lower container 33 so as to be movable up and down. As shown in FIG. 3, the lower substrate holding device 43 is formed in a grid shape by connecting both end portions of the plurality of support bars 44 by a connecting frame 45. In the stage 42, when the lower substrate holding device 43 is lowered to the lowermost limit, the receiving grooves 42a for accommodating the respective support bars 44 are formed so that the support bars 44 are not exposed to the upper surface of the stage 42. Further, on one side of the connecting frame 45 constituting the lower substrate holding device 43, a front end of the supporting conveyance device 22 (the upper arm 104, see FIG. 2) is protruded upward to prevent the upper arm 104 from sagging due to its own weight. .

如圖3及圖4所示,於載台42上面且與第2基板W2之抵接面,形成有用以真空吸附第2基板W2之複數個吸附孔42b,且安裝由多孔狀並具有通氣性,表面摩擦係數0.3~0.4程度之例如聚乙稀等構成的複數個多孔質片47。各吸附孔42b,連通於用以對各吸附孔42b分別供應負壓之管路42c,且,該管路42c,透過配設於室31外之閥48連接於負壓源49。閥48及負壓源49,藉由控制部35控制其動作而真空吸附第2基板W2。又,多孔質片47,於第1實施 形態係以大約300~500 μm之厚度形成,且安裝於不覆蓋形成在載台42之收容槽42a的位置。因此,第2基板W2,透過吸附孔42b真空吸附,且亦藉由多孔質片47之靜止摩擦阻力保持。As shown in FIG. 3 and FIG. 4, a plurality of adsorption holes 42b for vacuum-adsorbing the second substrate W2 are formed on the upper surface of the stage 42 and on the contact surface with the second substrate W2, and the surface is porous and ventilated. A plurality of porous sheets 47 made of, for example, polyethylene or the like having a surface friction coefficient of 0.3 to 0.4. Each of the adsorption holes 42b is connected to a line 42c for supplying a negative pressure to each of the adsorption holes 42b, and the line 42c is connected to the negative pressure source 49 through a valve 48 disposed outside the chamber 31. The valve 48 and the negative pressure source 49 are controlled by the control unit 35 to vacuum-adsorb the second substrate W2. Moreover, the porous sheet 47 is in the first embodiment. The form is formed to a thickness of about 300 to 500 μm, and is attached to a position where the receiving groove 42a formed in the stage 42 is not covered. Therefore, the second substrate W2 is vacuum-adsorbed through the adsorption holes 42b, and is also held by the static frictional resistance of the porous sheet 47.

另一方面,如圖2所示,於上側容器32內支撐上固定座51,且於該上固定座51之下面安裝複數個黏著機構部52。又,於第1實施形態,藉由上固定座51與複數個黏著機構部52構成上保持板。上固定座51,於上側容器32之上方,從包含馬達之驅動裝置53透過懸吊軸54懸吊支撐,藉由驅動裝置53之動作於上側容器32之下方升降。On the other hand, as shown in FIG. 2, the upper fixing base 51 is supported in the upper container 32, and a plurality of adhesive mechanism portions 52 are attached to the lower surface of the upper fixing base 51. Further, in the first embodiment, the upper holding base 51 and the plurality of adhesive mechanism portions 52 constitute the upper holding plate. The upper fixing base 51 is suspended from the driving device 53 including the motor through the suspension shaft 54 above the upper container 32, and is lifted and lowered by the driving device 53 below the upper container 32.

於黏著機構部52之下方配設能使第1基板W1移動至黏著機構部52附近之上基板保持裝置55。如圖5所示,上基板保持裝置55含有複數個支持棒56,與下基板保持裝置43同樣,藉由將該等複數個支持棒56之兩端部以連結桿57連結而形成為柵狀。於各支持棒56,設置向下方開口之複數個吸附墊58(參照圖2)。第1實施形態,於上固定座51之下面,將複數個黏著機構部52配置成陣列狀。又,各黏著機構部52係同樣構成。各收容槽52a,配置於彼此鄰接(圖5中鄰接於上下方向)之黏著機構部52間,使上基板保持裝置55之支持棒56(吸附墊58)收容於黏著機構部52之下面(圖6、7所示之加壓板71之下面73)上方之位置。因此,當上基板保持裝置55上升至最上限時,使支持棒56收容於收容槽52a內而不從黏著機構部52下面往下方露出。如圖2所示,於上基板保持裝置55之兩側部,安裝貫 通上側容器32向上方延伸之支軸59,該支軸59之上端部透過可撓曲聯結器60懸吊支撐於升降軸61。並且,升降軸61根據驅動裝置53之控制升降。又,於第1實施形態,由支軸59、可撓曲聯結器60及升降軸61構成支持手段,上基板保持裝置55根據驅動裝置53之控制進行升降動作。又,由驅動裝置53、上基板保持裝置55、及支持手段(支軸59、可撓曲聯結器60及升降軸61)構成第1移動手段。再者,由第1移動手段(驅動裝置53、上基板保持裝置55、可撓曲聯結器60及升降軸61)與吸附墊58構成移動機構部。A substrate holding device 55 that can move the first substrate W1 to the vicinity of the adhesive mechanism portion 52 is disposed below the adhesive mechanism portion 52. As shown in FIG. 5, the upper substrate holding device 55 includes a plurality of support bars 56. Similarly to the lower substrate holding device 43, the both ends of the plurality of support bars 56 are connected by a connecting rod 57 to form a grid. . Each of the support bars 56 is provided with a plurality of adsorption pads 58 (see FIG. 2) that are opened downward. In the first embodiment, a plurality of the adhesive mechanism portions 52 are arranged in an array on the lower surface of the upper holder 51. Further, each of the adhesive mechanism portions 52 has the same configuration. Each of the storage grooves 52a is disposed between the adhesive mechanism portions 52 adjacent to each other (adjacent to the vertical direction in FIG. 5), and the support rods 56 (adsorption pads 58) of the upper substrate holding device 55 are housed under the adhesive mechanism portion 52 (Fig. 6,7 shows the position above the lower surface 73) of the pressure plate 71. Therefore, when the upper substrate holding device 55 is raised to the uppermost limit, the support rod 56 is housed in the storage groove 52a without being exposed downward from the lower surface of the adhesive mechanism portion 52. As shown in FIG. 2, on both sides of the upper substrate holding device 55, the mounting is performed. A support shaft 59 extending upwardly through the upper container 32, and an upper end portion of the support shaft 59 is suspended and supported by the lift shaft 61 through the flexible coupling 60. Further, the elevating shaft 61 is raised and lowered in accordance with the control of the driving device 53. Further, in the first embodiment, the support shaft 59, the flexible coupling 60, and the lifting shaft 61 constitute a supporting means, and the upper substrate holding device 55 performs the lifting operation in accordance with the control of the driving device 53. Further, the driving device 53, the upper substrate holding device 55, and the supporting means (the support shaft 59, the flexible coupling 60, and the lifting shaft 61) constitute a first moving means. Further, the first moving means (the driving device 53, the upper substrate holding device 55, the flexible coupling 60, and the lifting shaft 61) and the suction pad 58 constitute a moving mechanism portion.

上基板保持裝置55,藉由可撓曲聯結器60支撐成可相對升降軸61沿水平方向移動。該可撓曲聯結器60,為了要修正保持於黏著機構部52之第1基板W1之水平方向之移位而進行位置對準處理時,容許黏著機構部52與上基板保持裝置55之水平方向之相對移動。The upper substrate holding device 55 is supported by the flexible coupling 60 so as to be movable in the horizontal direction with respect to the lifting shaft 61. The flexible coupling 60 allows the horizontal direction of the adhesive mechanism portion 52 and the upper substrate holding device 55 when the alignment process is performed to correct the displacement of the first substrate W1 held by the adhesive mechanism portion 52 in the horizontal direction. Relative movement.

如圖6及圖7所示,各黏著機構部52具備加壓板71。圖6係表示設置於1個黏著機構部52之1個加壓板71。又,於其他黏著機構部52,亦同樣設置圖6所示之加壓板71。各加壓板71,配置於對應之黏著機構部52之兩側(於圖5上下方向兩側)所在的2個支持棒56間。因此,各加壓板71,配置於鄰接在該加壓板71之複數個吸附墊間。於各加壓板71形成有複數個(於圖6例如8個)之貫通孔72。於第1實施形態,複數個貫通孔72,以既定間隔於加壓板71之面內排列成四角框狀。於加壓板71之下面73,安裝鄰接於各貫通孔72且包圍各貫通孔72全周之圓環狀黏著構件 74。於第1實施形態,各黏著構件74,在較加壓板71之下面73突出於下方之狀態下,固定於加壓板71之下面73。又,存在黏著構件74之加壓板71之區域,規定為接觸區域T。該接觸區域T,係當黏著機構部52之吸附墊75(後述)一邊吸附第1基板W1一邊上升時,第1基板W1與黏著構件74彼此接觸之區域。詳言之,於黏著構件74(即接觸區域T)形成有分別具有大致半球形狀之複數個保持突部74a(保持部),使該等保持突部74a接觸於第1基板W1。較佳為,如圖6所示,複數個保持突部74a,環狀排列於黏著構件74上。黏著構件74,例如藉由接著構件(圖示略)固定於加壓板71之下面73。黏著構件74,較佳為由聚丁橡膠構成,能暫時保持基板且能迅速剥離。As shown in FIGS. 6 and 7, each of the adhesive mechanism portions 52 is provided with a pressure plate 71. FIG. 6 shows one pressure plate 71 provided in one of the adhesive mechanism portions 52. Further, the pressure plate 71 shown in Fig. 6 is also provided in the other adhesive mechanism portion 52. Each of the pressing plates 71 is disposed between the two support bars 56 on both sides of the corresponding adhesive mechanism portion 52 (on both sides in the vertical direction of FIG. 5). Therefore, each of the pressure plates 71 is disposed between a plurality of adsorption pads adjacent to the pressure plate 71. A plurality of through holes 72 (for example, eight in FIG. 6) are formed in each of the pressing plates 71. In the first embodiment, the plurality of through holes 72 are arranged in a square frame shape at a predetermined interval in the plane of the pressure plate 71. An annular adhesive member that is adjacent to each of the through holes 72 and surrounds the entire circumference of each of the through holes 72 is attached to the lower surface 73 of the pressure plate 71. 74. In the first embodiment, each of the adhesive members 74 is fixed to the lower surface 73 of the pressure plate 71 in a state in which the lower surface 73 of the pressure plate 71 protrudes downward. Further, the region of the pressure plate 71 of the adhesive member 74 is defined as the contact region T. The contact region T is a region where the first substrate W1 and the adhesive member 74 are in contact with each other when the adsorption pad 75 (described later) of the adhesive mechanism portion 52 is raised while adsorbing the first substrate W1. In detail, a plurality of holding projections 74a (holding portions) each having a substantially hemispherical shape are formed in the adhesive member 74 (that is, the contact region T), and the holding projections 74a are brought into contact with the first substrate W1. Preferably, as shown in FIG. 6, a plurality of holding projections 74a are annularly arranged on the adhesive member 74. The adhesive member 74 is fixed to the lower surface 73 of the pressure plate 71, for example, by a follow-up member (not shown). The adhesive member 74 is preferably made of polybutadiene rubber, and can temporarily hold the substrate and can be quickly peeled off.

黏著機構部52,具備:複數個(即8個)吸附頭75,分別配置於該8個貫通孔72內,藉由黏著機構部52支撐成能從加壓板71之下面向下方進出;及致動器76,使該等8個吸附頭75升降。因此,8個吸附頭75,與8個貫通孔72同樣,以既定間隔於加壓板71之面內排列成四角框狀。各吸附頭75,連通於用以供應負壓之管路77,該管路77,透過配設於室31外之閥78連接於負壓源79(參照圖5)。吸附頭75,能將藉由上基板保持裝置55而移動至黏著機構部52附近之第1基板W1從其上面(外面)側吸附。The adhesive mechanism portion 52 includes a plurality of (ie, eight) adsorption heads 75 disposed in the eight through holes 72, and supported by the adhesive mechanism portion 52 so as to be able to enter and exit from the lower surface of the pressure plate 71; The actuator 76 lifts the eight adsorption heads 75. Therefore, the eight adsorption heads 75 are arranged in a square frame shape at a predetermined interval in the plane of the pressure plate 71, similarly to the eight through holes 72. Each of the adsorption heads 75 is connected to a line 77 for supplying a negative pressure, and the line 77 is connected to a negative pressure source 79 (see FIG. 5) through a valve 78 disposed outside the chamber 31. The adsorption head 75 can adsorb the first substrate W1 moved to the vicinity of the adhesive mechanism portion 52 by the upper substrate holding device 55 from the upper surface (outer surface) side thereof.

如圖7所示,於吸附頭75之下端,向徑方向外側形成有作為吸附部之凸緣部80,且形成有能與第1基板W1接觸之平面狀接觸面81。因此,在吸附頭75之接觸面81吸 附第1基板W1之狀態下第1基板W1與加壓板71彼此成為平行。又,於第1實施形態,吸附部(凸緣部80)之接觸面81形成圓環狀。進而,接觸面81配置於與該圓環狀之黏著構件74同軸上。此構成中,黏著構件74之內周端與吸附頭75之吸附部之外周端的距離(沿徑方向之距離)為全周相等。其結果,藉由吸附頭75緊壓第1基板W1而使第1基板W1從加壓板71剥離之步驟時,能使應力均勻作用於第1基板W1與黏著構件74之間以防止第1基板W1之破損。又,對此基板剥離步驟將予後述。各吸附頭75透過板狀支持構件82連接於致動器76,藉由致動器76之驅動,能使全部吸附頭75同時升降。於第1實施形態,藉由致動器76與支持構件82構成第2移動手段。致動器76藉由控制部35控制,由吸附頭75、致動器76及控制部35構成剥離控制手段。又,第1實施形態之致動器76,藉由將空氣供應於膜片(圖示略)內,使連接於支持構件82之驅動構件(圖示略)沿導件上下移動,藉此使各吸附頭75升降。藉由以螺釘83固定安裝構件84於加壓板71之上面,以螺釘85固定該安裝構件84於上固定座51之下面,將黏著機構部52設置成能拆卸於上固定座51。As shown in FIG. 7, at the lower end of the adsorption head 75, a flange portion 80 as an adsorption portion is formed on the outer side in the radial direction, and a planar contact surface 81 which can be in contact with the first substrate W1 is formed. Therefore, the contact surface 81 of the adsorption head 75 is sucked. The first substrate W1 and the pressure plate 71 are parallel to each other with the first substrate W1 attached. Further, in the first embodiment, the contact surface 81 of the adsorption portion (the flange portion 80) is formed in an annular shape. Further, the contact surface 81 is disposed coaxially with the annular adhesive member 74. In this configuration, the distance between the inner peripheral end of the adhesive member 74 and the outer peripheral end of the adsorption portion of the adsorption head 75 (the distance in the radial direction) is equal to the entire circumference. As a result, when the first substrate W1 is pressed away from the pressure plate 71 by the adsorption head 75, the stress can be uniformly applied between the first substrate W1 and the adhesive member 74 to prevent the first The substrate W1 is broken. Moreover, this substrate peeling step will be described later. Each of the adsorption heads 75 is connected to the actuator 76 through the plate-shaped support member 82, and by the actuation of the actuator 76, all of the adsorption heads 75 can be simultaneously raised and lowered. In the first embodiment, the actuator 76 and the support member 82 constitute a second moving means. The actuator 76 is controlled by the control unit 35, and the adsorption head 75, the actuator 76, and the control unit 35 constitute a peeling control means. Further, in the actuator 76 of the first embodiment, by supplying air into the diaphragm (not shown), the driving member (not shown) connected to the supporting member 82 is moved up and down along the guide, thereby Each of the adsorption heads 75 is raised and lowered. The attachment member 84 is fixed to the upper surface of the pressure plate 71 by screws 83, and the attachment member 84 is fixed to the lower surface of the upper holder 51 by screws 85, so that the adhesion mechanism portion 52 is detachably attached to the upper holder 51.

再者,於加壓板71,形成有複數個吸附孔86於各黏著構件74之間。各吸附孔86連通於用以供應負壓之管路87,該管路87,透過配設於室31外之閥88連接於負壓源89(參照圖5)。閥88之開閉藉由控制部35控制,藉由該閥88及控制部35構成吸附控制手段。因此,第1基板W1,除黏 著構件74之黏著力外亦進一步藉由通過吸附孔86之真空黏著力保持。又,第1基板W1,藉由以吸附頭75緊壓,能從黏著構件74剥離。Further, a plurality of adsorption holes 86 are formed in the pressure plate 71 between the respective adhesive members 74. Each of the adsorption holes 86 is connected to a line 87 for supplying a negative pressure, and the line 87 is connected to a negative pressure source 89 (see FIG. 5) through a valve 88 disposed outside the chamber 31. The opening and closing of the valve 88 is controlled by the control unit 35, and the valve 88 and the control unit 35 constitute an adsorption control means. Therefore, the first substrate W1 is degreased. The adhesion of the member 74 is further maintained by the vacuum adhesion through the adsorption holes 86. Further, the first substrate W1 can be peeled off from the adhesive member 74 by being pressed by the adsorption head 75.

如圖8所示,於室31配設用以供應負壓於該室31內之管路91,且該管路91,透過配設於室31外之閥92連接於負壓源93。並且,管路42c,連通於用以使該管路42c內之壓力(第2基板W2之背壓)為大致與室31內之壓力相等壓力的管路94,且於該管路94設置閥95。又,管路87,連通於用以使該管路87內之壓力(第1基板W1之背壓)為大致與室31內之壓力相等壓力的管路96,且於該管路96設置閥97。該等閥95、97之開閉藉由控制部35(參照圖2)控制。藉由閥95、97及控制部35構成等壓控制手段。As shown in FIG. 8, the chamber 31 is provided with a line 91 for supplying a negative pressure in the chamber 31, and the line 91 is connected to the negative pressure source 93 through a valve 92 disposed outside the chamber 31. Further, the line 42c is connected to a line 94 for making the pressure in the line 42c (back pressure of the second substrate W2) substantially equal to the pressure in the chamber 31, and a valve is provided in the line 94. 95. Further, the line 87 is connected to a line 96 for making the pressure in the line 87 (back pressure of the first substrate W1) substantially equal to the pressure in the chamber 31, and a valve is provided in the line 96. 97. The opening and closing of the valves 95 and 97 is controlled by the control unit 35 (see Fig. 2). The equal pressure control means is constituted by the valves 95, 97 and the control unit 35.

如上述,藉由搬運裝置22搬入第1及第2之基板W1、W2於按壓裝置14。如圖2所示,搬運裝置22,含有保持第1基板W1之第1機器臂101與保持第2基板W2之第2機器臂102。於下基板保持裝置43與上基板保持裝置55之間,藉由第1機器臂101搬入第1基板W1,且藉由第2機器臂102搬入第2基板W2。於第1機器臂101之基端連結主框103,複數支上部臂104與複數支下部臂105從該主框103平行延設。於各上部臂104連結用以吸附第1基板W1之複數個吸附墊106。下部臂105能支撐貼合基板W3。上部臂104較下部臂105為長,當前進於室31內時,上部臂104前端之下面位於下基板保持裝置43之撓曲防止片46之移動軌跡上。As described above, the first and second substrates W1 and W2 are carried into the pressing device 14 by the transport device 22. As shown in FIG. 2, the conveying device 22 includes a first robot arm 101 that holds the first substrate W1 and a second robot arm 102 that holds the second substrate W2. Between the lower substrate holding device 43 and the upper substrate holding device 55, the first substrate arm 101 is carried into the first substrate W1, and the second substrate arm 102 is carried into the second substrate W2. The main frame 103 is coupled to the base end of the first robot arm 101, and a plurality of upper arms 104 and a plurality of lower arms 105 are extended in parallel from the main frame 103. A plurality of adsorption pads 106 for adsorbing the first substrate W1 are coupled to the upper arms 104. The lower arm 105 can support the bonding substrate W3. The upper arm 104 is longer than the lower arm 105. When currently entering the chamber 31, the lower end of the front end of the upper arm 104 is located on the movement locus of the deflection preventing piece 46 of the lower substrate holding device 43.

圖9及圖10係表示保持第1基板W1之第1機器臂101之上部臂104與上基板保持裝置55之室31內的位置關係。如圖10所示,複數支(於第1實施形態,係6支)上部臂104從主框103延設。於各上部臂104設置7個吸附墊106a~106g。又,於各上部臂104透過主框103連結有用以供應負壓之三支管路。三支管路,分別透過配設於主框103外之3個閥107a~107c連接於負壓源108。該閥107a~107c藉由控制部35控制。9 and 10 show the positional relationship between the upper arm 104 of the first robot arm 101 holding the first substrate W1 and the chamber 31 of the upper substrate holding device 55. As shown in FIG. 10, a plurality of upper arms (6 in the first embodiment) are extended from the main frame 103. Seven adsorption pads 106a to 106g are provided in each of the upper arms 104. Further, each of the upper arms 104 is connected to the three pipes for supplying a negative pressure through the main frame 103. The three lines are connected to the negative pressure source 108 through three valves 107a to 107c disposed outside the main frame 103. The valves 107a to 107c are controlled by the control unit 35.

各上部臂104之7個吸附墊106a~106g中位於中央之3個吸附墊106c、106d、106e,藉由閥107c開閉。又,位於3個吸附墊106c、106d、106e之外側的2個吸附墊106b、106f,藉由閥107b開閉。又,7個吸附墊106a~106g中位於最外側之2個吸附墊106a、106g,藉由閥107a開閉。此種控制,對6支各上部臂104係同樣。The three adsorption pads 106c, 106d, and 106e located at the center among the seven adsorption pads 106a to 106g of the upper arms 104 are opened and closed by a valve 107c. Further, the two adsorption pads 106b and 106f located outside the three adsorption pads 106c, 106d, and 106e are opened and closed by the valve 107b. Further, the two adsorption pads 106a and 106g located at the outermost side among the seven adsorption pads 106a to 106g are opened and closed by the valve 107a. This control is the same for each of the six upper arms 104.

將第1基板W1搬入室31內之前,要以上部臂104吸附第1基板W1時,首先使閥107c開啟。藉此,藉由各上部臂104之吸附墊106c、106d、106e,吸附第1基板W1之上面(外面)之中央區域。其次使閥107b開啟。藉此,除各上部臂104之吸附墊106c、106d、106e外另藉由吸附墊106b、106f,吸附第1基板W1之上面之中央區域與位於其外側之中央附近區域。最後使閥107a開啟。藉此,除各上部臂104之吸附墊106c、106d、106e及吸附墊106b、106f外另藉由吸附墊106a、106g,吸附第1基板W1之上面之中央區域,中央附近區域,及更位於其外側之周邊區域。 此時,第1基板W1之上面,藉由各上部臂104之全部吸附墊106a~106g保持。Before the first substrate W1 is carried into the chamber 31, when the upper arm 104 is attracted to the first substrate W1, the valve 107c is first opened. Thereby, the central region of the upper surface (outer surface) of the first substrate W1 is adsorbed by the adsorption pads 106c, 106d, and 106e of the upper arms 104. Next, the valve 107b is opened. Thereby, in addition to the adsorption pads 106c, 106d, and 106e of the upper arms 104, the central regions of the upper surface of the first substrate W1 and the vicinity of the center of the outer side of the first substrate W1 are adsorbed by the adsorption pads 106b and 106f. Finally, the valve 107a is opened. Thereby, in addition to the adsorption pads 106c, 106d, and 106e of the upper arms 104 and the adsorption pads 106b and 106f, the central region of the upper surface of the first substrate W1, the vicinity of the center, and the like are adsorbed by the adsorption pads 106a and 106g. The outer area of the outer side. At this time, the upper surface of the first substrate W1 is held by all of the adsorption pads 106a to 106g of the upper arms 104.

於上基板保持裝置55之各支持棒56設置9個吸附墊58a~58i。又,於各支持棒56,透過連結框57連結用以供應負壓之三支管路。如圖9所示,該等三支管路,分別透過配設於連結框57外之3個閥109a~109c連接於負壓源110。該閥109a~109c藉由控制部35控制。Nine adsorption pads 58a to 58i are provided on each of the support bars 56 of the upper substrate holding device 55. Further, in each of the support bars 56, three pipes for supplying a negative pressure are connected through the connection frame 57. As shown in FIG. 9, the three lines are connected to the negative pressure source 110 through the three valves 109a to 109c disposed outside the connecting frame 57. The valves 109a to 109c are controlled by the control unit 35.

各支持棒56之9個吸附墊58a~58i中位於中央之3個吸附墊58d、58e、58f,以閥109c開閉。又,位於3個吸附墊58d、58e、58f之外側的2個吸附墊58c、58g,以閥109b開閉。位於吸附墊58c、58g更外側之4個吸附墊58a、58b、58h、58i,以閥109a開閉。如上述之控制,對5支各支持棒56亦同樣。The three adsorption pads 58d, 58e, and 58f located at the center among the nine adsorption pads 58a to 58i of each of the support bars 56 are opened and closed by the valve 109c. Further, the two adsorption pads 58c and 58g located outside the three adsorption pads 58d, 58e, and 58f are opened and closed by the valve 109b. The four adsorption pads 58a, 58b, 58h, and 58i located outside the adsorption pads 58c and 58g are opened and closed by the valve 109a. The control as described above is also the same for each of the five support bars 56.

以上基板保持裝置55吸附第1基板W1時,首先使閥109c開啟。藉此,藉由各支持棒56之吸附墊58d、58e、58f,吸附第1基板W1之上面(外面)之中央區域。其次,使閥109b開啟。藉此,除了各支持棒56之吸附墊58d、58e、58f外另藉由吸附墊58c、58g,吸附第1基板W1之上面之中央區域與位於其外側之中央附近區域。最後使閥109a開啟。藉此,除吸附墊58d、58e、58f及吸附墊58c、58g外另藉由吸附墊58a、58b、58h、58i,吸附第1基板W1之上面之中央區域,中央附近區域,及更位於其外側之周邊區域。此時,第1基板W1之上面,藉由上基板保持裝置55之全部吸附墊58a~58i保持。When the substrate holding device 55 adsorbs the first substrate W1, the valve 109c is first opened. Thereby, the central region of the upper surface (outer surface) of the first substrate W1 is adsorbed by the adsorption pads 58d, 58e, and 58f of the respective support bars 56. Next, the valve 109b is opened. Thereby, in addition to the adsorption pads 58d, 58e, and 58f of the support rods 56, the central portion of the upper surface of the first substrate W1 and the region near the center of the outer side of the first substrate W1 are adsorbed by the adsorption pads 58c and 58g. Finally, the valve 109a is opened. Thereby, in addition to the adsorption pads 58d, 58e, 58f and the adsorption pads 58c, 58g, the central region of the upper surface of the first substrate W1, the region near the center, and the like are further adsorbed by the adsorption pads 58a, 58b, 58h, 58i. The outer area of the outer side. At this time, the upper surface of the first substrate W1 is held by all of the adsorption pads 58a to 58i of the upper substrate holding device 55.

圖11係表示上基板保持裝置55之吸附墊58a的具體構成。其他吸附墊58b~58i及該第1機器臂101之吸附墊106亦係同樣之構成。於支持棒56內將抵接構件111支撐成能沿上下方向移動,且於該抵接構件111插通用以供應負壓之輸出管112。輸出管112,於支持棒56內,形成有抵接於抵接構件111之凸緣113。於支持棒56外,在輸出管112之前端安裝形成為蛇腹狀之吸附墊58a。Fig. 11 shows a specific configuration of the adsorption pad 58a of the upper substrate holding device 55. The other adsorption pads 58b to 58i and the adsorption pads 106 of the first robot arm 101 are also configured in the same manner. The abutting member 111 is supported in the support rod 56 so as to be movable in the up and down direction, and the abutting member 111 is inserted in common to supply the negative pressure output pipe 112. The output pipe 112 is formed in the support rod 56 with a flange 113 that abuts against the abutting member 111. In addition to the support rod 56, a suction pad 58a formed in a bellows shape is attached to the front end of the output tube 112.

於吸附墊58a與支持棒56之間,配設螺旋彈簧114。藉由以支持棒56為支點之螺旋彈簧114之彈壓力,吸附墊58隨時往從支持棒56遠離之方向即下方被彈壓。又,於支持棒56內,在抵接構件111與支持棒56底邊之間,配設複數個螺旋彈簧115於輸出管112周圍。而且,當抵接構件111與支持棒56底邊之間隔成為既定值以下時,藉由以支持棒56為支點之螺旋彈簧115之彈壓力,使向上方之彈壓力作用於抵接構件111。A coil spring 114 is disposed between the adsorption pad 58a and the support rod 56. By the elastic pressure of the coil spring 114 having the support rod 56 as a fulcrum, the suction pad 58 is biased at a position downward from the support rod 56, that is, downward. Further, in the support rod 56, a plurality of coil springs 115 are disposed around the output tube 112 between the abutting member 111 and the bottom side of the support rod 56. When the distance between the abutting member 111 and the bottom edge of the support rod 56 is equal to or less than a predetermined value, the upward biasing force acts on the abutting member 111 by the elastic pressure of the coil spring 115 having the support rod 56 as a fulcrum.

圖11(a)狀態之上基板保持裝置55從第1機器臂101承接第1基板W1時,向上方之緊壓力作用於吸附墊58a。因此,如圖11(b)所示,螺旋彈簧114縮短使吸附墊58a上升。又,當上基板保持裝置55將第1基板W1交給上保持板之黏著機構部52時,向下方之拉伸力作用於吸附墊58a。因此,如圖11(c)所示,螺旋彈簧114伸張且螺旋彈簧115縮短,而使吸附墊58a下降。When the substrate holding device 55 receives the first substrate W1 from the first robot arm 101 in the state of FIG. 11 (a), the upward pressing pressure acts on the adsorption pad 58a. Therefore, as shown in Fig. 11 (b), the coil spring 114 is shortened to raise the adsorption pad 58a. Further, when the upper substrate holding device 55 hands the first substrate W1 to the adhesive mechanism portion 52 of the upper holding plate, the downward tensile force acts on the adsorption pad 58a. Therefore, as shown in Fig. 11 (c), the coil spring 114 is stretched and the coil spring 115 is shortened, and the suction pad 58a is lowered.

其次,根據圖12~圖29說明如上述構成之基板貼合裝置之動作。Next, the operation of the substrate bonding apparatus having the above configuration will be described with reference to Figs. 12 to 29 .

於搬入第1及第2之基板W1、W2之前,如圖12所示,第1基板W1被第1機器臂101吸附,第2基板W2被第2機器臂102支撐。又,於下基板保持裝置43上,支撐在前循環已貼合之貼合基板W3。Before the first and second substrates W1 and W2 are carried in, as shown in FIG. 12, the first substrate W1 is adsorbed by the first robot arm 101, and the second substrate W2 is supported by the second robot arm 102. Further, the lower substrate holding device 43 is supported by the bonded substrate W3 to which the front cycle has been bonded.

從此狀態使下基板保持裝置43上升,第1機器臂101前進至已呈大氣開放狀態之室31內(圖13),接著下降(圖14)。於此狀態,第1機器臂101之上部臂104前端部之下面被撓曲防止片46支撐,修正上部臂104(及第1基板W1)之自重下垂。From this state, the lower substrate holding device 43 is raised, and the first robot arm 101 is advanced into the chamber 31 which is in an open state (Fig. 13), and then descends (Fig. 14). In this state, the lower surface of the front end portion of the upper arm 104 of the first robot arm 101 is supported by the deflection preventing piece 46, and the weight of the upper arm 104 (and the first substrate W1) is corrected to sag.

其次,上基板保持裝置55下降,藉由吸附墊58吸附第1基板W1之上面(外面)(圖15)。接著,第1機器臂101解除第1基板W1之吸附而向上方移動(圖16),其次,下基板保持裝置43下降(圖17)。結果,貼合基板W3則成為被第1機器臂101之下部臂105支撐之狀態。Next, the upper substrate holding device 55 is lowered, and the upper surface (outer surface) of the first substrate W1 is adsorbed by the adsorption pad 58 (FIG. 15). Then, the first robot arm 101 releases the adsorption of the first substrate W1 and moves upward (FIG. 16), and then the lower substrate holding device 43 descends (FIG. 17). As a result, the bonded substrate W3 is in a state of being supported by the lower arm 105 of the first robot arm 101.

其次,第1機器臂101後退於處理室外(圖18)。接著上基板保持裝置55上升使第1基板W1移動至黏著機構部52附近(例如,黏著機構部52(加壓板71)之下方近處2~5mm)(圖19)。又,圖19~圖23、圖28、圖29,為說明之方便上,僅顯示黏著構件74而省略保持突部74a。從圖19之狀態,各吸附頭75同時下降而吸附第1基板W1之上面(圖20),接著,上基板保持裝置55解除第1基板W1之吸附而向上方移動(圖21)。藉此,以較上基板保持裝置55之各吸附墊58間之間隔狹窄的間隔,藉由吸附頭75保持第1基板W1。因此,以保持於上基板保持裝置55之狀態所產生 的撓曲被修正,以高平面度之狀態保持。再者,吸附頭75之接觸面81(參照圖7)形成為平面狀。因此,在吸附頭75吸附保持第1基板W1之狀態,吸附頭75之接觸面81則與加壓板71成為平行。其結果,藉由第1基板W1接觸於接觸面81能修正其撓曲,以更高之平面度之狀態保持。Next, the first robot arm 101 retreats to the outside of the processing chamber (Fig. 18). Then, the upper substrate holding device 55 is raised to move the first substrate W1 to the vicinity of the adhesive mechanism portion 52 (for example, 2 to 5 mm below the adhesive mechanism portion 52 (pressure plate 71)) (FIG. 19). 19 to 23, 28, and 29, for convenience of explanation, only the adhesive member 74 is shown, and the holding projection 74a is omitted. In the state of FIG. 19, each adsorption head 75 is simultaneously lowered to adsorb the upper surface of the first substrate W1 (FIG. 20), and then the upper substrate holding device 55 releases the adsorption of the first substrate W1 and moves upward (FIG. 21). Thereby, the first substrate W1 is held by the adsorption head 75 at a narrow interval between the respective adsorption pads 58 of the upper substrate holding device 55. Therefore, it is generated in a state of being held by the upper substrate holding device 55. The deflection is corrected and maintained in a high degree of flatness. Further, the contact surface 81 (see FIG. 7) of the adsorption head 75 is formed in a planar shape. Therefore, in a state where the adsorption head 75 adsorbs and holds the first substrate W1, the contact surface 81 of the adsorption head 75 is parallel to the pressure plate 71. As a result, the deflection of the first substrate W1 in contact with the contact surface 81 can be corrected and maintained in a state of higher flatness.

其次,吸附頭75在將第1基板W1真空吸附之狀態下上升。藉此,第1基板W1黏著於黏著構件74之保持突部74a(圖22)。其結果,藉由黏著構件74之黏著力保持第1基板W1。再者,在圖22之狀態,通過吸附孔86供應負壓於第1基板W1,藉此吸引吸附第1基板W1。因此,第1基板W1,藉由黏著構件74之黏著力及來自吸附孔86之負壓,確實地保持於黏著機構部52(加壓板71)。其次,解除吸附頭75之吸附,使該吸附頭75向上方移動(圖23)。Next, the adsorption head 75 rises in a state where the first substrate W1 is vacuum-adsorbed. Thereby, the first substrate W1 is adhered to the holding protrusion 74a of the adhesive member 74 (FIG. 22). As a result, the first substrate W1 is held by the adhesive force of the adhesive member 74. In the state of FIG. 22, the negative pressure is supplied to the first substrate W1 through the adsorption holes 86, whereby the first substrate W1 is suction-adsorbed. Therefore, the first substrate W1 is surely held by the adhesive mechanism portion 52 (pressure plate 71) by the adhesive force of the adhesive member 74 and the negative pressure from the adsorption hole 86. Next, the adsorption of the adsorption head 75 is released, and the adsorption head 75 is moved upward (Fig. 23).

其次,第2機器臂102前進至室31內(圖24),進而使下基板保持裝置43上升,使第2基板W2支撐於下基板保持裝置43上(圖25)。Next, the second robot arm 102 advances into the chamber 31 (FIG. 24), and the lower substrate holding device 43 is raised to support the second substrate W2 on the lower substrate holding device 43 (FIG. 25).

其次,第2機器臂102後退至室31外,下基板保持裝置43下降使第2基板W2支撐於載台42上(圖26)。在此狀態,通過吸附孔42b供應負壓至第2基板W2,藉此第2基板W2透過多孔質片47被真空吸附於載台42上。然後,上側容器32及下側容器33被封閉(圖27)。以上述方式,結束第1及第2之基板W1、W2搬入室31內。Next, the second robot arm 102 retreats to the outside of the chamber 31, and the lower substrate holding device 43 is lowered to support the second substrate W2 on the stage 42 (FIG. 26). In this state, the negative pressure is supplied to the second substrate W2 through the adsorption holes 42b, whereby the second substrate W2 is vacuum-adsorbed onto the stage 42 through the porous sheet 47. Then, the upper container 32 and the lower container 33 are closed (Fig. 27). In the above manner, the first and second substrates W1 and W2 are completed and carried into the chamber 31.

在此狀態,使閥92開啟而使室31內真空排氣。此時,與使閥92開啟幾乎同時亦使閥95、97開啟。亦即,一邊 使室31內減壓一邊使管路42c內之壓力(第2基板W2之背壓)及管路87內之壓力(第1基板W1之背壓)同時減壓。又,在閥95、97開啟之前後、或負壓源93之真空度接近負壓源49、89之真空度的時點關閉閥48、88。藉由如上之控制,將第1及第2之基板W1、W2之背壓控制為大致與室31內之壓力相同壓力(或以下)。因此,能防止第1及第2之基板W1、W2分別從加壓板71及載台42剥離。In this state, the valve 92 is opened to evacuate the inside of the chamber 31. At this time, the valves 95, 97 are also opened almost simultaneously with the opening of the valve 92. One side The pressure in the line 42c (back pressure of the second substrate W2) and the pressure in the line 87 (back pressure of the first substrate W1) are simultaneously reduced in pressure in the chamber 31 under reduced pressure. Further, the valves 48, 88 are closed after the valves 95, 97 are opened, or when the vacuum of the negative pressure source 93 approaches the vacuum of the negative pressure sources 49, 89. By the above control, the back pressures of the first and second substrates W1, W2 are controlled to be substantially the same pressure (or less) as the pressure in the chamber 31. Therefore, it is possible to prevent the first and second substrates W1 and W2 from being peeled off from the pressurizing plate 71 and the stage 42, respectively.

其次,如圖27所示,在室31內之減壓狀態下進行按壓處理,使第1及第2之基板W1、W2貼合。此時,進行用以將2片基板W1、W2之水平方向之相對位置修正至一定範圍內之位置對準。伴隨此位置對準之上固定座51與上基板保持裝置55的水平方向移位,被可撓曲聯結器60吸收。貼合處理結束後,如圖28所示,吸附頭75緊壓貼合基板W3。然後,在藉由吸附頭75之緊壓力基板W3抵接於載台42之狀態下,如圖29所示,使加壓板71向上方移動。其結果,使黏著構件74之下端(保持突部74a)位於吸附頭75之下端上方。即,藉由上升加壓板71使吸附頭75之接觸面81位於加壓板71之下面73的相對下方,能使貼合基板W3從黏著構件74剥離。與此同時,供應正壓於加壓板71之吸附孔86,使黏著構件74與基板W3能更迅速地剥離。Next, as shown in FIG. 27, pressing treatment is performed in a reduced pressure state in the chamber 31, and the first and second substrates W1 and W2 are bonded together. At this time, alignment for correcting the relative positions of the two substrates W1 and W2 in the horizontal direction within a certain range is performed. With this position alignment, the fixing base 51 and the upper substrate holding device 55 are displaced in the horizontal direction, and are absorbed by the flexible coupling 60. After the bonding process is completed, as shown in FIG. 28, the adsorption head 75 presses the bonded substrate W3. Then, in a state where the pressure substrate W3 is brought into contact with the stage 42 by the adsorption head 75, as shown in FIG. 29, the pressure plate 71 is moved upward. As a result, the lower end of the adhesive member 74 (holding projection 74a) is positioned above the lower end of the adsorption head 75. That is, the contact surface 81 of the adsorption head 75 is positioned below the lower surface 73 of the pressure plate 71 by the rising pressure plate 71, whereby the bonded substrate W3 can be peeled off from the adhesive member 74. At the same time, the supply pressure is applied to the adsorption holes 86 of the pressure plate 71, so that the adhesive member 74 and the substrate W3 can be peeled off more quickly.

第1實施形態之基板貼合裝置,具有以下之優點。The substrate bonding apparatus of the first embodiment has the following advantages.

(1)於上固定座51之下面將黏著機構部52設置於彼此鄰接之2個支持棒56(吸附墊58)間。黏著機構部52,具備:具有複數個貫通孔72之加壓板71;及於加壓板71之下面 73設置成從下面73向下突出之黏著構件74。再者,黏著機構部52,具備配置於各貫通孔72內且以能從加壓板71之下面73進出之方式支撐的吸附頭75。吸附頭75,吸附藉由上基板保持裝置55移動至黏著機構部52附近之第1基板W1之上面。再者,黏著機構部52,具備致動器76及支持構件82,用以使吸附頭75上升,以藉由該吸附頭75保持之第1基板W1黏著於黏著構件74。在此處,於黏著機構部52之貫通孔72內升降之吸附頭75間的間隔,係較鄰接於該黏著機構部52之2個支持棒56(吸附墊58)間的間隔狹窄。因此,當黏著機構部52承接保持於上基板保持裝置55之第1基板W1時,黏著機構部52之吸附頭75,則以較上基板保持裝置55之吸附墊58短的間隔保持第1基板W1之上面(參照圖20)。因此,即使吸附墊58所保持之第1基板W1因自重而撓曲之情形,藉由吸附墊58保持該第1基板W1,能修正其撓曲。因此,能以高平面度狀態保持第1基板W1。又,若將保持於吸附頭75之第1基板W1接著於黏著構件74,第1基板W1則黏著於保持突部74a。此時,第1基板W1,藉由吸附頭75之吸附力與黏著構件74之黏著力確實地被保持。因此,在高平面度保持第1基板W1之狀態下,能使第1基板W1確實地保持於加壓板71之黏著構件74。(1) The adhesive mechanism portion 52 is disposed between the two support bars 56 (adsorption pads 58) adjacent to each other on the lower surface of the upper holder 51. The adhesive mechanism portion 52 includes: a pressure plate 71 having a plurality of through holes 72; and a lower surface of the pressure plate 71 73 is provided as an adhesive member 74 that protrudes downward from the lower side 73. Further, the adhesive mechanism portion 52 includes a suction head 75 that is disposed in each of the through holes 72 and that is supported by the lower surface 73 of the pressure plate 71. The adsorption head 75 is moved by the upper substrate holding device 55 to the upper surface of the first substrate W1 in the vicinity of the adhesive mechanism portion 52. Further, the adhesive mechanism portion 52 includes an actuator 76 and a support member 82 for raising the adsorption head 75 so that the first substrate W1 held by the adsorption head 75 is adhered to the adhesive member 74. Here, the interval between the adsorption heads 75 that rise and fall in the through hole 72 of the adhesive mechanism portion 52 is narrower than the interval between the two support rods 56 (adsorption pads 58) adjacent to the adhesive mechanism portion 52. Therefore, when the adhesive mechanism portion 52 receives the first substrate W1 held by the upper substrate holding device 55, the adsorption head 75 of the adhesive mechanism portion 52 holds the first substrate at a shorter interval than the adsorption pad 58 of the upper substrate holding device 55. Above W1 (see Figure 20). Therefore, even if the first substrate W1 held by the adsorption pad 58 is deflected by its own weight, the first substrate W1 can be held by the adsorption pad 58 to correct the deflection. Therefore, the first substrate W1 can be held in a high flatness state. Further, when the first substrate W1 held by the adsorption head 75 is attached to the adhesive member 74, the first substrate W1 is adhered to the holding projection 74a. At this time, the first substrate W1 is surely held by the adsorption force of the adsorption head 75 and the adhesive force of the adhesive member 74. Therefore, the first substrate W1 can be reliably held by the adhesive member 74 of the pressure plate 71 in a state where the first substrate W1 is held at a high flatness.

(2)將吸附頭75之接觸面81形成為平面狀,使保持於該吸附頭75之第1基板W1與加壓板71平行。藉此,當第1基板W1抵接於接觸面81時將第1基板W1修正為平面 狀,能更提高第1基板W1之平面度。(2) The contact surface 81 of the adsorption head 75 is formed in a planar shape, and the first substrate W1 held by the adsorption head 75 is parallel to the pressure plate 71. Thereby, when the first substrate W1 abuts on the contact surface 81, the first substrate W1 is corrected to a plane. In the shape, the flatness of the first substrate W1 can be further improved.

(3)因將黏著構件74環狀地設置於各貫通孔周圍,故能以吸附頭75之周圍部分使第1基板W1接觸於黏著構件74。因此,能確實地黏著保持第1基板W1。(3) Since the adhesive member 74 is annularly provided around each of the through holes, the first substrate W1 can be brought into contact with the adhesive member 74 by the peripheral portion of the adsorption head 75. Therefore, the first substrate W1 can be reliably adhered and held.

(4)使加壓板71向上方移動,以使以吸附頭75將貼合基板W3緊壓於載台42(下保持板)之狀態,使吸附頭75之下端(接觸面81)位於黏著構件74之下端下方(參照圖29)。因此,因貼合基板W3在抵接於載台42之狀態從加壓板71(黏著構件74)剥離,故能防止該貼合基板W3掉落而破損。又。不需另外設置用以從黏著構件74剥離貼合基板W3之構成,能藉由吸附頭75從黏著構件74剥離貼合基板W3。(4) The pressure plate 71 is moved upward so that the lower surface of the adsorption head 75 (contact surface 81) is adhered by the adsorption head 75 pressing the bonded substrate W3 against the stage 42 (lower holding plate). Below the lower end of member 74 (see Figure 29). Therefore, since the bonded substrate W3 is peeled off from the pressurizing plate 71 (adhesive member 74) in a state of abutting against the stage 42, the bonded substrate W3 can be prevented from falling and being damaged. also. It is not necessary to separately provide a configuration for peeling off the bonded substrate W3 from the adhesive member 74, and the bonded substrate W3 can be peeled off from the adhesive member 74 by the adsorption head 75.

(5)使室31內真空排氣時,與使閥92開啟之幾乎同時亦使閥95、97開啟,一邊使室31內減壓,一邊使管路42c內之壓力(第2基板W2之背壓)及管路87內之壓力(第1基板W1之背壓)同時減壓。藉此,因能將第1及第2基板W1、W2之背壓控制為與室31內之壓力大致相同,故能防止第1及第2基板W1、W2分別從載台42及加壓板71剥離。(5) When the inside of the chamber 31 is evacuated, the valves 95 and 97 are opened simultaneously with the opening of the valve 92, and the pressure in the line 42c is made while the pressure in the chamber 31 is reduced (the second substrate W2) The back pressure) and the pressure in the line 87 (back pressure of the first substrate W1) are simultaneously reduced in pressure. Thereby, since the back pressures of the first and second substrates W1 and W2 can be controlled to be substantially the same as the pressure in the chamber 31, it is possible to prevent the first and second substrates W1 and W2 from being respectively removed from the stage 42 and the pressure plate. 71 peeling off.

(6)將複數個黏著機構部52陣列狀配置於上固定座51之下面,藉由複數個黏著機構部52保持第1基板W1。因此,即使第1基板W1係大型,亦可在避免各黏著機構部52大型化之狀態下保持第1基板W1。(6) The plurality of adhesive mechanism portions 52 are arranged in an array on the lower surface of the upper holder 51, and the first substrate W1 is held by the plurality of adhesive mechanism portions 52. Therefore, even if the first substrate W1 is large, the first substrate W1 can be held while the size of each of the adhesive mechanism portions 52 is prevented from being increased.

(7)於各黏著機構部52之兩側,設置收容上基板保持裝置55所對應之2個支持棒56的收容槽52a。該收容槽52a 收容支持棒56於加壓板71之下面73之上方位置。因此,收容於收容槽52a之支持棒56,因不會露出較加壓板71之下面73下方,故能防止第1基板W1與支持棒56干涉。再者,本構成,因收容支持棒56(吸附墊58)之收容槽52a配置於黏著機構部52間,故亦能將第1基板W1之上面(外面)以上固定座51之內面側保持。因此與僅從上固定座51之周圍吸附保持第1基板W1之情形比較,能使第1基板W1之撓曲為小,使吸附頭75確實地接觸於第1基板W1。其結果,能確實地吸附保持第1基板W1。(7) A receiving groove 52a for accommodating the two support bars 56 corresponding to the upper substrate holding device 55 is provided on both sides of each of the adhesive mechanism portions 52. The receiving groove 52a The receiving support rod 56 is positioned above the lower surface 73 of the pressure plate 71. Therefore, since the support rod 56 accommodated in the accommodation groove 52a is not exposed below the lower surface 73 of the pressure plate 71, the first substrate W1 can be prevented from interfering with the support rod 56. Further, in this configuration, since the accommodation groove 52a for accommodating the support rod 56 (adsorption pad 58) is disposed between the adhesive mechanism portions 52, the upper surface of the first substrate W1 (outer surface) can be maintained on the inner surface side of the fixed base 51. . Therefore, as compared with the case where the first substrate W1 is adsorbed and held only from the periphery of the upper holder 51, the deflection of the first substrate W1 can be made small, and the adsorption head 75 can surely contact the first substrate W1. As a result, the first substrate W1 can be reliably adsorbed and held.

(8)各黏著機構部52,設置成可藉由螺釘83拆裝於上固定座51。因此,若任一個黏著機構部52產生不良時,能僅將該產生不良之黏著機構部52更換,故與將上固定座51及黏著機構部52全部更換之情形比較,能抑制成本增加。(8) Each of the adhesive mechanism portions 52 is provided to be detachable from the upper holder 51 by a screw 83. Therefore, when any of the adhesive mechanism portions 52 is defective, only the defective adhesive mechanism portion 52 can be replaced. Therefore, compared with the case where all of the upper mount 51 and the adhesive mechanism portion 52 are replaced, it is possible to suppress an increase in cost.

(第2實施形態)(Second embodiment)

以下,根據圖式說明本發明第2實施形態之基板貼合裝置。又,第2實施形態與上述第1實施形態之主要不同處,係吸附頭之構成。因此,說明之方便上,對與第1實施形態相同部分使用同一符號,省略其說明。Hereinafter, a substrate bonding apparatus according to a second embodiment of the present invention will be described with reference to the drawings. Further, the second embodiment differs from the above-described first embodiment mainly in the configuration of the adsorption head. Therefore, in the convenience of the description, the same portions as those in the first embodiment will be denoted by the same reference numerals and will not be described.

如圖30所示,第2實施形態之吸附頭121,具備:固定於支持構件82且大致圓柱形狀之本體部122;配置於本體部122下方之吸附部123;及設置於本體部122之下端且支撐吸附部123之彈性支持部124。As shown in FIG. 30, the adsorption head 121 of the second embodiment includes a main body portion 122 that is fixed to the support member 82 and has a substantially cylindrical shape, an adsorption portion 123 that is disposed below the main body portion 122, and a lower end portion that is disposed at the lower end of the main body portion 122. And supporting the elastic support portion 124 of the adsorption portion 123.

於本體部122之下端形成有圓形狀之凹部131。並且,於本體部122,形成有連接於管路77(即,圖5之負壓源79) 且於凹部131之底面132(本體部122之下端)開口之通氣孔133。該通氣孔133之垂直方向截面具有大致T字狀。又,於本體部122之下端形成有向其徑方向外側延設之延出部134,於該延出部134之外周螺裝圓環狀之固定部135。該等本體部122及固定部135,係藉由例如不鏽鋼等之高剛性材料形成。A circular recess 131 is formed at a lower end of the body portion 122. Further, the body portion 122 is formed to be connected to the conduit 77 (ie, the negative pressure source 79 of FIG. 5). The vent hole 133 is opened at the bottom surface 132 of the recess 131 (the lower end of the body portion 122). The vent hole 133 has a substantially T-shaped cross section in the vertical direction. Further, an extension portion 134 extending outward in the radial direction is formed at a lower end of the main body portion 122, and an annular fixing portion 135 is screwed to the outer periphery of the extension portion 134. The main body portion 122 and the fixing portion 135 are formed of a highly rigid material such as stainless steel.

吸附部123大致形成為圓柱形狀,且於其下部形成有向徑方向外側延設之凸緣部141。又,於吸附部123,將能連通於通氣孔133且於吸附部123之下端開口的吸引孔142形成為與該通氣孔133同徑。並且,於吸附部123之下端,形成有與第1基板W1接觸之接觸面143,及從接觸面143向上方傾斜於該吸附部123之中心之傾斜面144。又,於吸附部123,形成有較該吸附部123上端之軸徑小徑的段差部145。The adsorption portion 123 is formed substantially in a columnar shape, and a flange portion 141 extending outward in the radial direction is formed in a lower portion thereof. Further, in the adsorption unit 123, the suction hole 142 that can communicate with the vent hole 133 and open at the lower end of the adsorption unit 123 is formed to have the same diameter as the vent hole 133. Further, a contact surface 143 that is in contact with the first substrate W1 and an inclined surface 144 that is inclined upward from the contact surface 143 at the center of the adsorption portion 123 are formed at the lower end of the adsorption portion 123. Further, a step portion 145 having a smaller diameter than the shaft diameter of the upper end of the adsorption portion 123 is formed in the adsorption portion 123.

彈性支持部124,係關閉本體部122與吸附部123之間,且以能接觸/離開之方式支撐本體部122與吸附部123。具體而言,該彈性支持部124之外周緣,於固定部135與本體部122之延出部134之間,透過配設於該固定部135內之圓環狀緩衝構件136及環137固定。彈性支持部124之內周緣插入於段差部145內。因此,藉由彈性支持部124支撐吸附部123。又,緩衝構件136係由橡膠等彈性材料構成,環137係由鐵等金屬材料構成。並且,在未進行真空吸附之狀態,本體部122之底面132與吸附部123之上端面146細分離,使吸附部123能傾斜移動。另一方面,在 真空吸附第1基板W1之狀態,吸附部123被本體部122吸附,使吸附部123之上端面146抵接於本體部122之底面132,以限制吸附部123之傾斜移動。又,於第2實施形態,當吸附部123之上端面146抵接於本體部122之底面132時,形成有被本體部122與吸附部123與彈性支持部124包圍之空間138,於本體部122,形成有能連通該空間138與該通氣孔133之連通孔139。再者於凸緣部141之外周面,形成有從該凸緣部141向徑方向外側延伸之大徑部141a,於固定部135之內周面,較該大徑部141a下方之位置延伸形成有與凸緣部141之外周面相對之小徑部135a。因此,吸附部123,以大徑部141a位於小徑部135a上方之狀態支撐於彈性支持部124。因大徑部141a能抵接於小徑部135a,使吸附部123能從本體部122離開之距離及吸附部123之傾斜移動量限制於既定範圍內。藉此,防止吸附部123傾斜移動既定範圍以上以致從彈性支持部124脫落。The elastic support portion 124 closes between the main body portion 122 and the adsorption portion 123, and supports the main body portion 122 and the adsorption portion 123 in such a manner as to be able to contact/disengage. Specifically, the outer peripheral edge of the elastic support portion 124 is fixed between the fixed portion 135 and the extended portion 134 of the main body portion 122 through the annular cushioning member 136 and the ring 137 disposed in the fixed portion 135. The inner circumference of the elastic support portion 124 is inserted into the step portion 145. Therefore, the adsorption portion 123 is supported by the elastic support portion 124. Further, the cushioning member 136 is made of an elastic material such as rubber, and the ring 137 is made of a metal material such as iron. Further, in a state where vacuum adsorption is not performed, the bottom surface 132 of the main body portion 122 is finely separated from the upper end surface 146 of the adsorption portion 123, and the adsorption portion 123 can be tilted. On the other hand, in When the first substrate W1 is vacuum-adsorbed, the adsorption portion 123 is adsorbed by the main portion 122, and the upper end surface 146 of the adsorption portion 123 abuts against the bottom surface 132 of the main body portion 122 to restrict the tilting movement of the adsorption portion 123. Further, in the second embodiment, when the upper end surface 146 of the adsorption portion 123 abuts against the bottom surface 132 of the main body portion 122, a space 138 surrounded by the main body portion 122 and the adsorption portion 123 and the elastic support portion 124 is formed in the main body portion. 122, a communication hole 139 capable of connecting the space 138 and the vent hole 133 is formed. Further, a large diameter portion 141a extending outward from the flange portion 141 in the radial direction is formed on the outer circumferential surface of the flange portion 141, and an inner circumferential surface of the fixing portion 135 extends beyond the position of the large diameter portion 141a. There is a small diameter portion 135a that faces the outer peripheral surface of the flange portion 141. Therefore, the adsorption portion 123 is supported by the elastic support portion 124 in a state where the large diameter portion 141a is located above the small diameter portion 135a. When the large diameter portion 141a can abut against the small diameter portion 135a, the distance from which the adsorption portion 123 can be separated from the main body portion 122 and the amount of tilt movement of the adsorption portion 123 are limited to a predetermined range. Thereby, the adsorption portion 123 is prevented from being tilted and moved by a predetermined range or more so as to fall off from the elastic support portion 124.

於第2實施形態,凹部131之底面132及吸附部123之上端面146,均形成為與加壓板71之下面73大致平行,且吸附部123之接觸面143形成為與加壓板71之下面73大致平行。並且,當吸附頭121吸附第1基板W1時,吸附部123之上端面146抵接於凹部131之底面132使吸附部123之傾斜移動受到限制,使吸附部123之接觸面143大致平行於加壓板71之下面73。又,黏著構件74,固裝於與該黏著構件74大致相同形狀之基部151上,藉由螺釘152固定於加壓板71。In the second embodiment, the bottom surface 132 of the concave portion 131 and the upper end surface 146 of the adsorption portion 123 are formed substantially parallel to the lower surface 73 of the pressure plate 71, and the contact surface 143 of the adsorption portion 123 is formed to be in contact with the pressure plate 71. The 73 below is roughly parallel. When the adsorption head 121 adsorbs the first substrate W1, the upper end surface 146 of the adsorption portion 123 abuts against the bottom surface 132 of the concave portion 131 to restrict the tilting movement of the adsorption portion 123, so that the contact surface 143 of the adsorption portion 123 is substantially parallel to the addition. The lower surface 73 of the pressure plate 71. Further, the adhesive member 74 is fixed to the base portion 151 having substantially the same shape as the adhesive member 74, and is fixed to the pressure plate 71 by screws 152.

其次,說明基板貼合裝置之動作。因基板貼合裝置之動作係與第1實施形態同樣,故在此處根據圖31~34說明吸附頭121之吸附動作。圖31~圖35,係對應第1實施形態之圖19~23的圖,係包含基板貼合裝置之吸附頭121的部分截面圖。Next, the operation of the substrate bonding apparatus will be described. Since the operation of the substrate bonding apparatus is the same as that of the first embodiment, the adsorption operation of the adsorption head 121 will be described here with reference to Figs. 31 to 35 are views corresponding to Figs. 19 to 23 of the first embodiment, and are partial cross-sectional views of the adsorption head 121 including the substrate bonding apparatus.

如圖31所示,在被吸附墊58真空吸附之狀態,第1基板W1係以其自重等而撓曲。其次,如圖32所示,各吸附頭121下降而吸附第1基板W1之上面。此時,吸附頭121之吸附部123沿第1基板W1之撓曲傾斜移動,吸附部123之接觸面143之全周接觸於第1基板W1。因此,藉由吸附頭121能確實地真空吸附第1基板W1。又,因於吸附部123之下端形成有傾斜面144,故較無此傾斜面144之情形,能使吸附部123之內側與外側之氣壓差(壓力差)增大,且能使藉由吸附部123吸附第1基板W1之部分增大。其結果,能牢固地真空吸附第1基板W1。As shown in FIG. 31, the first substrate W1 is deflected by its own weight or the like in a state of being vacuum-adsorbed by the adsorption pad 58. Next, as shown in FIG. 32, each adsorption head 121 is lowered to adsorb the upper surface of the first substrate W1. At this time, the adsorption portion 123 of the adsorption head 121 moves obliquely along the deflection of the first substrate W1, and the entire circumference of the contact surface 143 of the adsorption portion 123 contacts the first substrate W1. Therefore, the first substrate W1 can be surely vacuum-adsorbed by the adsorption head 121. Further, since the inclined surface 144 is formed at the lower end of the adsorption portion 123, the difference in pressure difference (pressure difference) between the inner side and the outer side of the adsorption portion 123 can be increased without the inclined surface 144, and the adsorption can be made by adsorption. The portion of the portion 123 that adsorbs the first substrate W1 is enlarged. As a result, the first substrate W1 can be firmly vacuum-adsorbed.

接著,如圖33所示,上基板保持裝置55解除第1基板W1之吸附而向上方移動。藉此,藉由吸附頭121以較上基板保持裝置55之吸附墊58間狹窄之間隔保持第1基板W1。藉此,防止第1基板W1之撓曲,第1基板W1保持於高平面度之狀態。再者,在吸附頭121吸附保持第1基板W1之狀態下限制吸附部123之傾斜移動,吸附部123之接觸面143成為與加壓板71之下面73平行。因此,更確實地防止第1基板W1之撓曲。第1基板W1,則以更高之平面度被保持。又,此時,被本體部122與吸附部123與 彈性支持部124包圍之空間138內之空氣透過連通孔139吸引。因此,當室31內真空排氣時,能防止該空間138內之壓力較室31內之壓力為高。藉此,藉由空間138內之壓力與室31內之壓力的差防止彈性支持部124變形,以防止吸附部123移動。Next, as shown in FIG. 33, the upper substrate holding device 55 releases the adsorption of the first substrate W1 and moves upward. Thereby, the first substrate W1 is held by the adsorption head 121 at a narrow interval between the adsorption pads 58 of the upper substrate holding device 55. Thereby, the deflection of the first substrate W1 is prevented, and the first substrate W1 is maintained in a state of high flatness. In addition, the tilting movement of the adsorption unit 123 is restricted while the adsorption head 121 adsorbs and holds the first substrate W1, and the contact surface 143 of the adsorption unit 123 is parallel to the lower surface 73 of the pressure plate 71. Therefore, the deflection of the first substrate W1 is more reliably prevented. The first substrate W1 is held at a higher flatness. Moreover, at this time, the main body portion 122 and the adsorption portion 123 are The air in the space 138 surrounded by the elastic support portion 124 is attracted through the communication hole 139. Therefore, when the chamber 31 is evacuated in a vacuum, the pressure in the space 138 can be prevented from being higher than the pressure in the chamber 31. Thereby, the elastic support portion 124 is prevented from being deformed by the difference between the pressure in the space 138 and the pressure in the chamber 31 to prevent the adsorption portion 123 from moving.

其次,如圖34所示,吸附頭121在真空吸附第1基板W1之狀態下上升,使第1基板W1黏著於黏著構件74之保持突部74a。於此狀態,藉由黏著構件74之黏著力與吸附頭121之真空吸附力保持第1基板W1。其次,如圖35所示,吸附頭121,解除第1基板W1之真空吸附,向上方移動。然後,與上述第1實施形態同樣,進行第1基板W1與第2基板W2之貼合。Next, as shown in FIG. 34, the adsorption head 121 rises in a state where the first substrate W1 is vacuum-adsorbed, and the first substrate W1 is adhered to the holding protrusion 74a of the adhesive member 74. In this state, the first substrate W1 is held by the adhesive force of the adhesive member 74 and the vacuum suction force of the adsorption head 121. Next, as shown in FIG. 35, the adsorption head 121 releases the vacuum adsorption of the first substrate W1 and moves upward. Then, similarly to the above-described first embodiment, bonding of the first substrate W1 and the second substrate W2 is performed.

第2實施形態之基板貼合裝置,除上述第1實施形態之優點外,具有以下之優點。The substrate bonding apparatus of the second embodiment has the following advantages in addition to the advantages of the first embodiment described above.

(9)因使吸附頭121之吸附部123構成能傾斜移動,故當該吸附部123抵接於第1基板W1時,會沿第1基板W1之撓曲傾斜移動。藉此,能使吸附部123之接觸面143之全周接觸於第1基板W1。因此,藉由吸附頭121能確實地真空吸附第1基板W1,能使第1基板W1確實地接觸於黏著構件74。(9) Since the adsorption portion 123 of the adsorption head 121 is configured to be tiltably movable, when the adsorption portion 123 abuts against the first substrate W1, it moves obliquely along the deflection of the first substrate W1. Thereby, the entire circumference of the contact surface 143 of the adsorption portion 123 can be brought into contact with the first substrate W1. Therefore, the first substrate W1 can be surely vacuum-adsorbed by the adsorption head 121, and the first substrate W1 can be surely brought into contact with the adhesive member 74.

(10)在吸附部123之接觸面143形成為平面狀,吸附頭121吸附保持第1基板W1之狀態,吸附部123之傾斜移動被限制而使加壓板71之下面73與接觸面143成為平面。因此,吸附頭121(吸附部123)能以高平面度保持第1基板 W1。(10) The contact surface 143 of the adsorption unit 123 is formed in a planar shape, the adsorption head 121 adsorbs and holds the first substrate W1, and the tilting movement of the adsorption unit 123 is restricted, so that the lower surface 73 of the pressure plate 71 and the contact surface 143 become flat. Therefore, the adsorption head 121 (adsorption portion 123) can hold the first substrate with high flatness. W1.

(11)吸附頭121,具備:本體部122;及配置於本體部122下方之吸附部123。本體部122,具有連接於負壓源79且於凹部131之底面132開口之通氣孔133,吸附部123,具有連接於該通氣孔133且於該吸附部123之下端開口之吸引孔142。再者,吸附頭121,固定於本體部122,具備關閉本體部122與吸附部123之間且以能接觸分離之方式支撐本體部122與吸附部123的彈性支持部124。吸附部123,若從本體部122離開則能傾斜移動,若抵接於本體部122則限制傾斜移動。吸附部123,在分離於本體部122之狀態下使彈性支持部124變形而傾斜移動。於本構成,與將蛇腹狀之吸附部設置於本體部之下端之情形比較,即使縮短吸附頭121之軸方向長度亦能使吸附部123大傾斜移動。因此,能謀求吸附頭121之小型化。(11) The adsorption head 121 includes a main body portion 122 and an adsorption portion 123 disposed below the main body portion 122. The main body portion 122 has a vent hole 133 that is connected to the negative pressure source 79 and opens to the bottom surface 132 of the concave portion 131. The adsorption portion 123 has a suction hole 142 that is connected to the vent hole 133 and that is open at the lower end of the adsorption portion 123. Further, the adsorption head 121 is fixed to the main body portion 122, and includes an elastic support portion 124 that closes between the main body portion 122 and the adsorption portion 123 and supports the main body portion 122 and the adsorption portion 123 so as to be in contact with and separated. The adsorption portion 123 is tiltably movable when it is separated from the main body portion 122, and restricts the oblique movement when it abuts against the main body portion 122. The adsorption unit 123 deforms the elastic support portion 124 and moves obliquely while being separated from the main body portion 122. In the present configuration, as compared with the case where the bellows-like adsorption portion is provided at the lower end of the main body portion, the adsorption portion 123 can be largely tilted and moved even if the axial length of the adsorption head 121 is shortened. Therefore, the size of the adsorption head 121 can be reduced.

(12)於吸附頭121,形成有使通氣孔133與空間138連通之連通孔139。因透過連通孔139從該空間138吸引空氣,故能防止室31內被真空排氣之狀態下空間138內之壓力較室31內之壓力為高。因此,能防止彈性支持部124變形,以防止吸附部123產生非期望之動作。(12) A communication hole 139 through which the vent hole 133 communicates with the space 138 is formed in the adsorption head 121. Since air is sucked from the space 138 through the communication hole 139, it is possible to prevent the pressure in the space 138 from being higher than the pressure in the chamber 31 in a state where the chamber 31 is evacuated. Therefore, it is possible to prevent the elastic support portion 124 from being deformed to prevent the adsorption portion 123 from generating an unintended operation.

(13)因將黏著構件74,使用螺釘152透過基部151固定於加壓板71,故例如於黏著構件74劣化時不需將加壓板71整體更換,能僅更換劣化之黏著構件74。因此,能抑制成本增加。(13) Since the adhesive member 74 is fixed to the pressure plate 71 through the base portion 151 by using the screw 152, for example, when the adhesive member 74 is deteriorated, it is not necessary to replace the entire pressure plate 71, and only the deteriorated adhesive member 74 can be replaced. Therefore, an increase in cost can be suppressed.

(14)因於吸附部123之下端形成有傾斜面144,與例 如於吸附部123之下端僅形成有接觸面之情形比較,能使吸附部123之內側與外側之氣壓差(壓力差)增大。藉此,藉由吸附部123使吸附第1基板W1之面積增大,能牢固地真空吸附第1基板W1。(14) Since the inclined surface 144 is formed at the lower end of the adsorption portion 123, When the contact surface is formed only at the lower end of the adsorption portion 123, the difference in pressure (pressure difference) between the inside and the outside of the adsorption portion 123 can be increased. Thereby, the area of the adsorption first substrate W1 is increased by the adsorption unit 123, and the first substrate W1 can be firmly vacuum-adsorbed.

(15)於凸緣141之外周面形成有大徑部141a,且於固定部135之內周面形成有能與大徑部141a抵接之小徑部135a。因此,吸附部123,在大徑部141a較小徑部135a位於上方之狀態下支撐於彈性支持部124。因大徑部141a能抵接於小徑部135a,故將吸附部123能從本體部122離開之距離及吸附部123之傾斜移動量限制於既定範圍內。藉此,能防止吸附部123傾斜移動既定範圍以上而從彈性支持部124脫落。(15) The large diameter portion 141a is formed on the outer circumferential surface of the flange 141, and the small diameter portion 135a that can abut against the large diameter portion 141a is formed on the inner circumferential surface of the fixing portion 135. Therefore, the adsorption unit 123 is supported by the elastic support portion 124 in a state where the small diameter portion 135a of the large diameter portion 141a is located above. Since the large diameter portion 141a can abut against the small diameter portion 135a, the distance from which the adsorption portion 123 can be separated from the main body portion 122 and the amount of tilt movement of the adsorption portion 123 are limited to a predetermined range. Thereby, it is possible to prevent the adsorption portion 123 from falling off from the elastic support portion 124 by obliquely moving over a predetermined range.

(第3實施形態)(Third embodiment)

以下,根據圖式說明本發明第3實施形態之基板貼合裝置。又,第3實施形態與上述第1實施形態之主要不同處,僅係黏著構件之構成。因此,說明之方便上,對與第1實施形態相同部分使用同一符號,省略其說明。Hereinafter, a substrate bonding apparatus according to a third embodiment of the present invention will be described with reference to the drawings. Further, the third embodiment differs from the above-described first embodiment mainly in the configuration of the adhesive member. Therefore, in the convenience of the description, the same portions as those in the first embodiment will be denoted by the same reference numerals and will not be described.

如圖36所示,於加壓板71之下面73,藉由螺釘(圖示略)固定覆蓋該下面73全面之片狀(平板狀)黏著構件161。具體而言,平板狀黏著構件161,於對應加壓板71之貫通孔72、吸附孔86、及螺釘83之安裝孔的位置分別具有孔。於該黏著構件161,吸附頭75之附近區域,規定為於吸附頭75之上升時第1基板W1接觸於黏著構件161之接觸區域T(於圖36以二點鏈線包圍之區域)。於該接觸區域T內, 將複數個保持突部161a環狀排列於黏著構件161。又,於該接觸區域T外,於黏著構件161形成有棋盤格狀之複數個加壓突部161b(加壓部)。保持突部161a與加壓突部161b形成為大致相同高度。又,於第3實施形態,保持突部161a與加壓突部161b係形成有大致半球面狀。As shown in Fig. 36, on the lower surface 73 of the pressurizing plate 71, a full sheet-like (flat-plate) adhesive member 161 of the lower surface 73 is fixedly covered by a screw (not shown). Specifically, the flat adhesive member 161 has a hole at a position corresponding to the through hole 72 of the pressure plate 71, the suction hole 86, and the attachment hole of the screw 83. In the adhesive member 161, the vicinity of the adsorption head 75 is defined such that the first substrate W1 contacts the contact region T of the adhesive member 161 (the region surrounded by the two-dot chain line in Fig. 36) when the adsorption head 75 is raised. In the contact area T, A plurality of holding projections 161a are annularly arranged on the adhesive member 161. Further, outside the contact region T, a plurality of pressurizing projections 161b (pressurizing portions) having a checkerboard shape are formed in the adhesive member 161. The holding projection 161a and the pressurizing projection 161b are formed at substantially the same height. Further, in the third embodiment, the holding projection 161a and the pressurizing projection 161b are formed in a substantially hemispherical shape.

接著,加壓板71透過設置成較加壓板71之下面73突出於下方之黏著構件161緊壓第1基板W1。因此,若如第1實施形態僅於接觸區域T內設置黏著構件74之情形,於接觸區域T外無法直接緊壓第1基板W1,而產生2片基板W1、W2之貼合不能充分進行之虞。相對於此,根據第3實施形態,除接觸區域T內之保持突部161a外另於接觸區域T外設置加壓突部161b。藉此,2片基板W1、W2之貼合時,即使於加壓板71之下面73之接觸區域T外亦能藉由加壓突部161b直接緊壓第1基板W1。因此,能充分進行貼合。Next, the pressurizing plate 71 is pressed against the first substrate W1 through the adhesive member 161 which is provided to protrude below the lower surface 73 of the pressurizing plate 71. Therefore, when the adhesive member 74 is provided only in the contact region T as in the first embodiment, the first substrate W1 cannot be directly pressed outside the contact region T, and the bonding of the two substrates W1 and W2 cannot be sufficiently performed. Hey. On the other hand, according to the third embodiment, the pressurizing projection 161b is provided in addition to the holding projection 161a in the contact region T and outside the contact region T. Thereby, even when the two substrates W1 and W2 are bonded together, the first substrate W1 can be directly pressed by the pressurizing protrusion 161b even outside the contact region T of the lower surface 73 of the pressurizing plate 71. Therefore, the bonding can be sufficiently performed.

第3實施形態之基板貼合裝置,除上述第1實施形態之優點外,具有以下之優點。The substrate bonding apparatus of the third embodiment has the following advantages in addition to the advantages of the first embodiment described above.

(16)於加壓板71之下面73設置覆蓋該下面73全面之黏著構件161,於該黏著構件161之接觸區域T外形成加壓突部161b。因此,要貼合2片基板W1、W2時,即使於接觸區域T外,亦能藉由加壓突部161b直接緊壓第1基板W1。因此,能充分進行基板W1、W2之貼合。例如藉由增加1個加壓板71(黏著機構部52)之吸附頭75之數量以增加接觸區域T之比率,亦能提高貼合能力。然而,在此情形 黏著機構部52之構造變成複雜化。因此,如第3實施形態藉由於黏著構件161形成加壓突部161b,能以簡易構造提高貼合能力。(16) An adhesive member 161 covering the entire lower surface 73 is provided on the lower surface 73 of the pressing plate 71, and a pressurizing projection 161b is formed outside the contact region T of the adhesive member 161. Therefore, when the two substrates W1 and W2 are to be bonded together, the first substrate W1 can be directly pressed by the pressurizing protrusion 161b even in the contact region T. Therefore, the bonding of the substrates W1 and W2 can be sufficiently performed. For example, by increasing the number of the adsorption heads 75 of one pressure plate 71 (adhesion mechanism portion 52) to increase the ratio of the contact regions T, the bonding ability can also be improved. However, in this case The configuration of the adhesive mechanism portion 52 becomes complicated. Therefore, in the third embodiment, since the pressure-adhering member 161b is formed by the adhesive member 161, the bonding ability can be improved with a simple structure.

(17)黏著構件161設置成覆蓋加壓板71之下面73整體,且加壓突部161b一體形成於黏著構件161。因此,與將黏著構件161以另外構件形成而設置於加壓板71之下面73之情形比較,能減少構件數量。(17) The adhesive member 161 is provided to cover the entire lower surface 73 of the pressure plate 71, and the pressurizing protrusion 161b is integrally formed on the adhesive member 161. Therefore, the number of members can be reduced as compared with the case where the adhesive member 161 is formed as another member and disposed on the lower surface 73 of the pressure plate 71.

(第4實施形態)(Fourth embodiment)

以下,根據圖式說明本發明第4實施形態之基板貼合裝置。又,第4實施形態與上述第1實施形態之主要不同處,係黏著構件之構成。因此,說明之方便上,對與第1實施形態相同部分使用同一符號,省略其說明。Hereinafter, a substrate bonding apparatus according to a fourth embodiment of the present invention will be described with reference to the drawings. Further, the fourth embodiment differs from the above-described first embodiment mainly in the configuration of the adhesive member. Therefore, in the convenience of the description, the same portions as those in the first embodiment will be denoted by the same reference numerals and will not be described.

如圖37所示,於加壓板71之下面73設置複數個(於圖37中例如8個)黏著構件200。8個黏著構件200,與第1實施形態同樣,配置於與8個貫通孔72分別對應之位置。即,8個黏著構件200,於加壓板71之下面73周圍以既定間隔排列成四角框狀。各黏著構件200形成為圓環狀而包圍所對應之貫通孔72全周。各黏著構件200,較佳為由聚丁橡膠構成之黏著片,能將基板(此時指第1基板W1)暫時保持,且能迅速地剥離該基板W1。如圖38所示,各黏著構件200設置於加壓板71,使其成為與加壓板71之下面73同一平面狀。即,各黏著構件200之下面200a位於與加壓板71之下面73同一平面內。本第4實施形態之構造,亦具有與第1實施形態大致同樣之優點。又,與第1實施 形態同樣,亦可於各黏著構件200之面內,設置向下突出之保持突部74a(保持部)。As shown in Fig. 37, a plurality of (for example, eight in Fig. 37) adhesive members 200 are provided on the lower surface 73 of the pressurizing plate 71. The eight adhesive members 200 are disposed in eight through holes as in the first embodiment. 72 corresponds to the location. That is, the eight adhesive members 200 are arranged in a square frame shape at predetermined intervals around the lower surface 73 of the pressure plate 71. Each of the adhesive members 200 is formed in an annular shape and surrounds the entire through hole 72 corresponding thereto. Each of the adhesive members 200 is preferably an adhesive sheet made of butadiene rubber, and can temporarily hold the substrate (in this case, the first substrate W1), and can quickly peel off the substrate W1. As shown in FIG. 38, each of the adhesive members 200 is provided on the pressure plate 71 so as to be flush with the lower surface 73 of the pressure plate 71. That is, the lower surface 200a of each of the adhesive members 200 is located in the same plane as the lower surface 73 of the pressure plate 71. The structure of the fourth embodiment also has substantially the same advantages as the first embodiment. Also, with the first implementation In the same manner, a holding protrusion 74a (holding portion) that protrudes downward may be provided in the surface of each of the adhesive members 200.

又,上述各實施形態,亦可以如下之形態實施。Further, each of the above embodiments may be implemented as follows.

.於上述各實施形態,雖藉由8個吸附頭75(或121)保持第1基板W1,但不限於此,配置於1個加壓板71(黏著機構部52)內之吸附頭75(或121)的數量,可為任何數量。. In the above embodiments, the first substrate W1 is held by the eight adsorption heads 75 (or 121). However, the present invention is not limited thereto, and the adsorption heads 75 are disposed in one pressure plate 71 (adhesion mechanism portion 52) (or 121) The number can be any number.

.於上述各實施形態,雖將複數個吸附頭75(或121)以四角框狀排列於加壓板71內,但複數個吸附頭75、121之排列,可例如為圓環狀或三角框狀,又,亦可隨機排列。. In each of the above embodiments, a plurality of the adsorption heads 75 (or 121) are arranged in a square frame shape in the pressure plate 71. However, the arrangement of the plurality of adsorption heads 75 and 121 may be, for example, an annular shape or a triangular frame shape. , in addition, can also be arranged randomly.

.於上述第1及第3實施形態,雖於吸附頭75之下端形成向徑方向外側延設之凸緣部80,藉此使接觸面81成為與加壓板71平行之平面狀,但不限於此,只要接觸面81成為平面狀,亦可不設置凸緣部80。. In the first and third embodiments, the flange portion 80 extending outward in the radial direction is formed at the lower end of the adsorption head 75, whereby the contact surface 81 is formed in a planar shape parallel to the pressure plate 71, but is not limited thereto. Therefore, the flange portion 80 may not be provided as long as the contact surface 81 has a flat shape.

.於上述第2實施形態,雖將接觸面143形成為平面狀,在吸附頭121吸附保持第1基板W1之狀態下限制吸附部123之傾斜移動,使接觸面143成為與加壓板71之下面73平行,但不限於此,亦可將吸附部123形成為不與下面73平行。. In the second embodiment, the contact surface 143 is formed in a planar shape, and the tilting movement of the adsorption portion 123 is restricted in a state where the adsorption head 121 adsorbs and holds the first substrate W1, and the contact surface 143 is formed below the pressure plate 71. 73 is parallel, but is not limited thereto, and the adsorption portion 123 may be formed not to be parallel to the lower surface 73.

.於上述第2實施形態,亦可藉由使固定部135之下面形成為與加壓板71之下面73平行之平面狀,在吸附部123吸附保持第1基板W1之狀態下較固定部135位於上方,使第1基板W1抵接於固定部135之下面以修正其撓曲。. In the second embodiment, the lower surface of the fixing portion 135 may be formed in a planar shape parallel to the lower surface 73 of the pressure plate 71, and the adsorption portion 123 may be positioned closer to the fixing portion 135 than the fixing portion 135. Upper, the first substrate W1 is brought into contact with the lower surface of the fixing portion 135 to correct the deflection.

.於上述第2實施形態,吸附頭121,雖具備本體部122、彈性支持部124、及吸附部123,但不限於此。例如, 亦可於本體部122之下端設置蛇腹狀之吸附部。又,亦可使吸附頭121整體能傾斜移動。. In the second embodiment described above, the adsorption head 121 includes the main body portion 122, the elastic support portion 124, and the adsorption portion 123, but is not limited thereto. E.g, A bellows-like adsorption portion may be provided at a lower end of the body portion 122. Further, the entire adsorption head 121 can be tilted and moved.

.於上述第1及第2實施形態,雖將黏著構件74形成為環狀,但不限於此,亦可係楕圓形,又,亦可為三角形或四角形等之多角形。再者,亦可不在貫通孔之全周設置黏著構件74,任何形狀均可。. In the first and second embodiments, the adhesive member 74 is formed in a ring shape. However, the adhesive member 74 is not limited thereto, and may be a circular shape or a polygonal shape such as a triangle or a square. Further, the adhesive member 74 may not be provided over the entire circumference of the through hole, and may have any shape.

.於上述第3實施形態,雖將黏著構件161攝製成覆蓋加壓板71之下面73整體且使加壓突部161b一體形成於黏著構件161,但不限於此,例如亦可將具有加壓突部之複數個另外之黏著構件設置於接觸區域T外。又,亦可將加壓突部以黏著構件以外之其他材料形成而設置於加壓板71之下面73。. In the third embodiment, the adhesive member 161 is formed to cover the entire lower surface 73 of the pressure plate 71 and the pressure protrusion 161b is integrally formed on the adhesive member 161. However, the present invention is not limited thereto, and for example, it may have a pressure protrusion. A plurality of additional adhesive members are disposed outside the contact area T. Further, the pressurizing protrusion may be formed on the lower surface 73 of the pressure plate 71 by forming a material other than the adhesive member.

.於上述各實施形態,雖於黏著構件74、161將大致半球形狀之保持突部74a、161a排列成環狀,但不限於此,任何排列均可。. In each of the above embodiments, the substantially hemispherical shape holding projections 74a and 161a are arranged in a ring shape in the adhesive members 74 and 161. However, the present invention is not limited thereto, and any arrangement may be employed.

.於上述第1及第2實施形態,雖於黏著構件74形成有大致半球形狀之保持突部74a,但不限於此,亦可將保持突部74a例如以三角台錐或圓柱狀等之形狀形成。又,保持突部74a,亦可形成為於徑方向具有不同之段差的段差部。. In the above-described first and second embodiments, the holding member 74a having a substantially hemispherical shape is formed in the adhesive member 74. However, the present invention is not limited thereto, and the holding projection 74a may be formed in a shape such as a triangular pyramid or a column. . Further, the holding projection 74a may be formed as a step portion having a different step in the radial direction.

.不一定要形成保持突部74a。. It is not necessary to form the retaining projection 74a.

.除貫通孔72或吸附孔86外,亦可於加壓板71之下面73全面形成有黏著構件74。. In addition to the through hole 72 or the adsorption hole 86, an adhesive member 74 may be entirely formed on the lower surface 73 of the pressure plate 71.

.亦可例如使接觸面81、143形成為圓環狀,使黏著構件74形成為三角框狀等之非圓環狀。在此情形,越向黏 著構件之徑方向外側,黏著構件與接觸面的接觸面積越變小。因此,能以小緊壓力從黏著構件剥離第1基板W1。. For example, the contact faces 81 and 143 may be formed in an annular shape, and the adhesive member 74 may be formed in a non-annular shape such as a triangular frame shape. In this case, the more sticky The outer diameter of the member is smaller, and the contact area between the adhesive member and the contact surface becomes smaller. Therefore, the first substrate W1 can be peeled off from the adhesive member with a small pressing force.

.於上述第1實施形態,雖將黏著構件74以接著固定,但不限於此,亦可如第2實施形態,固裝於與黏著構件74大致相同形狀之基部151上,藉由螺釘152等固定於加壓板71。同樣,於第2及第3實施形態,亦可將黏著構件74以接著固定。. In the first embodiment, the adhesive member 74 is fixed next to the adhesive member 74. However, the adhesive member 74 is not limited thereto. Further, as in the second embodiment, the adhesive member 74 may be fixed to the base portion 151 having substantially the same shape as the adhesive member 74, and may be fixed by screws 152 or the like. On the pressure plate 71. Similarly, in the second and third embodiments, the adhesive member 74 may be fixed next.

.於上述第3實施形態,雖將黏著構件161形成為片狀,以使黏著構件161覆蓋加壓板71之下面73之全面,但不限於此,只要使加壓突部161b一體形成,亦可不覆蓋下面73之全面。. In the third embodiment, the adhesive member 161 is formed in a sheet shape so that the adhesive member 161 covers the entire lower surface 73 of the pressure plate 71. However, the present invention is not limited thereto, and the pressure protrusion 161b may be integrally formed. Cover the full range of 73 below.

.於上述各實施形態,雖藉由吸附頭75、121使貼合基板W3緊壓於載台42(下保持板),在其狀態下使加壓板71向上方移動,但不限於此。剥離控制手段(吸附頭75(121)、致動器76、控制部35),使加壓板71上升之同時,剛使加壓板71上升之前一刻,及剛使加壓板71上升之後一刻中之任1個時點藉由複數個吸附頭75(121)緊壓貼合基板W3。藉由如上述剥離控制手段之動作,不需要另外設置用以從黏著構件74剥離貼合基板W3之構成,能藉由吸附頭75(121)從黏著構件74剥離貼合基板W3。. In the above-described embodiments, the bonding substrate W3 is pressed against the stage 42 (lower holding plate) by the adsorption heads 75 and 121, and the pressure plate 71 is moved upward in this state. However, the pressure plate 71 is not limited thereto. The peeling control means (the adsorption head 75 (121), the actuator 76, and the control unit 35) raises the pressure plate 71, just before the pressure plate 71 rises, and immediately after the pressure plate 71 rises At any one of the times, the bonded substrate W3 is pressed by a plurality of adsorption heads 75 (121). By the operation of the peeling control means, it is not necessary to separately provide a structure for peeling off the bonded substrate W3 from the adhesive member 74, and the bonded substrate W3 can be peeled off from the adhesive member 74 by the adsorption head 75 (121).

.於上述各實施形態,雖於上固定座51之下面將複數個黏著機構部52排列成陣列狀,但不限於此,例如亦可將複數個黏著機構部52排列成環狀。又,亦可於上固定座51之下面僅設置1個黏著機構部52。此時,係藉由具有與圖 6所示之加壓板71相同構造的1個黏著機構部52與上固定座51構成上保持板。. In the above embodiments, the plurality of adhesive mechanism portions 52 are arranged in an array on the lower surface of the upper holder 51. However, the present invention is not limited thereto. For example, a plurality of the adhesive mechanism portions 52 may be arranged in a ring shape. Further, only one adhesive mechanism portion 52 may be provided below the upper holder 51. At this time, by having and One of the adhesive mechanism portions 52 having the same structure as the pressure plate 71 shown in Fig. 6 and the upper fixing base 51 constitute an upper holding plate.

.於上述各實施形態,雖將黏著機構部52設置成能拆裝於上固定座51,但不限於此,例如亦可以焊接設置於上固定座51使其不能裝卸。. In the above embodiments, the adhesive mechanism portion 52 is detachably attached to the upper holder 51. However, the present invention is not limited thereto. For example, the upper fixing base 51 may be welded to the upper holder 51 so as not to be attached or detached.

.於上述各實施形態,雖於藉由黏著構件74黏著第1基板W1後,藉由吸附孔86真空吸附第1基板W1,但不限於此,亦可於吸附頭75從上基板保持裝置55承接第1基板W1後,於使其接觸在黏著構件74之前對第1基板W1產生真空吸附之作用。. In the above-described embodiments, the first substrate W1 is vacuum-adsorbed by the adhesive member 74, and the first substrate W1 is vacuum-adsorbed by the adsorption holes 86. However, the first substrate W1 is not limited thereto, and the adsorption head 75 may be taken from the upper substrate holding device 55. After the first substrate W1, the first substrate W1 is subjected to vacuum adsorption before being brought into contact with the adhesive member 74.

.於上述各實施形態,雖將第2基板W2保持於載台42,將第1基板W1保持於加壓板71,但不限於此,亦可將第1基板W1保持於載台42,將第2基板W2保持於加壓板71。. In the above embodiments, the second substrate W2 is held by the stage 42 and the first substrate W1 is held by the pressing plate 71. However, the first substrate W1 is not limited thereto, and the first substrate W1 may be held on the stage 42. 2 The substrate W2 is held by the pressure plate 71.

.於上述各實施形態,亦可於下固定座41上設置黏著機構部,藉由該黏著機構部保持第2基板W2。. In each of the above embodiments, the adhesive mechanism portion may be provided on the lower holder 41, and the second substrate W2 may be held by the adhesive mechanism portion.

.於上述各實施形態,致動器76雖係藉由將空氣供應於膜片內,使固定於支持構件82之驅動構件沿導件上下移動的構成,但不限於此,致動器76亦可係馬達等之驅動機構。. In the above embodiments, the actuator 76 is configured such that air is supplied to the diaphragm and the driving member fixed to the support member 82 is moved up and down along the guide. However, the actuator 76 is not limited thereto. It is a drive mechanism such as a motor.

.於上述各實施形態,雖設置吸附孔86於黏著機構部52(加壓板71),但不限於此,亦可不設置吸附孔86。. In each of the above embodiments, the adsorption hole 86 is provided in the adhesion mechanism portion 52 (the pressure plate 71), but the invention is not limited thereto, and the adsorption hole 86 may not be provided.

.於上述各實施形態,接觸區域T雖係圖6、35之二點鏈線所表示之區域,但不限於此,能視基板之材質或形 狀,或接觸面81、143之形狀等予以變更。. In each of the above embodiments, the contact region T is a region indicated by the two-dot chain line of FIGS. 6 and 35, but is not limited thereto, and the material or shape of the substrate can be considered. The shape, or the shape of the contact faces 81, 143, etc. are changed.

.於上述第1及第2實施形態,亦可於加壓板71之下面73設置加壓突部(加壓部)。. In the first and second embodiments described above, a pressurizing protrusion (pressurizing portion) may be provided on the lower surface 73 of the pressurizing plate 71.

13‧‧‧基板貼合裝置13‧‧‧Substrate bonding device

14‧‧‧按壓裝置14‧‧‧ Pressing device

51‧‧‧上固定座51‧‧‧上固定座

52‧‧‧黏著機構部52‧‧‧Adhesive Department

52a‧‧‧收容槽52a‧‧‧storage trough

53‧‧‧驅動裝置53‧‧‧ drive

56‧‧‧支持棒56‧‧‧Support bar

58a~58i‧‧‧吸附墊58a~58i‧‧‧Adsorption pad

59‧‧‧支軸59‧‧‧ fulcrum

60‧‧‧可撓曲聯結器60‧‧‧Flexible coupling

61‧‧‧升降軸61‧‧‧ lifting shaft

71‧‧‧加壓板71‧‧‧ Pressurized plate

72‧‧‧貫通孔72‧‧‧through holes

73‧‧‧加壓板之下面73‧‧‧Under the pressure plate

74、161、200‧‧‧黏著構件74,161,200‧‧‧Adhesive members

74a、161a‧‧‧保持突部74a, 161a‧‧‧ Keeping the protrusion

75、121‧‧‧吸附頭75, 121‧‧‧Adsorption head

76‧‧‧致動器76‧‧‧Actuator

79‧‧‧負壓源79‧‧‧Negative source

81、143‧‧‧接觸面81, 143‧‧ ‧ contact surface

82‧‧‧支持構件82‧‧‧Support components

86‧‧‧吸附孔86‧‧‧Adsorption holes

122‧‧‧本體部122‧‧‧ Body Department

123‧‧‧吸附部123‧‧‧Adsorption Department

124‧‧‧彈性支持部124‧‧‧Flexible Support Department

133‧‧‧通氣孔133‧‧‧vents

138‧‧‧空間138‧‧‧ space

139‧‧‧連通孔139‧‧‧Connected holes

142‧‧‧吸引孔142‧‧‧Attraction hole

161b‧‧‧加壓突部161b‧‧‧ Pressurized protrusion

T‧‧‧接觸區域T‧‧‧Contact area

W1‧‧‧第1基板W1‧‧‧1st substrate

W2‧‧‧第2基板W2‧‧‧2nd substrate

圖1係表示面板製造裝置之概略構成的方塊圖。Fig. 1 is a block diagram showing a schematic configuration of a panel manufacturing apparatus.

圖2係表示第1實施形態之按壓裝置之概略構成的全體圖。Fig. 2 is a general view showing a schematic configuration of a pressing device according to the first embodiment.

圖3係表示下基板保持裝置的俯視圖。Fig. 3 is a plan view showing the lower substrate holding device.

圖4係表示載台及多孔質片的立體圖。Fig. 4 is a perspective view showing a stage and a porous sheet.

圖5係表示上基板保持裝置及上固定座的仰視圖。Fig. 5 is a bottom view showing the upper substrate holding device and the upper holder.

圖6係表示第1實施形態之黏著機構部的仰視圖。Fig. 6 is a bottom view showing the adhesive mechanism portion of the first embodiment.

圖7係圖6的A-A線截面圖。Figure 7 is a cross-sectional view taken along line A-A of Figure 6.

圖8係表示減壓機構及吸附機構之概略構成的概念圖。Fig. 8 is a conceptual diagram showing a schematic configuration of a pressure reducing mechanism and an adsorption mechanism.

圖9係表示上基板保持裝置及第1機器臂的側視圖。Fig. 9 is a side view showing the upper substrate holding device and the first robot arm.

圖10係表示上基板保持裝置及第1機器臂的仰視圖。Fig. 10 is a bottom view showing the upper substrate holding device and the first robot arm.

圖11(a)(b)(c)係表示吸附墊的截面圖。Fig. 11 (a), (b) and (c) are cross-sectional views showing the adsorption pad.

圖12係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 12 is a view showing an operational procedure of the substrate bonding apparatus according to the first embodiment.

圖13係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 13 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖14係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 14 is a view showing an operational procedure of the substrate bonding apparatus according to the first embodiment.

圖15係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 15 is a view showing the operation steps of the substrate bonding apparatus of the first embodiment.

圖16係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 16 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖17係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 17 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖18係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 18 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖19係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 19 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖20係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 20 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖21係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 21 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖22係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 22 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖23係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 23 is a view showing the operation steps of the substrate bonding apparatus of the first embodiment;

圖24係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 24 is a view showing an operational procedure of the substrate bonding apparatus of the first embodiment;

圖25係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 25 is a view showing the operation steps of the substrate bonding apparatus of the first embodiment.

圖26係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 26 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment.

圖27係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 27 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment;

圖28係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 28 is a view showing the operation steps of the substrate bonding apparatus of the first embodiment;

圖29係第1實施形態之基板貼合裝置的動作步驟圖。Fig. 29 is a view showing the operational steps of the substrate bonding apparatus of the first embodiment;

圖30係包含第2實施形態之吸附頭之黏著機構部的部分截面圖。Fig. 30 is a partial cross-sectional view showing an adhesive mechanism portion of the adsorption head according to the second embodiment.

圖31係第2實施形態之基板貼合裝置的動作步驟圖。Fig. 31 is a view showing the operational steps of the substrate bonding apparatus of the second embodiment.

圖32係第2實施形態之基板貼合裝置的動作步驟圖。Fig. 32 is a view showing the operation steps of the substrate bonding apparatus of the second embodiment.

圖33係第2實施形態之基板貼合裝置的動作步驟圖。Fig. 33 is a view showing the operational steps of the substrate bonding apparatus of the second embodiment.

圖34係第2實施形態之基板貼合裝置的動作步驟圖。Fig. 34 is a view showing the operational steps of the substrate bonding apparatus of the second embodiment.

圖35係第2實施形態之基板貼合裝置的動作步驟圖。Fig. 35 is a view showing the operation steps of the substrate bonding apparatus of the second embodiment.

圖36係表示第3實施形態之黏著機構部的仰視圖。Fig. 36 is a bottom view showing the adhesive mechanism portion of the third embodiment.

圖37係表示第4實施形態之黏著機構部的仰視圖。Fig. 37 is a bottom view showing the adhesive mechanism portion of the fourth embodiment.

圖38係圖37的A-A線截面圖。Figure 38 is a cross-sectional view taken along line A-A of Figure 37.

52‧‧‧黏著機構部52‧‧‧Adhesive Department

71‧‧‧加壓板71‧‧‧ Pressurized plate

72‧‧‧貫通孔72‧‧‧through holes

73‧‧‧加壓板之下面73‧‧‧Under the pressure plate

74‧‧‧黏著構件74‧‧‧Adhesive members

74a‧‧‧保持突部74a‧‧‧ Keeping the protrusion

75‧‧‧吸附頭75‧‧‧Adsorption head

76‧‧‧致動器76‧‧‧Actuator

81‧‧‧接觸面81‧‧‧Contact surface

82‧‧‧支持構件82‧‧‧Support components

83‧‧‧螺釘83‧‧‧ screws

84‧‧‧安裝構件84‧‧‧Installation components

86‧‧‧吸附孔86‧‧‧Adsorption holes

T‧‧‧接觸區域T‧‧‧Contact area

Claims (17)

一種基板貼合裝置,係於大氣壓下之處理室(31)內將第1基板(W1)保持於上保持板(51、52)且將第2基板(W2)保持於下保持板(41、42),使該處理室內減壓後貼合該第1基板與該第2基板,其特徵在於,具備:移動機構部(53、55、58~61),具有:吸附該第1基板之複數個吸附墊(58);及使該複數個吸附墊上升以使該第1基板移動至該上保持板附近的第1移動手段(53、55、59、60、61);及黏著機構部(52),配置於該複數個吸附墊間,安裝於該上保持板之上固定座(51);該黏著機構部,包含:加壓板(71),配置於該複數個吸附墊間,具有複數個貫通孔(72);黏著構件(74或161),以較該加壓板之下面突出於下方的方式設置於該加壓板;複數個吸附頭(121),分別配置於該複數個貫通孔內,且以能從該加壓板之下面向下方進出之方式支撐於該黏著機構部,能吸附藉由該移動機構部移動至該加壓板附近之該第1基板;及第2移動手段(76、82),係使該複數個吸附頭上升,以使該複數個吸附頭所吸附之該第1基板黏著於該黏著構件;該複數個吸附頭(121)分別包含吸附該第1基板之吸附部(123),各吸附頭之至少該吸附部(123)構成為能傾斜移動; 該吸附部(123)具有與該第1基板接觸之接觸面(143),以該吸附頭吸附該第1基板之狀態限制該吸附部之傾斜移動以使該加壓板之下面與該吸附部之接觸面成為平行。 A substrate bonding apparatus for holding a first substrate (W1) on an upper holding plate (51, 52) and a second substrate (W2) in a lower holding plate (41) in a processing chamber (31) under atmospheric pressure 42) The first substrate and the second substrate are bonded together under reduced pressure in the processing chamber, and the moving mechanism portion (53, 55, 58 to 61) is provided to have a plurality of adsorptions of the first substrate Adsorption pads (58); and first moving means (53, 55, 59, 60, 61) for raising the plurality of adsorption pads to move the first substrate to the vicinity of the upper holding plate; and an adhesive mechanism portion ( 52) disposed between the plurality of adsorption pads and mounted on the upper holding plate (51); the adhesive mechanism portion includes: a pressure plate (71) disposed between the plurality of adsorption pads, a plurality of through holes (72); the adhesive member (74 or 161) is disposed on the pressing plate so as to protrude below the pressing plate; a plurality of adsorption heads (121) are respectively disposed in the plurality of The inside of the through hole is supported by the adhesive mechanism portion so as to be able to enter and exit downward from the lower surface of the pressure plate, and can be adsorbed to the card by the moving mechanism portion The first substrate in the vicinity of the plate; and the second moving means (76, 82), the plurality of adsorption heads are raised to adhere the first substrate adsorbed by the plurality of adsorption heads to the adhesive member; Each of the adsorption heads (121) includes an adsorption portion (123) for adsorbing the first substrate, and at least the adsorption portion (123) of each adsorption head is configured to be tiltable; The adsorption portion (123) has a contact surface (143) that is in contact with the first substrate, and restricts the tilting movement of the adsorption portion in a state in which the adsorption head adsorbs the first substrate to make the lower surface of the pressure plate and the adsorption portion The contact faces become parallel. 如申請專利範圍第1項之基板貼合裝置,其中,該吸附部之接觸面形成為平面狀。 The substrate bonding apparatus according to claim 1, wherein the contact surface of the adsorption portion is formed in a planar shape. 如申請專利範圍第1項之基板貼合裝置,其中,該吸附部之接觸面形成為圓環狀;該黏著構件形成為包圍該接觸面之圓環狀;該黏著構件配置於與該吸附部相同之軸上。 The substrate bonding apparatus of claim 1, wherein the contact surface of the adsorption portion is formed in an annular shape; the adhesive member is formed in an annular shape surrounding the contact surface; and the adhesive member is disposed in the adsorption portion On the same axis. 如申請專利範圍第1項之基板貼合裝置,其中,該吸附頭(121),包含具有連接於負壓源(79)之通氣孔(133)之本體部(122),該通氣孔於該本體部內形成為在該本體部之下端開口;該吸附頭,進一步包含彈性支持部(124),該彈性支持部設置於該本體部與配置在該本體部下方之該吸附部間,以封閉該本體部與該吸附部間,且能彈性變形,以選擇性地進行該吸附部抵接於該本體部之動作及該吸附部從該本體部離開之動作;該吸附部,具有於該吸附部內形成為在該吸附部之下端開口且能連結於該通氣口的吸引孔(142),當該吸附部從該本體部離開時該吸附部能傾斜移動,當該吸附部抵接於該本體部,該吸附部之傾斜移動則被限制。 The substrate bonding apparatus of claim 1, wherein the adsorption head (121) comprises a body portion (122) having a vent hole (133) connected to the negative pressure source (79), wherein the vent hole is The body portion is formed to open at a lower end of the body portion; the adsorption head further includes an elastic support portion (124) disposed between the body portion and the adsorption portion disposed under the body portion to close the The main body portion and the adsorption portion are elastically deformable to selectively perform an operation of the adsorption portion abutting on the main body portion and an operation of the adsorption portion to be separated from the main body portion; the adsorption portion is provided in the adsorption portion a suction hole (142) that is open at a lower end of the adsorption portion and that can be coupled to the vent, and the adsorption portion can be tilted when the adsorption portion is separated from the body portion, and the adsorption portion abuts against the body portion The tilting movement of the adsorption portion is restricted. 如申請專利範圍第4項之基板貼合裝置,其中,該本體部,進一步具有連通孔(139),該連通孔係於該本體部內 形成為使被該本體部與該吸附部與該彈性支持部包圍之空間(138)、以及該本體部之通氣孔連通。 The substrate bonding apparatus of claim 4, wherein the body portion further has a communication hole (139), the communication hole being in the body portion The body portion is connected to a space (138) surrounded by the adsorption portion and the elastic support portion, and a vent hole of the body portion. 如申請專利範圍第1項之基板貼合裝置,其中,當該複數個吸附頭吸附該第1基板並上升時,使與該第1基板接觸之該黏著構件之一部分規定為接觸區域(T);於該接觸區域外之該黏著構件之其他部分、或於該接觸區域外之該加壓板,設有往下方突出之加壓部(161b)。 The substrate bonding apparatus according to claim 1, wherein when the plurality of adsorption heads adsorb the first substrate and rise, one of the adhesive members that are in contact with the first substrate is defined as a contact region (T) The other portion of the adhesive member outside the contact area or the pressurizing plate outside the contact area is provided with a pressurizing portion (161b) that protrudes downward. 如申請專利範圍第1項之基板貼合裝置,其中,該黏著構件係環狀設置於該各貫通孔之周圍。 The substrate bonding apparatus according to claim 1, wherein the adhesive member is annularly provided around the through holes. 如申請專利範圍第7項之基板貼合裝置,其中,於該黏著構件,形成有往下方突出之複數個保持部(74a)。 The substrate bonding apparatus according to claim 7, wherein the adhesive member is formed with a plurality of holding portions (74a) protruding downward. 如申請專利範圍第6項之基板貼合裝置,其中,該黏著構件以覆蓋該加壓板之下面全面之方式形成為片狀;配置於該接觸區域外之該加壓板係與該黏著構件一體形成。 The substrate bonding apparatus of claim 6, wherein the adhesive member is formed in a sheet shape so as to cover the lower surface of the pressing plate; the pressing plate and the adhesive member disposed outside the contact region Integrated. 如申請專利範圍第1項之基板貼合裝置,其中,該基板貼合裝置,係藉由貼合該第1基板與該第2基板來製作貼合基板(W3);該基板貼合裝置,進一步具備剥離控制手段,該剥離控制手段,係在將該貼合基板藉由複數個吸附頭緊壓於該下保持板之狀態下,藉由上升該加壓板使該黏著構件之下端位於該各吸附頭之下端上方,以使該貼合基板從該黏著構件剥離。 The substrate bonding apparatus according to the first aspect of the invention, wherein the substrate bonding apparatus is formed by bonding the first substrate and the second substrate to form a bonding substrate (W3); Further, a peeling control means is provided in which the lower end of the adhesive member is positioned by raising the pressing plate while the bonded substrate is pressed against the lower holding plate by a plurality of adsorption heads. Above the lower end of each adsorption head, the bonded substrate is peeled off from the adhesive member. 如申請專利範圍第10項之基板貼合裝置,其中,該 剥離控制手段,係在與上升該加壓板之同時、或於剛上升該加壓板之前、或於剛上升該加壓板之後,使該貼合基板藉由複數個吸附頭緊壓於該下保持板。 The substrate bonding apparatus of claim 10, wherein the The peeling control means presses the bonded substrate with the plurality of adsorption heads at the same time as the pressure plate is raised, or immediately before the pressure plate is raised, or immediately after the pressure plate is raised. Hold the plate under. 如申請專利範圍第1項之基板貼合裝置,其中,該基板貼合裝置,具備於該上保持板之上固定座配置成陣列狀的複數個黏著機構部,該複數個黏著機構部係申請專利範圍第1項之該黏著機構部。 The substrate bonding apparatus according to claim 1, wherein the substrate bonding apparatus includes a plurality of adhesive mechanism portions arranged in an array on the upper holding plate, and the plurality of adhesive mechanism portions apply The adhesive mechanism department of the first item of the patent scope. 如申請專利範圍第12項之基板貼合裝置,其中,該第1移動手段,包含配置於該處理室內之複數支支持棒(56)、以及將該複數支支持棒支撐成能升降的支持手段(59~61),該複數個吸附墊,安裝於該複數支支持棒;該複數個黏著機構部,係配置成在形成於該複數個黏著機構部間之複數個收容槽(52a)分別收容該複數支支持棒。 The substrate bonding apparatus according to claim 12, wherein the first moving means includes a plurality of support rods (56) disposed in the processing chamber, and a supporting means for supporting the plurality of support rods to be movable up and down (59~61), the plurality of adsorption pads are mounted on the plurality of support bars; the plurality of adhesive mechanism portions are arranged to receive the plurality of storage grooves (52a) formed between the plurality of adhesive mechanism portions respectively The plurality of support rods. 如申請專利範圍第1項之基板貼合裝置,其中,該黏著機構部係設置成能裝卸。 The substrate bonding apparatus of claim 1, wherein the adhesive mechanism portion is provided to be attachable and detachable. 一種基板貼合裝置,係於大氣壓下之處理室(31)內將第1基板(W1)保持於上保持板(51、52)且將第2基板(W2)保持於下保持板(41、42),使該處理室內減壓後貼合該第1基板與該第2基板,其特徵在於,具備:移動機構部(53、55、58~61),具有:吸附該第1基板之複數個吸附墊(58);及使該複數個吸附墊上升以使該第1基板移動至該上保持板附近的第1移動手段(53、55、59、60、61);及 黏著機構部(52),配置於該複數個吸附墊間,安裝於該上保持板之上固定座(51);該黏著機構部,包含:加壓板(71),配置於該複數個吸附墊間,具有複數個貫通孔(72);黏著構件(200),於該加壓板之下面設置成與該加壓板之下面成為同一平面狀;複數個吸附頭(121),分別配置於該複數個貫通孔內,且被該黏著機構部支撐成能從該加壓板之下面向下方進出,能吸附藉由該移動機構部移動至該加壓板附近之該第1基板;及第2移動手段(76、82),係使該複數個吸附頭上升,以使藉由該複數個吸附頭吸附之該第1基板黏著於該黏著構件;該複數個吸附頭(121)分別包含吸附該第1基板之吸附部(123),各吸附頭之至少該吸附部(123)構成為能傾斜移動;該吸附部(123)具有與該第1基板接觸之接觸面(143),以該吸附頭吸附該第1基板之狀態限制該吸附部之傾斜移動以使該加壓板之下面與該吸附部之接觸面成為平行。 A substrate bonding apparatus for holding a first substrate (W1) on an upper holding plate (51, 52) and a second substrate (W2) in a lower holding plate (41) in a processing chamber (31) under atmospheric pressure 42) The first substrate and the second substrate are bonded together under reduced pressure in the processing chamber, and the moving mechanism portion (53, 55, 58 to 61) is provided to have a plurality of adsorptions of the first substrate Adsorption pads (58); and first moving means (53, 55, 59, 60, 61) for raising the plurality of adsorption pads to move the first substrate to the vicinity of the upper holding plate; The adhesive mechanism portion (52) is disposed between the plurality of adsorption pads and is mounted on the upper holding plate upper fixing seat (51); the adhesive mechanism portion includes: a pressure plate (71) disposed in the plurality of adsorption The pad has a plurality of through holes (72); the adhesive member (200) is disposed under the pressing plate so as to be flush with the lower surface of the pressing plate; and the plurality of adsorption heads (121) are respectively disposed on The plurality of through holes are supported by the adhesive mechanism portion so as to be able to move in and out from the lower surface of the pressure plate, and the first substrate that is moved to the vicinity of the pressure plate by the moving mechanism portion can be adsorbed; 2 moving means (76, 82) for raising the plurality of adsorption heads so that the first substrate adsorbed by the plurality of adsorption heads adheres to the adhesive member; the plurality of adsorption heads (121) respectively comprise adsorption The adsorption portion (123) of the first substrate is configured such that at least the adsorption portion (123) of each adsorption head is configured to be tiltable, and the adsorption portion (123) has a contact surface (143) that is in contact with the first substrate. The state in which the adsorption head adsorbs the first substrate restricts the tilting movement of the adsorption portion to make the pressure plate under The adsorption of the contact portion is parallel with the surface. 一種基板貼合裝置之控制方法,該基板貼合裝置,係於大氣壓下之處理室(31)內將第1基板(W1)保持於上保持板(51、52)且將第2基板(W2)保持於下保持板(41、42),使該處理室內減壓後貼合該第1基板與該第2基板,其特徵在於,具備: 藉由複數個吸附墊(58)吸附搬入於大氣壓下之該處理室內之該第1基板的步驟;藉由在該複數個吸附墊吸附該第1基板之狀態下使該複數個吸附墊上升,以使該第1基板移動至安裝於該上保持板之上固定座(51)之黏著機構部(52)附近的步驟,該黏著機構部,包含配置於該複數個吸附墊間之加壓板(71);設置於該加壓板,以較該加壓板之下面突出於下方的方式設置於該加壓板的黏著構件(74或161);及複數個吸附頭(121),以能從該加壓板之下面向下方進出之方式支撐於該黏著機構部;藉由該複數個吸附頭吸附移動至該黏著機構部附近之該第1基板的步驟;及藉由在該複數個吸附頭吸附該第1基板之狀態下使該複數個吸附頭上升,以使該第1基板黏著於該黏著構件的步驟;該複數個吸附頭(121)分別包含吸附該第1基板之吸附部(123),各吸附頭之至少該吸附部(123)構成為能傾斜移動;藉由該複數個吸附頭吸附該第1基板的步驟,係以該吸附部能傾斜移動之狀態藉由該複數個吸附頭吸附該第1基板的步驟,包含當藉由該複數個吸附頭吸附該第1基板時,該吸附部之傾斜移動即被限制而使該吸附部之下面與該加壓板之下面成為平行的步驟;使該第1基板黏著於該黏著構件的步驟,包含在該吸附部之傾斜移動限制狀態下使該複數個吸附頭上升的步 驟。 A method of controlling a substrate bonding apparatus for holding a first substrate (W1) on an upper holding plate (51, 52) and a second substrate (W2) in a processing chamber (31) under atmospheric pressure The first holding substrate and the second substrate are bonded to the lower holding plate (41, 42), and the processing chamber is depressurized, and is characterized in that: a step of adsorbing the first substrate in the processing chamber under atmospheric pressure by a plurality of adsorption pads (58); and raising the plurality of adsorption pads in a state in which the plurality of adsorption pads adsorb the first substrate a step of moving the first substrate to a vicinity of an adhesive mechanism portion (52) attached to the upper holder (51) of the upper holding plate, wherein the adhesive mechanism portion includes a pressure plate disposed between the plurality of adsorption pads (71); disposed on the pressing plate, the adhesive member (74 or 161) disposed on the pressing plate so as to protrude below the pressing plate; and a plurality of adsorption heads (121) Supporting the adhesive mechanism portion from the lower surface of the pressure plate in a downward direction; the step of adsorbing and moving to the first substrate in the vicinity of the adhesive mechanism portion by the plurality of adsorption heads; and by the plurality of adsorptions a step of adsorbing the plurality of adsorption heads in a state in which the first substrate is adsorbed to adhere the first substrate to the adhesive member; and the plurality of adsorption heads (121) respectively include an adsorption portion that adsorbs the first substrate ( 123), at least the adsorption portion (123) of each adsorption head is configured to be tiltable The step of adsorbing the first substrate by the plurality of adsorption heads is a step of adsorbing the first substrate by the plurality of adsorption heads in a state in which the adsorption portion can be tilted, including by the plurality of adsorptions When the first substrate is adsorbed by the head, the tilting movement of the adsorption portion is restricted such that the lower surface of the adsorption portion is parallel to the lower surface of the pressure plate; and the step of adhering the first substrate to the adhesive member includes a step of raising the plurality of adsorption heads in a state in which the adsorption portion is tilted and restricted Step. 如申請專利範圍第16項之基板貼合裝置之控制方法,其中,基板貼合裝置之控制方法,進一步具備:藉由該複數個吸附頭將由該第1基板與該第2基板製作之貼合基板(W3)在緊壓於該下保持板之狀態下,使該加壓板上升以使該黏著構件之下端位於各吸附頭之下端上方,以使該貼合基板從該黏著構件剥離的步驟。The method of controlling a substrate bonding apparatus according to claim 16, wherein the method of controlling the substrate bonding apparatus further includes: bonding the first substrate and the second substrate by the plurality of adsorption heads a step of raising the pressing plate so that the lower end of the adhesive member is positioned above the lower end of each of the adsorption heads to peel the bonded substrate from the adhesive member in a state where the substrate (W3) is pressed against the lower holding plate .
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