JP2004102215A - Substrate assembling apparatus - Google Patents

Substrate assembling apparatus Download PDF

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Publication number
JP2004102215A
JP2004102215A JP2002366017A JP2002366017A JP2004102215A JP 2004102215 A JP2004102215 A JP 2004102215A JP 2002366017 A JP2002366017 A JP 2002366017A JP 2002366017 A JP2002366017 A JP 2002366017A JP 2004102215 A JP2004102215 A JP 2004102215A
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JP
Japan
Prior art keywords
substrate
suction
chamber
pressure plate
pressure
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JP2002366017A
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Japanese (ja)
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JP3823083B2 (en
Inventor
Yukinori Nakayama
中山 幸徳
Akira Hirai
平井 明
Takao Murayama
村山 孝夫
Satoshi Hachiman
八幡 聡
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Hitachi Plant Technologies Ltd
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Hitachi Industries Co Ltd
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Priority to JP2002366017A priority Critical patent/JP3823083B2/en
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Abstract

<P>PROBLEM TO BE SOLVED: To solve such a problem that the occurrence of substrate deflection makes the secure retention of the substrate impossible when large-sized substrates are conveyed into a laminating apparatus and, in particular, the upper substrate is retained by a pressing plate (upper table). <P>SOLUTION: A suction pad which is vertically expandable and contractible is disposed near the central part of the pressing plate 2 (upper table), the suction pad is expanded in accordance with the amount of deflection of the conveyed upper substrate, a negative pressure is supplied to a suction hole disposed on the pressing plate, at the same time, the negative pressure is supplied to the suction pad, too, the substrate is sucked, thereafter, the suction pad is contracted in such a manner that the top end of the suction pad is located on the suction surface of the pressing plate and, thereby, the substrate is firmly retained by the pressing plate. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は基板貼合装置に係り、特に、減圧チャンバ内で貼り合わせる基板同士をそれぞれ保持して対向し、間隔を狭めて貼り合せる液晶表示パネルなどの組立に好適な基板組立装置に関する。
【0002】
【従来の技術】
液晶表示パネルの製造には、透明電極や薄膜トランジスタアレイを設けた2枚のガラス基板を数μm程度の極めて接近した間隔をもって基板の周縁部に設けた接着剤(以下、シール剤ともいう)で貼り合せ(以後、貼り合せ後の基板をセルと呼ぶ)、それによって形成される空間に液晶を封止する工程がある。
【0003】
この液晶の封止には、注入口を設けないようにシール剤をクローズしたパターンに描画した一方の基板上に液晶を滴下しておいて、真空チャンバ内において他方の基板を一方の基板上に配置し、上下の基板を接近させて貼り合せる特開2000−284295号公報で提案された方法などがある。
【0004】
【特許文献1】
特開2000−284295号公報
【0005】
【発明が解決しようとする課題】
上記特開2000−284295号公報になる従来技術では、真空中での基板の保持を下側の基板は平坦なステージに載置しているが、上側の基板は大気状態では負圧により吸引吸着し、所定の真空状態になると静電気力による静電吸着で基板を保持する構成としている。ところで、最近では基板サイズが1m×1m以上の大型になり、かつ基板の厚みも0.7mmから0.63mm、0.5mmと薄型化になる傾向がある。そのため、基板を加圧板(上テーブルで)吸着保持する際、基板の撓みにより中央部基板周辺部と、基板中央部の基板と加圧板の間隔が大きくなり、基板を基板搬入手段から基板を加圧板が受け渡される際に、基板を保持できなくなる場合が発生する。特に大画面の基板を保持する場合には基板の中央部には配向膜やTFT等が形成されているため、基板の周辺部しか支持できず基板の撓みを防ぐことは困難である。また、基板を保持搬送するロボットハンド指部も長くなり基板を保持するときに先端側が撓んで、やはりロボットハンド先端側の基板と加圧板の間隔が大きくなり基板を吸着できなくなる。このため、大型基板に対する上記問題を解決しなければ、正確な貼り合せを行うことができなくなる。
【0006】
また、基板の中央部が撓んでいる状態で、基板の中央部と両端部から吸着していくと、中央部付近(把持している間の部分)に残留応力が発生すると共に、基準マーク(位置合わせマーク)の位置がずれた状態で基板を保持する場合が発生し貼り合せ精度を低下することになる。
【0007】
それゆえ本発明の目的は、基板が大型化しても基板を確実に保持でき、かつ貼り合せを高精度かつ高速に行うことができ、生産性が高い基板組立装置を提供することにある。
【0008】
【課題を解決するための手段】
上記目的を達成するため、本発明では、減圧雰囲気にするためのチャンバと、前記チャンバ内に一方の基板を保持し上下に移動可能に構成した加圧板と、前記加圧板に保持された基板に対向して間隔を空けて他方の基板を保持する基板保持テーブルと、前記基板保持テーブルを駆動して、前記一方の基板と他方の基板の位置合わせを行い、前記加圧板を上下に駆動して基板間の間隔を狭め、前記基板のどちらか一方に設けた接着剤により減圧雰囲気中で貼り合せを行う基板組立て装置において、前記加圧板に基板を保持するために負圧による複数の吸着孔と、複数の静電吸着機構とに加え、加圧板の中央部付近に上下動可能な複数の吸着パッドを設けた構成とした。
【0009】
【発明の実施の形態】
以下、本発明の一実施形態を図に基づいて説明する。
【0010】
図1において、基板組立装置は、下チャンバT1部と上チャンバT2部から構成されている。上チャンバT2部には、上側テーブル2(以後加圧板と称する場合もある)が、上チャンバT2を貫通する支持脚3および複数の調整脚4により上下方向に移動可能に備えられている。支持脚3はOリング5により、また調整脚4は溶接ベローズ6により上チャンバT2内部が大気に連通しないように遮断している。上側テーブル2の支持脚3および調整脚4は加圧ベース板7に固定されている。
【0011】
さらに、この加圧ベース板7の中央部が中間ベース板8に固定されている。中間ベース板8は天井フレーム9に取り付けられた駆動モータ10および減速機11、およびボールネジ12から構成される駆動機構を動作させることにより、ボールスプラインガイド13をガイドとして上下に移動可能に構成されている。また、架台1上にボールスプラインガイドとは別に設けた支持柱により天井フレーム9が支持さている。加圧ベース板7に一端が固定された各調整脚4の他端側は、中間ベース板8に取付けた駆動モータ14により駆動されるボールネジ15に連結されている。この駆動モータ14とボールネジ15からなる上下調整機構を駆動して、加圧ベース板7に力を作用させることにより上側テーブル2を平坦度を保持しながら上下に移動することができる。
【0012】
なお、上チャンバT2は加圧ベース板7間を結合する締結機構を備えており、上チャンバT2を下チャンバT1と切り離す場合に、この締結機構を動作させて加圧ベース板と上チャンバT2とを一体化して、駆動モータ10を動作させて上方向に持ち上げるようにしてある。
【0013】
また、チャンバ内に基板の搬入・搬出を行なうためのドアバルブ16が上チャンバT2の側方外壁側に設置されている。さらにドアバルブ16の対向する上チャンバ側壁の位置には、イオン化超音波エアーを基板表面に吹き付けることで、基板の除電を行うことが出来るようにイオナイザ17を設置してある。さらに、チャンバ外側のドアバルブ16の近傍にもイオナイザ17aが設けてあり、これにより、ドアを開いた状態でイオン化エアーを吹き付けることで基板の除電効果を上げることが出来る。
【0014】
上チャンバT2の上面外壁には、複数個のブッシュ構造のサブガイド18がチャンバ内にセンタ軸19を突出して設けてある。このセンタ軸19は、上側テーブル2の外周に設けた突出部に設けた穴に契合して上側テーブル2の水平方向の調整を行うことが出来る。すなわち、上側テーブル2の水平調整機構としてサブガイド18とセンタ軸19が動作する。
【0015】
上チャンバT2には、基板マーク観測用の複数の観測窓が設けてある。この観測窓にカメラの鏡筒21を挿入して、基板に設けたマークをカメラにより認識する。カメラの鏡筒21は、水平方向(X、Y方向)移動軸および垂直方向(Z方向)の移動軸を備えた移動ステージ上に設置されており、その移動ステージは上チャンバT2上に固定してある。さらに、上側テーブル2には、基板マーク認識用の穴が、上記観測窓と対応する位置に設けてある。
【0016】
本実施形態ではカメラをチャンバの外に配置する構成としたが、このカメラを上側テーブル2に直接取付けた構成とすることで、カメラを基板に近づけて配置でき、カメラによるマーク認識精度を向上が向上し、基板間の位置合わせ精度を向上できる。
【0017】
さらに、基板への加圧力を測定するために、支持脚3の中間ベース板8とボールネジの間にロードセル22を設けてある。また、上テーブルの平坦度を調整する際に、各調整脚4を駆動するモータ14が過負荷とならないようにモニタするために、加圧ベース板7上の各調整脚毎にロードセル23をそれぞれ設けてある。
【0018】
下チャンバT1内には下側テーブル24が固定されている。この下側テーブル24は、全面を下チャンバT1に接合固定すると、減圧時に下チャンバT1が変形した場合に、その変形を受け平坦度がずれる恐れがある。そのため、下チャンバT1の変形の影響を受けないように周辺部のみを固定している。また、下チャンバT1の全周には、後述するシールリング25を配置し、上チャンバT2が接触し、且つドアバルブ16が閉じた状態では内部が機密となり減圧室が構成される。
【0019】
下チャンバT1は、モータ26と図示していないボールネジおよび、回転ベアリング27により回転駆動するように構成したθベーステーブル28の上に設置してある。θベーステーブル28と下チャンバT1の締結には、箱型部材介在させて所定のスペースを確保できるようにしてある。このスペースは下チャンバT1の下側にUV照射機構40や基板保持爪昇降機構41、基板リフト機構42を取付けるために設けたものである。θベーステーブル28はYテーブル32上に回転ベアリング27を介して取付けてある。また、Yテーブル32はXテーブル33に設けたリニアレール上をモータ29により移動できるように設置されている。さらにXテーブル33は架台1側に設けたリニアレール上をモータ30を駆動することで移動できるように設けてある。
【0020】
また、上チャンバT2を下チャンバT1に接触して減圧室を構成したときに、シールリング25の潰れ量を一定にするため、θベーステーブル28の外周部上に複数個の上チャンバ用のボールベア34と、アジャスト機構付きの受け座35を設けてある。これらのボールベア34と受け座35で上チャンバ部T2の下降位置を調整している。
【0021】
さらにθベーステーブル28が変形しないように、θベーステーブル28の外周部を支持するように、装置ベース(架台)1上に固定した部材に複数個のθベースプレート28用のボールベア37と、アジャスト機構つきの受け座38を設けてある。これでθベースプレート28からの荷重を受けている。このように、チャンバ用のボールベア34と、θベーステーブル用のボールベア37との2段で上下チャンバの周囲の荷重を受けるように構成
したため、チャンバの変形を小さく抑えることができる。
【0022】
下チャンバT1にはマーク認識を行なうための複数の透過照明39を設け、下側テーブル24の対応する位置に穴をあけてある。さらに、下チャンバT1内には、貼合せた基板がずれないようにUV接着剤を潰して硬化させるために、複数の加圧・UV照射機構40を設けてある。さらに、基板の搬入・搬出を行なう際、基板の幅方向の撓みを防ぐための保持爪昇降機構41や、ロボットハンドの撓み、ならびに前後方向の基板の撓みを防ぐための回転昇降ピンや、貼り合せた基板を昇降するための基板リフト機構43がそれぞれ設けてある。
【0023】
下側テーブル24には、加圧・UV照射機構40が下側テーブル24内を上下に移動出来るように穴が設けてある。なお、加圧・UV照射機構40は、回転昇降ピンを兼用できるようにしてある。また基板リフト機構43が上下に移動できるように、基板支持側に溝(切り欠き部)がそれぞれ設けてある。基板の搬入及び搬出の際に、この基板リフト機構43を動作させて基板下面側にロボットハンドが挿入できるようにしている。これらの穴、あるいは溝は、下チャンバT1に下側テーブル24を固定してあるため、最小の余裕代を設けるのみでよい。
【0024】
さらに、加圧・UV照射機構40と、保持爪昇降機構41と、基板リフト機構42とは、それぞれ下チャンバT1を貫通する上下移動機構を持つているが、下チャンバT1とこれら上下移動機構部との間にOリングが設けてあり、これにより気密を保つ構造としている。
【0025】
減圧状態での上側テーブル2による上側基板の保持機構は、静電チャックにより電気的に保持する機構、あるいは粘着材により物理的に保持する機構のいずれでも良い。静電チャックにより電気的に保持する場合には、印加電圧を切断し、一定の除電時間後に上側テーブル2を上昇することにより、上側テーブル2による保持を中断できる。また、粘着材により保持する場合には、上側基板を機械的に下側の基板に押し付ける複数のピンを設けておき、ピンを下側に押し付けた状態で上側テーブル2のみを上昇することにより上側の基板の保持を中断できる。
【0026】
他方減圧状態での下側テーブル24による下側基板の保持機構も同様に、静電チャックにより電気的に保持する静電吸着機構を備えた方法、あるいは粘着材により物理的に保持する粘着保持機構を備えた方法のいずれでも良い。上側テーブル2と下側テーブル24の吸着方法の組み合わせは、上側テーブル2、下側テーブル24いずれも静電チャックとするか、上側テーブル2、あるいは下側テーブル24のいずれか一方を静電チャックとし他方を粘着材とすることが基準となる平坦部を持ち、テーブル間を平行に組立てることが容易となり、よって上下の基板を均一に貼り合せることが可能となるという点で好ましい。なお、本実施形態では負圧による吸引吸着をする吸引吸着機構と静電力による静電吸着機構の両方を兼用できるように構成してある。
【0027】
減圧チャンバ内の減圧は、上下いずれかのチャンバに設けた図示していない排気口を通して真空バルブ、およびドライポンプあるいはターボ分子ポンプの真空ポンプに接続して行なう。またチャンバ内の大気ベントは、これも図示していない上下いずれかのチャンバに設けたバルブを通して窒素などの不活性ガス、あるいは大気を導入して行なう。大気ベントはチャンバへの水分の付着を少なくし、チャンバ内を減圧するための時間を短縮する意味から、水分子の含有量が少ない窒素などの不活性ガスが好ましい。
【0028】
以上本発明を適用する基板組立装置の一例として、減圧チャンバを2分割できる構成で説明したが、この例の構成に限らず減圧チャンバを一体化した構成とした場合の装置でも、上側テーブルに一方の基板を保持して、その状態で上側テーブルを他方の基板を保持した下側テーブル側に移動する(基板間隔を狭める)ことで基板同士を貼り合わせる装置であれば適用できるものである。
【0029】
図2に基板組立装置内に搬入するためのロボットハンドのハンド部の構造を示したものである。図3に加圧板の吸着パッド部における基板吸着の模式図を示す。
【0030】
図2において、ロボットハンドのハンド部は腕部52から複数本の基板60を支持するための指部51が設けてあり、この指部51には複数の吸着パッド53が設けてある。この吸着パッド53は先端部に吸着孔が設けてあり、負圧により基板60を吸着できるようになっている。この指部51の吸着パッド53は上下に移動可能になっており、保持する基板60の面取り数に応じて、液晶表示部の面に接触する部分の吸着パッド53を、予め基板面に接触しない位置に退避させておく構成となっている。このため、図2(b)に示すように1面取りの基板60の場合、中央部の指に設けた吸着パッド53のうち、中央部の吸着パッド53bは基板面に接触しないように退避させ、周辺部の吸着パッド53aで基板60を支持するようにしている。
【0031】
このため、図2(b)に示すように、基板は中央部に凹に支持されることになる。この状態で加圧板(上テーブル)2に設けた吸引孔で負圧により吸引吸着する場合、基板60の中央部には負圧が作用せずに上テーブル2に基板60が保持できない場合が発生する。また、保持できた場合でも基板の吸着が均一にならず、基板に局所的に大きな引張り力が作用し、貼り合わせ時の精度低下をもたらす一因ともなる。そこで、本実施形態では、図3に示すように、上テーブル(加圧板)2に基板中央部を確実に吸着できるように上下に移動可能な吸着パッドを、加圧板2の中央部近傍に複数個設けたものである。
【0032】
吸着パッドは上下動させるためのエアシリンダ55と、エアシリンダ55により伸び縮みするロッド部57と先端のパッド部56とからなる。又、図示していないがロッド部57は中空になっており、そこに負圧のエアーを供給する構成となっている。なお先端のパッド部56にもロッド部57の中空部に連通する穴が設けてある。
【0033】
図3には図示していないが、加圧板2の基板吸着面には複数の負圧による吸引吸着孔が設けてある。前記構成でロボットハンド50から基板60の受け渡し作業を行う場合、加圧板2の負圧による吸引吸着機構を動作させると共に、上下動可能な吸着パッドのロッド部57を基板側に、必要な量だけ伸ばして、パッド部56で基板60を保持した後、ロッド部57を上テーブル2の基板保持面まで後退させることで、中央部付近の吸引吸着孔に確実に吸着するようにしたものである。なお、基板60に加圧力を作用させて貼り合せを行っている時は、パッド部56も吸引吸着孔として負圧が供給されている。なお、パッド部56は基板60に接触した時に基板60を傷つけないようにゴム等の弾性体で構成されている。
【0034】
本実施形態ではロッド部57の上下の移動は、エアシリンダで行うようにしている。この駆動部は本実施形態では減圧チャンバT2の外側に取り付ける様にしているが、加圧板の加圧面と反対側面に取り付ける構成としても良い。また、吸着パッドのロッド部57の伸び量は、予め基板の撓み量を測定しておき、測定量に応じて伸びを抑制するストッパの位置を可変しておくことにより伸び量を所定量にしている。又駆動装置として、モータ等を用いる構成としても良いし、搬入された基板毎に撓み量を計測するセンサを設けておき、その計測結果に応じてロッド部57の伸び量を制御することも可能である。
【0035】
以上は、基板60の中央部に撓みが発生した場合に動作させる機構を説明したが、ロボットハンド50の複数の本の指部51で基板60を搬入する場合、指部51の剛性を大きくするために、指部51が大きくなりロボットハンド50の動作を阻害する。このため、指部51の剛性を大きくできない。このため、大型基板搬入時に図4のように指部51の先端部が撓み、加圧板2は負圧により基板60を吸着できなくなる場合が発生する。そのため、チャンバ内に上基板60を吸引吸着する前に基板60の先端部を持ち上げるための補正爪を有する基板先端補正機構70を設けている。この基板先端補正機構70は、基板を端部を保持する基板端保持部71と、ロボットハンドの指部51を持ち上げるための指部保持部72を供えている。基板端保持部71はロボットハンドの隣り合う指部間に設けてあり、図4(a)のように基板の指間の撓みを補正して加圧板2に吸着し易くしている。このため、指部の先端側だけなく、腕部側にも基板端保持部71を設けてある。
【0036】
本図では、下側チャンバT1にシリンダにより上下する基板先端補正機構70を設けている。これにより、ロボットハンド50の指部51が撓んでも確実に基板60を加圧板2に吸着することができる。
【0037】
なお、基板先端補正機構70を設ける代わりに、先の実施例と同じく、ロボットハンド50の指部51先端側の基板保持部の位置(チャンバの基板搬入口側に対して反対側、即ち一番奥側の位置)に相当する位置の加圧板2に、上下の駆動機構を備えた吸着パッドを設ける構成としても良い。
【0038】
図5に本発明の他の実施形態を示す。本実施形態では加圧板2に設ける吸引吸着孔を複数の群(R1、R2、R3)に分割して、各群毎に供給する負圧力を可変できるように負圧源をそれぞれ設けるか、1つの負圧源を分岐させ、配管途中に調圧弁を設けて調整できるようにする。
【0039】
図5においては、吸引吸着孔を3つの群R1,R2,R3に分け、それぞれの負圧源をA1とA2の2つの負圧力を加えられるようにしたものである。基板60の中央部には、液晶パネルの配向膜等が形成されているため、ロボットハンドの両側の吸着パッド53により支持され組立装置内に運ばれてきている。このため、図5(a)のように基板中央部が撓んで加圧板2より距離のある状態となっている。そのため、中央の吸引吸着孔R2にまず大きな負圧力A1を作用させて、基板中央部を吸着する(図5(b))。次に、両側の吸引吸着孔R1、R3に中央部に加えた負圧力A1より小さな負圧力A2を加えることで基板60に歪の残らない状態で加圧板2に基板60を吸着することが可能となる(図5(c))。本実施形態では吸着孔を3つの群に分割化した状態を例にとって説明したが、さらに、細かに分割した群とし、基板中央部から基板端部に向かって徐々に吸着することで、さらに高精度の吸着が可能となる。また、本動作は、図3で説明した上下動可能な吸着パッド56を加圧板2に複数配置し、中央部か周囲に向って順次吸引吸着し引き上げ行い、これに対応する加圧板2に備えてある複数の吸引吸着孔により吸着していくことによっても実現できる。なお、図示していないが加圧板には、基板組立装置のチャンバ内を減圧した時に基板の落下を防止するために、前述の吸引吸着機構の他に、粘着保持機構や静電吸着機構を併設してある。
【0040】
次に本発明になる基板組立て装置1により、液晶パネルを貼り合わせる動作について説明する。
【0041】
まず、接着剤を枠状に液晶パネルの外周を囲むブラックマトリクス状あるいはこの近辺に塗布した上側基板を、接着剤を塗布した面が下側となるように反転した状態で配置しロボットハンドの下側に位置する一方の指部上に載置する。また、表面に予め液晶を塗布した下側基板を液晶の滴下面が上側になるように配置した状態で、上側に位置するロボットハンドの他方の指部上に搭載する。このように、2枚の基板を上下の指部上に搭載した状態でロボットハンドが貼り合せ装置の前に移動する。基板組立装置1は上チャンバT2部のドアバルブ16を開け、ロボットハンドは下側の指部上にある反転した上側基板を装置内に挿入する。
【0042】
基板組立装置1は上側テーブル2を下降し、負圧による吸引吸着により上側テーブル2の下に反転した上側基板を吸着保持する。このとき、基板に撓みがあるときは基板先端補正機構70や吸着パッドを一緒に動作させて、平坦に保持する。すなわち、基板に撓みがある場合は、吸着パッドをテーブル面から基板の吸着できる位置まで突出させておき、吸着パツドが基板を吸着すると吸着パッド面が上テーブル面の位置になるまで後退させることで、テーブル面に基板を平坦に保持することができる。
【0043】
なお上側テーブルの吸着孔が複数の群に分けられている場合は、中央部の吸着孔から順次端部側の吸着孔に向かって負圧を作用させることで、基板を歪の残らないように平坦に保持することが可能となる。
【0044】
次に、下側ロボットハンドは一旦基板組立装置1内から後退し、この後退を待って基板組立装置1は下側テーブル24上にある既に貼り合せの終わった液晶パネルを基板リフト機構43、および保持爪昇降機構41を用いて上方に持ち上げる。その状態で下側ロボットハンドを再び基板組立装置1内の液晶パネル下側に挿入し、ハンドを上方に持ち上げた後、これを後退させることにより液晶パネルを基板組立装置1から外部に取り出す。基板組立装置1は基板リフト機構43、および保持爪昇降機構41を下降させる。
【0045】
次に、上側のロボットハンド上にある、予め液晶を塗布した下側基板を基板組立装置1内に挿入する。基板組立装置1は保持爪昇降機構41を上昇し、下側基板を持ち上げロボットハンドの後退を待って下側基板を下側テーブル24の上に設置、下側基板を吸引吸着する。
【0046】
次に、上側基板の基板マーク位置をカメラの鏡筒21を垂直方向の移動軸を下降して測定し、水平方向移動軸を用いて上側基板のマーク中心位置とカメラの鏡筒21の中心が一致する位置に移動する。続いて、上側テーブル2を下降し、上側基板と下側基板のマーク位置のずれをカメラの鏡筒21により測定する。そして、ボールベア34を図示していない昇降機構で持ち上げることで、アジャスト機構付きの受け座35を通して上チャンバ部T2を上昇し、シールリング25と上チャンバ部T2とが僅かに接触するか、又は接触しないようにして(シールリングに上チャンバの荷重が作用しないようにして)、下チャンバ部T1をモータ26、モータ29、モータ30を駆動する。これにより下チャンバT1と一緒に下側テーブル24がXYθ方向に水平移動して、下基板と、上基板のアライメントマークの粗位置決めを行なう。粗位置決め終了後、ボールベア34を下降する。次に、上下のテーブルが静電チャックによる基板吸着を用いている場合には、静電チャックに電圧を印加し、基板の吸着を行なう。この状態で、ドアバルブ16を閉じ真空ポンプを用い減圧チャンバ内を減圧排気する。減圧排気中は上下基板間のガスが排気されやすいよう上側テーブル2を上昇しておく。
【0047】
減圧チャンバ内が一定の減圧状態になった後、再び上側テーブル2を下降し、上下の基板間の位置ずれを測定し、下チャンバT1部をモータ26、モータ29、モータ30を駆動することによりXYθ方向に水平移動して、下基板と、上基板のアライメントマークの微位置決めを行なう。微位置決め終了後、ロードセル22の値を測定しながら、さらに上側テーブル2を下降し、基板の加圧・貼合せを行なう。加圧力が接着剤を潰す所定の値に到達した後、加圧を終了し、加圧・UV照射機構40により、基板の仮止め位置に予め塗布された仮止め用のUV接着剤を加圧しながらUV光を照射、基板の位置がずれないように仮止めを行なう。
【0048】
仮止めが終了した後、加圧・UV照射機構40を上昇する。上側テーブル2が静電チャックによる真空中での吸着を利用している場合には、電圧を切断し、除電時間分待機した後上側テーブル2を上昇する。上側テーブル2が粘着を利用している場合には、複数のピンにより上側基板を機械的に下側の基板に押し付、ピンを下側に押し付けた状態で上側テーブルのみを上昇することにより上側の基板の保持を中断する。
【0049】
この後、減圧チャンバに設けたバルブを通して窒素などの不活性ガス、あるいは大気を減圧チャンバ内に導入し大気に開放する。続いてドアバルブ16を開放し、基板の搬入および搬出を行なう。基板組立て装置1の真空チャンバ内について、クリーニング等のメンテナンスを行なう場合には、上チャンバ部T2に取り付けた締結機構を動作させて、加圧ベース板7と上チャンバT2部を一体化して、駆動モータ10を用いて上側テーブル2と一緒にZ軸方向に持ち上げる。これによりチャンバを開放した状態で上下テーブルのメンテナンスを行なうことが可能となる。前述のように、本実施形態では、大型基板を上側テーブルに保持する際に、基板搬入時に発生している基板の撓みにより、上側テーブルに確実に基板を保持できないと言う問題を解決し、基板貼り合わせの精度の向上を図ることができる。
【0050】
【発明の効果】
以上説明したように本発明の基板貼合装置によれば、基板を装置内に搬入するとき、特に大型の上基板を上側テーブルに保持する際、基板に発生する撓みの影響をなくして確実に所定位置に基板を保持できるため、位置合わせの精度を向上できると共に、位置合わせに要する時間も短縮することが可能となる。
【図面の簡単な説明】
【図1】本発明の一実施形態になる基板組立て装置の構成を示す図である。
【図2】基板搬入に用いるロボットハンドの概要を示す図である。
【図3】加圧板に設けた吸着パッドの概略構成と、基板が撓んだときの保持の仕方を説明する図である。
【図4】ロボットハンドの指部の撓みによる基板撓みを補正する機構の説明図である。
【図5】本発明の他の実施形態の加圧板部の図である。
【符号の説明】
1…基板組立て装置、2…上側テーブル、3…支持脚、4…調整脚、5…Oリング、6…溶接ベローズ、7…加圧ベース板、8…中間ベース板、9…天井フレーム、10…駆動モータ、11…減速機、13…ボールスプラインガイド、14…駆動モータ、15…ボールネジ、16…ドアバルブ、17…イオナイザ、18…サブガイド、19…センター軸、20…観測窓、21…カメラの鏡筒、22…ロードセル、23…ロードセル、24…下側テーブル、25…シールリング、26…モータ、27…回転ベアリング、28…ベーステーブル、29…モータ、30…モータ、31…リニアガイド、32…Yテーブル、33…Xテーブル、34…ボールベア、35…アジャスト機構つきの受け座、36…装置ベース、37…ボールベア、38…アジャスト機構つきの受け座、39…透過照明、40…加圧・UV照射機構、41…保持爪昇降機構、42…回転昇降ピン、43…基板リフト機構、51…指部、53…吸着パッド、56…パッド部、57…ロッド部、60…基板。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a substrate bonding apparatus, and more particularly, to a substrate assembling apparatus suitable for assembling a liquid crystal display panel or the like in which substrates to be bonded are held and opposed to each other in a decompression chamber, and the distance between the substrates is reduced.
[0002]
[Prior art]
In manufacturing a liquid crystal display panel, two glass substrates provided with a transparent electrode and a thin film transistor array are attached with an adhesive (hereinafter, also referred to as a sealing agent) provided on a peripheral portion of the substrate at an extremely close interval of about several μm. There is a step of bonding (hereinafter, the substrate after bonding is called a cell) and sealing a liquid crystal in a space formed by the bonding.
[0003]
To seal this liquid crystal, the liquid crystal is dropped on one substrate in which a sealing agent is drawn in a closed pattern so as not to provide an injection port, and the other substrate is placed on one substrate in a vacuum chamber. For example, there is a method proposed in Japanese Patent Application Laid-Open No. 2000-284295 in which the upper and lower substrates are arranged close to each other and bonded together.
[0004]
[Patent Document 1]
JP 2000-284295 A
[Problems to be solved by the invention]
In the prior art disclosed in Japanese Patent Application Laid-Open No. 2000-284295, the lower substrate is mounted on a flat stage for holding the substrate in a vacuum, but the upper substrate is suction-adsorbed by negative pressure in the atmospheric state. When a predetermined vacuum state is reached, the substrate is held by electrostatic attraction by electrostatic force. By the way, recently, there is a tendency that the size of the substrate becomes larger than 1 mx 1 m and the thickness of the substrate becomes thinner from 0.7 mm to 0.63 mm and 0.5 mm. Therefore, when the substrate is sucked and held by the pressing plate (at the upper table), the bending of the substrate increases the peripheral portion of the central portion of the substrate and the distance between the substrate and the pressing plate at the central portion of the substrate. When the pressure plate is delivered, the substrate may not be able to be held. In particular, in the case of holding a large-screen substrate, an alignment film, a TFT, and the like are formed in the center of the substrate, so that only the peripheral portion of the substrate can be supported, and it is difficult to prevent the substrate from bending. Also, the robot hand fingers for holding and transporting the substrate become long, and the tip side is bent when holding the substrate, so that the distance between the substrate and the pressure plate on the tip side of the robot hand also becomes large, and the substrate cannot be sucked. For this reason, unless the above-mentioned problem for a large-sized substrate is solved, accurate bonding cannot be performed.
[0006]
Also, if the substrate is sucked from the center and both ends in a state where the center of the substrate is bent, a residual stress is generated near the center (portion while being gripped) and the reference mark ( In some cases, the substrate is held in a state where the position of the alignment mark is shifted, and the bonding accuracy is reduced.
[0007]
Therefore, an object of the present invention is to provide a substrate assembling apparatus which can securely hold a substrate even when the substrate is enlarged, can perform bonding with high accuracy and at high speed, and has high productivity.
[0008]
[Means for Solving the Problems]
In order to achieve the above object, according to the present invention, a chamber for creating a reduced-pressure atmosphere, a pressure plate configured to hold one substrate in the chamber and move up and down, and a substrate held by the pressure plate A substrate holding table for holding the other substrate at an interval facing the other, driving the substrate holding table, performing alignment of the one substrate and the other substrate, and driving the pressing plate up and down. In a substrate assembling apparatus that narrows an interval between substrates and performs bonding in a reduced-pressure atmosphere with an adhesive provided on one of the substrates, a plurality of suction holes by negative pressure are used to hold the substrate on the pressure plate. In addition to the plurality of electrostatic suction mechanisms, a plurality of vertically movable suction pads are provided near the center of the pressure plate.
[0009]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
[0010]
In FIG. 1, the substrate assembling apparatus includes a lower chamber T1 and an upper chamber T2. In the upper chamber T2, an upper table 2 (hereinafter, also referred to as a pressure plate) is provided so as to be vertically movable by supporting legs 3 and a plurality of adjusting legs 4 penetrating the upper chamber T2. The supporting leg 3 is blocked by an O-ring 5 and the adjusting leg 4 is blocked by a welding bellows 6 so that the inside of the upper chamber T2 does not communicate with the atmosphere. The support leg 3 and the adjustment leg 4 of the upper table 2 are fixed to the pressure base plate 7.
[0011]
Further, the center of the pressure base plate 7 is fixed to the intermediate base plate 8. The intermediate base plate 8 is configured to be able to move up and down by using a ball spline guide 13 as a guide by operating a drive mechanism including a drive motor 10 and a speed reducer 11 mounted on the ceiling frame 9 and a ball screw 12. I have. The ceiling frame 9 is supported by supporting columns provided on the gantry 1 separately from the ball spline guide. The other end of each adjustment leg 4 having one end fixed to the pressure base plate 7 is connected to a ball screw 15 driven by a drive motor 14 attached to the intermediate base plate 8. The upper table 2 can be moved up and down while maintaining flatness by driving a vertical adjustment mechanism including the drive motor 14 and the ball screw 15 to apply a force to the pressure base plate 7.
[0012]
The upper chamber T2 is provided with a fastening mechanism for coupling between the pressurized base plates 7, and when the upper chamber T2 is separated from the lower chamber T1, this fastening mechanism is operated to connect the pressurized base plate and the upper chamber T2. And the drive motor 10 is operated to lift it upward.
[0013]
Further, a door valve 16 for loading / unloading the substrate into / from the chamber is provided on the side outer wall of the upper chamber T2. Further, an ionizer 17 is provided at a position of the upper chamber side wall opposite to the door valve 16 so that the substrate can be neutralized by blowing ionized ultrasonic air onto the substrate surface. Further, an ionizer 17a is provided near the door valve 16 on the outside of the chamber, so that the ionization air can be blown while the door is opened, thereby improving the static elimination effect of the substrate.
[0014]
On the outer wall of the upper surface of the upper chamber T2, a plurality of sub-guides 18 having a bush structure are provided so as to project a center shaft 19 into the chamber. The center shaft 19 can adjust the horizontal direction of the upper table 2 by engaging with a hole provided in a protrusion provided on the outer periphery of the upper table 2. That is, the sub guide 18 and the center shaft 19 operate as a horizontal adjustment mechanism of the upper table 2.
[0015]
The upper chamber T2 is provided with a plurality of observation windows for observing substrate marks. The lens barrel 21 of the camera is inserted into the observation window, and the mark provided on the substrate is recognized by the camera. The lens barrel 21 of the camera is set on a moving stage having a horizontal (X, Y direction) moving axis and a vertical (Z direction) moving axis, and the moving stage is fixed on the upper chamber T2. It is. Further, the upper table 2 is provided with holes for recognizing substrate marks at positions corresponding to the observation windows.
[0016]
In the present embodiment, the camera is arranged outside the chamber. However, by adopting a structure in which the camera is directly attached to the upper table 2, the camera can be arranged close to the substrate, and the accuracy of mark recognition by the camera is improved. And the alignment accuracy between the substrates can be improved.
[0017]
Further, a load cell 22 is provided between the intermediate base plate 8 of the support leg 3 and the ball screw to measure the pressure applied to the substrate. Further, when adjusting the flatness of the upper table, in order to monitor the motor 14 for driving each adjustment leg 4 so as not to be overloaded, a load cell 23 is provided for each adjustment leg on the pressure base plate 7. It is provided.
[0018]
The lower table 24 is fixed in the lower chamber T1. When the entire surface of the lower table 24 is fixedly joined to the lower chamber T1, if the lower chamber T1 is deformed during decompression, the flatness may be deviated due to the deformation. Therefore, only the peripheral portion is fixed so as not to be affected by the deformation of the lower chamber T1. Further, a seal ring 25 described later is arranged all around the lower chamber T1, and when the upper chamber T2 is in contact and the door valve 16 is closed, the inside is confidential and a decompression chamber is formed.
[0019]
The lower chamber T1 is installed on a θ base table 28 that is configured to be rotationally driven by a motor 26, a ball screw (not shown), and a rotary bearing 27. When fastening the θ base table 28 and the lower chamber T1, a box-shaped member is interposed to secure a predetermined space. This space is provided for mounting the UV irradiation mechanism 40, the substrate holding claw elevating mechanism 41, and the substrate lift mechanism 42 below the lower chamber T1. base table 28 is mounted on Y table 32 via rotary bearing 27. Further, the Y table 32 is installed so as to be movable by a motor 29 on a linear rail provided on the X table 33. Further, the X table 33 is provided so as to be movable by driving a motor 30 on a linear rail provided on the gantry 1 side.
[0020]
Further, when the upper chamber T2 is brought into contact with the lower chamber T1 to form a decompression chamber, a plurality of ball chambers for the upper chamber are provided on the outer peripheral portion of the θ base table 28 in order to keep the amount of collapse of the seal ring 25 constant. 34 and a receiving seat 35 with an adjustment mechanism. The lower position of the upper chamber portion T2 is adjusted by the ball bear 34 and the receiving seat 35.
[0021]
Further, a plurality of ball carriers 37 for the θ base plate 28 and an adjustment mechanism are attached to a member fixed on the device base (stand) 1 so as to support the outer peripheral portion of the θ base table 28 so that the θ base table 28 is not deformed. An attached receiving seat 38 is provided. Thus, the load from the θ base plate 28 is received. As described above, the configuration is such that the load around the upper and lower chambers is received in two stages, the ball carrier 34 for the chamber and the ball carrier 37 for the θ base table, so that the deformation of the chamber can be suppressed to a small level.
[0022]
The lower chamber T1 is provided with a plurality of transmitted illuminations 39 for recognizing marks, and has holes at corresponding positions on the lower table 24. Further, a plurality of pressure / UV irradiation mechanisms 40 are provided in the lower chamber T1 in order to crush and cure the UV adhesive so that the bonded substrates do not shift. Further, when loading / unloading the substrate, the holding claw lifting / lowering mechanism 41 for preventing the bending in the width direction of the substrate, the bending of the robot hand, and the rotating lifting / lowering pin for preventing the bending of the substrate in the front-back direction, A substrate lift mechanism 43 for lifting the combined substrate is provided.
[0023]
The lower table 24 is provided with holes so that the pressure / UV irradiation mechanism 40 can move up and down in the lower table 24. The pressure / UV irradiation mechanism 40 can also be used as a rotary elevating pin. Grooves (notches) are provided on the substrate support side so that the substrate lift mechanism 43 can move up and down. When loading and unloading the substrate, the substrate lift mechanism 43 is operated so that the robot hand can be inserted into the lower surface of the substrate. Since these holes or grooves fix the lower table 24 to the lower chamber T1, it is only necessary to provide a minimum allowance.
[0024]
Further, the pressurizing / UV irradiation mechanism 40, the holding claw elevating mechanism 41, and the substrate lift mechanism 42 each have a vertical movement mechanism that penetrates the lower chamber T1, but the lower chamber T1 and these vertical movement mechanism parts And an O-ring is provided between them, thereby providing a structure for maintaining airtightness.
[0025]
The mechanism for holding the upper substrate by the upper table 2 in the depressurized state may be either a mechanism for holding electrically by an electrostatic chuck or a mechanism for holding physically by an adhesive. In the case of electrically holding by the electrostatic chuck, the holding by the upper table 2 can be interrupted by cutting off the applied voltage and raising the upper table 2 after a certain static elimination time. When holding with an adhesive material, a plurality of pins are provided for pressing the upper substrate mechanically against the lower substrate, and only the upper table 2 is raised while the pins are pressed downward, whereby the upper substrate is raised. Holding of the substrate can be interrupted.
[0026]
On the other hand, the mechanism for holding the lower substrate by the lower table 24 in a reduced pressure state is also a method including an electrostatic chucking mechanism for electrically holding by an electrostatic chuck, or an adhesive holding mechanism for physically holding by an adhesive. Any of the methods including The combination of the suction methods of the upper table 2 and the lower table 24 is such that either the upper table 2 or the lower table 24 is an electrostatic chuck, or either the upper table 2 or the lower table 24 is an electrostatic chuck. The other is preferably made of an adhesive material because it has a flat portion as a reference, and it is easy to assemble the tables in parallel, so that the upper and lower substrates can be uniformly bonded. In the present embodiment, the suction suction mechanism that performs suction suction using a negative pressure and the electrostatic suction mechanism that uses electrostatic force can be used.
[0027]
The pressure in the decompression chamber is reduced by connecting to a vacuum valve and a vacuum pump such as a dry pump or a turbo molecular pump through an exhaust port (not shown) provided in one of the upper and lower chambers. The venting of the atmosphere in the chamber is performed by introducing an inert gas such as nitrogen or the atmosphere through a valve provided in one of the upper and lower chambers (not shown). An air vent is preferably an inert gas such as nitrogen having a small content of water molecules, from the viewpoint of reducing adhesion of moisture to the chamber and shortening the time for depressurizing the inside of the chamber.
[0028]
As described above, as an example of the substrate assembling apparatus to which the present invention is applied, the configuration in which the decompression chamber can be divided into two has been described. However, the present invention is not limited to the configuration of this example. Any apparatus can be applied as long as the apparatus holds the substrates and moves the upper table toward the lower table holding the other substrate (narrows the substrate interval) in this state to bond the substrates together.
[0029]
FIG. 2 shows a structure of a hand portion of a robot hand to be carried into the substrate assembling apparatus. FIG. 3 shows a schematic diagram of substrate suction at the suction pad portion of the pressure plate.
[0030]
In FIG. 2, the hand portion of the robot hand is provided with a finger portion 51 for supporting a plurality of substrates 60 from an arm portion 52, and the finger portion 51 is provided with a plurality of suction pads 53. The suction pad 53 has a suction hole at a tip end thereof, so that the substrate 60 can be suctioned by a negative pressure. The suction pad 53 of the finger portion 51 can be moved up and down, and according to the number of chamfers of the substrate 60 to be held, the portion of the suction pad 53 that comes into contact with the surface of the liquid crystal display portion does not contact the substrate surface in advance. It is configured to be retracted to a position. For this reason, in the case of a single-chamfered substrate 60 as shown in FIG. 2B, of the suction pads 53 provided on the center finger, the central suction pad 53b is retracted so as not to contact the substrate surface. The substrate 60 is supported by the suction pad 53a in the peripheral portion.
[0031]
For this reason, as shown in FIG. 2B, the substrate is supported concavely at the center. In this state, when suction is performed by suction using a suction hole provided in the pressure plate (upper table) 2 due to a negative pressure, the substrate 60 may not be able to be held on the upper table 2 without applying a negative pressure to the central portion of the substrate 60. I do. Further, even when the substrate can be held, the suction of the substrate is not uniform, and a large tensile force acts locally on the substrate, which is one of the causes of a decrease in accuracy at the time of bonding. Therefore, in the present embodiment, as shown in FIG. 3, a plurality of suction pads which can be moved up and down so that the center of the substrate can be reliably sucked to the upper table (pressing plate) 2 are provided near the center of the pressing plate 2. Are provided.
[0032]
The suction pad includes an air cylinder 55 for moving up and down, a rod portion 57 that expands and contracts by the air cylinder 55, and a pad portion 56 at the tip. Although not shown, the rod portion 57 is hollow, and is configured to supply negative-pressure air thereto. A hole communicating with the hollow portion of the rod portion 57 is also provided in the pad portion 56 at the tip.
[0033]
Although not shown in FIG. 3, the suction surface of the pressure plate 2 is provided with a plurality of suction suction holes by a negative pressure. In the case of performing the work of transferring the substrate 60 from the robot hand 50 in the above-described configuration, the suction / suction mechanism using the negative pressure of the pressure plate 2 is operated, and the rod portion 57 of the suction pad that can move up and down is moved to the substrate side by a required amount. After being extended and holding the substrate 60 with the pad portion 56, the rod portion 57 is retracted to the substrate holding surface of the upper table 2 so that the suction portion is reliably sucked in the suction hole near the center. When bonding is performed by applying a pressing force to the substrate 60, a negative pressure is also supplied to the pad portion 56 as a suction suction hole. The pad portion 56 is made of an elastic material such as rubber so as not to damage the substrate 60 when it comes into contact with the substrate 60.
[0034]
In the present embodiment, the vertical movement of the rod portion 57 is performed by an air cylinder. In this embodiment, the drive unit is mounted outside the decompression chamber T2, but may be mounted on the side opposite to the pressing surface of the pressing plate. The amount of elongation of the rod portion 57 of the suction pad is set to a predetermined amount by measuring the amount of bending of the substrate in advance and changing the position of a stopper that suppresses elongation according to the measured amount. I have. Further, a motor or the like may be used as the driving device, or a sensor for measuring the amount of bending of each loaded substrate may be provided, and the amount of extension of the rod portion 57 may be controlled according to the measurement result. It is.
[0035]
In the above, the mechanism that operates when the central portion of the substrate 60 bends has been described. However, when the substrate 60 is carried in by a plurality of fingers 51 of the robot hand 50, the rigidity of the fingers 51 is increased. Therefore, the finger portion 51 becomes large and hinders the operation of the robot hand 50. Therefore, the rigidity of the finger portion 51 cannot be increased. For this reason, when the large substrate is carried in, the distal end of the finger portion 51 is bent as shown in FIG. 4, and the pressure plate 2 may not be able to suck the substrate 60 due to the negative pressure. Therefore, a substrate tip correction mechanism 70 having a correction claw for lifting the tip of the substrate 60 before sucking and sucking the upper substrate 60 is provided in the chamber. The substrate leading end correction mechanism 70 includes a substrate end holding unit 71 for holding an end of the substrate, and a finger holding unit 72 for lifting the finger 51 of the robot hand. The substrate end holding portion 71 is provided between adjacent finger portions of the robot hand, and corrects bending between the fingers of the substrate as shown in FIG. For this reason, the substrate end holding part 71 is provided not only on the tip end side of the finger part but also on the arm part side.
[0036]
In this drawing, a substrate tip correction mechanism 70 that moves up and down by a cylinder is provided in the lower chamber T1. Thus, even if the finger portion 51 of the robot hand 50 bends, the substrate 60 can be reliably attracted to the pressure plate 2.
[0037]
Instead of providing the substrate leading end correction mechanism 70, as in the previous embodiment, the position of the substrate holding part at the leading end side of the finger 51 of the robot hand 50 (the opposite side to the substrate entrance side of the chamber, that is, A pressure pad 2 provided with a vertical drive mechanism may be provided on the pressure plate 2 at a position corresponding to the position on the back side.
[0038]
FIG. 5 shows another embodiment of the present invention. In this embodiment, the suction suction holes provided in the pressure plate 2 are divided into a plurality of groups (R1, R2, R3), and a negative pressure source is provided so that the negative pressure supplied to each group can be varied. The two negative pressure sources are branched, and a pressure regulating valve is provided in the middle of the piping so that the pressure can be adjusted.
[0039]
In FIG. 5, the suction suction holes are divided into three groups R1, R2, R3, and each of the negative pressure sources can apply two negative pressures A1 and A2. Since an alignment film or the like of a liquid crystal panel is formed at the center of the substrate 60, it is supported by the suction pads 53 on both sides of the robot hand and is carried into the assembling apparatus. For this reason, as shown in FIG. 5A, the central portion of the substrate is deflected to be at a distance from the pressure plate 2. For this reason, a large negative pressure A1 is first applied to the suction suction hole R2 at the center to suck the center of the substrate (FIG. 5B). Next, by applying a negative pressure A2 smaller than the negative pressure A1 applied to the central portion to the suction suction holes R1 and R3 on both sides, the substrate 60 can be suctioned to the pressure plate 2 without distortion remaining on the substrate 60. (FIG. 5C). In this embodiment, the state in which the suction holes are divided into three groups has been described as an example. However, the suction holes are further divided into smaller groups, and the suction holes are further gradually suctioned from the central portion of the substrate toward the edge of the substrate, thereby further increasing the height. Accurate suction becomes possible. In this operation, a plurality of vertically movable suction pads 56 described with reference to FIG. 3 are arranged on the pressing plate 2, and the suction pads 56 are sequentially suction-adsorbed and pulled up toward the center or the periphery, and the corresponding pressing plate 2 is provided. It can also be realized by performing suction using a plurality of suction suction holes. Although not shown, the pressure plate is provided with an adhesive holding mechanism and an electrostatic suction mechanism in addition to the suction and suction mechanism described above in order to prevent the substrate from dropping when the pressure in the chamber of the substrate assembling apparatus is reduced. I have.
[0040]
Next, an operation of bonding the liquid crystal panels by the substrate assembling apparatus 1 according to the present invention will be described.
[0041]
First, the upper substrate with the adhesive applied in a black matrix or around the periphery of the liquid crystal panel in a frame shape is placed in an inverted state so that the surface on which the adhesive is applied is on the lower side, and the lower side of the robot hand is placed. On one finger located on the side. In addition, the lower substrate whose surface is coated with liquid crystal in advance is mounted on the other finger portion of the robot hand positioned above, with the liquid crystal dropping surface arranged above. In this way, the robot hand moves in front of the bonding apparatus with the two substrates mounted on the upper and lower finger portions. The substrate assembling apparatus 1 opens the door valve 16 in the upper chamber T2, and the robot hand inserts the inverted upper substrate on the lower finger into the apparatus.
[0042]
The substrate assembling apparatus 1 descends the upper table 2 and sucks and holds the inverted upper substrate under the upper table 2 by suction suction using a negative pressure. At this time, if the substrate is bent, the substrate leading end correction mechanism 70 and the suction pad are operated together to hold the substrate flat. In other words, when the substrate is bent, the suction pad is projected from the table surface to a position where the substrate can be sucked, and when the suction pad sucks the substrate, the suction pad is retracted until the suction pad surface reaches the position of the upper table surface. The substrate can be held flat on the table surface.
[0043]
If the suction holes of the upper table are divided into a plurality of groups, a negative pressure is applied sequentially from the suction holes at the center to the suction holes at the end so that the substrate remains free from distortion. It can be kept flat.
[0044]
Next, the lower robot hand once retreats from the inside of the substrate assembling apparatus 1, and after this retreat, the substrate assembling apparatus 1 removes the liquid crystal panel on the lower table 24, which has been already bonded, by the substrate lift mechanism 43, and The holding claw elevating mechanism 41 is used to lift up. In this state, the lower robot hand is again inserted under the liquid crystal panel in the board assembling apparatus 1 and the hand is lifted up. Then, the liquid crystal panel is taken out of the board assembling apparatus 1 by retracting. The substrate assembling apparatus 1 lowers the substrate lift mechanism 43 and the holding claw elevating mechanism 41.
[0045]
Next, the lower substrate on the upper robot hand, on which liquid crystal has been applied in advance, is inserted into the substrate assembling apparatus 1. The substrate assembling apparatus 1 raises the holding claw elevating mechanism 41, lifts the lower substrate, waits for the robot hand to retreat, sets the lower substrate on the lower table 24, and sucks and sucks the lower substrate.
[0046]
Next, the substrate mark position of the upper substrate is measured by moving the camera barrel 21 down the vertical movement axis, and using the horizontal movement axis, the mark center position of the upper substrate and the center of the camera barrel 21 are determined. Move to a matching position. Subsequently, the upper table 2 is lowered, and the displacement of the mark position between the upper substrate and the lower substrate is measured by the lens barrel 21 of the camera. Then, the ball carrier 34 is lifted by a lifting mechanism (not shown) to raise the upper chamber portion T2 through the receiving seat 35 with the adjusting mechanism, and the sealing ring 25 and the upper chamber portion T2 are slightly in contact with each other. The lower chamber T1 is driven by the motor 26, the motor 29, and the motor 30 so that the load of the upper chamber does not act on the seal ring. As a result, the lower table 24 is horizontally moved in the X, Y, and θ directions together with the lower chamber T1 to perform coarse positioning of the alignment marks on the lower substrate and the upper substrate. After the coarse positioning is completed, the ball bear 34 is lowered. Next, when the upper and lower tables use the substrate chuck by the electrostatic chuck, a voltage is applied to the electrostatic chuck to suck the substrate. In this state, the door valve 16 is closed and the inside of the decompression chamber is evacuated using a vacuum pump. During the evacuation, the upper table 2 is raised so that gas between the upper and lower substrates is easily exhausted.
[0047]
After the inside of the decompression chamber is reduced to a certain decompression state, the upper table 2 is lowered again, the displacement between the upper and lower substrates is measured, and the lower chamber T1 is driven by the motor 26, the motor 29, and the motor 30. By horizontally moving in the XYθ directions, fine positioning of the alignment marks on the lower substrate and the upper substrate is performed. After the fine positioning is completed, the upper table 2 is further lowered while measuring the value of the load cell 22, and the substrates are pressed and bonded. After the applied pressure reaches a predetermined value for crushing the adhesive, the pressurization is terminated, and the pressurizing / UV irradiation mechanism 40 presses the temporary adhesive UV adhesive applied in advance to the temporary fixing position of the substrate. UV light is radiated, and temporary fixing is performed so that the position of the substrate does not shift.
[0048]
After the temporary fixing is completed, the pressure / UV irradiation mechanism 40 is raised. When the upper table 2 utilizes suction in a vacuum by the electrostatic chuck, the voltage is cut off, and the upper table 2 is moved up after waiting for the charge elimination time. When the upper table 2 uses adhesive, the upper substrate is mechanically pressed against the lower substrate by a plurality of pins, and only the upper table is raised while the pins are pressed downward, thereby raising the upper table. The holding of the substrate is interrupted.
[0049]
After that, an inert gas such as nitrogen or the atmosphere is introduced into the decompression chamber through a valve provided in the decompression chamber and released to the atmosphere. Subsequently, the door valve 16 is opened to carry in and carry out the substrate. When performing maintenance such as cleaning in the vacuum chamber of the substrate assembling apparatus 1, the fastening mechanism attached to the upper chamber portion T2 is operated to integrate the pressure base plate 7 and the upper chamber T2 portion and drive the same. It is lifted in the Z-axis direction together with the upper table 2 using the motor 10. This makes it possible to perform maintenance on the upper and lower tables with the chamber open. As described above, in the present embodiment, when a large substrate is held on the upper table, the problem that the substrate cannot be reliably held on the upper table due to the bending of the substrate occurring when the substrate is loaded is solved. The bonding accuracy can be improved.
[0050]
【The invention's effect】
As described above, according to the substrate bonding apparatus of the present invention, when carrying the substrate into the apparatus, particularly when holding a large upper substrate on the upper table, reliably eliminate the influence of the bending generated in the substrate. Since the substrate can be held at a predetermined position, the accuracy of the alignment can be improved and the time required for the alignment can be reduced.
[Brief description of the drawings]
FIG. 1 is a diagram showing a configuration of a board assembling apparatus according to an embodiment of the present invention.
FIG. 2 is a diagram illustrating an outline of a robot hand used for carrying in a substrate.
FIG. 3 is a diagram illustrating a schematic configuration of a suction pad provided on a pressure plate and a method of holding a substrate when it is bent.
FIG. 4 is an explanatory diagram of a mechanism that corrects substrate deflection due to deflection of a finger portion of the robot hand.
FIG. 5 is a view of a pressure plate portion according to another embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Board assembly apparatus, 2 ... Upper table, 3 ... Support leg, 4 ... Adjustment leg, 5 ... O-ring, 6 ... Weld bellows, 7 ... Pressure base plate, 8 ... Intermediate base plate, 9 ... Ceiling frame, 10 ... Drive motor, 11 ... Reducer, 13 ... Ball spline guide, 14 ... Drive motor, 15 ... Ball screw, 16 ... Door valve, 17 ... Ionizer, 18 ... Sub guide, 19 ... Center shaft, 20 ... Observation window, 21 ... Camera , 22 ... Load cell, 23 ... Load cell, 24 ... Lower table, 25 ... Seal ring, 26 ... Motor, 27 ... Rotating bearing, 28 ... Base table, 29 ... Motor, 30 ... Motor, 31 ... Linear guide, 32: Y table, 33: X table, 34: Ball bearing, 35: Receiving seat with adjustment mechanism, 36: Device base, 37: Ball bearing, 38: A Receiving seat with cast mechanism, 39: transmission illumination, 40: pressurizing / UV irradiation mechanism, 41: holding claw elevating mechanism, 42: rotating elevating pin, 43: substrate lifting mechanism, 51: finger part, 53: suction pad, 56 ... pad part, 57 ... rod part, 60 ... substrate.

Claims (8)

減圧雰囲気にするためのチャンバと、前記チャンバ内に一方の基板を保持し上下に移動可能に構成した加圧板と、前記加圧板に保持された基板に対向して間隔を空けて他方の基板を保持する基板保持テーブルと、前記基板保持テーブルを駆動して、前記一方の基板と他方の基板の位置合わせを行い、前記加圧板を上下に駆動して基板間の間隔を狭め、前記基板のどちらか一方に設けた接着剤により減圧雰囲気中で貼り合せを行う基板組立装置において、
前記加圧板に基板を保持するために負圧による複数の吸着孔を備え、前記複数の吸着孔のうち加圧板中央部近傍およびその周囲の吸着孔は上下移動機構を備えた複数の吸着パッドに設けたことを特徴とする基板組立装置。
A chamber for reducing the pressure, a pressure plate configured to hold one substrate in the chamber and move up and down, and to separate the other substrate at an interval facing the substrate held by the pressure plate. The substrate holding table to be held and the substrate holding table are driven to position the one substrate and the other substrate, and the pressure plate is driven up and down to reduce the distance between the substrates. In a substrate assembling apparatus that performs bonding in a reduced pressure atmosphere with an adhesive provided on one side,
The pressure plate has a plurality of suction holes by a negative pressure to hold a substrate, and among the plurality of suction holes, suction holes near and around the center of the pressure plate are provided on a plurality of suction pads having a vertical movement mechanism. A substrate assembling apparatus, comprising:
請求項1記載の基板組立装置において、前記複数の吸着パッドを加圧板中央部近傍に設けたことを特徴とする基板組立装置。2. The substrate assembling apparatus according to claim 1, wherein the plurality of suction pads are provided near a central portion of the pressure plate. 請求項1又は2項に記載の基板組立装置において、前記加圧板の基板搬入口から反対側でその端部側に複数の吸着パッドを設けたことを特徴とする基板組立装置。3. The substrate assembling apparatus according to claim 1, wherein a plurality of suction pads are provided at an end of the pressing plate opposite to the substrate carrying-in port and at an end thereof. 減圧雰囲気にするためのチャンバと、前記チャンバ内に一方の基板を保持し上下に移動可能に構成した加圧板と、前記加圧板に保持された基板に対向して間隔を空けて他方の基板を保持する基板保持テーブルと、前記基板保持テーブルを駆動して、前記一方の基板と他方の基板の位置合わせを行い、前記加圧板を上下に駆動して基板間の間隔を狭め、前記基板のどちらか一方に設けた接着剤により減圧雰囲気中で貼り合せを行う基板組立装置において、
前記加圧板に基板を搬送するロボットハンドの指部先端側の撓み量に応じて基板を加圧板側に押し上げるための基板先端補正機構をチャンバ内に設けたことを特徴とする基板組立装置。
A chamber for reducing the pressure, a pressure plate configured to hold one substrate in the chamber and move up and down, and to separate the other substrate at an interval facing the substrate held by the pressure plate. The substrate holding table to be held and the substrate holding table are driven to position the one substrate and the other substrate, and the pressure plate is driven up and down to reduce the distance between the substrates. In a substrate assembling apparatus that performs bonding in a reduced pressure atmosphere with an adhesive provided on one side,
A substrate assembling apparatus, wherein a substrate tip correcting mechanism for pushing up a substrate to a pressure plate side in accordance with an amount of bending of a finger end of a robot hand for transporting the substrate to the pressure plate is provided in a chamber.
減圧雰囲気にするためのチャンバと、前記チャンバ内に一方の基板を保持し上下に移動可能に構成した加圧板と、前記加圧板に保持された基板に対向して間隔を空けて他方の基板を保持する基板保持テーブルと、前記基板保持テーブルを駆動して、前記一方の基板と他方の基板の位置合わせを行い、前記加圧板を上下に駆動して基板間の間隔を狭め、前記基板のどちらか一方に設けた接着剤により減圧雰囲気中で貼り合せを行う基板組立装置において、
前記加圧板に吸引吸着するため、複数の吸引吸着孔を3つ以上の群に分割し、各群毎に吸着力を可変できるように負圧源か調圧弁を備えた構成とした基板組立装置。
A chamber for reducing the pressure, a pressure plate configured to hold one substrate in the chamber and move up and down, and to separate the other substrate at an interval facing the substrate held by the pressure plate. The substrate holding table to be held and the substrate holding table are driven to position the one substrate and the other substrate, and the pressure plate is driven up and down to reduce the distance between the substrates. In a substrate assembling apparatus that performs bonding in a reduced pressure atmosphere with an adhesive provided on one side,
A substrate assembling apparatus having a configuration in which a plurality of suction suction holes are divided into three or more groups for suction suction by the pressure plate, and a negative pressure source or a pressure regulating valve is provided so that suction force can be varied for each group. .
請求項1乃至5のいずれか1項に記載の基板組立装置において、
前記チャンバ内を減圧した時に、前記基板を保持するための静電吸着機構または粘着保持機構を備えていることを特徴とする基板組立装置。
The substrate assembling apparatus according to any one of claims 1 to 5,
A substrate assembling apparatus comprising an electrostatic suction mechanism or an adhesive holding mechanism for holding the substrate when the pressure in the chamber is reduced.
真空チャンバ内で2枚の基板を上下に間隔を開けて対向させて上下のテーブルに吸引吸着によりそれぞれ保持し、位置合わせを行い、両基板の間隔を狭めることで、どちらか一方の基板に設けた接着剤により両基板の貼り合わせを行う基板組立方法において、
前記上側テーブル基板を保持する場合に、前記基板の中央部から吸引吸着力を作用させることを特徴とする基板組立方法。
In a vacuum chamber, two substrates are opposed to each other with a space between them up and down, held by suction and suction on the upper and lower tables, respectively, aligned, and provided with one of the substrates by narrowing the space between both substrates. In the substrate assembling method of bonding both substrates with the adhesive,
A method of assembling a substrate, wherein, when the upper table substrate is held, a suction force is applied from a central portion of the substrate.
真空チャンバ内で2枚の基板を上下に間隔を開けて対向させて上下のテーブルに吸引吸着によりそれぞれ保持し、位置合わせを行い、両基板の間隔を狭めることで、どちらか一方の基板に設けた接着剤により両基板の貼り合わせを行う基板組立方法において、
前記上側テーブル基板を保持する場合に、前記基板の中央部から周囲に向って順次上下移動機構を備えた吸着パッドで吸引吸着し引き上げ行い、上側テーブルに吸着していくことを特徴とする基板組立方法。
In a vacuum chamber, two substrates are opposed to each other with a space between them up and down, held by suction and suction on the upper and lower tables, respectively, aligned, and provided with one of the substrates by narrowing the space between both substrates. In the substrate assembling method of bonding both substrates with the adhesive,
When holding the upper table substrate, the substrate assembly is characterized in that the substrate is suction-adsorbed by a suction pad provided with a vertical moving mechanism and sequentially pulled up from the central portion of the substrate toward the periphery, and then is suctioned to the upper table. Method.
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CN100368882C (en) * 2006-04-14 2008-02-13 友达光电股份有限公司 Bracing frame and its shim
US7354494B2 (en) 2004-03-15 2008-04-08 Fujitsu Limited Apparatus and method for manufacturing laminated substrate
JP2009218372A (en) * 2008-03-10 2009-09-24 Canon Inc Exposure system
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JP2010175584A (en) * 2009-01-27 2010-08-12 Advanced Display Process Engineering Co Ltd Substrate bonding apparatus
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JPWO2021084582A1 (en) * 2019-10-28 2021-05-06
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US7963308B2 (en) 2002-03-19 2011-06-21 Fujitsu Limited Apparatus and method for fabricating bonded substrate
US8268113B2 (en) 2002-03-19 2012-09-18 Fujitsu Limited Apparatus and method for fabricating bonded substrate
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KR20180077932A (en) * 2016-12-29 2018-07-09 인베니아 주식회사 Apparatus and method for attaching substrate and glass
WO2019092787A1 (en) * 2017-11-07 2019-05-16 堺ディスプレイプロダクト株式会社 Substrate bonding device, substrate bonding method, and method for manufacturing display device
JPWO2021084582A1 (en) * 2019-10-28 2021-05-06
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CN113611653A (en) * 2021-08-13 2021-11-05 苏州隐冠半导体技术有限公司 Multi-gas-path adsorption device
CN113611653B (en) * 2021-08-13 2023-09-05 苏州隐冠半导体技术有限公司 Multi-gas-path adsorption device

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