TWI433207B - 積體電路製造中用於指示方向性之方法及裝置 - Google Patents

積體電路製造中用於指示方向性之方法及裝置 Download PDF

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Publication number
TWI433207B
TWI433207B TW096103126A TW96103126A TWI433207B TW I433207 B TWI433207 B TW I433207B TW 096103126 A TW096103126 A TW 096103126A TW 96103126 A TW96103126 A TW 96103126A TW I433207 B TWI433207 B TW I433207B
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TW
Taiwan
Prior art keywords
indicator
integrated circuit
implant
source
region
Prior art date
Application number
TW096103126A
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English (en)
Chinese (zh)
Other versions
TW200746238A (en
Inventor
崔維斯 艾德華O
雪洛夫 梅胡爾D
史麥哲 唐諾E
史密斯 崔西L
Original Assignee
飛思卡爾半導體公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 飛思卡爾半導體公司 filed Critical 飛思卡爾半導體公司
Publication of TW200746238A publication Critical patent/TW200746238A/zh
Application granted granted Critical
Publication of TWI433207B publication Critical patent/TWI433207B/zh

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67282Marking devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/34Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/544Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/544Marks applied to semiconductor devices or parts
    • H01L2223/54453Marks applied to semiconductor devices or parts for use prior to dicing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
TW096103126A 2006-02-23 2007-01-29 積體電路製造中用於指示方向性之方法及裝置 TWI433207B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/360,925 US7635920B2 (en) 2006-02-23 2006-02-23 Method and apparatus for indicating directionality in integrated circuit manufacturing

Publications (2)

Publication Number Publication Date
TW200746238A TW200746238A (en) 2007-12-16
TWI433207B true TWI433207B (zh) 2014-04-01

Family

ID=38427329

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096103126A TWI433207B (zh) 2006-02-23 2007-01-29 積體電路製造中用於指示方向性之方法及裝置

Country Status (6)

Country Link
US (2) US7635920B2 (enExample)
JP (1) JP2009527926A (enExample)
KR (1) KR101357906B1 (enExample)
CN (1) CN101438405B (enExample)
TW (1) TWI433207B (enExample)
WO (1) WO2007100929A2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI368963B (en) * 2008-07-18 2012-07-21 Inotera Memories Inc An analysis method of wafer's ion implant
US7829939B1 (en) * 2009-04-20 2010-11-09 International Business Machines Corporation MOSFET including epitaxial halo region
JP5561823B2 (ja) * 2010-02-05 2014-07-30 ルネサスエレクトロニクス株式会社 半導体装置の製造方法および半導体装置
CN102509726A (zh) * 2011-11-14 2012-06-20 上海宏力半导体制造有限公司 具有加密结构的ip模块及其制造方法
TWI466296B (zh) * 2012-07-31 2014-12-21 瑞昱半導體股份有限公司 半導體元件及其形成方法
US20150087131A1 (en) * 2013-09-20 2015-03-26 Infineon Technologies Ag Method for processing a chip
US10002800B2 (en) * 2016-05-13 2018-06-19 International Business Machines Corporation Prevention of charging damage in full-depletion devices
CN109950133B (zh) * 2019-03-14 2021-07-27 北京大学深圳研究生院 一种便于识别的碳化硅外延片圆片制备方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60195923A (ja) * 1984-03-17 1985-10-04 Sumitomo Electric Ind Ltd メサ方向を表示した半導体ウエハおよびチツプ並びにその製法
JPS62113462A (ja) * 1985-11-12 1987-05-25 Nec Corp 半導体装置
US4973217A (en) 1987-02-09 1990-11-27 Svg Lithography Systems, Inc. Wafer handling system
JPH06350042A (ja) * 1993-06-08 1994-12-22 Sony Corp トランジスタの製造方法
US5686345A (en) 1996-01-30 1997-11-11 International Business Machines Corporation Trench mask for forming deep trenches in a semiconductor substrate, and method of using same
US5742041A (en) 1996-05-29 1998-04-21 Intermec Corporation Method and apparatus for locating and decoding machine-readable symbols, including data matrix symbols
US6190980B1 (en) 1998-09-10 2001-02-20 Advanced Micro Devices Method of tilted implant for pocket, halo and source/drain extension in ULSI dense structures
KR100289810B1 (ko) * 1999-05-10 2001-05-15 김영환 반도체 소자 제조를 위한 할로 이온 주입 방법
US6194278B1 (en) * 1999-06-21 2001-02-27 Infineon Technologies North America Corp. Device performance by employing an improved method for forming halo implants
US6842538B2 (en) 2001-03-23 2005-01-11 Shih-Jong J. Lee Automatic detection of alignment or registration marks
US6742708B2 (en) 2001-06-07 2004-06-01 Hewlett-Packard Development Company, L.P. Fiducial mark patterns for graphical bar codes
US6745708B2 (en) * 2001-12-19 2004-06-08 Conocophillips Company Method and apparatus for improving the efficiency of a combustion device
JP2004103612A (ja) * 2002-09-04 2004-04-02 Toshiba Corp 半導体装置とその製造方法
US6911660B2 (en) 2002-10-02 2005-06-28 Varian Semiconductor Equipment Associates, Inc. Method of measuring ion beam angles
US6833307B1 (en) * 2002-10-30 2004-12-21 Advanced Micro Devices, Inc. Method for manufacturing a semiconductor component having an early halo implant
US7138318B2 (en) * 2003-05-28 2006-11-21 Advanced Micro Devices, Inc. Method of fabricating body-tied SOI transistor having halo implant region underlying hammerhead portion of gate

Also Published As

Publication number Publication date
TW200746238A (en) 2007-12-16
US20100112779A1 (en) 2010-05-06
JP2009527926A (ja) 2009-07-30
CN101438405B (zh) 2013-10-30
US7635920B2 (en) 2009-12-22
US20070194392A1 (en) 2007-08-23
KR20080107379A (ko) 2008-12-10
CN101438405A (zh) 2009-05-20
WO2007100929A2 (en) 2007-09-07
KR101357906B1 (ko) 2014-02-06
WO2007100929A3 (en) 2008-12-04
US7858487B2 (en) 2010-12-28

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