TWI433207B - 積體電路製造中用於指示方向性之方法及裝置 - Google Patents
積體電路製造中用於指示方向性之方法及裝置 Download PDFInfo
- Publication number
- TWI433207B TWI433207B TW096103126A TW96103126A TWI433207B TW I433207 B TWI433207 B TW I433207B TW 096103126 A TW096103126 A TW 096103126A TW 96103126 A TW96103126 A TW 96103126A TW I433207 B TWI433207 B TW I433207B
- Authority
- TW
- Taiwan
- Prior art keywords
- indicator
- integrated circuit
- implant
- source
- region
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
- H01L22/34—Circuits for electrically characterising or monitoring manufacturing processes, e. g. whole test die, wafers filled with test structures, on-board-devices incorporated on each die, process control monitors or pad structures thereof, devices in scribe line
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Semiconductor Integrated Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/360,925 US7635920B2 (en) | 2006-02-23 | 2006-02-23 | Method and apparatus for indicating directionality in integrated circuit manufacturing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200746238A TW200746238A (en) | 2007-12-16 |
| TWI433207B true TWI433207B (zh) | 2014-04-01 |
Family
ID=38427329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096103126A TWI433207B (zh) | 2006-02-23 | 2007-01-29 | 積體電路製造中用於指示方向性之方法及裝置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US7635920B2 (enExample) |
| JP (1) | JP2009527926A (enExample) |
| KR (1) | KR101357906B1 (enExample) |
| CN (1) | CN101438405B (enExample) |
| TW (1) | TWI433207B (enExample) |
| WO (1) | WO2007100929A2 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI368963B (en) * | 2008-07-18 | 2012-07-21 | Inotera Memories Inc | An analysis method of wafer's ion implant |
| US7829939B1 (en) * | 2009-04-20 | 2010-11-09 | International Business Machines Corporation | MOSFET including epitaxial halo region |
| JP5561823B2 (ja) * | 2010-02-05 | 2014-07-30 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法および半導体装置 |
| CN102509726A (zh) * | 2011-11-14 | 2012-06-20 | 上海宏力半导体制造有限公司 | 具有加密结构的ip模块及其制造方法 |
| TWI466296B (zh) * | 2012-07-31 | 2014-12-21 | 瑞昱半導體股份有限公司 | 半導體元件及其形成方法 |
| US20150087131A1 (en) * | 2013-09-20 | 2015-03-26 | Infineon Technologies Ag | Method for processing a chip |
| US10002800B2 (en) * | 2016-05-13 | 2018-06-19 | International Business Machines Corporation | Prevention of charging damage in full-depletion devices |
| CN109950133B (zh) * | 2019-03-14 | 2021-07-27 | 北京大学深圳研究生院 | 一种便于识别的碳化硅外延片圆片制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60195923A (ja) * | 1984-03-17 | 1985-10-04 | Sumitomo Electric Ind Ltd | メサ方向を表示した半導体ウエハおよびチツプ並びにその製法 |
| JPS62113462A (ja) * | 1985-11-12 | 1987-05-25 | Nec Corp | 半導体装置 |
| US4973217A (en) | 1987-02-09 | 1990-11-27 | Svg Lithography Systems, Inc. | Wafer handling system |
| JPH06350042A (ja) * | 1993-06-08 | 1994-12-22 | Sony Corp | トランジスタの製造方法 |
| US5686345A (en) | 1996-01-30 | 1997-11-11 | International Business Machines Corporation | Trench mask for forming deep trenches in a semiconductor substrate, and method of using same |
| US5742041A (en) | 1996-05-29 | 1998-04-21 | Intermec Corporation | Method and apparatus for locating and decoding machine-readable symbols, including data matrix symbols |
| US6190980B1 (en) | 1998-09-10 | 2001-02-20 | Advanced Micro Devices | Method of tilted implant for pocket, halo and source/drain extension in ULSI dense structures |
| KR100289810B1 (ko) * | 1999-05-10 | 2001-05-15 | 김영환 | 반도체 소자 제조를 위한 할로 이온 주입 방법 |
| US6194278B1 (en) * | 1999-06-21 | 2001-02-27 | Infineon Technologies North America Corp. | Device performance by employing an improved method for forming halo implants |
| US6842538B2 (en) | 2001-03-23 | 2005-01-11 | Shih-Jong J. Lee | Automatic detection of alignment or registration marks |
| US6742708B2 (en) | 2001-06-07 | 2004-06-01 | Hewlett-Packard Development Company, L.P. | Fiducial mark patterns for graphical bar codes |
| US6745708B2 (en) * | 2001-12-19 | 2004-06-08 | Conocophillips Company | Method and apparatus for improving the efficiency of a combustion device |
| JP2004103612A (ja) * | 2002-09-04 | 2004-04-02 | Toshiba Corp | 半導体装置とその製造方法 |
| US6911660B2 (en) | 2002-10-02 | 2005-06-28 | Varian Semiconductor Equipment Associates, Inc. | Method of measuring ion beam angles |
| US6833307B1 (en) * | 2002-10-30 | 2004-12-21 | Advanced Micro Devices, Inc. | Method for manufacturing a semiconductor component having an early halo implant |
| US7138318B2 (en) * | 2003-05-28 | 2006-11-21 | Advanced Micro Devices, Inc. | Method of fabricating body-tied SOI transistor having halo implant region underlying hammerhead portion of gate |
-
2006
- 2006-02-23 US US11/360,925 patent/US7635920B2/en active Active
-
2007
- 2007-01-09 WO PCT/US2007/060257 patent/WO2007100929A2/en not_active Ceased
- 2007-01-09 JP JP2008556487A patent/JP2009527926A/ja active Pending
- 2007-01-09 KR KR1020087020330A patent/KR101357906B1/ko not_active Expired - Fee Related
- 2007-01-09 CN CN2007800066717A patent/CN101438405B/zh active Active
- 2007-01-29 TW TW096103126A patent/TWI433207B/zh active
-
2009
- 2009-11-09 US US12/614,890 patent/US7858487B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| TW200746238A (en) | 2007-12-16 |
| US20100112779A1 (en) | 2010-05-06 |
| JP2009527926A (ja) | 2009-07-30 |
| CN101438405B (zh) | 2013-10-30 |
| US7635920B2 (en) | 2009-12-22 |
| US20070194392A1 (en) | 2007-08-23 |
| KR20080107379A (ko) | 2008-12-10 |
| CN101438405A (zh) | 2009-05-20 |
| WO2007100929A2 (en) | 2007-09-07 |
| KR101357906B1 (ko) | 2014-02-06 |
| WO2007100929A3 (en) | 2008-12-04 |
| US7858487B2 (en) | 2010-12-28 |
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