TWI408330B - 位置偵測器、位置偵測方法、曝光設備及裝置製造方法 - Google Patents

位置偵測器、位置偵測方法、曝光設備及裝置製造方法 Download PDF

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Publication number
TWI408330B
TWI408330B TW097139216A TW97139216A TWI408330B TW I408330 B TWI408330 B TW I408330B TW 097139216 A TW097139216 A TW 097139216A TW 97139216 A TW97139216 A TW 97139216A TW I408330 B TWI408330 B TW I408330B
Authority
TW
Taiwan
Prior art keywords
pattern
template
mark
feature point
image
Prior art date
Application number
TW097139216A
Other languages
English (en)
Chinese (zh)
Other versions
TW200938801A (en
Inventor
Nozomu Hayashi
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200938801A publication Critical patent/TW200938801A/zh
Application granted granted Critical
Publication of TWI408330B publication Critical patent/TWI408330B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/20—Image preprocessing
    • G06V10/24—Aligning, centring, orientation detection or correction of the image
    • G06V10/245—Aligning, centring, orientation detection or correction of the image by locating a pattern; Special marks for positioning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Multimedia (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
TW097139216A 2007-10-31 2008-10-13 位置偵測器、位置偵測方法、曝光設備及裝置製造方法 TWI408330B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007283791A JP5351409B2 (ja) 2007-10-31 2007-10-31 位置検出器、テンプレートを得る方法、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
TW200938801A TW200938801A (en) 2009-09-16
TWI408330B true TWI408330B (zh) 2013-09-11

Family

ID=40582909

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097139216A TWI408330B (zh) 2007-10-31 2008-10-13 位置偵測器、位置偵測方法、曝光設備及裝置製造方法

Country Status (4)

Country Link
US (1) US8369604B2 (enExample)
JP (1) JP5351409B2 (enExample)
KR (1) KR100991574B1 (enExample)
TW (1) TWI408330B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5650060B2 (ja) * 2011-06-03 2015-01-07 日本電信電話株式会社 画像追跡装置及び画像追跡方法
JP6088803B2 (ja) * 2012-11-16 2017-03-01 株式会社日立ハイテクノロジーズ 画像処理装置、自己組織化リソグラフィ技術によるパターン生成方法、及びコンピュータープログラム
US10438098B2 (en) 2017-05-19 2019-10-08 Hand Held Products, Inc. High-speed OCR decode using depleted centerlines
CN110517945A (zh) * 2018-05-21 2019-11-29 上海新微技术研发中心有限公司 半导体器件的制造方法及半导体器件
JP7701216B2 (ja) * 2021-08-27 2025-07-01 株式会社Ｓｃｒｅｅｎホールディングス 描画システム、描画方法およびプログラム

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5859923A (en) * 1992-12-29 1999-01-12 Cognex Corporation Mark quality inspection apparatus and method
TW374940B (en) * 1996-06-13 1999-11-21 Canon Kk Scanning exposure apparatus with surface position detecting system
US7130466B2 (en) * 2000-12-21 2006-10-31 Cobion Ag System and method for compiling images from a database and comparing the compiled images with known images
US20070071359A1 (en) * 2005-09-28 2007-03-29 Sharp Kabushiki Kaisha Image collating apparatus, image collating method, image collating program product, and computer readable recording medium recording image collating program product

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3569626B2 (ja) * 1998-05-11 2004-09-22 日本電信電話株式会社 図形抽出方法及びそのプログラムを記録した記録媒体
JP2000269700A (ja) * 1999-03-16 2000-09-29 Matsushita Electric Ind Co Ltd パターンマッチング認識方法
JP4165871B2 (ja) * 2002-03-15 2008-10-15 キヤノン株式会社 位置検出方法、位置検出装置及び露光装置
EP1482375B1 (en) 2003-05-30 2014-09-17 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4389871B2 (ja) * 2003-06-27 2009-12-24 株式会社ニコン 基準パターン抽出方法とその装置、パターンマッチング方法とその装置、位置検出方法とその装置及び露光方法とその装置
JP2005116561A (ja) 2003-10-02 2005-04-28 Nikon Corp テンプレート作成方法及び装置、位置検出方法及び装置、並びに露光方法及び装置
JP2006214816A (ja) 2005-02-02 2006-08-17 Nikon Corp 半導体検査装置
US7580560B2 (en) * 2005-07-18 2009-08-25 Mitutoyo Corporation System and method for fast template matching by adaptive template decomposition
JP4908867B2 (ja) * 2005-11-01 2012-04-04 株式会社日立ソリューションズ 地理画像処理システム

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5859923A (en) * 1992-12-29 1999-01-12 Cognex Corporation Mark quality inspection apparatus and method
TW374940B (en) * 1996-06-13 1999-11-21 Canon Kk Scanning exposure apparatus with surface position detecting system
US7130466B2 (en) * 2000-12-21 2006-10-31 Cobion Ag System and method for compiling images from a database and comparing the compiled images with known images
US20070071359A1 (en) * 2005-09-28 2007-03-29 Sharp Kabushiki Kaisha Image collating apparatus, image collating method, image collating program product, and computer readable recording medium recording image collating program product

Also Published As

Publication number Publication date
US20090110264A1 (en) 2009-04-30
KR20090045133A (ko) 2009-05-07
JP5351409B2 (ja) 2013-11-27
JP2009109413A (ja) 2009-05-21
US8369604B2 (en) 2013-02-05
TW200938801A (en) 2009-09-16
KR100991574B1 (ko) 2010-11-04

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