TWI400014B - 具有聚合塗層之電氣設備或電子設備及保護電氣設備或電子設備以對抗液體損壞之方法 - Google Patents
具有聚合塗層之電氣設備或電子設備及保護電氣設備或電子設備以對抗液體損壞之方法 Download PDFInfo
- Publication number
- TWI400014B TWI400014B TW096102116A TW96102116A TWI400014B TW I400014 B TWI400014 B TW I400014B TW 096102116 A TW096102116 A TW 096102116A TW 96102116 A TW96102116 A TW 96102116A TW I400014 B TWI400014 B TW I400014B
- Authority
- TW
- Taiwan
- Prior art keywords
- formula
- compound
- electronic device
- group
- plasma
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 33
- 239000007788 liquid Substances 0.000 title claims description 31
- 238000000576 coating method Methods 0.000 title claims description 11
- 239000011248 coating agent Substances 0.000 title claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 33
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 125000001188 haloalkyl group Chemical group 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000010410 layer Substances 0.000 claims description 7
- 239000013047 polymeric layer Substances 0.000 claims description 6
- 238000006116 polymerization reaction Methods 0.000 claims description 6
- 238000004891 communication Methods 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 125000000565 sulfonamide group Chemical group 0.000 claims description 4
- ZLQGITSKRNWIOT-UHFFFAOYSA-N 5-(dimethylamino)furan-2-carbaldehyde Chemical compound CN(C)C1=CC=C(C=O)O1 ZLQGITSKRNWIOT-UHFFFAOYSA-N 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 4
- 210000002381 plasma Anatomy 0.000 description 31
- 239000000178 monomer Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 239000007789 gas Substances 0.000 description 10
- 230000007613 environmental effect Effects 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000012159 carrier gas Substances 0.000 description 5
- 238000011109 contamination Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000012528 membrane Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- QUKRIOLKOHUUBM-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl prop-2-enoate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCOC(=O)C=C QUKRIOLKOHUUBM-UHFFFAOYSA-N 0.000 description 2
- 208000032484 Accidental exposure to product Diseases 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 231100000818 accidental exposure Toxicity 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 2
- 230000001960 triggered effect Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002103 nanocoating Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
- C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
- B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F114/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
- C08F114/18—Monomers containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/52—Polymerisation initiated by wave energy or particle radiation by electric discharge, e.g. voltolisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
- D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
- D06M10/025—Corona discharge or low temperature plasma
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M14/00—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials
- D06M14/18—Graft polymerisation of monomers containing carbon-to-carbon unsaturated bonds on to fibres, threads, yarns, fabrics, or fibrous goods made from such materials using wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Textile Engineering (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Formation Of Insulating Films (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Vapour Deposition (AREA)
- Details Of Audible-Bandwidth Transducers (AREA)
- Laminated Bodies (AREA)
Description
本發明係關於呈電子設備或電氣設備形式之新穎產物,其經處理以保護使其耐液體損壞,例如耐環境損壞,尤其耐水或其他液體,以及其製造方法。
眾所周知,電子設備及電氣設備對由諸如環境液體之液體(尤其水)導致之污染所引起之損壞極敏感。在正常使用過程中或由於意外暴露與液體相接觸可造成電子元件之間的短路及電路板、電子晶片等之無可挽回之損壞。
關於諸如行動電話、呼叫器、收音機、助聽器、膝上型電腦、筆記型電腦、掌上型電腦及個人數位助理(PDA)之小型攜帶型電子裝置,當其在外面移動時可能會暴露於嚴重液體污染中,問題尤其嚴重。另外,例如若滴濕或濺濕,則其傾向於意外暴露於液體中。
另外,其他類型之電子設備或電氣設備因其位置而尤其傾向於(例如)引起環境損壞,該等設備例如戶外照明系統、無線電天線及其他形式之通信裝置。
然而,大部分該類型之設備因意外噴濺或其類似因素而損壞。特定實例可包括諸如鍵盤之桌上型設備,或(例如)用於控制室之儀表。
關於用於聲音重現且利用諸如揚聲器、麥克風(microphone)、振鈴器及蜂鳴器之轉換器的設備,出現特殊問題。該等設備尤其易受因液體污染之損壞的影響,該液體污染係由於意外暴露或因諸如雨之環境因子或使用過程中之噴濺。在許多情況下,設備中所使用之膜或振動膜,尤其最經濟之膜在一定程度上為液體吸收劑,且當暴露於(例如)水中時,將吸收大量水。此顯著影響轉換器之操作性且因此聲音重現之品質受損。
許多麥克風具備一環繞該轉換器之開孔發泡塑膠外殼。然而,該等外殼必須具有氣體可滲透性且其不提供抗液體污染的完全保護。
在過去,該問題已藉由將其他水保護性措施引入麥克風中得以解決。在許多情況下,該等其他措施包含將諸如聚四氟乙烯(PTFE)膜之水不可滲透性多孔膜(參見,例如WO/01/03468或USP 5,420,570)引入設備。在所有情況下,該等膜將會降低轉換器之敏感性且因此對聲音品質產生不利影響。
在其他情況下,諸如GB 2,364,463中所述,提供含有孔之更具剛性保護性覆蓋片,或其中插入拾音設備之更堅固覆蓋片。該解決方案成本高且複雜且僅適合某些限定性情況。
電漿沈積技術已十分廣泛用於將聚合塗層沈積於大範圍之表面,且尤其為織物表面。與習知之濕式化學方法相比,該技術視為幾乎不產生廢棄物之乾淨乾式技術。使用該方法,由經受電場之有機分子產生電漿。當此在基板存在下完成時,電漿中化合物之基團會聚合於基板上。習知之聚合物合成趨向於產生含有與單體物質具有強相似性之重複單元之結構,而使用電漿產生之聚合物網狀物可能極其複雜。所得塗層之特性可視基板之性質以及所使用單體之性質及其沈積所處之條件而定。
申請者已發現在特定沈積條件下藉由利用特定類型之單體,可製造其上具有高排液體性奈米塗層之電子設備或電氣設備,其並不會影響該設備之功效。
根據本發明,提供一種具有聚合塗層之電子設備或電氣設備,該聚合塗層係藉由將該設備暴露於包含式(I)之化合物之脈衝電漿歷經足夠長之時間以允許一保護性聚合層形成於該電氣設備或電子設備之表面上而形成:
其中R1
、R2
及R3
係獨立地選自氫、烷基、鹵烷基或視情況經鹵基取代之芳基;且R4
為基團X-R5
,其中R5
為烷基或鹵烷基且X為一鍵;式-C(O)O(CH2
)n
Y-之基團,其中n為1至10之整數且Y為一鍵或磺醯胺基;或基團-(O)P
R6
(O)q
(CH2
)t
-,其中R6
為視情況經鹵基取代之芳基,p為0或1,q為0或1且t為0或1至10之整數,其限制條件為若q為1,則t非0。
如本文所使用,詞句"氣態"係指氣體或蒸氣(單獨或混合物形式),以及氣溶膠。
詞句"保護性聚合層"係指提供一些對抗液體損壞之保護且尤其具有排液體(諸如油及水)性之聚合層。該等設備所需保護防止之液體源包括諸如水之環境液體,且尤其為雨,以及任何其他可能被意外噴濺之油或液體。
如本文所使用,術語"電子設備或電氣設備"係指包括任一件可能會使用之電氣裝置或電子裝置,以及其元件,諸如印刷電路板(PCB)、電晶體、電阻器、電子元件或半導體晶片。然而,塗層係尤其施加於例如完全組裝之行動電話或麥克風之完全組裝之設備的外表面。在該等情況下,聚合層將施加於(例如)外殼或發泡覆蓋片,以及任何諸如控制鈕或開關之暴露元件以阻止任何液體到達元件內部。
申請者已發現,聚合物層形成於整個設備表面,該設備包括包含諸如不同塑膠(包括發泡塑膠)、金屬及/或玻璃表面之組合之不同基板材料的設備,且因此令人驚訝地,使得整個設備具有排液體性。甚至在該等設備非處於防水關係之情況下,例如,行動電話上並未與環繞外殼融合之按鈕,以此方式沈積之聚合物層亦具有足夠的拒斥性以阻止液體滲透該設備沿按鈕之邊緣進入設備。因此,已發現(例如)通常對液體損壞極敏感之行動電話經本發明之處理之後可完全浸入水中而無任何持久損害。
因為塗佈係在不需要浸入任何液體中之情況下進行,所以不存在由於暴露於該程序操作設備的風險。
該廣泛應用性使得本程序尤其有利。
電氣設備及電子設備之特定實例包括:通信設備,諸如行動電話及呼叫器、收音機;及聲音及音訊系統,諸如揚聲器、麥克風、振鈴器或蜂鳴器、助聽器;個人音訊裝置,諸如個人CD、卡式錄音或MP3播放器、電視、包括攜帶型DVD播放器之DVD播放器、視訊記錄器;數位及其他視訊轉換器,諸如Sky;電腦及相關元件,諸如膝上型電腦、筆記型電腦或掌上型電腦、個人數位助理(PDA)、鍵盤,或儀錶、遊戲控制臺尤其為手持遊戲站及其類似物;或戶外照明系統。
其他特定實例可包括尤其處於水污染風險中之電氣元件或電子元件,諸如彼等用於包括飛機及其他諸如火車、汽車之運輸裝置之運輸車輛以及其他諸如軍隊使用之車輛的車輛及其他諸如洗衣機及洗碟機之設備的元件。
在一特定實施例中,電子設備或電氣設備為麥克風。藉由利用以上所定義之方法,已製造出高度有利之麥克風。詳言之,使用該方法之主要特徵及益處在於藉由塗佈(例如)麥克風之外殼,尤其發泡覆蓋片,轉換器係經保護以使其耐液體污染而聲音品質無任何損失。達成與使用該等膜所達成之保護程度相等或更佳之保護程度而不會產生任何聲音品質之"減弱",此為使用該等膜之特徵。
當施加於發泡覆蓋片時,該層並不會影響發泡體之多孔性。換言之,該層並不足以阻塞發泡體之孔或以任何方式影響空氣滲透性。然而,使得該等孔之整個表面具有排液體性且此足以確保液體不會滲透發泡體。
然而,關於諸如以上所定義之通信設備及聲音及音訊系統之併入小型麥克風的設備,且尤其關於行動電話,其中成品電話之塗層可進一步增強保護程度,存在相似優點。
以此方式處理之電子設備或電氣設備係很大程度上經保護以使其耐水及油損壞。
電漿聚合以有效方式發生之精確條件將視諸如聚合物之性質、電氣設備或電子設備等因素而變化且將使用常規方法及/或技術來確定。
用於本發明之方法之合適電漿包括非平衡電漿,諸如彼等由射頻(Rf)、微波或直流(DC)產生之電漿。如此項技術所已知,其可在大氣壓或次大氣壓下操作。然而,其尤其由射頻(Rf)產生。
各種形式之裝置可用於產生氣態電漿。通常,該等裝置包含可產生電漿之容器或電漿腔室。該裝置之特定實例(例如)描述於WO2005/089961及WO02/28548中,但可利用許多其他習知電漿產生儀器。
通常,待處理之物品係與待沈積之氣態物質一起置放於電漿腔室中,輝光放電在該腔室內激發且施加可脈衝之合適電壓。
雖然電漿中所使用之氣體可單獨包含單體化合物之蒸氣,但其可與載氣,尤其為諸如氦或氬之惰性氣體組合。氦尤其為較佳載氣,因為其可將單體之碎裂減到最小。
當以混合物形式使用時,單體蒸氣與載氣之相對量係根據此項技術中習知之程序合適地確定。所添加之單體之量一定程度上應視所使用之特定單體之性質、待處理之實驗室拋棄性用品之性質、電漿腔室之大小等而定。通常,在習知腔室之情況下,單體係以50-250 mg/min之量,例如以100-150 mg/min之速率傳送。諸如氦之載氣係以例如5-90 sccm(例如15-30 sccm)之速率的恆定速率合適地投與。在一些情形下,單體與載氣之比率應在100:1至1:100之範圍內,例如在10:1至1:100之範圍內,且尤其為約1:1至1:10。應選擇精確比率以確保達成該方法所需之流率。
在一些情況下,可在腔室中觸發初步連續功率電漿(例如)2-10分鐘,例如約4分鐘。此可充當表面預處理步驟,以確保單體使其自身容易地與表面連接,使得當聚合作用發生時,塗層"生長"於該表面上。在僅惰性氣體存在下,預處理步驟可在單體引入腔室中之前執行。
隨後,將電漿合適地轉換為脈衝電漿以至少在存在單體時允許聚合進行。
在所有情況下,藉由施加例如13.56 MHz下之高頻電壓將輝光放電合適地激發。其使用電極合適地施加,雖然該等電極相對腔室可為內部的或外部的,但在較大腔室之情況下,為內部的。
合適地,氣體、蒸氣或氣體混合物係以至少1標準立方厘米/分鐘(sccm)且較佳1 sccm至100 sccm之範圍內之速率供應。
在單體蒸氣之情況下,其以80-300毫克/分鐘之速率合適地供應,例如視單體之性質而定為每分鐘約120毫克,同時施加脈衝電壓。
氣體或蒸氣可抽送或泵送至電漿區域中。尤其當使用電漿腔室時,氣體或蒸氣可因使用抽真空泵所引起之腔室中壓力之減小而抽送至腔室中,或其可泵送或注射至腔室中,此在液體處理中為常見的。
使用式(I)之化合物之蒸氣合適地實現聚合作用,該等蒸氣維持在0.1至200毫托之壓力下,合適地在約80-100毫托下。
施加場之功率合適地為40 W至500 W,峰值功率合適地為約100 W,以脈衝場形式施加。脈衝係以產生極低平均功率之序列,例如以工作時間:停止時間之比率在1:500至1:1500範圍內之序列施加。該等序列之特定實例為功率工作20-50 μs(例如約30 μs)且停止1000 μs至30000 μs(尤其約20000 μs)之序列。以此方式獲得之典型平均功率為0.01 W。
視式(I)之化合物之性質及電氣設備或電子設備等因素而定,該等場合適地施加30秒至90分鐘,較佳5至60分鐘。
合適地,所使用之電漿腔室具有足夠的體積以容納多個電氣設備或電子設備,尤其當該等設備為小尺寸時,例如可同時輕而易舉地處理多達20,000個麥克風頭且能夠處理多得多的恰當大小之裝置。
製造根據本發明之電氣設備或電子設備之尤其合適的儀器及方法描述於WO2005/089961中,其內容以引用之方式併入本文。
特定言之,當使用該類型之大體積腔室時,電漿係以脈衝場形式之平均功率為0.001 w/m3
至500 w/m3
,例如0.001 w/m3
至100 w/m3
且合適地0.005 w/m3
至0.5 w/m3
的電壓產生。
該等條件尤其適合在大腔室中,例如在電漿區域具有大於500 cm3
(例如0.5 m3
或更大,諸如0.5 m3
-10 m3
且合適地為約1 m3
)之體積的腔室中,沈積良好品質之均一塗層。以此方式形成之層具有良好的機械強度。
腔室之尺寸應經選擇以容納特定的待處理的電氣設備或電子設備。舉例而言,通常立方形腔室可適合廣泛範圍之應用,但若必需,可構造長條形或矩形腔室或甚至圓柱形,或任何其他合適的形狀。
腔室可為密封容器以允許分批處理或其可包含電氣設備或電子設備之進口或出口以允許在連續過程中利用該腔室。尤其在後者情況下,在腔室中產生電漿放電所必需之壓力條件使用大體積泵來維持,此在(例如)具有"鳴笛洩漏"之設備中為習知的。然而,亦應可能在大氣壓力或接近大氣壓力下處理某些物品,而不需要"鳴笛洩漏"。
所使用之單體係選自如以上所定義之式(I)之單體。R1
、R2
、R3
及R5
之合適鹵烷基為氟烷基。烷基鏈可為直鏈或支鏈且可包括環狀部分。
就R5
而言,烷基鏈合適地包含2個或2個以上碳原子,合適地包含2-20個碳原子且較佳包含6至12個碳原子。就R1
、R2
及R3
而言主,烷基鏈通常較佳具有1至6個碳原子。
R5
較佳為鹵烷基,且更佳為全鹵烷基,尤其為式Cm
F2m+1
之全氟烷基,其中m為1或更大之整數,合適地為1-20,且較佳為4-12,諸如4、6或8。
R1
、R2
及R3
之合適烷基具有1至6個碳原子。
在一實施例中,R1
、R2
及R3
中至少一個為氫。在一特定實施例中,R1
、R2
、R3
所有均為氫。然而,在又一實施例中,R3
為諸如甲基或丙基之烷基。
其中X為基團-C(O)O(CH2
)n
Y-,n為提供合適間隔基團之整數。特定言之,n為1至5、較佳為約2。
Y之合適磺醯基包括式-N(R7
)SO2 -
之磺醯基,其中R7
為氫或諸如C1-4
烷基、尤其甲基或乙基之烷基。
在一實施例中,式(I)之化合物為式(II)之化合物:CH2
=CH-R5
(II)其中R5
係如以上關於式(I)所定義。
在式(II)之化合物中,式(I)中之X為一鍵。
然而,在一較佳實施例中,式(I)之化合物為式(III)之丙烯酸酯:CH2
=CR7
C(O)O(CH2
)n
R5
(III)其中n及R5
係如以上關於式(I)所定義且R7
為氫、C1-10
烷基或C1-10
鹵烷基。尤其,R7
為氫或諸如甲基之C1-6
烷基。式(III)之化合物之特定實例為式(IV)之化合物:
其中R7
係如以上所定義且尤其為氫且x為1至9之整數,例如為4至9,且較佳為7。在此情況下,式(IV)之化合物為丙烯酸1H,1H,2H,2H-十七氟癸酯。
在另一態樣中,本發明提供一種保護電氣設備或電子設備以使其耐液體損壞的方法,該方法包含將該設備暴露於包含呈氣態之式(I)之化合物之脈衝電漿歷經足夠長之時間以允許一保護性聚合層形成於電氣設備或電子設備之表面上:
其中R1
、R2
及R3
係獨立地選自氫、烷基、鹵烷基或視情況經鹵基取代之芳基;且R4
為基團X-R5
,其中R5
為烷基或鹵烷基且X為一鍵;式-C(O)O(CH2
)n
Y-之基團,其中n為1至10之整數且Y為一鍵或磺醯胺基;或基團-(O)P
R6
(O)q
(CH2
)t
-,其中R6
為視情況經鹵基取代之芳基,p為0或1,q為0或1且t為0或1至10之整數,其限制條件為若q為1,則t非0。
該等設備經保護以使其耐受的液體損壞包括諸如水之環境液體且尤其為雨,或為任何其他可能會意外噴濺於該設備上之液體。
合適地,電氣設備或電子設備係置放於一電漿沈積腔室中,輝光放電在該腔室中激發,且電壓以脈衝場形式施加。
用於該方法之合適單體及反應條件係如上所述。
現在,將以實例特定描述本發明。
麥克風
將一組100個麥克風置放於一具有約300公升之處理體積之電漿腔室中。將腔室經由一質量流量控制器及/或液體質量流量控制器及(若合適)一混合注射器或任何其他蒸氣/氣體引入機構連接於所需氣體或蒸氣之供應。
將腔室抽真空至3-10毫托之間的基礎壓力,之後使氦以20 sccm進入腔室直至達到80毫托之壓力。隨後,將連續功率電漿使用13.56 MHz下之300 W之RF觸發4分鐘。
此後,將式
之丙烯酸1H,1H,2H,2H-十七氟癸酯(CAS # 27905-45-9)以每分鐘120毫克之速率送入腔室中且將電漿轉換為100 W之峰值功率下工作時間為30毫秒且停止時間為20毫秒之脈衝電漿歷時40分鐘。40分鐘結束之後,關閉電漿功率以及處理氣體及蒸氣且將腔室抽真空返回至基礎壓力。隨後,將腔室與大氣壓力相通且將麥克風頭移除。
已發現,麥克風頭用排水及排油劑覆蓋以保護使其耐水攻擊。
Claims (28)
- 一種具有聚合塗層之電氣設備或電子設備,該聚合塗層係藉由將該設備暴露於包含式(I)之化合物之脈衝電漿歷經足以於該電氣設備或電子設備之表面上形成保護性聚合層的時間而形成:
- 如請求項1之電氣設備或電子設備,其係選自通信設備、聲音或音訊系統設備、電腦或電腦相關之元件、戶外照明系統、或用於運輸車輛之電氣設備或電子設備、洗衣機或洗碗機;或該等設備之任一者之元件。
- 如請求項2之電氣設備或電子設備,其為一聲音或音訊系統設備。
- 如請求項3之電氣設備或電子設備,其為一揚聲器、麥克風、振鈴器或蜂鳴器。
- 如請求項4之電氣設備或電子設備,其為一麥克風。
- 如請求項4之電氣設備或電子設備,其中該麥克風包含一發泡塑膠覆蓋片且該聚合層存在其上。
- 如請求項1至6中任一項之電氣設備或電子設備,其中該電氣設備或電子設備係在電漿沈積腔室中暴露於該脈衝電漿。
- 如請求項1至6中任一項之電氣設備或電子設備,其中該式(I)之化合物為式(II)之化合物:CH2 =CH-R5 (II)其中R5 係如請求項1所定義,或為式(III)之化合物:CH2 =CR7 C(O)O(CH2 )n R5 (III)其中n及R5 係如請求項1所定義且R7 為氫、C1-10 烷基或C1-10 鹵烷基。
- 如請求項8之電氣設備或電子設備,其中該式(I)之化合物為式(III)之化合物。
- 如請求項9之電氣設備或電子設備,其中該式(III)之化合物為式(IV)之化合物:
- 如請求項10之電氣設備或電子設備,其中該式(IV)之化合物為丙烯酸1H,1H,2H,2H-十七氟癸酯。
- 一種保護電氣設備或電子設備以對抗液體損壞之方法,該方法包含將該設備暴露於包含呈氣態之式(I)之化合物之脈衝電漿歷經足以於該電氣設備或電子設備之表面上形成聚合層的時間:
- 如請求項12之方法,其中該電氣設備或電子設備係置放於電漿沈積腔室中,在該腔室中激發輝光放電,且以脈衝場形式施加電壓。
- 如請求項12或請求項13之方法,其中所施加之電壓之功率為40 W至500 W。
- 如請求項12或請求項13之方法,其中該電壓係以工作時間:停止時間之比率在1:500至1:1500之範圍內之序列脈衝施加。
- 如請求項15之方法,其中該電壓係以功率工作20-50 μs且停止1000 μs至30000 μs之序列脈衝施加。
- 如請求項12或請求項13之方法,其中該電壓係以脈衝場形式施加歷時30秒至90分鐘之時間。
- 如請求項17之方法,其中該電壓係以脈衝場形式施加歷時5至60分鐘。
- 如請求項12或請求項13之方法,其中在預備步驟中,連續功率電漿係施加於該電氣設備或電子設備。
- 如請求項19之方法,其中該預備步驟係在惰性氣體存在下執行。
- 如請求項12或請求項13之方法,其中該呈氣態形式之式(I)之化合物係於施加該脈衝電壓下以80-300毫克/分鐘之速率饋入該電漿中。
- 如請求項12或請求項13之方法,其中該電漿係用平均功率為0.001 w/m3 至500 w/m3 之電壓產生。
- 如請求項22之方法,其中該電漿係用平均功率為0.001 w/m3 至100 w/m3 之電壓產生。
- 如請求項23之方法,其中該電漿係用平均功率為0.005 w/m3 至0.5 w/m3 之電壓產生。
- 如請求項12或請求項13之方法,其中其中該式(I)之化合物為式(II)之化合物:CH2 =CH-R5 (II)其中R5 係如請求項1所定義,或為式(III)之化合物:CH2 =CR7 C(O)O(CH2 )n R5 (III)其中n及R5 係如請求項1所定義且R7 為氫、C1-10 烷基或C1-10 鹵烷基。
- 如請求項25之方法,其中該式(I)之化合物為式(III)之化合物。
- 如請求項26之方法,其中該式(III)之化合物為式(IV)之化合物:
- 如請求項26之方法,其中該式(IV)之化合物為丙烯酸1H,1H,2H,2H-十七氟癸酯。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0601117A GB2434369B (en) | 2006-01-20 | 2006-01-20 | Plasma coated electrical or electronic devices |
US76224206P | 2006-01-26 | 2006-01-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200733828A TW200733828A (en) | 2007-09-01 |
TWI400014B true TWI400014B (zh) | 2013-06-21 |
Family
ID=36010616
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096102116A TWI400014B (zh) | 2006-01-20 | 2007-01-19 | 具有聚合塗層之電氣設備或電子設備及保護電氣設備或電子設備以對抗液體損壞之方法 |
Country Status (16)
Country | Link |
---|---|
US (3) | US9617353B2 (zh) |
EP (2) | EP1976942B1 (zh) |
JP (1) | JP2009523914A (zh) |
KR (2) | KR101598736B1 (zh) |
CN (2) | CN103396688A (zh) |
AU (1) | AU2007206779B2 (zh) |
CA (1) | CA2637625C (zh) |
ES (1) | ES2654296T3 (zh) |
GB (1) | GB2434369B (zh) |
HU (1) | HUE035359T2 (zh) |
IL (1) | IL192905A (zh) |
NZ (1) | NZ570462A (zh) |
PL (1) | PL1976942T3 (zh) |
TW (1) | TWI400014B (zh) |
WO (1) | WO2007083122A1 (zh) |
ZA (1) | ZA200806846B (zh) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2434369B (en) | 2006-01-20 | 2010-08-25 | P2I Ltd | Plasma coated electrical or electronic devices |
JP5710591B2 (ja) * | 2009-04-20 | 2015-04-30 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | プロセスチャンバ壁上にシリコンコーティングを使用した残留フッ素ラジカルの除去の促進 |
GB201000538D0 (en) | 2010-01-14 | 2010-03-03 | P2I Ltd | Liquid repellent surfaces |
BE1019159A5 (nl) * | 2010-01-22 | 2012-04-03 | Europlasma Nv | Werkwijze voor de afzetting van een gelijkmatige nanocoating door middel van een lage druk plasma proces. |
EP2422887A1 (en) * | 2010-08-27 | 2012-02-29 | Oticon A/S | A method of coating a surface with a water and oil repellant polymer layer |
US8852693B2 (en) * | 2011-05-19 | 2014-10-07 | Liquipel Ip Llc | Coated electronic devices and associated methods |
US9161434B2 (en) | 2013-09-04 | 2015-10-13 | Apple Inc. | Methods for shielding electronic components from moisture |
EP3080352B1 (en) | 2013-12-13 | 2020-04-29 | The North Face Apparel Corporation | Plasma treatments for coloration of textiles |
GB201403558D0 (en) | 2014-02-28 | 2014-04-16 | P2I Ltd | Coating |
GB2528653A (en) * | 2014-07-21 | 2016-02-03 | P2I Ltd | Novel sound product |
TW201708263A (zh) * | 2015-06-09 | 2017-03-01 | P2I有限公司 | 塗層 |
WO2016198857A1 (en) | 2015-06-09 | 2016-12-15 | P2I Ltd | Coatings |
BE1023776B1 (nl) | 2015-06-09 | 2017-07-20 | P2I Ltd | Verbeteringen met betrekking tot coatings |
CN105819959A (zh) * | 2016-03-21 | 2016-08-03 | 李仁� | 绿化混凝土添加剂 |
GB201610481D0 (en) * | 2016-06-14 | 2016-08-03 | Surface Innovations Ltd | Coating |
CN107142465B (zh) * | 2017-05-21 | 2018-07-13 | 江苏菲沃泰纳米科技有限公司 | 一种循环小功率连续放电制备多功能性纳米防护涂层的方法 |
CN107201511B (zh) * | 2017-05-21 | 2018-07-13 | 江苏菲沃泰纳米科技有限公司 | 一种循环周期交替放电制备多功能性纳米防护涂层的方法 |
CN107201510B (zh) * | 2017-05-21 | 2018-09-21 | 江苏菲沃泰纳米科技有限公司 | 一种周期交替放电制备多功能性纳米防护涂层的方法 |
BE1024652B1 (nl) * | 2017-06-23 | 2018-05-16 | P2I Ltd | Coatings |
KR102418952B1 (ko) * | 2017-08-31 | 2022-07-08 | 삼성전자주식회사 | 음성인식 기능을 갖는 가전제품 |
WO2019077368A1 (en) | 2017-10-19 | 2019-04-25 | P2I Ltd | IMPROVEMENTS RELATING TO MASKING |
CN210147858U (zh) | 2017-10-24 | 2020-03-17 | P2I有限公司 | 通用夹具 |
CN208903161U (zh) | 2017-11-28 | 2019-05-24 | P2I有限公司 | 包括屏幕的电子或电气设备 |
WO2023148323A1 (en) | 2022-02-04 | 2023-08-10 | P2I Ltd | Masking method and masked product |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54153926U (zh) * | 1978-04-18 | 1979-10-26 | ||
JPS61169100A (ja) * | 1985-01-22 | 1986-07-30 | Matsushita Electric Ind Co Ltd | 超音波送受波器 |
WO2005089961A1 (en) * | 2004-03-18 | 2005-09-29 | The Secretary Of State Of Defence | Coating of a polymer layer using low power pulsed plasma in a plasma chamber of a large volume |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54153926A (en) | 1978-05-26 | 1979-12-04 | Yamaha Motor Co Ltd | Non-contact igniter of internal combustion engine |
SU1158634A1 (ru) * | 1983-02-02 | 1985-05-30 | Ивановский научно-исследовательский экспериментально-конструкторский машиностроительный институт | Способ водо- и маслоотталкивающей отделки текстильных материалов |
US4649071A (en) * | 1984-04-28 | 1987-03-10 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Composite material and process for producing the same |
US5147822A (en) * | 1988-08-26 | 1992-09-15 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing method for improving a package of a semiconductor device |
JP2990608B2 (ja) * | 1989-12-13 | 1999-12-13 | 株式会社ブリヂストン | 表面処理方法 |
US5258746A (en) | 1991-12-03 | 1993-11-02 | K & B Protection, Inc. | Manually actuatable wrist alarm having a high-intensity sonic alarm signal |
US5403487A (en) * | 1992-12-22 | 1995-04-04 | The B. F. Goodrich Company | Process for biochemical oxidation of ultra-toxic wastewater in a packed bed bioreactor |
US5463010A (en) | 1993-11-12 | 1995-10-31 | Surface Engineering Technologies, Division Of Innerdyne, Inc. | Hydrocyclosiloxane membrane prepared by plasma polymerization process |
US5616933A (en) | 1995-10-16 | 1997-04-01 | Sony Corporation | Nitride encapsulated thin film transistor fabrication technique |
US6066399A (en) * | 1997-03-19 | 2000-05-23 | Sanyo Electric Co., Ltd. | Hard carbon thin film and method of forming the same |
GB9712338D0 (en) | 1997-06-14 | 1997-08-13 | Secr Defence | Surface coatings |
CN1190545C (zh) | 1997-06-14 | 2005-02-23 | 英国国防部 | 表面涂层 |
IL125545A0 (en) * | 1997-08-08 | 1999-03-12 | Univ Texas | Devices having gas-phase deposited coatings |
US6214423B1 (en) | 1998-04-16 | 2001-04-10 | Texas Instruments Incorporated | Method of forming a polymer on a surface |
US6512834B1 (en) | 1999-07-07 | 2003-01-28 | Gore Enterprise Holdings, Inc. | Acoustic protective cover assembly |
DE10009847C2 (de) | 2000-03-01 | 2002-10-02 | Sennheiser Electronic | Wetterschutzgehäuse für Mikrofone |
DE10044841B4 (de) * | 2000-09-11 | 2006-11-30 | Osram Opto Semiconductors Gmbh | Plasmaverkapselung für elektronische und mikroelektronische Bauelemente wie OLEDs sowie Verfahren zu dessen Herstellung |
KR100823858B1 (ko) | 2000-10-04 | 2008-04-21 | 다우 코닝 아일랜드 리미티드 | 피복물 형성 방법 및 피복물 형성 장치 |
JP2003066203A (ja) | 2001-08-28 | 2003-03-05 | Hitachi Maxell Ltd | 微細凹凸構造の形成方法及び当該凹凸を有する部材 |
SE0200313D0 (sv) * | 2002-02-01 | 2002-02-01 | Astrazeneca Ab | Novel process |
GB0211354D0 (en) | 2002-05-17 | 2002-06-26 | Surface Innovations Ltd | Atomisation of a precursor into an excitation medium for coating a remote substrate |
GB0212848D0 (en) | 2002-06-01 | 2002-07-17 | Surface Innovations Ltd | Introduction of liquid/solid slurry into an exciting medium |
US7217344B2 (en) * | 2002-06-14 | 2007-05-15 | Streaming Sales Llc | Transparent conductive film for flat panel displays |
KR100462273B1 (ko) * | 2002-09-19 | 2004-12-20 | 최해림 | 휴대폰 방수 커버구 |
US20040146772A1 (en) * | 2002-10-21 | 2004-07-29 | Kyocera Corporation | Fuel cell casing, fuel cell and electronic apparatus |
US20070003081A1 (en) * | 2005-06-30 | 2007-01-04 | Insound Medical, Inc. | Moisture resistant microphone |
GB2434369B (en) | 2006-01-20 | 2010-08-25 | P2I Ltd | Plasma coated electrical or electronic devices |
-
2006
- 2006-01-20 GB GB0601117A patent/GB2434369B/en not_active Expired - Fee Related
-
2007
- 2007-01-19 CA CA2637625A patent/CA2637625C/en not_active Expired - Fee Related
- 2007-01-19 KR KR1020147011108A patent/KR101598736B1/ko not_active IP Right Cessation
- 2007-01-19 KR KR1020087020350A patent/KR101467582B1/ko active IP Right Grant
- 2007-01-19 PL PL07704931T patent/PL1976942T3/pl unknown
- 2007-01-19 CN CN2013100842664A patent/CN103396688A/zh active Pending
- 2007-01-19 ES ES07704931.0T patent/ES2654296T3/es active Active
- 2007-01-19 CN CNA2007800025577A patent/CN101370877A/zh active Pending
- 2007-01-19 AU AU2007206779A patent/AU2007206779B2/en not_active Ceased
- 2007-01-19 JP JP2008550843A patent/JP2009523914A/ja active Pending
- 2007-01-19 TW TW096102116A patent/TWI400014B/zh not_active IP Right Cessation
- 2007-01-19 EP EP07704931.0A patent/EP1976942B1/en active Active
- 2007-01-19 NZ NZ570462A patent/NZ570462A/en not_active IP Right Cessation
- 2007-01-19 US US12/161,181 patent/US9617353B2/en not_active Expired - Fee Related
- 2007-01-19 HU HUE07704931A patent/HUE035359T2/en unknown
- 2007-01-19 WO PCT/GB2007/000149 patent/WO2007083122A1/en active Application Filing
- 2007-01-19 EP EP17195751.7A patent/EP3330322A1/en not_active Withdrawn
-
2008
- 2008-07-17 IL IL192905A patent/IL192905A/en not_active IP Right Cessation
- 2008-08-07 ZA ZA200806846A patent/ZA200806846B/xx unknown
-
2017
- 2017-02-27 US US15/443,114 patent/US20170166775A1/en not_active Abandoned
-
2018
- 2018-09-14 US US16/131,368 patent/US20190010351A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54153926U (zh) * | 1978-04-18 | 1979-10-26 | ||
JPS61169100A (ja) * | 1985-01-22 | 1986-07-30 | Matsushita Electric Ind Co Ltd | 超音波送受波器 |
WO2005089961A1 (en) * | 2004-03-18 | 2005-09-29 | The Secretary Of State Of Defence | Coating of a polymer layer using low power pulsed plasma in a plasma chamber of a large volume |
Also Published As
Publication number | Publication date |
---|---|
US20100189914A1 (en) | 2010-07-29 |
GB0601117D0 (en) | 2006-03-01 |
CN103396688A (zh) | 2013-11-20 |
IL192905A (en) | 2013-06-27 |
EP1976942A1 (en) | 2008-10-08 |
US20190010351A1 (en) | 2019-01-10 |
IL192905A0 (en) | 2009-02-11 |
EP1976942B1 (en) | 2017-10-11 |
ES2654296T3 (es) | 2018-02-13 |
WO2007083122A1 (en) | 2007-07-26 |
PL1976942T3 (pl) | 2018-03-30 |
GB2434369A (en) | 2007-07-25 |
WO2007083122A8 (en) | 2008-08-28 |
KR101467582B1 (ko) | 2014-12-01 |
AU2007206779B2 (en) | 2011-11-03 |
CA2637625C (en) | 2014-02-25 |
ZA200806846B (en) | 2009-11-25 |
KR20140063887A (ko) | 2014-05-27 |
NZ570462A (en) | 2010-11-26 |
GB2434369B (en) | 2010-08-25 |
CN101370877A (zh) | 2009-02-18 |
KR101598736B1 (ko) | 2016-03-02 |
CA2637625A1 (en) | 2007-07-26 |
KR20080097201A (ko) | 2008-11-04 |
US20170166775A1 (en) | 2017-06-15 |
US9617353B2 (en) | 2017-04-11 |
EP3330322A1 (en) | 2018-06-06 |
AU2007206779A1 (en) | 2007-07-26 |
JP2009523914A (ja) | 2009-06-25 |
TW200733828A (en) | 2007-09-01 |
HUE035359T2 (en) | 2018-05-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI400014B (zh) | 具有聚合塗層之電氣設備或電子設備及保護電氣設備或電子設備以對抗液體損壞之方法 | |
KR102390581B1 (ko) | 표면 코팅 | |
JP7336019B2 (ja) | 撥水ナノ膜及びその製造方法、応用、並びに製品 | |
KR20140043737A (ko) | 코팅된 전자 장치 및 관련 방법 | |
JP2013517119A (ja) | 撥液性表面 | |
TWI728517B (zh) | 一種環氧奈米塗層及其製備方法 | |
GB2493264A (en) | Formation of a liquid repellent coating, using plasma polymerisation | |
US20200126769A1 (en) | Plasma ashing of coated substrates | |
TW202016346A (zh) | 一種丙烯醯胺納米塗層及其製備方法 | |
CN106255555B (zh) | 涂层 | |
CN111690306B (zh) | 防水膜层及其制备方法和产品 | |
TWI837894B (zh) | 一種複合塗層、製備方法及器件 | |
GB2528653A (en) | Novel sound product |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |