TWI394000B - 感放射線性樹脂組成物、感放射線性乾膜、層間絕緣膜與其形成方法、及微透鏡與其形成方法 - Google Patents

感放射線性樹脂組成物、感放射線性乾膜、層間絕緣膜與其形成方法、及微透鏡與其形成方法 Download PDF

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Publication number
TWI394000B
TWI394000B TW095101672A TW95101672A TWI394000B TW I394000 B TWI394000 B TW I394000B TW 095101672 A TW095101672 A TW 095101672A TW 95101672 A TW95101672 A TW 95101672A TW I394000 B TWI394000 B TW I394000B
Authority
TW
Taiwan
Prior art keywords
film
radiation
meth
resin composition
acrylate
Prior art date
Application number
TW095101672A
Other languages
English (en)
Chinese (zh)
Other versions
TW200630749A (en
Inventor
Masaaki Hanamura
Kenichi Hamada
Eiji Takamoto
Takaki Minowa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200630749A publication Critical patent/TW200630749A/zh
Application granted granted Critical
Publication of TWI394000B publication Critical patent/TWI394000B/zh

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Classifications

    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D29/00—Independent underground or underwater structures; Retaining walls
    • E02D29/045—Underground structures, e.g. tunnels or galleries, built in the open air or by methods involving disturbance of the ground surface all along the location line; Methods of making them
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D2200/00—Geometrical or physical properties
    • E02D2200/12—Geometrical or physical properties corrugated
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D2200/00—Geometrical or physical properties
    • E02D2200/16—Shapes
    • E02D2200/1607—Shapes round, e.g. circle
    • E02D2200/1621—Shapes round, e.g. circle made from multiple elements
    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02D—FOUNDATIONS; EXCAVATIONS; EMBANKMENTS; UNDERGROUND OR UNDERWATER STRUCTURES
    • E02D2600/00—Miscellaneous
    • E02D2600/20—Miscellaneous comprising details of connection between elements

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  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Mining & Mineral Resources (AREA)
  • Paleontology (AREA)
  • Civil Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW095101672A 2005-01-21 2006-01-17 感放射線性樹脂組成物、感放射線性乾膜、層間絕緣膜與其形成方法、及微透鏡與其形成方法 TWI394000B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005013854A JP2006201549A (ja) 2005-01-21 2005-01-21 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ

Publications (2)

Publication Number Publication Date
TW200630749A TW200630749A (en) 2006-09-01
TWI394000B true TWI394000B (zh) 2013-04-21

Family

ID=36959589

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101672A TWI394000B (zh) 2005-01-21 2006-01-17 感放射線性樹脂組成物、感放射線性乾膜、層間絕緣膜與其形成方法、及微透鏡與其形成方法

Country Status (3)

Country Link
JP (1) JP2006201549A (ja)
KR (1) KR20060085206A (ja)
TW (1) TWI394000B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5497312B2 (ja) * 2009-03-12 2014-05-21 旭化成イーマテリアルズ株式会社 フレキシブルプリント配線基板

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW570947B (en) * 2001-03-28 2004-01-11 Jsr Corp Radiation sensitive resin composition, its use for interlayer insulating film and microlens, interlayer insulating film and microlens

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW570947B (en) * 2001-03-28 2004-01-11 Jsr Corp Radiation sensitive resin composition, its use for interlayer insulating film and microlens, interlayer insulating film and microlens

Also Published As

Publication number Publication date
JP2006201549A (ja) 2006-08-03
TW200630749A (en) 2006-09-01
KR20060085206A (ko) 2006-07-26

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