TWI387849B - 適合於無旋轉，狹縫塗布之感光性樹脂組成物 - Google Patents

適合於無旋轉，狹縫塗布之感光性樹脂組成物 Download PDF

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Publication number
TWI387849B
TWI387849B TW096101989A TW96101989A TWI387849B TW I387849 B TWI387849 B TW I387849B TW 096101989 A TW096101989 A TW 096101989A TW 96101989 A TW96101989 A TW 96101989A TW I387849 B TWI387849 B TW I387849B
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
slit coating
weight
parts
Prior art date
Application number
TW096101989A
Other languages
English (en)
Chinese (zh)
Other versions
TW200739254A (en
Inventor
Junichi Shimakura
Shuichi Takahashi
Yong Zhang
Original Assignee
Az Electronic Mat Ip Japan Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Az Electronic Mat Ip Japan Kk filed Critical Az Electronic Mat Ip Japan Kk
Publication of TW200739254A publication Critical patent/TW200739254A/zh
Application granted granted Critical
Publication of TWI387849B publication Critical patent/TWI387849B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
TW096101989A 2006-01-31 2007-01-19 適合於無旋轉，狹縫塗布之感光性樹脂組成物 TWI387849B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006023388A JP4813193B2 (ja) 2006-01-31 2006-01-31 スピンレス、スリットコーティングに適した感光性樹脂組成物

Publications (2)

Publication Number Publication Date
TW200739254A TW200739254A (en) 2007-10-16
TWI387849B true TWI387849B (zh) 2013-03-01

Family

ID=38485798

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096101989A TWI387849B (zh) 2006-01-31 2007-01-19 適合於無旋轉，狹縫塗布之感光性樹脂組成物

Country Status (4)

Country Link
JP (1) JP4813193B2 (ja)
KR (1) KR101285574B1 (ja)
CN (1) CN101013263B (ja)
TW (1) TWI387849B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5090833B2 (ja) * 2007-09-11 2012-12-05 東京応化工業株式会社 ポジ型ホトレジスト組成物、及びそれを用いた感光性膜付基板
JP5329999B2 (ja) * 2009-01-29 2013-10-30 ＡｚエレクトロニックマテリアルズＩｐ株式会社 パターン形成方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3842446B2 (ja) * 1997-09-25 2006-11-08 富士写真フイルム株式会社 赤外線レーザ用ポジ型感光性組成物
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
JP4213366B2 (ja) * 2001-06-12 2009-01-21 Ａｚエレクトロニックマテリアルズ株式会社 厚膜レジストパターンの形成方法
JP2004138995A (ja) * 2002-08-21 2004-05-13 Fuji Photo Film Co Ltd 平版印刷版の製版方法
JP4545553B2 (ja) * 2004-03-12 2010-09-15 東京応化工業株式会社 ノンスピン塗布方式用ポジ型ホトレジスト組成物及びレジストパターンの形成方法

Also Published As

Publication number Publication date
KR101285574B1 (ko) 2013-07-15
CN101013263B (zh) 2012-05-30
JP4813193B2 (ja) 2011-11-09
KR20070079028A (ko) 2007-08-03
CN101013263A (zh) 2007-08-08
TW200739254A (en) 2007-10-16
JP2007206256A (ja) 2007-08-16

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