TWI386768B - 基板處理系統以及群組管理系統 - Google Patents

基板處理系統以及群組管理系統 Download PDF

Info

Publication number
TWI386768B
TWI386768B TW097110462A TW97110462A TWI386768B TW I386768 B TWI386768 B TW I386768B TW 097110462 A TW097110462 A TW 097110462A TW 97110462 A TW97110462 A TW 97110462A TW I386768 B TWI386768 B TW I386768B
Authority
TW
Taiwan
Prior art keywords
substrate processing
information
configuration
management
management device
Prior art date
Application number
TW097110462A
Other languages
English (en)
Chinese (zh)
Other versions
TW200848964A (en
Inventor
Kazuhide Asai
Hiroyuki Iwakura
Original Assignee
Hitachi Int Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Int Electric Inc filed Critical Hitachi Int Electric Inc
Publication of TW200848964A publication Critical patent/TW200848964A/zh
Application granted granted Critical
Publication of TWI386768B publication Critical patent/TWI386768B/zh

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • General Factory Administration (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW097110462A 2007-04-02 2008-03-25 基板處理系統以及群組管理系統 TWI386768B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007096147 2007-04-02
JP2008030365A JP5461778B2 (ja) 2007-04-02 2008-02-12 基板処理システム、群管理システム、構成管理プログラム、接続管理プログラム、端末プログラム及び各ハードウェアの接続管理方法

Publications (2)

Publication Number Publication Date
TW200848964A TW200848964A (en) 2008-12-16
TWI386768B true TWI386768B (zh) 2013-02-21

Family

ID=40055304

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097110462A TWI386768B (zh) 2007-04-02 2008-03-25 基板處理系統以及群組管理系統

Country Status (3)

Country Link
JP (1) JP5461778B2 (ko)
KR (3) KR101018682B1 (ko)
TW (1) TWI386768B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI474143B (zh) 2010-02-09 2015-02-21 Hitachi Int Electric Inc 基板處理系統及其資料處理方法、群管理裝置及其資料處理方法、半導體處理裝置之製造方法暨電腦可讀取記錄媒體
KR102094499B1 (ko) * 2012-10-31 2020-03-27 삼성전자주식회사 무선 통신 시스템에서 로컬 영역 패킷 데이터 네트워크 연결을 관리하는 방법 및 장치
JP6645993B2 (ja) * 2016-03-29 2020-02-14 株式会社Kokusai Electric 処理装置、装置管理コントローラ、及びプログラム並びに半導体装置の製造方法
CN107240564B (zh) 2016-03-29 2021-01-05 株式会社国际电气 处理装置、装置管理控制器、以及装置管理方法
JP7336207B2 (ja) * 2018-05-29 2023-08-31 キヤノン株式会社 基板処理システム、基板処理システムの制御方法、プログラム、および物品製造方法
JP7157629B2 (ja) * 2018-11-02 2022-10-20 株式会社Screenホールディングス 基板処理装置および基板処理方法
JP2022145329A (ja) 2021-03-19 2022-10-04 株式会社Kokusai Electric 管理装置、データ処理方法、プログラム、半導体装置の製造方法および処理システム

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6269279B1 (en) * 1997-06-20 2001-07-31 Tokyo Electron Limited Control system
US6615098B1 (en) * 2001-02-21 2003-09-02 Advanced Micro Devices, Inc. Method and apparatus for controlling a tool using a baseline control script
US20030220768A1 (en) * 2002-03-12 2003-11-27 Stuart Perry Diagnostic system and method for integrated remote tool access, data collection, and control
US7047100B2 (en) * 2001-07-05 2006-05-16 Dainippon Screen Mfg. Co., Ltd. Substrate processing system managing apparatus information of substrate processing apparatus
TW200625389A (en) * 2004-08-12 2006-07-16 Nikon Corp Substrate processing apparatus, use state ascertaining method, and false use preventing method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2679674B2 (ja) * 1994-05-02 1997-11-19 日本電気株式会社 半導体製造ライン制御装置
JP3771050B2 (ja) 1997-06-20 2006-04-26 東京エレクトロン株式会社 制御システム
JP3948916B2 (ja) * 2001-08-15 2007-07-25 大日本スクリーン製造株式会社 基板処理装置
US7280883B2 (en) * 2001-09-06 2007-10-09 Dainippon Screen Mfg. Co., Ltd. Substrate processing system managing apparatus information of substrate processing apparatus
JP4364468B2 (ja) * 2001-11-20 2009-11-18 株式会社日立国際電気 半導体製造装置、半導体製造システム、プロセスレシピの作成方法、及び膜の形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6269279B1 (en) * 1997-06-20 2001-07-31 Tokyo Electron Limited Control system
US6615098B1 (en) * 2001-02-21 2003-09-02 Advanced Micro Devices, Inc. Method and apparatus for controlling a tool using a baseline control script
US7047100B2 (en) * 2001-07-05 2006-05-16 Dainippon Screen Mfg. Co., Ltd. Substrate processing system managing apparatus information of substrate processing apparatus
US20030220768A1 (en) * 2002-03-12 2003-11-27 Stuart Perry Diagnostic system and method for integrated remote tool access, data collection, and control
TW200625389A (en) * 2004-08-12 2006-07-16 Nikon Corp Substrate processing apparatus, use state ascertaining method, and false use preventing method

Also Published As

Publication number Publication date
KR101043986B1 (ko) 2011-06-24
KR20110007077A (ko) 2011-01-21
KR101040196B1 (ko) 2011-06-09
TW200848964A (en) 2008-12-16
KR20110043571A (ko) 2011-04-27
KR101018682B1 (ko) 2011-03-04
JP2008277752A (ja) 2008-11-13
KR20080090281A (ko) 2008-10-08
JP5461778B2 (ja) 2014-04-02

Similar Documents

Publication Publication Date Title
TWI386768B (zh) 基板處理系統以及群組管理系統
US8874259B2 (en) Substrate processing apparatus and method of processing error of substrate processing apparatus
US8447424B2 (en) Substrate processing system and group management system
JP5412065B2 (ja) 情報管理方法、情報管理装置及び基板処理システム
JP5254779B2 (ja) 基板処理装置システム
KR101075128B1 (ko) 기판 처리 장치
JP2011071166A (ja) 基板処理システム
JP6018369B2 (ja) 基板処理システム、管理装置及び基板処理システムにおける表示方法
JP4734185B2 (ja) 基板処理装置及び基板処理装置の制御方法
JP5436797B2 (ja) 基板処理システム、装置データサーバ、プログラム及び基板処理装置のデータ処理方法
JP5269337B2 (ja) 基板処理システム、群管理システム、構成管理プログラム、接続管理プログラム及び群管理システムの構成管理方法
JP2011146626A (ja) 基板処理システム
JP5546195B2 (ja) 基板処理装置、基板処理装置の表示方法及び半導体装置の製造方法
JP2008053603A (ja) 基板処理システム
JP2009252911A (ja) 基板処理システム
JP2010219246A (ja) 基板処理システム
JP2010147034A (ja) 基板処理システム
JP2010287736A (ja) 基板処理システム
JP2011135090A (ja) 基板処理装置
JP2010040799A (ja) 基板処理システム
JP2010027983A (ja) 基板処理装置