TWI385047B - Method for cutting brittle material substrates - Google Patents

Method for cutting brittle material substrates Download PDF

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TWI385047B
TWI385047B TW099116495A TW99116495A TWI385047B TW I385047 B TWI385047 B TW I385047B TW 099116495 A TW099116495 A TW 099116495A TW 99116495 A TW99116495 A TW 99116495A TW I385047 B TWI385047 B TW I385047B
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crack
substrate
initial
brittle material
cutting
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TW099116495A
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Chinese (zh)
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TW201103684A (en
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Atsushi Imura
Yoshitaka Tsukada
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Mitsuboshi Diamond Ind Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222Scoring using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/03Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/08Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Description

脆性材料基板之割斷方法Cutting method of brittle material substrate

本發明係關於以雷射照射割斷玻璃基板或陶瓷基板等脆性材料基板之方法。The present invention relates to a method of cutting a substrate of a brittle material such as a glass substrate or a ceramic substrate by laser irradiation.

以往,做為玻璃基板或陶瓷基板等脆性材料基板之割斷方法,係廣泛使用使刀輪等壓接於脆性材料基板之表面並同時轉動,形成對脆性材料基板之表面大致垂直方向之裂痕(以下稱為「垂直裂痕」),之後,對基板施加機械性之按壓力,使垂直裂痕往基板厚度方向進展以割斷基板之方法。Conventionally, as a method of cutting a brittle material substrate such as a glass substrate or a ceramic substrate, it is widely used such that a cutter wheel or the like is pressed against the surface of the brittle material substrate and simultaneously rotated to form a crack in a direction substantially perpendicular to the surface of the brittle material substrate (hereinafter It is called "vertical crack", and then a mechanical pressing force is applied to the substrate to advance the vertical crack toward the thickness of the substrate to cut the substrate.

然而,通常在使用刀輪形成脆性材料基板之垂直裂痕之場合,會產生被稱為玻璃屑(cullet)之小破片,可能因此玻璃屑而於脆性材料基板之表面產生傷痕。此外,於割斷後之脆性材料基板之端部容易產生微裂痕(micro crack),可能以此微裂痕為起因而產生脆性材料基板之斷裂。因此,通常係在割斷後研磨、洗淨脆性材料基板之端部以去除微裂痕或玻璃屑等。However, in the case where a vertical crack of a brittle material substrate is formed using a cutter wheel, a small fragment called a cullet is generated, which may cause scratches on the surface of the brittle material substrate. In addition, micro cracks are likely to occur at the ends of the brittle material substrate after cutting, which may cause cracking of the brittle material substrate due to the micro cracks. Therefore, it is common to grind and clean the end portion of the brittle material substrate after cutting to remove microcracks or glass swarf.

另一方面,近年來,使用二氧化碳雷射以熔融溫度未滿之溫度加熱脆性材料基板,據此藉由於脆性材料基板產生之熱應力使拉伸應力局部性產生以形成垂直裂痕之方法已有各種檢討、開發。由於此使用雷射光束之割斷方法係非接觸加工,故可抑制上述之玻璃屑或微裂痕等潛在性缺陷之產生。但由於在此使用雷射光束之割斷方法中垂直裂痕亦未達基板之厚度方向之全體而通常僅止於表面部,故仍須施加外力使垂直裂痕往基板厚度方向進展。因此,垂直裂痕之端面被彼此按壓,仍有產生微裂痕或玻璃屑之虞。On the other hand, in recent years, a carbon dioxide laser has been used to heat a brittle material substrate at a temperature at which the melting temperature is not full, whereby various methods of locally generating tensile stress to form a vertical crack due to thermal stress generated by a brittle material substrate have been used. Review and development. Since the cutting method using the laser beam is non-contact processing, it is possible to suppress the occurrence of potential defects such as the above-mentioned glass swarf or microcrack. However, since the vertical crack in the cutting method using the laser beam does not reach the entire thickness direction of the substrate and generally stops only at the surface portion, an external force must be applied to progress the vertical crack in the thickness direction of the substrate. Therefore, the end faces of the vertical cracks are pressed against each other, and there is still a flaw in the occurrence of microcracks or glass swarf.

針對此問題,例如在專利文獻1有提案藉由於玻璃基板之側面形成初期龜裂,先以線狀加熱器加熱割斷預定線,以空氣噴嘴等冷卻機構部分冷卻進展之龜裂之前端周邊,以使龜裂更加進展之技術。In order to solve this problem, for example, in Patent Document 1, it is proposed that the initial crack is formed on the side surface of the glass substrate, and the predetermined line is first heated by a linear heater, and the peripheral portion of the crack before the progress is cooled by a cooling mechanism such as an air nozzle. A technique to make cracks more progressive.

此外,在專利文獻2有提案對至少2點同時照射雷射光束形成初期龜裂後,藉由使雷射光束沿割斷預定線移動以使初期龜裂於割斷預定線之方向進展之割斷脆性材料基板之方法Further, in Patent Document 2, it is proposed to cut a brittle material by causing at least two points to simultaneously irradiate a laser beam to form an initial crack, and then moving the laser beam along the planned cutting line to advance the initial crack in the direction of the cut line. Substrate method

專利文獻1:日本特開2000-281375號公報Patent Document 1: Japanese Laid-Open Patent Publication No. 2000-281375

專利文獻2:日本特開平7-328781號公報Patent Document 2: Japanese Patent Laid-Open No. Hei 7-328781

然而,在專利文獻1之提案技術中,因於玻璃基板之側面形成初期龜裂,故於割斷預定線之方向(從基板側面觀察為深度方向)形成既定長度(深度)之初期龜裂有困難。此外,實質上需要在於分離割斷面之方向對割斷預定線之終端部施加力之狀態下固定支持之機構或使檢出進展之龜裂位置之感測器移動之機構等,故割斷作業準備作業繁雜且裝置會大型化。另外,由於以沿割斷預定線配置之加熱器線加熱割斷預定線全線,故電力消耗量比部分加熱之場合多。However, in the technique of the patent document 1, since the initial crack is formed on the side surface of the glass substrate, it is difficult to form the initial crack of a predetermined length (depth) in the direction in which the predetermined line is cut (the depth direction is viewed from the side surface of the substrate). . In addition, there is a need for a mechanism for fixing the support in a state in which the direction of the cut-off section is applied to the end portion of the cut-off line, or a mechanism for moving the sensor that detects the crack position of the progress, and the like. It is cumbersome and the device will be large. Further, since the heater line arranged along the cut line is heated to cut the entire line of the predetermined line, the amount of power consumption is larger than that in the case of partial heating.

此外,在專利文獻2之提案技術中,需要複數雷射振盪器,且以光軸變更手段為必要,有裝置複雜化、大型化之虞。此外,在以複數之雷射光束照射形成初期龜裂之場合,雷射輸出或照射位置等之調整十分困難,有初期龜裂之形成位置之精度無法提升之虞。Further, in the proposed technique of Patent Document 2, a plurality of laser oscillators are required, and it is necessary to use an optical axis changing means, and the apparatus is complicated and large. Further, when the initial crack is formed by irradiation with a plurality of laser beams, it is difficult to adjust the laser output or the irradiation position, and the accuracy of the initial crack formation position cannot be improved.

本發明係鑑於此種以往之問題而為,其目的在於提供不招致裝置之大型化、複雜化便將微裂痕或玻璃屑等之產生抑制至最小限度同時割斷脆性材料基板之方法。The present invention has been made in view of such conventional problems, and an object of the present invention is to provide a method for cutting a brittle material substrate while minimizing the occurrence of micro-cracks or glass chips without causing an increase in size and complexity of the device.

此外,本發明之目的在於提供割斷被貼合之積層基板之一方之基板且可簡單分離、除去被割斷之基板部分之方法。Further, an object of the present invention is to provide a method of cutting a substrate on one side of a laminated substrate to be bonded and simply separating and removing the portion of the substrate to be cut.

達成前述目的之第1發明之脆性材料基板之割斷方法係一種脆性材料基板之割斷方法,藉由照射雷射光束來割斷脆性材料基板,其特徵在於具有:於前述基板之一面之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;按壓前述基板之形成有前述初期龜裂之面之相反側面之與前述初期龜裂對向之部分,使前述初期龜裂往前述基板之厚度方向進展而形成到達前述相反側面之初期貫通龜裂之步驟;從前述初期貫通龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱前述基板,據此藉由於基板產生之熱應力使初期貫通龜裂沿前述割斷預定線進展之步驟。The method for cutting a brittle material substrate according to the first aspect of the present invention is a method for cutting a brittle material substrate, wherein the brittle material substrate is cut by irradiating a laser beam, and the method further comprises: cutting a predetermined line on one side of the substrate a step of forming an initial crack by a cutter at a cutting start end; pressing a portion of the opposite side surface of the substrate on which the initial crack is formed to face the initial crack, and causing the initial crack to progress in a thickness direction of the substrate And forming an initial through crack to reach the opposite side surface; and the laser beam is relatively moved from the initial through crack along the predetermined cutting line, and the substrate is heated at a temperature at which the melting temperature is not full, thereby The thermal stress generated by the substrate causes the initial through crack to progress along the predetermined cut line.

達成前述目的之第2發明之脆性材料基板之割斷方法係一種脆性材料基板之割斷方法,藉由照射雷射光束來割斷脆性材料基板,其特徵在於具有:於前述基板之一面之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;從前述初期龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱前述基板,據此藉由於基板產生之熱應力使初期龜裂沿前述割斷預定線進展以形成初期進展龜裂之步驟;按壓前述基板之形成有前述初期進展龜裂之面之相反側面之與前述初期進展龜裂對向之部分,使前述初期進展龜裂往前述基板之厚度方向進展而形成到達前述相反側面之初期貫通龜裂之步驟;從前述初期進展龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱前述基板,據此藉由於基板產生之熱應力使初期進展龜裂沿前述割斷預定線進展之步驟。A method for cutting a brittle material substrate according to a second aspect of the present invention is a method for cutting a brittle material substrate, wherein the brittle material substrate is cut by irradiating a laser beam, and the method further comprises: cutting a predetermined line on one side of the substrate a step of forming an initial crack by a cutter at a cutting start end; and the laser beam is relatively moved from the initial crack along the predetermined cutting line and simultaneously irradiated, and the substrate is heated at a temperature at which the melting temperature is not full, thereby being generated by the substrate The thermal stress causes the initial crack to progress along the predetermined cutting line to form an initial progress crack; and presses the portion of the opposite side surface of the substrate on which the initial progress crack is formed, and the portion of the initial progress crack opposite The initial progress of the crack progresses in the thickness direction of the substrate to form an initial through crack that reaches the opposite side surface; and the laser beam is relatively moved and simultaneously irradiated from the initial progress crack along the predetermined cutting line to melt the temperature Heating the substrate at a temperature that is less than full, whereby the initial stage is caused by thermal stress generated by the substrate The step of progressing the crack along the aforementioned cut-off line.

達成前述目的之第3發明之脆性材料基板之割斷方法係一種脆性材料基板之割斷方法,將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷,其特徵在於具有:於第1脆性材料基板之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;按壓第2脆性材料基板之與前述初期龜裂對向之部分,使前述初期龜裂往第1脆性材料基板之厚度方向進展而形成到達第1脆性材料基板之相反側面之初期貫通龜裂之步驟;從前述初期貫通龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱第1脆性材料基板,據此藉由於第1脆性材料基板產生之熱應力使初期貫通龜裂沿前述割斷預定線進展之步驟。The method for cutting a brittle material substrate according to the third aspect of the present invention is a method for cutting a brittle material substrate, wherein one of the laminated substrates bonded to the two brittle material substrates is cut, and the method is characterized in that: (1) a step of forming an initial crack by a cutter at a cutting start end of the cutting line of the brittle material substrate; pressing the portion of the second brittle material substrate opposite to the initial crack, and causing the initial crack to the first brittle material substrate a step of forming an initial through crack in the thickness direction to form an opposite side surface of the first brittle material substrate; and the laser beam is relatively moved from the initial through crack along the predetermined cut line to a temperature at which the melting temperature is not full. The first brittle material substrate is heated, whereby the initial through crack is advanced along the predetermined cutting line by the thermal stress generated by the first brittle material substrate.

達成前述目的之第4發明之脆性材料基板之割斷方法係一種脆性材料基板之割斷方法,將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷,其特徵在於具有:於第1脆性材料基板之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;從前述初期龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱第1脆性材料基板,據此藉由於第1脆性材料基板產生之熱應力使初期龜裂沿前述割斷預定線進展以形成初期進展龜裂之步驟;按壓第2脆性材料基板之與前述初期龜裂對向之部分,使前述初期龜裂往第1脆性材料基板之厚度方向進展而形成到達第1脆性材料基板之相反側面之初期貫通龜裂之步驟;從前述初期貫通龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱第1脆性材料基板,據此藉由於第1脆性材料基板產生之熱應力使初期貫通龜裂沿前述割斷預定線進展之步驟。The method for cutting a brittle material substrate according to the fourth aspect of the present invention is a method for cutting a brittle material substrate, wherein one of the laminated substrates bonded to the two brittle material substrates is cut, and the method is characterized in that: (1) a step of forming an initial crack by a cutter at a cutting start end of the cutting line of the brittle material substrate; and the laser beam is relatively moved and simultaneously irradiated from the initial crack along the predetermined cutting line, and heated at a temperature at which the melting temperature is not full. a brittle material substrate, whereby the initial crack is advanced along the predetermined cutting line by the thermal stress generated by the first brittle material substrate to form an initial progress crack; and the second brittle material substrate is pressed against the initial crack pair In the part, the initial crack is advanced in the thickness direction of the first brittle material substrate to form an initial through crack in the opposite side surface of the first brittle material substrate, and the initial through crack is along the predetermined cut line. The laser beam is relatively moved and simultaneously irradiated, and the first brittle material substrate is heated at a temperature at which the melting temperature is not full. By thermal stress generated in the brittle material substrate so that a first initial step of the progression of the line through the cracks along the cleaving.

在本發明之脆性材料基板之割斷方法中,由於係使初期龜裂為往基板厚度方向貫通之龜裂,使此初期貫通龜裂藉由雷射光束之照射而沿割斷預定線進展,故不招致裝置之大型化、複雜化便可將微裂痕或玻璃屑等之產生抑制至最小限度。In the cutting method of the brittle material substrate of the present invention, since the initial crack is a crack that penetrates in the thickness direction of the substrate, the initial through crack is progressed along the planned cutting line by the irradiation of the laser beam, so The enlargement and complication of the device can minimize the occurrence of micro-cracks or glass swarf.

此外,在將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷之本發明之方法中,除上述效果外,還因在形成初期貫通龜裂之際按壓第2脆性材料基板之與前述初期龜裂對向之部分而第1脆性材料基板及第2脆性材料基板彎曲,初期貫通龜裂之端面間之貼合、第1脆性材料基板之端部之割斷除去部分與第2脆性材料基板間之貼合容易消除。Further, in the method of the present invention in which one of the laminated substrates bonded to the two brittle material substrates is cut, in addition to the above effects, the second brittle material substrate is pressed while the crack is formed at the initial stage of formation. The first brittle material substrate and the second brittle material substrate are bent in part opposite to the initial crack, and the first end of the crack is bonded to the end surface of the crack, and the end portion of the first brittle material substrate is cut and removed. The bonding between the brittle material substrates is easily eliminated.

另外,利用使以刀具形成之初期龜裂為小部分,以照射雷射光束使該初期龜裂進展至既定長度之方法,可進一步抑制微裂痕或玻璃屑等之產生。Further, by causing the initial crack formed by the cutter to be small, and irradiating the laser beam to advance the initial crack to a predetermined length, it is possible to further suppress the occurrence of microcracks or glass swarf.

以下雖針對本發明之脆性材料基板之割斷方法更詳細說明,但本發明並不限於此等實施型態。Although the cutting method of the brittle material substrate of the present invention will be described in more detail below, the present invention is not limited to these embodiments.

於圖1顯示顯示本發明之脆性材料基板之割斷方法之一實施型態之步驟圖。圖1係以割斷預定線11割斷做為脆性材料基板之玻璃基板1之場合之步驟圖。如同圖(a)所示,先於玻璃基板1之表面10a之割斷開始端As以刀輪2形成初期龜裂31。此初期龜裂31之長度及深度雖無特別限定,但通常初期龜裂31之長度為1~30mm之範圍較理想,更理想為數mm之範圍。此外,初期龜裂31之深度為基板厚度之10%以上較理想。Fig. 1 is a view showing the steps of an embodiment of the cutting method of the brittle material substrate of the present invention. Fig. 1 is a step diagram showing a case where the glass substrate 1 which is a brittle material substrate is cut by cutting the predetermined line 11. As shown in (a), the initial crack 31 is formed by the cutter wheel 2 before the cutting start end As of the surface 10a of the glass substrate 1. Although the length and depth of the initial crack 31 are not particularly limited, the length of the initial crack 31 is preferably in the range of 1 to 30 mm, more preferably in the range of several mm. Further, it is preferable that the depth of the initial crack 31 is 10% or more of the thickness of the substrate.

其次,如同圖(b)所示,以折斷滾輪4將玻璃基板1之背面10b之對向於初期龜裂31之部分往表面10a之方向按壓。藉此,初期龜裂31往玻璃基板1之厚度方向進展,成為到達背面10b之初期貫通龜裂32。Next, as shown in Fig. (b), the portion of the back surface 10b of the glass substrate 1 facing the initial crack 31 is pressed by the breaking roller 4 in the direction of the surface 10a. As a result, the initial crack 31 progresses in the thickness direction of the glass substrate 1, and the crack 32 is formed at the initial stage of reaching the back surface 10b.

其次,如同圖(c)所示,從玻璃基板1之初期貫通龜裂32沿割斷預定線11照射橢圓形狀之雷射光束51,並從冷卻噴嘴60對雷射光束51照射區域之後端附近噴霧做為冷卻媒體之冷卻水61。Next, as shown in (c), the elliptical-shaped laser beam 51 is irradiated from the initial stage of the glass substrate 1 through the crack 32 along the planned cutting line 11, and the laser beam 51 is irradiated from the vicinity of the end portion of the laser beam 51. Cooling water 61 as a cooling medium.

藉由對玻璃基板1照射雷射光束51,玻璃基板1於厚度方向被以熔融溫度未滿之溫度加熱,玻璃基板1雖產生熱膨脹之趨勢,但因局部加熱而無法膨脹,產生將照射點往中心壓縮之應力。之後,藉由在加熱後立即對玻璃基板1之表面噴霧冷卻水61而被冷卻,此時產生拉伸應力。藉由此拉伸應力之作用,以初期貫通龜裂32為開始點,涵蓋玻璃基板1之厚度方向全體之龜裂進展。之後,藉由使雷射光束51沿割斷預定線11移動,涵蓋玻璃基板1之厚度方向全體之龜裂33沿雷射光束51之移動方向連續進展,玻璃基板1被以割斷預定線11割斷。另外,在此實施形態中雖係固定玻璃基板1並使雷射光束51移動,但使玻璃基板1移動並固定雷射光束51或使玻璃基板1及雷射光束51雙方移動亦無妨。此外,即使不噴霧冷卻水61而以自然空冷雖亦可使以初期貫通龜裂32為起點之龜裂33進展,但噴霧冷卻水61強制冷卻之作法龜裂33迅速且確實進展,故較理想。By irradiating the glass substrate 1 with the laser beam 51, the glass substrate 1 is heated at a temperature at which the melting temperature is not full in the thickness direction, and the glass substrate 1 tends to thermally expand, but cannot be inflated due to local heating, and the irradiation point is generated. The stress of the center compression. Thereafter, the surface of the glass substrate 1 is sprayed with cooling water 61 immediately after heating to be cooled, and tensile stress is generated at this time. By the action of the tensile stress, the initial penetration crack 32 is used as a starting point, and the crack progress of the entire thickness direction of the glass substrate 1 is covered. Thereafter, by moving the laser beam 51 along the planned cutting line 11, the crack 33 covering the entire thickness direction of the glass substrate 1 continuously progresses in the moving direction of the laser beam 51, and the glass substrate 1 is cut by the planned cutting line 11. Further, in this embodiment, although the glass substrate 1 is fixed and the laser beam 51 is moved, the glass substrate 1 may be moved to fix the laser beam 51 or both the glass substrate 1 and the laser beam 51 may be moved. In addition, even if the cooling water 61 is not sprayed, the crack 33 starting from the initial penetration crack 32 can be progressed by natural air cooling, but the spray cooling water 61 is forced to cool, and the crack 33 is rapidly and surely progressed, so it is preferable. .

在此使用之雷射光束51並無特別限定,由玻璃基板1 之材質或厚度等適當決定即可。脆性材料基板為玻璃基板之場合,由於在玻璃基板表面之吸收較大故波長9~11μm之雷射光束較理想。此種雷射光束可舉出二氧化碳雷射。雷射光束51之對玻璃基板1之照射形狀係於雷射光束之相對移動方向較長之橢圓形狀較理想,長徑為10~60mm之範圍,短徑為1~5mm之範圍較理想。The laser beam 51 used herein is not particularly limited, and is composed of a glass substrate 1 The material or thickness can be appropriately determined. When the brittle material substrate is a glass substrate, a laser beam having a wavelength of 9 to 11 μm is preferable because the absorption on the surface of the glass substrate is large. Such a laser beam can be a carbon dioxide laser. The illumination shape of the laser beam 51 to the glass substrate 1 is preferably an elliptical shape in which the relative movement direction of the laser beam is long, and the long diameter is in the range of 10 to 60 mm, and the short diameter is preferably in the range of 1 to 5 mm.

做為使從冷卻噴嘴60噴出之水,蒸餾水較理想。但在割斷後之玻璃基板1不會產生不良影響之範圍,於水添加介面活性劑等添加劑亦無妨。冷卻水量通常為1~2ml/min之範圍。以水進行之玻璃基板1之冷卻,從急冷以雷射光束51加熱之玻璃基板1之觀點,使水與氣體(通常為空氣)一起噴射之所謂水注(water jet)方式較理想。以冷卻水冷卻之區域為直徑1~5mm程度之圓形狀或橢圓形狀較理想。此外,冷卻區域為以雷射光束51之加熱區域之相對移動方向後方,形成於加熱區域之後端附近較理想。As the water sprayed from the cooling nozzle 60, distilled water is preferred. However, the glass substrate 1 after the cutting does not have an adverse effect, and an additive such as an surfactant may be added to the water. The amount of cooling water is usually in the range of 1 to 2 ml/min. The cooling of the glass substrate 1 by water is preferably a so-called water jet method in which water is sprayed together with a gas (usually air) from the viewpoint of quenching the glass substrate 1 heated by the laser beam 51. The area cooled by the cooling water is preferably a circular shape or an elliptical shape having a diameter of 1 to 5 mm. Further, the cooling area is rearward in the relative moving direction of the heating region of the laser beam 51, and is preferably formed in the vicinity of the rear end of the heating region.

雷射光束51之相對移動速度雖由雷射光束輸出值或照射面積、脆性材料基板50之厚度等適當決定即可,但通常為1~數百mm/sec之範圍較理想。The relative moving speed of the laser beam 51 may be appropriately determined depending on the laser beam output value, the irradiation area, the thickness of the brittle material substrate 50, and the like, but is preferably in the range of 1 to several hundreds of mm/sec.

本發明之割斷方法可用於玻璃基板或陶瓷基板、單結晶矽基板、藍寶石基板等以往公知之脆性材料基板之割斷,適合使用於例如液晶顯示器等面板製造領域。The cutting method of the present invention can be used for cutting a conventionally known brittle material substrate such as a glass substrate, a ceramic substrate, a single crystal germanium substrate, or a sapphire substrate, and is suitably used in the field of panel manufacturing such as liquid crystal displays.

在以上說明之割斷方法由於係以於玻璃基板1之端部少量形成之初期貫通龜裂32為起點藉由照射雷射光束使龜裂33進展,故可有效抑制玻璃屑或微裂痕等之產生。另外,在進一步抑制玻璃屑或微裂痕等之產生之場合,建議縮短以刀輪2形成之龜裂,以照射雷射光束形成做為初期龜裂必要之剩餘長度。於圖2顯示此種初期龜裂之形成方法。In the cutting method described above, since the cracks 33 are progressed by irradiating the laser beam with the initial through crack 32 formed at a small amount at the end portion of the glass substrate 1, the occurrence of glass swarf, microcracks, and the like can be effectively suppressed. . Further, in the case where the occurrence of glass swarf or microcracks or the like is further suppressed, it is recommended to shorten the crack formed by the cutter wheel 2 and irradiate the laser beam to form the remaining length necessary for the initial crack. A method of forming such an initial crack is shown in FIG.

於圖2(a-1)中,以刀輪2於玻璃基板1之表面10a之割斷開始端As形成龜裂31a。此龜裂31a只要是藉由雷射照射龜裂會進展之長度即可,例如可為點裂痕(數十μm)。藉此,可將因刀輪2之使用而產生之微裂痕或玻璃屑等抑制至最小限度。In Fig. 2 (a-1), a crack 31a is formed by the cutter wheel 2 at the cutting start end As of the surface 10a of the glass substrate 1. The crack 31a may be a length that progresses by irradiation of a laser by a laser, and may be, for example, a point crack (tens of μm). Thereby, micro-cracks or glass swarf due to the use of the cutter wheel 2 can be suppressed to a minimum.

其次,如同圖(a-2)所示,從龜裂31a沿割斷預定線11照射雷射光束51並從冷卻噴嘴60對雷射光束51照射區域之後端附近噴霧做為冷卻媒體之冷卻水61,使龜裂31a沿割斷預定線11進展,成為既定長度之初期龜裂31。由於此龜裂31a之進展係以與玻璃基板1非接觸之方式進行,故微裂痕或玻璃屑等不會產生。從於同圖(b)顯示之形成初期貫通龜裂32之步驟往後之步驟與於圖1顯示之割斷方法相同,故在此省略說明。另外,照射雷射光束導致之龜裂31a之進展機構與前述之以初期貫通龜裂32為起點之龜裂33之進展機構相同。Next, as shown in Fig. (a-2), the laser beam 51 is irradiated from the crack 31a along the planned cutting line 11 and the cooling water 61 is sprayed as a cooling medium near the end portion of the laser beam 51 irradiated from the cooling nozzle 60. The crack 31a progresses along the planned cutting line 11 and becomes an initial crack 31 of a predetermined length. Since the progress of the crack 31a is performed so as not to be in contact with the glass substrate 1, microcracks, glass swarf, or the like does not occur. The step from the step of forming the crack 32 in the initial stage of the formation shown in the same figure (b) is the same as the cutting method shown in Fig. 1, and therefore the description thereof will be omitted. Further, the progress mechanism of the crack 31a caused by the irradiation of the laser beam is the same as the progress mechanism of the crack 33 starting from the crack 32 at the beginning.

其次,針對將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷之方法說明。於圖3顯示將玻璃基板(第1脆性材料基板)7與玻璃基板(第2脆性材料基板)8以密封劑S貼合之積層基板P之玻璃基板7之一部分割斷之方法之步驟圖。如同圖(a)所示,先於玻璃基板7之表面端部使刀輪2壓接同時轉動以形成初期龜裂31。此初期龜裂31之長度及深度與前述實施型態相同。Next, a method of cutting one of the brittle material substrates which laminates two sheets of the brittle material substrate will be described. FIG. 3 is a view showing a step of a method of dividing one portion of the glass substrate 7 of the laminated substrate P in which the glass substrate (the first brittle material substrate) 7 and the glass substrate (the second brittle material substrate) 8 are bonded together with the sealant S. As shown in the figure (a), the cutter wheel 2 is pressed and rotated simultaneously to form the initial crack 31 before the surface end portion of the glass substrate 7. The length and depth of the initial crack 31 are the same as those of the previous embodiment.

其次,如同圖(b)所示,以折斷滾輪4將玻璃基板8之背面側之對向於初期龜裂31之部分往玻璃基板7之方向按壓。藉此,積層基板P彎曲為向上凸,初期龜裂31往玻璃基板7之厚度方向全體進展,成為初期貫通龜裂32。同時,初期貫通龜裂32之端面間之貼合、玻璃基板7之端部之割斷除去部分71與玻璃基板8間之貼合被消除,玻璃基板7之端部之割斷除去部分71之分離可容易進行。Next, as shown in (b), the portion of the back surface side of the glass substrate 8 facing the initial crack 31 is pressed by the breaking roller 4 in the direction of the glass substrate 7. As a result, the laminated substrate P is bent upward, and the initial crack 31 progresses toward the entire thickness direction of the glass substrate 7, and the initial penetration crack 32 is formed. At the same time, the bonding between the end faces of the cracks 32 at the initial stage, the peeling and removing portion 71 of the end portion of the glass substrate 7 and the glass substrate 8 are eliminated, and the separation of the cut portions 71 at the end portions of the glass substrate 7 can be eliminated. Easy to carry out.

其次,如同圖(c)所示,從玻璃基板7之初期貫通龜裂32沿割斷預定線11照射橢圓形狀之雷射光束51,並從冷卻噴嘴60對雷射光束51照射區域之後端附近噴霧做為冷卻媒體之冷卻水61,以初期貫通龜裂32為開始點,使涵蓋玻璃基板7之厚度方向全體之龜裂33進展。藉由使雷射光束51沿割斷預定線11移動,涵蓋玻璃基板7之厚度方向全體之龜裂33沿雷射光束51之移動方向連續進展,玻璃基板7被以割斷預定線11割斷。之後,如同圖(d)所示,割斷除去部分71被從積層基板P分離、除去。另外,在此實施形態中雖係固定積層基板P並使雷射光束51移動,但使積層基板P移動並固定雷射光束51或使積層基板P及雷射光束51雙方移動亦無妨。此外,即使不噴霧冷卻水61而以自然空冷雖亦可使以初期貫通龜裂32為起點之龜裂33進展,但噴霧冷卻水61強制冷卻之作法龜裂33迅速且確實進展,故較理想。Next, as shown in Fig. (c), the elliptical-shaped laser beam 51 is irradiated from the initial stage of the glass substrate 7 through the crack 32 along the planned cutting line 11, and the laser beam 51 is irradiated from the vicinity of the end portion of the laser beam 51. The cooling water 61 as the cooling medium starts from the initial penetration crack 32, and the crack 33 covering the entire thickness direction of the glass substrate 7 progresses. By moving the laser beam 51 along the cutting planned line 11, the crack 33 covering the entire thickness direction of the glass substrate 7 continuously progresses in the moving direction of the laser beam 51, and the glass substrate 7 is cut by the planned cutting line 11. Thereafter, as shown in (d), the cut-and-removed portion 71 is separated and removed from the build-up substrate P. Further, in this embodiment, the laminated substrate P is fixed and the laser beam 51 is moved. However, the laminated substrate P may be moved to fix the laser beam 51 or both the laminated substrate P and the laser beam 51 may be moved. In addition, even if the cooling water 61 is not sprayed, the crack 33 starting from the initial penetration crack 32 can be progressed by natural air cooling, but the spray cooling water 61 is forced to cool, and the crack 33 is rapidly and surely progressed, so it is preferable. .

此外,與前述實施型態同樣地,從進一步抑制由刀輪2導致之玻璃屑或微裂痕等之產生之觀點,縮短以刀輪2形成之龜裂,以照射雷射光束形成做為初期龜裂必要之剩餘長度亦無妨。Further, similarly to the above-described embodiment, from the viewpoint of further suppressing generation of glass swarf or microcracks caused by the cutter wheel 2, the crack formed by the cutter wheel 2 is shortened, and the laser beam is irradiated to form an initial turtle. It is no problem to split the remaining length.

此種積層基板之割斷方法可適用例如在液晶顯示面板之貼合2片玻璃基板且於其中一方之玻璃基板之內側面形成有端子電極之場合,切斷除去覆蓋該端子電極之部分使該端子電極露出之場合。For example, when the liquid crystal display panel is bonded to two glass substrates and the terminal electrodes are formed on the inner side surface of one of the glass substrates, the terminal covering the terminal electrode is cut and removed to make the terminal. Where the electrode is exposed.

[產業上之可利用性][Industrial availability]

本發明之脆性材料基板之割斷方法由於係使以刀具形成之初期龜裂成為於基板厚度方向貫通之龜裂,以雷射光束之照射使此初期貫通龜裂沿割斷預定線進展,故不招致裝置之大型化、複雜化便可將微裂痕或玻璃屑等之產生抑制至最小限度,甚為有用。In the method for cutting a brittle material substrate according to the present invention, since the initial crack formed by the cutter is a crack that penetrates in the thickness direction of the substrate, the initial through crack is progressed along the planned cutting line by the irradiation of the laser beam, so that the crack does not occur. It is useful to increase the size and complexity of the device to minimize the occurrence of micro-cracks or glass swarf.

此外,將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷之本發明之方法除上述效果外,還因在形成初期貫通龜裂之際按壓第2脆性材料基板之與前述初期龜裂對向之部分而初期貫通龜裂之端面間之貼合、玻璃基板之端部之割斷除去部分與玻璃基板間之貼合被消除,玻璃基板之割斷除去部分之分離較容易,甚為有用。Further, in addition to the above effects, the method of the present invention in which one of the laminated substrates to which the two brittle material substrates are bonded is cut, and the second brittle material substrate is pressed while the crack is formed at the initial stage of formation. The bonding between the end faces of the cracks in the initial crack portion and the end portions of the cracks in the initial stage, the bonding between the cut portions of the end portions of the glass substrate and the glass substrate is eliminated, and the separation of the cut portions of the glass substrate is relatively easy. Useful.

1...玻璃基板(脆性材料基板)1. . . Glass substrate (brittle material substrate)

2...刀輪(刀)2. . . Knife wheel (knife)

4...折斷滾輪4. . . Broken roller

7...玻璃基板(第1脆性材料基板)7. . . Glass substrate (first brittle material substrate)

8...玻璃基板(第2脆性材料基板)8. . . Glass substrate (second brittle material substrate)

P...積層基板P. . . Laminated substrate

11...割斷預定線11. . . Cut the planned line

31...初期龜裂31. . . Initial crack

32...初期貫通龜裂32. . . Initial through crack

33...龜裂33. . . Crack

51...雷射光束51. . . Laser beam

61...冷卻水61. . . Cooling water

圖1係顯示本發明之脆性材料基板之割斷方法之一例之步驟圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the steps of an example of a method for cutting a brittle material substrate of the present invention.

圖2係顯示初期龜裂之其他形成方法之步驟圖。Fig. 2 is a view showing the steps of another method of forming the initial crack.

圖3係顯示本發明之積層基板之割斷方法之一例之步驟圖。Fig. 3 is a view showing a step of an example of a method of cutting a laminated substrate of the present invention.

1...玻璃基板(脆性材料基板)1. . . Glass substrate (brittle material substrate)

2...刀輪(刀)2. . . Knife wheel (knife)

4...折斷滾輪4. . . Broken roller

10a...表面10a. . . surface

10b...背面10b. . . back

11...割斷預定線11. . . Cut the planned line

31...初期龜裂31. . . Initial crack

32...初期貫通龜裂32. . . Initial through crack

33...龜裂33. . . Crack

51...雷射光束51. . . Laser beam

As...割斷開始端As. . . Cut start

Claims (4)

一種脆性材料基板之割斷方法,係藉由照射雷射光束來割斷脆性材料基板,其特徵在於具有:於前述基板之一面之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;按壓前述基板之形成有前述初期龜裂之面之相反側面之與前述初期龜裂對向之部分,使前述初期龜裂往前述基板之厚度方向進展而形成到達前述相反側面之初期貫通龜裂之步驟;以及從前述初期貫通龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱前述基板,據此藉由於基板產生之熱應力使初期貫通龜裂沿前述割斷預定線進展之步驟。A method for cutting a brittle material substrate by cutting a laser beam by irradiating a laser beam, comprising: forming an initial crack by a cutter at a cutting start end of a cut line of one surface of the substrate; and pressing the foregoing Forming a portion of the substrate opposite to the initial crack on the opposite side surface of the surface of the initial crack, and stepping the initial crack toward the thickness direction of the substrate to form an initial through crack at the opposite side surface; And irradiating the laser beam relative to the predetermined breaking line along the predetermined cutting line, and simultaneously heating the substrate at a temperature at which the melting temperature is not full, whereby the initial through crack is cut along the aforementioned by the thermal stress generated by the substrate. The step of scheduling the progress of the line. 一種脆性材料基板之割斷方法,係藉由照射雷射光束來割斷脆性材料基板,其特徵在於具有:於前述基板之一面之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;從前述初期龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱前述基板,據此藉由於基板產生之熱應力使初期龜裂沿前述割斷預定線進展以形成初期進展龜裂之步驟;按壓前述基板之形成有前述初期進展龜裂之面之相反側面之與前述初期進展龜裂對向之部分,使前述初期進展龜裂往前述基板之厚度方向進展而形成到達前述相反側面之初期貫通龜裂之步驟;以及從前述初期進展龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱前述基板,據此藉由於基板產生之熱應力使初期進展龜裂沿前述割斷預定線進展之步驟。A cutting method for a brittle material substrate, wherein a brittle material substrate is cut by irradiating a laser beam, characterized in that: a step of forming an initial crack by a cutter at a cutting start end of a cut line of one surface of the substrate; The initial crack moves the laser beam relative to each other along the predetermined cutting line, and simultaneously heats the substrate at a temperature at which the melting temperature is not full, thereby causing the initial crack to progress along the predetermined cutting line by the thermal stress generated by the substrate. a step of initializing the crack; pressing the portion of the opposite side surface of the substrate on which the initial progress crack is formed and the portion of the initial progress crack, and forming the initial progress crack in the thickness direction of the substrate to form a step of passing through the crack at the initial stage of the opposite side surface; and irradiating the laser beam relative to the predetermined cutting line along the predetermined cutting line and simultaneously irradiating the substrate, and heating the substrate at a temperature at which the melting temperature is not full, thereby relying on the substrate The resulting thermal stress causes the initial progress crack to progress along the aforementioned cut-off line. 一種脆性材料基板之割斷方法,係將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷,其特徵在於具有:於第1脆性材料基板之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;按壓第2脆性材料基板之與前述初期龜裂對向之部分,使前述初期龜裂往第1脆性材料基板之厚度方向進展而形成到達第1脆性材料基板之相反側面之初期貫通龜裂之步驟;以及從前述初期貫通龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱第1脆性材料基板,據此藉由於第1脆性材料基板產生之熱應力使初期貫通龜裂沿前述割斷預定線進展之步驟。A method for cutting a brittle material substrate by cutting a brittle material substrate of one of the laminated substrates to which two brittle material substrates are bonded, and having a cutting tool at a cutting start end of a predetermined cutting line of the first brittle material substrate a step of forming an initial crack; pressing a portion of the second brittle material substrate opposite to the initial crack, and causing the initial crack to progress in a thickness direction of the first brittle material substrate to form an opposite side of the first brittle material substrate a step of penetrating the crack at the beginning of the first step; and irradiating the laser beam while moving along the predetermined cutting line along the predetermined cutting line, and simultaneously heating the first brittle material substrate at a temperature at which the melting temperature is not full, thereby The thermal stress generated by the brittle material substrate advances the initial through crack along the predetermined cut line. 一種脆性材料基板之割斷方法,係將2片脆性材料基板貼合之積層基板中一方之脆性材料基板加以割斷,其特徵在於具有:於第1脆性材料基板之割斷預定線之割斷開始端以刀具形成初期龜裂之步驟;從前述初期龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱第1脆性材料基板,據此藉由於第1脆性材料基板產生之熱應力使初期龜裂沿前述割斷預定線進展以形成初期進展龜裂之步驟;按壓第2脆性材料基板之與前述初期龜裂對向之部分,使前述初期龜裂往第1脆性材料基板之厚度方向進展而形成到達第1脆性材料基板之相反側面之初期貫通龜裂之步驟;以及從前述初期貫通龜裂沿前述割斷預定線使雷射光束相對移動並同時照射,以熔融溫度未滿之溫度加熱第1脆性材料基板,據此藉由於第1脆性材料基板產生之熱應力使初期貫通龜裂沿前述割斷預定線進展之步驟。A method for cutting a brittle material substrate by cutting a brittle material substrate of one of the laminated substrates to which two brittle material substrates are bonded, and having a cutting tool at a cutting start end of a predetermined cutting line of the first brittle material substrate a step of forming an initial crack; the laser beam is relatively moved from the initial crack along the predetermined line to be cut, and the first brittle material substrate is heated at a temperature at which the melting temperature is not full, thereby utilizing the first brittle material substrate The generated thermal stress causes the initial crack to progress along the predetermined cutting line to form an initial progress crack; and presses the portion of the second brittle material substrate opposite to the initial crack to cause the initial crack to the first brittle material a step of forming a crack in the thickness direction of the substrate to form an initial through crack on the opposite side surface of the first brittle material substrate; and irradiating the laser beam while moving along the predetermined cut line from the initial through crack, so that the melting temperature is not Heating the first brittle material substrate at a full temperature, whereby the initial stress is caused by the thermal stress generated by the first brittle material substrate Progress through the cracking step along the line of cut.
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