JP5627201B2 - Cleaving method of brittle material substrate - Google Patents

Cleaving method of brittle material substrate Download PDF

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JP5627201B2
JP5627201B2 JP2009144662A JP2009144662A JP5627201B2 JP 5627201 B2 JP5627201 B2 JP 5627201B2 JP 2009144662 A JP2009144662 A JP 2009144662A JP 2009144662 A JP2009144662 A JP 2009144662A JP 5627201 B2 JP5627201 B2 JP 5627201B2
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crack
initial
substrate
brittle material
material substrate
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JP2011000605A (en
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淳史 井村
淳史 井村
義隆 塚田
義隆 塚田
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Mitsuboshi Diamond Industrial Co Ltd
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Priority to KR1020100056381A priority patent/KR101223490B1/en
Priority to CN201010210773.4A priority patent/CN101927402B/en
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222Scoring using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033Apparatus for opening score lines in glass sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/02Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/03Glass cutting tables; Apparatus for transporting or handling sheet glass during the cutting or breaking operations
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/08Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00Severing cooled glass
    • C03B33/09Severing cooled glass by thermal shock
    • C03B33/091Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Description

本発明は、ガラス基板やセラミック基板等の脆性材料基板をレーザビーム照射によって割断する方法に関するものである。   The present invention relates to a method of cleaving a brittle material substrate such as a glass substrate or a ceramic substrate by laser beam irradiation.

従来、ガラス基板やセラミック基板等の脆性材料基板の割断方法としては、脆性材料基板の表面にカッターホイール等を圧接させながら転動させて、脆性材料基板の表面に対して略垂直方向のクラック(以下、「垂直クラック」という)を形成し、次いで、基板に対して垂直方向に機械的な押圧力を加えて、垂直クラックを基板厚み方向に進展させて基板を割断する方法が広く行われていた。   Conventionally, as a method for cleaving a brittle material substrate such as a glass substrate or a ceramic substrate, the surface of the brittle material substrate is rolled while pressing a cutter wheel or the like, and cracks in a direction substantially perpendicular to the surface of the brittle material substrate ( (Hereinafter referred to as “vertical cracks”), and then a mechanical pressing force is applied to the substrate in the vertical direction so that the vertical crack propagates in the thickness direction of the substrate to cleave the substrate. It was.

しかし、通常、カッターホイールを用いて脆性材料基板の垂直クラックを形成した場合、カレットと呼ばれる小破片が発生し、このカレットによって脆性材料基板の表面にキズがつくことがあった。また、割断後の脆性材料基板の端部にはマイクロクラックが生じやすく、このマイクロクラックを起因として脆性材料基板の割れが発生することがあった。このため、通常は割断後に、脆性材料基板の端部を研磨・洗浄してマイクロクラックやカレット等を除去していた。   However, usually, when a vertical crack of a brittle material substrate is formed using a cutter wheel, small fragments called cullet are generated, and the cullet sometimes scratches the surface of the brittle material substrate. In addition, microcracks are easily generated at the edge of the brittle material substrate after cleaving, and the brittle material substrate may be cracked due to the microcracks. For this reason, usually, after cleaving, the edge of the brittle material substrate is polished and washed to remove microcracks, cullet and the like.

一方、近年、COレーザビームを用いて溶融温度未満で脆性材料基板を加熱し、これにより脆性材料基板に生じた熱応力によって局所的に引張応力を発生させて垂直クラックを形成する方法が近年種々検討・開発されている。このレーザビームを用いる割断方法は非接触加工であるため、上記したカレットやマイクロクラック等の潜在的欠陥の発生が抑えられる。ただ、このレーザビームを用いる割断方法でも、垂直クラックは基板の厚み方向の全体には至らず、通常は表面部に止まるため、外力を加えて垂直クラックを基板厚み方向に進展させることは依然として必要であった。このため、垂直クラックの端面同士が押圧されてマイクロクラックやカレット等の生じるおそれあった。 On the other hand, in recent years, a method in which a brittle material substrate is heated below the melting temperature using a CO 2 laser beam and thereby a tensile stress is locally generated by the thermal stress generated in the brittle material substrate to form a vertical crack has recently been developed. Various studies and developments have been made. Since the cleaving method using this laser beam is non-contact processing, the occurrence of potential defects such as cullet and microcracks can be suppressed. However, even with this cleaving method using a laser beam, the vertical crack does not reach the entire thickness direction of the substrate and normally stops at the surface portion, so it is still necessary to apply the external force to propagate the vertical crack in the thickness direction of the substrate. Met. For this reason, the end faces of the vertical cracks may be pressed to cause microcracks, cullet, and the like.

そこで、例えば特許文献1では、ガラス基板の側面に初期亀裂を形成し、割断予定線を線状ヒータで予め加熱し、進展する亀裂の先端周辺をエアノズルなどの冷却機構で部分冷却することによって亀裂を更に進展させる技術が提案されている。   Therefore, in Patent Document 1, for example, an initial crack is formed on the side surface of the glass substrate, the cleavage line is preheated with a linear heater, and the crack is cracked by partially cooling the periphery of the progressing crack with a cooling mechanism such as an air nozzle. A technology to further advance the process has been proposed.

また特許文献2では、少なくとも2点にレーザビームを同時に照射して初期亀裂を形成した後、割断予定線に沿って移動させることによって初期亀裂を割断予定線の方向に進展させて脆性材料基板を割断する方法が提案されている。   In Patent Document 2, after forming an initial crack by simultaneously irradiating at least two points with a laser beam, the brittle material substrate is formed by moving the initial crack in the direction of the planned cutting line by moving along the planned cutting line. A method of cleaving has been proposed.

特開2000-281375号公報JP 2000-281375 A 特開平7-328781号公報Japanese Unexamined Patent Publication No. 7-328781

しかしながら、特許文献1の提案技術では、ガラス基板の側面に初期亀裂を形成するので、割断予定線の方向(基板側面から見て深さ方向)に所定長さ(深さ)の初期亀裂を形成するのは難しい。また、割断面を開く方向に割断予定線の終端部に力を加えた状態で固定支持する機構や、進展する亀裂位置を検出するセンサを移動させる機構などを実質的に必要とし、割断作業の準備作業に手間がかかると共に装置が大型化する。さらに、割断予定線に沿って配置するヒータ線で割断予定線の全線を加熱するので、部分加熱の場合に比べて電力消費量が多くなる。   However, in the proposed technique of Patent Document 1, since an initial crack is formed on the side surface of the glass substrate, an initial crack having a predetermined length (depth) is formed in the direction of the planned cutting line (the depth direction when viewed from the substrate side surface). Difficult to do. In addition, a mechanism for fixing and supporting a force at the terminal part of the planned cutting line in the direction to open the split section and a mechanism for moving a sensor for detecting the progressing crack position, etc. are substantially required. The preparation work takes time and the apparatus becomes large. Further, since all the lines of the planned cutting line are heated by the heater wires arranged along the planned cutting line, the power consumption is increased as compared with the case of partial heating.

また、特許文献2の提案技術では、レーザ発振器を複数必要とすると共に、光軸変更手段を必要とし、装置が複雑化・大型化するおそれがある。また、複数のレーザビーム照射で初期亀裂を形成する場合、レーザ出力や照射位置などの調整が難しく、初期亀裂の形成位置の精度が上がらないおそれがある。   In addition, the proposed technique of Patent Document 2 requires a plurality of laser oscillators and an optical axis changing unit, which may increase the complexity and size of the apparatus. Further, when an initial crack is formed by irradiation with a plurality of laser beams, it is difficult to adjust the laser output, the irradiation position, and the like, and the accuracy of the initial crack formation position may not be improved.

本発明は、このような従来の問題に鑑みてなされたものであり、その目的とするところは、装置の大型化・複雑化を招くことなく、マイクロクラックやカレット等の発生を最小限に抑えながら、脆性材料基板を割断する方法を提供することにある。   The present invention has been made in view of such conventional problems, and the object of the present invention is to minimize the occurrence of microcracks, cullet, and the like without increasing the size and complexity of the apparatus. However, the object is to provide a method of cleaving a brittle material substrate.

また本発明の目的は、貼り合わされた積層基板の一方の基板を割断する方法であって、割断された基板部分を簡単に分離・除去できる方法を提供することにある。   Another object of the present invention is to provide a method of cleaving one substrate of a laminated substrate that has been bonded, in which the cleaved substrate portion can be easily separated and removed.

前記目的を達成する第1の発明に係る脆性材料基板の割断方法は、脆性材料基板をレーザビーム照射することによって割断する方法であって、前記基板の一方面の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、前記基板の前記初期亀裂を形成した面と反対側面の、前記初期亀裂と対向する部分を押圧し、前記初期亀裂を前記基板の厚み方向に進展させて前記反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、前記基板を溶融温度未満で加熱し、これにより前記基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする。   A brittle material substrate cleaving method according to a first invention that achieves the above object is a method of cleaving a brittle material substrate by irradiating it with a laser beam, the cleaving start end of a cleaved planned line on one surface of the substrate. A step of forming an initial crack with a cutter, and pressing a portion of the substrate opposite to the surface on which the initial crack is formed, facing the initial crack, and causing the initial crack to propagate in the thickness direction of the substrate. The step of forming an initial through crack reaching the opposite side surface and irradiating a laser beam from the initial through crack while moving relatively along the planned cutting line, and heating the substrate below the melting temperature, thereby the substrate And a step of causing the initial through crack to propagate along the planned cutting line due to the thermal stress generated in the step.

また第2の発明に係る割断方法は、脆性材料基板をレーザビーム照射することによって割断する方法であって、前記基板の一方面の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、前記初期亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、前記基板を溶融温度未満で加熱し、これにより前記基板に生じた熱応力によって、初期亀裂を前記割断予定線に沿って進展させて初期進展亀裂を形成する工程と、前記基板の前記初期進展亀裂を形成した面と反対側面の、前記初期進展亀裂と対向する部分を押圧し、前記初期進展亀裂を前記基板の厚み方向に進展させて前記反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、前記基板を溶融温度未満で加熱し、これにより前記基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする。 The cleaving method according to the second invention is a method of cleaving a brittle material substrate by irradiating it with a laser beam, and forming an initial crack with a cutter at a cleaving start end of a cleaving line on one side of the substrate. Irradiating a laser beam relative to the initial crack from the initial crack while moving relative to the initial crack to heat the substrate at a temperature lower than the melting temperature, thereby causing the initial crack to be caused by the thermal stress generated in the substrate. A step of forming along the planned cutting line to form an initial progress crack, and pressing a portion of the substrate opposite to the surface on which the initial progress crack is formed, facing the initial progress crack, and the initial progress crack. a step of initial penetration crack leading to the opposite side by progress in the thickness direction of the substrate, irradiation while relatively moving the laser beam from the initial through-crack along the expected splitting line To, heating the substrate at below the melting temperature, thereby the thermal stress generated in the substrate, and having a step to advance along the initial penetrating cracks the expected splitting line.

第3の発明に係る割断方法は、2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する方法であって、第1脆性材料基板の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、第2脆性材料基板の、前記初期亀裂と対向する部分を押圧し、前記初期亀裂を第1脆性材料基板の厚み方向に進展させて第1脆性材料基板の反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、第1脆性材料基板を溶融温度未満で加熱し、これにより第1脆性材料基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする。 A cleaving method according to a third aspect of the present invention is a method of cleaving one brittle material substrate of a laminated substrate in which two brittle material substrates are bonded together, and starting cleaving of a cleaved planned line of the first brittle material substrate forming an initial crack with a cutter on the end of the second brittle material substrate, the initial crack with a portion facing the pressing, the initial crack first brittle material by progress in the thickness direction of the first brittle material substrate An initial through-crack reaching the opposite side of the substrate, and irradiating while moving the laser beam along the planned cutting line from the initial through-crack to heat the first brittle material substrate below the melting temperature, And a step of causing the initial through crack to propagate along the planned cutting line due to the thermal stress generated in the first brittle material substrate.

第4の発明に係る割断方法は、2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する方法であって、第1脆性材料基板の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、前記初期亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、第1脆性材料基板を溶融温度未満で加熱し、これにより第1脆性材料基板に生じた熱応力によって、前記初期亀裂を前記割断予定線に沿って進展させて初期進展亀裂を形成する工程と、第2脆性材料基板の、前記初期進展亀裂と対向する部分を押圧し、前記初期進展亀裂を第1脆性材料基板の厚み方向に進展させて第1脆性材料基板の反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、第1脆性材料基板を溶融温度未満で加熱し、これにより第1脆性材料基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする。   A cleaving method according to a fourth aspect of the present invention is a method of cleaving one brittle material substrate of a laminated substrate in which two brittle material substrates are bonded, and starting cleaving of a cleaved planned line of the first brittle material substrate. A step of forming an initial crack with a cutter at the end, and irradiation with a laser beam being relatively moved from the initial crack along the planned cutting line to heat the first brittle material substrate below the melting temperature, thereby A step of causing the initial crack to propagate along the planned cutting line by a thermal stress generated in the first brittle material substrate; and a portion of the second brittle material substrate facing the initial progress crack. Pressing the initial progress crack in the thickness direction of the first brittle material substrate to form an initial through crack reaching the opposite side surface of the first brittle material substrate, and along the planned cutting line from the initial through crack Laser Bee The first brittle material substrate is heated at a temperature lower than the melting temperature, and the initial through-crack propagates along the planned cutting line due to the thermal stress generated in the first brittle material substrate. It is characterized by having.

本発明の脆性材料基板の割断方法では、初期亀裂を基板厚み方向に貫通した亀裂とし、この初期貫通亀裂を、レーザビームの照射によって割断予定線に沿って進展させるので、装置の大型化・複雑化を招くことなく、マイクロクラックやカレット等の発生を最小限に抑えることができるようになる。   In the cleaving method for a brittle material substrate according to the present invention, the initial crack is a crack penetrating in the thickness direction of the substrate, and this initial through crack is propagated along the planned cutting line by laser beam irradiation. It is possible to minimize the occurrence of microcracks, cullet, etc. without incurring the increase in the size.

また、2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する本発明の方法では、上記効果に加えてさらに、初期貫通亀裂を形成する際に、第2脆性材料基板の、前記初期亀裂と対向する部分を押圧することにより、第1脆性材料基板及び第2脆性材料基板が撓み、初期貫通亀裂の端面同士の貼り付き及び第1脆性材料基板の端部の割断除去部分と第2脆性材料基板との貼り付きが解消されやすくなる。   Further, in the method of the present invention for cleaving one brittle material substrate of a laminated substrate obtained by bonding two brittle material substrates, in addition to the above effects, the second brittle material is formed when an initial through crack is formed. By pressing a portion of the substrate facing the initial crack, the first brittle material substrate and the second brittle material substrate are bent, the end faces of the initial through crack are adhered to each other, and the end portion of the first brittle material substrate is cleaved. The sticking between the removed portion and the second brittle material substrate is easily eliminated.

そしてまた、カッターによって形成する初期亀裂を僅かなものとし、レーザビーム照射によって当該初期亀裂を所定長さまで進展させる方法によれば、マイクロクラックやカレットの発生を一層抑えることができるようになる。   In addition, according to the method in which the initial crack formed by the cutter is made slight and the initial crack is propagated to a predetermined length by laser beam irradiation, generation of microcracks and cullet can be further suppressed.

本発明に係る脆性材料基板の割断方法の一例を示す工程図である。It is process drawing which shows an example of the cutting method of the brittle material board | substrate which concerns on this invention. 初期亀裂の他の形成方法を示す工程図である。It is process drawing which shows the other formation method of an initial stage crack. 本発明に係る積層基板の割断方法の一例を示す工程図である。It is process drawing which shows an example of the cutting method of the laminated substrate which concerns on this invention.

以下、本発明に係る脆性材料基板の割断方法についてより詳細に説明するが、本発明はこれらの実施形態に何ら限定されるものではない。   Hereinafter, although the cutting method of the brittle material substrate according to the present invention will be described in more detail, the present invention is not limited to these embodiments.

図1に、本発明に係る脆性材料基板の割断方法の一実施形態を示す工程図を示す。図1は、脆性材料基板としてのガラス基板1を割断予定線11で割断する場合の工程図である。同図(a)に示すように、まず、ガラス基板1の表面10aの割断開始端Asにカッタホイール2で初期亀裂31を形成する。この初期亀裂31の長さ及び深さに特に限定はないが、通常は、初期亀裂31の長さは1〜30mmの範囲が好ましく、より好ましくは数mmの範囲である。また、初期亀裂31の深さは基板厚さの10%以上が好ましい。   FIG. 1 is a process diagram showing an embodiment of a brittle material substrate cleaving method according to the present invention. FIG. 1 is a process diagram in the case where the glass substrate 1 as a brittle material substrate is cleaved by a cleaving planned line 11. As shown in FIG. 1A, first, an initial crack 31 is formed by the cutter wheel 2 at the cleaving start end As of the surface 10 a of the glass substrate 1. The length and depth of the initial crack 31 are not particularly limited, but usually, the length of the initial crack 31 is preferably in the range of 1 to 30 mm, more preferably in the range of several mm. The depth of the initial crack 31 is preferably 10% or more of the substrate thickness.

次に、同図(b)に示すように、ガラス基板1の裏面10bの、初期亀裂31に対向する部分を、ブレークローラー4によって表面10a方向に押圧する。これによって、初期亀裂31は、ガラス基板1の厚み方向に進展し、裏面10bに達する初期貫通亀裂32となる。   Next, as shown in FIG. 2B, the part facing the initial crack 31 on the back surface 10 b of the glass substrate 1 is pressed by the break roller 4 in the direction of the front surface 10 a. Thereby, the initial crack 31 becomes the initial penetration crack 32 which progresses in the thickness direction of the glass substrate 1 and reaches the back surface 10b.

次いで、同図(c)に示すように、ガラス基板1の初期貫通亀裂32から割断予定線11に沿って、楕円形状のレーザビーム51を照射すると共に、レーザビーム照射領域の後端近傍に冷却媒体としての冷却水61を冷却ノズル60から噴霧する。レーザビーム51をガラス基板1に照射することによって、ガラス基板1は厚み方向に溶融温度未満で加熱され、ガラス基板1は熱膨張しようとするが、局所加熱のため膨張できず照射点を中心に圧縮応力が発生する。そして加熱直後に、ガラス基板1の表面に冷却水61が噴霧され冷却されることによって、今度は引っ張り応力が発生する。この引っ張り応力の作用によって、初期貫通亀裂32を開始点として、ガラス基板1の厚み方向全体にわたる亀裂が進展する。そして、レーザビーム51を割断予定線11に沿って移動させることにより、基板厚み方向全体にわたる亀裂33はレーザビーム51の移動方向に沿って連続して進展し、ガラス基板1は割断予定線11で割断される。なお、この実施形態では、ガラス基板1を固定し、レーザビーム51を移動させているが、ガラス基板1を移動させ、レーザビーム51を固定する、あるいはガラス基板1及びレーザビーム51の双方を移動させてももちろん構わない。また、冷却水61を噴霧することなく自然空冷によっても、初期貫通亀裂32を起点とした亀裂33を進展させることはできるが、冷却水61を噴霧して強制的に冷却する方が亀裂33が迅速且つ確実に進展されるので望ましい。   Next, as shown in FIG. 5C, the laser beam 51 having an elliptical shape is irradiated from the initial through-crack 32 of the glass substrate 1 along the planned cutting line 11 and cooled near the rear end of the laser beam irradiation region. Cooling water 61 as a medium is sprayed from the cooling nozzle 60. By irradiating the glass substrate 1 with the laser beam 51, the glass substrate 1 is heated below the melting temperature in the thickness direction, and the glass substrate 1 tries to thermally expand, but cannot expand due to local heating, and the irradiation point is the center. Compressive stress is generated. Then, immediately after the heating, the cooling water 61 is sprayed on the surface of the glass substrate 1 and cooled, whereby a tensile stress is generated. Due to the action of the tensile stress, the crack throughout the thickness direction of the glass substrate 1 starts from the initial through crack 32 as a starting point. Then, by moving the laser beam 51 along the planned cutting line 11, the crack 33 throughout the thickness direction of the substrate continuously develops along the moving direction of the laser beam 51, and the glass substrate 1 is cut along the planned cutting line 11. It is cleaved. In this embodiment, the glass substrate 1 is fixed and the laser beam 51 is moved. However, the glass substrate 1 is moved and the laser beam 51 is fixed, or both the glass substrate 1 and the laser beam 51 are moved. Of course you don't mind. The crack 33 starting from the initial through-crack 32 can be developed by natural air cooling without spraying the cooling water 61, but the crack 33 is more forcibly cooled by spraying the cooling water 61. This is desirable because it can be quickly and reliably developed.

ここで使用するレーザビーム51としては特に限定はなく、基板の材質や厚みなどから適宜決定すればよい。脆性材料基板がガラス基板の場合には、基板表面での吸収が大きいことから波長9〜11μmのレーザビームが好ましい。このようなレーザビームとしてはCOレーザが挙げられる。レーザビーム51のガラス基板1への照射形状としては、レーザビーム51の相対移動方向に長い楕円形状が好ましく、長径は10〜60mmの範囲、短径は1〜5mmの範囲が好適である。 The laser beam 51 used here is not particularly limited, and may be determined as appropriate based on the material and thickness of the substrate. When the brittle material substrate is a glass substrate, a laser beam with a wavelength of 9 to 11 μm is preferable because of the large absorption on the substrate surface. An example of such a laser beam is a CO 2 laser. The irradiation shape of the laser beam 51 onto the glass substrate 1 is preferably an elliptical shape that is long in the relative movement direction of the laser beam 51.

冷却ノズル60から噴出させる水としては蒸留水が好ましい。ただし、割断後の脆性材料基板を使用する上で悪影響を与えない範囲において、界面活性剤等の添加剤を水に添加しても構わない。冷却水量としては通常は1〜2ml/minの範囲である。水によるガラス基板1の冷却は、レーザービーム41によって加熱されたガラス基板1を急冷する観点からは、気体(通常は空気)と共に水を噴射させるいわゆるウォータジェット方式が望ましい。冷却水による冷却領域は、直径1〜5mm程度の円形状又は楕円形状であることが好ましい。また、冷却領域は、レーザビーム51による加熱領域の相対移動方向後方であって、加熱域の後端付近に形成するのが好ましい。   Distilled water is preferable as the water ejected from the cooling nozzle 60. However, an additive such as a surfactant may be added to water within a range that does not adversely affect the use of the brittle material substrate after cleaving. The amount of cooling water is usually in the range of 1 to 2 ml / min. The cooling of the glass substrate 1 with water is preferably a so-called water jet method in which water is injected together with gas (usually air) from the viewpoint of rapidly cooling the glass substrate 1 heated by the laser beam 41. The cooling region with cooling water is preferably circular or elliptical with a diameter of about 1 to 5 mm. The cooling region is preferably formed behind the heating region in the relative movement direction by the laser beam 51 and in the vicinity of the rear end of the heating region.

レーザビーム51の相対的移動速度は、レーザビーム出力値や照射面積、脆性材料基板1の厚み等から適宜決定すればよいが、通常は、1〜数百mm/secの範囲が好ましい。   The relative moving speed of the laser beam 51 may be determined as appropriate based on the laser beam output value, the irradiation area, the thickness of the brittle material substrate 1, etc., but is usually preferably in the range of 1 to several hundred mm / sec.

本発明の割断方法は、前述のガラス基板の他、セラミックス基板や単結晶シリコン基板、サファイヤ基板など従来公知の脆性材料基板の割断に用いることができ、例えば液晶ディスプレイ等のパネル製造分野などで好適に使用できる。   The cleaving method of the present invention can be used for cleaving conventionally known brittle material substrates such as ceramic substrates, single crystal silicon substrates, and sapphire substrates in addition to the glass substrate described above, and is suitable for the panel manufacturing field such as a liquid crystal display. Can be used for

以上説明した割断方法では、ガラス基板1の端部に僅かに形成した初期貫通亀裂32を起点としてレーザビーム照射によって亀裂33を進展させるので、カレットやマイクロクラック等の発生を効果的に抑えることができる。さらに、カレットやマイクロクラック等の発生を一層抑える場合には、カッタホイール2で形成する亀裂を短く抑え、初期亀裂として必要な残りの長さをレーザビーム照射で形成することが推奨される。このような初期亀裂の形成方法を図2に示す。   In the cleaving method described above, since the crack 33 is propagated by laser beam irradiation starting from the initial through crack 32 slightly formed at the end of the glass substrate 1, it is possible to effectively suppress the occurrence of cullet and microcracks. it can. Further, in order to further suppress the occurrence of cullet, microcracks, etc., it is recommended to suppress the cracks formed by the cutter wheel 2 and to form the remaining length necessary for the initial cracks by laser beam irradiation. Such an initial crack formation method is shown in FIG.

図2(a−1)において、カッタホイール2によって、ガラス基板1の表面10aの割断開始端Asに亀裂31aを形成する。この亀裂31aは、レーザビーム照射によって亀裂が進展する長さであればよく、例えばポイントクラック(数十μm)であってもよい。これにより、カッタホイール2の使用で発生するカレットやマイクロクラック等を最小限に抑えられる。   In FIG. 2 (a-1), the cutter wheel 2 forms a crack 31 a at the cleaving start end As of the surface 10 a of the glass substrate 1. The crack 31a has only to have a length that allows the crack to develop by laser beam irradiation, and may be a point crack (several tens of μm), for example. Thereby, the cullet, micro crack, etc. which generate | occur | produce by use of the cutter wheel 2 can be suppressed to the minimum.

次いで、同図(a−2)に示すように、亀裂31aから割断予定線11に沿って、レーザビーム51を照射すると共に、レーザビーム照射領域の後端近傍に冷却水61を冷却ノズル60から噴霧し、亀裂31aを割断予定線11に沿って進展させて、所定長さの初期亀裂31にする。この亀裂31aの進展は、ガラス基板1と非接触で行うので、カレットやマイクロクラック等は発生しない。同図(b)に示す初期貫通亀裂32を形成する工程から後の工程は、図1に示した割断方法と同様であるので、ここでは説明を略する。なお、レーザビーム照射による亀裂31aの進展機構は、前述の初期貫通亀裂32を起点とした亀裂33の進展機構と同様である。   Next, as shown in FIG. 4A-2, the laser beam 51 is irradiated along the planned cutting line 11 from the crack 31a, and the cooling water 61 is supplied from the cooling nozzle 60 near the rear end of the laser beam irradiation region. It sprays and the crack 31a is extended along the cutting projected line 11, and it is set as the initial stage crack 31 of predetermined length. Since the progress of the crack 31a is performed in a non-contact manner with the glass substrate 1, no cullet or microcrack is generated. Since the process after the process of forming the initial through crack 32 shown in FIG. 4B is the same as the cleaving method shown in FIG. 1, the description thereof is omitted here. The propagation mechanism of the crack 31a by laser beam irradiation is the same as the propagation mechanism of the crack 33 starting from the initial through crack 32 described above.

次に、2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する方法について説明する。図3に、ガラス基板(第1脆性材料基板)7とガラス基板(第2脆性材料基板)8がシール剤Sによって張り合わされた積層基板Pの、ガラス基板7の一部を割断する方法の工程図を示す。同図(a)に示すように、まず、ガラス基板7の表面端部に、カッタホイール2を圧接させながら転動させて初期亀裂31を形成する。この初期亀裂31の長さ及び深さについては前記実施形態の場合と同様である。   Next, a method for cleaving one brittle material substrate of a laminated substrate obtained by bonding two brittle material substrates together will be described. FIG. 3 shows a method of cleaving a part of the glass substrate 7 of the laminated substrate P in which the glass substrate (first brittle material substrate) 7 and the glass substrate (second brittle material substrate) 8 are bonded together by the sealant S. The figure is shown. As shown in FIG. 1A, first, an initial crack 31 is formed by rolling the cutter wheel 2 on the surface end of the glass substrate 7 while being pressed. The length and depth of the initial crack 31 are the same as those in the above embodiment.

次いで、同図(b)に示すように、ガラス基板8の裏面側の、初期亀裂31に対向する部分を、ブレークローラー4によってガラス基板7の方向に押圧する。これによって、積層基板Pが上に凸となるように撓み、初期亀裂31は、ガラス基板7の厚み方向全体に進展して初期貫通亀裂32となる。また同時に、初期貫通亀裂32の端面同士の貼り付き及びガラス基板7の端部の割断除去部分71とガラス基板8との貼り付きが解消され、ガラス基板7の割断除去部分71の分離が容易に行えるようになる。   Next, as shown in FIG. 2B, the part facing the initial crack 31 on the back surface side of the glass substrate 8 is pressed toward the glass substrate 7 by the break roller 4. As a result, the laminated substrate P is bent so as to be convex upward, and the initial crack 31 propagates in the entire thickness direction of the glass substrate 7 to become an initial through crack 32. At the same time, the sticking between the end faces of the initial through crack 32 and the sticking between the cleaving removal portion 71 and the glass substrate 8 at the end of the glass substrate 7 are eliminated, and the cleaving removal portion 71 of the glass substrate 7 is easily separated. You can do it.

次いで、同図(c)に示すように、ガラス基板7の初期貫通亀裂32から割断予定線11に沿って、楕円形状のレーザビーム51を照射すると共に、レーザビーム照射領域の後端近傍に冷却媒体としての冷却水61を冷却ノズル60から噴霧して、初期貫通亀裂32を開始点として、ガラス基板7の厚み方向全体にわたる亀裂33を進展させる。レーザビーム51を割断予定線11に沿って移動させることにより、ガラス基板7の厚み方向全体にわたる亀裂33はレーザビーム51の移動方向に沿って連続して進展し、ガラス基板7は割断予定線11で割断される。そして、同図(d)に示すように、割断除去部分71は積層基板Pから分離・除去される。なお、この実施形態では、積層基板Pを固定し、レーザビーム51を移動させているが、積層基板Pを移動させ、レーザビーム51を固定する、あるいは積層基板P及びレーザビーム51の双方を移動させてももちろん構わない。また、冷却水61を噴霧することなく自然空冷によっても、初期貫通亀裂32を起点とした亀裂33を進展させることはできるが、冷却水61を噴霧して強制的に冷却する方が亀裂33が迅速且つ確実に進展されるので望ましい。   Next, as shown in FIG. 5C, the laser beam 51 having an elliptical shape is irradiated from the initial through-crack 32 of the glass substrate 7 along the planned cutting line 11 and cooled near the rear end of the laser beam irradiation region. Cooling water 61 as a medium is sprayed from the cooling nozzle 60, and the crack 33 extending in the entire thickness direction of the glass substrate 7 starts from the initial through crack 32. By moving the laser beam 51 along the planned cutting line 11, the crack 33 throughout the thickness direction of the glass substrate 7 continuously develops along the moving direction of the laser beam 51, and the glass substrate 7 moves along the planned cutting line 11. Cleaved at. Then, as shown in FIG. 4D, the cleaving removal portion 71 is separated and removed from the laminated substrate P. In this embodiment, the laminated substrate P is fixed and the laser beam 51 is moved. However, the laminated substrate P is moved and the laser beam 51 is fixed, or both the laminated substrate P and the laser beam 51 are moved. Of course you don't mind. The crack 33 starting from the initial through-crack 32 can be developed by natural air cooling without spraying the cooling water 61, but the crack 33 is more forcibly cooled by spraying the cooling water 61. This is desirable because it can be quickly and reliably developed.

また、前記実施形態と同様に、カッターホイール2によるカレットやマイクロクラック等の発生を一層抑える観点から、カッタホイール2で形成する亀裂を短く抑え、初期亀裂として必要な残りの長さをレーザビーム照射で形成しても構わない。   Further, similarly to the above embodiment, from the viewpoint of further suppressing the occurrence of cullet, microcracks, and the like by the cutter wheel 2, the cracks formed by the cutter wheel 2 are suppressed to a short length, and the remaining length necessary for the initial crack is irradiated with the laser beam. You may form by.

このような積層基板の割断方法は、例えば、液晶表示パネルの、2枚のガラス基板が貼り合わされ、その一方のガラス基板の内側面に端子電極が形成されている場合に、当該端子電極を覆っている部分を切断除去して、当該端子電極を露出させる場合などに好適に用いられる。   Such a method for cleaving a laminated substrate covers, for example, when two glass substrates of a liquid crystal display panel are bonded and a terminal electrode is formed on the inner surface of one of the glass substrates. This is preferably used when the terminal electrode is exposed by cutting and removing the exposed portion.

本発明の脆性材料基板の割断方法は、カッターで形成した初期亀裂を基板厚み方向に貫通した亀裂とし、この初期貫通亀裂を、レーザビームの照射によって割断予定線に沿って進展させるので、装置の大型化・複雑化を招くことなく、マイクロクラックやカレット等の発生を最小限に抑えることができ有用である。   In the method of cleaving the brittle material substrate of the present invention, the initial crack formed by the cutter is a crack penetrating in the thickness direction of the substrate, and this initial through crack is propagated along the planned cutting line by laser beam irradiation. This is useful because it can minimize the generation of microcracks and cullet without increasing the size and complexity.

また、2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する本発明の方法は、上記効果に加えてさらに、初期貫通亀裂を形成する際に、第2脆性材料基板の、前記初期亀裂と対向する部分を押圧することにより、初期貫通亀裂の端面同士の貼り付き及びガラス基板の端部の割断除去部分とガラス基板との貼り付きが解消され、ガラス基板の割断除去部分の分離が容易になり有用である。   In addition to the above effect, the method of the present invention for cleaving one brittle material substrate of a laminated substrate obtained by laminating two brittle material substrates further includes the second brittle material when forming an initial through crack. By pressing the part of the substrate that faces the initial crack, the sticking between the end faces of the initial through crack and the sticking of the glass substrate with the cleaving removal part of the edge of the glass substrate is eliminated, and the glass substrate is cleaved. Separation of the removed portion is facilitated and useful.

1 ガラス基板(脆性材料基板)
2 カッタホイール(カッタ)
4 ブレークローラー
7 ガラス基板(第1脆性材料基板)
8 ガラス基板(第2脆性材料基板)
P 積層基板
11 割断予定線
31 初期亀裂
32 初期貫通亀裂
33 亀裂
51 レーザビーム
61 冷却水
1 Glass substrate (brittle material substrate)
2 Cutter wheel (cutter)
4 Break roller 7 Glass substrate (first brittle material substrate)
8 Glass substrate (second brittle material substrate)
P Laminated substrate 11 Cut line 31 Initial crack 32 Initial through crack 33 Crack 51 Laser beam 61 Cooling water

Claims (4)

脆性材料基板をレーザビーム照射することによって割断する方法であって、
前記基板の一方面の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、前記基板の前記初期亀裂を形成した面と反対側面の、前記初期亀裂と対向する部分を押圧し、前記初期亀裂を前記基板の厚み方向に進展させて前記反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、前記基板を溶融温度未満で加熱し、これにより前記基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする脆性材料基板の割断方法。
A method of cleaving a brittle material substrate by laser beam irradiation,
A step of forming an initial crack with a cutter at a cleaving start end of a cleaving line on one side of the substrate, and pressing a portion of the substrate opposite to the initial crack on a side surface opposite to the surface on which the initial crack is formed. A step of causing the initial crack to propagate in the thickness direction of the substrate and an initial through crack reaching the opposite side surface, and irradiating while moving the laser beam from the initial through crack along the cleaved line, A method of cleaving a brittle material substrate, comprising: heating the substrate at a temperature lower than a melting temperature, and causing an initial through crack to propagate along the planned fracture line by thermal stress generated in the substrate.
脆性材料基板をレーザビーム照射することによって割断する方法であって、
前記基板の一方面の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、前記初期亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、前記基板を溶融温度未満で加熱し、これにより前記基板に生じた熱応力によって、初期亀裂を前記割断予定線に沿って進展させて初期進展亀裂を形成する工程と、前記基板の前記初期進展亀裂を形成した面と反対側面の、前記初期進展亀裂と対向する部分を押圧し、前記初期進展亀裂を前記基板の厚み方向に進展させて前記反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、前記基板を溶融温度未満で加熱し、これにより前記基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする脆性材料基板の割断方法。
A method of cleaving a brittle material substrate by laser beam irradiation,
A step of forming an initial crack with a cutter at a cleaving start end of a cleaving line on one side of the substrate, and irradiating the substrate while moving the laser beam relatively along the cleaving line from the initial crack; Heating at a temperature lower than the melting temperature, thereby causing the initial crack to propagate along the planned cutting line by the thermal stress generated in the substrate, and forming the initial progress crack in the substrate face opposite sides, wherein pressing the initial progress crack a portion facing the steps of an initial penetration crack leading to the opposite side by the progress of the initial progress crack in the thickness direction of the substrate, from the initial through-crack wherein with radiation along the expected splitting line by relatively moving the laser beam, heating the substrate at below the melting temperature, thereby the thermal stress generated in the substrate, wherein the initial penetrating crack Brittle material breaking method of the substrate; and a step of developing along a cross-sectional plan line.
2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する方法であって、
第1脆性材料基板の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、第2脆性材料基板の、前記初期亀裂と対向する部分を押圧し、前記初期亀裂を第1脆性材料基板の厚み方向に進展させて第1脆性材料基板の反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、第1脆性材料基板を溶融温度未満で加熱し、これにより第1脆性材料基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする脆性材料基板の割断方法。
A method of cleaving one brittle material substrate of a laminated substrate obtained by bonding two brittle material substrates,
A step of forming an initial crack with a cutter at the cutting start end of the cutting line of the first brittle material substrate, a portion of the second brittle material substrate facing the initial crack is pressed, and the initial crack is made into the first brittleness A process of developing in the thickness direction of the material substrate to form an initial through crack reaching the opposite side surface of the first brittle material substrate, and irradiating while moving the laser beam from the initial through crack along the cutting line, A step of heating the first brittle material substrate at a temperature lower than the melting temperature, thereby causing the initial through crack to propagate along the planned cutting line by the thermal stress generated in the first brittle material substrate. Material substrate cleaving method.
2枚の脆性材料基板を貼り合わせた積層基板の、一方の脆性材料基板を割断する方法であって、
第1脆性材料基板の、割断予定線の割断開始端にカッターで初期亀裂を形成する工程と、前記初期亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、第1脆性材料基板を溶融温度未満で加熱し、これにより第1脆性材料基板に生じた熱応力によって、前記初期亀裂を前記割断予定線に沿って進展させて初期進展亀裂を形成する工程と、第2脆性材料基板の、前記初期進展亀裂と対向する部分を押圧し、前記初期進展亀裂を第1脆性材料基板の厚み方向に進展させて第1脆性材料基板の反対側面に至る初期貫通亀裂とする工程と、前記初期貫通亀裂から前記割断予定線に沿ってレーザビームを相対移動させながら照射して、第1脆性材料基板を溶融温度未満で加熱し、これにより第1脆性材料基板に生じた熱応力によって、初期貫通亀裂を前記割断予定線に沿って進展させる工程とを有することを特徴とする脆性材料基板の割断方法。
A method of cleaving one brittle material substrate of a laminated substrate obtained by bonding two brittle material substrates,
A process of forming an initial crack with a cutter at a cleave start line of the first brittle material substrate, and a laser beam is irradiated from the initial crack while moving relatively along the planned cut line, thereby causing the first brittleness A step of heating the material substrate at a temperature lower than the melting temperature, thereby causing the initial crack to propagate along the planned cutting line by the thermal stress generated in the first brittle material substrate; and a second brittleness Pressing a portion of the material substrate facing the initial progress crack, and developing the initial progress crack in the thickness direction of the first brittle material substrate to form an initial through crack reaching the opposite side surface of the first brittle material substrate; The first brittle material substrate is irradiated with the laser beam being relatively moved from the initial through crack along the planned cutting line to heat the first brittle material substrate at a temperature lower than the melting temperature, thereby causing the thermal stress generated in the first brittle material substrate. It, breaking method of the brittle material substrate, characterized in that a step to advance along the initial penetrating cracks the expected splitting line.
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