TWI383261B - Photoresist material and pattern formation method - Google Patents
Photoresist material and pattern formation method Download PDFInfo
- Publication number
- TWI383261B TWI383261B TW096112085A TW96112085A TWI383261B TW I383261 B TWI383261 B TW I383261B TW 096112085 A TW096112085 A TW 096112085A TW 96112085 A TW96112085 A TW 96112085A TW I383261 B TWI383261 B TW I383261B
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- bis
- sulfonate
- acid
- methyl
- Prior art date
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims description 92
- 239000000463 material Substances 0.000 title claims description 60
- 238000000034 method Methods 0.000 title claims description 26
- 230000007261 regionalization Effects 0.000 title 1
- 150000001875 compounds Chemical class 0.000 claims description 54
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 52
- 239000002253 acid Substances 0.000 claims description 51
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 40
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 34
- 229910052799 carbon Inorganic materials 0.000 claims description 33
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 21
- 239000011347 resin Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 230000002378 acidificating effect Effects 0.000 claims description 19
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 19
- 125000003118 aryl group Chemical group 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 18
- 239000011248 coating agent Substances 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 14
- 150000002894 organic compounds Chemical class 0.000 claims description 14
- 239000003513 alkali Substances 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 239000007788 liquid Substances 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 238000007654 immersion Methods 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 5
- 230000009471 action Effects 0.000 claims description 4
- 125000000962 organic group Chemical group 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 4
- 230000001939 inductive effect Effects 0.000 claims description 3
- -1 2-ethyl-2-adamantyl Chemical group 0.000 description 189
- 125000004432 carbon atom Chemical group C* 0.000 description 82
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 39
- 125000000217 alkyl group Chemical group 0.000 description 34
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 34
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 29
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 26
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 24
- 150000002430 hydrocarbons Chemical group 0.000 description 21
- 229920000642 polymer Polymers 0.000 description 15
- 230000007547 defect Effects 0.000 description 14
- 239000000203 mixture Substances 0.000 description 14
- 239000007983 Tris buffer Substances 0.000 description 13
- 150000001412 amines Chemical class 0.000 description 13
- DFNYGALUNNFWKJ-UHFFFAOYSA-N aminoacetonitrile Chemical compound NCC#N DFNYGALUNNFWKJ-UHFFFAOYSA-N 0.000 description 13
- 239000002585 base Substances 0.000 description 13
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 13
- 229940029560 pentafluoropropane Drugs 0.000 description 13
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 13
- SUSQOBVLVYHIEX-UHFFFAOYSA-N phenylacetonitrile Chemical compound N#CCC1=CC=CC=C1 SUSQOBVLVYHIEX-UHFFFAOYSA-N 0.000 description 12
- 125000001841 imino group Chemical group [H]N=* 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- KZJRKRQSDZGHEC-UHFFFAOYSA-N 2,2,2-trifluoro-1-phenylethanone Chemical compound FC(F)(F)C(=O)C1=CC=CC=C1 KZJRKRQSDZGHEC-UHFFFAOYSA-N 0.000 description 10
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 10
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 9
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 9
- 150000002148 esters Chemical class 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 9
- 239000011737 fluorine Substances 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 8
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 8
- 229920005601 base polymer Polymers 0.000 description 8
- 229940077388 benzenesulfonate Drugs 0.000 description 8
- MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 description 8
- 125000004093 cyano group Chemical group *C#N 0.000 description 8
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 8
- 238000005530 etching Methods 0.000 description 8
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 8
- 150000004060 quinone imines Chemical class 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 229910052717 sulfur Inorganic materials 0.000 description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 8
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 7
- 125000001033 ether group Chemical group 0.000 description 7
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 7
- 238000001459 lithography Methods 0.000 description 7
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 229910052707 ruthenium Inorganic materials 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 7
- GKNWQHIXXANPTN-UHFFFAOYSA-M 1,1,2,2,2-pentafluoroethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)F GKNWQHIXXANPTN-UHFFFAOYSA-M 0.000 description 6
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 6
- 238000011161 development Methods 0.000 description 6
- 125000004185 ester group Chemical group 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 6
- 125000004434 sulfur atom Chemical group 0.000 description 6
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 6
- PUKFLHPSERHMCY-UHFFFAOYSA-N 1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonic acid Chemical compound FC(F)(F)C(O)C(F)(F)S(O)(=O)=O PUKFLHPSERHMCY-UHFFFAOYSA-N 0.000 description 5
- ZSXYJNYYDJTZPB-UHFFFAOYSA-N 1-(1,1-difluoro-2h-naphthalen-2-yl)ethanesulfonic acid Chemical compound C1=CC=C2C(F)(F)C(C(C)S(O)(=O)=O)C=CC2=C1 ZSXYJNYYDJTZPB-UHFFFAOYSA-N 0.000 description 5
- KYXIHKXHBSORRJ-UHFFFAOYSA-N 1-(2,4-dimethylphenyl)-2,2,2-trifluoroethanone Chemical compound CC1=CC=C(C(=O)C(F)(F)F)C(C)=C1 KYXIHKXHBSORRJ-UHFFFAOYSA-N 0.000 description 5
- NCJZVRPXSSYDBG-UHFFFAOYSA-N 2,2,2-trifluoro-1-(4-methoxyphenyl)ethanone Chemical compound COC1=CC=C(C(=O)C(F)(F)F)C=C1 NCJZVRPXSSYDBG-UHFFFAOYSA-N 0.000 description 5
- DYILUJUELMWXAL-UHFFFAOYSA-N 2,2,2-trifluoro-1-(4-methylphenyl)ethanone Chemical compound CC1=CC=C(C(=O)C(F)(F)F)C=C1 DYILUJUELMWXAL-UHFFFAOYSA-N 0.000 description 5
- JCWQTARLYJDDRE-UHFFFAOYSA-N 2,2,2-trifluoro-1-(4-methylsulfanylphenyl)ethanone Chemical compound CSC1=CC=C(C(=O)C(F)(F)F)C=C1 JCWQTARLYJDDRE-UHFFFAOYSA-N 0.000 description 5
- IKMBXKGUMLSBOT-UHFFFAOYSA-M 2,3,4,5,6-pentafluorobenzenesulfonate Chemical compound [O-]S(=O)(=O)C1=C(F)C(F)=C(F)C(F)=C1F IKMBXKGUMLSBOT-UHFFFAOYSA-M 0.000 description 5
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 5
- YDOPMIAANRCTID-UHFFFAOYSA-N 2-(adamantane-1-carbonyloxy)-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound C1C(C2)CC3CC2CC1(C(=O)OC(C(F)(F)S(=O)(=O)O)C(F)(F)F)C3 YDOPMIAANRCTID-UHFFFAOYSA-N 0.000 description 5
- RLTPXEAFDJVHSN-UHFFFAOYSA-N 4-(trifluoromethyl)benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C(F)(F)F)C=C1 RLTPXEAFDJVHSN-UHFFFAOYSA-N 0.000 description 5
- WVSYONICNIDYBE-UHFFFAOYSA-M 4-fluorobenzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=C(F)C=C1 WVSYONICNIDYBE-UHFFFAOYSA-M 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Chemical group CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 150000002466 imines Chemical class 0.000 description 5
- 238000000671 immersion lithography Methods 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 5
- 125000001624 naphthyl group Chemical group 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 description 5
- WLGDAKIJYPIYLR-UHFFFAOYSA-M octane-1-sulfonate Chemical compound CCCCCCCCS([O-])(=O)=O WLGDAKIJYPIYLR-UHFFFAOYSA-M 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 5
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 5
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 5
- JGTNAGYHADQMCM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JGTNAGYHADQMCM-UHFFFAOYSA-M 0.000 description 4
- RJNJRKMXMGQJKX-UHFFFAOYSA-N 1,1,3,3,3-pentafluoro-2-naphthalen-2-yloxypropane-1-sulfonic acid Chemical compound C1=CC=CC2=CC(OC(C(F)(F)S(=O)(=O)O)C(F)(F)F)=CC=C21 RJNJRKMXMGQJKX-UHFFFAOYSA-N 0.000 description 4
- VINRTVDNUHIWCB-UHFFFAOYSA-N 2,2,2-trifluoro-1-(2,4,6-trimethylphenyl)ethanone Chemical compound CC1=CC(C)=C(C(=O)C(F)(F)F)C(C)=C1 VINRTVDNUHIWCB-UHFFFAOYSA-N 0.000 description 4
- XGMDYIYCKWMWLY-UHFFFAOYSA-N 2,2,2-trifluoroethanesulfonic acid Chemical compound OS(=O)(=O)CC(F)(F)F XGMDYIYCKWMWLY-UHFFFAOYSA-N 0.000 description 4
- LHQIPWLXZAGAFL-UHFFFAOYSA-N 2-benzylsulfonyloxy-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound FC(C(C(F)(F)F)OS(=O)(=O)CC1=CC=CC=C1)(S(=O)(=O)O)F LHQIPWLXZAGAFL-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- OJGMBLNIHDZDGS-UHFFFAOYSA-N N-Ethylaniline Chemical compound CCNC1=CC=CC=C1 OJGMBLNIHDZDGS-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- QDHFHIQKOVNCNC-UHFFFAOYSA-M butane-1-sulfonate Chemical compound CCCCS([O-])(=O)=O QDHFHIQKOVNCNC-UHFFFAOYSA-M 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 125000001072 heteroaryl group Chemical group 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- PSZYNBSKGUBXEH-UHFFFAOYSA-M naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-M 0.000 description 4
- 125000005188 oxoalkyl group Chemical group 0.000 description 4
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 4
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 4
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- JCELLLQBFWDSJR-UHFFFAOYSA-N 1,1,3,3,3-pentafluoro-2-(furan-2-yloxy)propane-1-sulfonic acid Chemical compound C1=COC(=C1)OC(C(F)(F)F)C(F)(F)S(=O)(=O)O JCELLLQBFWDSJR-UHFFFAOYSA-N 0.000 description 3
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 3
- XNJVIJQATFJERB-UHFFFAOYSA-N 2,3,4-trimethylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C(C)=C1C XNJVIJQATFJERB-UHFFFAOYSA-N 0.000 description 3
- YHGKEORTCHVBQH-UHFFFAOYSA-M 2,4,6-tri(propan-2-yl)benzenesulfonate Chemical compound CC(C)C1=CC(C(C)C)=C(S([O-])(=O)=O)C(C(C)C)=C1 YHGKEORTCHVBQH-UHFFFAOYSA-M 0.000 description 3
- ZDEQCDZGCQYQKB-UHFFFAOYSA-N 2-(2,2-dimethylpropoxy)-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound FC(C(C(F)(F)F)OCC(C)(C)C)(S(=O)(=O)O)F ZDEQCDZGCQYQKB-UHFFFAOYSA-N 0.000 description 3
- AHFWIRXJWWWORD-UHFFFAOYSA-N 2-(3-bicyclo[2.2.1]heptanyl)-1,1,2,2-tetrafluoroethanesulfonic acid Chemical compound C1CC2C(C(F)(F)C(F)(F)S(=O)(=O)O)CC1C2 AHFWIRXJWWWORD-UHFFFAOYSA-N 0.000 description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- PAPNRQCYSFBWDI-UHFFFAOYSA-N DMP Natural products CC1=CC=C(C)N1 PAPNRQCYSFBWDI-UHFFFAOYSA-N 0.000 description 3
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 3
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005073 adamantyl group Chemical group C12(CC3CC(CC(C1)C3)C2)* 0.000 description 3
- 150000001335 aliphatic alkanes Chemical class 0.000 description 3
- 125000003282 alkyl amino group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- YRIUSKIDOIARQF-UHFFFAOYSA-N dodecyl benzenesulfonate Chemical compound CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 YRIUSKIDOIARQF-UHFFFAOYSA-N 0.000 description 3
- 229940071161 dodecylbenzenesulfonate Drugs 0.000 description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 3
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 3
- CQAGLAXSRJMWSA-UHFFFAOYSA-N hydrazinyl hydrogen sulfate Chemical compound NNOS(O)(=O)=O CQAGLAXSRJMWSA-UHFFFAOYSA-N 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 3
- 125000004043 oxo group Chemical group O=* 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 3
- ROSDSFDQCJNGOL-UHFFFAOYSA-N protonated dimethyl amine Natural products CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 description 3
- WMGVPDQNPUQRND-UHFFFAOYSA-N (2-methylphenyl)acetonitrile Chemical compound CC1=CC=CC=C1CC#N WMGVPDQNPUQRND-UHFFFAOYSA-N 0.000 description 2
- LEEKMLKPERZBPT-UHFFFAOYSA-N 1,1,3,3,3-pentafluoro-2-(furan-2-ylmethoxy)propane-1-sulfonic acid Chemical compound C1=COC(=C1)COC(C(F)(F)F)C(F)(F)S(=O)(=O)O LEEKMLKPERZBPT-UHFFFAOYSA-N 0.000 description 2
- YFISYXOGMSGFRE-UHFFFAOYSA-N 1-(3,4-dimethoxyphenyl)-2,2,2-trifluoroethanone Chemical compound COC1=CC=C(C(=O)C(F)(F)F)C=C1OC YFISYXOGMSGFRE-UHFFFAOYSA-N 0.000 description 2
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical compound CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 description 2
- OESYNCIYSBWEQV-UHFFFAOYSA-N 1-[diazo-(2,4-dimethylphenyl)sulfonylmethyl]sulfonyl-2,4-dimethylbenzene Chemical compound CC1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1C OESYNCIYSBWEQV-UHFFFAOYSA-N 0.000 description 2
- DYXPEZMGLPXXNA-UHFFFAOYSA-N 1-[diazo-(4-hexoxy-2,5-dimethylphenyl)sulfonylmethyl]sulfonyl-4-hexoxy-2,5-dimethylbenzene Chemical compound C1=C(C)C(OCCCCCC)=CC(C)=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC(C)=C(OCCCCCC)C=C1C DYXPEZMGLPXXNA-UHFFFAOYSA-N 0.000 description 2
- OWULQWABTSFUGU-UHFFFAOYSA-N 1-[diazo-(4-hexoxy-2-methyl-5-propan-2-ylphenyl)sulfonylmethyl]sulfonyl-4-hexoxy-2-methyl-5-propan-2-ylbenzene Chemical compound C1=C(C(C)C)C(OCCCCCC)=CC(C)=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC(C(C)C)=C(OCCCCCC)C=C1C OWULQWABTSFUGU-UHFFFAOYSA-N 0.000 description 2
- SRFRYCOTCQAUAM-UHFFFAOYSA-N 1-[diazo-(4-hexoxy-2-methylphenyl)sulfonylmethyl]sulfonyl-4-hexoxy-2-methylbenzene Chemical compound CC1=CC(OCCCCCC)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(OCCCCCC)C=C1C SRFRYCOTCQAUAM-UHFFFAOYSA-N 0.000 description 2
- JHQDBQYFKARISA-UHFFFAOYSA-N 2,2,2-trifluoro-1-(2-methylphenyl)ethanone Chemical compound CC1=CC=CC=C1C(=O)C(F)(F)F JHQDBQYFKARISA-UHFFFAOYSA-N 0.000 description 2
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- QQMYPHGEZLNMAJ-UHFFFAOYSA-N 2-(cyclohexanecarbonyloxy)-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(C(F)(F)F)OC(=O)C1CCCCC1 QQMYPHGEZLNMAJ-UHFFFAOYSA-N 0.000 description 2
- SAFWZKVQMVOANB-UHFFFAOYSA-N 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methylpropane Chemical compound CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)(C)C SAFWZKVQMVOANB-UHFFFAOYSA-N 0.000 description 2
- SAOSCTYRONNFTC-UHFFFAOYSA-N 2-methyl-decanoic acid Chemical compound CCCCCCCCC(C)C(O)=O SAOSCTYRONNFTC-UHFFFAOYSA-N 0.000 description 2
- KDSNLYIMUZNERS-UHFFFAOYSA-N 2-methylpropanamine Chemical compound CC(C)CN KDSNLYIMUZNERS-UHFFFAOYSA-N 0.000 description 2
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 2
- WFCSWCVEJLETKA-UHFFFAOYSA-N 2-piperazin-1-ylethanol Chemical compound OCCN1CCNCC1 WFCSWCVEJLETKA-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- IKIZLVYCVDOMRH-UHFFFAOYSA-N 4-(4-methylphenyl)sulfonyloxybenzenesulfonic acid Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC1=CC=C(S(O)(=O)=O)C=C1 IKIZLVYCVDOMRH-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- DPCPZJKYWQQCDM-UHFFFAOYSA-N C(CCC)S(=O)(=O)O.C(CCCCCCCCCCC)OS(=O)(=O)C1=CC=CC=C1 Chemical compound C(CCC)S(=O)(=O)O.C(CCCCCCCCCCC)OS(=O)(=O)C1=CC=CC=C1 DPCPZJKYWQQCDM-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- ROHFNLRQFUQHCH-YFKPBYRVSA-N L-leucine Chemical compound CC(C)C[C@H](N)C(O)=O ROHFNLRQFUQHCH-YFKPBYRVSA-N 0.000 description 2
- ROHFNLRQFUQHCH-UHFFFAOYSA-N Leucine Natural products CC(C)CC(N)C(O)=O ROHFNLRQFUQHCH-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methylaniline Chemical compound CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 2
- GLGXSTXZLFQYKJ-UHFFFAOYSA-N [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 GLGXSTXZLFQYKJ-UHFFFAOYSA-N 0.000 description 2
- 125000004036 acetal group Chemical group 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 230000001476 alcoholic effect Effects 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- HOPRXXXSABQWAV-UHFFFAOYSA-N anhydrous collidine Natural products CC1=CC=NC(C)=C1C HOPRXXXSABQWAV-UHFFFAOYSA-N 0.000 description 2
- 150000001454 anthracenes Chemical class 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 125000004744 butyloxycarbonyl group Chemical group 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- RMBPEFMHABBEKP-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2C3=C[CH]C=CC3=CC2=C1 RMBPEFMHABBEKP-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- JDEJGVSZUIJWBM-UHFFFAOYSA-N n,n,2-trimethylaniline Chemical compound CN(C)C1=CC=CC=C1C JDEJGVSZUIJWBM-UHFFFAOYSA-N 0.000 description 2
- CDZOGLJOFWFVOZ-UHFFFAOYSA-N n-propylaniline Chemical compound CCCNC1=CC=CC=C1 CDZOGLJOFWFVOZ-UHFFFAOYSA-N 0.000 description 2
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N o-biphenylenemethane Natural products C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229940100684 pentylamine Drugs 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 2
- 125000003367 polycyclic group Chemical group 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 150000004033 porphyrin derivatives Chemical class 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 150000004892 pyridazines Chemical class 0.000 description 2
- UBQKCCHYAOITMY-UHFFFAOYSA-N pyridin-2-ol Chemical compound OC1=CC=CC=N1 UBQKCCHYAOITMY-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 125000004354 sulfur functional group Chemical group 0.000 description 2
- 230000005469 synchrotron radiation Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- ABVVEAHYODGCLZ-UHFFFAOYSA-N tridecan-1-amine Chemical compound CCCCCCCCCCCCCN ABVVEAHYODGCLZ-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 2
- 239000012953 triphenylsulfonium Substances 0.000 description 2
- 150000003673 urethanes Chemical class 0.000 description 2
- HRGBDNIQBMQLBE-UHFFFAOYSA-N (1-methylpiperidin-3-yl) propanoate Chemical compound CCC(=O)OC1CCCN(C)C1 HRGBDNIQBMQLBE-UHFFFAOYSA-N 0.000 description 1
- DDYKUIIMQBQEAZ-UHFFFAOYSA-N (2,4-dinitrophenyl)methanesulfonic acid Chemical compound OS(=O)(=O)CC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O DDYKUIIMQBQEAZ-UHFFFAOYSA-N 0.000 description 1
- KAJBGWNWZBBFGG-UHFFFAOYSA-N (2,6-dinitrophenyl)methanesulfonic acid Chemical compound OS(=O)(=O)CC1=C([N+]([O-])=O)C=CC=C1[N+]([O-])=O KAJBGWNWZBBFGG-UHFFFAOYSA-N 0.000 description 1
- YSWBUABBMRVQAC-UHFFFAOYSA-N (2-nitrophenyl)methanesulfonic acid Chemical compound OS(=O)(=O)CC1=CC=CC=C1[N+]([O-])=O YSWBUABBMRVQAC-UHFFFAOYSA-N 0.000 description 1
- DLDWUFCUUXXYTB-UHFFFAOYSA-N (2-oxo-1,2-diphenylethyl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 DLDWUFCUUXXYTB-UHFFFAOYSA-N 0.000 description 1
- NIZONLAIJCNVBD-UHFFFAOYSA-N (2-oxooxolan-3-yl) 3-[bis(2-acetyloxyethyl)amino]propanoate Chemical compound CC(=O)OCCN(CCOC(C)=O)CCC(=O)OC1CCOC1=O NIZONLAIJCNVBD-UHFFFAOYSA-N 0.000 description 1
- JZDQKBZKFIWSNW-UHFFFAOYSA-N (4-methoxyphenyl)-phenyliodanium Chemical compound C1=CC(OC)=CC=C1[I+]C1=CC=CC=C1 JZDQKBZKFIWSNW-UHFFFAOYSA-N 0.000 description 1
- PHRMUZWSJYTGSI-UHFFFAOYSA-N (4-tert-butylphenyl)-diphenylphosphane Chemical compound C1=CC(C(C)(C)C)=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 PHRMUZWSJYTGSI-UHFFFAOYSA-N 0.000 description 1
- TUKWYJVGKNCDJJ-GHXNOFRVSA-N (nz)-n-(2,2,2-trifluoro-1-phenylethylidene)hydroxylamine Chemical compound O\N=C(C(F)(F)F)\C1=CC=CC=C1 TUKWYJVGKNCDJJ-GHXNOFRVSA-N 0.000 description 1
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical group FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- WDALKLFZZMXJBJ-UHFFFAOYSA-N 1,1,1,3,3-pentafluoropropan-2-yl cyclohexanecarboxylate Chemical compound FC(F)C(C(F)(F)F)OC(=O)C1CCCCC1 WDALKLFZZMXJBJ-UHFFFAOYSA-N 0.000 description 1
- UXNXOVUTXPCFBB-UHFFFAOYSA-N 1,1,1,3,3-pentafluoropropan-2-yl phenylmethanesulfonate Chemical compound FC(C(C(F)(F)F)OS(=O)(=O)CC1=CC=CC=C1)F UXNXOVUTXPCFBB-UHFFFAOYSA-N 0.000 description 1
- IZXFVWCHCJQBPC-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,4-nonafluoro-N'-[2,2,3,3,4,4,5,5-octafluoro-1-(1H-indol-2-yl)pentyl]butane-1-sulfonohydrazide Chemical compound FC(C(NNS(=O)(=O)C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)C=1NC2=CC=CC=C2C1)(C(C(C(F)F)(F)F)(F)F)F IZXFVWCHCJQBPC-UHFFFAOYSA-N 0.000 description 1
- VLLPVDKADBYKLM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VLLPVDKADBYKLM-UHFFFAOYSA-M 0.000 description 1
- OPTSBMVUGQHDIX-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonic acid 2,2,2-trifluoroethanesulfonic acid Chemical compound FC(CS(=O)(=O)O)(F)F.FC(C(C(C(C(C(C(C(S(=O)(=O)O)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F OPTSBMVUGQHDIX-UHFFFAOYSA-N 0.000 description 1
- KKOXHTPMOSHSMP-UHFFFAOYSA-M 1,1,2,2,3,3-hexafluorobutane-1-sulfonate tetraphenylphosphanium Chemical compound FC(C(C(S(=O)(=O)[O-])(F)F)(F)F)(C)F.C1(=CC=CC=C1)[P+](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 KKOXHTPMOSHSMP-UHFFFAOYSA-M 0.000 description 1
- CJKMMABYONVLHS-UHFFFAOYSA-N 1,1,2,2,3-pentafluorobutane-1-sulfonic acid Chemical compound CC(F)C(F)(F)C(F)(F)S(O)(=O)=O CJKMMABYONVLHS-UHFFFAOYSA-N 0.000 description 1
- BHRIPICYVGSYCY-UHFFFAOYSA-N 1,1,2-tribenzylhydrazine Chemical compound C=1C=CC=CC=1CNN(CC=1C=CC=CC=1)CC1=CC=CC=C1 BHRIPICYVGSYCY-UHFFFAOYSA-N 0.000 description 1
- NTDMVRYXHWMVKG-UHFFFAOYSA-N 1,1-bis[3,4-bis[(2-methylpropan-2-yl)oxy]phenyl]-2-phenylhydrazine Chemical compound C(C)(C)(C)OC=1C=C(C=CC=1OC(C)(C)C)N(NC1=CC=CC=C1)C1=CC(=C(C=C1)OC(C)(C)C)OC(C)(C)C NTDMVRYXHWMVKG-UHFFFAOYSA-N 0.000 description 1
- CZYOYVACANYRFK-UHFFFAOYSA-N 1,1-bis[3-[(2-methylpropan-2-yl)oxy]phenyl]-2-phenylhydrazine Chemical compound C(C)(C)(C)OC=1C=C(C=CC=1)N(NC1=CC=CC=C1)C1=CC(=CC=C1)OC(C)(C)C CZYOYVACANYRFK-UHFFFAOYSA-N 0.000 description 1
- MVZZDHFURVJOKW-UHFFFAOYSA-N 1,1-bis[4-[(2-methylpropan-2-yl)oxy]phenyl]-2-phenylhydrazine Chemical compound C(C)(C)(C)OC1=CC=C(C=C1)N(NC1=CC=CC=C1)C1=CC=C(C=C1)OC(C)(C)C MVZZDHFURVJOKW-UHFFFAOYSA-N 0.000 description 1
- SKYBRLALUDNCSM-UHFFFAOYSA-N 1,1-dimethyl-2-phenylhydrazine Chemical compound CN(C)NC1=CC=CC=C1 SKYBRLALUDNCSM-UHFFFAOYSA-N 0.000 description 1
- 150000005045 1,10-phenanthrolines Chemical class 0.000 description 1
- VFOJXEHRTNGBDB-UHFFFAOYSA-M 1,2,2,3,3,4,4,5,5,6,6-undecafluorocyclohexane-1-sulfonate Chemical compound [O-]S(=O)(=O)C1(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)F VFOJXEHRTNGBDB-UHFFFAOYSA-M 0.000 description 1
- AMASMPCONNPSSC-UHFFFAOYSA-N 1,2,3-tris[3-[(2-methylpropan-2-yl)oxy]phenyl]-9H-fluorene Chemical compound C(C)(C)(C)OC=1C=C(C=CC=1)C=1C(=C(C=2CC3=CC=CC=C3C=2C=1)C1=CC(=CC=C1)OC(C)(C)C)C1=CC(=CC=C1)OC(C)(C)C AMASMPCONNPSSC-UHFFFAOYSA-N 0.000 description 1
- VLLDQFRSUWEXDA-UHFFFAOYSA-N 1,2,3-tris[4-[(2-methylpropan-2-yl)oxy]phenyl]-9H-fluorene Chemical compound C(C)(C)(C)OC1=CC=C(C=C1)C=1C(=C(C=2CC3=CC=CC=C3C=2C=1)C1=CC=C(C=C1)OC(C)(C)C)C1=CC=C(C=C1)OC(C)(C)C VLLDQFRSUWEXDA-UHFFFAOYSA-N 0.000 description 1
- LEEANUDEDHYDTG-UHFFFAOYSA-N 1,2-dimethoxypropane Chemical compound COCC(C)OC LEEANUDEDHYDTG-UHFFFAOYSA-N 0.000 description 1
- YBQZXXMEJHZYMB-UHFFFAOYSA-N 1,2-diphenylhydrazine Chemical compound C=1C=CC=CC=1NNC1=CC=CC=C1 YBQZXXMEJHZYMB-UHFFFAOYSA-N 0.000 description 1
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 1
- NBXKUSNBCPPKRA-UHFFFAOYSA-N 1,4,7,10,13-pentaoxa-16-azacyclooctadecane Chemical compound C1COCCOCCOCCOCCOCCN1 NBXKUSNBCPPKRA-UHFFFAOYSA-N 0.000 description 1
- BJUOQSZSDIHZNP-UHFFFAOYSA-N 1,4,7,10-tetraoxa-13-azacyclopentadecane Chemical compound C1COCCOCCOCCOCCN1 BJUOQSZSDIHZNP-UHFFFAOYSA-N 0.000 description 1
- YKUPVZDVUJDHSF-UHFFFAOYSA-M 1-(1,1-difluoro-2h-naphthalen-2-yl)ethanesulfonate;triphenylsulfanium Chemical compound C1=CC=C2C(F)(F)C(C(C)S([O-])(=O)=O)C=CC2=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YKUPVZDVUJDHSF-UHFFFAOYSA-M 0.000 description 1
- JBJUUEWWQLMAJH-UHFFFAOYSA-N 1-(2-ethoxyethyl)benzimidazole Chemical compound C1=CC=C2N(CCOCC)C=NC2=C1 JBJUUEWWQLMAJH-UHFFFAOYSA-N 0.000 description 1
- WDQFELCEOPFLCZ-UHFFFAOYSA-N 1-(2-hydroxyethyl)pyrrolidin-2-one Chemical compound OCCN1CCCC1=O WDQFELCEOPFLCZ-UHFFFAOYSA-N 0.000 description 1
- SCKJMHAZRHWHTP-UHFFFAOYSA-N 1-(4-benzylphenyl)-2,2,2-trifluoroethanone Chemical compound C1=CC(C(=O)C(F)(F)F)=CC=C1CC1=CC=CC=C1 SCKJMHAZRHWHTP-UHFFFAOYSA-N 0.000 description 1
- PZVBUCIVSPSAAL-UHFFFAOYSA-N 1-(4-ethoxy-3,5-dimethylphenyl)-2,2,2-trifluoroethanone Chemical compound CCOC1=C(C)C=C(C(=O)C(F)(F)F)C=C1C PZVBUCIVSPSAAL-UHFFFAOYSA-N 0.000 description 1
- GARZZLSTTYYEJK-UHFFFAOYSA-N 1-(4-methoxyphenyl)-1,2-dimethylhydrazine Chemical compound CNN(C)C1=CC=C(OC)C=C1 GARZZLSTTYYEJK-UHFFFAOYSA-N 0.000 description 1
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 description 1
- MHRHOLZTKDOBMG-UHFFFAOYSA-N 1-[2-(methoxymethoxy)ethyl]piperidine Chemical compound COCOCCN1CCCCC1 MHRHOLZTKDOBMG-UHFFFAOYSA-N 0.000 description 1
- GCBSYFJJZJJUBC-UHFFFAOYSA-N 1-[2-(methoxymethoxy)ethyl]pyrrolidine Chemical compound COCOCCN1CCCC1 GCBSYFJJZJJUBC-UHFFFAOYSA-N 0.000 description 1
- FBTYJKYDIWFXCI-UHFFFAOYSA-N 1-[3-[(2-methylpropan-2-yl)oxy]phenyl]-1,2-diphenylhydrazine Chemical compound C(C)(C)(C)OC=1C=C(C=CC=1)N(NC1=CC=CC=C1)C1=CC=CC=C1 FBTYJKYDIWFXCI-UHFFFAOYSA-N 0.000 description 1
- GLYOFBNLYMTEPS-UHFFFAOYSA-N 1-[diazo(2-methylpropylsulfonyl)methyl]sulfonyl-2-methylpropane Chemical compound CC(C)CS(=O)(=O)C(=[N+]=[N-])S(=O)(=O)CC(C)C GLYOFBNLYMTEPS-UHFFFAOYSA-N 0.000 description 1
- YDTQXTDOQMNMQW-UHFFFAOYSA-N 1-[diazo(ethylsulfonyl)methyl]sulfonylethane Chemical compound CCS(=O)(=O)C(=[N+]=[N-])S(=O)(=O)CC YDTQXTDOQMNMQW-UHFFFAOYSA-N 0.000 description 1
- GYQQFWWMZYBCIB-UHFFFAOYSA-N 1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1 GYQQFWWMZYBCIB-UHFFFAOYSA-N 0.000 description 1
- CCFAKBRKTKVJPO-UHFFFAOYSA-N 1-anthroic acid Chemical compound C1=CC=C2C=C3C(C(=O)O)=CC=CC3=CC2=C1 CCFAKBRKTKVJPO-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- DDPLKUDCQKROTF-UHFFFAOYSA-N 1-cyclohexyl-2-methyl-2-(4-methylphenyl)sulfonylpropan-1-one Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C)(C)C(=O)C1CCCCC1 DDPLKUDCQKROTF-UHFFFAOYSA-N 0.000 description 1
- AFMKLJCLBQEQTM-UHFFFAOYSA-N 1-diazonio-3,3-dimethyl-1-(4-methylphenyl)sulfonylbut-1-en-2-olate Chemical compound CC1=CC=C(S(=O)(=O)C(=[N+]=[N-])C(=O)C(C)(C)C)C=C1 AFMKLJCLBQEQTM-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- MZSBJIQZQNIOGK-UHFFFAOYSA-N 1-ethoxypropane-1-sulfonic acid Chemical compound CCOC(CC)S(O)(=O)=O MZSBJIQZQNIOGK-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- QMPSFOBBBKWHFN-UHFFFAOYSA-N 1-methoxyhexane-1-sulfonic acid Chemical compound CCCCCC(OC)S(O)(=O)=O QMPSFOBBBKWHFN-UHFFFAOYSA-N 0.000 description 1
- ZEORMSOVDNPUJK-UHFFFAOYSA-N 1-methoxyoctane-1-sulfonic acid Chemical compound CCCCCCCC(OC)S(O)(=O)=O ZEORMSOVDNPUJK-UHFFFAOYSA-N 0.000 description 1
- XLOXYWLRAKCDQL-UHFFFAOYSA-N 1-methyl-4-[(4-methylphenyl)sulfonylmethylsulfonyl]benzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)CS(=O)(=O)C1=CC=C(C)C=C1 XLOXYWLRAKCDQL-UHFFFAOYSA-N 0.000 description 1
- BISSSXOBQPAJKP-UHFFFAOYSA-N 1-methyl-4-[2-(4-methylphenyl)sulfonylpropan-2-ylsulfonyl]benzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(C)(C)S(=O)(=O)C1=CC=C(C)C=C1 BISSSXOBQPAJKP-UHFFFAOYSA-N 0.000 description 1
- AVFZOVWCLRSYKC-UHFFFAOYSA-N 1-methylpyrrolidine Chemical compound CN1CCCC1 AVFZOVWCLRSYKC-UHFFFAOYSA-N 0.000 description 1
- KOJITVLLKAORDD-UHFFFAOYSA-N 1-naphthalen-2-yl-1,2-diphenylhydrazine Chemical compound C=1C=CC=CC=1NN(C=1C=C2C=CC=CC2=CC=1)C1=CC=CC=C1 KOJITVLLKAORDD-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- AGDWSKXXHBIBRP-UHFFFAOYSA-N 1-prop-2-enoyloxycyclohexane-1-carboxylic acid Chemical compound C=CC(=O)OC1(C(=O)O)CCCCC1 AGDWSKXXHBIBRP-UHFFFAOYSA-N 0.000 description 1
- HFZLSTDPRQSZCQ-UHFFFAOYSA-N 1-pyrrolidin-3-ylpyrrolidine Chemical compound C1CCCN1C1CNCC1 HFZLSTDPRQSZCQ-UHFFFAOYSA-N 0.000 description 1
- ZBZAGZCFEOTODC-UHFFFAOYSA-N 1-tert-butyl-4-[(4-tert-butylphenyl)sulfonyl-diazomethyl]sulfonylbenzene Chemical compound C1=CC(C(C)(C)C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C(C)(C)C)C=C1 ZBZAGZCFEOTODC-UHFFFAOYSA-N 0.000 description 1
- UFLWECJWSGWVHB-UHFFFAOYSA-N 1H-carbazole Chemical class C1=CC=C2C3=CC=CCC3=NC2=C1 UFLWECJWSGWVHB-UHFFFAOYSA-N 0.000 description 1
- IHWDSEPNZDYMNF-UHFFFAOYSA-N 1H-indol-2-amine Chemical class C1=CC=C2NC(N)=CC2=C1 IHWDSEPNZDYMNF-UHFFFAOYSA-N 0.000 description 1
- ZSOFAYWPBVQQFQ-UHFFFAOYSA-N 2,2,2-trifluoro-1-(4-methylsulfonylphenyl)ethanone Chemical compound CS(=O)(=O)C1=CC=C(C(=O)C(F)(F)F)C=C1 ZSOFAYWPBVQQFQ-UHFFFAOYSA-N 0.000 description 1
- OSXBYCLYYVYZOX-UHFFFAOYSA-N 2,2,2-trifluoro-1-(4-phenylmethoxyphenyl)ethanone Chemical compound C1=CC(C(=O)C(F)(F)F)=CC=C1OCC1=CC=CC=C1 OSXBYCLYYVYZOX-UHFFFAOYSA-N 0.000 description 1
- BMVJZJPRNPFVCH-UHFFFAOYSA-N 2,2,2-trifluoro-1-[4-(2-phenoxyethoxy)phenyl]ethanone Chemical compound C1=CC(C(=O)C(F)(F)F)=CC=C1OCCOC1=CC=CC=C1 BMVJZJPRNPFVCH-UHFFFAOYSA-N 0.000 description 1
- UTFMTSQCBMJRND-UHFFFAOYSA-M 2,3,4,5,6-pentafluorobenzenesulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C1=C(F)C(F)=C(F)C(F)=C1F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 UTFMTSQCBMJRND-UHFFFAOYSA-M 0.000 description 1
- WBDPKZCMVAISAL-UHFFFAOYSA-N 2,3,4-triethylpyridine Chemical compound CCC1=CC=NC(CC)=C1CC WBDPKZCMVAISAL-UHFFFAOYSA-N 0.000 description 1
- QHUHPERZCBUMRK-UHFFFAOYSA-N 2,3-dimethoxypyridine Chemical compound COC1=CC=CN=C1OC QHUHPERZCBUMRK-UHFFFAOYSA-N 0.000 description 1
- KXTPSNIEMOWGQM-UHFFFAOYSA-N 2,3-dimethyl-1-naphthalen-2-yl-9H-fluorene Chemical compound CC=1C(=C(C=2CC3=CC=CC=C3C=2C=1)C1=CC2=CC=CC=C2C=C1)C KXTPSNIEMOWGQM-UHFFFAOYSA-N 0.000 description 1
- WKAXDAMWMOBXMP-UHFFFAOYSA-N 2,3-diphenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CN=C1C1=CC=CC=C1 WKAXDAMWMOBXMP-UHFFFAOYSA-N 0.000 description 1
- MFFMQGGZCLEMCI-UHFFFAOYSA-N 2,4-dimethyl-1h-pyrrole Chemical compound CC1=CNC(C)=C1 MFFMQGGZCLEMCI-UHFFFAOYSA-N 0.000 description 1
- LXQOQPGNCGEELI-UHFFFAOYSA-N 2,4-dinitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O LXQOQPGNCGEELI-UHFFFAOYSA-N 0.000 description 1
- QFUSCYRJMXLNRB-UHFFFAOYSA-N 2,6-dinitroaniline Chemical compound NC1=C([N+]([O-])=O)C=CC=C1[N+]([O-])=O QFUSCYRJMXLNRB-UHFFFAOYSA-N 0.000 description 1
- VYONOYYDEFODAJ-UHFFFAOYSA-N 2-(1-Aziridinyl)ethanol Chemical compound OCCN1CC1 VYONOYYDEFODAJ-UHFFFAOYSA-N 0.000 description 1
- FYVMBPXFPFAECB-UHFFFAOYSA-N 2-(1-methylpyrrolidin-2-yl)ethanol Chemical compound CN1CCCC1CCO FYVMBPXFPFAECB-UHFFFAOYSA-N 0.000 description 1
- FEWSKCAVEJNPBX-UHFFFAOYSA-N 2-(2-hydroxy-2-phenylacetyl)benzenesulfonic acid Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1S(O)(=O)=O FEWSKCAVEJNPBX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XGLVDUUYFKXKPL-UHFFFAOYSA-N 2-(2-methoxyethoxy)-n,n-bis[2-(2-methoxyethoxy)ethyl]ethanamine Chemical compound COCCOCCN(CCOCCOC)CCOCCOC XGLVDUUYFKXKPL-UHFFFAOYSA-N 0.000 description 1
- WKVFXPOUGPVAQN-UHFFFAOYSA-N 2-(2-methoxyethoxymethoxy)ethanamine Chemical compound COCCOCOCCN WKVFXPOUGPVAQN-UHFFFAOYSA-N 0.000 description 1
- ORADOZVQQUAMBR-UHFFFAOYSA-N 2-(2-morpholin-4-ylethoxycarbonyl)benzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OCCN1CCOCC1 ORADOZVQQUAMBR-UHFFFAOYSA-N 0.000 description 1
- PSWZPBOFMXJKCL-UHFFFAOYSA-N 2-(2-naphthalen-2-ylsulfonylpropan-2-ylsulfonyl)naphthalene Chemical compound C1=CC=CC2=CC(S(=O)(=O)C(C)(S(=O)(=O)C=3C=C4C=CC=CC4=CC=3)C)=CC=C21 PSWZPBOFMXJKCL-UHFFFAOYSA-N 0.000 description 1
- SPBNQWDOUKTPIC-UHFFFAOYSA-M 2-(3-bicyclo[2.2.1]heptanyl)-1,1,2,2-tetrafluoroethanesulfonate;triphenylsulfanium Chemical compound C1CC2C(C(F)(F)C(F)(F)S(=O)(=O)[O-])CC1C2.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 SPBNQWDOUKTPIC-UHFFFAOYSA-M 0.000 description 1
- LVPZSMIBSMMLPI-UHFFFAOYSA-N 2-(diethylamino)acetonitrile Chemical compound CCN(CC)CC#N LVPZSMIBSMMLPI-UHFFFAOYSA-N 0.000 description 1
- NRTKFSQKHCMEMO-UHFFFAOYSA-N 2-(methoxymethoxy)-n,n-bis[2-(methoxymethoxy)ethyl]ethanamine Chemical compound COCOCCN(CCOCOC)CCOCOC NRTKFSQKHCMEMO-UHFFFAOYSA-N 0.000 description 1
- KKFDCBRMNNSAAW-UHFFFAOYSA-N 2-(morpholin-4-yl)ethanol Chemical compound OCCN1CCOCC1 KKFDCBRMNNSAAW-UHFFFAOYSA-N 0.000 description 1
- CYPNWHKJDVRBBU-UHFFFAOYSA-N 2-(naphthalen-2-ylsulfonylmethylsulfonyl)naphthalene Chemical compound C1=CC=CC2=CC(S(=O)(CS(=O)(=O)C=3C=C4C=CC=CC4=CC=3)=O)=CC=C21 CYPNWHKJDVRBBU-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- OIALIKXMLIAOSN-UHFFFAOYSA-N 2-Propylpyridine Chemical compound CCCC1=CC=CC=N1 OIALIKXMLIAOSN-UHFFFAOYSA-N 0.000 description 1
- RFTNMSXRZKRFMD-UHFFFAOYSA-N 2-[2-(2,2-dimethylpropanoyloxy)ethyl-methylamino]ethyl 2,2-dimethylpropanoate Chemical compound CC(C)(C)C(=O)OCCN(C)CCOC(=O)C(C)(C)C RFTNMSXRZKRFMD-UHFFFAOYSA-N 0.000 description 1
- HJZNTFDOAXQUEZ-UHFFFAOYSA-N 2-[2-[2-[bis[2-[2-(2-hydroxyethoxy)ethoxy]ethyl]amino]ethoxy]ethoxy]ethanol Chemical compound OCCOCCOCCN(CCOCCOCCO)CCOCCOCCO HJZNTFDOAXQUEZ-UHFFFAOYSA-N 0.000 description 1
- RFHAEZJHUQQPOS-UHFFFAOYSA-N 2-[2-acetyloxyethyl(methyl)amino]ethyl acetate Chemical compound CC(=O)OCCN(C)CCOC(C)=O RFHAEZJHUQQPOS-UHFFFAOYSA-N 0.000 description 1
- OBCFIROEQZSWHZ-UHFFFAOYSA-N 2-[4-(2,3-diphenylanthracen-1-yl)phenoxy]thiophene Chemical compound C1(=CC=CC=C1)C=1C(=C(C2=CC3=CC=CC=C3C=C2C=1)C1=CC=C(C=C1)OC=1SC=CC=1)C1=CC=CC=C1 OBCFIROEQZSWHZ-UHFFFAOYSA-N 0.000 description 1
- DXZKNLCCPOCVJJ-UHFFFAOYSA-N 2-[amino(cyclohexylmethyl)amino]cyclohexan-1-one Chemical compound O=C1C(CCCC1)N(N)CC1CCCCC1 DXZKNLCCPOCVJJ-UHFFFAOYSA-N 0.000 description 1
- DJYQGDNOPVHONN-UHFFFAOYSA-N 2-[bis(2-acetyloxyethyl)amino]ethyl acetate Chemical compound CC(=O)OCCN(CCOC(C)=O)CCOC(C)=O DJYQGDNOPVHONN-UHFFFAOYSA-N 0.000 description 1
- XFBLAQSBUCSKOJ-UHFFFAOYSA-N 2-[bis(2-methoxycarbonyloxyethyl)amino]ethyl methyl carbonate Chemical compound COC(=O)OCCN(CCOC(=O)OC)CCOC(=O)OC XFBLAQSBUCSKOJ-UHFFFAOYSA-N 0.000 description 1
- KKOOSMDBEULUDH-UHFFFAOYSA-N 2-[butan-2-ylsulfonyl(diazo)methyl]sulfonylbutane Chemical compound CCC(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)CC KKOOSMDBEULUDH-UHFFFAOYSA-N 0.000 description 1
- SHYUREJVACUAIM-UHFFFAOYSA-N 2-[diazo(1,1,1,2,3,3,3-heptafluoropropan-2-ylsulfonyl)methyl]sulfonyl-1,1,1,2,3,3,3-heptafluoropropane Chemical compound FC(F)(F)C(F)(C(F)(F)F)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(F)(C(F)(F)F)C(F)(F)F SHYUREJVACUAIM-UHFFFAOYSA-N 0.000 description 1
- BTLBKKBQXKKHLB-UHFFFAOYSA-N 2-[ethyl(2-methoxycarbonyloxyethyl)amino]ethyl methyl carbonate Chemical compound COC(=O)OCCN(CC)CCOC(=O)OC BTLBKKBQXKKHLB-UHFFFAOYSA-N 0.000 description 1
- XZMDYFDOWYDDGM-UHFFFAOYSA-N 2-acetyloxy-1,1,3,3,3-pentafluoropropane-1-sulfonic acid Chemical compound CC(=O)OC(C(F)(F)F)C(F)(F)S(O)(=O)=O XZMDYFDOWYDDGM-UHFFFAOYSA-N 0.000 description 1
- PCFUWBOSXMKGIP-UHFFFAOYSA-N 2-benzylpyridine Chemical compound C=1C=CC=NC=1CC1=CC=CC=C1 PCFUWBOSXMKGIP-UHFFFAOYSA-N 0.000 description 1
- OFLSKXBALZCMCX-UHFFFAOYSA-N 2-butoxypyridine Chemical compound CCCCOC1=CC=CC=N1 OFLSKXBALZCMCX-UHFFFAOYSA-N 0.000 description 1
- ADSOSINJPNKUJK-UHFFFAOYSA-N 2-butylpyridine Chemical compound CCCCC1=CC=CC=N1 ADSOSINJPNKUJK-UHFFFAOYSA-N 0.000 description 1
- SLSMFXRAPKQEAO-UHFFFAOYSA-N 2-cyanoethyl 3-(diethylamino)propanoate Chemical compound CCN(CC)CCC(=O)OCCC#N SLSMFXRAPKQEAO-UHFFFAOYSA-N 0.000 description 1
- NIQPBJCGJFPEFW-UHFFFAOYSA-N 2-cyanoethyl 3-[bis(2-acetyloxyethyl)amino]propanoate Chemical compound CC(=O)OCCN(CCOC(C)=O)CCC(=O)OCCC#N NIQPBJCGJFPEFW-UHFFFAOYSA-N 0.000 description 1
- IFTCIQLXNQKJLT-UHFFFAOYSA-N 2-cyanoethyl 3-[bis(2-formyloxyethyl)amino]propanoate Chemical compound O=COCCN(CCOC=O)CCC(=O)OCCC#N IFTCIQLXNQKJLT-UHFFFAOYSA-N 0.000 description 1
- JKIAJDUQRRZLAT-UHFFFAOYSA-N 2-cyanoethyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound OCCN(CCO)CCC(=O)OCCC#N JKIAJDUQRRZLAT-UHFFFAOYSA-N 0.000 description 1
- YGXMCRNJWBTNKF-UHFFFAOYSA-N 2-cyanoethyl 3-[bis(2-methoxyethyl)amino]propanoate Chemical compound COCCN(CCOC)CCC(=O)OCCC#N YGXMCRNJWBTNKF-UHFFFAOYSA-N 0.000 description 1
- PDCAPJSACYFMKH-UHFFFAOYSA-N 2-cyanoethyl 3-morpholin-4-ylpropanoate Chemical compound N#CCCOC(=O)CCN1CCOCC1 PDCAPJSACYFMKH-UHFFFAOYSA-N 0.000 description 1
- 125000001731 2-cyanoethyl group Chemical group [H]C([H])(*)C([H])([H])C#N 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- BPGIOCZAQDIBPI-UHFFFAOYSA-N 2-ethoxyethanamine Chemical compound CCOCCN BPGIOCZAQDIBPI-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- NRGGMCIBEHEAIL-UHFFFAOYSA-N 2-ethylpyridine Chemical compound CCC1=CC=CC=N1 NRGGMCIBEHEAIL-UHFFFAOYSA-N 0.000 description 1
- RVSLRESFHNLOQK-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylethanone;methanesulfonic acid Chemical compound CS(O)(=O)=O.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 RVSLRESFHNLOQK-UHFFFAOYSA-N 0.000 description 1
- QYOCMIVPWWBWGX-UHFFFAOYSA-N 2-methoxy-n,n-bis(2-methoxyethyl)ethanamine Chemical compound COCCN(CCOC)CCOC QYOCMIVPWWBWGX-UHFFFAOYSA-N 0.000 description 1
- PSHZXHHHUPZONE-UHFFFAOYSA-N 2-methoxyethyl 2-morpholin-4-ylethyl carbonate Chemical compound COCCOC(=O)OCCN1CCOCC1 PSHZXHHHUPZONE-UHFFFAOYSA-N 0.000 description 1
- NMANYYGJUIRSEY-UHFFFAOYSA-N 2-methoxyethyl 3-[butyl-[3-(2-methoxyethoxy)-3-oxopropyl]amino]propanoate Chemical compound COCCOC(=O)CCN(CCCC)CCC(=O)OCCOC NMANYYGJUIRSEY-UHFFFAOYSA-N 0.000 description 1
- TYZFXMHAWJEFTK-UHFFFAOYSA-N 2-methoxyethyl 3-morpholin-4-ylpropanoate Chemical compound COCCOC(=O)CCN1CCOCC1 TYZFXMHAWJEFTK-UHFFFAOYSA-N 0.000 description 1
- AIWQKIZRPSRBQA-UHFFFAOYSA-N 2-methoxypropan-2-yl acetate Chemical compound COC(C)(C)OC(C)=O AIWQKIZRPSRBQA-UHFFFAOYSA-N 0.000 description 1
- IWTFOFMTUOBLHG-UHFFFAOYSA-N 2-methoxypyridine Chemical compound COC1=CC=CC=N1 IWTFOFMTUOBLHG-UHFFFAOYSA-N 0.000 description 1
- CTSZPNIMMLSKDV-UHFFFAOYSA-N 2-methyl-1-pyrroline Chemical compound CC1=NCCC1 CTSZPNIMMLSKDV-UHFFFAOYSA-N 0.000 description 1
- IIFFFBSAXDNJHX-UHFFFAOYSA-N 2-methyl-n,n-bis(2-methylpropyl)propan-1-amine Chemical compound CC(C)CN(CC(C)C)CC(C)C IIFFFBSAXDNJHX-UHFFFAOYSA-N 0.000 description 1
- NJBCRXCAPCODGX-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)propan-1-amine Chemical compound CC(C)CNCC(C)C NJBCRXCAPCODGX-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- KPRQAVMDNFOHNY-UHFFFAOYSA-N 2-methyloctane-1-sulfonic acid Chemical compound CCCCCCC(C)CS(O)(=O)=O KPRQAVMDNFOHNY-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- RABAYCPGTBMVDB-UHFFFAOYSA-N 2-methylundecane-2-sulfonic acid Chemical compound CCCCCCCCCC(C)(C)S(O)(=O)=O RABAYCPGTBMVDB-UHFFFAOYSA-N 0.000 description 1
- OOSOCAXREAGIGA-UHFFFAOYSA-N 2-morpholin-4-ylacetonitrile Chemical compound N#CCN1CCOCC1 OOSOCAXREAGIGA-UHFFFAOYSA-N 0.000 description 1
- AFODJWLTZZIPDU-UHFFFAOYSA-N 2-morpholin-4-ylethyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCCN1CCOCC1 AFODJWLTZZIPDU-UHFFFAOYSA-N 0.000 description 1
- CKLOUNIALOMLNL-UHFFFAOYSA-N 2-morpholin-4-ylethyl hexadecanoate Chemical compound CCCCCCCCCCCCCCCC(=O)OCCN1CCOCC1 CKLOUNIALOMLNL-UHFFFAOYSA-N 0.000 description 1
- RYNRTQQPJVWDLU-UHFFFAOYSA-N 2-morpholin-4-ylethyl hexanoate Chemical compound CCCCCC(=O)OCCN1CCOCC1 RYNRTQQPJVWDLU-UHFFFAOYSA-N 0.000 description 1
- HLKLWDOLNHEHME-UHFFFAOYSA-N 2-morpholin-4-ylethyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCN1CCOCC1 HLKLWDOLNHEHME-UHFFFAOYSA-N 0.000 description 1
- ZKTLPKQFIRBDNY-UHFFFAOYSA-N 2-morpholin-4-ylethyl octanoate Chemical compound CCCCCCCC(=O)OCCN1CCOCC1 ZKTLPKQFIRBDNY-UHFFFAOYSA-N 0.000 description 1
- LCZMXQMHZRWQTD-UHFFFAOYSA-N 2-morpholin-4-ylethyl tetradecanoate Chemical compound CCCCCCCCCCCCCC(=O)OCCN1CCOCC1 LCZMXQMHZRWQTD-UHFFFAOYSA-N 0.000 description 1
- YRJOBFAKVQTZCE-UHFFFAOYSA-N 2-morpholin-4-ylpropanenitrile Chemical compound N#CC(C)N1CCOCC1 YRJOBFAKVQTZCE-UHFFFAOYSA-N 0.000 description 1
- NSMJMUQZRGZMQC-UHFFFAOYSA-N 2-naphthalen-1-yl-1H-imidazo[4,5-f][1,10]phenanthroline Chemical compound C12=CC=CN=C2C2=NC=CC=C2C2=C1NC(C=1C3=CC=CC=C3C=CC=1)=N2 NSMJMUQZRGZMQC-UHFFFAOYSA-N 0.000 description 1
- DPJCXCZTLWNFOH-UHFFFAOYSA-N 2-nitroaniline Chemical compound NC1=CC=CC=C1[N+]([O-])=O DPJCXCZTLWNFOH-UHFFFAOYSA-N 0.000 description 1
- DXSVEKMQLJOJLA-UHFFFAOYSA-N 2-oxopropyl 3-[bis(2-acetyloxyethyl)amino]propanoate Chemical compound CC(=O)COC(=O)CCN(CCOC(C)=O)CCOC(C)=O DXSVEKMQLJOJLA-UHFFFAOYSA-N 0.000 description 1
- YJMUIOUBJAVDFS-UHFFFAOYSA-N 2-oxopropyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound CC(=O)COC(=O)CCN(CCO)CCO YJMUIOUBJAVDFS-UHFFFAOYSA-N 0.000 description 1
- FTYAXYWEDPWJCJ-UHFFFAOYSA-N 2-pentan-3-ylpyridine Chemical compound CCC(CC)C1=CC=CC=N1 FTYAXYWEDPWJCJ-UHFFFAOYSA-N 0.000 description 1
- ABTMVGZCKVQZHG-UHFFFAOYSA-N 2-pentoxy-N,N-bis(2-pentoxyethyl)ethanamine Chemical compound CCCCCOCCN(CCOCCCCC)CCOCCCCC ABTMVGZCKVQZHG-UHFFFAOYSA-N 0.000 description 1
- CLVBVRODHJFTGF-UHFFFAOYSA-N 2-piperidin-1-ylacetonitrile Chemical compound N#CCN1CCCCC1 CLVBVRODHJFTGF-UHFFFAOYSA-N 0.000 description 1
- BJCDLTBTUIMEOQ-UHFFFAOYSA-N 2-piperidin-1-ylethyl acetate Chemical compound CC(=O)OCCN1CCCCC1 BJCDLTBTUIMEOQ-UHFFFAOYSA-N 0.000 description 1
- ZTDDAUJXOBVPMN-UHFFFAOYSA-N 2-piperidin-1-ylethyl propanoate Chemical compound CCC(=O)OCCN1CCCCC1 ZTDDAUJXOBVPMN-UHFFFAOYSA-N 0.000 description 1
- BXGYBSJAZFGIPX-UHFFFAOYSA-N 2-pyridin-2-ylethanol Chemical compound OCCC1=CC=CC=N1 BXGYBSJAZFGIPX-UHFFFAOYSA-N 0.000 description 1
- NPRYXVXVLCYBNS-UHFFFAOYSA-N 2-pyrrolidin-1-ylacetonitrile Chemical compound N#CCN1CCCC1 NPRYXVXVLCYBNS-UHFFFAOYSA-N 0.000 description 1
- RSEBUVRVKCANEP-UHFFFAOYSA-N 2-pyrroline Chemical compound C1CC=CN1 RSEBUVRVKCANEP-UHFFFAOYSA-N 0.000 description 1
- JZIBVTUXIVIFGC-UHFFFAOYSA-N 2H-pyrrole Chemical compound C1C=CC=N1 JZIBVTUXIVIFGC-UHFFFAOYSA-N 0.000 description 1
- WGTASENVNYJZBK-UHFFFAOYSA-N 3,4,5-trimethoxyamphetamine Chemical compound COC1=CC(CC(C)N)=CC(OC)=C1OC WGTASENVNYJZBK-UHFFFAOYSA-N 0.000 description 1
- MPBZUKLDHPOCLS-UHFFFAOYSA-N 3,5-dinitroaniline Chemical compound NC1=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C1 MPBZUKLDHPOCLS-UHFFFAOYSA-N 0.000 description 1
- QKEWQOJCHPFEAF-UHFFFAOYSA-N 3,6-diaminohexanoic acid Chemical compound NCCCC(N)CC(O)=O QKEWQOJCHPFEAF-UHFFFAOYSA-N 0.000 description 1
- NUYADIDKTLPDGG-UHFFFAOYSA-N 3,6-dimethyloct-4-yne-3,6-diol Chemical compound CCC(C)(O)C#CC(C)(O)CC NUYADIDKTLPDGG-UHFFFAOYSA-N 0.000 description 1
- NZGKZSBTUPGUTQ-UHFFFAOYSA-N 3-(2-methylprop-2-enoyloxy)bicyclo[2.2.1]heptane-4-carboxylic acid Chemical compound C1CC2(C(O)=O)C(OC(=O)C(=C)C)CC1C2 NZGKZSBTUPGUTQ-UHFFFAOYSA-N 0.000 description 1
- LFFKXGFSDGRFQA-UHFFFAOYSA-N 3-(diethylamino)propanenitrile Chemical compound CCN(CC)CCC#N LFFKXGFSDGRFQA-UHFFFAOYSA-N 0.000 description 1
- ZSIRWYMANRZZPE-UHFFFAOYSA-N 3-[bis(2-hydroxyethyl)amino]propanenitrile Chemical compound OCCN(CCO)CCC#N ZSIRWYMANRZZPE-UHFFFAOYSA-N 0.000 description 1
- ZCAZBYJRGHWXKN-UHFFFAOYSA-N 3-[bis[2-(methoxymethoxy)ethyl]amino]propanoic acid Chemical compound COCOCCN(CCC(O)=O)CCOCOC ZCAZBYJRGHWXKN-UHFFFAOYSA-N 0.000 description 1
- FLROJJGKUKLCAE-UHFFFAOYSA-N 3-amino-2-methylphenol Chemical compound CC1=C(N)C=CC=C1O FLROJJGKUKLCAE-UHFFFAOYSA-N 0.000 description 1
- ZAGZIOYVEIDDJA-UHFFFAOYSA-N 3-aminopyrazine-2-carboxylic acid Chemical compound NC1=NC=CN=C1C(O)=O ZAGZIOYVEIDDJA-UHFFFAOYSA-N 0.000 description 1
- PFCHFHIRKBAQGU-UHFFFAOYSA-N 3-hexanone Chemical compound CCCC(=O)CC PFCHFHIRKBAQGU-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- BJATUPPYBZHEIO-UHFFFAOYSA-N 3-methyl-2-phenylpyridine Chemical compound CC1=CC=CN=C1C1=CC=CC=C1 BJATUPPYBZHEIO-UHFFFAOYSA-N 0.000 description 1
- XJCVRTZCHMZPBD-UHFFFAOYSA-N 3-nitroaniline Chemical compound NC1=CC=CC([N+]([O-])=O)=C1 XJCVRTZCHMZPBD-UHFFFAOYSA-N 0.000 description 1
- MECNWXGGNCJFQJ-UHFFFAOYSA-N 3-piperidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCCC1 MECNWXGGNCJFQJ-UHFFFAOYSA-N 0.000 description 1
- MFPZRSWYUKWRIQ-UHFFFAOYSA-N 3-pyrrolidin-1-ylpropane-1,2-diol Chemical compound OCC(O)CN1CCCC1 MFPZRSWYUKWRIQ-UHFFFAOYSA-N 0.000 description 1
- LVNQVIZBPSRXAN-UHFFFAOYSA-N 4,7,13,18-tetraoxa-1,10-diazabicyclo[8.5.5]icosane Chemical compound C1COCCOCCN2CCOCCN1CCOCC2 LVNQVIZBPSRXAN-UHFFFAOYSA-N 0.000 description 1
- QIYPRAYLYAFRHH-UHFFFAOYSA-N 4-[10-[4-(dimethylamino)phenyl]-4-[4-[(2-methylpropan-2-yl)oxy]phenyl]anthracen-9-yl]-N,N-dimethylaniline Chemical compound C(C)(C)(C)OC1=CC=C(C=C1)C1=CC=CC2=C(C3=CC=CC=C3C(=C12)C1=CC=C(C=C1)N(C)C)C1=CC=C(C=C1)N(C)C QIYPRAYLYAFRHH-UHFFFAOYSA-N 0.000 description 1
- LLNPIUABYPBVFJ-UHFFFAOYSA-N 4-[2-(2-methoxyethoxymethoxy)ethyl]morpholine Chemical compound COCCOCOCCN1CCOCC1 LLNPIUABYPBVFJ-UHFFFAOYSA-N 0.000 description 1
- GPNQTMNCYJMZDB-UHFFFAOYSA-N 4-[2-(methoxymethoxy)ethyl]morpholine Chemical compound COCOCCN1CCOCC1 GPNQTMNCYJMZDB-UHFFFAOYSA-N 0.000 description 1
- IAQZPACMPXWRRY-UHFFFAOYSA-N 4-[methyl(methylamino)amino]phenol Chemical compound OC1=CC=C(C=C1)N(NC)C IAQZPACMPXWRRY-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- BLFRQYKZFKYQLO-UHFFFAOYSA-N 4-aminobutan-1-ol Chemical compound NCCCCO BLFRQYKZFKYQLO-UHFFFAOYSA-N 0.000 description 1
- HDHQZCHIXUUSMK-UHFFFAOYSA-N 4-hydroxy-2-quinolone Chemical compound C1=CC=C2C(O)=CC(=O)NC2=C1 HDHQZCHIXUUSMK-UHFFFAOYSA-N 0.000 description 1
- VCLUTORDCGANOB-UHFFFAOYSA-N 4-hydroxybutyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound OCCCCOC(=O)CCN(CCO)CCO VCLUTORDCGANOB-UHFFFAOYSA-N 0.000 description 1
- IULUNTXBHHKFFR-UHFFFAOYSA-N 4-methyl-n,n-diphenylaniline Chemical compound C1=CC(C)=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 IULUNTXBHHKFFR-UHFFFAOYSA-N 0.000 description 1
- YXZXRYDYTRYFAF-UHFFFAOYSA-M 4-methylbenzenesulfonate;triphenylsulfanium Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 YXZXRYDYTRYFAF-UHFFFAOYSA-M 0.000 description 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 description 1
- WMYPMMDDCUOFEX-UHFFFAOYSA-N 4-piperidin-1-yloxolan-2-one Chemical compound C1OC(=O)CC1N1CCCCC1 WMYPMMDDCUOFEX-UHFFFAOYSA-N 0.000 description 1
- RGUKYNXWOWSRET-UHFFFAOYSA-N 4-pyrrolidin-1-ylpyridine Chemical compound C1CCCN1C1=CC=NC=C1 RGUKYNXWOWSRET-UHFFFAOYSA-N 0.000 description 1
- YSHMQTRICHYLGF-UHFFFAOYSA-N 4-tert-butylpyridine Chemical compound CC(C)(C)C1=CC=NC=C1 YSHMQTRICHYLGF-UHFFFAOYSA-N 0.000 description 1
- HPNYOOZSOLWQAQ-UHFFFAOYSA-N 5-[diazo-(4-hexoxy-3,5-dimethylphenyl)sulfonylmethyl]sulfonyl-2-hexoxy-1,3-dimethylbenzene Chemical compound C1=C(C)C(OCCCCCC)=C(C)C=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC(C)=C(OCCCCCC)C(C)=C1 HPNYOOZSOLWQAQ-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- YEHCRJVIRISVRJ-UHFFFAOYSA-N 7-methyl-decanoic acid Chemical compound CCCC(C)CCCCCC(O)=O YEHCRJVIRISVRJ-UHFFFAOYSA-N 0.000 description 1
- HUFKTRBTUGKAJF-UHFFFAOYSA-N 7-methyloctane-1-sulfonic acid Chemical compound CC(C)CCCCCCS(O)(=O)=O HUFKTRBTUGKAJF-UHFFFAOYSA-N 0.000 description 1
- ROWKCXLLOLDVIO-UHFFFAOYSA-N 7-oxabicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid Chemical compound O1C2C=CC1C(C(=O)O)C2C(O)=O ROWKCXLLOLDVIO-UHFFFAOYSA-N 0.000 description 1
- UYLYISCHTFVYHN-UHFFFAOYSA-N 7-oxabicyclo[2.2.1]heptane-3-carboxylic acid Chemical group C1CC2C(C(=O)O)CC1O2 UYLYISCHTFVYHN-UHFFFAOYSA-N 0.000 description 1
- CYSPWCARDHRYJX-UHFFFAOYSA-N 9h-fluoren-1-amine Chemical compound C12=CC=CC=C2CC2=C1C=CC=C2N CYSPWCARDHRYJX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical class NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 239000004475 Arginine Substances 0.000 description 1
- XNCOSPRUTUOJCJ-UHFFFAOYSA-N Biguanide Chemical compound NC(N)=NC(N)=N XNCOSPRUTUOJCJ-UHFFFAOYSA-N 0.000 description 1
- 229940123208 Biguanide Drugs 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ROJFUUGOZWBXRM-UHFFFAOYSA-N C(#N)CCOC(=O)N1C(CCC1)=O Chemical compound C(#N)CCOC(=O)N1C(CCC1)=O ROJFUUGOZWBXRM-UHFFFAOYSA-N 0.000 description 1
- XCETVINZSWAVPK-UHFFFAOYSA-N C(C)(C)(C)OC=1C=C(C=CC1OC(C)(C)C)N(NC1=CC=CC=C1)C1=CC=CC=C1 Chemical compound C(C)(C)(C)OC=1C=C(C=CC1OC(C)(C)C)N(NC1=CC=CC=C1)C1=CC=CC=C1 XCETVINZSWAVPK-UHFFFAOYSA-N 0.000 description 1
- SXGZQTCFOPUHQV-UHFFFAOYSA-N C(C)OCCCN(CCC(=O)OC)CCC(=O)OC Chemical compound C(C)OCCCN(CCC(=O)OC)CCC(=O)OC SXGZQTCFOPUHQV-UHFFFAOYSA-N 0.000 description 1
- DCCQHOUBYQGBOP-UHFFFAOYSA-N C(C)OCCN(CCC(=O)OC)CCC(=O)OC Chemical compound C(C)OCCN(CCC(=O)OC)CCC(=O)OC DCCQHOUBYQGBOP-UHFFFAOYSA-N 0.000 description 1
- ROGSMRYRQXSHCR-UHFFFAOYSA-N C(C)OCCN(CCC(=O)OCC)CCC(=O)OCC Chemical compound C(C)OCCN(CCC(=O)OCC)CCC(=O)OCC ROGSMRYRQXSHCR-UHFFFAOYSA-N 0.000 description 1
- ZYBHIJPBJPOYOO-UHFFFAOYSA-N C(CC)OS(=O)=O.FC(C(=NO)C1=CC=C(C=C1)OS(=O)(=O)C)(F)F Chemical compound C(CC)OS(=O)=O.FC(C(=NO)C1=CC=C(C=C1)OS(=O)(=O)C)(F)F ZYBHIJPBJPOYOO-UHFFFAOYSA-N 0.000 description 1
- PYKZFTQTKPTJQG-UHFFFAOYSA-N C(CCC)OC=1C=C(C=CC1OCCCC)C=1C(=C(C2=CC3=CC=CC=C3C=C2C1)C1=CC(=C(C=C1)OCCCC)OCCCC)C1=CC(=C(C=C1)OCCCC)OCCCC Chemical compound C(CCC)OC=1C=C(C=CC1OCCCC)C=1C(=C(C2=CC3=CC=CC=C3C=C2C1)C1=CC(=C(C=C1)OCCCC)OCCCC)C1=CC(=C(C=C1)OCCCC)OCCCC PYKZFTQTKPTJQG-UHFFFAOYSA-N 0.000 description 1
- RSNREDJNRXKHRG-UHFFFAOYSA-N C(CCCCCCCCCCC)C1=CC=C(C=C1)S(=O)(=O)C1=C(C=2CC3=CC=CC=C3C2C=C1)C(C#N)C1=CC=CC=C1 Chemical compound C(CCCCCCCCCCC)C1=CC=C(C=C1)S(=O)(=O)C1=C(C=2CC3=CC=CC=C3C2C=C1)C(C#N)C1=CC=CC=C1 RSNREDJNRXKHRG-UHFFFAOYSA-N 0.000 description 1
- FYRDTGZSWOXFLD-UHFFFAOYSA-N C(CCCCCCCCCCC)N(NC1=C(C=CC(=C1)OC)CC#N)S(=O)(=O)C1=CC=CC=C1 Chemical compound C(CCCCCCCCCCC)N(NC1=C(C=CC(=C1)OC)CC#N)S(=O)(=O)C1=CC=CC=C1 FYRDTGZSWOXFLD-UHFFFAOYSA-N 0.000 description 1
- VMLZACXEUKPZCX-UHFFFAOYSA-N C.C(CCC)OC(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C=C1)C Chemical compound C.C(CCC)OC(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C=C1)C VMLZACXEUKPZCX-UHFFFAOYSA-N 0.000 description 1
- JVFDADFMKQKAHW-UHFFFAOYSA-N C.[N] Chemical compound C.[N] JVFDADFMKQKAHW-UHFFFAOYSA-N 0.000 description 1
- DQUGFDFBSJFPBC-UHFFFAOYSA-N C1(=CC=CC=C1)C1(OCCO1)CCOS(=O)(=O)CC1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C1(OCCO1)CCOS(=O)(=O)CC1=CC=CC=C1 DQUGFDFBSJFPBC-UHFFFAOYSA-N 0.000 description 1
- YSAPNICNKSUSMN-UHFFFAOYSA-N C1(=CC=CC=C1)S(=O)(=O)NNC(C#N)C1=C(C=C(C=C1)Cl)Cl Chemical compound C1(=CC=CC=C1)S(=O)(=O)NNC(C#N)C1=C(C=C(C=C1)Cl)Cl YSAPNICNKSUSMN-UHFFFAOYSA-N 0.000 description 1
- MOFCXMMNAUGXFY-UHFFFAOYSA-N C1(=CC=CC=C1)S(=O)(=O)NNC(C#N)C1=CC=C(C=C1)Cl Chemical compound C1(=CC=CC=C1)S(=O)(=O)NNC(C#N)C1=CC=C(C=C1)Cl MOFCXMMNAUGXFY-UHFFFAOYSA-N 0.000 description 1
- VZSOQRBRAXIKQW-UHFFFAOYSA-N C1(=CC=CC=C1)S(=O)(=O)NNC(C#N)C1=CC=C(C=C1)OC Chemical compound C1(=CC=CC=C1)S(=O)(=O)NNC(C#N)C1=CC=C(C=C1)OC VZSOQRBRAXIKQW-UHFFFAOYSA-N 0.000 description 1
- IJCSBHIMSUNCFI-UHFFFAOYSA-N CC(C(=O)OC)CN1C=CC=C1 Chemical compound CC(C(=O)OC)CN1C=CC=C1 IJCSBHIMSUNCFI-UHFFFAOYSA-N 0.000 description 1
- SHWLFHXYKOWPRW-UHFFFAOYSA-N CC(C)(C)C1=CC=CC=C1.C(C=C1)=CC=C1PC1=CC=CC=C1 Chemical compound CC(C)(C)C1=CC=CC=C1.C(C=C1)=CC=C1PC1=CC=CC=C1 SHWLFHXYKOWPRW-UHFFFAOYSA-N 0.000 description 1
- UACMZTNXBURPQW-UHFFFAOYSA-N CC(C)(C)PON(OPC(C)(C)C)OPC(C)(C)C Chemical compound CC(C)(C)PON(OPC(C)(C)C)OPC(C)(C)C UACMZTNXBURPQW-UHFFFAOYSA-N 0.000 description 1
- HKCDHTLLGDVHBI-UHFFFAOYSA-N CC1=CC=C(C=C1)S(=O)(=O)C(CCCCC=1C(=C(C=CC1)C(C#N)C1=CC=CC=C1)C1SCC=C1)CCCC Chemical compound CC1=CC=C(C=C1)S(=O)(=O)C(CCCCC=1C(=C(C=CC1)C(C#N)C1=CC=CC=C1)C1SCC=C1)CCCC HKCDHTLLGDVHBI-UHFFFAOYSA-N 0.000 description 1
- WAXZAOVEJRGCSQ-UHFFFAOYSA-N CC1=CC=C(C=C1)S(=O)(=O)NNC(C#N)C1=CC=CC=C1 Chemical compound CC1=CC=C(C=C1)S(=O)(=O)NNC(C#N)C1=CC=CC=C1 WAXZAOVEJRGCSQ-UHFFFAOYSA-N 0.000 description 1
- RYFOANIQFIACND-UHFFFAOYSA-N CC1=CC=C(C=C1)S(=O)(=O)NNC1=C(C=CC(=C1)OC)CC#N Chemical compound CC1=CC=C(C=C1)S(=O)(=O)NNC1=C(C=CC(=C1)OC)CC#N RYFOANIQFIACND-UHFFFAOYSA-N 0.000 description 1
- DYBAEBPBRPBNMM-UHFFFAOYSA-N CCC(C)PON(OPC(C)CC)OPC(C)CC Chemical compound CCC(C)PON(OPC(C)CC)OPC(C)CC DYBAEBPBRPBNMM-UHFFFAOYSA-N 0.000 description 1
- LQJAEMJPPZGENS-UHFFFAOYSA-N CC[Au] Chemical compound CC[Au] LQJAEMJPPZGENS-UHFFFAOYSA-N 0.000 description 1
- MJDVOIUDTATXTD-UHFFFAOYSA-N COCC(=O)OCCN1C=CC=C1 Chemical compound COCC(=O)OCCN1C=CC=C1 MJDVOIUDTATXTD-UHFFFAOYSA-N 0.000 description 1
- LAXNOHMKBZJFIE-UHFFFAOYSA-N COCCN(CCC(=O)C#N)CCOC Chemical compound COCCN(CCC(=O)C#N)CCOC LAXNOHMKBZJFIE-UHFFFAOYSA-N 0.000 description 1
- QTWLNEARDJOAND-UHFFFAOYSA-N COCCN(CCOC)CCC(=O)OCCCCOC=O Chemical compound COCCN(CCOC)CCC(=O)OCCCCOC=O QTWLNEARDJOAND-UHFFFAOYSA-N 0.000 description 1
- QYGVBVQWOBBCDO-UHFFFAOYSA-N COCCOCCOC(CCN1C=CC=C1)=O Chemical compound COCCOCCOC(CCN1C=CC=C1)=O QYGVBVQWOBBCDO-UHFFFAOYSA-N 0.000 description 1
- CHGUHFHPVXQIQA-UHFFFAOYSA-N CS(=O)(=O)C(=[N+]=[N-])C1=NC2=CC=CC=C2C=N1 Chemical compound CS(=O)(=O)C(=[N+]=[N-])C1=NC2=CC=CC=C2C=N1 CHGUHFHPVXQIQA-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- QLDJWGFARFDWCG-UHFFFAOYSA-N ClC1=C(C=CC=C1)S(=O)(=O)NNC(C#N)(C1=CC=CC=C1)C1=CC=C(C=C1)OC Chemical compound ClC1=C(C=CC=C1)S(=O)(=O)NNC(C#N)(C1=CC=CC=C1)C1=CC=C(C=C1)OC QLDJWGFARFDWCG-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- BUFYYWQVVYONCA-UHFFFAOYSA-M FC(C(C(S(=O)(=O)[O-])(F)F)(F)F)C.C1(=CC=CC=C1)[S+](C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound FC(C(C(S(=O)(=O)[O-])(F)F)(F)F)C.C1(=CC=CC=C1)[S+](C1=CC=CC=C1)C1=CC=CC=C1 BUFYYWQVVYONCA-UHFFFAOYSA-M 0.000 description 1
- NYHBQMYGNKIUIF-UUOKFMHZSA-N Guanosine Chemical class C1=NC=2C(=O)NC(N)=NC=2N1[C@@H]1O[C@H](CO)[C@@H](O)[C@H]1O NYHBQMYGNKIUIF-UUOKFMHZSA-N 0.000 description 1
- WJYIASZWHGOTOU-UHFFFAOYSA-N Heptylamine Chemical compound CCCCCCCN WJYIASZWHGOTOU-UHFFFAOYSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- ODKSFYDXXFIFQN-BYPYZUCNSA-P L-argininium(2+) Chemical compound NC(=[NH2+])NCCC[C@H]([NH3+])C(O)=O ODKSFYDXXFIFQN-BYPYZUCNSA-P 0.000 description 1
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- FFEARJCKVFRZRR-BYPYZUCNSA-N L-methionine Chemical compound CSCC[C@H](N)C(O)=O FFEARJCKVFRZRR-BYPYZUCNSA-N 0.000 description 1
- COLNVLDHVKWLRT-QMMMGPOBSA-N L-phenylalanine Chemical compound OC(=O)[C@@H](N)CC1=CC=CC=C1 COLNVLDHVKWLRT-QMMMGPOBSA-N 0.000 description 1
- AYFVYJQAPQTCCC-GBXIJSLDSA-N L-threonine Chemical compound C[C@@H](O)[C@H](N)C(O)=O AYFVYJQAPQTCCC-GBXIJSLDSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 229910016006 MoSi Inorganic materials 0.000 description 1
- YBXSDBPKCFWIEI-UHFFFAOYSA-N N'-(2,2,3,3,4,4,5,5,6,6-decafluoro-1-hydrazinylhexyl)-1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonohydrazide Chemical compound FC(C(NNS(=O)(=O)C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)NN)(C(C(C(C(F)F)(F)F)(F)F)(F)F)F YBXSDBPKCFWIEI-UHFFFAOYSA-N 0.000 description 1
- GPRGKIFPOLCMAD-UHFFFAOYSA-N N'-[2,2,3,3,4,4,5,5,6,6-decafluoro-1-(1H-indol-2-yl)hexyl]-1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonohydrazide Chemical compound FC(C(NNS(=O)(=O)C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)C=1NC2=CC=CC=C2C1)(C(C(C(C(F)F)(F)F)(F)F)(F)F)F GPRGKIFPOLCMAD-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- AKNUHUCEWALCOI-UHFFFAOYSA-N N-ethyldiethanolamine Chemical compound OCCN(CC)CCO AKNUHUCEWALCOI-UHFFFAOYSA-N 0.000 description 1
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- LWGGMKLSCPJOHC-UHFFFAOYSA-N N1(C=CC=C1)CC1C(=O)OCC1 Chemical compound N1(C=CC=C1)CC1C(=O)OCC1 LWGGMKLSCPJOHC-UHFFFAOYSA-N 0.000 description 1
- GZOOCQXQEHNIHG-UHFFFAOYSA-N N1CC(CCC1)C(C(=O)OC1CCCCC1)C Chemical compound N1CC(CCC1)C(C(=O)OC1CCCCC1)C GZOOCQXQEHNIHG-UHFFFAOYSA-N 0.000 description 1
- CMYYGQJKBMFEHK-UHFFFAOYSA-N NCC(CO)C#N Chemical compound NCC(CO)C#N CMYYGQJKBMFEHK-UHFFFAOYSA-N 0.000 description 1
- GKUSWDVMIJXRGQ-UHFFFAOYSA-N O1NC=CC=C1.OCCOCCN1CCCCC1 Chemical compound O1NC=CC=C1.OCCOCCN1CCCCC1 GKUSWDVMIJXRGQ-UHFFFAOYSA-N 0.000 description 1
- YXIMXXVWTYCWJI-UHFFFAOYSA-N OCCOC(CCN1C=CC=C1)=O Chemical compound OCCOC(CCN1C=CC=C1)=O YXIMXXVWTYCWJI-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- UDGYTYCXHNGOME-UHFFFAOYSA-N S(=O)(=O)([O-])C1=CC=C(C)C=C1.C(C)(C)(C)OC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound S(=O)(=O)([O-])C1=CC=C(C)C=C1.C(C)(C)(C)OC1=CC=C(C=C1)[PH+](C1=CC=CC=C1)C1=CC=CC=C1 UDGYTYCXHNGOME-UHFFFAOYSA-N 0.000 description 1
- 229910004541 SiN Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- AYFVYJQAPQTCCC-UHFFFAOYSA-N Threonine Natural products CC(O)C(N)C(O)=O AYFVYJQAPQTCCC-UHFFFAOYSA-N 0.000 description 1
- 239000004473 Threonine Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical class O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 1
- 229910008812 WSi Inorganic materials 0.000 description 1
- UHQIGPGGBRBODL-UHFFFAOYSA-N [1-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(C(O)(C(F)(F)F)C(F)(F)F)CCCCC1 UHQIGPGGBRBODL-UHFFFAOYSA-N 0.000 description 1
- YBSKPPANKDFECB-UHFFFAOYSA-N [1-(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl] prop-2-enoate Chemical compound C=CC(=O)OC1(C(C(F)(F)F)(C(F)(F)F)O)CCCCC1 YBSKPPANKDFECB-UHFFFAOYSA-N 0.000 description 1
- VFQGGNGFYCBWLY-UHFFFAOYSA-N [4,4-bis(1,1,1,3,3,3-hexafluoro-2-hydroxypropan-2-yl)cyclohexyl] 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OC1CCC(CC1)(C(C(F)(F)F)(O)C(F)(F)F)C(C(F)(F)F)(C(F)(F)F)O VFQGGNGFYCBWLY-UHFFFAOYSA-N 0.000 description 1
- ZUSQIFOBBBRZIR-UHFFFAOYSA-N [4-(2,2,2-trifluoroacetyl)phenyl] acetate Chemical compound CC(=O)OC1=CC=C(C(=O)C(F)(F)F)C=C1 ZUSQIFOBBBRZIR-UHFFFAOYSA-N 0.000 description 1
- ZAMVCAOJUFVRMY-UHFFFAOYSA-N [4-[(2-methylpropan-2-yl)oxy]phenyl]-diphenylphosphane Chemical compound C1=CC(OC(C)(C)C)=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 ZAMVCAOJUFVRMY-UHFFFAOYSA-N 0.000 description 1
- XKMKQFBRTQEVQI-UHFFFAOYSA-N [4-[(2-methylpropan-2-yl)oxy]phenyl]-phenyliodanium Chemical compound C1=CC(OC(C)(C)C)=CC=C1[I+]C1=CC=CC=C1 XKMKQFBRTQEVQI-UHFFFAOYSA-N 0.000 description 1
- PXQPGXKAKFNIEX-UHFFFAOYSA-N [4-[(4-acetyloxyphenyl)sulfonyl-diazomethyl]sulfonylphenyl] acetate Chemical compound C1=CC(OC(=O)C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(OC(C)=O)C=C1 PXQPGXKAKFNIEX-UHFFFAOYSA-N 0.000 description 1
- VFORUXULQXRMMF-UHFFFAOYSA-N [4-[diazo-(4-methylsulfonyloxyphenyl)sulfonylmethyl]sulfonylphenyl] methanesulfonate Chemical compound C1=CC(OS(=O)(=O)C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(OS(C)(=O)=O)C=C1 VFORUXULQXRMMF-UHFFFAOYSA-N 0.000 description 1
- QMAFOGRWFVLZKU-UHFFFAOYSA-N [4-[diazo-[4-(4-methylphenyl)sulfonyloxyphenyl]sulfonylmethyl]sulfonylphenyl] 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC1=CC=C(S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C=2C=CC(OS(=O)(=O)C=3C=CC(C)=CC=3)=CC=2)C=C1 QMAFOGRWFVLZKU-UHFFFAOYSA-N 0.000 description 1
- ZKQDSROHZVFLAV-UHFFFAOYSA-N [N+](=O)([O-])C1=CC=C(C=C1)S(=O)(=O)NNC(C#N)C1=CC=CC=C1 Chemical compound [N+](=O)([O-])C1=CC=C(C=C1)S(=O)(=O)NNC(C#N)C1=CC=CC=C1 ZKQDSROHZVFLAV-UHFFFAOYSA-N 0.000 description 1
- JREJFORMHFDSQH-UHFFFAOYSA-N [N+](=[N-])=C.CC=1C=C(C=C(C1OCCCCCC)C)S(=O)(=O)O Chemical compound [N+](=[N-])=C.CC=1C=C(C=C(C1OCCCCCC)C)S(=O)(=O)O JREJFORMHFDSQH-UHFFFAOYSA-N 0.000 description 1
- ZICVDKKVKUHNIN-UHFFFAOYSA-N [[cyano-[3-(c-cyano-n-methylsulfonyloxycarbonimidoyl)phenyl]methylidene]amino] methanesulfonate Chemical compound CS(=O)(=O)ON=C(C#N)C1=CC=CC(C(=NOS(C)(=O)=O)C#N)=C1 ZICVDKKVKUHNIN-UHFFFAOYSA-N 0.000 description 1
- QFKJMDYQKVPGNM-UHFFFAOYSA-N [benzenesulfonyl(diazo)methyl]sulfonylbenzene Chemical compound C=1C=CC=CC=1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=CC=C1 QFKJMDYQKVPGNM-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- IQLPFDASDYSGCB-UHFFFAOYSA-N acetonitrile;2-(2-hydroxyethylamino)ethanol Chemical compound CC#N.OCCNCCO IQLPFDASDYSGCB-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 150000001251 acridines Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000003835 adenosine derivatives Chemical class 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000003862 amino acid derivatives Chemical class 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- 150000003927 aminopyridines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000001448 anilines Chemical class 0.000 description 1
- 125000002178 anthracenyl group Chemical group C1(=CC=CC2=CC3=CC=CC=C3C=C12)* 0.000 description 1
- 229940027991 antiseptic and disinfectant quinoline derivative Drugs 0.000 description 1
- ODKSFYDXXFIFQN-UHFFFAOYSA-N arginine Natural products OC(=O)C(N)CCCNC(N)=N ODKSFYDXXFIFQN-UHFFFAOYSA-N 0.000 description 1
- 235000009697 arginine Nutrition 0.000 description 1
- 235000003704 aspartic acid Nutrition 0.000 description 1
- QCHNSJNRFSOCLJ-UHFFFAOYSA-N benzenesulfonylmethylsulfonylbenzene Chemical compound C=1C=CC=CC=1S(=O)(=O)CS(=O)(=O)C1=CC=CC=C1 QCHNSJNRFSOCLJ-UHFFFAOYSA-N 0.000 description 1
- FMCQFYCLUGGPPB-UHFFFAOYSA-N benzhydrylhydrazine Chemical compound C=1C=CC=CC=1C(NN)C1=CC=CC=C1 FMCQFYCLUGGPPB-UHFFFAOYSA-N 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 239000005380 borophosphosilicate glass Substances 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- XZLBQUKKKNMMJF-UHFFFAOYSA-N butane-1-sulfonic acid;2-hydroxy-1,2-diphenylethanone Chemical compound CCCCS(O)(=O)=O.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 XZLBQUKKKNMMJF-UHFFFAOYSA-N 0.000 description 1
- PMSGJXMYHUSZEI-UHFFFAOYSA-N butanedioic acid;pyrrolidine-2,5-dione Chemical compound O=C1CCC(=O)N1.OC(=O)CCC(O)=O PMSGJXMYHUSZEI-UHFFFAOYSA-N 0.000 description 1
- YFNONBGXNFCTMM-UHFFFAOYSA-N butoxybenzene Chemical group CCCCOC1=CC=CC=C1 YFNONBGXNFCTMM-UHFFFAOYSA-N 0.000 description 1
- BBONZYOYSUGYFA-UHFFFAOYSA-N butyl 3-morpholin-4-ylpropanoate Chemical compound CCCCOC(=O)CCN1CCOCC1 BBONZYOYSUGYFA-UHFFFAOYSA-N 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- 229960000846 camphor Drugs 0.000 description 1
- 125000000609 carbazolyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- ITWRPPIZQLHLMS-UHFFFAOYSA-N cyanomethyl 3-[bis(2-formyloxyethyl)amino]propanoate Chemical compound O=COCCN(CCOC=O)CCC(=O)OCC#N ITWRPPIZQLHLMS-UHFFFAOYSA-N 0.000 description 1
- WMSZCDBKTRDZRY-UHFFFAOYSA-N cyanomethyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound OCCN(CCO)CCC(=O)OCC#N WMSZCDBKTRDZRY-UHFFFAOYSA-N 0.000 description 1
- OIGDRJMQKSIMEE-UHFFFAOYSA-N cyanomethyl 3-morpholin-4-ylpropanoate Chemical compound N#CCOC(=O)CCN1CCOCC1 OIGDRJMQKSIMEE-UHFFFAOYSA-N 0.000 description 1
- MSSSIIZBSGQTLN-UHFFFAOYSA-N cyanomethyl 3-piperidin-1-ylpropanoate Chemical compound N#CCOC(=O)CCN1CCCCC1 MSSSIIZBSGQTLN-UHFFFAOYSA-N 0.000 description 1
- KRBMMMNHJBCYDS-UHFFFAOYSA-N cyanomethyl 3-pyrrolidin-1-ylpropanoate Chemical compound N#CCOC(=O)CCN1CCCC1 KRBMMMNHJBCYDS-UHFFFAOYSA-N 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- DCGOXOKVFBZBJG-UHFFFAOYSA-N cyclohexyl 2-[2-[bis[2-(2-cyclohexyloxy-2-oxoethoxy)ethyl]amino]ethoxy]acetate Chemical compound C1CCCCC1OC(=O)COCCN(CCOCC(=O)OC1CCCCC1)CCOCC(=O)OC1CCCCC1 DCGOXOKVFBZBJG-UHFFFAOYSA-N 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- GCFAUZGWPDYAJN-UHFFFAOYSA-N cyclohexyl 3-phenylprop-2-enoate Chemical compound C=1C=CC=CC=1C=CC(=O)OC1CCCCC1 GCFAUZGWPDYAJN-UHFFFAOYSA-N 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- NISGSNTVMOOSJQ-UHFFFAOYSA-N cyclopentanamine Chemical compound NC1CCCC1 NISGSNTVMOOSJQ-UHFFFAOYSA-N 0.000 description 1
- JBDSSBMEKXHSJF-UHFFFAOYSA-N cyclopentanecarboxylic acid Chemical group OC(=O)C1CCCC1 JBDSSBMEKXHSJF-UHFFFAOYSA-N 0.000 description 1
- 125000004851 cyclopentylmethyl group Chemical group C1(CCCC1)C* 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 229910000071 diazene Inorganic materials 0.000 description 1
- CSYSRRCOBYEGPI-UHFFFAOYSA-N diazo(sulfonyl)methane Chemical compound [N-]=[N+]=C=S(=O)=O CSYSRRCOBYEGPI-UHFFFAOYSA-N 0.000 description 1
- OWLFYHDOEWVUJB-UHFFFAOYSA-N diazomethanethiol Chemical compound SC=[N+]=[N-] OWLFYHDOEWVUJB-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- LAWOZCWGWDVVSG-UHFFFAOYSA-N dioctylamine Chemical compound CCCCCCCCNCCCCCCCC LAWOZCWGWDVVSG-UHFFFAOYSA-N 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- XBRDBODLCHKXHI-UHFFFAOYSA-N epolamine Chemical compound OCCN1CCCC1 XBRDBODLCHKXHI-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- CXOBWJYMBBMTBX-UHFFFAOYSA-N ethyl 2-[bis(2-ethoxy-2-oxoethyl)amino]acetate Chemical compound CCOC(=O)CN(CC(=O)OCC)CC(=O)OCC CXOBWJYMBBMTBX-UHFFFAOYSA-N 0.000 description 1
- ZWCRLFIZIYVXMG-UHFFFAOYSA-N ethyl 2-acetyloxyacetate Chemical compound CCOC(=O)COC(C)=O ZWCRLFIZIYVXMG-UHFFFAOYSA-N 0.000 description 1
- XNFYRQFECVTJBW-UHFFFAOYSA-N ethyl 2-pyrrol-1-ylacetate Chemical compound CCOC(=O)CN1C=CC=C1 XNFYRQFECVTJBW-UHFFFAOYSA-N 0.000 description 1
- ZDTXSAWFZDETGN-UHFFFAOYSA-N ethyl 3-[(3-ethoxy-3-oxopropyl)-(2-hydroxyethyl)amino]propanoate Chemical compound CCOC(=O)CCN(CCO)CCC(=O)OCC ZDTXSAWFZDETGN-UHFFFAOYSA-N 0.000 description 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 1
- WRBIQTVRBWJCQT-UHFFFAOYSA-N ethyl 3-morpholin-4-ylpropanoate Chemical compound CCOC(=O)CCN1CCOCC1 WRBIQTVRBWJCQT-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- BTZNPZMHENLISZ-UHFFFAOYSA-M fluoromethanesulfonate Chemical compound [O-]S(=O)(=O)CF BTZNPZMHENLISZ-UHFFFAOYSA-M 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- JKFAIQOWCVVSKC-UHFFFAOYSA-N furazan Chemical class C=1C=NON=1 JKFAIQOWCVVSKC-UHFFFAOYSA-N 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical class O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 125000004441 haloalkylsulfonyl group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 125000004857 imidazopyridinyl group Chemical class N1C(=NC2=C1C=CC=N2)* 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
- ZPLNASMNUBJSDR-UHFFFAOYSA-N isoindole-1,3-dione Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1.C1=CC=C2C(=O)NC(=O)C2=C1 ZPLNASMNUBJSDR-UHFFFAOYSA-N 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 150000002537 isoquinolines Chemical class 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000000686 lactone group Chemical group 0.000 description 1
- VMPHSYLJUKZBJJ-UHFFFAOYSA-N lauric acid triglyceride Natural products CCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCC)COC(=O)CCCCCCCCCCC VMPHSYLJUKZBJJ-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229930182817 methionine Natural products 0.000 description 1
- RMIODHQZRUFFFF-UHFFFAOYSA-M methoxyacetate Chemical compound COCC([O-])=O RMIODHQZRUFFFF-UHFFFAOYSA-M 0.000 description 1
- NHKRXCTYPGGSTL-UHFFFAOYSA-N methyl 2-[bis(2-methoxy-2-oxoethyl)amino]acetate Chemical compound COC(=O)CN(CC(=O)OC)CC(=O)OC NHKRXCTYPGGSTL-UHFFFAOYSA-N 0.000 description 1
- FBGFQFGNJVSNPX-UHFFFAOYSA-N methyl 2-[hexyl-(2-methoxy-2-oxoethyl)amino]acetate Chemical compound CCCCCCN(CC(=O)OC)CC(=O)OC FBGFQFGNJVSNPX-UHFFFAOYSA-N 0.000 description 1
- BIZHVSVBWFSYOJ-UHFFFAOYSA-N methyl 2-morpholin-4-ylethyl carbonate Chemical compound COC(=O)OCCN1CCOCC1 BIZHVSVBWFSYOJ-UHFFFAOYSA-N 0.000 description 1
- OPBIIWZNARGYFG-UHFFFAOYSA-N methyl 3-[2-acetyloxyethyl(2-cyanoethyl)amino]propanoate Chemical compound COC(=O)CCN(CCC#N)CCOC(C)=O OPBIIWZNARGYFG-UHFFFAOYSA-N 0.000 description 1
- ODOCEKVZTLEAAP-UHFFFAOYSA-N methyl 3-[2-hydroxyethyl-(3-methoxy-3-oxopropyl)amino]propanoate Chemical compound COC(=O)CCN(CCO)CCC(=O)OC ODOCEKVZTLEAAP-UHFFFAOYSA-N 0.000 description 1
- IGKVCDVHPHVMFY-UHFFFAOYSA-N methyl 3-[2-methoxyethyl-(3-methoxy-3-oxopropyl)amino]propanoate Chemical compound COC(=O)CCN(CCOC)CCC(=O)OC IGKVCDVHPHVMFY-UHFFFAOYSA-N 0.000 description 1
- CFZRAJIVMQHILQ-UHFFFAOYSA-N methyl 3-[3-hydroxypropyl-(3-methoxy-3-oxopropyl)amino]propanoate Chemical compound COC(=O)CCN(CCCO)CCC(=O)OC CFZRAJIVMQHILQ-UHFFFAOYSA-N 0.000 description 1
- PDLCQBOPNILNFH-UHFFFAOYSA-N methyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound COC(=O)CCN(CCO)CCO PDLCQBOPNILNFH-UHFFFAOYSA-N 0.000 description 1
- BHTBQFHOJIBPKY-UHFFFAOYSA-N methyl 3-[bis(2-methoxyethyl)amino]propanoate Chemical compound COCCN(CCOC)CCC(=O)OC BHTBQFHOJIBPKY-UHFFFAOYSA-N 0.000 description 1
- YDNHCHDMPIHHGH-UHFFFAOYSA-N methyl 3-[bis(3-methoxy-3-oxopropyl)amino]propanoate Chemical compound COC(=O)CCN(CCC(=O)OC)CCC(=O)OC YDNHCHDMPIHHGH-UHFFFAOYSA-N 0.000 description 1
- BMJNUOYYIYNPJI-UHFFFAOYSA-N methyl 3-[butyl-(3-methoxy-3-oxopropyl)amino]propanoate Chemical compound COC(=O)CCN(CCCC)CCC(=O)OC BMJNUOYYIYNPJI-UHFFFAOYSA-N 0.000 description 1
- BKQUFNJLMGRJHL-UHFFFAOYSA-N methyl 3-[cyanomethyl(2-hydroxyethyl)amino]propanoate Chemical compound COC(=O)CCN(CCO)CC#N BKQUFNJLMGRJHL-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- YMSLLIGKMYXCPK-UHFFFAOYSA-N methyl 3-morpholin-4-ylpropanoate Chemical compound COC(=O)CCN1CCOCC1 YMSLLIGKMYXCPK-UHFFFAOYSA-N 0.000 description 1
- PMQPGLUUFXDPFM-UHFFFAOYSA-N methyl 3-pyrrol-1-ylpropanoate Chemical compound COC(=O)CCN1C=CC=C1 PMQPGLUUFXDPFM-UHFFFAOYSA-N 0.000 description 1
- DWPMBFQVLPPIRK-UHFFFAOYSA-N methyl 3-thiomorpholin-4-ylpropanoate Chemical compound COC(=O)CCN1CCSCC1 DWPMBFQVLPPIRK-UHFFFAOYSA-N 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002780 morpholines Chemical class 0.000 description 1
- DILRJUIACXKSQE-UHFFFAOYSA-N n',n'-dimethylethane-1,2-diamine Chemical compound CN(C)CCN DILRJUIACXKSQE-UHFFFAOYSA-N 0.000 description 1
- FRQONEWDWWHIPM-UHFFFAOYSA-N n,n-dicyclohexylcyclohexanamine Chemical compound C1CCCCC1N(C1CCCCC1)C1CCCCC1 FRQONEWDWWHIPM-UHFFFAOYSA-N 0.000 description 1
- NILJCGYQNXKIRL-UHFFFAOYSA-N n,n-dicyclopentylcyclopentanamine Chemical compound C1CCCC1N(C1CCCC1)C1CCCC1 NILJCGYQNXKIRL-UHFFFAOYSA-N 0.000 description 1
- CLZGJKHEVKJLLS-UHFFFAOYSA-N n,n-diheptylheptan-1-amine Chemical compound CCCCCCCN(CCCCCCC)CCCCCCC CLZGJKHEVKJLLS-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- PSHKMPUSSFXUIA-UHFFFAOYSA-N n,n-dimethylpyridin-2-amine Chemical compound CN(C)C1=CC=CC=N1 PSHKMPUSSFXUIA-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- PDYUCXOQBNSGKN-UHFFFAOYSA-N n-[2,2,2-trifluoro-1-(2,4,6-trimethylphenyl)ethylidene]hydroxylamine Chemical compound CC1=CC(C)=C(C(=NO)C(F)(F)F)C(C)=C1 PDYUCXOQBNSGKN-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 description 1
- FUUUBHCENZGYJA-UHFFFAOYSA-N n-cyclopentylcyclopentanamine Chemical compound C1CCCC1NC1CCCC1 FUUUBHCENZGYJA-UHFFFAOYSA-N 0.000 description 1
- MJCJUDJQDGGKOX-UHFFFAOYSA-N n-dodecyldodecan-1-amine Chemical compound CCCCCCCCCCCCNCCCCCCCCCCCC MJCJUDJQDGGKOX-UHFFFAOYSA-N 0.000 description 1
- SMBYUOXUISCLCF-UHFFFAOYSA-N n-ethyl-n-methylpropan-1-amine Chemical compound CCCN(C)CC SMBYUOXUISCLCF-UHFFFAOYSA-N 0.000 description 1
- NJWMENBYMFZACG-UHFFFAOYSA-N n-heptylheptan-1-amine Chemical compound CCCCCCCNCCCCCCC NJWMENBYMFZACG-UHFFFAOYSA-N 0.000 description 1
- NQYKSVOHDVVDOR-UHFFFAOYSA-N n-hexadecylhexadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCC NQYKSVOHDVVDOR-UHFFFAOYSA-N 0.000 description 1
- PXSXRABJBXYMFT-UHFFFAOYSA-N n-hexylhexan-1-amine Chemical compound CCCCCCNCCCCCC PXSXRABJBXYMFT-UHFFFAOYSA-N 0.000 description 1
- DYFFAVRFJWYYQO-UHFFFAOYSA-N n-methyl-n-phenylaniline Chemical compound C=1C=CC=CC=1N(C)C1=CC=CC=C1 DYFFAVRFJWYYQO-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- JACMPVXHEARCBO-UHFFFAOYSA-N n-pentylpentan-1-amine Chemical compound CCCCCNCCCCC JACMPVXHEARCBO-UHFFFAOYSA-N 0.000 description 1
- NTNWKDHZTDQSST-UHFFFAOYSA-N naphthalene-1,2-diamine Chemical compound C1=CC=CC2=C(N)C(N)=CC=C21 NTNWKDHZTDQSST-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- IZJVVXCHJIQVOL-UHFFFAOYSA-N nitro(phenyl)methanesulfonic acid Chemical compound OS(=O)(=O)C([N+]([O-])=O)C1=CC=CC=C1 IZJVVXCHJIQVOL-UHFFFAOYSA-N 0.000 description 1
- QBOJAFXDRTZTJT-UHFFFAOYSA-N nonane-3-sulfonic acid Chemical compound CCCCCCC(CC)S(O)(=O)=O QBOJAFXDRTZTJT-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- JFNLZVQOOSMTJK-UHFFFAOYSA-N norbornene Chemical compound C1C2CCC1C=C2 JFNLZVQOOSMTJK-UHFFFAOYSA-N 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- LJGSUFJICGWYLT-UHFFFAOYSA-N oxiran-2-ylmethyl 3-piperidin-1-ylpropanoate Chemical compound C1OC1COC(=O)CCN1CCCCC1 LJGSUFJICGWYLT-UHFFFAOYSA-N 0.000 description 1
- LCJLCKSXBYGANE-UHFFFAOYSA-N oxolan-2-ylmethyl 3-[bis(2-acetyloxyethyl)amino]propanoate Chemical compound CC(=O)OCCN(CCOC(C)=O)CCC(=O)OCC1CCCO1 LCJLCKSXBYGANE-UHFFFAOYSA-N 0.000 description 1
- NIRBLAKHONNXRC-UHFFFAOYSA-N oxolan-2-ylmethyl 3-[bis(2-hydroxyethyl)amino]propanoate Chemical compound OCCN(CCO)CCC(=O)OCC1CCCO1 NIRBLAKHONNXRC-UHFFFAOYSA-N 0.000 description 1
- NHMSEQJTGVEMKN-UHFFFAOYSA-N oxolan-2-ylmethyl 3-morpholin-4-ylpropanoate Chemical compound C1CCOC1COC(=O)CCN1CCOCC1 NHMSEQJTGVEMKN-UHFFFAOYSA-N 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000006340 pentafluoro ethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 125000001148 pentyloxycarbonyl group Chemical group 0.000 description 1
- 229940083254 peripheral vasodilators imidazoline derivative Drugs 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- COLNVLDHVKWLRT-UHFFFAOYSA-N phenylalanine Natural products OC(=O)C(N)CC1=CC=CC=C1 COLNVLDHVKWLRT-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000004885 piperazines Chemical class 0.000 description 1
- 150000003053 piperidines Chemical class 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 108010001861 pregnancy-associated glycoprotein 1 Proteins 0.000 description 1
- 108010001843 pregnancy-associated glycoprotein 2 Proteins 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- TVSBRLGQVHJIKT-UHFFFAOYSA-N propan-2-ylcyclopentane Chemical group CC(C)C1CCCC1 TVSBRLGQVHJIKT-UHFFFAOYSA-N 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-M propane-1-sulfonate Chemical compound CCCS([O-])(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-M 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- KRIOVPPHQSLHCZ-UHFFFAOYSA-N propiophenone Chemical compound CCC(=O)C1=CC=CC=C1 KRIOVPPHQSLHCZ-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 150000003216 pyrazines Chemical class 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- 150000003218 pyrazolidines Chemical class 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- DVECLMOWYVDJRM-UHFFFAOYSA-N pyridine-3-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CN=C1 DVECLMOWYVDJRM-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 229940083082 pyrimidine derivative acting on arteriolar smooth muscle Drugs 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 150000003235 pyrrolidines Chemical class 0.000 description 1
- ZVJHJDDKYZXRJI-UHFFFAOYSA-N pyrroline Natural products C1CC=NC1 ZVJHJDDKYZXRJI-UHFFFAOYSA-N 0.000 description 1
- 150000003236 pyrrolines Chemical class 0.000 description 1
- 150000003246 quinazolines Chemical class 0.000 description 1
- IQQDNMHUOLMLNJ-UHFFFAOYSA-N quinolin-3-ol Chemical compound C1=CC=CC2=CC(O)=CN=C21 IQQDNMHUOLMLNJ-UHFFFAOYSA-N 0.000 description 1
- QZZYYBQGTSGDPP-UHFFFAOYSA-N quinoline-3-carbonitrile Chemical compound C1=CC=CC2=CC(C#N)=CN=C21 QZZYYBQGTSGDPP-UHFFFAOYSA-N 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 150000003252 quinoxalines Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 229930004725 sesquiterpene Natural products 0.000 description 1
- 150000004354 sesquiterpene derivatives Chemical class 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 229940066771 systemic antihistamines piperazine derivative Drugs 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- YEOMHINWERQWTE-UHFFFAOYSA-N tert-butyl 2-[4-[3,4-bis[4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]anthracen-2-yl]phenoxy]acetate Chemical compound C(C)(C)(C)OC(=O)COC1=CC=C(C=C1)C=1C(=C(C2=CC3=CC=CC=C3C=C2C=1)C1=CC=C(C=C1)OCC(=O)OC(C)(C)C)C1=CC=C(C=C1)OCC(=O)OC(C)(C)C YEOMHINWERQWTE-UHFFFAOYSA-N 0.000 description 1
- PTSAQPIPJAFBDO-UHFFFAOYSA-N tert-butyl 2-[ethyl-[2-[(2-methylpropan-2-yl)oxycarbonyloxy]ethyl]amino]ethyl carbonate Chemical compound CC(C)(C)OC(=O)OCCN(CC)CCOC(=O)OC(C)(C)C PTSAQPIPJAFBDO-UHFFFAOYSA-N 0.000 description 1
- XULQYKHYHOXCJI-UHFFFAOYSA-N tert-butyl 2-piperidin-1-ylethyl carbonate Chemical compound CC(C)(C)OC(=O)OCCN1CCCCC1 XULQYKHYHOXCJI-UHFFFAOYSA-N 0.000 description 1
- CROWJIMGVQLMPG-UHFFFAOYSA-N tert-butyl benzimidazole-1-carboxylate Chemical compound C1=CC=C2N(C(=O)OC(C)(C)C)C=NC2=C1 CROWJIMGVQLMPG-UHFFFAOYSA-N 0.000 description 1
- WIURVMHVEPTKHB-UHFFFAOYSA-N tert-butyl n,n-dicyclohexylcarbamate Chemical compound C1CCCCC1N(C(=O)OC(C)(C)C)C1CCCCC1 WIURVMHVEPTKHB-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000004192 tetrahydrofuran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004187 tetrahydropyran-2-yl group Chemical group [H]C1([H])OC([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 150000007979 thiazole derivatives Chemical class 0.000 description 1
- 150000007970 thio esters Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- SZHOJFHSIKHZHA-UHFFFAOYSA-N tridecanoic acid Chemical compound CCCCCCCCCCCCC(O)=O SZHOJFHSIKHZHA-UHFFFAOYSA-N 0.000 description 1
- 125000002827 triflate group Chemical group FC(S(=O)(=O)O*)(F)F 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- USMVHTQGEMDHKL-UHFFFAOYSA-M triphenylsulfanium;2,4,6-tri(propan-2-yl)benzenesulfonate Chemical compound CC(C)C1=CC(C(C)C)=C(S([O-])(=O)=O)C(C(C)C)=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 USMVHTQGEMDHKL-UHFFFAOYSA-M 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 238000000233 ultraviolet lithography Methods 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
Description
本發明係有關(1)適合微細加工技術,抑制顯像後之基板上之缺陷發生的光阻材料及(2)使用該光阻材料之圖型之形成方法。
近年,隨著LSI之高度集積化及高速度化,圖型線路要求微細化,正全力開發使用遠紫外線微影-及真空紫外線微影之微細加工技術。以往以波長248 nm之KrF準分子雷射光為光源之微影在半導體裝置之實際生產中,擔任重要的功能,但是為了更進一步之微細化,也檢討使用波長193nm之ArF準分子雷射光,且用於一部分之試驗生產。但是ArF準分子雷射微影在技術上,尚未成熟,在實際生產方面仍有許多問題。
可對應ArF準分子雷射微影之光阻材料所要求的特性係波長193nm之透明性及耐乾蝕刻性,兼具此兩者之光阻材料,例如提案2-乙基-2-金剛烷基、2-甲基-2-金剛烷基所代表之具有高鬆密度之酸分解性保護基之聚(甲基)丙烯酸衍生物為基底樹脂的光阻材料(專利文獻1:日本特開平9-73173號公報、專利文獻2:特開平9-90637號公報)。其後也提案各種的材料,但是使用具有透明性高之主鏈與高鬆密度之部分構造的樹脂,乃是共通點。
這些材料之問題中,最嚴重的是因鬆密度高,疏水性高的構造所產生的各種缺陷。光阻膜係經由曝光、加熱處理之分解反応變成溶解於鹼顯像液的構造,但是這些疏水性高的材料會溶解於鹼顯像液,但是之後以純水等之非鹼水洗淨時會析出,這些析出物會附著於基板上,成為缺陷。基板上之缺陷成為蝕刻保護膜,造成半導體裝置之性能不良。
[專利文獻1]特開平9一73173號公報[專利文獻2]特開平9-90637號公報
本發明係有鑑於上述問題所完成者,本發明之目的係提供以ArF準分子雷射光等之高能量線為光源之微影時,高解像性且降低缺陷的光阻材料及使用該光阻材料的圖型之形成方法。
本發明者為了達成上述目的,精心検討結果發現含有藉由酸之作用提高對鹼顯像液之溶解性的樹脂成分及感應活性光線或輻射線產生酸的化合物,再含有一種以上之分子量150以上之酸性有機化合物的正型光阻材料為高解像性且降低缺陷,極適合精密之微細加工。
換言之,本發明係提供下述之光阻材料及圖型之形成方法。
申請專利範圍第1項:一種正型光阻材料,其特徵係含有:藉由酸之作用提高對鹼顯像液之溶解性的樹脂成分(A)及感應活性光線或輻射線產生酸的化合物(B),再含有一種以上之分子量150以上之酸性有機化合物(C)。
申請專利範圍第2項:如申請專利範圍第1項之正型光阻材料,其中該酸性有機化合物(C)為下述一般式(1)表示者,
(式中,R1
係表示直鏈狀或支鏈狀之一價有機基,結構內不含碳、氫、氧以外之原子及雙鍵,X係表示-SO3
H或-CO2
H)。
申請專利範圍第3項:如申請專利範圍第1項之正型光阻材料,其中該酸性有機化合物(C)為下述一般式(2)表示者,
(式中,A為伸甲基,n個之伸甲基中,一部分之伸甲基可被氧原子取代,但是一部分之伸甲基被氧原子取代時,無2個氧原子相鄰接的結構,n為滿足3≦n≦100之整數,X係表示-SO3
H或-CO2
H)。
如申請專利範圍第1~3項中任一項之正型光阻材料,其中該樹脂成分(A)具有酸性之重複單位。
一種圖型之形成方法,其係含有:將申請專利範圍第1~4項中任一項之正型光阻材料塗佈於基板上之步驟;加熱處理後,介由光罩以高能量線或電子線曝光的步驟;加熱處理後,使用顯像液進行顯像之步驟之圖型之形成方法,其特徵係將折射率1.0以上之高折射率液體介於光阻塗佈膜與投影透鏡之間,以浸潤式曝光進行曝光。
一種圖型之形成方法,其係含有:將申請專利範圍第1~4項中任一項之正型光阻材料塗佈於基板上之步驟;加熱處理後,介由光罩以高能量線或電子線曝光的步驟;加熱處理後,使用顯像液進行顯像之步驟之圖型之形成方法,其特徵係在光阻塗佈膜上再塗佈保護膜,將折射率1.0以上之高折射率液體介於該保護膜與投影透鏡之間,以浸潤式曝光進行曝光。
本發明之光阻材料係在微細加工技術,特別是ArF微影技術時,不僅為高解像性,且可降低缺陷,極適合精密之微細加工。
本發明之光阻材料係含有:藉由酸之作用提高對鹼顯像液之溶解性的樹脂成分(A)及感應活性光線或輻射線產生酸的化合物(B),再含有一種以上之分子量150以上之酸性有機化合物(C)者。
樹脂成分(A)之樹脂成分,例如有以下述式(R1)及/或下述式(R2)表示之重量平均分子量1,000~100,000,較佳為3,000~30,000之高分子化合物,但是不受此限定。上述重量平均分子量係表示凝膠滲透層析法(GPC)之聚苯乙烯換算值。
上述式中,R001
為氫原子、甲基或-CH2
CO2
R003
。
R002
為氫原子、甲基或CO2
R003
。
R003
為碳數1~15之直鏈狀、支鏈狀或環狀烷基,具體而言例如甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、第三戊基、正戊基、正己基、環戊基、環己基、乙基環戊基、丁基環戊基、乙基環己基、丁基環己基、金剛烷基、乙基金剛烷基、丁基金剛烷基等。
R004
為氫原子、碳數1~15之含氟取代基、含有選自羧基、羥基之至少一種基之一價烴基,具體而言例如氫原子、羧基乙基、羧基丁基、羧基環戊基、羧基環己基、羧基降冰片基、羧基金剛烷基、羥基乙基、羥基丁基、羥基環戊基、羥基環己基、羥基降冰片基、羥基金剛烷基、〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己基、雙〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己基等。
R005
~R008
中之至少1個為羧基、或碳數1~15之含氟取代基、含有選自羧基、羥基之至少一種基之一價烴基,其餘為各自獨立表示氫原子或碳數1~15之直鏈狀、支鏈狀或環狀之烷基。碳數1~15之含氟取代基、含有選自羧基、羥基之至少一種基之一價烴基,其具體例如羧基甲基、羧基乙基、羧基丁基、羥基甲基、羥基乙基、羥基丁基、2-羧基乙氧羰基、4-羧基丁氧羰基、2-羥基乙氧羰基、4-羥基丁氧羰基、羧基環戊氧羰基、羧基環己氧羰基、羧基降冰片氧基羰基、羧基金剛烷氧基羰基、羥基環戊氧羰基、羥基環己氧羰基、羥基降冰片氧基羰基、羥基金剛烷氧羰基、〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己氧羰基、雙〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己氧羰基等。
碳數1~15之直鏈狀、支鏈狀或環狀之烷基,具體例如與R003
所示者相同之內容。
R005
~R008
(這些之2種,例如R005
與R006
、R006
與R007
、R007
與R008
等)可互相鍵結與這些所鍵結之碳原子共同形成環,此時形成環之2個中,1個為碳數1~15之含氟取代基、含有選自羧基、羥基之至少一種基之二價烴基,另一為該二價烴基或單鍵,其餘為分別獨立表示氫原子或碳數1~15之直鏈狀、支鏈狀或環狀之烷基。碳數1~15之含氟取代基、含有選自羧基、羥基之至少一種基之二價烴基,具體例如上述含氟取代基、含有選自羧基、羥基之至少一種基之一價烴基所例示者中去除1個氫原子之基等。碳數1~15之直鏈狀、支鏈狀或環狀之烷基,具體例如R003
所示者等。
R009
為碳數3~15之含有-CO2
-部分結構之一價烴基,具體例如2-氧代氧雜環戊烷-3-基、4,4-二甲基-2-氧代氧雜環戊烷-3-基、4-甲基-2-氧代噁烷-4-基、2-氧代-1,3-二氧雜環戊烷-4-基甲基、5-甲基-2-氧代氧雜環戊烷-5-基等。
R010
~R013
中之至少1個為碳數2~15之含有-CO2
-部分結構之一價烴基,其餘為各自獨立表示氫原子或碳數1~15之直鏈狀、支鏈狀或環狀烷基。碳數2~15之含有-CO2
-部分結構之一價烴基,具體例如2-氧代氧雜環戊烷-3-基氧基羰基、4,4-二甲基-2-氧代氧雜環戊烷-3-基氧基羰基、4-甲基-2-氧代噁烷-4-基氧基羰基、2-氧代-1,3-二氧雜環戊烷-4-基甲基氧基羰基、5-甲基-2-氧代氧雜環戊烷-5-基氧基羰基等。碳數1~15之直鏈狀、支鏈狀或環狀烷基,具體例如與R003
所示之內容相同者。
R010
~R013
(這些之2種,例如R010
與R011
、R011
與R012
、R012
與R013
等)可互相鍵結與這些所鍵結之碳原子共同形成環,此時形成環之2個中,1個為碳數2~15之含有-CO2
-部分結構之二價烴基,另一為該二價烴基或單鍵,其餘為分別獨立表示氫原子或碳數1~15之直鏈狀、支鏈狀或環狀之烷基。碳數2~15之含有-CO2
-部分結構之二價烴基,具體例如1-氧代-2-氧雜丙烷-1,3-二基、1,3-二氧代-2-氧雜丙烷-1,3-二基、1-氧代-2-氧雜丁烷-1,4-二基、1,3-二氧代-2-氧雜丁烷-1,4-二基等外,例如由上述含有-CO2
-部分結構之一價烴基所例示者中去除1個氫原子之基等。碳數1~15之直鏈狀、支鏈狀或環狀伸烷基,具體例如由R003
所示者。
R014
為碳數7~15之多環烴基或含有多環烴基之烷基,具體例如降冰片烷基、二環[3.3.1]壬基、三環[5.2.1.02,6
]癸基、金剛烷基、降冰片烷基甲基、金剛烷基甲基及這些之烷基或環烷基取代物等。
R015
為酸不穩定基。具體例如下所示。
R016
為氫原子或甲基。
R017
為碳數1~8之直鏈狀、支鏈狀或環狀烷基,具體例如甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、第三戊基、正戊基、正己基、環戊基、環己基等。
X表示CH2
或氧原子。
k為0或1。
又,R015
之酸不穩定基,可使用各種基,具體而言,例如藉由下述光酸產生劑產生之酸脫去保護之基,可為以往光阻材料,特別是化學增幅正型光阻材料使用之公知的酸不穩定基,具體例有下述一般式(L1)~(L4)所示之基,碳數4~20、較佳為4~15之三級烷基,各烷基分別為碳數1~6之三烷基甲矽烷基、碳數4~20之氧代烷基等。
上述式中,虛線表示鍵結部。式(L1)中,RL01
、RL02
為氫原子或碳數1~18,較佳為1~10之直鏈狀、支鏈狀或環狀烷基,具體例如甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、環戊基、環己基、2-乙基己基、正辛基、金剛烷基等。RL03
為碳數1~18,較佳為1~10之可含有氧原子等雜原子之一價烴基,直鏈狀、支鏈狀或環狀烷基,或這些之氫原子之一部分可被羥基、烷氧基、氧代基、胺基、烷胺基所取代者,具體而言,直鏈狀、支鏈狀或環狀烷基,例如有與上述RL01
、RL02
同樣者,取代烷基例如有下述之基等。
RL01
與RL02
、RL01
與RL03
、RL02
與RL03
可相互鍵結,與這些所鍵結之碳原子或氧原子共同形成環,形成環時,RL01
、RL02
、RL03
各自為碳數1~18、較佳為1~10之直鏈狀或支鏈狀之伸烷基。
式(L2)中,RL04
為碳數4~20、較佳為4~15之三級烷基、各烷基分別為碳數1~6之三烷基甲矽烷基、碳數4~20之氧代烷基或上述一般式(L1)所示之基,三級烷基之具體例如第三丁基、第三戊基、1,1-二乙基丙基、2-環戊基丙烷-2-基、2-環己基丙烷-2-基、2-(二環[2.2.1]庚烷-2-基)丙烷-2-基、2-(金剛烷-1-基)丙烷-2-基、2-(三環[5.2.1.02,6
]癸烷-8-基)丙烷-2-基、2-(四環[4.4.0.12,5
.17,10
]十二烷-3-基)丙烷-2-基、1-乙基環戊基、1-丁基環戊基、1-乙基環己基、1-丁基環己基、1-乙基-2-環戊烯基、1-乙基-2-環己烯基、2-甲基-2-金剛烷基、2-乙基-2-金剛烷基、8-甲基-8-三環[5.2.1.02,6
]癸基、8-乙基-8-三環[5.2.1.02,6
]癸基、3-甲基-3-四環[4.4.0.12,5
.17,10
]十二烷基、3-乙基-3-四環[4.4.0.12,5
.17,10
]十二烷基等,三烷基甲矽烷基之具體例有三甲基甲矽烷基、三乙基甲矽烷基、二甲基-第三丁基甲矽烷基等;氧代烷基之具體例有3-氧代環己基、4-甲基-2-氧代噁烷-4-基、5-甲基-2-氧代氧雜環戊烷-4-基等。y為0~6之整數。
式(L3)中,RL05
為碳數1~10之可被取代之直鏈狀、支鏈狀或環狀烷基或碳數6~20之可被取代之芳基,可被取代之烷基例如有甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、第三戊基、正戊基、正己基、環戊基、環己基、二環[2.2.1]庚基等之直鏈狀、支鏈狀或環狀烷基,這些之氫原子之一部份可被羥基、烷氧基、羧基、烷氧羰基、氧代基、胺基、烷胺基、氰基、氫硫基、烷硫基、磺基等所取代者或這些之亞甲基之一部份被氧原子或硫原子取代者等,可被取代之芳基,具體例如苯基、甲基苯基、萘基、蒽基、菲基、芘基等。m為0或1;n為0、1、2、3中任一,且滿足2m+n=2或3的數。
式(L4)中,RL06
為碳數1~10之可被取代之直鏈狀、支鏈狀或環狀烷基或碳數6~20之可被取代之芳基,具體例係與RL05
相同者。RL07
~RL16
為各自獨立表示氫原子或碳數1~15之一價烴基,具體而言,例如有甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、第三戊基、正戊基、正己基、正辛基、正壬基、正癸基、環戊基、環己基、環戊基甲基、環戊基乙基、環戊基丁基、環己基甲基、環己基乙基、環己基丁基等之直鏈狀、支鏈狀或環狀烷基,這些之氫原子之一部份可被羥基、烷氧基、羧基、烷氧羰基、氧代基、胺基、烷基胺基、氰基、氫硫基、烷硫基、磺基等所取代者等。RL07
~RL16
其中2種相互鍵結,可與這些鍵結之碳原子共同形成環(例如,RL07
與RL08
、RL07
與RL09
、RL08
與RL10
、RL09
與RL10
、RL11
與RL12
、RL13
與RL14
等),此時表示碳數1~15之二價烴基,具體例示如上述一價烴基例中去除1個氫原子者等。又,RL07
~RL16
鍵結於相鄰之碳者,彼此可不必介由其他原子而鍵結,形成雙鍵(例如RL07
與RL09
、RL09
與RL15
、RL13
與RL15
等)。
上述式(L1)所示之酸不穩定基中,直鏈狀或支鏈狀者,具體例如下述之基。
上述式(L1)所示之酸不穩定基中,環狀者之具體例如四氫呋喃-2-基、2-甲基四氫呋喃-2-基、四氫吡喃-2-基、2-甲基四氫吡喃-2-基等。
上述式(L2)所示之酸不穩定基,具體例如第三丁氧羰基、第三丁氧羰甲基、第三戊氧羰基、第三戊氧羰甲基、1,1-二乙基丙氧羰基、1,1-二乙基丙氧羰甲基、1-乙基環戊氧基羰基、1-乙基環戊氧基羰甲基、1-乙基-2-環戊烯氧羰基、1-乙基-2-環戊烯氧羰甲基、1-乙氧乙氧羰甲基、2-四氫吡喃氧基羰甲基、2-四氫呋喃氧基羰甲基等。
上述式(L3)所示之酸不穩定基,其具體例如1-甲基環戊基、1-乙基環戊基、1-正丙基環戊基、1-異丙基環戊基、1-正丁基環戊基、1-第二丁基環戊基、1-環己基環戊基、1-(4-甲氧基丁基)環戊基、1-(二環[2.2.1]庚烷-2-基)環戊基、1-(7-氧雜二環[2.2.1]庚-2-基)環戊基、1-甲基環己基、1-乙基環己基、3-甲基-1-環戊烯基、1-乙基-2-環戊烯基、1-甲基-2-環己烯基、1-乙基-2-環己烯基等。
上述式(L4)所示之酸不穩定基,其具體例如下述式(L4-1)~(L4-4)所示之基較佳。
上述式(L4-1)~(L4-4)中,虛線表示鍵結位置與鍵結方向。RL41
係分別獨立表示碳數1~10之可被取代之直鏈狀、支鏈狀或環狀烷基等之一價烴基,具體例如甲基、乙基、丙基、異丙基、正丁基、第二丁基、第三丁基、第三戊基、正戊基、正己基、環戊基、環己基等。
上述一般式(L4-1)~(L4-4)可以鏡像異構物(enantiomer)或非鏡像異構物(diastereomer)存在,但是上述一般式(L4-1)~(L4-4)代表這些立體異構物之全部。這些立體異構物可單獨使用或以混合物形式使用。
例如上述一般式(L4-3)係代表選自下述式(L4-3-1)、(L4-3-2)所示之基之1種或2種的混合物。
上述一般式(L4-4)係代表選自下述式(L4-4-1)~(L4-4-4)所示之基之1種或2種的混合物。
上述一般式(L4-1)~(L4-4)、(L4-3-1)、(L4-3-2)及式(L4-4-1)~(L4-4-4)係代表這些鏡像異構物(enantiomer)或鏡像異構物混合物。
上述一般式(L4-1)~(L4-4)、(L4-3-1)、(L4-3-2)及式(L4-4-1)~(L4-4-4)之鍵結方向為各自對於二環[2.2.1]庚烷環為exo側,可實現酸觸媒脫離反應之高反應性(參考日本特開2000-336121號公報)。製造以具有前述二環[2.2.1]庚烷骨架之三級exo-烷基作為取代基的單體時,有時含有下述一般式(L4-1-endo)~(L4-4-endo)所示之endo-烷基所取代的單體,但是為了實現良好的反應性時,exo比例較佳為50%以上,exo比例更佳為80%以上。
上述式(L4)之酸不穩定基例如有下述之基。
碳數4~20的三級烷基、各烷基分別表示碳數1~6的三烷基甲矽烷基、碳數4~20的氧代烷基例如有與RL04
所例舉之相同者。
R016
係氫原子或甲基。R017
係碳數1~8之直鏈狀、支鏈狀或環狀之烷基。
a1’、a2’、a3’、b1’、b2’、b3’、c1’、c2’、c3’、d1’、d2’、d3’、e’係0以上未達1之數,且滿足a1’+a2’+a3’+b1’+b2’+b3’+c1’+c2’+c3’+d1’+d2’+d3’+e’=1。f’、g’、h’、i’、j’、o’、p’係0以上未達1之數,且滿足f’+g’+h’+i’+j’+o’+p’=1。x’、y’、z’係0~3之整數,且滿足1≦x’+y’+z’≦5;1≦y’+z’≦3)。
上述式(R1)、(R2)之各重複單位可同時導入2種以上。藉由使用各重複單位之多個單位可調整作為光阻材料時的性能。
上述各單位之和為1係指含有各重複單位的高分子化合物中,這些重複單位之合計量對於全重複單位之合計量為100莫耳%。
上述式(R1)中,以組成比a1’及式(R2)中,以組成比f’導入之重複單位,具體例如下所示者,但是不受此限定。
上述式(R1)中,以組成比b1’導入之重複單位,具體例如下所示者,但是不受此限定。
上述式(R1)中,以組成比d1’及式(R2)中,以組成比g’導入之重複單位,具體例如下所示者,但是不受此限定。
上述式(R1)中,以組成比a1’、b1’、c1’、d1’導入之重複單位,具體例如下所示者,但是不受此限定。
上述式(R1)中,以組成比a2’、b2’、c2’、d2’、e’之重複單位所構成之高分子化合物,具體例如下所示者,但是不受此限定。
上述式(R1)中,以組成比a3’、b3’、c3’、d3’之重複單位所構成之高分子化合物,具體例如下所示者,但是不受此限定。
上述式(R2)之高分子化合物,具體例如下所示者,但是不受此限定。
上述高分子化合物不限制1種,亦可添加2種以上。使用多種高分子化合物時,可調整光阻材料之性能。
本發明之光阻材料含有感應活性光線或輻射線產生酸的化合物(B)。(B)成分只要是可藉由高能量線照射產生酸的化合物即可,可為以往光阻材料,特別是化學增強型光阻材料所用之公知的光酸產生劑。較佳之光酸產生劑例如有鋶鹽、碘鎓鹽、磺醯基重氮甲烷、N-磺醯氧基醯亞胺型、肟-O-磺酸酯型酸產生劑等。詳述如下,此等可單獨或兩種以上混合使用。
鋶鹽為鋶陽離子與磺酸酯或雙(取代烷基磺醯基)醯亞胺、三(取代烷基磺醯基)甲基金屬的鹽,鋶陽離子例如有三苯鋶、(4-第三丁氧苯基)二苯鋶、雙(4-第三丁氧苯基)苯鋶、三(4-第三丁氧苯基)鋶、(3-第三丁氧苯基)二苯鋶、雙(3-第三丁氧苯基)苯鋶、三(3-第三丁氧苯基)鋶、(3,4-二第三丁氧苯基)二苯鋶、雙(3,4-二第三丁氧苯基)苯鋶、三(3,4-二第三丁氧苯基)鋶、二苯基(4-硫苯氧苯基)鋶、(4-第三丁氧羰基甲氧苯基)二苯鋶、三(4-第三丁氧羰基甲氧苯基)鋶、(4-第三丁氧苯基)雙(4-二甲胺苯基)鋶、三(4-二甲基胺苯基)鋶、2-萘基二苯鋶、二甲基2-萘基鋶、4-羥苯基二甲基鋶、4-甲氧基苯基二甲基鋶、三甲基鋶、2-氧代環己基環己基甲基鋶、三萘基鋶、三苄基鋶、二苯基甲基鋶、二甲基苯基鋶、2-氧代-2-苯基乙基硫雜環戊鎓、4-正丁氧基萘基-1-硫雜環戊鎓、2-正丁氧基萘基-1-硫雜環戊鎓等,磺酸酯例如有三氟甲烷磺酸酯、五氟乙烷磺酸酯、九氟丁烷磺酸酯、十二氟己烷磺酸酯、五氟乙基全氟環己烷磺酸酯、十七氟辛烷磺酸酯、2,2,2-三氟乙烷磺酸酯、五氟苯磺酸酯、4-三氟甲基苯磺酸酯、4-氟苯磺酸酯、三甲基苯磺酸酯、2,4,6-三異丙基苯磺酸酯、甲苯磺酸酯、苯磺酸酯、4-(4’-甲苯磺醯氧基)苯磺酸酯、萘磺酸酯、樟腦磺酸酯、辛烷磺酸酯、十二烷基苯磺酸酯、丁烷磺酸酯、甲烷磺酸酯、2-苯甲醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-(4-苯基苯甲醯氧基)丙烷磺酸酯、1,1,3,3,3-五氟-2-三甲基乙醯氧基丙烷磺酸酯、2-環己烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-呋喃甲醯氧基丙烷磺酸酯、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-(4-第三丁基苯甲醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、2-金剛烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-乙醯氧-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-羥基丙烷磺酸酯、1,1,3,3,3-五氟-2-甲苯磺醯氧基丙烷磺酸酯、1,1-二氟-2-萘基-乙烷磺酸酯、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、1,1,2,2-四氟-2-(四環[4.4.0.12,5
.17,10
]十二-3-烯-8-基)乙烷磺酸酯等,雙(取代烷基磺醯基)醯亞胺例如有雙三氟甲基磺醯基醯亞胺、雙五氟乙基磺醯基醯亞胺、雙七氟丙基磺醯基醯亞胺、1,3-丙烯雙磺醯基醯亞胺等,三(取代烷基磺醯基)甲基金屬例如有三氟甲基磺醯基甲基金屬,這些之組合的鋶鹽。
碘鎓鹽為碘鎓陽離子與磺酸酯或雙(取代烷基磺醯基)醯亞胺、三(取代烷基磺醯基)甲基金屬的鹽,例如有二苯基碘鎓、雙(4-第三丁基苯基)碘鎓、4-第三丁氧苯基苯基碘鎓、4-甲氧苯基苯基碘鎓等之芳基碘鎓陽離子與磺酸酯之三氟甲烷磺酸酯、五氟乙烷磺酸酯、九氟丁烷磺酸酯、十二氟己烷磺酸酯、五氟乙基全氟環己烷磺酸酯、十七氟辛烷磺酸酯、2,2,2-三氟乙烷磺酸酯、五氟苯磺酸酯、4-三氟甲基苯磺酸酯、4-氟苯磺酸酯、三甲基苯磺酸酯、2,4,6-三異丙基苯磺酸酯、甲苯磺酸酯、苯磺酸酯、4-(4-甲苯磺醯氧基)苯磺酸酯、萘磺酸酯、樟腦磺酸酯、辛烷磺酸酯、十二烷基苯磺酸酯、丁烷磺酸酯、甲烷磺酸酯、2-苯甲醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-(4-苯基苯甲醯氧基)丙烷磺酸酯、1,1,3,3,3-五氟-2-三甲基乙醯氧基丙烷磺酸酯、2-環己烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-呋喃甲醯氧基丙烷磺酸酯、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-(4-第三丁基苯甲醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、2-金剛烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-乙醯氧-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-羥基丙烷磺酸酯、1,1,3,3,3-五氟-2-甲苯磺醯氧基丙烷磺酸酯、1,1-二氟-2-萘基-乙烷磺酸酯、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、1,1,2,2-四氟-2-(四環[4.4.0.12,5
.17,10
]十二-3-烯-8-基)乙烷磺酸酯等,雙(取代烷基磺醯基)醯亞胺例如有雙三氟甲基磺醯基醯亞胺、雙五氟乙基磺醯基醯亞胺、雙七氟丙基磺醯基醯亞胺、1,3-丙烯雙磺醯基醯亞胺等,三(取代烷基磺醯基)甲基金屬例如有三氟甲基磺醯基甲基金屬,這些之組合的碘鎓鹽。
磺醯基重氮甲烷例如有雙(乙基磺醯基)重氮甲烷、雙(1-甲基丙基磺醯基)重氮甲烷、雙(2-甲基丙基磺醯基)重氮甲烷、雙(1,1-二甲基乙基磺醯基)重氮甲烷、雙(環己基磺醯基)重氮甲烷、雙(全氟異丙基磺醯基)重氮甲烷、雙(苯基磺醯基)重氮甲烷、雙(4-甲基苯基磺醯基)重氮甲烷、雙(2,4-二甲基苯基磺醯基)重氮甲烷、雙(2-萘基磺醯基)重氮甲烷、雙(4-乙醯氧基苯基磺醯基)重氮甲烷、雙(4-甲烷磺醯氧基苯基磺醯基)重氮甲烷、雙(4-(4-甲苯磺醯氧基)苯基磺醯基)重氮甲烷、雙(4-正己氧基)苯基磺醯基)重氮甲烷、雙(2-甲基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(2,5-二甲基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(3,5-二甲基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(2-甲基-5-異丙基-4-(正己氧基)苯基磺醯基)重氮甲烷、4-甲基苯基磺醯基苯醯基重氮甲烷、第三丁基羰基-4-甲基苯基磺醯重氮甲烷、2-萘基磺醯基苯醯基重氮甲烷、4-甲基苯基磺醯基-2-萘醯基重氮甲烷、甲基磺醯苯醯基重氮甲烷、第三丁氧羰基-4-甲基苯基磺醯基重氮甲烷等之雙磺醯重氮甲烷與磺醯基羰基重氮甲烷。
N-磺醯氧基醯亞胺型光酸產生劑例如有琥珀酸醯亞胺、萘二羧酸醯亞胺、苯二甲酸醯亞胺、環己基二羧酸醯亞胺、5-降冰片烯-2,3-二羧酸醯亞胺、7-氧雜二環〔2,2,1〕-5-庚烯-2,3-二羧酸醯亞胺等之醯亞胺骨架與三氟甲烷磺酸酯、五氟乙烷磺酸酯、九氟丁烷磺酸酯、十二氟己烷磺酸酯、五氟乙基全氟環己烷磺酸酯、十七氟辛烷磺酸酯、2,2,2-三氟乙烷磺酸酯、五氟苯磺酸酯、4-三氟甲基苯磺酸酯、4-氟苯磺酸酯、三甲基苯磺酸酯、2,4,6-三異丙基苯磺酸酯、甲苯磺酸酯、苯磺酸酯、萘磺酸酯、樟腦磺酸酯、辛烷磺酸酯、十二烷基苯磺酸酯、丁烷磺酸酯、甲烷磺酸酯、2-苯甲醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-(4-苯基苯甲醯氧基)丙烷磺酸酯、1,1,3,3,3-五氟-2-三甲基乙醯氧基丙烷磺酸酯、2-環己烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-呋喃甲醯氧基丙烷磺酸酯、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-(4-第三丁基苯甲醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、2-金剛烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-乙醯氧-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-羥基丙烷磺酸酯、1,1,3,3,3-五氟-2-甲苯磺醯氧基丙烷磺酸酯、1,1-二氟-2-萘基-乙烷磺酸酯、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、1,1,2,2-四氟-2-(四環[4.4.0.12,5
.17,10
]十二-3-烯-8-基)乙烷磺酸酯等之組合的化合物。
苯偶姻磺酸酯型光酸產生劑例如有苯偶姻甲苯磺酸酯、苯偶姻甲磺酸酯、苯偶姻丁烷磺酸酯等。
焦棓酚三磺酸酯型光酸產生劑例如有焦棓酚、氟胺基乙烷醇、鄰苯二酚、間苯二酚、對苯二酚之全部羥基被三氟甲烷磺酸酯、五氟乙烷磺酸酯、九氟丁烷磺酸酯、十二氟己烷磺酸酯、五氟乙基全氟環己烷磺酸酯、十七氟辛烷磺酸酯、2,2,2-三氟乙烷磺酸酯、五氟苯磺酸酯、4-三氟甲基苯磺酸酯、4-氟苯磺酸酯、甲苯磺酸酯、苯磺酸酯、萘磺酸酯、樟腦磺酸酯、辛烷磺酸酯、十二烷基苯磺酸酯、丁烷磺酸酯、甲烷磺酸酯、2-苯甲醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-(4-苯基苯甲醯氧基)丙烷磺酸酯、1,1,3,3,3-五氟-2-三甲基乙醯氧基丙烷磺酸酯、2-環己烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-呋喃甲醯氧基丙烷磺酸酯、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-(4-第三丁基苯甲醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、2-金剛烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-乙醯氧-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-羥基丙烷磺酸酯、1,1,3,3,3-五氟-2-甲苯磺醯氧基丙烷磺酸酯、1,1-二氟-2-萘基-乙烷磺酸酯、1,1,2,2-四氟-2-(冰片烷-2-基)乙烷磺酸酯、1,1,2,2-四氟-2-(四環[4.4.0.12,5
.17,10
]十二-3-烯-8-基)乙烷磺酸酯等所取代的化合物。
硝基苄基磺酸酯型光酸產生劑例如有2,4-二硝基苄基磺酸酯、2-硝基苄基磺酸酯、2,6-二硝基苄基磺酸酯,磺酸酯之具體例有三氟甲烷磺酸酯、五氟乙烷磺酸酯、九氟丁烷磺酸酯、十二氟己烷磺酸酯、五氟乙基全氟環己烷磺酸酯、十七氟辛烷磺酸酯、2,2,2-三氟乙烷磺酸酯、五氟苯磺酸酯、4-三氟甲基苯磺酸酯、4-氟苯磺酸酯、甲苯磺酸酯、苯磺酸酯、萘磺酸酯、樟腦磺酸酯、辛烷磺酸酯、十二烷基苯磺酸酯、丁烷磺酸酯、甲烷磺酸酯、2-苯甲醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-(4-苯基苯甲醯氧基)丙烷磺酸酯、1,1,3,3,3-五氟-2-三甲基乙醯氧基丙烷磺酸酯、2-環己烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-呋喃甲醯氧基丙烷磺酸酯、2-萘醯氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-(4-第三丁基苯甲醯氧基)-1,1,3,3,3-五氟丙烷磺酸酯、2-金剛烷羰氧基-1,1,3,3,3-五氟丙烷磺酸酯、2-乙醯氧-1,1,3,3,3-五氟丙烷磺酸酯、1,1,3,3,3-五氟-2-羥基丙烷磺酸酯、1,1,3,3,3-五氟-2-甲苯磺醯氧基丙烷磺酸酯、1,1-二氟-2-萘基-乙烷磺酸酯、1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、1,1,2,2-四氟-2-(四環[4.4.0.12,5
.17,10
]十二-3-烯-8-基)乙烷磺酸酯等。又,同樣也可使用將苄基側之硝基以三氟甲基取代的化合物。
磺酸型光酸產生劑例如有雙(苯磺醯基)甲烷、雙(4-甲基苯磺醯基)甲烷、雙(2-萘基磺醯基)甲烷、2,2-雙(苯基磺醯基)丙烷、2,2-雙(4-甲基苯基磺醯基)丙烷、2,2-雙(2-萘基磺醯基)丙烷、2-甲基-2-(對-甲苯磺醯基)苯丙酮、2-(環己基羰基)-2-(對-甲苯磺醯基)丙烷、2,4-二甲基-2-(對-甲苯磺醯基)戊烷-3-酮等。
乙二肟衍生物型之光酸產生劑例如有專利第2906999號公報或日本特開平9-301948號公報所記載之化合物,具體例有雙-O-(對-甲苯磺醯基)-α-二甲基乙二肟、雙-O-(對-甲苯磺醯基)-α-二苯基乙二肟、雙-O-(對-甲苯磺醯基)-α-二環己基乙二肟、雙-O-(對-甲苯磺醯基)-2,3-戊二酮乙二肟、雙-O-(正丁烷磺醯基)-α-二甲基乙二肟、雙-O-(正丁烷磺醯基)-α-二苯基乙二肟、雙-O-(正丁烷磺醯基)-α-二環己基乙二肟、雙-O-(甲烷磺醯基)-α-二甲基乙二肟、雙-O-(三氟甲烷磺醯基)-α-二甲基乙二肟、雙-O-(2,2,2-三氟乙烷磺醯基)-α-二甲基乙二肟、雙-O-(10-樟腦磺醯基)-α-二甲基乙二肟、雙-O-(苯磺醯基)-α-二甲基乙二肟、雙-O-(對-氟苯磺醯基)-α-二甲基乙二肟、雙-O-(對三氟甲基苯磺醯基)-α-二甲基乙二肟、雙-O-(二甲苯磺醯基)-α-二甲基乙二肟、雙-O-(三氟甲烷磺醯基)-環己二酮二肟、雙-O-(2,2,2-三氟乙烷磺醯基)-環己二酮二肟、雙-O-(10-樟腦磺醯基)-環己二酮二肟、雙-O-(苯磺醯基)-環己二酮二肟、雙-O-(對氟苯磺醯基)-環己二酮二肟、雙-O-(對三氟甲基苯磺醯基)-環己二酮二肟、雙-O-(二甲苯磺醯基)-環己二酮二肟等。
美國專利第6004724號說明書所記載之肟磺酸酯,特別是例如(5-(4-甲苯磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-(10-樟腦磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-正辛烷磺醯基肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-(4-甲苯磺醯基)肟基-5H-噻吩-2-基亞基)(2-甲基苯基)乙腈、(5-(10-樟腦磺醯基)肟基-5H-噻吩-2-基亞基)(2-甲基苯基)乙腈、(5-正辛烷磺醯基肟基-5H-噻吩-2-基亞基)(2-甲苯基)乙腈等,美國專利第6916591號說明書之(5-(4-(4-甲苯磺醯氧基)苯磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈、(5-(2,5-雙(4-甲苯磺醯氧基)苯磺醯基)肟基-5H-噻吩-2-基亞基)苯基乙腈等。
美國專利第6261738號說明書、日本特開2000-314956號公報中所記載之肟磺酸酯,特別是例如2,2,2-三氟-1-苯基-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-苯基-乙酮肟-O-(10-樟腦基磺酸酯)、2,2,2-三氟-1-苯基-乙酮肟-O-(4-甲氧基苯基磺酸酯)、2,2,2-三氟-1-苯基-乙酮肟-O-(1-萘基磺酸酯)、2,2,2-三氟-1-苯基-乙酮肟-O-(2-萘基磺酸酯)、2,2,2-三氟-1-苯基-乙酮肟-O-(2,4,6-三甲基苯基磺酸酯)、2,2,2-三氟-1-(4-甲基苯基)-乙酮肟-O-(10-樟腦基磺酸酯)、2,2,2-三氟-1-(4-甲基苯基)-乙酮肟-O-(甲基磺酸酯)、2,2,2-三氟-1-(2-甲基苯基)-乙酮肟-O-(10-樟腦基磺酸酯)、2,2,2-三氟-1-(2,4-二甲苯基)-乙酮肟-O-(10-樟腦基磺酸酯)、2,2,2-三氟-1-(2,4-二甲基苯基)-乙酮肟-O-(1-萘基磺酸酯)、2,2,2-三氟-1-(2,4-二甲苯基)-乙酮肟-O-(2-萘基磺酸酯)、2,2,2-三氟-1-(2,4,6-三甲基苯基)-乙酮肟-O-(10-樟腦基磺酸酯)、2,2,2-三氟-1-(2,4,6-三甲基苯基)-乙酮肟-O-(1-萘基磺酸酯)、2,2,2-三氟-1-(2,4,6-三甲苯基)-乙酮肟-O-(2-萘基磺酸酯)、2,2,2-三氟-1-(4-甲氧基苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(4-甲基苯硫基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(3,4-二甲氧基苯基)-乙酮肟-O-甲基磺酸酯、2,2,3,3,4,4,4-七氟-1-苯基-丁酮肟-O-(10-樟腦基磺酸酯)、2,2,2-三氟-1-(苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(苯基)-乙酮肟-O-10-樟腦基磺酸酯、2,2,2-三氟-1-(苯基)-乙酮肟-O-(4-甲氧基苯基)磺酸酯、2,2,2-三氟-1-(苯基)-乙酮肟-O-(1-萘基)磺酸酯、2,2,2-三氟-1-(苯基)-乙酮肟-O-(2-萘基)磺酸酯、2,2,2-三氟-1-(苯基)-乙酮肟-O-(2,4,6-三甲基苯基)磺酸酯、2,2,2-三氟-1-(4-甲基苯基)-乙酮肟-O-(10-樟腦基)磺酸酯、2,2,2-三氟-1-(4-甲基苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(2-甲基苯基)-乙酮肟-O-(10-樟腦基)磺酸酯、2,2,2-三氟-1-(2,4-二甲基苯基)-乙酮肟-O-(1-萘基)磺酸酯、2,2,2-三氟-1-(2,4-二甲基苯基)-乙酮肟-O-(2-萘基)磺酸酯、2,2,2-三氟-1-(2,4,6-三甲基苯基)-乙酮肟-O-(10-樟腦基)磺酸酯、2,2,2-三氟-1-(2,4,6-三甲基苯基)-乙酮肟-O-(1-萘基)磺酸酯、2,2,2-三氟-1-(2,4,6-三甲基苯基)-乙酮肟-O-(2-萘基)磺酸酯、2,2,2-三氟-1-(4-甲氧基苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(4-甲硫基苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(3,4-二甲氧基苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(4-甲氧基苯基)-乙酮肟-O-(4-甲苯基)磺酸酯、2,2,2-三氟-1-(4-甲氧基苯基)-乙酮肟-O-(4-甲氧基苯基)磺酸酯、2,2,2-三氟-1-(4-甲氧基苯基)-乙酮肟-O-(4-十二烷基苯基)磺酸酯、2,2,2-三氟-1-(4-甲氧基苯基)-乙酮肟-O-辛基磺酸酯、2,2,2-三氟-1-(4-甲硫基苯基)-乙酮肟-O-(4-甲氧基苯基)磺酸酯、2,2,2-三氟-1-(4-甲硫基苯基)-乙酮肟-O-(4-十二烷基苯基)磺酸酯、2,2,2-三氟-1-(4-甲硫基苯基)-乙酮肟-O-辛基磺酸酯、2,2,2-三氟-1-(4-甲硫基苯基)-乙酮肟-O-(2-萘基)磺酸酯、2,2,2-三氟-1-(2-甲基苯基)-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-(4-甲基苯基)-乙酮肟-O-苯基磺酸酯、2,2,2-三氟-1-(4-氯苯基)-乙酮肟-O-苯基磺酸酯、2,2,3,3,4,4,4-七氟-1-(苯基)-丁酮肟-O-(10-樟腦基)磺酸酯、2,2,2-三氟-1-萘基-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-2-萘基-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-〔4-苄基苯基〕-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-〔4-(苯基-1,4-二氧雜丁醯-1-基)苯基〕-乙酮肟-O-甲基磺酸酯、2,2,2-三氟-1-萘基-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-2-萘基-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔4-苄基苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔4-甲基磺醯基苯基〕-乙酮肟-O-丙基磺酸酯、1,3-雙〔1-(4-苯氧基苯基)-2,2,2-三氟乙酮肟-O-磺醯基〕苯基、2,2,2-三氟-1-〔4-甲基磺醯氧基苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔4-甲基羰氧基苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔6H,7H-5,8-二氧代萘醯-2-基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔4-甲氧基羰基甲氧基苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔4-(甲氧基羰基)-(4-胺基-1-氧雜-戊醯-1-基)苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔3,5-二甲基-4-乙氧基苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔4-苄氧基苯基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-〔2-苯硫基〕-乙酮肟-O-丙基磺酸酯及2,2,2-三氟-1-〔1-二氧雜噻吩-2-基〕-乙酮肟-O-丙基磺酸酯、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(三氟甲烷磺醯基肟基)-乙基)-苯氧基)-丙氧基)-苯基)乙酮肟(三氟甲烷磺酸酯)、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(1-丙烷磺醯基肟基)-乙基)-苯氧基)-丙氧基)-苯基)乙酮肟(1-丙烷磺酸酯)、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(1-丁烷磺醯基肟基)-乙基)-苯氧基)-丙氧基)-苯基)乙酮肟(1-丁烷磺酸酯)等,美國專利第6916591號說明書所記載之2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(4-(4-甲基苯基磺醯氧基)苯基磺醯基肟基)-乙基)-苯氧基)-丙氧基)-苯基)乙酮肟(4-(4-甲基苯基磺醯氧基)苯基磺酸酯)、2,2,2-三氟-1-(4-(3-(4-(2,2,2-三氟-1-(2,5-雙(4-甲基苯基磺醯氧基)-丙氧基)-苯基)乙酮肟(2,5-雙(4-甲基苯基磺醯氧基)苯基磺醯氧基)苯基磺酸酯)等。
日本特開平9-95479號公報、特開平9-230588號公報或文中之先前技術之肟磺酸酯、α-(對-甲苯磺醯基肟基)苯基乙腈、α-(對-氯苯磺醯基肟基)苯基乙腈、α-(4-硝基苯磺醯基肟基)苯基乙腈、α-(4-硝基-2-三氟甲基苯磺醯基肟基)苯基乙腈、α-(苯磺醯基肟基)-4-氯苯基乙腈、α-(苯磺醯基肟基)-2,4-二氯苯基乙腈、α-(苯磺醯基肟基)-2,6-二氯苯基乙腈、α-(苯磺醯基肟基)-4-甲氧基苯基乙腈、α-(2-氯苯磺醯基肟基)-4-甲氧基苯基乙腈、α-(苯磺醯基肟基)-2-噻嗯基乙腈、α-(4-十二烷基苯磺醯基肟基)-苯基乙腈、α-〔(4-甲苯磺醯基肟基)-4-甲氧基苯基〕乙腈、α-〔(十二烷基苯磺醯基肟基)-4-甲氧苯基〕乙腈、α-(甲苯磺醯基肟基)-3-噻嗯基乙腈、α-(甲基磺醯基肟基)-1-環戊烯基乙腈、α-(乙基磺醯基肟基)-1-環戊烯基乙腈、α-(異丙基磺醯基肟基)-1-環戊烯基乙腈、α-(正丁基磺醯基肟基)-1-環戊烯基乙腈、α-(乙基磺醯基肟基)-1-環己烯基乙腈、α-(異丙基磺醯基肟基)-1-環己烯基乙腈、α-(正丁基磺醯基肟基)-1-環己烯基乙腈等。
下述式表示之肟磺酸酯(例如WO2004/074242所具體記載者)。
具體例如有2-〔2,2,3,3,4,4,5,5-八氟-1-(九氟丁基磺醯基肟基)-戊基〕-芴、2-〔2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)-丁基〕-芴、2-〔2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)-己基〕-芴、2-〔2,2,3,3,4,4,5,5-八氟-1-(九氟丁基磺醯基肟基)-戊基〕-4-聯苯、2-〔2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)-丁基〕-4-聯苯、2-〔2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)-己基〕-4-聯苯等。
另外,雙肟磺酸酯例如有日本特開平9-208554號公報之化合物,特別是雙(α-(4-甲苯磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(苯磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(甲烷磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(丁烷磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(10-樟腦磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(4-甲苯磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(三氟甲烷磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(4-甲氧基苯磺醯氧基)亞胺基)-對苯二乙腈、雙(α-(4-甲苯磺醯氧基)亞胺基)-間苯二乙腈、雙(α-(苯磺醯氧基)亞胺基)-間苯二乙腈、雙(α-(甲烷磺醯氧基)亞胺基)-間苯二乙腈、雙(α-(丁烷磺醯氧基)亞胺基)-間苯二乙腈、雙(α-(10-樟腦磺醯氧基)亞胺基)-間苯二乙腈、雙(α-(4-甲苯磺醯基氧基)亞胺基)-間苯二乙腈、雙(α-(三氟甲烷磺醯基氧基)亞胺基)-間苯二乙腈、雙(α-(4-甲氧基苯磺醯氧基)亞胺基)-間苯二乙腈等。
其中較佳之光酸產生劑為鋶鹽、雙磺醯基重氮甲烷、N-磺醯氧基醯亞胺、肟-O-磺酸酯、乙二肟衍生物。更佳之光酸產生劑為鋶鹽、雙磺醯基重氮甲烷、N-磺醯氧基醯亞胺、肟-O-磺酸酯。具體例有三苯鋶對甲苯磺酸酯、三苯鋶樟腦磺酸酯、三苯鋶五氟苯磺酸酯、三苯鋶九氟丁烷磺酸酯、三苯鋶4-(4’-甲苯磺醯氧基)苯磺酸酯、三苯鋶-2,4,6-三異丙基苯磺酸酯、4-第三丁氧基苯基二苯基鋶對甲苯磺酸酯、4-第三丁氧基苯基二苯基鋶樟腦磺酸酯、4-第三丁氧基苯基二苯基鋶4-(4’-甲苯磺醯氧基)苯磺酸酯、三(4-甲基苯基)鋶樟腦磺酸酯、三(4-第三丁基苯基)鋶樟腦磺酸酯、4-第三丁基苯基二苯基鋶樟腦磺酸酯、4-第三丁基苯基二苯基鋶九氟-1-丁烷磺酸酯、4-第三丁基苯基二苯基鋶五氟乙基全氟環己烷磺酸酯、4-第三丁基苯基二苯基鋶全氟-1-辛烷磺酸酯、三苯鋶1,1-二氟-2-萘基-乙烷磺酸酯、三苯鋶1,1,2,2-四氟-2-(降冰片烷-2-基)乙烷磺酸酯、雙(第三丁基磺醯基)重氮甲烷、雙(環己基磺醯基)重氮甲烷、雙(2,4-二甲基苯基磺醯基)重氮甲烷、雙(4-正己氧基)苯基磺醯基)重氮甲烷、雙(2-甲基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(2,5-二甲基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(3,5-二甲基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(2-甲基-5-異丙基-4-(正己氧基)苯基磺醯基)重氮甲烷、雙(4-第三丁基苯基磺醯基)重氮甲烷、N-樟腦磺醯氧基-5-降冰片烯-2,3-二羧酸醯亞胺、N-對甲苯磺醯氧基-5-降冰片烯-2,3-二羧酸醯亞胺、2-〔2,2,3,3,4,4,5,5-八氟-1-(九氟丁基磺醯基肟基)-戊基〕-芴、2-〔2,2,3,3,4,4-五氟-1-(九氟丁基磺醯基肟基)-丁基〕-芴、2-〔2,2,3,3,4,4,5,5,6,6-十氟-1-(九氟丁基磺醯基肟基)-己基〕-芴等。
本發明之化學增幅型光阻材料之光酸產生劑(B)之添加量可適當選擇,通常對於光阻材料中之基底聚合物100質量份時,添加0.1~40質量份,較佳為0.1~20質量份。光酸產生劑之比例太高時,解像性可能劣化或顯像/光阻剝離時可能產生異物的問題。上述光酸產生劑可單獨或混合二種以上使用。使用曝光波長之透過率低之光酸產生劑,也可以其添加量控制光阻膜中的透過率。
本發明之光阻材料中可添加藉酸分解產生酸的化合物(酸增殖化合物)。這些化合物記載於J.Photopolym.Sci.and Tech.,8.43-44,45-46(1995),J.Photopolym.Sci.and Tech.,9.29-30(1996)。
酸增殖化合物例如有第三丁基-2-甲基2-甲苯磺醯氧基甲基乙醯乙酸酯、2-苯基-2-(2-甲苯磺醯氧基乙基)-1,3-二氧雜戊環等,但是不受此限。公知之光酸產生劑中,安定性特別是熱安定性較差的化合物大部分具有酸增殖化合物的特性。
本發明之光阻材料中之酸增殖化合物的添加量係對於光阻材料中之基底聚合物100質量份時,添加0~2質量份,更理想為0~1質量份。添加量太多時,很難控制擴散,產生解像性劣化、圖型形狀劣化。
本發明之光阻材料係再含有一種以上之分子量150以上之酸性有機化合物(C)。調配(C)成分可降低基板上之缺陷。
(C)成分係下述一般式(1)或(2)表示之化合物較佳。
R1
係結構內不含碳、氫、氧以外之原子及雙鍵之直鏈狀或支鏈狀之一價有機基,特別是僅由甲基、亞甲基、甲川基及醚鍵所構成之一價有機基。一般式(1)表示之分子量150以上之酸性有機化合物,具體例如下述一般式(2)表示之酸性有機化合物之具體例外,例如有2-甲基辛烷磺酸、1-乙基庚烷磺酸、1-甲氧基己烷磺酸、1-甲氧基辛烷磺酸、7-甲基辛烷磺酸、1,1-二甲基壬烷磺酸、1-乙基四十烷磺酸、2-甲基壬酸、1-乙基辛酸、1-甲氧基庚酸、1-甲氧基壬酸、7-甲基壬酸、1,1-二甲基癸酸、1-乙基四十烷酸,但是不受此限。
n為滿足3≦n≦100之整數,換言之,一般式(2)係碳數6~103之直鏈飽和脂肪酸或碳數5~102之直鏈飽和烷磺酸。一般式(2)表示之分子量150以上之酸性有機化合物,其具體例如下述化合物,但是不受此限。
(C)成分之分子量必須為150以上。分子量低於150時,有時缺陷降低的效果不足。其分子量之上限通常為3,000以下,特別是2,000以下。
本發明之光阻材料之分子量150以上之酸性有機化合物(C)的添加量係對於光阻材料中之基底聚合物100質量份時,添加超過0質量份且10質量份以下,較佳為超過0質量份且5質量份以下。較佳為0.1質量份以上,特別是0.3質量份以上。添加量太多時,有時產生解像性劣化或圖型形狀劣化。
本發明中,樹脂成分(A)含有酸性之重複單位時,分子量150以上之酸性有機化合物(C)之添加效果特別大。
酸性之重複單位例如羧酸、具有部分或全部氟取代之醇等之部分構造的單位等,具體例如丙烯酸、甲基丙烯酸、丙烯醯氧基環己烷羧酸、甲基丙烯醯氧基環己烷羧酸、甲基丙烯醯氧基二環[2.2.1]庚烷羧酸、甲基丙烯醯氧基三環[5.2.1.02,6
]癸烷羧酸、甲基丙烯醯氧基四環[4.4.0.12,5
.17,10
]十二烷羧酸、丙烯酸〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己酯、甲基丙烯酸〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己酯、丙烯酸雙〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己酯、甲基丙烯酸雙〔2,2,2-三氟-1-羥基-1-(三氟甲基)乙基〕環己酯等之單位,但是不受此限。此時酸性之重複單位之含有比例係(A)成分中為0~30莫耳%,特別理想為0~20莫耳%。
含有酸性之重複單位之樹脂的極性高於不含這些重複單位的樹脂。一般而言,基板的極性高於光阻膜及形成該膜的樹脂,但是樹脂中導入酸性之重複單位時,基板與樹脂的極性相近,來自樹脂的殘渣物容易殘留於基板上。
本發明之光阻材料除了上述(A)、(B)及(C)成分外,可含有(D)有機溶劑,必要時可含有(E)含氮有機化合物、(F)界面活性劑、(G)其他成分。
本發明使用之(D)成分之有機溶劑只要是可溶解基底樹脂、酸產生劑、其他添加劑等之有機溶劑時皆可使用。這種有機溶劑例如環己酮、甲基戊酮等之酮類;3-甲氧基丁醇、3-甲基-3-甲氧基丁醇、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇等醇類;丙二醇單甲醚、乙二醇單甲醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇二甲醚、二甘醇二甲醚等醚類;丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、乳酸乙酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸第三丁酯、丙酸第三丁酯、丙二醇單第三丁醚乙酸酯等酯類;γ-丁內酯等內酯類,這些可單獨使用1種或混合2種以上使用,但不限定於上述溶劑。本發明中,這些溶劑中較適合使用對光阻成分中之酸產生劑之溶解性最優異之二甘醇二甲醚或1-乙氧基-2-丙醇、丙二醇單甲醚乙酸酯及其混合溶劑。
有機溶劑之使用量係對於基底聚合物100質量份時,使用200至3,000質量份,特別理想為400至2,500質量份。
本發明之光阻材料中可含有1種或2種以上之(E)成分之含氮有機化合物。
含氮有機化合物係以可抑制因酸產生劑所產生之酸擴散至光阻膜中之擴散速度的化合物較適合。添加含氮有機化合物可抑制光阻膜中之酸之擴散速度,提高解像度,抑制曝光後之感度變化,或降低基板或環境之依存性,可提昇曝光容許度或圖型之外形等。
這種含氮有機化合物例如可為以往光阻材料,特別是化學增幅正型光阻材料使用之公知的含氮有機化合物,例如第1級、第2級、第3級之脂肪族胺類、混合胺類、芳香族胺類、雜環胺類、具有羧基之含氮化合物、具有磺醯基之含氮化合物、具有羥基之含氮化合物、具有羥苯基之含氮化合物、醇性含氮化合物、醯胺類、醯亞胺類、胺基甲酸酯類等。
具體而言,第1級之脂肪胺類例如有氨、甲胺、乙胺、正丙胺、異丙胺、正丁胺、異丁胺、第二丁胺、第三丁胺、戊胺、第三戊胺、環戊胺、己胺、環己胺、庚胺、辛胺、壬胺、癸胺、月桂胺、十六烷胺、甲二胺、乙二胺、四乙撐戊胺等;第2級之脂肪胺族類例如有二甲胺、二乙胺、二正丙胺、二異丙胺、二正丁胺、二異丁胺、二第二丁胺、二戊胺、二環戊胺、二己胺、二環己胺、二庚胺、二辛胺、二壬胺、二癸胺、二月桂胺、二-十六烷胺、N,N-二甲基甲撐二胺、N,N-二甲基乙二胺、N,N-二甲基四乙撐戊胺等;第3級之脂肪族胺類例如有三甲胺、三乙胺、三正丙胺、三異丙胺、三正丁胺、三異丁胺、三第二丁胺、三戊胺、三環戊胺、三己胺、三環己胺、三庚胺、三辛胺、三壬胺、三癸胺、三月桂胺、三-十六烷胺、N,N,N’,N’-四甲基甲二胺、N,N,N’,N’-四甲基乙二胺、N,N,N’,N’-四甲基四乙撐戊胺等。
又,混合胺類例如有二甲基乙胺、甲基乙基丙胺、苄胺、苯乙胺、苄基二甲胺等。芳香族胺類及雜環胺類之具體例有苯胺衍生物(例如苯胺、N-甲基苯胺、N-乙基苯胺、N-丙基苯胺、N,N-二甲基苯胺、2-甲基苯胺、3-甲基苯胺、4-甲基苯胺、乙基苯胺、丙基苯胺、三甲基苯胺、2-硝基苯胺、3-硝基苯胺、4-硝基苯胺、2,4-二硝基苯胺、2,6-二硝基苯胺、3,5-二硝基苯胺、N,N-二甲基甲苯胺等)、二苯基(對甲苯基)胺、甲基二苯胺、三苯胺、苯二胺、萘胺、二胺基萘、吡咯衍生物(例如吡咯、2H-吡咯、1-甲基吡咯、2,4-二甲基吡咯、2,5-二甲基吡咯、N-甲基吡咯等)、噁唑衍生物(例如噁唑、異噁唑等)、噻唑衍生物(例如噻唑、異噻唑等)、咪唑衍生物(例如咪唑、4-甲基咪唑、4-甲基-2-苯基咪唑等)、吡唑衍生物、呋咱衍生物、吡咯啉衍生物(例如吡咯啉、2-甲基-1-吡咯啉等)、吡咯烷衍生物(例如吡咯烷、N-甲基吡咯烷、吡咯烷酮、N-甲基吡咯烷酮等)、咪唑啉衍生物、咪唑並吡啶衍生物、吡啶衍生物(例如吡啶、甲基吡啶、乙基吡啶、丙基吡啶、丁基吡啶、4-(1-丁基戊基)吡啶、二甲基吡啶、三甲基吡啶、三乙基吡啶、苯基吡啶、3-甲基-2-苯基吡啶、4-第三丁基吡啶、二苯基吡啶、苯甲基吡啶、甲氧基吡啶、丁氧基吡啶、二甲氧基吡啶、4-吡咯烷基吡啶、2-(1-乙基丙基)吡啶、胺基吡啶、二甲胺基吡啶等)、噠嗪衍生物、嘧啶衍生物、吡嗪衍生物、吡唑啉衍生物、吡唑烷衍生物、哌啶衍生物、哌嗪衍生物、嗎啉衍生物、吲哚衍生物、異吲哚衍生物、1H-吲唑衍生物、吲哚啉衍生物、喹啉衍生物(例如喹啉、3-喹啉腈等)、異喹啉衍生物、噌啉衍生物、喹唑啉衍生物、喹喔啉衍生物、酞嗪衍生物、嘌呤衍生物、喋啶衍生物、咔唑衍生物、菲繞啉衍生物、吖啶衍生物、吩嗪衍生物、1,10-菲繞啉衍生物、腺嘌呤衍生物、腺苷衍生物、鳥嘌呤衍生物、鳥苷衍生物、脲嘧啶衍生物、脲嗪衍生物等。
又,具有羧基之含氮化合物,例如胺基苯甲酸、吲哚羧酸、胺基酸衍生物(例如菸鹼酸、丙氨酸、精氨酸、天冬氨酸、枸椽酸、甘氨酸、組氨酸、異賴氨酸、甘氨醯白氨酸、白氨酸、蛋氨酸、苯基丙氨酸、蘇氨酸、賴氨酸、3-胺基吡嗪-2-羧酸、甲氧基丙氨酸)等;具有磺醯基之含氮化合物例如3-吡啶磺酸、對甲苯磺酸吡啶鎓等;具有羥基之含氮化合物、具有羥苯基之含氮化合物、醇性含氮化合物例如有2-羥基吡啶、胺基甲酚、2,4-喹啉二醇、3-吲哚甲醇氫化物、單乙醇胺、二乙醇胺、三乙醇胺、N-乙基二乙醇胺、N,N-二乙基乙醇胺、三異丙醇胺、2,2’-亞胺基二乙醇、2-胺基乙醇、3-胺基-1-丙醇、4-胺基-1-丁醇、4-(2-羥乙基)嗎啉、2-(2-羥乙基)吡啶、1-(2-羥乙基)哌嗪、1-〔2-(2-羥基乙氧基)乙基〕哌嗪、哌嗪乙醇、1-(2-羥乙基)吡咯烷、1-(2-羥乙基)-2-吡咯烷酮、3-哌啶基-1,2-丙二醇、3-吡咯烷基-1,2-丙二醇、8-羥基久洛尼啶、3-喹寧醇、3-托品醇、1-甲基-2-吡咯烷乙醇、1-氮雜環丙烷乙醇、N-(2-羥乙基)肽醯亞胺、N-(2-羥乙基)異菸鹼醯胺等。醯胺衍生物例如甲醯胺、N-甲基醯胺、N,N-二甲基甲醯胺、乙醯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、丙醯胺、苯醯胺、1-環己基吡咯烷酮等。醯亞胺衍生物例如有酞醯亞胺、琥珀醯亞胺、馬來醯亞胺等。胺基甲酸酯類例如有N-第三丁氧基羰基-N,N-二環己基胺、N-第三丁氧基羰基苯並咪唑、噁唑酮。
例如下述一般式(B)-1所示之含氮之有機化合物。
N(X)n
(Y)3-n
(B)-1(式中,n為1、2或3。側鏈X為可相同或不同,可以下述一般式(X1)至(X3)
所示。側鏈Y可為相同或不同之氫原子或直鏈狀、支鏈狀或環狀之碳數1至20的烷基,可含有醚基或羥基。X彼此可鍵結形成環)
R300
、R302
、R305
為碳數1至4之直鏈狀或支鏈狀之伸烷基;R301
、R304
為氫原子、或碳數1至20之直鏈狀、支鏈狀或環狀之烷基,可含有1個或多個之羥基、醚基、酯基、內酯環。
R303
為單鍵、或碳數1至4之直鏈狀或支鏈狀之伸烷基,R306
為碳數1至20之直鏈狀、支鏈狀或環狀之烷基,可含有1個或多個羥基、醚基、酯基、內酯環。
以上述一般式(B)-1表示之化合物,具體例如三(2-甲氧甲氧乙基)胺、三{2-(2-甲氧乙氧基)乙基}胺、三{2-(2-甲氧乙氧甲氧基)乙基}胺、三{2-(1-甲氧乙氧基)乙基}胺、三{2-(1-乙氧乙氧基)乙基}胺、三{2-(1-乙氧丙氧基)乙基}胺、三〔2-{2-(2-羥基乙氧基)乙氧基}乙基〕胺、4,7,13,16,21,24-六氧雜-1,10-二氮雜二環〔8,8,8〕二十六烷、4,7,13,18-四氧雜-1,10-二氮雜二環〔8,5,5〕二十烷、1,4,10,13-四氧雜-7,16-二氮雜二環十八烷、1-氮雜-12-冠-4、1-氮雜-15-冠-5、1-氮雜-18-冠-6、三(2-甲醯氧乙基)胺、三(2-乙醯氧乙基)胺、三(2-丙醯氧乙基)胺、三(2-丁醯氧乙基)胺、三(2-異丁醯氧乙基)胺、三(2-戊醯氧乙基)胺、三(2-己醯氧乙基)胺、N,N-雙(2-乙醯氧乙基)2-(乙醯氧乙醯氧基)乙胺、三(2-甲氧羰氧乙基)胺、三(2-第三丁氧羰氧乙基)胺、三[2-(2-氧代丙氧基)乙基]胺、三[2-(甲氧羰甲基)氧乙基]胺、三[2-(第三丁氧羰甲基氧基)乙基]胺、三[2-(環己基氧基羰甲基氧基)乙基]胺、三(2-甲氧羰乙基)胺、三(2-乙氧基羰乙基)胺、N,N-雙(2-羥乙基)2-(甲氧羰基)乙胺、N,N-雙(2-乙醯氧基乙基)2-(甲氧羰基)乙胺、N,N-雙(2-羥乙基)2-(乙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(乙氧羰基)乙胺、N,N-雙(2-羥乙基)2-(2-甲氧乙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(2-甲氧乙氧羰基)乙胺、N,N-雙(2-羥乙基)2-(2-羥基乙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(2-乙醯氧乙氧羰基)乙胺、N,N-雙(2-羥乙基)2-[(甲氧羰基)甲氧羰基]乙胺、N,N-雙(2-乙醯氧乙基)2-[(甲氧羰基)甲氧羰基]乙胺、N,N-雙(2-羥乙基)2-(2-氧代丙氧羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(2-氧代丙氧羰基)乙胺、N,N-雙(2-羥乙基)2-(四氫糠氧基羰基)乙胺、N,N-雙(2-乙醯氧乙基)2-(四氫糠氧基羰基)乙胺、N,N-雙(2-羥乙基)2-[2-(氧代四氫呋喃-3-基)氧羰基]乙胺、N,N-雙(2-乙醯氧乙基)2-[(2-氧代四氫呋喃-3-基)氧羰基]乙胺、N,N-雙(2-羥乙基)2-(4-羥基丁氧羰基)乙胺、N,N-雙(2-甲醯氧乙基)2-(4-甲醯氧基丁氧羰基)乙胺、N,N-雙(2-甲醯氧乙基)2-(2-甲醯氧乙氧基羰基)乙胺、N,N-雙(2-甲氧乙基)2-(甲氧羰基)乙胺、N-(2-羥乙基)雙[2-(甲氧羰基)乙基]胺、N-(2-乙醯氧乙基)雙[2-(甲氧羰基)乙基]胺、N-(2-羥乙基)雙[2-(乙氧羰基)乙基]胺、N-(2-乙醯氧乙基)雙[2-(乙氧羰基)乙基]胺、N-(3-羥基-1-丙基)雙[2-(甲氧羰基)乙基]胺、N-(3-乙醯氧基-1-丙基)雙[2-(甲氧羰基)乙基]胺、N-(2-甲氧乙基)雙[2-(甲氧羰基)乙基]胺、N-丁基雙[2-(甲氧羰基)乙基]胺、N-丁基雙[2-(2-甲氧乙氧羰基)乙基]胺、N-甲基雙(2-乙醯氧乙基)胺、N-乙基雙(2-乙醯氧乙基)胺、N-甲基雙(2-三甲基乙醯氧乙基)胺、N-乙基雙[2-(甲氧基羰氧基)乙基]胺、N-乙基雙[2-(第三丁氧羰氧基)乙基]胺、三(甲氧羰甲基)胺、三(乙氧羰甲基)胺、N-丁基雙(甲氧羰甲基)胺、N-己基雙(甲氧羰甲基)胺、β-(二乙胺基)-δ-戊內醯胺,但不受此限。
例如以下述一般式(B)-2所示具有環狀結構之含氮有機化合物。
上述一般式(B)-2之具體例有1-[2-(甲氧甲氧基)乙基]吡咯烷、1-[2-(甲氧甲氧基)乙基]哌啶、4-[2-(甲氧甲氧基)乙基]嗎啉、1-[2-[2-(甲氧乙氧基)甲氧基]乙基]吡咯烷、1-[2-[2-(甲氧乙氧基)甲氧基]乙基]哌啶、4-[2-[2-(甲氧乙氧基)甲氧基]乙基]嗎啉、乙酸2-(1-吡咯基)乙酯、乙酸2-哌啶基乙酯、乙酸2-嗎啉乙酯、甲酸2-(1-吡咯基)乙酯、丙酸2-哌啶基乙酯、乙醯氧乙酸2-嗎啉乙酯、甲氧基乙酸2-(1-吡咯基)乙酯、4-[2-(甲氧羰氧基)乙基]嗎啉、1-[2-(第三丁氧羰氧基)乙基]哌啶、4-[2-(2-甲氧乙氧羰氧基)乙基]嗎啉、3-(1-吡咯基)丙酸甲酯、3-哌啶基丙酸甲酯、3-嗎啉基丙酸甲酯、3-(硫基嗎啉基)丙酸甲酯、2-甲基-3-(1-吡咯基)丙酸甲酯、3-嗎啉基丙酸乙酯、3-哌啶基丙酸甲氧羰基甲酯、3-(1-吡咯基)丙酸2-羥乙酯、3-嗎啉基丙酸2-乙醯氧乙酯、3-(1-吡咯基)丙酸2-氧代四氫呋喃-3-酯、3-嗎啉基丙酸四氫糠酯、3-哌啶基丙酸縮水甘油酯、3-嗎啉基丙酸2-甲氧基乙酯、3-(1-吡咯基)丙酸2-(2-甲氧乙氧基)乙酯、3-嗎啉基丙酸丁酯、3-哌啶基丙酸環己酯、α-(1-吡咯基)甲基-γ-丁內酯、β-哌啶基-γ-丁內酯、β-嗎啉基-δ-戊內酯、1-吡咯基乙酸甲酯、哌啶基乙酸甲酯、嗎啉基乙酸甲酯、硫基嗎啉基乙酸甲酯、1-吡咯基乙酸乙酯、嗎啉基乙酸2-甲氧基乙酯、2-甲氧基乙酸2-嗎啉基乙酯、2-(2-甲氧乙氧基)乙酸2-嗎啉基乙酯、2-(2-(2-甲氧乙氧基)乙氧基〕乙酸2-嗎啉基乙酯、己酸2-嗎啉基乙酯、辛酸2-嗎啉基乙酯、癸酸2-嗎啉基乙酯、月桂酸2-嗎啉基乙酯、十四酸2-嗎啉基乙酯、十六酸2-嗎啉基乙酯、十八酸2-嗎啉基乙酯。
以一般式(B)-3至(B)-6所示具有氰基之含氮有機化合物。
上述式(B)-3至(B)-6所示具有氰基之含氮有機化合物的具體例如3-(二乙胺基)丙腈、N,N-雙(2-羥乙基)-3-胺基丙腈、N,N-雙(2-乙醯氧乙基)-3-胺基丙腈、N,N-雙(2-甲醯氧乙基)-3-胺基丙腈、N,N-雙(2-甲氧乙基)-3-胺基丙腈、N,N-雙[2-(甲氧甲氧基)乙基]-3-胺基丙腈、N-(2-氰乙基)-N-(2-甲氧乙基)-3-胺基丙酸甲酯、N-(2-氰乙基)-N-(2-羥乙基)-3-胺基丙酸甲酯、N-(2-乙醯氧乙基)-N-(2-氰乙基)-3-胺基丙酸甲酯、N-(2-氰乙基)-N-乙基-3-胺基丙腈、N-(2-氰乙基)-N-(2-羥乙基)-3-胺基丙腈、N-(2-乙醯氧乙基)-N-(2-氰乙基)-3-胺基丙腈、N-(2-氰乙基)-N-(2-甲醯氧乙基)-3-胺基丙腈、N-(2-氰乙基)-N-(2-甲氧乙基)-3-胺基丙腈、N-(2-氰乙基)-N-[2-(甲氧甲氧基)乙基]-3-胺基丙腈、N-(2-氰乙基)-N-(3-羥基-1-丙基)-3-胺基丙腈、N-(3-乙醯基-1-丙基)-N-(2-氰乙基)-3-胺基丙腈、N-(2-氰乙基)-N-(3-甲醯氧基-1-丙基)-3-胺基丙腈、N-(2-氰乙基)-N-四氫糠基-3-胺基丙腈、N,N-雙(2-氰乙基)-3-胺基丙腈、二乙胺基乙腈、N,N-雙(2-羥乙基)胺基乙腈、N,N-雙(2-乙醯氧乙基)胺基乙腈、N,N-雙(2-甲醯氧乙基)胺基乙腈、N,N-雙(2-甲氧乙基)胺基乙腈、N,N-雙[2-(甲氧甲氧基)乙基]胺基乙腈、N-氰甲基-N-(2-甲氧乙基)-3-胺基丙酸甲酯、N-氰甲基-N-(2-羥乙基)-3-胺基丙酸甲酯、N-(2-乙醯氧乙基)-N-氰甲基-3-胺基丙酸甲酯、N-氰甲基-N-(2-羥乙基)胺基乙腈、N-(2-乙醯氧乙基)-N-(氰甲基)胺基乙腈、N-氰甲基-N-(2-甲醯氧乙基)胺基乙腈、N-氰甲基-N-(2-甲氧乙基)胺基乙腈、N-氰甲基-N-[2-(甲氧甲氧基)乙基]胺基乙腈、N-(氰甲基)-N-(3-羥基-1-丙基)胺基乙腈、N-(3-乙醯氧基-1-丙基)-N-(氰甲基)胺基乙腈、N-氰甲基-N-(3-甲醯氧基-1-丙基)胺基乙腈、N,N-雙(氰甲基)胺基乙腈、1-吡咯烷基丙腈、1-哌啶基丙腈、4-嗎啉基丙腈、1-吡咯烷乙腈、1-哌啶乙腈、4-嗎啉乙腈、3-二乙胺基丙酸氰甲酯、N,N-雙(2-羥乙基)-3-胺基丙酸氰甲酯、N,N-雙(2-乙醯氧乙基)-3-胺基丙酸氰甲酯、N,N-雙(2-甲醯氧乙基)-3-胺基丙酸氰甲酯、N,N-雙(2-甲氧乙基)-3-胺基丙酸氰甲酯、N,N-雙[2-(甲氧甲氧基)乙基]-3-胺基丙酸氰甲酯、3-二乙胺基丙酸(2-氰乙基)酯、N,N-雙(2-羥乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙(2-乙醯氧乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙(2-甲醯氧乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙(2-甲氧乙基)-3-胺基丙酸(2-氰乙基)酯、N,N-雙[2-(甲氧甲氧基)乙基]-3-胺基丙酸(2-氰乙基)酯、1-吡咯烷丙酸氰甲酯、1-哌啶丙酸氰甲酯、4-嗎啉丙酸氰甲酯、1-吡咯烷丙酸(2-氰乙基)酯、1-哌啶丙酸(2-氰乙基)酯、4-嗎啉丙酸(2-氰乙基)酯。
下述一般式(B)-7表示具有咪唑骨架及極性官能基之含氮有機化合物。
下述一般式(B)-8表示具有苯咪唑骨架及極性官能基之含氮有機化合物。
例如下述一般式(B)-9及(B)-10所示之含有極性官能基之含氮雜環化合物。
下述一般式(B)-11~(B)-14表示具有芳香族羧酸酯結構之含氮有機化合物。
下述一般式(B)-15表示具有7-氧雜降冰片烷-2-羧酸酯結構之含氮有機化合物。
含氮有機化合物之添加量係對於基底聚合物100質量份時,添加0.001~4質量份,特別理想為0.01~2質量份。添加量低於0.001質量份,無添加效果,而添加量超過4質量份時,有時有感度過度降低的情形。
本發明之光阻材料中,除上述成分外,可添加為了提高塗佈性之慣用之任意成分的界面活性劑。任意成分之添加量係不影響本發明效果之範圍內的一般添加量。
界面活性劑以非離子性界面活性劑為佳,例如全氟烷基聚環氧乙烷乙醇、氟化烷酯、全氟烷基胺氧化物、全氟烷基EO加成物、含氟有機矽氧烷系化合物等。例如有Florade「FC-430」、「FC-431」(住友3M(股)製)、Surfuron「S-141」、「S-145」、「KH-10」、「KH-20」、「KH-30」、「KH-40」(旭硝子(股)製)、Unidye「DS-401」、「DS-403」、「DS-451」(大金工業(股)製)、Megafac「F-8151」(大日本油墨工業(股)製)、「X-70-092」、「X-70-093」(信越化學工業(股)製)等。較佳為Florade FC-430(住友3M(股)製)、「KH-20」、「KH-30」(旭硝子(股)製)、「X-70-093」(信越化學工業(股)製)。
本發明之光阻材料中,必要時可添加作為任意成分,偏多存在於塗佈膜上部,調整表面之親水性、疏水性平衡,或提高撥水性,或塗佈膜與水或其他液體接觸時,具有阻礙低分子成分之流入或流出之功能的高分子化合物。高分子化合物之添加量係不影響本發明效果之範圍內的一般添加量。
偏多存在於塗佈膜上部之高分子化合物較佳為1種或2種以上之含氟單位所構成之聚合物、共聚物及含氟單位與其他單位所構成之共聚物。含氟單位與其他單位例如有下述者,但是不受此限定。
偏多存在於塗佈膜上部之高分子化合物之重量平均分子量較佳為1,00~50,00,更佳為2,00~20,00。不在上述範圍內時,表面改質效果不足或產生顯像缺陷。上述重量平均分子量係凝膠滲透層析法(GPC)之聚苯乙烯換算值。
本發明之光阻材料中,必要時可添加任意成分之溶解阻止劑、羧酸化合物、乙炔醇衍生物等之其他成分。此任意成分之添加量係不影響本發明效果之範圍內的一般添加量。
本發明之光阻材料中可添加之溶解阻止劑係重量平均分子量為100~1,00,較佳為150~800,且分子內具有2個以上之酚性羥基之化合物之該酚性羥基之氫原子被酸不穩定基以整體平均0~100莫耳%之比例取代的化合物或分子內具有羧基之化合物之該羧基之氫原子被酸不穩定基以整體平均50~100莫耳%之比例取代的化合物。
酚性羥基之氫原子被酸不穩定基之取代率係平均酚性羥基整體之0莫耳%以上,較佳為30莫耳%以上,其上限為100莫耳%,較佳為80莫耳%。羧基之氫原子被酸不穩定基之取代率係平均羧基整體之50莫耳%以上,較佳為70莫耳%以上,其上限為100莫耳%。
此時具有2個以上之酚性羥基之化合物具有羧基之化合物,較佳為下述式(D1)~(D14)表示者。
上式中,R201
與R202
係分別表示氫原子、或碳數1~8之直鏈狀或支鏈狀之烷基或烯基,例如有氫原子、甲基、乙基、丁基、丙基、乙炔基、環己基。
R203
為氫原子、或碳數1~8之直鏈狀或支鏈狀之烷基或烯基、或-(R207
)h
COOH(式中,R207
係表示碳數1~10之直鏈狀或支鏈狀之伸烷基),例如有與R201
、R202
相同者,或-COOH、-CH2
COOH。
R204
係表示-(CH2
)i
-(i=2~10)、碳數6~10之伸芳基、羰基、磺醯基、氧原子或硫原子,例如有乙烯、伸苯基、羰基、磺醯基、氧原子、硫原子等。
R205
為碳數1~10之伸烷基、碳數6~10之伸芳基、羰基、磺醯基、氧原子或硫原子,例如有伸甲基、或與R204
相同者。
R206
為氫原子、碳數1~8之直鏈狀或支鏈狀之烷基、烯基、或各自之氫原子之至少一個被羥基取代之苯基或萘基,例如有氫原子、甲基、乙基、丁基、丙基、乙炔基、環己基、各自之氫原子之至少一個被羥基取代之苯基、萘基等。
R208
為氫原子或羥基。
j為0~5之整數。u、h為0或1。s、t、s’、t’、s”、t”係分別滿足s+t=8;s’+t’=5;s”+t”=4,且為各苯基骨架中至少具有一個羥基之數。α為式(D8)、(D9)之化合物之重量平均分子量為100~1,00之數。
溶解控制劑之酸不穩定基可使用各種的酸不穩定基,具體而言,例如上述一般式(L1)~(L4)所示之基、碳數4~20之三級烷基、各烷基之碳數分別為1~6之三烷基甲矽烷基、碳數4~20之氧代烷基等。各基之具體例係與前述說明內容相同。
上述溶解控制劑之添加量為對於光阻材料中之基底聚合物100質量份,添加0~50質量份,較佳為0~40質量份,更佳為0~30質量份,可使用1種或將2種以上混合使用。添加量超過50質量份時,有時產生圖案之膜減少,解像度降低的情形。
又,如上述之溶解控制劑係對於具有苯酚性羥基或羧基之化合物,使用有機化學的處方,以導入酸不穩定基之方式來合成。
又,可添加於本發明之光阻材料之羧酸化合物,可使用例如1種或2種以上選自下述〔I群〕及〔II群〕的化合物,但不限於此。添加本成分可提高光阻之PED(Post Exposure Delay)安定性,並可改善氮化膜基板上之邊緣粗糙度。
〔I群〕下述一般式(A1)~(A10)所示之化合物之酚性羥基之氫原子的一部分或全部被-R401
-COOH(R401
為碳數1~10之直鏈狀或支鏈狀之伸烷基)取代所成,且分子中之酚性羥基(C)與以≡C-COOH所示之基(D)之莫耳比為C/(C+D)=0.1~1.0的化合物。
[II群]下述一般式(A11)~(A15)表示之化合物。
上式中,R402
、R403
係分別表示氫原子或碳數1~8之直鏈狀或支鏈狀之烷基或烯基。R404
為氫原子或碳數1~8之直鏈狀或支鏈狀之烷基或烯基,或-(R409
)h1
-COOR’基(R’為氫原子或-R409
-COOH)。
R405
為-(CH2
)i
-(i=2~10)、碳數6~10之伸芳基、羰基、磺醯基、氧原子或硫原子。
R406
為碳數1~10之伸烷基、碳數6~10之伸芳基、羰基、磺醯基、氧原子或硫原子。
R407
為氫原子或碳數1~8之直鏈狀或支鏈狀之烷基、烯基、分別被羥基取代之苯基或萘基。
R408
為氫原子或甲基。
R409
為碳數1~10之直鏈狀或支鏈狀之伸烷基。
R410
為氫原子或碳數1~8之直鏈狀或支鏈狀之烷基或烯基或-R411
-COOH基(式中,R411
為碳數1~10之直鏈狀或支鏈狀之伸烷基)。
R412
為氫原子或羥基。
j為0~3之數,s1、t1、s2、t2、s3、t3、s4、t4係分別滿足s1+t1=8、s2+t2=5、s3+t3=4、s4+t4=6,且為各苯基骨架中至少具有1個羥基之數。
s5、t5係s5≧0、t5≧0,且滿足s5+t5=5之數。
u1為滿足1≦u1≦4之數,h1為滿足1≦h1≦4之數。
為式(A6)化合物之重量平均分子量1,000~5,000之數。
λ為式(A7)化合物之重量平均分子量1,000~10,000之數)。
本成分之具體例如下述一般式(AI-1)~(AI-14)及(AII-1)~(AII-10)所示之化合物,但不限於這些化合物。
上述分子內具有以≡C-COOH表示之基之化合物的添加量係對於基底聚合物100質量份時,添加0~5質量份,較佳為0.1~5質量份,更佳為0.1~3質量份,最佳為0.1~2質量份。高於5質量份時,有時光阻材料之解像度會降低。
可添加於本發明之光阻材料中之炔醇衍生物,可使用例如下述一般式(S1)、(S2)所示的化合物。
炔醇衍生物較佳為Surfynol 61、Surfynol 82、Surfynol 104、Surfynol 104E、Surfynol 104H、Surfynol 104A、Surfynol TG、Surfynol PC、Surfynol 440、Surfynol 465、Surfynol 485(Air Products and Chemicals Inc.製)、Surfynol E1004(日信化學工業(股)製)等。
上述炔醇衍生物之添加量係對於光阻材料之基底聚合物100質量份,添加0~2質量份,更佳為0.01~2質量份,更佳為0.02~1質量份。高於2質量份時,有時光阻材料之解像度會降低。
使用本發明之光阻材料形成圖型時,可使用公知之微影技術,經由塗佈、加熱處理(預烘烤)、曝光、加熱處理(曝光後烘烤,PEB)、顯像之各步驟來達成。必要時也可追加幾個步驟。
形成圖型時,首先,將本發明之光阻材料藉由旋轉塗佈、輥塗佈、流塗、浸漬塗佈、噴灑塗佈、刮刀塗佈等適當塗佈方法,塗佈於製造積體電路用之基板(Si、SiO2
、SiN、SiON、TiN、WSi、BPSG、SOG、有機防反射膜、Cr、CrO、CrON、MoSi等)上,形成塗佈膜厚0.01~2.0μm,接著在加熱板上以60~150℃,1~10分鐘,較佳為80~140℃,1~5分鐘進行預烘烤。因光阻之薄膜化與被加工基板之蝕刻選擇比的關係,加工變得更嚴苛,而檢討在光阻之底層層合含矽中間膜、其下為碳密度高,蝕刻耐性高之底層膜、其下為被加工基板之3層製程。使用氧氣或氫氣、氨氣體等之含矽中間膜與底層膜之蝕刻選擇比高,含矽中間膜可薄膜化。單層光阻與含矽中間層之蝕刻選擇比也較高,單層光阻可薄膜化。此時底層膜之形成方法例如有塗佈及烘烤的方法與CVD的方法。塗佈型時,可使用將酚醛清漆樹脂或具有縮合環等之烯烴聚合的樹脂,CVD膜製作時,可使用丁烷、乙烷、丙烷、乙烯、乙炔等氣體。含矽中間層的情形也有塗佈型與CVD型,而塗佈型例如有倍半矽氧烷、籠狀低聚倍半矽氧烷(POSS)等,CVD用例如有各種矽烷氣體作為原料。含矽中間層可含有具有光吸收之防反射功能,可為苯基等之吸光基或SiON膜。含矽中間膜與光阻之間可形成有機膜,此時之有機膜可為有機防反射膜。光阻膜形成後,以純水清洗(後浸漬)可萃取膜表面之酸產生劑等或洗除粒子,也可塗佈保護膜。
接著,使用選自紫外線、遠紫外線、電子線、X射線、準分子雷射、γ射線、同步加速器放射線等之光源,通過形成目的圖型之所定光罩進行曝光。曝光量為1~200mJ/cm2
,較佳為10~100mJ/cm2
。其次在加熱板上進行60~150℃,1~5分鐘,較佳為80~120℃,1~3分鐘之曝光後烘烤(PEB)。再使用0.1~5質量%,較佳為2~3質量%氫氧化四甲銨(TMAH)等之鹼水溶液之顯像液,以0.1~3分鐘,較佳為0.5~2分鐘,藉由浸漬(dip)法、攪拌(puddle)法、噴灑(spray)法等常用方法進行顯像,在基板上形成目的之圖型。另外,本發明之光阻材料最適合以波長254~193nm之遠紫外線、波長157nm之真空紫外線、電子線、軟X射線、X射線、準分子雷射、γ線、同步加速器放射線,更佳為波長180~200nm之高能量線進行微細圖型化。
本發明之光阻材料也可適用於浸潤式微影。ArF浸潤式微影時,浸潤式溶媒可使用純水或鏈烷等折射率為1以上,曝光波長下為高透明的液體。浸潤式微影係在預烘烤後之光阻膜與投影透鏡之間插入純水或其他液體。藉此可設計開口數(NA)為1.0以上之投影透鏡,可形成更精細圖型。浸潤式微影可使ArF微影延長壽命至45nm節點(node)的重要技術,已正在加速開發中。浸潤式曝光時,為了除去光阻膜上之水滴殘留可在曝光後進行純水清洗,或為防止光阻之溶離物,為了提高膜表面之滑水性時,預烘烤後,可在光阻膜上形成保護膜。浸潤式微影所使用之保護膜較佳為使用不溶於水,可溶解於鹼顯像液,具有1,1,1,3,3,3-六氟-2-丙醇殘基之高分子化合物為基質,溶解於碳數4以上之醇系溶劑、碳數8~12之醚系溶劑及這些之混合溶媒的材料。
ArF微影延長壽命至32nm之技術,例如有雙重圖型化法。雙重圖型化法係第1次曝光與蝕刻下進行1:3溝道圖型之底層加工,然後使位置偏離,以第2次曝光形成1:3溝道圖型,形成1:1之圖型的溝道法,相對於上下2段所形成之第1底層與第2底層,在第1次曝光與蝕刻下,在第1底層上形成1:3孤立殘留圖型,然後使位置偏離,以第2次曝光在第2底層上形成1:3孤立殘留圖型,形成間距為一半之1:1圖型的線法。
以下以實施例及比較例具體說明本發明,但本發明並不受下述實施例等所限制。
以下表1所示之組成混合高分子化合物、酸產生劑、酸性化合物、鹼性化合物及溶劑,溶解後,將這些混合物使用孔徑0.2μm鐵氟龍(註冊商標)製過濾器過濾,調製光阻材料。溶劑均使用含有界面活性劑KH-20(旭硝子(股)製)0.01質量%者。同樣以下表2所示之組成調製比較用之光阻材料。
表1、表2中,括弧內之數值表示質量份。簡略符號表示之酸產生劑、酸性化合物、鹼性化合物及溶劑,分別如下述。
PAG-1:九氟丁烷磺酸三苯基鋶PAG-2:九氟丁烷磺酸4-第三丁氧基苯基二苯基鋶PAG-3:1,1,3,3,3-五氟-2-環己基羧基丙烷磺酸三苯基鋶Acid-0:CH3
OCH2
CH2
OCH2
COOH(分子量134)Acid-1:CH3
O(CH2
CH2
O)2
CH2
COOH(分子量178)Acid-2:CH3
O(CH2
CH2
O)3
CH2
COOH(分子量222)Acid-3:CH3
(CH2
)16
COOH(分子量284)Base-1:三(2-甲氧基甲氧基乙基)胺Base-2:2-(2-甲氧基乙氧基甲氧基)乙基嗎啉Base-2:N-(2-乙醯氧基乙基)苯並咪唑PGMEA:乙酸1-甲氧基異丙酯CyHO:環己酮
簡略符號表示之樹脂分別為表3~6表示之高分子化合物。
將本發明之光阻材料(R-01~42)及比較用之光阻材料(R-43~77)旋轉塗佈於塗佈防反射膜(AZ電子Mterials(股)製、1C5D、44nm)之矽晶圓上,實施110℃、60秒之熱處理,形成厚度200nm之光阻膜。將此光阻膜使用ArF準分子雷射步進機(Nikon(股)公司製,NA=0.68)以30mJ/cm2
之曝光量曝光,再進行60秒之熱處理(PEB)後,使用2.38質量%之四甲基氫氧化銨水溶液進行30秒之攪拌顯像,在晶圓上形成2.5cm×3.3cm四方之蝕刻區域與殘離區域交互排列的圖型。PEB中,各光阻材料使用最佳化之溫度。以缺陷檢查裝置((股)東京精密製、WIN-WIN50 1200L)觀察製得之含圖型的晶圓,測定基板上殘渣的個數。
各光阻材料之評價結果(基板上之缺陷數)如表7所示,比較用之光阻材料之評價結果如表8所示。
由表7、表8的結果可知,本發明之光阻材料之基板上的缺陷少。
將本發明之光阻材料(R-01~42)旋轉塗佈於塗佈防反射膜(日產化學公司製ARC-29A 78nm)之矽晶圓上,實施110℃、60秒之熱處理,形成厚度170nm之光阻膜。將此光阻膜使用ArF準分子雷射步進機(Nikon(股)公司製,NA=0.68)進行60秒之熱處理(PEB)後,使用2.38質量%之四甲基氫氧化銨水溶液進行30秒之攪拌顯像,形成1:1之線路與空間圖型。PEB中,各光阻材料使用最佳化之溫度。製得之含圖型之晶圓以上空SEM(掃描型電子顯微鏡)觀察,將0.11μm之1:1之線路與空間以1:1解像之曝光量(最佳曝光量、mJ/cm2
)下使分離顯像之最小尺寸為臨界解像性(0.01μm刻度,尺寸越小越佳)。
各光阻材料之評價結果(臨界解像性)如表9所示。
由表9之結果確認本發明之光阻材料為高解像性。
Claims (5)
- 一種正型光阻材料,其特徵係含有:藉由酸之作用提高對鹼顯像液之溶解性的樹脂成分(A)及感應活性光線或輻射線產生酸的化合物(B),再含有一種以上之分子量150以上的酸性有機化合物(C)之正型光阻材料,其中上述(A)成分為含有下述重複單位的樹脂,
- 如申請專利範圍第1項之正型光阻材料,其中該酸性有機化合物(C)為下述一般式(1)表示者,【化1】R1 -X (1)(式中,R1 係表示直鏈狀或支鏈狀之一價有機基,結構內不含碳、氫、氧以外的原子及雙鍵,X係表示-SO3 H或-CO2 H)。
- 如申請專利範圍第1項之正型光阻材料,其中該酸性有機化合物(C)為下述一般式(2)表示者,
- 一種圖型之形成方法,其係含有:將申請專利範圍第1~3項中任一項之正型光阻材料塗佈於基板上的步驟;加熱處理後,介由光罩以高能量線或電子線曝光的步驟;加熱處理後,使用顯像液進行顯像之步驟之圖型之形成方法,其特徵係將折射率1.0以上之高折射率液體介於光阻塗佈膜與投影透鏡之間,以浸潤式曝光進行曝光。
- 一種圖型之形成方法,其係含有:將申請專利範圍第1~3項中任一項之正型光阻材料塗佈於基板上的步驟;加熱處理後,介由光罩以高能量線或電子線曝光的步驟;加熱處理後,使用顯像液進行顯像的步驟之圖型之形成方法,其特徵係在光阻塗佈膜上再塗佈保護膜,將折射率1.0以上之高折射率液體介於該保護膜與投影透鏡之間,以浸潤式曝光進行曝光。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006103336 | 2006-04-04 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200807153A TW200807153A (en) | 2008-02-01 |
TWI383261B true TWI383261B (zh) | 2013-01-21 |
Family
ID=38559514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096112085A TWI383261B (zh) | 2006-04-04 | 2007-04-04 | Photoresist material and pattern formation method |
Country Status (3)
Country | Link |
---|---|
US (1) | US20070231741A1 (zh) |
KR (1) | KR101290882B1 (zh) |
TW (1) | TWI383261B (zh) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101204122B1 (ko) * | 2006-07-06 | 2012-11-22 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 포지티브형 레지스트 조성물 및 패턴 형성 방법 |
WO2008053697A1 (en) * | 2006-10-31 | 2008-05-08 | Tokyo Ohka Kogyo Co., Ltd. | Positive resist composition and method for formation of resist pattern |
JP5165227B2 (ja) * | 2006-10-31 | 2013-03-21 | 東京応化工業株式会社 | 化合物および高分子化合物 |
JP2008129389A (ja) * | 2006-11-22 | 2008-06-05 | Shin Etsu Chem Co Ltd | ポジ型レジスト材料及びパターン形成方法 |
JP4475435B2 (ja) * | 2007-07-30 | 2010-06-09 | 信越化学工業株式会社 | 含フッ素単量体、含フッ素高分子化合物、レジスト材料及びパターン形成方法 |
JP5377172B2 (ja) * | 2009-03-31 | 2013-12-25 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物及びそれを用いたパターン形成方法 |
TWI499581B (zh) | 2010-07-28 | 2015-09-11 | Sumitomo Chemical Co | 光阻組成物 |
JP5947051B2 (ja) * | 2011-02-25 | 2016-07-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5947053B2 (ja) | 2011-02-25 | 2016-07-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5898520B2 (ja) | 2011-02-25 | 2016-04-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5829940B2 (ja) | 2011-02-25 | 2015-12-09 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP6034026B2 (ja) | 2011-02-25 | 2016-11-30 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5898521B2 (ja) | 2011-02-25 | 2016-04-06 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5829939B2 (ja) | 2011-02-25 | 2015-12-09 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP6034025B2 (ja) | 2011-02-25 | 2016-11-30 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5829941B2 (ja) | 2011-02-25 | 2015-12-09 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP6013797B2 (ja) | 2011-07-19 | 2016-10-25 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP5912912B2 (ja) | 2011-07-19 | 2016-04-27 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP6189020B2 (ja) | 2011-07-19 | 2017-08-30 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
JP6013799B2 (ja) | 2011-07-19 | 2016-10-25 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5580702A (en) * | 1991-04-30 | 1996-12-03 | Kabushiki Kaisha Toshiba | Method for forming resist patterns |
JP2000122292A (ja) * | 1998-10-12 | 2000-04-28 | Nec Corp | 化学増幅型レジスト材料 |
US20050186503A1 (en) * | 2004-02-20 | 2005-08-25 | Fuji Photo Film Co., Ltd. | Resist composition for immersion exposure and pattern formation method using the same |
JP2006048029A (ja) * | 2004-07-07 | 2006-02-16 | Fuji Photo Film Co Ltd | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4670372A (en) * | 1984-10-15 | 1987-06-02 | Petrarch Systems, Inc. | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant |
US6200725B1 (en) * | 1995-06-28 | 2001-03-13 | Fujitsu Limited | Chemically amplified resist compositions and process for the formation of resist patterns |
US5942367A (en) * | 1996-04-24 | 1999-08-24 | Shin-Etsu Chemical Co., Ltd. | Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group |
EP0843218B1 (en) * | 1996-11-14 | 2008-01-16 | FUJIFILM Corporation | Photosensitive composition |
SG78412A1 (en) * | 1999-03-31 | 2001-02-20 | Ciba Sc Holding Ag | Oxime derivatives and the use thereof as latent acids |
JP3812622B2 (ja) * | 1999-09-17 | 2006-08-23 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
JP2002122986A (ja) * | 2000-10-16 | 2002-04-26 | Kansai Paint Co Ltd | ポジ型感光性樹脂組成物、ポジ型感光性ドライフィルム、その組成物を使用して得られる材料及びパターン形成方法 |
TW200403523A (en) * | 2002-03-22 | 2004-03-01 | Shinetsu Chemical Co | Photoacid generators, chemically amplified resist compositions, and patterning process |
JP4054285B2 (ja) * | 2003-06-12 | 2008-02-27 | 松下電器産業株式会社 | パターン形成方法 |
EP1621927B1 (en) * | 2004-07-07 | 2018-05-23 | FUJIFILM Corporation | Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
JP4506968B2 (ja) * | 2005-02-04 | 2010-07-21 | 信越化学工業株式会社 | 高分子化合物、レジスト材料及びパターン形成方法 |
-
2007
- 2007-04-02 US US11/730,427 patent/US20070231741A1/en not_active Abandoned
- 2007-04-03 KR KR1020070032682A patent/KR101290882B1/ko active IP Right Grant
- 2007-04-04 TW TW096112085A patent/TWI383261B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5580702A (en) * | 1991-04-30 | 1996-12-03 | Kabushiki Kaisha Toshiba | Method for forming resist patterns |
JP2000122292A (ja) * | 1998-10-12 | 2000-04-28 | Nec Corp | 化学増幅型レジスト材料 |
US20050186503A1 (en) * | 2004-02-20 | 2005-08-25 | Fuji Photo Film Co., Ltd. | Resist composition for immersion exposure and pattern formation method using the same |
JP2006048029A (ja) * | 2004-07-07 | 2006-02-16 | Fuji Photo Film Co Ltd | 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101290882B1 (ko) | 2013-07-29 |
TW200807153A (en) | 2008-02-01 |
US20070231741A1 (en) | 2007-10-04 |
KR20070099466A (ko) | 2007-10-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI383261B (zh) | Photoresist material and pattern formation method | |
TWI390345B (zh) | Photoresist materials and pattern forming methods using them | |
TWI383256B (zh) | 光阻材料及使用該材料之圖案形成方法 | |
JP4849267B2 (ja) | レジスト材料及びこれを用いたパターン形成方法 | |
JP4993138B2 (ja) | レジスト材料及びこれを用いたパターン形成方法 | |
TWI399616B (zh) | 正型光阻組成物及圖型之形成方法 | |
KR101028646B1 (ko) | 포지티브형 레지스트 재료 및 패턴 형성 방법 | |
TWI417666B (zh) | 正型光阻材料及圖型之形成方法 | |
TWI416261B (zh) | 正型光阻材料及圖型之形成方法 | |
KR101022602B1 (ko) | 포지티브형 레지스트 재료 및 패턴 형성 방법 | |
KR20100029045A (ko) | 포지티브형 레지스트 재료 및 패턴 형성 방법 | |
KR20100029047A (ko) | 포지티브형 레지스트 재료 및 패턴 형성 방법 | |
JP2008033287A (ja) | ポジ型レジスト組成物及びパターン形成方法 | |
KR20100029048A (ko) | 포지티브형 레지스트 재료 및 패턴 형성 방법 | |
TWI398731B (zh) | 正型光阻材料及圖型之形成方法 | |
JP4840596B2 (ja) | レジスト材料及びパターン形成方法 | |
TWI397771B (zh) | 正型光阻組成物及圖型之形成方法 | |
KR20100029046A (ko) | 포지티브형 레지스트 재료 및 패턴 형성 방법 | |
TWI395065B (zh) | 正型光阻組成物及圖型之形成方法 | |
JP4831360B2 (ja) | ポジ型レジスト組成物及びパターン形成方法 | |
JP4835869B2 (ja) | ポジ型レジスト組成物及びパターン形成方法 | |
JP2008129389A (ja) | ポジ型レジスト材料及びパターン形成方法 |