TWI376344B - Apparatus for carrying substrates - Google Patents

Apparatus for carrying substrates Download PDF

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Publication number
TWI376344B
TWI376344B TW095114207A TW95114207A TWI376344B TW I376344 B TWI376344 B TW I376344B TW 095114207 A TW095114207 A TW 095114207A TW 95114207 A TW95114207 A TW 95114207A TW I376344 B TWI376344 B TW I376344B
Authority
TW
Taiwan
Prior art keywords
substrate
transport
roller
shaft
carrier roller
Prior art date
Application number
TW095114207A
Other languages
Chinese (zh)
Other versions
TW200704575A (en
Inventor
Takahiko Wakatsuki
Yukinobu Nishibe
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Publication of TW200704575A publication Critical patent/TW200704575A/en
Application granted granted Critical
Publication of TWI376344B publication Critical patent/TWI376344B/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G60/00Simultaneously or alternatively stacking and de-stacking of articles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Description

九、發明說明: 【發明所屬^技術領域】 技術領域 本發明係有關於一種用以搬送使用於液晶顯示裝 置之 玻璃製基板的搬送裝置。 [先前技術3 背景技術 在液晶顯示裝置之製造步驟中,包含有蝕刻處理玻璃 製基板之步驟、在蝕刻處理後剝離處理作為光罩使用之光 阻的步驟、及利用洗淨液洗淨在蝕刻步驟、剥離步驟等步 驟後受到污染之基板的步驟。在前述基板處理步驟中,大 多採用一片片地搬送基板並進行處理之單晶圓方式。 已有一種當利用單晶圓方式處理基板時,會在搬送基 板中以喷頭喷射處理液至其上下面或上面,且接觸洗淨刷 頭來進行處理之處理裝置。該處理裝置具有空室,且在該 空室内部設有用以沿預定方向搬送前述基板之搬送裝置。 又,當利用複數處理裝置依序搬送處理基板時,在相鄰之 處理裝置之間,亦使用用以將基板由上游側處理裝置搬送 至下游側處理裝置之搬送裝置。 前述搬送裝置中’沿著基板搬送方向以預定間隔設有 可旋轉之複數搬送軸’且在該搬送軸上以預定間隔沿軸方 向設有複數搬送滚輪。如此,藉由旋轉驅動前述搬送轴, •5Γ利用搬送滚輪搬送前述基板。 使用於處理裝置之搬送裝置僅利用複數搬送滾輪支撐 1376344 基板下面,並且當該基板在喷射處理液、接觸洗淨刷等基 板受到處理液、洗淨刷之阻力時,基板會因其阻力而無法 以固定的速度平順地搬送,且基板兩端部有時會碰撞造成 損傷。 5 因此’搬送基板時,不僅藉由設置於搬送軸之搬送滾 輪來支撐該基板下面’且利用端部支撐滾輪支撐基板端部 下面,並藉由載運滾輪按壓該端部支撐滾輪所支撐之基板 端部下面。 藉此,即使基板受到處理液、洗淨刷的阻力,仍能以 10固定的速度確實地搬送其基板,且基板兩端部不會因碰撞 造成損傷。 以往,前述载運滾輪係設於載運滾輪軸兩端部,且該 載運滾輪軸係設置成位於前述喷頭、洗淨刷等之上游側的 搬送軸上方,並且與該搬送轴及軸線平行,而且其 15 受支撐並可旋轉。 ° 前述載運滾輪其中—端上設有齒輪,且該齒輪卡合設 於前述搬送軸其中-端之齒輪。藉此,若旋轉__轴, 則由於載運滾輪會與該搬送軸同步旋轉驅動,因此基板可 藉由端部支樓滚輪與載運滾輪夾持寬度方向兩端部的上下 20 面來確實地搬送。 C發明内容】 發明之揭示 發明欲解決之課題 前述載運滾輪軸係設定成與前述搬送軸等長,但由於 6 1376344 近年來基板有大型化之傾向,搬送軸亦增長化,因此,載 運滾輪轴也趨於增長化及高重量化。 一旦載運滾輪軸增長化以及高重量化,支撐兩端部且 可旋轉之載運滾輪軸則會不可避免地產生撓曲。出現於該 5 載運滾輪軸上之撓曲有時會造成設有一對載運滾輪之兩端 部不均等。此時,一對載運滾輪賦與基板寬度方向兩端部 之按壓力則會產生偏差。寬度方向兩端部之按壓力出現偏 差,是造成無法筆直地搬送基板,以及行進歪斜之主因, 結果,基板常會損傷。 10 本發明係將設有載運滾輪之載運滾輪軸分割為左右兩 根且縮短化,並且構造成設於各個載運滚輪軸之載運滾輪 可調整按壓基板寬度方向端部之按壓力者,以提供一種可 大致均等地按壓基板寬度方向兩端部的基板之搬送裝置。 解決問題之手段 15 本發明係一種基板之搬送裝置,係用以朝預定方向搬 送基板者,包含有: 複數搬送軸,係其軸方向之兩端部受支撐並可旋轉, 且其軸線相對於前述基板之搬送方向交叉並以一定間隔配 置者; 20 複數搬送滾輪,係設於該搬送軸,且支撐前述基板之 寬度方向兩端部以外之部份的下面者; 端部支撐滾輪,係設於前述搬送軸,且支撐前述基板 之寬度方向兩端部的下面者; 一對載運滚輪軸,係配置成分別於前述搬送軸一端部 7 1376344 及另一端部上方使其軸線與前述搬送軸平行,且其對應於 前述搬送轴兩端部之一端部受支撐並可旋轉者; 一對載運滾輪,係設於各前述載運滾輪軸之另一端 部,且分別按壓寬度方向的端部下面藉由前述端部支撐滾 5 輪所支撐之前述基板寬度方向的端部上面者; 砝碼,係設於前述載運滾輪軸,以調整前述載運滾輪 按壓前述基板上面之按壓力者。 發明效果 根據本發明,載運滚輪軸係左右分割且縮短化,不會 10 因重量而產生撓曲,且於各個載運滾輪軸上設置砝碼,並 藉由其砝碼對基板賦與按壓力,因此,可利用左右一對之 載運滾輪均等地按壓基板寬度方向兩端部之上面。 圖式簡單說明 第1圖係顯示本發明一實施形態之處理裝置的縱截面 15 圖。 第2圖係第1圖所示裝置之橫截面圖。 第3圖係搬送軸及載運滾輪軸之端部的放大圖。 第4圖係端部支撐滾輪及載運滾輪之放大圖。 【實施方式3 20 實施發明之最佳形態 以下,一面參照本發明一實施形態一面進行說明。 第1圖係利用處理液處理基板之處理裝置的縱截面 圖,第2圖係同裝置之側截面圖。處理裝置具有空室1,且 在該空室1内設有用以朝預定方向搬送如第1圖鏈線所示之 8 基板W的搬送裝置2。該搬送裝置2配置有其軸線相對於基 板W搬送方向(如第2圖箭號X所示方向)大致呈直角之複數 搬送轴,即,在本實施形態為第2圖所示之沿著前述搬送方 向以固定間隔設置的8根搬送軸3 ° 又,如第2圖所示,在空室1中,於基板W搬送方向其 中一端形成有搬入口 la,另一端形成有搬出口 lb,並藉由 擋門(未圖示)來開關該搬入口 la與搬出口 lb。 如第1圖所示,前述空室1内之寬度方向兩端部上配置 有與寬度方向交又之基板搬送方向且呈帶板狀的安裝構件 4。在該安裝構件4上設有軸承5,並且在空室1内部之寬度 方向上各個搬送軸3之兩端部受相對應之一對軸承5支撐並 可旋轉。 各個搬送軸3兩端部自軸承5突出,且其中一端部之突 出端下方配置有其轴線沿基板W搬送方向,且利用未圖示 之軸承支撐並可旋轉的動力傳達軸6。各個搬送軸3由軸承5 突出之一端上設有第1斜齒輪7。又’前述動力傳達軸6上設 有分別與第1斜齒輪7卡合之第2斜齒輪8。 前述動力傳達轴6之中間部設有從動鏈輪11,且空室1 外部上對應於設有該從動鏈輪11之位置設有馬達與減速機 一體化之搬送用驅動源12。該搬送用驅動源12之輸出轴13 上設有驅動鏈輪14,且該驅動鏈輪14與前述從動鏈輪^間 張設有鏈條15。藉此,當前述搬送用驅動源12開始動作, 各個搬送軸會朝預定方向經由鏈條15、第1斜齒輪7與第2斜 齒輪8旋轉驅動。 寬度方向兩外側面上分別形成有機械 至且在空室1内形成有搬送基板W之搬送室19。又,前 述搬运軸3之兩端部位於前述機械室18巾。藉此,即使支樓 送轴3之轴承、互相卡合之第1斜齒輪第2斜齒輪8等產 生又塵亦可抑制其塵埃擴散至空室1中用以搬送基板W之 搬送室19» 又’刖述搬送轴3之兩端部上由搬送室19貫通至機械室 18之。h錢蚊狀隔板μ塞住,且該隔板2何阻止機械 室18產生之塵埃進入搬送室Η。 剛述搬送軸3之軸方向中間部上係以預定間隔設有複 數搬送軸(本貫施形態為3根搬送軸),且在對應前述搬送室 19之寬度方向兩端部上分別設有端部支撐滾輪22。放大成 第3圖及第4圖所示,端部支撐滾輪22之外周面形成有階差 部23,且該階差部23支撐基板w寬度方向兩端部之下面。 因此,基板W因則述階差部23不會出現行進歪斜,並可沿 預定方向搬送。 如第2圖及第3圖所示’複數搬送軸3中,位於空室1之 基板W搬送方向中間部上之2根搬送軸3的軸方向兩端部上 方,分別配設有其軸線與搬送軸3平行之一對載運滚輪軸 25 0 一對載運滚輪轴25的其中一端部受設置於前述安裝構 件4之軸承26支撐並可自由旋轉,且該載運滾輪轴25之另一 端部設置有位於前述端部支撐滾輪22對向上之載運滾輪 在别述載運滾輪27上,且位於前述端部支撐滾輪22之 階差部23對向位置上安裝有作為彈性按壓構件之0型環28 並可拆卸’並且在該〇型環28與前述階差部23之間形成有可 放入前述搬送中基板之寬度方向端部的間隙G。 刚述載運滾輪軸25上設有砝碼29,且該砝碼29係設置 成沿轴方向滑動且可利用螺栓30固定於預定滑動位置者。 又’前述載運滾輪軸25係構造成以轴承26單方固持者。 因此,若鬆開螺栓30使前述砝碼29滑動,且調整其固 定位置’前述端部支撐滾輪22之階差部23以及設於前述載 運滾輪25之〇型環28兩者之間的間隔〇即可設定為預定大 小。換言之’可設定〇型環28按壓基板W寬度方向之端部上 面的按壓力。 又’在空室1内,在設有前述載運滾輪軸25之基板W搬 送方向前方侧上,設置有用以處理基板…之刷洗裝置等處 理機構(未圖示^藉此,基板W會如後述般地處於寬度方向 兩端部上下面受端部支撐滾輪22與載運滾輪27固持的狀態 下藉由前述處理機構進行處理。 前述搬送軸3中由前述軸承5突出之兩端部分別嵌著有 第1正齒輪31。又,前述載運滾輪轴25中由前述軸承26突出 之端部嵌著有用以卡合前述第1正齒輪31的第2正齒輪32。 因此,若藉由搬送用驅動源12旋轉驅動搬送轴3,一對載運 滾輪軸25會利用其旋轉力並經由第1正齒輪31與第2正齒輪 31朝反方向旋轉。 藉由前述構造之搬送裝置2,由搬入口13供應至空室1 1376344 内之基板W,其下面會受設於旋轉驅動之搬送轴3的搬送滾 輪21與端邹支撐滾輪22支撐來進行搬送。 於空室1内搬送之基板W,在送入用以處理位於空室1 中間部之基板W且未圖示的刷洗裝置等處理機構之前,下 5面藉由前述端部支撐滾輪22支撐且寬度方向兩端部上面藉 由載運滾輪27固持。 藉此’由於基板W會藉由端部支撐滾輪22及載運滚輪 27夾持且通過處理機構,故即使受到來自前述處理機構處 理時之阻力,亦可防止寬度方向兩端部碰撞損傷,且搬送 10速度並不會因受到處理機構阻力產生不均而可進行搬送。 一對載運滾輪2 7係分別設於已分割之一對載運滚輪轴 25的另一端部’且在各個載運滾輪軸25上設有可沿前述載 運滚輪轴25之轴方向進行定位調整之結碼29。 因此,若沿第3圖箭號所示方向移動前述砝碼29且調整 15其安裝位置’即可調整各個載運滾輪轴25按壓基板W寬度 方向兩端部上面之按壓力。 即,藉由將載運滾輪軸25分割成左右一對,其中一端 部會處於以轴承26支撐之單方固持狀態,因此,若調整砝 碼29位置’即可改變設有載運滾輪27之另一端部的撓曲 2〇 量。藉此,可改變〇型環28與端部支撐滾輪22上之階差部23 兩者之間的間隔G。 因此,若調整沿著設有一對載運滾輪軸25之砝碼29的 軸方向位置’可將左右一對載運滾輪27按壓基板W寬度方 向兩端部上面之按壓力設定成大致相等。 12 1376344 今若利用-對載運滾輪27以大致相同之按壓力按壓基板 W寬度方向兩端部,基板…不會朝寬度方向行進歪斜且可 筆直地進行搬送,並且藉由形成於端部支標滚輪22外周面 之階差部23,亦可抑制基板…朝寬度方向行進歪斜。 基板W之見度方向兩端部上面係受設於載運滾輪27之 〇型環28有彈性地按壓,因此,基板w寬度方向端部不會受 到損傷,且可確實地按壓固持。 前述0型環28無法避免因使用造成之劣化,此時必須替 換前述0型環28。 10 設有前述載運滾輪27之載運滾輪軸25係分割成左右一 對,且其端部上設有前述載運滾輪27者。因此,〇型環28 可相對於前述載運滾輪27輕易地拆卸。換言之,可迅速地 進行0型環28之替換作業。 一旦旋轉驅動搬送軸3,左右一對之載運滾輪軸25會分 15 別經由第1正齒輪31、第2正齒輪32強制地旋轉驅動。換言 之,載運滾輪27會與各個載運滚輪轴25—起強制旋轉驅動。 因此,基板W不僅是只藉由左右一對載運滾輪軸27固 持寬度方向兩端部上面,且可賦與搬送力。因此,即使載 運滾輪軸25分割成兩個,且各個載運滾輪軸25上設有載運 2〇 滾輪27,基板W仍能以穩定的狀態確實地搬送。 . 該發明並不限於前述一實施形態’例如’載運滾輪轴 25其中一端部雖受一個轴承26支撐,但亦可根據載運滾輪 軸25之長度利用以預定間隔分隔開之一對軸承來支撲。 又,若以一對軸承支撐,即使載運滾輪軸25為單方固持狀 13 1376344 態,亦可以較為穩定之狀態,意即以振動較少之狀態來支 撐其載運滾輪軸25。 C圖式簡單說明:! 第1圖係顯示本發明一實施形態之處理裝置的縱截面 5 圖。 第2圖係第1圖所示裝置之橫截面圖。 第3圖係搬送轴及載運滾輪軸之端部的放大圖。 第4圖係端部支撐滾輪及載運滾輪之放大圖。 【主要元件符號說明】 1...空室 14…驅動鏈輪 la_"^v 口 15…鏈條 lb...搬出口 18…機械室 2…搬送裝置 19…搬送室 3…搬送軸 2CL,隔板 4...安裝構件 21…搬送滾輪 5...軸承 22…端部支撐滾輪 6·..動力傳達軸 23...階差部 7...第1斜齒輪 25…載運滾輪軸 8...第2斜齒輪 26...轴承 11…從動鏈輪 27…載運滾輪 12...搬送用驅動源 28...0型環 13…輸出軸 29…站碼 14 1376344 30…螺检 31...第1正齒輪 W·.·絲 G..間隙 32...第2正齒輪[Technical Field] The present invention relates to a conveying apparatus for conveying a glass substrate used in a liquid crystal display device. [Prior Art 3] In the manufacturing step of the liquid crystal display device, the step of etching the substrate made of glass, the step of peeling off the photoresist used as a mask after the etching process, and the step of cleaning with the cleaning solution are performed. The step of contaminating the substrate after the step of the step, the stripping step, and the like. In the substrate processing step described above, a single wafer method in which a substrate is transferred and processed in a single sheet is used. There has been a processing apparatus which, when a substrate is processed by a single wafer method, sprays a treatment liquid onto a top surface or a top surface thereof in a transfer substrate, and contacts the cleaning brush head for processing. The processing apparatus has an empty chamber, and a transfer device for transporting the substrate in a predetermined direction is provided inside the empty chamber. Further, when the processing substrate is sequentially transferred by the complex processing device, a transfer device for transporting the substrate from the upstream processing device to the downstream processing device is also used between the adjacent processing devices. In the transport apparatus, 'a plurality of transportable transport shafts' are provided at predetermined intervals along the substrate transport direction, and a plurality of transport rollers are provided on the transport shaft at predetermined intervals along the axial direction. In this manner, by rotating the transport shaft, the substrate is transported by the transport roller. The transfer device used in the processing device supports the underside of the substrate with only a plurality of transfer rollers, and when the substrate receives the resistance of the treatment liquid or the cleaning brush on the substrate such as the spray treatment liquid or the contact cleaning brush, the substrate may not be able to withstand the resistance due to the resistance. It is conveyed smoothly at a fixed speed, and both ends of the substrate may collide and cause damage. 5 Therefore, when the substrate is transferred, not only the underside of the substrate is supported by the transport roller provided on the transport shaft, but also the underside of the substrate is supported by the end support roller, and the substrate supported by the end support roller is pressed by the carrier roller. Below the end. Thereby, even if the substrate receives the resistance of the treatment liquid or the cleaning brush, the substrate can be reliably conveyed at a fixed speed of 10, and the both end portions of the substrate are not damaged by the collision. Conventionally, the carrier roller is disposed at both end portions of the carrier roller shaft, and the carrier roller shaft is disposed above the transport shaft on the upstream side of the head, the cleaning brush, and the like, and is parallel to the transport shaft and the axis. And its 15 is supported and can be rotated. ° The carrier roller is provided with a gear on the end thereof, and the gear is engaged with the gear at the end of the conveying shaft. Therefore, when the __axis is rotated, since the carrier roller is rotationally driven in synchronization with the transport shaft, the substrate can be reliably transported by the upper and lower 20 faces of the both ends in the width direction by the end roller and the carrier roller. . The present invention is to solve the problem of the invention. It also tends to increase and increase in weight. Once the carrier roller shaft is enlarged and highly weighted, the carrier roller shaft that supports both ends and rotates inevitably produces deflection. The deflection that occurs on the shaft of the 5 carrying roller sometimes causes the ends of the pair of carrying rollers to be uneven. At this time, the pressing force of the pair of carrier rollers at both end portions in the width direction of the substrate varies. The pressing force at the both end portions in the width direction is a cause of the inability to convey the substrate straight and the main cause of the skew, and as a result, the substrate is often damaged. According to the present invention, the carrier roller shaft provided with the carrier roller is divided into two pieces and is shortened, and is configured such that the carrier roller provided on each of the carrier roller shafts can adjust the pressing force of the end portion in the width direction of the pressing substrate to provide a pressing force. The substrate transfer device that presses the both end portions in the substrate width direction substantially uniformly. Means for Solving the Problem The present invention relates to a substrate transporting apparatus for transporting a substrate in a predetermined direction, comprising: a plurality of transport shafts whose both ends in the axial direction are supported and rotatable, and whose axes are opposite to each other The transport direction of the substrates intersects and is arranged at a constant interval. 20 The plurality of transport rollers are disposed on the transport shaft and support the lower portion of the substrate in the width direction at both ends; the end support roller is provided The transport shaft supports the lower surface of the both ends of the substrate in the width direction; the pair of carrier roller shafts are disposed so as to be parallel to the transport axis at the one end portion 7 1376344 and the other end portion of the transport shaft And corresponding to one end of the two ends of the conveying shaft being supported and rotatable; a pair of carrying rollers are disposed at the other end of each of the carrying roller shafts, and are respectively pressed under the ends in the width direction by The end support roller 5 is supported by the upper end of the substrate in the width direction of the substrate; the weight is provided on the carrier roller shaft to adjust the load The roller presses the pressing force on the substrate. According to the present invention, the carrier roller shaft is divided and shortened left and right, and no deflection due to weight is applied, and a weight is set on each of the carrier roller shafts, and the pressing force is applied to the substrate by the weight thereof. Therefore, the upper and lower ends of the both end portions in the width direction of the substrate can be uniformly pressed by the pair of left and right carrying rollers. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a longitudinal cross-sectional view showing a processing apparatus according to an embodiment of the present invention. Figure 2 is a cross-sectional view of the apparatus shown in Figure 1. Fig. 3 is an enlarged view of the end portions of the transport shaft and the transport roller shaft. Figure 4 is an enlarged view of the end support roller and the carrier roller. [Embodiment 3] Best Mode for Carrying Out the Invention Hereinafter, an embodiment of the present invention will be described. Fig. 1 is a longitudinal sectional view of a processing apparatus for processing a substrate by a processing liquid, and Fig. 2 is a side sectional view of the same apparatus. The processing apparatus has a empty chamber 1, and a transporting device 2 for transporting eight substrates W as indicated by the chain of the first drawing in a predetermined direction is provided in the empty chamber 1. The conveying device 2 is provided with a plurality of conveying shafts whose axes are substantially perpendicular to the substrate W conveying direction (the direction indicated by the arrow X in the second drawing), that is, the second embodiment shown in the second embodiment. In the empty chamber 1, a transfer port 1a is formed at one end of the substrate W in the transfer direction, and a transfer port lb is formed at the other end, and as shown in FIG. 2, The carry-in door la and the carry-out port lb are opened and closed by a door (not shown). As shown in Fig. 1, a mounting member 4 having a strip shape is disposed on both end portions in the width direction of the empty chamber 1 in a direction in which the substrate is conveyed in the width direction. Bearings 5 are provided on the mounting member 4, and both end portions of the respective conveying shafts 3 are supported by the corresponding ones of the bearings 5 in the width direction of the inside of the empty chamber 1 and are rotatable. Both end portions of the respective conveying shafts 3 project from the bearing 5, and a power transmission shaft 6 whose axis is conveyed in the direction in which the substrate W is conveyed and which is supported by a bearing (not shown) and rotatable is disposed below the protruding end of the one end portion. Each of the transport shafts 3 is provided with a first helical gear 7 at one end of the bearing 5 projecting. Further, the power transmission shaft 6 is provided with a second helical gear 8 that is engaged with the first helical gear 7. The intermediate portion of the power transmission shaft 6 is provided with a driven sprocket 11, and a transport drive source 12 for integrating the motor and the reducer is provided on the outer portion of the empty chamber 1 corresponding to the position where the driven sprocket 11 is provided. A drive sprocket 14 is provided on the output shaft 13 of the transport drive source 12, and a chain 15 is disposed between the drive sprocket 14 and the driven sprocket. As a result, when the transport drive source 12 starts to operate, each transport shaft is rotationally driven via the chain 15, the first helical gear 7 and the second helical gear 8 in a predetermined direction. A transfer chamber 19 in which a transfer substrate W is formed in the empty chamber 1 is formed in each of the outer side surfaces in the width direction. Further, both end portions of the conveyance shaft 3 are located in the machine room 18. Therefore, even if the bearing of the branch shaft 3 and the first helical gear second helical gear 8 that are engaged with each other are dusty, the dust can be prevented from diffusing into the empty chamber 1 for transporting the substrate W of the substrate W. Further, the end portions of the transport shaft 3 are connected to the machine room 18 by the transfer chamber 19. The h-money-like separator is plugged, and the partition 2 prevents the dust generated in the machine room 18 from entering the transfer chamber. In the intermediate portion in the axial direction of the transport shaft 3, a plurality of transport shafts (three transport shafts in the present embodiment) are provided at predetermined intervals, and end portions are provided at both end portions in the width direction of the transport chamber 19, respectively. The support roller 22 is supported. As shown in Fig. 3 and Fig. 4, a step portion 23 is formed on the outer peripheral surface of the end support roller 22, and the step portion 23 supports the lower surface of both end portions in the width direction of the substrate w. Therefore, the substrate W does not have a traveling skew due to the step portion 23, and can be transported in a predetermined direction. As shown in Fig. 2 and Fig. 3, in the plurality of transport shafts 3, the axial direction of each of the two transport shafts 3 on the intermediate portion of the substrate W in the transport direction of the empty chamber 1 is arranged above the axial direction. One of the pair of transport roller shafts 25 in parallel with the transport shaft 3 is supported by the bearing 26 of the mounting member 4 and is rotatable, and the other end of the carrier roller shaft 25 is provided with The carrier roller of the end support roller 22 is disposed on the carrier roller 27, and the 0-ring 28 as an elastic pressing member is mounted at a position opposite to the step portion 23 of the end support roller 22. The gap G that can be placed in the width direction end portion of the substrate during transport is formed between the 〇-shaped ring 28 and the step portion 23. Just as the carrier roller shaft 25 is provided with a weight 29, the weight 29 is arranged to slide in the axial direction and can be fixed to the predetermined sliding position by the bolt 30. Further, the aforementioned carrier roller shaft 25 is configured to be unidirectionally held by the bearing 26. Therefore, if the bolt 30 is loosened, the weight 29 is slid, and the interval between the step position portion 23 of the end support roller 22 and the 〇-shaped ring 28 provided on the carrier roller 25 is adjusted. It can be set to a predetermined size. In other words, the pressing force of the upper end of the end portion of the substrate W in the width direction of the substrate W can be set. Further, in the empty chamber 1, a processing mechanism such as a brushing device for processing the substrate is provided on the front side in the transport direction of the substrate W on which the carrier roller shaft 25 is provided (not shown), and the substrate W will be described later. Generally, the upper and lower ends of the width direction are processed by the processing mechanism in a state where the end support roller 22 and the carrier roller 27 are held by the processing mechanism. The both ends of the transfer shaft 3 projecting from the bearing 5 are respectively embedded. In the first spur gear 31, the second spur gear 32 for engaging the first spur gear 31 is fitted into the end portion of the carrier roller shaft 25 that protrudes from the bearing 26. Therefore, the drive source for transport is used. 12, the transport shaft 3 is rotationally driven, and the pair of transport roller shafts 25 are rotated in the opposite direction by the first spur gear 31 and the second spur gear 31 by the rotational force. The transport device 2 having the above configuration is supplied by the carry-in port 13. The substrate W in the empty chamber 1 1376344 is supported by the transport roller 21 and the end support roller 22 provided on the transport shaft 3 that is rotationally driven, and is transported. The substrate W transported in the empty chamber 1 is fed. Used to process in the middle of empty room 1 Before the substrate W and a processing mechanism such as a brushing device (not shown), the lower surface is supported by the end support roller 22 and the upper end portions in the width direction are held by the carrier roller 27. Thereby, the substrate W is used by Since the end support roller 22 and the carrier roller 27 are sandwiched and pass through the processing mechanism, even if the resistance from the processing mechanism is received, collision damage at both ends in the width direction can be prevented, and the transport speed is not affected by the processing mechanism. The pair of carrier rollers 27 are respectively disposed at the other end portion of the pair of carrier roller shafts 25 and are disposed on the respective carrier roller shafts 25 along the carrier roller shaft 25 In the axial direction, the positioning adjustment code 29 is performed. Therefore, if the weight 29 is moved in the direction indicated by the arrow in the third figure and the mounting position of the adjustment 15 is adjusted, the respective carrier roller shafts 25 can be adjusted to press the ends of the substrate W in the width direction. The pressing force on the upper portion of the portion is obtained by dividing the carrier roller shaft 25 into a pair of left and right, one end portion of which is in a single holding state supported by the bearing 26, and therefore, if the weight is adjusted 29 The amount of deflection 2 provided at the other end portion of the carrier roller 27 can be changed, whereby the interval G between the 〇-shaped ring 28 and the step portion 23 on the end support roller 22 can be changed. Therefore, by adjusting the axial position " along the weight 29 of the pair of carrier roller shafts 25, the pressing force of the pair of left and right carrying rollers 27 pressed against the upper end portions of the substrate W in the width direction can be set to be substantially equal. 12 1376344 When both ends of the width direction of the substrate W are pressed by the carrier roller 27 with substantially the same pressing force, the substrate ... does not travel in the width direction and can be transported straight, and is formed on the outer circumference of the end-supporting roller 22 The step portion 23 of the surface can also suppress the substrate from being skewed in the width direction. The both ends of the substrate W in the visibility direction are elastically pressed by the 〇-shaped ring 28 provided on the carrier roller 27. Therefore, the end portion in the width direction of the substrate w is not damaged, and can be reliably pressed and held. The aforementioned 0-ring 28 cannot avoid deterioration due to use, and the aforementioned O-ring 28 must be replaced at this time. The carrier roller shaft 25 provided with the carrier roller 27 is divided into a pair of right and left, and the carrier roller 27 is provided at the end. Therefore, the 〇-shaped ring 28 can be easily detached with respect to the aforementioned carrier roller 27. In other words, the replacement of the 0-ring 28 can be performed quickly. When the transport shaft 3 is rotationally driven, the pair of left and right carrier roller shafts 25 are forcibly rotationally driven via the first spur gear 31 and the second spur gear 32, respectively. In other words, the carrier roller 27 is forcibly rotationally driven with the respective carrier roller shafts 25. Therefore, the substrate W can hold not only the upper end portions in the width direction but also the conveying force by the pair of left and right carrying roller shafts 27. Therefore, even if the carrier roller shaft 25 is divided into two, and each of the carrier roller shafts 25 is provided with the carrier roller 27, the substrate W can be reliably conveyed in a stable state. The invention is not limited to the above-described embodiment. For example, the carrier roller shaft 25 is supported by one bearing 26 at one end, but may be separated by a pair of bearings spaced apart at predetermined intervals according to the length of the carrier roller shaft 25. flutter. Further, when supported by a pair of bearings, even if the carrier roller shaft 25 is in a single-holding state of 13 1376344, it can be stabilized, that is, the carrier roller shaft 25 is supported in a state where vibration is small. Simple description of C::! Fig. 1 is a longitudinal sectional view showing a processing apparatus according to an embodiment of the present invention. Figure 2 is a cross-sectional view of the apparatus shown in Figure 1. Fig. 3 is an enlarged view of the end portions of the transport shaft and the transport roller shaft. Figure 4 is an enlarged view of the end support roller and the carrier roller. [Description of main component symbols] 1... empty chamber 14... drive sprocket la_"^v port 15...chain lb...transport 18...machine room 2...transporting device 19...transporting chamber 3...transport shaft 2CL, partition Plate 4...mounting member 21...transport roller 5...bearing 22...end support roller 6·.. power transmission shaft 23...step portion 7...first helical gear 25...carrier roller shaft 8 ...the second helical gear 26...the bearing 11...the driven sprocket 27...the carrier roller 12...the transport drive source 28...the 0-ring 13...the output shaft 29...the station code 14 1376344 30...snail Check 31...1st spur gear W·.·丝 G.. clearance 32...2nd spur gear

Claims (1)

1376344 I鐵071離?案 十、申請專利範固: 1.種基板之搬送I置,係用以朝預定方向搬送基板者, 包含有: 複數搬达轴,係其轴方向之兩端部受支揮並可旋 轉且其軸線相對於前述基板之搬送方向交又並以一定 間隔配置者; •複數搬送滾輪,係設於該搬送軸,且支前述基板 之寬度方向兩端部以外之部份的下面者; 端部支撐滾輪,係設於前述搬送轴,且支撐前述基 板之寬度方向兩端部的下面者; 對載運滚輪軸,係配置成分別於前述搬送軸一端 部及另一端部上方使其軸線與前述搬送轴平行,且其對 應於前述搬送軸兩端部之一端部受支撐並可旋轉者; —對載運滾輪,係設於各載運滾輪軸之另一端部, 且分別按壓寬度方向端部下面藉由前述端部支撐滚輪 所支撐之前述基板的寬度方向端部上面者;及 缺碼’係設於前述載運滾輪軸,且設置成可沿前述 栽運滾輪軸之軸方向進行定位調整,並在前述滾輪軸之 料方向上移動調整安裝位置,藉此以依照上述載運滾 輪’調整前述載運滾輪按壓前述基板上面之按壓力,防 2 止椒運到預定方向之前述基板蛇行者。 如申靖專利範圍第1項的基板之搬送裝置,其中前述搬 送輪係藉由驅動機構旋轉驅動,並且前述一對載運滾輪 細係藉由動力傳達機構傳達前述搬送軸之旋轉。 16 1376344 第95114207號專利申請案 修正_ 2012.4.26 3.如申請專利範圍第1項的基板之搬送裝置,其中前述載 運滾輪之外周面上,可拆卸地安裝有用以按壓前述基板 之寬度方向端部上面的彈性按壓構件, 5 前述端部支撐滾輪之外周面上,在與前述彈性按壓構件 對向之位置上形成有階差部,且該階差部與前述彈性按 壓構件之間形成有可放入前述基板之寬度方向端部的 間隙。 17 1376344 七、指定代表囷: (一) 本案指定代表圖為:第(3 )圖。 (二) 本代表圖之元件符號簡單說明: 31.. .第1正齒輪 32.. .第2正齒輪 W...基板 3.. .搬送軸 4.. .安裝構件 5.. .轴承 18.. .機械室 21.. .搬送滾輪 22.. .端部支撐滾輪 23.. .階差部 25.. .載運滾輪軸 26.. .轴承 27.. .載運滾輪 28.. .0.環 29.. .站碼 30.. .螺栓 八、本案若有化學式時,請揭示最能顯示發明特徵的化學式:1376344 I-Iron 071 is away from the case 10. Applying for a patent: 1. The substrate is transported by I. It is used to transport the substrate in a predetermined direction. It includes: a plurality of moving shafts, which are supported at both ends of the axial direction. The support is rotatable and the axis thereof is disposed at a predetermined interval with respect to the transport direction of the substrate; • a plurality of transport rollers are disposed on the transport shaft and support portions other than the two ends in the width direction of the substrate The end support roller is disposed on the transport shaft and supports the lower surface of both ends of the substrate in the width direction; and the carrier roller shaft is disposed above the one end and the other end of the transport shaft Having the axis parallel to the transport axis, and corresponding to one end of the two ends of the transport shaft being supported and rotatable; - the carrier roller is disposed at the other end of each of the transport roller shafts, and respectively pressing the width a lower end of the substrate in the width direction of the substrate supported by the end support roller; and a missing code is disposed on the carrier roller shaft, and is disposed along the foregoing Positioning and adjusting the axial direction of the roller shaft, and moving the adjustment mounting position in the direction of the roller shaft, thereby adjusting the pressing force of the carrier roller to press the substrate on the substrate according to the carrier roller The aforementioned substrate snakewalker in a predetermined direction. The substrate transfer apparatus according to claim 1, wherein the transporting wheel is rotationally driven by a drive mechanism, and the pair of transport rollers are configured to transmit the rotation of the transport shaft by a power transmission mechanism. The invention relates to a substrate transfer device according to the first aspect of the invention, wherein the outer peripheral surface of the carrier roller is detachably mounted to press the width direction end of the substrate. a resilient pressing member on the upper portion of the portion, wherein the outer peripheral surface of the end supporting roller has a stepped portion formed at a position opposed to the elastic pressing member, and the stepped portion and the elastic pressing member are formed between A gap is placed in the end portion of the substrate in the width direction. 17 1376344 VII. Designation of representatives: (1) The representative representative of the case is: figure (3). (2) The symbol of the symbol of this representative figure is briefly described: 31.. .1st spur gear 32.. 2nd spur gear W...substrate 3...Transport shaft 4...mounting member 5.. bearing 18.. Mechanical room 21.. Transfer roller 22.. End support roller 23.. Step difference part 25.. Carrying roller shaft 26.. Bearing 27... Carrying roller 28.. .0 Ring 29.. Station code 30.. . Bolt 8. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention:
TW095114207A 2005-04-28 2006-04-20 Apparatus for carrying substrates TWI376344B (en)

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JP5502443B2 (en) * 2009-12-05 2014-05-28 芝浦メカトロニクス株式会社 Substrate transfer device
JP6320849B2 (en) * 2014-06-04 2018-05-09 芝浦メカトロニクス株式会社 Substrate transfer apparatus and substrate processing apparatus
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