JP4881575B2 - Substrate transfer device - Google Patents

Substrate transfer device Download PDF

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JP4881575B2
JP4881575B2 JP2005132907A JP2005132907A JP4881575B2 JP 4881575 B2 JP4881575 B2 JP 4881575B2 JP 2005132907 A JP2005132907 A JP 2005132907A JP 2005132907 A JP2005132907 A JP 2005132907A JP 4881575 B2 JP4881575 B2 JP 4881575B2
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substrate
transport
shaft
upper roller
roller
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JP2006306596A (en
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尊彦 和歌月
幸伸 西部
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to KR1020060036741A priority patent/KR101232695B1/en
Priority to CN2006101006091A priority patent/CN1868839B/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G60/00—Simultaneously or alternatively stacking and de-stacking of articles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Description

この発明はたとえば液晶表示装置に用いられるガラス製の基板を搬送するためなどに用いられる搬送装置に関する。   The present invention relates to a transfer device used for transferring a glass substrate used in a liquid crystal display device, for example.

液晶表示装置の製造工程においては、ガラス製の基板をエッチング処理する工程、エッチング処理後にマスクとして使用されたレジストを剥離処理する工程、さらにはエッチング工程や剥離工程などの後で汚れた基板を洗浄液によって洗浄する工程などがある。このような基板の処理工程では、基板を一枚ずつ搬送しながら処理する枚葉方式が採用されることが多い。   In the manufacturing process of a liquid crystal display device, a process for etching a glass substrate, a process for removing a resist used as a mask after the etching process, and a cleaning solution for a substrate that becomes dirty after the etching process or the peeling process There is a process of cleaning by. In such substrate processing steps, a single-wafer method is often employed in which substrates are processed while being conveyed one by one.

枚葉方式によって基板を処理する場合、基板を搬送しながらその上下面或いは上面にシャワ−ノズルから処理液を噴射したり、洗浄ブラシを接触させて処理する処理装置が知られている。この処理装置はチャンバを有し、このチャンバ内には上記基板を所定方向に沿って搬送するための搬送装置が設けられている。また、複数の処理装置を用いて基板を順次搬送処理する場合、隣り合う処理装置間にも、上流側の処理装置から下流側の処理装置に基板を搬送するための搬送装置が用いられる。   In the case of processing a substrate by a single wafer method, a processing apparatus is known in which a processing liquid is ejected from a shower nozzle to the upper or lower surface or upper surface of the substrate while the substrate is transported, or a cleaning brush is contacted. The processing apparatus has a chamber, and a transport apparatus for transporting the substrate along a predetermined direction is provided in the chamber. In addition, when a plurality of processing apparatuses are used to sequentially transfer a substrate, a transfer apparatus for transferring a substrate from an upstream processing apparatus to a downstream processing apparatus is also used between adjacent processing apparatuses.

上記搬送装置は、基板の搬送方向に沿って複数の搬送軸が所定間隔で回転可能に設けられている。この搬送軸には複数の搬送ロ−ラが軸方向に所定間隔で設けられている。そして、上記搬送軸を回転駆動することで、上記基板を搬送ローラによって搬送するようになっている。   In the transport apparatus, a plurality of transport shafts are rotatably provided at predetermined intervals along the transport direction of the substrate. A plurality of transport rollers are provided on the transport shaft at predetermined intervals in the axial direction. The substrate is transported by transport rollers by rotationally driving the transport shaft.

処理装置に用いられる搬送装置は、基板の下面を単に複数の搬送ローラで支持しただけでは、この基板に処理液を噴射したり、洗浄ブラシを接触させたとき、基板が処理液や洗浄ブラシから抵抗を受けたときに、その抵抗によって基板を一定の速度で円滑に搬送できなくなるということがあったり、基板の両端部がばたついて損傷するということがある。   The transport device used in the processing apparatus simply supports the lower surface of the substrate with a plurality of transport rollers. When the processing liquid is sprayed on the substrate or the cleaning brush is brought into contact with the substrate, the substrate is removed from the processing liquid or the cleaning brush. When resistance is received, the resistance may prevent the substrate from being smoothly transported at a constant speed, or the both ends of the substrate may flutter and be damaged.

そこで、基板を搬送する際、この基板の下面を搬送軸に設けられた搬送ローラによって支持するだけでなく、基板の端部下面を端部支持ローラで支持し、この端部支持ローラによって支持された基板の端部上面を上載せローラで押圧する。
それによって、基板が処理液や洗浄ブラシから抵抗を受けても、その基板を一定の速度で確実に搬送したり、基板の両端部がばたついて損傷することがないようにしている。 Therefore, when transporting the substrate, not only the lower surface of the substrate is supported by the transport roller provided on the transport shaft, but also the lower surface of the end of the substrate is supported by the end support roller, and is supported by the end support roller. The upper surface of the end portion of the substrate is pressed with an upper roller.
Thereby, even if the substrate receives resistance from the processing liquid or the cleaning brush, the substrate is reliably transported at a constant speed, and both ends of the substrate are prevented from flapping and being damaged.

従来、上記上載せローラは上載せローラ軸の両端部に設けるようにしている。この上載せローラ軸は、上記シャワーノズルや洗浄ブラシの上流側に位置する搬送軸の上方に、この搬送軸と軸線を平行にし、かつ両端部が回転可能に支持されて設けられている。   Conventionally, the upper roller is provided at both ends of the upper roller shaft. The upper roller shaft is provided above the transport shaft located on the upstream side of the shower nozzle and the cleaning brush so that the transport shaft and the axis are parallel and both ends are rotatably supported.

上記上載せローラの一端部には上記搬送軸の一端部に設けられた歯車と噛合する歯車が設けられている。それによって、搬送軸が回転駆動されれば、この搬送軸に同期して上載せローラが回転駆動されるから、基板は端部支持ローラと上載せローラとによって幅方向の両端部の上下面が挟持されて確実に搬送される。   A gear that meshes with a gear provided at one end of the transport shaft is provided at one end of the upper roller. Thus, if the transport shaft is driven to rotate, the upper roller is driven to rotate in synchronization with the transport shaft. Therefore, the upper and lower surfaces of both ends in the width direction of the substrate are supported by the end support roller and the upper roller. It is pinched and transported reliably.

上記上載せローラ軸は上記搬送軸と同じ長さに設定されていた。しかしながら、最近では基板が大型化する傾向にあるから、搬送軸が長尺化し、それに応じて上載せローラ軸も長尺化及び高重量化していた。   The upper roller shaft was set to the same length as the transport shaft. However, recently, since the substrate tends to increase in size, the conveying shaft has become longer, and the upper roller shaft has become longer and heavier accordingly.

上載せローラ軸が長尺化及び高重量化すると、両端部が回転可能に支持された上載せローラ軸に撓みが生じることが避けられない。上載せローラ軸に生じる撓みは、一対の上載せローラが設けられた両端部分において同じにならないことがある。その場合、一対の上載せローラによる基板の幅方向両端部の押圧力にばらつきが生じる。幅方向両端部の押圧力にばらつきが生じると、基板は真直ぐに搬送されず、蛇行する原因になるということがある。   When the upper roller shaft becomes longer and heavier, it is inevitable that the upper roller shaft whose both ends are rotatably supported bend. The bending that occurs in the upper roller shaft may not be the same at both ends where the pair of upper rollers are provided. In that case, variation occurs in the pressing force at both ends in the width direction of the substrate by the pair of upper rollers. If the pressing force at both ends in the width direction varies, the substrate may not be transported straight and cause meandering.

この発明は、上載せローラが設けられる上載せローラ軸を左右２本に分割して短尺化し、かつ各ローラ軸に設けられた上載せローラが基板の幅方向端部を押圧する押圧力を調整できるようにすることで、基板の幅方向両端部をほぼ均等に押圧できるようにした基板の搬送装置を提供することにある。   In this invention, the upper roller shaft on which the upper roller is provided is divided into two parts on the left and right sides, and the length is shortened, and the pressing force with which the upper roller provided on each roller shaft presses the end in the width direction of the substrate is adjusted. By being able to do so, the present invention is to provide a substrate transport apparatus that can press both ends in the width direction of the substrate substantially evenly.

この発明は、基板を所定方向に搬送する搬送装置であって、
軸方向の両端部が回転可能に支持され上記基板の搬送方向に対して軸線を交差させて所定間隔で配置された複数の搬送軸と、
この搬送軸に設けられ上記基板の幅方向両端部を除く部分の下面を支持する複数の搬送ローラと、
上記搬送軸に設けられ上記基板の幅方向両端部の下面を支持する端部支持ローラと、
上記搬送軸の一端部と他端部との上方にそれぞれ軸線を上記搬送軸と平行にして配置され上記搬送軸の両端部に対応する一端部が回転可能に支持された一対の上載せローラ軸と、
各上載せローラ軸の他端部に設けられ上記端部支持ローラによって幅方向の端部下面が支持された上記基板の幅方向の端部上面をそれぞれ押圧する一対の上載せローラと、
上記上載せローラ軸にこのローラ軸の軸方向に沿って位置決め調整可能に設けられ上記ローラ軸の軸方向に移動させて取り付け位置を調整することで、上記上載せローラが上記基板の上面の幅方向両端部を押圧する押圧力を上記上載せローラごとに調整して所定方向に搬送される上記基板が蛇行するのを防止するウエイトと
を具備したことを特徴とする基板の搬送装置にある。 This invention is a transfer device for transferring a substrate in a predetermined direction,
A plurality of transport shafts that are rotatably supported at both ends in the axial direction and intersecting the transport direction of the substrate with the axis line crossed.
A plurality of transport rollers provided on the transport shaft and supporting the lower surface of the portion excluding both ends in the width direction of the substrate;
An end support roller that is provided on the transport shaft and supports the lower surfaces of both end portions in the width direction of the substrate;
A pair of upper roller shafts that are disposed above one end portion and the other end portion of the transport shaft so that their axis lines are parallel to the transport shaft, and one end portions corresponding to both end portions of the transport shaft are rotatably supported. When,
A pair of upper rollers, each of which is provided at the other end of each upper roller shaft and presses the upper end surface in the width direction of the substrate, the lower surface of the end in the width direction being supported by the end support roller;
The upper roller is provided so as to be positioned and adjustable along the axial direction of the roller shaft, and is moved in the axial direction of the roller shaft to adjust the mounting position, so that the upper roller has a width of the upper surface of the substrate. And a weight for preventing the substrate conveyed in a predetermined direction from being meandered by adjusting a pressing force for pressing both ends in the direction for each of the upper rollers .

上記搬送軸は駆動機構によって回転駆動されるとともに、上記一対の上載せローラ軸は上記搬送軸の回転が動力伝達機構によって伝達される構成であることが好ましい。
上記上載せローラの外周面には、上記基板の幅方向の端部上面を押圧する弾性押圧部材が着脱可能に取着され、上記端部支持ローラの外周面には、上記弾性押圧部材と対向する位置に段差部が形成されていて、この段差部と上記弾性押圧部材との間に上記基板の幅方向の端部が入り込む隙間が形成されていることが好ましい。 It is preferable that the transport shaft is rotationally driven by a drive mechanism, and the pair of upper roller shafts are configured such that the rotation of the transport shaft is transmitted by a power transmission mechanism.
An elastic pressing member that presses the upper surface of the end portion in the width direction of the substrate is detachably attached to the outer peripheral surface of the upper roller, and the outer peripheral surface of the end support roller faces the elastic pressing member. It is preferable that a step portion is formed at a position where the gap is formed, and a gap is formed between the step portion and the elastic pressing member so that the end portion in the width direction of the substrate enters.

この発明によれば、上載せローラ軸を左右に分割して短尺化し、重量による撓みが生じないようにするとともに、各上載せローラ軸にウエイトを設け、そのウエイトによって基板に対する押圧力を与えることができるようにしたから、左右一対の上載せローラによって基板の幅方向両端部の上面を均等に押圧することが可能となる。   According to the present invention, the upper roller shaft is divided into left and right parts to shorten the length so as not to be bent due to weight, and the weight is provided to each upper roller shaft, and the pressing force is applied to the substrate by the weight. Therefore, the upper surfaces of both ends in the width direction of the substrate can be evenly pressed by the pair of left and right upper rollers.

以下、この発明の一実施の形態を図面を参照しながら説明する。
図１は基板を処理液によって処理するための処理装置の縦断面図、図２は同じく側断面図である。処理装置はチャンバ１を備えている。このチャンバ１内には図１に鎖線で示す基板Ｗを所定方向に搬送するための搬送装置２が設けられている。この搬送装置２は基板Ｗの搬送方向（図２に矢印Ｘで示す方向）に対して軸線をほぼ直角方向に位置させた複数の搬送軸、この実施の形態では図２に示すように８本の搬送軸３が上記搬送方向に沿って所定間隔で配置されている。 An embodiment of the present invention will be described below with reference to the drawings.
FIG. 1 is a longitudinal sectional view of a processing apparatus for processing a substrate with a processing liquid, and FIG. 2 is a side sectional view of the same. The processing apparatus includes a chamber 1. In the chamber 1, a transfer device 2 is provided for transferring the substrate W indicated by a chain line in FIG. 1 in a predetermined direction. The transfer device 2 has a plurality of transfer shafts whose axes are positioned substantially perpendicular to the transfer direction of the substrate W (the direction indicated by the arrow X in FIG. 2). In this embodiment, eight transfer shafts as shown in FIG. The transport shafts 3 are arranged at predetermined intervals along the transport direction.

なお、チャンバ１には、図２に示すように基板Ｗの搬送方向の一端に搬入口１ａが形成され、他端に搬出口１ｂが形成されている。搬入口と搬出口はシャッタ（図示せず）によって開閉されるようになっている。   In the chamber 1, as shown in FIG. 2, a carry-in port 1a is formed at one end in the transfer direction of the substrate W, and a carry-out port 1b is formed at the other end. The carry-in port and the carry-out port are opened and closed by a shutter (not shown).

図１に示すように、上記チャンバ１内の幅方向両端部には、幅方向と交差する基板Ｗの搬送方向に沿って帯板状の取り付け部材４が配置されている。取り付け部材４には上記複数の搬送軸３の両端部と対応する位置に軸受５が設けられ、これら軸受５に上記搬送軸３の両端部が回転可能に支持されている。   As shown in FIG. 1, at both ends in the width direction in the chamber 1, band plate-shaped attachment members 4 are disposed along the transport direction of the substrate W intersecting the width direction. The mounting member 4 is provided with bearings 5 at positions corresponding to both ends of the plurality of transport shafts 3, and both ends of the transport shaft 3 are rotatably supported by these bearings 5.

各搬送軸３の両端部は軸受５から突出し、一方の端部の突出端下方には図示しない軸受によって回転自在に支持された動力伝達軸６が基板Ｗの搬送方向に沿って配置されている。各搬送軸３の軸受５から突出下一端には第１の傘歯車７が設けられている。上記動力伝達軸６には、それぞれの第１の傘歯車７に噛合する第２の傘歯車８が設けられている。   Both ends of each transport shaft 3 protrude from the bearing 5, and a power transmission shaft 6 that is rotatably supported by a bearing (not shown) is disposed along the transport direction of the substrate W below the projecting end of one end. . A first bevel gear 7 is provided at the lower end of each conveying shaft 3 protruding from the bearing 5. The power transmission shaft 6 is provided with a second bevel gear 8 that meshes with each first bevel gear 7.

上記動力伝達軸６の中途部には従動スプロケット１１が設けられている。従動スプロケット１１が設けられた位置と対応するチャンバ１の外部にはモータと減速機とが一体化された搬送用駆動源１２が設けられている。この搬送用駆動源１２の出力軸１３には駆動スプロケット１４が設けられている。この駆動スプロケット１４と上記従動スプロケット１１にはチェーン１５が張設されている。それによって、上記搬送用駆動源１２が作動すれば、チェーン１５及び第１、第２の傘歯車７，８を介して各搬送軸３が所定方向に回転駆動される。   A driven sprocket 11 is provided in the middle of the power transmission shaft 6. A conveyance drive source 12 in which a motor and a speed reducer are integrated is provided outside the chamber 1 corresponding to the position where the driven sprocket 11 is provided. A drive sprocket 14 is provided on the output shaft 13 of the conveyance drive source 12. A chain 15 is stretched between the drive sprocket 14 and the driven sprocket 11. Accordingly, when the transport drive source 12 is operated, the transport shafts 3 are rotationally driven in a predetermined direction via the chain 15 and the first and second bevel gears 7 and 8.

上記チャンバ１の幅方向両端側外面には、それぞれ機械室１８が形成されている。なお、チャンバ１内は基板Ｗを搬送する搬送室１９になっている。機械室１８には上記搬送軸３の両端部が位置している。それによって、搬送軸３を支持した軸受５や噛合した傘歯車７，８から発塵しても、その塵埃がチャンバ１の基板Ｗを搬送する搬送室１９に拡散するのを抑制できるようになっている。   Machine chambers 18 are formed on the outer surfaces on both ends in the width direction of the chamber 1. The chamber 1 is a transfer chamber 19 for transferring the substrate W. Both end portions of the transport shaft 3 are located in the machine chamber 18. As a result, even if dust is generated from the bearing 5 supporting the transport shaft 3 or the meshed bevel gears 7 and 8, the dust can be prevented from diffusing into the transport chamber 19 that transports the substrate W of the chamber 1. ing.

なお、上記搬送軸３の両端部が搬送室１９から機械室１８に貫通する部分は、フォーク状の仕切り板２０によって塞がれている。仕切り板２０は機械室１８内で発生する塵埃が搬送室１９に入り込むのを阻止している。   A portion where both end portions of the transfer shaft 3 penetrate from the transfer chamber 19 to the machine chamber 18 is closed by a fork-shaped partition plate 20. The partition plate 20 prevents dust generated in the machine chamber 18 from entering the transfer chamber 19.

上記搬送軸３の軸方向中途部には複数、この実施の形態では３つの搬送ローラ２１が所定間隔で設けられ、上記搬送室１９の幅方向両端部に対応する部分にはそれぞれ端部支持ローラ２２が設けられている。図３と図４に拡大して示すように、端部支持ローラ２２の外周面には段差部２３が形成され、この段差部２３に基板Ｗの幅方向の両端部の下面が支持される。それによって、基板Ｗは上記段差部２３によって蛇行することなく所定方向に沿って搬送されるようになっている。   A plurality of, in this embodiment, three transport rollers 21 are provided at predetermined intervals in the axial middle portion of the transport shaft 3, and end support rollers are provided at portions corresponding to both ends in the width direction of the transport chamber 19, respectively. 22 is provided. As shown in enlarged views in FIGS. 3 and 4, a stepped portion 23 is formed on the outer peripheral surface of the end support roller 22, and the lower surfaces of both end portions in the width direction of the substrate W are supported by the stepped portion 23. Accordingly, the substrate W is transported along a predetermined direction without meandering by the step portion 23.

図２と図３に示すように、複数の搬送軸３のうち、チャンバ１の基板Ｗの搬送方向中途部に位置する２本の搬送軸３の軸方向両端部の上方には、それぞれ搬送軸３と軸線を平行にして一対の上載せローラ軸２５が配設されている。   As shown in FIG. 2 and FIG. 3, among the plurality of transport shafts 3, the transport shafts are respectively disposed above both end portions in the axial direction of the two transport shafts 3 positioned in the middle of the transport direction of the substrate W of the chamber 1. A pair of upper roller shafts 25 are arranged with the axis 3 parallel to the axis.

一対の上載せローラ軸２５の一端部は上記取り付け部材４に設けられた軸受２６によって回転自在に支持されている。この上載せローラ軸２５の他端部には上記端部支持ローラ２２と対向する位置に上載せローラ２７が設けられている。   One end of the pair of upper roller shafts 25 is rotatably supported by a bearing 26 provided on the mounting member 4. An upper roller 27 is provided at the other end of the upper roller shaft 25 at a position facing the end support roller 22.

上記上載せローラ２７には、上記端部支持ローラ２２の段差部２３と対向する位置にＯリング２８が着脱可能に取着されている。このＯリング２８と上記段差部２３との間には隙間Ｇが形成されている。   An O-ring 28 is detachably attached to the upper roller 27 at a position facing the step portion 23 of the end support roller 22. A gap G is formed between the O-ring 28 and the step portion 23.

上記上載せローラ軸２５にはウエイト２９が軸方向にスライド可能かつねじ３０によって所定のスライド位置で固定可能に設けられている。上記上載せローラ軸２５は軸受２６による片持ち構造となっている。したがって、ねじ３０を緩めて上記ウエイト２９をスライドさせ、その固定位置を調整すれば、上記端部支持ローラ２２の段差部２３と、上記上載せローラ２５に設けられたＯリング２８との間の間隔Ｇを所定の大きさに設定することができる。   A weight 29 is provided on the upper roller shaft 25 so as to be slidable in the axial direction and fixed by a screw 30 at a predetermined slide position. The upper roller shaft 25 has a cantilever structure with a bearing 26. Therefore, if the screw 30 is loosened and the weight 29 is slid and the fixing position thereof is adjusted, the gap between the step portion 23 of the end support roller 22 and the O-ring 28 provided on the upper roller 25 is reduced. The interval G can be set to a predetermined size.

なお、チャンバ１内には、上記上載せローラ軸２５が設けられた中途部の手前に基板Ｗを処理する図示しないブラシ洗浄装置などの処理手段が設けられている。それによって、基板Ｗは、後述するように幅方向の両端部の上下面が端部支持ローラ２２と上載せローラ２７とによって保持された状態で上記処理手段によって処理されるようになっている。   In the chamber 1, processing means such as a brush cleaning device (not shown) for processing the substrate W is provided in front of the middle portion where the upper roller shaft 25 is provided. Thereby, the substrate W is processed by the processing means in a state where the upper and lower surfaces of both end portions in the width direction are held by the end portion supporting roller 22 and the upper roller 27 as will be described later.

上記搬送軸３の上記軸受５から突出した両端部にはそれぞれ第１の平歯車３１が嵌着されている。上記上載せローラ軸２５の上記軸受２６から突出した端部には上記第１の平歯車３１に噛合する第２の平歯車３２が嵌着されている。したがって、搬送軸３が搬送用駆動源１２によって回転駆動されれば、その回転によって第１、第２の平歯車３１，３２を介して一対の上載せローラ軸２５が逆方向に回転するようになっている。   First spur gears 31 are fitted to both end portions of the transport shaft 3 protruding from the bearing 5. A second spur gear 32 that meshes with the first spur gear 31 is fitted to the end of the upper roller shaft 25 protruding from the bearing 26. Therefore, if the transport shaft 3 is rotationally driven by the transport drive source 12, the rotation causes the pair of upper roller shafts 25 to rotate in the reverse direction via the first and second spur gears 31 and 32. It has become.

このような構成の搬送装置２によれば、搬入口１ａからチャンバ１内に供給された基板Ｗは、回転駆動される搬送軸３に設けられた搬送ローラ２１と端部支持ローラ２２とによって下面が支持されて搬送される。   According to the transport apparatus 2 having such a configuration, the substrate W supplied into the chamber 1 from the transport inlet 1a is lowered by the transport roller 21 and the end support roller 22 provided on the transport shaft 3 that is rotationally driven. Is supported and conveyed.

チャンバ１内を搬送される基板Ｗは、チャンバ１内の中途部に設けられた基板Ｗを処理する、図示しないブラシ洗浄装置などの処理手段に送り込まれる手前で、上記端部支持ローラ２２によって下面が支持された幅方向両端部の上面が上載せローラ２７によって保持される。   The substrate W transported in the chamber 1 is placed on the lower surface by the end support roller 22 before being sent to a processing means such as a brush cleaning device (not shown) that processes the substrate W provided in the middle of the chamber 1. The upper surface of the both ends in the width direction where the is supported is held by the upper roller 27.

それによって、基板Ｗは幅方向の両端部が端部支持ローラ２２と上載せローラ２７とによって挟持されて処理手段を通過することになるから、上記処理手段から処理時の抵抗を受けても、幅方向両端部がばたついて損傷するのが防止されるばかりか、処理手段から受ける抵抗によって速度がばらつくことなく搬送されることになる。   As a result, both ends of the substrate W in the width direction are sandwiched between the end support roller 22 and the upper roller 27 and pass through the processing means. Therefore, even when receiving resistance during processing from the processing means, In addition to preventing the end portions in the width direction from flapping and being damaged, the speed is not varied due to resistance received from the processing means.

一対の上載せローラ２７は分割された一対の上載せローラ軸２５の他端部にそれぞれ設けられている。各上載せローラ軸２５にはウエイト２９が軸方向に沿って位置決め調整可能に設けられている。   The pair of upper roller 27 is provided at the other end of the pair of upper roller shafts 25 divided. Each upper roller shaft 25 is provided with a weight 29 that can be positioned and adjusted along the axial direction.

それによって、上記ウエイト２９を図３に矢印で示す方向に移動させてその取り付け位置調整すれば、各上載せローラ軸２５が基板Ｗの幅方向の両端部上面を押圧する押圧力を調整することができる。   Accordingly, if the weight 29 is moved in the direction indicated by the arrow in FIG. 3 and its mounting position is adjusted, the pressing force with which each upper roller shaft 25 presses the upper surfaces of both ends in the width direction of the substrate W is adjusted. Can do.

すなわち、上載せローラ軸２５は左右一対に分割されていることで、一端部が軸受２６によって支持された片持ち状態にある。そのため、ウエイト２９の位置を調整すれば、上載せローラ２７が設けられた他端部の撓み量を変えることができる。Ｏリング２８と、端部支持ローラ２２の段差部２３との間隔Ｇを変えることができる。   That is, the upper roller shaft 25 is divided into a pair of left and right so that one end is supported by the bearing 26 in a cantilever state. Therefore, if the position of the weight 29 is adjusted, the deflection amount of the other end provided with the upper roller 27 can be changed. The distance G between the O-ring 28 and the stepped portion 23 of the end support roller 22 can be changed.

したがって、一対の上載せローラ軸２５に設けられたウエイト２９の軸方向に沿う位置を調整すれば、左右一対の上載せローラ２７による基板Ｗの幅方向両端部上面の押圧力をほぼ同等に設定することが可能である。一対の上載せローラ２７によって基板Ｗの幅方向両端部がほぼ同じ押圧力で押圧されていれば、基板Ｗを幅方向に蛇行させることなく真直ぐに搬送することが可能となる。   Therefore, if the position along the axial direction of the weight 29 provided on the pair of upper roller shafts 25 is adjusted, the pressing force on the upper surfaces of both ends in the width direction of the substrate W by the pair of left and right upper roller 27 is set to be substantially equal. Is possible. If both ends in the width direction of the substrate W are pressed by the pair of upper rollers 27 with substantially the same pressing force, the substrate W can be transported straight without meandering in the width direction.

基板Ｗの幅方向両端部の上面は、上載せローラ２７に設けられたＯリング２８によって押圧される。Ｏリング２８は使用に伴い劣化することが避けられないから、その場合には上記Ｏリング２８を交換しなければならない。   The upper surfaces of both ends in the width direction of the substrate W are pressed by an O-ring 28 provided on the upper roller 27. Since the O-ring 28 is inevitably deteriorated with use, in this case, the O-ring 28 must be replaced.

上載せローラ２７が設けられた上載せローラ軸２５は左右一対に分割され、その端部に上記上載せローラ２７が設けられている。そのため、上記上載せローラ２７に対してＯリング２８を簡単かつ容易に着脱することができる。つまり、Ｏリング２８の交換作業を迅速に行なうことが可能となる。   The upper roller shaft 25 provided with the upper roller 27 is divided into a left and right pair, and the upper roller 27 is provided at the end thereof. Therefore, the O-ring 28 can be easily attached to and detached from the upper roller 27. That is, the replacement operation of the O-ring 28 can be performed quickly.

左右一対の上載せローラ軸２５は、搬送軸３が回転駆動されると、第１、第２の平歯車３１、３２を介してそれぞれ強制的に回転駆動される。つまり、各上載せローラ軸２５とともに上載せローラ２７が強制的に回転駆動される。   The pair of left and right upper roller shafts 25 are forcibly rotated via the first and second spur gears 31 and 32 when the conveying shaft 3 is driven to rotate. That is, the upper roller 27 is forcibly rotated together with the upper roller shafts 25.

そのため、基板Ｗは左右一対の上載せローラ２７によって単に幅方向の両端部の上面が保持されるだけでなく、搬送力が付与される。そのため、上載せローラ軸２５を２つに分割し、各上載せローラ軸２５に上載せローラ２７を設けるようにしても、基板Ｗを安定した状態で確実に搬送することができる。   For this reason, the substrate W is not only simply held on the upper surfaces of the both end portions in the width direction by the pair of left and right upper loading rollers 27 but is given a transport force. Therefore, even if the upper roller shaft 25 is divided into two and the upper roller 27 is provided on each upper roller shaft 25, the substrate W can be reliably conveyed in a stable state.

この発明は上記一実施の形態に限定されず、たとえば上載せローラ軸２５の一端部を１つの軸受２６によって支持したが、上載せローラ軸２５の長さによってはその一端部を所定間隔で離間する一対の軸受によって支持するようにしてもよい。一対の軸受で支持すれば、上載せローラ軸２５が片持ち状態であっても、その上載せローラ軸２５を比較的安定した状態、つまり振れの少ない状態で支持することが可能となる。   The present invention is not limited to the above-described embodiment. For example, one end portion of the upper roller shaft 25 is supported by one bearing 26, but depending on the length of the upper roller shaft 25, the one end portion is separated at a predetermined interval. It may be supported by a pair of bearings. If supported by a pair of bearings, even if the upper roller shaft 25 is in a cantilever state, the upper roller shaft 25 can be supported in a relatively stable state, that is, in a state where there is little vibration.

この発明の一実施の形態を示す処理装置の縦断面図。BRIEF DESCRIPTION OF THE DRAWINGS The longitudinal cross-sectional view of the processing apparatus which shows one Embodiment of this invention. 図１に示す処理装置の横断面図。The cross-sectional view of the processing apparatus shown in FIG. 搬送軸と上載せローラ軸との端部の拡大図。The enlarged view of the edge part of a conveyance axis | shaft and a mounting roller axis | shaft. 端部支持ローラと上載せローラとの拡大図。The enlarged view of an edge part support roller and a top roller.

符号の説明Explanation of symbols

２…搬送装置、３…搬送軸、２１…搬送ローラ、２２…端部支持ローラ、２５…上載せローラ軸、２７…上載せローラ、２９…ウエイト。   DESCRIPTION OF SYMBOLS 2 ... Conveying device, 3 ... Conveying shaft, 21 ... Conveying roller, 22 ... End part supporting roller, 25 ... Top roller shaft, 27 ... Top roller, 29 ... Weight.

Claims (3)

基板を所定方向に搬送する搬送装置であって、
軸方向の両端部が回転可能に支持され上記基板の搬送方向に対して軸線を交差させて所定間隔で配置された複数の搬送軸と、
この搬送軸に設けられ上記基板の幅方向両端部を除く部分の下面を支持する複数の搬送ローラと、
上記搬送軸に設けられ上記基板の幅方向両端部の下面を支持する端部支持ローラと、
上記搬送軸の一端部と他端部との上方にそれぞれ軸線を上記搬送軸と平行にして配置され上記搬送軸の両端部に対応する一端部が回転可能に支持された一対の上載せローラ軸と、
各上載せローラ軸の他端部に設けられ上記端部支持ローラによって幅方向の端部下面が支持された上記基板の幅方向の端部上面をそれぞれ押圧する一対の上載せローラと、
上記上載せローラ軸にこのローラ軸の軸方向に沿って位置決め調整可能に設けられ上記ローラ軸の軸方向に移動させて取り付け位置を調整することで、上記上載せローラが上記基板の上面の幅方向両端部を押圧する押圧力を上記上載せローラごとに調整して所定方向に搬送される上記基板が蛇行するのを防止するウエイトと
を具備したことを特徴とする基板の搬送装置。 A transport device for transporting a substrate in a predetermined direction,
A plurality of transport shafts that are rotatably supported at both ends in the axial direction and intersecting the transport direction of the substrate with the axis line crossed.
A plurality of transport rollers provided on the transport shaft and supporting the lower surface of the portion excluding both ends in the width direction of the substrate;
An end support roller that is provided on the transport shaft and supports the lower surfaces of both end portions in the width direction of the substrate;
A pair of upper roller shafts that are disposed above one end portion and the other end portion of the transport shaft so that their axis lines are parallel to the transport shaft, and one end portions corresponding to both end portions of the transport shaft are rotatably supported. When,
A pair of upper rollers, each of which is provided at the other end of each upper roller shaft and presses the upper end surface in the width direction of the substrate, the lower surface of the end in the width direction being supported by the end support roller;
The upper roller is provided so as to be positioned and adjustable along the axial direction of the roller shaft, and is moved in the axial direction of the roller shaft to adjust the mounting position, so that the upper roller has a width of the upper surface of the substrate. A substrate transport apparatus comprising: a weight for adjusting a pressing force for pressing both ends in each direction for each of the upper rollers to prevent the substrate being transported in a predetermined direction from meandering . 上記搬送軸は駆動機構によって回転駆動されるとともに、上記一対の上載せローラ軸は上記搬送軸の回転が動力伝達機構によって伝達される構成であることを特徴とする請求項１記載の基板の搬送装置。   2. The substrate transport according to claim 1, wherein the transport shaft is rotationally driven by a drive mechanism, and the pair of upper roller shafts are configured such that rotation of the transport shaft is transmitted by a power transmission mechanism. apparatus. 上記上載せローラの外周面には、上記基板の幅方向の端部上面を押圧する弾性押圧部材が着脱可能に取着され、上記端部支持ローラの外周面には、上記弾性押圧部材と対向する位置に段差部が形成されていて、この段差部と上記弾性押圧部材との間に上記基板の幅方向の端部が入り込む隙間が形成されていることを特徴とする請求項１記載の基板の搬送装置。  An elastic pressing member that presses the upper surface of the end portion in the width direction of the substrate is detachably attached to the outer peripheral surface of the upper roller, and the outer peripheral surface of the end support roller faces the elastic pressing member. 2. The substrate according to claim 1, wherein a stepped portion is formed at a position where the gap is formed, and a gap is formed between the stepped portion and the elastic pressing member so that an end in the width direction of the substrate enters. Transport device.
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