TWI366072B - Photosensitive thermosetting resin composition, flattened and resist film coated printed wiring board and method of preparing the same - Google Patents
Photosensitive thermosetting resin composition, flattened and resist film coated printed wiring board and method of preparing the sameInfo
- Publication number
- TWI366072B TWI366072B TW096109202A TW96109202A TWI366072B TW I366072 B TWI366072 B TW I366072B TW 096109202 A TW096109202 A TW 096109202A TW 96109202 A TW96109202 A TW 96109202A TW I366072 B TWI366072 B TW I366072B
- Authority
- TW
- Taiwan
- Prior art keywords
- flattened
- preparing
- resin composition
- wiring board
- printed wiring
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
- H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Epoxy Resins (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006112677A JP4711208B2 (en) | 2006-03-17 | 2006-03-17 | Photosensitive thermosetting resin composition, resist film-coated smoothed printed wiring board, and method for producing the same. |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200801817A TW200801817A (en) | 2008-01-01 |
TWI366072B true TWI366072B (en) | 2012-06-11 |
Family
ID=38375044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096109202A TWI366072B (en) | 2006-03-17 | 2007-03-16 | Photosensitive thermosetting resin composition, flattened and resist film coated printed wiring board and method of preparing the same |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4711208B2 (en) |
KR (1) | KR100894609B1 (en) |
CN (1) | CN101037529B (en) |
DE (1) | DE102006043357B4 (en) |
TW (1) | TWI366072B (en) |
Families Citing this family (58)
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TWI357536B (en) * | 2006-10-24 | 2012-02-01 | Taiyo Ink Mfg Co Ltd | Photosetting and thermosetting solder resist ink c |
JP4538484B2 (en) * | 2006-10-24 | 2010-09-08 | 太陽インキ製造株式会社 | Photocurable thermosetting resin composition and printed wiring board using the same |
JP5464314B2 (en) * | 2007-10-01 | 2014-04-09 | 山栄化学株式会社 | Inorganic filler and organic filler-containing curable resin composition, resist film-coated printed wiring board, and method for producing the same |
US20090141505A1 (en) * | 2007-11-30 | 2009-06-04 | Taiyo Ink Mfg., Co,. Ltd. | White heat-hardening resin composition, hardened material, printed-wiring board and reflection board for light emitting device |
US8042976B2 (en) * | 2007-11-30 | 2011-10-25 | Taiyo Holdings Co., Ltd. | White hardening resin composition, hardened material, printed-wiring board and reflection board for light emitting device |
US8585272B2 (en) * | 2008-01-09 | 2013-11-19 | Hitachi Chemical Company, Ltd. | Thermosetting resin composition, epoxy resin molding material, and polyvalent carboxylic acid condensate |
US8637593B2 (en) | 2008-01-09 | 2014-01-28 | Hitachi Chemical Company, Ltd. | Thermosetting resin composition, epoxy resin molding material, and polyvalent carboxylic acid condensate |
WO2009090867A1 (en) * | 2008-01-15 | 2009-07-23 | Sekisui Chemical Co., Ltd. | Resist material and laminate |
JP5089426B2 (en) * | 2008-02-15 | 2012-12-05 | 電気化学工業株式会社 | Alkali-developable photocurable / thermosetting solder resist composition and metal base circuit board using the same |
JP2009194222A (en) * | 2008-02-15 | 2009-08-27 | Denki Kagaku Kogyo Kk | White alkali-developable photocurable and thermosetting solder resist composition, and metal-base circuit substrate using the same |
JP5201397B2 (en) * | 2008-04-25 | 2013-06-05 | 日立化成株式会社 | Photosensitive resin composition and photosensitive permanent resist, photosensitive film, and resist pattern forming method using the same |
JP5112944B2 (en) * | 2008-05-07 | 2013-01-09 | 太陽ホールディングス株式会社 | Combination unit and printed wiring board of thermosetting resin composition for hole filling and photocurable / thermosetting resin composition for solder mask formation |
TWI455954B (en) * | 2008-05-07 | 2014-10-11 | Taiyo Holdings Co Ltd | a thermosetting resin composition for hole filling, a combination unit of the composition and a photocurable thermosetting resin composition for forming a solder resist layer, and a printed circuit board |
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JP4657358B2 (en) * | 2008-12-12 | 2011-03-23 | 積水化学工業株式会社 | Photosensitive composition and solder resist composition |
JP2010235799A (en) * | 2009-03-31 | 2010-10-21 | Taiyo Ink Mfg Ltd | Curable resin composition and printed wiring board and reflector using the same |
WO2011018907A1 (en) * | 2009-08-10 | 2011-02-17 | 積水化学工業株式会社 | Photosensitive composition and solder resist composition |
CN102011952A (en) * | 2009-09-04 | 2011-04-13 | 佛山市国星光电股份有限公司 | Method for making LED (Light Emitting Diode) light resource module and product made by the method |
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JP2011227308A (en) * | 2010-04-20 | 2011-11-10 | Taiyo Holdings Co Ltd | Solder resist composition and print circuit board |
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CN102621811B (en) * | 2011-01-31 | 2017-03-01 | 新应材股份有限公司 | A kind of developed photosensitive resin composition being applied to panel construction |
JP5640864B2 (en) * | 2011-03-31 | 2014-12-17 | 日本ゼオン株式会社 | Negative photosensitive resin composition and electronic component |
CN103562796A (en) * | 2011-06-01 | 2014-02-05 | 日本瑞翁株式会社 | Resin composition and semiconductor element substrate |
KR101993489B1 (en) * | 2011-11-25 | 2019-06-26 | 스미토모 베이클리트 컴퍼니 리미티드 | Prepreg, laminate, multilayered printed circuit board and semiconductor device |
KR101895416B1 (en) | 2011-12-23 | 2018-09-06 | 엘지이노텍 주식회사 | Print circuit board substrate and method ofmanufacturing the same |
JP5663506B2 (en) * | 2012-02-06 | 2015-02-04 | 太陽ホールディングス株式会社 | Solder resist composition |
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KR102235156B1 (en) * | 2013-12-09 | 2021-04-05 | 롬엔드하스전자재료코리아유한회사 | Negative-type photosensitive resin composition |
JP6019065B2 (en) * | 2014-07-08 | 2016-11-02 | 太陽ホールディングス株式会社 | Solder resist composition and printed wiring board |
JP6438298B2 (en) * | 2014-12-25 | 2018-12-12 | 株式会社カネカ | New photosensitive resin composition and its application |
WO2016136755A1 (en) * | 2015-02-26 | 2016-09-01 | 太陽ホールディングス株式会社 | Photocurable thermosetting resin composition, cured product of same, and printed wiring board |
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KR102625987B1 (en) | 2015-03-25 | 2024-01-18 | 다이요 홀딩스 가부시키가이샤 | First liquid and second liquid of two-liquid mixing type, and method for manufacturing printed wiring board |
KR101578143B1 (en) * | 2015-06-03 | 2015-12-28 | 김응곤 | Method for Manufacturing White Coverlay of Inkjet Type |
JP6078595B2 (en) * | 2015-07-27 | 2017-02-08 | 太陽ホールディングス株式会社 | Curable resin composition and printed wiring board and reflector using the same |
US10412829B2 (en) | 2015-08-03 | 2019-09-10 | Soko Kagaku Co., Ltd. | Nitride semiconductor light-emitting element base and manufacturing method thereof |
CN105517362A (en) * | 2015-11-24 | 2016-04-20 | 广州兴森快捷电路科技有限公司 | Selective gold immersion method of circuit board |
US10042253B2 (en) * | 2016-01-11 | 2018-08-07 | Samsung Display Co., Ltd. | Photosensitive resin composition, film prepared by using the photosensitive resin composition, and organic light-emitting display device including the film |
CN107278039A (en) * | 2016-04-08 | 2017-10-20 | 东莞市斯坦得电子材料有限公司 | A kind of organic base dry film stripping technique for printed wiring board |
WO2017217243A1 (en) * | 2016-06-16 | 2017-12-21 | Dic株式会社 | Epoxy (meth)acrylate resin and resist member |
US9920154B1 (en) * | 2016-11-15 | 2018-03-20 | Ford Global Technologies, Llc | Accelerated cure time of polymer resins |
WO2019044817A1 (en) * | 2017-08-28 | 2019-03-07 | 住友ベークライト株式会社 | Negative photosensitive resin composition, semiconductor device and electronic device |
WO2019194286A1 (en) * | 2018-04-05 | 2019-10-10 | 富士フイルム株式会社 | Photosensitive resin composition and pattern structure |
EP3838936A1 (en) * | 2019-12-19 | 2021-06-23 | Arkema France | Curable compositions comprising multistage polymers |
WO2022075432A1 (en) | 2020-10-08 | 2022-04-14 | 太陽インキ製造株式会社 | Photosensitive multilayer resin structure, dry film, cured product and electronic component |
CN116339074A (en) * | 2023-03-01 | 2023-06-27 | 湖南五江高科技材料有限公司 | Photosensitive composition containing modified 9-phenylacridine photoinitiator |
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---|---|---|---|---|
JP3316015B2 (en) * | 1993-02-02 | 2002-08-19 | 東京応化工業株式会社 | Heat resistant photosensitive resin composition |
JP3254572B2 (en) * | 1996-06-28 | 2002-02-12 | バンティコ株式会社 | Photopolymerizable thermosetting resin composition |
JP3077695B1 (en) | 1999-06-17 | 2000-08-14 | 荒川化学工業株式会社 | Method for producing alkoxy group-containing silane-modified epoxy resin |
US6525160B1 (en) * | 1999-06-17 | 2003-02-25 | Arakawa Chemical Industries Ltd. | Epoxy resin composition and process for producing silane-modified epoxy resin |
JP2001261776A (en) * | 2000-03-24 | 2001-09-26 | Matsushita Electric Works Ltd | Electrical insulating material for printed circuit board |
JP3539486B2 (en) * | 2000-06-27 | 2004-07-07 | 荒川化学工業株式会社 | Coating composition |
JP3458379B2 (en) * | 2000-12-08 | 2003-10-20 | 荒川化学工業株式会社 | Silane-modified epoxy resin composition and cured product thereof |
JP4573152B2 (en) * | 2001-03-29 | 2010-11-04 | 株式会社タムラ製作所 | Photosensitive resin composition for printed wiring board production |
JP2002182383A (en) | 2001-10-09 | 2002-06-26 | Goo Chemical Co Ltd | Photosensitive resin composition for production of printed circuit board, coating film using the same, resist ink, resist, soldering resist and printed circuit board |
-
2006
- 2006-03-17 JP JP2006112677A patent/JP4711208B2/en active Active
- 2006-09-15 DE DE102006043357A patent/DE102006043357B4/en active Active
-
2007
- 2007-01-23 KR KR1020070007063A patent/KR100894609B1/en active IP Right Grant
- 2007-03-15 CN CN2007100863909A patent/CN101037529B/en active Active
- 2007-03-16 TW TW096109202A patent/TWI366072B/en active
Also Published As
Publication number | Publication date |
---|---|
JP2007249148A (en) | 2007-09-27 |
KR100894609B1 (en) | 2009-04-24 |
JP4711208B2 (en) | 2011-06-29 |
DE102006043357A1 (en) | 2007-09-20 |
TW200801817A (en) | 2008-01-01 |
KR20070094456A (en) | 2007-09-20 |
CN101037529B (en) | 2011-05-25 |
DE102006043357B4 (en) | 2011-04-21 |
CN101037529A (en) | 2007-09-19 |
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