TWI364811B - - Google Patents

Download PDF

Info

Publication number
TWI364811B
TWI364811B TW096107558A TW96107558A TWI364811B TW I364811 B TWI364811 B TW I364811B TW 096107558 A TW096107558 A TW 096107558A TW 96107558 A TW96107558 A TW 96107558A TW I364811 B TWI364811 B TW I364811B
Authority
TW
Taiwan
Prior art keywords
substrate
end portion
supporting member
substrate supporting
rod
Prior art date
Application number
TW096107558A
Other languages
English (en)
Chinese (zh)
Other versions
TW200802683A (en
Inventor
Takehito Wada
Shinya Sugiyama
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200802683A publication Critical patent/TW200802683A/zh
Application granted granted Critical
Publication of TWI364811B publication Critical patent/TWI364811B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7624—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Coating Apparatus (AREA)
TW096107558A 2006-03-20 2007-03-05 Member for supporting substrate TW200802683A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006075841A JP4906375B2 (ja) 2006-03-20 2006-03-20 基板支持部材

Publications (2)

Publication Number Publication Date
TW200802683A TW200802683A (en) 2008-01-01
TWI364811B true TWI364811B (https=) 2012-05-21

Family

ID=38595009

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107558A TW200802683A (en) 2006-03-20 2007-03-05 Member for supporting substrate

Country Status (4)

Country Link
JP (1) JP4906375B2 (https=)
KR (1) KR100948759B1 (https=)
CN (1) CN101043014A (https=)
TW (1) TW200802683A (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100968814B1 (ko) 2008-05-14 2010-07-08 세메스 주식회사 리프트 핀 구조체 및 이를 구비하는 기판 처리 장치
JP2010087342A (ja) * 2008-10-01 2010-04-15 Toray Eng Co Ltd リフトピン
JP2010087343A (ja) * 2008-10-01 2010-04-15 Toray Eng Co Ltd 基板処理装置及び基板載置方法
KR101715147B1 (ko) * 2015-07-24 2017-03-14 주식회사 선익시스템 글라스기판처짐보완장치를 포함하는 버퍼챔버
JP6512182B2 (ja) * 2016-06-27 2019-05-15 日亜化学工業株式会社 半導体装置の製造方法
CN106311525A (zh) * 2016-08-23 2017-01-11 豪威光电子科技（上海）有限公司 涂胶工艺
US10784142B2 (en) * 2018-01-09 2020-09-22 Varian Semiconductor Equipment Associates, Inc. Lift pin system for wafer handling
CN111312653B (zh) * 2020-03-16 2023-08-18 北京北方华创微电子装备有限公司 晶片承载装置及半导体加工设备
JP7585812B2 (ja) * 2021-01-25 2024-11-19 東京エレクトロン株式会社 基板載置台及び基板処理方法。
JP7819003B2 (ja) * 2022-03-18 2026-02-24 東京エレクトロン株式会社 基板載置台、基板処理装置及び基板処理方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3028462B2 (ja) * 1995-05-12 2000-04-04 東京エレクトロン株式会社 熱処理装置
JP3343012B2 (ja) * 1995-12-25 2002-11-11 大日本スクリーン製造株式会社 回転式基板処理装置
JP3881062B2 (ja) * 1996-08-14 2007-02-14 大日本スクリーン製造株式会社 基板保持機構および基板処理装置
KR100493011B1 (ko) * 1998-10-13 2005-08-01 삼성전자주식회사 디스크 사이트에 결합되어 있는 슬라이드 핀을 갖춘 웨이퍼 핸들러 시스템
JP2000237983A (ja) * 1999-02-22 2000-09-05 Hitachi Electronics Eng Co Ltd 基板チャック装置
EP1174910A3 (en) * 2000-07-20 2010-01-06 Applied Materials, Inc. Method and apparatus for dechucking a substrate
JP2002093890A (ja) * 2000-09-19 2002-03-29 Olympus Optical Co Ltd リフトピン及びステージ装置
JP2004059116A (ja) * 2002-07-31 2004-02-26 Sharp Corp ディスプレイ用基板収納用トレイ及びディスプレイ用基板の取り出し機構並びにディスプレイ用基板の取り出し方法
US8033245B2 (en) * 2004-02-12 2011-10-11 Applied Materials, Inc. Substrate support bushing

Also Published As

Publication number Publication date
JP2007251073A (ja) 2007-09-27
KR20070095197A (ko) 2007-09-28
JP4906375B2 (ja) 2012-03-28
CN101043014A (zh) 2007-09-26
TW200802683A (en) 2008-01-01
KR100948759B1 (ko) 2010-03-23

Similar Documents

Publication Publication Date Title
TWI364811B (https=)
KR102283740B1 (ko) 에피택시 반응기에서의 반도체 웨이퍼를 취급하는 장치 및 에피택셜 층을 갖는 반도체 웨이퍼를 제조하는 방법
CN207925445U (zh) 用于处理基板的基板支撑组件
TW200937571A (en) Lift pin for substrate processing
CN118099001A (zh) 接合基板的装置和方法
US8461490B2 (en) Substrate heating unit and substrate treating apparatus including the same
CN108604539B (zh) 外延生长装置和保持部件
TW201929046A (zh) 結合基材的裝置與方法
JP2007258443A (ja) 熱処理装置と基板吸着方法
JP2010080614A5 (https=)
JP4740188B2 (ja) 搬送アーム用パッド
JP2021064813A5 (https=)
US20200157678A1 (en) Lift pin holder assemblies and bodies including lift pin holder assemblies
US20190096736A1 (en) Waffer pedestal and support structure thereof
JP2001223252A (ja) ロボットの吸着レスハンド
JP5073230B2 (ja) 支持ピン
CN106601648A (zh) 晶圆舟、退火工具和退火方法
JP5704461B2 (ja) 枚葉式エピタキシャルウェーハ製造装置およびそれを用いたエピタキシャルウェーハの製造方法
JP6883581B2 (ja) 堆積チャンバでエピタキシャル層を有する半導体ウエハを製造する方法、エピタキシャル層を有する半導体ウエハを製造する装置、およびエピタキシャル層を有する半導体ウエハ
TWI712555B (zh) 用於夾持翹曲晶圓之裝置及方法
CN107210253A (zh) 基板移载系统
TWD118408S1 (zh) 半導體製造用加工處理管
TWI576955B (zh) Crystal seat
JP7322365B2 (ja) サセプタ及び化学気相成長装置
US10998219B2 (en) Wafer support device and method for removing lift pin therefrom