TWI356284B - - Google Patents

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Publication number
TWI356284B
TWI356284B TW096118779A TW96118779A TWI356284B TW I356284 B TWI356284 B TW I356284B TW 096118779 A TW096118779 A TW 096118779A TW 96118779 A TW96118779 A TW 96118779A TW I356284 B TWI356284 B TW I356284B
Authority
TW
Taiwan
Prior art keywords
substrate
base
sub
exposure
main
Prior art date
Application number
TW096118779A
Other languages
English (en)
Chinese (zh)
Other versions
TW200815935A (en
Inventor
Takefumi Maeda
Original Assignee
Nsk Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006152361A external-priority patent/JP2007324347A/ja
Priority claimed from JP2006152360A external-priority patent/JP2007322706A/ja
Priority claimed from JP2006152362A external-priority patent/JP4932330B2/ja
Application filed by Nsk Ltd filed Critical Nsk Ltd
Publication of TW200815935A publication Critical patent/TW200815935A/zh
Application granted granted Critical
Publication of TWI356284B publication Critical patent/TWI356284B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW096118779A 2006-05-31 2007-05-25 Exposure device and method TW200815935A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006152361A JP2007324347A (ja) 2006-05-31 2006-05-31 露光装置
JP2006152360A JP2007322706A (ja) 2006-05-31 2006-05-31 露光装置及び露光方法
JP2006152362A JP4932330B2 (ja) 2006-05-31 2006-05-31 露光装置

Publications (2)

Publication Number Publication Date
TW200815935A TW200815935A (en) 2008-04-01
TWI356284B true TWI356284B (https=) 2012-01-11

Family

ID=39142023

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118779A TW200815935A (en) 2006-05-31 2007-05-25 Exposure device and method

Country Status (2)

Country Link
KR (1) KR100865051B1 (https=)
TW (1) TW200815935A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110244396A1 (en) * 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
JP2013231962A (ja) * 2012-04-06 2013-11-14 Nsk Technology Co Ltd 露光装置及び露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001027978A1 (en) * 1999-10-07 2001-04-19 Nikon Corporation Substrate, stage device, method of driving stage, exposure system and exposure method
JP2005183876A (ja) * 2003-12-24 2005-07-07 Nikon Corp ステージ装置及び露光装置

Also Published As

Publication number Publication date
TW200815935A (en) 2008-04-01
KR100865051B1 (ko) 2008-10-23
KR20070115640A (ko) 2007-12-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees