KR100865051B1 - 노광 장치 및 노광 방법 - Google Patents

노광 장치 및 노광 방법 Download PDF

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Publication number
KR100865051B1
KR100865051B1 KR1020070050615A KR20070050615A KR100865051B1 KR 100865051 B1 KR100865051 B1 KR 100865051B1 KR 1020070050615 A KR1020070050615 A KR 1020070050615A KR 20070050615 A KR20070050615 A KR 20070050615A KR 100865051 B1 KR100865051 B1 KR 100865051B1
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KR
South Korea
Prior art keywords
substrate
exposure
main bed
bed
subbed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020070050615A
Other languages
English (en)
Korean (ko)
Other versions
KR20070115640A (ko
Inventor
다케후미 마에다
Original Assignee
닛본 세이고 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006152361A external-priority patent/JP2007324347A/ja
Priority claimed from JP2006152360A external-priority patent/JP2007322706A/ja
Priority claimed from JP2006152362A external-priority patent/JP4932330B2/ja
Application filed by 닛본 세이고 가부시끼가이샤 filed Critical 닛본 세이고 가부시끼가이샤
Publication of KR20070115640A publication Critical patent/KR20070115640A/ko
Application granted granted Critical
Publication of KR100865051B1 publication Critical patent/KR100865051B1/ko
Assigned to 가부시키가이샤 브이엔시스템즈 reassignment 가부시키가이샤 브이엔시스템즈 권리의 전부이전등록 Assignors: 닛본 세이고 가부시끼가이샤
Assigned to 브이 테크놀로지 씨오. 엘티디 reassignment 브이 테크놀로지 씨오. 엘티디 권리의 전부이전등록 Assignors: 가부시키가이샤 브이엔시스템즈
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020070050615A 2006-05-31 2007-05-25 노광 장치 및 노광 방법 Expired - Fee Related KR100865051B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2006152361A JP2007324347A (ja) 2006-05-31 2006-05-31 露光装置
JP2006152360A JP2007322706A (ja) 2006-05-31 2006-05-31 露光装置及び露光方法
JPJP-P-2006-00152362 2006-05-31
JP2006152362A JP4932330B2 (ja) 2006-05-31 2006-05-31 露光装置
JPJP-P-2006-00152361 2006-05-31
JPJP-P-2006-00152360 2006-05-31

Publications (2)

Publication Number Publication Date
KR20070115640A KR20070115640A (ko) 2007-12-06
KR100865051B1 true KR100865051B1 (ko) 2008-10-23

Family

ID=39142023

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020070050615A Expired - Fee Related KR100865051B1 (ko) 2006-05-31 2007-05-25 노광 장치 및 노광 방법

Country Status (2)

Country Link
KR (1) KR100865051B1 (https=)
TW (1) TW200815935A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110244396A1 (en) * 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
JP2013231962A (ja) * 2012-04-06 2013-11-14 Nsk Technology Co Ltd 露光装置及び露光方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020038592A (ko) * 1999-10-07 2002-05-23 시마무라 테루오 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
JP2005183876A (ja) * 2003-12-24 2005-07-07 Nikon Corp ステージ装置及び露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020038592A (ko) * 1999-10-07 2002-05-23 시마무라 테루오 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
JP2005183876A (ja) * 2003-12-24 2005-07-07 Nikon Corp ステージ装置及び露光装置

Also Published As

Publication number Publication date
TW200815935A (en) 2008-04-01
TWI356284B (https=) 2012-01-11
KR20070115640A (ko) 2007-12-06

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