TW200815935A - Exposure device and method - Google Patents

Exposure device and method Download PDF

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Publication number
TW200815935A
TW200815935A TW096118779A TW96118779A TW200815935A TW 200815935 A TW200815935 A TW 200815935A TW 096118779 A TW096118779 A TW 096118779A TW 96118779 A TW96118779 A TW 96118779A TW 200815935 A TW200815935 A TW 200815935A
Authority
TW
Taiwan
Prior art keywords
substrate
base
sub
exposure
main
Prior art date
Application number
TW096118779A
Other languages
English (en)
Chinese (zh)
Other versions
TWI356284B (https=
Inventor
Takefumi Maeda
Original Assignee
Nsk Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006152361A external-priority patent/JP2007324347A/ja
Priority claimed from JP2006152360A external-priority patent/JP2007322706A/ja
Priority claimed from JP2006152362A external-priority patent/JP4932330B2/ja
Application filed by Nsk Ltd filed Critical Nsk Ltd
Publication of TW200815935A publication Critical patent/TW200815935A/zh
Application granted granted Critical
Publication of TWI356284B publication Critical patent/TWI356284B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW096118779A 2006-05-31 2007-05-25 Exposure device and method TW200815935A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006152361A JP2007324347A (ja) 2006-05-31 2006-05-31 露光装置
JP2006152360A JP2007322706A (ja) 2006-05-31 2006-05-31 露光装置及び露光方法
JP2006152362A JP4932330B2 (ja) 2006-05-31 2006-05-31 露光装置

Publications (2)

Publication Number Publication Date
TW200815935A true TW200815935A (en) 2008-04-01
TWI356284B TWI356284B (https=) 2012-01-11

Family

ID=39142023

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118779A TW200815935A (en) 2006-05-31 2007-05-25 Exposure device and method

Country Status (2)

Country Link
KR (1) KR100865051B1 (https=)
TW (1) TW200815935A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110244396A1 (en) * 2010-04-01 2011-10-06 Nikon Corporation Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
JP2013231962A (ja) * 2012-04-06 2013-11-14 Nsk Technology Co Ltd 露光装置及び露光方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001027978A1 (en) * 1999-10-07 2001-04-19 Nikon Corporation Substrate, stage device, method of driving stage, exposure system and exposure method
JP2005183876A (ja) * 2003-12-24 2005-07-07 Nikon Corp ステージ装置及び露光装置

Also Published As

Publication number Publication date
KR100865051B1 (ko) 2008-10-23
TWI356284B (https=) 2012-01-11
KR20070115640A (ko) 2007-12-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees