TWI346776B - Method and system for detecting non-uniformmities of a semiconductor wafer - Google Patents

Method and system for detecting non-uniformmities of a semiconductor wafer

Info

Publication number
TWI346776B
TWI346776B TW097107023A TW97107023A TWI346776B TW I346776 B TWI346776 B TW I346776B TW 097107023 A TW097107023 A TW 097107023A TW 97107023 A TW97107023 A TW 97107023A TW I346776 B TWI346776 B TW I346776B
Authority
TW
Taiwan
Prior art keywords
uniformmities
semiconductor wafer
detecting non
detecting
wafer
Prior art date
Application number
TW097107023A
Other languages
English (en)
Chinese (zh)
Other versions
TW200846650A (en
Inventor
Jeffrey Alan Hawthorne
M Brandon Steele
Yeyuan Yang
Mark Schulze
Original Assignee
Qcept Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qcept Technologies Inc filed Critical Qcept Technologies Inc
Publication of TW200846650A publication Critical patent/TW200846650A/zh
Application granted granted Critical
Publication of TWI346776B publication Critical patent/TWI346776B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/002Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the work function voltage
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/2648Characterising semiconductor materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • G01R31/265Contactless testing
    • G01R31/2656Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
TW097107023A 2007-03-07 2008-02-29 Method and system for detecting non-uniformmities of a semiconductor wafer TWI346776B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/715,149 US7659734B2 (en) 2007-03-07 2007-03-07 Semiconductor inspection system and apparatus utilizing a non-vibrating contact potential difference sensor and controlled illumination

Publications (2)

Publication Number Publication Date
TW200846650A TW200846650A (en) 2008-12-01
TWI346776B true TWI346776B (en) 2011-08-11

Family

ID=39469573

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097107023A TWI346776B (en) 2007-03-07 2008-02-29 Method and system for detecting non-uniformmities of a semiconductor wafer

Country Status (6)

Country Link
US (1) US7659734B2 (enExample)
EP (1) EP1944614A1 (enExample)
JP (1) JP4783801B2 (enExample)
KR (1) KR100929768B1 (enExample)
CN (1) CN101266222A (enExample)
TW (1) TWI346776B (enExample)

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US20170266744A1 (en) * 2015-10-30 2017-09-21 Mitsubishi Electric Corporation Wire electric discharge machine, control method of control device of wire electric discharge machine, and positioning method
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US10859625B2 (en) * 2018-08-21 2020-12-08 Globalfoundries Singapore Pte. Ltd. Wafer probe card integrated with a light source facing a device under test side and method of manufacturing
US11924972B2 (en) * 2020-06-02 2024-03-05 Applied Materials, Inc. Diagnostic disc with a high vacuum and temperature tolerant power source
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Also Published As

Publication number Publication date
EP1944614A1 (en) 2008-07-16
KR20080082457A (ko) 2008-09-11
JP4783801B2 (ja) 2011-09-28
TW200846650A (en) 2008-12-01
US7659734B2 (en) 2010-02-09
JP2008304452A (ja) 2008-12-18
KR100929768B1 (ko) 2009-12-03
CN101266222A (zh) 2008-09-17
US20080217530A1 (en) 2008-09-11

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