TWI345055B - Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices - Google Patents

Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices Download PDF

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Publication number
TWI345055B
TWI345055B TW093131885A TW93131885A TWI345055B TW I345055 B TWI345055 B TW I345055B TW 093131885 A TW093131885 A TW 093131885A TW 93131885 A TW93131885 A TW 93131885A TW I345055 B TWI345055 B TW I345055B
Authority
TW
Taiwan
Prior art keywords
radiation
array
signal
reflected
layer
Prior art date
Application number
TW093131885A
Other languages
English (en)
Chinese (zh)
Other versions
TW200530576A (en
Inventor
David Berman
Alex Dikopoltsev
Original Assignee
Jordan Valley Applied Radiation Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/300,504 external-priority patent/US6639968B2/en
Priority claimed from US10/313,280 external-priority patent/US6947520B2/en
Priority claimed from US10/364,883 external-priority patent/US6895075B2/en
Priority claimed from US10/689,314 external-priority patent/US7062013B2/en
Application filed by Jordan Valley Applied Radiation Ltd filed Critical Jordan Valley Applied Radiation Ltd
Publication of TW200530576A publication Critical patent/TW200530576A/zh
Application granted granted Critical
Publication of TWI345055B publication Critical patent/TWI345055B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20091—Measuring the energy-dispersion spectrum [EDS] of diffracted radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/36—Measuring spectral distribution of X-rays or of nuclear radiation spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G01N21/5907—Densitometers
    • G01N2021/5957—Densitometers using an image detector type detector, e.g. CCD

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
TW093131885A 2002-11-20 2004-10-20 Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices TWI345055B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10/300,504 US6639968B2 (en) 2001-04-12 2002-11-20 X-ray reflectometer
US10/313,280 US6947520B2 (en) 2002-12-06 2002-12-06 Beam centering and angle calibration for X-ray reflectometry
US10/364,883 US6895075B2 (en) 2003-02-12 2003-02-12 X-ray reflectometry with small-angle scattering measurement
US10/689,314 US7062013B2 (en) 2001-04-12 2003-10-20 X-ray reflectometry of thin film layers with enhanced accuracy

Publications (2)

Publication Number Publication Date
TW200530576A TW200530576A (en) 2005-09-16
TWI345055B true TWI345055B (en) 2011-07-11

Family

ID=34700298

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093131885A TWI345055B (en) 2002-11-20 2004-10-20 Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices

Country Status (3)

Country Link
JP (2) JP4624758B2 (enExample)
KR (1) KR101166013B1 (enExample)
TW (1) TWI345055B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7113566B1 (en) * 2005-07-15 2006-09-26 Jordan Valley Applied Radiation Ltd. Enhancing resolution of X-ray measurements by sample motion
TWI452283B (zh) * 2006-05-05 2014-09-11 Jordan Valley Semiconductors 校準一獲得反射率資料之系統的方法及校準一反射計之方法
KR100814389B1 (ko) * 2006-07-06 2008-03-18 학교법인 포항공과대학교 Ⅹ선 투과 / 회절 영상 결합 촬영 시스템
CN116068609B (zh) * 2023-03-09 2023-05-30 中国科学院合肥物质科学研究院 一种真空环境下弯晶谱仪空间位置标定方法和装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5340988A (en) * 1993-04-05 1994-08-23 General Electric Company High resolution radiation imaging system
JPH0798285A (ja) * 1993-09-29 1995-04-11 Ricoh Co Ltd Ｘ線評価装置
JP2984232B2 (ja) * 1996-10-25 1999-11-29 株式会社テクノス研究所 Ｘ線分析装置およびｘ線照射角設定方法
JP2002118103A (ja) * 2000-10-12 2002-04-19 Matsushita Electric Ind Co Ltd 薄膜製造装置と薄膜の製造方法並びに薄膜トランジスタの製造方法
US6744850B2 (en) * 2001-01-11 2004-06-01 Therma-Wave, Inc. X-ray reflectance measurement system with adjustable resolution
US6535575B2 (en) * 2001-04-12 2003-03-18 Jordan Valley Applied Radiation Ltd. Pulsed X-ray reflectometer
US6507634B1 (en) * 2001-09-19 2003-01-14 Therma-Wave, Inc. System and method for X-ray reflectometry measurement of low density films
JP2003149180A (ja) * 2001-11-13 2003-05-21 Japan Synchrotron Radiation Research Inst １次元または２次元検出器を用いた粉末ｘ線回折データ測定方法
JP2003282660A (ja) * 2002-03-20 2003-10-03 Fujitsu Ltd 半導体製造装置及び成膜方法

Also Published As

Publication number Publication date
JP5302281B2 (ja) 2013-10-02
KR20050037985A (ko) 2005-04-25
JP2005140771A (ja) 2005-06-02
JP2011007811A (ja) 2011-01-13
JP4624758B2 (ja) 2011-02-02
TW200530576A (en) 2005-09-16
KR101166013B1 (ko) 2012-07-19

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