TWI345055B - Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices - Google Patents
Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices Download PDFInfo
- Publication number
- TWI345055B TWI345055B TW093131885A TW93131885A TWI345055B TW I345055 B TWI345055 B TW I345055B TW 093131885 A TW093131885 A TW 093131885A TW 93131885 A TW93131885 A TW 93131885A TW I345055 B TWI345055 B TW I345055B
- Authority
- TW
- Taiwan
- Prior art keywords
- radiation
- array
- signal
- reflected
- layer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 62
- 238000007689 inspection Methods 0.000 title claims description 13
- 238000004377 microelectronic Methods 0.000 title claims description 7
- 230000005855 radiation Effects 0.000 claims description 125
- 239000010408 film Substances 0.000 claims description 28
- 239000004065 semiconductor Substances 0.000 claims description 28
- 238000000151 deposition Methods 0.000 claims description 19
- 230000008021 deposition Effects 0.000 claims description 18
- 239000010409 thin film Substances 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 230000004044 response Effects 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- 239000003989 dielectric material Substances 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229910052724 xenon Inorganic materials 0.000 claims description 5
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 5
- 238000005520 cutting process Methods 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 239000000523 sample Substances 0.000 description 70
- 239000010410 layer Substances 0.000 description 62
- 238000005259 measurement Methods 0.000 description 40
- 235000012431 wafers Nutrition 0.000 description 30
- 238000001228 spectrum Methods 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 239000002344 surface layer Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000000560 X-ray reflectometry Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000013519 translation Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000002050 diffraction method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- -1 one Chemical compound 0.000 description 1
- 208000021596 pentasomy X Diseases 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000010896 thin film analysis Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20091—Measuring the energy-dispersion spectrum [EDS] of diffracted radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/2055—Analysing diffraction patterns
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/36—Measuring spectral distribution of X-rays or of nuclear radiation spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
- G01N21/5907—Densitometers
- G01N2021/5957—Densitometers using an image detector type detector, e.g. CCD
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Dispersion Chemistry (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Electromagnetism (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/300,504 US6639968B2 (en) | 2001-04-12 | 2002-11-20 | X-ray reflectometer |
| US10/313,280 US6947520B2 (en) | 2002-12-06 | 2002-12-06 | Beam centering and angle calibration for X-ray reflectometry |
| US10/364,883 US6895075B2 (en) | 2003-02-12 | 2003-02-12 | X-ray reflectometry with small-angle scattering measurement |
| US10/689,314 US7062013B2 (en) | 2001-04-12 | 2003-10-20 | X-ray reflectometry of thin film layers with enhanced accuracy |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200530576A TW200530576A (en) | 2005-09-16 |
| TWI345055B true TWI345055B (en) | 2011-07-11 |
Family
ID=34700298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093131885A TWI345055B (en) | 2002-11-20 | 2004-10-20 | Method and apparatus for inspection,and cluster tool and apparatus for producing microelectronic devices |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP4624758B2 (enExample) |
| KR (1) | KR101166013B1 (enExample) |
| TW (1) | TWI345055B (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7113566B1 (en) * | 2005-07-15 | 2006-09-26 | Jordan Valley Applied Radiation Ltd. | Enhancing resolution of X-ray measurements by sample motion |
| TWI452283B (zh) * | 2006-05-05 | 2014-09-11 | Jordan Valley Semiconductors | 校準一獲得反射率資料之系統的方法及校準一反射計之方法 |
| KR100814389B1 (ko) * | 2006-07-06 | 2008-03-18 | 학교법인 포항공과대학교 | Ⅹ선 투과 / 회절 영상 결합 촬영 시스템 |
| CN116068609B (zh) * | 2023-03-09 | 2023-05-30 | 中国科学院合肥物质科学研究院 | 一种真空环境下弯晶谱仪空间位置标定方法和装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5340988A (en) * | 1993-04-05 | 1994-08-23 | General Electric Company | High resolution radiation imaging system |
| JPH0798285A (ja) * | 1993-09-29 | 1995-04-11 | Ricoh Co Ltd | Ｘ線評価装置 |
| JP2984232B2 (ja) * | 1996-10-25 | 1999-11-29 | 株式会社テクノス研究所 | Ｘ線分析装置およびｘ線照射角設定方法 |
| JP2002118103A (ja) * | 2000-10-12 | 2002-04-19 | Matsushita Electric Ind Co Ltd | 薄膜製造装置と薄膜の製造方法並びに薄膜トランジスタの製造方法 |
| US6744850B2 (en) * | 2001-01-11 | 2004-06-01 | Therma-Wave, Inc. | X-ray reflectance measurement system with adjustable resolution |
| US6535575B2 (en) * | 2001-04-12 | 2003-03-18 | Jordan Valley Applied Radiation Ltd. | Pulsed X-ray reflectometer |
| US6507634B1 (en) * | 2001-09-19 | 2003-01-14 | Therma-Wave, Inc. | System and method for X-ray reflectometry measurement of low density films |
| JP2003149180A (ja) * | 2001-11-13 | 2003-05-21 | Japan Synchrotron Radiation Research Inst | １次元または２次元検出器を用いた粉末ｘ線回折データ測定方法 |
| JP2003282660A (ja) * | 2002-03-20 | 2003-10-03 | Fujitsu Ltd | 半導体製造装置及び成膜方法 |
-
2004
- 2004-10-20 KR KR1020040084157A patent/KR101166013B1/ko not_active Expired - Lifetime
- 2004-10-20 TW TW093131885A patent/TWI345055B/zh not_active IP Right Cessation
- 2004-10-20 JP JP2004306239A patent/JP4624758B2/ja not_active Expired - Lifetime
-
2010
- 2010-09-13 JP JP2010204666A patent/JP5302281B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP4624758B2 (ja) | 2011-02-02 |
| JP2005140771A (ja) | 2005-06-02 |
| KR20050037985A (ko) | 2005-04-25 |
| JP2011007811A (ja) | 2011-01-13 |
| TW200530576A (en) | 2005-09-16 |
| KR101166013B1 (ko) | 2012-07-19 |
| JP5302281B2 (ja) | 2013-10-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |