KR101166013B1 - 증진된 정밀성을 가진 박막층의 ｘ-레이 반사광 측정법 - Google Patents

증진된 정밀성을 가진 박막층의 ｘ-레이 반사광 측정법 Download PDF

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KR101166013B1
KR101166013B1 KR1020040084157A KR20040084157A KR101166013B1 KR 101166013 B1 KR101166013 B1 KR 101166013B1 KR 1020040084157 A KR1020040084157 A KR 1020040084157A KR 20040084157 A KR20040084157 A KR 20040084157A KR 101166013 B1 KR101166013 B1 KR 101166013B1
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radiation
signal
array
reflected
layer
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Korean (ko)
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KR20050037985A (ko
Inventor
베르만데이비드
디코폴트세브알렉스
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조르단 밸리 세미컨덕터즈 리미티드
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Priority claimed from US10/689,314 external-priority patent/US7062013B2/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20091—Measuring the energy-dispersion spectrum [EDS] of diffracted radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/36—Measuring spectral distribution of X-rays or of nuclear radiation spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G01N21/5907—Densitometers
    • G01N2021/5957—Densitometers using an image detector type detector, e.g. CCD

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020040084157A 2003-10-20 2004-10-20 증진된 정밀성을 가진 박막층의 ｘ-레이 반사광 측정법 Expired - Lifetime KR101166013B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/689,314 US7062013B2 (en) 2001-04-12 2003-10-20 X-ray reflectometry of thin film layers with enhanced accuracy
US10/689,314 2003-10-20

Publications (2)

Publication Number Publication Date
KR20050037985A KR20050037985A (ko) 2005-04-25
KR101166013B1 true KR101166013B1 (ko) 2012-07-19

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KR1020040084157A Expired - Lifetime KR101166013B1 (ko) 2003-10-20 2004-10-20 증진된 정밀성을 가진 박막층의 ｘ-레이 반사광 측정법

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JP (2) JP4624758B2 (enExample)
KR (1) KR101166013B1 (enExample)
TW (1) TWI345055B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7113566B1 (en) * 2005-07-15 2006-09-26 Jordan Valley Applied Radiation Ltd. Enhancing resolution of X-ray measurements by sample motion
TWI452283B (zh) * 2006-05-05 2014-09-11 Jordan Valley Semiconductors 校準一獲得反射率資料之系統的方法及校準一反射計之方法
KR100814389B1 (ko) * 2006-07-06 2008-03-18 학교법인 포항공과대학교 Ⅹ선 투과 / 회절 영상 결합 촬영 시스템
CN116068609B (zh) * 2023-03-09 2023-05-30 中国科学院合肥物质科学研究院 一种真空环境下弯晶谱仪空间位置标定方法和装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020097837A1 (en) * 2001-01-11 2002-07-25 Fanton Jeffrey T. X-ray reflectance measurement system with adjustable resolution
US6507634B1 (en) * 2001-09-19 2003-01-14 Therma-Wave, Inc. System and method for X-ray reflectometry measurement of low density films
US6535575B2 (en) * 2001-04-12 2003-03-18 Jordan Valley Applied Radiation Ltd. Pulsed X-ray reflectometer

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5340988A (en) * 1993-04-05 1994-08-23 General Electric Company High resolution radiation imaging system
JPH0798285A (ja) * 1993-09-29 1995-04-11 Ricoh Co Ltd Ｘ線評価装置
JP2984232B2 (ja) * 1996-10-25 1999-11-29 株式会社テクノス研究所 Ｘ線分析装置およびｘ線照射角設定方法
JP2002118103A (ja) * 2000-10-12 2002-04-19 Matsushita Electric Ind Co Ltd 薄膜製造装置と薄膜の製造方法並びに薄膜トランジスタの製造方法
JP2003149180A (ja) * 2001-11-13 2003-05-21 Japan Synchrotron Radiation Research Inst １次元または２次元検出器を用いた粉末ｘ線回折データ測定方法
JP2003282660A (ja) * 2002-03-20 2003-10-03 Fujitsu Ltd 半導体製造装置及び成膜方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020097837A1 (en) * 2001-01-11 2002-07-25 Fanton Jeffrey T. X-ray reflectance measurement system with adjustable resolution
US6535575B2 (en) * 2001-04-12 2003-03-18 Jordan Valley Applied Radiation Ltd. Pulsed X-ray reflectometer
US6507634B1 (en) * 2001-09-19 2003-01-14 Therma-Wave, Inc. System and method for X-ray reflectometry measurement of low density films

Also Published As

Publication number Publication date
TWI345055B (en) 2011-07-11
JP4624758B2 (ja) 2011-02-02
JP2005140771A (ja) 2005-06-02
KR20050037985A (ko) 2005-04-25
JP2011007811A (ja) 2011-01-13
TW200530576A (en) 2005-09-16
JP5302281B2 (ja) 2013-10-02

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