JP4624758B2 - サンプルの検査方法及び装置 - Google Patents

サンプルの検査方法及び装置 Download PDF

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Publication number
JP4624758B2
JP4624758B2 JP2004306239A JP2004306239A JP4624758B2 JP 4624758 B2 JP4624758 B2 JP 4624758B2 JP 2004306239 A JP2004306239 A JP 2004306239A JP 2004306239 A JP2004306239 A JP 2004306239A JP 4624758 B2 JP4624758 B2 JP 4624758B2
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Japan
Prior art keywords
layer
reflected signal
radiation
array
density
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Expired - Lifetime
Application number
JP2004306239A
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English (en)
Japanese (ja)
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JP2005140771A (ja
JP2005140771A5 (enExample
Inventor
ベルマン ダビド
ディコポルツェフ アレックス
Original Assignee
ジョーダン ヴァリー セミコンダクターズ リミテッド
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Priority claimed from US10/689,314 external-priority patent/US7062013B2/en
Application filed by ジョーダン ヴァリー セミコンダクターズ リミテッド filed Critical ジョーダン ヴァリー セミコンダクターズ リミテッド
Publication of JP2005140771A publication Critical patent/JP2005140771A/ja
Publication of JP2005140771A5 publication Critical patent/JP2005140771A5/ja
Application granted granted Critical
Publication of JP4624758B2 publication Critical patent/JP4624758B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20091—Measuring the energy-dispersion spectrum [EDS] of diffracted radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/2055—Analysing diffraction patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/36—Measuring spectral distribution of X-rays or of nuclear radiation spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G01N21/5907—Densitometers
    • G01N2021/5957—Densitometers using an image detector type detector, e.g. CCD

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Dispersion Chemistry (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2004306239A 2003-10-20 2004-10-20 サンプルの検査方法及び装置 Expired - Lifetime JP4624758B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/689,314 US7062013B2 (en) 2001-04-12 2003-10-20 X-ray reflectometry of thin film layers with enhanced accuracy

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010204666A Division JP5302281B2 (ja) 2003-10-20 2010-09-13 サンプルの検査方法及び装置

Publications (3)

Publication Number Publication Date
JP2005140771A JP2005140771A (ja) 2005-06-02
JP2005140771A5 JP2005140771A5 (enExample) 2007-10-25
JP4624758B2 true JP4624758B2 (ja) 2011-02-02

Family

ID=34700298

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004306239A Expired - Lifetime JP4624758B2 (ja) 2003-10-20 2004-10-20 サンプルの検査方法及び装置
JP2010204666A Expired - Lifetime JP5302281B2 (ja) 2003-10-20 2010-09-13 サンプルの検査方法及び装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010204666A Expired - Lifetime JP5302281B2 (ja) 2003-10-20 2010-09-13 サンプルの検査方法及び装置

Country Status (3)

Country Link
JP (2) JP4624758B2 (enExample)
KR (1) KR101166013B1 (enExample)
TW (1) TWI345055B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7113566B1 (en) * 2005-07-15 2006-09-26 Jordan Valley Applied Radiation Ltd. Enhancing resolution of X-ray measurements by sample motion
TWI452283B (zh) * 2006-05-05 2014-09-11 Jordan Valley Semiconductors 校準一獲得反射率資料之系統的方法及校準一反射計之方法
KR100814389B1 (ko) * 2006-07-06 2008-03-18 학교법인 포항공과대학교 Ⅹ선 투과 / 회절 영상 결합 촬영 시스템
CN116068609B (zh) * 2023-03-09 2023-05-30 中国科学院合肥物质科学研究院 一种真空环境下弯晶谱仪空间位置标定方法和装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5340988A (en) * 1993-04-05 1994-08-23 General Electric Company High resolution radiation imaging system
JPH0798285A (ja) * 1993-09-29 1995-04-11 Ricoh Co Ltd Ｘ線評価装置
JP2984232B2 (ja) * 1996-10-25 1999-11-29 株式会社テクノス研究所 Ｘ線分析装置およびｘ線照射角設定方法
JP2002118103A (ja) * 2000-10-12 2002-04-19 Matsushita Electric Ind Co Ltd 薄膜製造装置と薄膜の製造方法並びに薄膜トランジスタの製造方法
US6744850B2 (en) * 2001-01-11 2004-06-01 Therma-Wave, Inc. X-ray reflectance measurement system with adjustable resolution
US6535575B2 (en) * 2001-04-12 2003-03-18 Jordan Valley Applied Radiation Ltd. Pulsed X-ray reflectometer
US6507634B1 (en) * 2001-09-19 2003-01-14 Therma-Wave, Inc. System and method for X-ray reflectometry measurement of low density films
JP2003149180A (ja) * 2001-11-13 2003-05-21 Japan Synchrotron Radiation Research Inst １次元または２次元検出器を用いた粉末ｘ線回折データ測定方法
JP2003282660A (ja) * 2002-03-20 2003-10-03 Fujitsu Ltd 半導体製造装置及び成膜方法

Also Published As

Publication number Publication date
TWI345055B (en) 2011-07-11
JP2005140771A (ja) 2005-06-02
KR20050037985A (ko) 2005-04-25
JP2011007811A (ja) 2011-01-13
TW200530576A (en) 2005-09-16
KR101166013B1 (ko) 2012-07-19
JP5302281B2 (ja) 2013-10-02

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