JP2007285923A5 - - Google Patents
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- Publication number
- JP2007285923A5 JP2007285923A5 JP2006114489A JP2006114489A JP2007285923A5 JP 2007285923 A5 JP2007285923 A5 JP 2007285923A5 JP 2006114489 A JP2006114489 A JP 2006114489A JP 2006114489 A JP2006114489 A JP 2006114489A JP 2007285923 A5 JP2007285923 A5 JP 2007285923A5
- Authority
- JP
- Japan
- Prior art keywords
- spectrum
- periodic structure
- thin film
- region
- analyzing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000001228 spectrum Methods 0.000 claims description 27
- 230000000737 periodic effect Effects 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- 239000003989 dielectric material Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000011368 organic material Substances 0.000 claims description 3
- 238000009304 pastoral farming Methods 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims 4
- 238000002441 X-ray diffraction Methods 0.000 claims 2
- 238000007689 inspection Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000004377 microelectronic Methods 0.000 claims 2
- 238000000560 X-ray reflectometry Methods 0.000 description 6
- 229910016523 CuKa Inorganic materials 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006114489A JP2007285923A (ja) | 2006-04-18 | 2006-04-18 | 反射モードのｘ線回折を用いた限界寸法の測定 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006114489A JP2007285923A (ja) | 2006-04-18 | 2006-04-18 | 反射モードのｘ線回折を用いた限界寸法の測定 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007285923A JP2007285923A (ja) | 2007-11-01 |
| JP2007285923A5 true JP2007285923A5 (enExample) | 2011-11-24 |
Family
ID=38757829
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006114489A Pending JP2007285923A (ja) | 2006-04-18 | 2006-04-18 | 反射モードのｘ線回折を用いた限界寸法の測定 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2007285923A (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2481950B (en) * | 2009-04-14 | 2017-08-23 | Rigaku Denki Co Ltd | Surface microstructure measurement method, surface microstructure measurement data analysis method and surface microstructure measurement system. |
| JP5367549B2 (ja) | 2009-12-07 | 2013-12-11 | 株式会社東芝 | 基板計測方法 |
| JP2011203061A (ja) * | 2010-03-25 | 2011-10-13 | Toshiba Corp | パターン計測方法およびパターン計測装置 |
| JP6189242B2 (ja) * | 2014-03-28 | 2017-08-30 | Hoya株式会社 | フォトマスクの製造方法、フォトマスク及び表示装置の製造方法 |
| WO2016124345A1 (en) | 2015-02-04 | 2016-08-11 | Asml Netherlands B.V. | Metrology method, metrology apparatus and device manufacturing method |
| JP6495789B2 (ja) | 2015-09-11 | 2019-04-03 | 東芝メモリ株式会社 | 形状算出プログラム、形状算出装置および形状測定方法 |
| US10352695B2 (en) * | 2015-12-11 | 2019-07-16 | Kla-Tencor Corporation | X-ray scatterometry metrology for high aspect ratio structures |
| US10727142B2 (en) * | 2017-05-30 | 2020-07-28 | Kla-Tencor Corporation | Process monitoring of deep structures with X-ray scatterometry |
| JP7458935B2 (ja) * | 2020-08-26 | 2024-04-01 | キオクシア株式会社 | 計測装置、及び、計測方法 |
| CN121090586A (zh) * | 2021-10-24 | 2025-12-09 | 诺威量测设备公司 | 多个测量情况下使用xps在小盒中特征化样品的系统及方法 |
| JP7659821B2 (ja) * | 2021-11-30 | 2025-04-10 | 国立研究開発法人産業技術総合研究所 | ピッチ測定システム、ピッチ測定装置、ピッチ測定方法、ピッチ測定プログラム |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3366525B2 (ja) * | 1995-11-30 | 2003-01-14 | 富士通株式会社 | 膜厚測定方法及び膜の製造方法 |
| JPH11304728A (ja) * | 1998-04-23 | 1999-11-05 | Hitachi Ltd | Ｘ線計測装置 |
| US7126700B2 (en) * | 2003-12-12 | 2006-10-24 | Timbre Technologies, Inc. | Parametric optimization of optical metrology model |
| JP3914925B2 (ja) * | 2004-01-28 | 2007-05-16 | 株式会社リガク | 膜厚測定方法及び装置 |
| JP2005265841A (ja) * | 2004-02-17 | 2005-09-29 | Omron Corp | 光学式測定装置および光学式測定方法 |
| JP2005315742A (ja) * | 2004-04-28 | 2005-11-10 | Sony Corp | 測定装置および測定方法 |
| JP2005326261A (ja) * | 2004-05-14 | 2005-11-24 | Japan Synchrotron Radiation Research Inst | 超微細構造体のｘ線迅速構造解析方法 |
-
2006
- 2006-04-18 JP JP2006114489A patent/JP2007285923A/ja active Pending
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