TWI344384B - Photocatalytic process - Google Patents
Photocatalytic process Download PDFInfo
- Publication number
- TWI344384B TWI344384B TW094138436A TW94138436A TWI344384B TW I344384 B TWI344384 B TW I344384B TW 094138436 A TW094138436 A TW 094138436A TW 94138436 A TW94138436 A TW 94138436A TW I344384 B TWI344384 B TW I344384B
- Authority
- TW
- Taiwan
- Prior art keywords
- photocatalytic
- anode
- lamp
- phosphor
- carbon
- Prior art date
Links
- 230000001699 photocatalysis Effects 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 11
- 239000000463 material Substances 0.000 claims description 32
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 31
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 27
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- 239000002041 carbon nanotube Substances 0.000 claims description 12
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 11
- 230000005684 electric field Effects 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000000758 substrate Substances 0.000 claims description 7
- 239000003054 catalyst Substances 0.000 claims description 2
- 239000012530 fluid Substances 0.000 claims 2
- 239000011521 glass Substances 0.000 description 25
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 239000004020 conductor Substances 0.000 description 11
- 239000004744 fabric Substances 0.000 description 10
- 229920000049 Carbon (fiber) Polymers 0.000 description 9
- 239000004917 carbon fiber Substances 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 9
- 239000011941 photocatalyst Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 239000010406 cathode material Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000004887 air purification Methods 0.000 description 2
- 239000005352 borofloat Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000012780 transparent material Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000002238 carbon nanotube film Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 238000004050 hot filament vapor deposition Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002048 multi walled nanotube Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002109 single walled nanotube Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000475 sunscreen effect Effects 0.000 description 1
- 239000000516 sunscreening agent Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 230000003612 virological effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/40—Mixed oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3222—Units using UV-light emitting diodes [LED]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/10—Photocatalysts
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Toxicology (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Catalysts (AREA)
- Physical Water Treatments (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Disinfection, Sterilisation Or Deodorisation Of Air (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US62472404P | 2004-11-03 | 2004-11-03 | |
| US11/263,638 US7300634B2 (en) | 2004-11-03 | 2005-10-31 | Photocatalytic process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200630149A TW200630149A (en) | 2006-09-01 |
| TWI344384B true TWI344384B (en) | 2011-07-01 |
Family
ID=36260538
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094138436A TWI344384B (en) | 2004-11-03 | 2005-11-02 | Photocatalytic process |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7300634B2 (enExample) |
| JP (1) | JP5064228B2 (enExample) |
| CN (1) | CN101048228B (enExample) |
| TW (1) | TWI344384B (enExample) |
| WO (1) | WO2006060103A2 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE377580T1 (de) | 2004-07-12 | 2007-11-15 | Cardinal Cg Co | Wartungsarme beschichtungen |
| JP2006082287A (ja) * | 2004-09-14 | 2006-03-30 | Fuji Xerox Co Ltd | インクジェット記録装置 |
| US20100189223A1 (en) * | 2006-02-16 | 2010-07-29 | Steller Micro Devices | Digitally addressed flat panel x-ray sources |
| US20070189459A1 (en) * | 2006-02-16 | 2007-08-16 | Stellar Micro Devices, Inc. | Compact radiation source |
| US20100189222A1 (en) * | 2006-02-16 | 2010-07-29 | Steller Micro Devices | Panoramic irradiation system using flat panel x-ray sources |
| US9324535B2 (en) * | 2006-02-16 | 2016-04-26 | Stellarray, Incorporaated | Self contained irradiation system using flat panel X-ray sources |
| CN100561657C (zh) * | 2006-03-31 | 2009-11-18 | 清华大学 | 场发射灯管及其制造方法 |
| WO2007121215A1 (en) * | 2006-04-11 | 2007-10-25 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| WO2009036284A1 (en) | 2007-09-14 | 2009-03-19 | Cardinal Cg Company | Low-maintenance coatings, and methods for producing low-maintenance coatings |
| US7824626B2 (en) | 2007-09-27 | 2010-11-02 | Applied Nanotech Holdings, Inc. | Air handler and purifier |
| US8440467B2 (en) * | 2007-09-28 | 2013-05-14 | William Marsh Rice University | Electronic switching, memory, and sensor devices from a discontinuous graphene and/or graphite carbon layer on dielectric materials |
| CN101465254B (zh) * | 2007-12-19 | 2010-12-08 | 北京富纳特创新科技有限公司 | 热发射电子源及其制备方法 |
| CN101556888B (zh) * | 2008-04-11 | 2011-01-05 | 鸿富锦精密工业（深圳）有限公司 | 热发射电子源的制备方法 |
| JP5468079B2 (ja) * | 2009-09-07 | 2014-04-09 | 国立大学法人 名古屋工業大学 | 真空紫外発光デバイス |
| US9242019B2 (en) | 2014-03-13 | 2016-01-26 | Stellarray, Incorporated | UV pipe |
| GB201516253D0 (en) * | 2015-09-14 | 2015-10-28 | Univ Montfort | Rotating contactor reactor |
| GB2537196B (en) * | 2015-10-02 | 2017-05-10 | Mario Michan Juan | Apparatus and method for electron irradiation scrubbing |
| CN106348384A (zh) * | 2016-10-18 | 2017-01-25 | 兰州交通大学 | 一种光催化反应装置 |
| US10604442B2 (en) | 2016-11-17 | 2020-03-31 | Cardinal Cg Company | Static-dissipative coating technology |
| EP3658030A4 (en) * | 2017-07-26 | 2021-06-30 | Shenzhen Xpectvision Technology Co., Ltd. | INTEGRATED X-RAY SOURCE |
| DE102020113351A1 (de) * | 2020-05-18 | 2021-11-18 | Dbt Gmbh | Elektronenemitterstruktur, Äußerer-Photoeffekt-Emitter, Partikelsammelvorrichtung Tunnel- Flächenemitter halbleiterbasierter Direktemitter, und Flüssigkeitsionisator mit derselben, Verfahren zum Erzeugen von freien Elektronen und Verfahren zum Sammeln von Partikeln |
| CN114917737A (zh) * | 2022-05-18 | 2022-08-19 | 中国科学院大学 | 一种用于二噁英处理的低温等离子体装置 |
| CN119972041A (zh) * | 2025-04-14 | 2025-05-13 | 河南师范大学 | 一种TiO2/碳毡光热-催化材料、制备方法及其应用的光热界面蒸发净化装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5659224A (en) * | 1992-03-16 | 1997-08-19 | Microelectronics And Computer Technology Corporation | Cold cathode display device |
| JPH09253637A (ja) * | 1996-03-21 | 1997-09-30 | Matsushita Electric Ind Co Ltd | 流体処理装置 |
| WO2001019515A1 (en) * | 1999-09-09 | 2001-03-22 | Hitachi Zosen Corporation | Catalyst with discharge electrode or carrier |
| JP3440896B2 (ja) * | 1999-09-14 | 2003-08-25 | ダイキン工業株式会社 | 空気清浄装置 |
| CN1112719C (zh) * | 1999-10-12 | 2003-06-25 | 葛世潮 | 场发射等离子体放电发光装置及显示器 |
| US20020070648A1 (en) * | 2000-12-08 | 2002-06-13 | Gunnar Forsberg | Field emitting cathode and a light source using a field emitting cathode |
| JP4034083B2 (ja) * | 2002-02-18 | 2008-01-16 | 有限会社水野建築設計事務所 | 集合住宅 |
| JP4723786B2 (ja) * | 2002-05-23 | 2011-07-13 | 株式会社日鮮 | 生鮮物保存庫内の空気浄化装置 |
| JP2005261988A (ja) | 2002-09-20 | 2005-09-29 | Andes Denki Kk | 光触媒材料とその製造方法 |
-
2005
- 2005-10-31 US US11/263,638 patent/US7300634B2/en not_active Expired - Fee Related
- 2005-11-02 TW TW094138436A patent/TWI344384B/zh not_active IP Right Cessation
- 2005-11-03 JP JP2007539335A patent/JP5064228B2/ja not_active Expired - Fee Related
- 2005-11-03 CN CN200580037173XA patent/CN101048228B/zh not_active Expired - Fee Related
- 2005-11-03 WO PCT/US2005/039733 patent/WO2006060103A2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CN101048228A (zh) | 2007-10-03 |
| CN101048228B (zh) | 2012-02-01 |
| WO2006060103A2 (en) | 2006-06-08 |
| JP5064228B2 (ja) | 2012-10-31 |
| US20060090996A1 (en) | 2006-05-04 |
| WO2006060103A3 (en) | 2007-03-29 |
| US7300634B2 (en) | 2007-11-27 |
| JP2008518759A (ja) | 2008-06-05 |
| TW200630149A (en) | 2006-09-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |